JP2657721B2 - Polishing device having force control device - Google Patents
Polishing device having force control deviceInfo
- Publication number
- JP2657721B2 JP2657721B2 JP3209834A JP20983491A JP2657721B2 JP 2657721 B2 JP2657721 B2 JP 2657721B2 JP 3209834 A JP3209834 A JP 3209834A JP 20983491 A JP20983491 A JP 20983491A JP 2657721 B2 JP2657721 B2 JP 2657721B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- pressing force
- rotation angle
- force
- holding member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は工作物を研磨または研削
する研磨装置に関する。さらに詳しくは、研磨領域およ
びその近傍においてはグラインダなどの研磨部材が力制
御により制御される研磨装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing apparatus for polishing or grinding a workpiece. More specifically, the polishing area and
The present invention relates to a polishing apparatus in which a polishing member such as a grinder is controlled by force control in a vicinity thereof .
【0002】[0002]
【従来の技術】ジェットエンジンのブレードなどの翼面
研磨のように複雑な曲面形状に沿った研磨または研削
(以下、単に研磨という)では、高精度の仕上がり性能
が要求される。このような研磨を行うための研磨装置と
して、研磨用工具に工具の支持部材をバネなどの弾性部
材を用いて押し付け、このバネの押し付け力により工作
物を押し付けながら研磨を行う装置が知られている(図
7参照)。図7において、101はサーボモータ、10
2は研磨装置本体、103は押付部材、104はバネ、
105はグラインダ支持部材、106はグラインダ、1
07はポテンショメータ、108は工作物を示す。2. Description of the Related Art Polishing or grinding along a complicated curved surface shape (hereinafter simply referred to as "polishing") such as polishing of a wing surface of a jet engine blade or the like requires high-precision finishing performance. As a polishing apparatus for performing such polishing, there is known an apparatus that presses a support member of a tool against a polishing tool using an elastic member such as a spring, and performs polishing while pressing a workpiece by a pressing force of the spring. (See FIG. 7). 7, reference numeral 101 denotes a servo motor, 10
2 is a polishing apparatus main body, 103 is a pressing member, 104 is a spring,
105 is a grinder support member, 106 is a grinder, 1
07 is a potentiometer, 108 is a workpiece.
【0003】 しかしながら、前記従来の研磨装置で
は、研磨用工具の工作物に対する押し付け圧力(押圧
力)を一定とするような制御を行うのみで、バネと工具
とからなる系の動特性は考慮されていなかった。従っ
て、研磨時にバネが振動を行う場合の振動そのものを制
御することはできなかった。すなわち、バネの振動に伴
う研磨ムラが発生することがあり、これが原因となって
研磨品質の低下が起こるという問題があった。However, in the conventional polishing apparatus, only the control for keeping the pressing pressure (pressing force) of the polishing tool against the workpiece is performed, and the dynamic characteristics of the system including the spring and the tool are taken into consideration. I didn't. Therefore, it was not possible to control the vibration itself when the spring vibrates during polishing. In other words, there is a problem that polishing unevenness may occur due to the vibration of the spring, and this causes a reduction in polishing quality.
【0004】 本出願人はかかる従来技術の問題点に鑑
み、先に工作物を研磨する工具に、サーボモータと連動
した押し付け部材により弾性部材を介して前記工具の支
持部材を押し付け、前記工作物を研磨する研磨装置にお
いて、前記支持部材の動作角を検出する手段と前記工具
に対する前記支持部材の押し付け圧を検出する手段と前
記動作角の1階〜3階乗時間微分係数を演算する第1の
演算手段と、前記押し付け圧の1階〜2階乗時間微分係
数を演算する第2の演算手段と、前記第1および第2の
演算手段からの出力を用いて前記サーボモータの制御信
号を演算するサーボモータ指令値演算手段とを設けるこ
とによりバネの振動に伴う研磨ムラを防止できる研磨装
置を提案している(特願平2ー219452号)(図6
参照)。図6において、61はサーボモータ、62は研
磨装置本体、63は押付部材、64はバネ、65はグラ
インダ支持部材、66はグラインダ、67はφa検出用
ポテンショメータ、68は工作物、69は力センサ、7
0はφm検出用ポテンショメータを示す。[0004] In view of the problems of the related art, the present applicant presses a support member of the tool through a resilient member by a pressing member interlocked with a servomotor against a tool for polishing the workpiece first. A means for detecting an operation angle of the support member, a means for detecting a pressing pressure of the support member against the tool, and a first to third-order time differential coefficient of the operation angle. Calculating means for calculating the first- and second-order time differential coefficients of the pressing pressure, and using the outputs from the first and second calculating means to control the servomotor control signal. By providing a servo motor command value calculating means for calculating, a polishing apparatus capable of preventing polishing unevenness due to spring vibration has been proposed (Japanese Patent Application No. 2-219452) (FIG. 6).
reference). In FIG. 6, 61 is a servo motor, 62 is a polishing apparatus main body, 63 is a pressing member, 64 is a spring, 65 is a grinder support member, 66 is a grinder, 67 is a potentiometer for detecting φa, 68 is a workpiece, and 69 is a force sensor. , 7
0 indicates a potentiometer for detecting φm.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、このバ
ネの振動に伴う研磨ムラを防止できる研磨装置を用いて
も、研磨開始位置近傍や研磨終了位置近傍に過剰研磨が
発生することがわかった。本発明者らはかかる問題につ
き鋭意研究したところ、研磨開始位置近傍においては所
定の研磨力(押圧力)よりも低い研磨力(押圧力)で研
磨装置を制御し、研磨開始位置近傍経過後一定の時定数
で研磨力(押圧力)を所定の研磨力(押圧力)にまで上
昇させ、しかるのち研磨終了位置近傍まで所定の研磨力
(押圧力)を維持し、研磨終了位置近傍経過後また一定
の時定数で研磨力(押圧力)を初期の研磨力まで低下さ
せることにより、工作物の研磨開始位置および研磨終了
位置近傍に発生する過剰研磨を防止できることを見出し
本発明を完成するに至った。However, it has been found that excessive polishing occurs near the polishing start position and the polishing end position even when a polishing apparatus capable of preventing the polishing unevenness due to the vibration of the spring is used. The present inventors have conducted intensive studies on such a problem, and found that the polishing apparatus is controlled with a polishing force (pressing force) lower than a predetermined polishing force (pressing force) in the vicinity of the polishing start position, and is kept constant after the lapse of the vicinity of the polishing start position. The polishing force (pressing force) is increased to a predetermined polishing force (pressing force) with the time constant of, and then the predetermined polishing force is reached near the polishing end position.
(Pressing force) is maintained, the polishing force (pressing force) is reduced to the initial polishing force after a lapse of the vicinity of the polishing end position and with a constant time constant, so that it is generated near the polishing start position and the polishing end position of the workpiece. It has been found that excessive polishing can be prevented, and the present invention has been completed.
【0006】 すなわち、本発明は研磨開始位置近傍お
よび研磨終了位置近傍において研磨力(押圧力)を切り
替えることのできる研磨装置を提供することを目的とす
る。[0006] That is, the present invention is your vicinity polishing start position
Polishing force in the preliminary polishing end position near to provide a polishing apparatus capable of switching (pressing force) of interest.
【0007】 なお、本明細書では、この研磨開始位置
近傍から研磨終了位置近傍までを研磨領域と定義する。In this specification, a region from the vicinity of the polishing start position to the vicinity of the polishing end position is defined as a polishing region.
【0008】[0008]
【課題を解決するための手段】本発明の研磨装置は、研
磨部材および該研磨部材に作用する重力を相殺する重力
バランス用錘を有する第1保持部材と、該第1保持部材
の前記研磨部材および重力バランス用錘との間に横方向
に突出させて設けられた一対の軸部材と、前記一対の軸
部材の各先端部と回転可能に係合されている第2保持部
材と、前記第2保持部材の前記重力バランス用錘側に向
けて突出させられている突出部と前記第1保持部材との
間に装着されたバネ部材およびダンパと、前記第2保持
部材を回動させる回動手段と、前記第1保持部材の回転
角を検出する第1回転角検出手段と、前記第2保持部材
の回転角を検出する第2回転角検出手段とを備える研磨
部材保持手段と、前記第1回転角検出手段による検出値
と前記第2回転角検出手段による検出値との差に基づい
て前記回動手段の回転角を制御して研磨部材の押圧 力を
制御する力制御手段、および前記第2回転角検出手段に
よる検出値に基づいて前記回動手段の回転角を制御して
研磨部材の位置を制御する研磨位置制御手段を有する研
磨部制御手段とを備え、研磨領域およびその近傍におい
ては、前記力制御手段による力制御、例えば研磨開始位
置近傍までは所定の押圧力よりも小さな押圧力で研磨が
なされるとともに、研磨開始位置近傍において前記押圧
力から所定の押圧力に切り替えがなされる制御がなされ
たり、あるいは研磨終了位置近傍までは所定の押圧力で
研磨がなされるとともに、研磨終了位置近傍において前
記所定の押圧力から前記押圧力よりも小さな押圧力に切
り替えがなさる制御がなされたりし、そして研磨領域お
よびその近傍以外においては、前記研磨位置制御手段に
よる研磨位置制御がなされることを特徴とする。Means for Solving the Problems] polishing apparatus of the present invention, Ken
Polishing member and gravity counteracting gravity acting on the polishing member
A first holding member having a balance weight, and the first holding member
Between the polishing member and the gravity balance weight
A pair of shaft members provided so as to protrude therefrom, and the pair of shafts
Second holding portion rotatably engaged with each tip of the member
Material and the second holding member toward the gravity balance weight.
Between the first holding member and the projecting portion
A spring member and a damper mounted between the second holding member
Rotating means for rotating a member, and rotation of the first holding member
First rotation angle detection means for detecting an angle, and the second holding member
Polishing with second rotation angle detecting means for detecting the rotation angle of the surface
Member holding means and a value detected by the first rotation angle detecting means
And the difference between the detected value and the value detected by the second rotation angle detecting means.
Controlling the rotation angle of the rotating means to reduce the pressing force of the polishing member.
Controlling the force control means and the second rotation angle detecting means.
Controlling the rotation angle of the rotation means based on the detected value
Polishing machine having polishing position control means for controlling the position of the polishing member
Polishing unit control means, the polishing area and its vicinity
The force control by the force control means, for example, the polishing start position
Polishing with a pressing force smaller than the specified pressing force
And the pressing is performed in the vicinity of the polishing start position.
Control is performed to switch from the force to the specified pressing force.
Or a predetermined pressing force until near the polishing end position.
As the polishing is performed, the
Switch from the specified pressing force to a pressing force smaller than the aforementioned pressing force.
Control is performed, and the polishing area and
And other than its vicinity, the polishing position control means
The polishing position is controlled by the polishing .
【0009】 [0009]
【実施例】以下、添付図面を参照しながら本発明の研磨
装置を実施例に基づいて詳細に説明するが、本発明はか
かる実施例にのみ限定されるものではない。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a polishing apparatus according to the present invention will be described in detail with reference to the accompanying drawings based on embodiments, but the present invention is not limited to these embodiments.
【0010】 図1は本発明の研磨装置のブロック図、
図2は本発明の一実施例の電気的構成を示す概略図、図
3は本発明の研磨部制御手段(装置)の回路構成の一実
施例を示すブロック図、図4は研磨部材保持装置の概略
図、図5は研磨力と位置との関係を示すグラフ、図6は
本出願人の先の出願にかかわるバネの振動に伴う研磨ム
ラを防止できる研磨装置の概略図、図7は従来の研磨装
置の概略図である。図1において、1は研磨部材保持手
段(装置)、2は力制御手段2aおよび研磨位置制御手
段2bを備える研磨部制御手段(装置)、3は移送手段
(装置)、4は移送位置制御手段(装置)を示す。ここ
で、研磨位置制御と移送位置制御との関係について敷衍
すると、移送位置制御とはグラインダなどの研磨部材を
工作物の接線方向に移動させる制御をいい、研磨位置制
御とはグラインダなどの研磨部材を工作物の法線方向に
移動させる制御をいう。 FIG. 1 is a block diagram of a polishing apparatus of the present invention,
FIG. 2 is a schematic diagram showing an electrical configuration of an embodiment of the present invention, FIG. 3 is a block diagram showing an embodiment of a circuit configuration of a polishing section control means (apparatus) of the present invention, and FIG. 5, FIG. 5 is a graph showing a relationship between a polishing force and a position, FIG. 6 is a schematic diagram of a polishing apparatus capable of preventing uneven polishing caused by vibration of a spring according to the earlier application of the present applicant, and FIG. It is a schematic diagram of a polishing device. In FIG. 1, 1 is a polishing member holding means (apparatus), 2 is a force control means 2a and a polishing position control means.
Polishing unit control means (apparatus) including the step 2b , 3 denotes transfer means (apparatus), 4 denotes transfer position control means (apparatus). here
Then, the relationship between polishing position control and transfer position control is extended.
Then, the transfer position control means that a polishing member such as a grinder is
A control that moves the workpiece in the tangential direction.
A grinder or other abrasive member is moved in the direction normal to the workpiece.
This refers to control for moving.
【0011】 研磨部材保持手段である研磨部材保持装
置1は、図4にその概略構成を示すように、中央に突出
部11aを有するコの字型枠部材(第2保持部材)11
と、一端にコの字型枠部材12aを有し他端に重力バラ
ンス用錘Wを有する板状部材(第1保持部材)12とか
らなる。この重力バランス用錘Wは、押圧力の重力によ
る影響を打ち消し、押圧力をバネ部材だけによるものと
するものである。板状部材12はコの字型枠部材11の
突出部11aに略平行にかつ板状部材12のコの字型枠
部材12aを有する端部がコの字型枠部材11の突出部
11aの反対方向に突出するように配設されている。板
状部材12のコの字型枠部材12aの先端は研磨部材1
3を保持している。板状部材12とコの字型枠部材11
の突出部11aの間には、研磨部材13に押圧力を付与
するバネ部材14とこのバネ部材14による振動を減衰
させるためのダンパ15が介装されている。コの字型枠
部材11の端部内側には、板状部材12の両側面から延
伸されている軸部材12b,12bが回転自在に保持さ
れている。この軸部材12b,12bの一方には歯車部
材12cが介装されている。この歯車部材12cが介装
されている位置には、この歯車部材12cと歯合する歯
車部材16aを軸端部に有するポテンショメータ16が
配設されている。このポテンショメータ16は、板状部
材12の回転角を検出するためのものである。他方、コ
の字型枠部材11の端部外側には、前記板状部材12の
軸部材12bと同軸心状に歯車部材11b,11bが配
設されている。この歯車部材11b,11bの一方に
は、この歯車部材11bと歯合する歯車部材17aを軸
端部に有するモータ17が配設されている。また、この
歯車部材11b,11bの他方には、この歯車部材11
bと歯合する歯車部材18aを軸端部に有するポテンシ
ョメータ18が配設されている。このモータ17は、コ
の字型枠部材11と板状部材12とのなす角を変えるこ
とによりバネ部材14により得られる押圧力を変更する
ためのものである。ポテンショメータ18は、コの字型
枠部材11の回転角を検出するためのものである。この
ポテンショメータ16、18の回転角度差を所定値に維
持することにより所定の押圧力が得られる。As shown in FIG. 4, a polishing member holding device 1 serving as a polishing member holding means has a U-shaped frame member (second holding member) 11 having a projecting portion 11a at the center.
And a plate-shaped member (first holding member) 12 having a U-shaped frame member 12a at one end and a weight W for gravity balance at the other end. The weight W for gravity balance cancels the influence of the pressing force due to gravity, and makes the pressing force only by the spring member. The plate-shaped member 12 is substantially parallel to the projection 11a of the U-shaped frame member 11, and the end of the plate-shaped member 12 having the U-shaped frame member 12a is the projection of the U-shaped frame member 11.
11a is provided so as to protrude in the opposite direction. The tip of the U-shaped frame member 12a of the plate member 12 is the polishing member 1
3 is held. Plate member 12 and U-shaped frame member 11
A spring member 14 for applying a pressing force to the polishing member 13 and a damper 15 for attenuating vibration by the spring member 14 are interposed between the protrusions 11a . Inside the end of the U-shaped frame member 11, shaft members 12b, 12b extending from both side surfaces of the plate member 12 are rotatably held. A gear member 12c is interposed on one of the shaft members 12b . At a position where the gear member 12c is interposed, a potentiometer 16 having a gear member 16a at the shaft end which meshes with the gear member 12c is provided. This potentiometer 16 is for detecting the rotation angle of the plate-shaped member 12. On the other hand, on the outside of the end of the U-shaped frame member 11, gear members 11b, 11b are arranged coaxially with the shaft member 12b of the plate-shaped member 12. One of the gear members 11b, 11b is provided with a motor 17 having a gear member 17a at the shaft end which meshes with the gear member 11b . Further, the other of the gear member 11b, 11b, the gear member 11
A potentiometer 18 having a gear member 18a at the shaft end which meshes with the gear b is provided. The motor 17 is for changing the pressing pressure force obtained by the spring member 14 by changing the angle between the shaped frame member 11 and the plate-like member 12 co. The potentiometer 18 is for detecting the rotation angle of the U-shaped frame member 11. Given the pressing force is obtained by maintaining the rotation angle difference of the potentiometer 16, 18 to a predetermined value.
【0012】 研磨部制御手段である研磨部制御装置2
は、演算処理装置21と制御信号出力装置22と回転角
変更装置23とからなり、この演算処理装置21に力制
御用プログラムを実行させることにより力制御手段2a
が実現される一方、研磨位置制御プログラムを実行させ
ることにより研磨位置制御手段2bが実現される。 A polishing section control device 2 as a polishing section control means
The arithmetic processing unit Ri Do from 21 and the control signal output device 22 and the rotation angle changer 23, Chikarasei of the calculation processing unit 21
The force control means 2a is executed by executing the control program.
Is realized, and the polishing position control program is executed.
This realizes the polishing position control means 2b.
【0013】 演算処理装置21は、入力インターフェ
ースと演算処理素子(CPU2)と記憶素子(ROM
2、RAM2)と出力インターフェースとからなる。R
OM2には、前述した力制御手段2aを実現するための
プログラム、すなわちモータ17の駆動を制御するため
のプログラムやポテンショメータ16、18の回転角度
差とバネ部材14の押付力との関係示すデータや初期押
圧力、所定押圧力など研磨部材保持装置1を所定の押圧
力に制御するために必要なプログラムやデータなどがあ
らかじめ入力されるとともに、研磨位置制御手段2bを
実現するためのプログラムも入力されている。RAM2
には、ポテンショメータ16、18の回転角、移送装置
3の位置、研磨部材保持装置1の位置など研磨部材保持
装置1を所定の押圧力に維持するために必要なデータが
入力される。演算処理装置21のその余の構成は、従来
よりマイコン制御に用いられているものと同様であるの
で、その詳細な説明は省略する。The arithmetic processing unit 21 includes an input interface, an arithmetic processing element (CPU 2), and a storage element (ROM
2, RAM 2) and an output interface. R
OM2 is provided for realizing the aforementioned force control means 2a.
A program, that is, a program for controlling the driving of the motor 17, data indicating the relationship between the rotation angle difference between the potentiometers 16 and 18 and the pressing force of the spring member 14, the initial pressing force, the predetermined pressing force, and the like. is input programs and data necessary for controlling the pressing force of the advance Rutotomoni, a polishing position control means 2b
A program for realizing it is also input . RAM2
The rotation angle of the potentiometer 16, the position of the transfer device 3, data required abrasive member hold device 1 such as to maintain a predetermined pressure positions of the polishing member hold device 1 is inputted. The remaining configuration of the arithmetic processing unit 21 is the same as that conventionally used for microcomputer control, and a detailed description thereof will be omitted.
【0014】 制御信号出力装置22は、同軸ケーブル
221や増幅器222を介装した同軸ケーブル221な
どから、制御対象である回転角変更装置23の要求仕様
に応じて適宜選択される。The control signal output device 22 is a coaxial cable
221 and amplifier 222 and the like coaxial cable 221 is interposed, are appropriately selected according to the required specifications of the rotation angle changer 2 3 to be controlled.
【0015】 回転角変更装置23は、前記ポテンショ
メータ16、18、モータ17およびバネ部材14から
なる。The rotation angle changing device 23 includes the potentiometers 16 and 18, a motor 17 and a spring member 14.
【0016】 なお、研磨部制御装置2は、必ずしもマ
イコンを用いて構成する必要はなく、図3に示すよう
に、ワイヤードロジック回路を用いて構成してもよい。The polishing unit control device 2 does not necessarily need to be configured using a microcomputer, and may be configured using a wired logic circuit as shown in FIG.
【0017】 移送手段である移送装置3および移送位
置制御手段である移送位置制御装置4は、従来より研磨
部材保持装置1に用いられているものと同様であるの
で、その構成の詳細な説明は省略する。[0017] a transfer device 3 and transport position control means is a transfer means transferring position controller 4 are the same as those used in the polishing member hold device 1 conventionally, details of its construction Description Is omitted.
【0018】 以下、このように構成された研磨装置を
用いた研磨方法の一例を図5に基づいて説明する。Hereinafter, an example of a polishing method using the polishing apparatus configured as described above will be described with reference to FIG.
【0019】 研磨開始位置(図中、P1)近傍の手前
所定距離に到達したことが移送位置制御装置4より研磨
部制御装置2に入力されると、研磨部材13が研磨位置
制御手段2bによる研磨位置制御から力制御手段2aに
よる力制御に切り替えられて研磨部材13の押圧力が初
期押圧力(図中、F1)に設定される。研磨部材13が
移送装置3によりさらに移送されて研磨開始位置(図
中、P1)近傍に到達したことが移送位置制御装置4よ
り研磨部制御装置2に入力さ れると、押圧力が力制御手
段2aにより初期押圧力(図中、F1)から所定押圧力
(図中、F2、F2>F1)に所定時定数でもって切り
替えられる。この所定時定数は、研磨対象に応じ数十ミ
リ秒〜数秒の範囲の中から適宜選択される。その一例を
挙げれば、アルミ金型荒研磨の場合は1秒程度である。Before the vicinity of the polishing start position ( P 1 in the figure )
When the reaching of the predetermined distance is input from the transfer position control device 4 to the polishing unit control device 2 , the polishing member 13 is moved to the polishing position.
From the polishing position control by the control means 2b to the force control means 2a
And the pressing force of the polishing member 13
The initial pressing force (F1 in the figure) is set. Polishing member 13
The wafer is further transferred by the transfer device 3 to a polishing start position (see FIG.
Medium, P1) It is determined that the transfer position control device 4 has reached the vicinity.
Ri is input to the polishing unit controller 2, the pressing force is the force control hand
The stage 2a switches from the initial pressing force (F1 in the figure) to a predetermined pressing force (F2, F2> F1 in the figure) with a predetermined time constant. This predetermined time constant is appropriately selected from the range of several tens of milliseconds to several seconds depending on the polishing object. One example is about one second in the case of rough polishing of an aluminum mold.
【0020】 また、初期押圧力および所定押圧力も、
研磨対象に応じ数百グラム〜数キログラムの範囲の中か
ら適宜選択される。その一例を挙げれば、アルミ金型荒
研磨の場合は2〜3キログラムである。Further, the initial pressing force and the predetermined pressing force are also
It is appropriately selected from the range of several hundred grams to several kilograms according to the polishing object. For example, in the case of rough polishing of an aluminum mold, the weight is 2-3 kg.
【0021】 なお、図において初期押圧力から所定押
圧力への切替は直線状になされているが、切替は必ずし
も直線状になされる必要はなく、研磨対象に応じて適当
な曲線が採用される。この曲線は、演算処理装置21の
ROM2の制御プログラム、具体的には力制御手段2a
に関するプログラムを変更することによりまたはワイヤ
ードロジック回路(図3)の構成要素を取り替えること
によって得られる。In the figure, the switching from the initial pressing force to the predetermined pressing force is performed in a straight line, but the switching is not necessarily performed in a straight line, and an appropriate curve is adopted according to a polishing object. . This curve corresponds to the control program in the ROM 2 of the arithmetic processing unit 21 , specifically, the force control unit 2a.
Of the wired logic circuit (FIG. 3).
【0022】 その後、研磨部材保持装置1、具体的に
は研磨部材13が、研磨領域にある間はこの所定押圧力
が維持される。Thereafter, the predetermined pressing force is maintained while the polishing member holding device 1, specifically, the polishing member 13 is in the polishing area.
【0023】 研磨終了位置(図中、P2)近傍に到達
したことが移送位置制御装置4より研磨部制御装置2に
入力されると、押圧力が力制御手段2aにより所定押圧
力(図中、F2)から初期押圧力(図中、F1)に所定
時定数でもって切り替えられる。この所定時定数は、研
磨対象に応じ数十ミリ秒〜数秒の範囲の中から適宜選択
される。その一例を挙げれば、アルミ金型荒研磨の場合
は1秒程度である。図5において、所定押圧力から初期
押圧力への切替は直線状になされているが、研磨開始の
場合と同様、切替は必ずしも直線状になされる必要はな
く、研磨対象に応じて適当な曲線が採用される。そし
て、研磨部材が研磨終了位置近傍から後方所定距離に到
達したことが移送位置制御装置4により研磨部制御装置
2に入力されると、研磨部材13の制御が力制御手段2
aによる力制御から研磨位置制御手段2bによる位置制
御に切り替えられる。 When the polishing position is input to the polishing section controller 2 from the transfer position controller 4 in the vicinity of the polishing end position ( P2 in the figure ), the pressing force is controlled by the force controller 2a to a predetermined pressing force (in the figure, Switching from F2) to the initial pressing force (F1 in the figure) with a predetermined time constant. This predetermined time constant is appropriately selected from the range of several tens of milliseconds to several seconds depending on the polishing object. One example is about one second in the case of rough polishing of an aluminum mold. In FIG. 5, the switching from the predetermined pressing force to the initial pressing force is performed in a straight line. However, as in the case of the start of polishing, the switching does not necessarily have to be performed in a straight line. Is adopted. Soshi
The polishing member reaches a predetermined distance rearward from the vicinity of the polishing end position.
The reaching unit is controlled by the transfer position control unit 4
2, the polishing member 13 is controlled by the force control means 2
a to the position control by the polishing position control means 2b
You can switch to it.
【0024】[0024]
【発明の効果】以上説明したように、本発明の研磨装置
においては、研磨開始時と研磨終了時近傍の過渡的状態
における押圧力を所定押圧力よりも小さくしているの
で、研磨開始位置近傍や研磨終了位置近傍における過剰
研磨が防止できる。また、研磨部材保持装置の重力の影
響を重力バランス用錘で消しているので、押圧力の制御
が簡略化できる。As described above, in the polishing apparatus of the present invention, the pressing force in the transient state near the start of polishing and the end of polishing is smaller than the predetermined pressing force. And excessive polishing near the polishing end position can be prevented. Further, since the influence of the gravity of the polishing member holding device is eliminated by the gravity balance weight, the control of the pressing force can be simplified.
【図1】 本発明の研磨装置のブロック図である。FIG. 1 is a block diagram of a polishing apparatus according to the present invention.
【図2】 本発明の一実施例の電気的構成を示す概略図
である。FIG. 2 is a schematic diagram showing an electrical configuration of one embodiment of the present invention.
【図3】 本発明の研磨部制御手段の回路構成の一実施
例を示すブロック図である。FIG. 3 is a block diagram showing one embodiment of a circuit configuration of a polishing section control means of the present invention.
【図4】 研磨部材保持装置の概略図である。FIG. 4 is a schematic view of a polishing member holding device.
【図5】 押圧力と位置との関係を示すグラフである。FIG. 5 is a graph showing a relationship between a pressing force and a position.
【図6】 本出願人の出願にかかわるバネの振動に伴う
研磨ムラを防止できる研磨装置の概略図である。FIG. 6 is a schematic view of a polishing apparatus capable of preventing polishing unevenness due to vibration of a spring according to the present applicant's application.
【図7】 従来の研磨装置の概略図である。FIG. 7 is a schematic view of a conventional polishing apparatus.
1 研磨部材保持手段(研磨部材保持装置) 2 研磨部制御手段(研磨部制御装置) 3 移送手段(移送装置) 4 移送位置制御手段(移送位置制御装置) DESCRIPTION OF SYMBOLS 1 Polishing member holding means (polishing member holding device) 2 Polishing part control means (polishing part control device) 3 Transfer means (transfer device) 4 Transfer position control means (transfer position control device)
Claims (3)
力を相殺する重力バランス用錘を有する第1保持部材
と、該第1保持部材の前記研磨部材および重力バランス
用錘との間に横方向に突出させて設けられた一対の軸部
材と、前記一対の軸部材の各先端部と回転可能に係合さ
れている第2保持部材と、前記第2保持部材の前記重力
バランス用錘側に向けて突出させられている突出部と前
記第1保持部材との間に装着されたバネ部材およびダン
パと、前記第2保持部材を回動させる回動手段と、前記
第1保持部材の回転角を検出する第1回転角検出手段
と、前記第2保持部材の回転角を検出する第2回転角検
出手段とを備える研磨部材保持手段と、 前記第1回転角検出手段による検出値と前記第2回転角
検出手段による検出値との差に基づいて前記回動手段の
回転角を制御して研磨部材の押圧力を制御する力制御手
段、および前記第2回転角検出手段による検出値に基づ
いて前記回動手段の回転角を制御して研磨部材の位置を
制御する研磨位置制御手段を有する研磨部制御手段とを
備え、 研磨領域およびその近傍においては、前記力制御手段に
よる力制御がなされ、 研磨領域およびその近傍以外にお
いては、前記研磨位置制御手段による研磨位置制御がな
される ことを特徴とする研磨装置。(1)Polishing member and weight acting on the polishing member
First holding member having a gravity balance weight for canceling a force
And the polishing member and the gravity balance of the first holding member
A pair of shafts provided to protrude laterally between the weights
Material, and rotatably engaged with the respective tip portions of the pair of shaft members.
The second holding member and the gravity of the second holding member
Projection part and front part protruding toward balance weight side
A spring member mounted between the first holding member and the first holding member;
Rotating means for rotating the second holding member;
First rotation angle detecting means for detecting the rotation angle of the first holding member
And a second rotation angle detection for detecting a rotation angle of the second holding member.
Polishing member holding means comprising an ejection means, A value detected by the first rotation angle detection means and the second rotation angle
Based on the difference between the value detected by the detection means and the rotation means,
A force control hand that controls the rotation angle to control the pressing force of the polishing member
Step and a value detected by the second rotation angle detecting means.
Controlling the rotation angle of the rotating means to adjust the position of the polishing member.
Polishing unit control means having polishing position control means for controlling
Prepared, In the polishing area and its vicinity, the force control means
Power control, Except for the polishing area and its vicinity
In other words, the polishing position is not controlled by the polishing position control means.
Be done A polishing apparatus characterized in that:
までは所定の押圧力よりも小さな押圧力で研磨がなされ
るとともに、研磨開始位置近傍において前記押圧力から
所定の押圧力に切り替えがなされることを特徴とする請
求項1記載の研磨装置。 2. In the force control, a vicinity of a polishing start position is provided.
Up to this point, polishing is performed with a pressing force smaller than the specified pressing force.
And in the vicinity of the polishing start position,
The contracting force is switched to a predetermined pressing force.
The polishing apparatus according to claim 1.
までは所定の押圧力で研磨がなされるとともに、研磨終
了位置近傍において前記所定の押圧力から前記押圧力よ
りも小さな押圧力に切り替えがなされることを特徴とす
る請求項1記載の研磨装置。 3. In the force control, a vicinity of a polishing end position is provided.
Until the polishing is performed with the specified pressing force,
From the predetermined pressing force to the pressing force in the vicinity of the end position.
It is characterized by switching to a smaller pressing force
The polishing apparatus according to claim 1, wherein
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3209834A JP2657721B2 (en) | 1991-07-26 | 1991-07-26 | Polishing device having force control device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3209834A JP2657721B2 (en) | 1991-07-26 | 1991-07-26 | Polishing device having force control device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0531666A JPH0531666A (en) | 1993-02-09 |
JP2657721B2 true JP2657721B2 (en) | 1997-09-24 |
Family
ID=16579394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3209834A Expired - Fee Related JP2657721B2 (en) | 1991-07-26 | 1991-07-26 | Polishing device having force control device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2657721B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5565749A (en) * | 1993-04-28 | 1996-10-15 | Kabushiki Kaisha Toshiba | Method of controlling a grinder robot |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH074766B2 (en) * | 1986-04-22 | 1995-01-25 | トヨタ自動車株式会社 | Grinding machine |
-
1991
- 1991-07-26 JP JP3209834A patent/JP2657721B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0531666A (en) | 1993-02-09 |
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