JP2521257Y2 - Vapor deposition device with rotating and revolving jig - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial application] The present invention relates to a structure of a vacuum vapor deposition apparatus, and more particularly to a vapor deposition apparatus including a holder for rotating an object to be revolved around a vapor deposition source.

[Conventional technology]

2. Description of the Related Art Conventionally, there has been widely used an apparatus for performing vacuum evaporation by revolving around a vapor deposition source while rotating a workpiece. By simultaneously rotating and revolving the work piece,
The film thickness and composition of the deposited film can be made uniform. Such a self-revolving system is effective when processing a workpiece whose vapor deposition surface is a polyhedron. For example, FIG. 5 shows a polygon mirror as an example of a workpiece. As shown in the figure, the light reflecting surface of the conventional polygon mirror is a vertical polyhedron. The holder is inserted into the opening formed in the central portion of the vertical polyhedron to rotate the holder, and the workpiece is revolved along the inner wall of the vacuum container above the vapor deposition source. At this time, since the reflecting surface, that is, the vapor deposition surface is composed of vertical multiple surfaces, the holder is supported by the revolution member so as to be horizontal with respect to the vapor deposition source. In other words, the inclination angle of the rotation shaft is fixed horizontally in the conventional rotation-retaining tool.

[Problems to be solved by the invention]

However, in recent years, a deformed polygon mirror having an inclined polyhedral surface as shown in FIG. 6 has been widely used. When forming a vapor-deposited film on this inclined polyhedral surface, a problem occurs in the conventional holding mechanism in which the rotation axis is fixed horizontally. That is, since it is not possible to hold the inclined polyhedral surface perpendicular to the vapor deposition normal of the vapor deposition source, it is not possible to form a vapor deposition reflective film having a uniform composition and film thickness.

Therefore, when vapor deposition is performed on a workpiece having a different shape, it is conceivable to design a revolving jig according to each shape. However, there are various shapes of the work piece, and it is inefficient to design the revolving jig according to each shape. Therefore, an object of the present invention is to provide a vacuum vapor deposition apparatus equipped with a revolving jig that can be generally applied to irregularly shaped workpieces having different dimensions and inclination angles, for example, an inclined polyhedron. .

[Means for solving problems]

In view of the above-mentioned problems, in order to achieve the object of the present invention, an improved vapor deposition apparatus has a vacuum vessel, a vapor deposition source arranged in the vacuum vessel, and a vapor deposition normal line of the vapor deposition source as the center of revolution. And a revolving ring member that is revolvable. Furthermore, it has at least one rotation shaft. The rotation axis of the rotation shaft is radially aligned with the center of revolution. The rotation shaft can hold a workpiece, for example, a deformed inclined polyhedron shown in FIG. 6, along the rotation axis. Further, the rotation shaft is locked to the revolution ring member at the end of the rotation shaft with the inclination angle of the rotation shaft adjustable with respect to the revolution plane defined by the revolution ring member. Here, a stationary guide ring having an annular inclined guide surface is arranged inside the revolution ring member. The rotation flange is fixed to each rotation shaft. The rotation flange is in contact with the guide surface of the stationary guide ring so as to be rotatable. As a result, the individual rotation shafts revolve around the guide ring as the revolution ring member rotates, and the revolution torque is converted into the rotation torque through the rotation flange, so that the rotation shafts rotate simultaneously and smoothly. Be done. The height position of the guide ring is designed to be adjustable with respect to the revolution plane defined by the revolution ring member. By adjusting this height position appropriately,
The inclination angle of the rotation shaft is selected to obtain the optimum posture of the work piece.

According to one aspect of the present invention, each rotation shaft may have a structure in which rotation flanges having different diameters can be exchangeably fixed, and the inclination angle of the rotation shaft can be individually adjusted. According to another aspect of the present invention, the height position of the revolution ring member with respect to the vapor deposition surface can be adjusted, and a vapor deposition film having a desired film quality can be obtained by appropriately adjusting the vapor deposition rate. According to still another aspect, incliningly retained bearing portions are arranged in the peripheral portion of the revolution ring member, and each of the rotating shafts is detachably attached to the corresponding bearing portion at its end portion. It has a structure that can be engaged. Therefore, the work can be held on the rotation shaft and then mounted on the revolution ring, and the workability is significantly improved.

[Function of device]

According to the configuration of the present invention described above, the inclination angle of the rotation shaft that holds the workpiece can be adjusted with respect to the revolution plane. Therefore, by setting the inclination angle of the rotation shaft so that the vapor deposition surface of the work piece becomes substantially perpendicular to the vapor deposition normal, for example, a uniform composition can be obtained even for a deformed work piece having an inclined polyhedral surface. And a vapor deposition film having a film thickness can be formed.

〔Example〕

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic front view showing the structure of a vapor deposition apparatus equipped with a rotation and revolution jig. As shown, the vacuum container 1
The vapor deposition source 2 is arranged at the bottom of the. The vapor deposition source 2 is used for melting a desired vapor deposition material by resistance heating or electron beam heating to blow particles in the vapor deposition normal direction. Evaporation source 2
An orbital ring 3 is arranged above. The orbital ring 3 is supported horizontally by a column (not shown). The revolution ring 3 revolves around a revolution normal line, that is, a straight line connecting the vapor deposition source 2 and the film thickness monitor 4. For this reason, the ring gear 5 is fixed to the back surface of the revolution ring 3, and is engaged with the pinion 7 fixed to the tip of the rotation shaft of the motor 6. The revolution ring 3 rotates at a desired speed by rotating the motor 6 at a constant speed. Although not shown, the column supporting the revolution ring 3 has, for example, a plunger structure, and the horizontal height of the revolution ring 3 can be adjusted with respect to the vapor deposition source 2.

A plurality of rotation shafts 8 are mounted on the surface side of the revolution ring 3. When the vapor deposition apparatus shown in FIG. 1 is viewed from above, the plurality of rotation shafts 8 are radially arranged from the center of revolution. A workpiece 9 is held along the rotation shaft 8. Further, the rotation shaft 8 is inclined with respect to the revolution plane defined by the revolution ring 3, and its inclination angle can be adjusted.

A stationary guide ring 10 is arranged inside the revolution ring 3. As shown, the guide ring 10 has an annular light guide surface. In addition, the rotation shaft 8 has a rotation flange 11
Is stuck. This rotating flange 11 is a guide ring 10
Rotatably abuts on the inclined guide surface. The height position of the guide ring 10 can be adjusted by the adjusting mechanism 12 with respect to the revolution plane of the revolution ring 3. By adjusting the height of the guide ring 10, the inclination angle of the rotation shaft 8 can be set appropriately. For example, the inclination angle can be set so that the vapor deposition surface of the workpiece 9 is orthogonal to the vapor deposition normal. Further, each of the rotating shafts 8 has a structure in which rotating flanges 11 having different diameters can be exchangeably fixed. Therefore, the inclination angle of each rotation shaft 8 can be adjusted individually. This is effective when batch-processing workpieces having different geometries at the same time.

A bearing portion 13 is arranged on the surface of the revolution ring 3.
The bearing portion 13 is locked so as to be tiltable on the revolution ring. The rear end portion of the rotation shaft 8 is a corresponding bearing portion.
It is configured to be detachably engaged with 13. Therefore, the work piece 9 can be mounted on the bearing portion 13 after holding the work piece 9 on the rotation shaft 8, and the workability is remarkably improved.

FIG. 2 is a schematic plan view of the vapor deposition device shown in FIG. 1 seen from above. As described above, the plurality of rotation shafts 8 are radially arranged from the center of revolution of the revolution ring 3.
Further, it is rotatably locked to the revolving surface at a predetermined inclination angle via a bearing portion 13. Therefore, when the revolution ring 3 revolves as shown by the arrow, the six rotation shafts 8
Also revolves clockwise. At this time, the rotation flange 11 fixed to each rotation shaft 8 rotates or rolls along the inclined guide surface of the stationary guide ring 10. Since the rotation shaft 8 fixed to the rolling flange 11 that is rolling is rotatably locked with respect to the bearing portion 13, the rotation shaft 8 performs a rotation movement as shown by an arrow. Therefore, although not shown, the workpieces held by the respective rotation shuffs 8 rotate and revolve at the same time.

FIG. 3 is a detailed sectional view showing the structure of the rotation shaft 8. As shown, the rotation shaft 8 has a mandrel 14.
The outer diameter of the rear end portion 15 of the mandrel 14 is large and a stopper step is formed. Work piece 9 from the tip of this mandrel 14
And the spacers 16 are alternately inserted to hold a plurality of workpieces 9. A screw hole is formed in the rear end spacer 16 so as to penetrate the side wall thereof. Each workpiece 9 is fixed to the mandrel 14 by inserting a screw 17 into this screw hole. Flange
A sleeve 18 is formed on the front side of 11 so that the rear end portion 15 of the mandrel 14 can be detachably received. The flange 11 and the mandrel 14 are fixed to each other by screws 19. A shaft pin 20 is formed on the back surface side of the flange 11.

On the other hand, the bearing portion 13 is a bearing frame via the pivot pin 21.
22 is rotatably engaged. The bearing frame 22 is fixed to the upper surface of the revolution ring 3. Cylindrical bearing part 13
A rotary bearing 23 is incorporated at the tip of the. The shaft pin 20 of the rotation flange 11 is inserted into the rotary bearing 23. As a result, the rotation shaft 8 is
It is rotatably held by and is pivotally or tiltably supported via a pivot pin 21.

FIG. 4 is an enlarged partial sectional view showing the support structure of the revolution ring 3. As shown in the figure, the revolution ring 3 is horizontally supported by a plurality of columns 24, for example, three columns 24 arranged at equal angular intervals. However, in FIG. 4, only one column is shown. A bearing 25 for horizontal support is attached to the top of the column 24, and another bearing 26 for vertical support is attached below the bearing 25. The revolution ring 3 is supported and guided by the pair of bearings 25 and 26 so as to be rotatable along the circumferential surface and the lower side surface thereof. Prop
A plunger mechanism 27 is attached to the bottom of 24,
The horizontal height of the revolution ring 3 can be adjusted by expanding and contracting the pillar 24.

On the other hand, the stationary guide ring 10 is supported by three legs 28. However, in FIG. 4, only one leg is shown. A bolt screw 30 is provided below the leg 28 via a connecting member 29.
Is installed vertically. The bolt screw 30 penetrates the beam 31 fixed to the column 24. A pair of nut screws 32 and 33 are inserted in the bolt screw 30 with the beam 31 interposed therebetween. The position of the guide ring 10 in the height direction can be adjusted by the combination of the bolt and the nut.

[Effect of device]

As described above, according to the present invention, the rotation shaft that holds the workpiece is inclined with respect to the revolution surface, and the inclination angle can be freely set. Therefore, even for irregularly shaped workpieces whose vapor deposition surface is an inclined polyhedron, it is possible to keep the vapor deposition surface horizontal by adjusting the inclination angle of the rotation shaft, and to obtain a uniform film quality and film thickness. There is an effect that the vapor deposition film which it has can be formed. Further, since the rotation shaft is radially arranged and inclined with respect to the vapor deposition source, the space in the vacuum container can be effectively used, and the batch processing amount per one time is increased. Furthermore, different inclination angles can be set by individually changing the outer shape of the rotation flange that defines the inclination angle of each rotation shaft. For this reason, it is suitable for multi-product small-quantity production in which irregularly shaped workpieces having different shapes and sizes can be batch processed at the same time. In addition, since the rotating shaft has a structure that is attachable to and detachable from the bearing, the workability can be remarkably improved because the workpiece can be first set on the rotating shaft and then set on the bearing. In addition, since the horizontal height of the revolution ring with respect to the vapor deposition source can be freely set, the optimum vapor deposition rate can be selected and the quality of the vapor deposited film can be improved.
Particularly important point is that the posture of the work piece can be freely set by adjusting the inclination angle of the rotation shaft in order to obtain the optimum deposition condition according to the size and shape of the work piece. Has the effect of being extremely versatile.
In the case of depositing a workpiece having a vertical multi-facet deposition surface as in the prior art, since the inclination angle of the rotation shaft 8 can be substantially horizontal, no additional mechanism is required. .

[Brief description of drawings]

FIG. 1 is a schematic front view showing the overall configuration of a vapor deposition apparatus with a rotation and revolution jig, FIG. 2 is a schematic plan view of the vapor deposition apparatus with a rotation and revolution jig, and FIG. 3 is a vapor deposition apparatus with a rotation and revolution jig. Partial sectional view showing a detailed structure of a rotation shaft which is a main component, FIG. 4 is a schematic partial cross-sectional view showing a support structure of a revolution ring which is a main component of a vapor deposition apparatus with a rotation and revolution jig, and FIG. And the sixth
The figure is a schematic perspective view showing an example of the shape of a workpiece. 1 ... Vacuum container, 2 ... Evaporation source 3 ... Revolution ring, 5 ... Ring key 6 ... Motor, 7 ... Pinion 8 ... Rotating shaft, 9 ... Workpiece 10 ... Guide ring, 11 ... … Rotating flange 12 …… Adjustment mechanism, 13 …… Bearing part 21 …… Pivot pin, 22 …… Bearing frame 23 …… Bearing, 24 …… Stand 27 …… Plunger mechanism, 28 …… Leg part 30 …… Bolt screw, 32 …… Nut screw 33 …… Nut screw

Claims (4)

(57) [Scope of utility model registration request] 1. A vacuum vessel, a vapor deposition source arranged in the vacuum vessel, an orbital ring member rotatably disposed with a vapor deposition normal of the vapor source as the center of the public point, and from the center of the public point. It has rotation shafts arranged in a radial pattern, holds a workpiece along the rotation shaft, and is locked to the rotation ring member at the rotation shaft end in a state in which the inclination angle of the rotation shaft with respect to the rotation plane can be adjusted. A vapor deposition apparatus comprising a rotating shaft, wherein a stationary guide ring is provided inside a revolving ring member and has an annular inclined guide surface, and a stationary guide ring fixed to the rotating shaft and capable of rotating and traveling with respect to the guide surface. A vapor deposition apparatus comprising: a rotating flange in contact with the rotating flange; and an adjusting mechanism for adjusting the height position of the guide ring with respect to the revolution plane. 2. The vapor deposition apparatus according to claim 1, wherein the rotation shaft has a structure in which rotation flanges having different diameters can be exchangeably fixed. 3. The vapor deposition apparatus according to claim 1, further comprising an adjusting mechanism for adjusting the height position of the revolution ring member with respect to the vapor deposition source. 4. The vapor deposition apparatus according to claim 1, further comprising a bearing portion that is tiltably locked on the surface of the revolving ring member, and the rotation shaft detachably engages with the bearing portion at an end portion thereof. .