JP2628637B2 - Resist coating equipment - Google Patents
Resist coating equipmentInfo
- Publication number
- JP2628637B2 JP2628637B2 JP21477686A JP21477686A JP2628637B2 JP 2628637 B2 JP2628637 B2 JP 2628637B2 JP 21477686 A JP21477686 A JP 21477686A JP 21477686 A JP21477686 A JP 21477686A JP 2628637 B2 JP2628637 B2 JP 2628637B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- surface temperature
- disk
- glass master
- rotation speed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
- Manufacturing Optical Record Carriers (AREA)
Description
【発明の詳細な説明】 技術分野 本発明は、レジスト塗布装置に関する。Description: TECHNICAL FIELD The present invention relates to a resist coating apparatus.
背景技術 映像や音声情報等をディスク（円盤）状の記録媒体に
記録する方式として光学方式がある。この光学方式は、
基板となるガラス原盤をスピンドルモータで回転駆動し
つつその盤面上にフォトレジストを塗布しレジスト膜を
形成することによってレジスト原盤を作成し、このレジ
スト原盤のレジスト膜に微小な点に集光したレーザビー
ムを映像や音程情報等に応じて明滅させるいわゆるビッ
トバイビット方式で照射感光させ、しかる後これを現像
して得られるビット（へこみ）の長さ及びその繰返し周
期により情報を記録するものである。BACKGROUND ART There is an optical system as a system for recording video, audio information, and the like on a disk (disk) -shaped recording medium. This optical system is
A laser that focused on the resist film of the resist master by creating a resist master by applying a photoresist on the surface of the glass master as a substrate while rotating the glass master by a spindle motor and forming a resist film. The beam is irradiated and exposed in a so-called bit-by-bit system in which the beam blinks in accordance with video and pitch information, and thereafter, information is recorded based on the length of a bit (dent) obtained by developing the beam and its repetition period. .
かかる方式におけるレジスト塗布工程において、ガラ
ス原盤の盤面上にコーティングされるレジスト膜の膜厚
を一定に保つことは非常に重要なことである。このた
め、従来は、第２図に示す如きスピンドル回転数と膜厚
との関係から、ガラス原盤の盤面上に塗布するフォトレ
ジストの塗布量及びスピンドル回転数をそれぞれ一定に
保つことで対処していた。In the resist coating process in such a method, it is very important to keep the thickness of the resist film coated on the surface of the glass master disk constant. For this reason, conventionally, from the relationship between the spindle rotation speed and the film thickness as shown in FIG. 2, the countermeasures have been taken by keeping the amount of the photoresist applied onto the surface of the glass master disk and the spindle rotation speed constant. Was.
しかしながら、ガラス原盤の表面温度を一定に保つこ
とは難しく、表面温度が変動することにより、レジスト
の粘性が変化してしまうので膜厚にムラが生じ、したが
って盤面全体に亘って膜厚を一定に保つことができなく
なってしまう。However, it is difficult to keep the surface temperature of the glass master constant, and fluctuations in the surface temperature change the viscosity of the resist, causing unevenness in the film thickness. You will not be able to keep it.
発明の概要 本発明は、上述した点に鑑みなされたもので、ガラス
原盤の表面温度の変動に拘らず一定の膜厚でレジスト膜
をコーティングできるレジスト塗布装置を提供すること
を目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and an object of the present invention is to provide a resist coating apparatus capable of coating a resist film with a constant film thickness regardless of fluctuations in the surface temperature of a glass master.
本発明によるレジスト塗布装置は、スピンドルモータ
によって回転駆動される円盤状部材の表面温度を測定
し、この測定温度に基づいてスピンドルモータの回転数
を制御しつつ円盤状部材の盤面上にレジストを塗布する
構成となっている。The resist coating apparatus according to the present invention measures the surface temperature of a disk-shaped member that is rotated and driven by a spindle motor, and coats a resist on the disk surface of the disk-shaped member while controlling the rotation speed of the spindle motor based on the measured temperature. Configuration.
実 施 例 以下、本発明の実施例を図に基づいて詳細に説明す
る。Embodiment Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings.
第１図は、本発明の一実施例を示す構成図である。図
において、円盤状部材であるガラス原盤１はターンテー
ブル２により担持され、スピンドルモータ３によって回
転駆動される。ガラス原盤１の上方には当該原盤の半径
方向にて移動自在なノズル４が位置している。このノズ
ル４はレジストコーター５より供給されるフォトレジス
トを回転駆動されているガラス原盤１の盤面上に向けて
一定量射出しつつ該半径方向に規定速度で駆動される。FIG. 1 is a configuration diagram showing one embodiment of the present invention. In the figure, a glass master 1 as a disk-shaped member is carried by a turntable 2 and is driven to rotate by a spindle motor 3. Above the glass master 1, a nozzle 4 that is movable in the radial direction of the master is located. The nozzle 4 is driven at a specified speed in the radial direction while injecting a predetermined amount of photoresist supplied from the resist coater 5 onto the surface of the glass master 1 that is being driven to rotate.
スピンドルモータ３の回転数は当該モータに同期して
回転する周波数発電機（FG）６により検出され、この回
転数情報はスピンドル制御回路７に供給される。スピン
ドル制御回路７はこの回転数情報に基づいてスピンドル
モータ３の回転数が設定回転数になるように制御する。
この設定回転数はコントローラ８からスピンドル制御回
路７に対して与えられる。コントローラ８はマイクロコ
ンピュータ等によって構成され、ガラス原盤１の表面温
度を非接触で測定する例えば放射温度計９の測定出力に
基づいてスピンドルモータ３の回転数を設定する。The rotation speed of the spindle motor 3 is detected by a frequency generator (FG) 6 which rotates in synchronization with the motor, and the rotation speed information is supplied to a spindle control circuit 7. The spindle control circuit 7 controls the rotation speed of the spindle motor 3 based on the rotation speed information so that the rotation speed of the spindle motor 3 becomes the set rotation speed.
The set number of revolutions is given from the controller 8 to the spindle control circuit 7. The controller 8 is configured by a microcomputer or the like, and sets the number of revolutions of the spindle motor 3 based on a measurement output of, for example, a radiation thermometer 9 for measuring the surface temperature of the glass master 1 in a non-contact manner.
すなわち、コントローラ８は、例えば1300Åの膜厚を
得る場合は、スピンドル回転数を約330［rpm］に設定し
（第２図参照）、膜厚は第３図から明らかなようにガラ
ス原盤１の表面温度が上昇するにつれて厚くなる傾向に
あるので、表面温度が上昇したときはスピンドル回転数
を上げ、表面温度が低下したときはスピンドル回転数を
下げるようにスピンドル制御回路７に対する制御を行な
う。かかる制御をなすため、コントローラ８の内蔵メモ
リ（図示せず）には、ガラス原盤１の表面温度とスピン
ドル回転数との対応関係を示すデータマップが予め記憶
されている。That is, when obtaining a film thickness of, for example, 1300 °, the controller 8 sets the spindle rotation speed to about 330 [rpm] (see FIG. 2), and the film thickness of the glass master 1 as apparent from FIG. Since the surface temperature tends to increase as the surface temperature increases, the spindle control circuit 7 is controlled to increase the spindle rotation speed when the surface temperature increases and to decrease the spindle rotation speed when the surface temperature decreases. In order to perform such control, a data map indicating the correspondence between the surface temperature of the glass master 1 and the spindle speed is stored in advance in a built-in memory (not shown) of the controller 8.
また、放射温度計９によって測定される表面温度は見
掛け上の温度であるため、ガラス原盤１の放射率及び放
射温度計９による観測経路での放射の透過率の実効的な
値を予め求めてコントローラ８の内蔵メモリに記憶して
おき、この記憶データに基づいて放射温度計９の測定出
力を補正することによって、より正確に表面温度を測定
できることになる。その結果、スピンドルモータ３の回
転数を表面温度の変動に対応して正確に制御できること
になるので、ガラス原盤１の表面温度の変動に拘らずほ
ぼ一定の膜厚でレジスト膜をコーティングできることに
なる。Further, since the surface temperature measured by the radiation thermometer 9 is an apparent temperature, the effective values of the emissivity of the glass master 1 and the radiation transmittance of the radiation thermometer 9 on the observation path are determined in advance. By storing the data in the built-in memory of the controller 8 and correcting the measurement output of the radiation thermometer 9 based on the stored data, the surface temperature can be measured more accurately. As a result, the number of revolutions of the spindle motor 3 can be accurately controlled according to the fluctuation of the surface temperature, so that the resist film can be coated with a substantially constant film thickness regardless of the fluctuation of the surface temperature of the glass master 1. .
なお、上記実施例では、ガラス原盤１の表面温度を測
定する手段として放射温度計９を用いた場合について説
明したが、これに限定されるものではなく、ガラス原盤
１の表面温度を非接触で測定できるものであれば良い。In the above embodiment, the case where the radiation thermometer 9 is used as a means for measuring the surface temperature of the glass master 1 has been described. However, the present invention is not limited to this. Anything that can be measured may be used.
発明の効果 以上説明したように、本発明によるレジスト塗布装置
においては、スピンドルモータによって回転駆動される
円盤状部材の表面温度を測定し、この測定温度に基づい
てスピンドルモータの回転数を制御しつつ円盤状部材の
盤面上にレジストを塗布する構成となっているので、ガ
ラス原盤の表面温度の変動に拘らず一定の膜厚でレジス
ト膜をコーティングできるのである。Effect of the Invention As described above, in the resist coating apparatus according to the present invention, the surface temperature of the disk-shaped member rotated and driven by the spindle motor is measured, and the rotation speed of the spindle motor is controlled based on the measured temperature. Since the resist is applied to the surface of the disk-shaped member, the resist film can be coated with a constant film thickness regardless of the fluctuation of the surface temperature of the glass master.
第１図は本発明の一実施例を示す構成図、第２図はスピ
ンドル回転数と膜厚との関係を示す図である。 主要部分の符号の説明 １……ガラス原盤 ３……スピンドルモータ ５……レジストコーター ７……スピンドル制御回路 ９……放射温度計FIG. 1 is a configuration diagram showing one embodiment of the present invention, and FIG. 2 is a diagram showing a relationship between a spindle rotation speed and a film thickness. Explanation of Signs of Main Parts 1 ... Glass Master 3 ... Spindle Motor 5 ... Resist Coater 7 ... Spindle Control Circuit 9 ... Radiation Thermometer
───────────────────────────────────────────────────── フロントページの続き (72)発明者 河野 滋 山梨県中巨摩郡田富町西花輪2680番地 パイオニアビデオ株式会社内 (72)発明者 小塩 千春 山梨県中巨摩郡田富町西花輪2680番地 パイオニアビデオ株式会社内 (72)発明者 長田 和彦 山梨県中巨摩郡田富町西花輪2680番地 パイオニアビデオ株式会社内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shigeru Kono 2680 Nishi-Hanawa, Tatomi-cho, Nakakoma-gun, Yamanashi Prefecture Inside (72) Inventor Chiharu 2680 Nishi-Hanawa, Tatomi-cho, Nakakoma-gun, Yamanashi Pioneer Video Corporation (72) Inventor Kazuhiko Nagata 2680 Nishihanawa, Tatomi-cho, Nakakoma-gun, Yamanashi Prefecture Pioneer Video Corporation
Claims (2)
転駆動しつつその盤面上にレジストを塗布してレジスト
膜を形成するレジスト塗布装置であって、前記円盤状部
材の表面温度を測定する測定手段と、前記測定手段の出
力に基づいて前記スピンドルモータの回転数を制御する
制御手段とを備えたことを特徴とするレジスト塗布装
置。1. A resist coating apparatus for forming a resist film by applying a resist on a surface of a disk-shaped member while rotating the disk-shaped member by a spindle motor, comprising: a measuring unit for measuring a surface temperature of the disk-shaped member; Control means for controlling the number of revolutions of the spindle motor based on the output of the measuring means.
徴とする特許請求の範囲第１項記載のレジスト塗布装
置。2. A resist coating apparatus according to claim 1, wherein said measuring means is a radiation thermometer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21477686A JP2628637B2 (en) | 1986-09-11 | 1986-09-11 | Resist coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21477686A JP2628637B2 (en) | 1986-09-11 | 1986-09-11 | Resist coating equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6370424A JPS6370424A (en) | 1988-03-30 |
| JP2628637B2 true JP2628637B2 (en) | 1997-07-09 |
Family
ID=16661344
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21477686A Expired - Fee Related JP2628637B2 (en) | 1986-09-11 | 1986-09-11 | Resist coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2628637B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR0138097B1 (en) * | 1989-05-22 | 1998-06-15 | 고다까 토시오 | Liquid coating device |
| JP2784042B2 (en) * | 1989-06-05 | 1998-08-06 | 東京エレクトロン 株式会社 | Coating device |
| US6327793B1 (en) * | 2000-03-20 | 2001-12-11 | Silicon Valley Group | Method for two dimensional adaptive process control of critical dimensions during spin coating process |
| JP3792986B2 (en) * | 2000-04-11 | 2006-07-05 | 東京エレクトロン株式会社 | Film forming method and film forming apparatus |
-
1986
- 1986-09-11 JP JP21477686A patent/JP2628637B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6370424A (en) | 1988-03-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| LAPS | Cancellation because of no payment of annual fees |