JP2584187B2 - Cleaning equipment - Google Patents
Cleaning equipmentInfo
- Publication number
- JP2584187B2 JP2584187B2 JP5270362A JP27036293A JP2584187B2 JP 2584187 B2 JP2584187 B2 JP 2584187B2 JP 5270362 A JP5270362 A JP 5270362A JP 27036293 A JP27036293 A JP 27036293A JP 2584187 B2 JP2584187 B2 JP 2584187B2
- Authority
- JP
- Japan
- Prior art keywords
- steam
- cleaning
- cleaning chamber
- work
- supply member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は洗浄装置、詳しくは、油
分等が付着した複雑な形状を有する機械部品等（以下、
ワークと言う）を有機溶剤で蒸気洗浄するための洗浄装
置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device, and more particularly, to a machine part having a complicated shape to which oil and the like are adhered (hereinafter, referred to as a "machine").
(Hereinafter referred to as "work") with an organic solvent.
【０００２】[0002]
【従来の技術】従来、この種の洗浄装置としては、特開
昭５４−１１３９６５号公報、実開昭６３−１９３５８
８号公報等に開示されているように、気密構造の洗浄室
と、この洗浄室へ配管により連通する有機溶剤蒸気発生
タンク（以下、蒸気発生タンクと言う）と、前記洗浄室
内を排気する真空ポンプとで構成されているものが知ら
れている。この洗浄装置では、洗浄室内に蒸気発生タン
クから有機溶剤蒸気（以下、蒸気と言う）を供給する。
供給された蒸気は洗浄室に収納されているワークの表面
に付着して結露し、やがてワーク表面から滴下すること
により洗浄を行なうものである。2. Description of the Related Art Conventionally, this type of cleaning apparatus is disclosed in Japanese Patent Application Laid-Open No. 54-113965 and Japanese Utility Model Application Laid-Open No. 63-19358.
As disclosed in Japanese Patent Application Publication No. 8 (1996) -1994, a cleaning chamber having an airtight structure, an organic solvent vapor generation tank (hereinafter, referred to as a vapor generation tank) communicating with the cleaning chamber by a pipe, and a vacuum for exhausting the cleaning chamber. A pump and a pump are known. In this cleaning apparatus, organic solvent vapor (hereinafter, referred to as vapor) is supplied from a vapor generation tank into the cleaning chamber.
The supplied steam adheres to the surface of the work housed in the cleaning room and forms dew, and then is washed by dripping from the work surface.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、前記従
来の洗浄装置では、前記のようにして蒸気がワーク表面
に接触するため、ワーク表面の温度が徐々に上昇し、や
がてワークの表面温度が蒸気温度と等しくなって液化が
停止し、それ以上蒸気洗浄を行なうことができず、洗浄
時間が不足して洗浄不良になることがあった。したがっ
て、本発明は、簡単な機構を付加することによりワーク
表面の温度上昇を制御して十分に蒸気洗浄を行なうこと
ができ、しかも、洗浄工程から直ちに真空乾燥工程に移
行することができる洗浄装置を提供することを目的とす
る。However, in the conventional cleaning apparatus, since the steam comes into contact with the surface of the work as described above, the temperature of the work surface gradually increases, and the surface temperature of the work eventually becomes the steam temperature. And liquefaction stopped, steam cleaning could not be performed any more, and cleaning time was insufficient, resulting in poor cleaning. Therefore, the present invention provides a cleaning apparatus capable of controlling the temperature rise on the surface of a workpiece by adding a simple mechanism and sufficiently performing steam cleaning, and further allowing a transition from the cleaning step to a vacuum drying step immediately. The purpose is to provide.
【０００４】[0004]
【課題を解決するための手段】本発明は、前記目的を達
成するために、請求項１は、気密構造であって蒸気流通
可能なワーク載置部材を備えた洗浄室と、該洗浄室に配
管にて連通した有機溶剤蒸気発生タンクと、前記洗浄室
内を排気する真空ポンプとで構成した洗浄装置におい
て、前記洗浄室内のワーク上方に熱媒体供給部材を配設
し、該熱媒体供給部材に冷却媒体と加熱媒体とを選択的
に供給できるようにしたものである。請求項２は、前記
有機溶剤蒸気発生タンク内を、蒸気発生槽と廃液回収槽
とに区分し、前記２つの槽をそれぞれ洗浄室と配管によ
り連通したものである。According to the present invention, in order to achieve the above object, a cleaning chamber having an airtight structure and a work mounting member through which steam can flow is provided. In a cleaning apparatus including an organic solvent vapor generation tank connected by a pipe and a vacuum pump for exhausting the cleaning chamber, a heating medium supply member is disposed above a work in the cleaning chamber, and the heating medium supply member The cooling medium and the heating medium can be selectively supplied. According to a second aspect of the present invention, the inside of the organic solvent vapor generation tank is divided into a vapor generation tank and a waste liquid recovery tank, and the two tanks are connected to each other by a washing chamber and a pipe.
【０００５】[0005]
【実施例】つぎに、本発明の実施例を図にしたがって説
明する。図１は、本発明にかかる洗浄装置の第１実施例
を示し、大略、洗浄室１と、熱媒体供給部材３と、蒸気
発生タンク４と、真空ポンプ６とからなる。前記洗浄室
１は、気密構造からなり、内部には蒸気流通可能なワー
ク載置部材８を備え、かつ、装入扉２を有するととも
に、室内上方に熱媒体供給部材３を備えている。Next, an embodiment of the present invention will be described with reference to the drawings. FIG. 1 shows a first embodiment of a cleaning apparatus according to the present invention, which generally includes a cleaning chamber 1, a heat medium supply member 3, a steam generation tank 4, and a vacuum pump 6. The cleaning chamber 1 has an airtight structure, has a work placement member 8 through which steam can flow, has a charging door 2, and has a heat medium supply member 3 above the room.
【０００６】前記熱媒体供給部材３はフイン構造の管か
らなり、前記熱媒体供給部材３の入口側には開閉弁Ｖ1
を有する冷却媒体供給管Ｐ1が、一方、出口側には流量
調節弁Ｖｃを有する配管Ｐ4が接続されて熱媒体供給部
材３内に冷却媒体を流入できるようになっている。ま
た、スチームあるいは熱風等の加熱媒体を供給する加熱
媒体供給管Ｐ2を前記冷却媒体供給管Ｐ1から開閉弁Ｖ2
を介して分岐している。The heat medium supply member 3 is formed of a tube having a fin structure, and an opening / closing valve V 1 is provided at the inlet side of the heat medium supply member 3.
Cooling medium supply pipe P 1 having, on the other hand, has to be able to flow into the cooling medium by piping P 4 is connected to the heat medium supply member 3 having a flow control valve Vc is on the outlet side. Moreover, the on-off valve V 2 the heating medium supply pipe P 2 supplies a heating medium such as steam or hot air from the cooling medium supply pipe P 1
Branch through.
【０００７】前記蒸気発生タンク４は、前記洗浄室１の
下方に配設され、内部に有機溶剤Ｓを加熱するヒータ５
を備えるとともに、上部は洗浄室１の底部と蒸気導入弁
Ｖ3および液戻弁Ｖ4を介して連通している。The steam generation tank 4 is disposed below the cleaning chamber 1 and has a heater 5 for heating the organic solvent S therein.
Provided with a upper communicates through the bottom and the steam introduced cleaning chamber 1 valve V 3 and Ekimodoben V 4.
【０００８】前記真空ポンプ６は配管Ｐ3を介して洗浄
室１内を排気するもので、大気開放弁Ｖａ，主排気弁Ｖ
ｂ，コンデンサ７を介して洗浄室１内に連通している。[0008] The vacuum pump 6 is intended to exhaust the cleaning chamber 1 through the pipe P 3, the air release valve Va, the main exhaust valves V
b, It communicates with the inside of the cleaning chamber 1 via the condenser 7.
【０００９】つぎに、前記構成からなる洗浄装置の操業
について説明する。まず、装入扉２を開き、ワークＷを
洗浄室１内の載置部材８上に装入して装入扉２を閉じ
る。ついで、真空ポンプ６を駆動するとともに主排気弁
Ｖｂを開として、洗浄室１内を１０Ｔｏｒｒ以下に排気
したのち、主排気弁Ｖｂを閉じ、これと同時に開閉弁Ｖ
1および流量調整弁Ｖｃを開として熱媒体供給部材３の
内部に冷却媒体を流入する。そして、前記蒸気導入弁Ｖ
3および液戻弁Ｖ4を開くことで、蒸気発生タンク４内で
発生している蒸気は蒸気導入弁Ｖ3から洗浄室１内に圧
力差により導入される。導入された蒸気はワークＷの表
面温度が低いため結露し、この結露がワーク全表面に及
んで成長して滴下することにより蒸気洗浄が行なわれ
る。Next, the operation of the cleaning apparatus having the above configuration will be described. First, the loading door 2 is opened, the work W is loaded on the placing member 8 in the cleaning chamber 1 and the loading door 2 is closed. Next, the vacuum pump 6 is driven, the main exhaust valve Vb is opened, and the inside of the cleaning chamber 1 is evacuated to 10 Torr or less. Then, the main exhaust valve Vb is closed.
1 and the flow control valve Vc are opened to allow the cooling medium to flow into the heat medium supply member 3. And the steam introduction valve V
3 and Ekimodoben V 4 by opening the steam that is generated in the vapor generating tank 4 is introduced by a pressure difference in the cleaning chamber 1 from the steam inlet valve V 3. The introduced steam is dewed because the surface temperature of the work W is low, and the dew grows over the entire surface of the work and is dropped to perform steam cleaning.
【００１０】ところで、蒸気がワークＷの表面に付着す
ることによりワークＷの表面温度も徐々に上昇し、ワー
ク温度が蒸気温度と等しくなり、かつ、飽和蒸気圧と洗
浄室１内の圧力とが等しくなれば、前記蒸気洗浄は不能
となる（従来技術）が、前記熱媒体供給部材３には冷却
媒体が流入しており、常に、蒸気温度より熱媒体供給部
材３の温度が低く保持されているため、前記洗浄室１に
導入された蒸気は熱媒体供給部材３に触れて液化し、こ
の液滴はワークＷ上に滴下する。この液滴はワークＷの
表面温度を蒸気温度未満に冷却するため、前記蒸気洗浄
は継続されることになる。また、ワークＷは前記熱媒体
供給部材３からの液滴により、いわゆるシャワー洗浄が
付加されるため、洗浄効果をより一層向上させる。な
お、洗浄室１の底部に滴下した有機溶剤Ｓは液戻弁Ｖ4
から蒸気発生タンク４内に戻る。[0010] By the way, the surface temperature of the work W gradually rises due to the steam adhering to the surface of the work W, the work temperature becomes equal to the steam temperature, and the saturated steam pressure and the pressure in the cleaning chamber 1 are reduced. If they are equal, the steam cleaning becomes impossible (prior art), but the cooling medium flows into the heat medium supply member 3 and the temperature of the heat medium supply member 3 is always kept lower than the steam temperature. Therefore, the vapor introduced into the cleaning chamber 1 comes into contact with the heat medium supply member 3 to be liquefied, and the droplets drop onto the work W. Since the droplet cools the surface temperature of the work W below the vapor temperature, the vapor cleaning is continued. Further, the work W is subjected to so-called shower cleaning by droplets from the heat medium supply member 3, so that the cleaning effect is further improved. The organic solvent S dropped on the bottom of the cleaning chamber 1 is supplied to the liquid return valve V 4.
And returns to the steam generation tank 4.
【００１１】前述のようにして、ワークＷの表面が十分
に洗浄されると、開閉弁Ｖ1を閉として熱媒体供給部材
３への冷却媒体の供給を停止した後、開閉弁Ｖ2を開と
することにより加熱媒体を供給して、熱媒体供給部材３
を蒸気温度以上に直ちに昇温させて蒸気の液化を停止す
る一方、蒸気の洗浄室１内への供給を継続してワークＷ
を蒸気加熱する。そして、所定時間、蒸気加熱を行なっ
た後、蒸気導入弁Ｖ3および液戻弁Ｖ4を各々閉としたの
ち、主排気弁Ｖｂを開き、真空ポンプ６を作動すること
により洗浄室１内を減圧し、ワークＷの乾燥工程を行な
う。この洗浄室１から吸引した蒸気はコンデンサ７で液
化され、再生された後、再使用される。[0011] As described above, the surface of the workpiece W is sufficiently washed, the opening and closing valve V 1 to stop the supply of the cooling medium to the heat medium supply member 3 is closed, the on-off valve V 2 opens By supplying the heating medium, the heating medium supply member 3
Is immediately raised to a temperature equal to or higher than the steam temperature to stop the liquefaction of the steam, and the supply of the steam into the cleaning chamber 1 is continued to continue the work W
Is steam heated. Then, a predetermined time, after performing steam heating, after the respective closing the steam inlet valve V 3 and Ekimodoben V 4, opens the main exhaust valve Vb, the cleaning chamber 1 by operating the vacuum pump 6 The pressure is reduced and the work W is dried. The vapor sucked from the cleaning chamber 1 is liquefied by the condenser 7, regenerated, and reused.
【００１２】乾燥工程が終了すると、前記開閉弁Ｖ2を
閉とするとともに真空ポンプ６の運転を停止し、主排気
弁Ｖｂを閉、大気開放弁Ｖａを開として洗浄室１内を復
圧し、装入扉２を開いてワークＷを取り出し、ワークＷ
の洗浄を完了する。以下、前記同様工程にてつぎのワー
クＷを洗浄する。なお、前記全工程において、洗浄室１
はヒータ９にて保温されている。[0012] Drying step is completed, the on-off valve V 2 to stop the operation of the vacuum pump 6 with a closed, pressure was regained the cleaning chamber 1 to the main exhaust valve Vb is closed, the air release valve Va is opened, Open the charging door 2 and take out the work W.
Complete the washing. Hereinafter, the next work W is washed in the same steps as described above. In all of the above steps, the cleaning chamber 1
Are kept warm by the heater 9.
【００１３】前記実施例のものでは、洗浄室１で液化し
た有機溶剤Ｓは蒸気発生タンク４に戻されるため、加熱
有機溶剤温度が低下し、加熱効率が悪いとともに、安定
した蒸気の供給が行なえないことがある。したがって、
図２に示すように、蒸気発生タンク４を２槽に区分し、
一方を蒸気発生槽４Ａ，他方を廃液回収槽４Ｂとに分離
し、蒸気発生槽４Ａでの加熱効率の向上と安定した蒸気
の供給とを行なうようにしてもよい。その他、図１と同
一部分には同一符号を付して説明を省略する。なお、廃
液回収槽４Ｂの上部は開閉弁Ｖ7を介して真空ポンプ６
の配管Ｐ3に連通し、槽内を減圧して廃液の回収効率を
上げるようにしてある。In the above embodiment, since the organic solvent S liquefied in the cleaning chamber 1 is returned to the steam generating tank 4, the temperature of the heated organic solvent is lowered, the heating efficiency is poor, and a stable supply of steam can be performed. There may not be. Therefore,
As shown in FIG. 2, the steam generation tank 4 is divided into two tanks,
One may be separated into the steam generation tank 4A and the other into the waste liquid recovery tank 4B, so that the heating efficiency in the steam generation tank 4A and the stable supply of steam may be performed. In addition, the same parts as those in FIG. The vacuum pump 6 the upper portion of the waste liquid collecting tank. 4B via an on-off valve V 7
Communicates with the pipe P 3, are to the inside of the tank to increase the recovery efficiency of the waste under reduced pressure.
【００１４】また、加熱媒体供給管Ｐ2を設けることな
く、冷却媒体供給管Ｐ1に、ヒータ等の加熱手段（図示
せず）を付設し、蒸気洗浄が終了すると、加熱手段によ
り冷却媒体を加熱するようにしてもよい。さらに、図３
に示すように、流量調整弁Ｖｃの一次側に配管にて分岐
させた開閉弁Ｖ6を設け、冷却媒体の供給を停止する場
合、開閉弁Ｖ1を閉じて冷却媒体の供給を停止するとと
もに、開閉弁Ｖ6を開として熱媒体供給部材３内の冷却
媒体を排出し、熱媒体供給部材３の昇温時間を短縮する
ようにしてもよい。さらにまた、図４に示すように、熱
媒体供給部材３の下方に金網等の多孔板１０を設置し
て、液滴がワークＷに対して均一に滴下するようにして
も良いし、また、洗浄室１内を排気する開閉弁Ｖｄを有
するバイパス排気管Ｐ5を主排気弁Ｖｂの２次側に設け
ておき、蒸気洗浄時および蒸気加熱時に前記開閉弁Ｖｄ
を開にして、真空ポンプ６を駆動して洗浄室１内の蒸気
が一定方向の流れを形成するようにしても良い。Further, without providing the heating medium supply pipe P 2, to the coolant supply pipe P 1, and attaching a heating means such as a heater (not shown), the steam cleaning is completed, the cooling medium by the heating means You may make it heat. Further, FIG.
As shown in, the on-off valve V 6 which is branched to the primary side of the flow control valve Vc at pipe provided, to stop the supply of the cooling medium stops the supply of the cooling medium by closing the on-off valve V 1 the cooling medium of the heat medium in the supply member 3 is discharged off valve V 6 is opened, it may be shortened heating time of the heating medium supply member 3. Further, as shown in FIG. 4, a perforated plate 10 such as a wire mesh may be provided below the heat medium supply member 3 so that the liquid droplets are uniformly dropped on the work W. a bypass exhaust pipe P 5 having an opening and closing valve Vd for evacuating the cleaning chamber 1 may be provided on the secondary side of the main exhaust valve Vb, the on-off valve Vd at the time of vapor washing and steam heating
May be opened, and the vacuum pump 6 may be driven so that the steam in the cleaning chamber 1 forms a flow in a certain direction.
【００１５】[0015]
【発明の効果】以上の説明で明らかなように、請求項１
の発明においては、蒸気洗浄工程において、洗浄室内に
配設した熱媒体供給部材に冷却媒体を供給するため、有
機溶剤蒸気は熱媒体供給部材で液化してワークに滴下
し、蒸気によるワークの表面温度上昇を抑制するため、
従来の洗浄装置に比べて洗浄時間を任意に調節でき、ど
のようなワークをも十分に洗浄することができる。しか
も、従来の蒸気洗浄に加えて、熱媒体供給部材から滴下
する液化溶剤でも洗浄されるため、いわゆるシャワー洗
浄も行なわれることになり、洗浄効果は従来のものに比
べて著しく向上することができる。さらに蒸気洗浄完了
後、直ちに加熱媒体の供給に切り換えることにより、熱
媒体供給部材の温度が速やかに低温から高温に切り換え
られるため、蒸気洗浄から次工程である蒸気加熱工程に
短時間で移行でき、洗浄処理時間を短縮することができ
る。請求項２の発明によれば、蒸気発生槽には低温の液
化有機溶剤が混入しないため、有機溶剤の加熱効率が向
上するとともに、蒸気発生が安定し、洗浄効果を向上す
ることができる。As is apparent from the above description, claim 1
According to the invention, in the steam cleaning step, the organic solvent vapor is liquefied by the heat medium supply member and dropped on the work in order to supply the cooling medium to the heat medium supply member disposed in the cleaning chamber, and the surface of the work by the steam is used. To suppress the temperature rise,
The cleaning time can be arbitrarily adjusted as compared with the conventional cleaning apparatus, and any work can be sufficiently cleaned. Moreover, in addition to the conventional steam cleaning, the cleaning is also performed with the liquefied solvent dropped from the heat medium supply member, so that so-called shower cleaning is also performed, and the cleaning effect can be significantly improved as compared with the conventional one. . Further, immediately after the completion of the steam cleaning, by immediately switching to the supply of the heating medium, the temperature of the heating medium supply member is quickly switched from low to high, so that it is possible to quickly shift from the steam cleaning to the next steam heating step, The cleaning processing time can be shortened. According to the second aspect of the present invention, since the low-temperature liquefied organic solvent is not mixed into the steam generation tank, the heating efficiency of the organic solvent is improved, the steam generation is stabilized, and the cleaning effect can be improved.
【図１】 本発明にかかる洗浄装置の概略断面図。FIG. 1 is a schematic sectional view of a cleaning apparatus according to the present invention.
【図２】 他の実施例を示す概略断面図。FIG. 2 is a schematic sectional view showing another embodiment.
【図３】 熱媒体供給部材の他の実施例を示す図。FIG. 3 is a view showing another embodiment of the heat medium supply member.
【図４】 図１の変形例を示す概略断面図。FIG. 4 is a schematic sectional view showing a modification of FIG. 1;
１…洗浄室、２…装入扉、３…熱媒体供給部材、４…蒸
気発生タンク、４Ａ…蒸気発生槽、４Ｂ…廃液回収槽、
５…ヒータ、６…真空ポンプ、Ｖｂ…主排気弁、Ｖ3…
蒸気導入弁、Ｖ4…液戻弁、Ｓ…有機溶剤、Ｗ…ワー
ク。DESCRIPTION OF SYMBOLS 1 ... Cleaning room, 2 ... Charging door, 3 ... Heat medium supply member, 4 ... Steam generation tank, 4A ... Steam generation tank, 4B ... Waste liquid recovery tank,
5 ... heater, 6 ... vacuum pump, Vb ... the main exhaust valve, V 3 ...
Vapor introduction valve, V 4 ... liquid return valve, S ... organic solvent, W ... work.
フロントページの続き (56)参考文献 特開 昭53−23161（ＪＰ，Ａ) 特開 平７−47337（ＪＰ，Ａ) 特開 昭63−65987（ＪＰ，Ａ) 特開 昭50−149149（ＪＰ，Ａ) 特開 平３−47576（ＪＰ，Ａ) 特開 平２−303028（ＪＰ，Ａ) 特開 平２−251285（ＪＰ，Ａ) 特開 平２−59086（ＪＰ，Ａ) 特開 昭60−125202（ＪＰ，Ａ) 特開 平３−101881（ＪＰ，Ａ) 特開 昭62−279877（ＪＰ，Ａ) 特開 昭53−23161（ＪＰ，Ａ) 特開 昭54−112562（ＪＰ，Ａ) 実開 昭60−64185（ＪＰ，Ｕ) 実開 昭63−133391（ＪＰ，Ｕ) 実開 平２−66282（ＪＰ，Ｕ) 実開 昭57−199001（ＪＰ，Ｕ) 実開 昭55−76083（ＪＰ，Ｕ) 特公 昭53−26423（ＪＰ，Ｂ２) 特公 平４−34474（ＪＰ，Ｂ２) 特公 昭63−12146（ＪＰ，Ｂ２) 特公 平７−29091（ＪＰ，Ｂ２) 実公 平５−29113（ＪＰ，Ｙ２) 実公 昭50−2503（ＪＰ，Ｙ２) 実公 昭49−32857（ＪＰ，Ｙ２)Continuation of front page (56) References JP-A-53-23161 (JP, A) JP-A-7-47337 (JP, A) JP-A-63-65987 (JP, A) JP-A-50-149149 (JP, A) JP-A-3-47576 (JP, A) JP-A-2-303028 (JP, A) JP-A-2-251285 (JP, A) JP-A-2-59086 (JP, A) JP 60-125202 (JP, A) JP-A-3-101881 (JP, A) JP-A-62-279877 (JP, A) JP-A-53-23161 (JP, A) JP-A-54-112562 (JP, A) A) Fully open sho 60-64185 (JP, U) Fully open sho 63-133391 (JP, U) Fully open Hei 2-66282 (JP, U) Fully open 1979-199001 (JP, U) Really open Showa 55 -76083 (JP, U) JP-B-53-24423 (JP, B2) JP-B 4-34474 (JP, B2) JP-B, 63-12146 (JP, B2) JP-B 7-29091 (JP, B2) ) Jiko 5-29113 (JP, Y2) Jiko 50-503 (JP, Y2) Jiko 49-32857 (J , Y2)
Claims (2)
載置部材を備えた洗浄室と、該洗浄室に配管にて連通し
た有機溶剤蒸気発生タンクと、前記洗浄室内を排気する
真空ポンプとで構成した洗浄装置において、前記洗浄室
内のワーク上方に熱媒体供給部材を配設し、該熱媒体供
給部材に冷却媒体と加熱媒体とを選択的に供給できるよ
うにしたことを特徴とする洗浄装置。A cleaning chamber having an airtight structure and a work mounting member through which vapor can flow, an organic solvent vapor generation tank connected to the cleaning chamber by a pipe, and a vacuum pump for exhausting the cleaning chamber. Wherein a heating medium supply member is disposed above the work in the cleaning chamber, and a cooling medium and a heating medium can be selectively supplied to the heating medium supply member. apparatus.
発生槽と廃液回収槽とに区分し、前記２つの槽をそれぞ
れ洗浄室と配管により連通したことを特徴とする前記請
求項１に記載の洗浄装置。2. The method according to claim 1, wherein the inside of the organic solvent vapor generation tank is divided into a vapor generation tank and a waste liquid recovery tank, and the two tanks are respectively connected to a cleaning chamber and a pipe. Cleaning equipment.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5270362A JP2584187B2 (en) | 1993-10-28 | 1993-10-28 | Cleaning equipment |
| TW84103944A TW257697B (en) | 1993-10-28 | 1995-04-21 | Cleaning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5270362A JP2584187B2 (en) | 1993-10-28 | 1993-10-28 | Cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07116616A JPH07116616A (en) | 1995-05-09 |
| JP2584187B2 true JP2584187B2 (en) | 1997-02-19 |
Family
ID=17485218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5270362A Expired - Lifetime JP2584187B2 (en) | 1993-10-28 | 1993-10-28 | Cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2584187B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2742238B2 (en) | 1995-03-16 | 1998-04-22 | 中外炉工業株式会社 | Cleaning equipment using organic solvents |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8540821B2 (en) | 2004-03-26 | 2013-09-24 | Maasland N.V. | Teat cup cleaning device and method |
| NL1033100C2 (en) * | 2006-12-21 | 2008-06-24 | Maasland Nv | Teat cup cleaning device has heating unit that is designed to heat contents of heating chamber which is filled with amount of cleaning liquid by filling device |
| DE602007005445D1 (en) * | 2006-12-21 | 2010-05-06 | Maasland Nv | Cleaning device for a milking cup and corresponding method |
| NL1034963C2 (en) | 2007-05-24 | 2008-11-25 | Maasland Nv | Teat cup cleaning device and method. |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4932857U (en) * | 1972-06-26 | 1974-03-22 | ||
| JPS50149149A (en) * | 1974-05-21 | 1975-11-29 | ||
| JPS5323161A (en) * | 1976-08-14 | 1978-03-03 | Takao Ida | Solvent washer of vapor layer moving type |
| JPS5326423A (en) * | 1976-08-23 | 1978-03-11 | Shigeharu Kuroda | Barrlike blank used for lattice* etc* |
| JPH0767552B2 (en) * | 1986-05-29 | 1995-07-26 | 株式会社日立製作所 | Cleaning equipment |
| JPS6312146A (en) * | 1986-07-02 | 1988-01-19 | Nec Corp | Pattern-dimension measuring apparatus |
| JPH0611435B2 (en) * | 1989-09-18 | 1994-02-16 | 山崎化学工業株式会社 | Vacuum cleaning device |
| JPH0434474A (en) * | 1990-05-30 | 1992-02-05 | Mita Ind Co Ltd | Developing device |
| JPH0529113U (en) * | 1991-09-24 | 1993-04-16 | 株式会社トーキン | Chiyoke coil |
-
1993
- 1993-10-28 JP JP5270362A patent/JP2584187B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2742238B2 (en) | 1995-03-16 | 1998-04-22 | 中外炉工業株式会社 | Cleaning equipment using organic solvents |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07116616A (en) | 1995-05-09 |
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