JP2023550357A5 - - Google Patents
Info
- Publication number
- JP2023550357A5 JP2023550357A5 JP2023528948A JP2023528948A JP2023550357A5 JP 2023550357 A5 JP2023550357 A5 JP 2023550357A5 JP 2023528948 A JP2023528948 A JP 2023528948A JP 2023528948 A JP2023528948 A JP 2023528948A JP 2023550357 A5 JP2023550357 A5 JP 2023550357A5
- Authority
- JP
- Japan
- Prior art keywords
- purging
- ring
- outlet
- gas
- process chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025265414A JP2026048895A (ja) | 2020-11-23 | 2025-12-18 | パージリングを介した局所的なプラズマアークの防止 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063117404P | 2020-11-23 | 2020-11-23 | |
| US63/117,404 | 2020-11-23 | ||
| PCT/US2021/056339 WO2022108707A1 (en) | 2020-11-23 | 2021-10-22 | Localized plasma arc prevention via purge ring |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025265414A Division JP2026048895A (ja) | 2020-11-23 | 2025-12-18 | パージリングを介した局所的なプラズマアークの防止 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023550357A JP2023550357A (ja) | 2023-12-01 |
| JP2023550357A5 true JP2023550357A5 (https=) | 2024-10-28 |
| JP7794823B2 JP7794823B2 (ja) | 2026-01-06 |
Family
ID=81709602
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023528948A Active JP7794823B2 (ja) | 2020-11-23 | 2021-10-22 | パージリングを介した局所的なプラズマアークの防止 |
| JP2025265414A Pending JP2026048895A (ja) | 2020-11-23 | 2025-12-18 | パージリングを介した局所的なプラズマアークの防止 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025265414A Pending JP2026048895A (ja) | 2020-11-23 | 2025-12-18 | パージリングを介した局所的なプラズマアークの防止 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20230402259A1 (https=) |
| JP (2) | JP7794823B2 (https=) |
| KR (1) | KR20230112537A (https=) |
| CN (1) | CN115702486A (https=) |
| TW (1) | TW202240732A (https=) |
| WO (1) | WO2022108707A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW202417684A (zh) * | 2022-08-31 | 2024-05-01 | 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 | 基座環總成、反應器系統、及用於氣體注入之方法 |
| CN117276043A (zh) * | 2023-10-10 | 2023-12-22 | 江苏天芯微半导体设备有限公司 | 一种用于预清洁腔室的衬环、预清洁腔室 |
| CN117344286A (zh) * | 2023-10-17 | 2024-01-05 | 拓荆科技(上海)有限公司 | 一种吹扫管路和吹扫方法和薄膜沉积设备 |
| US20250266270A1 (en) * | 2024-02-15 | 2025-08-21 | Applied Materials, Inc. | System and method for near substrate gas delivery |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6040011A (en) | 1998-06-24 | 2000-03-21 | Applied Materials, Inc. | Substrate support member with a purge gas channel and pumping system |
| JP4433614B2 (ja) | 2001-01-17 | 2010-03-17 | ソニー株式会社 | エッチング装置 |
| US8097120B2 (en) | 2006-02-21 | 2012-01-17 | Lam Research Corporation | Process tuning gas injection from the substrate edge |
| JP4800991B2 (ja) | 2007-03-26 | 2011-10-26 | 日本碍子株式会社 | 半導体製造装置用サセプタ |
| US8048226B2 (en) * | 2007-03-30 | 2011-11-01 | Tokyo Electron Limited | Method and system for improving deposition uniformity in a vapor deposition system |
| CN101552182B (zh) * | 2008-03-31 | 2010-11-03 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种用于半导体制造工艺中的边缘环机构 |
| JP2009302324A (ja) | 2008-06-13 | 2009-12-24 | Tokyo Electron Ltd | ガスリング、半導体基板処理装置および半導体基板処理方法 |
| JP2012049376A (ja) | 2010-08-27 | 2012-03-08 | Hitachi High-Technologies Corp | プラズマ処理装置およびプラズマ処理方法 |
| US10410832B2 (en) | 2016-08-19 | 2019-09-10 | Lam Research Corporation | Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment |
| KR102336497B1 (ko) * | 2017-12-08 | 2021-12-08 | 주식회사 원익아이피에스 | 기판 지지 어셈블리 및 이를 포함하는 기판 처리 장치 |
-
2021
- 2021-10-22 JP JP2023528948A patent/JP7794823B2/ja active Active
- 2021-10-22 CN CN202180043943.0A patent/CN115702486A/zh active Pending
- 2021-10-22 US US18/250,349 patent/US20230402259A1/en active Pending
- 2021-10-22 WO PCT/US2021/056339 patent/WO2022108707A1/en not_active Ceased
- 2021-10-22 KR KR1020227044227A patent/KR20230112537A/ko active Pending
- 2021-11-22 TW TW110143317A patent/TW202240732A/zh unknown
-
2025
- 2025-12-18 JP JP2025265414A patent/JP2026048895A/ja active Pending
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