JP2023068608A - Glass fiber and method for manufacturing the same, and glass cloth, prepreg for circuit board and printed wiring board - Google Patents
Glass fiber and method for manufacturing the same, and glass cloth, prepreg for circuit board and printed wiring board Download PDFInfo
- Publication number
- JP2023068608A JP2023068608A JP2022067607A JP2022067607A JP2023068608A JP 2023068608 A JP2023068608 A JP 2023068608A JP 2022067607 A JP2022067607 A JP 2022067607A JP 2022067607 A JP2022067607 A JP 2022067607A JP 2023068608 A JP2023068608 A JP 2023068608A
- Authority
- JP
- Japan
- Prior art keywords
- glass fiber
- silane
- glass
- mass
- loss tangent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003365 glass fiber Substances 0.000 title claims abstract description 125
- 239000011521 glass Substances 0.000 title claims abstract description 94
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 239000004744 fabric Substances 0.000 title description 57
- 238000000034 method Methods 0.000 title description 35
- 238000004513 sizing Methods 0.000 claims abstract description 53
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 47
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 15
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 6
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 6
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 6
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 6
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 6
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 6
- 229910000077 silane Inorganic materials 0.000 claims description 71
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 70
- 238000004140 cleaning Methods 0.000 claims description 47
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 25
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 23
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 19
- 229910008051 Si-OH Inorganic materials 0.000 claims description 15
- 229910006358 Si—OH Inorganic materials 0.000 claims description 15
- 230000008859 change Effects 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 description 14
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 229920002472 Starch Polymers 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 6
- 235000019698 starch Nutrition 0.000 description 6
- 239000008107 starch Substances 0.000 description 6
- 239000004372 Polyvinyl alcohol Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 229920002451 polyvinyl alcohol Polymers 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000009941 weaving Methods 0.000 description 5
- 238000002485 combustion reaction Methods 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 235000015278 beef Nutrition 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000003995 emulsifying agent Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000007429 general method Methods 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000003760 tallow Substances 0.000 description 2
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 1
- KZEVSDGEBAJOTK-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[5-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CC=1OC(=NN=1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O KZEVSDGEBAJOTK-UHFFFAOYSA-N 0.000 description 1
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 1
- JQMFQLVAJGZSQS-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-N-(2-oxo-3H-1,3-benzoxazol-6-yl)acetamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)NC1=CC2=C(NC(O2)=O)C=C1 JQMFQLVAJGZSQS-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- SLDXSSRFNABVCN-UHFFFAOYSA-N 3-diethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[SiH](OCC)CCCOC(=O)C(C)=C SLDXSSRFNABVCN-UHFFFAOYSA-N 0.000 description 1
- -1 3-mercaptopropylmethyl Chemical group 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- QCQCHGYLTSGIGX-GHXANHINSA-N 4-[[(3ar,5ar,5br,7ar,9s,11ar,11br,13as)-5a,5b,8,8,11a-pentamethyl-3a-[(5-methylpyridine-3-carbonyl)amino]-2-oxo-1-propan-2-yl-4,5,6,7,7a,9,10,11,11b,12,13,13a-dodecahydro-3h-cyclopenta[a]chrysen-9-yl]oxy]-2,2-dimethyl-4-oxobutanoic acid Chemical compound N([C@@]12CC[C@@]3(C)[C@]4(C)CC[C@H]5C(C)(C)[C@@H](OC(=O)CC(C)(C)C(O)=O)CC[C@]5(C)[C@H]4CC[C@@H]3C1=C(C(C2)=O)C(C)C)C(=O)C1=CN=CC(C)=C1 QCQCHGYLTSGIGX-GHXANHINSA-N 0.000 description 1
- MCJJZFLLJFASJU-UHFFFAOYSA-N 5-phenylpent-3-enoxysilane Chemical compound C1(=CC=CC=C1)CC=CCCO[SiH3] MCJJZFLLJFASJU-UHFFFAOYSA-N 0.000 description 1
- RSUYYYCSSKIQGP-UHFFFAOYSA-N C(=C)C(C1=CC=CC=C1)NCCC[Si](OCCCN)(OC)C Chemical compound C(=C)C(C1=CC=CC=C1)NCCC[Si](OCCCN)(OC)C RSUYYYCSSKIQGP-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 241001024304 Mino Species 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 239000004902 Softening Agent Substances 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- QJXGIWIVBPAFNL-UHFFFAOYSA-N [1,1-bis(ethoxysilyl)-3-[3,3,3-tris(ethoxysilyl)propyltetrasulfanyl]propyl]-ethoxysilane Chemical compound C(C)O[SiH2]C(CCSSSSCCC([SiH2]OCC)([SiH2]OCC)[SiH2]OCC)([SiH2]OCC)[SiH2]OCC QJXGIWIVBPAFNL-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- SLQTWNAJXFHMHM-UHFFFAOYSA-N dimethoxy-methyl-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](C)(OC)OC)CCC2OC21 SLQTWNAJXFHMHM-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 1
- YQCIWBXEVYWRCW-UHFFFAOYSA-N methane;sulfane Chemical compound C.S YQCIWBXEVYWRCW-UHFFFAOYSA-N 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- VQECZZRUEDMVCU-UHFFFAOYSA-N methoxy-[4-[methoxy(dimethyl)silyl]phenyl]-dimethylsilane Chemical compound CO[Si](C)(C)C1=CC=C([Si](C)(C)OC)C=C1 VQECZZRUEDMVCU-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- HMDRAGZZZBGZJC-UHFFFAOYSA-N n-[3-[3-aminopropoxy(dimethoxy)silyl]propyl]-1-phenylprop-2-en-1-amine Chemical compound NCCCO[Si](OC)(OC)CCCNC(C=C)C1=CC=CC=C1 HMDRAGZZZBGZJC-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- 229960003493 octyltriethoxysilane Drugs 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- GFKCWAROGHMSTC-UHFFFAOYSA-N trimethoxy(6-trimethoxysilylhexyl)silane Chemical compound CO[Si](OC)(OC)CCCCCC[Si](OC)(OC)OC GFKCWAROGHMSTC-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
- Treatment Of Fiber Materials (AREA)
- Reinforced Plastic Materials (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
Abstract
Description
本発明は、誘電正接に優れるガラス繊維及びその製造方法、このガラス繊維を用いたガラスクロス、基板用プリプレグ及びプリント配線基板に関するものである。 TECHNICAL FIELD The present invention relates to a glass fiber excellent in dielectric loss tangent, a method for producing the same, a glass cloth using the glass fiber, a substrate prepreg, and a printed wiring board.
現在、スマートフォン等の情報端末の高性能化、高速通信化に伴い、使用されるプリント配線板において、高密度化、極薄化とともに、低誘電化、低誘電正接化が著しく進行している。このプリント配線板の絶縁材料としては、ガラスクロスをエポキシ樹脂等の熱硬化性樹脂(以下、「マトリックス樹脂」という。)に含浸させて得られるプリプレグを積層して加熱加圧硬化させた積層板が広く使用されている。基板における信号の伝送ロスは、Ed wardA.Wolff式:伝送損失∝√ε×tanδ、が示すように、誘電率(ε)及び誘電正接(tanδ)が小さい材料ほど改善されることが知られており、特に上記の式より、伝送損失に対しては誘電正接の寄与が大きいことが知られている。そのため、ガラスクロスにおいては低い誘電正接が求められ、Dガラス、NEガラス、Lガラス、Qガラス等の誘電特性が向上されたガラスクロスが提案されている(特許文献1~4)。しかしながら、今後の5G通信用用途等において十分な伝送速度性能を達成する観点から、これら低誘電率・低誘電正接に優れる低誘電特性ガラスクロスでもなお改善の必要性がある。 BACKGROUND ART At present, as information terminals such as smart phones have improved performance and high-speed communication, printed wiring boards used in them have been remarkably reduced in density and ultra-thin, as well as reduced in dielectric and dielectric loss tangent. As an insulating material for this printed wiring board, a laminated board obtained by laminating prepregs obtained by impregnating glass cloth with thermosetting resin such as epoxy resin (hereinafter referred to as "matrix resin") and curing under heat and pressure. is widely used. The signal transmission loss in the substrate is described by Edward A. et al. Wolff formula: transmission loss ∝√ε×tan δ, it is known that the smaller the dielectric constant (ε) and dielectric loss tangent (tan δ) of the material, the better the improvement. It is known that the contribution of the dielectric loss tangent is large. Therefore, the glass cloth is required to have a low dielectric loss tangent, and glass cloths with improved dielectric properties such as D glass, NE glass, L glass, and Q glass have been proposed (Patent Documents 1 to 4). However, from the viewpoint of achieving sufficient transmission speed performance in future 5G communication applications, etc., there is still a need to improve these low dielectric property glass cloths that are excellent in low dielectric constant and low dielectric loss tangent.
通常、ガラスクロスは巻取時や製織時等の機械的な磨耗による毛羽や糸切れの発生を防止するため、ガラス繊維束の紡糸時や整経時にサイズ剤で被覆処理が施される。ところが、ガラスクロス製造の最終工程では積層板に使用されるマトリックス樹脂との接着性を高める目的でシラン処理が施されるため、サイズ剤がガラスクロス上に残っていると、シランカップリング剤とガラスクロスとの接着性が悪化する。そのため、通常、シラン処理前に加熱分解処理、いわゆるヒートクリーニング処理によってサイズ剤を完全に除去することが行われている。 Generally, glass cloth is coated with a sizing agent during spinning and warping of glass fiber bundles in order to prevent fluff and yarn breakage due to mechanical wear during winding and weaving. However, in the final process of manufacturing glass cloth, silane treatment is applied to increase the adhesion to the matrix resin used in the laminate. Adhesion to the glass cloth deteriorates. Therefore, the sizing agent is usually completely removed by a heat decomposition treatment, a so-called heat cleaning treatment, before the silane treatment.
ヒートクリーニング後にサイズ剤がガラスクロスに残存する場合、ガラスクロスへのシランカップリング剤処理が不十分になり、樹脂との接着不良や、残存したサイズ剤によって誘電特性が悪化するため、ヒートクリーニング処理は重要であるものの、ヒートクリーニング工程のガラスクロスの誘電正接への影響についての検討はなされていない。 If the sizing agent remains on the glass cloth after heat cleaning, the treatment with the silane coupling agent on the glass cloth will be insufficient, resulting in poor adhesion with the resin and deterioration of dielectric properties due to the remaining sizing agent. is important, but no study has been made on the influence of the heat cleaning process on the dielectric loss tangent of the glass cloth.
本発明は、上記問題点に鑑みてなされたものであり、ガラス本来の低誘電正接を有するヒートクリーニングされたガラス繊維を提供することを目的とする。 SUMMARY OF THE INVENTION It is an object of the present invention to provide a heat-cleaned glass fiber having a low dielectric loss tangent inherent to glass.
既存のヒートクリーニング工程ではガス炉が用いられており、都市ガス等の燃焼を熱源としていることから、生成物として大量の二酸化炭素と水が生じる。ガラスクロスは50%以上がSiO2でありガラスは表面のSi-OH基は活性が強い。特に高温雰囲気では水分を水素結合で取り込み、Si-O-Si結合を開裂させることでSi-OH基が生じると考えられる(SiO2+H2O→Si-OH)。 A gas furnace is used in the existing heat cleaning process, and since the combustion of city gas or the like is used as a heat source, a large amount of carbon dioxide and water are produced as products. More than 50% of the glass cloth is SiO 2 , and the Si—OH groups on the surface of the glass are highly active. Especially in a high-temperature atmosphere, it is considered that Si--OH groups are generated by taking in moisture through hydrogen bonds and breaking Si--O--Si bonds (SiO 2 +H 2 O→Si--OH).
本発明者らは、Si-OH基を減少させることでガラス繊維の誘電正接が減少しており、Si-OH基と誘電正接は相関があるとの知見を見出した。ガラス組成中のSiO2の割合が55質量%以上だと、ヒートクリーニング工程での水分によるSi-O-Si結合の開裂によって誘電正接が上昇していると考えられる。特にSiO2の割合が95質量%以上のガラス繊維ではこの傾向が顕著になることを見出した。本発明者らはこのような事情を見出し、鋭意検討を重ねた結果、ヒートクリーニング工程において水分を発生させない発熱機構を持った加熱炉を用いることで、誘電正接の悪化を抑制しつつ、サイズ剤を除去することで、低誘電正接を有するガラス本来の誘電正接を有したガラス繊維を提供できることを見出した。これをシラン処理したシラン処理ガラス繊維も、低誘電正接を有するシラン処理ガラス繊維であった。 The present inventors have found that the dielectric loss tangent of the glass fiber is reduced by reducing the Si--OH groups, and that there is a correlation between the Si--OH groups and the dielectric loss tangent. When the proportion of SiO 2 in the glass composition is 55% by mass or more, it is believed that the dielectric loss tangent increases due to the cleavage of Si--O--Si bonds due to moisture in the heat cleaning process. In particular, it was found that this tendency is remarkable in glass fibers having a SiO 2 content of 95% by mass or more. The inventors of the present invention have found such a situation and have made extensive studies. It has been found that glass fibers having a low dielectric loss tangent inherent to glass can be provided by removing the . The silane-treated glass fiber obtained by silanizing this was also a silane-treated glass fiber having a low dielectric loss tangent.
従って、本発明は下記発明を提供する。
1.サイズ剤をヒートクリーニングした、SiO2組成量が55質量%以上であるガラス繊維であって、10GHzでの誘電正接が0.0016以下、サイズ剤由来の残存炭素含有量が0.1質量%以下であるガラス繊維。
2.前記ガラス繊維の40GHzにおける誘電正接が、0.0020以下である1記載のガラス繊維。
3.前記ガラス繊維がSiO2組成量95質量%以上のQガラスである1記載のガラス繊維。
4.前記ガラス繊維のSi-OH含有量が10,000ppm以下である1記載のガラス繊維。
5.1記載のガラス繊維をシラン処理した、シラン処理ガラス繊維。
6.揮発分が0.5質量%以下である5記載のシラン処理ガラス繊維。
7.ガラス繊維に対するシランカップリング剤の付着量が0.02~0.5質量%である、6記載のシラン処理ガラス繊維。
8.シラン処理前に対するシラン処理後の10GHzでの誘電正接が2倍以下である、5記載のシラン処理ガラス繊維。
9.シラン処理前に対するシラン処理後の40GHzでの誘電正接が2倍以下である、5記載のシラン処理ガラス繊維。
10.1~9のいずれかに記載のガラス繊維を含有するプリント基板用プリプレグ。
11.1~9のいずれかに記載のガラス繊維を用いたプリント配線基板。
12.サイズ剤処理された、SiO2組成量が55質量%以上のガラス繊維を、単位発熱量(1,000kcal)当たりに生じる水の量が0.12L以下であり、300~600℃に加熱された気体により、ヒートクリーニングする工程を含む、1~9のいずれかに記載のガラス繊維を製造する製造方法。
13.ヒートクリーニングする工程前後において、10GHzの誘電正接の変化比が0.7~1.3である12記載の製造方法。
14.ヒートクリーニングする工程前後において、40GHzの誘電正接の変化比が0.7~1.3である12記載の製造方法。
Accordingly, the present invention provides the following inventions.
1. A glass fiber having a SiO 2 composition amount of 55% by mass or more, which is heat-cleaned from a sizing agent, having a dielectric loss tangent at 10 GHz of 0.0016 or less and a residual carbon content derived from the sizing agent of 0.1% by mass or less. glass fiber.
2. 2. The glass fiber according to 1, wherein the dielectric loss tangent of the glass fiber at 40 GHz is 0.0020 or less.
3. 2. The glass fiber according to 1, wherein the glass fiber is Q glass having a SiO 2 composition of 95% by mass or more.
4. 2. The glass fiber according to 1, wherein the Si—OH content of the glass fiber is 10,000 ppm or less.
5. A silane-treated glass fiber obtained by silanizing the glass fiber according to 1.
6. 6. The silane-treated glass fiber according to 5, which has a volatile content of 0.5% by mass or less.
7. 7. The silane-treated glass fiber according to 6, wherein the amount of the silane coupling agent attached to the glass fiber is 0.02 to 0.5% by mass.
8. 6. The silane-treated glass fiber according to 5, wherein the dielectric loss tangent at 10 GHz after silane treatment is twice or less that before silane treatment.
9. 6. The silane-treated glass fiber according to 5, wherein the dielectric loss tangent at 40 GHz after silane treatment is twice or less that before silane treatment.
10. A printed circuit board prepreg containing the glass fiber according to any one of 1 to 9.
11. A printed wiring board using the glass fiber according to any one of 1 to 9.
12. A sizing-treated glass fiber having a SiO 2 composition of 55% by mass or more is heated to 300 to 600° C. with an amount of water generated per unit calorific value (1,000 kcal) of 0.12 L or less. 10. A production method for producing the glass fiber according to any one of 1 to 9, comprising a step of heat cleaning with gas.
13. 13. The manufacturing method according to 12, wherein the dielectric loss tangent change ratio at 10 GHz is 0.7 to 1.3 before and after the heat cleaning step.
14. 13. The manufacturing method according to 12, wherein the dielectric loss tangent change ratio at 40 GHz is 0.7 to 1.3 before and after the heat cleaning step.
本発明によれば、低誘電正接を有するサイズ剤をヒートクリーニングしたガラス繊維を得ることができ、今後増えていく5G等の高速通信等に用いられる基板の伝送損失を抑えることができるという著大な効果を有する。 According to the present invention, it is possible to obtain a glass fiber obtained by heat-cleaning a sizing agent having a low dielectric loss tangent, and it is possible to suppress the transmission loss of substrates used in high-speed communication such as 5G, which is expected to increase in the future. effect.
以下、本発明について詳細に説明する。
本発明のガラス繊維は、サイズ剤をヒートクリーニングした、SiO2組成量が55質量%以上であるガラス繊維であって、10GHzでの誘電正接が0.0016以下、サイズ剤由来の残存炭素含有量が0.1質量%以下であるガラス繊維である。なお、ガラス繊維とは、フィラメント、ストランド、チョップドストランド、ヤーン、平織りクロス、朱子織クロス、扁平クロス、不織布等のガラスクロスも含むものをいう。
The present invention will be described in detail below.
The glass fiber of the present invention is a glass fiber having a SiO 2 composition amount of 55% by mass or more after heat cleaning of a sizing agent, a dielectric loss tangent at 10 GHz of 0.0016 or less, and a residual carbon content derived from the sizing agent. is 0.1% by mass or less. The glass fiber includes filaments, strands, chopped strands, yarns, plain weave cloths, satin cloths, flat cloths, and glass cloths such as non-woven fabrics.
本発明の本発明のガラス繊維は、ガラスをサイズ剤で被覆処理した後、ヒートクリーニングによりサイズ剤を除去したものである。サイズ剤で被覆処理前のガラス及びヒートクリーニング処理されたガラス繊維は、SiO2が55質量%以上のものであり、95質量%以上のQガラスが好ましく、99.9質量%以上のQガラスがより好ましい。 The glass fiber of the present invention is obtained by coating glass with a sizing agent and then removing the sizing agent by heat cleaning. The glass before coating treatment with a sizing agent and the glass fiber subjected to heat cleaning treatment have a SiO2 content of 55% by mass or more, preferably 95% by mass or more of Q glass, and 99.9% by mass or more of Q glass. more preferred.
本発明のヒートクリーニング処理されたガラス繊維中の10GHzでの誘電正接、後述するシラン処理する場合、シラン処理する前の10GHzでの誘電正接は、0.0016以下であり、0.0010以下が好ましく、0.0008以下がより好ましい。また、40GHzでの誘電正接は0.0020以下が好ましく、0.0018以下がより好ましく、0.0015以下がさらに好ましい。誘電正接の測定方法は後述する実施例の記載に基づくものである。 The dielectric loss tangent at 10 GHz in the heat-cleaned glass fiber of the present invention, and the dielectric loss tangent at 10 GHz before silane treatment in the case of silane treatment, which will be described later, is 0.0016 or less, preferably 0.0010 or less. , 0.0008 or less. Also, the dielectric loss tangent at 40 GHz is preferably 0.0020 or less, more preferably 0.0018 or less, and even more preferably 0.0015 or less. A method for measuring the dielectric loss tangent is based on the description of Examples described later.
本発明のヒートクリーニング処理されたガラス繊維中の、サイズ剤由来の残存炭素含有量の炭素含有量、後述するシラン処理する場合、シラン処理する前の炭素含有量は、0.1質量%以下であり、0.06質量%以下が好ましく、0.03質量%以下がより好ましく、0質量%でもよい。なお、サイズ剤由来残存炭素量の測定方法は、炭素分析装置を用いた後述する実施例の記載に基づくものである。サイズ剤由来の残存炭素含有量を0.1%にする方法としては水洗によるサイズ剤の除去やヒートクリーニングによる除去が挙げられるが、毛羽の発生を抑え均一にサイズ剤を除去する観点から、ヒートクリーニングによる方法が好ましい。 In the heat-cleaned glass fiber of the present invention, the carbon content of the residual carbon content derived from the sizing agent, and in the case of silane treatment, which will be described later, the carbon content before silane treatment is 0.1% by mass or less. It is preferably 0.06% by mass or less, more preferably 0.03% by mass or less, and may be 0% by mass. The method for measuring the amount of residual carbon derived from the sizing agent is based on the description of Examples described later using a carbon analyzer. Methods for reducing the residual carbon content derived from the sizing agent to 0.1% include removal of the sizing agent by washing with water and removal by heat cleaning. A cleaning method is preferred.
本発明のヒートクリーニング処理されたガラス繊維中のSi-OH含有量は、10,000ppm(質量)以下が好ましく、8,500ppm以下がより好ましく、7,500ppm以下がさらに好ましく、0ppmでもよい。なお、ガラス繊維中のSi-OH含有量の測定方法は、後述する実施例の記載に基づくものである。 The Si—OH content in the heat-cleaned glass fiber of the present invention is preferably 10,000 ppm (mass) or less, more preferably 8,500 ppm or less, even more preferably 7,500 ppm or less, and may be 0 ppm. Incidentally, the method for measuring the Si—OH content in the glass fiber is based on the description of the examples described later.
[ガラス繊維の製造方法]
ガラスフィラメントの製造方法としては特に限定はされないが、規定のガラス組成インゴットを加熱延伸する方法や熔融して熔融ガラスとした後、ブッシングによって糸状に成形する方法が挙げられる。特にSiO2の割合が95質量%以上になると溶融する温度が高くなり、ブッシングによる延伸が難しくなるので酸水素バーナーによる加熱延伸が好まれる。
[Method for producing glass fiber]
The method for producing the glass filaments is not particularly limited, but examples include a method of heating and drawing an ingot of a prescribed glass composition, and a method of forming a filament with a bushing after melting to form molten glass. In particular, when the proportion of SiO 2 is 95% by mass or more, the melting temperature rises, making stretching with a bushing difficult, so heating and stretching with an oxyhydrogen burner is preferred.
延伸されたガラスフィラメントの表面に集束剤を塗布し、束ねることによりガラスストランドを形成できる。集束剤は澱粉を主原料とし、機能性付与のため、柔軟剤や潤滑剤を配合することができ、集束剤組成物は一般にサイズ剤と呼称される。サイズ剤処理は公知の方法を用いることができ、サイズ剤の種類、サイズ剤処理の方法は特に限定されず、毛羽、糸切れが生じにくい方法を適宜選定する。サイズ剤処理により、毛羽、糸切れが軽減される。処理方法としては、浸漬法、ローラー式又はベルト式のアプリケーター、噴霧法等が挙げられる。得られたガラスストランドに撚りをかけることでガラスヤーンが得られる。撚りの頻度としては、25mmあたり0.1~5.0回が好ましい。 A glass strand can be formed by applying a sizing agent to the surface of drawn glass filaments and bundling them. The sizing agent is mainly made of starch, and can be blended with a softening agent or a lubricant to impart functionality. The sizing agent composition is generally called a sizing agent. A known method can be used for the sizing agent treatment, and the type of sizing agent and the method of sizing agent treatment are not particularly limited, and a method that does not easily cause fuzz and yarn breakage is appropriately selected. The sizing treatment reduces fluff and thread breakage. Treatment methods include immersion, roller-type or belt-type applicators, spraying, and the like. A glass yarn is obtained by twisting the obtained glass strand. The twisting frequency is preferably 0.1 to 5.0 times per 25 mm.
ガラスクロスはガラスヤーンを製織することで得られる。ガラスクロスは、特に限定されないが、目付量が10~100g/m3のものが好適に用いられる。製織方法は、特に限定はされないが、例えば、エアージェット織機、ウォータージェット織機、レピア織機、シャトル織機等による製織方法が挙げられる。エアージェット織機等で製織を行う場合は、さらに潤滑性を得るために、PVA(ポリビニルアルコール)や澱粉を二次サイズ剤として付着させることができる。 Glass cloth is obtained by weaving glass yarns. Although the glass cloth is not particularly limited, those having a basis weight of 10 to 100 g/m 3 are preferably used. The weaving method is not particularly limited, but examples thereof include weaving methods using an air jet loom, a water jet loom, a rapier loom, a shuttle loom, and the like. When weaving with an air jet loom or the like, PVA (polyvinyl alcohol) or starch can be applied as a secondary sizing agent in order to further obtain lubricity.
[ガラス繊維のヒートクリーニング方法]
上記のようなヒートクリーニング処理されたガラス繊維を得る製造方法としては、サイズ剤処理されたガラス繊維を、単位発熱量(1,000kcal)当たりに生じる水の量が0.12L以下であり、300~600℃に加熱された気体により、ヒートクリーニングする工程を含むものが挙げられる。
[Glass fiber heat cleaning method]
As a manufacturing method for obtaining heat-cleaned glass fibers as described above, the amount of water generated per unit calorific value (1,000 kcal) is 0.12 L or less, and 300 Examples include a process of heat cleaning with a gas heated to ~600°C.
単位発熱量(1,000kcal)当たりに生じる水の量が0.12L以下であり、300~600℃に加熱された気体により、ヒートクリーニングする具体的方法は特に限定されない。単位発熱量(1,000kcal)当たりに生じる水の量は0.12L以下であり、0.10L未満が好ましい。温度は300~600℃が好ましく、400~600℃がより好ましい。このような範囲であれば長時間加熱する必要がなく、十分にサイズ剤を除去できる。温度が600℃を超えると強度に影響を及ぼすおそれがある。つまり、温度の調整により、ガラス本来の低誘電正接を有すると共に、強度に優れたガラス繊維が得られる。ヒートクリーニング時間に関して時間は加熱温度によって異なり、5~100時間が好ましく、12~72時間がより好ましく、30~72時間がさらに好ましい。また加熱炉の酸素が不足し、サイズ剤が炭化して黒変する場合は必要に応じてダンパの開閉等によって酸素を取り込んでもよい。 The amount of water generated per unit calorific value (1,000 kcal) is 0.12 L or less, and the specific method of heat cleaning with gas heated to 300 to 600° C. is not particularly limited. The amount of water generated per unit calorific value (1,000 kcal) is 0.12 L or less, preferably less than 0.10 L. The temperature is preferably 300-600°C, more preferably 400-600°C. Within such a range, the sizing agent can be sufficiently removed without requiring long-term heating. If the temperature exceeds 600°C, the strength may be affected. That is, by adjusting the temperature, it is possible to obtain a glass fiber having a low dielectric loss tangent inherent to glass and having excellent strength. The heat cleaning time varies depending on the heating temperature, preferably 5 to 100 hours, more preferably 12 to 72 hours, and even more preferably 30 to 72 hours. In addition, when the oxygen in the heating furnace is insufficient and the sizing agent is carbonized and blackened, oxygen may be taken in by opening and closing a damper or the like as necessary.
単位発熱量(1,000kcal)当たりに生じる水の量が0.12L以下となるような発熱機構を有する装置としては、このような発熱機構を有していれば、特に限定されず、電気炉、マッフル炉、レーザー加熱等で、上記が可能な発熱機構を有する加熱炉を含む装置が挙げられる。特に、電気炉は燃焼を伴わないため、気体中の水の量を0.12L以下、0.1L未満、0.10L未満、0Lとすることができる。例えば、都市ガスを燃焼源としたガス炉を用いた場合、単位発熱量(1,000kcal)当たりに生じる水の量が0.16Lとなる。 A device having a heating mechanism that generates 0.12 L or less of water per unit heating value (1,000 kcal) is not particularly limited as long as it has such a heating mechanism. , a muffle furnace, laser heating, and the like, which include a heating furnace having a heat generation mechanism capable of the above. In particular, since the electric furnace does not involve combustion, the amount of water in the gas can be 0.12 L or less, less than 0.1 L, less than 0.10 L, or 0 L. For example, when a gas furnace using city gas as a combustion source is used, the amount of water generated per unit calorific value (1,000 kcal) is 0.16 L.
ヒートクリーニングする工程前後において、10GHz及び40GHzでの誘電正接の変化比は、0.7~1.3が好ましく、0.9~1.1がより好ましい。なお、10GHz及び40GHzでの誘電正接の変化比は後述する実施例の記載に基づくものである。 Before and after the heat cleaning step, the dielectric loss tangent change ratio at 10 GHz and 40 GHz is preferably 0.7 to 1.3, more preferably 0.9 to 1.1. Note that the change ratio of the dielectric loss tangent at 10 GHz and 40 GHz is based on the description of Examples described later.
ヒートクリーニングする工程後、シラン処理する前のガラス繊維の引張強度は、JISR 3420の引張強さの測定方法において、0.05GPa以上が好ましく、0.1GPa以上がより好ましい。上限は特に限定されないが、0.5GPa以下とすることもできる。 After the heat cleaning step, the tensile strength of the glass fiber before silane treatment is preferably 0.05 GPa or more, more preferably 0.1 GPa or more, according to the method for measuring tensile strength according to JISR 3420. Although the upper limit is not particularly limited, it may be 0.5 GPa or less.
[シラン処理ガラス繊維]
本発明のヒートクリーニング処理されたガラス繊維は、シラン処理をしたシラン処理ガラス繊維とすることができる。シラン処理液に関しては特に限定はされないが、生産性や環境負荷の観点から、シランカップリング剤を0.05~1質量%に分散させた水溶液が好適である。シランカップリング剤の種類に応じて、pHを調整して分散させることができる。pHの調整方法としては特に限定されないが使用するシランカップリング剤に合わせて酢酸やアンモニアによる調整が好ましい。
[Silane-treated glass fiber]
The heat-cleaned glass fibers of the present invention can be silane-treated glass fibers that have been silanized. Although the silane treatment liquid is not particularly limited, an aqueous solution in which 0.05 to 1% by mass of a silane coupling agent is dispersed is suitable from the viewpoint of productivity and environmental load. Depending on the type of silane coupling agent, it can be dispersed by adjusting the pH. Although the pH adjustment method is not particularly limited, adjustment with acetic acid or ammonia is preferable according to the silane coupling agent to be used.
シランカップリング剤としては、トリメチルメトキシシラン、トリメチルエトキシシラン、ジメチルジメトキシシラン、ジメチルジエトキシシラン、メチルフェニルジメトキシシラン、メチルフェニルジエトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシラン、トリメトキシシラン、トリエトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、フェニルメチルビニルエトキシシラン、ナフチルトリメトキシシラン、ナフチルトリエトキシシラン、1,4-ビス(メトキシジメチルシリル)ベンゼン、テトラメトキシシラン、テトラエトキシシラン、n-プロピルトリエトキシシラン、ヘキシルトリメトキシシラン、オクチルトリエトキシシラン、デシルトリメトキシシラン、1,6-ビス(トリメトキシシリル)ヘキサン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、p-スチリルトリメトキシシラン、3-アミノプロピルトリメトキシシラン、3-グリシドキシプロピルトリメトキシシラン、3-グリシドキシプロピルメチルジメトキシシラン、3-グリシドキシプロピルトリエトキシシラン、3-グリシドキシプロピルメチルジエトキシシラン、2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、2-(3,4-エポキシシクロヘキシル)エチルメチルジメトキシシラン、3-メタクリロキシプロピルトリメトキシシラン、3-メタクリロキシプロピルジメトキシシラン、3-メタクリロキシプロピルトリエトキシシラン、3-メタクリロキシプロピルジエトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルメチルジメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリエトキシシラン、N-(2-アミノエチル)-3-アミノプロピルメチルジエトキシシラン、N-フェニル-3-アミノプロピルトリメトキシシラン、N-(ビニルベンジル)-2-アミノエチル-3-アミノプロピルトリメトキシシラン及びその塩酸塩、N-(ビニルベンジル)-2-アミノエチル-3-アミノプロピルメチルジメトキシシラン及びその塩酸塩、3-イソシアネートプロピルトリエトキシシラン、トリス-(トリメトキシシリルプロピル)イソシアヌレート、3-ウレイドプロピルトリエトキシシラン、3-クロロプロピルトリメトキシシラン、3-メルカプトプロピルトリメトキシシラン、3-メルカプトプロピルメチルジメトキシシラン、ビス(トリスエトキシシリルプロピル)テトラスルフィド等のアルコキシシラン化合物が挙げられ、1種あるいは2種以上混合して使用してもよい。その中でも、3-アミノプロピルトリメトキシシラン、N-(2-(アミノエチル)-3-アミノプロピルトリメトキシシラン、N-フェニル-3-アミノプロピルトリメトキシシラン等が好ましい。シランカップリング剤はこれらに限定されるものではなく、1種単独で又は2種以上組み合わせて用いることができる。 Silane coupling agents include trimethylmethoxysilane, trimethylethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, methylphenyldimethoxysilane, methylphenyldiethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, trimethoxysilane, triethoxysilane. silane, methyltrimethoxysilane, methyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenylmethylvinylethoxysilane, naphthyltrimethoxysilane, naphthyltriethoxysilane, 1,4-bis(methoxydimethylsilyl)benzene, Tetramethoxysilane, tetraethoxysilane, n-propyltriethoxysilane, hexyltrimethoxysilane, octyltriethoxysilane, decyltrimethoxysilane, 1,6-bis(trimethoxysilyl)hexane, vinyltrimethoxysilane, vinyltriethoxy silane, p-styryltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropyltriethoxysilane, Cydoxypropylmethyldiethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 2-(3,4-epoxycyclohexyl)ethylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxysilane roxypropyldimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-methacryloxypropyldiethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, N-(2-aminoethyl)-3 -aminopropylmethyldimethoxysilane, N-(2-aminoethyl)-3-aminopropyltriethoxysilane, N-(2-aminoethyl)-3-aminopropylmethyldiethoxysilane, N-phenyl-3-aminopropyl Trimethoxysilane, N-(vinylbenzyl)-2-aminoethyl-3-aminopropyltrimethoxysilane and its hydrochloride, N-(vinylbenzyl)-2-aminoethyl-3-aminopropylmethyldimethoxysilane and its hydrochloride salt, 3-isocyanatopropyltriethoxysilane, tris-(trimethoxysilylpropyl)isocyanurate, 3-ureidopropyltriethoxysilane, 3-chloropropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropylmethyl Examples include alkoxysilane compounds such as dimethoxysilane and bis(trisethoxysilylpropyl)tetrasulfide, which may be used singly or in combination of two or more. Among them, 3-aminopropyltrimethoxysilane, N-(2-(aminoethyl)-3-aminopropyltrimethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane and the like are preferable. Silane coupling agents are these. It is not limited to , and can be used singly or in combination of two or more.
シラン処理液の塗布方法に関して特に限定はされないが、シラン処理液中にガラス繊維を浸透させる方法、ロールコートによる処理等が挙げられる。シラン処理液の乾燥方法としては、特に制限されないが、熱風乾燥、赤外線、ホットロールによる乾燥方法が挙げられる。乾燥温度に関しては、例えば80~180℃から適宜選定され、より水分を蒸発させ、シランカップリング剤とガラス繊維表面のSi-OH基を反応させる点から、90~150℃が好ましい。このような範囲であれば、ガラス繊維の表面にシランカップリング剤が分散し、シランカップリング剤とガラス繊維表面のSi-OH基が好ましく反応する。80℃未満だと、シラン処理液の水が蒸発しないだけでなく、シランカップリング剤とガラス繊維表面のSi-OH基が反応せず誘電正接の悪化に加え、プリント配線板とした際にアウトガスとして水やアルコールが生じて膨れとなって信頼性に悪影響を与えるおそれがある。ここでいうアルコールとは、シランカップリング剤由来のものであり主にメタノールやエタノールである。180℃を超えると、急速にシランカップリング剤とガラス繊維表面のSi-OH基とが反応することによってガラス繊維に均一にシラン処理が行えないだけではなく、シランカップリング剤の炭化水素が急速に酸化されて誘電正接に悪影響を及ぼすおそれがある。 The method of applying the silane treatment liquid is not particularly limited, but examples include a method of impregnating glass fibers in the silane treatment liquid, a treatment by roll coating, and the like. The method for drying the silane treatment liquid is not particularly limited, but includes drying methods using hot air, infrared rays, and hot rolls. The drying temperature is appropriately selected from, for example, 80 to 180° C., and preferably 90 to 150° C. in order to evaporate more moisture and react the silane coupling agent with the Si—OH groups on the surface of the glass fiber. Within this range, the silane coupling agent is dispersed on the surface of the glass fiber, and the silane coupling agent reacts favorably with the Si—OH groups on the surface of the glass fiber. If it is less than 80°C, not only does the water in the silane treatment liquid not evaporate, but the silane coupling agent and the Si—OH groups on the surface of the glass fiber do not react, resulting in deterioration of the dielectric loss tangent and outgassing when printed wiring boards are produced. As a result, water or alcohol may be generated, resulting in swelling and adversely affecting reliability. The alcohol referred to here is derived from a silane coupling agent and is mainly methanol or ethanol. If the temperature exceeds 180°C, the silane coupling agent reacts rapidly with the Si—OH groups on the surface of the glass fiber, which not only makes it impossible to uniformly silane-treat the glass fiber, but also causes the hydrocarbon of the silane coupling agent to rapidly decompose. may be oxidized to adversely affect the dielectric loss tangent.
乾燥時間に関してはシラン処理液の濃度によって適宜変更できるが30秒~30分が好ましく、1~10分がより好ましいい。このような範囲であればシラン処理液の水分を除去し、シランカップリング剤とガラス繊維表面のSi-OH基が好ましく反応する。 The drying time can be appropriately changed depending on the concentration of the silane treatment liquid, but is preferably 30 seconds to 30 minutes, more preferably 1 to 10 minutes. Within this range, the water content of the silane treatment solution is removed, and the silane coupling agent reacts favorably with the Si—OH groups on the surface of the glass fiber.
シラン処理ガラス繊維の水やアルコールの揮発分は0.5質量以下が好ましく、0.3質量%以下がより好ましく、0.2質量%以下がさらに好ましく、0.1質量%が特に好ましい。このような揮発分にするためには、シラン処理後の乾燥工程を調整すればよい。なお、揮発分の測定方法は、実施例に記載の方法である。特に、SiO2の割合が95質量%以上のガラス本来の誘電正接はガラスに含まれるSi-OH量にもよるが、10GHzで1.0×10-4オーダーであり、合成石英等よりSi-OH量の少ないものは1.0×10-5オーダーのものも存在する。また、SiO2の割合が高いガラス繊維に関しては、誘電正接がSi-OH基の量によって顕著に影響を受け、後工程のシラン処理での適切量のシランカップリング剤での処理を行わなければ、過剰量のカップリング剤によるSi-OH基、SiOMe基やSiOEt基自体が誘電正接に悪影響を与えるだけでなく、それらの官能基が生じる水やアルコールが、ガラス繊維の誘電正接及び信頼性に大きな影響を与えることを見出した。すなわち、シラン処理後のガラス繊維を乾燥させた際に生じる水やアルコールの揮発分の発生量を、ガラス繊維に対して0.5質量%以下にすることで、ガラス本来の誘電正接をより有したまま、シラン処理ガラス繊維を提供できることを見出した。 The volatile content of water and alcohol in the silane-treated glass fiber is preferably 0.5% by mass or less, more preferably 0.3% by mass or less, even more preferably 0.2% by mass or less, and particularly preferably 0.1% by mass. In order to obtain such a volatile content, the drying process after the silane treatment may be adjusted. The method for measuring the volatile content is the method described in Examples. In particular, the original dielectric loss tangent of glass with a SiO 2 ratio of 95% by mass or more depends on the amount of Si—OH contained in the glass, but is on the order of 1.0×10 −4 at 10 GHz. There are also those with a small amount of OH on the order of 1.0×10 −5 . In addition, regarding glass fibers with a high SiO 2 ratio, the dielectric loss tangent is significantly affected by the amount of Si—OH groups, and treatment with an appropriate amount of silane coupling agent in the subsequent silane treatment must be performed. , Si—OH groups, SiOMe groups, and SiOEt groups themselves due to excessive amounts of coupling agents not only adversely affect the dielectric loss tangent, but also water and alcohol produced by these functional groups affect the dielectric loss tangent and reliability of the glass fiber. found to have a great impact. In other words, by reducing the amount of water and alcohol volatiles generated when drying the glass fiber after silane treatment to 0.5% by mass or less relative to the glass fiber, the dielectric loss tangent inherent to the glass is made more effective. It has been found that silane-treated glass fibers can be provided while maintaining the
シラン処理後のシランカップリング剤の付着量は、ガラス繊維に対して0.01~0.5質量%が好ましく、0.02~0.4質量%がより好ましい。このような範囲であれば、プリント配線板とした際に樹脂との密着性がより良好で、信頼性もより向上する。0.5質量%以上付着させるとガラス繊維表面のSi-OHに対してシランカップリング剤が過剰になり、誘電正接が悪化するだけではなくガラスクロスから柔軟性が失われてしまう。また過剰量のシランカップリング剤には未反応のものも含まれ、アルコールをアウトガスとして発生させるため好ましくない。シランカップリング剤の付着量に関してはJISR3420に記載の強熱減量によって測定ができる。 The amount of the silane coupling agent attached after the silane treatment is preferably 0.01 to 0.5% by mass, more preferably 0.02 to 0.4% by mass, relative to the glass fiber. Within such a range, when printed wiring boards are formed, the adhesiveness to the resin is better, and the reliability is further improved. If the silane coupling agent is deposited in an amount of 0.5% by mass or more, the amount of the silane coupling agent becomes excessive relative to the Si—OH on the surface of the glass fiber, and not only the dielectric loss tangent deteriorates but also the flexibility of the glass cloth is lost. Moreover, an excessive amount of silane coupling agent includes unreacted ones, which is not preferable because alcohol is generated as outgas. The adhesion amount of the silane coupling agent can be measured by ignition loss described in JISR3420.
上記のようにして得られたシラン処理ガラス繊維の誘電正接(10GHz,40GHz)はシラン処理前と比較して2倍以下が好ましく、1.5倍以下がより好ましく、1.3倍以下がさらに好ましい。特に単位発熱量(1,000kcal)当たりに生じる水の量が0.12L以下となるような発熱機構を有する装置でヒートクリーニングして得られた95質量%以上のQガラス繊維は誘電正接が非常に低いため、シラン処理での影響を受けやすく、上記の範囲であれば本来のガラスの誘電正接を持ったガラス繊維の誘電正接を悪化させずにシラン処理が行える。 The dielectric loss tangent (10 GHz, 40 GHz) of the silane-treated glass fiber obtained as described above is preferably 2 times or less, more preferably 1.5 times or less, and further 1.3 times or less compared to before silane treatment. preferable. In particular, the dielectric loss tangent of the Q glass fiber of 95% by mass or more obtained by heat cleaning with an apparatus having a heat generation mechanism that generates 0.12 L or less of water per unit calorific value (1,000 kcal) has a very high dielectric loss tangent. Therefore, it is easily affected by the silane treatment, and if it is within the above range, the silane treatment can be performed without deteriorating the dielectric loss tangent of the glass fiber, which originally has the dielectric loss tangent of the glass.
[プリント基板用プリプレグ]
本発明のガラス繊維は低誘電正接であるため、これを用いることにより、より誘電特性が向上したプリント基板用プリプレグが得られる。プリプレグの製造方法としては、特に限定されず、一般的なガラスクロス含有基板やフィルム、プリプレグ等の製造方法を適用することができる。
[Prepregs for printed circuit boards]
Since the glass fiber of the present invention has a low dielectric loss tangent, it is possible to obtain a prepreg for printed circuit boards with improved dielectric properties. The method for producing the prepreg is not particularly limited, and a general method for producing glass cloth-containing substrates, films, prepregs, and the like can be applied.
[プリント基板]
本発明のガラス繊維は低誘電正接であるため、これを用いることにより、より誘電特性が向上したプリント基板が得られる。10GHz以上の電気信号を伝送する回路を有する電子部品に好適に用いることができるものである。プリント基板の製造方法としては特に限定されず、一般的なプリント基板の製造方法を適用することができる。
[Printed board]
Since the glass fiber of the present invention has a low dielectric loss tangent, a printed circuit board having improved dielectric properties can be obtained by using the glass fiber. It can be suitably used for electronic parts having circuits that transmit electrical signals of 10 GHz or more. A method for manufacturing a printed circuit board is not particularly limited, and a general method for manufacturing a printed circuit board can be applied.
以下、実施例及び比較例を示し、本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。 EXAMPLES Hereinafter, the present invention will be specifically described by showing examples and comparative examples, but the present invention is not limited to the following examples.
[実施例1]
[工程1-1]
澱粉3.0質量%、牛脂0.5質量%、乳化剤0.1質量%、残りが水からなるガラス繊維用集束剤を調製し、SiO2の含有量が60質量%のガラスインゴットを加熱延伸して、直径5.3μmの石英ガラスフィラメントからなるガラス繊維を作製し、ガラス繊維集束剤をアプリケーターにて塗布した後に集束機により集束し、巻き取ってガラスフィラメント本数200本のガラスストランドを作製した。巻き取ったガラスストランドに24T/mの撚りを掛け、ガラスヤーンを作製した。
[Example 1]
[Step 1-1]
A sizing agent for glass fibers consisting of 3.0% by mass of starch, 0.5% by mass of beef tallow, 0.1% by mass of emulsifier, and the balance of water was prepared, and a glass ingot containing 60% by mass of SiO2 was heated and drawn. Then, a glass fiber consisting of quartz glass filaments with a diameter of 5.3 μm was produced, and after applying a glass fiber sizing agent with an applicator, it was bundled with a bundler and wound up to produce a glass strand of 200 glass filaments. . The wound glass strand was twisted at 24 T/m to produce a glass yarn.
得られたガラスヤーンに二次集束剤としてPVA(ポリビニルアルコール)1.5質量%、澱粉1.5質量%からなる水溶液を塗布した後に、エアージェット織機を用いて、IPC規格1078ガラスクロスを製造した。サイズ剤が付着したSiO2の含有量が60質量%であるガラスクロスを、単位発熱量(1,000kcal)当たりに生じる水の量が0.1L未満、実質的に0Lであるヤマト科学社製電気炉FO-610を用いて400℃・72時間加熱してヒートクリーニング処理し、ヒートクリーニング処理ガラス繊維を得た。 After applying an aqueous solution consisting of 1.5% by mass of PVA (polyvinyl alcohol) and 1.5% by mass of starch as a secondary sizing agent to the obtained glass yarn, an IPC standard 1078 glass cloth was manufactured using an air jet loom. bottom. A glass cloth with a SiO 2 content of 60% by mass to which a sizing agent is attached is used. Heat cleaning was performed by heating at 400° C. for 72 hours using an electric furnace FO-610 to obtain heat-cleaned glass fibers.
[工程1-2]
工程1-1で得られたヒートクリーニング処理ガラス繊維を、KBM-503(信越化学工業製 商品名:3-メタクリロキシプロピルトリメトキシシラン)の付着量が0.1質量%となるように、KBM-503が0.2質量%含まれたシラン処理水溶液を調製し、得られたヒートクリーニング後のガラスクロスを含侵し、ヤマト社製送風定温恒温器DKN602で110℃・10分乾燥させ、シラン処理ガラス繊維を得た。
[Step 1-2]
KBM-503 (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: 3-methacryloxypropyltrimethoxysilane) was added to the heat-cleaned glass fiber obtained in step 1-1 so that the amount of KBM-503 attached was 0.1% by mass. A silane treatment aqueous solution containing 0.2% by mass of -503 was prepared, and the obtained glass cloth after heat cleaning was impregnated, dried at 110 ° C. for 10 minutes in a blower constant temperature thermostat DKN602 manufactured by Yamato Co., Ltd., and silane treated. A glass fiber was obtained.
[実施例2]
[工程2-1]
SiO2が99.9質量%以上の石英ガラスインゴット原料として用いて工程1-1と同様にガラスクロスを製織し、ヤマト科学社製電気炉FO-610を用いて400℃・72時間加熱してヒートクリーニング処理してヒートクリーニング処理ガラスクロスを得た。
[Example 2]
[Step 2-1]
A quartz glass ingot raw material containing 99.9% by mass or more of SiO 2 was woven into glass cloth in the same manner as in step 1-1, and heated at 400° C. for 72 hours using an electric furnace FO-610 manufactured by Yamato Scientific Co., Ltd. A heat cleaning treatment was performed to obtain a heat cleaning treated glass cloth.
[工程2-2]
工程-1で得られたヒートクリーニング処理ガラス繊維を、工程1-2と同様の方法で処理し、シラン処理ガラス繊維を得た。
[Step 2-2]
The heat-cleaned glass fibers obtained in step-1 were treated in the same manner as in step 1-2 to obtain silane-treated glass fibers.
[実施例3]
[工程3-1]
ヒートクリーニング処理を、400℃・48時間にする以外は、工程2-1と同様の方法で、ヒートクリーニング処理ガラス繊維を得た。
[Example 3]
[Step 3-1]
A heat-cleaned glass fiber was obtained in the same manner as in step 2-1, except that the heat-cleaning treatment was performed at 400° C. for 48 hours.
[実施例3-2]
工程3-1で得られたヒートクリーニング処理ガラス繊維を、工程1-2と同様の方法で処理し、シラン処理ガラス繊維を得た。
[Example 3-2]
The heat-cleaned glass fibers obtained in step 3-1 were treated in the same manner as in step 1-2 to obtain silane-treated glass fibers.
[実施例4]
[工程4-1]
ヒートクリーニング処理を、300℃・72時間にする以外は、工程2-1と同様の方法で、ヒートクリーニング処理ガラス繊維を得た。
[Example 4]
[Step 4-1]
A heat-cleaned glass fiber was obtained in the same manner as in step 2-1, except that the heat-cleaning treatment was performed at 300° C. for 72 hours.
[工程4-2]
実施例4-1で得られたヒートクリーニング処理ガラス繊維を、工程1-2と同様の方法で処理し、シラン処理ガラス繊維を得た。
[Step 4-2]
The heat-cleaned glass fibers obtained in Example 4-1 were treated in the same manner as in step 1-2 to obtain silane-treated glass fibers.
[実施例5]
[工程5-1]
ヒートクリーニング処理を、450℃・72時間にする以外は、工程2-1と同様の方法で、ヒートクリーニング処理ガラス繊維を得た。
[Example 5]
[Step 5-1]
A heat-cleaned glass fiber was obtained in the same manner as in step 2-1, except that the heat-cleaning treatment was performed at 450° C. for 72 hours.
[実施例5-2]
工程5-1で得られたヒートクリーニング処理ガラス繊維を、工程1-2と同様の方法で処理し、シラン処理ガラス繊維を得た。
[Example 5-2]
The heat-cleaned glass fibers obtained in step 5-1 were treated in the same manner as in step 1-2 to obtain silane-treated glass fibers.
[実施例6]
[工程6-1]
ヒートクリーニング処理を、600℃・72時間にする以外は、工程2-1と同様の方法で、ヒートクリーニング処理ガラス繊維を得た。
[Example 6]
[Step 6-1]
A heat-cleaned glass fiber was obtained in the same manner as in step 2-1, except that the heat-cleaning treatment was performed at 600° C. for 72 hours.
[実施例6-2]
工程6-1で得られたヒートクリーニング処理ガラス繊維を、工程1-2と同様の方法で処理し、シラン処理ガラス繊維を得た。
[Example 6-2]
The heat-cleaned glass fibers obtained in step 6-1 were treated in the same manner as in step 1-2 to obtain silane-treated glass fibers.
[実施例7]
工程2-1で得られたヒートクリーニング処理ガラスクロスを、KBM-503の付着量が0.1質量%となるように、KBM-503が0.2質量%含まれたシラン処理水溶液を調整し、得られたヒートクリーニング後のガラスクロスを含侵し、ヤマト社製送風定温恒温器DKN602で110℃・30秒乾燥させ、シラン処理ガラス繊維を得た。
[Example 7]
The heat-cleaned glass cloth obtained in step 2-1 was adjusted with a silane-treated aqueous solution containing 0.2% by mass of KBM-503 so that the amount of KBM-503 adhered was 0.1% by mass. After the heat cleaning, the obtained glass cloth was impregnated and dried at 110° C. for 30 seconds in a blower constant temperature thermostat DKN602 manufactured by Yamato Co., Ltd. to obtain a silane-treated glass fiber.
[実施例8]
工程2-1で得られたヒートクリーニング処理ガラスクロスをKBM-503の付着量が0.02質量%となるように、KBM-503が0.05質量%含まれたシラン処理水溶液を調整し、得られたヒートクリーニング後のガラスクロスを含侵し、ヤマト社製送風定温恒温器DKN602で110℃・10分乾燥させ、シラン処理ガラス繊維を得た。
[Example 8]
A silane-treated aqueous solution containing 0.05% by mass of KBM-503 was adjusted so that the amount of KBM-503 adhered to the heat-cleaned glass cloth obtained in step 2-1 was 0.02% by mass, The obtained glass cloth after heat cleaning was impregnated and dried at 110° C. for 10 minutes in a blower constant temperature thermostat DKN602 manufactured by Yamato Co., Ltd. to obtain a silane-treated glass fiber.
[実施例9]
工程2-1で得られたヒートクリーニング処理ガラスクロスをKBM-503の付着量が0.4質量%となるように、KBM-503が1質量%含まれたシラン処理水溶液を調整し、得られたヒートクリーニング後のガラスクロスを含侵し、ヤマト社製送風定温恒温器DKN602で110℃・10分乾燥させ、シラン処理ガラス繊維を得た。
[Example 9]
A silane-treated aqueous solution containing 1% by mass of KBM-503 was adjusted so that the amount of KBM-503 attached to the heat-cleaned glass cloth obtained in step 2-1 was 0.4% by mass. After the heat cleaning, the glass cloth was impregnated and dried at 110° C. for 10 minutes in a blower constant temperature thermostat DKN602 manufactured by Yamato Co., Ltd. to obtain a silane-treated glass fiber.
[比較例1]
澱粉を3.0質量%、牛脂を0.5質量%、乳化剤を0.1質量%、残りが水からなるガラス繊維用集束剤を調整し、SiO2の含有量が53質量%のガラスインゴットを加熱延伸して、直径5.3μmの石英ガラスフィラメントからなるガラス繊維を作製し、ガラス繊維集束剤をアプリケーターにて塗布した後に集束機により集束し、巻き取ってガラスフィラメント本数200本のガラスストランドを作製した。巻き取ったガラスストランドに24T/mの撚りを掛け、ガラスヤーンを作製した。得られたガラスヤーンに二次集束剤としてPVA1.5質量%、澱粉1.5質量%からなる水溶液を塗布した後に、エアージェット織機を用いて、IPC規格1078ガラスクロスを製造した。サイズ剤が付着したSiO2の含有量が53質量%であるガラスクロスを、単位発熱量(1,000kcal)当たりに生じる水の量が0.1L未満、実質的に0Lであるヤマト科学社製電気炉FO-610を用いて400℃・72時間加熱して、ヒートクリーニング処理し、ヒートクリーニング処理ガラス繊維を得た。
[Comparative Example 1]
A glass ingot having a sizing agent for glass fibers consisting of 3.0% by mass of starch, 0.5% by mass of beef tallow, 0.1% by mass of an emulsifier, and the balance of water, and having a SiO2 content of 53% by mass. is heated and drawn to produce glass fibers made of quartz glass filaments with a diameter of 5.3 μm, and after applying a glass fiber sizing agent with an applicator, the fibers are bundled with a sizing machine and wound up to form a glass strand of 200 glass filaments. was made. The wound glass strand was twisted at 24 T/m to produce a glass yarn. After applying an aqueous solution containing 1.5% by mass of PVA and 1.5% by mass of starch as a secondary sizing agent to the obtained glass yarn, an IPC standard 1078 glass cloth was produced using an air jet loom. A glass cloth with a SiO 2 content of 53% by mass to which a sizing agent is attached is used. Using an electric furnace FO-610, it was heated at 400° C. for 72 hours and heat-cleaned to obtain a heat-cleaned glass fiber.
[比較例2]
ヒートクリーニング処理を、200℃・72時間にする以外は、工程2-1と同様の方法で、ヒートクリーニング処理ガラス繊維を得た。
上記で得られたヒートクリーニング処理ガラス繊維を、工程1-2と同様の方法で処理し、シラン処理ガラス繊維を得た。
[Comparative Example 2]
A heat-cleaned glass fiber was obtained in the same manner as in step 2-1, except that the heat-cleaning treatment was performed at 200° C. for 72 hours.
The heat-cleaned glass fibers obtained above were treated in the same manner as in step 1-2 to obtain silane-treated glass fibers.
[比較例3]
SiO2が99.9質量%以上の石英ガラスインゴット原料として用いて工程2-1と同様にガラスクロスを製織し、加熱炉を単位発熱量(1,000kcal)当たりに生じる水の量が12L以上である加熱炉(美濃窯業株式会社製ガス炉 7m3ファイバースーペリオキルン)に変更し、400℃・72時間でヒートクリーニング処理し、ヒートクリーニング処理ガラス繊維を得た。
上記で得られたヒートクリーニング処理ガラス繊維を、工程1-2と同様の方法で処理し、シラン処理ガラス繊維を得た。
[Comparative Example 3]
A quartz glass ingot containing 99.9% by mass or more of SiO 2 was used as a raw material to weave glass cloth in the same manner as in step 2-1. (Gas Furnace 7m 3 Fiber Superior Kiln manufactured by Mino Ceramics Co., Ltd.), heat cleaning treatment was performed at 400° C. for 72 hours to obtain heat cleaning treated glass fibers.
The heat-cleaned glass fibers obtained above were treated in the same manner as in step 1-2 to obtain silane-treated glass fibers.
[洗浄クロス(参考例1対応)]
実施例1で用いたヒートクリーニング前のサイズ剤が付着しているガラスクロスを鈴木油脂工業社製 アルカリ電解水 S-2665で60℃・2時間洗浄し、付着したサイズ剤を除去した後にガラスクロスを100℃・30分乾燥させてサイズ剤洗浄ガラスクロスを得た。
[Washing cloth (corresponding to Reference Example 1)]
The glass cloth with the sizing agent used in Example 1 before heat cleaning was washed with alkaline electrolyzed water S-2665 manufactured by Suzuki Yushi Kogyo Co., Ltd. at 60 ° C. for 2 hours to remove the adhered sizing agent, and then the glass cloth. was dried at 100° C. for 30 minutes to obtain a sizing agent-cleaned glass cloth.
[洗浄クロス(参考例2対応)]
実施例2で用いたヒートクリーニング前のサイズ剤が付着しているガラスクロスを鈴木油脂工業社製 アルカリ電解水 S-2665で60℃・2時間洗浄し、付着したサイズ剤を除去した後にガラスクロスを100℃・30分乾燥させてサイズ剤洗浄ガラスクロスを得た。
[Washing cloth (corresponding to Reference Example 2)]
The glass cloth to which the sizing agent was attached before heat cleaning used in Example 2 was washed with alkaline electrolyzed water S-2665 manufactured by Suzuki Yushi Kogyo Co., Ltd. at 60 ° C. for 2 hours, and after removing the adhered sizing agent, the glass cloth. was dried at 100° C. for 30 minutes to obtain a sizing agent-cleaned glass cloth.
上記参考例1,2によるアルカリ電解水によるサイズ剤の除去は、加熱によるSi-O-Si結合の開裂が起こらないため、ヒートクリーニング前のガラスクロスの誘電正接を測定することができ、本発明でのヒートクリーニングによる誘電正接の変化量を評価できる。 In the removal of the sizing agent with alkaline electrolyzed water according to Reference Examples 1 and 2 above, the Si—O—Si bond is not cleaved by heating, so the dielectric loss tangent of the glass cloth before heat cleaning can be measured. It is possible to evaluate the amount of change in dielectric loss tangent due to heat cleaning at .
上記で得られたヒートクリーニング処理前後のガラスクロス、シラン処理前後、及び洗浄クロスについて、下記方法で評価を行った。結果を下記表に記載する。 The glass cloth before and after the heat cleaning treatment, the cloth before and after the silane treatment, and the washing cloth obtained above were evaluated by the following methods. The results are listed in the table below.
1.誘電正接の測定
ガラスクロスの誘電正接を、誘電率測定用SPDR(Split post dielectric resonators)誘電体共振器周波数10GHz(キーサイト・テクノロジー株式会社製)を用いて測定した。なお、ガラスクロスの厚みは理論膜厚を用いて測定しており、ガラスクロスの理論膜厚は
理論膜厚t(m)=目付量(g/m2)/比重(g/cm3)
から算出した。
1. Measurement of Dielectric Loss Tangent The dielectric loss tangent of the glass cloth was measured using an SPDR (Split post dielectric resonator) dielectric resonator frequency of 10 GHz (manufactured by Keysight Technologies, Inc.) for dielectric constant measurement. The thickness of the glass cloth is measured using the theoretical film thickness .
calculated from
2.誘電正接比
以下の式に基づき、サイズ剤除去前後の誘電正接変化を計算した。
誘電正接比=実施例及び比較例の誘電正接/(SiO2量が同じ洗浄クロスの誘電正接)
2. Dielectric Loss Tangent Ratio The dielectric loss tangent change before and after removal of the sizing agent was calculated based on the following formula.
Dielectric loss tangent ratio = Dielectric loss tangent of Example and Comparative example / (Dielectric loss tangent of cleaning cloth with the same amount of SiO2 )
3.サイズ剤由来残存炭素量の測定
1,000℃、2時間空焼きした磁製るつぼに、ヒートクリーニング後のガラス繊維を100mg秤量し、助燃剤としてタングステン1.0gとスズコートされた銅1.5gを添加し、LECO社製炭素硫黄分析装置CS774を用いて2.2kWで燃焼した際のガス量から残存炭素量を測定した。この測定方法の結果を「サイズ剤由来残存炭素量」とする。
3. Measurement of residual carbon content derived from sizing agent 100 mg of glass fiber after heat cleaning was weighed in a porcelain crucible that had been pre-fired at 1,000°C for 2 hours, and 1.0 g of tungsten and 1.5 g of tin-coated copper were added as combustion improvers. After addition, the amount of residual carbon was measured from the amount of gas when burned at 2.2 kW using a carbon sulfur analyzer CS774 manufactured by LECO. The result of this measuring method is defined as the "residual carbon amount derived from the sizing agent".
4.シラノール基(Si-OH)含有量の測定
Qガラス繊維のシラノール含有量は、以下の方法によって測定・計算した値をいう。
あらかじめシラノール量が既知の板状Qガラスの誘電正接をガラスクロスと同様に測定して、以下のシラノール量と誘電正接の関係式を求めた。
誘電正接(10GHz)=9.04×10-8×シラノール量(ppm)+5.26×10-5
得られた関係式を用いてガラスクロスの誘電正接からシラノール量を算出した。なお残存炭素量が0.1質量%より多い場合、アルカリ電解水によって残存炭素を0.1質量%以下にした後の誘電正接からシラノール量を算出した。
4. Measurement of Silanol Group (Si—OH) Content The silanol content of the Q glass fiber is a value measured and calculated by the following method.
The dielectric loss tangent of the plate-like Q glass having a known silanol content was measured in the same manner as the glass cloth, and the following relational expression between the silanol content and the dielectric loss tangent was obtained.
Dielectric loss tangent (10 GHz) = 9.04 x 10 -8 x amount of silanol (ppm) + 5.26 x 10 -5
Using the obtained relational expression, the amount of silanol was calculated from the dielectric loss tangent of the glass cloth. When the residual carbon content was more than 0.1% by mass, the silanol content was calculated from the dielectric loss tangent after reducing the residual carbon content to 0.1% by mass or less with alkaline electrolyzed water.
5.シラン処理ガラスクロスの揮発分測定方法
シラン処理されたガラスクロスを150℃・1時間乾燥させ質量変化を測定した。
揮発分(%)=((加熱前のシラン処理ガラスクロス-加熱後のシラン処理ガラスクロス)/加熱前のシラン処理ガラスクロス)×100
5. Method for Measuring Volatile Content of Silane-Treated Glass Cloth The silane-treated glass cloth was dried at 150° C. for 1 hour, and the mass change was measured.
Volatile content (%) = ((silane-treated glass cloth before heating - silane-treated glass cloth after heating) / silane-treated glass cloth before heating) x 100
6.シランカップリング剤の付着量
JISR3420に記載の強熱減量の方法に従って測定を行った。
6. Adhesion amount of silane coupling agent Measurement was carried out according to the ignition loss method described in JISR3420.
7.引張強度
シラン処理前と処理後のガラスクロスについて、島津製作所社製オートグラフ、AGS-Xを用いて、JISR 3420の引張強さの測定方法にしたがって測定した。結果を、強度(GPa)=(強度(N/25mm)/25)/理論膜厚(μm)で記載する。
7. Tensile Strength The glass cloth before and after the silane treatment was measured according to the tensile strength measurement method of JISR 3420 using Autograph AGS-X manufactured by Shimadzu Corporation. The results are described as strength (GPa)=(strength (N/25 mm)/25)/theoretical film thickness (μm).
8.信頼性評価
SLK-3000(商品名;信越化学工業(株)製)を100質量部、ジクミルパーオキシド(商品名:パークミルD、日油製)を2質量部加え、溶剤としてトルエンに入れ、攪拌機で予備混合して樹脂ワニスを調製した。
作製した樹脂ワニスに実施例及び比較例で得られたシラン処理ガラスクロスを含侵させ、110℃で10分間乾燥させることでプリプレグを作製した。その際、付着量は55質量%になるように調整した。その後、作製したプリプレグを3枚積層して真空減圧プレス機を用い150℃で1時間、さらに180℃で2時間のステップキュアを行うことで硬化させた。得られた基板を1時間イオン交換水にて1時間煮沸後に、260℃のはんだ浴に30秒浸漬させて、膨れの生じなかったものを「〇」、膨れの生じたものを「×」として判断した。
8. Reliability evaluation 100 parts by mass of SLK-3000 (trade name; manufactured by Shin-Etsu Chemical Co., Ltd.) and 2 parts by mass of dicumyl peroxide (trade name: Parkmil D, manufactured by NOF Corporation) were added and put in toluene as a solvent. A resin varnish was prepared by pre-mixing with a stirrer.
The prepared resin varnish was impregnated with the silane-treated glass cloth obtained in Examples and Comparative Examples, and dried at 110° C. for 10 minutes to prepare a prepreg. At that time, the adhesion amount was adjusted to 55% by mass. After that, three sheets of the produced prepreg were laminated and cured by performing step curing at 150° C. for 1 hour and further at 180° C. for 2 hours using a vacuum decompression press. After boiling the obtained substrate for 1 hour in deionized water for 1 hour, it was immersed in a solder bath at 260°C for 30 seconds. It was judged.
表1に示したように、本発明のヒートクリーニング方法では、SiO2の含有量が55質量%以上のヒートクリーニング処理ガラスクロスは、誘電正接は10GHzで0.0016以下であり、40GHzで0.0020以下であり、洗浄クロスと比較して0.7~1.3倍である。一方、SiO2の含有量が55質量%以上のガラスクロスであっても比較例2,3では誘電正接比は10GHzで4.6、2.4であり、高速通信用基板材料としては不十分である。比較例2ではサイズ剤が燃焼せずに酸化してしまったため大幅に誘電正接が悪化した。 As shown in Table 1, in the heat cleaning method of the present invention, the heat-cleaned glass cloth having a SiO 2 content of 55% by mass or more has a dielectric loss tangent of 0.0016 or less at 10 GHz and 0.001 at 40 GHz. 0020 or less, which is 0.7 to 1.3 times that of the cleaning cloth. On the other hand, even if the glass cloth has a SiO 2 content of 55% by mass or more, the dielectric loss tangent ratio is 4.6 and 2.4 at 10 GHz in Comparative Examples 2 and 3, which is insufficient as a substrate material for high-speed communication. is. In Comparative Example 2, since the sizing agent was oxidized without being burned, the dielectric loss tangent was greatly deteriorated.
また実施例2で得られたヒートクリーニング処理ガラスクロスに対してシラン処理を行った結果、得られたシラン処理ガラスクロスの誘電正接を悪化させずに基板とした際に信頼性のあるシラン処理ガラスクロスとすることができた。 Further, as a result of subjecting the heat-cleaned glass cloth obtained in Example 2 to silane treatment, the obtained silane-treated glass cloth does not deteriorate in dielectric loss tangent and is reliable when used as a substrate. could be crossed.
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JP2004099377A (en) * | 2002-09-10 | 2004-04-02 | Shinetsu Quartz Prod Co Ltd | Synthetic quartz glass fiber, strand, yarn and cloth |
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