JP2024008899A - Protective film-forming film, composite sheet for forming protective film, kit, and use of protective film-forming film - Google Patents

Abstract

To provide: an energy ray-curable protective film-forming film which is excellent in near-infrared shielding properties, and in which, when being cured with energy rays, by setting the degree of curing of the protective film-forming film to a suitable range, the adhesion between a protective film and a silicon wafer is improved, so that peeling of the protective film is suppressed; a composite sheet for forming a protective film, and a kit, which include the protective film-forming film; and use of the protective film-forming film.SOLUTION: Provided is an energy ray curable protective film-forming film. The protective film-forming film has a transmittance of a near-infrared ray with a wavelength of 1,300 nm of 10% or less. In the protective film-forming film, a curing rate ratio measured by a specific <method of measuring a curing rate ratio> is 1.02 or more and less than 100.SELECTED DRAWING: Figure 1

Description

The present invention relates to a protective film-forming film, a protective film-forming composite sheet, a kit, and the use of the protective film-forming film.

Some wafers, such as semiconductor wafers and insulator wafers, have circuits formed on one surface (circuit surface) and further have protruding electrodes such as bumps on that surface (circuit surface). Such a wafer is divided into chips and mounted on the circuit board by connecting the protruding electrodes to connection pads on the circuit board by a so-called face-down method.
In such wafers and chips, the surface opposite to the circuit surface (back surface) is sometimes protected with a protective film in order to suppress damage such as cracking.

In order to form such a protective film, a protective film forming film for forming the protective film is attached to the back surface of the wafer. The protective film-forming film is sometimes used in the form of a protective film-forming composite sheet, laminated on a support sheet for supporting it, and sometimes used without being laminated on the support sheet. . After the protective film forming film is laser marked, the semiconductor wafer is cured with heat or energy rays as necessary to improve the protective performance of the protective film forming layer, and then the semiconductor wafer is divided into chips by dicing and picked up. Alternatively, the protective film formed by curing the protective film forming film with heat or energy rays is marked with a laser, and then the semiconductor wafer is divided into chips by dicing and picked up. Next, the picked up semiconductor chip with a protective film is flip-chip connected to a connection pad on a circuit board such as a motherboard, and the protruding electrodes on the chip with a protective film are melted by heating the circuit board (hereinafter referred to as reflow). ), the electrical connection between the protruding electrodes and the connection pads on the circuit board is strengthened, and the projecting electrodes are mounted on the circuit board.

Some protective film-forming films are non-curable films that do not have curability and function as a protective film as they are. When a non-curable protective film-forming film is used, a curing step is not necessary, so that a chip with a protective film can be manufactured by a simplified method at low cost. On the other hand, when a curable protective film-forming film is used, the cured product is used as the protective film, so it has the advantage of having a high ability to protect the wafer. A thermosetting protective film-forming film that is cured by heating takes a relatively long time to heat during curing, but an energy-ray-curable protective film forming film that is cured by irradiation with energy rays is It has the advantage that energy ray irradiation can be done in a short time. Therefore, various efforts are being made to develop energy ray-curable protective film-forming films (see Patent Documents 1 to 3).

Japanese Patent Application Publication No. 2010-031183 International Publication No. 2017/188197 International Publication No. 2019/082977

If a semiconductor device is irradiated with near-infrared rays, it may malfunction. By using a protective film-forming film containing an inorganic pigment as a coloring agent, it is possible to reduce the light transmittance as well as the near-infrared transmittance.
However, in the conventional energy ray-curable film for forming a protective film, it is not possible to simply contain an inorganic pigment for the purpose of lowering the transmittance of near-infrared rays, and to cure the film for forming a protective film with energy rays to form a protective film. At the time, it was difficult to maintain the adhesion between the protective film and the silicon wafer. When the adhesion is impaired, the protective film tends to peel off, which may impede the subsequent manufacture of semiconductor devices.

The present invention is an energy ray-curable protective film-forming film, which has excellent near-infrared shielding properties, and has a suitable degree of curing when the protective film-forming film is cured with energy rays. A protective film forming film that improves the adhesion between the protective film and the silicon wafer and can produce a highly reliable semiconductor device with suppressed peeling of the protective film, and a protective film forming film comprising the same. The purpose of the present invention is to provide a composite sheet, a kit, and a use of a protective film forming film.

The present invention has the following aspects.
[1] An energy ray-curable protective film-forming film,
The protective film forming film has a near-infrared transmittance of 10% or less at a wavelength of 1300 nm,
The protective film-forming film has a curing rate ratio of 1.02 or more and less than 100, as measured by the curing rate ratio measurement method described below.
<Measurement method of curing rate ratio>
The protective film-forming film is irradiated with ultraviolet rays from one side under conditions of an illumination intensity of 220 mW/cm ² and a light amount of 100 mJ/cm ² to produce a protective film-forming film (100) after UV irradiation.
Using a Fourier transform infrared spectrometer, the surface (back surface) opposite to the surface irradiated with ultraviolet rays in the protective film forming film (100) before and after irradiation with ultraviolet rays was measured using the diamond ATR method at an incident angle of 45°. Perform FT-IR measurement. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (100) before and after UV irradiation. The change in strength is calculated using the following formula (1), and this is taken as the curing rate at 100 mJ/cm ² of the back surface of the protective film forming film.
Next, a protective film-forming film (500) after ultraviolet ^{irradiation is produced in the same manner as described above, except that ultraviolet rays are irradiated under conditions of an illuminance of 220 mW/cm 2 and} a light amount of 500 mJ/cm 2 . FT-IR measurements are performed on the surface (back surface) opposite to the surface irradiated with ultraviolet rays of the protective film forming film (500) before and after irradiation with ultraviolet rays under the same conditions as above. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (500) before and after UV irradiation. The change in strength is calculated using the following formula (1), and this is taken as the curing rate at 500 mJ/cm ² of the back surface of the protective film forming film.
Next, the ratio of the curing rate at 500 mJ/cm ² on the back side of the protective film forming film to the curing rate at 100 mJ/cm ² on the back side of the protective film forming film is calculated using the following formula (2), and this is calculated as the ratio of the curing rate at 500 mJ/cm 2 on the back side of the protective film forming film. Let the curing rate ratio be
Curing rate = {(peak intensity before ultraviolet irradiation - peak intensity after ultraviolet irradiation)/peak intensity before ultraviolet irradiation} x 100...(1)
Curing rate ratio = (curing rate at 500 mJ/cm ² on the back side of the protective film forming film) / (curing rate at 100 mJ/cm ² on the back side of the protective film forming film) ... (2)
[2] The protective film-forming film according to [1], which contains an inorganic pigment as a colorant.
[3] A composite sheet for forming a protective film, comprising a support sheet and a protective film-forming film provided on one surface of the support sheet,
A composite sheet for forming a protective film, wherein the protective film-forming film is the protective film-forming film according to [1] or [2].
[4] A first laminate in which a first release film and a protective film-forming film are laminated in this order, a workpiece to which the protective film-forming film is attached, and a support used to support the protective film-forming film. A kit comprising a sheet,
A kit, wherein the protective film-forming film is the protective film-forming film according to [1] or [2].
[5] Use of a protective film forming film for forming a protective film on the surface of a semiconductor wafer or semiconductor chip opposite to the circuit surface,
Use of a protective film-forming film, wherein the protective film-forming film is the protective film-forming film according to [1] or [2].

According to the present invention, the protective film-forming film is energy ray-curable, and has excellent near-infrared shielding properties, and the degree of curing of the protective film-forming film during energy ray curing is within a suitable range. A protective film forming film that improves the adhesion between a protective film and a silicon wafer and can produce a highly reliable semiconductor device in which peeling of the protective film is suppressed, and a composite sheet and kit for forming a protective film comprising the same. , use of the protective film-forming film is provided.

FIG. 1 is a cross-sectional view schematically showing an example of a protective film-forming film according to an embodiment of the present invention. FIG. 1 is a cross-sectional view schematically showing an example of a composite sheet for forming a protective film according to an embodiment of the present invention. FIG. 3 is a cross-sectional view schematically showing another example of a composite sheet for forming a protective film according to an embodiment of the present invention. It is a sectional view showing typically still another example of the composite sheet for protective film formation concerning one embodiment of the present invention. It is a sectional view showing typically still another example of the composite sheet for protective film formation concerning one embodiment of the present invention. 1 is a cross-sectional view schematically showing an example of a kit according to an embodiment of the present invention. FIG. 1 is a cross-sectional view schematically illustrating an example of a method for manufacturing a chip with a protective film according to an embodiment of the present invention. FIG. 3 is a cross-sectional view for schematically explaining another example of the method for manufacturing a chip with a protective film according to an embodiment of the present invention.

◇Protective film-forming film The protective film-forming film according to one embodiment of the present invention is an energy ray-curable protective film-forming film, and the protective film-forming film has a near-infrared transmittance of 10% or less at a wavelength of 1300 nm. The curing rate ratio of the protective film-forming film measured by the method for measuring a curing rate ratio described below is 1.02 or more and less than 100.

<Measurement method of curing rate ratio>
The protective film-forming film is irradiated with ultraviolet rays from one side under conditions of an illumination intensity of 220 mW/cm ² and a light amount of 100 mJ/cm ² to produce a protective film-forming film (100) after UV irradiation.
Using a Fourier transform infrared spectrometer, the surface (back surface) opposite to the surface irradiated with ultraviolet rays in the protective film forming film (100) before and after irradiation with ultraviolet rays was measured using the diamond ATR method at an incident angle of 45°. Perform FT-IR measurement. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (100) before and after UV irradiation. The change in strength is calculated using the following formula (1), and this is taken as the curing rate at 100 mJ/cm ² of the back surface of the protective film forming film.
Next, a protective film-forming film (500) after ultraviolet ^{irradiation is produced in the same manner as described above, except that ultraviolet rays are irradiated under conditions of an illuminance of 220 mW/cm 2 and} a light amount of 500 mJ/cm 2 . FT-IR measurements are performed on the surface (back surface) opposite to the surface irradiated with ultraviolet rays of the protective film forming film (500) before and after irradiation with ultraviolet rays under the same conditions as above. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (500) before and after UV irradiation. The change in strength is calculated using the following formula (1), and this is taken as the curing rate at 500 mJ/cm ² of the back surface of the protective film forming film.
Next, the ratio of the curing rate at 500 mJ/cm ² on the back side of the protective film forming film to the curing rate at 100 mJ/cm ² on the back side of the protective film forming film is calculated using the following formula (2), and this is calculated as the ratio of the curing rate at 500 mJ/cm 2 on the back side of the protective film forming film. Let the curing rate ratio be

Curing rate = {(peak intensity before ultraviolet irradiation - peak intensity after ultraviolet irradiation)/peak intensity before ultraviolet irradiation} x 100...(1)
Curing rate ratio = (curing rate at 500 mJ/cm ² on the back side of the protective film forming film) / (curing rate at 100 mJ/cm ² on the back side of the protective film forming film) ... (2)

The protective film-forming film of this embodiment is a film used to protect the chip by providing a protective film on the back surface of the chip.

By using the protective film forming film of this embodiment or the composite sheet for forming a protective film including the same, a chip with a protective film including a chip and a protective film provided on the back surface of the chip can be manufactured. .
The above-mentioned chip with a protective film is produced by, for example, pasting a protective film forming film on the back side of a wafer, forming a protective film by curing the protective film forming film, dividing the wafer into chips, and applying a protective film around the outer periphery of the chip. It can be manufactured by cutting along the length.

In this specification, "wafer" refers to semiconductor wafers made of elemental semiconductors such as silicon, germanium, and selenium, and compound semiconductors such as GaAs, GaP, InP, CdTe, ZnSe, and SiC; sapphire, glass, and niobium semiconductors; Examples include insulator wafers made of insulators such as lithium oxide and lithium tantalate.
A circuit is formed on one surface of these wafers, and in this specification, the surface of the wafer on which the circuit is formed is referred to as the "circuit surface." The surface of the wafer opposite to the circuit surface is referred to as the "back surface."
The wafer is divided into chips by means such as dicing. In this specification, as in the case of a wafer, the surface of the chip on which a circuit is formed is referred to as the "circuit surface", and the surface of the chip opposite to the circuit surface is referred to as the "back surface".
Protruding electrodes such as bumps and pillars are provided on both the circuit surface of the wafer and the circuit surface of the chip. Preferably, the protruding electrode is made of solder.

Furthermore, by using the above-mentioned chip with a protective film, a substrate device can be manufactured.
As used herein, the term "substrate device" refers to one in which a chip with a protective film is flip-chip connected to connection pads on a circuit board at protruding electrodes on its circuit surface. For example, if a semiconductor wafer is used as the wafer, the substrate device may be a semiconductor device.

The protective film-forming film of this embodiment is energy ray curable, and may further be thermosetting, or may not be thermosetting. When the protective film-forming film of this embodiment has both energy ray curable and thermosetting properties, the contribution of energy ray curing of the protective film forming film to the formation of the protective film is greater than the contribution of thermosetting. It's also big.

As used herein, the term "energy ray" refers to electromagnetic waves or charged particle beams that have energy quanta. Examples of energy rays include ultraviolet rays, radiation, electron beams, and the like. The ultraviolet rays can be irradiated using, for example, a high-pressure mercury lamp, a fusion lamp, a xenon lamp, a black light, an LED lamp, or the like as an ultraviolet source. The electron beam can be generated by an electron beam accelerator or the like.
In this specification, "energy ray curable" means a property that hardens by irradiation with energy rays, and "non-energy ray curable" means a property that does not harden even when irradiated with energy rays. do.
Moreover, "non-curable" means a property that does not harden by any means such as heating or irradiation with energy rays.

The curing conditions for forming a protective film by curing the protective film-forming film with energy rays are not particularly limited as long as the degree of curing is such that the protective film can sufficiently exhibit its function. It may be selected as appropriate depending on the type.
For example, the illuminance of energy rays during energy ray curing of an energy ray curable protective film forming film is preferably 60 to 320 mW/cm ² . The amount of energy rays used during curing is preferably 100 to 1000 mJ/cm ² .

The near-infrared transmittance of the protective film-forming film of this embodiment at a wavelength of 1300 nm is 10% or less. The near-infrared transmittance at a wavelength of 1300 nm can be measured using, for example, a commercially available ultraviolet/visible/near-infrared spectrophotometer.

The near-infrared transmittance at a wavelength of 1300 nm of the protective film forming film of this embodiment is 10% or less, and in order to improve the near-infrared shielding effect, the near-infrared transmittance at a wavelength of 1300 nm is preferably 8% or less. It is more preferably 6% or less, and even more preferably 4% or less.
The near-infrared transmittance at a wavelength of 1300 nm of the protective film forming film may be 0.01% or more, may be 0.03% or more, may be 0.04% or more, and may be 0.1%. It may be more than that.
The near-infrared transmittance at a wavelength of 365 nm of the protective film-forming film of this embodiment is preferably less than 0.20%, more preferably 0.18% or less, in order to improve the near-infrared shielding effect. , 0.17% or less is more preferable, and 0.10% or less is particularly preferable.
The near-infrared transmittance of the protective film forming film at a wavelength of 365 nm may be 0.005% or more, or may be 0.008% or more.

The protective film-forming film of the present embodiment has a curing rate ratio of 1.02 or more and less than 100, as measured by the following curing rate ratio measurement method.

<Measurement method of curing rate ratio>
The protective film-forming film is irradiated with ultraviolet rays from one side under conditions of an illumination intensity of 220 mW/cm ² and a light amount of 100 mJ/cm ² to produce a protective film-forming film (100) after UV irradiation.
Using a Fourier transform infrared spectrometer, the surface (back surface) opposite to the surface irradiated with ultraviolet rays in the protective film forming film (100) before and after irradiation with ultraviolet rays was measured using the diamond ATR method at an incident angle of 45°. Perform FT-IR measurement. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (100) before and after UV irradiation. The change in strength is calculated using the following formula (1), and this is taken as the curing rate at 100 mJ/cm ² of the back surface of the protective film forming film.
Next, a protective film-forming film (500) after ultraviolet ^{irradiation is produced in the same manner as described above, except that ultraviolet rays are irradiated under conditions of an illuminance of 220 mW/cm 2 and} a light amount of 500 mJ/cm 2 . FT-IR measurements are performed on the surface (back surface) opposite to the surface irradiated with ultraviolet rays of the protective film forming film (500) before and after irradiation with ultraviolet rays under the same conditions as above. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (500) before and after UV irradiation. The change in strength is calculated using the following formula (1), and this is taken as the curing rate at 500 mJ/cm ² of the back surface of the protective film forming film.
Next, the ratio of the curing rate at 500 mJ/cm ² of the back side of the protective film forming film to the curing rate at 100 mJ/cm ² of the back side of the protective film forming film is calculated using the following formula (2), and this is calculated using the following formula (2). Let the curing rate ratio be

Curing rate = {(peak intensity before ultraviolet irradiation - peak intensity after ultraviolet irradiation)/peak intensity before ultraviolet irradiation} x 100...(1)
Curing rate ratio = (curing rate at 500 mJ/cm ² on the back side of the protective film forming film) / (curing rate at 100 mJ/cm ² on the back side of the protective film forming film) ... (2)

By setting the curing rate ratio determined by formula (2) to be 1.02 or more, when the protective film-forming film is cured with energy rays, the degree of curing of the protective film-forming film is within a suitable range. This improves the adhesion between the protective film and the silicon wafer, and prevents the protective film from peeling off easily.

Since the curing rate ratio determined by formula (2) is less than 100, when the protective film-forming film is cured with energy rays, the degree of curing of the protective film-forming film is within a suitable range, so that the protection This improves the adhesion between the film and the silicon wafer and prevents the protective film from peeling off easily.

In the protective film forming film of this embodiment, the curing rate ratio determined by formula (2) is 1.02 or more, which improves the adhesion between the protective film and the silicon wafer and better prevents peeling of the protective film. In order to do this, the curing rate ratio determined by formula (2) is preferably 1.1 or more, more preferably 2.0 or more, and even more preferably 2.5 or more.

In the protective film forming film of this embodiment, the curing rate ratio determined by formula (2) is less than 100, which improves the adhesion between the protective film and the silicon wafer and better prevents peeling of the protective film. It is preferably 50 or less, more preferably 20 or less, even more preferably 15 or less, particularly preferably 10 or less, and most preferably 5 or less.

In the protective film-forming film of this embodiment, in order to improve the adhesion between the protective film and the silicon wafer and to better prevent peeling of the protective film, the The curing rate at 100 mJ/cm ² is preferably 0.1% or more, more preferably 0.5% or more, even more preferably 0.8% or more, and 1.0% or more. It is particularly preferable that there be.
In addition, in the protective film forming film of this embodiment, in order to improve the adhesion between the protective film and the silicon wafer and more preferably prevent peeling of the protective film, the protective film forming film obtained by formula (1) is The curing rate at 100 mJ/cm ² on the back surface is preferably 79% or less, more preferably 75% or less, even more preferably 70% or less, particularly preferably 30% or less, Most preferably it is 25% or less.

In the protective film forming film of this embodiment, in order to improve the adhesion between the protective film and the silicon wafer and more preferably prevent peeling of the protective film, the The curing rate at 500 mJ/cm ² is preferably 1% or more, more preferably 5% or more, and even more preferably 10% or more.
In addition, in the protective film forming film of this embodiment, in order to improve the adhesion between the protective film and the silicon wafer and more preferably prevent peeling of the protective film, the protective film forming film obtained by formula (1) is The curing rate at 500 mJ/cm ² on the back surface is preferably 90% or less, more preferably 85% or less, even more preferably 80% or less, particularly preferably 75% or less, Most preferably it is 70% or less.

Examples of the protective film-forming film include those containing an energy ray-curable component (a) and an acrylic resin (b) that does not have an energy ray-curable group.
The components contained in the protective film-forming film will be explained in detail later.

The protective film forming film may be composed of one layer (single layer) or may be composed of two or more layers. When the protective film forming film consists of multiple layers, these multiple layers may be the same or different from each other, and the combination of these multiple layers is not particularly limited.

In this specification, not only in the case of a protective film-forming film, "the plurality of layers may be the same or different from each other" means "all the layers may be the same or all the layers may be different". ``The layers may be the same, or only some of the layers may be the same.'' Furthermore, ``the layers are different from each other'' means ``at least one of the constituent materials and thickness of each layer is different from each other.'' It means that.

The thickness of the protective film forming film is preferably 1 to 100 μm, more preferably 3 to 80 μm, and particularly preferably 5 to 60 μm. When the thickness of the protective film-forming film is equal to or greater than the lower limit, a protective film with higher protective ability can be formed. By setting the thickness of the protective film-forming film to be less than or equal to the upper limit value, it is possible to avoid excessive thickness of the chip with the protective film.
Here, the "thickness of the protective film-forming film" means the thickness of the entire protective film-forming film. For example, the thickness of a protective film-forming film consisting of multiple layers refers to all means the total thickness of the layers.
"Thickness" in this specification can be determined by the method defined in JIS K 7130:1999 (ISO 4593:1993).

<<Composition for forming a protective film>>
The protective film-forming film can be formed using an energy ray-curable protective film-forming composition (herein sometimes simply referred to as a "protective film-forming composition") containing the constituent materials thereof. For example, a protective film-forming film can be formed by applying the protective film-forming composition to the surface to be formed, and drying as necessary. The content ratio of components that do not vaporize at room temperature in the protective film-forming composition is usually the same as the content ratio of the components in the protective film-forming film. As used herein, "normal temperature" means a temperature that is not particularly cooled or heated, that is, a normal temperature, and includes, for example, a temperature of 18 to 28°C.

Coating of the composition for forming a protective film may be performed by a known method, such as an air knife coater, a blade coater, a bar coater, a gravure coater, a roll coater, a roll knife coater, a curtain coater, a die coater, a knife coater, Examples include methods using various coaters such as a screen coater, Meyer bar coater, and kiss coater.

Drying conditions for the composition for forming a protective film are not particularly limited. However, when the composition for forming a protective film contains a solvent described below, it is preferable to dry it by heating. The composition for forming a protective film containing a solvent is preferably dried by heating at, for example, 70 to 130°C for 10 seconds to 5 minutes. However, it is preferable to heat-dry the thermosetting composition for forming a protective film so that the composition itself and the thermosetting protective film-forming film formed from this composition are not thermally cured. .

<Energy ray curable protective film forming composition (IV)>
A preferable composition for forming a protective film includes, for example, the energy ray-curable component (a), the acrylic resin (b) that does not have the energy ray-curable group, and the inorganic filler (d). Energy ray-curable protective film-forming composition (IV) (herein sometimes simply referred to as "composition (IV)") and the like.

[Energy ray curable component (a)]
The energy ray-curable component (a) is a component that is cured by irradiation with energy rays, and is used to impart film-forming properties, flexibility, etc. to the protective film-forming film, and to form a hard protective film after curing. It is also a component of The protective film-forming film forms a protective film with good characteristics by containing the energy ray-curable component (a).
In the protective film-forming film, the energy ray-curable component (a) is preferably uncured, preferably adhesive, and more preferably uncured and adhesive.

Examples of the energy ray curable component (a) include a polymer (a1) having an energy ray curable group and a weight average molecular weight of 80,000 to 2,000,000, and a polymer (a1) having an energy ray curable group and a molecular weight of 100 to 80,000. Compound (a2) is mentioned. The polymer (a1) may be at least partially crosslinked with a crosslinking agent or may not be crosslinked.

(Polymer (a1) having an energy ray-curable group and having a weight average molecular weight of 80,000 to 2,000,000)
Examples of the polymer (a1) having an energy ray-curable group and having a weight average molecular weight of 80,000 to 2,000,000 include an acrylic polymer (a11) having a functional group that can react with a group possessed by another compound, and the above-mentioned functional group. An example thereof is an acrylic resin (a1-1) formed by reacting a group that reacts with a group and an energy ray-curable compound (a12) having an energy ray-curable group such as an energy-ray curable double bond.

Examples of the functional groups that can react with groups possessed by other compounds include hydroxyl groups, carboxy groups, amino groups, and substituted amino groups (one or two hydrogen atoms of the amino group are substituted with groups other than hydrogen atoms). (a group having a similar structure), an epoxy group, and the like. However, from the viewpoint of preventing corrosion of circuits such as wafers and chips, the functional group is preferably a group other than a carboxy group.
Among these, it is preferable that the functional group is a hydroxyl group.

・Acrylic polymer with functional groups (a11)
Examples of the acrylic polymer (a11) having the functional group include those formed by copolymerizing an acrylic monomer having the functional group and an acrylic monomer not having the functional group; Furthermore, monomers other than acrylic monomers (non-acrylic monomers) may be copolymerized.
Further, the acrylic polymer (a11) may be a random copolymer or a block copolymer, and known polymerization methods can be employed.

Examples of the acrylic monomer having a functional group include a hydroxyl group-containing monomer, a carboxyl group-containing monomer, an amino group-containing monomer, a substituted amino group-containing monomer, an epoxy group-containing monomer, and the like.

Examples of the hydroxyl group-containing monomer include hydroxymethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, and (meth)acrylate. Hydroxyalkyl (meth)acrylates such as 2-hydroxybutyl acrylate, 3-hydroxybutyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate; non-(meth)acrylic unsaturated such as vinyl alcohol, allyl alcohol, etc. Examples include alcohol (unsaturated alcohol without a (meth)acryloyl skeleton).

Examples of the carboxy group-containing monomer include ethylenically unsaturated monocarboxylic acids (monocarboxylic acids having an ethylenically unsaturated bond) such as (meth)acrylic acid and crotonic acid; fumaric acid, itaconic acid, maleic acid, and citraconic acid. Examples include ethylenically unsaturated dicarboxylic acids (dicarboxylic acids having an ethylenically unsaturated bond) such as acids; anhydrides of the ethylenically unsaturated dicarboxylic acids; (meth)acrylic acid carboxyalkyl esters such as 2-carboxyethyl methacrylate; It will be done.

The acrylic monomer having the functional group is preferably a hydroxyl group-containing monomer.

The acrylic monomer having the functional group constituting the acrylic polymer (a11) may be one type or two or more types, and when there are two or more types, a combination thereof and The ratio can be selected arbitrarily.

Examples of the acrylic monomer having no functional group include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, and n-(meth)acrylate. Butyl, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, (meth)acrylate, ) 2-ethylhexyl acrylate, isooctyl (meth)acrylate, n-octyl (meth)acrylate, n-nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, (meth)acrylate undecyl acid, dodecyl (meth)acrylate (lauryl (meth)acrylate), tridecyl (meth)acrylate, tetradecyl (meth)acrylate (myristyl (meth)acrylate), pentadecyl (meth)acrylate, (meth)acrylate The alkyl group constituting the alkyl ester, such as hexadecyl acrylate ((meth)palmityl acrylate), heptadecyl (meth)acrylate, octadecyl (meth)acrylate (stearyl (meth)acrylate), has 1 to 1 carbon atoms. Examples include (meth)acrylic acid alkyl esters having a chain structure of No. 18.

In addition, examples of the acrylic monomer having no functional group include alkoxyalkyl monomers such as methoxymethyl (meth)acrylate, methoxyethyl (meth)acrylate, ethoxymethyl (meth)acrylate, and ethoxyethyl (meth)acrylate. Group-containing (meth)acrylic esters; (meth)acrylic esters having aromatic groups, including aryl (meth)acrylic esters such as phenyl (meth)acrylate; non-crosslinkable (meth)acrylamides and their Derivatives; (meth)acrylic acid esters having a non-crosslinkable tertiary amino group, such as N,N-dimethylaminoethyl (meth)acrylate and N,N-dimethylaminopropyl (meth)acrylate, are also included.

The number of acrylic monomers having no functional group constituting the acrylic polymer (a11) may be one type, or two or more types, and in the case of two or more types, a combination thereof. and the ratio can be selected arbitrarily.

Examples of the non-acrylic monomer include olefins such as ethylene and norbornene; vinyl acetate; and styrene.
The non-acrylic monomer constituting the acrylic polymer (a11) may be one type or two or more types, and when there are two or more types, the combination and ratio thereof may be arbitrarily selected. You can choose.

In the acrylic polymer (a11), the ratio (content) of the structural unit derived from the acrylic monomer having a functional group to the total amount of the structural units constituting it is 0.1 to 50% by mass. The amount is preferably 1 to 40% by weight, more preferably 1 to 40% by weight, and particularly preferably 3 to 30% by weight. Since the ratio is in such a range, the acrylic resin (a1-1) obtained by copolymerization of the acrylic polymer (a11) and the energy ray curable compound (a12) can be cured by energy rays. The content of the functional group allows the degree of curing of the protective film to be adjusted within a preferable range.

The acrylic polymer (a11) constituting the acrylic resin (a1-1) may be one type or two or more types, and when there are two or more types, a combination thereof and The ratio can be selected arbitrarily.

In the protective film-forming film, the content ratio of the acrylic resin (a1-1) to the total mass of the protective film-forming film is preferably 1 to 70% by mass, more preferably 5 to 60% by mass. It is preferably 10 to 50% by weight, particularly preferably 10 to 50% by weight.

・Energy ray curable compound (a12)
The energy ray-curable compound (a12) is one or more groups selected from the group consisting of isocyanate groups, epoxy groups, and carboxy groups as groups capable of reacting with the functional groups possessed by the acrylic polymer (a11). Preferably, those having an isocyanate group as the group are more preferable. For example, when the energy ray-curable compound (a12) has an isocyanate group as the group, this isocyanate group easily reacts with the hydroxyl group of the acrylic polymer (a11) having a hydroxyl group as the functional group.

The number of energy ray curable groups that the energy ray curable compound (a12) has in one molecule is not particularly limited, and may be determined by taking into consideration the physical properties such as shrinkage rate required for the intended protective film. You can select as appropriate.
For example, the energy ray curable compound (a12) preferably has 1 to 5 energy ray curable groups, more preferably 1 to 3, in one molecule.

Examples of the energy ray-curable compound (a12) include 2-methacryloyloxyethyl isocyanate, meta-isopropenyl-α,α-dimethylbenzyl isocyanate, methacryloyl isocyanate, allyl isocyanate, 1,1-(bisacryloyloxymethyl) Ethyl isocyanate;
An acryloyl monoisocyanate compound obtained by reacting a diisocyanate compound or a polyisocyanate compound with hydroxyethyl (meth)acrylate;
Examples include acryloyl monoisocyanate compounds obtained by reacting a diisocyanate compound or a polyisocyanate compound, a polyol compound, and hydroxyethyl (meth)acrylate.
Among these, the energy ray-curable compound (a12) is preferably 2-methacryloyloxyethyl isocyanate.

The energy ray-curable compound (a12) constituting the acrylic resin (a1-1) may be one type or two or more types, and when there are two or more types, their Combinations and ratios can be selected arbitrarily.

In the acrylic resin (a1-1), the ratio of the content of energy ray curable groups derived from the energy ray curable compound (a12) to the content of the functional groups derived from the acrylic polymer (a11). is preferably 20 to 120 mol%, more preferably 35 to 100 mol%, particularly preferably 50 to 100 mol%. When the content ratio is within such a range, the adhesive strength of the cured product of the protective film-forming film becomes greater. In addition, when the energy ray-curable compound (a12) is a monofunctional (having one of the above groups in one molecule) compound, the upper limit of the content ratio is 100 mol%, but the above-mentioned When the energy ray-curable compound (a12) is a polyfunctional compound (having two or more of the above groups in one molecule), the upper limit of the content ratio may exceed 100 mol%.

The weight average molecular weight (Mw) of the polymer (a1) is preferably 100,000 to 2,000,000, more preferably 300,000 to 1,500,000.

In this specification, the "weight average molecular weight" is a polystyrene equivalent value measured by gel permeation chromatography (GPC) unless otherwise specified.

The composition (IV) and the protective film-forming film may contain only one type of polymer (a1), or two or more types, and when they are two or more types, a combination thereof. and the ratio can be selected arbitrarily.

(Compound (a2) having an energy ray-curable group and having a molecular weight of 100 to 80,000)
Examples of the energy ray curable group in the compound (a2) having a molecular weight of 100 to 80,000 include a group containing an energy ray curable double bond, and preferred ones include (meth) ) Acryloyl group, vinyl group, etc.

The compound (a2) is not particularly limited as long as it satisfies the above conditions, but includes a low molecular weight compound having an energy ray curable group, an epoxy resin having an energy ray curable group, and an energy ray curable group. Examples include phenol resin.

Among the compounds (a2), examples of the low molecular weight compound having an energy ray-curable group include polyfunctional monomers or oligomers, and acrylate compounds having a (meth)acryloyl group are preferred.

Examples of the acrylate compound include polyfunctional monomers or oligomers, and polyfunctional acrylate compounds having two or more (meth)acryloyl groups in one molecule are preferred.
Examples of the polyfunctional acrylate compounds include 2-hydroxy-3-(meth)acryloyloxypropyl methacrylate, polyethylene glycol di(meth)acrylate, propoxylated ethoxylated bisphenol A di(meth)acrylate, and 2,2-bisphenol A di(meth)acrylate. [4-((meth)acryloxypolyethoxy)phenyl]propane, ethoxylated bisphenol A di(meth)acrylate, 2,2-bis[4-((meth)acryloxydiethoxy)phenyl]propane, 9,9 -Bis[4-(2-(meth)acryloyloxyethoxy)phenyl]fluorene, 2,2-bis[4-((meth)acryloxypolypropoxy)phenyl]propane, tricyclodecane dimethanol di(meth)acrylate (Also known as: tricyclodecane dimethyl di(meth)acrylate), 1,10-decanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate , dipropylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, polytetramethylene glycol di(meth)acrylate, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate Acrylate, triethylene glycol di(meth)acrylate, 2,2-bis[4-((meth)acryloxyethoxy)phenyl]propane, neopentyl glycol di(meth)acrylate, ethoxylated polypropylene glycol di(meth)acrylate, Bifunctional (meth)acrylate ((meth)acrylate having two (meth)acryloyl groups in one molecule) such as 2-hydroxy-1,3-di(meth)acryloxypropane;
Tris(2-(meth)acryloxyethyl)isocyanurate, ε-caprolactone modified tris-(2-(meth)acryloxyethyl)isocyanurate, ethoxylated glycerin tri(meth)acrylate, pentaerythritol tri(meth)acrylate, Trimethylolpropane tri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, ethoxylated pentaerythritol tetra(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol poly(meth)acrylate, dipentaerythritol hexa( Polyfunctional (meth)acrylates such as meth)acrylates ((meth)acrylates having three or more (meth)acryloyl groups in one molecule);
Examples include polyfunctional (meth)acrylate oligomers ((meth)acrylate oligomers having two or more (meth)acryloyl groups in one molecule) such as polyfunctional urethane (meth)acrylate oligomers.

Among the compounds (a2), examples of epoxy resins having an energy ray-curable group and phenol resins having an energy ray-curable group include those described in paragraph 0043 of "Japanese Unexamined Patent Publication No. 2013-194102". can be used. Such a resin also corresponds to the resin constituting the thermosetting component described below, but is treated as the compound (a2) in the composition (IV).

The weight average molecular weight of the compound (a2) is preferably 100 to 30,000, more preferably 300 to 10,000.

The composition (IV) and the protective film-forming film may contain only one type of compound (a2), or two or more types, and when they are two or more types, a combination thereof and The ratio can be selected arbitrarily.

The protective film-forming film preferably contains the compound (a2) as the energy ray-curable component (a), and is a polyfunctional acrylate-based film having two or more (meth)acryloyl groups in one molecule. It is more preferable to contain a compound, and even more preferable to contain a polyfunctional urethane (meth)acrylate oligomer. The cured product (protective film) of a protective film-forming film containing such energy ray-curable component (a) by energy ray irradiation has good protective ability and flexibility, and is particularly excellent. It has the following characteristics.

When the composition (IV) and the protective film forming film contain the energy ray curable component (a), the content of the energy ray curable component (a) in the composition (IV) and the protective film forming film is It is preferably 100 to 310 parts by mass, more preferably 130 to 280 parts by mass, for example, it may be 130 to 200 parts by mass, based on 100 parts by mass of the resin (b). , 210 to 280 parts by mass.

In the composition (IV), the content ratio of the energy ray curable component (a) to the total content of all components other than the solvent (i.e., the content ratio of the energy ray curable component (a) to the total mass of the protective film forming film in the protective film forming film) The curable component (a) content ratio) is preferably 12 to 31% by mass, more preferably 14 to 28% by mass, and even more preferably 16 to 25% by mass. When the content ratio of the energy ray curable component (a) (that is, the ratio of the energy ray curable component (a) content) is equal to or higher than the lower limit, the energy ray curability of the protective film forming film is improved. becomes better. When the content ratio of the energy ray curable component (a) (that is, the content ratio of the energy ray curable component (a)) is equal to or less than the upper limit value, it is easy to prepare a desired protective film forming film. .

[Acrylic resin (b) without energy ray curable group]
The protective film-forming film preferably contains an acrylic resin (b) (herein sometimes simply referred to as "acrylic resin (b)") that does not have an energy ray-curable group.

The acrylic resin (b) is a component that imparts film-forming properties to the protective film-forming film.

The acrylic resin (b) may be a known one, for example, it may be a homopolymer of one kind of acrylic monomer, a copolymer of two or more kinds of acrylic monomers, or a copolymer of two or more kinds of acrylic monomers. It may also be a copolymer of one or more acrylic monomers and one or more monomers other than the acrylic monomer (non-acrylic monomers).

The acrylic resin (b) preferably has a structural unit derived from 4-(meth)acryloylmorpholine. That is, the acrylic resin (b) is preferably a polymer of 4-(meth)acryloylmorpholine. Because the acrylic resin (b) has a structural unit derived from 4-(meth)acryloylmorpholine, it has excellent adhesion to the above-mentioned wafer or chip, and has the effect of suppressing peeling of the protective film from the wafer or chip. It gets expensive.

The acrylic resin (b) preferably has a structural unit derived from 4-(meth)acryloylmorpholine and other structural units. That is, the acrylic resin (b) is preferably a copolymer of 4-(meth)acryloylmorpholine and other monomers or oligomers.

In the acrylic resin (b), the proportion of the structural unit derived from 4-(meth)acryloylmorpholine to the total amount of structural units is preferably 10 to 30% by mass, and 13 to 30% by mass. More preferably, it may be 18 to 30% by mass or 23 to 30% by mass.

At least a portion of the acrylic resin (b) may be crosslinked with a crosslinking agent, or may not be crosslinked.

Examples of the acrylic monomer constituting the acrylic resin (b) include (meth)acrylic acid alkyl esters, (meth)acrylic esters having a cyclic skeleton without functional groups, and (meth)acrylic acid containing glycidyl groups. (meth)acrylic esters such as esters, hydroxyl group-containing (meth)acrylic esters, substituted amino group-containing (meth)acrylic esters, carboxy group-containing (meth)acrylic esters, and amino group-containing (meth)acrylic esters; (Meth)acrylamide; Examples include (meth)acrylamide derivatives such as 4-(meth)acryloylmorpholine. Here, the term "substituted amino group" means a group having a structure in which one or two hydrogen atoms of the amino group are substituted with groups other than hydrogen atoms. Here, the term "functional group" means a group capable of reacting with another group (reactive functional group), such as a glycidyl group, a hydroxyl group, a substituted amino group, a carboxy group, or an amino group.

In this specification, "(meth)acrylic acid" is a concept that includes both "acrylic acid" and "methacrylic acid." The same applies to terms similar to (meth)acrylic acid. For example, "(meth)acrylate" is a concept that includes both "acrylate" and "methacrylate," and "(meth)acryloyl group" is a concept that includes both "acryloyl group" and "methacryloyl group".

In the present specification, when a structure in which one or more hydrogen atoms is substituted with a group other than a hydrogen atom in a certain specific compound is assumed, the compound having such a substituted structure is referred to as the above-mentioned specific compound. Referred to as a "derivative" of a compound.
In this specification, the term "group" includes not only an atomic group formed by bonding a plurality of atoms, but also a single atom.

Examples of the (meth)acrylic acid alkyl ester having no functional group and cyclic skeleton include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, and isopropyl (meth)acrylate. , n-butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, ( Heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, n-octyl (meth)acrylate, n-nonyl (meth)acrylate, isononyl (meth)acrylate, (meth) Decyl acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate (lauryl (meth)acrylate), tridecyl (meth)acrylate, tetradecyl (meth)acrylate (myristyl (meth)acrylate), (meth)acrylate ) Alkyl constituting an alkyl ester such as pentadecyl acrylate, hexadecyl (meth)acrylate (palmityl (meth)acrylate), heptadecyl (meth)acrylate, octadecyl (meth)acrylate (stearyl (meth)acrylate), etc. Examples include (meth)acrylic acid alkyl esters in which the group has a chain structure having 1 to 18 carbon atoms.

Examples of the (meth)acrylic ester having a cyclic skeleton without the functional group include cycloalkyl (meth)acrylic esters such as isobornyl (meth)acrylate and dicyclopentanyl (meth)acrylate;
(meth)acrylic acid aralkyl esters such as benzyl (meth)acrylate;
(meth)acrylic acid cycloalkenyl ester such as (meth)acrylic acid dicyclopentenyl ester;
Examples include (meth)acrylic acid cycloalkenyloxyalkyl esters such as (meth)acrylic acid dicyclopentenyloxyethyl ester.

Examples of the glycidyl group-containing (meth)acrylic ester include glycidyl (meth)acrylate.
Examples of the hydroxyl group-containing (meth)acrylic esters include (meth)acrylic acid alkyl esters that do not have the functional group and a cyclic skeleton, and (meth)acrylic esters that do not have the functional group and have a cyclic skeleton. Examples include those having a structure in which one or more hydrogen atoms are substituted with hydroxyl groups. Preferred examples of the hydroxyl group-containing (meth)acrylic ester include hydroxymethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 3-(meth)acrylate. Examples include hydroxypropyl, 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate.
Examples of the substituted amino group-containing (meth)acrylic ester include N-methylaminoethyl (meth)acrylate.

Examples of the non-acrylic monomer constituting the acrylic resin (b) include olefins such as ethylene and norbornene; vinyl acetate; and styrene.

Examples of the acrylic resin (b) at least partially crosslinked with a crosslinking agent include those obtained by reacting functional groups in the acrylic resin (b) with the crosslinking agent.
The functional group may be appropriately selected depending on the type of crosslinking agent, etc., and is not particularly limited. For example, when the crosslinking agent is a polyisocyanate compound, examples of the functional group include a hydroxyl group, a carboxy group, an amino group, and the like, and among these, a hydroxyl group is preferable because it has high reactivity with an isocyanate group. Further, when the crosslinking agent is an epoxy compound, examples of the functional group include a carboxyl group, an amino group, and the like, and among these, a carboxy group having high reactivity with an epoxy group is preferable. However, from the viewpoint of preventing corrosion of circuits on wafers and chips, it is preferable that the functional group is a group other than a carboxy group.

Examples of the acrylic resin (b) having the functional group include those obtained by polymerizing monomers having at least the functional group.
More specifically, the acrylic resin (b) having a functional group includes, for example, the glycidyl group-containing (meth)acrylic ester, the hydroxyl group-containing (meth)acrylic ester, and the substituted amino group-containing (meth)acrylic ester. In the meth)acrylic ester, the carboxy group-containing (meth)acrylic ester, the amino group-containing (meth)acrylic ester, and the non-acrylic monomer, one or more hydrogen atoms are the functional group. Examples include those obtained by polymerizing a monomer having a substituted structure and one or more monomers selected from the group consisting of the following.

In the acrylic resin (b), the ratio (content) of the structural units derived from the monomer having a functional group to the total amount of the structural units constituting the resin is preferably 1 to 20% by mass, More preferably, it is 2 to 10% by mass. When the ratio is within such a range, the degree of crosslinking in the acrylic resin (b) is within a more preferable range.

The weight average molecular weight (Mw) of the acrylic resin (b) is preferably 10,000 or more, more preferably 20,000 or more, and preferably 40,000 or more, from the viewpoint of further suppressing bleed-out during the reflow process. More preferred. The weight average molecular weight (Mw) of the acrylic resin (b) is preferably 10,000 to 2,000,000, more preferably 100,000 to 1,500,000, from the viewpoint of better film-forming properties of composition (IV).

The composition (IV) and the protective film-forming film may contain only one type of acrylic resin (b), or may contain two or more types, and when they are two or more types, their Combinations and ratios can be selected arbitrarily.

In composition (IV), the ratio of the content of acrylic resin (b) to the total content of all components other than the solvent (i.e., the ratio of the content of acrylic resin (b) to the total mass of the protective film-forming film in the protective film-forming film) The content ratio of b) is preferably 8% by mass or more, more preferably 10% by mass or more, for example, even if it is 12% by mass or more and 14% by mass or more. good.

In composition (IV), the ratio of the content of acrylic resin (b) to the total content of all components other than the solvent (i.e., the ratio of the content of acrylic resin (b) to the total mass of the protective film-forming film in the protective film-forming film) The upper limit of b) content ratio) is not particularly limited. The upper limit may be 27% by mass or less, and 25% by mass or less, in that the protective film exhibits the property of suppressing bleed-out due to the reflow process and other properties in a well-balanced manner. The content is preferably 23% by mass or less, more preferably 21% by mass or less, and even more preferably 21% by mass or less.

In composition (IV), the ratio of the content of acrylic resin (b) to the total content of all components other than the solvent (i.e., the ratio of the content of acrylic resin (b) to the total mass of the protective film-forming film in the protective film-forming film) The content ratio of b) can be adjusted as appropriate within a range set by arbitrarily combining any of the above-mentioned lower limit values and upper limit values.
For example, in one embodiment, the proportion is preferably 8 to 27% by weight, more preferably 10 to 25% by weight, 12 to 23% by weight, and 14 to 21% by weight. There may be.

When the composition (IV) and the protective film-forming film contain the energy ray-curable component (a) and the acrylic resin (b), in the composition (IV) and the protective film-forming film, the energy ray-curable component (a) The content is preferably 70 to 310 parts by mass, more preferably 80 to 280 parts by mass, and 85 to 250 parts by mass based on 100 parts by mass of the acrylic resin (b). It is more preferable.

In composition (IV), the ratio of the total content of the energy ray curable component (a) and the acrylic resin (b) to the total content of all components other than the solvent (i.e., the ratio of the total content of the energy ray curable component (a) and the acrylic resin (b) in the protective film forming film) The ratio of the total content of the energy beam curable component (a) and the acrylic resin (b) to the total mass of the formed film is preferably 10 to 60% by mass, for example, 20 to 50% by mass, and It may be anywhere from 30 to 45% by mass. When the ratio is within such a range, the effect of using the energy ray curable component (a) and the acrylic resin (b) becomes higher.

[Other ingredients]
The composition (IV) and the protective film-forming film contain other components that do not fall under either the energy ray curable component (a) or the acrylic resin (b) within a range that does not impair the effects of the present invention. May contain.
The other components include, for example, a photopolymerization initiator (c); an inorganic filler (d); a coupling agent (e); a crosslinking agent (f); a coloring agent (g); a thermosetting component (h) ; General purpose additive (z); Polymer (b0) that does not fall under the acrylic resin (b) and does not have an energy ray curable group (herein referred to as "other polymer that does not have an energy ray curable group") (b0)" or "polymer (b0)").

(Photopolymerization initiator (c))
When the composition (IV) and the protective film-forming film contain the photopolymerization initiator (c), the polymerization (curing) reaction of the energy ray-curable component (a) can proceed efficiently.

Examples of the photopolymerization initiator include benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin benzoic acid, benzoin methyl benzoate, and benzoin dimethyl ketal; acetophenone, 2-hydroxy -2-Methyl-1-phenylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethan-1-one, 2-hydroxy-1-(4-(4-(2-hydroxy-2- Acetophenone compounds such as methylpropionyl)benzyl)phenyl)-2-methylpropan-1-one, 2-(dimethylamino)-1-(4-morpholinophenyl)-2-benzyl-1-butanone; bis(2,4 , 6-trimethylbenzoyl) phenylphosphine oxide, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, and other acylphosphine oxide compounds; benzyl phenyl sulfide, tetramethylthiuram monosulfide, and other sulfide compounds; 1-hydroxycyclohexylphenyl α-ketol compounds such as ketones; azo compounds such as azobisisobutyronitrile; titanocene compounds such as titanocene; thioxanthone compounds such as thioxanthone; peroxide compounds; diketone compounds such as diacetyl; benzyl; dibenzyl; benzophenone; 2,4 -diethylthioxanthone; 1,2-diphenylmethane; 2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propanone; and quinone compounds such as 1-chloroanthraquinone and 2-chloroanthraquinone.
Examples of the photopolymerization initiator include photosensitizers such as amines.

The composition (IV) and the protective film-forming film may contain only one type of photopolymerization initiator (c), or two or more types, and when they are two or more types, their Combinations and ratios can be selected arbitrarily. For example, a highly reactive photopolymerization initiator that is liquid at room temperature, such as 2-hydroxy-2-methyl-1-phenylpropan-1-one, can be used alone to efficiently crosslink the protective film-forming film. This makes it possible to increase the gel fraction. Low-reactivity light such as 2-hydroxy-1-(4-(4-(2-hydroxy-2-methylpropionyl)benzyl)phenyl)-2-methylpropan-1-one, 1-hydroxycyclohexyl-phenylketone, etc. The polymerization initiator can be used in combination with a highly reactive photopolymerization initiator such as 2-(dimethylamino)-1-(4-morpholinophenyl)-2-benzyl-1-butanone to efficiently form a protective film. This makes it possible to crosslink the gel fraction by increasing the gel fraction.

When using the photopolymerization initiator (c), in the composition (IV), the content of the photopolymerization initiator (c) is 0.00 parts by mass based on 100 parts by mass of the energy ray-curable component (a). The amount is preferably 1 to 20 parts by weight, more preferably 1 to 10 parts by weight, and particularly preferably 2 to 5 parts by weight.

(Inorganic filler (d))
When the composition (IV) and the protective film-forming film contain an inorganic filler (d), the protective film can be formed by adjusting the amount of the inorganic filler (d) in the composition (IV) and the protective film-forming film. The thermal expansion coefficient of the cured product of the formed film (eg, protective film) can be more easily adjusted. For example, by optimizing the thermal expansion coefficient of the protective film with respect to the object on which the protective film is formed, the reliability of a package obtained using the protective film-forming film is further improved. Furthermore, by using a protective film-forming film containing the inorganic filler (d), it is possible to reduce the moisture absorption rate of the cured product of the protective film-forming film (for example, the protective film) and improve the heat dissipation properties. can.

Examples of the inorganic filler (d) include powders of inorganic materials such as silica, alumina, talc, calcium carbonate, titanium white, red iron, silicon carbide, and boron nitride; beads made of these inorganic materials; Examples include surface-modified products; single crystal fibers of these inorganic materials; glass fibers, etc. In addition, examples of surface-modified products include methoxy modification, epoxy modification, and phenyl modification.
Among these, the inorganic filler (d) is preferably silica or alumina.

The composition (IV) and the protective film-forming film may contain only one type of inorganic filler (d), or two or more types, and when they are two or more types, a combination thereof. and the ratio can be selected arbitrarily.

In the composition (IV), the ratio of the content of the inorganic filler (d) to the total content of all components other than the solvent (i.e., the ratio of the content of the inorganic filler (d) to the total mass of the protective film-forming film in the protective film-forming film) The content ratio of material (d) is preferably 35 to 75% by mass, and may be, for example, 45 to 70% by mass or 50 to 65% by mass. When the ratio is within this range, the effect of using the inorganic filler (d) becomes higher without impairing the properties of the protective film-forming film.

(Coupling agent (e))
When the composition (IV) and the protective film-forming film contain a coupling agent (e) having a functional group capable of reacting with an inorganic compound or an organic compound, the adhesion and adhesion of the protective film-forming film to the adherend will improve. Furthermore, the cured product of the protective film-forming film (for example, a protective film) has improved water resistance without impairing heat resistance.

The coupling agent (e) is preferably a compound having a functional group that can react with the functional group of the acrylic resin (b), the energy ray curable component (a), etc., and is preferably a silane coupling agent. More preferred.
Preferred examples of the silane coupling agent include 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxypropylmethyldiethoxysilane, 3-glycidyloxypropyltriethoxysilane, 3-glycidyloxymethyldiethoxysilane, and 2-glycidyloxypropyltriethoxysilane. (3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-(2-aminoethylamino)propyltrimethoxysilane, 3-(2-amino ethylamino)propylmethyldiethoxysilane, 3-(phenylamino)propyltrimethoxysilane, 3-anilinopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropylmethyl Examples include dimethoxysilane, bis(3-triethoxysilylpropyl)tetrasulfane, methyltrimethoxysilane, methyltriethoxysilane, vinyltrimethoxysilane, vinyltriacetoxysilane, and imidazolesilane.

The composition (IV) and the protective film-forming film may contain only one kind of coupling agent (e), or two or more kinds, and when they are two or more kinds, a combination thereof. and the ratio can be selected arbitrarily.

When using the coupling agent (e), in the composition (IV) and the protective film forming film, the content of the coupling agent (e) is the total content of the energy ray curable component (a) and the acrylic resin (b). The amount is preferably 0.03 to 20 parts by weight per 100 parts by weight. When the content of the coupling agent (e) is at least the lower limit, the dispersibility of the inorganic filler (d) in the resin is improved, and the adhesion of the protective film forming film to the adherend is improved. The effect of using the coupling agent (e) can be more clearly obtained. When the content of the coupling agent (e) is less than or equal to the upper limit, the generation of outgas is further suppressed.

(Crosslinking agent (f))
When using an acrylic resin (b) having a functional group such as a vinyl group, (meth)acryloyl group, amino group, hydroxyl group, carboxyl group, or isocyanate group that can bond with other compounds, composition (IV) and The protective film forming film may contain a crosslinking agent (f). The crosslinking agent (f) is a component for bonding and crosslinking the functional groups in the acrylic resin (b) with other compounds, and by crosslinking in this way, the initial adhesive strength and Cohesive force can be adjusted.

Examples of the crosslinking agent (f) include organic polyvalent isocyanate compounds, organic polyvalent imine compounds, metal chelate crosslinking agents (crosslinking agents having a metal chelate structure), aziridine crosslinking agents (crosslinking agents having an aziridinyl group), etc. can be mentioned.

Examples of the organic polyvalent isocyanate compounds include aromatic polyvalent isocyanate compounds, aliphatic polyvalent isocyanate compounds, and alicyclic polyvalent isocyanate compounds (hereinafter, these compounds are collectively referred to as "aromatic polyvalent isocyanate compounds, etc."). trimer, isocyanurate, and adduct of the aromatic polyvalent isocyanate compound, etc.; terminal isocyanate urethane prepolymer obtained by reacting the aromatic polyvalent isocyanate compound, etc. with a polyol compound etc. The "adduct" is an adduct of the aromatic polyvalent isocyanate compound, aliphatic polyvalent isocyanate compound, or alicyclic polyvalent isocyanate compound and a lower compound such as ethylene glycol, propylene glycol, neopentyl glycol, trimethylolpropane, or castor oil. Molecularly refers to a reactant with an active hydrogen-containing compound. Examples of the adduct include xylylene diisocyanate adducts of trimethylolpropane as described below. Moreover, the term "terminal isocyanate urethane prepolymer" means a prepolymer having a urethane bond and an isocyanate group at the end of the molecule.

More specifically, the organic polyvalent isocyanate compound includes, for example, 2,4-tolylene diisocyanate; 2,6-tolylene diisocyanate; 1,3-xylylene diisocyanate; 1,4-xylylene diisocyanate; diphenylmethane-4 ,4'-diisocyanate; diphenylmethane-2,4'-diisocyanate; 3-methyldiphenylmethane diisocyanate; hexamethylene diisocyanate; isophorone diisocyanate; dicyclohexylmethane-4,4'-diisocyanate; dicyclohexylmethane-2,4'-diisocyanate; trimethylol Compounds in which one or more of tolylene diisocyanate, hexamethylene diisocyanate, and xylylene diisocyanate are added to all or some of the hydroxyl groups of a polyol such as propane; examples include lysine diisocyanate.

Examples of the organic polyvalent imine compound include N,N'-diphenylmethane-4,4'-bis(1-aziridinecarboxamide), trimethylolpropane-tri-β-aziridinylpropionate, and tetramethylolmethane. -tri-β-aziridinylpropionate, N,N'-toluene-2,4-bis(1-aziridinecarboxamide)triethylenemelamine, and the like.

When using an organic polyvalent isocyanate compound as the crosslinking agent (f), it is preferable to use a hydroxyl group-containing polymer as the acrylic resin (b). When the crosslinking agent (f) has an isocyanate group and the acrylic resin (b) has a hydroxyl group, a crosslinked structure can be easily introduced into the protective film forming film by the reaction between the crosslinking agent (f) and the acrylic resin (b). can.

The composition (IV) and the protective film-forming film may contain only one type of crosslinking agent (f), or two or more types, and when they are two or more types, a combination thereof and The ratio can be selected arbitrarily.

When using the crosslinking agent (f), in the composition (IV), the content of the crosslinking agent (f) is 0.01 to 20 parts by mass based on 100 parts by mass of the acrylic resin (b). It is preferable. When the content of the crosslinking agent (f) is at least the lower limit, the effect of using the crosslinking agent (f) can be more significantly obtained. Excessive use of the crosslinking agent (f) is suppressed because the content of the crosslinking agent (f) is below the upper limit.

(Coloring agent (g))
The composition (IV) and the protective film forming film preferably contain an inorganic pigment as the colorant (g). By adjusting the content of the inorganic pigment, the near-infrared rays transmittance of the protective film-forming film, particularly near-infrared rays with a wavelength of 1300 nm, can be adjusted.

Examples of the inorganic pigments include carbon black, titanium black, zirconium nitride, cobalt pigments, iron pigments, chromium pigments, titanium pigments, vanadium pigments, zirconium pigments, molybdenum pigments, ruthenium pigments, Examples include platinum-based dyes, ITO (indium tin oxide)-based dyes, and ATO (antimony tin oxide)-based dyes. Among these, carbon black, titanium black, and zirconium nitride are preferred, and it is particularly preferred to use carbon black and titanium black in combination. Carbon black is inexpensive, and titanium black does not easily reduce the energy ray curability of the protective film forming film. Furthermore, compared to carbon black, zirconium nitride is less likely to increase the heat storage properties of the protective film-forming film and the protective film-forming layer, so it can prevent shrinkage due to heat during energy beam curing.

The content of the inorganic pigment in the composition (IV) and the protective film-forming film may be adjusted as appropriate so that the transmittance of near-infrared rays at a wavelength of 1300 nm is suitable. For example, in composition (IV), the ratio of the content of the colorant (g) to the total content of all components other than the solvent (i.e., the ratio of the coloring agent (g) to the total mass of the protective film-forming film in the protective film-forming film) The content ratio of the agent (g) is preferably 0.05% by mass or more and less than 5% by mass, more preferably 0.05 to 4% by mass, and 0.1 to 3% by mass. It is particularly preferable that there be. When the ratio is greater than or equal to the lower limit, the effect of using the colorant (g) can be more prominently obtained. When the ratio is below the upper limit, excessive use of the colorant (g) is suppressed. Further, by using a plurality of colorants in combination, it becomes easier to adjust the transmittance for each wavelength, and it becomes possible to improve the cost balance.

As the colorant (g), in addition to inorganic pigments, known ones such as organic pigments and organic dyes may be contained.
Examples of the organic pigments and organic dyes include aminium dyes, cyanine dyes, merocyanine dyes, croconium dyes, squalium dyes, azulenium dyes, polymethine dyes, naphthoquinone dyes, pyrylium dyes, and phthalocyanine. dyes, naphthalocyanine dyes, naphtholactam dyes, azo dyes, condensed azo dyes, indigo dyes, perinone dyes, perylene dyes, dioxazine dyes, quinacridone dyes, isoindolinone dyes, quinophthalone dyes , pyrrole dyes, thioindigo dyes, metal complex dyes (metal complex salt dyes), dithiol metal complex dyes, indolephenol dyes, triallylmethane dyes, anthraquinone dyes, naphthol dyes, azomethine dyes, benzimidazo Examples include ron-based dyes, pyranthrone-based dyes, and threne-based dyes.

Further, by adjusting the content of the colorant (g), for example, the visibility of the laser mark when laser marking is performed on the protective film forming film or the protective film can be adjusted. Furthermore, the design of the protective film can be improved, and grinding marks on the back surface of the wafer can be made less visible.

The composition (IV) and the protective film-forming film may contain only one type of colorant (g), or two or more types, and when they are two or more types, a combination thereof and The ratio can be selected arbitrarily.

(Thermosetting component (h))
When the composition (IV) and the protective film-forming film contain the energy ray-curable component (a) and the thermosetting component (h), the adhesive strength of the protective film-forming film to the adherend is improved by heating. The strength of the cured product of this protective film-forming film (for example, a protective film) is also improved.

Examples of the thermosetting component (h) include epoxy thermosetting resins, polyimide resins, unsaturated polyester resins, and the like, with epoxy thermosetting resins being preferred.

The epoxy thermosetting resin includes an epoxy resin (h1) and a thermosetting agent (h2).
The composition (IV) and the protective film forming film may contain only one type of epoxy thermosetting resin, or may contain two or more types, and in the case of two or more types, a combination thereof. and the ratio can be selected arbitrarily.

・Epoxy resin (h1)
Examples of the epoxy resin (h1) include known ones, such as polyfunctional epoxy resins, biphenyl compounds, bisphenol A diglycidyl ether and hydrogenated products thereof, orthocresol novolak epoxy resins, dicyclopentadiene type epoxy resins, Examples include epoxy compounds having two or more functionalities, such as biphenyl type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, and phenylene skeleton type epoxy resin.

As the epoxy resin (h1), an epoxy resin having an unsaturated hydrocarbon group may be used. Epoxy resins having unsaturated hydrocarbon groups have higher compatibility with acrylic resins than epoxy resins having no unsaturated hydrocarbon groups. Therefore, by using an epoxy resin having an unsaturated hydrocarbon group, the reliability of the chip with a protective film obtained using the composite sheet for forming a protective film is improved.

Examples of the epoxy resin having an unsaturated hydrocarbon group include a compound obtained by converting a part of the epoxy group of a polyfunctional epoxy resin into a group having an unsaturated hydrocarbon group. Such a compound can be obtained, for example, by adding (meth)acrylic acid or a derivative thereof to an epoxy group.
Examples of the epoxy resin having an unsaturated hydrocarbon group include compounds in which a group having an unsaturated hydrocarbon group is directly bonded to an aromatic ring constituting the epoxy resin. The unsaturated hydrocarbon group is a polymerizable unsaturated group, and specific examples thereof include ethenyl group (vinyl group), 2-propenyl group (allyl group), (meth)acryloyl group, (meth) Examples include an acrylamide group, and an acryloyl group is preferred.

The number average molecular weight of the epoxy resin (h1) is not particularly limited, but is preferably from 300 to 30,000, preferably from 300 to 10,000, from the viewpoint of curability of the protective film forming film, and strength and heat resistance of the protective film. It is more preferable that the number is within the range of 300 to 3000.
The epoxy equivalent of the epoxy resin (h1) is preferably 100 to 1000 g/eq, more preferably 150 to 950 g/eq.

The composition (IV) and the protective film-forming film may contain only one type of epoxy resin (h1), or two or more types, and when they are two or more types, a combination thereof and The ratio can be selected arbitrarily.

・Thermosetting agent (h2)
The thermosetting agent (h2) functions as a curing agent for the epoxy resin (h1).
Examples of the thermosetting agent (h2) include compounds having two or more functional groups capable of reacting with epoxy groups in one molecule. Examples of the functional group include a phenolic hydroxyl group, an alcoholic hydroxyl group, an amino group, a carboxy group, a group in which an acid group is anhydrified, and the like. It is preferably a group, and more preferably a phenolic hydroxyl group or an amino group.

Among the thermosetting agents (h2), examples of phenolic curing agents having a phenolic hydroxyl group include polyfunctional phenol resins, biphenols, novolac type phenolic resins, dicyclopentadiene type phenolic resins, aralkyl type phenolic resins, etc. .
Among the thermosetting agents (h2), examples of amine-based curing agents having an amino group include dicyandiamide.

The thermosetting agent (h2) may have an unsaturated hydrocarbon group.
As the thermosetting agent (h2) having an unsaturated hydrocarbon group, for example, a compound having a structure in which a part of the hydroxyl group of the phenol resin is replaced with a group having an unsaturated hydrocarbon group, , a compound having a structure in which a group having an unsaturated hydrocarbon group is directly bonded, and the like.
Examples of the unsaturated hydrocarbon group in the thermosetting agent (h2) include the same unsaturated hydrocarbon groups as in the epoxy resin having the above-mentioned unsaturated hydrocarbon group.

When using a phenolic curing agent as the thermosetting agent (h2), it is preferable that the thermosetting agent (h2) has a high softening point or glass transition temperature in order to improve the peelability of the protective film from the support sheet. preferable.

Among the thermosetting agents (h2), the number average molecular weight of resin components such as polyfunctional phenolic resins, novolac type phenolic resins, dicyclopentadiene type phenolic resins, and aralkyl type phenolic resins is preferably 300 to 30,000. , more preferably from 400 to 10,000, particularly preferably from 500 to 3,000.
Among the thermosetting agents (h2), the molecular weight of non-resin components such as biphenol and dicyandiamide is not particularly limited, but is preferably 60 to 500, for example.

The composition (IV) and the protective film-forming film may contain only one kind of thermosetting agent (h2), or two or more kinds, and when they are two or more kinds, a combination thereof. and the ratio can be selected arbitrarily.

When using the thermosetting component (h), in the composition (IV) and the protective film forming film, the content of the thermosetting agent (h2) is 0 with respect to 100 parts by mass of the epoxy resin (h1). The amount is preferably .1 to 100 parts by mass. When the content of the thermosetting agent (h2) is at least the lower limit, curing of the protective film forming film progresses more easily. When the content of the thermosetting agent (h2) is below the upper limit, the moisture absorption rate of the protective film forming film is reduced, and the reliability of the package obtained using the chip with a protective film is further improved. .

When using a thermosetting component (h), in the composition (IV) and the protective film forming film, the content of the thermosetting component (h) (for example, the total amount of the epoxy resin (h1) and the thermosetting agent (h2)) The content is preferably 5 to 120 parts by mass based on 100 parts by mass of the acrylic resin (b). When the content of the thermosetting component (h) is within such a range, for example, the adhesive force between the cured product of the protective film-forming film and the support sheet is suppressed, and the releasability of the support sheet is improved. .

(General purpose additive (z))
The general-purpose additive (z) may be a known one, can be arbitrarily selected depending on the purpose, and is not particularly limited. Preferred general-purpose additives (z) include, for example, plasticizers, antistatic agents, antioxidants, gettering agents, and ultraviolet absorbers.

The composition (IV) and the protective film-forming film may contain only one type of general-purpose additive (z), or may contain two or more types, and in the case of two or more types, a combination thereof. and the ratio can be selected arbitrarily.

When using a general-purpose additive (z), the content of the general-purpose additive (z) in the composition (IV) and the protective film-forming film is not particularly limited, and may be appropriately selected depending on the purpose.
For example, when the general-purpose additive (z) is an ultraviolet absorber, the content of the general-purpose additive (z) (ultraviolet absorber) in the total content of all components other than the solvent in the composition (IV) is The ratio of the amount (i.e., the ratio of the content of the general-purpose additive (z) (ultraviolet absorber) to the total mass of the protective film-forming film in the protective film-forming film) is 0.1 to 5% by mass. is preferred. When the ratio is equal to or higher than the lower limit, the effect of using the general-purpose additive (z) can be more significantly obtained. When the ratio is equal to or less than the upper limit, excessive use of the general-purpose additive (z) is suppressed.

(Other polymers (b0) that do not have energy ray-curable groups)
The other polymer (b0) having no energy ray-curable group imparts film-forming properties to the protective film-forming film.
The polymer (b0) is not particularly limited as long as it does not fall under the acrylic resin (b).
The polymer (b0) may be at least partially crosslinked with a crosslinking agent or may not be crosslinked.

Examples of the polymer (b0) include acrylic resins having a weight average molecular weight of more than 1,100,000, and acrylic resins having a dispersity of 3.0 or less (in this specification, these acrylic resins are referred to as "other acrylic resins"). ); Examples include polymers other than acrylic resins that do not have energy ray-curable groups.

Does the other acrylic resin have a weight average molecular weight of more than 1,100,000? Alternatively, examples may include those similar to the acrylic resin (b) except that the degree of dispersion is 3.0 or less.

Examples of polymers other than acrylic resins that do not have energy ray-curable groups include urethane resins, phenoxy resins, silicone resins, and saturated polyester resins.

The weight average molecular weight (Mw) of the polymer other than acrylic resin, which does not have an energy ray-curable group, is preferably 10,000 to 2,000,000, from the viewpoint of better film-forming properties of composition (IV). More preferably, it is 100,000 to 1,500,000.

The composition (IV) and the protective film-forming film may contain only one type of polymer (b0), or two or more types, and when they are two or more types, a combination thereof. and the ratio can be selected arbitrarily.

In the composition (IV) and the protective film forming film, the content of the polymer (b0) is preferably 5 parts by mass or less, and 3 parts by mass based on 100 parts by mass of the acrylic resin (b). It is more preferable that the amount is below, further preferably 1 part by weight or less, and particularly preferably 0 part by weight, that is, the composition (IV) and the protective film forming film do not contain the polymer (b0). preferable. When the content of the polymer (b0) is equal to or less than the upper limit, the above-mentioned effect of suppressing peeling of the protective film from the wafer or chip becomes higher.

[solvent]
It is preferable that composition (IV) further contains a solvent. Composition (IV) containing a solvent has good handling properties.
The solvent is not particularly limited, but preferable examples include hydrocarbons such as toluene and xylene; alcohols such as methanol, ethanol, 2-propanol, isobutyl alcohol (2-methylpropan-1-ol), and 1-butanol. ; esters such as ethyl acetate; ketones such as acetone and methyl ethyl ketone; ethers such as tetrahydrofuran; and amides (compounds having an amide bond) such as dimethylformamide and N-methylpyrrolidone.
Composition (IV) may contain only one kind of solvent, or may contain two or more kinds of solvents, and when there are two or more kinds of solvents, the combination and ratio thereof can be arbitrarily selected.

Among the solvents contained in composition (IV), more preferable ones include, for example, methyl ethyl ketone and the like, since the components contained in composition (IV) can be mixed more uniformly.

The content of the solvent in composition (IV) is not particularly limited, and may be appropriately selected depending on the types of components other than the solvent, for example.

<<Method for producing composition for forming protective film>>
An energy ray-curable protective film-forming composition such as composition (IV) can be obtained by blending the constituent components.
The order in which each component is added when blending is not particularly limited, and two or more components may be added at the same time.
The method of mixing each component at the time of compounding is not particularly limited, and may be any known method, such as mixing by rotating a stirrer or stirring blade; mixing by using a mixer; or mixing by applying ultrasonic waves. You can select it as appropriate.
The temperature and time during addition and mixing of each component are not particularly limited as long as each component does not deteriorate, and may be adjusted as appropriate, but the temperature is preferably 15 to 30°C.

FIG. 1 is a cross-sectional view schematically showing an example of the protective film-forming film of this embodiment. Note that the figures used in the following explanation may show important parts enlarged for convenience in order to make it easier to understand the features of the present invention, and the dimensional ratio of each component may be the same as the actual one. It doesn't necessarily have to be.

The protective film forming film 13 shown here includes a first release film 151 on one surface (sometimes referred to as "first surface" in this specification) 13a, and the first surface 13a is different from the first surface 13a. A second release film 152 is provided on the other surface (sometimes referred to as "second surface" in this specification) 13b on the opposite side.
Such a protective film forming film 13 is suitable for storing as a roll, for example.

The protective film forming film 13 has the above-mentioned characteristics.
The protective film forming film 13 can be formed using the above-mentioned composition for forming a protective film.

Both the first release film 151 and the second release film 152 may be known ones. The first release film 151 and the second release film 152 may be the same or different from each other, such as having different peeling forces when peeled from the protective film forming film 13. Good too.

In the protective film forming film 13 shown in FIG. 1, either the first release film 151 or the second release film 152 is removed, and the resulting exposed surface becomes the surface to be attached to the back surface of a wafer (not shown). Then, the other of the first release film 151 and the second release film 152 is removed, and the resulting exposed surface becomes a surface to which a support sheet or dicing sheet, which will be described later, is attached.

Although FIG. 1 shows an example in which the release film is provided on both sides (first surface 13a, second surface 13b) of the protective film-forming film 13, the release film may be provided on either of the protective film-forming films 13. It may be provided only on one surface, that is, only on the first surface 13a or only on the second surface 13b.

The protective film-forming film of this embodiment can be attached to the back surface of a wafer without being used together with a support sheet, which will be described later. In that case, a release film may be provided on the surface of the protective film forming film opposite to the surface to which it is attached to the wafer, and this release film may be removed at an appropriate timing.

On the other hand, the protective film-forming film of this embodiment can be used in combination with a support sheet to be described later to constitute a composite sheet for forming a protective film, which can perform both the formation of a protective film and dicing. Hereinafter, such a composite sheet for forming a protective film will be explained.

◇Composite sheet for forming a protective film A composite sheet for forming a protective film according to an embodiment of the present invention includes a support sheet and a protective film-forming film provided on one surface of the support sheet, The protective film-forming film is the protective film-forming film according to one embodiment of the present invention described above.
The protective film-forming composite sheet of the present embodiment includes the protective film-forming film, so that when the protective film-forming film is cured with energy rays, the degree of curing of the protective film-forming film is within a suitable range. This improves the adhesion between the protective film and the silicon wafer, and prevents the protective film from peeling off.

In this specification, even after the protective film-forming film is cured, as long as the laminated structure of the support sheet and the cured product of the protective film-forming film is maintained, this laminated structure is referred to as "protective film". "Composite sheet for forming".

Hereinafter, each layer constituting the composite sheet for forming a protective film will be explained in detail.

◎Support Sheet The support sheet may be composed of one layer (single layer) or may be composed of two or more layers. When the support sheet consists of multiple layers, the constituent materials and thicknesses of these multiple layers may be the same or different from each other, and the combination of these multiple layers is not particularly limited as long as the effects of the present invention are not impaired.

The support sheet is preferably transparent, and may be colored depending on the purpose.
In this embodiment, where the protective film-forming film has energy ray curability, the support sheet is preferably one that allows energy rays to pass therethrough.

Examples of the support sheet include those comprising a base material and an adhesive layer provided on one surface of the base material; those consisting only of the base material; and the like. When the support sheet is provided with an adhesive layer, the adhesive layer is arranged between the base material and the protective film-forming film in the protective film-forming composite sheet.

When a support sheet including a base material and an adhesive layer is used, it is possible to easily adjust the adhesion and releasability between the support sheet and the protective film-forming film in the protective film-forming composite sheet.
When a support sheet consisting only of a base material is used, a composite sheet for forming a protective film can be manufactured at low cost.

Examples of the composite sheet for forming a protective film according to the present embodiment will be described below for each type of support sheet with reference to the drawings.

FIG. 2 is a cross-sectional view schematically showing an example of the composite sheet for forming a protective film according to the present embodiment.
In the figures after FIG. 2, the same components as those shown in the already explained figures are given the same reference numerals as in the already explained figures, and detailed explanation thereof will be omitted.

The composite sheet 101 for forming a protective film shown here includes a support sheet 10 and a protective film provided on one surface (herein sometimes referred to as "first surface") 10a of the support sheet 10. A forming film 13 is provided.
The support sheet 10 includes a base material 11 and an adhesive layer 12 provided on one surface (first surface) 11a of the base material 11. In the protective film-forming composite sheet 101, the adhesive layer 12 is arranged between the base material 11 and the protective film-forming film 13.
That is, the composite sheet 101 for forming a protective film is constructed by laminating the base material 11, the adhesive layer 12, and the protective film forming film 13 in this order in the thickness direction thereof.
The first surface 10a of the support sheet 10 is the same as the surface 12a of the adhesive layer 12 on the side opposite to the base material 11 (herein sometimes referred to as "first surface").

The protective film forming composite sheet 101 further includes a jig adhesive layer 16 and a release film 15 on the protective film forming film 13.
In the protective film-forming composite sheet 101, the protective film-forming film 13 is laminated on the entire surface or almost the entire surface of the first surface 12a of the adhesive layer 12, and the protective film-forming film 13 is laminated on the opposite side from the adhesive layer 12 side. A jig adhesive layer 16 is laminated on a part of the surface (sometimes referred to as "first surface" in this specification) 13a, that is, a region near the peripheral edge. Further, a region of the first surface 13a of the protective film forming film 13 on which the jig adhesive layer 16 is not laminated, and a surface of the jig adhesive layer 16 on the opposite side from the protective film forming film 13 side. A release film 15 is laminated on the surface 16a (which may be referred to as the "first surface" in this specification). A support sheet 10 is provided on a surface 13b of the protective film forming film 13 opposite to the first surface 13a (herein sometimes referred to as a "second surface").

Not only in the case of the composite sheet for forming a protective film 101, but also in the composite sheet for forming a protective film of this embodiment, the release film (for example, the release film 15 shown in FIG. 1) has an arbitrary structure, and the structure of the release film of this embodiment is The composite sheet for forming a protective film may or may not be provided with a release film.

The jig adhesive layer 16 is used to fix the protective film forming composite sheet 101 to a jig such as a ring frame.
The jig adhesive layer 16 may have, for example, a single layer structure containing an adhesive component, or may have a sheet serving as a core material and a sheet containing an adhesive component provided on both sides of the sheet. It may have a multi-layer structure including a layer.

In the protective film forming composite sheet 101, the back surface of the wafer is attached to the first surface 13a of the protective film forming film 13 with the release film 15 removed, and the first surface of the jig adhesive layer 16 is attached. 16a is used by being attached to a jig such as a ring frame.

FIG. 3 is a cross-sectional view schematically showing another example of the composite sheet for forming a protective film according to the present embodiment. In the protective film forming composite sheet 102 shown here, the shape and size of the protective film forming film are different, and the jig adhesive layer is not on the first surface of the protective film forming film but on the first surface of the adhesive layer. It is the same as the protective film forming composite sheet 101 shown in FIG. 2 except that it is laminated.

More specifically, in the protective film-forming composite sheet 102, the protective film-forming film 23 is formed in a part of the first surface 12a of the adhesive layer 12, that is, in the width direction of the adhesive layer 12 (in FIG. They are laminated in the center region in the left-right direction). Furthermore, a jig adhesive is applied to an area of the first surface 12a of the adhesive layer 12 where the protective film forming film 23 is not laminated so as to surround the protective film forming film 23 from the outside in the width direction without contacting the area. Agent layers 16 are laminated. Then, a surface 23a of the protective film forming film 23 opposite to the adhesive layer 12 side (in this specification, may be referred to as a "first surface") and a first surface of the jig adhesive layer 16. A release film 15 is laminated on the surface 16a. The support sheet 10 is provided on a surface 23b of the protective film forming film 23 opposite to the first surface 23a (herein sometimes referred to as "second surface").

FIG. 4 is a cross-sectional view schematically showing still another example of the composite sheet for forming a protective film of this embodiment.
The composite sheet 103 for forming a protective film shown here is the same as the composite sheet 102 for forming a protective film shown in FIG. 3, except that it does not include the jig adhesive layer 16.

FIG. 5 is a cross-sectional view schematically showing still another example of the composite sheet for forming a protective film according to the present embodiment.
The composite sheet 104 for forming a protective film shown here is the same as the composite sheet 101 for forming a protective film shown in FIG. 2, except that it includes a support sheet 20 instead of the support sheet 10.

The support sheet 20 consists of only the base material 11.
That is, the protective film-forming composite sheet 104 is constructed by laminating the base material 11 and the protective film-forming film 13 in their thickness direction.
A surface (first surface) 20a of the support sheet 20 on the protective film forming film 13 side is the same as the first surface 11a of the base material 11.
The base material 11 has adhesiveness at least on its first surface 11a.

The composite sheet for forming a protective film of this embodiment is not limited to that shown in FIGS. 2 to 5, and some of the configurations of those shown in FIGS. 2 to 5 may be changed within a range that does not impair the effects of the present invention Alternatively, it may be deleted, or other configurations may be added to those described above.

Next, each layer constituting the support sheet will be explained in more detail.

○Substrate The base material is in the form of a sheet or a film, and its constituent materials include, for example, various resins.
Examples of the resin include polyethylene such as low-density polyethylene (LDPE), linear low-density polyethylene (LLDPE), and high-density polyethylene (HDPE); polyethylene other than polyethylene such as polypropylene, polybutene, polybutadiene, polymethylpentene, and norbornene resin. Polyolefin: Ethylene copolymers such as ethylene-vinyl acetate copolymer, ethylene-(meth)acrylic acid copolymer, ethylene-(meth)acrylic acid ester copolymer, and ethylene-norbornene copolymer (ethylene as a monomer) polyvinyl chloride, vinyl chloride resins such as vinyl chloride copolymers (resins obtained using vinyl chloride as a monomer); polystyrene; polycycloolefin; polyethylene terephthalate, polyethylene Polyesters such as naphthalate, polybutylene terephthalate, polyethylene isophthalate, polyethylene-2,6-naphthalene dicarboxylate, and fully aromatic polyesters in which all constituent units have aromatic cyclic groups; combinations of two or more of the above polyesters. Polymer; poly(meth)acrylic ester; polyurethane; polyurethane acrylate; polyimide; polyamide; polycarbonate; fluororesin; polyacetal; modified polyphenylene oxide; polyphenylene sulfide; polysulfone; polyether ketone.
Examples of the resin include polymer alloys such as mixtures of the polyester and other resins. The polymer alloy of the polyester and other resin preferably has a relatively small amount of resin other than the polyester.
In addition, examples of the resin include, for example, a crosslinked resin obtained by crosslinking one or more of the resins exemplified above; modified ionomers using one or more of the resins exemplified above; Also mentioned are resins.

There may be only one type of resin constituting the base material, or two or more types may be used. When there are two or more types, the combination and ratio thereof can be arbitrarily selected.

The base material may be composed of one layer (single layer) or may be composed of two or more layers, and when it is composed of multiple layers, these multiple layers may be the same or different from each other. The combination of these multiple layers is not particularly limited.

The thickness of the base material is preferably 50 to 300 μm, more preferably 60 to 100 μm. When the thickness of the base material is within this range, the flexibility of the composite sheet for forming a protective film and the suitability for attachment to a wafer are further improved.
Here, the "thickness of the base material" means the thickness of the entire base material. For example, the thickness of a base material consisting of multiple layers refers to the total thickness of all the layers that make up the base material. means.

In addition to the main constituent materials such as the resin, the base material may contain various known additives such as fillers, colorants, antioxidants, organic lubricants, catalysts, and softeners (plasticizers).

The base material is preferably transparent, and may be colored depending on the purpose, or may have other layers deposited on it.
In this embodiment, where the protective film-forming film has energy ray curability, the base material is preferably one that transmits energy rays.

The base material is roughened by sandblasting, solvent treatment, etc. in order to adjust the adhesion with the layer provided thereon (for example, the adhesive layer, the protective film forming film, or the other layer mentioned above); corona The surface may be subjected to oxidation treatment such as discharge treatment, electron beam irradiation treatment, plasma treatment, ozone/ultraviolet irradiation treatment, flame treatment, chromic acid treatment, hot air treatment; lipophilic treatment; hydrophilic treatment, etc. Further, the surface of the base material may be subjected to primer treatment.

The base material may have adhesive properties on at least one surface by containing a specific range of components (for example, resin, etc.).

The base material can be manufactured by a known method. For example, a base material containing a resin can be manufactured by molding a resin composition containing the resin.

○Adhesive layer The adhesive layer is sheet-like or film-like, and contains an adhesive.
Examples of the adhesive include adhesive resins such as acrylic resin, urethane resin, rubber resin, silicone resin, epoxy resin, polyvinyl ether, polycarbonate, and ester resin.

In this specification, the term "adhesive resin" includes both adhesive resins and adhesive resins. For example, the above-mentioned adhesive resins include not only resins that are adhesive themselves, but also resins that exhibit adhesiveness when used in combination with other components such as additives, and resins that exhibit adhesiveness due to the presence of triggers such as heat or water. It also includes resins that show.

The adhesive layer may be composed of one layer (single layer) or may be composed of two or more layers, and when composed of multiple layers, these multiple layers may be the same or different from each other. The combination of these multiple layers is not particularly limited.

The thickness of the adhesive layer is not particularly limited, but is preferably 1 to 100 μm, more preferably 1 to 60 μm, and particularly preferably 1 to 30 μm.
Here, the "thickness of the adhesive layer" means the thickness of the entire adhesive layer. For example, the thickness of an adhesive layer consisting of multiple layers is the total thickness of all the layers that make up the adhesive layer. means the thickness of

The adhesive layer is preferably transparent, and may be colored depending on the purpose.
In this embodiment, where the protective film-forming film has energy ray curability, the adhesive layer preferably transmits energy rays.

The adhesive layer may be either energy ray curable or non-energy ray curable. The physical properties of the energy ray-curable pressure-sensitive adhesive layer can be adjusted before and after curing. For example, by curing an energy ray-curable adhesive layer before picking up a chip with a protective film, which will be described later, the chip with a protective film can be picked up more easily. When the adhesive layer is non-energy ray curable, it has high photostability and excellent storage stability.

The adhesive layer can be formed using an adhesive composition containing an adhesive. For example, a pressure-sensitive adhesive layer can be formed on a target site by applying a pressure-sensitive adhesive composition to a surface on which a pressure-sensitive adhesive layer is to be formed, and drying the composition as necessary. The content ratio of components that do not vaporize at room temperature in the adhesive composition is usually the same as the content ratio of the components in the adhesive layer.

Coating and drying of the adhesive composition can be performed, for example, in the same manner as in the case of coating and drying the above-mentioned composition for forming a protective film.

When providing a pressure-sensitive adhesive layer on a base material, for example, a pressure-sensitive adhesive composition may be coated on the base material and dried if necessary. Alternatively, for example, an adhesive layer may be formed on the release film by coating an adhesive composition on the release film and drying as necessary, and the exposed surface of this adhesive layer may be applied to the base material. An adhesive layer may be laminated on the base material by bonding it to one surface of the base material. In this case, the release film may be removed either during the manufacturing process or during the use process of the composite sheet for forming a protective film.

When the adhesive layer is energy ray curable, the energy ray curable adhesive composition may be, for example, non-energy ray curable adhesive resin (I-1a) (hereinafter referred to as "adhesive resin (I-1a)"). Adhesive composition (I-1) containing a non-energy ray curable adhesive resin (I-1a); An adhesive composition (I-2a) containing an energy ray-curable adhesive resin (I-2a) (hereinafter sometimes abbreviated as "adhesive resin (I-2a)") into which an unsaturated group has been introduced. 2); Examples include a pressure-sensitive adhesive composition (I-3) containing the pressure-sensitive adhesive resin (I-2a) and an energy ray-curable compound.

When the adhesive layer is non-energy ray curable, examples of the non-energy ray curable adhesive composition include an adhesive composition containing the above-mentioned non-energy ray curable adhesive resin (I-1a). (I-4) etc.

[Non-energy ray-curable adhesive resin (I-1a)]
The adhesive resin (I-1a) is preferably an acrylic resin.

Examples of the acrylic resin include acrylic polymers having at least a structural unit derived from an alkyl (meth)acrylate ester.
Examples of the (meth)acrylic acid alkyl ester include those in which the alkyl group constituting the alkyl ester has 1 to 20 carbon atoms, and the alkyl group is linear or branched. is preferred.

It is preferable that the acrylic polymer further has a structural unit derived from a functional group-containing monomer in addition to the structural unit derived from the (meth)acrylic acid alkyl ester.
The functional group-containing monomer may, for example, act as a starting point for crosslinking by reacting with a crosslinking agent described later, or may act as an isocyanate group, glycidyl group, etc. in an unsaturated group-containing compound described later. Examples include those that can introduce unsaturated groups into the side chains of acrylic polymers by reacting with functional groups.

Examples of the functional group-containing monomer include hydroxyl group-containing monomers, carboxyl group-containing monomers, amino group-containing monomers, and epoxy group-containing monomers.

In addition to the structural units derived from the (meth)acrylic acid alkyl ester and the structural units derived from the functional group-containing monomer, the acrylic polymer may further contain structural units derived from other monomers.
The other monomers are not particularly limited as long as they can be copolymerized with (meth)acrylic acid alkyl ester and the like.
Examples of the other monomers include styrene, α-methylstyrene, vinyltoluene, vinyl formate, vinyl acetate, acrylonitrile, and acrylamide.

The above-mentioned adhesive composition (I-1), adhesive composition (I-2), adhesive composition (I-3) and adhesive composition (I-4) (hereinafter, these adhesive compositions are collectively referred to as (hereinafter abbreviated as "adhesive compositions (I-1) to (I-4)"), the acrylic resin such as the acrylic polymer may have only one type of structural unit. , two or more types may be used, and when there are two or more types, the combination and ratio thereof can be arbitrarily selected.

In the acrylic polymer, the proportion of the structural units derived from the functional group-containing monomer to the total amount of structural units is preferably 1 to 35% by mass.

The adhesive composition (I-1) or the adhesive composition (I-4) may contain only one type of adhesive resin (I-1a), or may contain two or more types. , in the case of two or more types, their combination and ratio can be arbitrarily selected.

In the adhesive layer formed from the adhesive composition (I-1) or the adhesive composition (I-4), the content ratio of the adhesive resin (I-1a) to the total mass of the adhesive layer. is preferably 5 to 99% by weight, and may be, for example, 25 to 95% by weight, 45 to 95% by weight, or 65 to 95% by weight.

[Energy ray curable adhesive resin (I-2a)]
The adhesive resin (I-2a) can be obtained, for example, by reacting a functional group in the adhesive resin (I-1a) with an unsaturated group-containing compound having an energy beam polymerizable unsaturated group.

The unsaturated group-containing compound can be bonded to the adhesive resin (I-1a) by reacting with a functional group in the adhesive resin (I-1a) in addition to the energy beam polymerizable unsaturated group. It is a compound that has a group.
Examples of the energy ray polymerizable unsaturated group include a (meth)acryloyl group, a vinyl group (ethenyl group), an allyl group (2-propenyl group), and a (meth)acryloyl group is preferred.
Groups capable of bonding with functional groups in the adhesive resin (I-1a) include, for example, isocyanate groups and glycidyl groups capable of bonding with hydroxyl groups or amino groups, and hydroxyl groups and amino groups capable of bonding with carboxy groups or epoxy groups. etc.

Examples of the unsaturated group-containing compound include (meth)acryloyloxyethyl isocyanate, (meth)acryloyl isocyanate, glycidyl (meth)acrylate, and the like.

The adhesive composition (I-2) or (I-3) may contain only one type of adhesive resin (I-2a), or may contain two or more types, or two or more types. If so, the combination and ratio thereof can be arbitrarily selected.

In the adhesive layer formed from the adhesive composition (I-2) or (I-3), the content ratio of the adhesive resin (I-2a) to the total mass of the adhesive layer is 5 to 5. It is preferably 99% by mass.

[Energy ray curable compound]
The energy ray-curable compound contained in the pressure-sensitive adhesive composition (I-1) or (I-3) is a monomer or oligomer that has an energy ray polymerizable unsaturated group and is curable by energy ray irradiation. can be mentioned.

Among energy ray-curable compounds, monomers include, for example, trimethylolpropane tri(meth)acrylate, pentaerythritol (meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1,4 - Polyhydric (meth)acrylates such as butylene glycol di(meth)acrylate and 1,6-hexanediol (meth)acrylate; Urethane (meth)acrylate; Polyester (meth)acrylate; Polyether (meth)acrylate; Epoxy ( Examples include meth)acrylate.
Among the energy ray-curable compounds, examples of oligomers include oligomers that are polymers of the monomers exemplified above.

The pressure-sensitive adhesive composition (I-1) or (I-3) may contain only one type of energy ray-curable compound, or may contain two or more types, and may be two or more types. In this case, their combination and ratio can be selected arbitrarily.

In the adhesive layer formed from the adhesive composition (I-1) or (I-3), the content ratio of the energy ray-curable compound to the total mass of the adhesive layer is 1 to 95% by mass. % is preferable.

[Crosslinking agent]
When using the acrylic polymer having a structural unit derived from a functional group-containing monomer in addition to the structural unit derived from the (meth)acrylic acid alkyl ester as the adhesive resin (I-1a), the adhesive composition (I-1a) -1) or (I-4) preferably further contains a crosslinking agent.
In addition, when the adhesive resin (I-2a) is, for example, the acrylic polymer having a structural unit derived from a functional group-containing monomer similar to that in the adhesive resin (I-1a), the adhesive composition (I-2) or (I-3) may further contain a crosslinking agent.

The crosslinking agent crosslinks the adhesive resins (I-1a) or the adhesive resins (I-2a) by, for example, reacting with the functional group.
Examples of the crosslinking agent include isocyanate crosslinking agents (crosslinking agents having an isocyanate group) such as tolylene diisocyanate, hexamethylene diisocyanate, xylylene diisocyanate, and adducts of these diisocyanates; epoxy crosslinking agents such as ethylene glycol glycidyl ether ( crosslinking agent having a glycidyl group); aziridine crosslinking agent such as hexa[1-(2-methyl)-aziridinyl]triphosphatriazine (crosslinking agent having an aziridinyl group); metal chelate crosslinking agent such as aluminum chelate (metal Crosslinking agents having a chelate structure); isocyanurate-based crosslinking agents (crosslinking agents having an isocyanuric acid skeleton), and the like.

The pressure-sensitive adhesive compositions (I-1) to (I-4) may contain only one type of crosslinking agent, or may contain two or more types, and when they contain two or more types, their Combinations and ratios can be selected arbitrarily.

In the adhesive composition (I-1) or (I-4), the content of the crosslinking agent is 0.01 to 50 parts by mass based on 100 parts by mass of the adhesive resin (I-1a). For example, it may be 1 to 40 parts by weight, 5 to 35 parts by weight, or 10 to 30 parts by weight.
In the adhesive composition (I-2) or (I-3), the content of the crosslinking agent is 0.01 to 50 parts by mass based on 100 parts by mass of the adhesive resin (I-2a). It is preferable that

[Photopolymerization initiator]
Adhesive compositions (I-1), (I-2) and (I-3) (hereinafter, these adhesive compositions are collectively referred to as "adhesive compositions (I-1) to (I-3)" ) may further contain a photopolymerization initiator. In the adhesive compositions (I-1) to (I-3) containing a photopolymerization initiator, the curing reaction sufficiently proceeds even when irradiated with relatively low energy energy rays such as ultraviolet rays.

Examples of the photopolymerization initiator include those similar to the photopolymerization initiator (c) described above.

The pressure-sensitive adhesive compositions (I-1) to (I-3) may contain only one kind of photopolymerization initiator, or may contain two or more kinds, and in the case of two or more kinds, Their combination and ratio can be selected arbitrarily.

In the adhesive composition (I-1), the content of the photopolymerization initiator is preferably 0.01 to 20 parts by mass based on 100 parts by mass of the energy ray-curable compound. In the adhesive composition (I-2), the content of the photopolymerization initiator is preferably 0.01 to 20 parts by mass based on 100 parts by mass of the adhesive resin (I-2a). .
In the adhesive composition (I-3), the content of the photopolymerization initiator is from 0.01 to 100 parts by mass of the total content of the adhesive resin (I-2a) and the energy ray-curable compound. Preferably, it is 20 parts by mass.

[Other additives]
The adhesive compositions (I-1) to (I-4) may contain other additives that do not fall under any of the above-mentioned components, within a range that does not impair the effects of the present invention.
Examples of the other additives include antistatic agents, antioxidants, softeners (plasticizers), fillers, rust preventives, colorants (pigments, dyes), sensitizers, and tackifiers. , reaction retarders, crosslinking promoters (catalysts), and other known additives.
Incidentally, the reaction retarder is, for example, a reaction retardant that causes the pressure-sensitive adhesive compositions (I-1) to (I-4) to deteriorate during storage due to the action of a catalyst mixed in the pressure-sensitive adhesive compositions (I-1) to (I-4). In I-4), it is a component that suppresses the progress of unintended crosslinking reactions. Examples of reaction retarders include those that form a chelate complex by chelating the catalyst, and more specifically, those that have two or more carbonyl groups (-C(=O)-) in one molecule. Can be mentioned.

The pressure-sensitive adhesive compositions (I-1) to (I-4) may contain only one kind of other additives, or may contain two or more kinds, and in the case of two or more kinds, Their combination and ratio can be selected arbitrarily.

The content of other additives in the adhesive compositions (I-1) to (I-4) is not particularly limited, and may be appropriately selected depending on the type thereof.

[solvent]
The adhesive compositions (I-1) to (I-4) may contain a solvent. By containing the solvent, the adhesive compositions (I-1) to (I-4) improve their applicability to the surface to be coated.

The solvent is preferably an organic solvent, and examples of the organic solvent include ketones such as methyl ethyl ketone and acetone; esters (carboxylic acid esters) such as ethyl acetate; ethers such as tetrahydrofuran and dioxane; cyclohexane, n-hexane, etc. aliphatic hydrocarbons; aromatic hydrocarbons such as toluene and xylene; and alcohols such as 1-propanol and 2-propanol.

The pressure-sensitive adhesive compositions (I-1) to (I-4) may contain only one type of solvent, or may contain two or more types, and when they contain two or more types, a combination thereof. and the ratio can be selected arbitrarily.

The content of the solvent in the adhesive compositions (I-1) to (I-4) is not particularly limited and may be adjusted as appropriate.

○Method for producing an adhesive composition Adhesive compositions such as adhesive compositions (I-1) to (I-4) are prepared by combining the above-mentioned adhesive and, if necessary, components other than the above-mentioned adhesive. It can be obtained by blending each component to constitute a drug composition.
The adhesive composition can be produced, for example, by the same method as for the protective film-forming composition described above, except that the types of ingredients are different.

◇Method for manufacturing a composite sheet for forming a protective film The composite sheet for forming a protective film is produced by laminating the above-mentioned layers in a corresponding positional relationship, and adjusting the shape of some or all of the layers as necessary. It can be manufactured by The method for forming each layer is as described above.

For example, when manufacturing a support sheet and laminating an adhesive layer on a base material, the above-mentioned adhesive composition may be coated on the base material and dried as necessary.
In addition, an adhesive layer is formed on the release film by coating the adhesive composition on the release film and drying it as necessary, and the exposed surface of this adhesive layer is applied to one side of the base material. The adhesive layer can also be laminated on the base material by bonding it to the surface of the base material. At this time, the adhesive composition is preferably applied to the release-treated surface of the release film.
Up to this point, the case where an adhesive layer is laminated on a base material has been cited as an example, but the above-mentioned method can also be applied, for example, to the case where a layer other than the adhesive layer is laminated on a base material.

On the other hand, for example, when further laminating a protective film-forming film on the adhesive layer already laminated on the base material, a protective film-forming composition is coated on the adhesive layer to form the protective film. It is possible to form the film directly. Layers other than the protective film-forming film can be laminated on the pressure-sensitive adhesive layer in the same manner using the composition for forming this layer. In this way, a new layer (hereinafter abbreviated as "second layer") is formed on any of the layers already laminated on the base material (hereinafter abbreviated as "first layer"), When forming a continuous two-layer laminated structure (in other words, a laminated structure of a first layer and a second layer), a composition for forming the second layer is coated on the first layer. A drying method can be applied as needed.
However, the second layer is formed in advance on the release film using a composition for forming the second layer, and the second layer is formed on the opposite side of the formed second layer from the side that is in contact with the release film. It is preferable to form a continuous two-layer laminated structure by bonding the exposed surface of the first layer to the exposed surface of the first layer. At this time, the composition is preferably applied to the release-treated surface of the release film. The release film may be removed as necessary after the laminated structure is formed.
Here, the case where a protective film-forming film is laminated on an adhesive layer is given as an example, but for example, when a layer (film) other than a protective film-forming film is laminated on an adhesive layer, the target lamination The structure can be selected arbitrarily.

In this way, all the layers other than the base material that make up the composite sheet for forming a protective film can be formed in advance on a release film and laminated by laminating it on the surface of the desired layer, so it can be laminated as needed. A composite sheet for forming a protective film may be manufactured by appropriately selecting a layer that uses such a step.

Note that the protective film-forming composite sheet is usually stored with a release film attached to the surface of the outermost layer (for example, the protective film-forming film) on the opposite side from the support sheet. Therefore, a composition for forming a layer constituting the outermost layer, such as a composition for forming a protective film, is applied onto this release film (preferably its release-treated surface), and dried as necessary. Then, form a layer constituting the outermost layer on the release film, and then laminate the remaining layers on the exposed surface of this layer opposite to the side that is in contact with the release film using one of the methods described above. However, by leaving the release film in the bonded state without removing it, a composite sheet for forming a protective film with a release film can be obtained.

The composite sheet for forming a protective film may be in the form of a sheet, and is preferably in the form of a roll.

◇Kit A kit according to an embodiment of the present invention includes a first laminate in which a first release film, a protective film-forming film, and a second release film are laminated in this order, and a target for pasting the protective film-forming film. A kit comprising a workpiece and a support sheet used to support the protective film-forming film, the protective film-forming film being the protective film-forming film according to the embodiment of the present invention described above.
An example of the kit 1 of this embodiment will be described below with reference to the drawings.

FIG. 6 is a cross-sectional view schematically showing an example of the kit 1 of this embodiment.
The kit 1 of this embodiment includes a first laminate 5 in which a first release film 151, a protective film-forming film 13, and a second release film 152 are laminated in this order, and a workpiece to which the protective film-forming film 13 is attached. and a support sheet 10 used to support the protective film forming film 13, and the support sheet 10 is the support sheet according to the embodiment of the present invention described above.

The protective film forming film 13 shown here includes a first release film 151 on one surface (sometimes referred to as "first surface" in this specification) 13a, and the first surface 13a is different from the first surface 13a. A second release film 152 is provided on the other surface (sometimes referred to as "second surface" in this specification) 13b on the opposite side.

By using the kit 1 comprising the support sheet 10 and the protective film forming film, a protective film-equipped chip comprising a chip and a protective film provided on the back surface of the chip can be produced by the method for manufacturing a chip with a protective film described below. Chips can be manufactured.

Such a protective film forming film 13 is suitable for storing as a roll, for example. That is, it is preferable that the first laminate has a roll shape.

The protective film forming film 13 can be formed using the above-mentioned composition for forming a protective film.

Both the first release film 151 and the second release film 152 may be known ones.
The first release film 151 and the second release film 152 may be the same or different from each other, such as having different peeling forces when peeled from the protective film forming film 13. Good too.

In the protective film forming film 13 shown in FIG. 6, either the first release film 151 or the second release film 152 is removed, and the resulting exposed surface becomes the surface to be attached to the back surface of the workpiece (not shown). Then, the other of the first release film 151 and the second release film 152 is removed, and the resulting exposed surface becomes the attachment surface of the support sheet.

Although FIG. 6 shows an example in which the release film is provided on both surfaces (first surface 13a, second surface 13b) of the protective film forming film 13, the release film may be provided on either of the protective film forming films 13. It may be provided only on one surface, that is, only on the first surface 13a or only on the second surface 13b.

In the kit 1 of this embodiment, by using the protective film forming film 13 and the support sheet 10 together, it is possible to apply both the protective film forming film to the workpiece and the subsequent support sheet in an in-line process. Here, "inline process" is "a process that is carried out in a device in which multiple (multiple units) of devices that perform one or more steps are connected, or in the same device, and includes multiple steps and their steps. This is a process in which workpieces are transported one by one between one process and the next.

◇Production method of chip with protective film (method for using protective film forming film, protective film forming composite sheet and kit)
The protective film forming film, the composite sheet for forming a protective film, and the kit can be used to manufacture the chip with a protective film.
That is, the method for manufacturing a chip with a protective film according to the present embodiment is a method for manufacturing a chip with a protective film, which includes a chip and a protective film provided on the back surface of the chip. By pasting the protective film forming film according to an embodiment of the present invention described above, a first laminated film is produced in which the protective film forming film and the wafer are laminated in the thickness direction thereof. Alternatively, by attaching the protective film forming film in the composite sheet for protective film forming according to an embodiment of the present invention to the back surface of the wafer, the supporting sheet, the protective film forming film, and the wafer are attached in this order. , a step of producing a first laminated composite sheet configured by laminating these in the thickness direction (herein sometimes referred to as a "pasting step"); A second laminated film in which the protective film and the wafer are laminated in their thickness direction by curing the protective film forming film in the first laminated composite sheet with energy rays to form the protective film. or producing a second laminated composite sheet in which the support sheet, the protective film, and the wafer are laminated in this order in the thickness direction (herein referred to as "hardening"). step), with a dicing sheet provided on the protective film side of the second laminated film, the wafer in the second laminated film is divided and the protective film is cut. By doing so, a third laminated film in which a plurality of the chips with protective films are fixed on the dicing sheet is produced, or the wafer in the second laminated composite sheet is divided, and the wafer in the second laminated composite sheet is divided. A step of cutting the protective film to produce a third laminated composite sheet in which a plurality of the chips with the protective film are fixed on the support sheet (herein referred to as "splitting step") ), by separating the protective film-coated chips in the third laminated film from the dicing sheet, or by separating the protective film-coated chips in the third laminated composite sheet from the support sheet. A pickup step (herein sometimes referred to as a "pickup step").

Referring to the drawings below, we will explain how to attach a protective film when attaching a protective film forming film that does not constitute a composite sheet for protective film forming (i.e. the protective film forming film in the kit) to the back side of a wafer. Chip manufacturing method (sometimes referred to as "manufacturing method 1" in this specification) and a protective film in the case of attaching a protective film forming film in a protective film forming composite sheet to the back side of a wafer A method for manufacturing the attached chip (sometimes referred to as "manufacturing method 2" in this specification) will be sequentially described.

<<Manufacturing method 1>>
FIG. 7 is a cross-sectional view for schematically explaining manufacturing method 1. Here, manufacturing method 1 will be described using as an example the case where the protective film forming film 13 shown in FIG. 1, more specifically, the kit shown in FIG. 6 is used.
In the pasting step of manufacturing method 1, as shown in FIG. 7(a), by pasting the above-mentioned protective film forming film 13 on the back surface 9b of the wafer 9, the protective film forming film 13 and the wafer 9 are A first laminated film 601 configured by laminating these in the thickness direction is produced. The first surface 13a of the protective film forming film 13 is attached to the back surface 9b of the wafer 9. A second release film 152 is provided on the second surface 13b of the protective film forming film 13.
Here, a case is shown in which the first release film 151 is removed from the protective film forming film 13 shown in FIG. The second release film 152 may be removed from the protective film forming film 13 shown in FIG.

The protective film forming film 13 can be attached to the wafer 9 by a known method. For example, the protective film forming film 13 may be attached to the wafer 9 while being heated.

Next, in the curing step of manufacturing method 1, the protective film forming film 13 in the first laminated film 601 is cured with energy rays to form a protective film 13', as shown in FIG. 7(b). A second laminated film 602 is produced in which the protective film 13' and the wafer 9 are laminated in the thickness direction thereof. Reference numeral 13a' indicates a surface of the protective film 13' that was the first surface 13a of the protective film forming film 13 (herein sometimes referred to as "first surface"). Reference numeral 13b' indicates a surface of the protective film 13' that was the second surface 13b of the protective film forming film 13 (herein sometimes referred to as "second surface").

In the curing step, energy is applied to the protective film forming film 13 from the outside of the first laminated film 601 on the protective film forming film 13 side through the second release film 152 (by transmitting the second release film 152). A protective film 13' is formed by irradiating with a line.
In the curing step, the second release film 152 is removed from the protective film forming film 13 in the first laminated film 601 to expose the second surface 13b of the protective film forming film 13, and then the protective film forming film 13 is exposed. The protective film 13' may be formed by irradiating energy rays.

The energy ray irradiation conditions in the curing step are as described above.

The protective film forming film 13 shown in FIG. 7(a) may be laser marked by irradiating a laser through the second release film 152 (through the second release film 152), or Laser marking may be performed on the protective film 13' shown in b) by irradiating a laser through the second release film 152 (through the second release film 152).

Next, in the dividing step of manufacturing method 1, the second release film 152 is first removed from the protective film 13' in the second laminated film 602. Then, as shown in FIG. 7C, the newly exposed second surface 13b' of the protective film 13' is coated with one surface (in this specification, "first surface") of the dicing sheet 8. 8a (sometimes referred to as ) is pasted.
The dicing sheet 8 shown here includes a base material 81 and an adhesive layer 82 provided on one surface 81a of the base material 81, and the adhesive layer 82 in the dicing sheet 8 is It is attached to the protective film 13'. A surface 82a of the adhesive layer 82 on the protective film 13' side (herein sometimes referred to as "first surface") is the same as the first surface 8a of the dicing sheet 8.

The dicing sheet 8 may be a known one. For example, the base material 81 may be the same as the base material in the above-mentioned composite sheet for forming a protective film, and the adhesive layer 82 may be the same as the adhesive layer in the above-mentioned composite sheet for forming a protective film. It may be of. That is, the dicing sheet 8 can be replaced with the support sheet 10.

Here, a case is shown in which a dicing sheet 8 comprising a base material 81 and an adhesive layer 82 is used; however, in the dividing step, a dicing sheet other than this, such as a dicing sheet made only of the base material, is used. may also be used.

Next, in the dividing step, as shown in FIG. 7D, the wafer 9 in the second laminated film 602 is separated with the dicing sheet 8 provided on the protective film 13' side of the second laminated film 602. and cut the protective film 13'. The wafer 9 is divided into individual pieces to form a plurality of chips 90.

Dividing the wafer 9 and cutting the protective film 13' may be performed by known methods. For example, division of the wafer 9 and cutting of the protective film 13' can be performed continuously by dicing such as blade dicing, laser dicing by laser irradiation, or water dicing by spraying water containing an abrasive.
The protective film 13' is cut along the outer periphery of the chip 90 regardless of the cutting method.

By dividing the wafer 9 and cutting the protective film 13' in this manner, the chip 90 and the protective film (herein simply referred to as "protective film") provided on the back surface 90b of the chip 90 are separated. A plurality of protected film-coated chips 901 are obtained. Reference numeral 130b' indicates a surface of the protective film 130' after cutting, which was the second surface 13b' of the protective film 13' (herein sometimes referred to as "second surface"). There is.

In the dividing step of manufacturing method 1, the third laminated film 603 in which the plurality of protective film-coated chips 901 are fixed on the dicing sheet 8 is produced as described above.

Next, in the pick-up step of manufacturing method 1, as shown in FIG. 7(e), the chip 901 with a protective film in the third laminated film 603 is picked up by being separated from the dicing sheet 8.
In the pickup step, peeling occurs between the second surface 130b' of the protective film 130' in the chip 901 with a protective film and the first surface 82a of the adhesive layer 82 in the dicing sheet 8.

Here, a case is shown in which the protective film-covered chip 901 is separated in the direction of arrow P using the separating means 7 such as a vacuum collet. Note that the cross-sectional representation of the separating means 7 is omitted here.
The chip 901 with a protective film can be picked up by a known method.

When the adhesive layer 82 is energy ray curable, in the pickup step, the adhesive layer 82 is irradiated with energy rays to cure the adhesive layer 82 and form a cured product (not shown). It is preferable to separate the protective film-covered chip 901 from the dicing sheet 8 after forming the protective film. In this case, in the pickup step, peeling occurs between the protective film 130' in the chip 901 with a protective film and the cured adhesive layer 82 in the dicing sheet 8.
In this case, the cured adhesive layer 82 is less likely to deform than before curing, making it easier to pick up the protective film-coated chip 901.

The energy ray irradiation conditions for the adhesive layer 82 in the pickup step may be the same as the energy ray irradiation conditions for the protective film forming film 13 in the curing step, for example.

In this specification, even after the energy ray curable adhesive layer is cured with energy rays, as long as the laminated structure of the base material and the cured product of the energy ray curable adhesive layer is maintained, This laminated structure is called a "dicing sheet".

On the other hand, in the case where the adhesive layer 82 is non-energy ray curable, the chip 901 with a protective film can be simply separated from the adhesive layer 82, and the adhesive layer 82 does not need to be cured, which simplifies the process. In this process, the chip 901 with a protective film can be picked up.
Even if the adhesive layer 82 is energy ray-curable, the protective film-coated chip 901 can be picked up in a simplified process by picking up the protective film-coated chip 901 without curing the adhesive layer 82. .

In the pick-up process, such pick-up of the protective film-coated chips 901 is performed for all the target protective film-coated chips 901.

In manufacturing method 1, the intended chip 901 with a protective film can be obtained by performing up to the pickup step.

With conventional energy-ray-curable protective film-forming films, the protective film-forming film is irradiated with energy rays through the release film. As a result, the protective film becomes easy to peel off, which may cause problems in the subsequent manufacture of semiconductor devices.
In production method 1, since the protective film-forming film according to the embodiment of the present invention described above is used, the degree of curing of the protective film-forming film is set within a suitable range when the protective film-forming film is cured with energy rays. This improves the adhesion between the protective film and the silicon wafer and suppresses peeling of the protective film.

<<Manufacturing method 2>>
FIG. 8 is a cross-sectional view for schematically explaining manufacturing method 2. FIG. Here, manufacturing method 2 will be described using, as an example, the case where the composite sheet 101 for forming a protective film shown in FIG. 2 is used. In the pasting step of the manufacturing method 2, as shown in FIG. , the protective film forming film 13 and the wafer 9 are laminated in this order in the thickness direction to produce a first laminated composite sheet 501. In this case, as in the case of manufacturing method 1, the first surface 13a of the protective film forming film 13 in the protective film forming composite sheet 101 is attached to the back surface 9b of the wafer 9.

The protective film forming film 13 in the protective film forming composite sheet 101 can be attached to the wafer 9 by a known method. For example, the protective film forming film 13 may be attached to the wafer 9 while being heated.

Next, in the curing step of manufacturing method 2, the protective film forming film 13 in the first laminated composite sheet 501 is cured with energy rays to form a protective film 13', as shown in FIG. 8(b). , the support sheet 10, the protective film 13', and the wafer 9 are laminated in this order in the thickness direction to produce a second laminated composite sheet 502.

In the curing step, the protective film forming film 13 is irradiated with energy rays from outside the support sheet 10 side of the first laminated composite sheet 501 through the support sheet 10 (through the support sheet 10). A protective film 13' is thus formed.

The curing step can be performed in the same manner as the curing step in manufacturing method 1, except that the first laminated composite sheet 501 is used instead of the first laminated film 601.

The second laminated composite sheet 502 obtained in the curing process has the same configuration as the laminate of the second laminated film 602 and the dicing sheet 8 in the dividing process in manufacturing method 1. If the dicing sheet 8 is the same as the support sheet 10, the second laminated composite sheet 502 is the same as the laminate.

Next, in the dividing step of manufacturing method 2, as shown in FIG. 8(c), the wafer 9 in the second laminated composite sheet 502 is divided and the protective film 13' is cut. The wafer 9 is divided into individual pieces to form a plurality of chips 90.

The dividing step is performed in the same manner as the dividing step in manufacturing method 1, except that the second laminated composite sheet 502 is used instead of the laminate of the second laminated film 602 and the dicing sheet 8. be able to.
In manufacturing method 2 as well, the protective film 13' is cut along the outer periphery of the chip 90 regardless of the cutting method.

In this way, by dividing the wafer 9 and cutting the protective film 13', a plurality of protective films including the chip 90 and the protective film 130' after cutting provided on the back surface 90b of the chip 90 are formed. A chip 901 with a membrane is obtained.
These chips 901 with a protective film obtained in the dividing step in the manufacturing method 2 are the same as the chips 901 with a protective film obtained in the dividing step in the manufacturing method 1.

The protective film forming film 13 shown in FIG. 8(a) may be laser marked by irradiating it with a laser through the support sheet 10 (through the support sheet 10), or the protective film forming film 13 shown in FIG. 8(b) may be marked with a laser. Laser marking may be performed by irradiating the protective film 13' with a laser through the support sheet 10 (transmitting the support sheet 10).

In the dividing step of manufacturing method 2, the third laminated composite sheet 503 in which the plurality of protective film-coated chips 901 are fixed on the support sheet 10 is produced as described above.
The third laminated composite sheet 503 has the same configuration as the third laminated film 603 obtained in the dividing step in manufacturing method 1. When the dicing sheet 8 is the same as the support sheet 10, the third laminated composite sheet 503 is the same as the third laminated film 603.

Next, in the pickup step of manufacturing method 2, as shown in FIG. 8(d), the chip 901 with a protective film in the third laminated composite sheet 503 is picked up by separating it from the support sheet 10.
In the pickup step, peeling occurs between the second surface 130b' of the protective film 130' in the chip 901 with a protective film and the first surface 12a of the adhesive layer 12 in the support sheet 10.

The pick-up process can be performed in the same manner as the pick-up process in manufacturing method 1, except that the third laminated composite sheet 503 is used instead of the third laminated film 603.

For example, when the adhesive layer 12 is energy ray-curable, in the pickup step, the adhesive layer 12 is cured by irradiating the adhesive layer 12 with energy rays to cure the adhesive layer 12 (as shown in the figure). It is preferable to separate the protective film-coated chip 901 from the support sheet 10 after forming the protective film (abbreviation). In this case, in the pickup step, peeling occurs between the protective film 130' in the chip 901 with a protective film and the cured product of the adhesive layer 12 in the support sheet 10.
In this case, since the adhesive force between the cured product of the adhesive layer 12 and the protective film 130' is smaller than the adhesive force between the adhesive layer 12 and the protective film 130', the chip 901 with a protective film can be picked up more easily.

On the other hand, when the adhesive layer 12 is non-energy ray curable, the protective film-coated chip 901 can be simply separated from the adhesive layer 12, and curing of the adhesive layer 12 is not necessary, so the process is simplified. In this process, the chip 901 with a protective film can be picked up.
Even if the adhesive layer 12 is energy ray-curable, the protective film-coated chip 901 can be picked up in a simplified process by picking up the protective film-coated chip 901 without curing the adhesive layer 12. .

In manufacturing method 2, the intended chip 901 with a protective film can be obtained by performing up to the pickup step. The chip 901 with a protective film obtained by manufacturing method 2 is the same as the chip 901 with a protective film obtained by manufacturing method 1.

In a conventional composite sheet for forming a protective film including a protective film forming film that is curable with energy rays, if the protective film forming film is cured too much by irradiating the protective film forming film with energy rays through the support sheet 10, The adhesion between the protective film and the silicon wafer deteriorates, making the protective film easy to peel off, which may pose a problem in the subsequent manufacture of semiconductor devices.
In manufacturing method 2, since the above-mentioned composite sheet for forming a protective film comprising the protective film-forming film according to an embodiment of the present invention is used, when the protective film-forming film is cured with energy rays, the protective film-forming film is By setting the degree of curing within a suitable range, the adhesion between the protective film and the silicon wafer can be improved and peeling of the protective film can be suppressed.

Up to this point, we have described manufacturing method 2 using the protective film forming composite sheet 101 shown in FIG. You may use the composite sheet for protective film formation of this embodiment other than the composite sheet for protective film formation 101, such as the composite sheet for film formation 103 or the composite sheet for protective film formation 104.

◇ Manufacturing method of substrate device (method of using chip with protective film)
After obtaining a chip with a protective film by the above manufacturing method, the manufacturing method is the same as the conventional face-down type substrate device manufacturing method, except that this chip with a protective film is used instead of the conventional chip with a protective film. According to the method, a substrate device can be manufactured.

For example, by heating a circuit board on which a chip with a protective film obtained using the above protective film forming film is mounted using a reflow oven equipped with a halogen heater, the protruding electrodes on the chip with a protective film are melted. There is a method of manufacturing a board device in which the electrical connection between the protruding electrode and the connection pad on the circuit board is strengthened through a reflow process.

The substrate device of this embodiment has excellent near-infrared shielding properties by using the above-mentioned kit including the above-mentioned protective film-forming film or the above-mentioned composite sheet for forming a protective film.

◇Use of protective film forming film The use of the protective film forming film according to one embodiment of the present invention is for forming a protective film on the surface opposite to the circuit surface (i.e., the back surface) of a semiconductor wafer or semiconductor chip. , use of a protective film-forming film, wherein the protective film-forming film is the protective film-forming film according to the above-described embodiment of the present invention.
The use of the protective film-forming film of this embodiment is such that, by including the protective film-forming film, when the protective film-forming film is cured with energy rays, the degree of curing of the protective film-forming film can be controlled within a suitable range. This improves the adhesion between the protective film and the silicon wafer, and prevents the protective film from peeling off.

Use of the protective film-forming film of the present invention has the following aspects.
<11> Use of a protective film forming film for forming a protective film on the surface opposite to the circuit surface of a semiconductor wafer or semiconductor chip,
The protective film-forming film is an energy ray-curable protective film-forming film,
The protective film forming film has a near-infrared transmittance of 10% or less at a wavelength of 1300 nm,
The curing rate ratio of the protective film forming film is 1.02 or more and less than 100, as measured by the curing rate ratio measurement method described below.

<Measurement method of curing rate ratio>
The protective film-forming film is irradiated with ultraviolet rays from one side under conditions of an illumination intensity of 220 mW/cm ² and a light amount of 100 mJ/cm ² to produce a protective film-forming film (100) after UV irradiation.
Using a Fourier transform infrared spectrometer, the surface (back surface) opposite to the surface irradiated with ultraviolet rays in the protective film forming film (100) before and after irradiation with ultraviolet rays was measured using the diamond ATR method at an incident angle of 45°. Perform FT-IR measurement. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (100) before and after UV irradiation. The change in strength is calculated using the following formula (1), and this is taken as the curing rate at 100 mJ/cm ² of the back surface of the protective film forming film.
Next, a protective film-forming film (500) after ultraviolet ^{irradiation is produced in the same manner as described above, except that ultraviolet rays are irradiated under conditions of an illuminance of 220 mW/cm 2 and} a light amount of 500 mJ/cm 2 . FT-IR measurements are performed on the surface (back surface) opposite to the surface irradiated with ultraviolet rays of the protective film forming film (500) before and after irradiation with ultraviolet rays under the same conditions as above. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (500) before and after UV irradiation. The change in strength is calculated using the following formula (1), and this is taken as the curing rate at 500 mJ/cm ² of the back surface of the protective film forming film.
Next, the ratio of the curing rate at 500 mJ/cm ² on the back side of the protective film forming film to the curing rate at 100 mJ/cm ² on the back side of the protective film forming film is calculated using the following formula (2), and this is calculated as the ratio of the curing rate at 500 mJ/cm 2 on the back side of the protective film forming film. Let the curing rate ratio be

Curing rate = {(peak intensity before ultraviolet irradiation - peak intensity after ultraviolet irradiation)/peak intensity before ultraviolet irradiation} x 100...(1)
Curing rate ratio = (curing rate at 500 mJ/cm ² on the back side of the protective film forming film) / (curing rate at 100 mJ/cm ² on the back side of the protective film forming film) ... (2)

<12> Use of the protective film-forming film according to <11>, which contains an inorganic pigment as a coloring agent.
<13> Use of the protective film forming film according to <11> or <12> for forming a protective film on the surface of a semiconductor wafer or semiconductor chip opposite to the circuit surface in the production of a chip with a protective film. .
<14> The protective film forming film according to <11> or <12> for forming a protective film on a surface of a semiconductor wafer or a semiconductor chip opposite to a circuit surface in manufacturing a face-down type substrate device. Use of.

Hereinafter, the present invention will be explained in more detail with reference to specific examples. However, the present invention is not limited to the examples shown below.

<Resin manufacturing raw materials>
The official names of the raw materials for resin production, which are abbreviated in the examples and comparative examples, are shown below.
BA: n-butyl acrylate MA: methyl acrylate ACrMO: 4-acryloylmorpholine HEA: 2-hydroxyethyl acrylate 2EHA: 2-ethylhexyl acrylate MMA: methyl methacrylate

<Raw materials for producing the composition for forming a protective film>
The raw materials used for producing the composition for forming a protective film are shown below.
[Energy ray curable component (a)]
(a)-1: ε-caprolactone modified tris-(2-acryloxyethyl) isocyanurate (“A-9300-1CL” manufactured by Shin Nakamura Chemical Co., Ltd., trifunctional ultraviolet curable compound)
(a)-2: Urethane acrylate (“Quick cure 8100EA70” manufactured by KJ Chemicals)

[Acrylic resin (b) without energy ray curable group]
(b)-1: Acrylic resin (weight average molecular weight (700,000), glass transition temperature 2℃)

[Photopolymerization initiator (c)]
(c)-1:1-[4-(phenylthio)-2-(O-benzoyloxime)]1,2-octanedione (trade name IRGACURE (registered trademark) OXE01, manufactured by BASF Japan)

[Inorganic filler (d)]
(d)-1: Spherical silica (average particle diameter 500 nm, product name "SC2050-MA" manufactured by Admatex Co., Ltd.)

[Coloring agent (g)]
(g)-1: Inorganic black pigment (carbon black, manufactured by Mitsubishi Carbon Black Co., Ltd., #20, average particle size 50 nm)
(g)-2: Inorganic black pigment (carbon black, manufactured by Mitsubishi Carbon Black Co., Ltd., MA600B, average particle size 20 nm)
(g)-3: Inorganic black pigment (carbon black, manufactured by Mitsubishi Carbon Black Co., Ltd., #2600, average particle size 13 nm)
(g)-4: Organic black pigment (carbon black, "6377 Black" manufactured by Dainichiseika Chemical Co., Ltd.)
(g)-5: Inorganic black pigment (titanium black (component: titanium nitride), manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd., 13M)

<<Manufacture of protective film forming film>>
[Example 1]
<Production of protective film forming composition (IV)-1>
Energy ray curable component (a)-1 (12.3 parts by mass), energy ray curable component (a)-2 (10.0 parts by mass), acrylic resin without energy ray curable group (b)- 1 (14.6 parts by mass), photopolymerization initiator (c)-1 (1.0 parts by mass), inorganic filler (d)-1 (58.1 parts by mass), and colorant (g)-1 ( 4.0 parts by mass) is dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain an energy beam-curable composition for forming a protective film in which the total concentration of all components other than the solvent is 55% by mass. (IV)-1 was obtained. In addition, all the blending amounts of the components other than the solvent shown here are the blending amounts of the target product not containing the solvent, and are the same in the following composition for forming a protective film (IV).

<Production of protective film forming film>
A release film (second release film, "SP-PET382150" manufactured by Lintec Corporation, thickness 38 μm) in which one side of a polyethylene terephthalate film was subjected to release treatment by silicone treatment was used, and the above-obtained release film was used on the release treatment surface. The composition for forming a protective film (IV)-1 was applied and dried at 100° C. for 2 minutes to produce an energy ray-curable protective film forming film having a thickness of 25 μm.

Furthermore, a release-treated surface of a release film (first release film, "SP-PET381031" manufactured by Lintec Corporation, thickness 38 μm) was applied to the exposed surface of the obtained protective film-forming film on the side not provided with the second release film. By bonding together, a protective film-forming film, a first release film provided on one surface of the protective film-forming film, and a second release film provided on the other surface of the protective film-forming film, A protective film-forming film with a release film was obtained.

[Example 2]
<Production of protective film forming composition (IV)-2>
Energy ray curable component (a)-1 (12.6 parts by mass), energy ray curable component (a)-2 (10.2 parts by mass), acrylic resin without energy ray curable group (b)- 1 (14.9 parts by mass), photopolymerization initiator (c)-1 (1.0 parts by mass), inorganic filler (d)-1 (59.3 parts by mass), and colorant (g)-1 ( 2.0 parts by mass) in methyl ethyl ketone and stirred at 23°C to obtain an energy ray-curable composition for forming a protective film in which the total concentration of all components other than the solvent is 55% by mass. (IV)-2 was obtained.

<Production of protective film forming film>
The protective film-forming film of Example 2 was prepared in the same manner as in Example 1, except that the composition for forming a protective film (IV)-2 was used in place of the composition for forming a protective film (IV)-1. was manufactured.

[Example 3]
<Production of protective film forming composition (IV)-3>
Energy ray curable component (a)-1 (12.7 parts by mass), energy ray curable component (a)-2 (10.4 parts by mass), acrylic resin without energy ray curable group (b)- 1 (15.1 parts by mass), photopolymerization initiator (c)-1 (1.0 parts by mass), inorganic filler (d)-1 (59.8 parts by mass), and colorant (g)-1 ( 1.0 parts by mass) is dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain an energy beam-curable composition for forming a protective film in which the total concentration of all components other than the solvent is 55% by mass. (IV)-3 was obtained.

<Production of protective film forming film>
The protective film-forming film of Example 3 was prepared in the same manner as in Example 1, except that the composition for forming a protective film (IV)-3 was used in place of the composition for forming a protective film (IV)-1. was manufactured.

[Example 4]
<Production of protective film forming composition (IV)-4>
Energy ray curable component (a)-1 (12.6 parts by mass), energy ray curable component (a)-2 (10.3 parts by mass), acrylic resin without energy ray curable group (b)- 1 (15.0 parts by mass), photopolymerization initiator (c)-1 (1.0 parts by mass), inorganic filler (d)-1 (59.6 parts by mass), and colorant (g)-1 ( 1.5 parts by mass) in methyl ethyl ketone and stirred at 23°C to obtain an energy ray-curable protective film-forming composition in which the total concentration of all components other than the solvent is 55% by mass. (IV)-4 was obtained.

<Production of protective film forming film>
The protective film-forming film of Example 4 was prepared in the same manner as in Example 1, except that the composition for forming a protective film (IV)-4 was used in place of the composition for forming a protective film (IV)-1. was manufactured.

[Example 5]
<Production of protective film forming composition (IV)-5>
Energy ray curable component (a)-1 (12.6 parts by mass), energy ray curable component (a)-2 (10.3 parts by mass), acrylic resin without energy ray curable group (b)- 1 (15.0 parts by mass), photopolymerization initiator (c)-1 (1.0 parts by mass), inorganic filler (d)-1 (59.4 parts by mass), and colorant (g)-1 ( 1.7 parts by mass) is dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain an energy beam-curable composition for forming a protective film in which the total concentration of all components other than the solvent is 55% by mass. (IV)-5 was obtained.

<Production of protective film forming film>
The protective film-forming film of Example 5 was prepared in the same manner as in Example 1, except that the composition for forming a protective film (IV)-5 was used in place of the composition for forming a protective film (IV)-1. was manufactured.

[Example 6]
<Production of protective film forming composition (IV)-6>
Energy ray curable component (a)-1 (12.5 parts by mass), energy ray curable component (a)-2 (10.1 parts by mass), acrylic resin without energy ray curable group (b)- 1 (14.8 parts by mass), photopolymerization initiator (c)-1 (1.0 parts by mass), inorganic filler (d)-1 (58.6 parts by mass), and colorant (g)-5 ( 3.0 parts by mass) is dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain an energy ray-curable composition for forming a protective film in which the total concentration of all components other than the solvent is 55% by mass. (IV)-6 was obtained.

<Manufacture of protective film forming film>
The protective film-forming film of Example 6 was prepared in the same manner as in Example 1, except that the composition for forming a protective film (IV)-6 was used instead of the composition for forming a protective film (IV)-1. Manufactured.

[Example 7]
<Production of protective film forming composition (IV)-7>
Energy ray curable component (a)-1 (12.6 parts by mass), energy ray curable component (a)-2 (10.1 parts by mass), acrylic resin without energy ray curable group (b)- 1 (14.9 parts by mass), photopolymerization initiator (c)-1 (1.0 parts by mass), inorganic filler (d)-1 (58.7 parts by mass), and colorant (g)-1 ( (0.5 parts by mass) and (g)-5 (2.2 parts by mass) were dissolved or dispersed in methyl ethyl ketone and stirred at 23°C, so that the total concentration of all components other than the solvent was 55% by mass. An energy ray-curable protective film forming composition (IV)-7 was obtained.

<Production of protective film forming film>
The protective film forming film of Example 6 was prepared in the same manner as in Example 1 except that the composition for forming a protective film (IV)-7 was used instead of the composition for forming a protective film (IV)-1. Manufactured.

[Comparative example 1]
<Production of composition for forming a protective film (X)-1>
Energy ray curable component (a)-1 (12.9 parts by mass), energy ray curable component (a)-2 (10.5 parts by mass), acrylic resin without energy ray curable group (b)- 1 (15.3 parts by mass), photopolymerization initiator (c)-1 (1.0 parts by mass), and inorganic filler (d)-1 (60.3 parts by mass) are dissolved or dispersed in methyl ethyl ketone. By stirring at 23° C., energy ray-curable composition for forming a protective film (X)-1 having a total concentration of all components other than the solvent of 55% by mass was obtained.

<Production of protective film forming film>
The protective film-forming film of Comparative Example 1 was prepared in the same manner as in Example 1, except that the composition for forming a protective film (X)-1 was used in place of the composition for forming a protective film (IV)-1. was manufactured.

[Comparative example 2]
<Production of protective film forming composition (X)-2>
Energy ray curable component (a)-1 (12.6 parts by mass), energy ray curable component (a)-2 (10.3 parts by mass), acrylic resin without energy ray curable group (b)- 1 (15.0 parts by mass), photoinitiator (c)-1 (1.0 parts by mass), inorganic filler (d)-1 (59.1 parts by mass), and colorant (g)-4 ( 2.0 parts by mass) in methyl ethyl ketone and stirred at 23°C to obtain an energy ray-curable composition for forming a protective film in which the total concentration of all components other than the solvent is 55% by mass. (X)-2 was obtained.

<Production of protective film forming film>
The protective film-forming film of Comparative Example 2 was prepared in the same manner as in Example 1, except that the composition for forming a protective film (X)-2 was used in place of the composition for forming a protective film (IV)-1. was manufactured.

[Comparative example 3]
<Production of protective film forming composition (X)-3>
Energy ray curable component (a)-1 (12.7 parts by mass), energy ray curable component (a)-2 (10.7 parts by mass), acrylic resin without energy ray curable group (b)- 1 (15.0 parts by mass), photopolymerization initiator (c)-1 (1.0 parts by mass), inorganic filler (d)-1 (60.1 parts by mass), and colorant (g)-3 ( 0.5 parts by mass) in methyl ethyl ketone and stirred at 23°C to obtain an energy ray-curable composition for forming a protective film in which the total concentration of all components other than the solvent is 55% by mass. (X)-3 was obtained.

<Production of protective film forming film>
The protective film-forming film of Comparative Example 3 was prepared in the same manner as in Example 1, except that the composition for forming a protective film (X)-3 was used in place of the composition for forming a protective film (IV)-1. was manufactured.

[Comparative example 4]
<Production of protective film forming composition (X)-4>
Energy ray curable component (a)-1 (12.8 parts by mass), energy ray curable component (a)-2 (10.4 parts by mass), acrylic resin without energy ray curable group (b)- 1 (15.2 parts by mass), photopolymerization initiator (c)-1 (1.0 parts by mass), inorganic filler (d)-1 (60.1 parts by mass), and colorant (g)-1 ( 0.5 parts by mass) in methyl ethyl ketone and stirred at 23°C to obtain an energy ray-curable composition for forming a protective film in which the total concentration of all components other than the solvent is 55% by mass. (X)-4 was obtained.

<Production of protective film forming film>
The protective film-forming film of Comparative Example 4 was prepared in the same manner as in Example 1, except that the composition for forming a protective film (X)-4 was used in place of the composition for forming a protective film (IV)-1. was manufactured.

<<Evaluation of protective film forming film>>
<Transmittance measurement of protective film forming film>
The first release film and the second release film were peeled off, and the light transmittance of the protective film-forming film was measured using an ultraviolet/visible/near-infrared spectrophotometer (manufactured by Shimadzu Corporation, UV-3600) as shown below. The transmittance of each protective film-forming film was measured under the following transmittance measurement conditions.

(Transmittance measurement conditions)
Wavelength range: 190-2000nm
Scan speed: High speed Slit width: 8.0mm
Detector unit: Direct light reception

<Evaluation of near-infrared shielding properties of protective film-forming film>
The measurement results of transmittance at a wavelength of 365 nm and a wavelength of 1300 nm are shown in Tables 1 to 3.
In addition, near-infrared shielding properties were evaluated based on the following criteria.
A: The near-infrared transmittance at a wavelength of 1300 nm is 10% or less, and the near-infrared shielding property is excellent.
B: The near-infrared transmittance at a wavelength of 1300 nm is more than 10%, and the near-infrared shielding property is poor.

<Measurement of curing rate ratio of protective film forming film>
The protective film forming film laminated with the first release film and the second release film obtained above was treated with a UV irradiation device (RAD-2000m/12, manufactured by Lintec Corporation) at an illuminance of 220 mW/cm ² , UV rays were irradiated from one side under the conditions of a light intensity of 100 mJ/cm ² to produce a protective film-forming film (100) after UV irradiation. At this time, silicon wafers were stacked on the surface opposite to the light incident side and irradiation was performed.
Using a Fourier transform infrared/near-far infrared spectrometer ("Spectrum 100" manufactured by PerkinElmer), the surface opposite to the surface irradiated with UV rays (back surface) of the protective film forming film (100) before and after irradiation with UV rays was measured. FT-IR measurements were performed using the diamond ATR method at an incident angle of 45°. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (100) before and after UV irradiation. The change in strength was calculated using the following formula (1), and this was taken as the curing rate at 100 mJ/cm ² of the back surface of the protective film forming film.
Note that the peak at 790 cm ⁻¹ is derived from (d)-1.
Furthermore, the peak at 810 cm ^-1 is derived from the vinyl groups of energy ray curable components (a)-1 and (a)-2, and the greater the peak intensity, the more unreacted vinyl groups remain. This means that the protective film-forming film has not been sufficiently cured.
Next, a protective film-forming film (500) after ultraviolet ^{irradiation was produced in the same manner as described above, except that ultraviolet rays were irradiated under conditions of an illuminance of 220 mW/cm 2 and} a light amount of 500 mJ/cm 2 . FT-IR measurements were performed on the surface (back surface) opposite to the surface irradiated with ultraviolet rays of the protective film-forming film (500) before and after irradiation with ultraviolet rays under the same conditions as above. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (500) before and after UV irradiation. The change in strength was calculated using the following formula (1), and this was taken as the curing rate at 500 mJ/cm ² of the back surface of the protective film forming film.

Curing rate = {(peak intensity before ultraviolet irradiation - peak intensity after ultraviolet irradiation)/peak intensity before ultraviolet irradiation} x 100...(1)

Next, the ratio of the curing rate at 500 mJ/cm ² on the back side of the protective film forming film to the curing rate at 100 mJ/cm ² on the back side of the protective film forming film is calculated using the following formula (2), and this is calculated as the ratio of the curing rate at 500 mJ/cm 2 on the back side of the protective film forming film. hardening rate ratio.

Curing rate ratio = (curing rate at 500 mJ/cm ² on the back side of the protective film forming film) / (curing rate at 100 mJ/cm ² on the back side of the protective film forming film) ... (2)

The results are shown in Tables 1 to 3.

<Cross-cut test evaluation of protective film forming film>
The second release film was removed from the release film-attached protective film forming film obtained above. In addition, a silicon wafer (diameter 200 mm, thickness 350 μm) with one surface polished to #2000 was prepared. Using a tape mounter (Adwill RAD-3600F/12 manufactured by Lintec), the exposed surface (the surface that had the second release film) was heated at 0.3 MPa while heating the protective film forming film to 70°C. is pasted on the polished surface of the silicon wafer, thereby forming a protective film in which the first release film, the protective film forming film, and the silicon wafer are laminated in this order in the thickness direction. A silicon wafer with a membrane-forming film was produced (the pasting step).

Next, the silicon wafer with the protective film forming film obtained above was left to stand for 20 minutes in an environment of 23° C. and 50% RH, and then exposed to a UV irradiation device (“Adwill RAD-2000M/12” manufactured by Lintec). Then, ultraviolet rays were irradiated under conditions of an illumination intensity of 220 mW/cm ² and a light amount of 500 mJ/cm ² to produce a silicon wafer with a protective film (the above-mentioned curing step).
Next, on the exposed surface of the protective film in the silicon wafer with a protective film obtained above, use a cutter knife to make a cut corresponding to the film thickness only in the protective film in the silicon wafer with a protective film. It was divided into 100 squares with each square having a size of 5 mm x 5 mm.
Next, the first release film was removed from the 100 squares of silicon wafer with a protective film obtained above. After that, adhesive tape (Cello Tape (registered trademark) manufactured by Nichiban Co., Ltd.) was applied to the protective film side of the 100-square silicon wafer with a protective film in an environment of 23°C and 50% RH, and then heated to 25°C. The protective film was left to stand for 20 minutes to fully adhere the adhesive tape to the protective film. Thereafter, the adhesive tape was peeled off, and the presence or absence of peeling of the protective film was visually confirmed for 100 squares of the silicon wafer with the protective film.

At this time, the results of the cross-cut test of the protective film-forming film were evaluated based on the following criteria.
A: No peeling was observed in the protective film of 100 squares.
B: Of the 100 squares of the protective film, not a single square was found to have completely peeled off, but some parts of the protective film were found to have partially peeled off at the edges.
C: Out of 100 squares of protective film, one or more squares were found to have completely peeled off.
Tables 1 to 3 show the results of the loss cut test for the protective film forming film.

In addition, the description "-" in the column of contained components in Tables 1 to 3 means that the protective film-forming film does not contain the component.

As is clear from the above results, the protective film-forming films of Examples 1 to 7 have near-infrared transmittances of 10% or less, and have excellent near-infrared shielding properties. The protective film-forming films of Examples 1 to 7 had a small curing rate ratio and were able to suppress peeling of the protective film after curing with energy rays.

The protective film-forming film of Comparative Example 1 had a small curing rate ratio and was able to suppress peeling of the protective film after curing with energy rays. However, the near-infrared transmittance at a wavelength of 1300 nm was 97.0%, and the near-infrared shielding property was not sufficient.

The protective film-forming film of Comparative Example 2 had a small curing rate ratio and was able to suppress peeling of the protective film after curing with energy rays. However, the near-infrared transmittance at a wavelength of 1300 nm was 72.0%, and the near-infrared shielding property was not sufficient.

In the protective film forming film of Comparative Example 3, the curing rate ratio was too small to prevent peeling of the protective film after curing with energy rays. Further, the near-infrared transmittance at a wavelength of 1300 nm was 70.6%, and the near-infrared shielding property was not sufficient.

The protective film-forming film of Comparative Example 4 had a small curing rate ratio and was able to suppress peeling of the protective film after curing with energy rays. However, the near-infrared transmittance at a wavelength of 1300 nm was 66.0%, and the near-infrared shielding property was not sufficient.

The present invention can be used to manufacture various substrate devices including semiconductor devices.

10, 20... Support sheet, 10a, 20a... One surface (first surface) of the support sheet,
11... Base material, 12... Adhesive layer,
13, 23...Energy ray curable protective film forming film, 13'...Protective film, 13b'...The other surface (second surface) of the protective film, 130'...Protective film after cutting,
101, 102, 103, 104...Composite sheet for forming a protective film,
501...First laminated composite sheet, 502...Second laminated composite sheet, 503...Third laminated composite sheet,
601... First laminated film, 602... Second laminated film, 603... Third laminated film, 8... Dicing sheet, 9... Wafer, 9b... Back side of wafer, 90... Chip, 90b... Back side of chip, 901... Protective film with chip

Claims (5)

An energy ray curable protective film forming film,
The protective film forming film has a near-infrared transmittance of 10% or less at a wavelength of 1300 nm,
The protective film-forming film has a curing rate ratio of 1.02 or more and less than 100, as measured by the curing rate ratio measurement method described below.
<Method of measuring curing rate ratio>
The protective film-forming film is irradiated with ultraviolet rays from one side under conditions of an illumination intensity of 220 mW/cm ² and a light amount of 100 mJ/cm ² to produce a protective film-forming film (100) after UV irradiation.
Using a Fourier transform infrared spectrometer, the surface (back surface) opposite to the surface irradiated with ultraviolet rays in the protective film forming film (100) before and after irradiation with ultraviolet rays was measured using the diamond ATR method at an incident angle of 45°. Perform FT-IR measurement. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (100) before and after UV irradiation. The change in strength is calculated using the following formula (1), and this is taken as the curing rate at 100 mJ/cm ² of the back surface of the protective film forming film.
Next, a protective film-forming film (500) after ultraviolet ^{irradiation is produced in the same manner as described above, except that ultraviolet rays are irradiated under conditions of an illuminance of 220 mW/cm 2 and} a light amount of 500 mJ/cm 2 . FT-IR measurements are performed on the surface (back surface) opposite to the surface irradiated with ultraviolet rays of the protective film forming film (500) before and after irradiation with ultraviolet rays under the same conditions as above. After correcting the spectral shift by normalizing the peak intensity of the peak around wave number 790 cm ^-1 to 1.5 Abs, the peak of the peak around wave number 810 cm ^-1 on the back side of the protective film forming film (500) before and after UV irradiation. The change in strength is calculated using the following formula (1), and this is taken as the curing rate at 500 mJ/cm ² of the back surface of the protective film forming film.
Next, the ratio of the curing rate at 500 mJ/cm ² on the back side of the protective film forming film to the curing rate at 100 mJ/cm ² on the back side of the protective film forming film is calculated using the following formula (2), and this is calculated as the ratio of the curing rate at 500 mJ/cm 2 on the back side of the protective film forming film. Let the curing rate ratio be
Curing rate = {(peak intensity before ultraviolet irradiation - peak intensity after ultraviolet irradiation)/peak intensity before ultraviolet irradiation} x 100...(1)
Curing rate ratio = (curing rate at 500 mJ/cm ² on the back side of the protective film forming film) / (curing rate at 100 mJ/cm ² on the back side of the protective film forming film) ... (2) The protective film-forming film according to claim 1, containing an inorganic pigment as a coloring agent. A composite sheet for forming a protective film, comprising a support sheet and a protective film-forming film provided on one surface of the support sheet,
A composite sheet for forming a protective film, wherein the protective film forming film is the protective film forming film according to claim 1 or 2. a first laminate in which a first release film and a protective film-forming film are laminated in this order; a support sheet used to support a workpiece to which the protective film-forming film is attached and the protective film-forming film; A kit comprising:
A kit, wherein the protective film-forming film is the protective film-forming film according to claim 1 or 2. Use of a protective film forming film for forming a protective film on the side opposite to the circuit surface of a semiconductor wafer or semiconductor chip,
Use of a protective film-forming film, wherein the protective film-forming film is the protective film-forming film according to claim 1 or 2.

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