JP2587258B2 - Method for producing reflow tin or tin alloy plated material using copper or copper alloy as base material - Google Patents

Method for producing reflow tin or tin alloy plated material using copper or copper alloy as base material

Info

Publication number
JP2587258B2
JP2587258B2 JP62316314A JP31631487A JP2587258B2 JP 2587258 B2 JP2587258 B2 JP 2587258B2 JP 62316314 A JP62316314 A JP 62316314A JP 31631487 A JP31631487 A JP 31631487A JP 2587258 B2 JP2587258 B2 JP 2587258B2
Authority
JP
Japan
Prior art keywords
tin
copper
alloy
base material
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62316314A
Other languages
Japanese (ja)
Other versions
JPH01159397A (en
Inventor
剛志 増田
真人 内糸
一彦 深町
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=18075753&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP2587258(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP62316314A priority Critical patent/JP2587258B2/en
Publication of JPH01159397A publication Critical patent/JPH01159397A/en
Application granted granted Critical
Publication of JP2587258B2 publication Critical patent/JP2587258B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、外観及び半田付性に優れた銅及び銅合金の
錫又は錫合金のリフローめつき材の製造方法に関するも
のである。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a reflow plating material of tin or tin alloy of copper and copper alloy having excellent appearance and solderability.

従来の技術及び問題点 従来、銅及び銅合金を母材とし表面に錫又は錫合金を
電気めつき後、錫又は錫合金の融点より高い温度でめつ
き層を加熱溶融した。いわゆるリフローめつき材は、コ
ネクター、スイツチその他電子部品のリード等に一般的
に用いられている。
2. Description of the Related Art Conventionally, after a tin or a tin alloy is electroplated on a surface using copper or a copper alloy as a base material, the plating layer is heated and melted at a temperature higher than the melting point of the tin or the tin alloy. The so-called reflow plating material is generally used for leads of connectors, switches and other electronic components.

リフロー錫めつき、リフロー錫合金めつきのいずれの
場合も、母材の種類およびめつき材の用途により、母材
に直接めつきされる場合と銅又はニツケルが下地めつき
として施される場合がある。
In both cases of reflow tin plating and reflow tin alloy plating, depending on the type of base material and the application of the plating material, there are cases where it is directly plated on the base material and cases where copper or nickel is applied as a base plating. is there.

ところが、下地めつきを省略するか、もしくは下地め
つきの厚みが0.2mm以下のように極めて薄い場合の錫又
は錫合金電気めつき皮膜をリフロー処理すると、溶融金
属が集まり、皮膜厚さが不均一となる「デエウエツテイ
ング」あるいは「ぬれ不良」と呼ばれる欠陥が発生す
る。ぬれ不良の発生しためつき材は、外観が悪いばかり
でなく半田付性も劣り、これを用いた部品の製造条件及
び品質への悪影響も生じるという問題がある。
However, when the undercoating is omitted or the tin or tin alloy electroplated coating is extremely thin, such as when the thickness of the base coating is 0.2 mm or less, the molten metal gathers and the coating thickness becomes uneven. A defect called "dewetting" or "wetting defect" occurs. The resulting material due to poor wetting not only has poor appearance, but also poor solderability, and has a problem of adversely affecting the manufacturing conditions and quality of parts using the material.

このように、ぬれ不良が産業上重大な欠陥であるにも
かかわらず、その発生機構の定説はなく、従来の対策も
満足のいくものではなかつた。
Thus, despite the fact that the wetting failure is a serious industrial defect, there is no established mechanism for its occurrence, and the conventional measures have not been satisfactory.

因に、従来、この発生機構として、現象的ははじき
現象であること、前処理でめつき母材を化学研摩する
か下地めつきを厚く施すと軽減すること、めつき皮膜
中への有機物(添加剤)の共析が多いと発生し易いなど
が知られている程度であつた。
Conventionally, the mechanism of occurrence is that it is a phenomenon of repelling phenomenon, that it can be reduced by chemically polishing the base material by pretreatment or by thickly applying a base material, and that organic matter ( (Additive) is known to easily occur when the amount of eutectoid is large.

特に、めつき前処理工程での化学研摩が必要なものは
生産性及び経済性の観点から、これに代わる対策が強く
求められていた。
In particular, those requiring chemical polishing in the plating pretreatment step have been strongly required to take an alternative measure from the viewpoint of productivity and economy.

発明が解決すべき課題 本発明は、上述したごとき状況に鑑みなされたもので
あつて、ぬれ不良の発生しない、外観及び半田付性共に
優れた銅又は銅合金のリフロー錫又は錫合金めつき材を
製造するための方法、特に上記めつき材に用いる銅又は
銅合金母材を改善することにより、下地めつきを省略し
たリフローめつき材の場合でも、めつき工程で母材を化
学研摩することなく、外観及び半田付性共に優れた上記
リフロー錫又は錫合金めつき材を製造するための方法を
提供することを課題とする。
Problems to be Solved by the Invention The present invention has been made in view of the situation as described above, and is a copper or copper alloy reflowed tin or tin alloy plated material which does not cause poor wetting and has both excellent appearance and solderability. By improving the copper or copper alloy base material used for the above-mentioned plating material, in particular, in the case of a reflow plating material in which the base plating is omitted, the base material is chemically polished in the plating step. An object of the present invention is to provide a method for producing the above-mentioned reflow tin or tin alloy-coated material which is excellent in both appearance and solderability without any problem.

以下本発明の詳しく説明する。 Hereinafter, the present invention will be described in detail.

発明の構成 本発明の構成上の特徴は、最終焼鈍以降に表面を機械
研磨することなく、最終圧延を行って得られた銅又は銅
合金母材に、錫又は錫合金の電気めっきを施し、さらに
リフロー処理することにある。
Configuration features of the present invention, without mechanical polishing the surface after the final annealing, copper or copper alloy base material obtained by performing the final rolling, tin or tin alloy electroplating, In addition, the reflow process is performed.

尚、ここでいう最終焼鈍とは、最終圧延後の歪取り焼
鈍は含まない。したがつて、最終焼鈍後にばね特性等の
改善のため、適宜歪取り焼鈍などを行つてもさしつかえ
ない。
Here, the final annealing does not include the strain relief annealing after the final rolling. Therefore, it is possible to appropriately perform strain relief annealing or the like after the final annealing in order to improve spring characteristics and the like.

課題を解決するための手段 銅又は銅合金材料は、焼鈍工程で生じた表面酸化物の
除去や表面欠陥の除去のため、バフ等により機械研摩さ
れた後、仕上げ圧延されるのが通例である。ところが、
材料がバフ等により機械研摩されると研摩方向に微小な
条痕、いわゆる研摩目が生じるが、この研摩目の研摩方
向に直角の断面プロフイールは極めて鈍角的であるた
め、これを圧延すると返り状あるいはかさぶた状の欠陥
が生じる。この反り状欠陥の存在については従来より公
知であり、さらには、電子部品関係の金、銀等の貴金属
めつき母材に用いられた場合はその耐熱性を低下させる
ことが知られていた。ところが、電子部品用貴金属めつ
きの耐熱性は、めつき金属の融点よりもはるかに低い
(例えば、金、銀めつきで最高でも500℃程度)であ
り、リフロー工程で溶融状態の錫又は錫合金に発生する
ぬれ不良との相関は発生機構の観点からも現象面からも
予想だにされていなかつた。
Means for solving the problem Copper or copper alloy material is generally subjected to mechanical polishing by a buff or the like for removal of surface oxides and surface defects generated in the annealing step, and then to finish rolling. . However,
When the material is mechanically polished with a buff or the like, minute streaks, so-called polished lines, are formed in the polishing direction.The cross-sectional profile perpendicular to the polished direction of the polished line is extremely obtuse. Alternatively, a scab-like defect occurs. The existence of this warp-like defect has been known in the past, and furthermore, it has been known that when it is used for a base material for precious metals such as gold and silver for electronic components, the heat resistance thereof is reduced. However, the heat resistance of precious metal plating for electronic components is much lower than the melting point of the plating metal (for example, at most about 500 ° C for gold and silver plating). Correlation with poor wetting that occurred in the above was not expected from the viewpoint of the mechanism of occurrence and the phenomenon.

上記機構の詳細は明らかではないが、材料表面の返り
状欠陥部は、めつき工程の前処理で十分に活性化され
ず、その上に電気めつきされた錫又は錫合金をリフロー
すると、母材との界面に残留する該不活性点との相互作
用により、ぬれ不良を誘発するものと推定される。
Although the details of the above mechanism are not clear, the return defects on the material surface are not sufficiently activated in the pretreatment of the plating step, and when the electroplated tin or tin alloy is reflowed thereon, the mother board becomes defective. It is estimated that the interaction with the inactive point remaining at the interface with the material induces poor wetting.

本発明は、上記ぬれ不良の発生を防止するために、最
終焼鈍等の工程において機械研摩を省略するものである
が、そのためには、最終焼鈍の雰囲気を非酸化性として
材料表面の酸化あるいはその他雰囲気との反応を防止す
るか軽微に押さえ、酸洗のみで表面を清浄化する。
In the present invention, in order to prevent the occurrence of the above-described wetting failure, mechanical polishing is omitted in a step of final annealing or the like. To that end, the atmosphere of the final annealing is made non-oxidizing to oxidize the material surface or other Prevent or minimize reaction with the atmosphere, and clean the surface only by pickling.

非酸化性雰囲気は、水素(H2)、一酸化炭素(CO)、
アンモニア分解ガス(N2+3H2)、木炭ガス(CO+CO2
等の還元性のガス雰囲気であれば銅及び銅合金の表面は
酸化されない。本発明における非酸化性の条件として、
材料表面の酸化あるいはその他雰囲気との反応を防止す
るか軽微に押さえた最終焼鈍処理では、例えばブタン等
の石油系燃料の燃焼炉であれば、空燃比の調整により雰
囲気中の酸素の濃度を0.1%以下に低下させると、銅及
び銅合金の酸化の程度は軽微で、採用可能な条件であ
る。この程度の酸化膜であれば、酸洗10%硫酸+1%過
酸化水素の混酸等を用いた数秒の軽度の酸洗で除去でき
るため、バフ等により機械的に材料表面を研摩しなくて
も清浄な銅又は銅合金の表面が得られる。
Non-oxidizing atmospheres include hydrogen (H 2 ), carbon monoxide (CO),
Ammonia decomposition gas (N 2 + 3H 2 ), charcoal gas (CO + CO 2 )
In the case of a reducing gas atmosphere such as that described above, the surfaces of copper and copper alloy are not oxidized. As the non-oxidizing conditions in the present invention,
In the final annealing treatment in which oxidation of the material surface or other reaction with the atmosphere is prevented or slightly suppressed, for example, in the case of a combustion furnace for petroleum fuel such as butane, the concentration of oxygen in the atmosphere is adjusted to 0.1 by adjusting the air-fuel ratio. %, The degree of oxidation of copper and copper alloy is slight, which is an acceptable condition. With an oxide film of this degree, it can be removed by light pickling for several seconds using a mixed acid of pickling 10% sulfuric acid + 1% hydrogen peroxide or the like, so that the material surface is not mechanically polished with a buff or the like. A clean copper or copper alloy surface is obtained.

ただし、本発明は、その後の仕上げ圧延の条件につい
ては何ら制限されない。
However, in the present invention, the conditions for the subsequent finish rolling are not limited at all.

上記処理を行つた後、めつき工程で用いる錫合金とし
ては、鉛との合金、いわゆる半田めつきを代表的なもの
として例示し得るが、その他にビスマス、アンチモン等
の低融点でリフロー可能な錫合金皮膜も有効に用い得
る。
After performing the above treatment, as a tin alloy used in the plating step, an alloy with lead, so-called solder plating can be exemplified as a typical one, but in addition, bismuth, antimony and the like can be reflowed at a low melting point. Tin alloy films can also be used effectively.

以下、実施例により本発明を具体的に説明する。 Hereinafter, the present invention will be described specifically with reference to examples.

本発明では、非酸化雰囲気下に最終焼鈍を行い、機械
研磨による条痕を材料に生じさせることなく熱処理工程
を終えることができるために錫めっき材表面は、全面均
一な光沢面を有し、ぬれ不良は認められず、均一で半田
付け性の優れためっき皮膜が得られる。
In the present invention, the final annealing is performed in a non-oxidizing atmosphere, and since the heat treatment step can be completed without causing a streak due to mechanical polishing on the material, the surface of the tin-plated material has a uniform glossy surface over the entire surface, No poor wetting is observed, and a uniform plating film having excellent solderability is obtained.

これに対して酸化雰囲気下に最終焼鈍を行ったときに
は、不均一な酸化皮膜が形成されるので、この皮膜の除
去のためにバフによる表面研磨が不可欠であり、このた
め錫めっき材表面は、全面ぬれ不良を呈し、部分的に半
田はじきも認められた。
On the other hand, when the final annealing is performed in an oxidizing atmosphere, a non-uniform oxide film is formed. Therefore, surface removal by a buff is indispensable to remove the film, and therefore, the surface of the tin-plated material is The entire surface exhibited poor wetting, and solder repelling was partially observed.

実施例 錫0.8wt%、りん0.1wt%、残部が銅から成るりん青銅
の0.3mm厚の冷間圧延材を、非酸化性雰囲気で650℃×2h
rの熱処理を施した。
Example Cold-rolled 0.3 mm-thick phosphor bronze consisting of 0.8 wt% tin, 0.1 wt% phosphorus, and the balance copper was 650 ° C x 2 hours in a non-oxidizing atmosphere.
Heat treatment of r was performed.

次いで、上記熱処理したものを冷間圧延により0.2mm
厚のりん青銅板を作成した。このりん青銅板を一般的条
件で脱脂、酸洗後、硫酸浴を用いて1μm厚みの無光沢
錫めつきを施した。その後、700℃の温度の電気炉中に
保持し、錫めつき層が溶融着後に炉より取り出し、クエ
ンチした。
Next, the heat-treated one was subjected to cold rolling by 0.2 mm.
A thick phosphor bronze plate was made. The phosphor bronze plate was degreased and pickled under general conditions, and then subjected to a 1 μm thick matte tin plating using a sulfuric acid bath. Then, it was kept in an electric furnace at a temperature of 700 ° C., and after the tin-plated layer had been fused, it was taken out of the furnace and quenched.

このようにして作成した錫めつき材表面は、全面均一
な光沢面を有し、ぬれ不良は認められなかつた。又、MI
L−STD−202E−208Cの条件で半田付試験に供したが、半
田付浸漬面全面が良好な濡れを示した。
The surface of the tin-plated material thus prepared had a uniform glossy surface, and no poor wetting was observed. Also, MI
When subjected to a soldering test under the conditions of L-STD-202E-208C, the entire surface immersed in the solder showed good wetting.

比較例 実施例で用いたと同じ0.3mm厚のりん青銅板を大気雰
囲気で650℃×2hrの熱処理を施した後、#3000のスコツ
チバフで表面を研摩し、酸化スケールを除去した。この
後冷間圧延により0.2mm厚のりん青銅板を作成した。こ
のようにして作成したりん青銅板を実施例に記載したと
同一条件で錫を電気めつき後リフロー処理した。
Comparative Example The same phosphor bronze plate having a thickness of 0.3 mm as used in the example was subjected to a heat treatment at 650 ° C. for 2 hours in an air atmosphere, and the surface was polished with a # 3000 Scotch buff to remove oxide scale. Thereafter, a phosphor bronze plate having a thickness of 0.2 mm was formed by cold rolling. The phosphor bronze plate thus prepared was electroplated with tin under the same conditions as described in the examples, and then subjected to a reflow treatment.

こうして作成した錫めつき材表面は、全面ぬれ不良を
呈した。さらに実施例1と同一条件の半田付試験に供し
たが、部分的には半田はじきが認められた。
The surface of the tin-plated material thus produced exhibited poor wetting over the entire surface. Further, the sample was subjected to a soldering test under the same conditions as in Example 1, but solder repelling was partially observed.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】銅又は銅合金を母材としたリフロー錫又は
錫合金めっき材の製造方法において、銅又は銅合金に対
して、雰囲気を非酸化性として材料表面の酸化あるいは
その他の雰囲気との反応を防止するか軽微に押さえた条
件下に最終焼鈍処理を行い、それ以降の工程において表
面を機械研磨することなく、圧延した後に得られる銅又
は銅合金母材に電気めっきを施した後にリフロー処理す
ることを特徴とするリフロー錫又は錫合金めっき材の製
造方法。
In a method for producing a reflow tin or tin alloy plating material using copper or a copper alloy as a base material, the atmosphere of the copper or copper alloy is made non-oxidizing so that the surface of the material is oxidized or is exposed to another atmosphere. The final annealing treatment is performed under the condition that the reaction is prevented or slightly suppressed, and the surface is not mechanically polished in the subsequent steps, and the copper or copper alloy base material obtained after rolling is electroplated and then reflowed A method for producing a reflow tin or tin alloy plated material, characterized by treating.
JP62316314A 1987-12-16 1987-12-16 Method for producing reflow tin or tin alloy plated material using copper or copper alloy as base material Expired - Lifetime JP2587258B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62316314A JP2587258B2 (en) 1987-12-16 1987-12-16 Method for producing reflow tin or tin alloy plated material using copper or copper alloy as base material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62316314A JP2587258B2 (en) 1987-12-16 1987-12-16 Method for producing reflow tin or tin alloy plated material using copper or copper alloy as base material

Publications (2)

Publication Number Publication Date
JPH01159397A JPH01159397A (en) 1989-06-22
JP2587258B2 true JP2587258B2 (en) 1997-03-05

Family

ID=18075753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62316314A Expired - Lifetime JP2587258B2 (en) 1987-12-16 1987-12-16 Method for producing reflow tin or tin alloy plated material using copper or copper alloy as base material

Country Status (1)

Country Link
JP (1) JP2587258B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19748306A1 (en) * 1997-10-31 1999-05-06 Stolberger Metallwerke Gmbh Process for producing an electrically conductive metallic tape
DE102010054539A1 (en) 2010-12-15 2012-06-21 OTB Oberflächentechnik in Berlin GmbH & Co. KG Method for producing a workpiece made of copper or a copper alloy with a coating
JP5393739B2 (en) * 2011-08-01 2014-01-22 Jx日鉱日石金属株式会社 Cu-Ni-Si alloy tin plating strip

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6017838B2 (en) * 1981-03-31 1985-05-07 玉川機械金属株式会社 Method for manufacturing Cu and Cu alloy plates and strips to which metal plating is applied

Also Published As

Publication number Publication date
JPH01159397A (en) 1989-06-22

Similar Documents

Publication Publication Date Title
JP4522970B2 (en) Cu-Zn alloy heat resistant Sn plating strip with reduced whisker
KR20090021100A (en) Conductive material for a connecting part
JP3481392B2 (en) Electronic component lead member and method of manufacturing the same
JP2007039804A (en) Copper alloy for electronic apparatus and method of producing the same
JP2002317295A (en) REFLOW TREATED Sn ALLOY PLATING MATERIAL AND FIT TYPE CONNECTING TERMINAL USING THE SAME
JP2007314859A (en) Cu-Zn ALLOY STRIP WITH EXCELLENT RESISTANCE TO THERMAL PEELING OF Sn PLATING, AND Sn-PLATED STRIP THEREOF
JPH11222659A (en) Process for producing metal composite strip
JPH04329891A (en) Tin plated copper alloy material and its production
JP2001107290A (en) Tinned bar stock for electronic parts and its producing method
JP2007092173A (en) Cu-Ni-Si-Zn BASED ALLOY TINNED STRIP
JP2587258B2 (en) Method for producing reflow tin or tin alloy plated material using copper or copper alloy as base material
JP2670348B2 (en) Sn or Sn alloy coating material
JP5226032B2 (en) Cu-Zn alloy heat resistant Sn plating strip with reduced whisker
JP2007051370A (en) Cu-zn-sn alloy strip excellent in heat-peeling resistance of sn plating and sn-plated strip made of the same
JP2006283149A (en) Surface treatment method for copper or copper alloy, surface-treated material, and electronic component using the same
JPS6372895A (en) Production of parts for electronic and electrical equipment
US20230111976A1 (en) Terminal material for connector
TW202142704A (en) Cu-Ni-Si-based copper alloy plate, film-plated Cu-Ni-Si-based copper alloy plate, and production method for cu-ni-si-based copper alloy plate and film-plated Cu-Ni-Si-based copper alloy plate
JPH0510439B2 (en)
JP2000030558A (en) Electric contact material and its manufacture
JP4570948B2 (en) Sn-plated strip of Cu-Zn alloy with reduced whisker generation and method for producing the same
JPH02145794A (en) Copper or copper alloy material plated with tin or solder reflowed and excellent in thermal peeling resistance
JPH0520949A (en) Electric contact point material and manufacture thereof
JPH10265973A (en) Production of copper alloy material for electronic parts having good silver plating property
JPH06235088A (en) Steel products for electronic parts and their production

Legal Events

Date Code Title Description
S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20071205

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081205

Year of fee payment: 12

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081205

Year of fee payment: 12