JP2023167375A - Electric discharge machine - Google Patents

Electric discharge machine Download PDF

Info

Publication number
JP2023167375A
JP2023167375A JP2022078521A JP2022078521A JP2023167375A JP 2023167375 A JP2023167375 A JP 2023167375A JP 2022078521 A JP2022078521 A JP 2022078521A JP 2022078521 A JP2022078521 A JP 2022078521A JP 2023167375 A JP2023167375 A JP 2023167375A
Authority
JP
Japan
Prior art keywords
tank
liquid
machining
liquid tank
dirty
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022078521A
Other languages
Japanese (ja)
Other versions
JP7311674B1 (en
Inventor
昭夫 保坂
Akio Hosaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sodick Co Ltd
Original Assignee
Sodick Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sodick Co Ltd filed Critical Sodick Co Ltd
Priority to JP2022078521A priority Critical patent/JP7311674B1/en
Application granted granted Critical
Publication of JP7311674B1 publication Critical patent/JP7311674B1/en
Publication of JP2023167375A publication Critical patent/JP2023167375A/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

Landscapes

  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

To provide an electric discharge machine which comprises a service tank constituted to make a volumetric ratio of a contaminated liquid to a clarified liquid variable suitably in a simpler constitution.SOLUTION: An electric discharge machine 1 is provided which comprises: a service tank 3 including a working tank 2 housing a workpiece W, a contaminated liquid tank 31 reserving a working liquid discharged out of the working tank 2, a clarified liquid tank 33 reserving the working liquid fed from the anti-fouling tank 31, and a partition plate 35 partitioning the anti-fouling tank 31 from the clarified liquid tank 33 to have a first communication passage; a reservation bag 4 including a bag body 41 provided in the clarified liquid tank 33 to be expandable, and a connection port 42 being a bag mouth of the bag body 41 and connected to the first communication passage to communicate with the anti-fouling tank 31; a circulation pump pumping up the working liquid in the anti-fouling tank 31; a filter 52 filtering the working liquid fed by the circulation pump to feed it to the clarified liquid tank 33; and a liquid feeding pump 61 pumping up the working liquid in the clarified liquid tank 33 to feed it to the working tank 2.SELECTED DRAWING: Figure 1

Description

本発明は、放電加工機に関する。 The present invention relates to an electric discharge machine.

放電加工機は、加工槽中に被加工物を載置し、工具電極(以下、単に電極という)と電極に対向配置された被加工物とで形成される加工間隙に加工電圧を印加して放電を発生させるとともに、電極と被加工物とを相対移動させて放電エネルギにより被加工物を所望の形状に加工する。 In an electric discharge machine, a workpiece is placed in a machining tank, and a machining voltage is applied to the machining gap formed between a tool electrode (hereinafter simply referred to as the electrode) and a workpiece placed opposite the electrode. While generating an electric discharge, the electrode and the workpiece are moved relative to each other, and the workpiece is machined into a desired shape by the discharge energy.

電極と被加工物との絶縁回復、被加工物の冷却、加工屑の除去等を目的として、加工間隙を加工液に浸漬したり、加工間隙に加工液を吹き付けたりする等して、放電加工中は加工間隙に絶縁性の加工液が供給される。 Electric discharge machining is performed by dipping the machining gap in machining fluid or spraying machining fluid into the machining gap for the purpose of recovering insulation between the electrode and workpiece, cooling the workpiece, and removing machining debris. Inside, an insulating machining fluid is supplied to the machining gap.

加工液は、サービスタンクと呼ばれる槽に貯留されている。サービスタンクは、加工屑を含む加工液を貯留する汚液槽と、加工屑を除去した加工液を貯留する清液槽と、を含んで構成される。 The machining fluid is stored in a tank called a service tank. The service tank includes a dirty liquid tank that stores machining liquid containing machining waste, and a clean liquid tank that stores machining liquid from which machining waste has been removed.

放電加工によって発生した加工屑を含む加工液は、加工槽から汚液槽へと排出される。汚液槽に貯留された加工液は、フィルタによって加工屑が除去され、清液槽へと送られる。清液槽に貯留された加工液は、再度加工槽へ送られ、加工間隙に供給される。このようにして、加工液は清浄に保たれながら、装置内を循環する。 Machining fluid containing machining debris generated by electrical discharge machining is discharged from the machining tank to the waste tank. The machining liquid stored in the dirty liquid tank has machining debris removed by a filter, and is sent to the clean liquid tank. The machining liquid stored in the fresh liquid tank is sent to the machining tank again and supplied to the machining gap. In this way, the machining fluid is kept clean while circulating within the device.

放電加工機の運転状況によって、サービスタンクにおける、加工屑を含む加工液(以下、単に汚液という)および加工屑を除去した加工液(以下、単に清液という)の水位と比率は変位する。一般的には、汚液槽および清液槽は、最大水位に合わせて、十分な容量に設計される。 Depending on the operating status of the electric discharge machine, the water level and ratio of the machining fluid containing machining debris (hereinafter simply referred to as dirty fluid) and the machining fluid from which machining debris has been removed (hereinafter simply referred to as clear fluid) in the service tank vary. Generally, the dirty liquid tank and the clean liquid tank are designed to have sufficient capacity according to the maximum water level.

サービスタンクを小型に構成する上で、汚液と清液の容量比を変更可能に構成することが考えられる。特許文献1は、汚液槽と清液槽とを仕切る仕切板を水平方向に移動可能に構成した放電加工機を開示している。 In order to make the service tank smaller, it is conceivable to configure the service tank so that the volume ratio of dirty liquid and clean liquid can be changed. Patent Document 1 discloses an electric discharge machine in which a partition plate that partitions a dirty liquid tank and a clean liquid tank is configured to be movable in the horizontal direction.

特開平04-122525号公報Japanese Patent Application Publication No. 04-122525

サービスタンクにおいて汚液と清液の容量比を変更可能に構成するにあたり、より簡易な構成で容量比が変更可能であることが望ましい。また、サービスタンクにおける汚液と清液の実際の貯留比に応じて、随時適切に容量比が変更可能であることが望ましい。 When configuring the service tank to be able to change the capacity ratio of dirty liquid and clean liquid, it is desirable to be able to change the capacity ratio with a simpler configuration. Further, it is desirable that the capacity ratio can be changed appropriately at any time depending on the actual storage ratio of dirty liquid and clean liquid in the service tank.

本発明はこのような事情に鑑みてなされたものであり、より簡易な構成で、適切に汚液と清液の容量比を変更可能に構成されたサービスタンクを備える放電加工機を提供することを目的とする。 The present invention has been made in view of the above circumstances, and an object of the present invention is to provide an electric discharge machine equipped with a service tank that has a simpler structure and is configured to be able to appropriately change the capacity ratio of dirty liquid and clean liquid. With the goal.

本発明によれば、被加工物が収容される加工槽と、加工槽から排出される加工液を貯留する汚液槽と、汚液槽から送られる加工液を貯留する清液槽と、汚液槽と清液槽とを区切り第1の連通路を有する仕切板と、を含むサービスタンクと、清液槽内に設けられ膨張可能な袋体と、袋体の袋口であり第1の連通路に接続されて汚液槽と連通する接続口と、を含む貯留袋と、汚液槽内の加工液を汲み上げる循環ポンプと、循環ポンプによって送られた加工液を濾過して清液槽に送るフィルタと、清液槽内の加工液を汲み上げ加工槽へ送る送液ポンプと、を備える、放電加工機が提供される。 According to the present invention, there is provided a machining tank in which a workpiece is stored, a dirty liquid tank that stores the machining liquid discharged from the machining tank, a clean liquid tank that stores the machining liquid sent from the dirty liquid tank, and a dirty liquid tank that stores the machining liquid sent from the dirty liquid tank. a service tank including a partition plate that separates the liquid tank and the fresh liquid tank and has a first communication path; an inflatable bag provided in the fresh liquid tank; A storage bag that includes a connection port that is connected to the communication path and communicates with the sewage tank, a circulation pump that pumps up the machining fluid in the sewage tank, and a clean fluid tank that filters the machining fluid sent by the circulation pump. An electric discharge machine is provided, which includes a filter that sends the machining fluid to the machining tank, and a liquid pump that pumps up the machining fluid in the clear fluid tank and sends it to the machining tank.

本発明に係る放電加工機では、加工液を貯留するための容器として、汚液槽と、清液槽と、貯留袋と、が設けられる。貯留袋は、清液槽内に設けられ膨張可能な袋体と、袋体の袋口であり汚液槽と連通する接続口と、を含む。汚液槽に供給された加工液は袋体に流入し、袋体は膨張する。汚液槽から清液槽に加工液が送られると、袋体に清液槽内の加工液の水圧が加わるので袋体は収縮し、袋体から汚液槽に加工液が流出する。このように、袋体の膨張・収縮は、汚液と清液の実際の貯留比に応じて自動的に為されるので、簡易かつ適正に、汚液と清液の容量比を変更することができる。また、汚液を貯留する汚液貯留部が汚液槽と貯留袋とを含んで構成されるので、汚液槽を従来と比べて小型に構成できる。ひいては、サービスタンクを小型化することができる。 In the electric discharge machine according to the present invention, a dirty liquid tank, a clean liquid tank, and a storage bag are provided as containers for storing machining liquid. The storage bag includes an inflatable bag body provided in the fresh liquid tank, and a connection port that is a bag opening of the bag body and communicates with the dirty liquid tank. The processing liquid supplied to the waste tank flows into the bag, and the bag expands. When the machining liquid is sent from the dirty liquid tank to the clean liquid tank, the water pressure of the machining liquid in the clean liquid tank is applied to the bag, causing the bag to contract and the machining liquid to flow out from the bag into the dirty liquid tank. In this way, the bag body expands and contracts automatically according to the actual storage ratio of dirty liquid and clean liquid, so the volume ratio of dirty liquid and clean liquid can be easily and appropriately changed. I can do it. Further, since the dirty liquid storage section that stores the dirty liquid is configured to include the dirty liquid tank and the storage bag, the dirty liquid tank can be configured to be smaller than the conventional one. As a result, the service tank can be downsized.

本実施形態の放電加工機の概略構成を示す側面図である。FIG. 1 is a side view showing a schematic configuration of an electric discharge machine according to the present embodiment. サービスタンク周辺の概略構成を示す上面図である。FIG. 2 is a top view showing a schematic configuration around the service tank. 加工液の給排出経路を示す回路図である。FIG. 3 is a circuit diagram showing a machining fluid supply and discharge route. 加工終了後、排液中の状態を示す。Shows the state of liquid being drained after processing is completed. 加工終了後、排液完了の状態を示す。After finishing processing, it shows the state of completion of draining. 加工準備中において、清液槽内の加工液が液面下限にある状態を示す。This shows a state in which the machining fluid in the fresh fluid tank is at the lower limit of the liquid level during machining preparation. 加工準備中において、連通シャッタが開状態である状態を示す。The communication shutter is shown in an open state during processing preparation. 加工準備中において、加工槽に送液している状態を示す。This shows the state in which liquid is being sent to the processing tank during preparation for processing. 加工中の状態を示す。Indicates the status during processing.

以下、図面を用いて本発明の実施形態について説明する。以下に説明される各種変形例は、それぞれ任意に組み合わせて実施することができる。 Embodiments of the present invention will be described below with reference to the drawings. The various modified examples described below can be implemented in arbitrary combinations.

本実施形態に係る放電加工機1は、電極としてワイヤ電極Eを使用するワイヤ放電加工機であるが、型彫放電加工機、細孔放電加工機等、他の放電加工機であってもよい。また、本実施形態においては、加工液Fとして純水を主成分とする水系加工液が使用されるが、油系加工液等、他の絶縁性の液体であってもよい。 Although the electrical discharge machine 1 according to the present embodiment is a wire electrical discharge machine that uses a wire electrode E as an electrode, it may be another electrical discharge machine such as a die-sinking electrical discharge machine or a small-hole electrical discharge machine. . Further, in this embodiment, an aqueous machining fluid containing pure water as a main component is used as the machining fluid F, but other insulating fluids such as an oil-based machining fluid may be used.

図1から図3に示されるように、本実施形態の放電加工機1は、加工槽2と、サービスタンク3と、貯留袋4と、循環ポンプ51およびフィルタ52を含む循環管路5と、送液ポンプ61、純水器62および冷却器63を含む送液管路6と、噴流ポンプ71を含む噴流管路7と、を備える。 As shown in FIGS. 1 to 3, the electrical discharge machine 1 of this embodiment includes a machining tank 2, a service tank 3, a storage bag 4, a circulation pipe 5 including a circulation pump 51 and a filter 52, It includes a liquid sending pipe line 6 including a liquid sending pump 61, a water purifier 62, and a cooler 63, and a jet pipe line 7 including a jet pump 71.

加工槽2は、放電加工の対象となる被加工物Wを収容する。加工槽2には、被加工物Wを挟んで対向する上ガイド組体21と、下ガイド組体22と、が設けられる。上ガイド組体21および下ガイド組体22はそれぞれ、ワイヤ電極Eを案内するワイヤガイドと、被加工物Wとワイヤ電極Eとの間に形成される加工間隙に向かって加工液Fを噴出する噴流ノズル23と、を有する。ワイヤ電極Eまたは被加工物Wは相対移動可能に構成され、放電加工中において被加工物Wは所定の加工間隙をもってワイヤ電極Eと対向配置される。不図示の電源からワイヤ電極Eおよび被加工物Wにそれぞれ極性が異なる加工電圧が印加され、放電により被加工物Wの一部が除去される。 The machining tank 2 accommodates a workpiece W to be subjected to electrical discharge machining. The processing tank 2 is provided with an upper guide assembly 21 and a lower guide assembly 22 that face each other with the workpiece W interposed therebetween. The upper guide assembly 21 and the lower guide assembly 22 each spray machining fluid F toward the machining gap formed between the wire guide that guides the wire electrode E, the workpiece W, and the wire electrode E. It has a jet nozzle 23. The wire electrode E or the workpiece W is configured to be relatively movable, and the workpiece W is placed opposite the wire electrode E with a predetermined machining gap during electrical discharge machining. Machining voltages with different polarities are applied to the wire electrode E and the workpiece W from a power supply (not shown), and a part of the workpiece W is removed by electric discharge.

上ガイド組体21には、加工槽液面センサ26が取り付けられ、加工槽液面センサ26は、加工槽2の液面上限PUを検出する。加工槽2の下部には、加工液Fを排出するドレンが設けられ、ドレンには、開閉可能に構成されたドレンシャッタ24が設けられる。ドレンシャッタ24は、エアシリンダ等の任意のアクチュエータであるドレンシャッタ駆動装置25により開閉される。ドレンシャッタ24に代えて、電磁弁等により加工槽2からの加工液Fの排出を制御してもよいが、ドレンシャッタ24は加工屑による動作不良を起こしにくい点で好ましい。 A processing tank liquid level sensor 26 is attached to the upper guide assembly 21, and the processing tank liquid level sensor 26 detects the upper limit PU of the liquid level of the processing tank 2. A drain for discharging the machining fluid F is provided at the lower part of the machining tank 2, and a drain shutter 24 configured to be openable and closable is provided to the drain. The drain shutter 24 is opened and closed by a drain shutter drive device 25, which is an arbitrary actuator such as an air cylinder. Although the drain shutter 24 may be replaced with a solenoid valve or the like to control the discharge of the machining fluid F from the machining tank 2, the drain shutter 24 is preferable because it is less likely to cause malfunctions due to machining debris.

サービスタンク3は、加工液Fを貯留する。サービスタンク3は、汚液槽31と、清液槽33と、仕切板35と、を含む。汚液槽31は、加工槽2から排出される加工液Fを貯留する。すなわち、汚液槽31は、基本的には汚液を貯留する。汚液槽31には、汚液槽31における加工液Fの液面下限DLを検出する汚液槽液面センサ32が設けられる。清液槽33は、汚液槽31からフィルタ52を介して送られる加工液Fを貯留する。すなわち、清液槽33は清液を貯留する。清液槽33には、清液槽33における加工液Fの液面下限CLを検出する清液槽液面センサ34が設けられる。汚液槽31の液面下限DLは、清液槽33の液面下限CLよりも高く設定される。清液槽33が液面下限CLを検出したときは、放電加工ならびに循環ポンプ51、送液ポンプ61および噴流ポンプ71の駆動を停止する。このとき、加工液Fの補充を促すメッセージを制御装置の表示装置等に表示してもよい。仕切板35は、汚液槽31と清液槽33とを区切る板状部材である。仕切板35は、汚液槽31と清液槽33とに連通する開口である、第1の連通路351と第2の連通路352とを有する。 The service tank 3 stores machining fluid F. The service tank 3 includes a dirty liquid tank 31, a clean liquid tank 33, and a partition plate 35. The waste liquid tank 31 stores the processing liquid F discharged from the processing tank 2. That is, the dirty liquid tank 31 basically stores dirty liquid. The sewage tank 31 is provided with a sewage tank liquid level sensor 32 that detects a lower limit DL of the liquid level of the machining fluid F in the sewage tank 31 . The clean liquid tank 33 stores the machining liquid F sent from the dirty liquid tank 31 through the filter 52. That is, the fresh liquid tank 33 stores fresh liquid. The fresh liquid tank 33 is provided with a fresh liquid tank liquid level sensor 34 that detects the lower limit CL of the liquid level of the machining fluid F in the fresh liquid tank 33 . The lower limit DL of the liquid level of the dirty liquid tank 31 is set higher than the lower limit CL of the liquid level of the clean liquid tank 33. When the clear liquid tank 33 detects the lower limit CL of the liquid level, the electric discharge machining and the driving of the circulation pump 51, the liquid feeding pump 61, and the jet pump 71 are stopped. At this time, a message prompting replenishment of the machining fluid F may be displayed on the display device of the control device or the like. The partition plate 35 is a plate-like member that separates the dirty liquid tank 31 and the clean liquid tank 33. The partition plate 35 has a first communication path 351 and a second communication path 352, which are openings that communicate with the dirty liquid tank 31 and the clean liquid tank 33.

貯留袋4は、袋体41と、接続口42と、を含む。袋体41は膨張可能に構成され、清液槽31内に設けられる。袋体42は、その内部に加工液Fを貯留可能な程度の非透水性を有していればよい。すなわち、袋体42においては、加工液Fを貯留できる範囲で多少の透水性が許容され、完全な非透水性までは要求されない。袋体41はその機能を果たす限りにおいて任意の素材から構成されればよいが、例えば、高密度ポリエステルタフタが使用されてもよい。袋体41の下部は、脱着可能にサービスタンク3に固定されてもよい。例えば、袋体41の先端にフックを設け、フックを清液槽33内に設けた固定具に取り付け、袋体41を固定するようにしてもよい。また、袋体41の中に侵入した空気を脱気するため、袋体41の上部に脱気弁が設けられてもよい。接続口42は、袋体41の袋口であり、第1の連通路351と接続される。接続口42を介して、袋体41と汚液槽31との間で加工液Fの流入および流出が行われる。加工液Fの流入および流出を適正に行うようにするため、第1の連通路351は、清液槽33の液面下限CLよりも下方に設けられることが好ましい。 The storage bag 4 includes a bag body 41 and a connection port 42. The bag body 41 is configured to be expandable and is provided within the fresh liquid tank 31. The bag body 42 only needs to have water impermeability to the extent that it can store the machining fluid F therein. That is, the bag body 42 is allowed to have some degree of water permeability as long as it can store the machining fluid F, and is not required to have complete water impermeability. The bag 41 may be made of any material as long as it fulfills its function; for example, high-density polyester taffeta may be used. The lower part of the bag 41 may be removably fixed to the service tank 3. For example, a hook may be provided at the tip of the bag 41 and the hook may be attached to a fixture provided in the fresh liquid tank 33 to fix the bag 41. Furthermore, a degassing valve may be provided in the upper part of the bag 41 in order to evacuate the air that has entered the bag 41. The connection port 42 is a bag opening of the bag body 41 and is connected to the first communication path 351. Processing fluid F flows in and out between the bag body 41 and the dirty fluid tank 31 through the connection port 42 . In order to properly inflow and outflow the machining fluid F, the first communication path 351 is preferably provided below the lower limit CL of the liquid level of the clear liquid tank 33.

以上のような構成によれば、汚液槽31に供給された加工液Fは接続口42を介して袋体41に流入し、袋体41は膨張する。また、汚液槽31から清液槽33に加工液Fが送られると、袋体41に清液槽33内の加工液Fの水圧が加わるので袋体41は収縮し、袋体41から汚液槽31に加工液が流出する。このように、袋体41の膨張・収縮は、汚液と清液の実際の貯留比に応じて自動的に為されるので、簡易かつ適正に、汚液と清液の容量比が変更される。 According to the above configuration, the processing fluid F supplied to the dirty liquid tank 31 flows into the bag body 41 through the connection port 42, and the bag body 41 expands. Further, when the machining fluid F is sent from the dirty liquid tank 31 to the clean liquid tank 33, the water pressure of the machining fluid F in the clean liquid tank 33 is applied to the bag body 41, so the bag body 41 contracts, and the dirt is removed from the bag body 41. Processing liquid flows out into the liquid tank 31. In this way, the bag body 41 is automatically expanded and deflated according to the actual storage ratio of dirty liquid and clean liquid, so that the volume ratio of dirty liquid and clean liquid can be easily and appropriately changed. Ru.

また、汚液の大部分を袋体41に貯留することができるので、汚液槽31を従来よりも小型に構成できる。汚液槽31を小型に構成する上で、貯留袋4に貯留可能な加工液Fの最大容量は、加工槽2に貯留可能な加工液Fの最大容量と、略同等であることが好ましい。具体的には、貯留袋4に貯留可能な加工液Fの最大容量は、加工槽2に貯留可能な加工液Fの最大容量の90%以上150%以下であることが好ましく、95%以上110%以下であることがより好ましい。このとき、汚液槽31は、循環ポンプ51および汚液槽液面センサ32が設置可能な程度に小型であればよい。 Further, since most of the dirty liquid can be stored in the bag body 41, the dirty liquid tank 31 can be configured to be smaller than the conventional one. In order to make the waste liquid tank 31 smaller, it is preferable that the maximum capacity of the processing liquid F that can be stored in the storage bag 4 is approximately the same as the maximum capacity of the processing liquid F that can be stored in the processing tank 2. Specifically, the maximum capacity of the processing liquid F that can be stored in the storage bag 4 is preferably 90% or more and 150% or less of the maximum capacity of the processing liquid F that can be stored in the processing tank 2, and preferably 95% or more and 110% or less. % or less is more preferable. At this time, the waste tank 31 only needs to be small enough to allow installation of the circulation pump 51 and the waste tank liquid level sensor 32.

第2の連通路352には、開閉可能に構成された連通シャッタ36が設けられる。連通シャッタ36は、エアシリンダ等の任意のアクチュエータである連通シャッタ駆動装置37により開閉される。連通シャッタ36を開くことで、汚液槽31と清液槽33とが連通する。 The second communication path 352 is provided with a communication shutter 36 configured to be openable and closable. The communication shutter 36 is opened and closed by a communication shutter drive device 37, which is an arbitrary actuator such as an air cylinder. By opening the communication shutter 36, the dirty liquid tank 31 and the clean liquid tank 33 communicate with each other.

ここで、図3を参照しながら、加工液Fの給排出経路について詳述する。本実施形態においては、加工液Fの給排出経路は、循環管路5と、送液管路6と、噴流管路7と、第1の急送管路8と、第2の急送管路9と、を備える。 Here, the supply and discharge route for the machining fluid F will be described in detail with reference to FIG. 3. In this embodiment, the machining fluid F is supplied and discharged through a circulation pipe 5, a liquid feeding pipe 6, a jet pipe 7, a first express pipe 8, and a second express pipe 9. and.

循環管路5は、汚液槽31内の加工液Fから加工屑を除去して清液槽33に送る。循環管路5は、汚液槽31と清液槽とに接続された配管と、当該配管に設けられた、循環ポンプ51と、フィルタ52と、電磁弁53と、を含む。循環ポンプ51は、汚液槽31内の加工液Fを汲み上げ、フィルタ52へと送る。フィルタ52は、循環ポンプ51によって送られた加工液Fを濾過して清液槽33へと送る。フィルタ52は、要求される濾過能力に応じて、複数設けられてもよい。 The circulation pipe 5 removes processing waste from the processing liquid F in the dirty liquid tank 31 and sends it to the clean liquid tank 33. The circulation pipe 5 includes a pipe connected to the dirty liquid tank 31 and the clean liquid tank, and a circulation pump 51, a filter 52, and a solenoid valve 53 provided in the pipe. The circulation pump 51 pumps up the processing liquid F in the waste liquid tank 31 and sends it to the filter 52. The filter 52 filters the machining fluid F sent by the circulation pump 51 and sends it to the clear fluid tank 33 . A plurality of filters 52 may be provided depending on the required filtration ability.

送液管路6は、清液槽33内の加工液Fを加工槽2に送る。送液管路6は、清液槽33と加工槽2とに接続された配管と、当該配管に設けられた、送液ポンプ61と、電磁弁64と、を含む。また、送液管路6は、純水器62と、電磁弁65と、純水器62および電磁弁65が設けられる配管と、冷却器63と、電磁弁66と、冷却器63および電磁弁66が設けられる配管と、をさらに含む。純水器62および電磁弁65が設けられる配管と、冷却器63および電磁弁66が設けられる配管は、それぞれ、循環ポンプ51と電磁弁64との間の配管に接続される。純水器62は、例えばイオン交換樹脂を有するイオン交換装置であり、加工液Fの比抵抗値を適正な値に保つ。純水器62の制御に関して、放電加工機1は、比抵抗計を備えていてもよい。なお、加工液Fが水系加工液でない場合は、純水器62は省略される。冷却器63は、加工液Fの温度を適正な値に保つ。 The liquid sending pipe line 6 sends the machining liquid F in the clear liquid tank 33 to the machining tank 2. The liquid sending pipe line 6 includes a pipe connected to the fresh liquid tank 33 and the processing tank 2, a liquid sending pump 61, and a solenoid valve 64 provided in the pipe. Further, the liquid sending pipe line 6 includes a water purifier 62, a solenoid valve 65, a pipe in which the deionizer 62 and the solenoid valve 65 are provided, a cooler 63, a solenoid valve 66, a cooler 63 and the solenoid valve. 66 is provided. The piping in which the water purifier 62 and the electromagnetic valve 65 are provided, and the piping in which the cooler 63 and the electromagnetic valve 66 are provided, are connected to the piping between the circulation pump 51 and the electromagnetic valve 64, respectively. The water deionizer 62 is, for example, an ion exchange device having an ion exchange resin, and maintains the specific resistance value of the processing fluid F at an appropriate value. Regarding the control of the water purifier 62, the electrical discharge machine 1 may be equipped with a resistivity meter. Note that if the machining fluid F is not a water-based machining fluid, the deionizer 62 is omitted. The cooler 63 maintains the temperature of the machining fluid F at an appropriate value.

噴流管路7は、清液槽33内の加工液Fを噴流ノズル23に送る。噴流管路7は、清液槽33と噴流ノズル23とに接続された配管と、当該配管に設けられた、噴流ポンプ71と、電磁弁72と、を含む。 The jet pipe line 7 sends the machining fluid F in the fresh liquid tank 33 to the jet nozzle 23 . The jet pipe line 7 includes a pipe connected to the fresh liquid tank 33 and the jet nozzle 23, a jet pump 71, and a solenoid valve 72 provided in the pipe.

第1の急送管路8は、循環管路5に接続される。第1の急送管路8は、循環ポンプ51および電磁弁53間の配管と加工槽2とに接続された配管と、当該配管に設けられた電磁弁81と、を含む。第1の急送管路8の配管は、直接加工槽2と接続されてもよいし、送液管路6と合流してもよい。電磁弁53,81を制御することで、循環ポンプ51の送液先を、フィルタ52と第1の急送管路8のいずれか一方に切り換えることができる。 The first express line 8 is connected to the circulation line 5. The first express pipeline 8 includes a pipe connected to the processing tank 2 and a pipe between the circulation pump 51 and the solenoid valve 53, and a solenoid valve 81 provided in the pipe. The piping of the first express pipeline 8 may be directly connected to the processing tank 2 or may merge with the liquid supply pipeline 6 . By controlling the electromagnetic valves 53 and 81, the liquid delivery destination of the circulation pump 51 can be switched to either the filter 52 or the first express pipe 8.

第2の急送管路9は、噴流管路7に接続される。第2の急送管路9は、噴流ポンプ71および電磁弁72間の配管と加工槽2とに接続された配管と、当該配管に設けられた電磁弁91と、を含む。第2の急送管路9の配管は、直接加工槽2と接続されてもよいし、送液管路6と合流してもよい。電磁弁72,91を制御することで、噴流ポンプ71の送液先を、噴流ノズル23と第2の急送管路9のいずれか一方に切り換えることができる。 The second express line 9 is connected to the jet line 7 . The second express pipeline 9 includes a pipe connected to the processing tank 2 and a pipe between the jet pump 71 and the solenoid valve 72, and a solenoid valve 91 provided in the pipe. The pipe of the second express pipe line 9 may be directly connected to the processing tank 2, or may merge with the liquid feed pipe line 6. By controlling the electromagnetic valves 72 and 91, the liquid sending destination of the jet pump 71 can be switched to either the jet nozzle 23 or the second express pipe 9.

加工準備中において加工槽2に加工液Fを満たす際、送液管路6に加えて、第1の急送管路8および第2の急送管路9を使用して加工液Fの送液を行ってもよい。 When filling the machining fluid F into the machining tank 2 during machining preparation, the first express conduit 8 and the second express conduit 9 are used in addition to the liquid conveyance conduit 6 to convey the machining fluid F. You may go.

以上に説明した加工液Fの給排出経路はあくまで一例であり、これに限定されない。上述した以外の管路が設けられてもよく、例えば、ワイヤ放電加工機においては加工槽2において不図示の下アームが貫通する開口を覆うスライドプレートが設けられるが、スライドプレート付近に噴流を供給する管路が設けられてもよい。 The supply and discharge route for the machining fluid F described above is just an example, and is not limited thereto. Conduits other than those described above may be provided. For example, in a wire electrical discharge machine, a slide plate is provided to cover an opening through which a lower arm (not shown) passes through the machining tank 2, but a jet flow is supplied near the slide plate. A conduit may also be provided.

循環ポンプ51、送液ポンプ61および噴流ポンプ71は、図1および図2に示されるように、放電加工機1の背面側に集約して配置されてもよい。このようにすれば、各ポンプへのアクセスが容易となり、メンテナンス性がよい。また、本実施形態においては、フィルタ52はサービスタンク3上に配置されるが、各ポンプを背面側に集約して配置することで、フィルタ52の配置位置の自由度が増す。 The circulation pump 51, the liquid pump 61, and the jet pump 71 may be collectively arranged on the back side of the electrical discharge machine 1, as shown in FIGS. 1 and 2. In this way, each pump can be easily accessed and maintainability is improved. Further, in this embodiment, the filter 52 is arranged on the service tank 3, but by arranging each pump collectively on the back side, the degree of freedom in the arrangement position of the filter 52 increases.

本実施形態の放電加工機1は、不図示の制御装置を備える。制御装置は、具体的には数字制御装置であり、CPU、RAM、ROM、補助記憶装置、出入力インターフェース等のハードウェアとソフトウェアを任意に組み合わせて構成される。制御装置は、加工液Fの給排出に関して、ドレンシャッタ24、連通シャッタ36、循環ポンプ51、送液ポンプ61、噴流ポンプ71および電磁弁53,64,65,66,72,81,91の制御を行う。 The electrical discharge machine 1 of this embodiment includes a control device (not shown). The control device is specifically a numerical control device, and is configured by arbitrarily combining hardware and software such as a CPU, RAM, ROM, auxiliary storage device, and input/output interface. The control device controls the drain shutter 24, the communication shutter 36, the circulation pump 51, the liquid feed pump 61, the jet pump 71, and the solenoid valves 53, 64, 65, 66, 72, 81, 91 regarding supply and discharge of the machining fluid F. I do.

ここで、図4から図9を参照しながら、以上に説明した放電加工機1における加工液Fの給排出に係る制御方法の例を説明する。各図において、実線で記載されている経路は、その時点で使用されている経路を示す。破線で記載されている経路は、その時点で使用されていない経路を示す。鎖線で記載されている経路は、必要に応じて使用される経路を示す。なお、以下においては、加工間隙を加工液Fに浸漬して放電加工を行う浸漬加工を実施する場合の動作を例にして説明するが、本実施形態の放電加工機1においては種々の放電加工方法が実施可能である。 Here, an example of a control method related to the supply and discharge of machining fluid F in the electrical discharge machine 1 described above will be described with reference to FIGS. 4 to 9. In each figure, the route drawn with a solid line indicates the route being used at that time. A route drawn with a broken line indicates a route that is not being used at that time. Routes written in dashed lines indicate routes that are used as necessary. In the following, the operation will be explained using an example of immersion machining in which the machining gap is immersed in machining fluid F to perform electric discharge machining, but the electric discharge machine 1 of this embodiment can perform various electric discharge machining operations. The method is implementable.

被加工物Wに対する放電加工が完了した後、加工槽2からサービスタンク3への排液が開始される。図3および図4は、排液時の状態を示している。まず、ドレンシャッタ24が開かれ、加工槽2から汚液槽31に汚液が排出される。汚液槽31に排出された汚液は、接続口42を介して袋体41へと流入し、袋体41は膨張する。汚液槽31内の汚液は、循環ポンプ51によってフィルタ52へと送られ、加工屑が除去された清液として清液槽33へと供給される。 After the electric discharge machining on the workpiece W is completed, draining of liquid from the machining tank 2 to the service tank 3 is started. 3 and 4 show the state during draining. First, the drain shutter 24 is opened, and the dirty liquid is discharged from the processing tank 2 to the dirty liquid tank 31. The dirty liquid discharged into the dirty liquid tank 31 flows into the bag body 41 through the connection port 42, and the bag body 41 expands. The dirty liquid in the dirty liquid tank 31 is sent to the filter 52 by the circulation pump 51, and is supplied to the clean liquid tank 33 as a clean liquid from which processing waste has been removed.

好ましくは、排液と並行して、純水器62および冷却器63が使用され、加工液Fの比抵抗値および温度が所定の値に維持される。電磁弁64が閉じ、電磁弁65が開いた状態で送液ポンプ61が駆動し、清液槽33内の清液が純水器62を通った後に再度清液槽33に戻されることで、加工液Fの比抵抗値が適正に保たれる。本実施形態においては、排液中、電磁弁65は加工液Fの比抵抗値に応じて開閉される。電磁弁64が閉じ、電磁弁66が開いた状態で送液ポンプ61が駆動し、清液槽33内の清液が冷却器63を通った後に再度清液槽33に戻されることで、加工液Fの温度が適正に保たれる。本実施形態においては、排液中、電磁弁66は常時開かれる。 Preferably, a deionizer 62 and a cooler 63 are used in parallel with the draining to maintain the specific resistance value and temperature of the processing fluid F at predetermined values. The liquid sending pump 61 is driven with the solenoid valve 64 closed and the solenoid valve 65 open, and the fresh liquid in the fresh liquid tank 33 passes through the deionizer 62 and then returns to the fresh liquid tank 33. The specific resistance value of the machining fluid F is maintained appropriately. In this embodiment, the solenoid valve 65 is opened and closed according to the specific resistance value of the machining fluid F during draining. When the solenoid valve 64 is closed and the solenoid valve 66 is open, the liquid sending pump 61 is driven, and the fresh liquid in the fresh liquid tank 33 passes through the cooler 63 and is returned to the fresh liquid tank 33, thereby processing. The temperature of liquid F is maintained appropriately. In this embodiment, the solenoid valve 66 is always open during draining.

加工槽2の排液完了後も、引き続き、循環ポンプ51およびフィルタ52による加工液Fの浄化と、送液ポンプ61、純水器62および冷却器63による比抵抗値および温度の調節が行われる。排液中と同じく、純水器62は必要に応じて使用され、冷却器63は常時使用される。加工液Fの浄化が進むにつれ、汚液槽31および袋体41内の汚液は減少し、清液槽33内の清液は増加する。これに伴い、袋体41は徐々に収縮する。図6は、汚液槽31内の液面が液面下限DLに到達した直後の状態を示している。 Even after the draining of the machining tank 2 is completed, the purification of the machining fluid F is continued by the circulation pump 51 and the filter 52, and the specific resistance value and temperature are adjusted by the liquid feed pump 61, the water purifier 62, and the cooler 63. . As in the case of draining liquid, the deionizer 62 is used as needed, and the cooler 63 is used all the time. As the processing liquid F is purified, the amount of dirty liquid in the dirty liquid tank 31 and the bag body 41 decreases, and the amount of clean liquid in the clean liquid tank 33 increases. Along with this, the bag body 41 gradually contracts. FIG. 6 shows the state immediately after the liquid level in the dirty liquid tank 31 reaches the lower limit DL of the liquid level.

汚液槽31内の液面が液面下限DLに到達したことが検出されると、連通シャッタ36が開かれる。図7に示される通り、第2の連通路352を介して、清液槽33内の清液が汚液槽31に流入する。連通シャッタ36が開かれた後、循環ポンプ51は駆動したままでもよいが、エネルギ消費を抑える上では、連通シャッタ36後の適当なタイミングで停止されることが好ましい。 When it is detected that the liquid level in the dirty liquid tank 31 has reached the liquid level lower limit DL, the communication shutter 36 is opened. As shown in FIG. 7, the clean liquid in the clean liquid tank 33 flows into the dirty liquid tank 31 via the second communication path 352. After the communication shutter 36 is opened, the circulation pump 51 may remain driven, but in order to suppress energy consumption, it is preferable to stop the circulation pump 51 at an appropriate timing after the communication shutter 36 is opened.

本実施形態の例では、加工液Fの浄化後、次の加工のため加工槽2に加工液Fが送液されるが、次の加工をすぐに実施しない場合は、加工液Fの浄化を完了した段階で放電加工機1を停止させることが望ましい。換言すれば、放電加工を行った後は、加工槽2からの排液を行い、汚液槽31内の液面が液面下限DLに到達するまで循環ポンプ51を駆動させて、加工液Fの浄化を完了させた状態で、放電加工機1を停止させることが望ましい。 In the example of this embodiment, after purification of the machining fluid F, the machining fluid F is sent to the machining tank 2 for the next machining, but if the next machining is not performed immediately, the machining fluid F should be purified. It is desirable to stop the electric discharge machine 1 when the process is completed. In other words, after performing electrical discharge machining, the machining fluid F is drained from the machining tank 2, and the circulation pump 51 is driven until the fluid level in the dirty fluid tank 31 reaches the lower limit DL of the fluid level. It is desirable to stop the electric discharge machine 1 after the cleaning of the electric discharge machine 1 is completed.

清液槽33および汚液槽31内にともに清液が貯留された状態で、加工槽2に加工液Fが送液される。このとき、送液管路6に加えて、第1の急送管路8および第2の急送管路9を使用して、加工槽2に加工液Fが供給される。図8に示されるように、まず、加工槽2のドレンシャッタ24が閉じられる。送液管路6においては、電磁弁64が開かれ、送液ポンプ61が駆動される。迅速に送液を行う上で、電磁弁65,66は閉じられることが好ましい。循環管路5および第1の急送管路8においては、電磁弁53が閉じられ、電磁弁81が開かれた状態で、循環ポンプ51が駆動される。噴流管路7および第2の急送管路9においては、電磁弁72が閉じられ、電磁弁91が開かれた状態で、噴流ポンプ71が駆動される。加工槽2の液面が液面上限PUに到達した時点で、加工槽2が満水になったと判断される。満水後、電磁弁81,91は閉じられ、第1の急送管路8および第2の急送管路9の使用は停止される。 The machining fluid F is fed to the machining tank 2 while the clean fluid is stored in both the clean fluid tank 33 and the dirty fluid tank 31 . At this time, the machining fluid F is supplied to the machining tank 2 using the first express conduit 8 and the second express conduit 9 in addition to the liquid conduit 6 . As shown in FIG. 8, first, the drain shutter 24 of the processing tank 2 is closed. In the liquid feeding pipe line 6, the electromagnetic valve 64 is opened and the liquid feeding pump 61 is driven. It is preferable that the electromagnetic valves 65 and 66 be closed in order to rapidly transfer the liquid. In the circulation line 5 and the first express line 8, the circulation pump 51 is driven with the solenoid valve 53 closed and the solenoid valve 81 opened. In the jet pipe line 7 and the second express pipe line 9, the jet pump 71 is driven with the solenoid valve 72 closed and the solenoid valve 91 opened. When the liquid level of the machining tank 2 reaches the liquid level upper limit PU, it is determined that the machining tank 2 is full of water. After the water is filled, the solenoid valves 81 and 91 are closed, and the use of the first express pipe 8 and the second express pipe 9 is stopped.

循環ポンプ51、送液ポンプ61、噴流ポンプ71の3つのポンプを使用して送液を行うことで、より迅速に加工槽2内に加工液Fを充填させることができる。本実施形態においては、連通シャッタ36は、第1の急送管路8を使用する際に開かれるよう制御される。すなわち、加工液Fの浄化後に連通シャッタ36を開くことで汚液槽31にも清液を貯留するので、汚液槽31に設けられている循環ポンプ51も加工槽2への送液に利用することができる。 By feeding the liquid using three pumps, the circulation pump 51, the liquid feeding pump 61, and the jet pump 71, the processing liquid F can be filled into the processing tank 2 more quickly. In this embodiment, the communication shutter 36 is controlled to be opened when the first express pipeline 8 is used. That is, by opening the communication shutter 36 after purifying the machining fluid F, the clean fluid is also stored in the dirty fluid tank 31, so the circulation pump 51 provided in the dirty fluid tank 31 is also used to send the fluid to the machining tank 2. can do.

加工槽2に十分な量の加工液Fが供給された後、放電加工が行われる。図9は加工中の状態を示している。加工槽2においては、ドレンシャッタ24が加工槽液面センサ26の検出信号に応じて開閉されることで、加工液Fの液面が液面上限PUに保たれる。循環管路5においては、汚液槽31内の加工液Fが循環ポンプ51によって汲み上げられ、フィルタ52を介して清液槽33へと送られる。送液管路6においては、清液槽33内の加工液が送液ポンプ61によって汲み上げられ、加工槽2へと送られる。送液ポンプ61によって汲み上げられた加工液の一部は、純水器62または冷却器63へと送られる。加工中は、電磁弁65は加工液Fの比抵抗値に応じて開閉され、必要時のみ純水器62が使用される。加工中は、電磁弁66は常時開かれ、常時冷却器63が使用される。噴流管路7においては、清液槽33内の加工液が噴流ポンプ71によって汲み上げられ、噴流ノズル23へと送られる。このようにして、加工槽2とサービスタンク3との間で、加工液Fが浄化されながら循環する。 After a sufficient amount of machining fluid F is supplied to the machining tank 2, electrical discharge machining is performed. FIG. 9 shows the state during processing. In the machining tank 2, the drain shutter 24 is opened and closed according to the detection signal of the machining tank liquid level sensor 26, so that the liquid level of the machining liquid F is maintained at the liquid level upper limit PU. In the circulation pipe 5, the processing liquid F in the dirty liquid tank 31 is pumped up by the circulation pump 51 and sent to the clean liquid tank 33 via the filter 52. In the liquid supply pipe line 6 , the processing liquid in the clear liquid tank 33 is pumped up by the liquid supply pump 61 and sent to the processing tank 2 . A part of the processing liquid pumped up by the liquid sending pump 61 is sent to a deionizer 62 or a cooler 63. During machining, the solenoid valve 65 is opened and closed according to the specific resistance value of the machining fluid F, and the water purifier 62 is used only when necessary. During processing, the solenoid valve 66 is always open and the cooler 63 is constantly used. In the jet pipe line 7 , the machining liquid in the clear liquid tank 33 is pumped up by the jet pump 71 and sent to the jet nozzle 23 . In this way, the machining fluid F circulates between the machining tank 2 and the service tank 3 while being purified.

加工中、汚液槽31から清液槽33に送られる加工液Fの量は、清液槽33から加工槽2に送られる加工液Fの量よりも多くなるように構成される。すなわち、本実施形態においては、加工液Fに関して、「(循環ポンプ51の吐出量)>(送液ポンプ61の吐出量)-(純水器62および冷却器63からの戻り量)+(噴流ポンプ71の吐出量)」が成り立つよう構成される。 During processing, the amount of machining fluid F sent from the dirty liquid tank 31 to the clean liquid tank 33 is configured to be larger than the amount of machining fluid F sent from the clean liquid tank 33 to the machining tank 2. That is, in this embodiment, regarding the machining fluid F, "(discharge amount of circulation pump 51)>(discharge amount of liquid feeding pump 61)-(return amount from water deionizer 62 and cooler 63)+(jet flow amount)" discharge amount of the pump 71).

このとき、連通シャッタ36は、加工中に常時開かれるよう制御されてもよい。汚液槽31から清液槽33に送られる加工液Fの量が、清液槽33から加工槽2に送られる加工液Fの量よりも多いとき、清液槽33から汚液槽31への加工液Fの流れが常時形成される。そのため、連通シャッタ36を常時開いていても、汚液槽31内の汚液が清液槽33内に流出する虞が少ない。このようにすれば、汚液槽31と清液槽33の液面が同一となるので、汚液槽31の加工液が不足することを防止できる。 At this time, the communication shutter 36 may be controlled to be always open during processing. When the amount of processing fluid F sent from the dirty liquid tank 31 to the clean liquid tank 33 is larger than the amount of processing fluid F sent from the clean liquid tank 33 to the processing tank 2, the processing liquid F is sent from the clean liquid tank 33 to the dirty liquid tank 31. A flow of machining fluid F is constantly formed. Therefore, even if the communication shutter 36 is always open, there is little possibility that the dirty liquid in the dirty liquid tank 31 will flow out into the clean liquid tank 33. In this way, the liquid levels in the dirty liquid tank 31 and the clean liquid tank 33 become the same, so that it is possible to prevent the processing liquid in the dirty liquid tank 31 from running out.

あるいは、連通シャッタ36は、加工中に必要に応じて開かれるよう制御されてもよい。例えば、汚液槽31の液面が液面下限DLに到達したときに、所定時間だけ連通シャッタ36が開かれるように制御されてもよい。汚液槽31から清液槽33に送られる加工液Fの量が、清液槽33から加工槽2に送られる加工液Fの量よりも多いとき、清液槽33の液面の方が汚液槽31の液面よりも高くなるので、連通シャッタ36を開くと、水圧により清液槽33内の清液が汚液槽31に流入する。このようにしても、汚液槽31の加工液が不足することを防止できる。 Alternatively, the communication shutter 36 may be controlled to be opened as necessary during processing. For example, the communication shutter 36 may be controlled to be opened for a predetermined period of time when the liquid level of the dirty liquid tank 31 reaches the lower limit DL of the liquid level. When the amount of machining fluid F sent from the dirty liquid tank 31 to the clean liquid tank 33 is larger than the amount of machining fluid F sent from the clean liquid tank 33 to the machining tank 2, the liquid level of the clean liquid tank 33 is Since the liquid level is higher than the liquid level in the dirty liquid tank 31, when the communication shutter 36 is opened, the clean liquid in the clean liquid tank 33 flows into the dirty liquid tank 31 due to water pressure. Even in this case, it is possible to prevent the machining liquid in the waste liquid tank 31 from running out.

本発明は、既にいくつかの例が具体的に示されているように、図面に示される実施形態の構成に限定されず、本発明の技術思想を逸脱しない範囲で種々の変形または応用が可能である。 As several examples have already been specifically shown, the present invention is not limited to the configuration of the embodiment shown in the drawings, and various modifications and applications are possible without departing from the technical idea of the present invention. It is.

1 放電加工機
2 加工槽
23 噴流ノズル
3 サービスタンク
31 汚液槽
DL 液面下限
33 清液槽
CL 液面下限
35 仕切板
351 第1の連通路
352 第2の連通路
36 連通シャッタ
4 貯留袋
41 袋体
42 接続口
51 循環ポンプ
52 フィルタ
61 送液ポンプ
71 噴流ポンプ
8 第1の急送管路
9 第2の急送管路
E ワイヤ電極
F 加工液
W 被加工物
1 Electric discharge machine 2 Machining tank 23 Jet nozzle 3 Service tank 31 Dirty liquid tank DL Liquid level lower limit 33 Clean liquid tank CL Liquid level lower limit 35 Partition plate 351 First communication path 352 Second communication path 36 Communication shutter 4 Storage bag 41 Bag body 42 Connection port 51 Circulation pump 52 Filter 61 Liquid pump 71 Jet pump 8 First express pipe 9 Second express pipe E Wire electrode F Processing fluid W Workpiece

Claims (8)

被加工物が収容される加工槽と、
前記加工槽から排出される加工液を貯留する汚液槽と、前記汚液槽から送られる前記加工液を貯留する清液槽と、前記汚液槽と前記清液槽とを区切り第1の連通路を有する仕切板と、を含むサービスタンクと、
前記清液槽内に設けられ膨張可能な袋体と、前記袋体の袋口であり前記第1の連通路に接続されて前記汚液槽と連通する接続口と、を含む貯留袋と、
前記汚液槽内の前記加工液を汲み上げる循環ポンプと、
前記循環ポンプによって送られた前記加工液を濾過して前記清液槽に送るフィルタと、
前記清液槽内の前記加工液を汲み上げ前記加工槽へ送る送液ポンプと、を備える、放電加工機。
a processing tank in which the workpiece is accommodated;
A dirty liquid tank that stores the machining liquid discharged from the processing tank, a clean liquid tank that stores the machining liquid sent from the dirty liquid tank, and a first liquid tank that separates the dirty liquid tank and the clean liquid tank. a service tank including a partition plate having a communication passage;
a storage bag that includes an inflatable bag provided in the fresh liquid tank; and a connection port that is a bag opening of the bag and is connected to the first communication path and communicates with the dirty liquid tank;
a circulation pump that pumps up the processing liquid in the sewage tank;
a filter that filters the processing liquid sent by the circulation pump and sends it to the clear liquid tank;
An electrical discharge machine comprising: a liquid pump that pumps up the machining fluid in the fresh liquid tank and sends it to the machining tank.
前記仕切板は、前記汚液槽と前記清液槽とに連通する第2の連通路をさらに有し、
前記第2の連通路を開閉する連通シャッタと、をさらに備える、請求項1に記載の放電加工機。
The partition plate further includes a second communication path that communicates with the dirty liquid tank and the clean liquid tank,
The electrical discharge machine according to claim 1, further comprising a communication shutter that opens and closes the second communication path.
加工中、前記汚液槽から前記清液槽に送られる前記加工液の量は、前記清液槽から前記加工槽に送られる加工液の量よりも多くなるように構成され、
前記連通シャッタは、加工中に開かれるよう制御される、請求項2に記載の放電加工機。
During processing, the amount of the processing liquid sent from the dirty liquid tank to the clean liquid tank is configured to be larger than the amount of processing liquid sent from the clean liquid tank to the processing tank,
The electric discharge machine according to claim 2, wherein the communication shutter is controlled to be opened during machining.
前記循環ポンプにより前記汚液槽内の前記加工液を直接前記加工槽へと送る第1の急送管路をさらに備え、
前記循環ポンプは、送液先を前記フィルタと前記第1の急送管路の一方に選択可能に構成され、
前記連通シャッタは、前記第1の急送管路を使用する際に開かれるよう制御される、請求項2に記載の放電加工機。
further comprising a first express pipe for directly sending the machining liquid in the sewage tank to the machining tank by the circulation pump,
The circulation pump is configured to be able to select one of the filter and the first express pipe as a liquid delivery destination,
The electric discharge machine according to claim 2, wherein the communication shutter is controlled to be opened when the first express conduit is used.
前記汚液槽の液面下限は、前記清液槽の液面下限よりも高く設定され、
前記第1の連通路は、前記清液槽の前記液面下限よりも下方に設けられる、請求項1に記載の放電加工機。
The lower limit of the liquid level of the dirty liquid tank is set higher than the lower limit of the liquid level of the clean liquid tank,
The electric discharge machine according to claim 1, wherein the first communication path is provided below the lower limit of the liquid level of the fresh liquid tank.
前記貯留袋に貯留可能な前記加工液の最大容量は、前記加工槽に貯留可能な前記加工液の最大容量の90%以上150%以下である、請求項1に記載の放電加工機。 The electric discharge machine according to claim 1, wherein a maximum capacity of the machining fluid that can be stored in the storage bag is 90% or more and 150% or less of a maximum capacity of the machining fluid that can be stored in the machining tank. 前記被加工物と電極との間に形成される加工間隙に前記加工液を噴出する噴流ノズルと、
前記清液槽内の前記加工液を汲み上げ前記噴流ノズルへ送る噴流ポンプと、をさらに備える、請求項1に記載の放電加工機。
a jet nozzle that spouts the machining fluid into a machining gap formed between the workpiece and the electrode;
The electrical discharge machine according to claim 1, further comprising a jet pump that pumps up the machining fluid in the fresh fluid tank and sends it to the jet nozzle.
前記噴流ポンプにより前記清液槽内の前記加工液を直接前記加工槽へと送る第2の急送管路をさらに備え、
前記噴流ポンプは、送液先を前記噴流ノズルと前記第2の急送管路の一方に選択可能に構成される、請求項7に記載の放電加工機。
further comprising a second express pipe for directly sending the machining liquid in the fresh liquid tank to the machining tank by the jet pump,
8. The electrical discharge machine according to claim 7, wherein the jet pump is configured to be able to select one of the jet nozzle and the second express pipe as a liquid sending destination.
JP2022078521A 2022-05-12 2022-05-12 electrical discharge machine Active JP7311674B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022078521A JP7311674B1 (en) 2022-05-12 2022-05-12 electrical discharge machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022078521A JP7311674B1 (en) 2022-05-12 2022-05-12 electrical discharge machine

Publications (2)

Publication Number Publication Date
JP7311674B1 JP7311674B1 (en) 2023-07-19
JP2023167375A true JP2023167375A (en) 2023-11-24

Family

ID=87201283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022078521A Active JP7311674B1 (en) 2022-05-12 2022-05-12 electrical discharge machine

Country Status (1)

Country Link
JP (1) JP7311674B1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04122525A (en) * 1990-09-14 1992-04-23 Mitsubishi Electric Corp Electric discharge machining device
JP2002263961A (en) * 2001-03-06 2002-09-17 Hitachi Via Mechanics Ltd Processing liquid tank for wire electric discharge machine
JP2015077646A (en) * 2013-10-16 2015-04-23 株式会社ソディック Processing liquid tank of machine tool

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999008412A1 (en) 1997-08-11 1999-02-18 Sony Corporation Device and method for transmitting digital data, device and method for demodulating digital data, and transmission medium

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04122525A (en) * 1990-09-14 1992-04-23 Mitsubishi Electric Corp Electric discharge machining device
JP2002263961A (en) * 2001-03-06 2002-09-17 Hitachi Via Mechanics Ltd Processing liquid tank for wire electric discharge machine
JP2015077646A (en) * 2013-10-16 2015-04-23 株式会社ソディック Processing liquid tank of machine tool

Also Published As

Publication number Publication date
JP7311674B1 (en) 2023-07-19

Similar Documents

Publication Publication Date Title
JP5674847B2 (en) Machine tool with cutting fluid filtration device
WO2001036139A1 (en) Liquid feeder for electrodischarge machining
CN113365911A (en) Self-processing electrolytic biocide generation system with retrofit features for use on a watercraft
US5317872A (en) Device for improvement of running condition in hydraulic system
JP2023167375A (en) Electric discharge machine
JP5892705B2 (en) Machine tool machining fluid tank
JP6391867B1 (en) EDM machine
JPH09108947A (en) Working fluid processing equipment for electric discharge machine device
JP7179285B2 (en) Tooling fluid supply system
CN216737674U (en) Water purifying system and water purifying machine
US4966693A (en) Apparatus for processing coolant
JP5277998B2 (en) Coolant cooling device
KR101313628B1 (en) Seawater supply device for a ship
JP4754884B2 (en) Backwash system
JP4429456B2 (en) Electric discharge machining method and apparatus using normal machining fluid and powder mixed machining fluid
CA2001465A1 (en) Apparatus for processing coolant
JP2022007259A (en) Cutting liquid tank
US20040118777A1 (en) System for separating oil from water
JPH06115409A (en) Water feeding unit for car washing equipment
CN114291944B (en) Underground reservoir quality-divided and flow-divided drainage system and control method thereof
KR102462338B1 (en) System in which a plurality of centrifuges are selectively connected in series or parallel
JP3229154B2 (en) Processing liquid supply device and processing liquid supply method for electric processing device
JP3060935B2 (en) Degassing device
CN114314755A (en) Water purifying and drinking machine, water purifying and drinking system and control method thereof
JPS62264828A (en) Machining fluid processing tank for wire cut electric discharge machine

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20221114

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20230626

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20230706

R150 Certificate of patent or registration of utility model

Ref document number: 7311674

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150