JP2024035658A - Composition, cured product, display device, and solid-state imaging element - Google Patents
Composition, cured product, display device, and solid-state imaging element Download PDFInfo
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- JP2024035658A JP2024035658A JP2022140254A JP2022140254A JP2024035658A JP 2024035658 A JP2024035658 A JP 2024035658A JP 2022140254 A JP2022140254 A JP 2022140254A JP 2022140254 A JP2022140254 A JP 2022140254A JP 2024035658 A JP2024035658 A JP 2024035658A
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- 239000000203 mixture Substances 0.000 title claims abstract description 98
- 238000003384 imaging method Methods 0.000 title claims description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 165
- 229920005989 resin Polymers 0.000 claims abstract description 106
- 239000011347 resin Substances 0.000 claims abstract description 106
- 125000001424 substituent group Chemical group 0.000 claims abstract description 36
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 28
- 125000004432 carbon atom Chemical group C* 0.000 claims description 75
- 239000003505 polymerization initiator Substances 0.000 claims description 32
- 125000004434 sulfur atom Chemical group 0.000 claims description 20
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 16
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 9
- 150000004292 cyclic ethers Chemical group 0.000 claims description 8
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 125000000101 thioether group Chemical group 0.000 claims description 5
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 5
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- -1 and specifically Chemical group 0.000 description 133
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 82
- 239000000047 product Substances 0.000 description 76
- 239000000178 monomer Substances 0.000 description 41
- 239000010408 film Substances 0.000 description 38
- 150000002430 hydrocarbons Chemical group 0.000 description 36
- 239000002904 solvent Substances 0.000 description 34
- 125000001931 aliphatic group Chemical group 0.000 description 28
- 125000002723 alicyclic group Chemical group 0.000 description 25
- 125000000217 alkyl group Chemical group 0.000 description 25
- 239000011521 glass Substances 0.000 description 25
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 24
- 239000002253 acid Substances 0.000 description 23
- 239000003795 chemical substances by application Substances 0.000 description 21
- 238000000034 method Methods 0.000 description 21
- 238000006116 polymerization reaction Methods 0.000 description 19
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 18
- 239000003963 antioxidant agent Substances 0.000 description 18
- 238000000576 coating method Methods 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 16
- 239000000463 material Substances 0.000 description 16
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 15
- 125000005843 halogen group Chemical group 0.000 description 15
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 14
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 14
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 14
- 125000001153 fluoro group Chemical group F* 0.000 description 13
- 230000003287 optical effect Effects 0.000 description 13
- PTJWCLYPVFJWMP-UHFFFAOYSA-N 2-[[3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)COCC(CO)(CO)CO PTJWCLYPVFJWMP-UHFFFAOYSA-N 0.000 description 12
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 12
- 150000007513 acids Chemical class 0.000 description 12
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 12
- 239000011247 coating layer Substances 0.000 description 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- 125000003277 amino group Chemical group 0.000 description 11
- 125000001309 chloro group Chemical group Cl* 0.000 description 11
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 11
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 11
- 238000001228 spectrum Methods 0.000 description 11
- 238000005160 1H NMR spectroscopy Methods 0.000 description 10
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 10
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 10
- 150000008065 acid anhydrides Chemical class 0.000 description 10
- 125000004093 cyano group Chemical group *C#N 0.000 description 10
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 10
- 125000001624 naphthyl group Chemical group 0.000 description 10
- 239000004094 surface-active agent Substances 0.000 description 10
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 9
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 150000001299 aldehydes Chemical class 0.000 description 9
- 230000003078 antioxidant effect Effects 0.000 description 9
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 9
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 9
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 9
- 230000000977 initiatory effect Effects 0.000 description 9
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 9
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 8
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 8
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 8
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 8
- 229910052731 fluorine Inorganic materials 0.000 description 8
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 8
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 7
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 7
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 7
- 150000008064 anhydrides Chemical class 0.000 description 7
- 150000001735 carboxylic acids Chemical class 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 229960000583 acetic acid Drugs 0.000 description 6
- 235000011054 acetic acid Nutrition 0.000 description 6
- 150000001408 amides Chemical class 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 125000001246 bromo group Chemical group Br* 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 239000004615 ingredient Substances 0.000 description 6
- 125000002950 monocyclic group Chemical group 0.000 description 6
- 125000003566 oxetanyl group Chemical group 0.000 description 6
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 6
- 125000003367 polycyclic group Chemical group 0.000 description 6
- 229920006395 saturated elastomer Polymers 0.000 description 6
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 5
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 5
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- 239000002585 base Substances 0.000 description 5
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 5
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- 230000014759 maintenance of location Effects 0.000 description 5
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 5
- 239000002530 phenolic antioxidant Substances 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 5
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical group CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 4
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 4
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 4
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- XOUQAVYLRNOXDO-UHFFFAOYSA-N 2-tert-butyl-5-methylphenol Chemical compound CC1=CC=C(C(C)(C)C)C(O)=C1 XOUQAVYLRNOXDO-UHFFFAOYSA-N 0.000 description 4
- YCOXTKKNXUZSKD-UHFFFAOYSA-N 3,4-xylenol Chemical compound CC1=CC=C(O)C=C1C YCOXTKKNXUZSKD-UHFFFAOYSA-N 0.000 description 4
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- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
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- 239000003112 inhibitor Substances 0.000 description 4
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- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
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- 238000005259 measurement Methods 0.000 description 4
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- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 4
- IXQGCWUGDFDQMF-UHFFFAOYSA-N o-Hydroxyethylbenzene Natural products CCC1=CC=CC=C1O IXQGCWUGDFDQMF-UHFFFAOYSA-N 0.000 description 4
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- 235000006408 oxalic acid Nutrition 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- 235000011007 phosphoric acid Nutrition 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- 238000000411 transmission spectrum Methods 0.000 description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 4
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- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- LGOPTUPXVVNJFH-UHFFFAOYSA-N pentadecanethioic s-acid Chemical compound CCCCCCCCCCCCCCC(O)=S LGOPTUPXVVNJFH-UHFFFAOYSA-N 0.000 description 1
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- 239000013500 performance material Substances 0.000 description 1
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- 239000005011 phenolic resin Substances 0.000 description 1
- WLVPQQDEYVVXJF-UHFFFAOYSA-N phenyl bicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C(C=C2)CC2C1C(=O)OC1=CC=CC=C1 WLVPQQDEYVVXJF-UHFFFAOYSA-N 0.000 description 1
- HPAFOABSQZMTHE-UHFFFAOYSA-N phenyl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)C1=CC=CC=C1 HPAFOABSQZMTHE-UHFFFAOYSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 229940100595 phenylacetaldehyde Drugs 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- UXCDUFKZSUBXGM-UHFFFAOYSA-N phosphoric tribromide Chemical compound BrP(Br)(Br)=O UXCDUFKZSUBXGM-UHFFFAOYSA-N 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical class OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
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- 239000004033 plastic Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920003050 poly-cycloolefin Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
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- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 1
- 229940116357 potassium thiocyanate Drugs 0.000 description 1
- WQKGAJDYBZOFSR-UHFFFAOYSA-N potassium;propan-2-olate Chemical compound [K+].CC(C)[O-] WQKGAJDYBZOFSR-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
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- 235000019260 propionic acid Nutrition 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- CYIRLFJPTCUCJB-UHFFFAOYSA-N propyl 2-methoxypropanoate Chemical compound CCCOC(=O)C(C)OC CYIRLFJPTCUCJB-UHFFFAOYSA-N 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
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- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 239000005336 safety glass Substances 0.000 description 1
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000002453 shampoo Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
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- 239000005368 silicate glass Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 description 1
- WBQTXTBONIWRGK-UHFFFAOYSA-N sodium;propan-2-olate Chemical compound [Na+].CC(C)[O-] WBQTXTBONIWRGK-UHFFFAOYSA-N 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010421 standard material Substances 0.000 description 1
- 125000003696 stearoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000011145 styrene acrylonitrile resin Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 229950000244 sulfanilic acid Drugs 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Inorganic materials O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 1
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 230000000475 sunscreen effect Effects 0.000 description 1
- 239000000516 sunscreening agent Substances 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- BZBMBZJUNPMEBD-UHFFFAOYSA-N tert-butyl bicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C2C(C(=O)OC(C)(C)C)CC1C=C2 BZBMBZJUNPMEBD-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- LVEOKSIILWWVEO-UHFFFAOYSA-N tetradecyl 3-(3-oxo-3-tetradecoxypropyl)sulfanylpropanoate Chemical compound CCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCC LVEOKSIILWWVEO-UHFFFAOYSA-N 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 150000003549 thiazolines Chemical class 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- VOVUARRWDCVURC-UHFFFAOYSA-N thiirane Chemical compound C1CS1 VOVUARRWDCVURC-UHFFFAOYSA-N 0.000 description 1
- 150000003553 thiiranes Chemical group 0.000 description 1
- 235000019303 thiodipropionic acid Nutrition 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- 229960004319 trichloroacetic acid Drugs 0.000 description 1
- OHRVKCZTBPSUIK-UHFFFAOYSA-N tridodecyl phosphate Chemical compound CCCCCCCCCCCCOP(=O)(OCCCCCCCCCCCC)OCCCCCCCCCCCC OHRVKCZTBPSUIK-UHFFFAOYSA-N 0.000 description 1
- IVIIAEVMQHEPAY-UHFFFAOYSA-N tridodecyl phosphite Chemical compound CCCCCCCCCCCCOP(OCCCCCCCCCCCC)OCCCCCCCCCCCC IVIIAEVMQHEPAY-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- QOQNJVLFFRMJTQ-UHFFFAOYSA-N trioctyl phosphite Chemical compound CCCCCCCCOP(OCCCCCCCC)OCCCCCCCC QOQNJVLFFRMJTQ-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- QQBLOZGVRHAYGT-UHFFFAOYSA-N tris-decyl phosphite Chemical compound CCCCCCCCCCOP(OCCCCCCCCCC)OCCCCCCCCCC QQBLOZGVRHAYGT-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229940042596 viscoat Drugs 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000003799 water insoluble solvent Substances 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 235000016804 zinc Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/06—Polythioethers from cyclic thioethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/12—Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本発明は組成物に関する。また、本発明は、該組成物の硬化物、該硬化物を含む表示装置、及び該硬化物を含む固体撮像素子にも関する。 The present invention relates to compositions. The present invention also relates to a cured product of the composition, a display device including the cured product, and a solid-state imaging device including the cured product.
光学機器の分野において高屈折材料が要望されている。高屈折材料によりレンズを得ることができ、レンズにより光学機器内の光路を制御することができる。固体撮像素子において各光電変換素子への集光効率を向上させる目的でレンズが用いられ、また表示装置において画素からの光の取り出し効率を向上させる目的でレンズが用いられている。従来、種々の高屈折材料の開発がなされている(例えば特許文献1)。 High refractive materials are desired in the field of optical equipment. Lenses can be obtained from highly refractive materials and can control the optical path within an optical device. Lenses are used in solid-state image sensors to improve the efficiency of light collection to each photoelectric conversion element, and lenses are used in display devices to improve the efficiency of light extraction from pixels. Conventionally, various high refractive materials have been developed (for example, Patent Document 1).
本発明の1つの目的は、高い屈折率を示す硬化物を与えることができ、硬化性にも優れる新たな組成物を提供することにある。本発明の他の目的は、該組成物の硬化物、該硬化物を含む表示装置、及び該硬化物を含む固体撮像素子を提供することにある。 One object of the present invention is to provide a new composition that can provide a cured product exhibiting a high refractive index and also has excellent curability. Another object of the present invention is to provide a cured product of the composition, a display device including the cured product, and a solid-state imaging device including the cured product.
本発明は、以下を含む。
〔1〕 式(I)で表される化合物と波長550nmにおける屈折率が1.60以上である樹脂とを含む組成物。
[式(I)中、
nは0~6のいずれかの整数を表し、
Lは単結合又は2価の基を表し、複数あるLは同一であっても異なっていてもよく、
R11は1価の置換基を表し、R11が複数ある場合、複数のR11は同一であっても異なっていてもよく、
R12は、水素原子、式(1a)、及び式(1b)からなる群から選択され、複数あるR12は同一であっても異なっていてもよい。
式(1a)中、
AはO原子またはS原子を表し、式(I)においてAが複数ある場合、複数のAは同一であっても異なっていてもよく、
maは0又は1を表し、式(I)においてmaが複数ある場合、複数のmaは同一であっても異なっていてもよく、
R2は、水素原子又は1価の置換基を表し、R2が複数ある場合、複数のR2は同一であっても異なっていてもよく、
*はLとの結合手を表す。
式(1b)中、
R13は1価の置換基を表し、R13が複数ある場合、複数のR13は同一であっても異なっていてもよく、
*はLとの結合手を表す。]
〔2〕 前記樹脂は、(メタ)アクリロイル基、メルカプト基、炭素数2~4の環状エーテル基、及び炭素数2~4の環状スルフィド基からなる群より選ばれる一つの重合性基を含む、〔1〕に記載の組成物。
〔3〕 前記樹脂が式(A)で表される樹脂である、〔1〕又は〔2〕に記載の組成物。
[式(A)中、
Rは1価の炭化水素基を表し、Rが複数ある場合、複数のRは同一であっても異なっていてもよく、
nは平均値で1以上の数を表し、
AはO原子又はS原子を表し、複数あるAは同一であっても異なっていてもよい。]
〔4〕 さらに重合開始剤を含む、〔1〕~〔3〕のいずれか1項に記載の組成物。
〔5〕 式(I)で表される化合物は、式(I)中に複数あるR12が式(1a)で表される化合物を含む、〔1〕~〔4〕のいずれか1項に記載の組成物。
〔6〕 〔1〕~〔5〕のいずれか1項に記載の組成物の硬化物。
〔7〕 〔6〕に記載の硬化物を含む表示装置。
〔8〕 〔6〕に記載の硬化物を含む固体撮像素子。
The present invention includes the following.
[1] A composition containing a compound represented by formula (I) and a resin having a refractive index of 1.60 or more at a wavelength of 550 nm.
[In formula (I),
n represents any integer from 0 to 6,
L represents a single bond or a divalent group, and multiple Ls may be the same or different,
R 11 represents a monovalent substituent, and when there are multiple R 11s , the multiple R 11s may be the same or different,
R 12 is selected from the group consisting of a hydrogen atom, formula (1a), and formula (1b), and a plurality of R 12s may be the same or different.
In formula (1a),
A represents an O atom or an S atom, and when there are multiple A's in formula (I), the multiple A's may be the same or different,
m a represents 0 or 1, and when there is a plurality of m a in formula (I), the plural m a may be the same or different,
R 2 represents a hydrogen atom or a monovalent substituent, and when there is a plurality of R 2 , the plurality of R 2 may be the same or different,
* represents a bond with L.
In formula (1b),
R 13 represents a monovalent substituent, and when there are multiple R 13s , the multiple R 13s may be the same or different,
* represents a bond with L. ]
[2] The resin contains one polymerizable group selected from the group consisting of a (meth)acryloyl group, a mercapto group, a cyclic ether group having 2 to 4 carbon atoms, and a cyclic sulfide group having 2 to 4 carbon atoms. The composition according to [1].
[3] The composition according to [1] or [2], wherein the resin is a resin represented by formula (A).
[In formula (A),
R represents a monovalent hydrocarbon group, and when there are multiple R's, the multiple R's may be the same or different,
n represents an average value of 1 or more,
A represents an O atom or an S atom, and multiple A's may be the same or different. ]
[4] The composition according to any one of [1] to [3], further comprising a polymerization initiator.
[5] The compound represented by formula (I) is a compound represented by any one of [1] to [4], including a compound in which multiple R 12s in formula (I) are represented by formula (1a). Compositions as described.
[6] A cured product of the composition according to any one of [1] to [5].
[7] A display device comprising the cured product according to [6].
[8] A solid-state imaging device comprising the cured product according to [6].
高い屈折率を示す硬化物を与えることができ、硬化性にも優れる新たな組成物を提供することができる。また、該組成物の硬化物、該硬化物を含む表示装置、及び該硬化物を含む固体撮像素子を提供することができる。 It is possible to provide a new composition that can provide a cured product that exhibits a high refractive index and also has excellent curability. Further, it is possible to provide a cured product of the composition, a display device including the cured product, and a solid-state imaging device including the cured product.
<組成物>
本発明に係る組成物(以下、「組成物(I)」ともいう)は、式(I)で表される化合物(以下、「化合物(I)」ともいう)と波長550nmにおける屈折率が1.60以上の樹脂(以下、「樹脂(I)」ともいう)とを含む。組成物(I)は、化合物(I)と樹脂(I)を含むことにより、高い屈折率を示す硬化物を与えることができ、また、優れた硬化性を示すことができる。組成物(I)は、化合物(I)を2種以上含んでいてもよい。組成物(I)は、樹脂(I)を2種以上含んでいてもよい。組成物(I)は、化合物(I)と、樹脂(I)と、これら以外の他の成分を含んでいてもよい。組成物(I)を硬化させることにより、組成物(I)の硬化物を含む成形物を形成することができる。上記硬化物を含む成形物とは、上記硬化物を含む物であって、所望の形状に成形された物をいう。
<Composition>
The composition according to the present invention (hereinafter also referred to as "composition (I)") has a refractive index of 1 at a wavelength of 550 nm with a compound represented by formula (I) (hereinafter also referred to as "compound (I)"). .60 or higher (hereinafter also referred to as "resin (I)"). By containing the compound (I) and the resin (I), the composition (I) can provide a cured product exhibiting a high refractive index, and can also exhibit excellent curability. Composition (I) may contain two or more types of compound (I). Composition (I) may contain two or more types of resin (I). Composition (I) may contain compound (I), resin (I), and other components other than these. By curing composition (I), a molded article containing a cured product of composition (I) can be formed. The molded product containing the cured product is a product containing the cured product and molded into a desired shape.
<化合物(I)>
化合物(I)は、式(I)で表される化合物である。
[式(I)中、
nは0~6のいずれかの整数を表し、
Lは単結合又は2価の基を表し、複数あるLは同一であっても異なっていてもよく、
R11は1価の置換基を表し、R11が複数ある場合、複数のR11は同一であっても異なっていてもよく、
R12は、水素原子、式(1a)、及び式(1b)からなる群から選択され、複数あるR12は同一であっても異なっていてもよい。
式(1a)中、
AはO原子またはS原子を表し、式(I)においてAが複数ある場合、複数のAは同一であっても異なっていてもよく、
maは0又は1を表し、式(I)においてmaが複数ある場合、複数のmaは同一であっても異なっていてもよく、
R2は、水素原子又は1価の置換基を表し、R2が複数ある場合、複数のR2は同一であっても異なっていてもよく、
*はLとの結合手を表す。
式(1b)中、
R13は1価の置換基を表し、R13が複数ある場合、複数のR13は同一であっても異なっていてもよく、
*はLとの結合手を表す。]
<Compound (I)>
Compound (I) is a compound represented by formula (I).
[In formula (I),
n represents any integer from 0 to 6,
L represents a single bond or a divalent group, and multiple Ls may be the same or different,
R 11 represents a monovalent substituent, and when there are multiple R 11s , the multiple R 11s may be the same or different,
R 12 is selected from the group consisting of a hydrogen atom, formula (1a), and formula (1b), and a plurality of R 12s may be the same or different.
In formula (1a),
A represents an O atom or an S atom, and when there are multiple A's in formula (I), the multiple A's may be the same or different,
m a represents 0 or 1, and when there is a plurality of m a in formula (I), the plural m a may be the same or different,
R 2 represents a hydrogen atom or a monovalent substituent, and when there is a plurality of R 2 , the plurality of R 2 may be the same or different,
* represents a bond with L.
In formula (1b),
R 13 represents a monovalent substituent, and when there are multiple R 13s , the multiple R 13s may be the same or different,
* represents a bond with L. ]
式(I)は、2つの下記式で表される基
がいずれもナフタレン環の1~4位の任意の位置、もしくは5~8位の任意の位置に結合していてもよく、また、一方の基がナフタレン環の1~4位の任意の位置に結合して、かつ他方の基がナフタレン環の5~8位の任意の位置に結合していてもよいことを表す。2つのR11についても同様である。
Formula (I) is a group represented by the two following formulas
may be bonded to any of the 1st to 4th positions of the naphthalene ring, or any of the 5th to 8th positions, and one group may be bonded to any of the 1st to 4th positions of the naphthalene ring. represents that the other group may be bonded to any position from the 5th to 8th positions of the naphthalene ring. The same applies to the two R 11s .
Lは単結合又は2価の基を表す。2価の基を表す2つのLとしては、それぞれ独立して、例えば、置換基を有していてもよい2価の脂肪族鎖状炭化水素基、置換基を有していてもよい2価の脂環式炭化水素基、置換基を有していてもよい2価の芳香族炭化水素基、及びこれらの組み合わせからなる2価の基(アラルキレン基等)等の2価の炭化水素基が挙げられる。2価の炭化水素基に含まれる-CH2-は、-O-、-S-、-NR1A-(R1Aは水素原子又は炭素数1~6のアルキル基を表す)、-CO-、-SO2-で置換されていてもよい。 L represents a single bond or a divalent group. The two L's representing a divalent group each independently include, for example, a divalent aliphatic chain hydrocarbon group which may have a substituent, a divalent aliphatic hydrocarbon group which may have a substituent, A divalent hydrocarbon group such as an alicyclic hydrocarbon group, a divalent aromatic hydrocarbon group which may have a substituent, and a divalent group consisting of a combination thereof (aralkylene group, etc.) Can be mentioned. -CH 2 - contained in the divalent hydrocarbon group is -O-, -S-, -NR 1A - (R 1A represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms), -CO-, It may be substituted with -SO 2 -.
2価の脂肪族鎖状炭化水素基としては、例えば、飽和又は不飽和の脂肪族鎖状炭化水素基が挙げられ、具体的には、メチレン基、エチレン基、プロパンジイル基、ブタンジイル基、ペンタンジイル基、ヘキサンジイル基、ヘプタンジイル基、オクタンジイル基、ノナンジイル基、デカンジイル基、ウンデカンジイル基、ドデカンジイル基、トリデカンジイル基、テトラデカンジイル基、ペンタデカンジイル基、ヘキサデカンジイル基、ヘプタデカンジイル基、オクタデカンジイル基、ノナデカンジイル基、エイコサンジイル基等のアルカンジイル基等が挙げられる。2価の脂肪族鎖状炭化水素基は、直鎖状であっても分岐鎖状であってもよい。2価の脂肪族鎖状炭化水素基の炭素数は、通常1~20であり、好ましくは1~10、より好ましくは1~6、さらに好ましくは1~4、なおさらに好ましくは1又は2である。 Examples of the divalent aliphatic chain hydrocarbon group include saturated or unsaturated aliphatic chain hydrocarbon groups, and specifically, methylene group, ethylene group, propanediyl group, butanediyl group, pentanediyl group, etc. group, hexanediyl group, heptanediyl group, octanediyl group, nonanediyl group, decanediyl group, undecanediyl group, dodecanediyl group, tridecanediyl group, tetradecanediyl group, pentadecanediyl group, hexadecanediyl group, heptadecanediyl group, octadecanediyl group group, alkanediyl groups such as nonadecanediyl group, eicosandiyl group, and the like. The divalent aliphatic chain hydrocarbon group may be linear or branched. The number of carbon atoms in the divalent aliphatic chain hydrocarbon group is usually 1 to 20, preferably 1 to 10, more preferably 1 to 6, still more preferably 1 to 4, even more preferably 1 or 2. be.
2価の脂肪族鎖状炭化水素基が有していてもよい置換基としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ヒドロキシ基、アミノ基、アセチル基、シアノ基等が挙げられる。 Examples of substituents that the divalent aliphatic chain hydrocarbon group may have include halogen atoms such as fluorine atom, chlorine atom, bromine atom, and iodine atom, hydroxy group, amino group, acetyl group, and cyano group. Examples include groups.
2価の脂環式炭化水素基としては、例えば、飽和又は不飽和の脂環式炭化水素基が挙げられ、具体的には、シクロプロパンジイル基、シクロブタンジイル基、シクロペンタンジイル基、シクロヘキサンジイル基、シクロオクタンジイル基、シクロノナンジイル基、シクロデカンジイル基等の単環の脂環式炭化水素基;ビシクロ[1.1.0]ブタンジイル基、トリシクロ[2.2.1.0]ヘプタンジイル基、ビシクロ[3.2.1]オクタンジイル基、ビシクロ[2.2.2.]オクタンジイル基、アダマンタンジイル基、ビシクロ[4.3.2]ウンデカンジイル基、トリシクロ[5.3.1.1]ドデカンジイル基等の多環の脂環式炭化水素基等が挙げられる。2価の脂環式炭化水素基の炭素数は、通常3~20であり、好ましくは3~10、より好ましくは3~6、さらに好ましくは5又は6である。 Examples of the divalent alicyclic hydrocarbon group include saturated or unsaturated alicyclic hydrocarbon groups, specifically cyclopropanediyl group, cyclobutanediyl group, cyclopentanediyl group, cyclohexanediyl group. monocyclic alicyclic hydrocarbon groups such as group, cyclooctanediyl group, cyclononanediyl group, cyclodecanediyl group; bicyclo[1.1.0]butanediyl group, tricyclo[2.2.1.0]heptanediyl group group, bicyclo[3.2.1]octanediyl group, bicyclo[2.2.2. ] Polycyclic alicyclic hydrocarbon groups such as an octanediyl group, an adamantanediyl group, a bicyclo[4.3.2]undecanediyl group, and a tricyclo[5.3.1.1]dodecanediyl group. The divalent alicyclic hydrocarbon group usually has 3 to 20 carbon atoms, preferably 3 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, and still more preferably 5 or 6 carbon atoms.
2価の脂環式炭化水素基が有していてもよい置換基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基等の炭素原子数1~10(好ましくは炭素原子数1~4)のアルキル基、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ヒドロキシ基、アミノ基、アセチル基、シアノ基等が挙げられる。 Examples of substituents that the divalent alicyclic hydrocarbon group may have include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, Alkyl groups having 1 to 10 carbon atoms (preferably 1 to 4 carbon atoms) such as decyl groups, halogen atoms such as fluorine atoms, chlorine atoms, bromine atoms, and iodine atoms, hydroxy groups, amino groups, acetyl groups, cyano Examples include groups.
2価の芳香族炭化水素基は、単環であっても多環であってもよく、例えば、フェニレン基、ナフチレン基、アントラセンジイル基、フルオレンジイル基等が挙げられる。2価の芳香族炭化水素基の炭素数は、通常6~20であり、好ましくは6~10である。 The divalent aromatic hydrocarbon group may be monocyclic or polycyclic, and includes, for example, a phenylene group, a naphthylene group, an anthracenediyl group, a fluorenediyl group, and the like. The divalent aromatic hydrocarbon group usually has 6 to 20 carbon atoms, preferably 6 to 10 carbon atoms.
2価の芳香族炭化水素基が有していてもよい置換基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基等の炭素原子数1~10(好ましくは炭素原子数1~4)のアルキル基、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ヒドロキシ基、アミノ基、アセチル基、シアノ基等が挙げられる。 Examples of substituents that the divalent aromatic hydrocarbon group may have include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, and decyl group. Alkyl groups having 1 to 10 carbon atoms (preferably 1 to 4 carbon atoms) such as groups, halogen atoms such as fluorine atoms, chlorine atoms, bromine atoms, iodine atoms, hydroxy groups, amino groups, acetyl groups, cyano groups etc.
2つのLは、例えば、少なくともいずれか一方が単結合又はアルカンジイル基であり、より好ましくは、両方が単結合又はアルカンジイル基である。この場合において、アルカンジイル基の炭素数は、好ましくは1~10、より好ましくは1~6、さらに好ましくは1~4、なおさらに好ましくは1又は2である。 For example, at least one of the two L's is a single bond or an alkanediyl group, and more preferably both are a single bond or an alkanediyl group. In this case, the alkanediyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms, and even more preferably 1 or 2 carbon atoms.
2つのnは、それぞれ独立して、0~3のいずれかの整数であり、好ましくは0~2のいずれかの整数であり、より好ましくは0又は1である。さらに好ましくは、2つのnはいずれも0である。 The two n's are each independently an integer of 0 to 3, preferably an integer of 0 to 2, and more preferably 0 or 1. More preferably, both n's are 0.
1価の置換基を表すR11としては、R11が複数ある場合はそれぞれ独立して、例えば、置換基を有していてもよい1価の脂肪族鎖状炭化水素基、置換基を有していてもよい1価の脂環式炭化水素基、置換基を有していてもよい1価の芳香族炭化水素基、及びこれらの組み合わせからなる1価の基(アラルキル基等)等の1価の炭化水素基;ヒドロキシ基;アミノ基、モノメチルアミノ基、モノエチルアミノ基、ジメチルアミノ基、ジエチルアミノ基、メチルエチルアミノ基等の1つ又は2つの炭素数1~6のアルキル基で置換されていてもよいアミノ基;ピロリジニル基、ピロリニル基、イミダゾリジニル基、イミダゾリニル基、オキサゾリニル基、チアゾリル基、ピペリジニル基、モルホリニル基、ピペラジニル基、インドリル基、イソインドリル基、キノリル基、チエニル基、ピロリル基、及びフリル基等の炭素数4~20の脂肪族複素環基又は炭素数3~20の芳香族複素環基等のヘテロ環基;ハロゲン原子;ニトロ基;シアノ基;カルボキシ基;スルホ基;チオール基;ホルミル基;-SF3基;-SF5基が挙げられる。1価の炭化水素基に含まれる-CH2-は、-O-、-S-、-NR1B-(R1Bは水素原子又は炭素数1~6のアルキル基を表す)、-CO-、-SO2-で置換されていてもよい。なお、1価の炭化水素基に含まれる-CH2-が、-O-で置換された基としては、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基、ペンチルオキシ基、ヘキシルオキシ基、ヘプチルオキシ基、オクチルオキシ基等の炭素数1~12のアルコキシ基;メトキシメチル基、エトキシメチル基、メトキシエチル基等のアルコキシアルキル基等が挙げられる。 As R 11 representing a monovalent substituent, when there is a plurality of R 11 , each independently represents, for example, a monovalent aliphatic chain hydrocarbon group which may have a substituent, a monovalent aliphatic chain hydrocarbon group which may have a substituent, monovalent alicyclic hydrocarbon groups which may have substituents, monovalent aromatic hydrocarbon groups which may have substituents, monovalent groups consisting of combinations thereof (aralkyl groups, etc.), etc. Monovalent hydrocarbon group; hydroxy group; substituted with one or two alkyl groups having 1 to 6 carbon atoms such as amino group, monomethylamino group, monoethylamino group, dimethylamino group, diethylamino group, methylethylamino group, etc. Amino groups that may be substituted; pyrrolidinyl group, pyrrolinyl group, imidazolidinyl group, imidazolinyl group, oxazolinyl group, thiazolyl group, piperidinyl group, morpholinyl group, piperazinyl group, indolyl group, isoindolyl group, quinolyl group, thienyl group, pyrrolyl group, and heterocyclic groups such as aliphatic heterocyclic groups having 4 to 20 carbon atoms such as furyl group or aromatic heterocyclic groups having 3 to 20 carbon atoms; halogen atom; nitro group; cyano group; carboxy group; sulfo group; thiol group; formyl group; -SF 3 group; -SF 5 group. -CH 2 - contained in the monovalent hydrocarbon group is -O-, -S-, -NR 1B - (R 1B represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms), -CO-, It may be substituted with -SO 2 -. In addition, examples of groups in which -CH 2 - contained in the monovalent hydrocarbon group are substituted with -O- include methoxy group, ethoxy group, propoxy group, butoxy group, pentyloxy group, hexyloxy group, heptyloxy group. and alkoxy groups having 1 to 12 carbon atoms such as octyloxy groups; alkoxyalkyl groups such as methoxymethyl groups, ethoxymethyl groups, and methoxyethyl groups.
1価の脂肪族鎖状炭化水素基としては、例えば、飽和又は不飽和の脂肪族鎖状炭化水素基が挙げられ、具体的には、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基、トリデシル基、テトラデシル基、ペンタデシル基、ヘキサデシル基、ヘプタデシル基、オクタデシル基、ノナデシル基、エイコシル基等のアルキル基等が挙げられる。1価の脂肪族鎖状炭化水素基は、直鎖状であっても分岐鎖状であってもよい。1価の脂肪族鎖状炭化水素基の炭素数は、通常1~20であり、好ましくは1~10、より好ましくは1~6、さらに好ましくは1~4、なおさらに好ましくは1又は2である。 Examples of the monovalent aliphatic chain hydrocarbon group include saturated or unsaturated aliphatic chain hydrocarbon groups, and specifically, methyl group, ethyl group, propyl group, butyl group, pentyl group. , alkyl groups such as hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, hexadecyl group, heptadecyl group, octadecyl group, nonadecyl group, eicosyl group, etc. can be mentioned. The monovalent aliphatic chain hydrocarbon group may be linear or branched. The number of carbon atoms in the monovalent aliphatic chain hydrocarbon group is usually 1 to 20, preferably 1 to 10, more preferably 1 to 6, still more preferably 1 to 4, even more preferably 1 or 2. be.
1価の脂肪族鎖状炭化水素基が有していてもよい置換基としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ヒドロキシ基、アミノ基、アセチル基、シアノ基等が挙げられる。 Examples of substituents that the monovalent aliphatic chain hydrocarbon group may have include halogen atoms such as fluorine atom, chlorine atom, bromine atom, and iodine atom, hydroxy group, amino group, acetyl group, and cyano group. Examples include groups.
1価の脂環式炭化水素基としては、例えば、飽和又は不飽和の脂環式炭化水素基が挙げられ、具体的には、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロオクチル基、シクロノニル基、シクロデシル基等の単環の脂環式炭化水素基;ビシクロ[1.1.0]ブチル基、トリシクロ[2.2.1.0]ヘプチル基、ビシクロ[3.2.1]オクチル基、ビシクロ[2.2.2.]オクチル基、アダマンチル基、ビシクロ[4.3.2]ウンデシル基、トリシクロ[5.3.1.1]ドデシル基等の多環の脂環式炭化水素基等が挙げられる。1価の脂環式炭化水素基の炭素数は、通常3~20であり、好ましくは3~10、より好ましくは3~6、さらに好ましくは5又は6である。 Examples of the monovalent alicyclic hydrocarbon group include saturated or unsaturated alicyclic hydrocarbon groups, specifically, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cyclooctyl group. , cyclononyl group, monocyclic alicyclic hydrocarbon group such as cyclodecyl group; bicyclo[1.1.0]butyl group, tricyclo[2.2.1.0]heptyl group, bicyclo[3.2.1] Octyl group, bicyclo [2.2.2. ] Polycyclic alicyclic hydrocarbon groups such as an octyl group, an adamantyl group, a bicyclo[4.3.2]undecyl group, and a tricyclo[5.3.1.1]dodecyl group. The monovalent alicyclic hydrocarbon group usually has 3 to 20 carbon atoms, preferably 3 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, and even more preferably 5 or 6 carbon atoms.
1価の脂環式炭化水素基が有していてもよい置換基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基等の炭素原子数1~10(好ましくは炭素原子数1~4)のアルキル基、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ヒドロキシ基、アミノ基、アセチル基、シアノ基等が挙げられる。 Examples of substituents that the monovalent alicyclic hydrocarbon group may have include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, Alkyl groups having 1 to 10 carbon atoms (preferably 1 to 4 carbon atoms) such as decyl groups, halogen atoms such as fluorine atoms, chlorine atoms, bromine atoms, and iodine atoms, hydroxy groups, amino groups, acetyl groups, cyano Examples include groups.
1価の芳香族炭化水素基は、単環であっても多環であってもよく、例えば、フェニル基、ナフチル基、アントラセニル基、フルオレニル基等が挙げられる。1価の芳香族炭化水素基の炭素数は、通常6~20であり、好ましくは6~10である。 The monovalent aromatic hydrocarbon group may be monocyclic or polycyclic, and includes, for example, a phenyl group, a naphthyl group, an anthracenyl group, a fluorenyl group, and the like. The monovalent aromatic hydrocarbon group usually has 6 to 20 carbon atoms, preferably 6 to 10 carbon atoms.
上記1価の芳香族炭化水素基が有していてもよい置換基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基等の炭素原子数1~10(好ましくは炭素原子数1~4)のアルキル基、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ヒドロキシ基、アミノ基、アセチル基、シアノ基等が挙げられる。 Examples of the substituents that the monovalent aromatic hydrocarbon group may have include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, Alkyl groups having 1 to 10 carbon atoms (preferably 1 to 4 carbon atoms) such as decyl groups, halogen atoms such as fluorine atoms, chlorine atoms, bromine atoms, and iodine atoms, hydroxy groups, amino groups, acetyl groups, cyano Examples include groups.
R12は、水素原子、式(1a)、及び式(1b)からなる群から選択され、複数あるR12は同一であっても異なっていてもよい。化合物(I)は、硬化性の化合物(I)を含むことが好ましい。 R 12 is selected from the group consisting of a hydrogen atom, formula (1a), and formula (1b), and a plurality of R 12s may be the same or different. Preferably, compound (I) includes a curable compound (I).
式(I)中に複数あるR12が水素原子で表される化合物としては、式(IB)で表される化合物が挙げられる。
Examples of compounds in which multiple R 12s in formula (I) are represented by hydrogen atoms include compounds represented by formula (IB).
式(I)中に複数あるR12が式(1b)で表される化合物としては、式(IC)で表される化合物が挙げられる。
Examples of compounds in which multiple R 12s in formula (I) are represented by formula (1b) include compounds represented by formula (IC).
式(I)中に複数あるR12が式(1a)で表される化合物の場合、R12が連結するLは、好ましくはアルカンジイル基である。化合物(I)は、式(I)中に複数あるR12が式(1a)で表される化合物を含むことが好ましい。 In the case of a compound in which a plurality of R 12 in formula (I) are represented by formula (1a), L to which R 12 is connected is preferably an alkanediyl group. Compound (I) preferably includes a compound in which multiple R 12s in formula (I) are represented by formula (1a).
式(1a)において、2つのmaは、それぞれ独立して、0又は1であり、好ましくは0である。より好ましくは、2つのmaはいずれも0である。 In formula (1a), two m a are each independently 0 or 1, preferably 0. More preferably, both m a are 0.
式(1a)において、R2は水素原子又は1価の置換基を表し、複数あるR2は同一であっても異なっていてもよく、好ましくは同一である。1価の置換基の具体例としては、R11と同じものが挙げられる。2つのR2は、それぞれ独立して、好ましくは、水素原子又は1価の脂肪族鎖状炭化水素基であり、より好ましくは、水素原子又は炭素数1~6の1価の脂肪族鎖状炭化水素基であり、さらに好ましくは、水素原子又は炭素数1~6のアルキル基であり、特に好ましくは、水素原子、メチル基又はエチル基である。。 In formula (1a), R 2 represents a hydrogen atom or a monovalent substituent, and a plurality of R 2 may be the same or different, preferably the same. Specific examples of the monovalent substituent include the same as R 11 . The two R 2 's are each independently preferably a hydrogen atom or a monovalent aliphatic chain hydrocarbon group, more preferably a hydrogen atom or a monovalent aliphatic chain hydrocarbon group having 1 to 6 carbon atoms. It is a hydrocarbon group, more preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and particularly preferably a hydrogen atom, a methyl group, or an ethyl group. .
式(I)中に複数あるR12が式(1a)で表される化合物は、以下の式(IA)で表される。
式(IA)中、L、R11、R2、A、n、maは、前記と同じ意味である。式(IA)で表される化合物として、以下の化合物が例示される。
A compound in which multiple R 12s in formula (I) are represented by formula (1a) is represented by formula (IA) below.
In formula (IA), L, R 11 , R 2 , A, n, and m a have the same meanings as above. The following compounds are exemplified as the compound represented by formula (IA).
式(Ia-1)、式(Ia-2)、式(Ib-1)、式(Ib-2)、式(Ic-1)、式(Ic-2)、式(Id-1)、式(Id-2)、式(Ie-1)、及び式(Ie-2)において、2つのLは、好ましくは、少なくともいずれか一方がアルカンジイル基であり、より好ましくは、両方がアルカンジイル基である。この場合において、アルカンジイル基の炭素数は、好ましくは1~10、より好ましくは1~6、さらに好ましくは1~4、なおさらに好ましくは1又は2である。 Formula (Ia-1), Formula (Ia-2), Formula (Ib-1), Formula (Ib-2), Formula (Ic-1), Formula (Ic-2), Formula (Id-1), Formula (Id-2), formula (Ie-1), and formula (Ie-2), preferably at least one of the two L is an alkanediyl group, more preferably both are an alkanediyl group. It is. In this case, the alkanediyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms, and even more preferably 1 or 2 carbon atoms.
式(Ia-1)、式(Ia-2)、式(Ib-1)、式(Ib-2)、式(Ic-1)、式(Ic-2)、式(Id-1)、式(Id-2)、式(Ie-1)、及び式(Ie-2)において、2つのmaは、それぞれ独立して、0又は1であり、好ましくは0である。より好ましくは、2つのmaはいずれも0である。
2つのnは、それぞれ独立して、0~3のいずれかの整数であり、好ましくは0~2のいずれかの整数であり、より好ましくは0又は1である。さらに好ましくは、2つのnはいずれも0である。
Formula (Ia-1), Formula (Ia-2), Formula (Ib-1), Formula (Ib-2), Formula (Ic-1), Formula (Ic-2), Formula (Id-1), Formula (Id-2), formula (Ie-1), and formula (Ie-2), the two m a 's are each independently 0 or 1, preferably 0. More preferably, both m a are 0.
The two n's are each independently an integer of 0 to 3, preferably an integer of 0 to 2, and more preferably 0 or 1. More preferably, both n's are 0.
式(Ia-1)、式(Ia-2)、式(Ib-1)、式(Ib-2)、式(Ic-1)、式(Ic-2)、式(Id-1)、式(Id-2)、式(Ie-1)、及び式(Ie-2)において、2つのR2は、それぞれ独立して、好ましくは、水素原子又は1価の脂肪族鎖状炭化水素基であり、より好ましくは、水素原子又は炭素数1~6の1価の脂肪族鎖状炭化水素基であり、さらに好ましくは、水素原子又は炭素数1~6のアルキル基であり、特に好ましくは、水素原子、メチル基又はエチル基である。2つのR2は、好ましくは同一である。 Formula (Ia-1), Formula (Ia-2), Formula (Ib-1), Formula (Ib-2), Formula (Ic-1), Formula (Ic-2), Formula (Id-1), Formula (Id-2), formula (Ie-1), and formula (Ie-2), the two R 2 are each independently preferably a hydrogen atom or a monovalent aliphatic chain hydrocarbon group. More preferably a hydrogen atom or a monovalent aliphatic chain hydrocarbon group having 1 to 6 carbon atoms, still more preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and particularly preferably, A hydrogen atom, a methyl group or an ethyl group. Two R 2 are preferably the same.
式(IA)で表される化合物の具体例を以下に例示するが、これらに限定されるものではない。 Specific examples of the compound represented by formula (IA) are illustrated below, but the invention is not limited thereto.
化合物(I)の分子量は、合成の観点から、好ましくは2000以下、より好ましくは1000以下、さらに好ましくは500以下である。また、該分子量は、揮発性の観点から、好ましくは50以上、より好ましくは100以上、さらに好ましくは150以上である。 From the viewpoint of synthesis, the molecular weight of compound (I) is preferably 2000 or less, more preferably 1000 or less, even more preferably 500 or less. Further, from the viewpoint of volatility, the molecular weight is preferably 50 or more, more preferably 100 or more, and still more preferably 150 or more.
組成物(I)における化合物(I)の含有率は、組成物(I)の固形分の総量に対して、好ましくは1質量%以上、より好ましくは2質量%以上、さらに好ましくは5質量%以上であり、好ましくは99質量%以下、より好ましくは95質量%以下であり、90質量%以下又は80質量%以下であってもよい。 The content of compound (I) in composition (I) is preferably 1% by mass or more, more preferably 2% by mass or more, even more preferably 5% by mass, based on the total solid content of composition (I). The content is preferably 99% by mass or less, more preferably 95% by mass or less, and may be 90% by mass or less or 80% by mass or less.
組成物(I)の固形分の総量とは、組成物(I)に含まれる成分のうち、溶剤を除いた成分の合計を意味する。組成物の固形分中における各成分の含有率は、液体クロマトグラフィ又はガスクロマトグラフィ等の公知の分析手段で測定することができる。組成物(I)の固形分中における各成分の含有率は、該組成物調製時の配合から算出されてもよい。 The total solid content of composition (I) means the total of the components contained in composition (I) excluding the solvent. The content of each component in the solid content of the composition can be measured by known analytical means such as liquid chromatography or gas chromatography. The content of each component in the solid content of composition (I) may be calculated from the formulation at the time of preparing the composition.
<化合物(I)の製造方法>
R12が式(1a)で表される基である化合物(I)は、下記に示す第1工程を含むか、又は、第1工程及び第2工程を含む方法によって製造することができる。
第1工程:式(II)
[式(II)中、n及びR11は前記と同じ意味を表す。]
で表される化合物と、式(III)
[式(III)中、R2、L及びmaは前記と同じ意味を表し、Xは脱離基を表す。]
で表される化合物とを反応させることにより、式(1a)中のAがO原子である式(I)で表される化合物を得る工程;
第2工程:式(1a)中のAがO原子である式(I)で表される化合物と硫化剤との反応により、式(1a)中のAがS原子である式(I)で表される化合物を得る工程
<Method for producing compound (I)>
Compound (I) in which R 12 is a group represented by formula (1a) can be produced by a method including the first step or the first step and the second step shown below.
First step: Formula (II)
[In formula (II), n and R 11 represent the same meanings as above. ]
A compound represented by and formula (III)
[In formula (III), R 2 , L and m a have the same meanings as above, and X represents a leaving group. ]
A step of obtaining a compound represented by formula (I) in which A in formula (1a) is an O atom by reacting with a compound represented by;
2nd step: By the reaction of the compound represented by formula (I) in which A in formula (1a) is an O atom and a sulfiding agent, the compound represented by formula (I) in which A in formula (1a) is an S atom is formed. Steps for obtaining the represented compound
第1工程における式(II)で表される化合物(以下、「化合物(II)」ともいう)と式(III)で表される化合物(以下、「化合物(III)」ともいう)との反応は、例えば、塩基の存在下に行うことができる。2種以上の塩基を併用してもよい。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、水酸化セシウム、炭酸ナトリウム、炭酸カリウム、炭酸リチウム、炭酸セシウム、水素化ナトリウム、水素化アルミニウムリチウム、水素化ホウ素ナトリウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素リチウム、炭酸水素セシウム等の無機塩基;ナトリウムメトキシド、カリウムメトキシド、リチウムメトキシド、ナトリウムエトキシド、カリウムエトキシド、ナトリウムイソプロポキシド、カリウムイソプロポキシド、ナトリウムt-ブトキシド、カリウムt-ブトキシド等の金属アルコキシド;アンモニア、メチルアミン、ジメチルアミン、トリメチルアミン、トリエチルアミン、ジイソプロピルエチルアミン、トリイソプロピルアミン、DBU、DABCO、ピリジン、2,6-ジメチルピリジン、2,6-ジt-ブチルピリジン、ジメチルアミノピリジン、トリフェニルホスフィン、テトラメチルアンモニウムブロミド、テトラメチルアンモニウムクロリド等の有機塩基が挙げられる。使用する塩基の量は、化合物(II)の1モルに対して、例えば0.01~10モルであり、好ましくは0.5~5モルである。 Reaction of the compound represented by formula (II) (hereinafter also referred to as "compound (II)") and the compound represented by formula (III) (hereinafter also referred to as "compound (III)") in the first step can be carried out, for example, in the presence of a base. Two or more types of bases may be used in combination. As the base, sodium hydroxide, potassium hydroxide, lithium hydroxide, cesium hydroxide, sodium carbonate, potassium carbonate, lithium carbonate, cesium carbonate, sodium hydride, lithium aluminum hydride, sodium borohydride, sodium hydrogen carbonate, Inorganic bases such as potassium bicarbonate, lithium bicarbonate, cesium bicarbonate; sodium methoxide, potassium methoxide, lithium methoxide, sodium ethoxide, potassium ethoxide, sodium isopropoxide, potassium isopropoxide, sodium t-butoxide , metal alkoxides such as potassium t-butoxide; ammonia, methylamine, dimethylamine, trimethylamine, triethylamine, diisopropylethylamine, triisopropylamine, DBU, DABCO, pyridine, 2,6-dimethylpyridine, 2,6-di-t-butyl Examples include organic bases such as pyridine, dimethylaminopyridine, triphenylphosphine, tetramethylammonium bromide, and tetramethylammonium chloride. The amount of the base used is, for example, 0.01 to 10 mol, preferably 0.5 to 5 mol, per 1 mol of compound (II).
式(III)において、Xで表される脱離基としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子;メチルスルホニル基、エチルスルホニル基、プロピルスルホニル基、ブチルスルホニル基、トリフルオロメチルスルホニル基、パーフルオロエチルスルホニル基、パーフルオロプロピルスルホニル基、パーフルオロブチルスルホニル基等のアルキルスルホニル基;フェニルスルホニル基、p-トルエンスルホニル基、p-フルオロフェニルスルホニル基、ペンタフルオロフェニルスルホニル基等のアリールスルホニル基等が挙げられる。化合物(III)の一例は、エピハロヒドリン化合物(Xがハロゲン原子であり、Lがメチレン基であり、maが0である化合物)である。使用する化合物(III)の量は、化合物(II)の1モルに対して、例えば0.01~20モルであり、好ましくは0.5~15モルである。2種以上の化合物(III)を用いて第1工程を実施してもよい。 In formula (III), the leaving group represented by X includes halogen atoms such as fluorine atom, chlorine atom, bromine atom, and iodine atom; Alkylsulfonyl groups such as fluoromethylsulfonyl group, perfluoroethylsulfonyl group, perfluoropropylsulfonyl group, perfluorobutylsulfonyl group; phenylsulfonyl group, p-toluenesulfonyl group, p-fluorophenylsulfonyl group, pentafluorophenylsulfonyl group Examples include arylsulfonyl groups such as. An example of compound (III) is an epihalohydrin compound (a compound in which X is a halogen atom, L is a methylene group, and m a is 0). The amount of compound (III) used is, for example, 0.01 to 20 mol, preferably 0.5 to 15 mol, per 1 mol of compound (II). The first step may be carried out using two or more types of compound (III).
化合物(II)と化合物(III)との反応は、溶媒中で実施されることが好ましい。溶媒としては、水のほか、ケトン類、芳香族炭化水素類、ハロゲン化芳香族炭化水素類、脂肪族炭化水素類、ハロゲン化脂肪族炭化水素類、エーテル類、アルコール類、グライム類、エステル類、脂肪族ニトリル類、スルホキシド類、アミド類等の有機溶媒が挙げられる。2種以上の溶媒を併用してもよい。有機溶媒として、具体的には以下の溶媒が例示される。 The reaction between compound (II) and compound (III) is preferably carried out in a solvent. In addition to water, solvents include ketones, aromatic hydrocarbons, halogenated aromatic hydrocarbons, aliphatic hydrocarbons, halogenated aliphatic hydrocarbons, ethers, alcohols, glymes, and esters. , aliphatic nitriles, sulfoxides, amides, and other organic solvents. Two or more types of solvents may be used in combination. Specific examples of the organic solvent include the following solvents.
ケトン類:アセトン、メチルエチルケトン、ジエチルケトン、ブチルメチルケトン、ジイソブチルケトン、メチルイソブチルケトン、メチルイソアミルケトン、2-ヘプタノン、2-オクタノン、シクロペンタノン、シクロヘキサノン等
芳香族炭化水素類:ベンゼン、トルエン、キシレン、メシチレン、ナフタレン、アニソール、ニトロベンゼン、アニリン、テトラリン、デュレン等
ハロゲン化芳香族炭化水素:クロロベンゼン、ジクロロベンゼン、クロロナフタレン等
脂肪族炭化水素:ペンタン、ヘキサン、ヘプタン等
ハロゲン化脂肪族炭化水素類:ジクロロメタン、クロロホルム、1,2-ジクロロエタン、テトラクロロエタン等
エーテル類:ジエチルエーテル、ジイソプロピルエーテル、メチルt-ブチルエーテル、シクロペンチルメチルエーテル、ジフェニルエーテル、ジメトキシエタン、ジオキサン等
アルコール類:メタノール、エタノール、プロパノール、イソプロパノール、ブタノール、t-ブタノール、ヘキサノール、シクロヘキサノール、エチレングリコール、プロピレングリコール、ヘキサフルオロイソプロパノール等
グライム類:メチルジグライム、エチルジグライム、トリグライム、ジエチレングリコールブチルメチルエーテル等
エステル類:酢酸メチル、酢酸エチル、酢酸プロピル、酢酸ブチル等
脂肪族ニトリル類:アセトニトリル等
スルホキシド類:ジメチルスルホキシド、スルホラン等
アミド類:N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチルピロリドン等。
Ketones: acetone, methyl ethyl ketone, diethyl ketone, butyl methyl ketone, diisobutyl ketone, methyl isobutyl ketone, methyl isoamyl ketone, 2-heptanone, 2-octanone, cyclopentanone, cyclohexanone, etc. Aromatic hydrocarbons: benzene, toluene, xylene , mesitylene, naphthalene, anisole, nitrobenzene, aniline, tetralin, durene, etc. Halogenated aromatic hydrocarbons: chlorobenzene, dichlorobenzene, chloronaphthalene, etc. Aliphatic hydrocarbons: pentane, hexane, heptane, etc. Halogenated aliphatic hydrocarbons: dichloromethane , chloroform, 1,2-dichloroethane, tetrachloroethane, etc. Ethers: diethyl ether, diisopropyl ether, methyl t-butyl ether, cyclopentyl methyl ether, diphenyl ether, dimethoxyethane, dioxane, etc. Alcohols: methanol, ethanol, propanol, isopropanol, butanol, t-Butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, hexafluoroisopropanol, etc. Glyme: methyl diglyme, ethyl diglyme, triglyme, diethylene glycol butyl methyl ether, etc. Esters: methyl acetate, ethyl acetate, propyl acetate, acetic acid Butyl, etc. Aliphatic nitriles: acetonitrile, etc. Sulfoxides: dimethyl sulfoxide, sulfolane, etc. Amides: N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, etc.
化合物(II)と化合物(III)との反応の温度は、例えば-80~200℃であり、好ましくは0~150℃である。反応によって得られる、式(1a)中のAがO原子である式(I)で表される化合物は、単離されてもよいし、単離されることなく第2工程に供されてもよい。 The temperature of the reaction between compound (II) and compound (III) is, for example, -80 to 200°C, preferably 0 to 150°C. The compound represented by formula (I) in which A in formula (1a) is an O atom obtained by the reaction may be isolated or may be subjected to the second step without being isolated. .
第2工程で行う反応は、式(1a)中のAがO原子である式(I)で表される化合物が有するエポキシ基又はオキセタニル基の酸素原子を硫化剤を用いて硫黄原子に置換し、チイラン基(エピスルフィド基)又はチエタン基を形成する反応である。硫化剤としては、例えば、チオ尿素、メチルチオウレア、ジメチルチオウレア、トリメチルチオウレア、テトラメチルチオウレア、テトラエチルチオウレア、エチレンチオウレア、チオシアン酸ナトリウム、チオシアン酸カリウム等が挙げられる。使用する硫化剤の量は、式(1a)中のAがO原子である式(I)で表される化合物の1モルに対して、例えば0.01~20モルであり、好ましくは0.5~10モルである。 The reaction carried out in the second step involves replacing the oxygen atom of the epoxy group or oxetanyl group of the compound represented by formula (I) in which A in formula (1a) is an O atom with a sulfur atom using a sulfurizing agent. , a reaction that forms a thiirane group (episulfide group) or a thietane group. Examples of the sulfurizing agent include thiourea, methylthiourea, dimethylthiourea, trimethylthiourea, tetramethylthiourea, tetraethylthiourea, ethylenethiourea, sodium thiocyanate, potassium thiocyanate, and the like. The amount of the sulfurizing agent used is, for example, 0.01 to 20 mol, preferably 0.01 to 20 mol, per 1 mol of the compound represented by formula (I) in which A in formula (1a) is an O atom. The amount is 5 to 10 moles.
式(1a)中のAがO原子である式(I)で表される化合物と硫化剤との反応は、溶媒中で実施されることが好ましい。溶媒としては、上で例示した有機溶媒を用いることができる。2種以上の有機溶媒を併用してもよい。式(1a)中のAがO原子である式(I)で表される化合物と硫化剤との反応の温度は、例えば-80~200℃であり、好ましくは0~100℃である。 The reaction between the compound represented by formula (I) in which A in formula (1a) is an O atom and the sulfurizing agent is preferably carried out in a solvent. As the solvent, the organic solvents exemplified above can be used. Two or more types of organic solvents may be used in combination. The temperature of the reaction of the compound represented by formula (I) in which A in formula (1a) is an O atom with a sulfurizing agent is, for example, -80 to 200°C, preferably 0 to 100°C.
第2工程において、生成した式(1a)中のAがS原子である式(I)で表される化合物の重合を抑制するために重合抑制剤を添加してもよい。重合抑制剤としては酸、酸無水物等が挙げられる。具体的には硝酸、塩酸、過塩素酸、次亜塩素酸、二酸化塩素、フッ酸、硫酸、発煙硫酸、塩化スルフリル、ホウ酸、ヒ酸、亜ヒ酸、ピロヒ酸、燐酸、亜リン酸、次亜リン酸、オキシ塩化リン、オキシ臭化リン、硫化リン、三塩化リン、三臭化リン、五塩化リン、青酸、クロム酸、無水硝酸、無水硫酸、酸化ホウ素、五酸化ヒ酸、五酸化燐、無水クロム酸、シリカゲル、シリカアルミナ、塩化アルミニウム、塩化亜鉛等の無機の酸性化合物、蟻酸、酢酸、過酢酸、チオ酢酸、蓚酸、酒石酸、プロピオン酸、酪酸、コハク酸、吉草酸、カプロン酸、カプリル酸、ナフテン酸、メチルメルカプトプロピオネート、マロン酸、グルタル酸、アジピン酸、シクロヘキサンカルボン酸、チオジプロピオン酸、ジチオジプロピオン酸酢酸、マレイン酸、安息香酸、フェニル酢酸、o-トルイル酸、m-トルイル酸、p-トルイル酸、サリチル酸、2-メトキシ安息香酸、3-メトキシ安息香酸、ベンゾイル安息香酸、フタル酸、イソフタル酸、テレフタル酸、サリチル酸、ベンジル酸、α-ナフタレンカルボン酸、β-ナフタレンカルボン酸、無水酢酸、無水プロピオン酸、無水酪酸、無水コハク酸、無水マレイン酸、無水安息香酸、無水フタル酸、無水ピロメリット酸、無水トリメリット酸、無水トリフルオロ酢酸等の有機カルボン酸類、モノ、ジ及びトリメチルホスフェート、モノ、ジ及びトリエチルホスフェート、モノ、ジ及びトリイソブチルホスフェート、モノ、ジ及びトリブチルホスフェート、モノ、ジ及びトリラウリルホスフェート等のリン酸類及びこれらのホスフェート部分がホスファイトとなった亜リン酸類、ジメチルジチオリン酸に代表されるジアルキルジチオリン酸類等の有機リン化合物、フェノール、カテコール、t-ブチルカテコール、2,6-ジ-t-ブチルクレゾール、2,6-ジ-t-ブチルエチルフェノール、レゾルシン、ハイドロキノン、フロログルシン、ピロガロール、クレゾール、エチルフェノール、ブチルフェノール、ノニルフェノール、ヒドロキシフェニル酢酸、ヒドロキシフェニルプロピオン酸、ヒドロキシフェニル酢酸アミド、ヒドロキシフェニル酢酸メチル、ヒドロキシフェニル酢酸エチル、ヒドロキシフェネチルアルコール、ヒドロキシフェネチルアミン、ヒドロキシベンズアルデヒド、フェニルフェノール、ビスフェノール-A、2,2’-メチレン-ビス(4-メチル-6-t-ブチルフェノール)、ビスフェノール-F、ビスフェノール-S、α-ナフトール、β-ナフトール、アミノフェノール、クロロフェノール、2,4,6-トリクロロフェノール等のフェノール類、メタンスルホン酸、エタンスルホン酸、ブタンスルホン酸、ドデカンスルホン酸、ベンゼンスルホン酸、o-トルエンスルホン酸、m-トルエンスルホン酸、p-トルエンスルホン酸、エチルベンゼンスルホン酸、ブチルベンゼンスルホン酸、ドデシルベンゼンスルホン酸、p-フェノールスルホン酸、o-クレゾールスルホン酸、メタニル酸、スルファニル酸、4B-酸、ジアミノスチルベンスルホン酸、ビフェニルスルホン酸、α-ナフタレンスルホン酸、β-ナフタレンスルホン酸、ペリ酸、ローレント酸、フェニルJ酸等のスルホン酸類、等があげられ、複数を併用することも可能である。使用する重合抑制剤の量は、式(1a)中のAがO原子である式(I)で表される化合物の1モルに対して、例えば0.0001~1.0モルであり、好ましくは0.01~0.2モルである。重合抑制剤としては酢酸、無水酢酸、マレイン酸、無水マレイン酸が好ましい。 In the second step, a polymerization inhibitor may be added in order to suppress the polymerization of the produced compound represented by formula (I) in which A is an S atom. Examples of the polymerization inhibitor include acids, acid anhydrides, and the like. Specifically, nitric acid, hydrochloric acid, perchloric acid, hypochlorous acid, chlorine dioxide, hydrofluoric acid, sulfuric acid, fuming sulfuric acid, sulfuryl chloride, boric acid, arsenic acid, arsenous acid, pyroarsenic acid, phosphoric acid, phosphorous acid, Hypophosphorous acid, phosphorus oxychloride, phosphorus oxybromide, phosphorus sulfide, phosphorus trichloride, phosphorus tribromide, phosphorus pentachloride, hydrocyanic acid, chromic acid, nitric anhydride, sulfuric anhydride, boron oxide, arsenic pentoxide, Inorganic acidic compounds such as phosphorous oxide, chromic anhydride, silica gel, silica alumina, aluminum chloride, zinc chloride, formic acid, acetic acid, peracetic acid, thioacetic acid, oxalic acid, tartaric acid, propionic acid, butyric acid, succinic acid, valeric acid, caprone Acid, caprylic acid, naphthenic acid, methylmercaptopropionate, malonic acid, glutaric acid, adipic acid, cyclohexanecarboxylic acid, thiodipropionic acid, dithiodipropionic acid acetic acid, maleic acid, benzoic acid, phenylacetic acid, o-toluyl Acid, m-toluic acid, p-toluic acid, salicylic acid, 2-methoxybenzoic acid, 3-methoxybenzoic acid, benzoylbenzoic acid, phthalic acid, isophthalic acid, terephthalic acid, salicylic acid, benzylic acid, α-naphthalenecarboxylic acid, Organic carboxylates such as β-naphthalenecarboxylic acid, acetic anhydride, propionic anhydride, butyric anhydride, succinic anhydride, maleic anhydride, benzoic anhydride, phthalic anhydride, pyromellitic anhydride, trimellitic anhydride, trifluoroacetic anhydride, etc. Acids, phosphoric acids such as mono, di and trimethyl phosphate, mono, di and triethyl phosphate, mono, di and triisobutyl phosphate, mono, di and tributyl phosphate, mono, di and trilauryl phosphate and these phosphate moieties are phosphites. phosphorous acids, organic phosphorus compounds such as dialkyldithiophosphoric acids represented by dimethyldithiophosphoric acid, phenol, catechol, t-butylcatechol, 2,6-di-t-butylcresol, 2,6-di-t -Butylethylphenol, resorcinol, hydroquinone, phloroglucin, pyrogallol, cresol, ethylphenol, butylphenol, nonylphenol, hydroxyphenylacetic acid, hydroxyphenylpropionic acid, hydroxyphenylacetamide, methyl hydroxyphenylacetate, ethyl hydroxyphenylacetate, hydroxyphenethyl alcohol, Hydroxyphenethylamine, hydroxybenzaldehyde, phenylphenol, bisphenol-A, 2,2'-methylene-bis(4-methyl-6-t-butylphenol), bisphenol-F, bisphenol-S, α-naphthol, β-naphthol, amino Phenols such as phenol, chlorophenol, 2,4,6-trichlorophenol, methanesulfonic acid, ethanesulfonic acid, butanesulfonic acid, dodecanesulfonic acid, benzenesulfonic acid, o-toluenesulfonic acid, m-toluenesulfonic acid, p-Toluenesulfonic acid, ethylbenzenesulfonic acid, butylbenzenesulfonic acid, dodecylbenzenesulfonic acid, p-phenolsulfonic acid, o-cresolsulfonic acid, metanilic acid, sulfanilic acid, 4B-acid, diaminostilbenzenesulfonic acid, biphenylsulfonic acid , α-naphthalenesulfonic acid, β-naphthalenesulfonic acid, peric acid, laurentic acid, phenyl J acid, and other sulfonic acids, and it is also possible to use a plurality of them in combination. The amount of the polymerization inhibitor used is, for example, 0.0001 to 1.0 mol, preferably 0.0001 to 1.0 mol, per 1 mol of the compound represented by formula (I) in which A in formula (1a) is an O atom. is 0.01 to 0.2 mol. As the polymerization inhibitor, acetic acid, acetic anhydride, maleic acid, and maleic anhydride are preferred.
第2工程において、反応後の生成物溶液は酸性水溶液を用いた洗浄によって得られる式(1a)中のAがS原子である式(I)で表される化合物の経時安定性を向上させることができる。酸性水溶液に用いる酸の具体例としては、硝酸、塩酸、硫酸、ホウ酸、ヒ酸、燐酸、青酸、酢酸、クロロ酢酸、ジクロロ酢酸、トリクロロ酢酸、トリフルオロ酢酸、過酢酸、チオ酢酸、蓚酸、酒石酸、コハク酸、マレイン酸等があげられる。これらは単独でも2種類以上を混合して用いても良い。これらの酸の水溶液は通常pH6以下で効果を現すが、より効果的な範囲はpH3以下である。好ましくは塩酸、硫酸である。 In the second step, the product solution after the reaction is washed with an acidic aqueous solution to improve the stability over time of the compound represented by formula (I) in which A in formula (1a) is an S atom. Can be done. Specific examples of acids used in the acidic aqueous solution include nitric acid, hydrochloric acid, sulfuric acid, boric acid, arsenic acid, phosphoric acid, hydrocyanic acid, acetic acid, chloroacetic acid, dichloroacetic acid, trichloroacetic acid, trifluoroacetic acid, peracetic acid, thioacetic acid, oxalic acid, Examples include tartaric acid, succinic acid, and maleic acid. These may be used alone or in combination of two or more. Aqueous solutions of these acids are usually effective at a pH of 6 or less, but are more effective at a pH of 3 or less. Preferred are hydrochloric acid and sulfuric acid.
さらに、第2工程において式(1a)中のAがS原子である式(I)で表される化合物の安定性を向上させるために硫化水素吸着剤を使用することもできる。硫化水素吸着剤としては例えば、水酸化鉄(III)、酸化亜鉛、KNK-301(酸化亜鉛系吸着剤、呉羽油脂工業製)、ニオノン202A(酸化鉄系吸着剤、株式会社伊吹正製)、リモニック(水酸化鉄系、日本リモニック製)などが挙げられる。硫化水素吸着剤は第2工程の反応時に添加してもよいし、反応後の精製において使用することもできる。 Furthermore, in the second step, a hydrogen sulfide adsorbent can also be used to improve the stability of the compound represented by formula (I) in which A in formula (1a) is an S atom. Examples of hydrogen sulfide adsorbents include iron (III) hydroxide, zinc oxide, KNK-301 (zinc oxide-based adsorbent, manufactured by Kureha Yushi Kogyo), Nionon 202A (iron oxide-based adsorbent, manufactured by Ibuki Tadashi Co., Ltd.), Examples include Rimonic (iron hydroxide type, manufactured by Nippon Rimonic). The hydrogen sulfide adsorbent may be added during the second step reaction, or may be used in purification after the reaction.
<樹脂(I)>
樹脂(I)は、波長550nmにおける屈折率が1.60以上であり、化合物(I)以外であれば特に限定されない。樹脂(I)は、波長550nmにおける屈折率が1.60以上、1.62以上、1.65以上、1.67以上であってもよい。波長550nmにおける屈折率は、例えば1.80以下であり、1.78以下であってもよい。
<Resin (I)>
Resin (I) has a refractive index of 1.60 or more at a wavelength of 550 nm, and is not particularly limited as long as it is other than compound (I). Resin (I) may have a refractive index of 1.60 or more, 1.62 or more, 1.65 or more, or 1.67 or more at a wavelength of 550 nm. The refractive index at a wavelength of 550 nm is, for example, 1.80 or less, and may be 1.78 or less.
樹脂(I)としては、ノボラック樹脂、ヒドロキシスチレン由来の構造単位を有する樹脂、不飽和カルボン酸及び不飽和カルボン酸無水物からなる群から選ばれる少なくとも1種の単量体(以下、「単量体(a)」という場合がある)に由来する構造単位を有する樹脂(以下、「樹脂(B)という場合がある)等が挙げられる。 As the resin (I), at least one monomer (hereinafter referred to as "monomeric Examples include resins having a structural unit derived from the resin (hereinafter sometimes referred to as "resin (B)").
樹脂(I)は、(メタ)アクリロイル基、メルカプト基、炭素数2~4の環状エーテル基、炭素数2~4の環状スルフィド基からなる群より選ばれる一つの重合性基を含むものであることが好ましい。このような樹脂を用いることにより、優れた硬化性を示すことができる。樹脂(I)は、メルカプト基、炭素数2~4の環状エーテル基、炭素数2~4の環状スルフィド基からなる群より選ばれる一つの重合性基を含むものであることが好ましい。このような樹脂を用いることにより、波長550nmにおける屈折率が1.60以上の樹脂(I)を得ることが容易となるからである。環状エーテル基としては、エポキシ基、オキセタニル基が挙げられる。環状スルフィド基としては、チイラン基、チエタン基が挙げられる。 The resin (I) may contain one polymerizable group selected from the group consisting of a (meth)acryloyl group, a mercapto group, a cyclic ether group having 2 to 4 carbon atoms, and a cyclic sulfide group having 2 to 4 carbon atoms. preferable. By using such a resin, excellent curability can be exhibited. The resin (I) preferably contains one polymerizable group selected from the group consisting of a mercapto group, a cyclic ether group having 2 to 4 carbon atoms, and a cyclic sulfide group having 2 to 4 carbon atoms. This is because by using such a resin, it becomes easy to obtain resin (I) having a refractive index of 1.60 or more at a wavelength of 550 nm. Examples of the cyclic ether group include an epoxy group and an oxetanyl group. Examples of the cyclic sulfide group include a thiirane group and a thietane group.
ノボラック樹脂とは、フェノール化合物とアルデヒドとを触媒の存在下に縮合させて得られる樹脂である。フェノール化合物としては、例えば、フェノール;o-クレゾール、m-クレゾール又はp-クレゾール;2,3-キシレノール、2,5-キシレノール、3,4-キシレノール又は3,5-キシレノール;2,3,5-トリメチルフェノール;2-tert-ブチルフェノール、3-tert-ブチルフェノール又は4-tert-ブチルフェノール;2-tert-ブチル-4メチルフェノール-又は2-tert-ブチル-5-メチルフェノール;2-ジメトキシフェノール、4-ジメトキシフェノール又は5-メチルレゾルシノール;2-メトキシフェノール、3-メトキシフェノール又は4-メトキシフェノール;2,3-ジメトキシフェノール、2,5ジメトキシフェノール-又は3,5-ジメトキシフェノール;2-メトキシレゾルシノール;4-tert-ブチルカテコール;2-エチルフェノール、3-エチルフェノール又は4-エチルフェノール;2,5-ジエチルフェノール又は3,5-ジエチルフェノール;2,3,5-トリエチルフェノール;2-ナフトール;1,3-ジヒドロキシナフタレン、1,5-ジヒドロキシナフタレン又は1,7-ジヒドロキシナフタレン;キシレノールとヒドロキシベンズアルデヒドとの縮合により得られるポリヒドロキシトリフェニルメタン系化合物等が挙げられる。これらのフェノール化合物は、2種以上組合せて用いでもよい。なかでも、フェノール化合物としては、o-クレゾール、m-クレゾール、p-クレゾール、2,3-キシレノール、2,5-キシレノール、3,4-キシレノール、3,5-キシレノール、2,3,5-トリメチルフェノール、2-tert-ブチルフェノール、3-tert-ブチルフェノール、4-tert-ブチルフェノール、2-tert-ブチル-4-メチルフェノール、2-tert-ブチル-5-メチルフェノールが好ましい。 Novolak resin is a resin obtained by condensing a phenol compound and an aldehyde in the presence of a catalyst. Examples of phenolic compounds include phenol; o-cresol, m-cresol, or p-cresol; 2,3-xylenol, 2,5-xylenol, 3,4-xylenol, or 3,5-xylenol; - Trimethylphenol; 2-tert-butylphenol, 3-tert-butylphenol or 4-tert-butylphenol; 2-tert-butyl-4-methylphenol- or 2-tert-butyl-5-methylphenol; 2-dimethoxyphenol, 4 -dimethoxyphenol or 5-methylresorcinol; 2-methoxyphenol, 3-methoxyphenol or 4-methoxyphenol; 2,3-dimethoxyphenol, 2,5-dimethoxyphenol- or 3,5-dimethoxyphenol; 2-methoxyresorcinol; 4-tert-butylcatechol; 2-ethylphenol, 3-ethylphenol or 4-ethylphenol; 2,5-diethylphenol or 3,5-diethylphenol; 2,3,5-triethylphenol; 2-naphthol; 1 , 3-dihydroxynaphthalene, 1,5-dihydroxynaphthalene, or 1,7-dihydroxynaphthalene; and polyhydroxytriphenylmethane compounds obtained by condensation of xylenol and hydroxybenzaldehyde. Two or more of these phenol compounds may be used in combination. Among them, phenolic compounds include o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,5-xylenol, 3,4-xylenol, 3,5-xylenol, 2,3,5- Trimethylphenol, 2-tert-butylphenol, 3-tert-butylphenol, 4-tert-butylphenol, 2-tert-butyl-4-methylphenol, and 2-tert-butyl-5-methylphenol are preferred.
アルデヒドとしては、例えば、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、n-ブチルアルデヒド、イソブチルアルデヒド、アクロレイン又はクロトンアルデヒド等の脂肪族アルデヒド;シクロヘキサンアルデヒド、シクロペンタンアルデヒド、フルフラール又はフリルアクロレイン等の脂環式アルデヒド;ベンズアルデヒド、o-メチルベンズアルデヒド、m-メチルベンズアルデヒド、p-メチルベンズアルデヒド、p-エチルベンズアルデヒド、2,4-、2,5-、3,4-もしくは3,5-ジメチルベンズアルデヒド、o-ヒドロキシベンズアルデヒド、m-ヒドロキシベンズアルデヒド又はp-ヒドロキシベンズアルデヒド等の芳香族アルデヒド;フェニルアセトアルデヒド又はケイ皮アルデヒドのような芳香脂肪族アルデヒドが挙げられる。これらのアルデヒドも、2種以上組合せて用いてもよい。これらのアルデヒドのなかでは、工業的に入手しやすいことから、ホルムアルデヒドが好ましい。 Examples of aldehydes include aliphatic aldehydes such as formaldehyde, acetaldehyde, propionaldehyde, n-butyraldehyde, isobutyraldehyde, acrolein, or crotonaldehyde; alicyclic aldehydes such as cyclohexanaldehyde, cyclopentanaldehyde, furfural, or furyl acrolein; benzaldehyde; , o-methylbenzaldehyde, m-methylbenzaldehyde, p-methylbenzaldehyde, p-ethylbenzaldehyde, 2,4-, 2,5-, 3,4- or 3,5-dimethylbenzaldehyde, o-hydroxybenzaldehyde, m- Aromatic aldehydes such as hydroxybenzaldehyde or p-hydroxybenzaldehyde; araliphatic aldehydes such as phenylacetaldehyde or cinnamic aldehyde. Two or more of these aldehydes may also be used in combination. Among these aldehydes, formaldehyde is preferred because it is industrially easily available.
フェノール化合物とアルデヒドとの縮合に用いられる触媒の例としては、塩酸、硫酸、過塩素酸又は燐酸等の無機酸;蟻酸、酢酸、蓚酸、トリクロロ酢酸又はp-トルエンスルホン酸等の有機酸;酢酸亜鉛、塩化亜鉛又は酢酸マグネシウム等の二価金属塩等が挙げられる。これらの触媒は、2種以上組合せてもよい。かかる触媒の使用量は、アルデヒド1モルに対して通常0.01~1モルである。 Examples of catalysts used for the condensation of phenolic compounds and aldehydes include inorganic acids such as hydrochloric acid, sulfuric acid, perchloric acid or phosphoric acid; organic acids such as formic acid, acetic acid, oxalic acid, trichloroacetic acid or p-toluenesulfonic acid; acetic acid. Examples include divalent metal salts such as zinc, zinc chloride, and magnesium acetate. Two or more of these catalysts may be used in combination. The amount of such catalyst used is usually 0.01 to 1 mol per 1 mol of aldehyde.
フェノール化合物とアルデヒドとの縮合反応は、例えば、フェノール化合物とアルデヒドとを混合した後、60~120℃の温度で2~30時間反応させることにより行うことができる。当該縮合反応は溶媒の存在下で行ってもよい。当該縮合反応における溶媒としては、メチルエチルケトン、メチルイソブチルケトン、アセトン等が挙げられる。反応終了後、例えば、必要に応じて反応混合物に水に不溶な溶媒を加え、反応混合物を水で洗浄した後、濃縮することにより、ノボラック樹脂を取り出すことができる。 The condensation reaction between the phenol compound and the aldehyde can be carried out, for example, by mixing the phenol compound and the aldehyde and then reacting the mixture at a temperature of 60 to 120° C. for 2 to 30 hours. The condensation reaction may be performed in the presence of a solvent. Examples of the solvent in the condensation reaction include methyl ethyl ketone, methyl isobutyl ketone, and acetone. After completion of the reaction, the novolac resin can be taken out by, for example, adding a water-insoluble solvent to the reaction mixture as needed, washing the reaction mixture with water, and then concentrating it.
ノボラック樹脂の質量平均分子量は、通常3,000~50,000であり、好ましくは4,000~40,000、より好ましくは5,000~30,000である。ノボラック樹脂の重量平均分子量が上記の範囲であることにより、現像後に薄膜化及び残渣の残存を有効に防止することができる。 The weight average molecular weight of the novolak resin is usually 3,000 to 50,000, preferably 4,000 to 40,000, more preferably 5,000 to 30,000. When the weight average molecular weight of the novolac resin is within the above range, it is possible to effectively prevent formation of a thin film and the remaining of residue after development.
ヒドロキシスチレン由来の重合単位を有する樹脂とは、定型的にはポリビニルフェノールであり、好ましくは、ポリp-ビニルフェノールである。 The resin having polymerized units derived from hydroxystyrene is typically polyvinylphenol, preferably polyp-vinylphenol.
樹脂(I)は、ノボラック樹脂である場合、好ましい一例として、式(A)で表される樹脂(以下、「樹脂(A)ともいう)が挙げられる。樹脂(A)は、高い屈折率を示す硬化物を与えることができ、また、優れた硬化性を示すことができる。
[式(A)中、
Rは1価の炭化水素基を表し、Rが複数ある場合、複数のRは同一であっても異なっていてもよく、
nは平均値で1以上の数を表し、
AはO原子又はS原子を表し、複数あるAは同一であっても異なっていてもよい。]
When the resin (I) is a novolac resin, a preferable example is a resin represented by the formula (A) (hereinafter also referred to as "resin (A)").The resin (A) has a high refractive index. It is possible to provide a cured product that exhibits excellent curability.
[In formula (A),
R represents a monovalent hydrocarbon group, and when there are multiple R's, the multiple R's may be the same or different,
n represents an average value of 1 or more,
A represents an O atom or an S atom, and multiple A's may be the same or different. ]
式(A)は、A原子を含む基がナフタレン環の1~8位の任意の位置に存在していてもよいことを表す。また、基Rは、ベンゼン環の2~6位の任意の位置に存在し得る。 Formula (A) represents that the group containing the A atom may be present at any position from the 1st to 8th positions of the naphthalene ring. Furthermore, the group R can be present at any position from 2 to 6 on the benzene ring.
1価の炭化水素基を表すRとしては、Rが複数ある場合はそれぞれ独立して、例えば、置換基を有していてもよい1価の脂肪族鎖状炭化水素基、置換基を有していてもよい1価の脂環式炭化水素基、置換基を有していてもよい1価の芳香族炭化水素基、及びこれらの組み合わせからなる1価の基(アラルキル基等)等の1価の炭化水素基が挙げられる。1価の炭化水素基に含まれる-CH2-は、-O-、-S-、-NR1A-(R1Aは水素原子又は炭素数1~6のアルキル基を表す)、-CO-、-SO2-で置換されていてもよい。 As R representing a monovalent hydrocarbon group, when there are multiple R's, each independently includes, for example, a monovalent aliphatic chain hydrocarbon group that may have a substituent, a monovalent aliphatic chain hydrocarbon group that may have a substituent, A monovalent alicyclic hydrocarbon group which may have a substituent, a monovalent aromatic hydrocarbon group which may have a substituent, and a monovalent group consisting of a combination thereof (aralkyl group, etc.). valent hydrocarbon groups. -CH 2 - contained in the monovalent hydrocarbon group is -O-, -S-, -NR 1A - (R 1A represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms), -CO-, It may be substituted with -SO 2 -.
1価の脂肪族鎖状炭化水素基としては、例えば、飽和又は不飽和の脂肪族鎖状炭化水素基が挙げられ、具体的には、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基、トリデシル基、テトラデシル基、ペンタデシル基、ヘキサデシル基、ヘプタデシル基、オクタデシル基、ノナデシル基、エイコシル基等のアルキル基等が挙げられる。1価の脂肪族鎖状炭化水素基は、直鎖状であっても分岐鎖状であってもよい。1価の脂肪族鎖状炭化水素基の炭素数は、通常1~20であり、好ましくは1~10、より好ましくは1~6、さらに好ましくは1~4、なおさらに好ましくは1又は2である。 Examples of the monovalent aliphatic chain hydrocarbon group include saturated or unsaturated aliphatic chain hydrocarbon groups, and specifically, methyl group, ethyl group, propyl group, butyl group, pentyl group. , alkyl groups such as hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, hexadecyl group, heptadecyl group, octadecyl group, nonadecyl group, eicosyl group, etc. can be mentioned. The monovalent aliphatic chain hydrocarbon group may be linear or branched. The number of carbon atoms in the monovalent aliphatic chain hydrocarbon group is usually 1 to 20, preferably 1 to 10, more preferably 1 to 6, still more preferably 1 to 4, even more preferably 1 or 2. be.
1価の脂肪族鎖状炭化水素基が有していてもよい置換基としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ヒドロキシ基、アミノ基、アセチル基、シアノ基等が挙げられる。 Examples of substituents that the monovalent aliphatic chain hydrocarbon group may have include halogen atoms such as fluorine atom, chlorine atom, bromine atom, and iodine atom, hydroxy group, amino group, acetyl group, and cyano group. Examples include groups.
1価の脂環式炭化水素基としては、例えば、飽和又は不飽和の脂環式炭化水素基が挙げられ、具体的には、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロオクチル基、シクロノニル基、シクロデシル基等の単環の脂環式炭化水素基;ビシクロ[1.1.0]ブチル基、トリシクロ[2.2.1.0]ヘプチル基、ビシクロ[3.2.1]オクチル基、ビシクロ[2.2.2.]オクチル基、アダマンチル基、ビシクロ[4.3.2]ウンデシル基、トリシクロ[5.3.1.1]ドデシル基等の多環の脂環式炭化水素基等が挙げられる。1価の脂環式炭化水素基の炭素数は、通常3~20であり、好ましくは3~10、より好ましくは3~6、さらに好ましくは5又は6である。 Examples of the monovalent alicyclic hydrocarbon group include saturated or unsaturated alicyclic hydrocarbon groups, specifically, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cyclooctyl group. , cyclononyl group, monocyclic alicyclic hydrocarbon group such as cyclodecyl group; bicyclo[1.1.0]butyl group, tricyclo[2.2.1.0]heptyl group, bicyclo[3.2.1] Octyl group, bicyclo [2.2.2. ] Polycyclic alicyclic hydrocarbon groups such as an octyl group, an adamantyl group, a bicyclo[4.3.2]undecyl group, and a tricyclo[5.3.1.1]dodecyl group. The monovalent alicyclic hydrocarbon group usually has 3 to 20 carbon atoms, preferably 3 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, and even more preferably 5 or 6 carbon atoms.
1価の脂環式炭化水素基が有していてもよい置換基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基等の炭素原子数1~10(好ましくは炭素原子数1~4)のアルキル基、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ヒドロキシ基、アミノ基、アセチル基、シアノ基等が挙げられる。 Examples of substituents that the monovalent alicyclic hydrocarbon group may have include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, Alkyl groups having 1 to 10 carbon atoms (preferably 1 to 4 carbon atoms) such as decyl groups, halogen atoms such as fluorine atoms, chlorine atoms, bromine atoms, and iodine atoms, hydroxy groups, amino groups, acetyl groups, cyano Examples include groups.
1価の芳香族炭化水素基は、単環であっても多環であってもよく、例えば、フェニル基、ナフチル基、アントラセニル基、フルオレニル基等が挙げられる。1価の芳香族炭化水素基の炭素数は、通常6~20であり、好ましくは6~10である。 The monovalent aromatic hydrocarbon group may be monocyclic or polycyclic, and includes, for example, a phenyl group, a naphthyl group, an anthracenyl group, a fluorenyl group, and the like. The monovalent aromatic hydrocarbon group usually has 6 to 20 carbon atoms, preferably 6 to 10 carbon atoms.
上記1価の芳香族炭化水素基が有していてもよい置換基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基等の炭素原子数1~10(好ましくは炭素原子数1~4)のアルキル基、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ヒドロキシ基、アミノ基、アセチル基、シアノ基等が挙げられる。 Examples of the substituents that the monovalent aromatic hydrocarbon group may have include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, Alkyl groups having 1 to 10 carbon atoms (preferably 1 to 4 carbon atoms) such as decyl groups, halogen atoms such as fluorine atoms, chlorine atoms, bromine atoms, and iodine atoms, hydroxy groups, amino groups, acetyl groups, cyano Examples include groups.
Rは、好ましくは、置換基を有していてもよい1価の脂肪族鎖状炭化水素基であり、より好ましくは、置換基を有していてもよいアルキル基であり、さらに好ましくは、炭素数1~6のアルキル基であり、なおさらに好ましくは、炭素数1~4のアルキル基であり、特に好ましくはメチル基又はエチル基である。 R is preferably a monovalent aliphatic chain hydrocarbon group that may have a substituent, more preferably an alkyl group that may have a substituent, and still more preferably, It is an alkyl group having 1 to 6 carbon atoms, even more preferably an alkyl group having 1 to 4 carbon atoms, and particularly preferably a methyl group or an ethyl group.
Rは、ベンゼン環の2~6位の任意の位置に存在し得るは、好ましくは、A原子を含む基に対してパラ位に存在する。 R may be present at any position from 2 to 6 of the benzene ring, but is preferably present at the para position to the group containing the A atom.
nは平均値で1以上の数を表す。ここで、樹脂(A)は、式(A)で表される1種の樹脂であってもよいし、式(A)で表される2種以上の樹脂の混合物であってもよい。上記「平均値」とは、樹脂(A)が式(A)で表される1種の樹脂であるときには該樹脂が有するnの値(1以上の整数)であり、樹脂(A)が式(A)で表される2種以上の樹脂の混合物であるときには、該2種以上の樹脂が有するnの値の平均値である。樹脂(A)が式(A)で表される1種の樹脂であるとき、nは、好ましくは1~10のいずれかの整数であり、より好ましくは1~5のいずれかの整数である。樹脂(A)が式(A)で表される2種以上の樹脂の混合物であるとき、nは、平均値で、好ましくは1~10の範囲内であり、より好ましくは1~5の範囲内である。なお、該2種以上の樹脂は、nの値が同じで他の構成が異なる樹脂であってもよい。 n represents an average value of 1 or more. Here, the resin (A) may be one type of resin represented by the formula (A), or a mixture of two or more types of resins represented by the formula (A). The above "average value" means the value of n (an integer of 1 or more) that the resin has when the resin (A) is a type of resin represented by the formula (A), and When it is a mixture of two or more resins represented by (A), it is the average value of n values of the two or more resins. When resin (A) is one type of resin represented by formula (A), n is preferably an integer of 1 to 10, more preferably an integer of 1 to 5. . When the resin (A) is a mixture of two or more resins represented by formula (A), n is an average value, preferably in the range of 1 to 10, more preferably in the range of 1 to 5. It is within. Note that the two or more types of resins may have the same value of n but differ in other configurations.
AはO原子又はS原子を表し、複数あるAは同一であっても異なっていてもよい。Aの総数に対するS原子であるAの数の比(以下、「S原子含有比」ともいう)は、大きいほど硬化物の屈折率を高めることができる。少なくとも一つのAがS原子である場合は、エピスルフィド化されている樹脂(A)という。屈折率を上げる観点から、樹脂(A)のS原子含有比は平均値で、好ましくは0.5以上であり、より好ましくは0.6以上、さらに好ましくは0.7以上、なおさらに好ましくは0.8以上、特に好ましくは0.9以上、最も好ましくは1.0である。S原子含有比は1.0未満であってもよい。ここでいう平均値は、上記と同様の意味である。 A represents an O atom or an S atom, and multiple A's may be the same or different. The larger the ratio of the number of A as S atoms to the total number of A (hereinafter also referred to as "S atom content ratio"), the higher the refractive index of the cured product can be. When at least one A is an S atom, it is called an episulfidized resin (A). From the viewpoint of increasing the refractive index, the average S atom content ratio of the resin (A) is preferably 0.5 or more, more preferably 0.6 or more, still more preferably 0.7 or more, and even more preferably It is 0.8 or more, particularly preferably 0.9 or more, and most preferably 1.0. The S atom content ratio may be less than 1.0. The average value here has the same meaning as above.
式(A)において、ナフタレン環に結合するA原子を含む基の結合位置は特に制限されないが、好ましくは、ナフタレン環の1位又は2位である。 In formula (A), the bonding position of the group containing the A atom bonded to the naphthalene ring is not particularly limited, but is preferably the 1st or 2nd position of the naphthalene ring.
式(A)で表される樹脂としては、式(Aa)で表される化合物が挙げられる。式(Ia)中のR、n及びAは前記と同じ意味である。
Examples of the resin represented by formula (A) include compounds represented by formula (Aa). R, n and A in formula (Ia) have the same meanings as above.
上述のように、樹脂(A)は、式(A)で表される2種以上の樹脂の混合物であってもよい。該混合物としては、例えば、S原子含有比、ナフタレン環におけるA原子を含む基の位置、Rの種類、ベンゼン環におけるRの位置及びnの値のいずれか一つ以上が互いに異なる式(A)で表される2種以上の化合物の混合物が挙げられる。 As mentioned above, resin (A) may be a mixture of two or more resins represented by formula (A). The mixture includes, for example, formulas (A) that differ from each other in any one or more of the S atom content ratio, the position of the group containing the A atom in the naphthalene ring, the type of R, the position of R in the benzene ring, and the value of n. A mixture of two or more kinds of compounds represented by:
樹脂(A)の重量平均分子量Mwは、ゲルパーミエーションクロマトグラフィ(GPC)によるポリスチレン換算で、例えば500~10000であり、好ましくは750~3000である。 The weight average molecular weight Mw of the resin (A) is, for example, 500 to 10,000, preferably 750 to 3,000, as calculated by gel permeation chromatography (GPC) in terms of polystyrene.
樹脂(B)は、不飽和カルボン酸及び不飽和カルボン酸無水物からなる群から選ばれる少なくとも1種の単量体(以下、「単量体(a)」という場合がある)に由来する構造単位を有する。樹脂(B)は、炭素数2~4の環状エーテル構造とエチレン性不飽和結合とを有する単量体(以下、「単量体(b)」という場合がある)に由来する構造単位を有していてもよく、単量体(a)と共重合可能な単量体(ただし、単量体(a)及び単量体(b)とは異なる。以下、「単量体(c)という場合がある)に由来する構造単位を有していてもよい。 The resin (B) has a structure derived from at least one monomer (hereinafter sometimes referred to as "monomer (a)") selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides. It has a unit. The resin (B) has a structural unit derived from a monomer having a cyclic ether structure having 2 to 4 carbon atoms and an ethylenically unsaturated bond (hereinafter sometimes referred to as "monomer (b)"). A monomer copolymerizable with monomer (a) (however, it is different from monomer (a) and monomer (b).Hereinafter, referred to as "monomer (c)") may have a structural unit derived from (in some cases).
本明細書において「(メタ)アクリル酸」とは、アクリル酸及びメタクリル酸からなる群より選ばれる少なくとも1種を表す。「(メタ)アクリロイル」及び「(メタ)アクリレート」等の表記も、同様の意味を有する。 In this specification, "(meth)acrylic acid" represents at least one kind selected from the group consisting of acrylic acid and methacrylic acid. Notations such as "(meth)acryloyl" and "(meth)acrylate" have similar meanings.
単量体(a)としては、例えば、アクリル酸、メタクリル酸、クロトン酸及びo-、m-、p-ビニル安息香酸等の不飽和モノカルボン酸;
マレイン酸、フマル酸、シトラコン酸、メサコン酸、イタコン酸、3-ビニルフタル酸、4-ビニルフタル酸、3,4,5,6-テトラヒドロフタル酸、1,2,3,6-テトラヒドロフタル酸、ジメチルテトラヒドロフタル酸及び1,4-シクロヘキセンジカルボン酸等の不飽和ジカルボン酸;
メチル-5-ノルボルネン-2,3-ジカルボン酸、5-カルボキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジカルボキシビシクロ[2.2.1]ヘプト-2-エン、5-カルボキシ-5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-カルボキシ-5-エチルビシクロ[2.2.1]ヘプト-2-エン、5-カルボキシ-6-メチルビシクロ[2.2.1]ヘプト-2-エン及び5-カルボキシ-6-エチルビシクロ[2.2.1]ヘプト-2-エン等のカルボキシ基を含有するビシクロ不飽和化合物;
無水マレイン酸、シトラコン酸無水物、イタコン酸無水物、3-ビニルフタル酸無水物、4-ビニルフタル酸無水物、3,4,5,6-テトラヒドロフタル酸無水物、1,2,3,6-テトラヒドロフタル酸無水物、ジメチルテトラヒドロフタル酸無水物、5,6-ジカルボキシビシクロ[2.2.1]ヘプト-2-エン無水物等の不飽和ジカルボン酸無水物;
こはく酸モノ〔2-(メタ)アクリロイルオキシエチル〕及びフタル酸モノ〔2-(メタ)アクリロイルオキシエチル〕等の2価以上の多価カルボン酸の不飽和モノ〔(メタ)アクリロイルオキシアルキル〕エステル;
α-(ヒドロキシメチル)アクリル酸等、同一分子中にヒドロキシ基及びカルボキシ基を含有する不飽和アクリレート;等が挙げられる。
Examples of the monomer (a) include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, and o-, m-, p-vinylbenzoic acid;
Maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, 3-vinylphthalic acid, 4-vinylphthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,2,3,6-tetrahydrophthalic acid, dimethyl unsaturated dicarboxylic acids such as tetrahydrophthalic acid and 1,4-cyclohexenedicarboxylic acid;
Methyl-5-norbornene-2,3-dicarboxylic acid, 5-carboxybicyclo[2.2.1]hept-2-ene, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene, 5-Carboxy-5-methylbicyclo[2.2.1]hept-2-ene, 5-carboxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-carboxy-6-methylbicyclo [2.2.1] Bicyclounsaturated compounds containing a carboxyl group such as hept-2-ene and 5-carboxy-6-ethylbicyclo[2.2.1]hept-2-ene;
Maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6- Unsaturated dicarboxylic anhydrides such as tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene anhydride;
Unsaturated mono[(meth)acryloyloxyalkyl] esters of divalent or higher polyhydric carboxylic acids such as mono[2-(meth)acryloyloxyethyl] succinate and mono[2-(meth)acryloyloxyethyl] phthalate. ;
Examples include unsaturated acrylates containing a hydroxy group and a carboxy group in the same molecule, such as α-(hydroxymethyl)acrylic acid.
これらのうち、共重合反応性の点や得られる樹脂のアルカリ水溶液への溶解性の点から、アクリル酸、メタクリル酸、o-、m-、p-ビニル安息香酸及び無水マレイン酸等が好ましい。 Among these, acrylic acid, methacrylic acid, o-, m-, p-vinylbenzoic acid, maleic anhydride, and the like are preferred from the viewpoint of copolymerization reactivity and the solubility of the resulting resin in aqueous alkali solutions.
単量体(b)は、炭素数2~4の環状エーテル構造(例えば、オキシラン環、オキセタン環及びテトラヒドロフラン環(オキソラン環)からなる群から選ばれる少なくとも1種)とエチレン性不飽和結合とを有する重合性化合物をいう。
単量体(b)は、炭素数2~4の環状エーテルと(メタ)アクリロイルオキシ基とを有する単量体であることが好ましい。
The monomer (b) has a cyclic ether structure having 2 to 4 carbon atoms (for example, at least one member selected from the group consisting of an oxirane ring, an oxetane ring, and a tetrahydrofuran ring (oxolane ring)) and an ethylenically unsaturated bond. refers to a polymerizable compound that has
Monomer (b) is preferably a monomer having a cyclic ether having 2 to 4 carbon atoms and a (meth)acryloyloxy group.
単量体(b)としては、例えば、オキシラニル基とエチレン性不飽和結合とを有する単量体(以下、「単量体(b1)」という場合がある)、オキセタニル基とエチレン性不飽和結合とを有する単量体(以下、「単量体(b2)」という場合がある)、テトラヒドロフリル基とエチレン性不飽和結合とを有する単量体(以下、「単量体(b3)」という場合がある)等が挙げられる。 As the monomer (b), for example, a monomer having an oxiranyl group and an ethylenically unsaturated bond (hereinafter sometimes referred to as "monomer (b1)"), an oxetanyl group and an ethylenically unsaturated bond (hereinafter sometimes referred to as "monomer (b2)"), a monomer having a tetrahydrofuryl group and an ethylenically unsaturated bond (hereinafter referred to as "monomer (b3)") ), etc.
単量体(b1)としては、例えば、直鎖状又は分枝鎖状の不飽和脂肪族炭化水素がエポキシ化された構造を有する単量体(以下、「単量体(b1-1)」という場合がある)、不飽和脂環式炭化水素がエポキシ化された構造を有する単量体(以下、「単量体(b1-2)」という場合がある)が挙げられる。 As the monomer (b1), for example, a monomer having a structure in which a linear or branched unsaturated aliphatic hydrocarbon is epoxidized (hereinafter referred to as "monomer (b1-1)") ), and a monomer having a structure in which an unsaturated alicyclic hydrocarbon is epoxidized (hereinafter sometimes referred to as "monomer (b1-2)").
単量体(b1-1)としては、グリシジル基とエチレン性不飽和結合とを有する単量体が好ましい。
単量体(b1-1)としては、例えば、グリシジル(メタ)アクリレート、β-メチルグリシジル(メタ)アクリレート、β-エチルグリシジル(メタ)アクリレート、グリシジルビニルエーテル、o-ビニルベンジルグリシジルエーテル、m-ビニルベンジルグリシジルエーテル、p-ビニルベンジルグリシジルエーテル、α-メチル-o-ビニルベンジルグリシジルエーテル、α-メチル-m-ビニルベンジルグリシジルエーテル、α-メチル-p-ビニルベンジルグリシジルエーテル、2,3-ビス(グリシジルオキシメチル)スチレン、2,4-ビス(グリシジルオキシメチル)スチレン、2,5-ビス(グリシジルオキシメチル)スチレン、2,6-ビス(グリシジルオキシメチル)スチレン、2,3,4-トリス(グリシジルオキシメチル)スチレン、2,3,5-トリス(グリシジルオキシメチル)スチレン、2,3,6-トリス(グリシジルオキシメチル)スチレン、3,4,5-トリス(グリシジルオキシメチル)スチレン、2,4,6-トリス(グリシジルオキシメチル)スチレン等が挙げられる。
The monomer (b1-1) is preferably a monomer having a glycidyl group and an ethylenically unsaturated bond.
Examples of the monomer (b1-1) include glycidyl (meth)acrylate, β-methylglycidyl (meth)acrylate, β-ethylglycidyl (meth)acrylate, glycidyl vinyl ether, o-vinylbenzylglycidyl ether, m-vinyl Benzyl glycidyl ether, p-vinylbenzyl glycidyl ether, α-methyl-o-vinylbenzyl glycidyl ether, α-methyl-m-vinylbenzyl glycidyl ether, α-methyl-p-vinylbenzyl glycidyl ether, 2,3-bis( glycidyloxymethyl)styrene, 2,4-bis(glycidyloxymethyl)styrene, 2,5-bis(glycidyloxymethyl)styrene, 2,6-bis(glycidyloxymethyl)styrene, 2,3,4-tris( 2,3,5-tris(glycidyloxymethyl)styrene, 2,3,6-tris(glycidyloxymethyl)styrene, 3,4,5-tris(glycidyloxymethyl)styrene, 2, Examples include 4,6-tris(glycidyloxymethyl)styrene.
単量体(b1-2)としては、例えば、ビニルシクロヘキセンモノオキサイド、1,2-エポキシ-4-ビニルシクロヘキサン(例えば、セロキサイド(登録商標)2000;(株)ダイセル製)、3,4-エポキシシクロヘキシルメチル(メタ)アクリレート(例えば、サイクロマー(登録商標)A400;(株)ダイセル製)、3,4-エポキシシクロヘキシルメチル(メタ)アクリレート(例えば、サイクロマー(登録商標)M100;(株)ダイセル製)、式(BI)で表される化合物及び式(BII)で表される化合物等が挙げられる。 Examples of the monomer (b1-2) include vinylcyclohexene monooxide, 1,2-epoxy-4-vinylcyclohexane (for example, Celoxide (registered trademark) 2000; manufactured by Daicel Corporation), 3,4-epoxy Cyclohexylmethyl (meth)acrylate (for example, Cyclomer (registered trademark) A400; manufactured by Daicel Corporation), 3,4-epoxycyclohexylmethyl (meth)acrylate (for example, Cyclomer (registered trademark) M100; manufactured by Daicel Corporation) ), a compound represented by formula (BI), a compound represented by formula (BII), and the like.
[式(BI)及び式(BII)中、Ra及びRbは、互いに独立に、水素原子、又は炭素数1~4のアルキル基を表し、該アルキル基に含まれる水素原子は、ヒドロキシ基で置換されていてもよい。
Xa及びXbは、互いに独立に、単結合、*-Rc-、*-Rc-O-、*-Rc-S-又は*-Rc-NH-を表す。
Rcは、炭素数1~6のアルカンジイル基を表す。
*は、Oとの結合手を表す。]
[In formula (BI) and formula (BII), R a and R b each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and the hydrogen atom contained in the alkyl group is a hydroxy group. may be replaced with .
X a and X b each independently represent a single bond, *-R c -, *-R c -O-, *-R c -S-, or *-R c -NH-.
R c represents an alkanediyl group having 1 to 6 carbon atoms.
* represents a bond with O. ]
炭素数1~4のアルキル基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基等が挙げられる。 Examples of the alkyl group having 1 to 4 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, and tert-butyl group.
水素原子がヒドロキシで置換されたアルキル基としては、例えば、ヒドロキシメチル基、1-ヒドロキシエチル基、2-ヒドロキシエチル基、1-ヒドロキシプロピル基、2-ヒドロキシプロピル基、3-ヒドロキシプロピル基、1-ヒドロキシ-1-メチルエチル基、2-ヒドロキシ-1-メチルエチル基、1-ヒドロキシブチル基、2-ヒドロキシブチル基、3-ヒドロキシブチル基、4-ヒドロキシブチル基等が挙げられる。 Examples of the alkyl group in which a hydrogen atom is substituted with hydroxy include hydroxymethyl group, 1-hydroxyethyl group, 2-hydroxyethyl group, 1-hydroxypropyl group, 2-hydroxypropyl group, 3-hydroxypropyl group, 1-hydroxypropyl group, -hydroxy-1-methylethyl group, 2-hydroxy-1-methylethyl group, 1-hydroxybutyl group, 2-hydroxybutyl group, 3-hydroxybutyl group, 4-hydroxybutyl group, and the like.
Ra及びRbとしては、好ましくは水素原子、メチル基、ヒドロキシメチル基、1-ヒドロキシエチル基、2-ヒドロキシエチル基が挙げられ、より好ましくは水素原子、メチル基が挙げられる。 Preferred examples of R a and R b include a hydrogen atom, a methyl group, a hydroxymethyl group, a 1-hydroxyethyl group, and a 2-hydroxyethyl group, and more preferably a hydrogen atom and a methyl group.
アルカンジイル基としては、例えば、メチレン基、エチレン基、プロパン-1,2-ジイル基、プロパン-1,3-ジイル基、ブタン-1,4-ジイル基、ペンタン-1,5-ジイル基、ヘキサン-1,6-ジイル基等が挙げられる。 Examples of alkanediyl groups include methylene group, ethylene group, propane-1,2-diyl group, propane-1,3-diyl group, butane-1,4-diyl group, pentane-1,5-diyl group, Examples include hexane-1,6-diyl group.
Xa及びXbとしては、好ましくは単結合、メチレン基、エチレン基、*-CH2-O-、*-CH2CH2-O-が挙げられ、より好ましくは単結合、*-CH2CH2-O-が挙げられる(*はOとの結合手を表す)。 Preferably, X a and X b include a single bond, a methylene group, an ethylene group, *-CH 2 -O-, *-CH 2 CH 2 -O-, and more preferably a single bond, *-CH 2 Examples include CH 2 -O- (* represents a bond with O).
式(BI)で表される化合物としては、式(BI-1)~式(BI-15)のいずれかで表される化合物等が挙げられる。中でも、式(BI-1)、式(BI-3)、式(BI-5)、式(BI-7)、式(BI-9)及び式(BI-11)~式(BI-15)で表される化合物が好ましく、式(BI-1)、式(BI-7)、式(BI-9)及び式(BI-15)で表される化合物がより好ましい。 Examples of the compound represented by formula (BI) include compounds represented by any of formulas (BI-1) to (BI-15). Among them, formula (BI-1), formula (BI-3), formula (BI-5), formula (BI-7), formula (BI-9) and formula (BI-11) to formula (BI-15) Compounds represented by formula (BI-1), formula (BI-7), formula (BI-9) and formula (BI-15) are more preferred.
式(BII)で表される化合物としては、式(BII-1)~式(BII-15)のいずれかで表される化合物等が挙げられ、中でも、好ましくは式(BII-1)、式(BII-3)、式(BII-5)、式(BII-7)、式(BII-9)及び式(BII-11)~式(BII-15)で表される化合物が挙げられ、より好ましくは式(BII-1)、式(BII-7)、式(BII-9)及び式(BII-15)で表される化合物が挙げられる。 Examples of the compound represented by formula (BII) include compounds represented by any one of formula (BII-1) to formula (BII-15), among which compounds represented by formula (BII-1) and formula (BII-15) are preferred. (BII-3), formula (BII-5), formula (BII-7), formula (BII-9) and formulas (BII-11) to (BII-15), and more. Preferred are compounds represented by formula (BII-1), formula (BII-7), formula (BII-9) and formula (BII-15).
式(BI)で表される化合物及び式(BII)で表される化合物は、それぞれ単独で用いてもよく、2種以上を併用してもよい。式(BI)で表される化合物及び式(BII)で表される化合物を併用してもよい。式(BI)で表される化合物及び式(BII)で表される化合物を併用する場合、これらの含有比率〔式(BI)で表される化合物:式(BII)で表される化合物〕はモル基準で、好ましくは5:95~95:5であり、より好ましくは10:90~90:10であり、さらに好ましくは20:80~80:20である。 The compound represented by formula (BI) and the compound represented by formula (BII) may be used alone, or two or more types may be used in combination. The compound represented by formula (BI) and the compound represented by formula (BII) may be used together. When the compound represented by formula (BI) and the compound represented by formula (BII) are used together, their content ratio [compound represented by formula (BI): compound represented by formula (BII)] is On a molar basis, the ratio is preferably 5:95 to 95:5, more preferably 10:90 to 90:10, even more preferably 20:80 to 80:20.
オキセタニル基とエチレン性不飽和結合とを有する単量体(b2)としては、オキセタニル基と(メタ)アクリロイルオキシ基とを有する単量体がより好ましい。
単量体(b2)としては、例えば、3-メチル-3-(メタ)アクリルロイルオキシメチルオキセタン、3-エチル-3-(メタ)アクリロイルオキシメチルオキセタン、3-メチル-3-(メタ)アクリロイルオキシエチルオキセタン、3-エチル-3-(メタ)アクリロイルオキシエチルオキセタン等が挙げられる。
As the monomer (b2) having an oxetanyl group and an ethylenically unsaturated bond, a monomer having an oxetanyl group and a (meth)acryloyloxy group is more preferable.
Examples of the monomer (b2) include 3-methyl-3-(meth)acryloyloxymethyloxetane, 3-ethyl-3-(meth)acryloyloxymethyloxetane, and 3-methyl-3-(meth)acryloyl. Examples include oxyethyloxetane, 3-ethyl-3-(meth)acryloyloxyethyloxetane, and the like.
テトラヒドロフリル基とエチレン性不飽和結合とを有する単量体(b3)としては、テトラヒドロフリル基と(メタ)アクリロイルオキシ基とを有する単量体がより好ましい。
単量体(b3)としては、例えば、テトラヒドロフルフリルアクリレート(例えば、ビスコートV#150、大阪有機化学工業(株)製)、テトラヒドロフルフリルメタクリレート等が挙げられる。
As the monomer (b3) having a tetrahydrofuryl group and an ethylenically unsaturated bond, a monomer having a tetrahydrofuryl group and a (meth)acryloyloxy group is more preferable.
Examples of the monomer (b3) include tetrahydrofurfuryl acrylate (eg, Viscoat V #150, manufactured by Osaka Organic Chemical Industry Co., Ltd.), tetrahydrofurfuryl methacrylate, and the like.
単量体(b)としては、得られる硬化物の耐熱性、耐薬品性等の信頼性をより高くすることができる点で、単量体(b1)であることが好ましい。さらに、組成物(I)の保存安定性が優れるという点で、単量体(b1-2)がより好ましい。 As the monomer (b), monomer (b1) is preferable because it can further improve the reliability of the heat resistance, chemical resistance, etc. of the obtained cured product. Furthermore, monomer (b1-2) is more preferred in that composition (I) has excellent storage stability.
単量体(c)としては、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-ブチル(メタ)アクリレート、sec-ブチル(メタ)アクリレート、tert-ブチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、ドデシル(メタ)アクリレート、ラウリル(メタ)アクリレート、ステアリル(メタ)アクリレート、シクロペンチル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、2-メチルシクロヘキシル(メタ)アクリレート、トリシクロ[5.2.1.02,6]デカン-8-イル(メタ)アクリレート(当該技術分野では、慣用名として「ジシクロペンタニル(メタ)アクリレート」といわれている。また、「トリシクロデシル(メタ)アクリレート」という場合がある)、トリシクロ[5.2.1.02,6]デカン-9-イル(メタ)アクリレート、トリシクロ[5.2.1.02,6]デセン-8-イル(メタ)アクリレート(当該技術分野では、慣用名として「ジシクロペンテニル(メタ)アクリレート」といわれている)、トリシクロ[5.2.1.02,6]デセン-9-イル(メタ)アクリレート、ジシクロペンタニルオキシエチル(メタ)アクリレート、イソボルニル(メタ)アクリレート、アダマンチル(メタ)アクリレート、アリル(メタ)アクリレート、プロパルギル(メタ)アクリレート、フェニル(メタ)アクリレート、ナフチル(メタ)アクリレート及びベンジル(メタ)アクリレート等の(メタ)アクリル酸エステル;
2-ヒドロキシエチル(メタ)アクリレート及び2-ヒドロキシプロピル(メタ)アクリレート等のヒドロキシ基含有(メタ)アクリル酸エステル;
2,2,3,3,4,4,5,5-オクタフルオロペンチル(メタ)アクリレート等のハロゲン原子含有(メタ)アクリル酸エステル;
マレイン酸ジエチル、フマル酸ジエチル及びイタコン酸ジエチル等のジカルボン酸ジエステル;
ビシクロ[2.2.1]ヘプト-2-エン、5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-エチルビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシメチルビシクロ[2.2.1]ヘプト-2-エン、5-(2’-ヒドロキシエチル)ビシクロ[2.2.1]ヘプト-2-エン、5-メトキシビシクロ[2.2.1]ヘプト-2-エン、5-エトキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジヒドロキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジ(ヒドロキシメチル)ビシクロ[2.2.1]ヘプト-2-エン、5,6-ジ(2’-ヒドロキシエチル)ビシクロ[2.2.1]ヘプト-2-エン、5,6-ジメトキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジエトキシビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシ-5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシ-5-エチルビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシメチル-5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-tert-ブトキシカルボニルビシクロ[2.2.1]ヘプト-2-エン、5-シクロヘキシルオキシカルボニルビシクロ[2.2.1]ヘプト-2-エン、5-フェノキシカルボニルビシクロ[2.2.1]ヘプト-2-エン、5,6-ビス(tert-ブトキシカルボニル)ビシクロ[2.2.1]ヘプト-2-エン及び5,6-ビス(シクロヘキシルオキシカルボニル)ビシクロ[2.2.1]ヘプト-2-エン等のビシクロ不飽和化合物;
N-フェニルマレイミド、N-シクロヘキシルマレイミド、N-ベンジルマレイミド、N-スクシンイミジル-3-マレイミドベンゾエート、N-スクシンイミジル-4-マレイミドブチレート、N-スクシンイミジル-6-マレイミドカプロエート、N-スクシンイミジル-3-マレイミドプロピオネート及びN-(9-アクリジニル)マレイミド等のジカルボニルイミド誘導体;
スチレン、o-メチルスチレン、m-メチルスチレン、p-メチルスチレン、ビニルトルエン、N-ビニルカルバゾール及びp-メトキシスチレン等のビニル基含有芳香族化合物;(メタ)アクリロニトリル等のビニル基含有ニトリル;塩化ビニル及び塩化ビニリデン等のハロゲン化炭化水素;(メタ)アクリルアミド等のビニル基含有アミド;酢酸ビニル等のエステル;1,3-ブタジエン、イソプレン及び2,3-ジメチル-1,3-ブタジエン等のジエン;等が挙げられる。
Examples of the monomer (c) include methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, and 2-ethylhexyl. (meth)acrylate, dodecyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-methylcyclohexyl (meth)acrylate, tricyclo [5.2. 1.0 2,6 ] Decan-8-yl (meth)acrylate (commonly referred to as "dicyclopentanyl (meth)acrylate" in the technical field. Also, "tricyclodecyl (meth)acrylate") ), tricyclo[5.2.1.0 2,6 ]decane-9-yl (meth)acrylate, tricyclo[5.2.1.0 2,6 ]decen-8-yl (meth) ) acrylate (commonly referred to as “dicyclopentenyl (meth)acrylate” in the technical field), tricyclo[5.2.1.0 2,6 ]decen-9-yl (meth)acrylate, dicyclopentenyl (meth)acrylate, Cyclopentanyloxyethyl (meth)acrylate, isobornyl (meth)acrylate, adamantyl (meth)acrylate, allyl (meth)acrylate, propargyl (meth)acrylate, phenyl (meth)acrylate, naphthyl (meth)acrylate and benzyl (meth)acrylate (Meth)acrylic acid esters such as acrylates;
Hydroxy group-containing (meth)acrylic acid esters such as 2-hydroxyethyl (meth)acrylate and 2-hydroxypropyl (meth)acrylate;
Halogen atom-containing (meth)acrylic acid ester such as 2,2,3,3,4,4,5,5-octafluoropentyl (meth)acrylate;
Dicarboxylic acid diesters such as diethyl maleate, diethyl fumarate and diethyl itaconate;
Bicyclo[2.2.1]hept-2-ene, 5-methylbicyclo[2.2.1]hept-2-ene, 5-ethylbicyclo[2.2.1]hept-2-ene, 5- Hydroxybicyclo[2.2.1]hept-2-ene, 5-hydroxymethylbicyclo[2.2.1]hept-2-ene, 5-(2'-hydroxyethyl)bicyclo[2.2.1] Hept-2-ene, 5-methoxybicyclo[2.2.1]hept-2-ene, 5-ethoxybicyclo[2.2.1]hept-2-ene, 5,6-dihydroxybicyclo[2.2 .1] hept-2-ene, 5,6-di(hydroxymethyl)bicyclo[2.2.1]hept-2-ene, 5,6-di(2'-hydroxyethyl)bicyclo[2.2. 1] Hept-2-ene, 5,6-dimethoxybicyclo[2.2.1]hept-2-ene, 5,6-diethoxybicyclo[2.2.1]hept-2-ene, 5-hydroxy -5-methylbicyclo[2.2.1]hept-2-ene, 5-hydroxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxymethyl-5-methylbicyclo[2 .2.1] hept-2-ene, 5-tert-butoxycarbonylbicyclo[2.2.1]hept-2-ene, 5-cyclohexyloxycarbonylbicyclo[2.2.1]hept-2-ene, 5-phenoxycarbonylbicyclo[2.2.1]hept-2-ene, 5,6-bis(tert-butoxycarbonyl)bicyclo[2.2.1]hept-2-ene and 5,6-bis(cyclohexyl) bicyclounsaturated compounds such as (oxycarbonyl)bicyclo[2.2.1]hept-2-ene;
N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, N-succinimidyl-3-maleimidobenzoate, N-succinimidyl-4-maleimidobutyrate, N-succinimidyl-6-maleimidocaproate, N-succinimidyl-3 - dicarbonylimide derivatives such as maleimidopropionate and N-(9-acridinyl)maleimide;
Vinyl group-containing aromatic compounds such as styrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene, N-vinylcarbazole and p-methoxystyrene; vinyl group-containing nitriles such as (meth)acrylonitrile; chloride Halogenated hydrocarbons such as vinyl and vinylidene chloride; Vinyl group-containing amides such as (meth)acrylamide; Esters such as vinyl acetate; Dienes such as 1,3-butadiene, isoprene, and 2,3-dimethyl-1,3-butadiene ; etc.
樹脂(I)の含有率は、組成物(I)の固形分100質量%に対して、好ましくは5~90質量%であり、より好ましくは10~80質量%であり、さらに好ましくは13~70質量%であり、よりさらに好ましくは15~60質量%である。樹脂(I)の含有率が、前記の範囲にあると、硬化物の屈折率を向上させることができる。 The content of resin (I) is preferably 5 to 90% by mass, more preferably 10 to 80% by mass, even more preferably 13 to 80% by mass, based on 100% by mass of the solid content of composition (I). The content is 70% by mass, and even more preferably 15 to 60% by mass. When the content of resin (I) is within the above range, the refractive index of the cured product can be improved.
<他の成分>
組成物(I)に含まれる上記他の成分としては、例えば、化合物(I)以外の重合性化合物である重合性化合物、樹脂(I)以外の樹脂(以下、「樹脂(II)」ともいう)、重合開始剤、重合開始助剤、レベリング剤、酸化防止剤、硬化剤等を含んでいてもよい。硬化剤としては、多価カルボン酸、イミダゾール化合物等が例示される。
<Other ingredients>
Examples of the other components contained in composition (I) include polymerizable compounds other than compound (I), resins other than resin (I) (hereinafter also referred to as "resin (II)") ), a polymerization initiator, a polymerization initiation aid, a leveling agent, an antioxidant, a curing agent, etc. Examples of the curing agent include polycarboxylic acids and imidazole compounds.
(1)重合性化合物
組成物(I)は、化合物(I)以外に重合性化合物を1種又は2種以上含むことができる。組成物(I)が重合性化合物を含むことにより、組成物(I)の粘度又は硬化性を調整したり、得られる硬化物及びそれを含む成形物の機械的特性及び/又は光学特性を調整したりすることが可能である。
(1) Polymerizable compound Composition (I) can contain one or more polymerizable compounds in addition to compound (I). By containing the polymerizable compound in the composition (I), the viscosity or curability of the composition (I) can be adjusted, and the mechanical properties and/or optical properties of the obtained cured product and molded products containing the same can be adjusted. It is possible to do this.
重合性化合物は、化合物(I)以外の化合物であって重合性を有する化合物あれば限定されることはない。重合性化合物は、熱又は重合開始剤の作用により反応するモノマーであり、該モノマーとして、例えば、エチレン性不飽和結合を有する化合物が挙げられ、好ましくは(メタ)アクリル化合物が挙げられ、より好ましくはアクリロイル基及びメタクリロイル基からなる群から選ばれる少なくとも1種の基を有する化合物が挙げられる。 The polymerizable compound is not limited as long as it is a compound other than compound (I) and has polymerizability. The polymerizable compound is a monomer that reacts with heat or the action of a polymerization initiator, and examples of the monomer include compounds having an ethylenically unsaturated bond, preferably (meth)acrylic compounds, and more preferably Examples include compounds having at least one group selected from the group consisting of an acryloyl group and a methacryloyl group.
(メタ)アクリロイル基を2つ有する(メタ)アクリル化合物としては、1,3-ブタンジオールジ(メタ)アクリレート、1,3-ブタンジオール(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、テトラエチレングリコールジ(メタ)アクリレート、ポリエチレングリコールジアクリレート、ビスフェノールAのビス(アクリロイロキシエチル)エーテル、エチレンオキシド変性ビスフェノールAジ(メタ)アクリレート、プロピレンオキシド変性ネオペンチルグリコールジ(メタ)アクリレート、エチレンオキシド変性ネオペンチルグリコールジ(メタ)アクリレート、3-メチルペンタンジオールジ(メタ)アクリレート等が挙げられる。 Examples of (meth)acrylic compounds having two (meth)acryloyl groups include 1,3-butanediol di(meth)acrylate, 1,3-butanediol (meth)acrylate, and 1,6-hexanediol di(meth)acrylate. Acrylate, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, polyethylene glycol diacrylate, bisphenol Bis(acryloyloxyethyl) ether of A, ethylene oxide-modified bisphenol A di(meth)acrylate, propylene oxide-modified neopentyl glycol di(meth)acrylate, ethylene oxide-modified neopentyl glycol di(meth)acrylate, 3-methylpentanediol diol Examples include (meth)acrylate.
(メタ)アクリロイル基を3つ以上有する(メタ)アクリル化合物としては、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、トリス(2-ヒドロキシエチル)イソシアヌレートトリ(メタ)アクリレート、エチレンオキシド変性トリメチロールプロパントリ(メタ)アクリレート、プロピレンオキシド変性トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、トリペンタエリスリトールテトラ(メタ)アクリレート、トリペンタエリスリトールペンタ(メタ)アクリレート、トリペンタエリスリトールヘキサ(メタ)アクリレート、トリペンタエリスリトールヘプタ(メタ)アクリレート、トリペンタエリスリトールオクタ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレートと酸無水物との反応物、ジペンタエリスリトールペンタ(メタ)アクリレートと酸無水物との反応物、トリペンタエリスリトールヘプタ(メタ)アクリレートと酸無水物との反応物、カプロラクトン変性トリメチロールプロパントリ(メタ)アクリレート、カプロラクトン変性ペンタエリスリトールトリ(メタ)アクリレート、カプロラクトン変性トリス(2-ヒドロキシエチル)イソシアヌレートトリ(メタ)アクリレート、カプロラクトン変性ペンタエリスリトールテトラ(メタ)アクリレート、カプロラクトン変性ジペンタエリスリトールペンタ(メタ)アクリレート、カプロラクトン変性ジペンタエリスリトールヘキサ(メタ)アクリレート、カプロラクトン変性トリペンタエリスリトールテトラ(メタ)アクリレート、カプロラクトン変性トリペンタエリスリトールペンタ(メタ)アクリレート、カプロラクトン変性トリペンタエリスリトールヘキサ(メタ)アクリレート、カプロラクトン変性トリペンタエリスリトールヘプタ(メタ)アクリレート、カプロラクトン変性トリペンタエリスリトールオクタ(メタ)アクリレート、カプロラクトン変性ペンタエリスリトールトリ(メタ)アクリレートと酸無水物との反応物、カプロラクトン変性ジペンタエリスリトールペンタ(メタ)アクリレートと酸無水物との反応物、カプロラクトン変性トリペンタエリスリトールヘプタ(メタ)アクリレートと酸無水物との反応物等が挙げられる。 Examples of (meth)acrylic compounds having three or more (meth)acryloyl groups include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, tris(2-hydroxyethyl)isocyanurate tri(meth)acrylate, Ethylene oxide modified trimethylolpropane tri(meth)acrylate, propylene oxide modified trimethylolpropane tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tri Pentaerythritol tetra(meth)acrylate, tripentaerythritol penta(meth)acrylate, tripentaerythritol hexa(meth)acrylate, tripentaerythritol hepta(meth)acrylate, tripentaerythritol octa(meth)acrylate, pentaerythritol tri(meth)acrylate Reaction product of acrylate and acid anhydride, reaction product of dipentaerythritol penta(meth)acrylate and acid anhydride, reaction product of tripentaerythritol hepta(meth)acrylate and acid anhydride, caprolactone-modified trimethylolpropane tri (meth)acrylate, caprolactone-modified pentaerythritol tri(meth)acrylate, caprolactone-modified tris(2-hydroxyethyl)isocyanurate tri(meth)acrylate, caprolactone-modified pentaerythritol tetra(meth)acrylate, caprolactone-modified dipentaerythritol penta(meth)acrylate ) acrylate, caprolactone-modified dipentaerythritol hexa(meth)acrylate, caprolactone-modified tripentaerythritol tetra(meth)acrylate, caprolactone-modified tripentaerythritol penta(meth)acrylate, caprolactone-modified tripentaerythritol hexa(meth)acrylate, caprolactone-modified tri- Pentaerythritol hepta(meth)acrylate, caprolactone-modified tripentaerythritol octa(meth)acrylate, reaction product of caprolactone-modified pentaerythritol tri(meth)acrylate and acid anhydride, caprolactone-modified dipentaerythritol penta(meth)acrylate and acid anhydride Examples include reaction products with caprolactone-modified tripentaerythritol hepta(meth)acrylate and acid anhydrides.
(メタ)アクリル化合物としては、(メタ)アクリルロイル基を3つ以上有する(メタ)アクリル化合物が好ましく、ジペンタエリスリトールヘキサ(メタ)アクリレートがよ
り好ましい。
As the (meth)acrylic compound, a (meth)acrylic compound having three or more (meth)acryloyl groups is preferable, and dipentaerythritol hexa(meth)acrylate is more preferable.
組成物(I)が重合性化合物を含む場合、重合性化合物の含有量は、組成物(I)の固形分の総量に対して、好ましくは1質量%以上、より好ましくは2質量%以上であり、好ましくは30質量%以下、より好ましくは20質量%以下である。 When composition (I) contains a polymerizable compound, the content of the polymerizable compound is preferably 1% by mass or more, more preferably 2% by mass or more, based on the total solid content of composition (I). It is preferably 30% by mass or less, more preferably 20% by mass or less.
(2)樹脂(II)
組成物(I)は、1種又は2種以上の樹脂(II)を含むことができる。組成物(I)が樹脂(II)を含むことにより、組成物(I)の硬化物に現像性を付与したり、該硬化物及びそれを含む成形物の機械的特性及び/又は光学特性を調整したりすることが可能である。樹脂(II)としては、樹脂(I)以外の樹脂であれば限定されることはなく、熱可塑性樹脂及び硬化性樹脂が挙げられる。硬化性樹脂は、活性エネルギー線照射により硬化する光硬化性樹脂であってもよいし、熱により硬化する熱硬化性樹脂であってもよい。
(2) Resin (II)
Composition (I) can contain one or more resins (II). Composition (I) containing resin (II) imparts developability to the cured product of composition (I) and improves the mechanical and/or optical properties of the cured product and molded products containing it. It is possible to make adjustments. Resin (II) is not limited as long as it is a resin other than resin (I), and includes thermoplastic resins and curable resins. The curable resin may be a photocurable resin that is cured by irradiation with active energy rays, or a thermosetting resin that is cured by heat.
熱可塑性樹脂としては、例えば、ポリエチレン樹脂、ポリプロピレン樹脂、ポリシクロオレフィン樹脂等のオレフィン系樹脂、ポリ(メタ)アクリル酸エステル系樹脂等の(メタ)アクリル系樹脂、ポリスチレン系樹脂、スチレン-アクリロニトリル系樹脂、アクリロニトリル-ブタジエン-スチレン系樹脂、ポリ塩化ビニル系樹脂、ポリ塩化ビニリデン系樹脂、ポリ酢酸ビニル系樹脂、ポリビニルブチラール系樹脂、エチレン-酢酸ビニル系共重合体、エチレン-ビニルアルコール系樹脂、ポリエチレンテレフタレート樹脂、ポリブチレンテレフタレート樹脂、液晶ポリエステル樹脂等のポリエステル系樹脂、ポリアセタール樹脂、ポリアミド樹脂、ポリカーボネート樹脂、ポリウレタン樹脂、ポリフェニレンサルファイド樹脂等が挙げられる。これらの樹脂の1種を又は2種以上をポリマーブレンド若しくはポリマーアロイとして使用してもよい。 Examples of thermoplastic resins include olefin resins such as polyethylene resins, polypropylene resins, and polycycloolefin resins, (meth)acrylic resins such as poly(meth)acrylate resins, polystyrene resins, and styrene-acrylonitrile resins. Resin, acrylonitrile-butadiene-styrene resin, polyvinyl chloride resin, polyvinylidene chloride resin, polyvinyl acetate resin, polyvinyl butyral resin, ethylene-vinyl acetate copolymer, ethylene-vinyl alcohol resin, polyethylene Examples include polyester resins such as terephthalate resin, polybutylene terephthalate resin, and liquid crystal polyester resin, polyacetal resin, polyamide resin, polycarbonate resin, polyurethane resin, and polyphenylene sulfide resin. One or more of these resins may be used as a polymer blend or polymer alloy.
硬化性樹脂としては、光重合性基又は熱重合性基を有する樹脂が挙げられ、例えば、(メタ)アクリル系樹脂、エポキシ樹脂、メラミン樹脂、不飽和ポリエステル樹脂、フェノール樹脂、尿素樹脂、アルキド樹脂、ポリイミド樹脂等が挙げられる。 Examples of the curable resin include resins having a photopolymerizable group or a thermopolymerizable group, such as (meth)acrylic resins, epoxy resins, melamine resins, unsaturated polyester resins, phenolic resins, urea resins, and alkyd resins. , polyimide resin, etc.
(3)重合開始剤
組成物(I)は、1種又は2種以上の重合開始剤を含むことができる。重合開始剤としては、化合物(I)の重合を開始できるものであれば特に制限されず、例えば、ラジカル重合開始剤、カチオン重合開始剤、アニオン重合開始剤、ラジカル及びカチオン重合開始剤等が挙げられ、適宜選択して用いられる。これらの重合開始剤は、活性エネルギー線照射及び熱の少なくとも1種によりラジカル、酸又は塩基を発生し、重合性化合物のラジカル重合、カチオン重合又はアニオン重合を進行させる。
(3) Polymerization initiator Composition (I) can contain one or more types of polymerization initiator. The polymerization initiator is not particularly limited as long as it can initiate the polymerization of compound (I), and includes, for example, radical polymerization initiators, cationic polymerization initiators, anionic polymerization initiators, radical and cationic polymerization initiators, etc. and can be selected and used as appropriate. These polymerization initiators generate radicals, acids, or bases by at least one of active energy ray irradiation and heat, and advance radical polymerization, cationic polymerization, or anionic polymerization of the polymerizable compound.
重合開始剤としては、O-アシルオキシム化合物、アルキルフェノン化合物、トリアジン化合物、アシルホスフィンオキサイド化合物及びビイミダゾール化合物からなる群から選ばれる少なくとも1種を含む重合開始剤が好ましく、O-アシルオキシム化合物を含む重合開始剤がより好ましい。これらの重合開始剤であると、高感度であり、かつ可視光領域における透過率が高くなる傾向がある。 The polymerization initiator is preferably a polymerization initiator containing at least one selected from the group consisting of O-acyloxime compounds, alkylphenone compounds, triazine compounds, acylphosphine oxide compounds, and biimidazole compounds; More preferred are polymerization initiators containing. These polymerization initiators tend to have high sensitivity and high transmittance in the visible light region.
O-アシルオキシム化合物は、式(D1)で表される構造を有する化合物である。以下、*は結合手を表す。 The O-acyloxime compound is a compound having a structure represented by formula (D1). Hereinafter, * represents a bond.
O-アシルオキシム化合物としては、例えば、N-ベンゾイルオキシ-1-(4-フェニルスルファニルフェニル)ブタン-1-オン-2-イミン、N-ベンゾイルオキシ-1-(4-フェニルスルファニルフェニル)オクタン-1-オン-2-イミン、N-ベンゾイルオキシ-1-(4-フェニルスルファニルフェニル)-3-シクロペンチルプロパン-1-オン-2-イミン、N-アセトキシ-1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]エタン-1-イミン、N-アセトキシ-1-[9-エチル-6-{2-メチル-4-(3,3-ジメチル-2,4-ジオキサシクロペンタニルメチルオキシ)ベンゾイル}-9H-カルバゾール-3-イル]エタン-1-イミン、N-アセトキシ-1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-3-シクロペンチルプロパン-1-イミン、N-ベンゾイルオキシ-1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-3-シクロペンチルプロパン-1-オン-2-イミンが挙げられる。イルガキュア(登録商標)OXE01、OXE02(以上、BASF(株)製)、N-1919((株)ADEKA製)等の市販品を用いてもよい。 Examples of O-acyloxime compounds include N-benzoyloxy-1-(4-phenylsulfanylphenyl)butan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)octane- 1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)-3-cyclopentylpropan-1-one-2-imine, N-acetoxy-1-[9-ethyl-6-( 2-Methylbenzoyl)-9H-carbazol-3-yl]ethane-1-imine, N-acetoxy-1-[9-ethyl-6-{2-methyl-4-(3,3-dimethyl-2,4 -dioxacyclopentanylmethyloxy)benzoyl}-9H-carbazol-3-yl]ethane-1-imine, N-acetoxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole- 3-yl]-3-cyclopentylpropan-1-imine, N-benzoyloxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-3-cyclopentylpropane-1 -one-2-imine is mentioned. Commercial products such as Irgacure (registered trademark) OXE01, OXE02 (manufactured by BASF Corporation) and N-1919 (manufactured by ADEKA Corporation) may be used.
アルキルフェノン化合物は、式(D2-1)で表される構造又は式(D2-2)で表される構造を有する化合物である。これらの構造中、ベンゼン環は置換基を有していてもよい。 The alkylphenone compound is a compound having a structure represented by formula (D2-1) or a structure represented by formula (D2-2). In these structures, the benzene ring may have a substituent.
式(D2-1)で表される構造を有する化合物としては、例えば、2-メチル-2-モルホリノ-1-(4-メチルスルファニルフェニル)プロパン-1-オン、2-ジメチルアミノ-1-(4-モルホリノフェニル)-2-ベンジルブタン-1-オン、2-(ジメチルアミノ)-2-[(4-メチルフェニル)メチル]-1-[4-(4-モルホリニル)フェニル]ブタン-1-オンが挙げられる。イルガキュア(登録商標)369、907及び379(以上、BASF(株)製)等の市販品を用いてもよい。また、特表2002-544205号公報に記載されている、連鎖移動を起こしうる基を有する重合開始剤を用いてもよい。式(D2-2)で表される構造を有する化合物としては、例えば、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン、2-ヒドロキシ-2-メチル-1-〔4-(2-ヒドロキシエトキシ)フェニル〕プロパン-1-オン、1-ヒドロキシシクロヘキシルフェニルケトン、2-ヒドロキシ-2-メチル-1-(4-イソプロペニルフェニル)プロパン-1-オンのオリゴマー、α,α-ジエトキシアセトフェノン、ベンジルジメチルケタールが挙げられる。感度の点で、アルキルフェノン化合物としては、式(D2-1)で表される構造を有する化合物が好ましい。 Examples of the compound having the structure represented by formula (D2-1) include 2-methyl-2-morpholino-1-(4-methylsulfanylphenyl)propan-1-one, 2-dimethylamino-1-( 4-morpholinophenyl)-2-benzylbutan-1-one, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]butane-1- One example is on. Commercially available products such as Irgacure (registered trademark) 369, 907, and 379 (all manufactured by BASF Corporation) may be used. Furthermore, a polymerization initiator having a group capable of causing chain transfer, which is described in Japanese Patent Publication No. 2002-544205, may be used. Examples of the compound having the structure represented by formula (D2-2) include 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2-hydroxy-2-methyl-1-[4-( 2-hydroxyethoxy)phenyl]propan-1-one, 1-hydroxycyclohexylphenylketone, 2-hydroxy-2-methyl-1-(4-isopropenylphenyl)propan-1-one oligomer, α,α-di Examples include ethoxyacetophenone and benzyl dimethyl ketal. In terms of sensitivity, the alkylphenone compound is preferably a compound having a structure represented by formula (D2-1).
トリアジン化合物としては、例えば、2,4-ビス(トリクロロメチル)-6-(4-メトキシフェニル)-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-(4-メトキシナフチル)-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-ピペロニル-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-(4-メトキシスチリル)-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(5-メチルフラン-2-イル)エテニル〕-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(フラン-2-イル)エテニル〕-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(4-ジエチルアミノ-2-メチルフェニル)エテニル〕-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(3,4-ジメトキシフェニル)エテニル〕-1,3,5-トリアジンが挙げられる。 Examples of triazine compounds include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl) naphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxystyryl) )-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(5-methylfuran-2-yl)ethenyl]-1,3,5-triazine, 2,4- Bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2) -methylphenyl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)ethenyl]-1,3,5-triazine It will be done.
アシルホスフィンオキサイド化合物としては、2,4,6-トリメチルベンゾイルジフェニルホスフィンオキサイド等が挙げられる。イルガキュア819(BASF・ジャパン(株)製)等の市販品を用いてもよい。 Examples of the acylphosphine oxide compound include 2,4,6-trimethylbenzoyldiphenylphosphine oxide. Commercial products such as Irgacure 819 (manufactured by BASF Japan Co., Ltd.) may be used.
ビイミダゾール化合物としては、例えば、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラフェニルビイミダゾール、2,2’-ビス(2,3-ジクロロフェニル)-4,4’,5,5’-テトラフェニルビイミダゾール(例えば、特開平6-75372号公報、特開平6-75373号公報等参照。)、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラフェニルビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラ(アルコキシフェニル)ビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラ(ジアルコキシフェニル)ビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラ(トリアルコキシフェニル)ビイミダゾール(例えば、特公昭48-38403号公報、特開昭62-174204号公報等参照。)、4,4’,5,5’-位のフェニル基がカルボアルコキシ基により置換されているビイミダゾール化合物(例えば、特開平7-10913号公報等参照)が挙げられる。 Examples of biimidazole compounds include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4 , 4',5,5'-tetraphenylbiimidazole (see, for example, JP-A-6-75372, JP-A-6-75373, etc.), 2,2'-bis(2-chlorophenyl)-4, 4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl)biimidazole, 2,2'-bis( 2-chlorophenyl)-4,4',5,5'-tetra(dialkoxyphenyl)biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(trialkoxy phenyl)biimidazole (see, for example, Japanese Patent Publication No. 48-38403, Japanese Patent Application Laid-open No. 62-174204, etc.), in which the phenyl group at the 4,4', 5,5'-positions is substituted with a carbalkoxy group. Examples include biimidazole compounds (see, for example, JP-A-7-10913).
さらに重合開始剤としては、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテル等のベンゾイン化合物;ベンゾフェノン、o-ベンゾイル安息香酸メチル、4-フェニルベンゾフェノン、4-ベンゾイル-4’-メチルジフェニルサルファイド、3,3’,4,4’-テトラ(tert-ブチルパーオキシカルボニル)ベンゾフェノン、2,4,6-トリメチルベンゾフェノン等のベンゾフェノン化合物;9,10-フェナンスレンキノン、2-エチルアントラキノン、カンファーキノン等のキノン化合物;10-ブチル-2-クロロアクリドン、ベンジル、フェニルグリオキシル酸メチル、チタノセン化合物等が挙げられる。これらは、後述の重合開始助剤(特にアミン化合物)と組合せて用いることができる。 Furthermore, as a polymerization initiator, benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether; benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'- Benzophenone compounds such as methyldiphenyl sulfide, 3,3',4,4'-tetra(tert-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone; 9,10-phenanthrenequinone, 2-ethyl Examples include quinone compounds such as anthraquinone and camphorquinone; 10-butyl-2-chloroacridone, benzyl, methyl phenylglyoxylate, and titanocene compounds. These can be used in combination with a polymerization initiation aid (especially an amine compound) described below.
重合開始剤としては、酸発生剤も用いることができる。酸発生剤としては、例えば、4-ヒドロキシフェニルジメチルスルホニウムp-トルエンスルホナート、4-ヒドロキシフェニルジメチルスルホニウムヘキサフルオロアンチモネート、4-アセトキシフェニルジメチルスルホニウムp-トルエンスルホナート、4-アセトキシフェニル・メチル・ベンジルスルホニウムヘキサフルオロアンチモネート、トリフェニルスルホニウムp-トルエンスルホナート、トリフェニルスルホニウムヘキサフルオロアンチモネート、ジフェニルヨードニウムp-トルエンスルホナート、ジフェニルヨードニウムヘキサフルオロアンチモネート等のオニウム塩や、ニトロベンジルトシレート、ベンゾイントシレートが挙げられる。 As the polymerization initiator, an acid generator can also be used. Examples of acid generators include 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate, 4-acetoxyphenyldimethylsulfonium p-toluenesulfonate, and 4-acetoxyphenyl methyl sulfonate. Onium salts such as benzylsulfonium hexafluoroantimonate, triphenylsulfonium p-toluenesulfonate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium p-toluenesulfonate, diphenyliodonium hexafluoroantimonate, nitrobenzyl tosylate, benzoin Examples include tosylate.
組成物(I)が重合性化合物及び重合開始剤を含む場合、重合開始剤の含有量は、樹脂と重合性化合物との合計含有量100質量部に対して、好ましくは0.1~30質量部、より好ましくは0.5~15質量部、さらに好ましくは1~8質量部である。重合開始剤の含有量が前記の範囲内にあると、得られる硬化物の可視光透過率が高い傾向がある。 When composition (I) contains a polymerizable compound and a polymerization initiator, the content of the polymerization initiator is preferably 0.1 to 30 parts by mass based on 100 parts by mass of the total content of the resin and the polymerizable compound. parts, more preferably 0.5 to 15 parts by weight, still more preferably 1 to 8 parts by weight. When the content of the polymerization initiator is within the above range, the visible light transmittance of the resulting cured product tends to be high.
(4)重合開始助剤
重合開始助剤は、重合開始剤とともに、重合開始剤によって重合が開始された重合性化合物の重合を促進するために用いられる化合物、もしくは増感剤である。
(4) Polymerization initiation aid The polymerization initiation aid is a compound or sensitizer used together with the polymerization initiator to promote the polymerization of a polymerizable compound whose polymerization has been initiated by the polymerization initiator.
重合開始助剤としては、チアゾリン化合物、アミン化合物、アルコキシアントラセン化合物、チオキサントン化合物、カルボン酸化合物等が挙げられる。 Examples of the polymerization initiation aid include thiazoline compounds, amine compounds, alkoxyanthracene compounds, thioxanthone compounds, and carboxylic acid compounds.
チアゾリン化合物としては、式(H1-1)~式(H1-3)で表される化合物、特開2008-65319号公報記載の化合物等が挙げられる。 Examples of the thiazoline compound include compounds represented by formulas (H1-1) to (H1-3), compounds described in JP-A No. 2008-65319, and the like.
アミン化合物としては、トリエタノールアミン、メチルジエタノールアミン、トリイソプロパノールアミン、4-ジメチルアミノ安息香酸メチル、4-ジメチルアミノ安息香酸エチル、4-ジメチルアミノ安息香酸イソアミル、安息香酸2-ジメチルアミノエチル、4-ジメチルアミノ安息香酸2-エチルヘキシル、N,N-ジメチルパラトルイジン、4,4’-ビス(ジメチルアミノ)ベンゾフェノン(通称ミヒラーズケトン)、4,4’-ビス(ジエチルアミノ)ベンゾフェノン、4,4’-ビス(エチルメチルアミノ)ベンゾフェノン等が挙げられ、中でも4,4’-ビス(ジエチルアミノ)ベンゾフェノンが好ましい。EAB-F(保土谷化学工業(株)製)等の市販品を用いてもよい。 Examples of amine compounds include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, and 4-dimethylaminobenzoate. 2-ethylhexyl dimethylaminobenzoate, N,N-dimethylpara-toluidine, 4,4'-bis(dimethylamino)benzophenone (commonly known as Michler's ketone), 4,4'-bis(diethylamino)benzophenone, 4,4'-bis( Examples include ethylmethylamino)benzophenone, among which 4,4'-bis(diethylamino)benzophenone is preferred. Commercially available products such as EAB-F (manufactured by Hodogaya Chemical Industry Co., Ltd.) may also be used.
アルコキシアントラセン化合物としては、9,10-ジメトキシアントラセン、2-エチル-9,10-ジメトキシアントラセン、9,10-ジエトキシアントラセン、2-エチル-9,10-ジエトキシアントラセン、9,10-ジブトキシアントラセン、2-エチル-9,10-ジブトキシアントラセン等が挙げられる。 Examples of alkoxyanthracene compounds include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, 9,10-dibutoxy Examples include anthracene, 2-ethyl-9,10-dibutoxyanthracene, and the like.
チオキサントン化合物としては、2-イソプロピルチオキサントン、4-イソプロピルチオキサントン、2,4-ジエチルチオキサントン、2,4-ジクロロチオキサントン、1-クロロ-4-プロポキシチオキサントン等が挙げられる。 Examples of the thioxanthone compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, and 1-chloro-4-propoxythioxanthone.
カルボン酸化合物としては、フェニルスルファニル酢酸、メチルフェニルスルファニル酢酸、エチルフェニルスルファニル酢酸、メチルエチルフェニルスルファニル酢酸、ジメチルフェニルスルファニル酢酸、メトキシフェニルスルファニル酢酸、ジメトキシフェニルスルファニル酢酸、クロロフェニルスルファニル酢酸、ジクロロフェニルスルファニル酢酸、N-フェニルグリシン、フェノキシ酢酸、ナフチルチオ酢酸、N-ナフチルグリシン、ナフトキシ酢酸等が挙げられる。 Examples of carboxylic acid compounds include phenylsulfanylacetic acid, methylphenylsulfanylacetic acid, ethylphenylsulfanylacetic acid, methylethylphenylsulfanylacetic acid, dimethylphenylsulfanylacetic acid, methoxyphenylsulfanylacetic acid, dimethoxyphenylsulfanylacetic acid, chlorophenylsulfanylacetic acid, dichlorophenylsulfanylacetic acid, N -Phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid and the like.
組成物(I)が重合性化合物、重合開始剤及び重合開始助剤を含む場合、重合開始助剤の含有量は、樹脂(I)と重合性化合物との合計含有量100質量部に対して、好ましくは0.1~30質量部、より好ましくは0.2~10質量部である。重合開始助剤の量が前記の範囲内にあると、硬化物を形成する際、さらに高感度になる傾向にある。 When composition (I) contains a polymerizable compound, a polymerization initiator, and a polymerization initiation aid, the content of the polymerization initiation aid is based on 100 parts by mass of the total content of the resin (I) and the polymerizable compound. , preferably 0.1 to 30 parts by weight, more preferably 0.2 to 10 parts by weight. When the amount of the polymerization initiation aid is within the above range, the sensitivity tends to be even higher when forming a cured product.
(5)レベリング剤
レベリング剤としては、シリコーン系界面活性剤、フッ素系界面活性剤及びフッ素原子を有するシリコーン系界面活性剤等が挙げられる。これらは、側鎖に重合性基を有していてもよい。
(5) Leveling agent Examples of the leveling agent include silicone surfactants, fluorine surfactants, and silicone surfactants containing fluorine atoms. These may have a polymerizable group in the side chain.
シリコーン系界面活性剤としては、分子内にシロキサン結合を有する界面活性剤等が挙げられる。具体的には、トーレシリコーンDC3PA、同SH7PA、同DC11PA、同SH21PA、同SH28PA、同SH29PA、同SH30PA、同SH8400(商品名:東レ・ダウコーニング(株)製)、KP321、KP322、KP323、KP324、KP326、KP340、KP341(信越化学工業(株)製)、TSF400、TSF401、TSF410、TSF4300、TSF4440、TSF4445、TSF4446、TSF4452及びTSF4460(モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社製)等が挙げられる。 Examples of the silicone surfactant include surfactants having a siloxane bond in the molecule. Specifically, Toray silicone DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, SH8400 (product name: manufactured by Dow Corning Toray Co., Ltd.), KP321, KP322, KP323, KP324 , KP326, KP340, KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452 and TSF4460 (manufactured by Momentive Performance Materials Japan LLC). .
前記のフッ素系界面活性剤としては、分子内にフルオロカーボン鎖を有する界面活性剤等が挙げられる。具体的には、フロラード(登録商標)FC430、同FC431(住友スリーエム(株)製)、メガファック(登録商標)F142D、同F171、同F172、同F173、同F177、同F183、同F554、同R30、同RS-718-K(DIC(株)製)、エフトップ(登録商標)EF301、同EF303、同EF351、同EF352(三菱マテリアル電子化成(株)製)、サーフロン(登録商標)S381、同S382、同SC101、同SC105(旭硝子(株)製)及びE5844((株)ダイキンファインケミカル研究所製)等が挙げられる。 Examples of the above-mentioned fluorine-based surfactants include surfactants having a fluorocarbon chain in the molecule. Specifically, Florado (registered trademark) FC430, Florado FC431 (manufactured by Sumitomo 3M Ltd.), Megafac (registered trademark) F142D, Florado (registered trademark) F171, Florado F172, Florado F173, Florado F177, Florado F183, Florado F554, Megafac (registered trademark) R30, RS-718-K (manufactured by DIC Corporation), EFTOP (registered trademark) EF301, EF303, EF351, EF352 (manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd.), Surflon (registered trademark) S381, Examples include S382, SC101, SC105 (manufactured by Asahi Glass Co., Ltd.), and E5844 (manufactured by Daikin Fine Chemical Research Institute).
前記のフッ素原子を有するシリコーン系界面活性剤としては、分子内にシロキサン結合及びフルオロカーボン鎖を有する界面活性剤等が挙げられる。具体的には、メガファック(登録商標)R08、同BL20、同F475、同F477及び同F443(DIC(株)製)等が挙げられる。 Examples of the silicone surfactant having a fluorine atom include surfactants having a siloxane bond and a fluorocarbon chain in the molecule. Specifically, Megafac (registered trademark) R08, Megafac (registered trademark) BL20, Megafac (registered trademark) F475, Megafac (registered trademark) F477, and Megafac (registered trademark) F443 (manufactured by DIC Corporation) may be mentioned.
レベリング剤を含有する場合、その含有率は、樹脂組成物の総量に対して、好ましくは0.001質量%以上0.2質量%以下であり、より好ましくは0.002質量%以上0.1質量%以下であり、さらに好ましくは0.005質量%以上0.07質量%以下である。 When containing a leveling agent, its content is preferably 0.001% by mass or more and 0.2% by mass or less, more preferably 0.002% by mass or more and 0.1% by mass, based on the total amount of the resin composition. It is not more than 0.005% by mass and not more than 0.07% by mass.
(6)酸化防止剤
酸化防止剤としては、フェノール系酸化防止剤、イオウ系酸化防止剤、リン系酸化防止剤、アミン系酸化防止剤が挙げられる。中でも、得られる膜の着色が少ないという点で、フェノール系酸化防止剤が好ましい。
(6) Antioxidant Examples of the antioxidant include phenolic antioxidants, sulfur-based antioxidants, phosphorus-based antioxidants, and amine-based antioxidants. Among these, phenolic antioxidants are preferred in that the resulting film is less colored.
フェノール系酸化防止剤としては、例えば、2-tert-ブチル-6-(3-tert-ブチル-2-ヒドロキシ-5-メチルベンジル)-4-メチルフェニルアクリレート、2-[1-(2-ヒドロキシ-3,5-ジ-tert-ペンチルフェニル)エチル]-4,6-ジ-tert-ペンチルフェニルアクリレート、3,9-ビス[2-{3-(3-tert-ブチル-4-ヒドロキシ-5-メチルフェニル)プロピオニルオキシ}-1,1-ジメチルエチル]-2,4,8,10-テトラオキサスピロ[5.5]ウンデカン、2,2’-メチレンビス(6-tert-ブチル-4-メチルフェノール)、4,4’-ブチリデンビス(6-tert-ブチル-3-メチルフェノール)、4,4’-チオビス(2-tert-ブチル-5-メチルフェノール)、2,2’-チオビス(6-tert-ブチル-4-メチルフェノール)、1,3,5-トリス(3,5-ジ-tert-ブチル-4-ヒドロキシベンジル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオン、3,3’,3”,5,5’,5”-ヘキサ-tert-ブチル-a,a’,a”-(メシチレン-2,4,6-トリイル)トリ-p-クレゾール、ペンタエリスリトールテトラキス[3-(3,5-ジ-tert-ブチル-4-ヒドロキシフェニル)プロピオネート]、2,6-ジ-tert-ブチル-4-メチルフェノール及び6-[3-(3-tert-ブチル-4-ヒドロキシ-5-メチルフェニル)プロポキシ]-2,4,8,10-テトラ-tert-ブチルジベンズ[d,f][1,3,2]ジオキサ
ホスフェピンが挙げられる。前記フェノール系酸化防止剤としては、市販品を使用してもよい。市販されているフェノール系酸化防止剤としては、例えば、スミライザー(登録商標)BHT、GM、GS、GP(以上、全て住友化学(株)製)、イルガノックス(登録商標)1010、1076、1330、3114(以上、全てBASF(株)製)が挙げられる。
Examples of phenolic antioxidants include 2-tert-butyl-6-(3-tert-butyl-2-hydroxy-5-methylbenzyl)-4-methylphenylacrylate, 2-[1-(2-hydroxy -3,5-di-tert-pentylphenyl)ethyl]-4,6-di-tert-pentylphenyl acrylate, 3,9-bis[2-{3-(3-tert-butyl-4-hydroxy-5 -methylphenyl)propionyloxy}-1,1-dimethylethyl]-2,4,8,10-tetraoxaspiro[5.5]undecane, 2,2'-methylenebis(6-tert-butyl-4-methyl phenol), 4,4'-butylidenebis(6-tert-butyl-3-methylphenol), 4,4'-thiobis(2-tert-butyl-5-methylphenol), 2,2'-thiobis(6- tert-butyl-4-methylphenol), 1,3,5-tris(3,5-di-tert-butyl-4-hydroxybenzyl)-1,3,5-triazine-2,4,6(1H, 3H,5H)-trione, 3,3',3",5,5',5"-hexa-tert-butyl-a,a',a"-(mesitylene-2,4,6-tolyl)tri- p-cresol, pentaerythritol tetrakis [3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], 2,6-di-tert-butyl-4-methylphenol and 6-[3-( Examples include 3-tert-butyl-4-hydroxy-5-methylphenyl)propoxy]-2,4,8,10-tetra-tert-butyldibenz[d,f][1,3,2]dioxaphosphepine. As the phenolic antioxidant, commercially available products may be used. Examples of commercially available phenolic antioxidants include Sumilizer (registered trademark) BHT, GM, GS, and GP (all of the above). (manufactured by Sumitomo Chemical Co., Ltd.), and Irganox (registered trademark) 1010, 1076, 1330, and 3114 (all manufactured by BASF Corporation).
イオウ系酸化防止剤としては、例えば、ジラウリル3,3’-チオジプロピオネート、ジミリスチル3,3’-チオジプロピオネート、ジステアリル3,3’-チオジプロピオネート、ペンタエリスリチルテトラキス(3-ラウリルチオプロピオネート)が挙げられる。前記イオウ系酸化防止剤としては、市販品を使用してもよい。市販されているイオウ系酸化防止剤としては、例えば、スミライザー(登録商標)TPL-R、TP-D(以上、全て住友化学(株)製)が挙げられる。 Examples of sulfur-based antioxidants include dilauryl 3,3'-thiodipropionate, dimyristyl 3,3'-thiodipropionate, distearyl 3,3'-thiodipropionate, pentaerythrityltetrakis (3 -laurylthiopropionate). As the sulfur-based antioxidant, commercially available products may be used. Examples of commercially available sulfur-based antioxidants include Sumilizer (registered trademark) TPL-R and TP-D (all manufactured by Sumitomo Chemical Co., Ltd.).
リン系酸化防止剤としては、例えば、トリオクチルホスファイト、トリラウリルホスファイト、トリデシルホスファイト、トリス(ノニルフェニル)ホスファイト、ジステアリルペンタエリスリトールジホスファイト、テトラ(トリデシル)-1,1,3-トリス(2-メチル-5-tert-ブチル-4-ヒドロキシフェニル)ブタンジホスファイトが挙げられる。前記リン系酸化防止剤としては、市販品を使用してもよい。市販されているリン系酸化防止剤としては、例えば、イルガフォス(登録商標)168、12、38(以上、全てBASF(株)製)、アデカスタブ329K、アデカスタブPEP36(以上、全て(株)ADEKA製)が挙げられる。 Examples of phosphorus antioxidants include trioctyl phosphite, trilauryl phosphite, tridecyl phosphite, tris(nonylphenyl) phosphite, distearyl pentaerythritol diphosphite, tetra(tridecyl)-1,1, 3-tris(2-methyl-5-tert-butyl-4-hydroxyphenyl)butane diphosphite is mentioned. As the phosphorus antioxidant, a commercially available product may be used. Examples of commercially available phosphorus antioxidants include Irgafos (registered trademark) 168, 12, and 38 (all manufactured by BASF Corporation), ADEKA STAB 329K, and ADEKA STAB PEP36 (all manufactured by ADEKA Corporation). can be mentioned.
アミン系酸化防止剤としては、例えば、N,N’-ジ-sec-ブチル-p-フェニレンジアミン、N,N’-ジ-イソプロピル-p-フェニレンジアミン、N,N’-ジシクロヘキシル-p-フェニレンジアミン、N,N’-ジフェニル-p-フェニレンジアミン、N,N’-ビス(2-ナフチル)-p-フェニレンジアミンが挙げられる。前記アミン系酸化防止剤としては、市販品を使用してもよい。市販されているアミン系酸化防止剤としては、例えば、スミライザー(登録商標)BPA、BPA-M1、4ML(以上、全て住友化学(株)製)が挙げられる。 Examples of amine antioxidants include N,N'-di-sec-butyl-p-phenylenediamine, N,N'-di-isopropyl-p-phenylenediamine, and N,N'-dicyclohexyl-p-phenylene. Examples include diamine, N,N'-diphenyl-p-phenylenediamine, and N,N'-bis(2-naphthyl)-p-phenylenediamine. As the amine antioxidant, a commercially available product may be used. Examples of commercially available amine antioxidants include Sumilizer (registered trademark) BPA, BPA-M1, and 4ML (all manufactured by Sumitomo Chemical Co., Ltd.).
組成物(I)が酸化防止剤を含む場合、その含有量は、樹脂と重合性化合物との合計含有量100質量部に対して、好ましくは0.1質量部以上5質量部以下、より好ましくは0.5質量部以上3質量部以下である。酸化防止剤の含有量が前記の範囲内にあると、得られる硬化物は耐熱性及び鉛筆硬度に優れる傾向がある。 When composition (I) contains an antioxidant, the content thereof is preferably 0.1 parts by mass or more and 5 parts by mass or less, more preferably 0.1 parts by mass or more and 5 parts by mass or less, based on 100 parts by mass of the total content of the resin and the polymerizable compound. is 0.5 parts by mass or more and 3 parts by mass or less. When the content of the antioxidant is within the above range, the resulting cured product tends to have excellent heat resistance and pencil hardness.
(7)硬化剤
<多価カルボン酸>
硬化剤として多価カルボン酸を用いることができる。多価カルボン酸は、多価カルボン酸無水物及び多価カルボン酸からなる群から選ばれる少なくとも1種の化合物である。多価カルボン酸とは、2つ以上のカルボキシ基を有する化合物であり、多価カルボン酸無水物とは、多価カルボン酸の無水物である。多価カルボン酸の分子量は、好ましくは3000以下、より好ましくは1000以下である。
(7) Curing agent <polyhydric carboxylic acid>
A polycarboxylic acid can be used as a curing agent. The polycarboxylic acid is at least one compound selected from the group consisting of polycarboxylic anhydrides and polycarboxylic acids. A polyvalent carboxylic acid is a compound having two or more carboxy groups, and a polyvalent carboxylic acid anhydride is an anhydride of a polyvalent carboxylic acid. The molecular weight of the polyvalent carboxylic acid is preferably 3,000 or less, more preferably 1,000 or less.
前記の多価カルボン酸無水物としては、例えば、無水マレイン酸、無水コハク酸、グルタル酸無水物、シトラコン酸無水物、イタコン酸無水物、2-ドデシルコハク酸無水物、2-(2-オクタ-3-エニル)コハク酸無水物、2-(2,4,6-トリメチルノナ-3-エニル)コハク酸無水物、トリカルバリル酸無水物、1,2,3,4-ブタンテトラカルボン酸二無水物等の鎖状多価カルボン酸無水物;3,4,5,6-テトラヒドロフタル酸無水物、1,2,3,6-テトラヒドロフタル酸無水物、ジメチルテトラヒドロフタ
ル酸無水物、ヘキサヒドロフタル酸無水物、4-メチルヘキサヒドロフタル酸無水物、ノルボルネンジカルボン酸無水物、メチルビシクロ[2.2.1]ヘプタン-2,3-ジカルボン酸無水物、ビシクロ[2.2.1]ヘプタン-2,3-ジカルボン酸無水物、ビシクロ[2.2.1]ヘプタ-5-エン-2,3-ジカルボン酸無水物、メチルビシクロ[2.2.1]ヘプタ-5-エン-2,3-ジカルボン酸無水物、シクロペンタンテトラカルボン酸二無水物等の脂環式多価カルボン酸無水物;無水フタル酸、3-ビニルフタル酸無水物、4-ビニルフタル酸無水物、ピロメリット酸無水物、トリメリット酸無水物、ベンゾフェノンテトラカルボン酸二無水物、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物、エチレングリコールビス(アンヒドロトリメリテート)、グリセリントリス(アンヒドロトリメリテート)、グリセリンビス(アンヒドロトリメリテート)モノアセテート、1,3,3a,4,5,9b-ヘキサヒドロ-5-(テトラヒドロ-2,5-ジオキソ-3-フラニル)ナフト[1,2-c]フラン-1,3-ジオン等の芳香族多価カルボン酸無水物;が挙げられる。アデカハードナ(登録商標)-EH-700(商品名(以下同様)、(株)ADEKA製)、リカシッド(登録商標)-HH、同-TH、同-MH、同MH-700(新日本理化(株)製)、エピキニア126、同YH-306、同DX-126(油化シェルエポキシ(株)製)等の市販品を用いてもよい。
Examples of the polyhydric carboxylic anhydride include maleic anhydride, succinic anhydride, glutaric anhydride, citraconic anhydride, itaconic anhydride, 2-dodecylsuccinic anhydride, 2-(2-octaconic anhydride) -3-enyl)succinic anhydride, 2-(2,4,6-trimethylnon-3-enyl)succinic anhydride, tricarballylic anhydride, 1,2,3,4-butanetetracarboxylic acid dianhydride Chain polyvalent carboxylic acid anhydrides such as anhydrides; 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, hexahydro Phthalic anhydride, 4-methylhexahydrophthalic anhydride, norbornenedicarboxylic anhydride, methylbicyclo[2.2.1]heptane-2,3-dicarboxylic anhydride, bicyclo[2.2.1]heptane -2,3-dicarboxylic anhydride, bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic anhydride, methylbicyclo[2.2.1]hept-5-ene-2, Alicyclic polycarboxylic anhydrides such as 3-dicarboxylic anhydride and cyclopentanetetracarboxylic dianhydride; phthalic anhydride, 3-vinyl phthalic anhydride, 4-vinyl phthalic anhydride, pyromellitic anhydride , trimellitic anhydride, benzophenonetetracarboxylic dianhydride, 3,3',4,4'-diphenylsulfonetetracarboxylic dianhydride, ethylene glycol bis(anhydrotrimellitate), glycerin tris(anhydrotris) trimellitate), glycerin bis(anhydrotrimellitate) monoacetate, 1,3,3a,4,5,9b-hexahydro-5-(tetrahydro-2,5-dioxo-3-furanyl)naphtho[1, 2-c] Aromatic polycarboxylic acid anhydrides such as furan-1,3-dione; ADEKA HARDONA (registered trademark) -EH-700 (product name (the same applies hereinafter), manufactured by ADEKA Co., Ltd.), RIKACID (registered trademark) -HH, RIKACID (registered trademark) -TH, ADEKA -MH, MH-700 (product name (the same applies hereafter), manufactured by ADEKA Co., Ltd.) Commercially available products such as Epikinia 126, Epikinia YH-306, and Epiquinia DX-126 (manufactured by Yuka Shell Epoxy Co., Ltd.) may also be used.
前記の多価カルボン酸としては、シュウ酸、マロン酸、アジピン酸、セバシン酸、フマル酸、酒石酸、クエン酸、鎖状多価カルボン酸無水物を導く多価カルボン酸等の鎖状多価カルボン酸;シクロヘキサンジカルボン酸、脂環式多価カルボン酸無水物を導く多価カルボン酸等の脂環式多価カルボン酸;イソフタル酸、テレフタル酸、1,4,5,8-ナフタレンテトラカルボン酸、芳香族多価カルボン酸無水物を導く多価カルボン酸等の芳香族多価カルボン酸;等が挙げられる。 Examples of the polyvalent carboxylic acids include chain polyvalent carboxylic acids such as oxalic acid, malonic acid, adipic acid, sebacic acid, fumaric acid, tartaric acid, citric acid, and polyvalent carboxylic acids that lead to chain polyvalent carboxylic acid anhydrides. Acids; cyclohexanedicarboxylic acid, alicyclic polycarboxylic acids such as polycarboxylic acids that lead to alicyclic polycarboxylic acid anhydrides; isophthalic acid, terephthalic acid, 1,4,5,8-naphthalenetetracarboxylic acid, Aromatic polyvalent carboxylic acids such as polyvalent carboxylic acids leading to aromatic polyvalent carboxylic acid anhydrides; and the like.
中でも、得られる膜の耐熱性に優れ、特に可視光領域での透明性が低下しにくい点から、鎖状カルボン酸無水物、脂環式多価カルボン酸無水物が好ましく、脂環式多価カルボン酸無水物がより好ましい。 Among these, chain carboxylic acid anhydrides and alicyclic polycarboxylic acid anhydrides are preferred, since the resulting film has excellent heat resistance and is less likely to reduce transparency, especially in the visible light region. Carboxylic acid anhydrides are more preferred.
組成物(I)が多価カルボン酸を含む場合、その含有量は、樹脂と重合性化合物との合計含有量100質量部に対して、好ましくは1~30質量部、より好ましくは2~20質量部、さらに好ましくは2~15質量部である。多価カルボン酸の含有量が前記の範囲内にあると、得られる膜の耐熱性及び密着性に優れる。 When the composition (I) contains a polyhydric carboxylic acid, the content thereof is preferably 1 to 30 parts by mass, more preferably 2 to 20 parts by mass, based on 100 parts by mass of the total content of the resin and the polymerizable compound. Parts by weight, more preferably 2 to 15 parts by weight. When the content of polycarboxylic acid is within the above range, the resulting film will have excellent heat resistance and adhesion.
<イミダゾール化合物>
硬化剤としてイミダゾール化合物を用いることができる。イミダゾール化合物は、イミダゾール骨格を有する化合物であれば特に限定されず、例えば、エポキシ硬化剤として知られている化合物が挙げられる。中でも、式(G2-1)で表される化合物が好ましい。
<Imidazole compound>
An imidazole compound can be used as a curing agent. The imidazole compound is not particularly limited as long as it has an imidazole skeleton, and examples thereof include compounds known as epoxy curing agents. Among these, the compound represented by formula (G2-1) is preferred.
[式(G2-1)中、R31は、炭素数1~20のアルキル基、フェニル基、ベンジル基又は炭素数2~5のシアノアルキル基を表す。
R32~R34は、互いに独立に、水素原子、ハロゲン原子、炭素数1~20のアルキル基、フェニル基、ニトロ基又は炭素数1~20のアシル基を表し、該アルキル基及び該フェニル基に含まれる水素原子は、ヒドロキシ基で置換されていてもよい。]
[In formula (G2-1), R 31 represents an alkyl group having 1 to 20 carbon atoms, a phenyl group, a benzyl group, or a cyanoalkyl group having 2 to 5 carbon atoms.
R 32 to R 34 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, a phenyl group, a nitro group, or an acyl group having 1 to 20 carbon atoms, and the alkyl group and the phenyl group The hydrogen atom contained in may be substituted with a hydroxy group. ]
炭素数1~20のアルキル基としては、例えば、メチル基、エチル基、プロピル基、イソブチル基、ブチル基、tert-ブチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ヘプタデシル基、ウンデシル基が挙げられる。
炭素数2~5のシアノアルキル基としては、例えば、シアノメチル基、シアノエチル基、シアノプロピル基、シアノブチル基、シアノペンチル基が挙げられる。
Examples of the alkyl group having 1 to 20 carbon atoms include methyl group, ethyl group, propyl group, isobutyl group, butyl group, tert-butyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, heptadecyl group. , undecyl group.
Examples of the cyanoalkyl group having 2 to 5 carbon atoms include a cyanomethyl group, a cyanoethyl group, a cyanopropyl group, a cyanobutyl group, and a cyanopentyl group.
ハロゲン原子としては、例えば、フッ素原子、塩素原子、臭素原子が挙げられる。
炭素数1~20のアシル基としては、例えば、ホルミル基、アセチル基、プロピオニル基、イソブチリル基、バレリル基、イソバレリル基、ピバロイル基、ラウロイル基、ミリストイル基、ステアロイル基が挙げられる。
Examples of the halogen atom include a fluorine atom, a chlorine atom, and a bromine atom.
Examples of the acyl group having 1 to 20 carbon atoms include formyl group, acetyl group, propionyl group, isobutyryl group, valeryl group, isovaleryl group, pivaloyl group, lauroyl group, myristoyl group, and stearoyl group.
イミダゾール化合物としては、例えば、1-メチルイミダゾール、2-メチルイミダゾール、2-ヒドロキシメチルイミダゾール、2-メチル-4-ヒドロキシメチルイミダゾール、5-ヒドロキシメチル-4-メチルイミダゾール、2-エチルイミダゾール、2-ウンデシルイミダゾール、2-ヘプタデシルイミダゾール、1,2-ジメチルイミダゾール、2-エチル-4-メチルイミダゾール、4-ヒドロキシメチル-2-フェニルイミダゾール、2-フェニルイミダゾール、2-フェニル-2-ヒドロキシメチルイミダゾール、1-ベンジル-4-メチルイミダゾール、1-ベンジル-4-フェニルイミダゾール、1-ベンジル-5-ヒドロキシメチルイミダゾール、2-(p-ヒドロキシフェニル)イミダゾール、1-シアノメチル-2-メチルイミダゾール、1-(2-シアノエチル)-2-ヒドロキシメチルイミダゾール、2,4-ジフェニルイミダゾール、1-シアノメチル-2-ウンデシルイミダゾール、1-シアノメチル-2-エチル-4-メチルイミダゾール、1-シアノメチル-2-フェニルイミダゾール、1-(2-シアノエチル)-2-エチル-4-メチルイミダゾールが挙げられる。中でも1-ベンジル-4-フェニルイミダゾール、2-エチル-4-メチルイミダゾール、1-(2-シアノエチル)-2-エチル-4-メチルイミダゾールが好ましい。 Examples of imidazole compounds include 1-methylimidazole, 2-methylimidazole, 2-hydroxymethylimidazole, 2-methyl-4-hydroxymethylimidazole, 5-hydroxymethyl-4-methylimidazole, 2-ethylimidazole, 2-methylimidazole, and 2-methylimidazole. Undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 4-hydroxymethyl-2-phenylimidazole, 2-phenylimidazole, 2-phenyl-2-hydroxymethylimidazole , 1-benzyl-4-methylimidazole, 1-benzyl-4-phenylimidazole, 1-benzyl-5-hydroxymethylimidazole, 2-(p-hydroxyphenyl)imidazole, 1-cyanomethyl-2-methylimidazole, 1- (2-cyanoethyl)-2-hydroxymethylimidazole, 2,4-diphenylimidazole, 1-cyanomethyl-2-undecylimidazole, 1-cyanomethyl-2-ethyl-4-methylimidazole, 1-cyanomethyl-2-phenylimidazole , 1-(2-cyanoethyl)-2-ethyl-4-methylimidazole. Among them, 1-benzyl-4-phenylimidazole, 2-ethyl-4-methylimidazole, and 1-(2-cyanoethyl)-2-ethyl-4-methylimidazole are preferred.
組成物(I)がイミダゾール化合物を含む場合、その含有量は、樹脂と重合性化合物との合計含有量100質量部に対して、好ましくは0.1質量部以上25質量部以下、より好ましくは0.2質量部以上15質量部以下、さらに好ましくは0.5質量部以上5質量部以下である。イミダゾール化合物の含有量が前記の範囲にあると、得られる硬化物は可視光領域における透明性に優れる傾向がある。 When composition (I) contains an imidazole compound, its content is preferably 0.1 parts by mass or more and 25 parts by mass or less, more preferably The content is 0.2 parts by mass or more and 15 parts by mass or less, more preferably 0.5 parts by mass or more and 5 parts by mass or less. When the content of the imidazole compound is within the above range, the resulting cured product tends to have excellent transparency in the visible light region.
(8)溶剤
組成物(I)は、溶剤を含有する。溶剤としては、特に限定されず、当該分野で通常使用される溶剤を挙げることができる。例えば、エステル溶剤(分子内に-COO-を含み、-O-を含まない溶剤)、エーテル溶剤(分子内に-O-を含み、-COO-を含まない溶剤)、エーテルエステル溶剤(分子内に-COO-と-O-とを含む溶剤)、ケトン溶剤(分子内に-CO-を含み、-COO-を含まない溶剤)、アルコール溶剤(分子内にOHを含み、-O-、-CO-及び-COO-を含まない溶剤)、芳香族炭化水素溶剤、アミド溶剤、ジメチルスルホキシド等が挙げられる。
(8) Solvent Composition (I) contains a solvent. The solvent is not particularly limited, and includes solvents commonly used in the field. For example, ester solvents (solvents that contain -COO- but no -O- in the molecule), ether solvents (solvents that contain -O- but no -COO- in the molecule), and ether ester solvents (solvents that contain -O- but no -COO- in the molecule). solvents containing -COO- and -O-), ketone solvents (solvents containing -CO- in the molecule but not -COO-), alcohol solvents (solvents containing OH in the molecule, -O-, - (CO- and -COO--free solvents), aromatic hydrocarbon solvents, amide solvents, dimethyl sulfoxide, and the like.
エステル溶剤としては、乳酸メチル、乳酸エチル、乳酸ブチル、2-ヒドロキシイソブタン酸メチル、酢酸エチル、酢酸n-ブチル、酢酸イソブチル、ギ酸ペンチル、酢酸イソペンチル、プロピオン酸ブチル、酪酸イソプロピル、酪酸エチル、酪酸ブチル、ピルビン酸メチル、ピルビン酸エチル、ピルビン酸プロピル、アセト酢酸メチル、アセト酢酸エチル、シクロヘキサノールアセテート及びγ-ブチロラクトンなどが挙げられる。 Ester solvents include methyl lactate, ethyl lactate, butyl lactate, methyl 2-hydroxyisobutanoate, ethyl acetate, n-butyl acetate, isobutyl acetate, pentyl formate, isopentyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate. , methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, cyclohexanol acetate, and γ-butyrolactone.
エーテル溶剤としては、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノブチルエーテル、3-メトキシ-1-ブタノール、3-メトキシ-3-メチルブタノール、テトラヒドロフラン、テトラヒドロピラン、1,4-ジオキサン、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールメチルエチルエーテル、ジエチレングリコールジプロピルエーテル、ジエチレングリコールジブチルエーテル、アニソール、フェネトール及びメチルアニソールなどが挙げられる。 Ether solvents include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether. , propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butanol, 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydropyran, 1,4-dioxane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl Examples include ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, anisole, phenetol, and methylanisole.
エーテルエステル溶剤としては、メトキシ酢酸メチル、メトキシ酢酸エチル、メトキシ酢酸ブチル、エトキシ酢酸メチル、エトキシ酢酸エチル、3-メトキシプロピオン酸メチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、2-メトキシプロピオン酸メチル、2-メトキシプロピオン酸エチル、2-メトキシプロピオン酸プロピル、2-エトキシプロピオン酸メチル、2-エトキシプロピオン酸エチル、2-メトキシ-2-メチルプロピオン酸メチル、2-エトキシ-2-メチルプロピオン酸エチル、3-メトキシブチルアセテート、3-メチル-3-メトキシブチルアセテート、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、プロピレングリコールモノプロピルエーテルアセテート、エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート及びジエチレングリコールモノブチルエーテルアセテートなどが挙げられる。 Ether ester solvents include methyl methoxy acetate, ethyl methoxy acetate, butyl methoxy acetate, methyl ethoxy acetate, ethyl ethoxy acetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxy Ethyl propionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxy-2-methylpropionate, Ethyl 2-ethoxy-2-methylpropionate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, ethylene glycol monomethyl Examples include ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, and diethylene glycol monobutyl ether acetate.
ケトン溶剤としては、4-ヒドロキシ-4-メチル-2-ペンタノン、アセトン、2-ブタノン、2-ヘプタノン、3-ヘプタノン、4-ヘプタノン、4-メチル-2-ペンタノン、シクロペンタノン、シクロヘキサノン及びイソホロンなどが挙げられる。 Ketone solvents include 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, 4-methyl-2-pentanone, cyclopentanone, cyclohexanone and isophorone. Examples include.
アルコール溶剤としては、メタノール、エタノール、プロパノール、ブタノール、ヘキサノール、シクロヘキサノール、エチレングリコール、プロピレングリコール及びグリセリンなどが挙げられる。 Examples of alcohol solvents include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, and glycerin.
芳香族炭化水素溶剤としては、ベンゼン、トルエン、キシレン及びメシチレンなどが挙げられる。アミド溶剤としては、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド及びN-メチルピロリドンなどが挙げられる。 Examples of aromatic hydrocarbon solvents include benzene, toluene, xylene, and mesitylene. Examples of the amide solvent include N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone.
上記の溶剤のうち、塗布性、乾燥性の点から、1atmにおける沸点が100℃以上200℃以下である有機溶剤が好ましい。溶剤としては、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノメチルエーテル、3-メトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、エチレングリコールエチルメチルエーテル、シクロヘキサノン、メトキシブタノール及びメトキシブチルアセテートが好ましく、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノメチルエーテル、エチレングリコールエチルメチルエーテル、メトキシブタノール及びメトキシブチルアセテートがより好ましい。 Among the above-mentioned solvents, organic solvents having a boiling point of 100° C. or more and 200° C. or less at 1 atm are preferred from the viewpoint of coating properties and drying properties. As the solvent, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, ethylene glycol ethyl methyl ether, cyclohexanone, methoxybutanol and methoxybutyl acetate are preferred, and propylene glycol monomethyl ether More preferred are acetate, propylene glycol monomethyl ether, ethylene glycol ethyl methyl ether, methoxybutanol and methoxybutyl acetate.
組成物(I)における溶剤の含有率は、組成物(I)の総量に対して、好ましくは60~95質量%、より好ましくは70~95質量%である。言い換えると、本発明の組成物(I)の固形分は、好ましくは5~40質量%、より好ましくは5~30質量%である。 The content of the solvent in composition (I) is preferably 60 to 95% by mass, more preferably 70 to 95% by mass, based on the total amount of composition (I). In other words, the solid content of the composition (I) of the present invention is preferably 5 to 40% by weight, more preferably 5 to 30% by weight.
(9)その他の成分
組成物(I)には、必要に応じて、充填剤、その他の高分子化合物、紫外線吸収剤、連鎖移動剤、密着促進剤等、当該技術分野において公知の添加剤を含有していてもよい。
(9) Other components Composition (I) may contain additives known in the technical field, such as fillers, other polymer compounds, ultraviolet absorbers, chain transfer agents, adhesion promoters, etc., as necessary. May contain.
(10)組成物(I)の製造方法
組成物(I)は、化合物(I)及び樹脂(I)、並びに、必要に応じて用いられる、溶剤、重合性化合物、重合開始剤、重合開始助剤、レベリング剤、酸化防止剤、硬化剤及びその他の成分を、公知の方法で混合することにより製造することができる。混合後は、孔径0.05~1.0μm程度のフィルタでろ過することが好ましい。
(10) Method for producing composition (I) Composition (I) consists of compound (I), resin (I), and a solvent, a polymerizable compound, a polymerization initiator, and a polymerization initiation promoter, which are used as necessary. It can be manufactured by mixing the agent, leveling agent, antioxidant, curing agent, and other components by a known method. After mixing, it is preferable to filter through a filter with a pore size of about 0.05 to 1.0 μm.
<硬化物及び成形物>
本発明は、組成物(I)の硬化物、及び該硬化物を含む成形物を提供する。組成物(I)は硬化性に優れているため、硬化物又はそれを含む成形物を作製するための硬化性材料として好適である。該硬化物は、活性エネルギー線照射及び熱の少なくともいずれかにより組成物(I)を硬化させることにより得ることができる。該硬化物を含む成形物の形状は特に制限されず、フィルム(膜)状、板状、レンズ形状、粉状、粒状、非球粒子状、破砕粒子状、多孔質状、塊状連続体、繊維状、管状、中空糸状等を含む、成形物の用途等に応じた任意の形状であってよい。
<Cured products and molded products>
The present invention provides a cured product of composition (I) and a molded article containing the cured product. Since the composition (I) has excellent curability, it is suitable as a curable material for producing a cured product or a molded product containing the same. The cured product can be obtained by curing composition (I) using at least one of active energy ray irradiation and heat. The shape of the molded product containing the cured product is not particularly limited, and may include film (membrane), plate, lens, powder, granules, non-spherical particles, crushed particles, porous, continuous lumps, and fibers. The shape may be any shape depending on the purpose of the molded product, including shape, tubular shape, hollow fiber shape, etc.
組成物(I)から成形物を得る方法としては、特に限定されず、基板上に膜を形成してその後エッチング等により成形を行う方法、射出成型方法、注型重合成型方法等が挙げられる。 The method for obtaining a molded article from composition (I) is not particularly limited, and examples thereof include a method in which a film is formed on a substrate and then molded by etching or the like, an injection molding method, a cast polymerization molding method, and the like.
注型重合成型方法では、例えば、成型モールド内に組成物(I)を注入し、必要に応じて脱泡等を行い、次にオーブンでの加熱等により硬化させ、得られた成形物を取り出す。取り出した成形物に、さらに活性エネルギー線照射を行い、追加で硬化を行うこともできる。 In the cast polymerization method, for example, the composition (I) is injected into a mold, defoamed etc. as necessary, and then cured by heating in an oven, etc., and the obtained molded product is taken out. . The removed molded product may be further irradiated with active energy rays to additionally cure the molded product.
基板上に成形物としての膜を形成する場合、組成物(I)を基板に塗布し、必要に応じて乾燥を行って塗布層を形成し、塗布層を硬化させることにより硬化膜である成形物を得ることができる。成形物はパターニングされた硬化膜であってもよい。フォトリソグラフ法、インクジェット法、印刷法等の方法によってパターニングすることによりパターニングされた硬化膜を得ることができる。パターニング方法は、フォトリソグラフィ法であることが好ましい。フォトリソグラフィ法は、組成物(I)を基板に塗布し、必要に応じて乾燥を行って塗布層を形成し、フォトマスクを介して塗布層を露光し、ついで現像する方法である。 When forming a film as a molded article on a substrate, the composition (I) is applied to the substrate, dried as necessary to form a coating layer, and the coating layer is cured to form a cured film. can get things. The molded article may be a patterned cured film. A patterned cured film can be obtained by patterning by a method such as a photolithography method, an inkjet method, or a printing method. The patterning method is preferably a photolithography method. The photolithography method is a method in which composition (I) is applied to a substrate, dried if necessary to form a coating layer, exposed to light through a photomask, and then developed.
基板としては、石英ガラス、ホウケイ酸ガラス、アルミナケイ酸塩ガラス、表面をシリカコートしたソーダライムガラス等のガラス板や、ポリカーボネート、ポリメタクリル酸メチル、ポリエチレンテレフタレート等の樹脂板、シリコン、上記基板上にアルミニウム、銀、銀/銅/パラジウム合金薄膜等を形成したもの等を用いることができる。組成物(I)の基板への塗布方法としては、スピンコート法、スリットコート法、スリットアンドスピンコート法等が挙げられる。 Substrates include glass plates such as quartz glass, borosilicate glass, alumina silicate glass, and soda lime glass whose surface is coated with silica, resin plates such as polycarbonate, polymethyl methacrylate, and polyethylene terephthalate, silicon, and the above substrates. A material in which a thin film of aluminum, silver, silver/copper/palladium alloy, etc. is formed can be used. Examples of the method for applying the composition (I) to the substrate include a spin coating method, a slit coating method, and a slit and spin coating method.
露光に用いられる光源としては、250nm以上450nm以下の波長の光を発生する光源が好ましい。例えば、該波長の光から、光重合開始剤の吸収波長に応じて、436nm付近、408nm付近、又は365nm付近の光をバンドパスフィルタにより選択的に取り出してもよい。光源として具体的には、水銀灯、発光ダイオード、メタルハライドランプ、ハロゲンランプ等が挙げられる。パターン露光後かつ現像前に加熱(現像前ベーク)を行ってもよい。 The light source used for exposure is preferably a light source that generates light with a wavelength of 250 nm or more and 450 nm or less. For example, from the light of this wavelength, depending on the absorption wavelength of the photopolymerization initiator, light around 436 nm, around 408 nm, or around 365 nm may be selectively extracted using a bandpass filter. Specific examples of the light source include a mercury lamp, a light emitting diode, a metal halide lamp, and a halogen lamp. Heating (pre-development bake) may be performed after pattern exposure and before development.
現像に用いる現像液としては、例えば、水酸化カリウム、炭酸水素ナトリウム、炭酸ナトリウム、水酸化テトラメチルアンモニウム等のアルカリ性化合物の水溶液や有機溶剤が挙げられる。有機溶剤としては、ケトン類、芳香族炭化水素類、ハロゲン化芳香族炭化水素類、脂肪族炭化水素類、ハロゲン化脂肪族炭化水素類、エーテル類、アルコール類、グライム類、エステル類、脂肪族ニトリル類、スルホキシド類、アミド類等の有機溶剤が挙げられる。2種以上の溶剤を併用してもよい。現像液は、界面活性剤を含んでいてもよい。現像方法は、パドル法、ディッピング法及びスプレー法等のいずれでもよい。現像により得られたパターン状の膜に対してさらに加熱(ポストベーク)を行ってもよい。 Examples of the developer used for development include aqueous solutions of alkaline compounds such as potassium hydroxide, sodium bicarbonate, sodium carbonate, and tetramethylammonium hydroxide, and organic solvents. Examples of organic solvents include ketones, aromatic hydrocarbons, halogenated aromatic hydrocarbons, aliphatic hydrocarbons, halogenated aliphatic hydrocarbons, ethers, alcohols, glymes, esters, aliphatic Examples include organic solvents such as nitriles, sulfoxides, and amides. Two or more types of solvents may be used in combination. The developer may contain a surfactant. The developing method may be any of the paddle method, dipping method, spray method, etc. The patterned film obtained by development may be further heated (post-baked).
硬化物又はそれを含む成形物は、組成物(I)から形成されるものであるため、高屈折率を示すことができ、また、それらの屈折率は、組成物(I)の組成等を調整することにより所望の屈折率に制御することができる。硬化物又はそれを含む成形物は、波長550nmにおける屈折率が、1.70以上、1.72以上、さらには1.75以上であり得る。波長550nmにおける屈折率は、例えば1.80以下であり、1.78以下であってもよい。 Since the cured product or the molded product containing the same is formed from the composition (I), it can exhibit a high refractive index, and the refractive index depends on the composition of the composition (I), etc. By adjusting the refractive index, it is possible to control the refractive index to a desired value. The cured product or the molded product containing the same may have a refractive index of 1.70 or more, 1.72 or more, or even 1.75 or more at a wavelength of 550 nm. The refractive index at a wavelength of 550 nm is, for example, 1.80 or less, and may be 1.78 or less.
[用途]
本発明によると高屈折率を有する硬化物若しくは成形物、又は所望の屈折率を有する硬化物又は成形物を得ることができる。該硬化物又は成形物の用途としては、例えば、ガラス代替品とその表面コーティング材;住居、施設、輸送機器等の窓ガラス、採光ガラス及び光源保護ガラス用のコーティング材;住居、施設、輸送機器等のウインドウフィルム;住居、施設、輸送機器等の内外装材及び内外装用塗料及び該塗料によって形成させる塗膜;アルキド樹脂ラッカー塗料及び該塗料によって形成される塗膜;アクリルラッカー塗料及び該塗料によって形成される塗膜;蛍光灯、水銀灯等の紫外線を発する光源用部材;精密機械、電子電気機器用部材、各種ディスプレイから発生する電磁波等の遮断用材;食品、化学品、薬品等の容器又は包装材;ボトル、ボックス、ブリスター、カップ、特殊包装用、コンパクトディスクコート、農工業用シート又はフィルム材;印刷物、染色物、染顔料等の退色防止剤;ポリマー支持体用(例えば、機械及び自動車部品のようなプラスチック製部品用)の保護膜;印刷物オーバーコート;インクジェット媒体被膜;積層艶消し;オプティカルライトフィルム;安全ガラス/フロントガラス中間層;エレクトロクロミック/フォトクロミック用途;オーバーラミネートフィルム;太陽熱制御膜;日焼け止めクリーム、シャンプー、リンス、整髪料等の化粧品;スポーツウェア、ストッキング、帽子等の衣料用繊維製品及び繊維;カーテン、絨毯、壁紙等の家庭用内装品;プラスチックレンズ、コンタクトレンズ、義眼等の医療用器具;光学フィルタ、バックライトディスプレーフィルム、プリズム、レンズ(例えば、眼鏡レンズ、カメラレンズ、及び後述するマイクロレンズ、ピックアップレンズ等)、鏡、写真材料等の光学用品;金型膜、転写式ステッカー、落書き防止膜、テープ、インク等の文房具;標示板、標示器等とその表面コーティング材;光学装置等に用いられる基板;光導波路;ホログラム;LED封止材;等を挙げることができる。
[Application]
According to the present invention, a cured product or molded product having a high refractive index, or a cured product or molded product having a desired refractive index can be obtained. Applications of the cured product or molded product include, for example, glass substitutes and their surface coating materials; coating materials for window glass, lighting glass, and light source protection glass for residences, facilities, transportation equipment, etc.; residences, facilities, transportation equipment, etc. Window films such as; interior and exterior materials and interior and exterior paints for houses, facilities, transportation equipment, etc., and coatings formed by such coatings; alkyd resin lacquer paints and coatings formed by such coatings; acrylic lacquer paints and coatings formed by such coatings. Coating film formed; Materials for light sources that emit ultraviolet rays such as fluorescent lamps and mercury lamps; Materials for blocking electromagnetic waves, etc. generated from precision machinery, electronic and electrical equipment materials, and various displays; Containers or packaging for foods, chemicals, drugs, etc. Materials; Bottles, boxes, blisters, cups, special packaging, compact disk coatings, agricultural and industrial sheet or film materials; Anti-fading agents for printed matter, dyed products, dyes and pigments; For polymer supports (e.g. machinery and automobile parts) Print overcoats; Inkjet media coatings; Laminated matte; Optical light films; Safety glass/windshield interlayers; Electrochromic/photochromic applications; Overlaminate films; Solar thermal control coatings; Cosmetics such as sunscreen creams, shampoos, conditioners, and hair conditioners; Textile products and fibers for clothing such as sportswear, stockings, and hats; Home interior products such as curtains, carpets, and wallpaper; Plastic lenses, contact lenses, and artificial eyes, etc. Medical instruments; Optical products such as optical filters, backlight display films, prisms, lenses (e.g., eyeglass lenses, camera lenses, and microlenses and pickup lenses described below), mirrors, and photographic materials; mold films, transfer type Examples include stationery such as stickers, anti-graffiti films, tapes, and inks; sign boards, signage devices, etc. and their surface coating materials; substrates used in optical devices, etc.; optical waveguides; holograms; LED sealing materials; and the like.
成形物は、光学機器に用いられる光学用品であるレンズとして好適に用いられる。光学機器としては、固体撮像素子、表示装置等が挙げられる。固体撮像素子において各光電変換素子への集光効率を向上させる目的でレンズが用いられ、また表示装置において画素からの光の取り出し効率を向上させる目的でレンズが用いられている。レンズはマイクロレンズであってもよい。表示装置としては、液晶表示装置、有機EL表示装置等に好適に用いられる。 The molded product is suitably used as a lens, which is an optical article used in optical equipment. Examples of optical devices include solid-state image sensors, display devices, and the like. Lenses are used in solid-state image sensors to improve the efficiency of light collection to each photoelectric conversion element, and lenses are used in display devices to improve the efficiency of light extraction from pixels. The lens may be a microlens. As a display device, it is suitably used for a liquid crystal display device, an organic EL display device, etc.
以下、実施例及び比較例を示した本発明をさらに具体的に説明するが、本発明はこれらの例によって限定されるものではない。例中、含有量ないし使用量を表す%及び部は、特に断りのない限り質量基準である。 Hereinafter, the present invention will be explained in more detail with reference to Examples and Comparative Examples, but the present invention is not limited to these Examples. In the examples, % and parts indicating content or amount used are based on mass unless otherwise specified.
[化合物(I)の合成例]
<合成例1:式(Ib-1)で表される化合物の合成>
式(IVb-1)で表される化合物の合成
ジムロート冷却管及び温度計を設置した4つ口フラスコ内を窒素雰囲気とし、式(IIb-1)で表される化合物(1,6-ナフタレンジチオール)30部、アセトン165部、純水45部、及び式(III-1)で表される化合物(エピクロロヒドリン)139部を上記フラスコに加えて氷浴中で15分撹拌した。続いて、別のフラスコに水酸化ナトリウム15部、アセトン66部、及び純水203部を加えて完溶させたのちに、上記4つ口フラスコに1時間かけて滴下した。滴下したのちに30℃まで昇温し、30℃で2時間撹拌した。得られた混合物を精製し、式(IVb-1)で表される化合物46部を得た。
[Synthesis example of compound (I)]
<Synthesis Example 1: Synthesis of compound represented by formula (Ib-1)>
Synthesis of compound represented by formula (IVb-1)
A four-neck flask equipped with a Dimroth condenser and a thermometer was set in a nitrogen atmosphere, and 30 parts of the compound represented by formula (IIb-1) (1,6-naphthalenedithiol), 165 parts of acetone, 45 parts of pure water, 139 parts of the compound represented by formula (III-1) (epichlorohydrin) were added to the flask and stirred for 15 minutes in an ice bath. Subsequently, 15 parts of sodium hydroxide, 66 parts of acetone, and 203 parts of pure water were added to another flask to completely dissolve them, and then added dropwise to the four-necked flask over 1 hour. After the dropwise addition, the temperature was raised to 30°C and stirred at 30°C for 2 hours. The resulting mixture was purified to obtain 46 parts of a compound represented by formula (IVb-1).
LC-MS測定及び1H-NMR解析を行い、式(IVb-1)で表される化合物が生成したことを確認した。
1H-NMR(重クロロホルム)δ:8.37~8.39(1H)、7.85(1H)、7.39~7.70(4H)、3.08~3.29(5H)、2.94~2.98(1H)、2.57~2.81(3H)、2.39~2.41(1H)
LC-MS;[M+H]+=305.5
LC-MS measurement and 1 H-NMR analysis were performed, and it was confirmed that a compound represented by formula (IVb-1) was produced.
1 H-NMR (deuterated chloroform) δ: 8.37-8.39 (1H), 7.85 (1H), 7.39-7.70 (4H), 3.08-3.29 (5H), 2.94-2.98 (1H), 2.57-2.81 (3H), 2.39-2.41 (1H)
LC-MS; [M+H] + =305.5
(2)式(Ib-1)で表される化合物の合成
ジムロート冷却管及び温度計を設置した4つ口フラスコ内を窒素雰囲気とし、式(IVb-1)で表される化合物3部、メタノール30部、トルエン30部、無水酢酸0.05部、及びチオ尿素3.8部を上記フラスコに加えて室温下で24時間撹拌した。得られた混合物を精製し、式(Ib-1)で表される化合物2.5部を得た。
(2) Synthesis of compound represented by formula (Ib-1)
A four-necked flask equipped with a Dimroth condenser and a thermometer was set in a nitrogen atmosphere, and 3 parts of the compound represented by formula (IVb-1), 30 parts of methanol, 30 parts of toluene, 0.05 part of acetic anhydride, and thio 3.8 parts of urea was added to the above flask and stirred at room temperature for 24 hours. The resulting mixture was purified to obtain 2.5 parts of a compound represented by formula (Ib-1).
LC-MS測定及び1H-NMR解析を行い、式(Ib-1)で表される化合物が生成したことを確認した。
1H-NMR(重クロロホルム)δ:8.39~8.43(1H)、7.86(1H)、7.40~7.74(4H)、3.40~3.53(2H)、3.04~3.18(2H)、2.78~2.96(2H)、2.47~2.49(1H)、2.35~2.36(1H)、2.14~2.16(1H)、1.93~1.94(1H)
LC-MS;[M+H]+=337.5
LC-MS measurement and 1 H-NMR analysis were performed, and it was confirmed that a compound represented by formula (Ib-1) was produced.
1 H-NMR (deuterated chloroform) δ: 8.39 to 8.43 (1H), 7.86 (1H), 7.40 to 7.74 (4H), 3.40 to 3.53 (2H), 3.04-3.18 (2H), 2.78-2.96 (2H), 2.47-2.49 (1H), 2.35-2.36 (1H), 2.14-2. 16 (1H), 1.93-1.94 (1H)
LC-MS; [M+H] + =337.5
<合成例2:式(Id-1)で表される化合物の合成>
(1)式(IVd-1)で表される化合物の合成
ジムロート冷却管及び温度計を設置した4つ口フラスコ内を窒素雰囲気とし、式(IId-1)で表される化合物(2,7-ナフタレンジチオール)15部、アセトン83部、純水23部、及び式(III-1)で表される化合物(エピクロロヒドリン)69部を上記フラスコに加えて氷浴中で15分撹拌した。続いて、別のフラスコに水酸化ナトリウム7.5部、アセトン33部、及び純水101部を加えて完溶させたのちに、前記4つ口フラスコに1時間かけて滴下した。滴下したのちにオイルバスで65℃まで昇温し、65℃で1時間撹拌した。得られた混合物を精製し、式(IVd-1)で表される化合物24部を得た。
<Synthesis Example 2: Synthesis of compound represented by formula (Id-1)>
(1) Synthesis of compound represented by formula (IVd-1)
A four-necked flask equipped with a Dimroth condenser and a thermometer was set in a nitrogen atmosphere, and a compound represented by formula (IId-1) (2,7-naphthalenedithiol) 15 parts, acetone 83 parts, pure water 23 parts, 69 parts of the compound represented by formula (III-1) (epichlorohydrin) were added to the flask and stirred for 15 minutes in an ice bath. Subsequently, 7.5 parts of sodium hydroxide, 33 parts of acetone, and 101 parts of pure water were added to another flask to completely dissolve them, and then added dropwise to the four-necked flask over 1 hour. After the dropwise addition, the temperature was raised to 65°C in an oil bath, and the mixture was stirred at 65°C for 1 hour. The resulting mixture was purified to obtain 24 parts of a compound represented by formula (IVd-1).
LC-MS測定及び1H-NMR解析を行い、式(IVd-1)で表される化合物が生成したことを確認した。
1H-NMR(重クロロホルム)δ:7.70~7.76(4H)、7.43~7.45(2H)、3.21~3.27(4H)、3.05~3.11(2H)、2.78~2.80(2H)、2.57~2.58(2H)
LC-MS;[M+H]+=305.5
LC-MS measurement and 1 H-NMR analysis were performed, and it was confirmed that a compound represented by formula (IVd-1) was produced.
1 H-NMR (deuterated chloroform) δ: 7.70-7.76 (4H), 7.43-7.45 (2H), 3.21-3.27 (4H), 3.05-3.11 (2H), 2.78-2.80 (2H), 2.57-2.58 (2H)
LC-MS; [M+H] + =305.5
(2)式(Id-1)で表される化合物の合成
ジムロート冷却管及び温度計を設置した4つ口フラスコ内を窒素雰囲気とし、式(IVd-1)で表される化合物20部、メタノール320部、ジクロロメタン80部、及びチオ尿素25部を上記フラスコに加えて室温下で24時間撹拌した。得られた混合物を精製し、式(Id-1)で表される化合物18.1部を得た。
(2) Synthesis of compound represented by formula (Id-1)
A four-necked flask equipped with a Dimroth condenser and a thermometer was set in a nitrogen atmosphere, and 20 parts of the compound represented by formula (IVd-1), 320 parts of methanol, 80 parts of dichloromethane, and 25 parts of thiourea were added to the flask. In addition, the mixture was stirred at room temperature for 24 hours. The resulting mixture was purified to obtain 18.1 parts of a compound represented by formula (Id-1).
LC-MS測定及び1H-NMR解析を行い、式(Id-1)で表される化合物が生成したことを確認した。
1H-NMR(重クロロホルム)δ:7.73~7.79(4H)、7.46~7.48(2H)、3.52~3.57(2H)、3.14~3.18(2H)、2.90~2.96(2H)、2.49~2.51(2H)、2.15~2.17(2H)
LC-MS;[M+H]+=337.5
LC-MS measurement and 1 H-NMR analysis were performed, and it was confirmed that a compound represented by formula (Id-1) was produced.
1 H-NMR (deuterated chloroform) δ: 7.73-7.79 (4H), 7.46-7.48 (2H), 3.52-3.57 (2H), 3.14-3.18 (2H), 2.90-2.96 (2H), 2.49-2.51 (2H), 2.15-2.17 (2H)
LC-MS; [M+H] + =337.5
[樹脂(I)の合成例]
<合成例3:式(Aa-2)で表される樹脂の合成>
[式中、A及びnは前記と同じ意味を表す。]
[Synthesis example of resin (I)]
<Synthesis Example 3: Synthesis of resin represented by formula (Aa-2)>
[In the formula, A and n represent the same meanings as above. ]
ジムロート冷却管及び温度計を設置した4つ口フラスコ内を窒素雰囲気とし、式(Aa-1)で表される樹脂(日本化薬株式会社製のナフトール-クレゾールノボラック型エポキシ樹脂「NC-7000L」)20部、ジクロロメタン320部、メタノール80部、チオ尿素33部を上記フラスコに加えて室温下で72時間撹拌した。得られた混合物を精製し、式(Aa-2)で表される樹脂14部を得た。 A four-necked flask equipped with a Dimroth condenser and a thermometer was set in a nitrogen atmosphere, and a resin represented by formula (Aa-1) (naphthol-cresol novolac type epoxy resin "NC-7000L" manufactured by Nippon Kayaku Co., Ltd.) was added. ), 320 parts of dichloromethane, 80 parts of methanol, and 33 parts of thiourea were added to the flask and stirred at room temperature for 72 hours. The resulting mixture was purified to obtain 14 parts of a resin represented by formula (Aa-2).
1H-NMR解析を行い、式(Aa-2)で表される樹脂が生成したことを確認した。エポキシ由来の2.56~2.96ppmのピークが完全に消失し、新たに2.40~2.65ppmにチイラン由来のピークの生成を確認できた。 1 H-NMR analysis was performed and it was confirmed that a resin represented by formula (Aa-2) was produced. The peak at 2.56 to 2.96 ppm derived from epoxy completely disappeared, and the formation of a new peak at 2.40 to 2.65 ppm due to thiirane was confirmed.
上記1H-NMR解析から、Aの総数に対するS原子であるAの数の比(S原子含有比)を求めたところ、平均値で1.0であった。また、GPCにより式(Aa-2)で表される樹脂の重量平均分子量Mwは1500であり、Mnは600であった。
装置;K2479((株)島津製作所製)
カラム;SHIMADZU Shim-pack GPC-80M
カラム温度;40℃
溶媒;テトラヒドロフラン
流速;1.0mL/min
検出器;RI
校正用標準物質 ;TSK STANDARD POLYSTYRENE F-40、F-4、F-288、A-2500、A-500(東ソー(株)製)
From the above 1 H-NMR analysis, the ratio of the number of A as S atoms to the total number of A (S atom content ratio) was determined, and the average value was 1.0. Further, the weight average molecular weight Mw of the resin represented by formula (Aa-2) was 1500 and Mn was 600 by GPC.
Device: K2479 (manufactured by Shimadzu Corporation)
Column; SHIMADZU Shim-pack GPC-80M
Column temperature: 40℃
Solvent: Tetrahydrofuran Flow rate: 1.0 mL/min
Detector; RI
Calibration standard material: TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500 (manufactured by Tosoh Corporation)
式(Aa-1)及び式(Aa-2)で表される樹脂の波長550nmの屈折率を、下記の手順に従って算出した。
式(Aa-1)で表される樹脂又は式(Aa-2)で表される樹脂100質量部、溶剤としてのシクロペンタノン310質量部をフラスコに入れ、攪拌して液状の組成物を得た。組成物を目視したところ透明であり、配合成分が均一に溶解されていることが確認された。上記で調製した組成物を、無アルカリガラス(Eagle XG 厚み0.7mm、コーニング社製)上に約3cc滴下し、1000rpm、20秒の条件でスピンコーター(MS-B100、ミカサ製)を用いてスピンコートして、塗布層を形成した。塗布層が形成された無アルカリガラス板を60℃で5分間加熱し溶媒を乾燥させ、溶媒を含まない塗布膜が形成された無アルカリガラスを得た。触針式膜厚計(DekTak XT、Bruker製)で無アルカリガラス上の塗布膜の膜厚を測定したところ1.5μmであった。
塗布膜が形成された無アルカリガラスについて、波長300nmから800nmの反射スペクトルを積分球ユニット(ISV-922 、日本分光製)付き可視紫外分光光度計(V-650、日本分光製)で透過スペクトルと反射スペクトルを測定し、透過スペクトルと反射スペクトルとから反射スペクトルの干渉による増減を減算処理し平滑化して得られた真の反射スペクトルのうち、波長550nmの値と無アルカリガラス(EagleXG、コーニング製)の屈折率とから波長550nmにおける塗布膜の屈折率をフレネルの公式(ヘクト光学I原著5版、丸善出版、2018年、p.209―p.226)に基づいて算出した
式(Aa-1)及び式(Aa-2)で表される樹脂の波長550nmでの屈折率は、それぞれ1.63、1.66であった。
The refractive index at a wavelength of 550 nm of the resins represented by formulas (Aa-1) and (Aa-2) was calculated according to the following procedure.
100 parts by mass of the resin represented by formula (Aa-1) or the resin represented by formula (Aa-2) and 310 parts by mass of cyclopentanone as a solvent were placed in a flask and stirred to obtain a liquid composition. Ta. Visual inspection of the composition revealed that it was transparent and that the ingredients were uniformly dissolved. Approximately 3 cc of the composition prepared above was dropped onto non-alkali glass (Eagle A coating layer was formed by spin coating. The alkali-free glass plate on which the coating layer was formed was heated at 60° C. for 5 minutes to dry the solvent, thereby obtaining an alkali-free glass on which a coating film containing no solvent was formed. The thickness of the coating film on the alkali-free glass was measured using a stylus-type film thickness meter (DekTak XT, manufactured by Bruker) and found to be 1.5 μm.
For the alkali-free glass on which the coating film was formed, the reflection spectrum from wavelength 300 nm to 800 nm was measured using a visible and ultraviolet spectrophotometer (V-650, manufactured by JASCO Corporation) with an integrating sphere unit (ISV-922, manufactured by JASCO Corporation) and the transmission spectrum. Measure the reflection spectrum, subtract the increase/decrease due to interference in the reflection spectrum from the transmission spectrum and reflection spectrum, and smooth the true reflection spectrum. Among the true reflection spectra, calculate the value at a wavelength of 550 nm and alkali-free glass (EagleXG, manufactured by Corning). From the refractive index of The refractive index of the resin represented by formula (Aa-2) at a wavelength of 550 nm was 1.63 and 1.66, respectively.
[実施例1:組成物の調製]
合成例1で得られた式(Ib-1)で表される化合物を70質量部、式(Aa-2)で表される樹脂を30質量部、重合開始剤Aを5質量部、及び溶剤としてのシクロペンタノン310質量部をフラスコに入れ、攪拌して液状の組成物を得た。組成物を目視したところ透明であり、配合成分が均一に溶解されていることが確認された。
[Example 1: Preparation of composition]
70 parts by mass of the compound represented by formula (Ib-1) obtained in Synthesis Example 1, 30 parts by mass of the resin represented by formula (Aa-2), 5 parts by mass of polymerization initiator A, and a solvent. 310 parts by mass of cyclopentanone was placed in a flask and stirred to obtain a liquid composition. Visual inspection of the composition revealed that it was transparent and that the ingredients were uniformly dissolved.
[実施例2~6、比較例1~3]
組成物における配合成分の種類及びそれらの添加量を表1に示すとおりとしたこと以外は、実施例1と同様にして液状の組成物を得た。実施例2~6、及び比較例1~3の組成物は、目視したところ透明であり、配合成分が均一に溶解されていることが確認された。
[Examples 2 to 6, Comparative Examples 1 to 3]
A liquid composition was obtained in the same manner as in Example 1, except that the types of ingredients and the amounts added in the composition were as shown in Table 1. The compositions of Examples 2 to 6 and Comparative Examples 1 to 3 were transparent when visually observed, and it was confirmed that the ingredients were uniformly dissolved.
表1に示される配合成分の略称の詳細は次のとおりである。
〔1〕(1b-1):式(1b-1)で表される化合物
〔2〕(1d-1):式(1d-1)で表される化合物
〔3〕(IB):式(IB)で表される化合物
〔4〕(Y1):式(Y1)で表される化合物(1,6-ビス(グリシジルオキシ)ナフタレン、DIC株式会社製「EPICLON HP-4032D」)
〔5〕(Aa-1):式(Aa-1)で表される樹脂(日本化薬株式会社製のナフトール-クレゾールノボラック型エポキシ樹脂「NC-7000L」)
〔6〕(Aa-2):式(Aa-2)で表される樹脂
〔7〕重合開始剤A:スルホニウム塩タイプの光カチオン重合開始剤(サンアプロ株式会社製「VC-1S」)
〔8〕重合開始剤B:スルホニウム塩タイプの光カチオン重合開始剤(サンアプロ株式会社製「VC-1FG」)
〔9〕重合開始剤C:オニウム塩タイプの熱カチオン重合開始剤(サンアプロ株式会社製「TA-100」)
Details of the abbreviations of the ingredients shown in Table 1 are as follows.
[1] (1b-1): Compound represented by formula (1b-1) [2] (1d-1): Compound represented by formula (1d-1) [3] (IB): Formula (IB ) compound represented by
[4] (Y1): Compound represented by formula (Y1) (1,6-bis(glycidyloxy)naphthalene, "EPICLON HP-4032D" manufactured by DIC Corporation)
[5] (Aa-1): Resin represented by formula (Aa-1) (naphthol-cresol novolac type epoxy resin "NC-7000L" manufactured by Nippon Kayaku Co., Ltd.)
[6] (Aa-2): Resin represented by formula (Aa-2) [7] Polymerization initiator A: Sulfonium salt type photocationic polymerization initiator (“VC-1S” manufactured by San-Apro Co., Ltd.)
[8] Polymerization initiator B: Sulfonium salt type photocationic polymerization initiator (“VC-1FG” manufactured by San-Apro Co., Ltd.)
[9] Polymerization initiator C: Onium salt type thermal cationic polymerization initiator (“TA-100” manufactured by San-Apro Co., Ltd.)
[評価試験]
(1)硬化物の屈折率
上記で調製した組成物を、無アルカリガラス(Eagle XG 厚み0.7mm、コーニング社製)上に約3cc滴下し、1000rpm、20秒の条件でスピンコーター(MS-B100、ミカサ製)を用いてスピンコートして、塗布層を形成した。塗布層が形成された無アルカリガラス板を60℃で2分間加熱した。次に、塗布層が形成された無アルカリガラス板に高圧水銀灯プロキシミティUV露光装置(UV-3300SC、ウシオ製)を用いて大気雰囲気中、1000mJ/cm2の照射エネルギーで露光した。続いて、露光後の塗布層が形成された無アルカリガラス板を120℃で5分間加熱して、硬化膜が形成された無アルカリガラスを得た。触針式膜厚計(DekTak XT、Bruker製)で無アルカリガラス上の硬化膜の膜厚を測定したところ1.5μmであった。
[Evaluation test]
(1) Refractive index of cured product Approximately 3 cc of the composition prepared above was dropped onto non-alkali glass (Eagle B100 (manufactured by Mikasa) was spin coated to form a coating layer. The alkali-free glass plate on which the coating layer was formed was heated at 60° C. for 2 minutes. Next, the alkali-free glass plate on which the coating layer was formed was exposed to light at an irradiation energy of 1000 mJ/cm 2 in an atmospheric atmosphere using a high-pressure mercury lamp Proximity UV exposure device (UV-3300SC, manufactured by Ushio). Subsequently, the alkali-free glass plate on which the exposed coating layer was formed was heated at 120° C. for 5 minutes to obtain alkali-free glass on which a cured film was formed. The thickness of the cured film on the alkali-free glass was measured using a stylus-type film thickness meter (DekTak XT, manufactured by Bruker) and found to be 1.5 μm.
硬化膜が形成された無アルカリガラスについて、波長300nmから800nmの反射スペクトルを積分球ユニット(ISV-922、日本分光製)付き可視紫外分光光度計(V-650、日本分光製)で透過スペクトルと反射スペクトルを測定した。透過スペクトルと反射スペクトルから反射スペクトルの干渉による増減を減算処理し平滑化して得られた真の反射スペクトルのうち、波長550nmの値と無アルカリガラス(EagleXG、コーニング製)の屈折率とから波長550nmにおける硬化膜の屈折率をフレネルの公式(ヘクト光学I原著5版、丸善出版、2018年、p.209―p.226)に基づいて算出した。結果を表1に示す。 For the alkali-free glass on which the cured film was formed, the reflection spectrum in the wavelength range from 300 nm to 800 nm was measured using a visible and ultraviolet spectrophotometer (V-650, manufactured by JASCO Corporation) with an integrating sphere unit (ISV-922, manufactured by JASCO Corporation) and the transmission spectrum. Reflection spectra were measured. Among the true reflection spectra obtained by subtracting and smoothing the increase or decrease due to interference in the reflection spectra from the transmission spectrum and reflection spectrum, the wavelength of 550 nm is determined from the value at wavelength 550 nm and the refractive index of alkali-free glass (EagleXG, manufactured by Corning). The refractive index of the cured film was calculated based on Fresnel's formula (Hecto Optics I original 5th edition, Maruzen Publishing, 2018, p. 209-p. 226). The results are shown in Table 1.
(2)硬化性
上記で調製した組成物を、無アルカリガラス(Eagle XG 厚み0.7mm、コーニング社製)上に約3cc滴下し、1000rpm、20秒の条件でスピンコーター(MS-B100、ミカサ製)を用いてスピンコートして、塗布層を形成した。塗布層が形成された無アルカリガラス板を60℃で2分間加熱した。次に、塗布層が形成された無アルカリガラス板に高圧水銀灯プロキシミティUV露光装置(UV-3300SC、ウシオ製)を用いて大気雰囲気中、表1に示される照射エネルギーで露光した。続いて、露光後の塗布層が形成された無アルカリガラス板を表1に示されるポストベーク温度及び時間で加熱して、硬化膜が形成された無アルカリガラスを得た。触針式膜厚計(DekTak XT、Bruker製)で無アルカリガラス上の硬化膜の膜厚を測定したところ1.5μmであった。
(2) Curability Approximately 3 cc of the composition prepared above was dropped onto non-alkali glass (Eagle A coated layer was formed by spin coating using a commercially available commercially available product (manufactured by Co., Ltd.). The alkali-free glass plate on which the coating layer was formed was heated at 60° C. for 2 minutes. Next, the alkali-free glass plate on which the coating layer was formed was exposed to light using a high-pressure mercury lamp Proximity UV exposure device (UV-3300SC, manufactured by Ushio) in an atmospheric atmosphere at the irradiation energy shown in Table 1. Subsequently, the alkali-free glass plate on which the exposed coating layer was formed was heated at the post-baking temperature and time shown in Table 1 to obtain alkali-free glass on which a cured film was formed. The thickness of the cured film on the alkali-free glass was measured using a stylus-type film thickness meter (DekTak XT, manufactured by Bruker) and found to be 1.5 μm.
得られた硬化膜について以下の評価基準に従って硬化性を評価した。結果を表1に示す。硬化性は、23℃のアセトンに硬化膜が形成された無アルカリガラスを10分間浸漬し、浸漬前後の膜厚保持率(膜厚保持率=浸漬後膜厚÷浸漬前膜厚)を用いて評価した。
A:膜厚保持率が100%以下90%以上
B:膜厚保持率が90%未満80%以上
C:膜厚保持率が80%未満
The curability of the obtained cured film was evaluated according to the following evaluation criteria. The results are shown in Table 1. Curability was determined by immersing alkali-free glass with a cured film in acetone at 23°C for 10 minutes, and using the film thickness retention rate before and after immersion (thickness retention rate = film thickness after immersion ÷ film thickness before immersion). evaluated.
A: Film thickness retention rate is 100% or less and 90% or more B: Film thickness retention rate is less than 90% and 80% or more C: Film thickness retention rate is less than 80%
Claims (8)
[式(I)中、
nは0~6のいずれかの整数を表し、
Lは単結合又は2価の基を表し、複数あるLは同一であっても異なっていてもよく、
R11は1価の置換基を表し、R11が複数ある場合、複数のR11は同一であっても異なっていてもよく、
R12は、水素原子、式(1a)、及び式(1b)からなる群から選択され、複数あるR12は同一であっても異なっていてもよい。
式(1a)中、
AはO原子またはS原子を表し、式(I)においてAが複数ある場合、複数のAは同一であっても異なっていてもよく、
maは0又は1を表し、式(I)においてmaが複数ある場合、複数のmaは同一であっても異なっていてもよく、
R2は、水素原子又は1価の置換基を表し、R2が複数ある場合、複数のR2は同一であっても異なっていてもよく、
*はLとの結合手を表す。
式(1b)中、
R13は1価の置換基を表し、R13が複数ある場合、複数のR13は同一であっても異なっていてもよく、
*はLとの結合手を表す。] A composition comprising a compound represented by formula (I) and a resin having a refractive index of 1.60 or more at a wavelength of 550 nm.
[In formula (I),
n represents any integer from 0 to 6,
L represents a single bond or a divalent group, and multiple Ls may be the same or different,
R 11 represents a monovalent substituent, and when there are multiple R 11s , the multiple R 11s may be the same or different,
R 12 is selected from the group consisting of a hydrogen atom, formula (1a), and formula (1b), and a plurality of R 12s may be the same or different.
In formula (1a),
A represents an O atom or an S atom, and when there are multiple A's in formula (I), the multiple A's may be the same or different,
m a represents 0 or 1, and when there is a plurality of m a in formula (I), the plural m a may be the same or different,
R 2 represents a hydrogen atom or a monovalent substituent, and when there is a plurality of R 2 , the plurality of R 2 may be the same or different,
* represents a bond with L.
In formula (1b),
R 13 represents a monovalent substituent, and when there are multiple R 13s , the multiple R 13s may be the same or different,
* represents a bond with L. ]
[式(A)中、
Rは1価の炭化水素基を表し、Rが複数ある場合、複数のRは同一であっても異なっていてもよく、
nは平均値で1以上の数を表し、
AはO原子又はS原子を表し、複数あるAは同一であっても異なっていてもよい。] The composition according to claim 1, wherein the resin is a resin represented by formula (A).
[In formula (A),
R represents a monovalent hydrocarbon group, and when there are multiple R's, the multiple R's may be the same or different,
n represents an average value of 1 or more,
A represents an O atom or an S atom, and multiple A's may be the same or different. ]
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