JP2023543324A - 眼鏡レンズをコーティングするための蒸着方法、物理蒸着システム及び物理蒸着のためのるつぼ - Google Patents
眼鏡レンズをコーティングするための蒸着方法、物理蒸着システム及び物理蒸着のためのるつぼ Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 48
- 238000000034 method Methods 0.000 title claims abstract description 39
- 238000005240 physical vapour deposition Methods 0.000 title claims abstract description 36
- 239000011248 coating agent Substances 0.000 title claims abstract description 35
- 238000007740 vapor deposition Methods 0.000 title description 5
- 239000000463 material Substances 0.000 claims abstract description 291
- 238000001704 evaporation Methods 0.000 claims abstract description 82
- 230000008020 evaporation Effects 0.000 claims abstract description 79
- 239000011364 vaporized material Substances 0.000 claims abstract description 29
- 230000003287 optical effect Effects 0.000 claims abstract description 15
- 239000007787 solid Substances 0.000 claims description 42
- 238000010894 electron beam technology Methods 0.000 claims description 27
- 239000008187 granular material Substances 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 16
- 239000008202 granule composition Substances 0.000 claims description 7
- 238000000151 deposition Methods 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 10
- 230000008901 benefit Effects 0.000 description 8
- 230000008021 deposition Effects 0.000 description 8
- 230000004048 modification Effects 0.000 description 7
- 238000012986 modification Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 238000001771 vacuum deposition Methods 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 230000006978 adaptation Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000002791 soaking Methods 0.000 description 4
- 239000008199 coating composition Substances 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- 230000003044 adaptive effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 238000009420 retrofitting Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000011217 control strategy Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005328 electron beam physical vapour deposition Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 208000030533 eye disease Diseases 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00865—Applying coatings; tinting; colouring
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Ophthalmology & Optometry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
特開平1275747 A号公報は、薄い金属フィルムの製造を記載している。二次電子ビーム源からの制御された電子ビームは、高蒸気圧成分の濃度が異なる一次蒸着材料及び二次蒸着材料を選択的に加熱するために屈折させられる。
それによって、露出面の比は、効率よく近似値を求めることができる。
Claims (13)
- 特に、眼鏡レンズ(3)などの、光学面をコーティングするための、物理蒸着方法であって、前記方法が、
- 第1の蒸発材料(41)及び第2の蒸発材料(42)を含むるつぼ(10)の提供であって、前記第1の蒸発材料(41)は、第1の蒸気圧を有し、前記第2の蒸発材料(42)は、前記第1の蒸気圧とは異なる第2の蒸気圧を有する、提供と;
- 前記同じるつぼ(10)からの前記第1の蒸発材料(41)及び前記第2の蒸発材料(42)の同時蒸発と
を含み;
前記るつぼ(10)の表面での前記第1の蒸発材料(41)の露出面と前記第2の蒸発材料(42)の露出面との比を、前記第1の蒸発材料と前記第2の蒸発材料との間の蒸気圧の差を相殺するように適応させることを特徴とする
方法。 - 前記第1及び第2の蒸発材料(41、42)の前記露出面の比は、第1及び第2の蒸発材料の蒸気圧に比に反比例する、請求項1に記載の方法。
- 前記第1の蒸発材料(41)及び前記第2の蒸発材料(42)は、電子ビーム又はレーザー光を使用して蒸発させられ、前記電子ビーム又はレーザー光は、前記第1及び第2の材料の蒸発のために同じ出力に設定される、請求項1~2のいずれか一項に記載の方法。
- より高い蒸気圧を有する前記第1の蒸発材料(41)は、固形物として提供され、及び前記第1の蒸発材料よりも低い蒸気圧を有する前記第2の蒸発材料(42)は、前記第1の蒸発材料の前記固形物を取り囲む顆粒として提供される、請求項1~3のいずれか一項に記載の方法。
- 前記第1の蒸発材料(41)は、棒、ワイヤ又はシートの少なくとも1つとして提供される、請求項4に記載の方法。
- 前記第1の蒸発材料(41)の固形物は、前記第2の蒸発材料(42)の顆粒中に真っ直ぐに立っている、請求項4又は5に記載の方法。
- 前記第1の蒸発材料(41)の複数の棒、ワイヤ又はシートが提供される、請求項5又は6に記載の方法。
- 前記固形物は、前記るつぼの底部に触れることなく前記るつぼ(10)に配置される、請求項4~7のいずれか一項に記載の方法。
- 前記固形物の断面積は、前記るつぼ(10)の高さ方向に垂直の方向で変わる、請求項4~7のいずれか一項に記載の方法。
- 前記第1の蒸発材料(41、44)と、前記第1の蒸発材料よりも低い蒸気圧を有する前記第2の蒸発材料(42、45)とは、前記るつぼ(10)中に顆粒混合物として提供され、及び前記るつぼ(10)中の前記顆粒混合物での前記第1の蒸発材料と前記第2の蒸発材料との比を、前記第1の蒸発材料と前記第2の蒸発材料との間の蒸気圧の差を相殺するように適応させる、請求項1~4のいずれか一項に記載の方法。
- 前記第1の蒸発材料(41)と、前記第1の蒸発材料よりも低い蒸気圧を有する前記第2の蒸発材料(42)とは、前記るつぼ(10)中に錠剤(46)として提供され、及び前記錠剤(46)における前記第1の蒸発材料と前記第2の蒸発材料との比を、前記第1の蒸発材料と前記第2の蒸発材料との間の蒸気圧の差を相殺するように適応させる、請求項1~4のいずれか一項に記載の方法。
- 特に、眼鏡レンズなどの光学面をコーティングするための、物理蒸着のためのるつぼ(10)であって、前記るつぼが、第1の蒸発材料(41)と第2の蒸発材料(42)とを含み、
ここで、前記第1の蒸発材料(41)は、第1の蒸気圧を有し、前記第2の蒸発材料(42)は、前記第1の蒸気圧とは異なる第2の蒸気圧を有し、
前記るつぼ(10)中の前記第1の蒸発材料(41)の露出面と前記第2の蒸発材料(42)の露出面との比が、前記第1蒸発材料と前記第2の蒸発材料との間の蒸気圧の差を相殺するように適応させられることを特徴とする、
るつぼ。 - 特に、眼鏡レンズ(3)などの光学面をコーティングするための、物理蒸着システム(1)であって、前記システムが、
- 真空室(2)と;
- 請求項12に記載のるつぼ(10)と;
- 前記第1の蒸発材料(41)及び前記第2の蒸発材料(42)を前記同じるつぼ(10)から同時に蒸発させるように適応させられた蒸発ユニット(20)と
を含むシステム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP21160061.4 | 2021-03-01 | ||
EP21160061.4A EP4053303A1 (en) | 2021-03-01 | 2021-03-01 | Vapor deposition method for coating a spectacle lens, physical vapor deposition system and crucible for physical vapor deposition |
PCT/EP2022/054807 WO2022184585A1 (en) | 2021-03-01 | 2022-02-25 | Vapor deposition method for coating a spectacle lens, physical vapor deposition system and crucible for physical vapor deposition |
Publications (2)
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JP2023543324A true JP2023543324A (ja) | 2023-10-13 |
JP7477725B2 JP7477725B2 (ja) | 2024-05-01 |
Family
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JP2023524418A Active JP7477725B2 (ja) | 2021-03-01 | 2022-02-25 | 眼鏡レンズをコーティングするための蒸着方法、物理蒸着システム及び物理蒸着のためのるつぼ |
Country Status (6)
Country | Link |
---|---|
US (1) | US11866818B2 (ja) |
EP (2) | EP4053303A1 (ja) |
JP (1) | JP7477725B2 (ja) |
CN (1) | CN116368257A (ja) |
MX (1) | MX2023004636A (ja) |
WO (1) | WO2022184585A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3141699A1 (fr) * | 2022-11-03 | 2024-05-10 | Trixell | Procédé de dépôt d’une couche de matériaux inorganiques ou hybrides organiques/inorganiques sur un substrat |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3655430A (en) * | 1969-05-21 | 1972-04-11 | United Aircraft Corp | Vapor deposition of alloys |
JPH0610344B2 (ja) * | 1988-04-28 | 1994-02-09 | 松下電器産業株式会社 | 金属薄膜の製造法 |
GB2230792A (en) | 1989-04-21 | 1990-10-31 | Secr Defence | Multiple source physical vapour deposition. |
US5474809A (en) * | 1994-12-27 | 1995-12-12 | General Electric Company | Evaporation method |
US5773078A (en) * | 1996-06-24 | 1998-06-30 | General Electric Company | Method for depositing zirconium oxide on a substrate |
JP2001059158A (ja) | 1999-08-19 | 2001-03-06 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
SG106639A1 (en) * | 2000-10-10 | 2004-10-29 | Gen Electric | Apparatus and method for introducing small amounts of refractory elements into a vapor deposition coating |
US6869508B2 (en) * | 2001-10-19 | 2005-03-22 | General Electric Company | Physical vapor deposition apparatus and process |
JP2004191062A (ja) * | 2002-12-06 | 2004-07-08 | Fuji Photo Film Co Ltd | 放射線像変換パネルの製造方法 |
US7329436B2 (en) * | 2004-11-17 | 2008-02-12 | United Technologies Corporation | Vapor deposition of dissimilar materials |
US20130129938A1 (en) * | 2010-01-06 | 2013-05-23 | Direct Vapor Technologies International | Method for the co-evaporation and deposition of materials with differing vapor pressures |
WO2015105818A1 (en) * | 2014-01-09 | 2015-07-16 | United Technologies Corporation | Coating process using gas screen |
-
2021
- 2021-03-01 EP EP21160061.4A patent/EP4053303A1/en not_active Withdrawn
-
2022
- 2022-02-25 EP EP22707198.2A patent/EP4211288B1/en active Active
- 2022-02-25 MX MX2023004636A patent/MX2023004636A/es unknown
- 2022-02-25 JP JP2023524418A patent/JP7477725B2/ja active Active
- 2022-02-25 CN CN202280006994.0A patent/CN116368257A/zh active Pending
- 2022-02-25 WO PCT/EP2022/054807 patent/WO2022184585A1/en active Application Filing
-
2023
- 2023-05-02 US US18/310,619 patent/US11866818B2/en active Active
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Publication number | Publication date |
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EP4211288B1 (en) | 2024-05-29 |
WO2022184585A1 (en) | 2022-09-09 |
EP4211288A1 (en) | 2023-07-19 |
MX2023004636A (es) | 2024-02-22 |
US11866818B2 (en) | 2024-01-09 |
EP4053303A1 (en) | 2022-09-07 |
CN116368257A (zh) | 2023-06-30 |
JP7477725B2 (ja) | 2024-05-01 |
US20230265553A1 (en) | 2023-08-24 |
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