JP2025517611A5 - - Google Patents
Info
- Publication number
- JP2025517611A5 JP2025517611A5 JP2024563539A JP2024563539A JP2025517611A5 JP 2025517611 A5 JP2025517611 A5 JP 2025517611A5 JP 2024563539 A JP2024563539 A JP 2024563539A JP 2024563539 A JP2024563539 A JP 2024563539A JP 2025517611 A5 JP2025517611 A5 JP 2025517611A5
- Authority
- JP
- Japan
- Prior art keywords
- image
- annealing
- laser
- scattering
- melt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202263337714P | 2022-05-03 | 2022-05-03 | |
| US63/337,714 | 2022-05-03 | ||
| PCT/US2023/016071 WO2023215046A1 (en) | 2022-05-03 | 2023-03-23 | Scatter melt detection systems and methods of using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025517611A JP2025517611A (ja) | 2025-06-10 |
| JP2025517611A5 true JP2025517611A5 (enExample) | 2026-04-08 |
Family
ID=88646827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024563539A Pending JP2025517611A (ja) | 2022-05-03 | 2023-03-23 | 散乱溶融検出システムおよびその使用方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12512346B2 (enExample) |
| JP (1) | JP2025517611A (enExample) |
| KR (1) | KR20250004835A (enExample) |
| CN (1) | CN119156531A (enExample) |
| TW (1) | TW202410232A (enExample) |
| WO (1) | WO2023215046A1 (enExample) |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004146782A (ja) * | 2002-08-29 | 2004-05-20 | Advanced Lcd Technologies Development Center Co Ltd | 結晶化状態のｉｎ−ｓｉｔｕモニタリング方法 |
| JP2012119512A (ja) * | 2010-12-01 | 2012-06-21 | Hitachi High-Technologies Corp | 基板の品質評価方法及びその装置 |
| US8546805B2 (en) * | 2012-01-27 | 2013-10-01 | Ultratech, Inc. | Two-beam laser annealing with improved temperature performance |
| US9099389B2 (en) * | 2012-02-10 | 2015-08-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus for reducing stripe patterns |
| US9559023B2 (en) * | 2014-06-23 | 2017-01-31 | Ultratech, Inc. | Systems and methods for reducing beam instability in laser annealing |
| JP6436664B2 (ja) * | 2014-07-14 | 2018-12-12 | 住友化学株式会社 | 基板の検査装置及び基板の検査方法 |
| US10083843B2 (en) * | 2014-12-17 | 2018-09-25 | Ultratech, Inc. | Laser annealing systems and methods with ultra-short dwell times |
| KR102546719B1 (ko) * | 2018-09-04 | 2023-06-21 | 삼성전자주식회사 | 모니터링 장치 및 모니터링 방법 |
| TWI737004B (zh) * | 2018-12-03 | 2021-08-21 | 日商住友重機械工業股份有限公司 | 退火裝置及退火方法 |
| JP7292387B2 (ja) * | 2019-05-31 | 2023-06-16 | ギガフォトン株式会社 | レーザアニール装置及び電子デバイスの製造方法 |
| JP2022539847A (ja) * | 2019-07-09 | 2022-09-13 | ビーコ インストゥルメント インク | 溶融検出システム及びその使用方法 |
| US20230268233A1 (en) * | 2022-02-18 | 2023-08-24 | Veeco Instruments Inc. | Laser Spike Annealing Process Temperature Calibration Utilizing Photoluminescence Measurements |
-
2023
- 2023-03-23 KR KR1020247038472A patent/KR20250004835A/ko active Pending
- 2023-03-23 CN CN202380038062.9A patent/CN119156531A/zh active Pending
- 2023-03-23 JP JP2024563539A patent/JP2025517611A/ja active Pending
- 2023-03-23 WO PCT/US2023/016071 patent/WO2023215046A1/en not_active Ceased
- 2023-03-31 TW TW112112719A patent/TW202410232A/zh unknown
- 2023-04-10 US US18/297,745 patent/US12512346B2/en active Active
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