JP2518162B2 - Semiconductor integrated circuit failure inspection equipment - Google Patents

Semiconductor integrated circuit failure inspection equipment

Info

Publication number
JP2518162B2
JP2518162B2 JP5322523A JP32252393A JP2518162B2 JP 2518162 B2 JP2518162 B2 JP 2518162B2 JP 5322523 A JP5322523 A JP 5322523A JP 32252393 A JP32252393 A JP 32252393A JP 2518162 B2 JP2518162 B2 JP 2518162B2
Authority
JP
Japan
Prior art keywords
laser
chip
laser beam
irradiating
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP5322523A
Other languages
Japanese (ja)
Other versions
JPH07174723A (en
Inventor
和宏 坂口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP5322523A priority Critical patent/JP2518162B2/en
Publication of JPH07174723A publication Critical patent/JPH07174723A/en
Application granted granted Critical
Publication of JP2518162B2 publication Critical patent/JP2518162B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Investigating Or Analyzing Materials Using Thermal Means (AREA)
  • Tests Of Electronic Circuits (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体集積回路故障検
査装置に関し、特に半導体集積回路チップにおける各種
素子の故障をレーザビームを用いて検査する半導体集積
回路の故障検査装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor integrated circuit failure inspection apparatus, and more particularly to a semiconductor integrated circuit failure inspection apparatus for inspecting various elements in a semiconductor integrated circuit chip for failure using a laser beam.

【0002】[0002]

【従来の技術】従来の、この種の半導体集積回路故障検
査装置に電子ビームを用いたものがある。これは、半導
体チップ表面に電子ビームを照射し、照射によるその2
次電子の量がチップ表面の電圧に関係することを利用
し、半導体集積回路内部の電圧を測定し、故障の検査を
行なうものである。しかしこの電子ビームを用いた手法
では、電圧の高精度な測定が難しいこと、チップ表面に
ある配線部分の電圧のみが測定可能であり、多層配線の
場合チップ内部の配線の電位は測定不能であるなどの難
点が存在した。さらに観測した電位から実際の物理的な
故障位置を特定することに対しても難しい問題があっ
た。
2. Description of the Related Art There is a conventional semiconductor integrated circuit failure inspection device of this type using an electron beam. This is done by irradiating the surface of the semiconductor chip with an electron beam and irradiating it.
By utilizing the fact that the amount of secondary electrons is related to the voltage on the surface of the chip, the voltage inside the semiconductor integrated circuit is measured and the failure is inspected. However, with this method using an electron beam, it is difficult to measure the voltage with high accuracy, and it is possible to measure only the voltage of the wiring part on the chip surface, and in the case of multilayer wiring, the potential of the wiring inside the chip cannot be measured. There were difficulties such as. Furthermore, there is a difficult problem in identifying the actual physical failure position from the observed potential.

【0003】一方、特許願5−85817「半導体集積
回路内部相互配線の検査方法および装置」に基づく方法
では、半導体チップ表面にある配線の内部の欠陥を検査
することが可能である。これは、半導体チップ表面にレ
ーザビームを照射することにより、照射部の温度を変化
させ、配線内部の欠陥の有無によりその熱伝導状態が異
なることから温度の変動幅に差を生じ、これによる電気
抵抗値の変動の差を用いて欠陥の位置を特定するもので
ある。しかしこの手法では、トランジスタ等の非配線部
の欠陥を検出することは不可能である。
On the other hand, in the method based on Japanese Patent Application No. 5-85817 "Inspection method and apparatus for internal interconnection of semiconductor integrated circuit", it is possible to inspect internal defects of interconnections on the surface of a semiconductor chip. This is because the temperature of the irradiated part is changed by irradiating the surface of the semiconductor chip with a laser beam, and the thermal conduction state varies depending on the presence or absence of defects inside the wiring, resulting in a difference in the temperature fluctuation range. The position of the defect is specified by using the difference in the fluctuation of the resistance value. However, with this method, it is impossible to detect a defect in a non-wiring portion such as a transistor.

【0004】[0004]

【発明が解決しようとする課題】この従来の半導体集積
回路故障検査装置では、観測した回路中の電位から実際
の物理的故障位置を特定しようとするため、多大な時間
を必要とし、場合によっては不可能となる。また、多層
配線等により目的とする配線が表面に存在しない場合、
当該部の電位は測定不可能である。一方後者の手法に関
しては、故障位置が直ちに特定可能であるという利点が
あるが、配線部における故障のみを対象とし、それ以外
の故障に関しては対応できないという問題がある。
In this conventional semiconductor integrated circuit failure inspection apparatus, it takes a lot of time to identify the actual physical failure position from the observed potential in the circuit. It will be impossible. Also, if the target wiring does not exist on the surface due to multilayer wiring, etc.,
The potential of the part cannot be measured. On the other hand, the latter method has an advantage that the failure position can be immediately specified, but has a problem that only the failure in the wiring portion is targeted and other failures cannot be dealt with.

【0005】[0005]

【課題を解決するための手段】上述した問題点を解決す
るため、本発明による半導体集積回路故障検査装置は、
レーザビームを半導体チップ表面に照射し、照射部の温
度変化に基づく半導体素子の温度特性が、故障素子と正
常素子との間で異なることに起因する半導体集積回路デ
バイスの入出力特性の差に着目する。
In order to solve the above problems, a semiconductor integrated circuit failure inspection apparatus according to the present invention is
Focusing on the difference in the input / output characteristics of the semiconductor integrated circuit device due to the fact that the semiconductor chip surface is irradiated with a laser beam and the temperature characteristics of the semiconductor element based on the temperature change of the irradiation part differ between the defective element and the normal element. To do.

【0006】本発明の半導体集積回路故障検査装置は、
半導体集積回路チップの故障検出/診断装置において、
半導体集積回路チップ表面を局所的に温度上昇させる
ームを発生するレーザ発生部と、前記レーザ発生部より
のレーザビームを受け、良品チップ照射用レーザビーム
と被検査チップ照射用レーザビームとに2分するレーザ
分配器と、前記レーザ分配器から良品チップ照射用レー
ザビームを受け、良品チップ上を走査、照射するための
第1のレーザ走査部と、前記レーザ分配器から被検査チ
ップ照射用レーザビームを受け、被検査チップ上を走
査、照射するための第2のレーザ走査部と、良品デバイ
スと、被検査デバイスにそれぞれの回路特性を測定する
ための電源および入力信号を供給する電源/入力信号発
生部と、前記良品デバイスと、前記被検査デバイスから
の出力信号を取り込み、両者の回路特性を求め、各素子
の温度特性の相違による回路特性の変動の比較を行なう
出力信号検出/比較処理部と、前記第1及び第2のレー
ザ走査部からのレーザビーム照射位置情報と、出力信号
検出/比較処理部からの結果に基づき被検査デバイスチ
ップにおける故障素子を指摘する画像を作成する画像処
理部と、その画像を表示する画像表示デバイスとから構
成されることを特徴とする。
The semiconductor integrated circuit failure inspection apparatus of the present invention comprises:
In a failure detection / diagnosis device for a semiconductor integrated circuit chip,
A laser generator for generating a beam that locally raises the temperature of the semiconductor integrated circuit chip surface, and a laser beam for receiving a laser beam from the laser generator and irradiating a non-defective chip and an inspected chip. A laser distributor that divides the laser beam into two parts, a first laser scanning unit that receives a laser beam for irradiating a non-defective chip from the laser distributor, scans and irradiates a non-defective chip, and a laser beam from the laser distributor. A second laser scanning unit for receiving a laser beam for irradiating an inspection chip to scan and irradiate the chip to be inspected, a non-defective device, and a circuit characteristic of each device to be inspected are measured.
Determined the power supply and supplying the input signal power / input signal generating unit, and the good devices, the capture of the output signal from the device under test, the circuit characteristics of both for each element
Output signal detection / comparison processing section for comparing circuit characteristic variations due to differences in temperature characteristics, laser beam irradiation position information from the first and second laser scanning sections, and output signal detection / comparison processing section. It is characterized by comprising an image processing unit for creating an image indicating a defective element in the device chip to be inspected based on the result of 1. and an image display device for displaying the image.

【0007】[0007]

【実施例】次に本発明について図面を参照して説明す
る。図1は、本発明の一実施例を示すブロック図であ
る。図1においてレーザ発生部1は半導体集積回路チッ
プに照射するレーザビームを発生する。レーザ分配器2
はレーザ発生部1で発生したレーザビームを受け、これ
を被検査デバイス11のチップ13と参照用の良品デバ
イス10のチップ12に照射するために2分し、それぞ
れの光路に導く。レーザ走査部3,4はそれぞれレーザ
分配器2より受けたレーザビームを整形し、参照用良品
デバイスのチップ12、被検査デバイス11のチップ1
3に走査しながら照射する。このときそれぞれのレーザ
走査部3,4は互いに同期を取ってビーム走査を行な
う。
The present invention will be described below with reference to the drawings. FIG. 1 is a block diagram showing an embodiment of the present invention. In FIG. 1, a laser generator 1 generates a laser beam with which a semiconductor integrated circuit chip is irradiated. Laser distributor 2
Receives the laser beam generated by the laser generator 1, divides the laser beam into two for irradiating the chip 13 of the device under test 11 and the chip 12 of the non-defective device 10 for reference, and guides them to their respective optical paths. The laser scanning units 3 and 4 shape the laser beam received from the laser distributor 2, respectively, and refer to the chip 12 of the reference good device and the chip 1 of the device under test 11.
Irradiate while scanning to 3. At this time, the laser scanning units 3 and 4 perform beam scanning in synchronization with each other.

【0008】温度制御器5は良品デバイス10、被検査
デバイス11の温度を一定に保ち、測定時のノイズの低
減を行なう。
The temperature controller 5 keeps the temperature of the non-defective device 10 and the device under test 11 constant and reduces noise during measurement.

【0009】電源/入力信号発生部6は、良品デバイス
10、被検査デバイス12に電源を供給し、テスト信号
を入力する。
The power supply / input signal generator 6 supplies power to the non-defective device 10 and the device under test 12 and inputs a test signal.

【0010】レーザビームが照射されることにより照射
部の温度は局所的に上昇する。ところで、チップ上に構
成されているトランジスタ等の半導体素子は、その温度
特性は極めて敏感であり、半導体素子部にレーザビーム
が照射されたとき、その温度変化による半導体デバイス
の出力特性は大きく変動する。ここで、故障を起してい
る半導体素子と、正常な半導体素子とではその温度特性
は異なり、半導体デバイスの出力特性にもその温度特性
の差異が反映される。このため、レーザビームをレーザ
走査部3,4で参照良品チップ12、被検査チップ13
上を走査、照射しながら、その出力を、出力信号検出/
比較処理部9により観測し、レーザビームの照射によ
る、各半導体デバイスの出力特性の変化を観測し、比較
処理を行なうことで、故障素子にレーザ照射された時の
特異的な出力特性の変化が検出できる。
The irradiation of the laser beam locally raises the temperature of the irradiation portion. By the way, the temperature characteristics of semiconductor elements such as transistors formed on a chip are extremely sensitive, and when the semiconductor element section is irradiated with a laser beam, the output characteristics of the semiconductor device greatly change due to the temperature change. . Here, the temperature characteristic differs between the semiconductor element having a failure and the normal semiconductor element, and the difference in the temperature characteristic is also reflected in the output characteristic of the semiconductor device. Therefore, the laser beam is used by the laser scanning units 3 and 4 to refer to the non-defective chip 12 and the inspected chip 13.
While scanning and irradiating the top, the output is detected / output signal
By observing by the comparison processing unit 9 and observing the change in the output characteristics of each semiconductor device due to the irradiation of the laser beam, and performing the comparison processing, the change in the specific output characteristics when the faulty element is irradiated with the laser is observed. Can be detected.

【0011】画像処理部8は、出力信号検出/比較処理
部9の結果を受け、またレーザ走査部3,4より、レー
ザビームの照射位置情報を受け取り、画像表示デバイス
7上に結果を出力する。これにより、半導体チップの故
障素子の特定が直ちに可能となる。
The image processing unit 8 receives the result of the output signal detection / comparison processing unit 9, receives the laser beam irradiation position information from the laser scanning units 3 and 4, and outputs the result on the image display device 7. . As a result, the defective element of the semiconductor chip can be immediately identified.

【0012】レーザビームの波長、パワーは、走査する
速度、デバイスの種類などを勘定して決定する。
The wavelength and power of the laser beam are determined by counting the scanning speed and the type of device.

【0013】[0013]

【発明の効果】以上説明したように、本発明による半導
体集積回路故障検査装置は、温度変化による半導体素子
の特性の変動が正常素子と不良素子とでは異なることを
利用し、故障位置を特定するため、半導体集積回路チッ
プの物理的故障位置を即座に指摘可能であり、またチッ
プ表面からでは観察不能なチップ内部の素子の故障も指
摘できるという効果がある。
As described above, the semiconductor integrated circuit failure inspection apparatus according to the present invention utilizes the fact that the variation of the characteristics of the semiconductor element due to the temperature change is different between the normal element and the defective element, thereby identifying the failure position. Therefore, the physical failure position of the semiconductor integrated circuit chip can be pointed out immediately, and the failure of the element inside the chip which cannot be observed from the surface of the chip can be pointed out.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による半導体集積回路故障検査装置の実
施例を示す装置構成図である。
FIG. 1 is a device configuration diagram showing an embodiment of a semiconductor integrated circuit failure inspection device according to the present invention.

【符号の説明】[Explanation of symbols]

1 レーザ発生部 2 レーザ分配器 3 良品半導体デバイス照射用レーザ走査部 4 被検査半導体デバイス照射用レーザ走査部 5 検査対象半導体デバイス温度制御器 6 電源/入力信号発生部 7 画像表示デバイス 8 画像処理部 9 出力信号検出/比較処理部 10 良品半導体デバイス 11 被検査半導体デバイス 12 良品半導体チップ 13 被検査半導体チップ 1 Laser Generator 2 Laser Distributor 3 Laser Scanner for Irradiating Good Semiconductor Device 4 Laser Scanner for Irradiating Semiconductor Device to be Inspected 5 Semiconductor Device Temperature Controller for Inspection 6 Power Supply / Input Signal Generator 7 Image Display Device 8 Image Processor 9 Output signal detection / comparison processing unit 10 Good semiconductor device 11 Inspected semiconductor device 12 Good semiconductor chip 13 Inspected semiconductor chip

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 半導体集積回路チップの故障検出/診断
装置において、 半導体集積回路チップ表面を局所的に温度上昇させる
ームを発生するレーザ発生部と、前記レーザ発生部より
のレーザビームを受け、良品チップ照射用レーザビーム
と被検査チップ照射用レーザビームとに2分するレーザ
分配器と、前記レーザ分配器から良品チップ照射用レー
ザビームを受け、良品チップ上を走査、照射するための
第1のレーザ走査部と、前記レーザ分配器から被検査チ
ップ照射用レーザビームを受け、被検査チップ上を走
査、照射するための第2のレーザ走査部と、 良品デバイスと、被検査デバイスにそれぞれの回路特性
を測定するための電源および入力信号を供給する電源/
入力信号発生部と、 前記良品デバイスと、前記被検査デバイスからの出力信
号を取り込み、両者の回路特性を求め、各素子の温度特
性の相違による回路特性の変動の比較を行なう出力信号
検出/比較処理部と、 前記第1及び第2のレーザ走査部からのレーザビーム照
射位置情報と、出力信号検出/比較処理部からの結果に
基づき被検査デバイスチップにおける故障素子を指摘す
る画像を作成する画像処理部と、その画像を表示する画
像表示デバイスとから構成されることを特徴とする半導
体集積回路故障検査装置。
1. A failure detection / diagnosis apparatus for a semiconductor integrated circuit chip, comprising: a laser generator that generates a beam that locally raises the temperature of the surface of the semiconductor integrated circuit chip; A laser distributor that receives a laser beam and divides it into a laser beam for irradiating good chips and a laser beam for irradiating chips to be inspected, and a laser beam for irradiating good chips from the laser distributor, scans and irradiates good chips. A first laser scanning unit for scanning, a second laser scanning unit for receiving a laser beam for irradiating a chip to be inspected from the laser distributor, scanning and irradiating the chip to be inspected, a non-defective device, and Circuit characteristics of each inspection device
Power supply for measuring
The output signals from the input signal generator, the non-defective device, and the device under test are fetched, the circuit characteristics of both are obtained, and the temperature characteristics of each element are determined.
Output signal detection / comparison processing section for comparing variations in circuit characteristics due to differences in characteristics, laser beam irradiation position information from the first and second laser scanning sections, and results from the output signal detection / comparison processing section A semiconductor integrated circuit failure inspection apparatus, comprising: an image processing unit that creates an image indicating a defective element in a device chip to be inspected based on the above; and an image display device that displays the image.
JP5322523A 1993-12-21 1993-12-21 Semiconductor integrated circuit failure inspection equipment Expired - Lifetime JP2518162B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5322523A JP2518162B2 (en) 1993-12-21 1993-12-21 Semiconductor integrated circuit failure inspection equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5322523A JP2518162B2 (en) 1993-12-21 1993-12-21 Semiconductor integrated circuit failure inspection equipment

Publications (2)

Publication Number Publication Date
JPH07174723A JPH07174723A (en) 1995-07-14
JP2518162B2 true JP2518162B2 (en) 1996-07-24

Family

ID=18144619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5322523A Expired - Lifetime JP2518162B2 (en) 1993-12-21 1993-12-21 Semiconductor integrated circuit failure inspection equipment

Country Status (1)

Country Link
JP (1) JP2518162B2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01216548A (en) * 1988-02-25 1989-08-30 Nec Corp Malfunction analyzer for semiconductor device

Also Published As

Publication number Publication date
JPH07174723A (en) 1995-07-14

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