JP2024001798A - Photosensitive resin composition - Google Patents

Abstract

To provide a photosensitive resin composition etc. that can produce an optical waveguide having an excellent core formation property and low optical transmission loss.SOLUTION: Provided is a photosensitive resin composition that contains (A) an epoxy resin, (B) a resin containing a carboxyl group and an ethylenic double bond, (C) a photopolymerization initiator, and (D) a photosensitizer having a molecular weight of 400 or more.SELECTED DRAWING: None

Description

The present invention relates to a photosensitive resin composition, a resin sheet, a photosensitive resin composition set, an optical waveguide and its manufacturing method, and an opto-electric hybrid board.

Due to technological advances in 5G communications, autonomous driving, IoT, artificial intelligence, big data, etc., the demand for ultra-high-speed and large-capacity communications is increasing. Semiconductor packages, which form the basis of this technology, have traditionally supported high-speed communications by passing high-frequency current through them. However, in recent years, problems such as noise generation, communication loss, and heat generation due to high-speed communication have become apparent. In order to solve these problems, efforts have been made in recent years to implement optical circuits on electrical wiring boards to realize energy saving, low delay, and high-speed communication (Patent Documents 1 and 2).

JP2019-211540A Patent No. 5771978

Research on the introduction of silicon photonics is particularly active in data centers where high-speed transmission is required. Silicon photonics is highly compatible with conventional LSI manufacturing processes. Therefore, by utilizing silicon photonics, it is expected that it will be possible to form nanometer-sized thin wire waveguides at low cost based on the technology cultivated in electronic circuit integration technology.

For example, according to silicon photonics, it is expected that optical integrated circuits will be formed on chips using thin wire waveguides. When manufacturing an opto-electric hybrid board equipped with this chip, an optical waveguide must be provided on the opto-electric hybrid board in order to extract signal light from the thin waveguide inside the chip to the outside of the chip and connect it to the wiring between the chips. is required. From the viewpoint of efficiently forming a fine optical waveguide, it is desirable to form an optical waveguide using a cured product of a photosensitive resin composition. Therefore, in order to form a fine core layer, it is desired that the material has excellent core forming properties. Furthermore, in order to suppress attenuation of signal light, it is also desirable to suppress transmission loss in the optical waveguide.

The present invention was devised in view of the above-mentioned problems; a photosensitive resin composition capable of producing an optical waveguide with excellent core forming properties and low transmission loss; a resin sheet containing the photosensitive resin composition; The present invention aims to provide a resin composition set; an optical waveguide; and an opto-electrical hybrid board.

The inventors of the present invention have made extensive studies to solve the above problems. As a result, the present inventor discovered that (A) an epoxy resin, (B) a resin containing a carboxyl group and an ethylenic double bond, (C) a photopolymerization initiator, and (D) a photosensitized resin having a molecular weight of 400 or more. The inventors have discovered that by using a photosensitive resin composition containing a combination of agents, it is possible to manufacture an optical waveguide with excellent core forming properties and low transmission loss, and have completed the present invention.

That is, the present invention includes the following.
[1] (A) Epoxy resin,
(B) a resin containing a carboxyl group and an ethylenic double bond,
A photosensitive resin composition containing (C) a photopolymerization initiator and (D) a photosensitizer having a molecular weight of 400 or more.
[2] The photosensitive resin composition according to [1], wherein component (C) contains (C1) a photopolymerization initiator having a molecular weight of 420 or more.
[3] The photosensitive resin composition according to [1] or [2], further comprising (E) an inorganic filler having an average particle size of 100 nm or less.
[4] The photosensitive resin composition according to any one of [1] to [3], wherein component (D) contains a tertiary amino group in the molecule.
[5] The photosensitive resin composition according to any one of [1] to [4], wherein component (D) contains an aminobenzoyl group in the molecule.
[6] The photosensitive resin composition according to any one of [1] to [5], wherein component (A) contains either a naphthalene skeleton-containing epoxy resin or a biphenyl skeleton-containing epoxy resin.
[7] The photosensitive resin composition according to any one of [1] to [6], which is used for sodium carbonate development.
[8] The photosensitive resin composition according to any one of [1] to [7], which is used for producing a core layer of an optical waveguide.
[9] Comprising a support and a photosensitive resin composition layer formed on the support,
A resin sheet in which the photosensitive resin composition layer is made of the photosensitive resin composition according to any one of [1] to [8].
[10] The resin sheet according to [9], wherein the photosensitive resin composition layer has a thickness of 1 μm or more and 15 μm or less.
[11] A photosensitive resin composition set comprising a core photosensitive resin composition and a cladding resin composition,
A photosensitive resin composition set, wherein the core photosensitive resin composition contains the photosensitive resin composition according to any one of [1] to [8].
[12] Comprising a core layer and a cladding layer,
An optical waveguide, the core layer comprising a cured product of the photosensitive resin composition according to any one of [1] to [8].
[13] The optical waveguide according to [12], which is capable of transmitting light with a wavelength of 1300 nm to 1320 nm.
[14] The optical waveguide according to [12] or [13], which is a single mode optical waveguide.
[15] An opto-electric hybrid board comprising the optical waveguide according to any one of [12] to [14].

According to the present invention, a photosensitive resin composition capable of manufacturing an optical waveguide with excellent core forming properties and low optical transmission loss; a photosensitive resin composition set including the photosensitive resin composition; an optical waveguide; and an opto-electric hybrid Substrate; can be provided.

FIG. 1 is a perspective view schematically showing an optical waveguide according to an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view for explaining step (I) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. FIG. 3 is a schematic cross-sectional view for explaining step (II) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. FIG. 4 is a schematic cross-sectional view for explaining step (III) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. FIG. 5 is a schematic cross-sectional view for explaining step (IV) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. FIG. 6 is a schematic cross-sectional view for explaining step (V) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. FIG. 7 is a schematic cross-sectional view for explaining step (VI) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. FIG. 8 is a schematic cross-sectional view for explaining step (VII) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. FIG. 9 is a schematic cross-sectional view for explaining step (VIII) of the method for manufacturing an optical waveguide according to an embodiment of the present invention.

Hereinafter, the present invention will be described in detail by showing embodiments and examples. However, the present invention is not limited to the embodiments and examples listed below, and may be implemented with arbitrary changes within the scope of the claims and equivalents thereof.

[Photosensitive resin composition]
The photosensitive resin composition of the present invention comprises (A) an epoxy resin, (B) a resin containing a carboxyl group and an ethylenic double bond, (C) a photopolymerization initiator, and (D) a light having a molecular weight of 400 or more. Contains a sensitizer. According to the photosensitive resin composition of the present invention, it becomes possible to manufacture an optical waveguide with excellent core forming properties and low optical transmission loss. Further, according to the present invention, it is also possible to obtain a cured product with a small optical transmission loss.

The photosensitive resin composition of the present invention may further contain arbitrary components in combination with components (A) to (D). Examples of the optional components include (E) an inorganic filler having an average particle size of 100 nm or less, (F) a reactive diluent, (G) a solvent, and (H) other additives. Each component contained in the photosensitive resin composition will be explained in detail below.

In the following description, unless otherwise specified, the term "(meth)acrylic acid" includes acrylic acid, methacrylic acid, and combinations thereof, and the term "(meth)acrylate" includes acrylate, methacrylate, and combinations thereof.

Further, in the present invention, the content of each component in the photosensitive resin composition is a value based on 100% by mass of nonvolatile components in the photosensitive resin composition, unless otherwise specified.

<(A) Epoxy resin>
The photosensitive resin composition contains (A) an epoxy resin as the (A) component. (A) Epoxy resin is a curable resin having an epoxy group.

(A) Epoxy resins include, for example, bixylenol type epoxy resin; bisphenol type epoxy resin such as bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, and bisphenol AF type epoxy resin; dicyclopentadiene type Epoxy resin; Novolac type epoxy resin such as trisphenol type epoxy resin, phenol novolac type epoxy resin; tert-butyl-catechol type epoxy resin; Naphthalene type epoxy resin, naphthol type epoxy resin, naphthylene ether type epoxy resin, naphthol novolac type Naphthalene skeleton-containing epoxy resins such as epoxy resins; anthracene-type epoxy resins; glycidylamine-type epoxy resins; glycidyl ester-type epoxy resins; cresol novolak-type epoxy resins; phenol aralkyl-type epoxy resins; biphenyl skeleton-containing epoxy resins; linear aliphatic epoxy Resin; Epoxy resin with butadiene structure; Alicyclic epoxy resin; Heterocyclic epoxy resin; Spiro ring-containing epoxy resin; Cyclohexane-type epoxy resin; Cyclohexane dimethanol-type epoxy resin; Trimethylol-type epoxy resin; Tetraphenylethane-type epoxy Resins; isocyanurate type epoxy resins; phenolphthalimidine type epoxy resins and the like. Among these, the epoxy resin (A) preferably contains any one of a dicyclopentadiene type epoxy resin, a naphthalene type epoxy resin, and a cresol novolak type epoxy resin, from the viewpoint of significantly obtaining the effects of the present invention. (A) Epoxy resins may be used alone or in combination of two or more.

The photosensitive resin composition of the present invention preferably contains, as the epoxy resin (A), an epoxy resin having two or more epoxy groups in one molecule. (A) With respect to 100% by mass of epoxy resin, the proportion of epoxy resin having two or more epoxy groups in one molecule is preferably 50% by mass or more, more preferably 60% by mass or more, particularly preferably 70% by mass. % or more.

(A) Epoxy resins include epoxy resins that are solid at a temperature of 20°C (hereinafter sometimes referred to as "solid epoxy resins") and epoxy resins that are liquid at a temperature of 20°C (hereinafter referred to as "liquid epoxy resins"). There is.) There is. The photosensitive resin composition of the present invention may contain only a liquid epoxy resin, only a solid epoxy resin, or a combination of a liquid epoxy resin and a solid epoxy resin as the epoxy resin (A). Although it may contain both, it is particularly preferable that it contains only a solid epoxy resin.

As the solid epoxy resin, a solid epoxy resin having three or more epoxy groups in one molecule is preferable, and an aromatic solid epoxy resin having three or more epoxy groups in one molecule is more preferable.

Solid epoxy resins include bixylenol type epoxy resin, naphthalene type epoxy resin, naphthalene type tetrafunctional epoxy resin, naphthol novolac type epoxy resin, cresol novolac type epoxy resin, dicyclopentadiene type epoxy resin, trisphenol type epoxy resin, Naphthol type epoxy resin, biphenyl type epoxy resin, naphthylene ether type epoxy resin, anthracene type epoxy resin, bisphenol A type epoxy resin, bisphenol AF type epoxy resin, phenol aralkyl type epoxy resin, tetraphenylethane type epoxy resin, phenolphthalyl Midine-type epoxy resins are preferred, naphthalene skeleton-containing epoxy resins and biphenyl skeleton-containing epoxy resins are more preferred, and dicyclopentadiene-type epoxy resins, naphthalene-type epoxy resins, and cresol novolak-type epoxy resins are even more preferred. .

Specific examples of solid epoxy resins include "HP4032H" (naphthalene type epoxy resin) manufactured by DIC; "HP-4700" and "HP-4710" (naphthalene type tetrafunctional epoxy resin) manufactured by DIC; "N-690" (cresol novolac type epoxy resin) manufactured by DIC; "N-695" (cresol novolac type epoxy resin) manufactured by DIC; "N-673" (cresol novolac type epoxy resin) manufactured by DIC; "HP-7200", "HP-7200HH", "HP-7200H", "HP-7200L" (dicyclopentadiene type epoxy resin) manufactured by DIC; "EXA-7311", "EXA-7311-" manufactured by DIC G3”, “EXA-7311-G4”, “EXA-7311-G4S”, “HP6000” (naphthylene ether type epoxy resin); “EPPN-502H” manufactured by Nippon Kayaku Co., Ltd. (trisphenol type epoxy resin); "NC7000L" (naphthol novolac type epoxy resin) manufactured by Nippon Kayaku Co., Ltd.; "NC3000H", "NC3000", "NC3000L", "NC3000FH", "NC3100" (biphenyl type epoxy resin) manufactured by Nippon Kayaku Co., Ltd.; "ESN475V", "ESN4100V" (naphthalene type epoxy resin) manufactured by Nippon Steel Chemical &Materials; "ESN485" (naphthol type epoxy resin) manufactured by Nippon Steel Chemical &Materials; "ESN375" manufactured by Nippon Steel Chemical & Materials (dihydroxynaphthalene type epoxy resin); “YX4000H”, “YX4000”, “YX4000HK”, “YL7890” manufactured by Mitsubishi Chemical Company (bixylenol type epoxy resin); “YL6121” manufactured by Mitsubishi Chemical Company (biphenyl type epoxy resin) "YX8800" (anthracene type epoxy resin) manufactured by Mitsubishi Chemical Company; "YX7700" (phenol aralkyl type epoxy resin) manufactured by Mitsubishi Chemical Company; "PG-100", "CG-500" manufactured by Osaka Gas Chemical Company; "YL7760" (bisphenol AF type epoxy resin) manufactured by Mitsubishi Chemical; "YL7800" (fluorene type epoxy resin) manufactured by Mitsubishi Chemical; "jER1010" (bisphenol A type epoxy resin) manufactured by Mitsubishi Chemical; "jER1031S" (tetraphenylethane type epoxy resin) manufactured by Nippon Kayaku Co., Ltd.; "WHR991S" (phenolphthalimidine type epoxy resin) manufactured by Nippon Kayaku Co., Ltd., and the like. These may be used alone or in combination of two or more.

As the liquid epoxy resin, a liquid epoxy resin having two or more epoxy groups in one molecule is preferable.

Liquid epoxy resins include glycyol type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol AF type epoxy resin, naphthalene type epoxy resin, glycidyl ester type epoxy resin, glycidylamine type epoxy resin, and phenol novolac type epoxy resin. Preferred are resins, alicyclic epoxy resins having an ester skeleton, cyclohexanedimethanol type epoxy resins, cycloaliphatic glycidyl ethers, and epoxy resins having a butadiene structure.

Specific examples of liquid epoxy resins include "EX-992L" manufactured by Nagase ChemteX, "YX7400" manufactured by Mitsubishi Chemical, and "HP4032", "HP4032D", and "HP4032SS" manufactured by DIC (naphthalene type epoxy resin). ); Mitsubishi Chemical's "828US", "jER828EL", "828EL", "825", "Epicote 828EL" (bisphenol A epoxy resin); Mitsubishi Chemical's "jER807", "1750" (bisphenol F type epoxy resin); “jER152” (phenol novolak type epoxy resin) manufactured by Mitsubishi Chemical; “630”, “630LSD”, “604” (glycidylamine type epoxy resin) manufactured by Mitsubishi Chemical; “ ED-523T" (glycylol type epoxy resin); "EP-3950L", "EP-3980S" (glycidylamine type epoxy resin) manufactured by ADEKA; "EP-4088S" (dicyclopentadiene type epoxy resin) manufactured by ADEKA ); “ZX1059” manufactured by Nippon Steel Chemical & Materials (a mixture of bisphenol A type epoxy resin and bisphenol F type epoxy resin); “EX-721” manufactured by Nagase ChemteX (glycidyl ester type epoxy resin); Nagase “EX-991L” manufactured by Chemtex (epoxy resin containing alkyleneoxy skeleton and butadiene skeleton); “Celoxide 2021P” manufactured by Daicel (alicyclic epoxy resin having ester skeleton); “PB-3600” manufactured by Daicel ", Nippon Soda Co., Ltd.'s "JP-100", "JP-200" (epoxy resin with a butadiene structure); Nippon Steel Chemical & Material Co., Ltd.'s "ZX1658", "ZX1658GS" (liquid 1,4-glycidylcyclohexane) type epoxy resin); "EG-280" (fluorene structure-containing epoxy resin) manufactured by Osaka Gas Chemical; and "EX-201" (cycloaliphatic glycidyl ether) manufactured by Nagase ChemteX.

(A) When using a solid epoxy resin and a liquid epoxy resin in combination as the epoxy resin, their mass ratio (solid epoxy resin: liquid epoxy resin) is preferably 10:1 to 1:50, more preferably is from 5:1 to 1:20, particularly preferably from 2:1 to 1:10.

(A) The epoxy resin preferably includes an epoxy resin having a skeleton selected from a naphthalene skeleton and a biphenyl skeleton, and particularly preferably includes an epoxy resin having a naphthalene skeleton.

(A) The epoxy equivalent of the epoxy resin is preferably 50 g/eq. ～5,000g/eq. , more preferably 60g/eq. ~2,000g/eq. , more preferably 70g/eq. ～1,000g/eq. , even more preferably 80 g/eq. ～500g/eq. It is. Epoxy equivalent is the mass of resin per equivalent of epoxy group. This epoxy equivalent can be measured according to JIS K7236.

The weight average molecular weight (Mw) of the epoxy resin (A) is preferably 100 to 5,000, more preferably 250 to 3,000, even more preferably 400 to 1,500. The weight average molecular weight of the resin can be measured as a value in terms of polystyrene by gel permeation chromatography (GPC).

(A) The content of the epoxy resin is preferably 5% by mass or more, more preferably 10% by mass, from the viewpoint of further improving mechanical strength and insulation reliability, when the nonvolatile components of the photosensitive resin composition are 100% by mass. It is at least 15% by mass, more preferably at least 15% by mass, preferably at most 40% by mass, more preferably at most 35% by mass, even more preferably at most 30% by mass.

<(B) Resin containing a carboxyl group and an ethylenic double bond>
The photosensitive resin composition of the present invention contains, as the component (B), a resin containing a (B) carboxyl group and an ethylenic double bond. The (B) resin containing a carboxy group and an ethylenic double bond as the component (B) does not include those corresponding to the component (A) described above. Component (B) may be used alone or in combination of two or more.

(B) Since the resin containing a carboxyl group and an ethylenic double bond contains a carboxyl group which is an acidic group, the photosensitive resin composition of the present invention can be prepared using an alkaline solution such as a 1% by mass aqueous sodium carbonate solution. It can be soluble in a developer. (B) In the resin containing a carboxyl group and an ethylenic double bond, the number of carboxyl groups in one molecule may be one or two or more.

(B) The resin containing a carboxyl group and an ethylenic double bond contains an ethylenic double bond as an aliphatic carbon-carbon unsaturated bond. Therefore, (B) the resin containing a carboxyl group and an ethylenic double bond can undergo polymerization when the photopolymerization initiator (C) generates radicals.

(B) The resin containing a carboxyl group and an ethylenic double bond usually has the above-mentioned group containing an ethylenic double bond. Since this group generally has radical polymerizability, it may be hereinafter referred to as a "radical polymerizable group." Examples of the radically polymerizable group include (meth)acryloyl group (acryloyl group or methacryloyl group), vinyl group, allyl group, propargyl group, butenyl group, ethynyl group, phenylethynyl group, maleimide group, nadimide group, etc. From the viewpoint of radical polymerization reactivity, a (meth)acryloyl group is preferred.

(B) The number of radically polymerizable groups per molecule of the resin containing a carboxyl group and an ethylenic double bond may be one or more than two.

(B) In one embodiment, the resin containing a carboxyl group and an ethylenic double bond is preferably an acid-modified epoxy (meth)acrylate resin.

Since the acid-modified epoxy (meth)acrylate resin has a (meth)acryloyl group, in one embodiment, it may be capable of photoradical polymerization. The number of (meth)acryloyl groups per molecule of the acid-modified epoxy (meth)acrylate resin may be one, or two or more.

The acid-modified epoxy (meth)acrylate resin preferably has both a (meth)acryloyl group and a carboxyl group, and is a resin that enables photoradical polymerization and alkaline development.

Acid-modified epoxy (meth)acrylate resin can be produced by acid-modifying epoxy (meth)acrylate resin by a known method. Epoxy (meth)acrylate resin can be produced, for example, by reacting an epoxy resin with acrylic acid or methacrylic acid.

The epoxy resin for producing epoxy (meth)acrylate resin is not particularly limited as long as it is a compound having an epoxy group in the molecule, and examples include bisphenol A epoxy resin, hydrogenated bisphenol A epoxy resin, bisphenol F Bisphenol-type epoxy resins such as hydrogenated bisphenol F-type epoxy resins, bisphenol S-type epoxy resins, and modified bisphenol F-type epoxy resins modified to trifunctional or higher functionality by reacting bisphenol F-type epoxy resins with epichlorohydrin. Biphenol type epoxy resins such as biphenol type epoxy resins and tetramethylbiphenol type; Novolac type epoxy resins such as phenol novolac type epoxy resins, cresol novolac type epoxy resins, bisphenol A type novolac type epoxy resins, alkylphenol novolac type epoxy resins; Bisphenol Fluorine-containing epoxy resins such as AF type epoxy resins and perfluoroalkyl type epoxy resins; naphthalene type epoxy resins, dihydroxynaphthalene type epoxy resins, polyhydroxybinaphthalene type epoxy resins, naphthol type epoxy resins, naphthol aralkyl type epoxy resins, binaphthol type epoxy resin, naphthylene ether type epoxy resin naphthol novolac type epoxy resin, naphthalene type epoxy resin obtained by the condensation reaction of polyhydroxynaphthalene and aldehydes, etc. Epoxy resins having a naphthalene skeleton (epoxy resin containing naphthalene skeleton); Xylenol type epoxy resin; dicyclopentadiene type epoxy resin; trisphenol type epoxy resin; tert-butyl-catechol type epoxy resin; epoxy resin containing a condensed ring skeleton such as anthracene type epoxy resin; glycidylamine type epoxy resin; glycidyl ester type epoxy resin; biphenyl type epoxy resin; linear aliphatic epoxy resin; epoxy resin with butadiene structure; alicyclic epoxy resin; heterocyclic epoxy resin; spiro ring-containing epoxy resin; cyclohexanedimethanol type epoxy resin; trimethylol type epoxy resin; tetraphenylethane type epoxy resin; glycidyl group-containing acrylic resin such as polyglycidyl (meth)acrylate, copolymer of glycidyl methacrylate and acrylic ester; fluorene type epoxy resin; halogenated epoxy resin, etc. .

The epoxy resin for producing the epoxy (meth)acrylate resin is preferably an epoxy resin containing an aromatic skeleton from the viewpoint of significantly obtaining the effects of the present invention. Here, the aromatic skeleton is a concept that also includes polycyclic aromatics and aromatic heterocycles. Among these, any one of a cresol novolac type epoxy resin, a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a biphenyl type epoxy resin, and a naphthol aralkyl type epoxy resin is preferable, and a naphthol aralkyl type epoxy resin is more preferable.

In one embodiment, the acid-modified epoxy (meth)acrylate resin preferably contains an acid-modified epoxy (meth)acrylate resin having a skeleton selected from a naphthol aralkyl skeleton, a naphthalene skeleton, and a biphenyl skeleton; It is particularly preferable to include a modified epoxy (meth)acrylate resin.

In one embodiment, the acid-modified epoxy (meth)acrylate resin is an acid-modified epoxy (meth)acrylate resin in which the hydroxyl group of the epoxy (meth)acrylate resin is esterified (hereinafter referred to as "ester type acid-modified epoxy (meth)acrylate resin"). ), and acid-modified epoxy (meth)acrylate resins in which the hydroxyl groups of epoxy (meth)acrylate resins are urethanized (hereinafter referred to as "urethane type acid-modified epoxy (meth)acrylate resins"). Preferably, it is particularly preferable to include an ester type acid-modified epoxy (meth)acrylate resin.

The ester type acid-modified epoxy (meth)acrylate resin can be produced, for example, by reacting an epoxy (meth)acrylate resin with a polyhydric carboxylic acid anhydride. The ester type acid-modified epoxy (meth)acrylate resins may be used alone or in combination of two or more.

Examples of polycarboxylic anhydrides include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, trimellitic anhydride, pyromellitic anhydride, benzophenone tetra Examples include carboxylic dianhydrides, and any one of these may be used alone or two or more may be used in combination. Among these, succinic anhydride and tetrahydrophthalic anhydride are preferred, and tetrahydrophthalic anhydride is more preferred.

Ester-type acid-modified epoxy (meth)acrylate resins include cresol novolac skeleton-containing ester-type acid-modified epoxy (meth)acrylate resins, bisphenol A skeleton-containing ester-type acid-modified epoxy (meth)acrylate resins, and bisphenol-F skeleton-containing ester-type acid-modified resins. It is preferable to include a resin selected from epoxy (meth)acrylate resins, acid ester-type modified epoxy (meth)acrylate resins containing a biphenyl skeleton, and ester-type acid-modified epoxy (meth)acrylate resins containing a naphthol aralkyl skeleton.

The ester type acid-modified epoxy (meth)acrylate resin can be synthesized by a known method, but a commercially available product may also be used. Specific examples of commercial products include “CCR-1373H” (acid-modified epoxy acrylate resin containing a cresol novolak skeleton), “ZCR-8001H” (acid-modified epoxy acrylate resin containing a biphenyl skeleton), and “ZCR-” manufactured by Nippon Kayaku Co., Ltd. 1569H” (acid-modified epoxy acrylate resin containing biphenyl skeleton), “CCR-1171H” (acid-modified epoxy acrylate resin containing cresol novolak skeleton), “ZCR-1797H” (acid-modified epoxy acrylate resin containing biphenyl skeleton), Nippon Kayaku Co., Ltd. ``ZAR-2000'' (acid-modified epoxy acrylate resin containing bisphenol A skeleton), ``ZFR-1491H'', ``ZFR-1533H'' (acid-modified epoxy acrylate resin containing bisphenol F skeleton), manufactured by Showa Denko ``PR-'' 300CP" (cresol novolac type acid-modified epoxy acrylate resin), Nippon Kayaku Co., Ltd.'s "CCR-1179" (cresol novolac skeleton-containing epoxy acrylate resin), and the like.

A urethane type acid-modified epoxy (meth)acrylate resin can be produced, for example, by reacting an epoxy (meth)acrylate resin with a diisocyanate compound and a carboxyl group-containing diol compound. The urethane type acid-modified epoxy (meth)acrylate resins may be used alone or in combination of two or more.

Examples of diisocyanate compounds include aromatic diisocyanate compounds such as phenylene diisocyanate, tolylene diisocyanate, xylylene diisocyanate, tetramethylxylylene diisocyanate, diphenyl diisocyanate, and naphthalene diisocyanate; hexamethylene diisocyanate, dicyclohexylmethane diisocyanate, isophorone diisocyanate, and arylene sulfone. Examples include aliphatic diisocyanate compounds such as ether diisocyanate, allyl cyanide diisocyanate, N-acyl diisocyanate, trimethylhexamethylene diisocyanate, and 1,3-bis(isocyanatemethyl)cyclohexane.

Examples of the carboxyl group-containing diol compound include dimethylolpropionic acid, dimethylolbutanoic acid, dimethylolnonanoic acid, and the like.

Urethane type acid-modified epoxy (meth)acrylate resins include cresol novolak skeleton-containing urethane-type acid-modified epoxy (meth)acrylate resins, bisphenol A skeleton-containing urethane-type acid-modified epoxy (meth)acrylate resins, bisphenol F skeleton-containing urethane-type acid-modified resins. It is preferable to include a resin selected from epoxy (meth)acrylate resin, acid urethane type modified epoxy (meth)acrylate resin containing biphenyl skeleton, and urethane type acid modified epoxy (meth)acrylate resin containing naphthol aralkyl skeleton.

The urethane type acid-modified epoxy (meth)acrylate resin can be synthesized by a known synthesis method, but a commercially available product may also be used. Known synthetic methods include, for example, the method described in JP-A No. 2016-199719. Specific examples of commercially available products include "UXE-3024", "UXE-3011", "UXE-3012", and "UXE-3024" manufactured by Nippon Kayaku Co., Ltd.

From the viewpoint of improving the alkali developability of the photosensitive resin composition, the acid value of component (B) is preferably 0.1 mgKOH/g or more, more preferably 0.5 mgKOH/g or more, and even more preferably 1 mgKOH/g. /g or more, 10mgKOH/g or more, even more preferably 20mgKOH/g or more, 30mgKOH/g or more, particularly preferably 40mgKOH/g or more, 50mgKOH/g or more. The upper limit of the acid value of component (B) is preferably 200 mgKOH/g or less, more preferably 150 mgKOH/g or less, even more preferably 120 mgKOH/g or less, particularly preferably 100 mgKOH/g or less.

The weight average molecular weight of component (B) is preferably 20,000 or less, more preferably 17,000 or less, even more preferably 15,000 or less, and preferably 1,000 or more, more preferably 1,500 or more. The weight average molecular weight is a polystyrene equivalent weight average molecular weight measured by gel permeation chromatography (GPC).

The content of component (B) is preferably 15% by mass or more, more preferably 25% by mass or more from the viewpoint of improving alkali developability, when the nonvolatile components of the photosensitive resin composition are 100% by mass. It is more preferably 30% by mass or more, preferably 55% by mass or less, still more preferably 50% by mass or less, particularly preferably 45% by mass or less.

Mass ratio of component (B) to (A) epoxy resin (mass (mass%) of component (B) when the nonvolatile component of the photosensitive resin composition is 100% by mass)/nonvolatile component of the photosensitive resin composition The mass (% by mass) of component (A) when expressed as 100% by mass is preferably 0.1 or more, more preferably 0.5 or more, and even more preferably 1 or more. The upper limit is preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less.

<(C) Photopolymerization initiator>
The photosensitive resin composition of the present invention contains (C) a photopolymerization initiator as the (C) component. (C) The photopolymerization initiator is usually capable of generating radicals upon receiving light. Moreover, the photopolymerization initiator (C) can normally generate radicals by receiving energy from the photosensitizer (D) in an excited state. The (C) photopolymerization initiator as the (C) component does not include those corresponding to the above-mentioned (A) and (B) components. Component (C) may be used alone or in combination of two or more.

As component (C), a photopolymerization initiator that can efficiently photocure the photosensitive resin composition can be used. As such a photopolymerization initiator, it is preferable to include either (C1) a photopolymerization initiator with a molecular weight of 420 or more, and (C2) a photopolymerization initiator with a molecular weight of less than 420. Although the (C1) component and the (C2) component may be used in combination, the (C) component includes either the (C1) component or the (C2) component from the viewpoint of significantly obtaining the effects of the present invention. It is preferable that the component (C1) is included.

-(C1) Photopolymerization initiator with a molecular weight of 420 or more -
The molecular weight of component (C1) is usually 420 or more, preferably 500 or more, more preferably 600 or more, and 700 or more, from the viewpoint of manufacturing an optical waveguide that can form a fine core layer and has low optical transmission loss. That's all. The upper limit is not particularly limited, but is preferably 3,000 or less, more preferably 2,500 or less, even more preferably 2,000 or less.

（式中、Ｒ^１は活性光線吸収基を表し、Ｒ^２はそれぞれ独立に２価の炭化水素基を表す。ｎは１～１０の整数を表す。＊は結合手を表す。） As the component (C1), a compound can be used that has a molecular weight of 420 or more, has a group that absorbs active light such as ultraviolet rays, and can efficiently proceed with photopolymerization. Such component (C1) is preferably a compound containing a structural unit represented by formula (C-1), for example.

(In the formula, R ¹ represents an actinic ray absorbing group, and R ² each independently represents a divalent hydrocarbon group. n represents an integer from 1 to 10. * represents a bond.)

R ¹ represents an actinic ray absorbing group. The active light absorbing group is a group that can absorb active light such as ultraviolet rays. The active light absorbing group may be any functional group that can absorb active light, such as a group having an aminoketone skeleton, a group having an anthraquinone skeleton, a group having a thioxanthone skeleton, a group having a ketal skeleton, and a benzophenone skeleton. A group having a xanthone skeleton, a group having an acetophenone skeleton, a group having a benzoin skeleton, a group having a thioxanthone skeleton, a group having a benzoate skeleton, and the like.

Specific examples of actinic ray absorbing groups include the following groups (i) to (vii). Among these, either (i) or (ii) is preferred as the actinic ray absorbing group. In the formula, * represents a bond.

Each R ² independently represents a divalent hydrocarbon group. Examples of the divalent hydrocarbon group include a divalent aliphatic hydrocarbon group and a divalent aromatic hydrocarbon group. preferable.

As the divalent aliphatic hydrocarbon group, a divalent saturated aliphatic hydrocarbon group is preferable, and examples thereof include an alkylene group and an alkenylene group, and an alkylene group is more preferable. The alkylene group may be linear, branched, or cyclic, and preferably linear. The alkylene group is preferably an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having 1 to 6 carbon atoms, an alkylene group having 1 to 5 carbon atoms, or an alkylene group having 1 to 3 carbon atoms. is even more preferable. Examples of such an alkylene group include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, and a cyclohexylene group, with a methylene group being preferred. The alkenylene group may be linear, branched, or cyclic, and preferably linear. The alkenylene group is preferably an alkenylene group having 2 to 10 carbon atoms, more preferably an alkenylene group having 2 to 6 carbon atoms, and even more preferably an alkenylene group having 2 to 5 carbon atoms.

Examples of the divalent aromatic hydrocarbon group include an arylene group and a heteroarylene group. The arylene group or heteroarylene group is preferably an arylene group or heteroarylene group having 6 to 20 carbon atoms, more preferably an arylene group or heteroarylene group having 6 to 10 carbon atoms.

The divalent hydrocarbon group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an arylalkyl group, a silyl group, an acyl group, an acyloxy group, a carboxy group, a sulfo group, a cyano group, a nitro group, a hydroxy group, a mercapto group, Examples include oxo group.

n represents an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 5, even more preferably an integer of 1 to 3.

（一般式（Ｃ－２）中、Ｒ^１１はそれぞれ独立に活性光線吸収基を表し、Ｒ^１２はそれぞれ独立に２価の炭化水素基を表し、Ｒ^１３はｍ価の炭化水素基を表す。ｎ１は１～１０の整数を表し、ｍは１～４の整数を表す。
一般式（Ｃ－３）中、Ｒ^２１、Ｒ^２３はそれぞれ独立に活性光線吸収基を表し、Ｒ^２２はそれぞれ独立に２価の炭化水素基を表す。ｎ２は１～１０の整数を表す。） Component (C1) preferably contains either a compound represented by the following general formula (C-2) or a compound represented by the following general formula (C-3).

(In general formula (C-2), R ¹¹ each independently represents an actinic ray absorbing group, R ¹² each independently represents a divalent hydrocarbon group, and R ¹³ represents an m-valent hydrocarbon group. n1 represents an integer of 1 to 10, and m represents an integer of 1 to 4.
In general formula (C-3), R ²¹ and R ²³ each independently represent an actinic ray absorbing group, and R ²² each independently represents a divalent hydrocarbon group. n2 represents an integer from 1 to 10. )

Each R ¹¹ independently represents an actinic ray absorbing group, and is the same as the actinic ray absorbing group represented by R ¹ in formula (C-1).

R ¹² each independently represents a divalent hydrocarbon group, and is the same as the divalent hydrocarbon group represented by R ² in formula (C-1).

R ¹³ represents an m-valent hydrocarbon group. Examples of m-valent hydrocarbon groups include m-valent aliphatic hydrocarbon groups and m-valent aromatic hydrocarbon groups, and m-valent aliphatic hydrocarbon groups are preferred. For example, when m is 3, alkane to A trivalent group excluding three hydrogen atoms is preferred. Specific examples of the group represented by R ¹³ include those shown below. In the formula, "*" represents a bond.

n1 represents an integer from 1 to 10 and is the same as n in formula (C-1).

m represents an integer of 1 to 4, preferably an integer of 1 to 3, and more preferably 3.

R ²¹ and R ²³ each independently represent an actinic ray absorbing group, and are the same as the actinic ray absorbing group represented by R ¹ in formula (C-1).

R ²² each independently represents a divalent hydrocarbon group, and is the same as the divalent hydrocarbon group represented by R ² in formula (C-1).

Specific examples of component (C1) include the following compounds. However, the component (C1) is not limited to these specific examples. a, b, c, and d each represent an integer from 1 to 10.

As the component (C1), a commercially available product can be used. Examples of commercially available products include "Omnipol910", "OmnipolTP", and "Omnipol9210" manufactured by IGM.

From the viewpoint of significantly obtaining the effects of the present invention, the content of the component (C1) is preferably 0.05% by mass or more, more preferably 0% by mass when the nonvolatile components of the photosensitive resin composition are 100% by mass. .1% by mass or more, more preferably 1% by mass or more, preferably 15% by mass or less, more preferably 13% by mass or less, still more preferably 10% by mass or less.

(A) Mass ratio of component (C1) to epoxy resin (mass (mass %) of component (C1) when non-volatile components of the photosensitive resin composition is 100 mass %/non-volatile components of the photosensitive resin composition) The mass (mass%) of component (A) when taken as 100% by mass is preferably 0.001 or more, more preferably 0.005 or more, from the viewpoint of significantly obtaining the effects of the present invention. It is preferably 0.01 or more, and more preferably 0.01 or more. The upper limit is preferably 1 or less, more preferably 0.5 or less, and even more preferably 0.3 or less.

(B) Mass ratio of component (C1) to resin containing a carboxyl group and an ethylenic double bond (mass (% by mass) of component (C1) when nonvolatile components of the photosensitive resin composition is 100% by mass) /The mass (mass%) of component (B) when the nonvolatile component of the photosensitive resin composition is 100% by mass is preferably 0.001 or more from the viewpoint of significantly obtaining the effects of the present invention. , more preferably 0.002 or more, and even more preferably 0.01 or more. The upper limit is preferably 1 or less, more preferably 0.5 or less, and even more preferably 0.1 or less.

-(C2) Photopolymerization initiator with a molecular weight of less than 420-
The molecular weight of component (C2) is less than 420, preferably 418 or less, more preferably 415 or less, from the viewpoint of significantly obtaining the effects of the present invention. The lower limit is not particularly limited, but is preferably 100 or more, more preferably 200 or more, even more preferably 300 or more.

Component (C2) includes, for example, an oxime ester photopolymerization initiator, an α-aminoketone photopolymerization initiator, a phosphine oxide photopolymerization initiator, an α-hydroxyketone photopolymerization initiator, and a benzoin photopolymerization initiator. , a benzyl ketal photopolymerization initiator, an acylphosphine photopolymerization initiator, and the like.

Examples of oxime ester photopolymerization initiators include 2-(benzoyloxyimino)-1-[4-(phenylthio)phenyl]octan-1-one (OXE01), [1-[9-ethyl-6-( 2-Methylbenzoyl)carbazol-3-yl]ethylideneamino]acetate (OXE02), ethanone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-,1-( O-acetyloxime), etc.

Examples of the α-aminoketone photopolymerization initiator include 2-methyl-1-phenyl-2-morpholinopropan-1-one, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropane- 1-one, 2-methyl-1-(4-hexylphenyl)-2-morpholinopropan-1-one, 2-ethyl-2-(dimethylamino)-1-(4-morpholinophenyl)butane-1- 2-benzyl-2-(dimethylamino)-1-(4-morpholinophenyl)butan-1-one, 2-(dimethylamino)-2-(4-methylphenylmethyl)-1-(4- Examples include morpholinophenyl)butan-1-one, 2-methyl-1-(9,9-dibutylfluoren-2-yl)-2-morpholinopropan-1-one, and the like.

Examples of the phosphine oxide photopolymerization initiator include bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide, (2,4,6-trimethylbenzoyl)diphenylphosphine oxide, polyoxyethylene glycerin ether tris[phenyl( 2,4,6-trimethylbenzoyl)phosphinate] (Polymeric TPO-L) and the like.

Examples of the α-hydroxyketone photopolymerization initiator include 1-hydroxycyclohexylphenylketone, 2-hydroxy-2-methyl-1-phenylpropanone, 1-[4-(2-hydroxyethoxy)phenyl]-2 -hydroxy-2-methylpropanone, 2-hydroxy-1-{4-[4-(2-hydroxy-2-methylpropionyl)benzyl]phenyl}-2-methylpropan-1-one, and the like.

Examples of the benzoin-based photopolymerization initiator include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether. Examples of the benzyl ketal photopolymerization initiator include 2,2-dimethoxy-2-phenylacetophenone.

Examples of the acylphosphine-based photopolymerization initiator include bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide.

In one embodiment, the component (C2) is any one of an oxime ester photopolymerization initiator, an α-aminoketone photopolymerization initiator, and an acylphosphine photopolymerization initiator, from the viewpoint of significantly obtaining the effects of the present invention. It is preferable to contain

As the component (C2), commercially available products can be used. Specific examples of commercial products of component (C2) include "Omnirad907", "Omnirad369", "Omnirad379", "Omnirad379EG", "Omnirad819", "OmniradTPO" manufactured by IGM, "IrgacureTPO" manufactured by BASF, " Examples include "Irgacure OXE-01", "Irgacure OXE-02", and "N-1919" manufactured by ADEKA.

From the viewpoint of significantly obtaining the effects of the present invention, the content of component (C2) is preferably 0.05% by mass or more, more preferably 0.05% by mass or more, when the nonvolatile components of the photosensitive resin composition are 100% by mass. The content is 1% by mass or more, more preferably 1% by mass or more, preferably 15% by mass or less, more preferably 13% by mass or less, even more preferably 10% by mass or less.

(A) Mass ratio of component (C2) to epoxy resin (mass (mass%) of component (C2) when nonvolatile components of the photosensitive resin composition is 100% by mass/nonvolatile components of the photosensitive resin composition) The mass (mass%) of component (A) when taken as 100% by mass is preferably 0.001 or more, more preferably 0.005 or more, from the viewpoint of significantly obtaining the effects of the present invention. It is preferably 0.01 or more, and more preferably 0.01 or more. The upper limit is preferably 1 or less, more preferably 0.5 or less, and even more preferably 0.3 or less.

(B) Mass ratio of component (C2) to resin containing a carboxyl group and ethylenic double bond (mass of component (C2) when the nonvolatile components of the photosensitive resin composition is 100% by mass) /The mass (mass%) of component (B) when the nonvolatile component of the photosensitive resin composition is 100% by mass is preferably 0.001 or more from the viewpoint of significantly obtaining the effects of the present invention. , more preferably 0.002 or more, and even more preferably 0.01 or more. The upper limit is preferably 1 or less, more preferably 0.5 or less, and even more preferably 0.1 or less.

As for the content of component (C) (total content of components (C1) and (C2)), the nonvolatile components of the photosensitive resin composition were set at 100% by mass, from the viewpoint of significantly obtaining the effects of the present invention. In the case of % by mass or less.

The photosensitive resin composition contains, in combination with component (C), N,N-dimethylaminobenzoic acid ethyl ester, N,N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylamino as a photopolymerization initiation aid. It may also contain tertiary amines such as benzoate, triethylamine, and triethanolamine. One type of photopolymerization initiation aid may be used alone, or two or more types may be used in combination.

<(D) Photosensitizer with a molecular weight of 400 or more>
The photosensitive resin composition of the present invention contains (D) a photosensitizer having a molecular weight of 400 or more as component (D). (D) A photosensitizer can normally be brought into an excited state upon receiving light, but the photosensitizer itself does not generate radicals. Further, (D) the photosensitizer can normally transfer its energy to the (C) photoinitiator when it becomes excited. The (D) photosensitizer having a molecular weight of 400 or more as component (D) does not include those corresponding to the above-mentioned components (A) to (C). Component (D) may be used alone or in combination of two or more.

Since component (D) has a large molecular weight of 400 or more, the energy obtained by absorbing light is greater than that of a photosensitizer with a molecular weight of less than 400. When component (C) receives this energy, the speed of photopolymerization increases. As a result, photopolymerization proceeds before photopolymerization is inhibited by oxygen, so that photocuring of the photosensitive resin composition can proceed quickly and the solubility in an alkaline developer can be quickly reduced. Since the line width (line) and interval (space) of the core layer can be reduced, it becomes possible to form a fine core layer. Further, since it is possible to suppress variations in the degree of insolubilization on the surface portion of the core layer due to the influence of oxygen inhibition, the surface roughness of the core layer can be reduced, and therefore, the surface unevenness of the lines of the core layer can be reduced. Furthermore, the molecular size of component (D) having a large molecular weight is generally large. The solubility of such large-sized molecules in a developer solution tends to be lower than that of small-sized molecules. Therefore, the frequency of detachment of molecules from the surface of the core layer due to dissolution during development can be suppressed, and, for example, it is possible to suppress the frequent detachment of small molecules from the surface of the core layer and the formation of many minute irregularities. Therefore, this also makes it possible to reduce the surface irregularities of the lines of the core layer and improve the core formability.

The molecular weight of component (D) is 400 or more, preferably 450 or more, more preferably 450 or more, from the viewpoint of manufacturing an optical waveguide that is capable of forming a fine core layer and has few core surface irregularities and low optical transmission loss. Preferably it is 500 or more. The upper limit is not particularly limited, but is preferably 3,000 or less, more preferably 2,500 or less, even more preferably 2,000 or less.

(D) The maximum absorption wavelength of the photosensitizer is preferably between 300 nm and 450 nm, more preferably between 330 nm and 420 nm, and particularly preferably between 350 nm and 400 nm.

The lowest excited triplet energy level of component (D) is preferably 60 kcal/mol to 70 kcal/mol, more preferably 60 kcal/mol to 65 kcal/mol, particularly preferably 60 kcal/mol to 63 kcal/mol. be.

From the viewpoint of significantly obtaining the effects of the present invention, component (D) preferably contains a tertiary amino group in the molecule, and more preferably contains a tertiary amino group at the end of the molecule. It is preferable to have one or more tertiary amino groups in the molecule, and more preferably two or more. The lower limit is not particularly limited, but is preferably 10 or less, more preferably 5 or less. The tertiary amino group is preferably a tertiary alkylamino group. Examples of the tertiary amino group include dimethylamino group and diethylamino group, with dimethylamino group being preferred.

From the viewpoint of significantly obtaining the effects of the present invention, component (D) preferably contains an aminobenzoyl group in the molecule, and more preferably contains an aminobenzoyl group at the end of the molecule. It is preferable that the molecule contains one or more aminobenzoyl groups, and more preferably two or more aminobenzoyl groups. The lower limit is not particularly limited, but is preferably 10 or less, more preferably 5 or less. The aminobenzoyl group is preferably a tertiary alkylaminobenzoyl group, and examples of the aminobenzoyl group include a dimethylaminobenzoyl group and a diethylaminobenzoyl group, with a dimethylaminobenzoyl group being preferred.

（式中、Ｒ^４１、Ｒ^４２、Ｒ^４５、及びＲ^４６は、それぞれ独立に炭素原子数１～６のアルキル基を表し、Ｒ^４３は、それぞれ独立に炭素原子数１～６のアルキレン基、酸素原子、－ＮＲ－、及びそれらの組み合わせからなる群から選択れる２価の基を表し、Ｒは水素原子、又は炭素原子数１～３のアルキル基を表し、Ｒ^４４は、炭素原子数１～６のアルキレン基、酸素原子、及びそれらの組み合わせからなる群から選択れる２価の基を表す。ｒは１～１０の整数を表す。） From the viewpoint of significantly obtaining the effects of the present invention, component (D) preferably contains a compound represented by formula (D-1).

(In the formula, R ⁴¹ , R ⁴² , R ⁴⁵ , and R ⁴⁶ each independently represent an alkyl group having 1 to 6 carbon atoms, R ⁴³ each independently represents an alkylene group having 1 to 6 carbon atoms, Represents a divalent group selected from the group consisting of an oxygen atom, -NR-, and a combination thereof, R represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and R ⁴⁴ represents a group consisting of 1 to 3 carbon atoms. Represents a divalent group selected from the group consisting of ~6 alkylene groups, oxygen atoms, and combinations thereof. r represents an integer of 1 to 10.)

R ⁴¹ , R ⁴² , R ⁴⁵ and R ⁴⁶ each independently represent an alkyl group having 1 to 6 carbon atoms. The alkyl group may be linear, branched, or cyclic, and preferably linear. The alkyl group having 1 to 6 carbon atoms is preferably an alkyl group having 1 to 5 carbon atoms, more preferably an alkyl group having 1 to 3 carbon atoms, and even more preferably a methyl group.

R ⁴³ each independently represents a divalent group selected from the group consisting of an alkylene group having 1 to 6 carbon atoms, an oxygen atom, -NR-, and a combination thereof; R is a hydrogen atom or a carbon atom; Represents 1 to 3 alkyl groups.

R represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. Examples of the alkyl group having 1 to 3 carbon atoms include a methyl group, an ethyl group, a propyl group, and the like. R is preferably an alkyl group having 1 to 3 carbon atoms, more preferably an alkyl group having 1 or 2 carbon atoms, and even more preferably a methyl group.

The alkylene group may be linear, branched, or cyclic, and preferably linear. The alkylene group having 1 to 6 carbon atoms is preferably an alkylene group having 1 to 5 carbon atoms, more preferably an alkylene group having 1 to 3 carbon atoms, an alkylene group having 1 or 2 carbon atoms, or an ethylene group. More preferred.

Examples of the divalent group selected from the group consisting of combinations include oxymethyleneaminomethyl group, oxyethyleneaminomethyl group, oxypropyleneaminomethyl group, oxybutyleneaminomethyl group, oxypentyleneaminomethyl group, Oxyalkylene aminoalkyl structure consisting of xylene aminomethyl group, oxymethylene aminoethyl group, oxyethylene aminoethyl group, oxypropylene aminoethyl group, oxybutylene aminoethyl group, oxypentylene aminoethyl group, oxyhexylene aminoethyl group, etc. Divalent group consisting of an oxyalkylene structure such as oxymethylene group, oxyethylene group, oxypropylene group, oxybutylene group, oxypentylene group, oxyhexylene group; methyleneoxy group, ethylene Divalent group consisting of alkyleneoxy structure consisting of oxy group, propyleneoxy group, butyleneoxy group, pentyleneoxy group, hexyleneoxy group, etc.; oxymethyleneoxy group, oxyethyleneoxy group, oxypropyleneoxy group, oxybutylene Divalent group consisting of oxyalkyleneoxy structure consisting of oxy group, oxypentyleneoxy group, oxyhexyleneoxy group, etc.; methyleneoxymethylene group, ethyleneoxyethylene group, propyleneoxypropylene group, butyleneoxybutylene group, pentylene group Divalent group consisting of alkyleneoxyalkylene structure consisting of oxypentylene group, hexyleneoxyhexylene group, etc.; methyleneoxymethyleneoxy group, ethyleneoxyethyleneoxy group, propyleneoxypropyleneoxy group, butyleneoxybutyleneoxy group, pentyleneoxy group Divalent groups consisting of an alkyleneoxyalkyleneoxyalkylene structure consisting of a renoxypentyleneoxy group, a hexyleneoxyhexyleneoxy group, etc. can be mentioned.

Among these, R ⁴³ is preferably either a divalent group consisting of an oxyalkylene aminoalkyl structure or a divalent group consisting of an oxyalkyleneoxy structure, from the viewpoint of significantly obtaining the effects of the present invention. As the divalent group having an oxyalkylene aminoalkyl structure, an oxyethylene aminomethyl group is preferable. As the divalent group having an oxyalkyleneoxy structure, an oxyethyleneoxy group is preferable.

R ⁴⁴ represents a divalent group selected from the group consisting of an alkylene group having 1 to 6 carbon atoms, an oxygen atom, and a combination thereof. The divalent group selected from the group consisting of alkylene groups having 1 to 6 carbon atoms, and combinations is the divalent group selected from the group consisting of alkylene groups having 1 to 6 carbon atoms, and combinations, which R ⁴³ represents. It is the same as the base of

From the viewpoint of significantly obtaining the effects of the present invention, R ⁴⁴ is preferably a divalent group having an alkyleneoxy structure. As the divalent group having an alkyleneoxy structure, an ethyleneoxy group is preferable.

r represents an integer of 1 to 10, preferably an integer of 1 to 5, more preferably an integer of 1 to 4, and more preferably 3 or 4.

The nitrogen atom bonded to the benzene ring may be bonded at any of the ortho, meta, and para positions, and from the viewpoint of significantly obtaining the effects of the present invention, the nitrogen atom may be bonded at the para position. is preferred.

Even if the alkyl group having 1 to 6 carbon atoms represented by R ⁴¹ , R ⁴² , R ⁴⁵ , and R ⁴⁶ and the alkylene group having 1 to 6 carbon atoms represented by R ⁴³ and R ⁴⁴ have a substituent, good. Examples of the substituent include a halogen atom, an alkoxy group, an aryl group, an arylalkyl group, a silyl group, an acyl group, an acyloxy group, a carboxy group, a sulfo group, a cyano group, a nitro group, a hydroxy group, a mercapto group, an oxo group, etc. can be mentioned.

Specific examples of component (D) include the following compounds. However, component (D) is not limited to these specific examples. r1 represents 3 or 4.

As the component (D), commercially available products can be used. Examples of commercially available products include "Omnipol ASA" and "Esacure A 198" manufactured by IGM.

From the viewpoint of significantly obtaining the effects of the present invention, the content of component (D) is preferably 0.5% by mass or more, more preferably 1% by mass when the nonvolatile components of the photosensitive resin composition are 100% by mass. It is at least 15% by mass, more preferably at most 13% by mass, even more preferably at most 10% by mass.

Mass ratio of component (D) to component (A) (mass (mass%) of component (D) when the nonvolatile component of the photosensitive resin composition is 100% by mass/nonvolatile component of the photosensitive resin composition is 100%) The mass (mass %) of component (A) expressed as mass % is preferably 1 or more, more preferably 2 or more, and even more preferably 3 or more. The upper limit is preferably 15 or less, more preferably 10 or less, and even more preferably 8 or less.

Mass ratio of component (D) to component (B) (mass (mass%) of component (D) when the nonvolatile component of the photosensitive resin composition is 100% by mass/nonvolatile component of the photosensitive resin composition is 100%) The mass (mass%) of component (B) expressed as mass% is preferably 0.01 or more, more preferably 0.02 or more, and even more preferably 0.03 or more. . The upper limit is preferably 1 or less, more preferably 0.5 or less, and even more preferably 0.2 or less.

Mass ratio of component (D) to component (C) (mass (mass %) of component (D) when non-volatile components of the photosensitive resin composition is 100 mass %/non-volatile components of the photosensitive resin composition is 100 mass %) The mass (mass%) of component (C) expressed as mass% is preferably 0.1 or more, more preferably 0.2 or more, and even more preferably 0.3 or more. . The upper limit is preferably 35 or less, more preferably 10 or less, further preferably 5 or less, and even more preferably 3 or less.

<(E) Inorganic filler with an average particle size of 100 nm or less>
The photosensitive resin composition of the present invention may contain (E) an inorganic filler having an average particle size of 100 nm or less as an optional component. (E) The inorganic filler is contained in the photosensitive resin composition in the form of particles.

The average particle size of component (E) is 100 nm or less, preferably 90 nm or less, more preferably 80 nm or less, from the viewpoint of suppressing light reflection during exposure and obtaining excellent core forming properties and developability. Preferably it is 5 nm or more, more preferably 10 nm or more.

The average particle size of the inorganic filler can be measured by a laser diffraction/scattering method based on Mie scattering theory. Specifically, it can be measured by creating the particle size distribution of the inorganic filler on a volume basis using a laser diffraction scattering particle size distribution measuring device, and using the median diameter as the average particle size. As the measurement sample, one in which an inorganic filler is dispersed in water using ultrasonic waves can be preferably used. As the laser diffraction scattering particle size distribution analyzer, "LA-500" manufactured by Horiba, "SALD-2200" manufactured by Shimadzu Corporation, etc. can be used.

The specific surface area of component (E) is preferably 1 m ² /g or more, more preferably 3 m ² /g or more, particularly preferably 5 m ² from the viewpoint of suppressing light reflection during exposure and obtaining excellent core forming properties. /g or more. Although there is no particular limit to the upper limit, it is preferably 60 m ² /g or less, 50 m ² /g or less, or 40 m ² /g or less. The specific surface area can be obtained by adsorbing nitrogen gas on the sample surface using a specific surface area measuring device (Macsorb HM-1210 manufactured by Mountec) according to the BET method, and calculating the specific surface area using the BET multi-point method. .

As the material for component (E), an inorganic compound is used. Materials for component (E) include, for example, silica, alumina, glass, cordierite, silicon oxide, barium sulfate, barium carbonate, talc, clay, mica powder, zinc oxide, hydrotalcite, boehmite, aluminum hydroxide. , magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, aluminum nitride, manganese nitride, aluminum borate, strontium carbonate, strontium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, oxide Examples include zirconium, barium titanate, barium zirconate titanate, barium zirconate, calcium zirconate, zirconium phosphate, and zirconium tungstate phosphate. Among these, silica is particularly suitable. Examples of silica include amorphous silica, fused silica, crystalline silica, synthetic silica, and hollow silica. Further, as the silica, spherical silica is preferable. Component (E) may be used alone or in combination of two or more in any ratio.

As component (E), commercially available products can be used. Such commercially available products include, for example, the "Admanano series" manufactured by Admatex, such as Y50SZ-AM1, the "UFP series" manufactured by Denki Kagaku Kogyo Co., Ltd., the "Sciqas series" manufactured by Sakai Chemical Industry Co., Ltd., and the "Sciqas series" manufactured by Nippon Shokubai Co., Ltd. Examples include "Seahoster Series" and "BF Series" manufactured by Sakai Chemical Industry Co., Ltd.

Component (E) is preferably treated with a surface treatment agent from the viewpoint of improving moisture resistance and dispersibility. Examples of surface treatment agents include fluorine-containing silane coupling agents, aminosilane coupling agents, epoxysilane coupling agents, mercaptosilane coupling agents, silane coupling agents, alkoxysilanes, organosilazane compounds, and titanate-based coupling agents. Examples include coupling agents. Moreover, one type of surface treatment agent may be used alone, or two or more types may be used in any combination.

Commercially available surface treatment agents include, for example, "KBM403" (3-glycidoxypropyltrimethoxysilane) manufactured by Shin-Etsu Chemical Co., Ltd., "KBM803" (3-mercaptopropyltrimethoxysilane) manufactured by Shin-Etsu Chemical Co., Ltd. "KBE903" (3-aminopropyltriethoxysilane) manufactured by Kagaku Kogyo, "KBM573" (N-phenyl-3-aminopropyltrimethoxysilane) manufactured by Shin-Etsu Chemical, "SZ-31" manufactured by Shin-Etsu Chemical ( hexamethyldisilazane), "KBM103" (phenyltrimethoxysilane) manufactured by Shin-Etsu Chemical, "KBM-4803" (long chain epoxy type silane coupling agent) manufactured by Shin-Etsu Chemical, "KBM-" manufactured by Shin-Etsu Chemical 7103'' (3,3,3-trifluoropropyltrimethoxysilane).

The degree of surface treatment with the surface treatment agent is preferably within a predetermined range from the viewpoint of improving the dispersibility of the inorganic filler. Specifically, 100% by mass of the inorganic filler is preferably surface-treated with a surface treatment agent of 0.2% by mass to 5% by mass, and preferably 0.2% by mass to 3% by mass. It is more preferable that the surface is treated in an amount of 0.3% by mass to 2% by mass.

The degree of surface treatment by the surface treatment agent can be evaluated by the amount of carbon per unit surface area of the inorganic filler. The amount of carbon per unit surface area of the inorganic filler is preferably 0.02 mg/m ² or more, more preferably 0.1 mg/m ² or more, and 0.2 mg/m ² from the viewpoint of improving the dispersibility of the inorganic filler. The above is more preferable. On the other hand, from the viewpoint of preventing an increase in the melt viscosity of the resin composition or the melt viscosity in sheet form, the amount is preferably 1.0 mg/m ² or less, more preferably 0.8 mg/m ² or less, and 0.5 mg/m ² The following are more preferred.

The amount of carbon per unit surface area of component (E) can be measured after cleaning the surface-treated inorganic filler with a solvent (for example, methyl ethyl ketone (MEK)). Specifically, a sufficient amount of MEK as a solvent is added to the inorganic filler whose surface has been treated with a surface treatment agent, and the mixture is subjected to ultrasonic cleaning at 25° C. for 5 minutes. After removing the supernatant liquid and drying the solid content, the amount of carbon per unit surface area of the inorganic filler can be measured using a carbon analyzer. As the carbon analyzer, "EMIA-320V" manufactured by Horiba, Ltd., etc. can be used.

The content of component (E) is preferably 5% by mass or more, more preferably 10% by mass, from the viewpoint of significantly obtaining the effects of the present invention, when the nonvolatile components in the photosensitive resin composition are 100% by mass. Above, it is more preferably 15% by mass or more, preferably 35% by mass or less, more preferably 30% by mass or less, still more preferably 25% by mass or less.

<(F) Reactive diluent>
The photosensitive resin composition of the present invention may contain (F) a reactive diluent as an optional component. The reaction diluent (F) as component (F) does not include any of the components (A) to (E) described above. Component (F) may be used alone or in combination of two or more.

(F) Photoreactivity can be improved by incorporating a reactive diluent into the photosensitive resin composition. (F) As the reactive diluent, for example, a (meth)acrylate compound having one or more (preferably two or more) (meth)acryloyl groups in one molecule can be used.

Typical (meth)acrylate compounds include, for example, hydroxyalkyl acrylates such as 2-hydroxyethyl acrylate and 2-hydroxybutyl acrylate, mono- or glycols such as ethylene glycol, methoxytetraethylene glycol, polyethylene glycol, and propylene glycol. Diacrylates, acrylamides such as N,N-dimethylacrylamide and N-methylolacrylamide, aminoalkyl acrylates such as N,N-dimethylaminoethyl acrylate, polyhydric alcohols such as trimethylolpropane, pentaerythritol, and dipentaerythritol. or polyacrylates of adducts of these ethylene oxide, propylene oxide or ε-caprolactone, phenols such as phenoxy acrylate, phenoxyethyl acrylate, or acrylates such as ethylene oxide or propylene oxide adducts thereof, trimethylolpropane triglycidyl Examples include epoxy acrylates derived from glycidyl ethers such as ethers, modified epoxy acrylates, melamine acrylates, and/or methacrylates corresponding to the above-mentioned acrylates. Among these, polyvalent acrylates or polyvalent methacrylates are preferred. For example, trivalent acrylates or methacrylates include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, and trimethylolpropane. EO-added tri(meth)acrylate, glycerin PO-added tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, tetrafurfuryl alcohol oligo(meth)acrylate, ethyl carbitol oligo(meth)acrylate, 1,4-butanediol Oligo(meth)acrylate, 1,6-hexanediol oligo(meth)acrylate, trimethylolpropane oligo(meth)acrylate, pentaerythritol oligo(meth)acrylate, tetramethylolmethanetetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate ) acrylate, (meth)acrylic acid ester of N,N,N',N'-tetrakis(β-hydroxyethyl)ethyldiamine, etc. As trivalent or higher acrylates or methacrylates, tri(2- (meth)acryloyloxyethyl) phosphate, tri(2-(meth)acryloyloxypropyl)phosphate, tri(3-(meth)acryloyloxypropyl)phosphate, tri(3-(meth)acryloyl-2-hydroxyloxypropyl) Phosphate, di(3-(meth)acryloyl-2-hydroxyloxypropyl) (2-(meth)acryloyloxyethyl) phosphate, (3-(meth)acryloyl-2-hydroxyloxypropyl) di(2-(meth) Phosphoric triester (meth)acrylates such as acryloyloxyethyl) phosphate can be mentioned. These photosensitive (meth)acrylate compounds may be used alone or in combination of two or more. "EO" refers to ethylene oxide.

(F) A commercially available product can be used as the reaction diluent. Examples of commercially available products include "DPHA" manufactured by Nippon Kayaku Co., Ltd. and "EBECRYL3708" manufactured by Daicel Allnex.

(F) Reactive diluents typically have low viscosities. (F) The specific viscosity of the reactive diluent is usually less than 0.5 Pa·s. (F) The lower limit of the viscosity of the reactive diluent is not particularly limited, and may be, for example, 0.001 Pa·s or more, 0.005 Pa·s or more, 0.01 Pa·s or more. (F) The viscosity of the reactive diluent can be measured using an E-type viscometer at 25±2°C.

(F) The content of the reaction diluent is preferably 5% by mass or more, more preferably 10% by mass from the viewpoint of promoting photocuring, when the nonvolatile component in the photosensitive resin composition is 100% by mass. or more, preferably 40% by mass or less, more preferably 35% by mass or less, still more preferably 30% by mass or less.

<(G) Solvent>
The photosensitive resin composition may contain (G) a solvent as a volatile component in combination with non-volatile components such as the above-mentioned components (A) to (F). According to the solvent (G) as the component (G), the viscosity of the photosensitive resin composition can be adjusted. (G) Examples of the solvent include organic solvents.

(G) Solvents include, for example, ketone solvents such as ethyl methyl ketone (MEK) and cyclohexanone; aromatic hydrocarbon solvents such as toluene, xylene, and tetramethylbenzene; methyl cellosolve, butyl cellosolve, methyl carbitol, butyl carbitol, Glycol ether solvents such as propylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol diethyl ether, triethylene glycol monoethyl ether; esters such as ethyl acetate, butyl acetate, butyl cellosolve acetate, carbitol acetate, ethyl diglycol acetate, etc. Solvents: Ether ester solvents such as propylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, ethyl diglycol acetate, γ-butyrolactone, methyl methoxypropionate; Aliphatic hydrocarbon solvents such as octane and decane; petroleum ether, petroleum naphtha , hydrogenated petroleum naphtha, solvent naphtha, and other petroleum solvents. (G) Solvents may be used alone or in combination of two or more.

(G) The amount of solvent is preferably adjusted appropriately from the viewpoint of coating properties of the photosensitive resin composition.

<(H) Optional additive>
The photosensitive resin composition of the present invention may further contain (H) any additive as an optional component, in combination with the above-mentioned components (A) to (G), to the extent that the effects of the present invention are not significantly impaired. You can stay there. This optional additive (H) does not include those corresponding to the components (A) to (G) described above. (H) The optional additives may be used alone or in combination of two or more.

(H) Examples of optional additives include photosensitizers with a molecular weight of less than 400, ultraviolet absorbers, silane coupling agents, plasticizers, flame retardants, antistatic agents, antiaging agents, antibacterial agents, and antifoaming agents. agents, leveling agents, thickeners, adhesion agents, thixotropy agents, mold release agents, surface treatment agents, dispersants, surface modifiers, stabilizers, and the like.

The photosensitive resin composition is prepared by mixing the above-mentioned (A) to (D) components as essential components and appropriately mixing the above-mentioned (E) to (H) components as optional components. A resin varnish can be produced by kneading or stirring using a kneading means such as a ball mill, bead mill, or sand mill, or a stirring means such as a super mixer, a planetary mixer, or a high-speed rotation mixer.

<Physical properties and uses of photosensitive resin composition>
The photosensitive resin composition described above can be used to form a core layer of an optical waveguide. The core layer formed usually contains a cured product of the photosensitive resin composition described above. The photosensitive resin composition can usually be cured by light, preferably by light and heat. Generally, among the components contained in a photosensitive resin composition, the solvent (G) is a volatile component and can be volatilized by the heat during curing, but other non-volatile components are not volatilized by the heat during curing. Therefore, the cured product of the photosensitive resin composition may contain the nonvolatile components of the photosensitive resin composition or a reaction product thereof. The core layer preferably contains only a cured product of the photosensitive resin composition.

Since the photosensitive resin composition contains a combination of components (A) to (D), it exhibits excellent core-forming properties. Specifically, when a line layer corresponding to a core layer is formed by exposing and developing a photosensitive resin composition, a line layer with a small minimum fine formation width can be formed. For example, a photosensitive resin composition is exposed and developed to form line layers with L/S (line/space) of 10 μm/10 μm, 5 μm/5 μm, and 3 μm/3 μm. In this case, the aspect ratio of any line layer can be preferably 0.6 or more, more preferably 0.8 or more, and even more preferably 1 or more. Here, in L/S, L (line) represents the width of the line layer, and S (space) represents the interval between lines. Further, the aspect ratio of the line layer represents the ratio expressed by "layer thickness/line width" of the line layer. According to the photosensitive resin composition having such excellent core-forming properties, it is possible to form a core layer with a small width and a small interval, and it is possible to achieve miniaturization of an optical waveguide. The minimum fine formation width can be measured according to the method described in Examples described later.

Since the photosensitive resin composition contains a combination of components (A) to (D), it exhibits excellent core-forming properties. Specifically, formation of irregularities on the surface of the line layer corresponding to the core layer can be suppressed. For example, when a line layer is formed by exposing and developing a photosensitive resin composition, formation of irregularities on the surface of the line layer is suppressed. For example, a photosensitive resin composition is exposed and developed to form line layers with L/S (line/space) of 10 μm/10 μm, 5 μm/5 μm, and 3 μm/3 μm. In this case, there is no unevenness on the surface of any line layer. According to the photosensitive resin composition in which the occurrence of surface irregularities is suppressed in this way, a core layer having no irregularities on the surface can be formed, and optical transmission loss can be reduced. The evaluation of surface unevenness can be measured according to the method described in Examples described later.

Since the photosensitive resin composition contains a combination of components (A) to (D), it exhibits the property of being able to reduce optical transmission loss. Specifically, a test substrate having a cladding layer and a core layer formed using a photosensitive resin composition is produced. Optical transmission loss will be measured using this test board. At this time, the optical transmission loss is preferably less than 2 dB/cm, more preferably less than 1 dB/cm. The lower limit is not particularly limited, but may be 0 dB/cm or more, 0.1 dB/cm or more, etc. Optical transmission loss can be measured according to the method described in Examples below.

Since the photosensitive resin composition contains a combination of components (A) to (D), it usually exhibits the characteristic that a cured product with excellent absorbance at 1310 nm can be obtained. Specifically, a photosensitive resin composition is dissolved in a solvent to prepare a photosensitive resin composition solution. The absorbance of this photosensitive resin composition solution at 1310 nm is measured using an ultraviolet-visible near-infrared spectrophotometer. At this time, the absorbance is preferably less than 0.0100, more preferably less than 0.0050, and still more preferably less than 0.0025. The lower limit is not particularly limited, but may be 0.0001 or more. Absorbance can be measured according to the method described in Examples below.

In the photosensitive resin composition of the present invention, non-exposed areas that are not irradiated with light can usually be removed by a developer. In particular, the photosensitive resin composition of the present invention can be effectively removed by a sodium carbonate solution as an alkaline developer. Therefore, the photosensitive resin composition of the present invention can be suitably used for sodium carbonate development.

Further, the photosensitive resin composition of the present invention has excellent core forming properties and can reduce optical transmission loss, so it can be suitably used as a photosensitive resin composition for forming a core layer of an optical waveguide. Therefore, the photosensitive resin composition of the present invention can be used for producing a core layer of an optical waveguide (a photosensitive resin composition for forming a core layer of an optical waveguide), and for forming an optical waveguide capable of transmitting light with a wavelength of 1300 nm to 1320 nm ( It can be suitably used as a photosensitive resin composition for forming an optical waveguide capable of transmitting light with a wavelength of 1300 nm to 1320 nm. The photosensitive resin composition of the present invention is preferably used to form a single mode optical waveguide, for example, it is preferably used to form a single mode optical waveguide for light with a wavelength of 1310 nm.

[Resin sheet]
The photosensitive resin composition of the present invention can be suitably used in the form of a resin sheet in which a photosensitive resin composition layer is formed on a support. That is, the resin sheet includes a support and a photosensitive resin composition layer formed from the photosensitive resin composition of the present invention provided on the support.

Examples of the support include polyethylene terephthalate film, polyethylene naphthalate film, polypropylene film, polyethylene film, polyvinyl alcohol film, triacetyl acetate film, etc., and polyethylene terephthalate film is particularly preferred.

Commercially available supports include, for example, "Alphan MA-410" and "E-200C" manufactured by Oji Paper Co., Ltd., polypropylene films manufactured by Shin-Etsu Film Co., Ltd., and "PS-25" manufactured by Teijin Co., Ltd. Examples include polyethylene terephthalate films such as PS series, etc., but are not limited to these. The surface of these supports is preferably coated with a release agent such as a silicone coating agent in order to facilitate removal of the photosensitive resin composition layer. The thickness of the support is preferably in the range of 5 μm to 50 μm, more preferably in the range of 10 μm to 25 μm. By setting the thickness to 5 μm or more, it is possible to suppress the support from tearing when peeling the support before development, and by setting the thickness to 50 μm or less, it is possible to prevent the support from being torn when exposing from above the support. Resolution can be improved. Also, a support with low fisheye is preferred. Here, fish eyes refer to foreign matter, undissolved matter, oxidized deterioration products, etc. of the material being incorporated into the film when the film is manufactured by heat-melting, kneading, extrusion, biaxial stretching, casting, etc. It is something that

Further, in order to reduce scattering of light during exposure to actinic rays such as ultraviolet rays, it is preferable that the support has excellent transparency. Specifically, the support preferably has a turbidity (haze standardized by JIS-K6714) of 0.1 to 5, which is an indicator of transparency. Furthermore, the photosensitive resin composition layer may be protected with a protective film.

By protecting the photosensitive resin composition layer side of the resin sheet with a protective film, adhesion of dust and the like to the surface of the photosensitive resin composition layer and scratches can be prevented. As the protective film, a film made of the same material as the support described above can be used. The thickness of the protective film is not particularly limited, but is preferably in the range of 1 μm to 40 μm, more preferably in the range of 5 μm to 30 μm, and even more preferably in the range of 10 μm to 30 μm. By setting the thickness to 1 μm or more, the handling properties of the protective film can be improved, and by setting the thickness to 40 μm or less, the cost tends to be improved. In addition, the protective film preferably has a smaller adhesive force between the photosensitive resin composition layer and the protective film than the adhesive force between the photosensitive resin composition layer and the support.

The resin sheet can be produced, for example, by preparing a resin varnish in which the photosensitive resin composition of the present invention is dissolved in an organic solvent, coating this resin varnish on a support, and drying the organic solvent by heating or blowing hot air. It can be manufactured by forming a photosensitive resin composition layer. Specifically, first, bubbles in the photosensitive resin composition are completely removed using a vacuum defoaming method, etc., then the photosensitive resin composition is applied onto a support, and the solvent is removed using a hot air oven or far infrared oven. A resin sheet can be manufactured by removing and drying, and then, if necessary, laminating a protective film on the obtained photosensitive resin composition layer. Specific drying conditions vary depending on the curability of the photosensitive resin composition and the amount of organic solvent in the resin varnish, but for resin varnishes containing 30% by mass to 60% by mass of organic solvents, the drying conditions are 80°C to 120°C. It can be dried in 3 to 13 minutes. The amount of residual organic solvent in the photosensitive resin composition layer is preferably 5% by mass or less based on the total amount of the photosensitive resin composition layer, from the viewpoint of preventing diffusion of the organic solvent in a subsequent step. More preferably, the content is 2% by mass or less. Those skilled in the art can appropriately set suitable drying conditions through simple experiments.

The thickness of the photosensitive resin composition layer is preferably 1 μm or more, more preferably 2 μm or more, from the viewpoint of improving handling properties and suppressing deterioration of sensitivity and resolution inside the photosensitive resin composition layer. , more preferably 3 μm or more, preferably 15 μm or less, more preferably 13 μm or less, even more preferably 10 μm or less.

Examples of the coating method of the photosensitive resin composition include a gravure coating method, a microgravure coating method, a reverse coating method, a kiss reverse coating method, a die coating method, a slot die method, a lip coating method, a comma coating method, a blade coating method, Examples include roll coating, knife coating, curtain coating, chamber gravure coating, slot orifice coating, spray coating, and dip coating.

The photosensitive resin composition may be applied in several parts, may be applied in one application, or may be applied in a combination of a plurality of different methods. Among these, the die coating method is preferred because it has excellent uniform coating properties. Furthermore, in order to avoid contamination with foreign matter, it is preferable to carry out the coating process in an environment where foreign matter is less likely to occur, such as in a clean room.

[Photosensitive resin composition set]
The photosensitive resin composition of the present invention can be suitably used as a photosensitive resin composition for forming a core layer of an optical waveguide. Therefore, the photosensitive resin composition set includes the photosensitive resin composition of the present invention and the photosensitive resin composition for cladding. The photosensitive resin composition set may be used for manufacturing an optical waveguide comprising a core layer containing a cured product of the photosensitive resin composition of the present invention and a cladding layer containing a cured product of the photosensitive resin composition for cladding. I can do it. As the photosensitive resin composition for cladding, a known photosensitive resin composition can be used. Since both the photosensitive resin composition of the present invention and the photosensitive resin composition for cladding are photosensitive resin compositions, fine optical waveguides can usually be efficiently manufactured by a method including exposure and development. It is possible.

[Optical waveguide]
The photosensitive resin composition, resin sheet, and photosensitive resin composition set described above can be used for manufacturing an optical waveguide. Hereinafter, embodiments of the optical waveguide will be described using the drawings.

FIG. 1 is a perspective view schematically showing an optical waveguide 10 according to an embodiment of the present invention. As shown in FIG. 1, the optical waveguide 10 includes a core layer 100 and a cladding layer 200. The core layer 100 contains a cured product of the photosensitive resin composition of the present invention, preferably only a cured product of the photosensitive resin composition of the present invention. Further, the cladding layer 200 includes a cured product of the resin composition for cladding, and preferably only contains a cured product of the resin composition for cladding. As the resin composition for cladding, a resin composition that can yield a cured product having a lower refractive index than the cured product of the photosensitive resin composition of the present invention can be used. As the resin composition for cladding, a photocurable resin composition or a thermosetting resin composition may be used.

Core layer 100 is provided within cladding layer 200 . Therefore, the core layer 100 is covered with the cladding layer 200. Usually, the entire circumferential surface of the core layer 100 is covered with the cladding layer 200. The core layer 100 and the cladding layer 200 are in direct contact with each other without any other layer interposed therebetween, so that an interface 100I can be formed between the core layer 100 and the cladding layer 200. Normally, the core layer 100 has a higher refractive index than the cladding layer 200, so light (not shown) is transmitted from one end (incidence side end) 100A of the core layer 100 to the other end (output side end). Up to 100B can be transmitted within the core layer 100.

The wavelength of light that can be transmitted by the optical waveguide 10 can be selected from various values. By way of example, preferred wavelength ranges for transmitted light may be 840 nm to 860 nm (eg, 850 nm), 1300 nm to 1320 nm (eg, 1310 nm), 1540 nm to 1560 nm (eg, 1550 nm), and the like. Among these, the wavelength range of the light transmitted through the optical transmission line 10 is preferably 1300 nm to 1320 nm.

The optical waveguide 10 may be a single mode optical waveguide or a multimode optical waveguide, but is preferably a single mode optical waveguide. Above all, it is preferable that the optical waveguide 10 is a single mode optical waveguide for light in the above-mentioned preferred wavelength range. For example, the optical waveguide 10 is preferably a single mode optical waveguide for light of 1310 nm.

It is desirable that the width L of the core layer 100 is appropriately set within a range that allows light transmission. Specifically, the range of the line width L of the core layer 100 is preferably 0.5 μm or more, more preferably 1 μm or more, particularly preferably 2 μm or more, and preferably 50 μm or less, more preferably 30 μm or less, and particularly preferably 20 μm. or less, and may be less than or equal to 10 μm or less than or equal to 5 μm. The width L of the core layer 100 corresponds to the line width (line) of the core layer 100 when viewed from the thickness direction.

It is desirable that the spacing S between the core layers 100 is appropriately set within a range that allows light transmission. The specific range of the spacing S between the core layers 100 is preferably 50 μm or more, more preferably 70 μm or more, particularly preferably 100 μm or more, and preferably 1000 μm or less, more preferably 500 μm or less, particularly preferably 300 μm or less. . The spacing S between the core layers 100 corresponds to the spacing (space) between the core layers when viewed from the thickness direction.

It is desirable that the thickness T of the core layer 100 is appropriately set within a range that allows light transmission. The specific range of the thickness T of the core layer 100 is preferably 0.5 μm or more, more preferably 1 μm or more, particularly preferably 2 μm or more, and preferably 50 μm or less, more preferably 30 μm or less, particularly preferably 20 μm or less. and may be 10 μm or less.

The thickness of the cladding layer 200 is typically greater than the thickness of the core layer 100. The specific thickness of the cladding layer 200 is preferably 5 μm or more, more preferably 7 μm or more, particularly preferably 10 μm or more, and preferably 40 μm or less, more preferably 30 μm or less, particularly preferably 20 μm or less.

The optical waveguide 10 may include any elements other than the core layer 100 and the cladding layer 200, if necessary. For example, the optical waveguide 10 may include a base material 300. In an optical waveguide 10 including a base material 300, a cladding layer 200 is usually provided on the base material 300, and a core layer 100 is provided within the cladding layer 200.

As the base material 300, a hard substrate such as a glass substrate, a metal substrate, a ceramic substrate, a wafer, a circuit board, etc. may be used. Examples of wafers include silicon wafers, gallium arsenide (GaAs) wafers, indium phosphide (InP) wafers, gallium phosphide (GaP) wafers, gallium nitride (GaN) wafers, gallium telluride (GaTe) wafers, and zinc selenium (ZnSe). A semiconductor wafer such as a wafer or a silicon carbide (SiC) wafer may be used, or a pseudo wafer may be used. As the pseudo wafer, for example, a plate-shaped member including a mold resin and an electronic component embedded in the mold resin can be used. Examples of the circuit board include a glass epoxy board, a metal board, a polyester board, a polyimide board, a BT resin board, a thermosetting polyphenylene ether board, and the like. Note that the circuit board herein refers to a board on which a patterned conductor layer (circuit) is formed on one or both sides of the board as described above. Further, as the substrate 300, a film made of a plastic material such as polyethylene terephthalate, polyimide, polyester, etc. may be used. Furthermore, a flexible circuit board may be employed as the board 300.

Further, the optical waveguide 10 may include a protective layer (not shown) that protects the core layer 100 and the cladding layer 200 as an optional element. The protective layer may be provided, for example, to cover the surface of the cladding layer 200 opposite to the base material 300.

The optical waveguide 10 can have small transmission loss, as described above. Moreover, since the core layer 100 of the optical waveguide 10 has excellent core forming properties, it is possible to suppress the occurrence of surface irregularities and to form fine wiring in the core layer, and as described above, the small line width L It is possible to form the

The optical waveguide 10 can be manufactured using the photosensitive resin composition of the present invention. For example, the optical waveguide 10 is
Step (I) of forming a first composition layer containing a resin composition for cladding;
Step (II) of curing the first composition layer;
Step (III) of forming a second composition layer containing the photosensitive resin composition of the present invention on the first composition layer;
Step (IV) of exposing the second composition layer;
a step (V) of subjecting the second composition layer to a development treatment;
a step (VI) of curing the second composition layer;
A step (VII) of forming a third composition layer containing a cladding resin composition on the second composition layer;
Curing the third composition layer (VIII);
It can be manufactured by a method including in this order.

FIG. 2 is a schematic cross-sectional view for explaining step (I) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. As shown in FIG. 2, the method for manufacturing an optical waveguide according to one embodiment of the present invention includes a step (I) of forming a first composition layer 210 containing a photosensitive resin composition for cladding. In this embodiment, an example will be described in which the first composition layer 210 is formed on the base material 300.

There is no particular restriction on the method of forming the first composition layer 210. For example, the first composition layer 210 may be formed by applying a cladding resin composition onto the base material 300. From the viewpoint of smooth application, a varnish-like resin composition for cladding containing a solvent may be prepared, and the varnish-like resin composition for cladding may be applied.

Application methods include, for example, gravure coating, microgravure coating, reverse coating, kiss reverse coating, die coating, slot die coating, lip coating, comma coating, blade coating, roll coating, and knife coating. method, curtain coating method, chamber gravure coating method, slot orifice method, spin coating method, slit coating method, spray coating method, dip coating method, hot melt coating method, bar coating method, applicator method, air knife coating method, curtain flow coating methods, offset printing method, brush coating method, screen printing method, etc.

The resin composition for cladding may be applied once, or may be applied in multiple times. Further, different coating methods may be combined. In order to avoid contamination with foreign matter, it is preferable that the coating be carried out in an environment where little foreign matter is generated, such as a clean room.

After applying the cladding resin composition, the first composition layer 210 may be dried, if necessary. Drying can be performed using a drying device such as a hot air oven or a far-infrared oven. The drying conditions are preferably set appropriately depending on the composition of the cladding resin composition. To give a specific example, the drying temperature is preferably 50°C or higher, more preferably 70°C or higher, particularly preferably 80°C or higher, and preferably 150°C or lower, more preferably 130°C or lower, particularly preferably 120°C. It is as follows. Further, the drying time is preferably 30 seconds or more, more preferably 60 seconds or more, particularly preferably 120 seconds or more, and preferably 60 minutes or less, more preferably 20 minutes or less, particularly preferably 5 minutes or less.

The first composition layer 210 may be formed using, for example, a cladding resin sheet including a support and a cladding photosensitive resin composition layer made of a cladding photosensitive resin composition. To give a specific example, the first composition layer 210 can be formed on the base material 300 by laminating the cladding photosensitive resin composition layer of the cladding resin sheet onto the base material 300. Lamination is usually performed by pressing the cladding photosensitive resin composition layer of the resin sheet onto the base material 300 while heating. This lamination is preferably performed under reduced pressure by a vacuum lamination method. Moreover, before lamination, a preheating process may be performed to heat the resin sheet and the base material, if necessary.

The laminating conditions are, for example, a compression temperature (laminate temperature) of 70°C to 140°C, a compression pressure of 1kgf/cm ² to 11kgf/cm ² (9.8×10 ⁴ N/m ² to 107.9×10 ⁴ N/ m ² ) and the pressure bonding time is 5 seconds to 300 seconds. Furthermore, lamination is preferably performed under reduced pressure with an air pressure of 20 mmHg (26.7 hPa) or less. Lamination may be performed in a batch manner or in a continuous manner using rolls.

The vacuum lamination method can be performed using a commercially available vacuum laminator. Examples of commercially available vacuum laminators include a vacuum applicator manufactured by Nikko Materials, a vacuum pressurized laminator manufactured by Meiki Seisakusho, a roll dry coater manufactured by Hitachi Industries, and a vacuum laminator manufactured by Hitachi AIC. be able to.

When the first composition layer 210 is formed using a resin sheet for cladding provided with a support, the support is usually peeled off at an appropriate time before step (III).

The first composition layer 210 formed on the base material 300 in step (I) usually contains a resin composition for cladding, and preferably contains only the resin composition for cladding.

The method for manufacturing an optical waveguide according to an embodiment of the present invention includes a step (II) of curing the first composition layer 210 after the step (I). In this step (II), for example, the first composition layer 210 may be heat-treated. The heat treatment conditions may be selected depending on the type and amount of the resin component in the cladding fat composition, preferably in the range of 150°C to 250°C for 20 minutes to 180 minutes, more preferably in the range of 160°C to 230°C. C. for 30 minutes to 120 minutes. The heat treatment is preferably performed in an inert atmosphere such as a nitrogen atmosphere.

Further, the first composition layer 210 may be cured by exposure treatment. In one example, the specific exposure amount range is preferably 10 mJ/cm ² or more, more preferably 50 mJ/cm ² or more, particularly preferably 200 mJ/cm ² or more, and preferably 10,000 mJ/cm ² or less, It is more preferably 8,000 mJ/cm ² or less, still more preferably 4,000 mJ/cm ² or less, particularly preferably 1,000 mJ/cm ² or less. Alternatively, the first composition layer 210 may be cured by combining exposure treatment and heat treatment.

FIG. 3 is a schematic cross-sectional view for explaining step (II) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. By curing the first composition layer 210 in step (II), a cured first composition layer 220 is obtained on the base material 300, as shown in FIG. This hardened first composition layer 220 forms a part of the cladding layer 200, and may be referred to as "lower cladding layer" 220 hereinafter.

FIG. 4 is a schematic cross-sectional view for explaining step (III) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. In the method for manufacturing an optical waveguide according to an embodiment of the present invention, after step (II), as shown in FIG. The method includes a step (III) of forming a second composition layer 110 containing a synthetic resin composition.

There is no particular restriction on the method of forming the second composition layer 110. For example, the second composition layer 110 may be formed by applying the photosensitive resin composition of the present invention onto the lower cladding layer 220. From the viewpoint of smooth application, a varnish-like photosensitive resin composition containing a solvent may be prepared and the varnish-like photosensitive resin composition may be applied. Application of the photosensitive resin composition of the present invention can be performed in the same manner as application of the resin composition for cladding. Moreover, after coating the photosensitive resin composition of the present invention, the second composition layer 110 may be dried, if necessary. The second composition layer 110 may be dried using the same method and conditions as the first composition layer 210.

The second composition layer 110 may be formed using a resin sheet, for example. To give a specific example, the second composition layer 110 can be formed on the lower cladding layer 220 by laminating a photosensitive resin composition layer of a resin sheet onto the lower cladding layer 220. Lamination of the resin sheet can be performed in the same manner as lamination of the resin sheet for cladding. Further, the resin sheet support is peeled off at an appropriate time before step (V).

The second composition layer 110 formed on the lower cladding layer 220 in step (III) usually contains the photosensitive resin composition of the present invention, and preferably contains only the photosensitive resin composition of the present invention.

FIG. 5 is a schematic cross-sectional view for explaining step (IV) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. As shown in FIG. 5, the method for manufacturing an optical waveguide according to an embodiment of the present invention includes a step (IV) of subjecting the second composition layer 110 to an exposure treatment after the step (III).

In step (V), a latent image is formed on the second composition layer 110 by exposure treatment. Specifically, in the exposure treatment, a specific portion of the second composition layer 110 is selectively irradiated with light P. Therefore, when the exposure treatment is performed, the second composition layer 110 is provided with an exposed portion 111 that is irradiated with light and a non-exposed portion 112 that is not irradiated with light. Since the core resin composition usually functions as a negative photosensitive resin composition, the exposed portion 111 forms a latent image corresponding to the core layer.

From the viewpoint of performing selective exposure, the exposure process in step (V) is usually performed using a mask 400. Specifically, in this exposure process, the second composition layer 110 is irradiated with light P through a mask 400 that includes a light-transmitting part 410 and a light-blocking part 420. The light P passes through the light-transmitting section 410 and enters the exposed section 111, but cannot pass through the light-blocking section 420 and therefore cannot enter the non-exposed section 112. Therefore, the exposed part 111 and the non-exposed part 112 corresponding to the light-transmitting part 410 and the light-blocking part 420 can be provided in the second composition layer 110. The mask 400 may be brought into close contact with the second composition layer 110 as shown in FIG. 5 (contact exposure method), or may be exposed using parallel light without being brought into close contact (non-contact exposure method). .

Generally, the light-transmitting portion 410 of the mask 400 is formed to have a planar shape corresponding to the core layer of the optical waveguide. Therefore, the light blocking portion 420 of the mask 400 is formed to have a planar shape corresponding to the portion of the optical waveguide where the core layer is absent. Unless otherwise specified, "planar shape" refers to the shape viewed from the thickness direction. The light-transmitting portion 410 formed in a planar shape corresponding to the core layer may be hereinafter referred to as a "mask pattern."

As the light P used in the exposure treatment in step (V), it is preferable to use an appropriate actinic ray depending on the composition of the photosensitive resin composition of the present invention. The wavelength of the actinic light is usually 190 nm to 1000 nm, preferably 240 nm to 550 nm, but light of other wavelengths may be used. Specific examples of the active light source include ultraviolet rays, visible light, electron beams, X-rays, etc., and ultraviolet rays are particularly preferred. The exposure amount of the light P is preferably set so that a desired core layer can be formed after curing in step (VII). In one example, the specific exposure amount range in step (V) is preferably 10 mJ/cm ² or more, more preferably 50 mJ/cm ² or more, particularly preferably 200 mJ/cm ² or more, and preferably 10, 000 mJ/cm ² or less, more preferably 8,000 mJ/cm ² or less, still more preferably 4,000 mJ/cm ² or less, particularly preferably 1,000 mJ/cm ² or less.

When the second composition layer 110 is formed using the resin sheet of the present invention, a support (not shown) may be present on the second composition layer 110 in step (IV). . When a support is present on the second composition layer 110, the exposure may be performed through the support, or the exposure may be performed after the support is peeled off.

Since the photosensitive resin composition of the present invention functions as a negative type photosensitive resin composition, the solubility in the developer decreases in the exposed area 111. On the other hand, the non-exposed area 112 has high solubility in the developer. Utilizing the difference in solubility between the exposed portion 111 and the non-exposed portion 112, development processing in the subsequent step (VI) is performed.

In the method for manufacturing an optical waveguide according to an embodiment of the present invention, after step (IV) and before step (V), the second composition layer 110 is heated from the viewpoint of curing the second composition layer 110. The step (IX) may also be included. Through step (IX), the solubility of the exposed portion 111 in the developer can be quickly reduced. The heating in step (IX) may be performed using a hot plate or an oven. The heating temperature may be, for example, 40°C or higher and 110°C or lower. Further, the heating time may be, for example, 30 seconds or more and 60 minutes or less.

FIG. 6 is a schematic cross-sectional view for explaining step (V) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. The method for manufacturing an optical waveguide according to an embodiment of the present invention includes a step (V) of subjecting the second composition layer 110 to a development treatment after the step (IV). According to the development process, the latent image formed in step (IV) can be developed. Since the photosensitive resin composition of the present invention functions as a negative type photosensitive resin composition, as shown in FIG. 6, while the exposed area 111 is not removed by the development process, the non-exposed area 112 (see FIG. 5) is removed. The exposed portion 111 of the second composition layer 110 remaining after development may have the same planar shape as the mask pattern of the transparent portion 410 (see FIG. 5) of the mask 400 used in step (IV).

The development method is usually a wet development method in which the second composition layer 110 is brought into contact with a developer. As the developer, an alkaline aqueous solution is usually used.

Examples of the alkaline aqueous solution used as a developer include an aqueous solution of an alkali metal compound. Examples of the alkali metal compound include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; alkali metal carbonates or bicarbonates such as sodium carbonate and sodium bicarbonate; sodium phosphate; , alkali metal phosphates such as potassium phosphate; alkali metal pyrophosphates such as sodium pyrophosphate and potassium pyrophosphate. Examples of the alkaline aqueous solution include an aqueous solution of an organic base that does not contain metal ions, such as tetraalkylammonium hydroxide. One type of alkaline aqueous solution may be used alone, or two or more types may be used in combination. Among these, carbonates or bicarbonates of alkali metals are preferred, and sodium carbonate is more preferred, from the viewpoint of significantly obtaining the effects of the present invention.

The developer may contain additives such as a surfactant and an antifoaming agent, if necessary, in order to improve the development effect.

The development time is preferably 10 seconds to 5 minutes. The temperature of the developer during development is not particularly limited, but is preferably 20°C or higher, preferably 50°C or lower, and more preferably 40°C or lower.

Examples of the development method include a paddle method, a spray method, a dipping method, a brushing method, a lapping method, and an ultrasonic method. Among these, the spray method is suitable for improving resolution. When a spray method is employed, the spray pressure is preferably 0.05 MPa to 0.3 MPa.

After the development using the developer, the second composition layer 110 may be further rinsed. Preferably, rinsing is performed using a solvent different from the developer. For example, the same type of solvent or water as contained in the core resin composition may be used for rinsing. The rinsing time is preferably 5 seconds to 1 minute.

Further, after development using a developer, a desmear process may be performed to remove unexposed areas that cannot be removed by development. Desmearing may be performed according to various methods used in the manufacture of printed wiring boards and known to those skilled in the art.

The method for manufacturing an optical waveguide according to an embodiment of the present invention includes a step (VI) of curing the second composition layer 110 after the step (V). This step (VI) typically includes heat treating the second composition layer 110. The conditions for heat treatment may be selected depending on the type and amount of the resin component in the photosensitive resin composition of the present invention. For example, the conditions for the heat treatment in step (VI) may be the same as those for the heat treatment on the first composition layer 210 in step (II).

FIG. 7 is a schematic cross-sectional view for explaining step (VI) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. By curing the second composition layer 110 in step (VI), the core layer 100 as a hardened second composition layer is obtained on the lower cladding layer 220, as shown in FIG.

FIG. 8 is a schematic cross-sectional view for explaining step (VII) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. As shown in FIG. 8, the method for manufacturing an optical waveguide according to an embodiment of the present invention includes forming a third composition layer 230 containing a cladding resin composition on the core layer 100 after step (VI). Step (VII) is included. The third composition layer 230 is usually formed to cover the entire peripheral surface of the core layer 100 that is not in contact with the lower cladding layer 220. Therefore, the third composition layer 230 is formed to cover the core layer 100 and is also formed on the lower cladding layer 220.

There are no particular limitations on the method for forming the third composition layer 230. For example, the third composition layer 230 may be formed by applying a cladding resin composition onto the core layer 100 (and, if necessary, onto the lower cladding layer 220). The application of the cladding resin composition for forming the third composition layer 230 can be performed in the same manner as the application of the cladding resin composition for forming the first composition layer 210. Further, after applying the cladding resin composition, the third composition layer 230 may be dried, if necessary. The third composition layer 230 may be dried using the same method and conditions as the first composition layer 210.

The third composition layer 230 may be formed using, for example, a resin sheet for cladding. To give a specific example, by laminating the photosensitive resin composition layer of the cladding resin sheet on the core layer 100 (and the lower cladding layer 220 as necessary), the third composition layer 230 is formed on the core layer 100. can be formed. The lamination of the cladding resin sheet for forming the third composition layer 230 can be performed in the same manner as the lamination of the cladding resin sheet for forming the first composition layer 210. When the third composition layer 230 is formed using a resin sheet for cladding provided with a support, the support may be peeled off at an arbitrary step.

The third composition layer 230 formed on the core layer 100 in step (VII) usually contains a cladding resin composition, and preferably contains only a cladding resin composition.

The method for manufacturing an optical waveguide according to an embodiment of the present invention includes a step (VIII) of curing the third composition layer 230 after the step (VII). The effect of the third resin composition layer 230 in this step (VIII) can generally be achieved in the same manner as the curing of the first composition layer 210.

FIG. 9 is a schematic cross-sectional view for explaining step (VIII) of the method for manufacturing an optical waveguide according to an embodiment of the present invention. By curing the third composition layer 230 in step (VIII), a cured third composition layer 240 is obtained on the core layer 100, as shown in FIG. This hardened third composition layer 240 forms a part of the cladding layer 200, and may be referred to as "upper cladding layer" 240 hereinafter. Then, the cladding layer 200 is formed from the upper cladding layer 240 and the lower cladding layer 220. Therefore, it is possible to obtain an optical waveguide 10 including a cladding layer 200 including a lower cladding layer 220 and an upper cladding layer 240, and a core layer 100 provided within this cladding layer 200.

The method for manufacturing the optical waveguide 10 may further include any steps in combination with the steps described above.

The method for manufacturing the optical waveguide 10 may include, for example, a step of forming a protective layer (not shown). Further, the method for manufacturing the optical waveguide 10 may include, for example, a step of dicing the manufactured optical waveguide 10.

The method for manufacturing the optical waveguide 10 may include repeating the steps described above. For example, steps (I) to (XI) may be repeated to manufacture an optical waveguide having a multilayer structure in which core layers and cladding layers are alternately provided on the base material 300 in the thickness direction.

[Optoelectric hybrid board]
An opto-electrical hybrid board according to an embodiment of the present invention includes the above-described optical waveguide. Typically, an opto-electrical hybrid board includes an optical waveguide and an electric circuit board. The electric circuit board can include an electronic component and wiring connected to the electronic component. Examples of electronic components include passive components such as capacitors, inductors, and resistors; active components such as semiconductor chips; and the like. The optical waveguide and the wiring of the electric circuit board can be connected via a photoelectric conversion element. The photoelectric conversion element may include a combination of a light emitting element (for example, a surface-emitting light emitting diode) capable of converting electricity into light, and a light receiving element (for example, a photodiode) capable of converting light into electricity. Further, the opto-electric hybrid board may include an optical element such as a mirror for optical path adjustment.

An example of a preferable opto-electrical hybrid board is one that includes a chip in which an optical integrated circuit is formed on a silicon wafer. This chip is expected to be put into practical use using silicon photonics at an early stage, and is expected to be mounted in semiconductor packages, for example. An opto-electrical hybrid board including this chip includes, for example, an electric circuit board, a chip mounted on the electric circuit board, and an optical waveguide. Optical waveguides can be used to connect wiring on an electric circuit board to a chip, or to connect multiple chips.

In general, chips manufactured using silicon photonics often use light with wavelengths of 1310 nm and 1550 nm, with 1310 nm being the mainstream. “Wavepath Fabrication and Low Loss”, 28th Electronics Packaging Society Spring Conference, 2014). Therefore, the optical waveguide is preferably capable of transmitting light having a wavelength of 1310 nm and 1550 nm or close thereto, for example, preferably capable of transmitting light having a wavelength of 1300 nm to 1320 nm. According to the optical waveguide according to the embodiments described above, it is possible to transmit light of these wavelengths.

Generally, between single mode and multimode, single mode can achieve faster transmission. Therefore, from the viewpoint of high-speed transmission, a single-mode optical waveguide is preferable as an optical waveguide applied to an opto-electrical hybrid circuit. In a single mode optical waveguide, the width of the core layer is preferably small. For example, it is preferable to form a core layer having a width of 10 μm or less, or 5 μm or less. Further, an optical waveguide including a core layer having such a small width is preferable from the viewpoint of increasing the degree of freedom in designing the package when the optical waveguide is applied to a semiconductor package. According to the optical waveguide according to the embodiment described above, it is possible to reduce the width of the core layer as described above.

On the other hand, when connecting a plurality of opto-electric hybrid boards, those boards may be connected via optical fibers. For example, a plurality of opto-electrical hybrid boards may be installed in a rack, and the opto-electrical hybrid boards may be connected to each other with optical fibers. Multi-mode optical fibers are the mainstream for connecting substrates in this way. Therefore, from the viewpoint of enabling connection with the optical fiber, a multimode optical waveguide may be employed as the optical waveguide provided on the opto-electrical hybrid board.

From the viewpoint of increasing versatility, it is desirable that the optical waveguide be applicable to both single mode and multimode. Furthermore, it is desirable to reduce the minimum width of the core layer of these optical waveguides to increase the degree of freedom in the line width of the core layer. According to the optical waveguide according to the embodiment described above, by using the photosensitive resin composition of the present invention for the core, it is possible to form a fine core and suppress the occurrence of surface irregularities of the core, so that the core layer The minimum width of can be reduced. Further, according to the optical waveguide according to the embodiment described above, both a single mode and a multimode optical waveguide can be obtained. Therefore, the optical waveguide according to the embodiment described above can be applied to a wide range of applications. Since the optical waveguide according to the embodiment described above is applicable to such a wide range and can suppress optical transmission loss, it is suitable for application to an opto-electrical hybrid board.

EXAMPLES The present invention will be specifically described below with reference to Examples, but the present invention is not limited to these Examples. In the following description, "parts" and "%" representing amounts mean "parts by mass" and "% by mass," respectively, unless otherwise specified. Further, the operations described below were performed in the atmosphere at normal temperature and pressure (23° C., 1 atm) unless otherwise specified.

<Synthesis Example 1: Synthesis of resin containing carboxy group and ethylenic double bond>
Epoxy equivalent is 325330g/eq. 325 parts of an epoxy resin having a naphthol aralkyl skeleton ("ESN-475V", manufactured by Nippon Steel Chemical & Materials Co., Ltd.) was placed in a flask equipped with a gas introduction pipe, a stirring device, a cooling pipe and a thermometer, and 340 parts of carbitol acetate was added. 0.46 part of hydroquinone and 1 part of triphenylphosphine were added. This mixture was heated to 95-105°C, 72 parts of acrylic acid was gradually added dropwise, and the mixture was allowed to react for 16 hours. The reaction product was cooled to 80 to 90°C, 80 parts of tetrahydrophthalic anhydride was added, reacted for 8 hours, and cooled. The amount of solvent was adjusted to obtain a resin solution (non-volatile content: 70%) with a solid acid value of 60 mgKOH/g. The weight average molecular weight was 1000. The naphthol aralkyl skeleton contained in the obtained naphthol aralkyl skeleton-containing ester-type acid-modified epoxy acrylate resin was contained as a repeating unit, and was contained in an amount of 55% based on the entire mass of one molecule.

<Production Example 1: Production of resin composition for cladding>
25 parts of the naphthol aralkyl skeleton-containing ester-type acid-modified epoxy acrylate resin (non-volatile content 70%) obtained in Synthesis Example 1, dicyclopentadiene-type epoxy resin (“HP-7200H” manufactured by DIC Corporation, epoxy equivalent 270 g/eq. ), 10 parts of photopolymerization initiator ("Omnirad 379EG" manufactured by IGM), 1.3 parts of reactive diluent ("DPHA" manufactured by Nippon Kayaku Co., Ltd., dipentaerythritol hexaacrylate), and amino-based silane cup 30 parts of spherical silica surface-treated with a ring agent ("180nm SX-C1" manufactured by Admatex, specific surface area 20 m ² /g, average particle size 0.2 μm) was mixed with 10 parts of methyl ethyl ketone, and mixed using a high-speed rotating mixer. A varnish-like resin composition was prepared.

<Example 1>
25 parts of the naphthol aralkyl skeleton-containing ester-type acid-modified epoxy acrylate resin (non-volatile content 70%) obtained in Synthesis Example 1, dicyclopentadiene-type epoxy resin (“HP-7200H” manufactured by DIC Corporation, epoxy equivalent 270 g/eq. ), 1.3 parts of photopolymerization initiator ("Omnirad 379EG" manufactured by IGM), photosensitizer ("Omnipol ASA" manufactured by IGM), reactive diluent ("DPHA" manufactured by Nippon Kayaku Co., Ltd.), A varnish-like resin composition was prepared by mixing 10 parts of pentaerythritol hexaacrylate and 10 parts of methyl ethyl ketone using a high-speed rotating mixer.

<Examples 2 to 12, Comparative Examples 1 to 3: Production of photosensitive resin composition>
A varnish-like photosensitive resin composition was prepared in the same manner as in Example 1 except that each component was mixed according to the composition shown in the table below. In addition, in the table, the compounding amount of each component means parts by mass, and is the actual amount used.

・Ｉｒｇａｃｕｒｅ ＯＸＥ－０２：下記構造で表される化合物（ＢＡＳＦ社製、分子量は４１２．５、ｅｔｈａｎｏｎｅ， １－［９－ｅｔｈｙｌ－６－（２－ｍｅｔｈｙｌｂｅｎｚｏｙｌ）－９Ｈ－ｃａｒｂａｚｏｌ－３－ｙｌ］－， １－（ｏ－ａｃｅｔｙｌｏｘｉｍｅ））

・Ｏｍｎｉｒａｄ ８１９：下記構造で表される化合物（ＩＧＭ社製、分子量は４１８．５、Ｂｉｓ（２，４，６－ｔｒｉｍｅｔｈｙｌｂｅｎｚｏｙｌ）ｐｈｅｎｙｌｐｈｏｓｐｈｉｎｅ ｏｘｉｄｅ）

・Ｏｍｎｉｐｏｌ ＴＰ：下記構造で表される化合物（ＩＧＭ社製、分子量は９００以上）式中、ａ、ｂ、ｃはそれぞれ１～１０の整数を表す。

・Ｏｍｎｉｐｏｌ ９１０：下記構造で表される化合物（ＩＧＭ社製、分子量は８５０以上）式中、ｄは１～１０の整数を表す。

（Ｄ）成分
・Ｏｍｎｉｐｏｌ ＡＳＡ：ＩＧＭ社製、分子量約５１０、Ｐｏｌｙ（ｅｔｈｙｌｅｎｅ ｇｌｙｃｏｌ）ｂｉｓ（ｐ－ｄｉｍｅｔｈｙｌａｍｉｎｏｂｅｎｚｏａｔｅ）、式中、ｒ１は３又は４を表す。

・Ｅｓａｃｕｒｅ Ａ １９８：ＩＧＭ社製、Ｂｅｎｚｏｉｃ ａｃｉｄ， ４－（ｄｉｍｅｔｈｙｌａｍｉｎｏ）－， １，１’－［（ｍｅｔｈｙｌｉｍｉｎｏ）ｄｉ－２，１－ｅｔｈａｎｅｄｉｙｌ］ ｅｓｔｅｒ

（Ｅ）成分
・Ｙ５０ＳＺ－ＡＭ１：アミノ系シランカップリング剤で表面処理された球形シリカ（アドマテックス社製「Ｙ５０ＳＺ－ＡＭ１」、比表面積６０ｍ^２／ｇ、平均粒径０．０５μｍ、固形分率５０％
（Ｆ）成分
・ＤＰＨＡ：日本化薬社製、ジペンタエリスリトールヘキサアクリレート
（Ｇ）成分
・ＭＥＫ：メチルエチルケトン
（Ｈ）成分
・Ｏｍｎｉｒａｄ ＥＤＢ：ＩＧＭ社製、分子量１９３、Ｅｔｈｙｌ－４－（ｄｉｍｅｔｈｙｌａｍｉｎｏ）－ｂｅｎｚｏａｔｅ

・ＥＡＢ：（東京化成工業社製、分子量３４３、４，４’－Ｂｉｓ（ｄｉｅｔｈｙｌａｍｉｎｏ）ｂｅｎｚｏｐｈｅｎｏｎｅ

Abbreviations in the table are as follows.
(A) Component HP-7200H: Dicyclopentadiene type epoxy resin (“HP-7200H” manufactured by DIC Corporation, epoxy equivalent 270g/eq.)
・HP-4710: Naphthalene type tetrafunctional epoxy resin (“HP-4710” manufactured by DIC, epoxy equivalent 170g/eq.)
・N-673: Cresol novolac type epoxy resin (“N-673” manufactured by DIC Corporation, epoxy equivalent: approximately 210 g/eq.)
(B) Component/Synthesis Example 1: Resin containing a carboxyl group and ethylenic double bond synthesized in Synthesis Example 1, non-volatile content 70%, containing 55% naphthol aralkyl skeleton based on the entire mass of one molecule. ZCR-1569H: Acid-modified epoxy acrylate resin containing biphenyl skeleton (“ZCR-1569H” manufactured by Nippon Kayaku Co., Ltd., acid value 98 mgKOH/g, non-volatile fraction 70%, solvent PGMEA, molecular weight 4500)
Component (C) Omnirad 379EG: Compound represented by the following structure (manufactured by IGM, molecular weight 380.5, 2-dimethylamino-2-(4-methyl-benzyl)-1-(4-morpholin-4-yl) -phenyl)-butan-1-one, CAS 119344-86-4)

・Irgacure OXE-02: Compound represented by the following structure (manufactured by BASF, molecular weight 412.5, ethanol, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]- , 1-(o-acetyloxime))

・Omnirad 819: Compound represented by the following structure (manufactured by IGM, molecular weight 418.5, Bis(2,4,6-trimethylbenzoyl) phenylphosphine oxide)

- Omnipol TP: A compound represented by the following structure (manufactured by IGM, molecular weight is 900 or more) where a, b, and c each represent an integer from 1 to 10.

- Omnipol 910: Compound represented by the following structure (manufactured by IGM, molecular weight is 850 or more), where d represents an integer from 1 to 10.

Component (D) Omnipol ASA: manufactured by IGM, molecular weight approximately 510, Poly (ethylene glycol) bis (p-dimethylaminobenzoate), where r1 represents 3 or 4.

・Esacure A 198: Manufactured by IGM, Benzoic acid, 4-(dimethylamino)-, 1,1'-[(methylimino)di-2,1-ethanediyl] ester

Component (E) Y50SZ-AM1: Spherical silica surface-treated with an amino-based silane coupling agent (“Y50SZ-AM1” manufactured by Admatex, specific surface area 60 m ² /g, average particle size 0.05 μm, solid content 50%
(F) Ingredient DPHA: Nippon Kayaku Co., Ltd., dipentaerythritol hexaacrylate (G) component MEK: Methyl ethyl ketone (H) component Omnirad EDB: IGM Co., Ltd., molecular weight 193, Ethyl-4-(dimethylamino)-benzoate

・EAB: (manufactured by Tokyo Kasei Kogyo Co., Ltd., molecular weight 343, 4,4'-Bis(diethylamino)benzophenone

<Manufacture of resin sheets>
Using the photosensitive resin compositions produced in Examples 1 to 12 and Comparative Examples 1 to 3 described above, a plurality of resin sheets having photosensitive resin composition layers having different thicknesses were produced by the following method. did.

A polyethylene terephthalate film ("Lumirror T6AM" manufactured by Toray Industries, Inc., thickness 38 μm, softening point 130° C.) was prepared as a support. The photosensitive resin compositions produced in Production Example 1, Examples 1 to 12, and Comparative Examples 1 to 3 were applied to such a support so that the thickness of the photosensitive resin composition layer after drying would be 5 μm or 10 μm. It was applied uniformly using a die coater and dried for 6 minutes at 80°C to 110°C (maximum temperature 110°C) to form a photosensitive resin composition layer. Next, a cover film (biaxially oriented polypropylene film, "MA-411" manufactured by Oji F-Tex Co., Ltd.) is placed on the surface of the photosensitive resin composition layer, and laminated at 80°C, so that the support/photosensitive resin A resin sheet having a three-layer structure of composition layer/cover film was manufactured.

A polyethylene terephthalate film ("Lumirror T6AM" manufactured by Toray Industries, Inc., thickness 38 μm, softening point 130° C.) was prepared as a support. The resin composition produced in Production Example 1 was uniformly coated with a die coater so that the thickness of the resin composition layer after drying was 5 μm, 10 μm, or 20 μm, and the temperature was 80°C to 110°C (maximum temperature 110°C). ) for 6 minutes to form a photosensitive resin composition layer. Next, a cover film (biaxially oriented polypropylene film, "MA-411" manufactured by Oji F-Tex Co., Ltd.) is placed on the surface of the photosensitive resin composition layer, and laminated at 80°C, so that the support/photosensitive resin A resin sheet having a three-layer structure of composition layer/cover film was manufactured.

[Evaluation of core formation]
(Evaluation of minimum fine line formation width)
A substrate was prepared by roughening the copper layer of a glass epoxy substrate (copper-clad laminate) with a copper layer having a thickness of 18 μm using a surface treatment agent containing an organic acid (CZ8100, manufactured by MEC Corporation). . A resin sheet with a photosensitive resin composition layer having a thickness of 5 μm, which was produced using the resin composition prepared in Production Example 1, was laminated on the previous substrate at 80°C, the support was peeled off, and the photosensitive resin A composition layer was formed. Thereafter, using a projection exposure apparatus (Ushio Inc. "UFX-2240"), ultraviolet light was exposed at an exposure energy such that the number of remaining glossy steps of the 41-step tablet was 8 steps. A quartz glass mask without an exposure pattern was used. After standing at room temperature for 30 minutes, the support was peeled off. Spray development was performed on the entire surface of the photosensitive resin composition layer using a 1% by mass aqueous sodium carbonate solution at 30°C as a developer for 1 minute at a spray pressure of 0.2 MPa. After spray development, a lower cladding layer was formed on the copper-clad laminate by irradiating with ultraviolet rays at 2 J/cm ² and further performing a heat treatment at 170° C. for 1 hour in a nitrogen atmosphere.

A cover film was peeled off from a resin sheet provided with a 10 μm thick photosensitive resin composition layer produced using the photosensitive resin composition produced in each of the Examples and Comparative Examples described above. A resin sheet is placed on the lower cladding layer so that the photosensitive resin composition layer of the resin sheet and the lower cladding layer are in contact with each other, and the resin sheet is laminated using a vacuum laminator (“VP160” manufactured by Nikko Materials). A photosensitive resin composition layer was formed on the lower cladding layer. The lamination conditions were as follows: evacuation time: 30 seconds, compression temperature: 100° C., compression pressure: 0.7 MPa, and pressurization time: 30 seconds. Thereby, a laminate including a copper-clad laminate, a lower cladding layer, and a resin sheet in this order was obtained. Thereafter, the support was peeled off to expose the photosensitive resin composition layer.

The photosensitive resin composition layer was exposed to ultraviolet light using a projection exposure device (Ushio Inc. "UFX-2240") at an exposure energy that resulted in a 41-step tablet having 8 remaining gloss steps. The exposure was performed using a first mask pattern that draws a straight line with L/S (line/space) of 10 μm/10 μm, a second mask pattern that draws a straight line with L/S (line/space) of 5 μm/5 μm, and L/S (line/space) of 5 μm/5 μm. A quartz glass mask having a third mask pattern for drawing a straight line at /S (line/space) 3 μm/3 μm was used. After exposure, the support was peeled off after being allowed to stand at room temperature for 30 minutes. Spray development was performed on the entire surface of the photosensitive resin composition layer using a 1% by mass aqueous sodium carbonate solution at 30°C as a developer for 1 minute at a spray pressure of 0.2 MPa. After spray development, the copper clad laminate, lower cladding layer and line layer (cured resin composition) were irradiated with ultraviolet rays at 2 J/cm ² and further heat treated at 170°C for 1 hour in a nitrogen atmosphere. A sample was obtained in which the layers were formed in this order.

The obtained sample was observed with a scanning electron microscope (SEM) (2000x magnification), and the minimum fine line formation width (the width of the line layer with the smallest width among the line layers that could be formed) was measured. The aspect ratio was calculated by dividing the thickness of the line layer by the minimum thin line formation width. The minimum width of fine line formation in core formation property was evaluated based on the following criteria. The line width represents the width of the line layer.
◎: The aspect ratio is 1 or more in all line layers having a line width of 10 μm or less.
○: All line layers having a line width of 10 μm or less have an aspect ratio of 0.8 or more and less than 1.
Δ: All line layers having a line width of 10 μm or less had an aspect ratio of 0.6 or more and less than 0.8.
×: The aspect ratio of at least one line layer having a line width of 10 μm or less is less than 0.6.

(Evaluation of surface unevenness)
The line layer whose minimum fine line formation width was measured was observed with a scanning electron microscope (SEM) (magnification: 2000 times), and the surface state was evaluated according to the following criteria.
○: There is no unevenness on the surface of the line layer.
×: There are irregularities on the surface of the line layer.

[Measurement of optical transmission loss]
(1-1. Formation of lower cladding layer)
A cover film was peeled from a resin sheet manufactured using the resin composition manufactured in Manufacturing Example 1 and provided with a 10 μm thick photosensitive resin composition layer. A resin sheet was placed on a 4-inch silicon wafer so that the photosensitive resin composition layer was in contact with the silicon wafer, and laminated using a vacuum laminator ("VP160" manufactured by Nikko Materials). The lamination conditions were as follows: evacuation time: 30 seconds, compression temperature: 100° C., compression pressure: 0.7 MPa, and pressurization time: 30 seconds. Thereafter, the support was peeled off to obtain an intermediate laminate I including a silicon wafer and a photosensitive resin composition layer.

The photosensitive resin composition layer of the intermediate laminate I was exposed to ultraviolet rays using a projection exposure device (Ushio Inc. "UFX-2240") at an exposure energy such that the number of remaining gloss steps of the 41 step tablet was 8 steps. I did it. After exposure, ultraviolet rays were irradiated at 2 J/cm ² . Intermediate laminate I was placed in a clean oven, heated from room temperature to 170°C, and after reaching 170°C, heat treatment was performed for 60 minutes in a nitrogen atmosphere to cure the photosensitive resin composition layer. A lower cladding layer was formed by curing the photosensitive resin composition layer, yielding an intermediate laminate II including a silicon wafer and a lower cladding layer.

(1-2. Formation of core layer)
A cover film was peeled off from a resin sheet provided with a 5 μm thick photosensitive resin composition layer manufactured using the photosensitive resin compositions manufactured in Examples and Comparative Examples. A resin sheet is placed on the surface of the lower cladding layer of intermediate laminate II so that the photosensitive resin composition layer and the lower cladding layer are in contact with each other, and laminated using a vacuum laminator ("VP160" manufactured by Nikko Materials). did. The lamination conditions were as follows: evacuation time: 30 seconds, compression temperature: 100° C., compression pressure: 0.7 MPa, and pressurization time: 30 seconds. Thereafter, the support was peeled off to obtain an intermediate laminate III comprising a silicon wafer, an underlying cladding layer, and a photosensitive resin composition layer in this order.

The photosensitive resin composition layer of the intermediate laminate III was exposed to ultraviolet rays using a projection exposure device (Ushio Inc. "UFX-2240") at an exposure energy such that the number of remaining gloss steps of the 41 step tablet was 8 steps. I did it. For exposure, a mask pattern that can draw multiple straight lines with a length of 1 cm at an L/S (line/space) of 5 μm/100 μm, and a mask pattern that can draw multiple straight lines with a length of 2 cm at an L/S (line/space) of 5 μm/100 μm are used. A quartz glass mask having a mask pattern capable of drawing and a mask pattern capable of drawing a plurality of straight lines each having a length of 3 cm at an L/S (line/space) of 5 μm/100 μm was used. In the L/S of this quartz glass mask, the line corresponds to the width of the core layer, and the space corresponds to the interval between the core layers. After exposure, the support was peeled off after being allowed to stand at room temperature for 30 minutes. Spray development was performed on the entire surface of the photosensitive resin composition layer using a 1% by mass aqueous sodium carbonate solution at 30°C as a developer for 1 minute at a spray pressure of 0.2 MPa. After spray development, ultraviolet irradiation was performed at 2 J/cm ² . Thereafter, the intermediate laminate III was placed in a clean oven, the temperature was raised from room temperature to 170°C, and after reaching 170°C, a heat treatment was performed for 60 minutes in a nitrogen atmosphere to harden the photosensitive resin composition layer. .

A core layer was formed by curing the photosensitive resin composition layer, yielding an intermediate laminate IV comprising a silicon wafer, a lower cladding layer, and a core layer in this order.

(1-3. Formation of upper cladding layer)
A cover film was peeled from a resin sheet manufactured using the resin composition manufactured in Manufacturing Example 1 and provided with a 20 μm thick photosensitive resin composition layer. A resin sheet was placed on the core layer of the intermediate laminate IV so that the photosensitive resin composition layer and the core layer were in contact with each other, and laminated using a vacuum laminator ("VP160" manufactured by Nikko Materials). The lamination conditions were as follows: evacuation time: 30 seconds, compression temperature: 100° C., compression pressure: 0.7 MPa, and pressurization time: 30 seconds. Thereafter, the support was peeled off to obtain an intermediate laminate V comprising a silicon wafer, a lower cladding layer, a core layer, and a photosensitive resin composition layer in this order.
The photosensitive resin composition layer of the intermediate laminate V was exposed to ultraviolet rays using a projection exposure device (Ushio Inc. "UFX-2240") at an exposure energy such that the number of remaining gloss steps of the 41 step tablet was 8 steps. I did it. After exposure, ultraviolet rays were irradiated at 2 J/cm ² . Intermediate laminate V was placed in a clean oven, heated from room temperature to 170°C, and after reaching 170°C, heat treatment was performed for 60 minutes in a nitrogen atmosphere to cure the photosensitive resin composition layer. An upper cladding layer was formed by curing the photosensitive resin composition layer to obtain a sample laminate including a silicon wafer, a lower cladding layer, a core layer, and an upper cladding layer in this order.

In this sample laminate, the combination of the lower cladding layer and the upper cladding layer constituted the cladding layer. Therefore, an optical waveguide including the cladding layer and the core layer in the cladding layer was obtained. In addition, in this sample stack, the core layer has linear patterns with lengths of 1 cm, 2 cm, and 3 cm, corresponding to the mask pattern that the quartz glass mask had, and the core layer has linear patterns with lengths of 1 cm, 2 cm, and 3 cm. The width (line width) and interval (space) of the core layer matched the width (line width) and interval (space) of the mask pattern.

[Evaluation of optical waveguide]
(Measurement of optical transmission loss of optical system for calibration)
The transmission loss of an optical system configured by excluding the test board and the condensing module from the optical system for measuring the transmission loss of the test board, which will be described later, was measured. That is, on a vibration isolation table covered with a blackout curtain, a light source (1310 nm light source, "LPSC-1310-FC" manufactured by THORLABS) and a light receiver (optical power meter "Keysight" manufactured by Keysight) were connected via an optical fiber (input fiber). N7742'') to obtain an optical system for calibration. The light source was turned on and the intensity of the light that entered the light receiver was measured by the light receiver to measure the loss of this calibration optical system.

(Preparation of test board)
From the sample laminates manufactured using the photosensitive resin compositions of Examples and Comparative Examples, the core layer and the surrounding cladding layer were cut out at the portion where the core layer was formed, and a test board equipped with an optical transmission path was prepared. Obtained.

(Measurement of optical transmission loss)
The test board was placed on a vibration isolation table covered with a blackout curtain. A condensing module (numerical aperture 0.18) is connected to one end (incidence end) of the optical waveguide of the test board, and a light source (1310 nm light source, THORLABS Co., Ltd.) is connected to the condensing module via an optical fiber (input fiber). ``LPSC-1310-FC'') was connected. In addition, another light condensing module (numerical aperture 0.18) was connected to the other end (output end) of the optical waveguide of the test board, and a light receiver was connected to the light condensing module via an optical fiber (output fiber). (Optical power meter "N7742" manufactured by Keysight) was connected. Through the above operations, the light emitted from the light source passes through the optical fiber (input fiber), light collection module, optical waveguide, light collection module, and optical fiber (output fiber) in this order, and then enters the light receiver. I got the system. Hereinafter, this optical system may be referred to as a sample optical system. The light source was turned on and the intensity of the light that entered the light receiver was measured by the light receiver to measure the loss in the sample optical system.

The loss of the optical waveguide included in the test board was determined by subtracting the loss of the calibration optical system from the loss of the sample optical system.

(Measurement of transmission loss (dB/cm) of optical waveguide)
The loss of the optical waveguide was measured for each of an optical waveguide with a length of 1 cm, an optical waveguide with a length of 2 cm, and an optical waveguide with a length of 3 cm. The measurement results were then plotted on a coordinate system with the length of the optical waveguide as the horizontal axis and the loss of the optical waveguide as the vertical axis, to obtain the loci of three points representing the measurement results. An approximate straight line at these three points was calculated using the least squares method, and the slope of the approximate straight line was determined as a loss (transmission loss) per unit distance of the optical waveguide, and evaluated based on the following criteria.
〇: Optical transmission loss is less than 1 dB/cm △: Optical transmission loss is 1 dB/cm or more and less than 2 dB/cm ×: Optical transmission loss is 2 dB/cm or more

(Checking the mode)
The light receiver was removed, and an infrared camera (InGaAs camera with a 100x objective lens) was set in its place. The light source was turned on and the light emitted from the end of the optical fiber (output fiber) was photographed with an infrared camera. When only one perfectly circular edge of light was observed, it was determined to be a single mode. Furthermore, when multiple edges were observed, it was determined to be multimode.
In the table, "S" means single mode, and "M" means multimode.

[Absorbance measurement of photosensitive resin composition solution]
Solutions of the photosensitive resin compositions produced in Examples 1 to 11 and Comparative Examples 1 to 3 were prepared, and the absorbance of the solutions was measured by the following method. That is, a mixed solvent of MEK (methyl ethyl ketone) and cyclopentanone (MEK: pentanone = 1:1) was mixed with the photosensitive resin compositions of Examples 1 to 12 and Comparative Examples 1 to 3, and the concentration was 20% by mass. % photosensitive resin composition solution was prepared. This solution was placed in a 1 cm quartz cell, and absorbance Abs at a wavelength of 1310 nm was measured using an ultraviolet-visible near-infrared spectrophotometer (manufactured by JASCO Corporation, V-770), and evaluated based on the following criteria.
〇: Absorbance is less than 0.0050 △: Absorbance is 0.0050 or more and less than 0.0100 ×: Absorbance is 0.0100 or more

Examples 1 to 12 using photosensitive resin compositions containing a combination of components (A) to (D) have excellent core formation properties, can suppress the occurrence of surface irregularities in the line layer, and reduce optical transmission loss. I can see that it is being done. On the other hand, it can be seen that Comparative Examples 1 to 3, which do not contain component (D), are inferior to Examples 1 to 12 in core formation properties, occurrence of surface irregularities, and optical transmission loss.

10 Optical waveguide 100 Core layer 110 Second composition layer 111 Exposed area 112 Non-exposed area 200 Cladding layer 210 First composition layer 220 Hardened first composition layer (lower cladding layer)
230 Third composition layer 240 Hardened third composition layer (upper cladding layer)
300 base material 400 mask 410 light-transmitting part 420 light-shielding part

Claims (15)

(A) epoxy resin,
(B) a resin containing a carboxyl group and an ethylenic double bond,
A photosensitive resin composition containing (C) a photopolymerization initiator and (D) a photosensitizer having a molecular weight of 400 or more. The photosensitive resin composition according to claim 1, wherein component (C) contains (C1) a photopolymerization initiator having a molecular weight of 420 or more. The photosensitive resin composition according to claim 1, further comprising (E) an inorganic filler having an average particle size of 100 nm or less. The photosensitive resin composition according to claim 1, wherein component (D) contains a tertiary amino group in the molecule. The photosensitive resin composition according to claim 1, wherein component (D) contains an aminobenzoyl group in the molecule. The photosensitive resin composition according to claim 1, wherein component (A) contains either a naphthalene skeleton-containing epoxy resin or a biphenyl skeleton-containing epoxy resin. The photosensitive resin composition according to claim 1, which is used for sodium carbonate development. The photosensitive resin composition according to claim 1, which is used for producing a core layer of an optical waveguide. comprising a support and a photosensitive resin composition layer formed on the support,
A resin sheet, wherein the photosensitive resin composition layer is made of the photosensitive resin composition according to any one of claims 1 to 8. The resin sheet according to claim 9, wherein the photosensitive resin composition layer has a thickness of 1 μm or more and 15 μm or less. A photosensitive resin composition set comprising a core photosensitive resin composition and a cladding resin composition,
A photosensitive resin composition set, wherein the core photosensitive resin composition comprises the photosensitive resin composition according to any one of claims 1 to 8. Comprising a core layer and a cladding layer,
An optical waveguide, wherein the core layer contains a cured product of the photosensitive resin composition according to any one of claims 1 to 8. The optical waveguide according to claim 12, capable of transmitting light with a wavelength of 1300 nm to 1320 nm. The optical waveguide according to claim 12, which is a single mode optical waveguide. An opto-electrical hybrid board comprising the optical waveguide according to claim 12.

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