JP2670916B2 - Retardation film manufacturing method - Google Patents
Retardation film manufacturing methodInfo
- Publication number
- JP2670916B2 JP2670916B2 JP3115584A JP11558491A JP2670916B2 JP 2670916 B2 JP2670916 B2 JP 2670916B2 JP 3115584 A JP3115584 A JP 3115584A JP 11558491 A JP11558491 A JP 11558491A JP 2670916 B2 JP2670916 B2 JP 2670916B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- support
- casting
- drying
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Moulding By Coating Moulds (AREA)
- Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
- Polarising Elements (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は位相差膜の製造方法に関
する、特に合成高分子溶液を走行するエンドレスの金属
板の支持体上に流延し、膜状物とした後、乾燥を行い、
支持体上より剥ぎ取り、更に後乾燥を行うプラスチック
フィルムによる液晶表示(LCD)用位相差膜の製造方
法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a retardation film, in particular, a synthetic polymer solution is cast on a support of an endless metal plate to form a film, and then dried.
The present invention relates to a method for producing a retardation film for liquid crystal display (LCD) using a plastic film, which is peeled off from a support and further dried.
【0002】[0002]
【従来の技術】従来位相差膜の製造方法としては、溶液
流延法により複屈折を有するフイルムを製膜して、延伸
することにより位相差を生じさせている。(特開昭56
−130703号公報参照)2. Description of the Related Art As a conventional method for producing a retardation film, a film having birefringence is formed by a solution casting method and stretched to produce a retardation. (JP-A-56
(See JP-130703)
【0003】[0003]
【発明が解決しようとする課題】しかしながら有機溶媒
に溶解された高分子溶液を走行する支持体上に流延して
プラスチックフィルムを製膜する一般の方法に於ては、
使用される有機溶媒に特に低沸点溶媒が多量に含まれる
場合は、ダイから高分子溶液を押し出す時ダイ先端です
ぐに溶媒蒸発が始まり、ダイ先端に高分子溶液が固着
し、スジ故障を発生させることがある。また小量の乾燥
風が当たってもその乾燥風の流れが均一でない場合は、
溶媒の蒸発が乾燥風の当たり方によって変わるために膜
状物の表面上に乾燥風による乾燥ムラが発生し、それが
フィルム内部に光学的ムラとして存在してしまう。平面
性としては全く問題がないために、単なる感光材料用支
持体としては全く問題ないが、光学的利用、例えば液晶
表示器(LCD)用位相差膜など複屈折を利用するよう
な場合は品質上問題となる。又、特にLCD用位相差膜
の製造の場合、支持体から流延膜を剥がす場合に支持体
との付着力が強く、剥離できない場合があり問題であっ
た。更に溶液流延の場合、支持体から流延膜を剥がす場
合に、支持体との付着力が強いと剥離時に段状のムラに
なったり、剥ぎ取ることができない場合がある。又、溶
液系のため、流延後剥離までの時間を短くすると、溶媒
の蒸発が少なく、膜の強度が弱くなり剥離時に伸びが生
じて幅方向のムラとなったり、支持体に膜の一部が残る
剥げ残り現象が生じる場合があった。本発明の目的は上
記従来の問題点を解消し、剥離時のムラや剥げ残り現象
を防止し、品質の安定した、かつ製膜速度を上げること
の出来る位相差膜製造方法を提供することにある。However, in the general method for casting a polymer film by casting a polymer solution dissolved in an organic solvent on a running support,
If the organic solvent used contains a particularly large amount of low-boiling solvents, when the polymer solution is extruded from the die, solvent evaporation starts immediately at the tip of the die, and the polymer solution sticks to the tip of the die, causing streak failure. May be caused. If the flow of dry air is not uniform even if a small amount of dry air hits it,
Since the evaporation of the solvent changes depending on how the drying air hits, drying unevenness due to the drying air is generated on the surface of the film-like material, and this is present as optical unevenness inside the film. Since there is no problem in terms of planarity, there is no problem as a mere support for a photosensitive material, but in the case of optically utilizing, for example, birefringence such as retardation film for liquid crystal display (LCD), the quality is It becomes an upper problem. Further, particularly in the case of manufacturing a retardation film for LCD, when peeling the casting film from the support, the adhesive force with the support is strong and there are cases where it cannot be peeled off, which is a problem. Further, in the case of solution casting, when peeling the casting film from the support, if the adhesive strength to the support is strong, stepwise unevenness may occur during peeling or the peeling may not be possible. In addition, since the solution system is used, if the time from casting to peeling is shortened, the evaporation of the solvent is reduced, the strength of the film is weakened, and elongation occurs at the time of peeling, resulting in unevenness in the width direction, and the film on the support is There was a case where the phenomenon of peeling residue remained. An object of the present invention is to solve the above conventional problems, to provide a retardation film manufacturing method capable of preventing unevenness during peeling and peeling residual phenomenon, having stable quality, and increasing the film forming speed. is there.
【0004】[0004]
【課題を解決するための手段及び作用】本発明の上記目
的は、高分子溶液を支持体に流延して製膜し、その後延
伸して位相差膜を製造する方法において、前記高分子溶
液に一般式(1)に示すリン酸エステル系界面活性剤を
添加して流延することを特徴とする位相差膜製造方法、Means and Actions for Solving the Problems The above object of the present invention is to provide a method for producing a retardation film by casting a polymer solution on a support to form a film, and then stretching the polymer solution. A method for producing a retardation film, characterized in that the phosphoric acid ester-based surfactant represented by the general formula (1) is added and cast.
【0005】一般式The general formula
【化2】 Embedded image
【0006】 但し:R1 :炭素数6以上のアルキル基、またはアルケ
ニル基 炭素数6以上のアルキル基またはアルケニル基を有する
アリール基 R2 :炭化水素基 L1 :二価の連結基 n1:0または1 M1 :水素原子またはカチオン R3 :M2 またはR4 −(L2 )n2−R5 (R4 とR1 と同義,L2 はL1と同義,n2はn1と同
義,R5 はR2 と同義,M2 はM1 と同義) 及び、前記溶液流延製膜方法が有機溶媒に溶解された前
記高分子溶液を走行するエンドレスの金属板の支持体上
に流延し、膜状物とした後、乾燥を行い、該支持体上よ
り剥ぎ取り、更に後乾燥を行うプラスチックフィルムの
流延製膜方法であって、前記支持体の裏面側より支持体
を輻射熱源によって加熱し、かつ膜状物の残留溶剤が3
5重量%以下に至る迄の範囲は該支持体上の表面側膜状
物は乾燥風を用いず輻射熱源によってのみ加熱し乾燥さ
せることを特徴とする請求項1記載の位相差膜製造方法
によって達成される。However, R 1 is an alkyl group having 6 or more carbon atoms, or an alkenyl group is an aryl group having an alkyl group or an alkenyl group having 6 or more carbon atoms R 2 : a hydrocarbon group L 1 : a divalent linking group n 1: 0 or 1 M 1: a hydrogen atom or a cation R 3: M 2 or R 4 - (L 2) n2 -R 5 (R 4 and R 1 as defined, L 2 is L 1 synonymous, n2 is n1 synonymous, R 5 has the same meaning as R 2 and M 2 has the same meaning as M 1. ) and the solution casting film-forming method is such that the polymer solution dissolved in an organic solvent is cast on an endless metal plate support. A method for casting a plastic film, which comprises drying a film, peeling the film from the support, and further drying the film, wherein the support is radiant heat source from the back side of the support. It is heated and the residual solvent of the film is 3
2. The method for producing a retardation film according to claim 1, wherein the surface side film-like material on the support is heated and dried only by a radiant heat source without using drying air in a range up to 5% by weight or less. To be achieved.
【0007】本発明における位相差膜としては複屈折性
を有するものでポリスチレンおよびスチレン・アクリロ
ニトリル共重合体の他、ポリカーボネート、ポリメタク
リル酸メチル、ポリプロピレン、ポリ塩化ビニル、ポリ
エチレン、ポリアクリレート、ポリエーテルスルホン、
ポリフェニレンオキサイド等である。又、本発明に用い
る溶媒としては、メチレンクロライドなどの塩素化炭化
水素、アセトン、メチルエチルケトンなどのケトン類、
トルエンなどの芳香族などから選択される。本発明に用
いるリン酸エステル系化合物の使用量は固形分に対して
0.0001〜0.2wt%、好ましくは0.001〜
0.1wt%である。本発明に用いるリン酸エステル系
化合物は一般式(1)としてThe retardation film used in the present invention has birefringence and is made of polystyrene, styrene-acrylonitrile copolymer, polycarbonate, polymethyl methacrylate, polypropylene, polyvinyl chloride, polyethylene, polyacrylate, polyether sulfone. ,
Examples thereof include polyphenylene oxide. The solvent used in the present invention includes chlorinated hydrocarbons such as methylene chloride, ketones such as acetone and methyl ethyl ketone,
It is selected from aromatic compounds such as toluene. The amount of the phosphoric acid ester compound used in the present invention is 0.0001 to 0.2 wt% based on the solid content, preferably 0.001 to
It is 0.1 wt%. The phosphoric acid ester compound used in the present invention has the general formula (1)
【0008】一般式(1)General formula (1)
【化3】 Embedded image
【0009】但し:R1 :炭素数6以上のアルキル基、
またはアルケニル基 炭素数6以上のアルキル基またはアルケニル基を有する
アリール基 R2 :炭化水素基 L1 :二価の連結基 n1:0または1 M1 :水素原子またはカチオン R3 :M2 またはR4 −(L2 )n2−R5 (R4 とR1 と同義,L2 はL1と同義,n2はn1と同
義,R5 はR2 と同義,M2 はM1 と同義) 具体的には、 R2 の炭化水素基はアルキレン基又はフェニレン基であ
り、L1 の二価の連結基は−O(C2H4O)m1− 、−
O(C3H6O)m2−(m1,m2:0〜50)、−SO
2NH−,または−CONH−であり、M1のカチオンは
アルカリ金属,アルカリ土類金属,またはアルキルアン
モニウム塩である。 好ましくは R1 :炭素数8〜36のアルキル基もしくはアルケニル
基、または 炭素数8〜36のアルキル基もしくはアルケニル基を有
するフェニル基である。 具体的には、以下の基が挙げられる。However, R 1 is an alkyl group having 6 or more carbon atoms,
Or an alkenyl group, an aryl group having an alkyl group having 6 or more carbon atoms or an alkenyl group R 2 : a hydrocarbon group L 1 : a divalent linking group n 1: 0 or 1 M 1, a hydrogen atom or a cation R 3 : M 2 or R 4 - (L 2) n2 -R 5 (R 4 and R 1 as defined, L 2 is L 1 synonymous, n2 is n1 synonymous, R 5 is R 2 as defined, M 2 is M 1 synonymous) specific Specifically, the hydrocarbon group of R 2 is an alkylene group or a phenylene group, and the divalent linking group of L 1 is —O (C 2 H 4 O) m 1 —, —
O (C 3 H 6 O) m2 - (m1, m2: 0~50), - SO
2 NH- or -CONH-, and the cation of M 1 is an alkali metal, alkaline earth metal, or alkylammonium salt. R 1 is preferably an alkyl group or alkenyl group having 8 to 36 carbon atoms, or a phenyl group having an alkyl group or alkenyl group having 8 to 36 carbon atoms. Specific examples include the following groups.
【0010】[0010]
【化4】 Embedded image
【0011】R2 :炭素数1〜10のアルキレン基また
はフェニレン基である。化合物例としては化5,化6,
化7に示すとおりである。 L1 :−O(C2H4O)m1−、−O(C3H6O)m2−
(m1,m2:1〜10)、−CONH−である。 M1 は水素原子,Na,Ka,Li,Ca,Mg,又は
HNHt(R6 )3-t 〔ここでR6 は置換または非置換
のアルキル基、t は0,1または2,具体的にはHNH
2CH2CH2OH,HNH(CH2CH2OH)2 ,HN
(CH2CH2OH)3 ,HN(C2H5)3 〕R 2 is an alkylene group having 1 to 10 carbon atoms or a phenylene group. As examples of compounds,
This is as shown in Chemical formula 7. L 1: -O (C 2 H 4 O) m1 -, - O (C 3 H 6 O) m2 -
(M1, m2: 1 to 10) and -CONH-. M 1 is a hydrogen atom, Na, Ka, Li, Ca, Mg, or HNH t (R 6 ) 3-t [wherein R 6 is a substituted or unsubstituted alkyl group, t is 0, 1 or 2, HNH
2 CH 2 CH 2 OH, HNH (CH 2 CH 2 OH) 2 , HN
(CH 2 CH 2 OH) 3 , HN (C 2 H 5 ) 3 ]
【0012】[0012]
【化5】 Embedded image
【0013】[0013]
【化6】 Embedded image
【0014】[0014]
【化7】 Embedded image
【0015】本発明における流延製膜法においては、高
分子溶液中の高分子の濃度は40重量%以下が好ましい
が、高分子の分子量によって変化する。ドープの温度は
40℃以下が好ましい。流延時の膜厚は完成膜厚によっ
て変化し、完成膜厚は50μm〜200μmが好まし
い。本発明において、支持体の裏面側より支持体を輻射
熱源によって加熱するということは、支持体の裏面全面
に対して遠赤外線加熱又は高周波加熱等を行うことで、
具体的には上記ヒータ,又は誘電加熱ヒータ等がこれに
用いられる。これは従来の表面側の熱風によるだけの乾
燥が、膜状物の裏面側が溶剤の蒸発によって冷えたまま
であるのに比して、本発明はむしろ膜表面からの溶剤の
蒸発熱を裏面から供給する面において、膜状物の温度が
裏面側が表面側より上昇する点において大きく異なり、
全体として蒸発に対する溶剤の表面側への移動が有利に
なる。In the casting film forming method of the present invention, the concentration of the polymer in the polymer solution is preferably 40% by weight or less, but it varies depending on the molecular weight of the polymer. The dope temperature is preferably 40 ° C. or lower. The film thickness at the time of casting varies depending on the completed film thickness, and the completed film thickness is preferably 50 μm to 200 μm. In the present invention, heating the support from the back surface side of the support by a radiant heat source means that far infrared heating or high frequency heating is performed on the entire back surface of the support,
Specifically, the above heater, a dielectric heater, or the like is used for this. This is compared to the conventional drying only by hot air on the front surface side, whereas the back surface side of the film-like material remains cold due to the evaporation of the solvent, but the present invention rather supplies the heat of evaporation of the solvent from the film surface from the back surface. The difference is that the temperature of the filmy substance on the surface to be heated rises more on the back side than on the front side.
Overall, the transfer of solvent to the surface side for evaporation is favored.
【0016】本発明において、膜状物の残留溶剤が35
重量%以下に至る迄は、該支持体の表面側膜状物は乾燥
風を用いず、上記同様輻射熱源によってのみ加熱し乾燥
させるということは、残留溶剤が35重量%以上の場合
においては、従来の乾燥ムラの原因は膜面上の乾燥風の
対流の部分的差によって膜面のムラを起こすので、即
ち、熱風による対流乾燥は、膜面表面において乾燥風の
流れによる境膜の部分的乾燥速度の違いにより部分的ム
ラを発生させるのに対し、本発明においては膜自身の温
度上昇によるのみの蒸発による乾燥で、全面において緩
徐で均一な乾燥が出来る大いなる差を生じる。従って、
本発明の方法は専ら輻射熱による膜状物の加熱による全
表面における自然蒸発のみをおこさせることに特徴があ
る。従って輻射熱源は前記膜状物の面に均一に照射され
るように設備することが大切であり、且、膜状物が発泡
しないように上限の温度を押えることが必要である。In the present invention, the residual solvent of the film is 35
Until the amount of the solvent is 35% by weight or less, the film on the surface side of the support is heated by only a radiant heat source and dried without using the drying air in the case where the residual solvent is 35% by weight or more. Conventional drying unevenness causes unevenness of the film surface due to partial difference in convection of dry air on the film surface, that is, convective drying by hot air causes partial drying of the boundary film by the flow of dry air on the film surface. While partial unevenness occurs due to the difference in the drying speed, in the present invention, the drying by evaporation only due to the temperature rise of the film itself causes a great difference in that the entire surface can be slowly and uniformly dried. Therefore,
The method of the present invention is characterized by causing only natural evaporation on the entire surface by heating the film-like material by radiant heat. Therefore, it is important to provide a radiant heat source so as to uniformly irradiate the surface of the film, and it is necessary to control the upper limit temperature so that the film does not foam.
【0017】本発明において、膜状物の残留溶剤が35
重量%以下になったら乾燥ムラの心配もなくなるので、
従来の様に熱風を用いて強制的に乾燥させてもよいが、
残留溶剤が35重量%以上の時は表面側膜状物を熱風乾
燥を行なわず溶剤濃度の濃い、(乾燥空気を使用してい
ないので)雰囲気の中で表裏両面より輻射加熱し、した
がってバンド上においては全面均一に緩徐な乾燥を行
い、35重量%以下の残留溶剤にして、バンドから剥取
った後、本格的な乾燥は後乾燥の装置で乾燥させる方法
を行うことも出来る。そうすることによって生産スピー
ドを更に上昇させることも期待出来る。更に本発明のエ
ンドレスの金属板の支持体としては、支持体がバンドの
場合とドラムの場合があるが、本発明はむしろ経路を長
く有するバンドを支持体として流延装置に用いるのが効
果的である。In the present invention, the residual solvent of the film is 35
When it is less than weight%, there is no worry of uneven drying, so
Although it may be forced to dry with hot air as in the past,
When the residual solvent is 35% by weight or more, the film on the surface side is not dried by hot air, and the solvent concentration is high. Radiant heating is performed from both the front and back sides in the atmosphere (because dry air is not used). In the above method, a method of uniformly drying the whole surface to make a residual solvent of 35% by weight or less, peeling it from the band, and then performing full-scale drying may be performed by a post-drying device. By doing so, it can be expected that the production speed will be further increased. Further, as the support for the endless metal plate of the present invention, the support may be a band or a drum, but the present invention is rather effective when a band having a long path is used as a support in a casting apparatus. Is.
【0018】本発明の効果を更に明確に説明するため
に、図を用いて説明する。図1は本発明の流延製膜方法
の1実施例のバンド式流延装置の側面断面図である。図
1において、有機溶媒に溶解された高分子溶液がダイ1
に補給せられダイ1よりエンドレスの金属板のバンド状
支持体2の上に流延され、膜状物となった後、該支持体
の進行と共に流延装置の上部バンド部分を進行する。流
延部のダイ1の真下に存在する前部ドラム4は通常冷水
7を通し、前部ドラム部表面を冷却し、併せて前部ドラ
ム表面上を走行するエンドレスのバンドを冷却し、ダイ
1より流延される高分子溶液の膜状物のセットを良化す
るようになっている。流延された膜状物は流延装置の上
バンド部でバンド裏面よりの蒸気ヒータや誘電加熱ヒー
タ3よりの輻射熱を受け、バンドの温度を上昇させ、そ
れによって膜状物も加熱されて温度を上昇させる。又こ
の部分は表面も蒸気ヒータまたは誘電加熱ヒータ3によ
り輻射熱を膜状物に与えられ乾燥風がないのでその熱に
よって膜面全体が自然蒸発的に均一に乾燥が進む、この
部分の雰囲気は溶媒の蒸発によってその蒸気圧が高まる
ので、適当な雰囲気の交換が必要であるが、この雰囲気
の交換は、膜状物の乾燥速度に強いかつ局部的な影響を
与えることがない様に交換されなければならない。In order to more clearly explain the effects of the present invention, description will be made with reference to the drawings. FIG. 1 is a side sectional view of a band type casting apparatus of one embodiment of the casting film forming method of the present invention. In FIG. 1, the polymer solution dissolved in the organic solvent is the dye 1
The film is cast on the band-shaped support 2 made of an endless metal plate from the die 1 to form a film, and then the upper band portion of the casting device is advanced as the support is advanced. The front drum 4 located right below the die 1 at the casting portion is usually passed with cold water 7 to cool the surface of the front drum portion, and also to cool the endless band running on the front drum surface. It is designed to improve the set of the polymer-like film material that is more cast. The cast film material receives the radiant heat from the backside of the band from the steam heater or the dielectric heater 3 in the upper band portion of the casting apparatus, and raises the temperature of the band, whereby the film material is also heated and heated. To rise. Radiation heat is applied to the film material by a steam heater or dielectric heater 3 on this surface as well, and there is no drying air, so that the entire surface of the film is dried naturally and uniformly by the heat. The vapor pressure increases due to the vaporization of the air, so it is necessary to exchange a suitable atmosphere, but this atmosphere exchange must be exchanged so as not to have a strong and localized effect on the drying speed of the film. I have to.
【0019】図1は、バンド式流延製膜装置において、
全工程を輻射加熱による均一にして緩徐な乾燥を行い、
流延製膜装置の終りで剥取ってフィルム6にした後、後
乾燥装置(図示せず)で充分な乾燥が行われる時の流延
製膜装置の状態を示している。極めて平面性が要求され
るフィルムに関しては、上記のように流延後暫くの間無
風状態を保つことで、レベリングの効果が促進され平面
性を向上させることができる。支持体上で乾燥が進み、
膜状物の流動が完全に止る時、即ち残留溶剤が35重量
%以下になった時に乾燥風を当ててもよいが、その乾燥
風は流延口には影響を与えないような工夫をする必要が
ある。本発明は又図2において、流延部より支持体の約
2/3迄の範囲で膜状物の残留溶剤が35重量%以下に
なる様に乾燥させて2/3以後の領域では、乾燥を促進
する意味において、図2のように下バンド部の乾燥風1
0として熱風によって乾燥させる方法も採用できる。FIG. 1 shows a band type casting film forming apparatus.
All processes are made uniform by radiant heating and slowly dried,
7 shows a state of the casting film forming apparatus when the film 6 is peeled off at the end of the casting film forming apparatus and then sufficiently dried by a post-drying device (not shown). For a film that requires extremely flatness, by maintaining a calm state for a while after casting as described above, the leveling effect can be promoted and the flatness can be improved. Drying progresses on the support,
Dry air may be applied when the flow of the film-like material completely stops, that is, when the residual solvent becomes 35% by weight or less, but the dry air should be designed so as not to affect the casting port. There is a need. According to the present invention, in FIG. 2, the solvent is dried so that the residual solvent of the film-like substance is 35% by weight or less in the range from the casting portion to about 2/3 of the support, and the drying is performed in the area after 2/3. In the sense of promoting the
A method of drying with hot air as 0 can also be adopted.
【0020】[0020]
【0021】本発明を実施例をあげてその効果を示す。
但し、本発明は本実施例のみに拘束されるものではな
い。(実施例−1) スチレン/アクリロニトリル共重
合体(比率66/34,平均分子量20万、スタイラッ
クAS−703,旭化成)をメチレンクロライドに溶解
した25重量%の高分子溶液(ドープ)に、リン酸エス
テル系界面活性剤として化5の1に示すものを固形分に
対して0.01重量%添加し、完全均一な溶液にした。
溶液を濾過し、キャスティングダイより液膜厚400μ
mで支持体上に流延し、発泡しない温度で12分乾燥さ
せ、支持体より剥ぎ取った。剥ぎ取り時の残留揮発分を
21重量%以下にした時、支持体より剥ぎ取る時の抵抗
がなく、段ムラのない良好な膜となった。この膜を後乾
燥で十分乾燥させ、105℃の雰囲気で2.5倍延伸し
たところ、得られたフィルムのレターデーション値(R
e値)は300nmを示し、位相差膜としての機能を現
わした。(実施例−2) 実施例−1において界面活性
剤として化5の化合物7および16を同条件で添加した
ところ剥離は非常に軽くなり、良好な膜となった。The effects of the present invention will be shown with examples.
However, the present invention is not limited only to the present embodiment. (Example-1) A styrene / acrylonitrile copolymer (ratio 66/34, average molecular weight 200,000, Stylac AS-703, Asahi Kasei) was dissolved in methylene chloride to prepare a 25 wt% polymer solution (dope), and phosphorus was added. As the acid ester-based surfactant, the one shown in Chemical formula 1 was added in an amount of 0.01% by weight based on the solid content to form a completely homogeneous solution.
The solution is filtered and the film thickness is 400μ from the casting die.
m, cast on a support, dried for 12 minutes at a temperature at which foaming did not occur, and peeled from the support. When the residual volatile content during stripping was 21% by weight or less, there was no resistance when stripped from the support, and a good film without step unevenness was obtained. When this film was sufficiently dried by post-drying and stretched 2.5 times in an atmosphere of 105 ° C., the retardation value (R
The e value) was 300 nm and exhibited the function as a retardation film. (Example-2) When compounds 7 and 16 of Chemical formula 5 were added as surfactants in Example-1 under the same conditions, peeling became very light and a good film was formed.
【0022】(比較例−1) 実施例−1において界面
活性剤を全く用いなかった場合は、残留揮発分が21重
量%で剥ぎ取り時に段ムラを生じた。揮発分を高くする
と、膜が伸びたり、剥ぎ残り現象を生じ、低くすると、
剥離荷重が大きくなり、剥ぎ取れなかった。(Comparative Example-1) When no surfactant was used in Example-1, the residual volatile content was 21% by weight, and unevenness occurred during stripping. When the volatile content is high, the film stretches and the phenomenon of stripping remains, and when it is low,
The peeling load increased and could not be peeled off.
【0023】(実施例−3) 実施例−1において、図
1に示すように、支持体の表面に輻射熱源として蒸気を
用いたフィン状の間接加熱ヒーターを入れ、乾燥風を止
めて流延し、残留溶剤35重量%で剥取った後、後乾燥
装置によって乾燥したものは、風ムラもスジ又段ムラも
ない、且つ極めて光学的に面状の良い製品が得られた。
又、スピードアップも可能となった。(Example-3) In Example-1, as shown in FIG. 1, a fin-shaped indirect heating heater using steam as a radiant heat source was placed on the surface of the support, the drying air was stopped, and the casting was performed. Then, after peeling off with a residual solvent of 35% by weight and drying with a post-drying device, a product having no wind unevenness, streaks or step unevenness and having an extremely optically excellent surface condition was obtained.
Also, it has become possible to speed up.
【0024】[0024]
【発明の効果】本発明の位相差膜製造方法により、膜の
剥離荷重を小さくし、剥離時の段ムラやスジの発生のな
い光学的品質の優れた均一なフィルムが得られた。しか
も流延後剥離までの時間を短かくすることができるの
で、高速度で生産することが可能となった。According to the method for producing a retardation film of the present invention, the peeling load of the film is reduced, and a uniform film having excellent optical quality, which is free from unevenness and streaks during peeling, can be obtained. In addition, since the time from casting to peeling can be shortened, high-speed production becomes possible.
【図1】本発明に用いると有効な流延製膜方法の1実施
例のバンド式流延製膜装置の側面断面図。FIG. 1 is a side sectional view of a band-type casting film forming apparatus according to an embodiment of a casting film forming method which is effective when used in the present invention.
【図2】本発明に用いると有効な流延製膜方法の他の実
施例の装置の側面断面図。FIG. 2 is a side sectional view of an apparatus of another embodiment of the casting film forming method which is effective when used in the present invention.
【図3】従来の流延製造方法の一例の装置の側面断面
図。FIG. 3 is a side sectional view of an apparatus as an example of a conventional casting manufacturing method.
1 ダイ 2 支持体 3 加熱ヒータ 4 前部ドラム 5 後部ドラム 6 フィルム 7 冷水管 8 温水管 9 上バンド部の乾燥風 10 下バンド部の乾燥風 1 Die 2 Support 3 Heater 4 Front Drum 5 Rear Drum 6 Film 7 Cold Water Pipe 8 Hot Water Pipe 9 Dry Air for Upper Band 10 Dry Air for Lower Band
Claims (2)
その後延伸して位相差膜を製造する方法において、高分
子溶液に一般式(1)に示すリン酸エステル系界面活性
剤を添加して流延することを特徴とする位相差膜製造方
法。一般式(1) 【化1】 但し:R1 :炭素数6以上のアルキル基、またはアルケ
ニル基 炭素数6以上のアルキル基またはアルケニル基を有する
アリール基 R2 :炭化水素基 L1 :二価の連結基 n1:0または1 M1 :水素原子またはカチオン R3 :M2 またはR4 −(L2 )n2−R5 (R4 とR1 と同義,L2 はL1と同義,n2はn1と同
義,R5 はR2 と同義,M2 はM1 と同義)1. A polymer solution is cast on a support to form a film,
In the method for producing a retardation film by stretching thereafter, a method for producing a retardation film, which comprises adding the phosphoric acid ester surfactant represented by the general formula (1) to a polymer solution and casting. General formula (1) However, R 1 : an alkyl group having 6 or more carbon atoms, or an alkenyl group, an aryl group having an alkyl group or an alkenyl group having 6 or more carbon atoms R 2 : a hydrocarbon group L 1 : a divalent linking group n 1: 0 or 1 M 1: a hydrogen atom or a cation R 3: M 2 or R 4 - (L 2) n2 -R 5 (R 4 and R 1 as defined, L 2 is L 1 synonymous, n2 is n1 synonymous, R 5 is R (Synonymous with 2 , M 2 is synonymous with M 1 )
された前記高分子溶液を走行するエンドレスの金属板の
支持体上に流延し、膜状物とした後、乾燥を行い、該支
持体上より剥ぎ取り、更に後乾燥を行うプラスチックフ
ィルムの流延製膜方法であって、前記支持体の裏面側よ
り支持体を輻射熱源によって加熱し、かつ膜状物の残留
溶剤が35重量%以下に至る迄の範囲は該支持体上の表
面側膜状物は乾燥風を用いず輻射熱源によってのみ加熱
し乾燥させることを特徴とする請求項1記載の位相差膜
製造方法。2. The solution casting film forming method comprises casting the polymer solution dissolved in an organic solvent on a support of an endless metal plate running to form a film, and then drying. A method for casting a plastic film by stripping from the support and further drying the support, wherein the support is heated from the back side of the support by a radiant heat source and the residual solvent of the film is 35 2. The method for producing a retardation film according to claim 1, wherein the surface side film-like material on the support is heated and dried only by a radiant heat source without using drying air in a range up to a weight% of less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3115584A JP2670916B2 (en) | 1991-04-19 | 1991-04-19 | Retardation film manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3115584A JP2670916B2 (en) | 1991-04-19 | 1991-04-19 | Retardation film manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04320203A JPH04320203A (en) | 1992-11-11 |
JP2670916B2 true JP2670916B2 (en) | 1997-10-29 |
Family
ID=14666211
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3115584A Expired - Lifetime JP2670916B2 (en) | 1991-04-19 | 1991-04-19 | Retardation film manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2670916B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2952449B2 (en) * | 1992-06-03 | 1999-09-27 | 日石三菱株式会社 | Manufacturing method of compensator for liquid crystal display element |
JP7196535B2 (en) * | 2018-10-30 | 2022-12-27 | 三菱ケミカル株式会社 | POLYVINYL ALCOHOL-BASED FILM FOR MANUFACTURING POLARIZING FILM, AND POLARIZING MEMBRANE AND POLARIZING PLATE USING THE SAME |
-
1991
- 1991-04-19 JP JP3115584A patent/JP2670916B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH04320203A (en) | 1992-11-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4087569A (en) | Prebaking treatment for resist mask composition and mask making process using same | |
US5395556A (en) | Tricyanovinyl substitution process for NLO polymers | |
Zuber et al. | Improved PEDOT conductivity via suppression of crystallite formation in Fe (III) tosylate during vapor phase polymerization | |
JP2962473B2 (en) | Photoalignable polymer and photoalignable composition containing the same | |
JP2670916B2 (en) | Retardation film manufacturing method | |
EP2270560A2 (en) | Optical device | |
JPH1158425A (en) | Method and apparatus for making cast film | |
WO2017137142A1 (en) | A polymer, composition, forming sacrificial layer and method for semiconductor device therewith | |
TW201113930A (en) | Methods of forming patterns on substrates | |
TW200843587A (en) | Methods of forming printed circuit boards having optical functionality | |
JP5108851B2 (en) | Sulfonated polyether ether ketone ketone, film using the same, and method for producing the same | |
CN107003577A (en) | The driving liquid crystal of transverse electric field represents that element is manufactured with composition with liquid crystal orientation film, used the liquid crystal orientation film and its manufacture method of said composition and the liquid crystal with liquid crystal orientation film to represent element and its manufacture method | |
JPH1177822A (en) | Production of thermoplastic resin film | |
JPS6346112B2 (en) | ||
JP2003286336A (en) | Method for producing transparent electrically conductive layer, thus produced layer and its use | |
US4816383A (en) | Method for forming fine patterns of conjugated polymers | |
Paniez et al. | Origin of delay times in chemically amplified positive DUV resists | |
US5080931A (en) | Doped polymer films for waveguides | |
CN1194857C (en) | Method for solution preparing of film | |
JPH0798410A (en) | Production of phase-difference film | |
JPS63191822A (en) | Production of electroconductive film | |
JP2988636B2 (en) | Polyarylate film having optical isotropy and method for producing the same | |
KR100261653B1 (en) | A polymer orientation film including photoreaction promoter | |
JP2002067520A (en) | Drying device | |
Wang et al. | Molecular Structure Modulated Organization and Properties of Azobenzene‐Substituted Polydiacetylene Assemblies Films: Photopolymerization, Morphology, and Thermal Stability |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080711 Year of fee payment: 11 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080711 Year of fee payment: 11 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090711 Year of fee payment: 12 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090711 Year of fee payment: 12 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100711 Year of fee payment: 13 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110711 Year of fee payment: 14 |
|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110711 Year of fee payment: 14 |