JP2023063249A - Surface treatment apparatus and membrane protection member - Google Patents

Surface treatment apparatus and membrane protection member Download PDF

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JP2023063249A
JP2023063249A JP2022163403A JP2022163403A JP2023063249A JP 2023063249 A JP2023063249 A JP 2023063249A JP 2022163403 A JP2022163403 A JP 2022163403A JP 2022163403 A JP2022163403 A JP 2022163403A JP 2023063249 A JP2023063249 A JP 2023063249A
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membrane
processed
ion conductive
protection member
surface treatment
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豊樹 佐藤
Toyoki Sato
孝男 寺山
Takao Terayama
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MIKADO TECHNOS KK
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Abstract

To provide a surface treatment apparatus and a membrane protection member capable of preventing breakage of an ion conductive membrane.SOLUTION: An apparatus of the invention includes: a housing which is arranged opposite to an object to be treated and can form a liquid chamber therein; an electrode arranged in the housing; an ion conducting membrane arranged between the liquid chamber and the object to be treated; a first membrane protection member arranged between the object to be treated and the ion conducting membrane; and a power supply unit which applies a voltage between the electrode and the object to be treated, wherein the first membrane protection member includes a first membrane support portion that supports the ion conducting membrane; and by applying a voltage between the electrode and the object to be treated, the surface of the object is treated by electrolysis through the ion conducting membrane and the first membrane support portion.SELECTED DRAWING: Figure 1A

Description

本発明は、表面処理装置、膜保護部材及び表面処理方法に関する。 TECHNICAL FIELD The present invention relates to a surface treatment apparatus, a membrane protective member, and a surface treatment method.

従来、陽極と、陰極と、陽極と陰極との間に配置された固体電解質膜と、陽極と陰極との間に電圧を印加する電源部とを備え、陽極と陰極との間に電圧を印加して、固体電解質膜の内部に含有された金属イオンを陰極側に析出させることにより、金属被膜を基板の表面に成膜する成膜装置が知られている(例えば特許文献1)。 Conventionally, an anode, a cathode, a solid electrolyte membrane arranged between the anode and the cathode, and a power supply section for applying a voltage between the anode and the cathode are provided, and a voltage is applied between the anode and the cathode. Then, there is known a film forming apparatus for forming a metal film on the surface of a substrate by depositing metal ions contained inside a solid electrolyte film on the cathode side (for example, Patent Document 1).

この成膜装置は、陽極と固体電解質膜との間に金属イオンを含む溶液を収容する溶液収容部を備えている。溶液収容部の底部には、開口が形成されており、開口を覆うように固体電解質膜が配置されている。また、溶液収容部の蓋部には、移動部が連結されている。移動部は、溶液収容部と共に固体電解質膜を基板に向かって移動させることにより、固体電解質膜を基板の成膜領域に加圧するものである。さらに、移動部は、金属被膜の固体電解質膜と基板との距離を増加させるように、固体電解質膜と基板とを相対的に移動させる機能を備えている。 This film forming apparatus includes a solution storage unit that stores a solution containing metal ions between the anode and the solid electrolyte membrane. An opening is formed in the bottom of the solution storage part, and a solid electrolyte membrane is arranged so as to cover the opening. Further, the moving part is connected to the cover part of the solution storage part. The moving part presses the solid electrolyte membrane against the deposition area of the substrate by moving the solid electrolyte membrane toward the substrate together with the solution storage part. Further, the moving part has a function of relatively moving the solid electrolyte membrane and the substrate so as to increase the distance between the metal-coated solid electrolyte membrane and the substrate.

特開2014-051701号公報Japanese Unexamined Patent Application Publication No. 2014-051701

しかしながら、従来の成膜装置では、固体電解質膜が基板に接触していない状態では、溶液収容部に収容された溶液の自重が固体電解質膜に作用し、固体電解質膜が変形して破損することがある。そのため、固体電解質膜が基板に接触している状態で、溶液収容部に溶液を供給し、溶液排出後に固体電解質膜を基板から離間する必要がある。また、固体電解質膜が直接基材と接触するため、固体電解質膜を基板から離間する際に、固体電解質膜が破れやすいという問題がある。 However, in the conventional film forming apparatus, when the solid electrolyte membrane is not in contact with the substrate, the weight of the solution contained in the solution container acts on the solid electrolyte membrane, and the solid electrolyte membrane deforms and breaks. There is Therefore, it is necessary to supply the solution to the solution container while the solid electrolyte membrane is in contact with the substrate, and separate the solid electrolyte membrane from the substrate after discharging the solution. Moreover, since the solid electrolyte membrane is in direct contact with the substrate, there is a problem that the solid electrolyte membrane is easily broken when separating the solid electrolyte membrane from the substrate.

本発明はこのような課題に鑑みなされたものであり、イオン伝導膜の破損を防止可能な表面処理装置、膜保護部材及び表面処理方法を提供することを目的とする。 SUMMARY OF THE INVENTION It is an object of the present invention to provide a surface treatment apparatus, a membrane protective member, and a surface treatment method that can prevent damage to an ion conductive membrane.

本発明に係る表面処理装置は、被処理物と対向して配置され、内部に液室を形成可能なハウジングと、前記ハウジング内に配された電極と、前記液室と前記被処理物との間に配置されたイオン伝導膜と、前記被処理物と前記イオン伝導膜との間に配された第1膜保護部材と、前記電極と前記被処理物との間に電圧を印加する電源部とを備え、前記第1膜保護部材は、前記イオン伝導膜を支持する第1膜支持部を含み、前記電極と前記被処理物との間に電圧を印加することで、前記イオン伝導膜及び前記第1膜支持部を介した電気分解により前記被処理物の表面を処理することを特徴とする。 A surface treatment apparatus according to the present invention comprises a housing arranged to face an object to be treated and capable of forming a liquid chamber therein, an electrode arranged in the housing, and the liquid chamber and the object to be treated. an ion conductive film disposed therebetween; a first film protection member disposed between the object to be processed and the ion conductive film; and a power supply section for applying a voltage between the electrode and the object to be processed. and the first membrane protection member includes a first membrane supporting portion that supports the ion conductive membrane, and by applying a voltage between the electrode and the object to be processed, the ion conductive membrane and The surface of the object to be treated is treated by electrolysis via the first membrane supporting portion.

本発明に係る表面処理装置において、前記第1膜支持部は、多孔部材であってもよい。 In the surface treatment apparatus according to the present invention, the first membrane supporting section may be a porous member.

本発明に係る表面処理装置において、前記イオン伝導膜と前記第1膜保護部材は、前記ハウジングに取り付けられてもよい。 In the surface treatment apparatus according to the present invention, the ion conductive membrane and the first membrane protection member may be attached to the housing.

本発明に係る表面処理装置において、前記第1膜保護部材は、前記被処理物の非処理部分を被覆するための被覆部を更に含んでもよい。 In the surface treatment apparatus according to the present invention, the first film protection member may further include a covering portion for covering the non-treatment portion of the object to be treated.

本発明に係る表面処理装置において、前記第1膜保護部材は、前記被覆部の前記被処理物側に通電部が更に設けられており、前記通電部は、前記電源部と前記被処理物の前記表面とを導通するように、該被処理物の該表面の一部に接触可能に配置されてもよい。 In the surface treatment apparatus according to the present invention, the first film protection member is further provided with an energizing portion on the side of the object to be treated of the covering portion, and the energizing portion comprises the power supply portion and the object to be treated. It may be arranged so as to be able to contact a portion of the surface of the object to be processed so as to conduct with the surface.

本発明に係る表面処理装置において、前記被覆部は、撥水性を有してもよい。 In the surface treatment apparatus according to the present invention, the covering portion may have water repellency.

本発明に係る表面処理装置において、前記第1膜支持部は、表面が絶縁処理されてもよい。 In the surface treatment apparatus according to the present invention, the surface of the first film supporting portion may be insulated.

本発明に係る表面処理装置において、前記第1膜支持部は、前記イオン伝導膜の前記被処理物との対向面に接着されていてもよい。 In the surface treatment apparatus according to the present invention, the first membrane supporting portion may be adhered to a surface of the ion conductive membrane facing the object to be treated.

本発明に係る表面処理装置は、前記イオン伝導膜の前記液室側に配された第2膜保護部材を更に備え、前記第2膜保護部材は、前記イオン伝導膜と対向して設けられ、前記液室内の溶液を通過可能な第2膜支持部を含み、前記イオン伝導膜は、前記第1膜支持部と前記第2膜支持部の間に挟まれていてもよい。 The surface treatment apparatus according to the present invention further includes a second membrane protection member disposed on the liquid chamber side of the ion conductive membrane, the second membrane protection member is provided facing the ion conductive membrane, A second membrane support may be included through which the solution in the liquid chamber can pass, and the ion-conducting membrane may be sandwiched between the first membrane support and the second membrane support.

本発明に係る表面処理装置において、前記第2膜支持部は、前記イオン伝導膜の前記液室側の面に接着されてもよい。 In the surface treatment apparatus according to the present invention, the second membrane supporting portion may be adhered to the liquid chamber side surface of the ion conductive membrane.

本発明に係る膜保護部材は、被処理物と対向して配置され、内部に液室を形成可能なハウジングと、前記ハウジング内に配された電極と、前記液室と前記被処理物との間に配置されたイオン伝導膜と、前記電極と前記被処理物との間に電圧を印加する電源部とを備え、前記電極と前記被処理物との間に電圧を印加することで、前記イオン伝導膜を介した電気分解により前記被処理物の表面を処理する表面処理装置に用いられる膜保護部材であって、前記イオン伝導膜を支持する膜支持部を備え、前記被処理物と前記イオン伝導膜との間に配置可能に構成されている。 The membrane protection member according to the present invention comprises a housing arranged to face an object to be processed and capable of forming a liquid chamber therein, an electrode arranged in the housing, and the liquid chamber and the object to be processed. an ion conductive film interposed therebetween; and a power supply section for applying a voltage between the electrode and the object to be processed. By applying a voltage between the electrode and the object to be processed, the A membrane protection member for use in a surface treatment apparatus that treats the surface of an object to be treated by electrolysis via an ion-conducting membrane, comprising a membrane supporting portion for supporting the ion-conducting membrane, wherein the object to be treated and the It is configured to be arranged between the ion conductive membrane.

本発明に係る膜保護部材は、前記被処理物の非処理部分を被覆するための被覆部を備えてもよい。 The membrane protection member according to the present invention may comprise a covering portion for covering the untreated portion of the object to be treated.

本発明に係る膜保護部材は、前記被覆部の前記被処理物側に通電部が更に設けられており、前記通電部は、前記電源部と前記被処理物の前記表面とを導通するように、該被処理物の該表面の一部に接触可能に構成されてもよい。 In the film protection member according to the present invention, a current-carrying part is further provided on the side of the object to be treated of the covering part, and the current-carrying part conducts between the power supply part and the surface of the object to be treated. , may be configured to be able to contact a portion of the surface of the object to be processed.

本発明に係る表面処理方法は、電極と被処理物との間にイオン伝導膜を配置し、前記電極と前記被処理物との間に電圧を印加することで、前記イオン伝導膜を介した液室内の溶液の電気分解により被処理物の表面を処理する表面処理方法であって、膜保護部材により前記イオン伝導膜の前記被処理物との対向面を支持した状態で表面処理を行うことを特徴とする。 In the surface treatment method according to the present invention, an ion conductive film is placed between an electrode and an object to be treated, and a voltage is applied between the electrode and the object to be treated, so that A surface treatment method for treating the surface of an object to be treated by electrolysis of a solution in a liquid chamber, wherein the surface treatment is performed while the surface of the ion conductive membrane facing the object to be treated is supported by a membrane protection member. characterized by

本発明に係る表面処理方法は、前記膜保護部材により前記イオン伝導膜の前記被処理物との前記対向面を支持した状態で前記液室に前記溶液を収容し、該液室に該溶液を収容した状態で前記イオン伝導膜を前記被処理物に対し接近及び離間させてもよい。 In the surface treatment method according to the present invention, the solution is contained in the liquid chamber while the surface of the ion conductive membrane facing the object to be treated is supported by the membrane protection member, and the solution is poured into the liquid chamber. The ion-conducting membrane may be moved toward and away from the object to be processed while being accommodated.

本発明に係る表面処理方法は、前記液室内を加圧する加圧工程と、加圧工程後に、前記電極と前記被処理物との間に電圧を印加する電圧印加工程とを備えてもよい。 The surface treatment method according to the present invention may include a pressurizing step of pressurizing the inside of the liquid chamber, and a voltage applying step of applying a voltage between the electrode and the object after the pressurizing step.

本発明によれば、イオン伝導膜の破損を防止可能な表面処理装置、膜保護部材及び表面処理方法を提供することが可能となる。 ADVANTAGE OF THE INVENTION According to this invention, it becomes possible to provide the surface treatment apparatus, membrane protection member, and surface treatment method which can prevent damage to an ion-conducting membrane.

本発明の本実施形態に係る表面処理装置の型開き状態を示す概略図である。It is a schematic diagram showing a mold opening state of the surface treatment apparatus according to the present embodiment of the present invention. 本実施形態に係る表面処理装置の型閉じ状態を示す概略図である。It is a schematic diagram showing a mold closed state of the surface treatment apparatus according to the present embodiment. 本実施形態に係る表面処理装置の型閉じ状態を示す概略図である。It is a schematic diagram showing a mold closed state of the surface treatment apparatus according to the present embodiment. 本実施形態に係る第1膜保護部材を示す分解図である。4 is an exploded view showing the first film protection member according to the embodiment; FIG. 本実施形態に係る第1膜保護部材を示す組立図である。FIG. 4 is an assembly diagram showing the first film protection member according to the embodiment; 本実施形態に係る第1膜保護部材を示す断面図である。4 is a cross-sectional view showing the first film protection member according to the embodiment; FIG. 本実施形態に係る表面処理方法を示すフローチャートである。It is a flow chart which shows the surface treatment method concerning this embodiment. 本発明の変形例に係るイオン伝導膜を示す概略図である。FIG. 5 is a schematic diagram showing an ion conductive membrane according to a modification of the present invention; 本発明の変形例に係る第1膜保護部材及び第2膜保護部材を示す概略図である。FIG. 10 is a schematic diagram showing a first membrane protection member and a second membrane protection member according to a modification of the present invention; 本実施形態に係る第1膜保護部材の変形例を示す断面図である。FIG. 5 is a cross-sectional view showing a modification of the first film protection member according to the embodiment; 本実施形態に係る第1膜保護部材の変形例を示す断面図である。FIG. 5 is a cross-sectional view showing a modified example of the first film protection member according to the present embodiment;

以下、本発明を実施するための最良の実施形態について、図面を用いて説明する。なお、以下の実施形態は、各請求項に係る発明を限定するものではなく、また、実施形態の中で説明されている特徴の組み合わせの全てが発明の解決手段に必須であるとは限らない。 BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the best embodiment for carrying out the present invention will be described with reference to the drawings. In addition, the following embodiments do not limit the invention according to each claim, and not all combinations of features described in the embodiments are essential for the solution of the invention. .

[本実施形態に係る表面処理装置の全体構成]
まず、図1を参照して、本発明の本実施形態に係る表面処理装置1を概説する。図1A~図1Cに示すように、本実施形態に係る表面処理装置1は、例えば、金属イオンを還元することで金属を析出させて、金属からなる被膜を被処理物Cの表面Eに形成するめっき処理装置として用いられ得る。ただし、表面処理装置1は、これに限定されるものではなく、被処理物Cの表面Eを処理することができる装置であれば、種々のものに適用可能である。
[Overall configuration of surface treatment apparatus according to the present embodiment]
First, referring to FIG. 1, a surface treatment apparatus 1 according to the present embodiment of the present invention will be outlined. As shown in FIGS. 1A to 1C, the surface treatment apparatus 1 according to the present embodiment deposits metal by, for example, reducing metal ions to form a metal film on the surface E of the object C to be treated. It can be used as a plating processing apparatus for However, the surface treatment apparatus 1 is not limited to this, and can be applied to various apparatuses as long as they can treat the surface E of the object C to be treated.

なお、本実施形態において、被処理物Cは、金属材料などの導体であるものとして説明するが、これに限定されない。例えば、被処理物Cが、樹脂基材や、ガラス基板、シリコンウエハー、セラミックス基板等の上に導体層が形成されている材料の場合、表面処理装置1は、導体層の表面を処理することもできる。また、本実施形態において、溶液は、電解液であるものとして説明するがこれに限定されない。 In addition, in the present embodiment, the object to be processed C is described as being a conductor such as a metal material, but is not limited to this. For example, when the object C to be processed is a material in which a conductor layer is formed on a resin base material, a glass substrate, a silicon wafer, a ceramic substrate, or the like, the surface treatment apparatus 1 can treat the surface of the conductor layer. can also Also, in the present embodiment, the solution is described as being an electrolytic solution, but it is not limited to this.

表面処理装置1は、被処理物Cと対向して配置され、内部に液室(閉鎖空間、密閉空間)3を形成可能なハウジング4と、ハウジング4内に配された電極20と、液室3と被処理物Cとの間に配置されたイオン伝導膜6と、被処理物Cとイオン伝導膜6との間に配された第1膜保護部材60と、電極20と被処理物Cとの間に電圧を印加する電源部7とを備えている。イオン伝導膜6と第1膜保護部材60は、ハウジング4に取り付けられている。 The surface treatment apparatus 1 is arranged to face an object C to be treated, and includes a housing 4 capable of forming a liquid chamber (closed space, closed space) 3 therein, an electrode 20 arranged in the housing 4, and a liquid chamber. 3 and the object C to be processed, the first film protection member 60 arranged between the object C to be processed and the ion conductive film 6, the electrode 20 and the object C to be processed and a power supply unit 7 for applying a voltage between. The ion conductive membrane 6 and the first membrane protection member 60 are attached to the housing 4 .

また、表面処理装置1は、被処理物Cを載置可能な載置基台2と、載置基台2及びハウジング4の少なくとも一方を他方に対して相対移動させる移動機構5と、液室3内に電解液を供給又は排出する溶液供給部(図示せず)と、イオン伝導膜6を保持する保持治具35とを更に備えている。保持治具35は、内枠膜治具36と、内枠膜治具36に係合する外枠膜治具37とを含む。 Further, the surface treatment apparatus 1 includes a mounting base 2 on which an object to be processed C can be mounted, a moving mechanism 5 for relatively moving at least one of the mounting base 2 and the housing 4 with respect to the other, and a liquid chamber. A solution supply unit (not shown) for supplying or discharging an electrolytic solution into or from the inside 3 and a holding jig 35 for holding the ion conductive film 6 are further provided. The holding jig 35 includes an inner frame membrane jig 36 and an outer frame membrane jig 37 that engages with the inner frame membrane jig 36 .

本実施形態において、電解液は、例えば、被処理物Cの表面Eに析出される金属をイオンの状態で含有している液体であり、含有される金属は、例えば、銅、金、銀、ニッケル等が挙げられる。電解液は、これらの金属をイオン化したものであり、公知の各種の電解液を用いることができる。なお、電解液は、ここに例示したものに限定されるものではない。 In the present embodiment, the electrolytic solution is, for example, a liquid containing the metal deposited on the surface E of the object to be processed C in an ion state, and the contained metal is, for example, copper, gold, silver, Nickel etc. are mentioned. The electrolytic solution is obtained by ionizing these metals, and various known electrolytic solutions can be used. Note that the electrolytic solution is not limited to those exemplified here.

載置基台2は、支持基台8とハウジング4との間に配置されており、被処理物Cをその表面に載置可能に構成されている。本実施形態では、表面処理装置1が、被処理物Cを嵌め込むことが可能なトレイ9を有すると共に、載置基台2がトレイ9を嵌め込むことが可能な凹部を有しているが、トレイ9を介さずに被処理物Cを載置基台2に嵌め込む構成や、被処理物Cを単に載置基台2上に載置させる構成であってもよい。 The mounting base 2 is arranged between the supporting base 8 and the housing 4, and is configured so that the object to be processed C can be mounted on its surface. In this embodiment, the surface treatment apparatus 1 has the tray 9 into which the workpiece C can be fitted, and the mounting base 2 has a concave portion into which the tray 9 can be fitted. A configuration in which the object C to be processed is fitted onto the mounting base 2 without interposing the tray 9 or a configuration in which the object C to be processed is simply mounted on the mounting base 2 may be employed.

載置基台2及びトレイ9は、被処理物Cを載置した際に、被処理物Cに接続する電極部(図示せず)を有する。載置基台2及びトレイ9の電極部、ひいては、被処理物Cは、電源部7の負極(-極)に接続されている。これにより、被処理物Cは、表面処理装置1における陰極を構成する。 The mounting base 2 and the tray 9 have electrode portions (not shown) that are connected to the object to be processed C when the object to be processed C is placed thereon. The electrode portions of the mounting base 2 and the tray 9 and, in turn, the workpiece C are connected to the negative electrode (− electrode) of the power source portion 7 . Thereby, the object C to be processed constitutes a cathode in the surface treatment apparatus 1 .

ハウジング4は、載置基台2の鉛直方向の上方に配置されており、内部上面と内部側面とを有する液室3を構成する有底筒状(有底円筒状、有底角筒状等)に形成されている。有底筒状の開口部には、矩形状のイオン伝導膜6及び第1膜保護部材60が取り付けられている。ハウジング4は、ハウジング4の壁面を貫通して形成され、液室3内の気体を排出可能な排出流路31と、液室3に対して電解液を供給可能な供給流路41と、ハウジング4を載置基台2に嵌合させるためのクランプ部39とを含む。 The housing 4 is disposed above the mounting base 2 in the vertical direction, and has a bottomed cylindrical shape (a bottomed cylindrical shape, a bottomed rectangular shape, etc.) that constitutes the liquid chamber 3 having an inner upper surface and an inner side surface. ). A rectangular ion conductive membrane 6 and a first membrane protection member 60 are attached to the bottomed cylindrical opening. The housing 4 is formed through a wall surface of the housing 4, and includes a discharge passage 31 capable of discharging the gas in the liquid chamber 3, a supply passage 41 capable of supplying the electrolyte to the liquid chamber 3, and a housing. 4 and a clamp portion 39 for fitting the mounting base 2 to the mounting base 2 .

また、ハウジング4は、排出流路31の外壁面にハウジング4の側面から突出するように加圧機構30が設けられている。さらに、ハウジング4には、供給流路41を開閉させる流路開閉弁40が設けられている。流路開閉弁40は、給排ポートを有する。ハウジング4は、上記のように載置基台2と対向配置されると共に、例えば、移動機構5によって載置基台2側へ移動された状態のときに、載置基台2との間に閉鎖空間となる液室3を形成可能に構成されている。 Further, the housing 4 is provided with a pressurizing mechanism 30 protruding from the side surface of the housing 4 on the outer wall surface of the discharge passage 31 . Further, the housing 4 is provided with a channel opening/closing valve 40 for opening and closing the supply channel 41 . The channel opening/closing valve 40 has a supply/discharge port. The housing 4 is arranged to face the mounting base 2 as described above, and is positioned between the mounting base 2 and the mounting base 2 when moved toward the mounting base 2 by the moving mechanism 5, for example. It is configured to be able to form a liquid chamber 3 that serves as a closed space.

なお、本実施形態では、ハウジング4の上部の上面全体に上ヒータ55及び絶縁部材55aを設け、載置基台2の内部に下ヒータ56を設けてあるが、被処理物Cへの表面処理の種類によっては設けなくてもよい。 In this embodiment, the upper heater 55 and the insulating member 55a are provided over the entire upper surface of the housing 4, and the lower heater 56 is provided inside the mounting base 2. may not be provided depending on the type of

加圧機構30は、排出流路31に接続されており、排出流路31を開閉する開閉弁を有する。加圧機構30は、排出流路31を開閉可能に構成されると共に、液室3内に供給された電解液を加圧可能に構成されている。加圧機構30は、載置基台2とハウジング4との間において開閉弁が閉じられたときに形成される液室3の閉鎖空間の容積を減少させ、閉鎖空間内ひいては電解液を加圧する。 The pressurizing mechanism 30 is connected to the discharge channel 31 and has an on-off valve that opens and closes the discharge channel 31 . The pressurizing mechanism 30 is configured to be able to open and close the discharge channel 31 and is configured to be capable of pressurizing the electrolytic solution supplied into the liquid chamber 3 . The pressurizing mechanism 30 reduces the volume of the closed space of the liquid chamber 3 formed when the on-off valve is closed between the mounting base 2 and the housing 4, and pressurizes the closed space and the electrolytic solution. .

クランプ部39は、クランプ部39と載置基台2とが嵌合した状態において、載置基台2とイオン伝導膜6との間の下方空間の空気を排気(好適には真空排気)するための排気手段が設けられている。排気手段は、上記の下方空間を減圧するために開閉される開閉弁47を有する。開閉弁47は、上記の下方空間に開口すると共にクランプ部39の下方に連通する減圧流路48の外側に配置されるように設けられている。また、クランプ部39は、第1膜保護部材60を取り付け可能に構成されている。 The clamp part 39 evacuates (preferably evacuates) the air in the lower space between the mounting base 2 and the ion conductive film 6 in a state where the clamping part 39 and the mounting base 2 are fitted to each other. An exhaust means is provided for. The exhaust means has an on-off valve 47 that is opened and closed to reduce the pressure in the lower space. The on-off valve 47 is provided so as to be arranged outside a decompression flow path 48 that opens into the above-mentioned lower space and communicates with the lower side of the clamp portion 39 . Moreover, the clamp part 39 is configured to be able to attach the first film protection member 60 .

減圧流路48は、液室3(イオン伝導膜6の上方空間)に連通する減圧流路、流路開閉弁及びバイパス流路(いずれも図示せず)を介して接続されている。バイパス流路は、減圧用の真空ポンプ等を有する減圧ユニット(図示せず)が接続されている。このような減圧系の回路は、加圧機構30や流路開閉弁40等の溶液供給系の回路とは別回路で設けられている。 The decompression channel 48 is connected via a decompression channel communicating with the liquid chamber 3 (the space above the ion conductive membrane 6), a channel opening/closing valve, and a bypass channel (all not shown). A decompression unit (not shown) having a decompression vacuum pump or the like is connected to the bypass channel. Such a decompression system circuit is provided as a separate circuit from the solution supply system circuit such as the pressurization mechanism 30 and the channel opening/closing valve 40 .

電極20は、金属板であり、任意の金属材料(例えば、銅等)で構成されている。電極20は、ハウジング4の内部上面から吊り下げられており、電極20底部23がイオン伝導膜6の直上に位置するように液室3内に配置されている。 The electrode 20 is a metal plate and is made of any metal material (for example, copper or the like). The electrode 20 is suspended from the inner upper surface of the housing 4 and arranged in the liquid chamber 3 so that the bottom portion 23 of the electrode 20 is positioned directly above the ion conductive membrane 6 .

電極20は、ハウジング4を介して、電源部7の正極(+極)に接続されている。このような構成を備えることにより、電極20は、表面処理装置1における陽極を構成する。なお、電極20は、金属板に限定されず、液室3内の電解液に浸かる位置に配置され得るものであれば、種々の構成(例えば、任意形状の金属が入っている籠状部材等)、配置態様を採用可能である。 The electrode 20 is connected to the positive electrode (+ electrode) of the power supply section 7 through the housing 4 . By having such a configuration, the electrode 20 constitutes the anode in the surface treatment apparatus 1 . In addition, the electrode 20 is not limited to a metal plate, and may have various configurations as long as it can be arranged at a position where it is immersed in the electrolytic solution in the liquid chamber 3 (for example, a cage-like member containing metal of arbitrary shape, etc.). ), arrangement mode can be adopted.

電源部7は、陽極となる電極20と陰極となる被処理物Cとの間に電圧を印加する。 The power supply unit 7 applies a voltage between the electrode 20 as an anode and the workpiece C as a cathode.

移動機構5は、図1Cに示すように、載置基台2及びハウジング4の少なくとも一方を他方に対して接近又は離間する方向に相対移動させる。具体的には、移動機構5は、直動ロッド51を有し、直動ロッド51によってハウジング4を昇降させることにより、ハウジング4を載置基台2に対して接近又は離間させるように構成されている。 As shown in FIG. 1C, the moving mechanism 5 relatively moves at least one of the mounting base 2 and the housing 4 toward or away from the other. Specifically, the moving mechanism 5 has a direct-acting rod 51 and is configured to move the housing 4 up and down with the direct-acting rod 51 to move the housing 4 closer to or away from the mounting base 2 . ing.

また、移動機構5は、ハウジング4が載置基台2に対して最も離間された上昇端位置(原位置:図1A参照)と、ハウジング4及び載置基台2の間に液室3を形成すると共に、該液室3及びイオン伝導膜6の下部に載置基台2とクランプ部39とが嵌合して形成される下方空間の減圧を実行する減圧位置と、該減圧位置よりも更にハウジング4を載置基台2に接近させて表面処理を実行する処理位置(図1B参照)との少なくとも3か所において、ハウジング4を停止させることが可能に構成されている。 Further, the moving mechanism 5 moves the liquid chamber 3 between the upper end position (original position: see FIG. 1A) where the housing 4 is farthest from the mounting base 2 and the housing 4 and the mounting base 2 . a decompression position for decompressing the lower space formed by fitting the mounting base 2 and the clamp portion 39 under the liquid chamber 3 and the ion conductive film 6; Further, the housing 4 can be stopped at at least three positions including the processing position (see FIG. 1B) where the housing 4 is brought closer to the mounting base 2 to perform surface processing.

なお、本実施形態において、移動機構5は、ハウジング4を載置基台2に対して接近又は離間させるが、これに限定されない。また、移動機構5は、上述した直動ロッド51を備える構成に限定されず、ハウジング4を載置基台2に対して接近又は離間させることが可能な構成であれば、任意の構成を採用することが可能である。 In addition, in the present embodiment, the moving mechanism 5 moves the housing 4 closer to or away from the mounting base 2, but is not limited to this. Further, the moving mechanism 5 is not limited to the configuration including the direct-acting rod 51 described above, and any configuration can be adopted as long as the configuration allows the housing 4 to approach or separate from the mounting base 2. It is possible to

第1膜保護部材60は、図2に示すように、イオン伝導膜6を支持する第1膜支持部63と、第1膜支持部63を支持する第1枠部61とを含む。また、第1膜保護部材60は、被処理物Cの非処理部分を被覆するための被覆部64を更に含む。第1膜保護部材60は、図1Aに示すように、ハウジング4の下部(クランプ部39)に取り付けられている。 The first membrane protection member 60 includes a first membrane support portion 63 that supports the ion conductive membrane 6 and a first frame portion 61 that supports the first membrane support portion 63, as shown in FIG. Moreover, the first film protection member 60 further includes a covering portion 64 for covering the untreated portion of the object C to be treated. The first film protection member 60 is attached to the lower portion (clamp portion 39) of the housing 4, as shown in FIG. 1A.

第1枠部61は、図2に示すように、矩形状の平板であり、中央に被処理物Cの表面Eよりも大きい開口62が設けられている。本実施形態において、第1枠部61は、ステンレス鋼で構成されているが、これに限定されず、耐薬品性があり、変形しづらいものであれば、種々の任意の構成を採用可能である。 As shown in FIG. 2, the first frame portion 61 is a rectangular flat plate, and has an opening 62 in the center which is larger than the surface E of the object C to be processed. In the present embodiment, the first frame portion 61 is made of stainless steel, but it is not limited to this, and various arbitrary configurations can be adopted as long as they have chemical resistance and are difficult to deform. be.

第1膜支持部63は、多孔部材であり、開口部から、イオン伝導膜6を通過した金属イオンが通過できる。具体的には、第1膜支持部63は、矩形状かつ網状のメッシュ材料であり、第1枠部61と同形同大に形成されている。第1膜支持部63の開口部大きさは、開口部上に配されるイオン伝導膜6が、電解液の圧力により過大な変形をしない程度であることが好ましいがこれに限定されない。第1膜支持部63としては、例えば、ステンレスメッシュ等の金属メッシュや、ポリエステルメッシュ等の合成繊維メッシュを採用可能である。 The first membrane supporting portion 63 is a porous member, and metal ions that have passed through the ion conductive membrane 6 can pass through the opening. Specifically, the first film supporting portion 63 is a rectangular mesh material, and is formed to have the same shape and size as the first frame portion 61 . The size of the opening of the first membrane supporting portion 63 is preferably such that the ion conductive membrane 6 arranged on the opening is not excessively deformed by the pressure of the electrolytic solution, but is not limited thereto. As the first film supporting portion 63, for example, a metal mesh such as a stainless steel mesh or a synthetic fiber mesh such as a polyester mesh can be used.

金属メッシュを採用する場合、合成繊維メッシュよりもメッシュの粗さを細かくできるため、イオン伝導膜6にかかる力をより分散可能であり、また、後述する被覆部64のパターンを微細化できる。さらに、金属メッシュは、合成繊維メッシュと比較して高剛性であるため、加圧時の変形が小さく、後述する被覆部64で覆われていないメッシュ部分が被処理物Cの表面Eと接触しにくい。なお、金属メッシュを採用する場合、第1膜支持部63の表面がめっき処理されることを防ぐために、表面が絶縁処理されていることが好ましい。 When using a metal mesh, the mesh can be made finer than the synthetic fiber mesh, so the force applied to the ion conductive membrane 6 can be more dispersed, and the pattern of the coating portion 64, which will be described later, can be made finer. Furthermore, since the metal mesh has a higher rigidity than the synthetic fiber mesh, deformation during pressurization is small, and the mesh portion not covered with the coating portion 64 described later contacts the surface E of the object C to be processed. Hateful. When using a metal mesh, it is preferable that the surface of the first film supporting portion 63 is insulated in order to prevent the surface from being plated.

一方で、合成繊維メッシュを採用する場合、絶縁体のため、第1膜支持部63の表面がめっき処理されないという利点がある。また、耐薬品性を有する合成繊維であれば、金属メッシュでは化学反応を起こす電解液であっても使用可能である。 On the other hand, when the synthetic fiber mesh is adopted, there is an advantage that the surface of the first membrane supporting portion 63 is not plated because it is an insulator. In addition, as long as the synthetic fiber has chemical resistance, even an electrolytic solution that causes a chemical reaction with a metal mesh can be used.

なお、第1膜支持部63は、メッシュ(網状)に限定されず、他の多孔部材であってもよい。例えば、第1膜支持部63は、格子状や、ドット状の開口を有する部材であってもよいし、多孔質フィルムや、多孔質板等の無秩序な細孔を有する形状であってもよい。 In addition, the first film supporting portion 63 is not limited to a mesh (net-like), and may be another porous member. For example, the first film supporting portion 63 may be a member having lattice-like or dot-like openings, or may have a shape having disordered pores such as a porous film or a porous plate. .

第1膜支持部63は、図4に示すように、第1枠部61の上面(ハウジング4側)に取り付けられており、第1膜支持部63の第1枠部61の周縁部と重なる部分(第1膜支持部63の周縁部)は、第1枠部61の周縁部に接着されている。また、第1膜支持部63は、被覆部64によって表面が絶縁処理されている。 As shown in FIG. 4 , the first membrane support portion 63 is attached to the upper surface (housing 4 side) of the first frame portion 61 and overlaps the peripheral edge portion of the first frame portion 61 of the first membrane support portion 63 . A portion (peripheral portion of the first membrane support portion 63 ) is adhered to the peripheral portion of the first frame portion 61 . The surface of the first film supporting portion 63 is insulated by the covering portion 64 .

さらに、第1膜支持部63の周縁部及び第1枠部61の周縁部は、液室3内の電解液による腐食を防ぐと共に、電圧印加時に通電することを防ぐために絶縁処理が施されている。具体的には、図3及び図4に示すように、第1膜支持部63の周縁部及び第1枠部61の周縁部は、耐薬品性及び絶縁性を有する保護フィルム66で覆われている。 Furthermore, the peripheral edge of the first membrane supporting portion 63 and the peripheral edge of the first frame portion 61 are subjected to insulation treatment to prevent corrosion due to the electrolyte in the liquid chamber 3 and to prevent energization during voltage application. there is Specifically, as shown in FIGS. 3 and 4, the peripheral edge portion of the first membrane support portion 63 and the peripheral edge portion of the first frame portion 61 are covered with a protective film 66 having chemical resistance and insulating properties. there is

被覆部64は、図4に示すように、第1膜支持部63の被処理物Cとの対向面に設けられている。具体的には、被覆部64は、感光性の樹脂材料(乳剤)であり、第1膜支持部63の被処理物C側の面に薄膜上に塗布されている。また、被覆部64は、撥水加工が施されており、これにより撥水性を有する。被覆部64の厚みは、第1膜支持部63が直接被処理物Cの表面Eに触れない程度の厚みが好ましい。本実施形態において、被覆部64は、表面処理により被処理物Cの表面Eに形成される金属被膜よりも厚いが、これに限定されない。被覆部64が金属被膜よりも厚い場合、形成される金属被膜に第1膜支持部63が干渉し、金属被膜に第1膜時支部の網目模様が入ることを防止できる。 As shown in FIG. 4, the covering portion 64 is provided on the surface of the first film supporting portion 63 facing the object C to be processed. Specifically, the covering portion 64 is a photosensitive resin material (emulsion), and is applied on a thin film on the surface of the first film supporting portion 63 on the object C side. In addition, the covering portion 64 is subjected to a water-repellent treatment, and thus has water repellency. The thickness of the covering portion 64 is preferably such that the first film supporting portion 63 does not directly touch the surface E of the object C to be processed. In this embodiment, the coating portion 64 is thicker than the metal coating formed on the surface E of the workpiece C by the surface treatment, but is not limited to this. When the covering portion 64 is thicker than the metal film, the first film support portion 63 interferes with the formed metal film, and the mesh pattern of the first film support portion can be prevented from entering the metal film.

また、被覆部64は、図2に示すように、露光・現像処理により、被処理物Cの表面Eの処理部分を選択的に表面処理するためのパターンが形成されている。そのため、第1膜支持部63の被覆部64のパターンと重なる部分は、被覆部64により被覆されていない。このような構成を備えることにより、表面処理装置1は、被処理物Cの表面Eの被覆部64により被覆されていない処理部分だけを選択的に表面処理することができる。 In addition, as shown in FIG. 2, the covering portion 64 is formed with a pattern for selectively surface-treating the treated portion of the surface E of the object C by exposure and development. Therefore, the portion of the first film supporting portion 63 that overlaps the pattern of the covering portion 64 is not covered with the covering portion 64 . With such a configuration, the surface treatment apparatus 1 can selectively surface-treat only the part of the surface E of the object C to be treated that is not covered by the covering portion 64 .

なお、第1膜保護部材60は、被覆部64の被処理物C側に通電部65が更に設けられてもよい。通電部65は、銅、金、銀、ステンレス鋼、チタン等の導電性を有する金属材料により構成されており、電源部7と被処理物Cの表面Eとを導通するように、被処理物Cの表面Eの一部に接触可能に配置される。本実施形態において、通電部65は、載置基台2及びトレイ9の電極部と、被処理物Cの非処理部分とに接続するように配置されている。 The first film protection member 60 may be further provided with a current-carrying portion 65 on the side of the workpiece C of the covering portion 64 . The current-carrying part 65 is made of a conductive metal material such as copper, gold, silver, stainless steel, or titanium. It is arranged so as to be able to contact a part of the surface E of C. In this embodiment, the current-carrying part 65 is arranged so as to be connected to the electrode part of the mounting base 2 and the tray 9 and the non-processed portion of the object C to be processed.

なお、通電部65は、図8に示すように、被覆部64の被処理物C側の表面上に配置されてもよいし、図9に示すように、被覆部64の被処理物C側の面に埋め込まれてもよい。さらに、本実施形態において、通電部65は箔状部材であり、被覆部64に接着剤を介して取り付けられるが、これに限定されない。例えば、被覆部64に金属粒子を塗布することで通電部65を形成してもよい。 8, the conducting portion 65 may be arranged on the surface of the covering portion 64 on the side of the object C to be treated, or as shown in FIG. may be embedded in the face of Furthermore, in the present embodiment, the conducting portion 65 is a foil member and is attached to the covering portion 64 via an adhesive, but the present invention is not limited to this. For example, the conducting portion 65 may be formed by applying metal particles to the covering portion 64 .

イオン伝導膜6は、数μm~数百μm(例えば、5~450μm)の膜厚で形成された枚葉状の薄膜部材である。イオン伝導膜6は、例えば、多孔質膜、固体電解質膜等が挙げられ、ポリエチレンや、ポリプロピレン、炭化水素系樹脂、フッ素系樹脂等の樹脂を用いることができる。なお、イオン伝導膜6は、液室3内に供給された電解液に接触することで、電解液中の金属イオンを含浸し、電源部7により電圧を印加した際に金属イオン由来の金属を被処理物Cの表面Eに析出可能なものであれば、これらに限定されない。 The ion-conducting membrane 6 is a leaf-shaped thin film member formed with a thickness of several μm to several hundred μm (for example, 5 to 450 μm). Examples of the ion conductive membrane 6 include porous membranes and solid electrolyte membranes, and resins such as polyethylene, polypropylene, hydrocarbon-based resins, and fluorine-based resins can be used. The ion conductive film 6 is impregnated with the metal ions in the electrolyte by coming into contact with the electrolyte supplied into the liquid chamber 3 , and when a voltage is applied by the power supply unit 7 , the metal derived from the metal ions is transferred to the ion conductive film 6 . The material is not limited to these as long as it can be deposited on the surface E of the object C to be processed.

イオン伝導膜6は、保持治具35の内枠膜治具36及び外枠膜治具37の間に挟持されている。イオン伝導膜6は、内枠膜治具36及び外枠膜治具37で挟持することにより、均一に張られた状態で保持されている。内枠膜治具36及び外枠膜治具37は、ハウジング4の下部に取り付けられており、イオン伝導膜6は、液室3内に配置された電極20の直下に配置されている。 The ion conductive membrane 6 is sandwiched between the inner frame membrane jig 36 and the outer frame membrane jig 37 of the holding jig 35 . The ion conductive membrane 6 is held in a uniformly stretched state by being sandwiched between the inner frame membrane jig 36 and the outer frame membrane jig 37 . The inner frame membrane jig 36 and the outer frame membrane jig 37 are attached to the lower part of the housing 4 , and the ion conductive membrane 6 is arranged directly below the electrode 20 arranged in the liquid chamber 3 .

なお、イオン伝導膜6の取付は、イオン伝導膜6を弛みなく張ることができる構成であれば、上述した構成に限定されない。例えば、図6に示すように、第1膜保護部材60の第1膜支持部63が、イオン伝導膜6の被処理物Cとの対向面に接着されている構成等が挙げられる。このような構成を備えることにより、保持治具35を使用せずにイオン伝導膜6を保持することができるため、装置の小型化が可能である。また、電解液の自重や、イオン伝導膜6の膨潤により、イオン伝導膜6が弛むことを防止できる。 It should be noted that the attachment of the ion conductive film 6 is not limited to the configuration described above as long as the ion conductive film 6 can be stretched without slack. For example, as shown in FIG. 6, the first membrane support portion 63 of the first membrane protection member 60 may be adhered to the surface of the ion conductive membrane 6 facing the object C to be processed. With such a configuration, the ion conductive membrane 6 can be held without using the holding jig 35, so that the size of the device can be reduced. In addition, it is possible to prevent the ion conductive membrane 6 from loosening due to the weight of the electrolyte or swelling of the ion conductive membrane 6 .

また、表面処理装置1は、図7に示すように、イオン伝導膜6の液室3側に配された第2膜保護部材70を更に備えてもよい。具体的には、第2膜保護部材70は、イオン伝導膜6と対向して設けられ、液室3内の電解液を通過可能な第2膜支持部73と、第2膜支持部73を支持する第2枠部71とを含んでいる。第2膜保護部材70は、保持治具35の内枠膜治具36を介してイオン伝導膜6の上方に取り付けられている。この場合、第1膜保護部材60は、保持治具35の外枠膜治具37を介してハウジング4の下部に取り付けられてもよいし、クランプ部39に取り付けられてもよい。 The surface treatment apparatus 1 may further include a second membrane protection member 70 arranged on the liquid chamber 3 side of the ion conductive membrane 6, as shown in FIG. Specifically, the second membrane protection member 70 is provided facing the ion conductive membrane 6, and includes a second membrane support portion 73 through which the electrolytic solution in the liquid chamber 3 can pass, and the second membrane support portion 73. and a supporting second frame portion 71 . The second membrane protection member 70 is attached above the ion conductive membrane 6 via the inner frame membrane jig 36 of the holding jig 35 . In this case, the first membrane protection member 60 may be attached to the lower portion of the housing 4 via the outer frame membrane jig 37 of the holding jig 35 or may be attached to the clamp portion 39 .

第2枠部71は、第1膜保護部材60の第1枠部61と同様に開口が設けられている。第2膜支持部73は、第1膜支持部63と同様に多孔部材であるが、これに限定されず、電解液が第2膜支持部73の液室3側からイオン伝導膜6側に通過可能な構成であれば、種々の任意の構成を採用可能である。 The second frame portion 71 is provided with an opening like the first frame portion 61 of the first film protection member 60 . The second membrane support part 73 is a porous member like the first membrane support part 63, but is not limited to this. Various arbitrary configurations can be adopted as long as they can pass through.

第2膜保護部材70を更に備える場合、イオン伝導膜6は、第1膜保護部材60の第1膜支持部63と第2膜保護部材70の第2膜支持部73との間に挟まれている。このような構成を備えることにより、イオン伝導膜6が両面から支持され、イオン伝導膜6の破損をより防ぐことができる。また、第2膜支持部73は、イオン伝導膜6の液室側の面に接着されてもよい。 When the second membrane protection member 70 is further provided, the ion conductive membrane 6 is sandwiched between the first membrane support portion 63 of the first membrane protection member 60 and the second membrane support portion 73 of the second membrane protection member 70. ing. With such a configuration, the ion-conducting membrane 6 is supported from both sides, and breakage of the ion-conducting membrane 6 can be further prevented. Further, the second membrane supporting portion 73 may be adhered to the liquid chamber side surface of the ion conductive membrane 6 .

以上の構成を備える表面処理装置1は、電極20と被処理物Cとの間に電圧を印加することで、イオン伝導膜6及び第1膜支持部63を介した電気分解により被処理物Cの表面Eを処理する。 By applying a voltage between the electrode 20 and the object C to be treated, the surface treatment apparatus 1 having the configuration described above electrolyzes the object C to be treated through the ion conductive film 6 and the first film supporting portion 63 . to treat the surface E of

[表面処理方法の説明]
本実施形態に係る表面処理装置1を用いた表面処理方法について図5を参照して説明する。図5は、本実施形態に係る表面処理装置1を用いた表面処理手順の一例を示すフローチャートである。本実施形態に係る表面処理方法は、概略的には、電極20と被処理物Cとの間にイオン伝導膜6を配置し、電極20と被処理物Cとの間に電圧を印加することで、イオン伝導膜6を介した液室3内の電解液の電気分解により被処理物Cの表面Eを処理する表面処理方法であって、膜保護部材によりイオン伝導膜6の被処理物Cとの対向面を支持した状態で表面処理を行う。
[Description of surface treatment method]
A surface treatment method using the surface treatment apparatus 1 according to this embodiment will be described with reference to FIG. FIG. 5 is a flow chart showing an example of a surface treatment procedure using the surface treatment apparatus 1 according to this embodiment. Schematically, the surface treatment method according to the present embodiment comprises disposing the ion conductive film 6 between the electrode 20 and the object C to be treated, and applying a voltage between the electrode 20 and the object C to be treated. is a surface treatment method for treating the surface E of the object C to be treated by electrolysis of the electrolytic solution in the liquid chamber 3 through the ion conductive film 6, wherein the object C to be treated of the ion conductive film 6 is protected by the film protection member. The surface treatment is performed while supporting the surface facing the .

また、本実施形態に係る表面処理方法は、膜保護部材によりイオン伝導膜6の被処理物Cとの対向面を支持した状態で液室3に電解液を収容し、該液室3に該電解液を収容した状態でイオン伝導膜6を被処理物Cに対し接近及び離間させる。 Further, in the surface treatment method according to the present embodiment, the electrolytic solution is accommodated in the liquid chamber 3 in a state in which the surface of the ion conductive film 6 facing the object C to be treated is supported by the film protection member, The ion-conducting membrane 6 is moved toward and away from the object C to be processed while containing the electrolytic solution.

本実施形態に係る表面処理方法は、ハウジング4を載置基台2に接近させる接近工程と、イオン伝導膜6と被処理物Cの間の空間を減圧する減圧工程と、第1膜保護部材60の被覆部64と被処理物Cの表面Eを接触させる当接工程と、液室3内を加圧する加圧工程と、加圧工程後に、電極20と被処理物Cとの間に電圧を印加する電圧印加工程と、ハウジング4を載置基台2から離間させる離間工程とを備える。 The surface treatment method according to the present embodiment includes an approaching step of bringing the housing 4 closer to the mounting base 2, a depressurizing step of depressurizing the space between the ion conductive film 6 and the workpiece C, and a first film protecting member. A contact step of bringing the coating portion 64 of the 60 into contact with the surface E of the object C to be processed, a pressurizing step of pressurizing the inside of the liquid chamber 3, and a voltage between the electrode 20 and the object C to be processed after the pressurizing step. and a separating step of separating the housing 4 from the mounting base 2 .

また、表面処理方法は、液室3内に電解液を注入する給液工程と、液室3内の電解液を排出する排液工程とを更に備える。以下この方法について詳述する。 Moreover, the surface treatment method further includes a liquid supply step of injecting the electrolytic solution into the liquid chamber 3 and a liquid draining step of discharging the electrolytic solution from the liquid chamber 3 . This method will be described in detail below.

まず、表面処理の前段階として、ハウジング4が載置基台2と離間した状態(原位置:図1A参照)において、ユーザによってハウジング4に、イオン伝導膜6と、表面処理のパターンに合わせた被覆部64を有する第1膜保護部材60とがセットされる。その後、移動機構5によって、ハウジング4を下降させると共に、ハウジング4のクランプ部39と、載置基台2とを嵌合させる。 First, as a preliminary stage of surface treatment, in a state in which the housing 4 is separated from the mounting base 2 (original position: see FIG. 1A), the ion conductive film 6 is attached to the housing 4 by the user according to the surface treatment pattern. A first film protection member 60 having a covering portion 64 is set. After that, the housing 4 is lowered by the moving mechanism 5 and the clamp portion 39 of the housing 4 and the mounting base 2 are fitted.

次に、イオン伝導膜6を第1膜保護部材60の第1膜支持部63により支持した状態で、外部の溶液供給部から供給流路41を介して電解液を液室3内に注入する(図5のS1:給液工程)。液室3の内部を電解液で満たしていくと、液室3の内部に残留している空気は、加圧機構30の接続流路である排出流路31から、溶液供給部に排気される。電解液の注入をさらに続けると、液室3の内部は常圧の電解液で完全に満たされる。 Next, while the ion conductive membrane 6 is supported by the first membrane supporting portion 63 of the first membrane protecting member 60, an electrolytic solution is injected into the liquid chamber 3 from an external solution supplying portion through the supply channel 41. (S1 in FIG. 5: liquid supply step). When the inside of the liquid chamber 3 is filled with the electrolytic solution, the air remaining inside the liquid chamber 3 is discharged from the discharge channel 31, which is the connection channel of the pressurizing mechanism 30, to the solution supply part. . As the injection of the electrolytic solution is continued, the inside of the liquid chamber 3 is completely filled with the electrolytic solution at normal pressure.

液室3内が電解液で満たされた後、移動機構5によって、ハウジング4を原位置まで上昇させることで、ハウジング4を載置基台2から離間する。ハウジング4が原位置に戻った後に、載置基台2上に、被処理物Cを載置したトレイがセットされる。これにより表面処理の準備が完了する。 After the inside of the liquid chamber 3 is filled with the electrolytic solution, the housing 4 is moved up to the original position by the moving mechanism 5 , thereby separating the housing 4 from the mounting base 2 . After the housing 4 returns to its original position, the tray on which the workpiece C is placed is set on the placement base 2 . This completes the preparation for surface treatment.

準備完了後、再び移動機構5によって、ハウジング4を上記の減圧位置まで下降させ、ハウジング4のクランプ部39と、被処理物Cを載置した載置基台2とを嵌合する(図5のS2:接近工程)。このとき、クランプ部39と載置基台2との嵌合位置は、第1膜支持部63が被処理物Cの表面Eと可能な限り近づいた状態となる位置に設定される。被処理物Cは、載置基台2とイオン伝導膜6との間に形成される下方空間内に密閉され、液室3とは隔てられている。 After completion of the preparation, the housing 4 is lowered to the decompressed position again by the moving mechanism 5, and the clamp portion 39 of the housing 4 and the mounting base 2 on which the workpiece C is mounted are fitted (FIG. 5). S2: approaching step). At this time, the fitting position between the clamp part 39 and the mounting base 2 is set to a position where the first film supporting part 63 is as close to the surface E of the workpiece C as possible. The object to be processed C is hermetically sealed in a lower space formed between the mounting base 2 and the ion conductive film 6 and separated from the liquid chamber 3 .

次に、ハウジング4のクランプ部39と、被処理物Cを載置した載置基台2とを嵌合させた状態で、クランプ部39に設けられた開閉弁47を開状態にすると共に、上述した減圧系の流路開閉弁を開状態にして、減圧流路48と図示しない減圧流路をバイパス流路を介して連通させ、下方空間を減圧する(図5のS3:減圧工程)。 Next, in a state in which the clamp portion 39 of the housing 4 and the mounting base 2 on which the object to be processed C is placed are fitted, the on-off valve 47 provided in the clamp portion 39 is opened, and By opening the above-described flow passage opening/closing valve of the decompression system, the decompression flow passage 48 and the decompression flow passage (not shown) are communicated with each other through the bypass flow passage, and the lower space is decompressed (S3 in FIG. 5: decompression step).

そして、減圧状態を継続したまま、ハウジング4のクランプ部39を載置基台2に完全嵌合させるべく、移動機構5によってハウジング4を上述の処理位置まで下降させ、第1膜保護部材60の被覆部64を被処理物Cの表面Eに接触させる(図5のS4:当接工程)。 Then, while maintaining the depressurized state, the moving mechanism 5 lowers the housing 4 to the above-described processing position so that the clamp portion 39 of the housing 4 is completely fitted to the mounting base 2, and the first membrane protection member 60 is moved. The covering portion 64 is brought into contact with the surface E of the object to be processed C (S4 in FIG. 5: contact step).

次に、ハウジング4の外部側面に設けられた加圧機構30によって、液室3内の電解液を加圧する(図5のS5:加圧工程)。この加圧工程により、被覆部64と、被処理物Cの表面Eとが密着し、被腹部64が、被覆機能を発揮する。そして、液室3内の電解液が加圧されている状態で、電源部7によって、電極20と被処理物Cとの間に電圧を印加する(図5のS6:電圧印加工程)。これにより、被処理物Cの表面Eの処理部分に、金属イオンを析出させて金属の被膜を形成する表面処理を実行する。 Next, the electrolytic solution in the liquid chamber 3 is pressurized by the pressurizing mechanism 30 provided on the outer side surface of the housing 4 (S5 in FIG. 5: pressurizing step). By this pressurizing step, the covering portion 64 and the surface E of the object to be processed C are brought into close contact with each other, and the portion 64 to be treated exhibits a covering function. Then, while the electrolytic solution in the liquid chamber 3 is pressurized, the power supply unit 7 applies a voltage between the electrode 20 and the workpiece C (S6 in FIG. 5: voltage application step). As a result, a surface treatment is performed in which metal ions are deposited on the treated portion of the surface E of the object C to form a metal coating.

本実施形態において、イオン伝導膜6と被処理物Cの表面Eとは直接接触しないが、イオン伝導膜6の上方空間と下方空間の差圧により、イオン伝導膜6から電解液が染み出し、被処理物Cの表面E上を満たすと共に、被処理物Cの処理部分に金属被膜が形成される。 In the present embodiment, the ion conductive membrane 6 and the surface E of the object C to be processed do not come into direct contact with each other, but due to the differential pressure between the space above and below the ion conductive membrane 6, the electrolytic solution seeps out from the ion conductive membrane 6, While filling the surface E of the object C to be processed, a metal film is formed on the part of the object C to be processed.

なお、ハウジング4に液室3の内部の圧力を計測可能な圧力センサを設置し、この計測値を基に、加圧機構30による作動空気圧力を制御すれば、電解液を所望の圧力に加圧制御することが可能である。この状態を所定の時間保持し、所定の電圧印加時間が経過すれば、表面処理が完了する。 If a pressure sensor capable of measuring the pressure inside the liquid chamber 3 is installed in the housing 4 and the working air pressure of the pressurizing mechanism 30 is controlled based on the measured value, the electrolytic solution can be pressurized to a desired pressure. It is possible to control the pressure. This state is maintained for a predetermined time, and the surface treatment is completed when the predetermined voltage application time elapses.

表面処理完了後、移動機構5によって、ハウジング4を原位置まで上昇させることで、ハウジング4を載置基台2から離間する(図5のS7:離間工程)。ハウジング4が原位置に移動した後、被処理物Cが載置されたトレイ9を載置基台2から取り出す。 After the surface treatment is completed, the housing 4 is lifted to the original position by the moving mechanism 5, thereby separating the housing 4 from the mounting base 2 (S7 in FIG. 5: separation step). After the housing 4 is moved to the original position, the tray 9 on which the object C to be processed is placed is taken out from the mounting base 2 .

複数の被処理物Cに同一パターンの表面処理を連続して実施する場合(図5のS8にてYES)、新たな被処理物Cをセットし、再び接近工程から離間工程までを繰り返す。表面処理を繰り返し行い、電解液の交換が必要となった場合、当接工程(図5のS4)の後、ハウジング4のクランプ部39と、載置基台2とを嵌合させた状態において、液室3内の電解液を循環させる。 When the same pattern of surface treatment is to be continuously performed on a plurality of workpieces C (YES in S8 of FIG. 5), a new workpiece C is set, and the steps from the approaching step to the separating step are repeated again. When the surface treatment is repeated and the electrolytic solution needs to be replaced, after the contact step (S4 in FIG. 5), the clamp portion 39 of the housing 4 and the mounting base 2 are fitted together. , the electrolyte in the liquid chamber 3 is circulated.

表面処理を連続して実施しない場合(図5のS8にてNO)、排液工程を経て表面処理を終了する。具体的には、まず、移動機構5によって、再びハウジング4を下降させると共に、ハウジング4のクランプ部39と、載置基台2とを嵌合させる。その後、ハウジング4に開口部を有する供給流路41から液室3内の電解液を排出する(排液工程)。排液工程では、流路開閉弁40と加圧機構30とを開状態にし、加圧機構30から低圧の空気を送気して、流路開閉弁40の給排ポートから電解液を排液する。排液完了後、移動機構5によって、ハウジング4を原位置まで上昇させることで、ハウジング4を載置基台2から離間する。 If the surface treatment is not to be performed continuously (NO in S8 of FIG. 5), the surface treatment is terminated after the liquid discharge step. Specifically, first, the housing 4 is lowered again by the moving mechanism 5, and the clamp portion 39 of the housing 4 and the mounting base 2 are fitted together. After that, the electrolytic solution in the liquid chamber 3 is discharged from the supply channel 41 having an opening in the housing 4 (draining step). In the liquid draining process, the flow path opening/closing valve 40 and the pressure mechanism 30 are opened, low-pressure air is supplied from the pressure mechanism 30, and the electrolytic solution is drained from the supply/drainage port of the flow path opening/closing valve 40. do. After the liquid is drained, the moving mechanism 5 moves the housing 4 up to the original position, thereby separating the housing 4 from the mounting base 2 .

また、表面処理のパターンを変更する場合、排液後にハウジング4に取り付けられている第1膜保護部材60を取り外し、他の表面処理のパターンを有する第1膜保護部材60を新たに取り付ける。その後、電解液を液室3内に注入し、再び接近工程から離間工程までを繰り返す。 When changing the surface treatment pattern, the first membrane protection member 60 attached to the housing 4 is removed after the liquid is drained, and a new first membrane protection member 60 having a different surface treatment pattern is attached. After that, the electrolytic solution is injected into the liquid chamber 3, and the steps from the approaching step to the separating step are repeated again.

以上の工程により、本実施形態に係る表面処理装置1による一連の表面処理方法が実行される。 Through the above steps, a series of surface treatment methods are executed by the surface treatment apparatus 1 according to the present embodiment.

[本実施形態に係る表面処理装置、膜保護部材及び表面処理方法の利点]
以上説明したように、本実施形態に係る表面処理装置1は、被処理物Cと対向して配置され、内部に液室3を形成可能なハウジング4と、ハウジング4内に配された電極20と、液室3と被処理物Cとの間に配置されたイオン伝導膜6と、被処理物Cとイオン伝導膜6との間に配された第1膜保護部材60と、電極20と被処理物Cとの間に電圧を印加する電源部7とを備え、第1膜保護部材60は、イオン伝導膜6を支持する第1膜支持部63を含み、電極20と被処理物Cとの間に電圧を印加することで、イオン伝導膜6及び第1膜支持部63を介した電気分解により被処理物Cの表面Eを処理する。
[Advantages of Surface Treatment Apparatus, Film Protection Member, and Surface Treatment Method According to the Present Embodiment]
As described above, the surface treatment apparatus 1 according to the present embodiment includes a housing 4 arranged to face the object C to be treated and capable of forming the liquid chamber 3 therein, and the electrodes 20 arranged in the housing 4 . , the ion conductive film 6 arranged between the liquid chamber 3 and the object to be processed C, the first film protection member 60 arranged between the object to be processed C and the ion conductive film 6, and the electrode 20 The first membrane protection member 60 includes a first membrane supporter 63 that supports the ion conductive membrane 6, and the electrode 20 and the workpiece C are connected to each other. By applying a voltage between , the surface E of the object C to be processed is processed by electrolysis via the ion conductive membrane 6 and the first membrane supporting portion 63 .

そして、本実施形態に係る表面処理装置1は、このような構成を備えることにより、イオン伝導膜6が被処理物Cに接触していない状態において、第1膜支持部63によりイオン伝導膜6が支持されることで、液室3内の電解液の自重や、減圧する際生じるイオン伝導膜6の上方空間と下方空間の差圧によってイオン伝導膜6が変形せず、また、表面処理時にイオン伝導膜6が直接被処理物Cと接触しないため、イオン伝導膜6の破損を防止できるという利点を有している。さらに、イオン伝導膜6と被処理物Cとの間に第1膜支持部が配置されていることで、減圧工程において、イオン伝導膜6が被処理物Cの表面Eと密着することで発生する残留気泡を抑制できる。 With such a configuration, the surface treatment apparatus 1 according to the present embodiment is configured so that the ion conductive film 6 is supported by the first film supporting portion 63 while the ion conductive film 6 is not in contact with the object C to be processed. is supported, the ion conductive membrane 6 does not deform due to the weight of the electrolyte in the liquid chamber 3 or the pressure difference between the upper and lower spaces of the ion conductive membrane 6 that occurs when the pressure is reduced, and during surface treatment Since the ion-conducting film 6 does not come into direct contact with the object C to be processed, there is an advantage that the ion-conducting film 6 can be prevented from being damaged. Furthermore, since the first membrane supporting portion is arranged between the ion conductive film 6 and the object C to be processed, the ion conductive film 6 is brought into close contact with the surface E of the object C to be processed in the decompression process. Residual bubbles can be suppressed.

また、本実施形態に係る表面処理装置1において、第1膜支持部63は、多孔部材である。このような構成を備えることにより、電解液の自重によってイオン伝導膜6にかかる負荷を均等に分散しつつ、イオン伝導膜6を支持できるという利点を有している。また、電解液が通過可能な開口を有するため、電解液の染み出しを妨げないという利点も有する。 Moreover, in the surface treatment apparatus 1 according to the present embodiment, the first membrane supporting portion 63 is a porous member. With such a configuration, there is an advantage that the ion conductive membrane 6 can be supported while the load applied to the ion conductive membrane 6 by the weight of the electrolyte is evenly distributed. Moreover, since it has openings through which the electrolytic solution can pass, it also has the advantage of not hindering the seepage of the electrolytic solution.

さらに、本実施形態に係る表面処理装置1において、イオン伝導膜6と第1膜保護部材60は、ハウジング4に取り付けられている。このような構成を備えることにより、複数の被処理物Cに対して繰り返し表面処理を実施する場合に、第1膜保護部材60を取り外さなくてよいという利点を有している。 Furthermore, in the surface treatment apparatus 1 according to this embodiment, the ion conductive membrane 6 and the first membrane protection member 60 are attached to the housing 4 . With such a configuration, there is an advantage that it is not necessary to remove the first film protection member 60 when repeatedly performing surface treatment on a plurality of objects C to be processed.

またさらに、本実施形態に係る表面処理装置1において、第1膜保護部材60は、被処理物Cの非処理部分を被覆するための被覆部64を更に含む。このような構成を備えることにより、イオン伝導膜6から染み出た電解液は、被覆部64の厚みによって被処理物上での拡がりが抑制されるため、被処理物Cの処理部分のみを選択的に表面処理できるという利点を有している。また、被覆部64は、第1膜保護部材60に設けられていることで、第1膜保護部材60と別で被覆部を設ける場合と比較して、自由な被覆パターンを実現できる。 Furthermore, in the surface treatment apparatus 1 according to this embodiment, the first film protection member 60 further includes a covering portion 64 for covering the untreated portion of the object C to be treated. With such a configuration, the electrolytic solution seeping out from the ion conductive membrane 6 is prevented from spreading on the object to be processed by the thickness of the covering portion 64, so only the portion of the object to be processed C to be processed is selected. It has the advantage that it can be surface-treated on a regular basis. In addition, since the covering portion 64 is provided on the first film protecting member 60 , a free covering pattern can be realized as compared with the case where the covering portion is provided separately from the first film protecting member 60 .

また、本実施形態に係る表面処理装置1において、第1膜保護部材60は、被覆部64の被処理物C側に通電部65が更に設けられており、通電部65は、電源部7と被処理物Cの表面Eとを導通するように、該被処理物Cの表面Eの一部に接触可能に配置される。このような構成を備えることにより、被処理物Cが、樹脂基材や、ガラス基板、シリコンウエハー、セラミックス基板等の上に導体層が形成されている材料の場合であっても、電源部7と導体層を導通させて表面処理することができるという利点を有している。また、被処理物Cと、載置基台2及びトレイ9の電極部、ひいては電源部7の負極とを容易に接続できるという利点を有している。さらに、被処理物Cの処理部分の近傍で電源部7と被処理物Cの表面Eとを導通することになり、表面処理の精度をより向上することができるという利点を有している。 In addition, in the surface treatment apparatus 1 according to the present embodiment, the first film protection member 60 is further provided with a conducting section 65 on the side of the object C to be treated of the covering section 64 . It is arranged so as to be able to contact a part of the surface E of the object C to be treated so as to conduct the surface E of the object C to be treated. By providing such a configuration, even if the object to be processed C is a material in which a conductor layer is formed on a resin base material, a glass substrate, a silicon wafer, a ceramics substrate, or the like, the power supply unit 7 can be used. It has the advantage that the surface can be treated by making the conductor layer conductive. In addition, there is an advantage that the workpiece C can be easily connected to the mounting base 2 and the electrodes of the tray 9, and further to the negative electrode of the power source 7. FIG. Furthermore, the power supply unit 7 and the surface E of the object C to be treated are electrically connected in the vicinity of the part to be treated of the object C to be treated, which has the advantage that the accuracy of the surface treatment can be further improved.

さらに、本実施形態に係る表面処理装置1において、被覆部64は、撥水性を有する。このような構成を備えることにより、イオン伝導膜6から染み出た電解液が被覆部64に滲入し、被処理物Cの非処理部分に侵入することを防止できるという利点を有している。 Furthermore, in the surface treatment apparatus 1 according to this embodiment, the covering portion 64 has water repellency. With such a configuration, there is an advantage that it is possible to prevent the electrolytic solution exuded from the ion conductive membrane 6 from infiltrating into the covering portion 64 and entering the unprocessed portion of the object C to be processed.

またさらに、本実施形態に係る表面処理装置1において、第1膜支持部63は、表面が絶縁処理されている。このような構成を備えることにより、電圧印加時に、第1膜支持部63に通電し、第1膜支持部63の表面がめっき処理されることを防止できるという利点を有している。 Furthermore, in the surface treatment apparatus 1 according to the present embodiment, the surface of the first film supporting portion 63 is insulated. By providing such a configuration, there is an advantage that it is possible to prevent the surface of the first film supporting portion 63 from being plated by energizing the first film supporting portion 63 when a voltage is applied.

また、本実施形態に係る表面処理方法は、膜保護部材によりイオン伝導膜6の被処理物Cとの対向面を支持した状態で液室3に溶液(電解液)を収容し、該液室3に該溶液(電解液)を収容した状態でイオン伝導膜6を被処理物Cに対し接近及び離間させる。このような構成を備えることにより、1サイクル毎に電解液の注入及び排出をする必要がなくなり、表面処理の1サイクルにかかる時間を短縮できるという利点を有している。 Further, in the surface treatment method according to the present embodiment, a solution (electrolyte) is accommodated in the liquid chamber 3 while the surface of the ion conductive film 6 facing the object C to be treated is supported by the film protection member. With the solution (electrolyte) contained in 3, the ion conductive film 6 is moved toward and away from the object C to be processed. With such a configuration, there is no need to inject and discharge the electrolytic solution for each cycle, and there is an advantage that the time required for one cycle of surface treatment can be shortened.

さらに、本実施形態に係る表面処理方法は、液室3内を加圧する加圧工程と、加圧工程後に、電極20と被処理物Cとの間に電圧を印加する電圧印加工程とを備える。このような構成を備えることにより、被覆部64と、被処理物Cの表面Eとの密着性が向上し、より効果的に被覆できるという利点を有している。 Furthermore, the surface treatment method according to the present embodiment includes a pressurizing step of pressurizing the inside of the liquid chamber 3 and a voltage applying step of applying a voltage between the electrode 20 and the object C to be processed after the pressurizing step. . By providing such a configuration, there is an advantage that the adhesion between the covering portion 64 and the surface E of the object to be processed C is improved, and the object can be covered more effectively.

[変形例]
以上、本発明の好適な実施形態について説明したが、本発明の技術的範囲は、上述した実施形態に記載の範囲には限定されない。上述した実施形態には、多様な変更又は改良を加えることが可能である。
[Modification]
Although the preferred embodiments of the present invention have been described above, the technical scope of the present invention is not limited to the scope described in the above-described embodiments. Various modifications or improvements can be added to the embodiments described above.

例えば、本実施形態において、第1膜支持部63は、多孔部材であるものとして説明したが、これに限定されない。第1膜支持部63は、イオン伝導膜6を通過したイオンが通過可能であり、かつ、イオン伝導膜6を支持可能な構成であれば、種々の任意の構成を採用可能である。 For example, in the present embodiment, the first film supporting portion 63 is described as being a porous member, but it is not limited to this. The first membrane supporting portion 63 can adopt various arbitrary configurations as long as the ions passing through the ion conductive membrane 6 can pass therethrough and the ion conductive membrane 6 can be supported.

本実施形態において、イオン伝導膜6と第1膜保護部材60は、ハウジング4に取り付けられているものとして説明したが、これに限定されない。第1膜保護部材60は、例えば、被処理物Cが載置基台2又はトレイ9に載置された状態において、載置基台2又はトレイ9上に被処理物Cを覆うように取り付けられてもよい。 Although the ion conductive membrane 6 and the first membrane protection member 60 are attached to the housing 4 in the present embodiment, the present invention is not limited to this. For example, the first film protection member 60 is mounted on the mounting base 2 or the tray 9 so as to cover the processing target C while the processing target C is placed on the mounting base 2 or the tray 9 . may be

本実施形態において、第1膜保護部材60は、被処理物Cの非処理部分を被覆するための被覆部64を更に含むものとして説明したが、これに限定されず、第1膜保護部材60は、被覆部64を含まなくてもよい。 In the present embodiment, the first film protection member 60 has been described as further including the covering portion 64 for covering the non-processed portion of the object C to be processed. may not include the covering portion 64 .

本実施形態において、第1膜保護部材60は、被覆部64の被処理物C側に通電部65が更に設けられており、通電部65は、電源部7と被処理物Cの表面Eとを導通するように、該被処理物Cの表面Eの一部に接触可能に配置されるものとして説明したが、これに限定されず、第1膜保護部材60は、被覆部64の被処理物C側に通電部65が更に設けられていなくてもよい。 In the present embodiment, the first film protection member 60 is further provided with a current-carrying portion 65 on the side of the object C to be processed of the covering portion 64. Although it has been described as being arranged so as to be able to come into contact with a part of the surface E of the object to be treated C so as to conduct the The current-carrying portion 65 may not be further provided on the object C side.

本実施形態において、被覆部64は、撥水性を有するものとして説明したが、これに限定されず、被覆部64は、撥水性がなくてもよい。 In the present embodiment, the covering portion 64 has been described as having water repellency, but the present invention is not limited to this, and the covering portion 64 may not have water repellency.

本実施形態において、第1膜支持部63は、表面が絶縁処理されているものとして説明したが、これに限定されず、第1膜支持部63は、表面が絶縁処理されていなくてもよい。 In the present embodiment, the surface of the first film supporting portion 63 is treated with insulation, but the present invention is not limited to this. .

本実施形態に係る表面処理方法は、膜保護部材によりイオン伝導膜6の被処理物Cとの対向面を支持した状態で液室3に溶液(電解液)を収容し、該液室3に該溶液(電解液)を収容した状態でイオン伝導膜6を被処理物Cに対し接近及び離間させるものとして説明したが、これに限定されない。本実施形態に係る表面処理方法は、液室3に溶液(電解液)を収容しない状態でイオン伝導膜6を被処理物Cに対し接近及び離間させてもよい。 In the surface treatment method according to the present embodiment, a solution (electrolyte) is accommodated in the liquid chamber 3 while the surface of the ion conductive film 6 facing the object C to be treated is supported by a film protection member. Although the ion conductive film 6 is moved toward and away from the object C while containing the solution (electrolyte), the present invention is not limited to this. In the surface treatment method according to the present embodiment, the ion conductive film 6 may be brought closer to and away from the object C to be treated while the solution (electrolyte) is not contained in the liquid chamber 3 .

本実施形態に係る表面処理方法は、液室3内を加圧する加圧工程と、加圧工程後に、電極20と被処理物Cとの間に電圧を印加する電圧印加工程とを備えるものとして説明したが、これに限定されない。本実施形態に係る表面処理方法は、加圧工程と電圧印加工程を備えなくてもよい。 The surface treatment method according to this embodiment includes a pressurization step of pressurizing the inside of the liquid chamber 3 and a voltage application step of applying a voltage between the electrode 20 and the object C to be processed after the pressurization step. Illustrated, but not limited to. The surface treatment method according to this embodiment may not include the pressurizing step and the voltage applying step.

本実施形態において、被覆部64は、乳剤であるものとして説明したが、これに限定されない。例えば、被覆部64は、樹脂フィルム、感光性樹脂(ドライフィルム等)、絶縁処理された金属材料(メタルマスク等)等であってもよい。 In the present embodiment, the coating portion 64 has been described as an emulsion, but it is not limited to this. For example, the covering portion 64 may be a resin film, a photosensitive resin (dry film, etc.), an insulated metal material (metal mask, etc.), or the like.

本実施形態において、イオン伝導膜6は、矩形状であるものとして説明したが、これに限定されず、ハウジング4の開口部を覆う構成であれば、種々の任意の構成を採用可能である。例えば、円形状等であってもよい。また、第1枠部61及び第2枠部71の開口部は、イオン伝導膜6の形状に合わせて、矩形以外の形状であってもよい。 In the present embodiment, the ion conductive film 6 has been described as having a rectangular shape, but it is not limited to this, and various arbitrary configurations can be adopted as long as the configuration covers the opening of the housing 4 . For example, it may be circular. Also, the openings of the first frame portion 61 and the second frame portion 71 may have a shape other than a rectangle in accordance with the shape of the ion conductive film 6 .

本実施形態において、第1膜保護部材60の第1膜支持部63の周縁部及び第1枠部61の周縁部は、耐薬品性及び絶縁性を有する保護フィルム66で覆われているものとして説明したが、これに限定されず、第1膜支持部63の周縁部及び第1枠部61の周縁部は、保護フィルム66で覆われていなくてもよく、第1枠部61が電気的に短絡しない構成であれば、種々の任意の構成を採用可能である。 In the present embodiment, the peripheral edge of the first membrane supporting portion 63 and the peripheral edge of the first frame portion 61 of the first membrane protection member 60 are covered with a protective film 66 having chemical resistance and insulating properties. Although it has been described, it is not limited to this. Various arbitrary configurations can be adopted as long as they do not short-circuit to .

本実施形態において、第1膜支持部63は、第1枠部61と同形同大に形成されているものとして説明したが、これに限定されず、第1膜支持部63は、第1枠部61と同形同大でなくてもよい。 In the present embodiment, the first film supporting portion 63 is formed to have the same shape and size as the first frame portion 61. However, the present invention is not limited to this. It does not have to be the same shape and size as the frame portion 61 .

本実施形態において、第2膜保護部材70は、保持治具35の内枠膜治具36に取り付けられているものとして説明したが、これに限定されず、第2膜保護部材70は、イオン伝導膜6の上方に配される構成であれば、種々の任意の構成を採用可能である。 In the present embodiment, the second membrane protection member 70 is attached to the inner frame membrane jig 36 of the holding jig 35. However, the present invention is not limited to this. Various arbitrary configurations can be adopted as long as they are arranged above the conductive film 6 .

本実施形態において、表面処理の前段階として、ハウジング4を下降させると共に、ハウジング4のクランプ部39と、載置基台2とを嵌合させ、電解液を液室3内に注入する(給液工程)ものとして説明したが、これに限定されない。例えば、1回目の表面処理において、当接工程後に、電解液を液室3内に注入してもよい。 In this embodiment, as a pre-stage of the surface treatment, the housing 4 is lowered, the clamp portion 39 of the housing 4 and the mounting base 2 are fitted together, and the electrolytic solution is injected into the liquid chamber 3 (supplying). liquid process), but it is not limited to this. For example, in the first surface treatment, the electrolytic solution may be injected into the liquid chamber 3 after the contact step.

本実施形態に係る表面処理方法は、減圧工程を備えるものとして説明したが、これに限定されず、本実施形態に係る表面処理方法は、減圧工程を備えなくてもよい。 Although the surface treatment method according to the present embodiment has been described as including the depressurization step, the present invention is not limited to this, and the surface treatment method according to the present embodiment may not include the depressurization step.

1 表面処理装置
2 載置基台
3 液室
4 ハウジング
5 移動機構
6 イオン伝導膜
7 電源部
8 支持基台
9 トレイ
20 電極
23 底部
30 加圧機構
31 排出流路
35 保持治具
36 内枠膜治具
37 外枠膜治具
39 クランプ部
40 流路開閉弁
41 供給流路
47 開閉弁
48 減圧流路
51 直動ロッド
55 上ヒータ
55a 絶縁部材
56 下ヒータ
60 第1膜保護部材
61 第1枠部
62 開口
63 第1膜支持部
64 被覆部
65 通電部
66 保護フィルム
70 第2膜保護部材
71 第2枠部
73 第2膜支持部
C 被処理物
E 表面
REFERENCE SIGNS LIST 1 surface treatment apparatus 2 placement base 3 liquid chamber 4 housing 5 movement mechanism 6 ion conductive membrane 7 power supply unit 8 support base 9 tray 20 electrode 23 bottom 30 pressure mechanism 31 discharge channel 35 holding jig 36 inner frame membrane Jig 37 Outer frame film jig 39 Clamp part 40 Channel opening/closing valve 41 Supply channel 47 Opening/closing valve 48 Pressure reduction channel 51 Direct acting rod 55 Upper heater 55a Insulating member 56 Lower heater 60 First membrane protection member 61 First frame Part 62 Opening 63 First membrane supporting part 64 Covering part 65 Conducting part 66 Protective film 70 Second membrane protecting member 71 Second frame part 73 Second membrane supporting part C Object to be treated E Surface

Claims (13)

被処理物と対向して配置され、内部に液室を形成可能なハウジングと、
前記ハウジング内に配された電極と、
前記液室と前記被処理物との間に配置されたイオン伝導膜と、
前記被処理物と前記イオン伝導膜との間に配された第1膜保護部材と、
前記電極と前記被処理物との間に電圧を印加する電源部と
を備え、
前記第1膜保護部材は、前記イオン伝導膜を支持する第1膜支持部を含み、
前記電極と前記被処理物との間に電圧を印加することで、前記イオン伝導膜及び前記第1膜支持部を介した電気分解により前記被処理物の表面を処理する
ことを特徴とする表面処理装置。
a housing arranged to face the object to be processed and capable of forming a liquid chamber therein;
an electrode disposed within the housing;
an ion conductive membrane disposed between the liquid chamber and the object to be processed;
a first film protection member disposed between the object to be processed and the ion conductive film;
a power supply unit that applies a voltage between the electrode and the object to be processed,
The first membrane protection member includes a first membrane support that supports the ion conductive membrane,
By applying a voltage between the electrode and the object to be treated, the surface of the object to be treated is treated by electrolysis via the ion conductive membrane and the first membrane supporting portion. processing equipment.
前記第1膜支持部は、多孔部材である
ことを特徴とする請求項1に記載の表面処理装置。
The surface treatment apparatus according to claim 1, wherein the first film supporting portion is a porous member.
前記イオン伝導膜と前記第1膜保護部材は、前記ハウジングに取り付けられている
ことを特徴とする請求項1又は2に記載の表面処理装置。
3. The surface treatment apparatus according to claim 1, wherein the ion conductive membrane and the first membrane protection member are attached to the housing.
前記第1膜保護部材は、前記被処理物の非処理部分を被覆するための被覆部を更に含む
ことを特徴とする請求項1又は2に記載の表面処理装置。
3. The surface treatment apparatus according to claim 1, wherein said first film protection member further includes a covering portion for covering a non-treatment portion of said object to be treated.
前記第1膜保護部材は、前記被覆部の前記被処理物側に通電部が更に設けられており、
前記通電部は、前記電源部と前記被処理物の前記表面とを導通するように、該被処理物の該表面の一部に接触可能に配置される
ことを特徴とする請求項4に記載の表面処理装置。
The first film protection member is further provided with a current-carrying portion on the side of the object to be treated of the covering portion,
5. The power supply unit is arranged so as to be able to contact a part of the surface of the object to be processed so as to electrically connect the power supply unit and the surface of the object to be processed. surface treatment equipment.
前記被覆部は、撥水性を有する
ことを特徴とする請求項4に記載の表面処理装置。
5. The surface treatment apparatus according to claim 4, wherein the covering portion has water repellency.
前記第1膜支持部は、表面が絶縁処理されている
ことを特徴とする請求項1又は2に記載の表面処理装置。
3. The surface processing apparatus according to claim 1, wherein the surface of the first film supporting portion is insulated.
前記第1膜支持部は、前記イオン伝導膜の前記被処理物との対向面に接着されている
ことを特徴とする請求項1又は2に記載の表面処理装置。
3. The surface treatment apparatus according to claim 1, wherein the first membrane supporting portion is adhered to a surface of the ion conductive membrane facing the object to be treated.
前記イオン伝導膜の前記液室側に配された第2膜保護部材を更に備え、
前記第2膜保護部材は、前記イオン伝導膜と対向して設けられ、前記液室内の溶液を通過可能な第2膜支持部を含み、
前記イオン伝導膜は、前記第1膜支持部と前記第2膜支持部の間に挟まれている
ことを特徴とする請求項1又は2に記載の表面処理装置。
further comprising a second membrane protection member disposed on the liquid chamber side of the ion conductive membrane,
the second membrane protection member includes a second membrane support part provided opposite to the ion conductive membrane and through which the solution in the liquid chamber can pass;
3. The surface treatment apparatus according to claim 1, wherein the ion conductive membrane is sandwiched between the first membrane supporting portion and the second membrane supporting portion.
前記第2膜支持部は、前記イオン伝導膜の前記液室側の面に接着されている
ことを特徴とする請求項9に記載の表面処理装置。
10. The surface treatment apparatus according to claim 9, wherein the second membrane supporting portion is adhered to the liquid chamber side surface of the ion conductive membrane.
被処理物と対向して配置され、内部に液室を形成可能なハウジングと、前記ハウジング内に配された電極と、前記液室と前記被処理物との間に配置されたイオン伝導膜と、前記電極と前記被処理物との間に電圧を印加する電源部とを備え、前記電極と前記被処理物との間に電圧を印加することで、前記イオン伝導膜を介した電気分解により前記被処理物の表面を処理する表面処理装置に用いられる膜保護部材であって、
前記イオン伝導膜を支持する膜支持部を備え、前記被処理物と前記イオン伝導膜との間に配置可能に構成されている
ことを特徴とする膜保護部材。
A housing arranged to face an object to be processed and capable of forming a liquid chamber therein, an electrode arranged in the housing, and an ion-conducting membrane arranged between the liquid chamber and the object to be processed. and a power supply unit for applying a voltage between the electrode and the object to be processed, and by applying a voltage between the electrode and the object to be processed, electrolysis via the ion conductive film A film protection member used in a surface treatment apparatus for treating the surface of the object to be treated,
A membrane protection member comprising a membrane supporting portion that supports the ion-conducting membrane and configured to be arranged between the object to be processed and the ion-conducting membrane.
前記被処理物の非処理部分を被覆するための被覆部を備える
ことを特徴とする請求項11に記載の膜保護部材。
12. The membrane protection member according to claim 11, further comprising a covering portion for covering the untreated portion of the object to be treated.
前記被覆部の前記被処理物側に通電部が更に設けられており、
前記通電部は、前記電源部と前記被処理物の前記表面とを導通するように、該被処理物の該表面の一部に接触可能に構成されている
ことを特徴とする請求項12に記載の膜保護部材。
A conducting portion is further provided on the side of the object to be processed of the covering portion,
13. The method according to claim 12, wherein the current-carrying section is configured to contact a part of the surface of the object to be processed so as to electrically connect the power supply unit and the surface of the object to be processed. A membrane protection member as described.
JP2022163403A 2021-10-22 2022-10-11 Surface treatment apparatus and membrane protection member Pending JP2023063249A (en)

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JP2021173369 2021-10-22

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