JP2578462B2 - Heat treatment method for metal or alloy - Google Patents
Heat treatment method for metal or alloyInfo
- Publication number
- JP2578462B2 JP2578462B2 JP63020884A JP2088488A JP2578462B2 JP 2578462 B2 JP2578462 B2 JP 2578462B2 JP 63020884 A JP63020884 A JP 63020884A JP 2088488 A JP2088488 A JP 2088488A JP 2578462 B2 JP2578462 B2 JP 2578462B2
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- heat
- treated
- alloy
- coil
- acid fluoride
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Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は、銅、銅合金、ニッケル又はニッケル・鉄合
金等の条材のコイルをバッチ炉で密着させることなく焼
鈍させる場合に好適の金属又は合金の熱処理方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a metal suitable for annealing a coil of a strip material such as copper, a copper alloy, nickel or a nickel-iron alloy without bringing it into close contact in a batch furnace. Or, it relates to a heat treatment method for an alloy.
［従来の技術］ 銅（Cu）、Cu合金、ニッケル（Ni）又はNi・鉄（Fe）
合金等の線状又は板状の条材のコイルを密着不良を発生
させることなく焼鈍する技術として、従来、コイルを連
続して巻き戻しつつ焼鈍する所謂A.Pライン又はB.Aライ
ン等の連続式焼鈍炉により焼鈍するものがある。[Prior art] Copper (Cu), Cu alloy, nickel (Ni) or Ni / iron (Fe)
Conventionally, as a technique for annealing a coil of a linear or plate-shaped strip such as an alloy without causing poor adhesion, a continuous annealing furnace such as a so-called AP line or BA line for continuously rewinding and annealing the coil. May be annealed.
しかしながら、析出処理を必要とするCu合金等は析出
のために一定の保持時間を必要とする。このため、連続
式焼鈍法では十分な保持時間をとることができないの
で、この種のコイルはバッチ式の焼鈍方法によらざるを
得ない。However, a Cu alloy or the like that requires a precipitation treatment requires a certain holding time for precipitation. For this reason, a sufficient holding time cannot be secured by the continuous annealing method, so that this type of coil is forced to use a batch annealing method.
この場合に、コイルをバッチ式の焼鈍炉により焼鈍し
ようとすると、コイル状に巻かれた条材の接触面にて相
互に密着してしまい、条材の表面不良が発生する。In this case, if the coil is to be annealed by a batch-type annealing furnace, the coils come into close contact with each other at the contact surfaces of the coil-shaped strips, resulting in a defective surface of the strips.
そこで、Siを−（SiO）ｎ−型の化合物として含有す
る油を灯油で薄めた油液をコイルの全長にわたってその
表面に塗布し、条材同士が直接的に接触しないようにし
ている。Therefore, an oil solution obtained by diluting oil containing Si as a-(SiO) n- type compound with kerosene is applied to the entire surface of the coil to prevent the strip members from directly contacting each other.
［発明が解決しようとする課題］ しかしながら、Siオイルを塗布したCu合金等のコイル
を焼鈍するとSiが酸化されてSiO2が生成し、これがCu合
金コイルの表面に付着する。そして、バッチ焼鈍後に、
酸化スケール除去のためにコイル表面を研磨すると、コ
イル表面に付着したSiO2が研磨砥石のかわりを悪化さ
せ、研磨能力を阻害する。これにより、生産性が著しく
低下すると共に、研磨量が減少するため、加熱ふくれの
原因となる条材表面のかぶさり状欠陥を除去することが
できないので製品品質も劣化させてしまう。[Problems to be Solved by the Invention] However, when a coil of a Cu alloy or the like coated with Si oil is annealed, Si is oxidized to generate SiO 2 , which adheres to the surface of the Cu alloy coil. And after batch annealing,
When the coil surface is polished to remove oxide scale, SiO 2 adhering to the coil surface deteriorates the replacement of the polishing wheel and impairs the polishing ability. As a result, the productivity is remarkably reduced, and the polishing amount is reduced. As a result, it is impossible to remove the overburden-like defects on the surface of the strip material, which causes the heat swelling, so that the product quality is deteriorated.
なお、従来、研磨処理に先立ち、コイルを硫酸水溶液
又は硫酸と過酸化水素との混合溶液により処理している
が、コイル表面のSiO2を十分に除去することは困難であ
る。Heretofore, prior to the polishing treatment, the coil is treated with a sulfuric acid aqueous solution or a mixed solution of sulfuric acid and hydrogen peroxide, but it is difficult to sufficiently remove SiO 2 from the coil surface.
このため、従来、Siオイル中のSi含有量を低下させて
コイルに塗布するか、又はSiオイルを塗布せずにコイル
を焼鈍処理している。For this reason, conventionally, the Si content in the Si oil is reduced and applied to the coil, or the coil is annealed without applying the Si oil.
しかしながら、このようにSi含有量が低い場合は、焼
鈍過程でコイルの条材間の密着が生じやすく、条材と条
材との間で局所的に密着して歩留を低下させる要因にな
っている。また、密着が生じていない部分においても、
コイル条材の表面に局所的に大量のSi酸化物が残存して
しまう。However, when the Si content is low as described above, adhesion between the coil members is likely to occur during the annealing process, which causes local adhesion between the members and lowers the yield. ing. Also, even in areas where adhesion has not occurred,
A large amount of Si oxide locally remains on the surface of the coil material.
特に、近時、Cu、Cu合金、Ni又はNi・Fe合金等のコイ
ルをバッチ炉により焼鈍する場合に、生産性の向上を図
るために、コイルの広幅化及び３トンから８トンまでの
単量の増加が促進されている。このため、Siオイルの塗
りむらが発生しやすく、また焼鈍時の熱膨張によりコイ
ルの巻き締りが起きやすくなっている。従って、このよ
うなSiオイルの塗りむら、コイルの巻き締り及びコイル
重量増加により、増々コイル条材間の密着が生じやすい
状況下にある。また、Siオイル中のSiの濃度については
厳しい管理が必要である。このため、熱処理工程が煩雑
化するという難点がある。In particular, recently, when coils such as Cu, Cu alloy, Ni or Ni-Fe alloy are annealed by a batch furnace, in order to improve productivity, the width of the coil is increased and a single coil of 3 to 8 tons is used. Increases in volume are being promoted. For this reason, the coating unevenness of the Si oil is likely to occur, and the coil is likely to be tightened due to thermal expansion during annealing. Therefore, there is a situation in which the adhesion between the coil members is more likely to occur due to such uneven coating of the Si oil, tightening of the coil, and increase in the coil weight. Strict control is required for the concentration of Si in the Si oil. For this reason, there is a problem that the heat treatment process is complicated.
本発明はかかる問題点に鑑みてなされたものであっ
て、熱処理による熱処理材相互間の密着を確実に防止す
ることができると共に、Si酸化物が付着していないコイ
ルを研磨工程に供給することができる金属又は合金の熱
処理方法を提供することを目的とする。The present invention has been made in view of such a problem, and it is possible to reliably prevent adhesion between heat-treated materials by heat treatment and to supply a coil to which a Si oxide is not attached to a polishing process. It is an object of the present invention to provide a method for heat-treating a metal or an alloy that can be used.
［課題を解決するための手段］ 本発明に係る金属又は合金の熱処理方法においては、
２重量％以上のSiを含有する油液を被熱処理材の表面に
塗布した後、被熱処理材を熱処理する。次いで、この熱
処理により生じたSi酸化物を酸性フッ化塩を含有する水
溶液により処理して除去する。[Means for Solving the Problems] In the heat treatment method for a metal or alloy according to the present invention,
After applying an oil liquid containing 2% by weight or more of Si to the surface of the heat-treated material, the heat-treated material is heat-treated. Next, the Si oxide generated by the heat treatment is removed by treatment with an aqueous solution containing an acid fluoride salt.
また、本発明をコイル状の被熱処理材の焼鈍処理に適
用した場合は、被熱処理材の表面に２重量％以上のSiを
含有する油液を塗布した後、300乃至700℃の温度で焼鈍
し、次いで、10g/以上の酸性フッ化塩を含有する水溶
液により焼鈍時に発生したSi酸化物を除去する。When the present invention is applied to annealing of a coil-shaped material to be heat-treated, an oil solution containing 2% by weight or more of Si is applied to the surface of the material to be heat-treated and then annealed at a temperature of 300 to 700 ° C. Then, the Si oxide generated at the time of annealing is removed with an aqueous solution containing 10 g / or more of an acidic fluoride.
［作用］ 本発明においては、２重量％以上の十分高い濃度のSi
を含有する油液を塗布した後、金属又は合金の被熱処理
材を熱処理するから、被熱処理材が熱処理中に局所的に
密着してしまうことが回避される。[Action] In the present invention, a sufficiently high concentration of Si of 2% by weight or more is used.
After applying the oil solution containing, the heat-treated material of the metal or alloy is heat-treated, so that the heat-treated material is prevented from being locally adhered during the heat treatment.
また、熱処理後には、酸性フッ化塩を含有する水溶液
により被熱処理材を処理し、熱処理により被熱処理材の
表面に生成したSi酸化物を除去する。これにより、例え
ば、本発明をコイルの熱処理に適用した場合は、後工程
のスケール除去の研磨工程にSi酸化物が付着していない
清浄なコイルを供給することができる。After the heat treatment, the material to be heat-treated is treated with an aqueous solution containing an acid fluoride, and Si oxide generated on the surface of the material to be heat-treated by the heat treatment is removed. Thus, for example, when the present invention is applied to heat treatment of a coil, a clean coil having no Si oxide attached thereto can be supplied in a polishing process for removing scale in a subsequent process.
［実施例］ 以下、本発明の実施例について詳細に説明する。[Examples] Hereinafter, examples of the present invention will be described in detail.
先ず、Cu、Cu合金、Ni又はNi・Fe合金等の被熱処理材
の線状又は板状の条材をコイルに巻き取る際に、この条
材の表面にSi濃度が２乃至10重量％のSi含有オイルを均
一に塗布する。First, when winding a linear or plate-shaped strip of a material to be heat-treated such as Cu, Cu alloy, Ni or Ni-Fe alloy into a coil, the surface of the strip has a Si concentration of 2 to 10% by weight. Apply Si-containing oil uniformly.
次いで、バッチ炉に被熱処理材を装入し、300乃至700
℃に加熱して被熱処理材を焼鈍する。そうすると、条材
の表面のSiオイルがSi酸化物になり、そのまま残存する
ので、条材同士の局所的な密着は回避される。Next, the material to be heat-treated is charged into a batch furnace, and 300 to 700
Heat to ℃ to anneal the material to be heat treated. Then, the Si oil on the surface of the strip becomes Si oxide and remains as it is, so that local adhesion between the strips is avoided.
Siオイル中のSi濃度は２重量％である。Si濃度が２重
量％未満の場合は、後工程の研磨工程にて研磨のかかり
方は良好であるが、焼鈍時の密着不良を十分に防止する
ことはできず、500乃至700℃という比較的高温の焼鈍処
理により局所的な密着が発生してしまう。このため、Si
濃度は２重量％以上にする。The Si concentration in the Si oil is 2% by weight. When the Si concentration is less than 2% by weight, the method of polishing in the subsequent polishing step is good, but poor adhesion during annealing cannot be sufficiently prevented. High-temperature annealing causes local adhesion. For this reason, Si
The concentration is 2% by weight or more.
このSi濃度は10重量％以下にすることが好ましい。Si
濃度を10重量％を超えて高くしても、焼鈍時の密着防止
効果は10重量％以下の場合と同等である。また、Si濃度
を高めると、処理コストが高くなると共に、後工程のSi
酸化物除去工程において酸性フッ化塩水溶液を劣化させ
てしまう。このため、Siオイル中のSi濃度は10重量％以
下にすることが好ましい。This Si concentration is preferably set to 10% by weight or less. Si
Even if the concentration is increased beyond 10% by weight, the effect of preventing adhesion during annealing is equivalent to that of 10% by weight or less. In addition, when the Si concentration is increased, the processing cost increases, and the Si
In the oxide removing step, the aqueous acid fluoride solution is deteriorated. For this reason, the Si concentration in the Si oil is preferably set to 10% by weight or less.
そして、熱処理後に酸性フッ化塩を含有する水溶液に
より被熱処理材を処理して、焼鈍により被熱処理材の表
面に生じたSi酸化物を除去する。After the heat treatment, the material to be heat-treated is treated with an aqueous solution containing an acid fluoride, and the Si oxide generated on the surface of the material to be heat-treated by annealing is removed.
このような酸性フッ化塩としては、酸性フッ化アンモ
ン、酸性フッ化カリウム又は酸性フッ化ナトリウム等が
ある。例えば、酸性フッ化アンモンNH4F・HFは下記化学
式によりSi酸化物SiO2と反応して化合物になる。Examples of such an acid fluoride salt include ammonium acid fluoride, potassium acid fluoride, and sodium acid fluoride. For example, ammonium ammonium fluoride NH 4 F · HF reacts with Si oxide SiO 2 to form a compound by the following chemical formula.
NH4F・HF→NH4F＋HF （水中で酸性フッ化アンモンが分解） SiO2＋4HF→SiF4＋2H2O （Si酸化物と反応） SiF4＋2NH4F→（NH4）2SiF6 （錯塩の生成） この場合に、常温において酸性フッ化塩MF・HF（但
し、ＭはNH3、Na、Ｋ等）の水溶液中に10秒間浸漬する
ことによりSi酸化物を完全に除去しようとすると、水溶
液中の酸性フッ化塩の含有量を10g/以上にすることが
必要である。NH 4 F ・ HF → NH 4 F + HF (ammonium fluoride decomposes in water) SiO 2 + 4HF → SiF 4 + 2H 2 O (reacts with Si oxide) SiF 4 + 2NH 4 F → (NH 4 ) 2 SiF 6 (complex salt) In this case, in order to completely remove the Si oxide by immersing it in an aqueous solution of an acidic fluoride MF / HF (where M is NH 3 , Na, K, etc.) for 10 seconds at normal temperature, It is necessary to make the content of the acid fluoride salt in the aqueous solution 10 g / or more.
次に、本発明方法により実際にコイルを製造した実施
例についてその比較例と共に説明する。Next, an example in which a coil is actually manufactured by the method of the present invention will be described together with a comparative example.
実施例１ 銅合金コイルを、冷間圧延機により上り前圧延した
後、リワインダに巻き取る際に、Si濃度が1.5乃至10重
量％のSiオイルを灯油で薄めた液をコイル表面に塗布し
た。次いで、バッチ式雰囲気ガス焼鈍炉にコイルを装入
し、500℃に２時間加熱して焼鈍した。次いで、１乃至
２重量％の酸性フッ化アンモンと、20乃至30重量％の硫
酸と、残部水とからなる混合水溶液によりコイルを酸洗
することによって、コイル表面に被膜として残存してい
るSiO2を除去した。その後、コイル表面を研磨した後、
上り圧延してコイル製品を製造した。Example 1 After a copper alloy coil was pre-rolled by a cold rolling mill and then wound around a rewinder, a liquid obtained by diluting Si oil having a Si concentration of 1.5 to 10% by weight with kerosene was applied to the coil surface. Next, the coil was charged into a batch type atmosphere gas annealing furnace, and was heated to 500 ° C. for 2 hours for annealing. Next, the coil is pickled with a mixed aqueous solution consisting of 1 to 2% by weight of ammonium acid fluoride, 20 to 30% by weight of sulfuric acid, and the remaining water, so that SiO 2 remaining as a coating on the coil surface is removed. Was removed. Then, after polishing the coil surface,
Rolled up to produce coil products.
下記第１表はSiオイル中のSiの濃度及び酸性フッ化ア
ンモン水溶液処理の有無と、焼鈍処理時の密着不良発生
の有無及びめっき加熱フクレ試験結果との関係を示す。Table 1 below shows the relationship between the concentration of Si in the Si oil and the presence / absence of the treatment with an aqueous ammonium fluoride solution, the presence / absence of poor adhesion during the annealing treatment, and the results of the plating heating blister test.
この第１表から明らかなように、SiオイルのSi濃度が
２重量％以上であって、酸性フッ化アンモン処理を施し
たものは、焼鈍時に密着不良は発生せず、めっき加熱フ
クレも生じなかった。 As is clear from Table 1, the Si oil having a Si concentration of 2% by weight or more and having been subjected to ammonium fluoride treatment does not cause poor adhesion during annealing and does not cause plating blisters. Was.
実施例２ 厚さが3.5mmであって、下記第２表に組成を示す金属
又は合金の条材の表面にSi濃度が1.5及び5.0重量％のSi
オイルを含む油液を滴下しつつ、この条材をコイルに巻
き取った。このコイルは幅が470mm、重さが６トンであ
り、直径が500mmのスプールに前記条材を巻き取ったも
のである。但し、条材の表面粗さはRmaxで1.0乃至1.3μ
ｍである。Example 2 A metal or alloy strip having a thickness of 3.5 mm and having the composition shown in Table 2 below has a Si concentration of 1.5 and 5.0% by weight.
The strip was wound around a coil while an oil solution containing oil was dropped. This coil has a width of 470 mm, a weight of 6 tons, and is obtained by winding the above-mentioned material on a spool having a diameter of 500 mm. However, the surface roughness of the strip is 1.0 to 1.3μ at Rmax
m.
そして、このコイルを下記第３表に示す焼鈍条件（加
熱温度、加熱時間）により焼鈍した。その結果、各材料
のコイルについて密着不良の発生の有無を調査し、その
結果を下記第３表に併せて示す。この第３表に示すよう
に、油中のSi濃度が５重量％の場合には密着不良が全く
発生しなかった。The coil was annealed under the annealing conditions (heating temperature, heating time) shown in Table 3 below. As a result, the presence or absence of poor adhesion was investigated for coils of each material, and the results are shown in Table 3 below. As shown in Table 3, when the Si concentration in the oil was 5% by weight, no poor adhesion occurred.
この第２表に示す材料のコイルのうち、密着不良が発
生しなかったコイル（Si濃度５重量％）について、その
コイルを巻きほどきつつ、酸性フッ化アンモン（フッ化
水素アンモニウム）を下記第４表に示す組成で含有する
液温20℃の水溶液中に通した。なお、一部の水溶液には
硫酸を10体積％で添加した。その結果、下記第４表に条
材表面のSiOXの除去状況を示すように、酸性フッ化アン
モンを15g/含有する水溶液により処理した場合は、Si
OXを完全に除去することができた。 Of the coils made of the materials shown in Table 2, with respect to the coil in which the adhesion failure did not occur (Si concentration: 5% by weight), while removing the coil, the acidic ammonium fluoride (ammonium hydrogen fluoride) was converted to The solution was passed through an aqueous solution containing the composition shown in Table 4 at a liquid temperature of 20 ° C. In addition, sulfuric acid was added to some aqueous solutions at 10% by volume. As a result, as shown in Table 4 below, the condition of removal of SiO X from the surface of the strip was as follows: when treated with an aqueous solution containing 15 g / ammonium acid fluoride,
The O X was able to be completely removed.
このように、本実施例においては、300乃至700℃で焼
鈍する際のコイルの密着不良を防止することができると
共に、密着防止材として生成させたSi酸化物を容易に除
去することができる。 As described above, in the present embodiment, it is possible to prevent poor adhesion of the coil when annealing at 300 to 700 ° C. and easily remove the Si oxide generated as the adhesion preventing material.
なお、本実施例は焼鈍炉としてDXガス炉を使用した場
合のものであるが、Cu又はCu基合金を焼鈍する場合は電
気炉を使用してもよい。In the present embodiment, a DX gas furnace is used as an annealing furnace. However, when Cu or a Cu-based alloy is annealed, an electric furnace may be used.
また、電気炉により焼鈍したコイルのSi酸化物を除去
するためには、硫酸を含む水溶液を使用した方が有効に
Si酸化物を除去することができる。これは、硫酸を含む
水溶液を使用することにより、Si酸化物の除去と同時
に、焼鈍時に生成したCuの酸化物も併行して除去される
からである。In addition, in order to remove Si oxides from coils annealed by an electric furnace, it is more effective to use an aqueous solution containing sulfuric acid.
Si oxide can be removed. This is because the use of the aqueous solution containing sulfuric acid removes the Si oxide and simultaneously removes the Cu oxide generated during annealing.
更にまた、本実施例は、酸性フッ化アンモン（NH4F・
HF）を使用したものであるが、硫酸を使用しない場合は
酸性フッ化ナトリウムNaF・HF又は酸性フッ化カリウムK
F・HFを使用してもよく、Si酸化物の除去については同
様の効果を得ることができる。Furthermore, in this embodiment, an ammonium acid fluoride (NH 4 F.
HF), but when sulfuric acid is not used, sodium acid fluoride NaF · HF or potassium acid fluoride K
F · HF may be used, and the same effect can be obtained for the removal of Si oxide.
［発明の効果］ 本発明によれば、所定濃度のSiを含有するSiオイルを
塗布した後熱処理するから、熱処理中にSi酸化物が生成
し、このSi酸化物により被熱処理材間の密着不良を防止
することができ、歩留を著しく向上させることができ
る。[Effects of the Invention] According to the present invention, since a heat treatment is performed after applying a Si oil containing a predetermined concentration of Si, a Si oxide is generated during the heat treatment, and this Si oxide causes poor adhesion between the heat-treated materials. Can be prevented, and the yield can be significantly improved.
また、酸性フッ化塩水溶液により前記Si酸化物を除去
するから、Si酸化物を有しない清浄なコイルが得られ
る。従って、後工程の被熱処理材の研磨工程において
は、被熱処理材表面のSi酸化物により研磨能力が損われ
ることなく研磨することができる。このため、被熱処理
材の表面の全域に亘って均一に表面欠陥を除去するのに
十分な研磨量を確保することができるから、後工程にお
けるめっき加熱フクレを防止することができると共に、
研磨速度を高めることができるので生産性が向上する。Further, since the Si oxide is removed by the acidic fluoride aqueous solution, a clean coil having no Si oxide can be obtained. Therefore, in the post-processing step of polishing the material to be heat-treated, the polishing can be performed without impairing the polishing ability by the Si oxide on the surface of the material to be heat-treated. For this reason, since a sufficient amount of polishing can be ensured to uniformly remove surface defects over the entire surface of the material to be heat-treated, it is possible to prevent plating swelling in a later step,
Since the polishing rate can be increased, productivity is improved.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 津野 理一 山口県下関市長府印内町１番Ｄ―204号 (72)発明者 宮藤 元久 山口県下関市長府安養寺２丁目５番８号 (56)参考文献 特開 昭61−69977（ＪＰ，Ａ) 特開 昭61−48584（ＪＰ，Ａ) 特開 昭57−98680（ＪＰ，Ａ) ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Riichi Tsuno 1-204 D-204, Innai-cho, Shifuzeki City, Yamaguchi Prefecture (72) Inventor Motohisa Miyafuji 2-5-8, Chofu-Anyoji, Shimonoseki City, Yamaguchi Prefecture (56) Reference Document JP-A-61-69977 (JP, A) JP-A-61-48584 (JP, A) JP-A-57-98680 (JP, A)
Claims (10)
量％以上のSiを含有する油液を塗布し、次いで、前記被
熱処理材を熱処理した後、酸性フッ化塩を含有する水溶
液により被熱処理材の表面のSi酸化物を除去することを
特徴とする金属又は合金の熱処理方法。An oil solution containing 2% by weight or more of Si is applied to the surface of a metal or alloy material to be heat-treated, and then the material to be heat-treated is heat-treated, and then an aqueous solution containing an acid fluoride salt A heat treatment method for a metal or an alloy, wherein a Si oxide on a surface of a material to be heat treated is removed by the method.
びニッケル・鉄合金から選択されたものであることを特
徴とする請求項１に記載の金属又は合金の熱処理方法。2. The method according to claim 1, wherein the material to be heat-treated is selected from copper, copper alloy, nickel and nickel-iron alloy.
ることを特徴とする請求項２に記載の金属又は合金の熱
処理方法。3. The method according to claim 2, wherein the material to be heat-treated is a linear or plate-shaped strip.
ることを特徴とする請求項３に記載の金属又は合金の熱
処理方法。4. The method according to claim 3, wherein the material to be heat-treated is wound in a coil shape.
ことを特徴とする請求項１に記載の金属又は合金の熱処
理方法。5. The method according to claim 1, wherein the Si content of the oil liquid is 10% by weight or less.
以上の酸性フッ化塩を含有することを特徴とする請求
項１に記載の金属又は合金の熱処理方法。6. The aqueous solution containing the acid fluoride salt is 10 g /
The method for heat treating a metal or an alloy according to claim 1, comprising the above acidic fluoride.
あることを特徴とする請求項６に記載の金属又は合金の
熱処理方法。7. The method according to claim 6, wherein said acid fluoride salt is ammonium acid fluoride.
であることを特徴とする請求項６に記載の金属又は合金
の熱処理方法。8. The method according to claim 6, wherein the acid fluoride salt is sodium acid fluoride.
あることを特徴とする請求項６に記載の金属又は合金の
熱処理方法。9. The method according to claim 6, wherein the acid fluoride salt is potassium acid fluoride.
のSiを含有する油液を塗布し、300乃至700℃の温度で焼
鈍した後、この焼鈍材の表面に生成したSi酸化物を10g/
以上の酸性フッ化塩を含有する水溶液により除去する
ことを特徴とする金属又は合金の熱処理方法。10. An oil solution containing 2% by weight or more of Si is applied to a coil-shaped material to be heat-treated, annealed at a temperature of 300 to 700 ° C., and Si oxide formed on the surface of the annealed material. 10g /
A method for heat-treating a metal or an alloy, wherein the metal or alloy is removed by an aqueous solution containing the above acidic fluoride.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63020884A JP2578462B2 (en) | 1988-01-29 | 1988-01-29 | Heat treatment method for metal or alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63020884A JP2578462B2 (en) | 1988-01-29 | 1988-01-29 | Heat treatment method for metal or alloy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH028352A JPH028352A (en) | 1990-01-11 |
| JP2578462B2 true JP2578462B2 (en) | 1997-02-05 |
Family
ID=12039624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63020884A Expired - Fee Related JP2578462B2 (en) | 1988-01-29 | 1988-01-29 | Heat treatment method for metal or alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2578462B2 (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5798680A (en) * | 1980-12-12 | 1982-06-18 | Sanshin Kagaku Kogyo Kk | Corrosion inhibiting agent for stainless steel |
| JPS6086242A (en) * | 1983-10-19 | 1985-05-15 | Kawasaki Steel Corp | Single surface coated one directional silicon steel plate and preparation thereof |
| JPS6148584A (en) * | 1984-08-10 | 1986-03-10 | C Uyemura & Co Ltd | Scale remover |
| JPS6169977A (en) * | 1984-09-12 | 1986-04-10 | Kawasaki Steel Corp | Production of electrical steel sheet having film to prevent seizure of steel sheet during strain relief annealing |
-
1988
- 1988-01-29 JP JP63020884A patent/JP2578462B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH028352A (en) | 1990-01-11 |
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