JP2024026909A - Two-photon absorption material, recording medium, information recording method, and information reading method - Google Patents

Abstract

The present invention provides a two-photon absorption material for a short wavelength region. A two-photon absorption material includes a compound represented by the following formula (1). TIFF2024026909000014.tif75170 [Selection diagram] None

Description

The present disclosure relates to a two-photon absorption material, a recording medium, a method for recording information, and a method for reading information.

Among optical materials such as light-absorbing materials, materials that have a non-linear optical effect are called non-linear optical materials. A nonlinear optical effect means that when a substance is irradiated with intense light such as a laser beam, an optical phenomenon proportional to the square or higher order of the electric field of the irradiated light occurs in the substance. Optical phenomena include absorption, reflection, scattering, and light emission. Second-order nonlinear optical effects proportional to the square of the electric field of irradiated light include second harmonic generation (SHG), Pockels effect, parametric effect, and the like. Examples of third-order nonlinear optical effects proportional to the cube of the electric field of irradiated light include two-photon absorption, multiphoton absorption, third harmonic generation (THG), and the Kerr effect.

Much research has been actively conducted on nonlinear optical materials. In particular, inorganic materials whose single crystals can be easily prepared have been developed as nonlinear optical materials. In recent years, the development of nonlinear optical materials made of organic materials is expected. Examples of nonlinear optical materials made of organic materials include organic dyes. Organic materials not only have a high degree of design freedom compared to inorganic materials, but also have large nonlinear optical constants. Furthermore, organic materials exhibit fast nonlinear responses. In this specification, a nonlinear optical material containing an organic material may be referred to as an organic nonlinear optical material.

Patent No. 5821661

Harry L. Anderson et al, "Two-Photon Absorption and the Design of Two-Photon Dyes", Angew. Chem. Int. Ed. 2009, Vol. 48, p. 3244-3266.

There is a need for new two-photon absorption materials that have two-photon absorption characteristics for light having wavelengths in the short wavelength range.

前記式（１）において、Ｒ¹からＲ²⁷は、互いに独立して、Ｈ、Ｃ、Ｎ、Ｏ、Ｆ、Ｐ、Ｓ、Ｃｌ、Ｉ及びＢｒからなる群より選ばれる少なくとも１つの原子を含む。 The two-photon absorption material in one aspect of the present disclosure is
It includes a compound represented by the following formula (1).

In the formula (1), R ¹ to R ²⁷ independently contain at least one atom selected from the group consisting of H, C, N, O, F, P, S, Cl, I and Br. .

The present disclosure provides a new two-photon absorption material that has two-photon absorption characteristics for light having a wavelength in a short wavelength range.

FIG. 1A is a flowchart regarding a method for recording information using a recording medium including a two-photon absorption material according to an embodiment of the present disclosure. FIG. 1B is a flowchart regarding a method for reading information using a recording medium including a two-photon absorption material according to an embodiment of the present disclosure. FIG. 2 is a graph showing the ¹ H-NMR spectrum of the compound of Example 1. FIG. 3 is a graph showing the ¹ H-NMR spectrum of the compound of Example 2.

(Findings that formed the basis of this disclosure)
Among organic nonlinear optical materials, two-photon absorption materials are attracting particular attention. Two-photon absorption refers to a phenomenon in which a compound absorbs two photons almost simultaneously and transitions to an excited state. Non-resonant two-photon absorption and resonant two-photon absorption are known as two-photon absorption. Non-resonant two-photon absorption means two-photon absorption in a wavelength range where no one-photon absorption band exists. In non-resonant two-photon absorption, a compound absorbs two photons almost simultaneously and transitions to a higher excited state. In resonant two-photon absorption, a compound absorbs one photon and then a second photon, thereby transitioning to a higher excited state. In resonant two-photon absorption, a compound absorbs two photons sequentially.

In non-resonant two-photon absorption, the amount of light absorbed by a compound is usually proportional to the square of the irradiated light intensity. Therefore, for example, it is possible to cause two-photon absorption of light focused by a lens by a compound only near the focal point where the light intensity is high. That is, in a sample containing a two-photon absorption material, compounds can be excited only at desired positions. In this way, compounds that produce non-resonant two-photon absorption provide extremely high spatial resolution, and are therefore being considered for application in applications such as recording layers for three-dimensional optical memories and photocurable resin compositions for stereolithography. .

Research on two-photon absorption materials used in recording layers of three-dimensional optical memories, photocurable resin compositions for stereolithography, etc. is being actively conducted. In two-photon absorption materials, a two-photon absorption cross section (GM value) is used as an index indicating the efficiency of two-photon absorption. The unit of the two-photon absorption cross section is GM (10 ⁻⁵⁰ cm ⁴ ·s·molecule ⁻¹ ·photon ⁻¹ ). To date, many compounds having a large two-photon absorption cross section exceeding 500 GM have been reported (for example, Non-Patent Document 1). However, in most reports, the two-photon absorption cross section is measured using laser light with a wavelength longer than 600 nm. In particular, near-infrared rays having a wavelength longer than 750 nm may be used as laser light.

However, in order to apply two-photon absorption materials to industrial applications, materials that have a large two-photon absorption cross section when irradiated with laser light having a shorter wavelength are required. For example, in the field of optical memory, from the viewpoint of the diffraction limit of the focused laser light, laser light with a short wavelength is used in order to achieve a finer focused spot. In a three-dimensional optical memory with a multilayer structure, the recording density can be dramatically improved by using a two-photon absorption material with extremely high spatial resolution. In particular, in the application of three-dimensional optical memory, the Blu-ray (registered trademark) disc standard uses a laser beam having a center wavelength of 405 nm. Therefore, if a compound with a large two-photon absorption cross section for light in the same wavelength range as this laser light is developed, it can greatly contribute to the development of industry.

Patent Document 1 discloses a compound that exhibits nonlinear optical absorption for pulsed laser light having a wavelength of 400 nm or more and 410 nm or less and high intensity. In this compound, three aromatic hydrocarbons are bonded to the nitrogen atom. That is, this compound has a tri-branched structure centered on the nitrogen atom. However, this compound has not yet been put to practical use and is still in the realm of research. Furthermore, there is room for improvement in the two-photon absorption cross section of this compound. For example, when a compound having a small two-photon absorption cross section is used in a three-dimensional optical memory, it may be necessary to improve the light intensity of laser light. Therefore, from the viewpoint of further improving industrial applicability, there is a need for compounds that have a larger two-photon absorption cross section for light having a wavelength around 405 nm.

As a result of intensive studies, the present inventors have newly discovered that the compound represented by formula (1) described below has excellent two-photon absorption characteristics for light having a wavelength in the short wavelength range. . In this specification, the short wavelength range means a wavelength range including 405 nm, for example, a wavelength range of 390 nm or more and 420 nm or less. In particular, the compound represented by formula (1) has a large two-photon absorption cross section for light having a wavelength around 405 nm.

前記式（１）において、Ｒ¹からＲ²⁷は、互いに独立して、Ｈ、Ｃ、Ｎ、Ｏ、Ｆ、Ｐ、Ｓ、Ｃｌ、Ｉ及びＢｒからなる群より選ばれる少なくとも１つの原子を含む。 (Summary of one aspect of the present disclosure)
The two-photon absorption material according to the first aspect of the present disclosure is
It includes a compound represented by the following formula (1).

In the formula (1), R ¹ to R ²⁷ independently contain at least one atom selected from the group consisting of H, C, N, O, F, P, S, Cl, I and Br. .

According to the first aspect, the two-photon absorption material has excellent two-photon absorption characteristics for light having a wavelength in the short wavelength range.

In the second aspect of the present disclosure, for example, in the two-photon absorption material according to the first aspect, R ¹ to R ²⁷ are each independently a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, or Saturated hydrocarbon group, hydroxyl group, carboxyl group, alkoxycarbonyl group, acyl group, amide group, nitrile group, alkoxy group, acyloxy group, thiol group, alkylthio group, sulfonic acid group, acylthio group, alkylsulfonyl group, sulfonamido group , a primary amino group, a secondary amino group, a tertiary amino group, or a nitro group.

In the third aspect of the present disclosure, for example, in the two-photon absorption material according to the first or second aspect, from the R ¹³ to the R ¹⁵ , from the R ¹⁸ to the R ²⁰ , and from the R ²³ to the R ²⁵ At least one selected from the group consisting of: may be an electron donating group or an electron withdrawing group.

In the fourth aspect of the present disclosure, for example, in the two-photon absorption material according to the third aspect, the electron donating group may be an alkyl group or an alkoxy group.

In the fifth aspect of the present disclosure, for example, in the two-photon absorption material according to the third or fourth aspect, the electron donating group may be -C(CH ₃ ) ₃ or -OCH ₃ .

In the sixth aspect of the present disclosure, for example, in the two-photon absorption material according to the first or second aspect, when the compound is represented by the following formula (2), from the R ¹³ , the R ¹⁸ and the R ²³ At least one selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, an unsaturated hydrocarbon group, a hydroxyl group, a carboxyl group, an alkoxycarbonyl group, an acyl group, an amide group, a nitrile group, and an alkoxy group, an acyloxy group, a thiol group, an alkylthio group, a sulfonic acid group, an acylthio group, an alkylsulfonyl group, a sulfonamido group, a primary amino group, a secondary amino group, or a nitro group.

In the seventh aspect of the present disclosure, for example, in the two-photon absorption material according to the sixth aspect, the compound may be represented by the formula (2), and the group consisting of R ¹³ , R ¹⁸ and R ²³ At least one selected from is a halogen atom, an alkyl group, a halogenated alkyl group, an unsaturated hydrocarbon group, a hydroxyl group, a carboxyl group, an alkoxycarbonyl group, an acyl group, an amide group, a nitrile group, an alkoxy group, an acyloxy group, It may be a thiol group, an alkylthio group, a sulfonic acid group, an acylthio group, an alkylsulfonyl group, a sulfonamido group, a primary amino group, a secondary amino group or a nitro group.

In the eighth aspect of the present disclosure, for example, the two-photon absorption material according to any one of the first to seventh aspects may be used in a device that uses light having a wavelength of 390 nm or more and 420 nm or less.

According to the second to eighth aspects, the two-photon absorption material has excellent two-photon absorption characteristics for light having a wavelength in the short wavelength range. This two-photon absorption material is suitable for use in devices that utilize light having a wavelength of 390 nm or more and 420 nm or less.

The recording medium according to the ninth aspect of the present disclosure includes:
The two-photon absorption material according to any one of the first to eighth aspects is included.

According to the ninth aspect, the two-photon absorption material has excellent two-photon absorption characteristics for light having a wavelength in the short wavelength range. A recording medium containing such a two-photon absorption material can record information at a high recording density.

The information recording method according to the tenth aspect of the present disclosure includes:
Prepare a light source that emits light having a wavelength of 390 nm or more and 420 nm or less,
condensing the light from the light source and irradiating it onto a recording area in a recording medium including the two-photon absorbing material according to any one of the first to eighth aspects;
Including.

According to the tenth aspect, the two-photon absorption material has excellent two-photon absorption characteristics for light having a wavelength in the short wavelength range. According to an information recording method using a recording medium containing such a two-photon absorption material, information can be recorded at a high recording density.

The method for reading information according to the eleventh aspect of the present disclosure is, for example, a method for reading information recorded by the recording method according to the tenth aspect, comprising:
The reading method is
Measuring the optical characteristics of the recording area by irradiating the recording area in the recording medium with light,
determining whether information is recorded in the recording area based on the optical property;
Including.

In a twelfth aspect of the present disclosure, for example, in the information reading method according to the eleventh aspect, the optical property may be the intensity of light reflected at the recording area.

According to the eleventh or twelfth aspect, the recording area in which information is recorded can be easily determined.

Embodiments of the present disclosure will be described below with reference to the drawings. This disclosure is not limited to the following embodiments.

(Embodiment)
The two-photon absorption material of this embodiment includes a compound A represented by the following formula (1).

In formula (1), R ¹ to R ²⁷ each independently contain at least one atom selected from the group consisting of H, C, N, O, F, P, S, Cl, I and Br. R ¹ to R ²⁷ are each independently a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, an unsaturated hydrocarbon group, a hydroxyl group, a carboxyl group, an alkoxycarbonyl group, an acyl group, an amide group, a nitrile group , an alkoxy group, an acyloxy group, a thiol group, an alkylthio group, a sulfonic acid group, an acylthio group, an alkylsulfonyl group, a sulfonamido group, a primary amino group, a secondary amino group, a tertiary amino group, or a nitro group. . R ¹ to R ²⁷ are each independently a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, an unsaturated hydrocarbon group, a hydroxyl group, a carboxyl group, an alkoxycarbonyl group, an acyl group, an amide group, a nitrile group , an alkoxy group, an acyloxy group, a thiol group, an alkylthio group, a sulfonic acid group, an acylthio group, an alkylsulfonyl group, a sulfonamido group, a primary amino group, a secondary amino group, or a nitro group. R ¹ to R ²⁷ are each independently a hydrogen atom (except when all of R ¹ to R ²⁷ are hydrogen atoms), a halogen atom, an alkyl group, a halogenated alkyl group, an unsaturated hydrocarbon group, Carboxyl group, alkoxycarbonyl group, acyl group, amide group, nitrile group, alkoxy group, acyloxy group, thiol group, alkylthio group, sulfonic acid group, acylthio group, alkylsulfonyl group, sulfonamide group, primary amino group, secondary It may be an amino group or a nitro group.

Examples of the halogen atom include F, Cl, Br, I, and the like. In this specification, a halogen atom may be referred to as a halogen group.

The number of carbon atoms in the alkyl group is not particularly limited, and is, for example, 1 or more and 20 or less. The number of carbon atoms in the alkyl group may be 1 or more and 10 or less, or 1 or more and 5 or less, from the viewpoint that compound A can be easily synthesized. By adjusting the number of carbon atoms in the alkyl group, the solubility of Compound A in a solvent or resin composition can be adjusted. The alkyl group may be linear, branched, or cyclic. At least one hydrogen atom contained in the alkyl group may be substituted with a group containing at least one atom selected from the group consisting of N, O, P, and S. Examples of alkyl groups include methyl, ethyl, propyl, butyl, 2-methylbutyl, pentyl, hexyl, 2,3-dimethylhexyl, heptyl, octyl, nonyl, decyl, and undecyl groups. , dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, hexadecyl group, heptadecyl group, octadecyl group, nonadecyl group, eicosyl group, 2-methoxybutyl group, 6-methoxyhexyl group, and the like.

A halogenated alkyl group means a group in which at least one hydrogen atom contained in an alkyl group is substituted with a halogen atom. The halogenated alkyl group may be a group in which all hydrogen atoms contained in the alkyl group are substituted with halogen atoms. Examples of the alkyl group include those mentioned above. A specific example of a halogenated alkyl group is -CF ₃ .

Unsaturated hydrocarbon groups include unsaturated bonds such as carbon-carbon double bonds and carbon-carbon triple bonds. The number of unsaturated bonds contained in the unsaturated hydrocarbon group is, for example, 1 or more and 5 or less. The number of carbon atoms in the unsaturated hydrocarbon group is not particularly limited, and may be, for example, 2 or more and 20 or less, 2 or more and 10 or less, or 2 or more and 5 or less. The unsaturated hydrocarbon group may be linear, branched, or cyclic. At least one hydrogen atom contained in the unsaturated hydrocarbon group may be substituted with a group containing at least one atom selected from the group consisting of N, O, P, and S. Examples of the unsaturated hydrocarbon group include a vinyl group and an ethynyl group.

Hydroxyl groups are represented by -OH. A carboxyl group is represented by -COOH. The alkoxycarbonyl group is represented by -COOR _a . The acyl group is represented by -COR _b . The amide group is represented by -CONR _c R _d . A nitrile group is represented by -CN. The alkoxy group is represented by -OR _e . The acyloxy group is represented by -OCOR _f . The thiol group is represented by -SH. The alkylthio group is represented by -SR _g . The sulfonic acid group is represented by -SO ₃ H. The acylthio group is represented by -SCOR _h . The alkylsulfonyl group is represented by -SO ₂ R _i . The sulfonamide group is represented by -SO ₂ NR _j R _k . A primary amino group is represented by -NH ₂ . A secondary amino group is represented by -NHR _l . The tertiary amino group is represented by -NR _m R _n . The nitro group is represented by -NO ₂ . R _a to R _n are each independently an alkyl group. Examples of the alkyl group include those mentioned above. However, R _c and R _d of the amide group and R _j and R _k of the sulfonamide group may be independently hydrogen atoms.

Specific examples of alkoxycarbonyl groups are -COOCH ₃ , -COO(CH ₂ ) ₃ CH ₃ and -COO(CH ₂ ) ₇ CH ₃ . A specific example of an acyl group is _-COCH3 . A specific example of an amide group is -CONH ₂ . Specific examples of alkoxy groups include methoxy group, ethoxy group, 2-methoxyethoxy group, butoxy group, 2-methylbutoxy group, 2-methoxybutoxy group, 4-ethylthiobutoxy group, pentyloxy group, hexyloxy group, heptyl group. Oxy group, octyloxy group, nonyloxy group, decyloxy group, undecyloxy group, dodecyloxy group, tridecyloxy group, tetradecyloxy group, pentadecyloxy group, hexadecyloxy group, heptadecyloxy group, octadecyloxy group , nonadecyloxy group and eicosyloxy group. A specific example of an acyloxy group is -OCOCH ₃ . A specific example of an alkylthio group is _-SCH3 . A specific example of an acylthio group is _-SCOCH3 . A specific example of an alkylsulfonyl group is -SO ₂ CH ₃ . A specific example of a sulfonamide group is -SO ₂ NH ₂ . A specific example of a tertiary amino group is -N(CH ₃ ) ₂ .

In formula (1), each of R ¹ to R ¹² , R ¹⁶ , R ¹⁷ , R ²¹ , R ²² , R ²⁶ and R ²⁷ may have a small volume. At this time, steric hindrance is unlikely to occur in R ¹ to R ¹² , R ¹⁶ , R ¹⁷ , R ²¹ , R ²² , R ²⁶ and R ²⁷ . Therefore, in Compound A, the planarity of the π-electron conjugated system is improved, so that Compound A tends to have a large two-photon absorption cross section. Each of R ¹ to R ¹² , R ¹⁶ , R ¹⁷ , R ²¹ , R ²² , R ²⁶ and R ²⁷ may be a hydrogen atom.

In formula (1), at least one selected from the group consisting of R ¹³ to R ¹⁵ , R ¹⁸ to R ²⁰ , and R ²³ to R ²⁵ may be an electron donating group or an electron withdrawing group. The greater the electron-donating or electron-withdrawing properties of R ¹³ to R ¹⁵ , R ¹⁸ to R ²⁰ , and R ²³ to R ²⁵ , the greater the electron bias in compound A. If the electrons in compound A are highly biased, the electrons tend to move significantly within compound A when compound A is excited. Such Compound A may have better two-photon absorption properties. In other words, when at least one selected from the group consisting of R ¹³ to R ¹⁵ , R ¹⁸ to R ²⁰ , and R ²³ to R ²⁵ is an electron donating group or an electron withdrawing group, compound A has a large two-photon It may have an absorption cross section. However, each of R ¹⁴ , R ¹⁵ , R ¹⁹ , R ²⁰ , R ²⁴ and R ²⁵ may be a hydrogen atom. At least one selected from the group consisting of R ¹³ , R ¹⁸ and R ²³ may be an electron donating group or an electron withdrawing group.

The electron-withdrawing group means, for example, a substituent whose σ _p value, which is a substituent constant in the Hammett formula, is a positive value. Examples of electron-withdrawing groups include halogen atoms, carboxyl groups, nitro groups, thiol groups, sulfonic acid groups, acyloxy groups, alkylthio groups, alkylsulfonyl groups, sulfonamide groups, acyl groups, acylthio groups, alkoxycarbonyl groups, and halogenated alkyl groups. Examples include groups.

The electron donating group means, for example, a substituent whose σ _p value is a negative value. Examples of electron-donating groups include alkyl groups, alkoxy groups, hydroxyl groups, and amino groups. The electron donating group may be an alkyl or alkoxy group, and may be -C(CH ₃ ) ₃ or -OCH ₃ .

In addition, when compound A is compound B represented by the following formula (2), at least one selected from the group consisting of R ¹³ , R ¹⁸ and R ²³ is a hydrogen atom, a halogen atom, an alkyl group, a halogenated Alkyl group, unsaturated hydrocarbon group, hydroxyl group, carboxyl group, alkoxycarbonyl group, acyl group, amide group, nitrile group, alkoxy group, acyloxy group, thiol group, alkylthio group, sulfonic acid group, acylthio group, alkylsulfonyl group , a sulfonamide group, a primary amino group, a secondary amino group or a nitro group.

Compound A may be Compound B described above. At this time, in formula (2), at least one selected from the group consisting of R ¹³ , R ¹⁸ and R ²³ is a halogen atom, an alkyl group, a halogenated alkyl group, an unsaturated hydrocarbon group, a hydroxyl group, a carboxyl group. , alkoxycarbonyl group, acyl group, amide group, nitrile group, alkoxy group, acyloxy group, thiol group, alkylthio group, sulfonic acid group, acylthio group, alkylsulfonyl group, sulfonamido group, primary amino group, secondary amino group Or it may be a nitro group.

A specific example of compound A is compound C represented by the following formula (3).

In formula (3), multiple Z's are the same. A plurality of Z corresponds to R ¹³ , R ¹⁸ and R ²³ in formula (1), respectively. Specific examples of Z in formula (3) are shown in Table 1 below. In formula (3), the plurality of Z's may be -C(CH ₃ ) ₃ or -OCH ₃ .

The method for synthesizing compound C represented by formula (3) is not particularly limited. Compound C can be synthesized, for example, by the following method. First, a compound D represented by the following formula (4) is prepared. Compound D is 1,3,5-tris(4-aminophenyl)benzene.

Next, compound D is subjected to a dehydration condensation reaction with compound E having an aldehyde group. Thereby, compound C can be synthesized. The structure of compound E is determined depending on the structure of the target compound. The conditions for the dehydration condensation reaction can be adjusted appropriately depending on the compounds D and E, for example.

Compound A represented by formula (1) has excellent two-photon absorption characteristics for light having a wavelength in the short wavelength range. As an example, when Compound A is irradiated with light having a wavelength of 405 nm, two-photon absorption occurs significantly in Compound A.

The two-photon absorption cross section of compound A for light having a wavelength of 405 nm may be 5000 GM or more, 9000 GM or more, 10000 GM or more, 15000 GM or more, 20000 GM It may be more than that. The upper limit of the two-photon absorption cross section of compound A is not particularly limited, and is, for example, 300,000 GM. The two-photon absorption cross section can be measured, for example, by the Z-scan method described in J. Opt. Soc. Am. B, 2003, Vol. 20, p. 529. The Z-scan method is widely used as a method for measuring nonlinear optical constants. In the Z-scan method, a measurement sample is moved along the irradiation direction of the laser beam near the focal point where the laser beam is focused. At this time, changes in the amount of light transmitted through the measurement sample are recorded. In the Z-scan method, the power density of incident light changes depending on the position of the measurement sample. Therefore, when the measurement sample performs nonlinear absorption, when the measurement sample is located near the focal point of the laser beam, the amount of transmitted light is attenuated. The two-photon absorption cross section can be calculated by fitting changes in the amount of transmitted light to a theoretical curve predicted from the intensity of the incident light, the thickness of the measurement sample, the concentration of compound A in the measurement sample, etc. .

When Compound A absorbs two photons, Compound A absorbs approximately twice the energy of the light irradiated onto Compound A. The wavelength of light having approximately twice the energy of light having a wavelength of 405 nm is, for example, 200 nm. That is, when compound A is irradiated with light having a wavelength of around 200 nm, one-photon absorption may occur in compound A. Furthermore, in compound A, one-photon absorption may occur for light having a wavelength near the wavelength range in which two-photon absorption occurs.

The two-photon absorption material of this embodiment may contain compound A represented by formula (1) as a main component. "Main component" means the component contained in the two-photon absorption material in the largest amount by weight. The two-photon absorbing material consists essentially of Compound A, for example. "Substantially consisting of" means excluding other ingredients that alter the essential characteristics of the referenced material. However, the two-photon absorption material may contain impurities in addition to compound A. Since the two-photon absorption material of this embodiment contains the compound A represented by formula (1), it has excellent two-photon absorption characteristics for light having a wavelength in the short wavelength range.

The two-photon absorption material of this embodiment is used, for example, in a device that uses light having a wavelength in a short wavelength range. That is, from another aspect, the present disclosure provides a two-photon absorption material for use in a device that utilizes light having a wavelength of 390 nm or more and 420 nm or less, which includes compound A represented by formula (1). Provide photon absorbing materials. Such devices include recording media, modeling machines, fluorescence microscopes, and the like. An example of the recording medium is a three-dimensional optical memory. A specific example of a three-dimensional optical memory is a three-dimensional optical disk. Examples of the modeling machine include a stereolithography machine such as a 3D printer. Examples of the fluorescence microscope include a two-photon fluorescence microscope. The light utilized in these devices has, for example, a high photon density near its focal point. The power density of light used in the device near the focal point is, for example, 0.1 W/cm ² or more and 1.0×10 ²⁰ W/cm ² or less. The power density near the focal point of this light may be 1.0 W/cm ² or more, 1.0×10 ² W/cm ² or more, or 1.0×10 ⁵ W/cm It may be ² or more. As the light source of the device, for example, a femtosecond laser such as a titanium sapphire laser, or a pulsed laser having a pulse width from picoseconds to nanoseconds such as a semiconductor laser can be used.

The recording medium includes, for example, a thin film called a recording layer. In a recording medium, information is recorded on a recording layer. As an example, the thin film as the recording layer contains the two-photon absorbing material of this embodiment. That is, from another aspect, the present disclosure provides a recording medium including a light-absorbing material containing compound A represented by formula (1).

In addition to the two-photon absorption material, the recording layer may further contain a polymer compound that functions as a binder. The recording medium may include a dielectric layer in addition to the recording layer. The recording medium includes, for example, multiple recording layers and multiple dielectric layers. In the recording medium, a plurality of recording layers and a plurality of dielectric layers may be alternately stacked.

Next, a method of recording information using the above recording medium will be explained. FIG. 1A is a flowchart regarding a method for recording information using the above recording medium. First, in step S11, a light source that emits light having a wavelength of 390 nm or more and 420 nm or less is prepared. As a light source, for example, a femtosecond laser such as a titanium sapphire laser can be used. As the light source, a pulsed laser such as a semiconductor laser having a pulse width of picoseconds to nanoseconds may be used. Next, in step S12, light from a light source is focused by a lens or the like and irradiated onto a recording area on the recording medium. The power density of this light near the focal point is, for example, 0.1 W/cm ² or more and 1.0×10 ²⁰ W/cm ² or less. The power density near the focal point of this light may be 1.0 W/cm ² or more, 1.0×10 ² W/cm ² or more, or 1.0×10 ⁵ W/cm It may be ² or more. In this specification, the recording area refers to a spot that exists in the recording layer and can record information by being irradiated with light.

Physical or chemical changes occur in the recording area irradiated with the above light. For example, heat is generated when Compound A, which has absorbed light, returns from the transition state to the ground state. This heat changes the quality of the binder present in the recording area. This changes the optical characteristics of the recording area. For example, the intensity of light reflected in the recording area, the reflectance of light in the recording area, the absorption rate of light in the recording area, the refractive index of light in the recording area, etc. change. In the recording area irradiated with light, the intensity of the fluorescent light emitted from the recording area or the wavelength of the fluorescent light may change. Thereby, information can be recorded in the recording area (step S13).

Next, a method of reading information using the above recording medium will be explained. FIG. 1B is a flowchart regarding a method for reading information using the above recording medium. First, in step S21, a recording area on a recording medium is irradiated with light. The light used in step S21 may be the same as or different from the light used to record information on the recording medium. Next, in step S22, the optical characteristics of the recording area are measured. In step S22, for example, the intensity of light reflected on the recording area is measured as the optical characteristic of the recording area. In step S22, the optical properties of the recording area include the reflectance of light in the recording area, the absorption rate of light in the recording area, the refractive index of light in the recording area, the intensity of fluorescent light emitted from the recording area, The wavelength of fluorescent light may also be measured.

Next, in step S23, it is determined whether information is recorded in the recording area based on the optical characteristics of the recording area. For example, when the intensity of light reflected from the recording area is below a specific value, it is determined that information is recorded in the recording area. On the other hand, if the intensity of the light reflected by the recording area exceeds a specific value, it is determined that no information is recorded in the recording area. If it is determined that no information is recorded in the recording area, the process returns to step S21 and similar operations are performed on other recording areas. If it is determined that information is recorded in the recording area, the information is read out in step S24.

The method for recording and reading information using the above-mentioned recording medium can be performed by, for example, a known recording device. The recording device includes, for example, a light source that irradiates a recording area on a recording medium with light, a measuring device that measures optical characteristics of the recording area, and a controller that controls the light source and the measuring device.

The modeling machine performs modeling by, for example, irradiating a photocurable resin composition with light and curing the resin composition. As an example, a photocurable resin composition for stereolithography contains the two-photon absorption material of this embodiment. The photocurable resin composition includes, for example, a two-photon absorption material, a polymerizable compound, and a polymerization initiator. The photocurable resin composition may further contain additives such as a binder resin. The photocurable resin composition may contain an epoxy resin.

According to a fluorescence microscope, for example, it is possible to irradiate a biological sample containing a fluorescent dye material with light and observe the fluorescence emitted from the dye material. As an example, the fluorescent dye material to be added to the biological sample includes the two-photon absorption material of this embodiment.

Hereinafter, the present disclosure will be explained in further detail with reference to Examples. Note that the following examples are merely examples, and the present disclosure is not limited to the following examples. In the present disclosure, the compound used in the examples is referred to as "compound (X)-Y.""X" means the structural formula of the compound. "Y" means the type of Z in formula (X). For example, compound (3)-1 means a compound represented by formula (3) and in which Z is substituent 1 (-C(CH ₃ ) ₃ ) shown in Table 1.

(Example 1)
[Compound (3)-1]
First, in a 100 mL eggplant-shaped flask, 1,3,5-tris(4-aminophenyl)benzene (manufactured by Tokyo Kasei Kogyo Co., Ltd.) and 4-tert-butylbenzaldehyde (manufactured by Tokyo Kasei Kogyo Co., Ltd.) as raw materials and as a solvent. Ethanol (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) was added to dissolve the raw materials in the solvent. Next, the obtained solution was heated under reflux for 12 hours while being stirred using a stirrer. This produced a reactant. Next, this reaction product was subjected to solid-liquid separation. The compound of Example 1 was obtained by vacuum drying the obtained solid. The compound of Example 1 corresponds to the compound C represented by the above formula (3) in which a plurality of Z's are -C(CH ₃ ) ₃ . The compound of Example 1 was identified by ¹ H-NMR. FIG. 2 is a graph showing the ¹ H-NMR spectrum of the compound of Example 1. The ¹ H-NMR spectrum of the compound of Example 1 was as follows.
¹ H-NMR (600MHz, CHLOROFORM-D) δ8.52 (s, 3H), 7.87 (d, J=8.3Hz, 6H), 7.82 (s, 3H), 7.75 (d, J=9.0Hz, 6H) , 7.52 (d, J=8.3Hz, 6H), 7.34 (d, J=9.0Hz, 6H), 1.37 (s, 27H).

(Example 2)
[Compound (3)-2]
First, in a 100 mL eggplant-shaped flask, 1,3,5-tris(4-aminophenyl)benzene (manufactured by Tokyo Chemical Industry Co., Ltd.) and 4-methoxybenzaldehyde (manufactured by Tokyo Chemical Industry Co., Ltd.) as raw materials, and ethanol (manufactured by Tokyo Chemical Industry Co., Ltd.) as a solvent. Fuji Film (manufactured by Wako Pure Chemical Industries, Ltd.)) and the raw materials were dissolved in the solvent. Next, the obtained solution was heated under reflux for 12 hours while being stirred using a stirrer. This produced a reactant. Next, this reaction product was subjected to solid-liquid separation. The compound of Example 2 was obtained by vacuum drying the obtained solid. The compound of Example 2 corresponds to the compound C represented by the above formula (3) in which a plurality of Z's are -OCH ₃ . The compound of Example 2 was identified by ¹ H-NMR. FIG. 3 is a graph showing the ¹ H-NMR spectrum of the compound of Example 2. The ¹ H-NMR spectrum of the compound of Example 2 was as follows.
¹ H-NMR (600MHz, CHLOROFORM-D) δ8.47 (s, 3H), 7.89 (d, J=9.0Hz, 6H), 7.82 (s, 3H), 7.75 (d, J=8.3Hz, 6H) , 7.33 (d, J=8.3Hz, 6H), 7.01 (d, J=9.0Hz, 6H), 3.89 (s, 9H).

<Measurement of two-photon absorption cross section>
The two-photon absorption cross section of the synthesized compound was measured for light having a wavelength of 405 nm. The two-photon absorption cross section was measured using the Z-scan method described in J. Opt. Soc. Am. B, 2003, Vol. 20, p. 529. A titanium sapphire pulsed laser was used as a light source for measuring the two-photon absorption cross section. Specifically, the sample was irradiated with the second high frequency of a titanium sapphire pulsed laser. The laser pulse width was 80 fs. The repetition frequency of the laser was 1 kHz. The average power of the laser was varied within a range of 0.01 mW or more and 0.08 mW or less. The light from the laser had a wavelength of 405 nm. Specifically, the light from the laser had a center wavelength of 402 nm or more and 404 nm or less. The full width at half maximum of the light from the laser was 4 nm.

<Prediction of two-photon absorption cross section using machine learning>
Next, two-photon absorption cross sections were predicted by machine learning for the synthesized compound and other compounds with different types of Z from the synthesized compound. Specifically, first, about 70 types of compounds with known two-photon absorption cross sections were prepared as learning data. Half of these compounds were used as training data and the other half as test data. Based on these learning data, we predicted the two-photon absorption cross section using random forest and evaluated the prediction accuracy. Chemoinformatics software RDkit was used for random forest. As a result, a prediction model with a coefficient of determination R ² of 0.75 or more was obtained. Using this prediction model, two-photon absorption cross sections were predicted for the synthesized compound and other compounds having a different type of Z from the synthesized compound.

Table 2 shows the measured values and predicted values of the two-photon absorption cross section obtained by the above method. In Table 2, "No Data" means that no data has been acquired.

Next, compounds shown in Table 3 below were prepared as compounds different from compound A represented by formula (1). In addition, compound 1f of Comparative Example 1 is represented by the following formula (5).

Next, the two-photon absorption cross sections of the compounds shown in Table 3 were measured and predicted by the method described above. The results are shown in Table 3.

As can be seen from Table 2, in the compounds of Examples 1 to 14 corresponding to compound A represented by formula (1), the two-photon absorption cross section for light having a wavelength of 405 nm exceeded 5000 GM. Compared to the compounds of Comparative Examples 1 to 6 listed in Table 3, the compounds of Examples 1 to 14 had significantly larger two-photon absorption cross sections. This result shows that Compound A represented by formula (1) has excellent two-photon absorption characteristics for light having a wavelength in the short wavelength range. Compound A represented by formula (1) is a trisubstituted benzene having an expanded π-electron conjugated system and has an imine group in its molecular skeleton. Due to this structure, Compound A is presumed to have excellent two-photon absorption properties.

The two-photon absorption material of the present disclosure can be used for applications such as a recording layer of a three-dimensional optical memory and a photocurable resin composition for stereolithography. The two-photon absorption material of the present disclosure tends to have excellent two-photon absorption characteristics for light having a wavelength in a short wavelength range. Therefore, the two-photon absorption material of the present disclosure can achieve extremely high spatial resolution in applications such as three-dimensional optical memory and modeling machines. According to the two-photon absorption material of the present disclosure, it is possible to perform two-photon absorption using a laser beam with a lower light intensity than conventional two-photon absorption materials.

Claims (12)

A two-photon absorption material containing a compound represented by the following formula (1).

In the formula (1), R ¹ to R ²⁷ independently contain at least one atom selected from the group consisting of H, C, N, O, F, P, S, Cl, I and Br. . Said R ¹ to said R ²⁷ are each independently a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, an unsaturated hydrocarbon group, a hydroxyl group, a carboxyl group, an alkoxycarbonyl group, an acyl group, an amide group, A nitrile group, alkoxy group, acyloxy group, thiol group, alkylthio group, sulfonic acid group, acylthio group, alkylsulfonyl group, sulfonamido group, primary amino group, secondary amino group, tertiary amino group or nitro group, The two-photon absorption material according to claim 1. At least one selected from the group consisting of R ¹³ to R ¹⁵ , R ¹⁸ to R ²⁰ , and R ²³ to R ²⁵ is an electron donating group or an electron withdrawing group. Or the two-photon absorption material according to 2. The two-photon absorption material according to claim 3, wherein the electron donating group is an alkyl group or an alkoxy group. The two-photon absorption material according to claim 3 or 4, wherein the electron donating group is -C(CH ₃ ) ₃ or -OCH ₃ . When the compound is represented by the following formula (2), at least one selected from the group consisting of R ¹³ , R ¹⁸ and R ²³ is a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, Unsaturated hydrocarbon group, hydroxyl group, carboxyl group, alkoxycarbonyl group, acyl group, amide group, nitrile group, alkoxy group, acyloxy group, thiol group, alkylthio group, sulfonic acid group, acylthio group, alkylsulfonyl group, sulfonamide The two-photon absorption material according to claim 1 or 2, which is a group, a primary amino group, a secondary amino group, or a nitro group.

The compound is represented by the formula (2),
At least one selected from the group consisting of R ¹³ , R ¹⁸ and R ²³ is a halogen atom, an alkyl group, a halogenated alkyl group, an unsaturated hydrocarbon group, a hydroxyl group, a carboxyl group, an alkoxycarbonyl group, an acyl group. group, amide group, nitrile group, alkoxy group, acyloxy group, thiol group, alkylthio group, sulfonic acid group, acylthio group, alkylsulfonyl group, sulfonamido group, primary amino group, secondary amino group or nitro group, The two-photon absorption material according to claim 6. The two-photon absorption material according to any one of claims 1 to 7, used for a device that uses light having a wavelength of 390 nm or more and 420 nm or less. A recording medium comprising the two-photon absorbing material according to any one of claims 1 to 8. Prepare a light source that emits light having a wavelength of 390 nm or more and 420 nm or less,
condensing the light from the light source and irradiating it onto a recording area in a recording medium containing the two-photon absorption material according to any one of claims 1 to 8;
How information is recorded, including: A method for reading information recorded by the recording method according to claim 10, comprising:
The reading method is
Measuring the optical characteristics of the recording area by irradiating the recording area in the recording medium with light,
determining whether information is recorded in the recording area based on the optical property;
How to read information, including: 12. The reading method according to claim 11, wherein the optical characteristic is the intensity of light reflected by the recording area.

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