JP2643208B2 - Electron gun device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an electron gun device of a cathode ray tube used for, for example, a color television receiver and various color display devices, particularly an in-line single electron gun type electron gun device. Get involved.

[Summary of the Invention]

The present invention relates to an in-line single electron gun type electron gun device, in which an electron beam space is provided by providing electrostatic deflection means for bending a side electron beam outward on the rear side of a main electron lens provided in common for all electron beams. In order to increase the degree of freedom of selection, a voltage for dynamic beam space correction is superimposed and applied to the electrostatic deflecting means, and at each scanning position on the color phosphor screen of the electron beam in the cathode ray tube, A high-quality color image with improved mislanding can be displayed, and the structure can be simplified.

[Conventional technology]

As an electron gun apparatus for various color cathode ray tubes including a color television picture tube, for example, as shown in FIG. 6, a phosphor screen in which red, green and blue phosphors are separately applied in a predetermined arrangement relationship. , Three cathodes K _S1 , K _C and K _{S2 serving} as emission sources of three electron beams (1 _S1 ) (1c) and (1 _S2 ) corresponding to the red, green and blue, respectively,
The cathodes K _S1 on both sides are arranged on both sides of the cathode K _C so that they are arranged substantially in a straight line when viewed from the front.
And K _S2 are arranged, and these cathodes K _C , K _S1 and K _S2
In common to _S2, for example, first to fifth grids G ₁ ~G ₅ which are arranged on the cathode K _C and same axis center. Then, the third to fifth grids G ₃ ~G ₅ common main electron lens L _M uni-potential type is configured, the lens L _M
At the center of the electron beams (1 _S1 ) and (1 _S2 ) from the cathodes K _S1 and K _{S2 on} both sides, the center cathode
Crossed with the electron beam (1c) from K _C
The electron beams (1 _S1 ) and (1 _S2 ) spread after these crossovers
Is deflected inward by the convergence means (2) so as to converge on the phosphor screen on the inner surface of the panel of the cathode ray tube. The convergence means (2) comprises a pair of inner electrostatic deflectors (2 _C1 ) and (2 _C2 ) opposed to each other across the path of the center electron beam (1c).
And a pair of outer electrostatic deflecting plates (2 _C1 ) and (2 _C2 ) which are arranged outside and opposite to each other.
_S1 ) and ( _2S2 ), and the inner electrostatic deflector (2
The _C1) and (2 _C2), for example the 5 high anode voltage HV grid G ₅ and the fluorescent screen the same potential is applied both these deflectors (2 _C1) and (2 _C2) introduced between The center beam (1c) is moved straight without deflection. Between the outer electrostatic deflectors (2 _S1 ) and (2 _S2 ) and the inner electrostatic deflectors (2 _C1 ) and (2 _C2 ), each side electron beam (1 _S1 ) and (1 _S2 ) A convergence voltage of about 92 to 96% of the anode voltage HV is applied to each of the outer electrostatic deflectors (2 _S1 ) and (2 _S2 ) so that each side electron beam (1 _S1 ) and ( _1S2 ) is deflected toward the center electron beam (1c).

Beam interval in this type of electron gun apparatus, i.e. beamspace BS, as seen in Figure 6, mainly on both side electron beams (1 _S1) and (1 _S2), the angle of incidence of the main electron lens L _M and (divergence angle) is determined by the distance to the lens L _M and convergence means (2). The incident angle of the electron beam in the main electron lens L _M (1 _S1) and (1 _S2) is determined by the inclination or the like of the cathode K _S1 and K _S2, precisely adjust the setting of the inclination to an arbitrary angle It is difficult to choose. The main and the electron lens L _M, the distance convergence means also, since it affects the entire length of the electron gun, for example, selection of sufficient large consisting beam space BS becomes difficult.

On the other hand, in a normal color cathode ray tube, for example,
As shown in the figure, the main parts of the front panel (3) of the cathode ray tube are, for example, sequentially painted with red, green and blue phosphor stripes R, G and B, respectively. A color selection means (6), such as a shadow mask or an aperture grille, having a color fluorescent surface (4) and an electron beam transmitting opening (5) such as a slit or a circular hole is disposed opposite thereto. When three electron beams emitted from the electron gun, that is, the center beam (1c) and the side beams ( _1S1 ) and ( _1S2 ) enter the opening (5) of the color selection means (6), the corresponding color is obtained. Are landed on the phosphor stripes G, R and B. In this case, the interval between the phosphors R, G, B, that is, the pitch P is determined by the color selection means (6).
Is determined by the product of the so-called grill height GH and the incident angle θ of the side beams (1 _S1 ) and (1 _S2 ). It is necessary to increase the grill height GH or the incident angle θ. However, in actuality, in forming the color fluorescent screen (4), the color selection means (6) is used as an optical mask while the color selection means (6) is arranged at a predetermined position on the panel section (3). In this method, the phosphor is optically printed through the opening (5). In this case, however, the exposure through the opening (5) causes Fresnel diffraction, thereby causing the grill height to increase.
Since the HB is large, the light distribution on the exposed surface on the inner surface of the panel portion (1) shows a remarkable bimodal property, which causes inconveniences such as the occurrence of uneven exposure and a large burning width of the phosphor. Invite you.

Further, when the grill height GH is increased, the electron beam passes through the color selecting means (6) and then the fluorescent screen (4).
Since the length of the path leading up to the landing is long, it is susceptible to drift effects due to terrestrial magnetism or temperature rise due to electron beam impact during the operation of the color selection means (6), that is, susceptible to temperature drift, etc. However, there is a problem in that color shift and the like are liable to occur, resulting in deterioration of image quality and instability.

Therefore, when a large phosphor pitch P is to be formed, the incident angle θ, in other words, the beam space BS in the electron gun device, is increased rather than increasing the grill height GH of the color selection means (6). It is desirable.

However, as described above, in the in-line type single electron gun device, it is difficult to select the beam space BS, and the degree of freedom in the selection is small.

[Problems to be solved by the invention]

The present invention relates to the above-described electron gun apparatus in which the in-line single electron gun is difficult, in which the pitch of the electron beam at the electron beam emitting end, that is, the beam space BS only depends on the arrangement angle of the cathode with respect to each side electron beam and the electron gun length. Without having to make a selection.
An electron gun apparatus which has solved such a problem has been proposed in Japanese Patent Application No. 62-168238 filed by the present applicant, but in the present invention, for example, a fluorescent light in a cathode ray tube is used. Increases the phosphor pitch in the peripheral area where misdanging of the surface is likely to occur, or corrects spot spacing unevenness on the fluorescent surface due to local fluctuation in grill height due to uneven molding of the panel etc. The present invention provides an electron gun device capable of performing such operations.

[Means for solving the problem]

As shown in FIG. 1, the present invention comprises a center electron beam (1c) and three electron beam radiation sources for emitting side electron beams (1 _S1 ) and (1 _S2 ) on both sides thereof, namely, a cathode K _C , K _S1 and K _S2 are arranged substantially in a straight line as viewed from the front side along the arrow a, and the electron beams (1c), (1 _S1 ) and (1 _S2 ) are formed in common with these main electron lenses. A convergence electrostatic deflecting means (2) which crosses at L _M , diverges from this, and converges the diverged side beams (1 _S1 ) and (1 _S2 ) to the center electron beam (1c). in the electron gun apparatus, both side electron beams between the common main electron lens L _M and convergence electrostatic deflection means (2) (1
Electrostatic deflecting means (10) for deflecting _S1 ) and (1 _S2 ) outward to select the electron beam space BS is provided, and the electrostatic deflecting means (10) for adjusting the beam space is used for adjusting the basic beam space. A dynamic beam space correction voltage that is superimposed on the DC voltage and changes according to the scanning position of the electron beam on the fluorescent screen is supplied.

And especially in the present invention, the electrostatic deflecting means (10)
Consists of an inner electrostatic deflector (10 _C1 ) (10 _C2 ) and a pair of outer electrostatic deflectors (10 _S1 ) (10 _S2 ) opposed thereto,
The outer electrostatic deflection plate ( _10S1 ) ( _10S2 ) is the main electron lens
L and high-voltage electrode and electrically and mechanically connected with the structure of the last stage which constitutes the _M.

[Action]

According to the arrangement of the present invention, the main electron lens L _M-stage is provided an electrostatic deflection means for beam space adjusting (10) the of both side electron beams (1 _S1) and the (1 _S2), deflected outwardly The electron beams (1 _S1 ) and (1 _S2 )
Angle of incidence of the main electron lens L _M of, 495. In other words the cathode K
Inclination and of _S1 and K _S2, further primary regardless of the interval between the electron lens L _M and convergence electrostatic deflection means (2), the degree of freedom of selection of the beam space since it is possible to perform the selection of the beam space BS is increased Further, in the present invention, the dynamic beam space correction voltage is applied to the beam space selecting electrostatic deflection means (10), so that, for example, the phosphor pitch P at the peripheral portion of the screen in the cathode ray tube is increased. Here, it is possible to increase the tolerance of landing which is likely to occur, and to avoid color shift due to mislanding.
Further, for example, the deviation of the landing position due to the variation of the grill height GH due to the shape error of the panel portion of the cathode ray tube made of a glass molded body is also measured by the electrostatic deflection electrode (10).
The present invention provides an electron gun device which can perform a correction adjustment by applying a dynamic correction voltage to a cathode ray tube and which constitutes a high quality cathode ray tube in which mislanding is avoided.

〔Example〕

The cathodes K _C of the three cathode i.e. center line as shown in FIG. 1 is disposed on the axis, the cathode K _C on both sides, symmetrically both with respect to the cathode K _C in the same plane Side cathodes K _S1 and K _S2 are arranged, and a common first to fifth grids G _{1 to} G ₅ are arranged coaxially with the center cathode K _C for these. The third and fifth grids G _3, and G _5, are high anode voltage HV is applied, the fourth grid G _4, which lower the focus voltage is applied, the third to fifth grids G ₃ ~G ₅ main electron lens L _M uni-potential type is formed by, in the main electron lens L _M, a cathode K _C, K _S1 and K _S2 from three electron beams (1c) (1 _S1) and (1 _S2) Are crossed.

The subsequent stage of the fifth grid G _5, the electrostatic deflection means for even electron beam space adjustment for dynamic correction of the electron beam space (10) is arranged to place the convergence means (2) to the subsequent stage.

Electrostatic deflection means (10) for adjusting the electron beam space
It has a pair of flat or curved electrostatic deflecting plates (10 _C1 ) and (10 _C2 ) on both sides and electrostatic deflecting plates (10 _S1 ) and (10 _S2 ) arranged outside the pair, respectively. Board (10
_C1) (10 _C2) These opposite deflectors same voltage is applied (10 _C1) and (10 _C2) between the center electron beam (1
c) can go straight without being deflected,
A positive voltage is applied to the outer electrostatic deflection plates (10 _S1 ) and (10 _S2 ) from the inner electrostatic deflection plates (10 _C1 ) and (10 _C2 ), and these electrostatic deflection plates (10 _C1 ) are applied. ) And (10 _S1 ),
The electrolysis between (10 _C2 ) and (10 _S2 ) causes the side beams (1 _S1 ) and (1 _S2 ) to deflect outward, respectively.

The convergence means (2) has outer electrostatic deflectors (2 _S1 ) and (2 _S2 ) and inner electrostatic deflectors (2 _C1 ) and (2 _C2 ) as described in FIG. The inner electrostatic deflectors (2 _C1 ) and (2 _C2 ) have a high anode voltage HV
Is applied, and a negative voltage is applied to the outer electrostatic deflectors (2 _S1 ) and (2 _S2 ) from the inner electrostatic deflectors (2 _C1 ) and (2 _C2 ).

The two side beams (1 _S1 ) and (1 _S2 ) deflected outward by the beam space adjusting electrostatic deflecting means (10) are combined with the deflecting plate (2) of the convergence means (2).
_C1) and (2 _S1) between the (2 _C2) and (2 _S2) is introduced between, introducing the center beam (1c) between the inner deflection plates (2 _C1) and (2 _C2). In this way, the center beam (1c) introduced between (2 _C1 ) and (2 _C2 ) at the same potential goes straight, but between the deflection plates (2 _C1 ) and (2 _S1 ),
Beam introduced between (2 _C2 ) and (2 _S2 ) (1 _S2 )
And (1 _S1 ) are deflected inward and the center beam (1
In c), convergence occurs near the phosphor screen.

The beam space adjusting electrostatic deflecting means (10) and the convergence means (2) are, for example, as shown in FIG.
The end plate (8) provided at the rear end of the fifth grid G ₅ or final stage of the high voltage electrode constituting the main electron lens L _M, which respectively bored electron beam transmissive aperture h _C, h _S1 and h _S2 A pair of outer deflectors (10 _S1 ) and (10 _S2 ) bent in an L-shape along the axis are provided on opposite sides thereof, and the same electric potential as that of the fifth grid G ₅ is applied to them. the central electron beam transmissive aperture h _C on both sides to a pair of electrodes deflector plate (91) and (92) mechanically and electrically linking erected so as to be opposed to each other. These deflecting plates (91) and (92) use the inner electrostatic deflecting plates (10 _C1 ) and (10 _C2 ) of each means (10) for the center beam (1c), that is, the first inner electrostatic deflecting plate, and The means (2) forming the electrostatic deflectors (2 _C1 ) and (2 _C2 ) inside the means (2) are commonly formed electrically. Also, the side beams (1 _S1 ) and (1 _S1 ) of the means (10) and (2) are electrically separated from the deflection plates (91) and (92).
_S2 ) each one inner electrostatic deflector (10 _C1 ) (10 _C2 )
That is, the second inner electrostatic deflector and the outer electrostatic deflector (2
_S1) and (2 _S2) and constitute, is bent to the electron beam (1 _S1) and (1 _S2) electron beam transmissive aperture h _S12, h _S22 is bored with cranked respectively the bent plate portions Deflection plates (101) and (102) are provided.
Than the fifth grid G ₅ to 1) and (102), that is, the deflection plate (10 _S1) (on 10 _S2) (2 _C1) 1~2KV lower deflection current voltage from (2 _C2), as shown in FIG. 4 For example, a parabolic dynamic space correction voltage synchronized with the vertical scanning cycle in the cathode ray tube is superimposed and applied.

In this way, in the cathode ray tube, mislanding is likely to occur at the peripheral portion of the fluorescent screen (screen), particularly at the corners. At the middle corner, the beam pitch is increased to increase the arrangement pitch of the phosphors R, G and B.

In the above-described example, the structure is such that the electrodes of the beam space adjusting electrostatic deflecting means (10) and the convergence means (2) are partially connected to each other. For the convergence adjustment, the length of the deflection plate of the convergence means (2) is selected, and for the dynamic convergence, the influence is corrected by the design of the deflection yoke and the quadrupole convergence correction means provided in the cathode ray tube. This does not cause any inconvenience due to the connection.

Further, electrostatic deflection means (10), for example on the inner side of the fifth grid G ₅ for example high anode voltage is applied as shown in FIG. 3 outside the electrostatic deflection plates (10 _S1) as (10 _S2) Various configurations, such as a configuration in which the inner electrostatic deflection plates (10 _C1 ) and (10 _C2 ) are arranged, can be adopted.

Further, in the above example, a case of applying the present invention in-line single-electron gun system having a uni-potential type main electron lens configuration, the main electron lens L _M is started by-unipotential or bipotential configuration The present invention can be applied to an electron gun having an electrode configuration having various configurations.

〔The invention's effect〕

As described above, according to the present invention, the inclination of the cathode,
Since it is possible to perform the selection and dynamic correction of the beam space (beam pitch) without depending on the distance between the main electron lens L _M and convergence means (2),
When applied to a color cathode ray tube, the degree of freedom in selecting the arrangement pitch of the phosphor can be increased. As described above, the phosphor pitch P in the peripheral portion of the screen is increased by superimposing application of a parabolic dynamic deflection correction voltage synchronized with, for example, the horizontal and / or vertical scanning periods to the electrostatic deflecting means (10). In this case, it is possible to increase the tolerance of landing, which tends to occur here, and to avoid color shift due to mislanding.
Further, for example, the displacement of the landing position due to the variation of the bar height GH due to the shape error of the panel portion of the cathode ray tube made of a glass molded body can be corrected and adjusted by applying the dynamic correction voltage to the electrostatic deflecting means (10). As a result, a high-quality cathode ray tube in which mislanding is avoided can be configured.

Then, in the present invention, the outer electrostatic deflection plate constituting the electrostatic deflection means _{(10) (10 S1) (} 10 S2) are high-voltage electrode and electrically and mechanically in the final stages constituting the main electron lens L _M The structure of the electron gun device can be reduced, the electrical derivation can be simplified, and the assembly and manufacturing can be simplified and the cost can be reduced. Reduction and improvement in reliability can be achieved.

[Brief description of the drawings]

FIG. 1 is a diagram showing an electrode configuration of each example of the electron gun device according to the present invention, FIGS. 2 and 3 are each a configuration diagram of each example of the electrostatic deflection means, and FIG. 4 is a dynamic beam space correction voltage. FIG. 5 is an explanatory diagram of a main part of a color cathode ray tube, and FIG. 6 is a configuration diagram of a conventional electron gun device. (3) is a panel section, (4) is a color phosphor screen, (6) is a color selection means, (1c) is a center electron beam, (1 _S1 ) and (1 _S2 ) are side electron beams, K _C , K _S1, K _S2 cathode, L _M is the main electron lens (10) is an electrostatic deflection means.

Claims (3)

(57) [Claims] 1. A center electron beam and side electron beams on both sides thereof are arranged substantially in a straight line when viewed from the front side, and the three electron beams are shared by a common main electron lens portion. In the electron gun device comprising convergence electrostatic deflection means for diverging from this, diverging from this, and converging the diverged side beams to the center electron beam, the common main electron lens and the convergence electrostatic deflection means An electrostatic deflecting means for deflecting the electron beams on both sides outward to adjust the electron beam space is provided, and the electrostatic deflecting means comprises an inner electrostatic member for transmitting a center electron beam from the main electron lens. A deflecting plate, and facing the inner electrostatic deflecting plate with the path of each of the side electron beams diverging from the main electron lens interposed therebetween; A pair of outer electrostatic deflecting plates, wherein the pair of outer electrostatic deflecting plates is configured to be electrically and mechanically connected to a final stage high voltage electrode constituting the main electron lens, An electron gun device wherein a dynamic beam space correction voltage is supplied between the inner electrostatic deflecting plate and the outer electrostatic deflecting plate. An inner electrostatic deflection plate of the electrostatic deflection means, a first inner electrostatic deflection plate facing the path of the center electron beam, and the outer electrostatic deflection plate sandwiching each of the side electron beam paths. A deflecting plate and a corresponding second inner electrostatic deflecting plate, wherein the first inner electrostatic deflecting plate of the electrostatic deflecting means and the inner electrostatic deflecting constituting the convergence electrostatic deflecting means 2. The electron gun device according to claim 1, wherein the plate and the plate are electrically and mechanically connected to each other. 3. An electrostatic deflecting plate inside said electrostatic deflecting means, a first inner electrostatic deflecting plate facing said center electron beam passage, and said outer electrostatic deflecting plate sandwiching said side electron beam passages. A deflecting plate and a corresponding second inner electrostatic deflecting plate, wherein the second inner electrostatic deflecting plate of the electrostatic deflecting means and the outer electrostatic deflecting constituting the convergence electrostatic deflecting means 2. The electron gun device according to claim 1, wherein the plate and the plate are electrically and mechanically connected to each other.