JP2535862B2 - Partial plating holder and partial plating method using the same - Google Patents

Partial plating holder and partial plating method using the same

Info

Publication number
JP2535862B2
JP2535862B2 JP62022214A JP2221487A JP2535862B2 JP 2535862 B2 JP2535862 B2 JP 2535862B2 JP 62022214 A JP62022214 A JP 62022214A JP 2221487 A JP2221487 A JP 2221487A JP 2535862 B2 JP2535862 B2 JP 2535862B2
Authority
JP
Japan
Prior art keywords
plating
plating solution
strip
partial
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62022214A
Other languages
Japanese (ja)
Other versions
JPS63190191A (en
Inventor
浩一 茅根
重男 萩谷
博通 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP62022214A priority Critical patent/JP2535862B2/en
Publication of JPS63190191A publication Critical patent/JPS63190191A/en
Application granted granted Critical
Publication of JP2535862B2 publication Critical patent/JP2535862B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、例えばリードフレームの素材である帯状長
尺物に部分めっき特にストライプめっきを施すための部
分めっき用ホルダーに関する。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Field of Application> The present invention relates to a holder for partial plating for performing partial plating, particularly stripe plating, on a strip-shaped long object which is a material of a lead frame, for example.

〈従来の技術〉 例えば、トランジスタ用のリードフレームは、素材と
なる金属の帯状長尺物にストライプめっきと称される部
分めっきを施こし、これを所定の形状に打ち抜き加工
し、切断して製造される。
<Prior Art> For example, a lead frame for a transistor is manufactured by subjecting a strip of metal, which is a raw material, to partial plating called stripe plating, punching it into a predetermined shape, and cutting it. To be done.

従来、このような部分めっきの形成は、次のようにし
て行われる。
Conventionally, formation of such partial plating is performed as follows.

第4図および第5図に示すように、帯状長尺物のめっ
きを施す部分11(以下、「めっき部分11」という)以外
をマスキングテープ(接着剤付きプラスチックテープ
等)15で被覆し、これをめっき槽16のめっき液17中に浸
漬しつつ、帯状長尺物10とめっき槽16中に設置された可
溶性陽極14との間に通電して部分めっき(ストライプめ
っき12)を行っている。
As shown in FIG. 4 and FIG. 5, a masking tape (plastic tape with adhesive, etc.) 15 is coated on a portion other than the portion 11 (hereinafter referred to as “plating portion 11”) on which the strip-shaped long object is plated, While being immersed in the plating solution 17 in the plating tank 16, the strip-shaped long object 10 and the soluble anode 14 installed in the plating tank 16 are energized to perform partial plating (striped plating 12).

しかるにこの方法では、マスキングテープ15の正確に
貼付け作業および、部分めっき完了後のマスキングテー
プ15の引き剥し作業が必要であり、手間がかかる。ま
た、マスキングテープ15は、接着力の確保、貼付け寸法
精度の確保等の観点から再利用が行われないため、マス
キングテープの消費量が多くなり、コスト面で不利であ
るとともに使用済のマスキングテープ15を廃棄する設備
等も必要となる。
However, this method requires the work of accurately attaching the masking tape 15 and the work of peeling off the masking tape 15 after the partial plating is completed, which is troublesome. Further, since the masking tape 15 is not reused from the viewpoint of securing the adhesive force, securing the attachment dimensional accuracy, etc., the masking tape consumption is large, which is disadvantageous in terms of cost and is a used masking tape. Equipment for disposing of 15 is also required.

そこでこのような欠点を克服するために、エンドレス
ベルトを用いた機械的マスキング法が提案されている。
即ち、この方法は、第6図に示すように、図中矢印方向
に連続的に走行する帯状長尺物10をローラ19を介して回
転ドラム18に巻き掛け、一方数個のローラ21に巻き掛け
られ回転ドラム18と同期的に循環走行するエンドレスマ
スキングベルト20を回転ドラム18上で帯状長尺物10の非
めっき部分に密着させる(帯状長尺物10は自らの張力お
よびエンドレスマスキングベルト20の張力により回転ド
ラム18の外周面に押圧される)。そしてこのマスキング
ベルト20で被覆された部分の帯状長尺物10をめっき槽16
のめっき液17中に浸漬し、帯状長尺物10とめっき槽16内
に設置された可溶性陽極14との間に通電して部分めっき
を行うものである。あるいは、特に図示はしないが、マ
スキングベルト20で被覆された帯状長尺物10に対し、回
転ドラム18の内周面または外周面に沿って設置したノズ
ルからめっき液を非マスキング部(めっき液透過用部)
に噴射し、通電して部分めっきを行うものである。
Therefore, in order to overcome such a drawback, a mechanical masking method using an endless belt has been proposed.
That is, in this method, as shown in FIG. 6, a strip-shaped long object 10 which continuously runs in the direction of the arrow in the drawing is wound around a rotary drum 18 via a roller 19 and wound around several rollers 21. The endless masking belt 20 that is hung and circulates in synchronization with the rotary drum 18 is brought into close contact with the non-plated portion of the strip-shaped long object 10 on the rotary drum 18 (the strip-shaped long object 10 has its own tension and the endless masking belt 20. It is pressed against the outer peripheral surface of the rotating drum 18 by the tension). Then, the strip-shaped long object 10 covered with the masking belt 20 is placed in the plating tank 16
Partial plating is carried out by immersing the strip-shaped elongated object 10 and the soluble anode 14 installed in the plating tank 16 by immersing in the plating solution 17. Alternatively, although not particularly shown, the strip-shaped long object 10 covered with the masking belt 20 is provided with a non-masking portion (plating solution permeation liquid) from a nozzle installed along the inner peripheral surface or the outer peripheral surface of the rotary drum 18. Part)
It is sprayed on and energized to carry out partial plating.

このような方法では、前述のようにマスキングテープ
を1回使用ごとに使い捨てる必要はないが、部品点数が
多く、めっき装置の構造が非常に複雑になり、装置も高
価になることや、作業性が低下すること、およびマスキ
ングベルト20を帯状長尺物10のめっき面側にしか被覆で
きないので非めっき面側へのめっきの廻り込み等の問題
がある。さらに、この方法では、2枚の帯状長尺物の非
めっき面側同士を重ね合せてこれらを同時にめっきする
ことができない。
In such a method, it is not necessary to dispose of the masking tape after each use as described above, but the number of parts is large, the structure of the plating apparatus becomes very complicated, the apparatus becomes expensive, and the operation is difficult. However, since the masking belt 20 can be coated only on the plated surface side of the strip-shaped long object 10, there are problems such as the wrapping of the plating on the non-plated surface side. Furthermore, in this method, it is not possible to superimpose the non-plating surface sides of two strip-shaped long products and plate them simultaneously.

また、部分めっきではめっきの寸法精度およびめっき
境界部の鮮明度が優れることが望まれるが、一般にマス
キングベルトによる機械マスク法では、マスキングベル
トを帯状長尺物10に密着させるに際し、帯状長尺物に対
しベルトの位置が不安定なため、ずれを生じることがあ
りめっきの寸法精度がそれほど良くないという欠点があ
る。
Further, in partial plating, it is desired that the dimensional accuracy of plating and the sharpness of the plating boundary portion are excellent.However, in the mechanical mask method using a masking belt, when the masking belt is brought into close contact with the strip-shaped long object 10, the strip-shaped long object is generally used. On the other hand, since the position of the belt is unstable, the belt may be displaced and the dimensional accuracy of the plating is not so good.

上述した問題点、特にめっき装置の構造の複雑化やめ
っきの寸法精度に関する問題点は、ストライプめっきの
本数が多くなればなるほど顕著になる。
The above-mentioned problems, particularly the problem of complication of the structure of the plating apparatus and the dimensional accuracy of plating, become more remarkable as the number of stripe platings increases.

〈発明が解決しようとする問題点〉 本発明の目的は、上述した従来技術の欠点を解消し、
マスキングテープおよびマスキングベルトを使用するこ
となく構造が簡単で、めっきの寸法精度およびめっき境
界部の鮮明度に優れた部分めっきを可能とする部分めっ
き用ホルダーおよびこれを用いた部分めっき方法を提供
することにある。
<Problems to be Solved by the Invention> An object of the present invention is to solve the above-mentioned drawbacks of the prior art,
A holder for partial plating that has a simple structure without using a masking tape and a masking belt, and that enables partial plating with excellent plating dimensional accuracy and sharpness of the plating boundary portion, and a partial plating method using the same Especially.

〈問題点を解決するための手段〉 このような目的を達成するために、本発明者らは、鋭
意研究の結果、連続走行する帯状長尺物のめっきを施す
面に当接するように固定的に設置されるホルダーであっ
て、帯状長尺物のめっき部分に対応する開口にめっき液
を供給しつつ、この開口付近からのめっき液の漏出を防
止するための気体シール手段を有する部分めっき用ホル
ダーおよびこれを用いた部分めっき方法を見出し本発明
に至った。
<Means for Solving Problems> In order to achieve such an object, the inventors of the present invention have as a result of earnest research, and as a result, fixedly contact a surface to be plated of a continuous strip-shaped long object that is to be plated. A holder to be installed on a strip-shaped elongated object having a gas sealing means for preventing leakage of the plating solution from the vicinity of the opening while supplying the plating solution to the opening corresponding to the plating part. The present invention has been accomplished by finding a holder and a partial plating method using the holder.

即ち、本発明は帯状長尺物のめっきを施す面に当接さ
れるとともに該面にめっき液を供給して接触させること
により該面に部分的にめっきを施すことができる開口を
有し、めっき液の供給口および排出口を有する少なくと
も1つのめっき液室と、 前記開口付近に設置されたシール部材と、 気体供給口を有し、前記めっき液室の両側部に隣接設
置され、前記シール部材と前記帯状長尺物との接触部を
前記気体供給孔より送り込まれた気体により加圧して該
接触部よりめっき液が漏出するのを防止するよう構成さ
れた加圧気体室とを有することを特徴とする部分めっき
用ホルダーを提供するものである。
That is, the present invention has an opening that can be partially applied to the surface of the strip-shaped long object by abutting the surface to be plated and supplying the surface with a plating solution to bring the surface into contact. At least one plating solution chamber having a supply port and a discharge port for the plating solution, a seal member installed near the opening, and a gas supply port, which are installed adjacent to both sides of the plating solution chamber, and the seal is provided. A pressurizing gas chamber configured to pressurize the contact portion between the member and the strip-shaped elongated object with the gas sent from the gas supply hole to prevent the plating solution from leaking from the contact portion. The present invention provides a holder for partial plating, which is characterized by

そして、本発明は、帯状長尺物にめっきを施すことが
できる開口を有し、めっき液の供給口および排出口を有
する少なくとも1つのめっき液室と、前記開口付近に設
置されたシール部材と、気体供給口を有し、前記めっき
液室の両側部に隣接設置された加圧気体室とを有する少
なくとも1つの部分めっき用ホルダーを長手方向に連続
走行する帯状長尺物のめっきを施す面に当接し、前記め
っき液の供給口および排出口よりめっき液室内へのめっ
き液の供給および排出を行いつつ、前記気体供給口より
前記気室内に気体を送り込み前記シール部材と前記帯状
長尺物との接触部を加圧してめっき境界部よりめっき液
が漏出するのを防止するよう部分めっきを行うことを特
徴とする部分めっき方法を提供するものである。
Further, the present invention has at least one plating solution chamber having an opening through which a strip-shaped long product can be plated, and having a supply port and a discharge port for a plating solution, and a seal member installed near the opening. A surface for plating a strip-shaped long object that continuously runs in the longitudinal direction in at least one partial plating holder that has a gas supply port and has a pressurized gas chamber that is installed adjacent to both sides of the plating solution chamber A sealing member and the strip-shaped long object by feeding gas into the gas chamber from the gas supply port while supplying and discharging the plating liquid from the supply port and the discharge port of the plating solution to the plating chamber. It is intended to provide a partial plating method characterized by performing partial plating so as to prevent the plating solution from leaking from the plating boundary portion by pressurizing a contact portion with.

部分めっきホルダーは、めっき液の供給口および排出
口が前記帯状長尺物の走行方向に対し所定間隔をおいて
交互に設置されているのがよい。
In the partial plating holder, it is preferable that the supply port and the discharge port of the plating solution are installed alternately at a predetermined interval in the running direction of the strip-shaped long object.

そして、部分めっき用ホルダーは、相互に独立した複
数のめっき液室を有するのがよい。
The partial plating holder preferably has a plurality of plating solution chambers that are independent of each other.

また、本発明の部分めっき方法において、2枚の帯状
長尺物のめっきを施さない面同士を重ね合せ、両帯状長
尺物のめっきを施す面に各々前記部分めっきホルダーを
当接し、前記2枚の帯状長尺物に同時に部分めっきを行
うのがよい。
Further, in the partial plating method of the present invention, the two non-plated surfaces of the strip-shaped long objects are superposed on each other, and the partial plating holders are respectively brought into contact with the surfaces of the strip-shaped long objects to be plated, It is preferable to perform partial plating on a strip of long strip material at the same time.

そして、前記部分めっき用ホルダーは、相互に独立し
た複数のめっき液室を有し、各めっき液室毎に異なる種
類のめっきを行うのがよい。
It is preferable that the partial plating holder has a plurality of plating solution chambers that are independent of each other, and that different types of plating be performed for each plating solution chamber.

以下、本発明の部分めっき用ホルダーおよびこれを用
いた部分めっき方法を添付図面に示す好適実施例につい
て詳細に説明する。
Hereinafter, a holder for partial plating of the present invention and a partial plating method using the same will be described in detail with reference to preferred embodiments shown in the accompanying drawings.

第1図は、本発明の部分めっき用ホルダー1の構成例
を示す斜視図、第2図は、第1図におけるII−II線での
断面図である。
FIG. 1 is a perspective view showing a structural example of a partial plating holder 1 of the present invention, and FIG. 2 is a sectional view taken along line II-II in FIG.

これらの図に示すように、本発明の部分めっき用ホル
ダー1は、図中矢印方向に連続的に走行するに帯状長尺
物10のめっきを施す面側に当接するように、好ましくは
任意の手段により固定的に設置されている。一方、帯状
長尺物10のめっきを施さない面側即ち裏面側には、固定
されたガイド板13に当接している。あるいは、特に図示
はしないが、帯状長尺物10の走行と同期的に循環するエ
ンドレスベルト等を帯状長尺物10の裏面に所定の圧力で
密着させたものでもよい。この場合には、固定のガイド
板13を用いるのと異なり、摩擦による帯状長尺物裏面の
キズ付きを防止することができる。
As shown in these drawings, the holder 1 for partial plating of the present invention preferably contacts with the surface of the strip-shaped long object 10 to be plated so as to travel continuously in the direction of the arrow in the drawing, and is preferably arbitrary. It is fixedly installed by means. On the other hand, the surface of the strip-shaped long object 10 that is not plated, that is, the back surface, is in contact with the fixed guide plate 13. Alternatively, although not particularly shown, an endless belt or the like that circulates in synchronization with the running of the strip-shaped elongated object 10 may be adhered to the back surface of the strip-shaped elongated object 10 at a predetermined pressure. In this case, unlike the case where the fixed guide plate 13 is used, it is possible to prevent scratches on the back surface of the strip-shaped long object due to friction.

部分めっき用ホルダー1は、その内部に少なくとも1
つのめっき液室2を有している。このめっき液室2は、
例えば、第1図中斜線で示す2本のストライプめっき1
2、12を行う場合には、その数に対応した室数を有して
いるのがよい。なお、複数のめっき液室を設けた場合、
これらが相互に連通しているか否かは問わない。
The partial plating holder 1 has at least one inside thereof.
It has one plating solution chamber 2. This plating solution chamber 2
For example, two stripe plating 1 shown by diagonal lines in Fig. 1
When carrying out steps 2 and 12, it is advisable to have the number of rooms corresponding to that number. When multiple plating solution chambers are provided,
It does not matter whether these are in communication with each other.

また、ホルダー1が複数の独立した(相互に連通しな
い)めっき液室2を持っている場合、各めっき液室毎に
異なる種類のめっき金属をめっきすることも可能であ
り、これにより、帯状長尺物10の片面に異種金属による
2以上のストライプめっきを同時に行うこともできる。
Further, when the holder 1 has a plurality of independent plating solution chambers 2 (which do not communicate with each other), it is possible to plate different kinds of plating metal in each plating solution chamber, whereby the strip-shaped length is increased. It is also possible to simultaneously perform two or more stripe platings of different metals on one surface of the scale 10.

めっき液室2の先端には、帯状長尺物10のめっきを施
す部分11(後述するマスキングテープ15を貼付ける場合
には、その外縁部分)を限定する開口3を有し、この開
口3において帯状長尺物10のめっき部分11がめっき液と
接触してめっき12が施される。
At the tip of the plating solution chamber 2, there is an opening 3 that defines a portion 11 (the outer edge portion when the masking tape 15 to be described later is applied) of the strip-shaped long object 10 to be plated. The plating portion 11 of the strip-shaped long object 10 comes into contact with the plating solution to perform plating 12.

また、開口3付近、特に開口3の周囲に沿ってシール
部材6が装着され、めっき部分11以外の部分にめっき液
が漏出するのを防止している。
A seal member 6 is attached near the opening 3, especially around the opening 3 to prevent the plating solution from leaking to a portion other than the plated portion 11.

シール部材6は、例えばゴム、軟質樹脂、スポンジ、
プラスチック等の弾性材料で構成されている。ただし、
シール部材6は、帯状長尺物10の表面が接触しつつ摺動
したとき、帯状長尺物10の表面にキズを付けず、かつめ
っき液と反応しない材質のものであれば、いかなるもの
でもよい。
The seal member 6 is made of rubber, soft resin, sponge,
It is made of an elastic material such as plastic. However,
The sealing member 6 may be made of any material as long as the surface of the strip-shaped long object 10 slides in contact with the surface of the strip-shaped long object 10 without causing scratches and reacting with the plating solution. Good.

一方、部分めっき用ホルダー1には、めっき液室2内
に連通するめっき液供給口4およびめっき液排出口5が
形成されている。このめっき液供給口4および排出口5
に、所定の配管等を接続し、めっき液の循環回路を構成
する(図示せず)ことによってめっき液室2内へのめっ
き液の供給および排出を行う。
On the other hand, the holder 1 for partial plating is provided with a plating solution supply port 4 and a plating solution discharge port 5 which communicate with the inside of the plating solution chamber 2. This plating solution supply port 4 and discharge port 5
By connecting a predetermined pipe or the like to a circulation circuit for the plating solution (not shown), the plating solution is supplied to and discharged from the plating solution chamber 2.

なお、めっき液供給口4および排出口5(特に図示は
しないが吸引機能を有するのが好ましい)の形状、配置
等は特に限定されないが、第1図に示すようにめっき液
の供給口4と排出口5が帯状長尺物10の走行方向に対し
所定間隔をおいて交互に設置されているのが好ましい。
その理由は、各めっき液室内におけるめっき液の流速向
上による電流密度のアップおよびめっき液の清浄度アッ
プなどによるめっき面の品質向上に役立つからである。
The shape, the arrangement, etc. of the plating solution supply port 4 and the discharge port 5 (not shown, but preferably having a suction function) are not particularly limited, but as shown in FIG. It is preferable that the discharge ports 5 are alternately installed at a predetermined interval in the traveling direction of the strip-shaped long object 10.
The reason is that it improves the quality of the plated surface by increasing the current density by improving the flow rate of the plating solution in each plating solution chamber and improving the cleanliness of the plating solution.

このようなめっき液室2の両側部には、加圧気体室7
が隣接設置され、この加圧気体室7内に所定圧力の気体
を送り込むことによって、シール部材6と帯状長尺物10
との接触部付近を加圧し、この接触部付近を当該帯状長
尺物10がシール部材6に接触しつつ摺動するのに支障の
ない適切な圧力で加圧し、即ちめっき境界部120よりめ
っき液が漏出するのを確実に防止し、めっき境界部120
の鮮明度を向上させている。
A pressurized gas chamber 7 is provided on both sides of the plating solution chamber 2.
Are installed adjacent to each other, and a gas having a predetermined pressure is fed into the pressurized gas chamber 7 so that the seal member 6 and the strip-shaped long object 10 are provided.
A pressure is applied to the vicinity of the contact portion with the contact portion, and the vicinity of the contact portion is applied with an appropriate pressure that does not hinder the sliding of the strip-shaped long object 10 while contacting the seal member 6, that is, plating from the plating boundary portion 120. Ensures that the liquid does not leak and the plating boundary 120
It improves the sharpness of.

加圧気体室7内への気体の送り込みは、加圧気体室7
内に連通するよう設けられた気体供給口8より行われ
る。
The gas is sent into the pressurized gas chamber 7 by means of the pressurized gas chamber 7
It is performed from a gas supply port 8 provided so as to communicate with the inside.

この気体供給口8の形状、配置等は特に限定されず、
例えば第1図に示すごときスリット状の気体供給口や、
その他複数の丸孔による気体供給口等いかなるものでも
よい。
The shape and arrangement of the gas supply port 8 are not particularly limited,
For example, a slit-shaped gas supply port as shown in FIG.
Any other gas supply port such as a plurality of round holes may be used.

なお、加圧気体室7内への実際の気体の供給は、気体
供給口8に送気配管の一端を接続し、この送気配管の他
端に接続されたコンプレッサー等を駆動させる等、一般
的な送気手段により行えばよい。
The actual supply of gas into the pressurized gas chamber 7 is generally performed by connecting one end of an air supply pipe to the gas supply port 8 and driving a compressor or the like connected to the other end of the air supply pipe. It may be performed by a typical air supply means.

また、送気する気体の種類としては、特に限定され
ず、空気の他、N2ガス、Arガスなど、めっき液の汚染や
めっき特性を劣化しない気体であればいかなるものでも
よい。
The type of gas to be sent is not particularly limited, and in addition to air, any gas such as N 2 gas or Ar gas may be used as long as it does not contaminate the plating solution or deteriorate the plating characteristics.

そして、加圧気体室7内の圧力は、めっき部分11から
のめっき液の漏出を十分に防止することができる程度に
設定すればよい。
The pressure in the pressurized gas chamber 7 may be set to such an extent that the plating solution can be sufficiently prevented from leaking from the plating portion 11.

なお、加圧気体室7内の気体漏れを防止するために、
めっき液室2と隣接しない側の帯状長尺物10との接触部
付近にもシール部材9を装着するのがよい。
In order to prevent gas leakage in the pressurized gas chamber 7,
It is preferable to install the seal member 9 also in the vicinity of the contact portion with the strip-shaped elongated object 10 on the side not adjacent to the plating solution chamber 2.

本発明におけるめっき液とは広い概念でのめっき液を
意味し、目的とする金属めっきや合金めっきのめっき液
はもちろんのこと、半田等のろう材、塗料等のあらゆる
液体コーティング材料をも含む。ただし、本明細書中で
は代表的に通常の金属めっきについて説明する。
The plating solution in the present invention means a plating solution based on a broad concept, and includes not only a target plating solution for metal plating or alloy plating, but also any brazing material such as solder or any liquid coating material such as paint. However, in the present specification, typical metal plating will be described as a representative.

また、めっきの方式としては、電解めっき、無電解め
っきのいずれも可能である。
Further, as the plating method, either electrolytic plating or electroless plating is possible.

電解めっきを行う場合、第1図に示すように帯状長尺
物10を陰極とし、部分めっきホルダー1自体を陽極とし
て通電を行えばよい。この場合、シール部材6および9
は帯状長尺物10との絶縁材としても機能する。また、ホ
ルダー1のめっき液室2内に別個に可溶性陽極14を設置
し(第3図参照)、あるいはホルダーの外部近傍にめっ
き槽を設け(図示せず)その、槽内に可溶性陽極を設置
することにより、帯状長尺物10(陰極)との通電を行う
ことも可能である。
When electrolytic plating is performed, electricity may be supplied by using the strip-shaped elongated member 10 as a cathode and the partial plating holder 1 itself as an anode as shown in FIG. In this case, the seal members 6 and 9
Also functions as an insulating material with the long strip 10. Further, the soluble anode 14 is separately installed in the plating solution chamber 2 of the holder 1 (see FIG. 3), or a plating tank is provided near the outside of the holder (not shown), and the soluble anode is installed in the tank. By doing so, it is possible to energize the long strip 10 (cathode).

第3図は、本発明の部分めっき用ホルダーを用いた部
分めっき方法の一例を示す横断面図である。同図に示す
ように2枚の帯状長尺物10、10の裏面(めっきを施さな
い面)同士を重ね合せ、帯状長尺物10、10のめっき面
に、各々本発明の部分めっき用ホルダー1、1を当接す
る。このような方法では、2枚の帯状長尺物10、10に同
時に部分めっきを行うことができるので生産性が向上す
る。また、1枚の帯状長尺物10の両面に各々本発明の部
分めっき用ホルダー1、1を当接してめっきを行えば、
帯状長尺物10の両面に同一または異種金属を同時に部分
めっきすることもできる。
FIG. 3 is a cross-sectional view showing an example of a partial plating method using the holder for partial plating of the present invention. As shown in the figure, the back surfaces (surfaces that are not plated) of the two strip-shaped long objects 10, 10 are overlapped with each other, and the plating surfaces of the strip-shaped long objects 10, 10 are respectively attached to the partial plating holders of the present invention. Contact 1, 1. In such a method, since the two strip-shaped long objects 10, 10 can be partially plated at the same time, the productivity is improved. Further, if plating is performed by bringing the holders for partial plating 1 and 1 of the present invention into contact with both surfaces of one strip-shaped long object 10, respectively,
It is also possible to partially plate the same or different metals on both surfaces of the strip-shaped long object 10 at the same time.

シール部材6および加圧気体室7内の加圧によるめっ
き液のシールだけではめっき境界部120の鮮明度が不足
する場合には、第3図に示すように帯状長尺物10にめっ
き部分11を限定するマスキングテープ15を貼付けそのマ
スキングテープ15により限定されためっき境界部120よ
り若干外側にめっき液室2の開口3の縁部が位置するよ
うに、即ちシール部材6がマスキングテープ15上に密着
するようにする。これにより、めっき境界部120の鮮明
度が向上する。なお、前述した従来のマスキングテープ
の貼付けによる部分めっき方法では、第4図および第5
図に示すように、めっき不要部分全体をマスキングテー
プ15で被覆しなければならないが、上記方法では、めっ
き境界部120の近傍のみをマスキングテープ15で被覆す
ればよいので、マスキングテープの消費量は従来法に比
べ減少する。
When the definition of the plating boundary portion 120 is insufficient only by sealing the plating solution by the pressurization in the seal member 6 and the pressurized gas chamber 7, as shown in FIG. A masking tape 15 for limiting the number of edges is attached so that the edge of the opening 3 of the plating solution chamber 2 is located slightly outside the plating boundary 120 defined by the masking tape 15, that is, the sealing member 6 is placed on the masking tape 15. Make sure they are in close contact. This improves the sharpness of the plating boundary portion 120. In addition, in the above-mentioned conventional partial plating method by attaching the masking tape, as shown in FIG.
As shown in the figure, the entire plating unnecessary portion must be covered with the masking tape 15, but in the above method, only the vicinity of the plating boundary portion 120 needs to be covered with the masking tape 15, so the consumption amount of the masking tape is It is reduced compared to the conventional method.

なお、第3図に示す構造の部分めっき用ホルダー1
は、めっき液室2や加圧気体室7の数、配置等が第1図
および第2図に示す部分めっきホルダー1と異なるが、
各部の構造およびその機能については前述したものと同
様である。
In addition, the holder 1 for partial plating having the structure shown in FIG.
Is different from the partial plating holder 1 shown in FIGS. 1 and 2 in the number and arrangement of the plating solution chamber 2 and the pressurized gas chamber 7,
The structure and function of each part are the same as those described above.

上述した実施例の部分めっきホルダー1は長手方向に
直線的な構造となっているが、本発明ではこれに限ら
ず、長手方向に例えば円弧状に湾曲した構造のものでも
よい。
Although the partial plating holder 1 of the above-described embodiment has a linear structure in the longitudinal direction, the present invention is not limited to this, and may have a structure curved in an arc shape in the longitudinal direction.

〈作用〉 第1図中の矢印方向に連続的に走行する帯状長尺物10
のめっき面に部分めっき用ホルダー1を当接し、めっき
液供給口4よりめっき液室2内へめっき液を供給し、め
っき液排出口5よりめっき液を排出してめっき液を循環
させつつ、例えば帯状長尺物10を陰極として通電を行
う。帯状長尺物10のめっき部分11は、めっき液室2の開
口3においてめっき液と接触し、ストライプめっき12が
施される。
<Action> A strip-shaped long object 10 that continuously runs in the direction of the arrow in FIG.
While the partial plating holder 1 is brought into contact with the plating surface of, the plating solution is supplied from the plating solution supply port 4 into the plating solution chamber 2, the plating solution is discharged from the plating solution discharge port 5, and the plating solution is circulated. For example, electricity is performed using the strip-shaped long object 10 as a cathode. The plating portion 11 of the strip-shaped long object 10 comes into contact with the plating solution at the opening 3 of the plating solution chamber 2 and is subjected to stripe plating 12.

開口3付近に装着されたシール部材6は、めっき部分
11外へのめっき液の漏出を防止しているが、めっき液室
2の両側部に隣接設置された加圧気体室7に気体供給口
8から気体を送り込み、加圧気体室7内を所定圧力に加
圧することによって、シール部材6と帯状長尺物10の接
触部付近を加圧するのでめっき部分11外のめっき液の漏
出を確実に防止し、めっき境界部120の鮮明度が高ま
る。
The seal member 6 mounted near the opening 3 is a plated portion.
Although the plating solution is prevented from leaking to the outside, the gas is supplied from the gas supply port 8 to the pressurized gas chamber 7 which is installed adjacent to both sides of the plating solution chamber 2 so that the inside of the pressurized gas chamber 7 is predetermined. By pressurizing the pressure, the vicinity of the contact portion between the seal member 6 and the strip-shaped long object 10 is pressurized, so that the leakage of the plating solution outside the plating portion 11 is reliably prevented and the sharpness of the plating boundary portion 120 is enhanced.

〈発明の効果〉 本発明の部分めっき用ホルダーによれば、次のような
効果がある。
<Effects of the Invention> The holder for partial plating of the present invention has the following effects.

(1)従来のマスキングベルトを用いた部分めっき装置
では、特に複数本のストライプめっきを行う場合、装置
の構造が複雑であったが、本発明の部分めっき用ホルダ
ーによれば、部分めっき装置の構造が極めて簡単であ
る。
(1) In a conventional partial plating apparatus using a masking belt, the structure of the apparatus is complicated, especially when a plurality of stripe platings are performed. However, according to the partial plating holder of the present invention, The structure is extremely simple.

(2)本発明の部分めっき用ホルダーは、固定的に設置
して用いるので、循環走行中にベルトの位置ずれ等を生
ずることがあるエンドレスマスキングベルトによる機械
マスク法に比べ、めっきの寸法精度か大幅に向上する。
(2) Since the holder for partial plating of the present invention is fixedly installed and used, the dimensional accuracy of plating is higher than that of the mechanical mask method using the endless masking belt, which may cause the belt to be displaced during circulation running. Greatly improved.

(3)開口付近に装着されたシール部材および気体圧力
によりめっき液のシールを行うので、めっき部分以外へ
のめっき液の漏出を防止し、めっき境界部の鮮明度が高
まる。
(3) Since the plating solution is sealed by the seal member mounted near the opening and the gas pressure, the plating solution is prevented from leaking to other parts than the plating part, and the sharpness of the plating boundary part is enhanced.

(4)本発明の部分めっき用ホルダーはその構造上2枚
の帯状長尺物の非めっき面側を重ね合せ、その両側(め
っき面側)に部分めっき用ホルダーを当接して、これら
を同時に部分めっきすることができるので、生産性が向
上する。
(4) The structure of the holder for partial plating of the present invention is such that two non-plated surface sides of long strips are superposed on each other and the holders for partial plating are abutted on both sides (plating surface side) of the two members at the same time. Since partial plating can be performed, productivity is improved.

(5)幅寸法の異なる帯状長尺物や、めっきパターンの
異なる帯状長尺物に部分めっきを行う場合にも、それぞ
れに対応した部分めっき用ホルダーを用意しておき、こ
れらを簡単に交換することができる。
(5) Even when strip-shaped long strips with different width dimensions or strip-shaped strips with different plating patterns are subjected to partial plating, prepare partial plating holders corresponding to each and easily replace them. be able to.

(6)部分めっき用ホルダーが相互に独立した(連通し
ない)複数のめっき液室を有し、各めっき液室毎に異種
金属のめっき液を供給すれば、帯状長尺物の片面に異種
金属による2以上のストライプめっきを同時に行うこと
ができる。
(6) The partial plating holder has a plurality of plating solution chambers that are independent of each other (do not communicate with each other), and if a plating solution of a dissimilar metal is supplied to each plating solution chamber, the dissimilar metal is provided on one side of the strip-shaped long object. It is possible to simultaneously perform two or more stripe platings.

【図面の簡単な説明】[Brief description of drawings]

第1図は、本発明の部分めっき用ホルダー1の構成例を
示す斜視図である。 第2図は、第1図におけるII−II線での断面図である。 第3図は、本発明の部分めっき用ホルダーを用いた部分
めっき方法の一例を示す横断面図である。 第4図は、マスキングテープを用いた従来の部分めっき
装置の横断面図である。 第5図は、第4図に示す部分めっき装置の一部切欠端面
図である。 第6図は、エンドレスマスキングベルトを用いた従来の
部分めっき装置の正面図である。 符号の説明 1……部分めっき用ホルダー、2……めっき液室、3…
…開口、4……めっき液供給口、5……めっき液排出
口、6……シール部材、7……加圧気体室、8……気体
供給口、9……シール部材、10……帯状長尺物、11……
めっき部分、12……ストライプめっき、120……めっき
境界部、13……ガイド板、14……可溶性陽極、15……マ
スキングテープ、16……めっき槽、17……めっき液、18
……回転ドラム、19……ローラ、20……エンドレスマス
キングベルト、21……ローラ
FIG. 1 is a perspective view showing a configuration example of a holder 1 for partial plating of the present invention. FIG. 2 is a sectional view taken along line II-II in FIG. FIG. 3 is a cross-sectional view showing an example of a partial plating method using the partial plating holder of the present invention. FIG. 4 is a cross-sectional view of a conventional partial plating apparatus using a masking tape. FIG. 5 is a partially cutaway end view of the partial plating apparatus shown in FIG. FIG. 6 is a front view of a conventional partial plating apparatus using an endless masking belt. Explanation of symbols 1 ... Holder for partial plating, 2 ... Plating solution chamber, 3 ...
… Aperture, 4 …… Plating solution supply port, 5 …… Plating solution discharge port, 6 …… Seal member, 7 …… Pressurized gas chamber, 8 …… Gas supply port, 9 …… Seal member, 10 …… Band-shaped Long object, 11 ……
Plating area, 12 …… Striped plating, 120 …… Plating boundary area, 13 …… Guide plate, 14 …… Soluble anode, 15 …… Masking tape, 16 …… Plating bath, 17 …… Plating solution, 18
...... Rotating drum, 19 …… Roller, 20 …… Endless masking belt, 21 …… Roller

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】帯状長尺物のめっきを施す面に当接される
とともに該面にめっき液を供給して接触させることによ
り該面に部分的にめっきを施すことができる開口を有
し、めっき液の供給口および排出口を有する少なくとも
1つのめっき液室と、 前記開口付近に設置されたシール部材と、 気体供給口を有し、前記めっき液室の両側部に隣接設置
され、前記シール部材と前記帯状長尺物との接触部を前
記気体供給孔より送り込まれた気体により加圧して該接
触部よりめっき液が漏出するのを防止するよう構成され
た加圧気体室とを有することを特徴とする部分めっき用
ホルダー。
1. An opening which is brought into contact with a surface of a strip-shaped long object to be plated and which can be partially plated by supplying a plating solution to the surface to bring the surface into contact, At least one plating solution chamber having a supply port and a discharge port for the plating solution, a seal member installed near the opening, and a gas supply port, which are installed adjacent to both sides of the plating solution chamber, and the seal is provided. A pressurizing gas chamber configured to pressurize the contact portion between the member and the strip-shaped elongated object with the gas sent from the gas supply hole to prevent the plating solution from leaking from the contact portion. A holder for partial plating.
【請求項2】前記めっき液の供給口および排出口が、前
記帯状長尺物の走行方向に対し所定間隔をおいて交互に
設置されている特許請求の範囲第1項に記載の部分めっ
き用ホルダー。
2. The plating for partial plating according to claim 1, wherein the supply port and the discharge port of the plating solution are alternately installed at a predetermined interval with respect to the running direction of the strip-shaped long object. holder.
【請求項3】前記部分めっき用ホルダーは、相互に独立
した複数のめっき液室を有する特許請求の範囲第1項ま
たは第2項に記載の部分めっき用ホルダー。
3. The holder for partial plating according to claim 1 or 2, wherein the holder for partial plating has a plurality of plating solution chambers independent of each other.
【請求項4】帯状長尺物にめっきを施すことができる開
口を有し、めっき液の供給口および排出口を有する少な
くとも1つのめっき液室と、前記開口付近に設置された
シール部材と、気体供給口を有し、前記めっき液室の両
側部に隣接設置された加圧気体室とを有する少なくとも
1つの部分めっき用ホルダーを、長手方向に連続走行す
る帯状長尺物のめっきを施す面に当接し、 前記めっき液の供給口および排出口よりめっき液室内へ
のめっき液の供給および排出を行いつつ、 前記気体供給口より前記加圧気体室内に気体を送り込み
前記シール部材と前記帯状長尺物との接触部を加圧し
て、めっき境界部よりめっき液が漏出するのを防止する
よう部分めっきを行うことを特徴とする部分めっき方
法。
4. An at least one plating solution chamber having an opening through which a strip-shaped elongated member can be plated and having a supply port and a discharge port for a plating solution, and a seal member installed near the opening. At least one partial plating holder having a gas supply port and having a pressurized gas chamber adjacent to both sides of the plating solution chamber, and a surface for plating a strip-shaped long object continuously running in the longitudinal direction. Abutting against, and supplying and discharging the plating solution into and from the plating solution chamber from the plating solution supply port and the discharge port, while feeding gas into the pressurized gas chamber from the gas supply port, the sealing member and the strip-shaped length. A partial plating method comprising pressurizing a contact portion with a scale to perform partial plating so as to prevent the plating solution from leaking from a plating boundary portion.
【請求項5】2枚の帯状長尺物のめっきを施さない面同
士を重ね合せ、両帯状長尺物のめっきを施す面に各々前
記部分めっき用ホルダーを当接し、前記2枚の帯状長尺
物に同時に部分めっきを行う特許請求の範囲第4項に記
載の部分めっき方法。
5. The two strip-shaped long members are brought into contact with each other by contacting the non-plated surfaces of the two strip-shaped elongated members with each other and contacting the surfaces of the strip-shaped long members to be plated with each other. The partial plating method according to claim 4, wherein partial plating is simultaneously performed on the scale.
【請求項6】前記部分めっき用ホルダーは、相互に独立
しためっき液室を有し、各めっき液室毎に異なる種類の
めっきを行う特許請求の範囲第4項または第5項に記載
の部分めっき方法。
6. The part according to claim 4 or 5, wherein the partial plating holder has plating solution chambers that are independent of each other, and performs different types of plating for each plating solution chamber. Plating method.
JP62022214A 1987-02-02 1987-02-02 Partial plating holder and partial plating method using the same Expired - Fee Related JP2535862B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62022214A JP2535862B2 (en) 1987-02-02 1987-02-02 Partial plating holder and partial plating method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62022214A JP2535862B2 (en) 1987-02-02 1987-02-02 Partial plating holder and partial plating method using the same

Publications (2)

Publication Number Publication Date
JPS63190191A JPS63190191A (en) 1988-08-05
JP2535862B2 true JP2535862B2 (en) 1996-09-18

Family

ID=12076551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62022214A Expired - Fee Related JP2535862B2 (en) 1987-02-02 1987-02-02 Partial plating holder and partial plating method using the same

Country Status (1)

Country Link
JP (1) JP2535862B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5196616B1 (en) * 2012-06-29 2013-05-15 アイシン軽金属株式会社 Partial anodizing apparatus and anodizing method using the same

Also Published As

Publication number Publication date
JPS63190191A (en) 1988-08-05

Similar Documents

Publication Publication Date Title
US4155815A (en) Method of continuous electroplating and continuous electroplating machine for printed circuit board terminals
US4264416A (en) Method for continuous application of strip ribbon or patch-shaped coatings to a metal tape
US4132617A (en) Apparatus for continuous application of strip-, ribbon- or patch-shaped coatings to a metal tape
US4072581A (en) Stripe on strip plating method
JP2535862B2 (en) Partial plating holder and partial plating method using the same
US4545885A (en) Selective electroplating apparatus having a cleaning device
US5389220A (en) Apparatus for a continuous selective electrodeposition on a strip
US4885071A (en) Apparatus for continuous electrolytic treatment of metal strip and sealing structure for electrolytic cell therefor
US3962063A (en) Selective plating apparatus
US4083755A (en) Method and apparatus for selectively plating rectangular sheet continuously or intermittently
US4163704A (en) Apparatus for selectively plating rectangular sheet continuously or intermittently
US4036725A (en) Wheel selective jet plating system
JPH11207237A (en) Coater
US4582583A (en) Continuous stripe plating apparatus
EP0107417B1 (en) Selective plating
KR101362265B1 (en) By way of drum rotation portion of the stereoscopic connector pin electroplating unit
US4582573A (en) Method for treating a single side of a metallic sheet
JP3429686B2 (en) Feeding device for long strips
JP4974614B2 (en) Continuous partial plating method and continuous partial plating apparatus
JP2000345385A (en) Partial electroplating device and partial electroplating line system and continuous partial electroplating method used therefor
CN212669815U (en) Local area surface treatment device
JPS644845Y2 (en)
JPH0143036B2 (en)
JPH02153090A (en) Stripe plating device
JPH0765208B2 (en) Stripe plating equipment

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees