JP2635267B2
(ja )
1997-07-30
Rfプラズマ処理装置
JP2625072B2
(ja )
1997-06-25
電磁rf結合を用いたプラズマ反応装置及びその方法
US5556501A
(en )
1996-09-17
Silicon scavenger in an inductively coupled RF plasma reactor
US6068784A
(en )
2000-05-30
Process used in an RF coupled plasma reactor
US5888414A
(en )
1999-03-30
Plasma reactor and processes using RF inductive coupling and scavenger temperature control
EP0552491B1
(en )
1998-07-15
Plasma etch process and plasma processing reactor
US6545420B1
(en )
2003-04-08
Plasma reactor using inductive RF coupling, and processes
US6488807B1
(en )
2002-12-03
Magnetic confinement in a plasma reactor having an RF bias electrode
US6518195B1
(en )
2003-02-11
Plasma reactor using inductive RF coupling, and processes
US6251792B1
(en )
2001-06-26
Plasma etch processes
US6444137B1
(en )
2002-09-03
Method for processing substrates using gaseous silicon scavenger
US20020004309A1
(en )
2002-01-10
Processes used in an inductively coupled plasma reactor
JP2519364B2
(ja )
1996-07-31
Uhf/vhf共振アンテナ供給源を用いたプラズマリアクタ
US6679981B1
(en )
2004-01-20
Inductive plasma loop enhancing magnetron sputtering
US7513214B2
(en )
2009-04-07
Plasma processing method and apparatus
KR101011580B1
(ko )
2011-01-27
이온 분포의 자기 제어에 의해 외부적으로 여기된토로이드형 플라즈마 소스
US5824605A
(en )
1998-10-20
Gas dispersion window for plasma apparatus and method of use thereof
US6468388B1
(en )
2002-10-22
Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate
KR100342014B1
(ko )
2002-09-18
플라즈마처리장치
US6453842B1
(en )
2002-09-24
Externally excited torroidal plasma source using a gas distribution plate
US5707486A
(en )
1998-01-13
Plasma reactor using UHF/VHF and RF triode source, and process
US20040237897A1
(en )
2004-12-02
High-Frequency electrostatically shielded toroidal plasma and radical source
US6634313B2
(en )
2003-10-21
High-frequency electrostatically shielded toroidal plasma and radical source
JP2543642B2
(ja )
1996-10-16
高周波交流電気エネルギ―と相対的に低い周波数の交流電気的エネルギ―を有する、工作物を処理するためのシステムおよび方法
JP2004506339A
(ja )
2004-02-26
外部から励磁されるトロイダルプラズマ源