JP2023057458A - Hand, conveyance device, and substrate treatment device - Google Patents

Abstract

To suppress falling of a substrate from a hand when the substrate is received from a top ring and to position the substrate in a prescribed seating region.SOLUTION: The hand for holding a substrate comprises: a hand body 620; a plurality of seating members 630 attached to the hand body 620 to seat the substrate; a plurality of guide members 640 attached to the hand body 620 at prescribed intervals from each other so as to surround a seating region SA in which the substrate is seated; and a plurality of positioning members 650 attached to the hand body 620 at prescribed intervals from each other so as to surround the seating region SA. Each of the guide members 640 has a substrate reception surface 642 inclined downward toward the seating region SA. Each of the positioning members 650 has a positioning part 652 that comes into contact with the outer edge of the seating region.SELECTED DRAWING: Figure 9C

Description

The present application relates to a hand, a transfer device, and a substrate processing device.

2. Description of the Related Art In recent years, substrate processing apparatuses have been used to perform various types of processing on substrates such as semiconductor wafers. An example of a substrate processing apparatus is a CMP (Chemical Mechanical Polishing) apparatus for polishing a substrate.

As described in Patent Document 1, a CMP apparatus includes a polishing apparatus for polishing a substrate, a cleaning apparatus for cleaning and drying the substrate, and a substrate that is transferred to the polishing apparatus. A load/unload device for receiving substrates cleaned and dried by the cleaning device, and the like. In addition, the CMP apparatus includes a transfer device that transfers substrates among the polishing device, the cleaning device, and the loading/unloading device. A CMP apparatus sequentially performs various processes such as polishing, cleaning, and drying while transporting a substrate by a transport device.

The transport device includes a hand for holding the substrate and a drive mechanism for moving the hand. The hand has a plurality of pins on which the substrate rests. As described in Patent Document 1, each of the plurality of pins includes a first inclined surface that is inclined with respect to the horizontal direction and directed upward, and a horizontal and a second slanted surface slanted downwardly with respect to the . In this transport device, when the substrate is displaced from its seating position due to acceleration during transport of the substrate, the edge of the substrate abuts against the second inclined surface, thereby suppressing the substrate from falling.

JP 2014-175333 A

However, the prior art has room for improvement in suppressing the dropping of the substrate when receiving it from the top ring and positioning the substrate in the predetermined seating area.

That is, when receiving the substrate from the top ring, the substrate is detached from the membrane by supplying a fluid to the adsorption surface of the substrate that is adsorbed by the membrane of the top ring. In this case, there is no problem when the substrate is separated from the membrane while maintaining a horizontal state, but the substrate may come down to the transfer device in an inclined state because only one side of the substrate is separated from the membrane. Even in such a case, it is required to receive the substrate from the transfer device without dropping it and to position it in a predetermined seating area.

Accordingly, one object of the present application is to prevent the substrate from falling from the hand when receiving the substrate from the top ring, and to position the substrate in a predetermined seating area.

According to one embodiment, a hand for holding a substrate comprises a hand body, a plurality of seating members attached to the hand body on which the substrate is seated, and a seating area on which the substrate is seated. a plurality of guide members attached to the hand body at predetermined intervals so as to surround the seating area; and a plurality of positioning members attached to the hand body at predetermined intervals so as to surround the seating area. wherein each of the plurality of guide members has a substrate receiving surface that slopes downward toward the seating area, and each of the plurality of positioning members has a positioning portion contacting an outer edge of the seating area. is disclosed.

FIG. 1 is a plan view showing the overall configuration of a CMP apparatus as an example of a substrate processing apparatus according to one embodiment of the present invention. FIG. 2 is a perspective view schematically showing the polishing apparatus. FIG. 3 is a plan view and a side view schematically showing the configuration of the cleaning device. FIG. 4 is a perspective view schematically showing the first linear transporter of the conveying device. FIG. 5 is a perspective view schematically showing the configuration of the hand. FIG. 6A is a perspective view schematically showing the configuration of the first seating member. FIG. 6B is a cross-sectional view taken along line BB of FIG. 6A. FIG. 6C is a cross-sectional view taken along line CC of FIG. 6A. FIG. 7A is a perspective view schematically showing the configuration of the second seating member. FIG. 7B is a diagram schematically showing transfer of the substrate from the hand to the top ring. FIG. 7C is a cross-sectional view taken along line C'-C' in FIG. 6A. FIG. 8A is a plan view schematically showing the configuration of the hand. FIG. 8B is a perspective view schematically showing the configuration of the guide member. FIG. 8C is a cross-sectional view schematically showing the configuration of the guide member. FIG. 9A is a plan view schematically showing the configuration of the hand. FIG. 9B is a perspective view schematically showing the configuration of the positioning member. FIG. 9C is a side view schematically showing the configuration of the positioning member; FIG. 10A is a perspective view schematically showing the configuration of the hand and hand support. FIG. 10B is an enlarged perspective view of the hand support portion of FIG. 10A. FIG. 11A is a perspective view schematically showing attachment of a hand to a support member. FIG. 11B is a perspective view schematically showing the configuration of the hand support; FIG. 11C is a side view and a plan view schematically showing the configuration of the hand support.

Hereinafter, a hand, a transfer device, and a substrate processing device according to one embodiment of the present invention will be described based on the drawings. In the drawings described below, the same or corresponding components are denoted by the same reference numerals, and redundant descriptions are omitted.

<Polishing device>
FIG. 1 is a plan view showing the overall configuration of a CMP apparatus as an example of a substrate processing apparatus according to one embodiment of the present invention. As shown in FIG. 1, the CMP apparatus 1000 has a substantially rectangular housing 1 . The interior of the housing 1 is partitioned into a loading/unloading device 2, a polishing device 3, and a cleaning device 4 by partition walls 1a and 1b. The loading/unloading device 2, the polishing device 3, and the cleaning device 4 are each independently assembled and independently evacuated. The cleaning device 4 also includes a power supply member that supplies power to the polishing device, and a control device 5 that controls processing operations.

<Load/unload device>
The loading/unloading device 2 handles a large number of objects to be processed (for example, disc-shaped substrates (wafers)
is provided with two or more (four in this embodiment) front load members 20 on which substrate cassettes for stocking are placed. These front load members 20 are arranged adjacent to the housing 1 and arranged along the width direction (perpendicular to the longitudinal direction) of the polishing apparatus. The front load member 20 can be loaded with an open cassette, a SMIF (Standard Manufacturing Interface) pod, or a FOUP (Front Opening Unified Pod). Here, the SMIF and the FOUP are closed containers that contain substrate cassettes and are covered with partition walls to maintain an environment independent of the external space.

A traveling mechanism 21 is laid along the row of the front load members 20 in the loading/unloading device 2 . Two transfer robots (loaders, transfer mechanisms) 22 are installed on the traveling mechanism 21 so as to be movable along the direction in which the substrate cassettes are arranged. The transport robot 22 can access the substrate cassette mounted on the front load member 20 by moving on the traveling mechanism 21 . Each transport robot 22 has two upper and lower hands. The upper hand is used when returning processed substrates to the substrate cassette. The lower hand is used when removing unprocessed substrates from the substrate cassette. In this way, the upper and lower hands can be used separately. Furthermore, the lower hand of the transfer robot 22 is configured to be able to turn over the substrate.

<Polishing device>
The polishing device 3 is a device for polishing (planarizing) a substrate. The polishing device 3 includes a first polishing device 3A, a second polishing device 3B, a third polishing device 3C, and a fourth polishing device 3D. The first polishing device 3A, the second polishing device 3B, the third polishing device 3C, and the fourth polishing device 3D are arranged along the longitudinal direction of the polishing devices, as shown in FIG.

As shown in FIG. 1, a first polishing apparatus 3A includes a polishing table 30A to which a polishing pad (polishing tool) 10 having a polishing surface is attached, and a substrate that holds and presses the substrate against the polishing pad 10 on the polishing table 30A. a top ring 31A for polishing while polishing; a polishing liquid supply nozzle 32A for supplying a polishing liquid or a dressing liquid (for example, pure water) to the polishing pad 10; A dresser 33A ejects a mixed fluid of liquid (for example, pure water) and gas (for example, nitrogen gas) or liquid (for example, pure water) to remove slurry, polishing products, and polishing pad residues from dressing on the polishing surface. and an atomizer 34A.

Similarly, the second polishing apparatus 3B includes a polishing table 30B, a top ring 31B, a polishing liquid supply nozzle 32B, a dresser 33B, and an atomizer 34B. The third polishing apparatus 3C includes a polishing table 30C, a top ring 31C, a polishing liquid supply nozzle 32C, a dresser 33C, and an atomizer 34C. The fourth polishing device 3D includes a polishing table 30D, a top ring 31D, a polishing liquid supply nozzle 32D, a dresser 33D, and an atomizer 34D.

Since the first polishing apparatus 3A, the second polishing apparatus 3B, the third polishing apparatus 3C, and the fourth polishing apparatus 3D have the same configuration, the first polishing apparatus 3A will be described below. only explained.

FIG. 2 is a perspective view schematically showing the first polishing apparatus 3A. The top ring 31A is supported by a top ring shaft 36. As shown in FIG. A polishing pad 10 is attached to the upper surface of the polishing table 30A. The upper surface of the polishing pad 10 forms a polishing surface for polishing the substrate W. As shown in FIG. Fixed abrasive grains may be used instead of the polishing pad 10 . The top ring 31A and polishing table 30A are configured to rotate about their axes as indicated by arrows. The substrate W is held by vacuum suction on the lower surface of the top ring 31A. During polishing, while the polishing liquid is supplied to the polishing surface of the polishing pad 10 from the polishing liquid supply nozzle 32A, the substrate W to be polished is pressed against the polishing surface of the polishing pad 10 by the top ring 31A and polished.

<Washing device>
FIG. 3 is a plan view and a side view schematically showing the configuration of the cleaning device. 3(a) is a plan view showing the cleaning device 4, and FIG. 3(b) is a side view showing the cleaning device 4. FIG. As shown in FIGS. 3A and 3B, the cleaning device 4 includes roll cleaning chambers 190 and 300, a first transfer chamber 191, a pen cleaning chamber 192, and a second transfer chamber 193. , a drying chamber 194 and a third transfer chamber 195 .

In the roll cleaning chamber 190, an upper roll cleaning module 201A and a lower roll cleaning module 201B are arranged along the vertical direction. The upper roll cleaning module 201A and the lower roll cleaning module 201B are cleaning machines that clean the substrate by pressing two rotating roll sponges against the front and back surfaces of the substrate while supplying cleaning liquid to the front and back surfaces of the substrate. A substrate temporary placement table 204 is provided between the upper roll cleaning module 201A and the lower roll cleaning module 201B. In the roll washing chamber 300, an upper roll washing module 300A and a lower roll washing module 300B similar to the upper roll washing module 201A and the lower roll washing module 201B arranged in the roll washing chamber 190 are arranged.

Inside the pen washing chamber 192, an upper pen washing module 202A and a lower pen washing module 202B arranged along the vertical direction are arranged. The upper pen cleaning module 202A and the lower pen cleaning module 202B clean the substrate by pressing a rotating pencil sponge against the surface of the substrate and swinging it in the radial direction of the substrate while supplying cleaning liquid to the surface of the substrate. machine. A substrate temporary placement table 203 is provided between the upper pen cleaning module 202A and the lower pen cleaning module 202B. A temporary placement table 180 for the substrate W installed on a frame (not shown) is arranged on the side of the first transfer chamber 191 .

In the drying chamber 194, an upper drying module 205A and a lower drying module 205B are arranged along the longitudinal direction. Above the upper drying module 205A and the lower drying module 205B are provided filter fan devices 207A, 207B that supply clean air into the drying modules 205A, 205B, respectively.

A vertically movable first transfer device 209 is arranged in the first transfer chamber 191 . A vertically movable second transfer device 210 is arranged in the second transfer chamber 193 . A vertically movable third transfer device 213 is arranged in the third transfer chamber 195 . The first transport device 209, the second transport device 210, and the third transport device 213 are movably supported by support shafts 211, 212, and 214 extending in the vertical direction. The first conveying device 209, the second conveying device 210, and the third conveying device 213 have an elevating drive mechanism such as a motor inside, and move up and down along the support shafts 211, 212, and 214. It is movable. The first transfer device 209 has two upper and lower hands, like the transfer robot 22 . As indicated by the dotted line in FIG. 3A, the first transport device 209 is arranged at a position where the lower hand can access the above-described temporary placement table 180 . When the lower hand of the first transport device 209 accesses the temporary placement table 180, a shutter (not shown) provided on the partition wall 1b is opened.

The first transport device 209 includes a temporary table 180, an upper roll cleaning module 201A, a lower roll cleaning module 201B, a temporary table 204, a temporary table 203, an upper pen cleaning module 202A, and a lower pen cleaning module 202B. , to transport the substrate W between. The first transport device 209 uses the lower hand when transporting a substrate before cleaning (substrate with slurry attached), and uses the upper hand when transporting a substrate after cleaning.

The second transport device 210 operates to transport the substrate W between the upper pen cleaning module 202A, the lower pen cleaning module 202B, the cradle 203, the upper drying module 205A and the lower drying module 205B. do. The second transport device 210 transports only cleaned substrates, so it has only one hand. The transfer robot 22 shown in FIG. 1 takes out the substrate from the upper drying module 205A or the lower drying module 205B using the upper hand, and returns the substrate to the substrate cassette. When the upper hand of the transfer robot 22 accesses the drying modules 205A and 205B, a shutter (not shown) provided on the partition wall 1a is opened.

The third transport device 213 operates to transport the substrate W between the upper roll cleaning module 300A, the lower roll cleaning module 300B, and the temporary placement table 204. FIG. The third transport device 213 uses the lower hand when transporting a substrate before cleaning (substrate with slurry attached), and uses the upper hand when transporting a substrate after cleaning.

<Conveyor>
Next, a transport device for transporting substrates will be described. As shown in FIG. 1, a first linear transporter (transfer device) 6 is arranged adjacent to the first polishing device 3A and the second polishing device 3B. The first linear transporter 6 has four transport positions along the direction in which the polishing apparatuses 3A and 3B are arranged (first transport position TP1, second transport position TP2, second 3, a transfer position TP3 and a fourth transfer position TP4).

A second linear transporter (conveying device) 7 is arranged adjacent to the third polishing device 3C and the fourth polishing device 3D. The second linear transporter 7 has three transport positions along the direction in which the polishing apparatuses 3C and 3D are arranged (fifth transport position TP5, sixth transport position TP6, 7 (referred to as a transfer position TP7).

The substrate is transported to the polishing apparatuses 3A and 3B by the first linear transporter 6. As shown in FIG. The top ring 31A of the first polishing apparatus 3A moves between the polishing position and the second transfer position TP2 by swinging the top ring head. Therefore, the transfer of the substrate to the top ring 31A is performed at the second transfer position TP2. Similarly, the top ring 31B of the second polishing apparatus 3B moves between the polishing position and the third transfer position TP3, and the transfer of the substrate to the top ring 31B is performed at the third transfer position TP3. The top ring 31C of the third polishing apparatus 3C moves between the polishing position and the sixth transfer position TP6, and the transfer of the substrate to the top ring 31C is performed at the sixth transfer position TP6. The top ring 31D of the fourth polishing apparatus 3D moves between the polishing position and the seventh transfer position TP7, and the transfer of the substrate to the top ring 31D is performed at the seventh transfer position TP7.

A lifter 11 for receiving the substrate from the transport robot 22 is arranged at the first transport position TP1. The substrate is transferred from the transfer robot 22 to the first linear transporter 6 via the lifter 11 . A shutter (not shown) is provided on the partition wall 1a between the lifter 11 and the transport robot 22. When the substrate is transported, the shutter is opened so that the substrate is passed from the transport robot 22 to the lifter 11. It has become. A swing transporter 12 is arranged between the first linear transporter 6 , the second linear transporter 7 and the cleaning device 4 . The swing transporter 12 has a hand that can move between the fourth transport position TP4 and the fifth transport position TP5. Substrate transfer from the first linear transporter 6 to the second linear transporter 7 is performed by the swing transporter 12 . The substrate is transported by the second linear transporter 7 to the third polishing apparatus 3C and/or the fourth polishing apparatus 3D. Also, the substrate polished by the polishing device 3 is transported to the cleaning device 4 via the swing transporter 12 .

FIG. 4 is a perspective view schematically showing the first linear transporter 6. FIG. The first linear transporter 6 has first, second, third and fourth hands 600-1, 600-2, 600-3 and 600-4 for holding substrates. In addition, the first linear transporter 6 has support members 610 for supporting the first to fourth hands 600-1 to 600-4, respectively. The first linear transporter 6 also has a drive mechanism 680 for moving the first to fourth hands 600-1 to 600-4 via the support member 610. As shown in FIG. The drive mechanism 680 includes three elevation drive mechanisms (for example, motor drive mechanisms using ball screws or air cylinders) that vertically move the second, third, and fourth hands 600-2, 600-3, and 600-4, respectively. 680A, 680B, 680C, three linear guides 682A, 682B, 682C for horizontally movably supporting the first to fourth hands 600-1 to 600-4, and the first to fourth hands 600- 1 to 600-4 are provided with three horizontal drive mechanisms 684A, 684B, and 684C that drive horizontally. In this embodiment, each of the horizontal drive mechanisms 684A, 684B, and 684C has a pair of pulleys 686, a belt 687 hooked around these pulleys 686, and a servomotor 688 that rotates one of the pair of pulleys. have.

The first hand 600-1 is supported by the first linear guide 682A and driven by the first horizontal drive mechanism 684A to move between the first transport position TP1 and the fourth transport position TP4. This first hand 600 - 1 is a pass hand for receiving the substrate from the lifter 11 and passing it to the second linear transporter 7 . Therefore, when the substrate is not polished by the first polishing device 3A and the second polishing device 3B but is polished by the third polishing device 3C and the fourth polishing device 3D, the first hand 600-1 is used. The first hand 600-1 is not provided with an elevation drive mechanism, and the first hand 600-1 is movable only in the horizontal direction.

The second hand 600-2 is supported by the second linear guide 682B and driven by the second horizontal drive mechanism 684B to move between the first transport position TP1 and the second transport position TP2. This second hand 600-2 functions as an access hand for transporting the substrate from the lifter 11 to the first polishing apparatus 3A. That is, the second hand 600-2 moves to the first transfer position TP1 and receives the substrate from the lifter 11 here. Then, the second hand 600-2 moves again to the second transfer position TP2, where the substrate held by the second hand 600-2 is transferred to the top ring 31A. A first lifting drive mechanism 680A is connected to the second hand 600-2 so that they move together in the horizontal direction. When transferring the substrate to the top ring 31A, the second hand 600-2 is driven by the first elevation driving mechanism 680A to move upward, and after passing the substrate to the top ring 31A, the second hand 600-2 moves to the first elevation driving mechanism 680A. driven down.

The third hand 600-3 and fourth hand 600-4 are supported by the third linear guide 682C. The third hand 600-3 and the fourth hand 600-4 are connected to each other by an air cylinder 692, and are driven by the third horizontal drive mechanism 684C to move together in the horizontal direction. It's becoming The air cylinder 692 functions as a gap adjusting mechanism for adjusting the gap between the third hand 600-3 and the fourth hand 600-4. The reason for providing the air cylinder (gap adjustment mechanism) 692 is that the gap between the first transfer position TP1 and the second transfer position TP2 and the gap between the second transfer position TP2 and the third transfer position TP3 are different. This is because they may differ. The air cylinder 692 can perform the interval adjustment operation while the third hand 600-3 and the fourth hand 600-4 are moving.

A second elevation driving mechanism 680B is connected to the third hand 600-3, and a third elevation driving mechanism 680C is connected to the fourth hand 600-4. The fourth hand 600-4 can be raised and lowered independently. The third hand 600-3 moves between the first transport position TP1, the second transport position TP2, and the third transport position TP3. It moves between TP2, the third transport position TP3, and the fourth transport position TP4.

The third hand 600-3 functions as an access hand for transporting the substrate from the lifter 11 to the second polishing apparatus 3B. That is, the third hand 600-3 moves to the first transfer position TP1, receives the substrate from the lifter 11, moves to the third transfer position TP3, and transfers the substrate to the top ring 31B. do. The third hand 600-3 also functions as an access hand for transporting the substrate polished by the first polishing apparatus 3A to the second polishing apparatus 3B. That is, the third hand 600-3 moves to the second transfer position TP2, receives the substrate from the top ring 31A, moves to the third transfer position TP3, and transfers the substrate to the top ring 31B. works like When transferring a substrate between the third hand 600-3 and the top ring 31A or the top ring 31B, the third hand 600-3 is driven by the second lifting drive mechanism 680B to rise, After the transfer of the substrate is completed, it is lowered by being driven by the second elevation drive mechanism 680B.

The fourth hand 600-4 functions as an access hand for transporting the substrate polished by the first polishing device 3A or the second polishing device 3B to the swing transporter 12. FIG. That is, the fourth hand 600-4 moves to the second transfer position TP2 or the third transfer position TP3, receives the polished substrate from the top ring 31A or the top ring 31B, and then moves to the fourth transfer position. Move to TP4. When receiving a substrate from the top ring 31A or top ring 31B, the fourth hand 600-4 is driven by the third elevation drive mechanism 680C to ascend, and after receiving the substrate, the third elevation drive mechanism 680C moves upward. driven down.

The second linear transporter 7 differs from the first linear transporter 6 in that it does not have parts corresponding to the first hand 600-1, but otherwise it is basically the same as the first linear transporter 6. , the detailed description thereof will be omitted.

<hand>
Next, the details of the hand will be described. Since the first to fourth hands 600-1 to 600-4 have the same configuration, only one hand (referred to as "hand 600" for convenience) will be described. FIG. 5 is a perspective view schematically showing the configuration of the hand.

As shown in FIG. 5, the hand 600 includes a hand body 620 and a plurality of (five in this embodiment) seating members 630-1 to 630-5 attached to the hand body 620. As shown in FIG. The hand main body 620 is a plate-like member formed in a substantially U shape so as to surround the seating area SA of the substrate. The seating members 630-1 to 630-5 are members on which substrates are seated. The seating members 630-1 to 630-5 are attached to the hand body 620 at intervals so as to surround the seating area SA. In this embodiment, the hand 600 has five seating members 630-1 to 630-5, but the number of seating members 630 is arbitrary. The hand 600 may be provided with three or more seating members 630 capable of holding the substrate W as horizontally as possible and evenly distributing the weight of the substrate W. FIG.

The seating members 630-1 to 630-5 are classified into two types according to the presence or absence of a seating sensor for detecting that the board is seated on the hand 600. FIG. In this embodiment, seating members 630-1, 630-3, 630-5 are equipped with seating sensors, and seating members 630-2, 630-4 are not equipped with seating sensors. Hereinafter, in order to distinguish between the two, the seating members 630-1, 630-3 and 630-5 will be referred to as "first seating members", and the seating members 630-2 and 630-4 will be referred to as "second seating members". It is called "member".

FIG. 6A is a perspective view schematically showing the configuration of the first seating member. FIG. 6B is a cross-sectional view taken along line BB of FIG. 6A. FIG. 6C is a cross-sectional view taken along line CC of FIG. 6A. As shown in FIGS. 6A to 6C, the first seating members 630-1, 630-3, and 630-5 are respectively supported on the hand body 620 via a pedestal 631 attached to the hand body 620 and the pedestal 631. and a lever member 634 supported by the shaft member 632 . The lever member 634 is a rod-shaped member arranged in a groove formed in the pedestal 631 . The lever member 634 has a first end portion 634-1 having a seating portion 634-1a on which the substrate is seated, and a second end portion 634-1 provided on the opposite side of the first end portion 634-1 with the shaft member 632 interposed therebetween. and end 634-2. Lever member 634 is supported by shaft member 632 such that first end 634-1 protrudes into seating area SA.

Each of the first seating members 630-1, 630-3, 630-5 also includes a biasing member 636 for applying a force to the lever member 634 to rotate the lever member 634. As shown in FIG. Biasing member 636 imparts a force to lever member 634 to rotate lever member 634 such that second end 634-2 moves downward. Therefore, when the substrate is not seated on the lever member 634, as indicated by the dashed line in FIG. 6B, the second end 634-2 is in a downwardly moved state. Biasing member 636 is a compression spring in this embodiment. Specifically, one end of the compression spring is attached to a housing 639 covering the upper portion of the lever member 634, and the other end is formed on the upper surface of the lever member 634 closer to the second end 634-2 than the shaft member 632. It is configured to be attached to the bottom surface of hole 634b. Note that the biasing member 636 is not limited to a compression spring, and any member that applies the above-described biasing force to the lever member 634 can be used as long as it is an elastic body such as rubber.

Each of the first seating members 630-1, 630-3, 630-5 further includes a seating sensor 638 for detecting that the substrate has been seated on the hand 600. FIG. Specifically, seating sensor 638 is configured to detect upward movement of second end 634-2. That is, when the substrate is not seated on lever member 634 in FIG. 6B, biasing member 636 biases lever member 634 so that second end 634-2 is positioned downward as indicated by the dashed line. state. On the other hand, when the board is seated on the seating portion 634-1a of the lever member 634, the lever member 634 rotates around the shaft member 632 due to the weight of the board, and the first end 634-1 moves downward while the first end 634-1 moves downward. 2 end 634-2 moves upward. A second end 634-2 of the lever member 634 is provided with a magnet 634-2a. Seat sensor 638 includes a magnetic sensor that detects upward movement of magnet 634-2a. The seating sensor 638 detects a change in magnetic resistance when the magnet 634-2a moves upward and approaches the magnetic sensor, thereby indicating that the second end 634-2 has moved upward, in other words, the substrate has It is detected that the lever member 634 is seated on the seat portion 634-1a.

The hand body 620 is provided with a wiring cover 622 along the outline of the hand body 620 . A cable connected to the seating sensor 638 is routed inside the wiring cover 622 . The first seating members 630 - 1 , 630 - 3 , 630 - 5 also include a housing 639 configured to cover the second end 634 - 2 of the lever member 634 and the seating sensor 638 .

According to this embodiment, it is possible to improve the accuracy of board seating detection. That is, in the prior art, seating detection was performed using an optical sensor provided in the seating portion 634-1a. Here, since the seating portion 634-1a is at a position protruding into the seating area SA, and the seating area SA contains a mixture of cleaning water used for cleaning and slurry used for polishing, The light from the optical sensor is diffusely reflected, and as a result, there are cases where substrate seating is erroneously detected. In contrast, in this embodiment, the seating sensor 638 is configured to perform seating detection by detecting upward movement of the second end 634-2. The second end 634-2 is on the opposite side of the shaft member 632 from the first end 634-1 including the seating portion 634-1a, and away from the seating area SA, so that the cleaning water or slurry As a result, the accuracy of substrate seating detection can be improved. In addition, in this embodiment, since the second end 634-2 and the seating sensor 638 are covered by the housing 639, they are much less susceptible to disturbance due to cleaning water or slurry. Accuracy can be improved.

In this embodiment, the seating sensor 638 includes an auto-switch type sensor that detects the magnet 634-2a provided at the second end 634-2 by a magnetic sensor, but is not limited to this. . For example, seating sensor 638 may include an optical sensor having a light emitting component and a light receiving component. In this case, the light emitting component and the light receiving component are located near the second end 634-2. The lever member 634 is supported by the shaft member 632 so as to shield between the light projecting component and the light receiving component when the second end 634-2 moves upward. Accordingly, when the substrate is not seated on the lever member 634, the second end 634-2 is positioned downward, and the light receiving component can detect the light output from the light projecting component. On the other hand, when the second end portion 634-2 moves upward, the light receiving component cannot detect the light output from the light emitting component, so it is possible to detect that the substrate is seated on the lever member 634. can.

In this embodiment, seating is determined by moving the magnet 634-2a between the positions indicated by the two-dot chain line and the solid line in FIG. 6B. In this embodiment, the seat sensor 638 is arranged on the side (side surface) of the second end 634-2, but is provided on the lower surface of the bolt of the housing 639 facing the upper surface of the magnet 634-2a. can be Seating sensor 638 may also include an electrical sensor. In this case, the second end 634-2 of the lever member 634 is provided with a first electrical contact. Seat sensor 638 has a second electrical contact that makes contact with the first electrical contact when second end 634-2 moves upward, and a change in voltage causes the substrate to seat on lever member 634. can be detected. Also, the seating sensor 638 may include a piezoelectric sensor (pressure sensor) or a strain gauge sensor. In this case, a piezoelectric sensor (pressure sensor) or a strain gauge sensor is installed at the contact portion of the tip or end of the second end portion 634-2, and by detecting a change in pressure or strain, the substrate is Seating on the lever member 634 can be detected. Moreover, the seating member described in the present embodiment can be applied not only to a mobile hand, but also to a temporary placement table for substrates during transportation and a positioning table for aligning notches and orientation flats.

FIG. 7A is a perspective view schematically showing the configuration of the second seating member. The second seating members 630-2, 630-4 differ from the first seating members 630-1, 630-3, 630-5 in that they do not have a biasing member 636 and a seating sensor 638. do. Since other parts have similar functions, parts having similar functions are given the same reference numerals. As shown in FIG. 7A, the second seating members 630-2 and 630-4 are respectively a pedestal 631 attached to the hand body 620, a shaft member 632 supported by the hand body 620 via the pedestal 631, and a lever member 634 supported by the shaft member 632 . The lever member 634 has a first end portion 634-1 having a seating portion 634-1a on which the substrate is seated, and a second end portion 634-1 provided on the opposite side of the first end portion 634-1 with the shaft member 632 interposed therebetween. and end 634-2. Lever member 634 is supported by shaft member 632 such that first end 634-1 protrudes into seating area SA. A housing 639 covers the lever member 634 and the shaft member 632 .

6 and 7A, the seating members 630-1 to 630-5 are respectively a pair of bearings 633 for supporting both ends of the shaft member 632 and a pair of bearings 633 for supporting the bearings 633. and a pair of elastic members 635 . The elastic member 635 is a spring member in this embodiment. The spring member is configured such that one end is attached to the lower surface of the bearing 633 and the other end is attached to the bottom surface of the hole formed in the upper surface of the hand body 620 . With this configuration, the lever member 634 is supported by the hand body 620 via the elastic member 635 . Note that the elastic member 635 is not limited to a spring member, and may be any member that can absorb the pressing load from the top ring.

FIG. 7B is a diagram schematically showing transfer of the substrate from the hand to the top ring. FIG. 7B schematically shows a cross section taken along line BB in FIG. 8A, which will be described later. The top ring 31 includes an annular retainer ring 312, a membrane 320 surrounded by the retainer ring 312, and the like. As shown in FIG. 7B, the seating member housing 639 is L-shaped in cross section. The retainer ring 312 is arranged to be accommodated in the L-shaped space of the housing 639 when the substrate W is transferred from the hand 600 to the top ring 31 . This makes it possible to easily confirm the positional relationship between the hand 600 and the top ring 31 . Further, as shown in FIG. 7B, when the substrate W is transferred from the hand to the top ring 31, the membrane 320 is pressed against the substrate W and vacuum-sucked. In this respect, the lever member 634 on which the substrate W is seated is supported by the hand body 620 via the elastic member 635 . Therefore, when the substrate W is pushed down by the membrane 320 , the pressing load is absorbed by the elastic member 635 .

According to this embodiment, the pressing load from the top ring can be absorbed more stably. That is, in the prior art, the hand is configured to include two upper and lower blades (an upper blade and a lower blade), and an elastic member is provided between the blades to absorb the pressing load from the top ring. In this case, when the membrane of the top ring is pressed against the substrate W, the entire upper blade receives the pressing load. Therefore, for example, when the membrane is in one-sided contact with the substrate W, there is a risk that the upper blade will be partially pushed down and tilted, resulting in unstable absorption of the pressing load.

On the other hand, in the present embodiment, each of the seat members 630-1 to 630-5 has an elastic member 635 that supports the lever member 634, so that the hand body 620 can be composed of one piece. Cost can be reduced. In addition, since the lever members 634 of the seating members 630-1 to 630-5 are supported by one hand body 620 via elastic members 635, for example, the membrane 320 is in one-sided contact with the substrate W. In this case, one of the seating members 630-1 to 630-5 corresponding to the uneven contact absorbs the pressing load, so that the hand body 620 is less likely to tilt. As a result, according to this embodiment, the pressing load from the top ring can be absorbed more stably. Of the first to fourth hands 600-1 to 600-4, the hand that does not receive the pressing load from the top ring (for example, the first hand 600-1) is not provided with the elastic member 635. good too. Further, the hand 600 of the present embodiment supports and fixes the substrate W, and furthermore, the method of inserting and arranging the substrate W into the supporting portion is such that the substrate W is dropped horizontally. The hand 600 of the present embodiment does not hold the substrate W by moving horizontally from both side surfaces thereof.

Note that in the above embodiment, the seating members 630-1 to 630-5 each have a shaft member 63.
2 and a pair of elastic members 635 for supporting the pair of bearings 633, but the present invention is not limited to this. Modifications of the pair of bearings 633 and the pair of elastic members 635 will be described below. FIG. 7C is a cross-sectional view taken along line C'-C' in FIG. 6A. As shown in FIG. 7C, seating members 630-1 through 630-5 may each include bearings 633' for supporting opposite ends of shaft member 632. As shown in FIG. The bearing 633 ′ is a single member that extends across both ends of the shaft member 632 below the shaft member 632 . Also, as shown in FIG. 7C, each of the seating members 630-1 through 630-5 may include a single resilient member 635' supporting the center of the lower surface of the bearing 633'.

According to this modification, as in the above-described embodiment, the lever members 634 of the seating members 630-1 to 630-5 are supported by one hand body 620 via elastic members 635'. The pressing load from the top ring can be absorbed more stably.

<Guide member and positioning member>
Next, guide members and positioning members provided on the hand 600 will be described. FIG. 8A is a plan view schematically showing the configuration of the hand. FIG. 8B is a perspective view schematically showing the configuration of the guide member. FIG. 8C is a cross-sectional view schematically showing the configuration of the guide member.

As shown in FIG. 8, the hand 600 includes a plurality of (four in this embodiment) guide members 640 . A plurality of guide members 640 are attached to the hand main body 620 at predetermined intervals so as to surround the seating area SA. Each of the plurality of guide members 640 has a columnar guide body 641 extending in the vertical direction, and a substrate receiving surface 642 formed on the guide body 641 so as to be inclined downward toward the seating area SA. A support member 644 for supporting the guide body 641 is fixed to the lower surface of the hand body 620 . A cylindrical member 645 is attached to the through hole of the hand body 620 . The guide body 641 is inserted inside a cylindrical member 645 and supported by a support member 644 via an elastic member 646 (spring member). Thereby, the load applied to the guide body 641 can be absorbed by the elastic member 646 .

By forming the substrate receiving surface 642 on the guide body 641, a substrate rake diameter WC that is larger than the diameter of the seating area SA is provided as shown in FIG. 8A. The board rake diameter WC is the diameter of a circle connecting the upper ends of the board receiving surfaces 642 of the plurality of guide bodies 641 . Even if the substrate is passed outside the seating area SA when receiving the substrate from the top ring, the hand 600 can seat the substrate on the seating area SA within the range of the substrate rake diameter WC. This point will be described later together with the positioning member described below.

FIG. 9A is a plan view schematically showing the configuration of the hand. FIG. 9B is a perspective view schematically showing the configuration of the positioning member. FIG. 9C is a side view schematically showing the configuration of the positioning member; As shown in FIGS. 9A to 9C, the hand 600 includes a plurality of (four in this embodiment) positioning members 650. As shown in FIGS. A plurality of positioning members 650 are attached to the hand main body 620 at predetermined intervals so as to surround the seating area SA. Each of the plurality of positioning members 650 has a positioning portion 652 in contact with the outer edge of the seating area SA. Specifically, each of the positioning members 650 includes a cylindrical positioning post 654 extending vertically upward from the upper surface of the hand body 620, and a positioning portion 652 is formed on the side surface of the positioning post 654 with which the substrate W contacts. be. By using the cylindrical positioning post 654 as the positioning member 650, the contact area between the substrate and the positioning post 654 can be reduced, so that the defects on the substrate surface can be reduced.

As shown in FIG. 9A, the four positioning members 650 are arranged such that the intervals between the adjacent positioning members 650 are substantially uniform. If the intervals between the adjacent positioning members 650 are made uniform (four positioning members 650 are arranged at intervals of 90°), the substrate W is ejected from the hand 600 when the substrate W is transported (particularly during horizontal transport). has the effect of suppressing the In this embodiment, due to the shape of the hand body 620 (the upper limit of the longitudinal dimension of the hand body 620), the positioning members 650 are not perfectly evenly arranged, but are approximately evenly arranged. It is possible to prevent the substrate W from jumping out of the hand 600 during transportation. Furthermore, when there is a possibility that the substrate W may ride on the positioning member 650 described below, it is possible to prevent the substrate W from falling from the opposing position of the riding portion. Further, as shown in FIG. 9A, the four positioning members 650 are arranged so that the diameter of the circle (substrate positioning diameter WP) connecting the respective positioning portions 652 includes a slight margin with respect to the diameter of the substrate W. be done. Further, as shown in FIG. 9C, the lower end 642a of the substrate receiving surface 642 is formed at a position corresponding to the outer edge of the seating area SA. The diameter of the circle connecting the positioning members 650 must be larger than the diameter of the circle connecting the lower ends 642 a of the substrate receiving surfaces 642 of the guide members 640 . This is because the substrate W may run on the positioning member 650 . Also, the positioning member 650 must be positioned inside the inner diameter of the retainer ring 312 . This is to avoid contact with the membrane when transferring the substrate W to the top ring 31 .

According to this embodiment, it is possible to prevent the substrate W from falling from the hand when receiving the substrate W from the top ring 31, and to position the substrate W in the predetermined seating area SA. That is, when the hand 600 receives the substrate W from the top ring 31 , the substrate W is detached from the membrane 320 by supplying fluid to the adsorption surface of the substrate W that is adsorbed by the membrane 320 of the top ring 31 . It's becoming In this case, there is no problem when the substrate W is separated from the membrane 320 while maintaining a horizontal state, but the substrate W may come down to the hand 600 in an inclined state because only one side of the substrate W is separated from the membrane 320 . be. In such a case, according to the present embodiment, one side of the substrate W that has descended with an inclination descends inside the outer edge of the seating area SA, but the lever members 634 of the seating members 630-1 to 630-5 are not seated. Since it protrudes into the area SA, one side of the substrate W is supported by the seating portion 634-1a of one of the lever members 634. As shown in FIG. Subsequently, the opposite side of the substrate W descends, but since one side is supported by the lever member 634 inside the outer edge of the seating area SA, the opposite side of the substrate W is formed on the guide body 641 at the opposite position. It is supported by the board receiving surface 642 . Since the substrate receiving surface 642 is inclined downward toward the seating area SA, the opposite side of the substrate W slides down the substrate receiving surface 642 to seat the substrate W on the seating area SA. At this time, since a plurality of positioning members 650 having positioning portions 652 contacting the outer edge of the seating area SA are arranged around the seating area SA, the substrate W is positioned in the seating area SA.

<Hand support>
Next, a mechanism for attaching the hand 600 to the support member 610 will be described. FIG. 10A is a perspective view schematically showing the configuration of the hand and hand support. FIG. 10B is an enlarged perspective view of the hand support portion of FIG. 10A. As shown in FIGS. 10A and 10B, the first linear transporter 6 includes a hand support 660 for attaching the hand 600 to the support member 610 as shown in FIG. The hand support 660 is a member configured to support the lower surface 620 b of the hand body 620 and is fixed to the hand body 620 with bolts 662 . Hand support 660 has bolt holes 660 a and 660 b for fixing hand support 660 to support member 610 . The hand 600 can be attached to the support member 610 by fixing the hand support 660 and the support member 610 with bolts.

Although the embodiment of FIG. 10 shows an example in which the hand support 660 is directly attached to the support member 610, the present invention is not limited to this. A hand support according to another embodiment will be described below. FIG. 11A is a perspective view schematically showing attachment of a hand to a support member. FIG. 11B is a perspective view schematically showing the configuration of the hand support; FIG. 11C is a side view and a plan view schematically showing the configuration of the hand support.

As shown in FIGS. 11A-11C, hand support 670 includes a first hand support 672 attached to hand 600 and a second hand support 674 attached to support member 610 . The first hand support 672 is a plate-like member configured to support the lower surface of the hand body 620 . The first hand support 672 has bolt holes 672a for fixing the first hand support 672 to the hand body 620 with bolts.

The second hand support 674 includes a plate-like lower support 674-1 and a plate-like upper support 674-3 spaced apart, and a connecting member 674-2 connecting the ends of both. It is shaped like a roughly U-shaped groove. Between the lower support 674-1 and the upper support 674-3 is formed a connection area 674c into which the first hand support 672 is inserted. The upper support 674-3 has bolt holes 674-3a, 674-3b for securing the second hand support 674 to the support member 610 with bolts.

As shown in FIG. 11C, hand body 620 is secured to first hand support 672 by bolts 662 . Also, the first hand support 672 is formed with a pin hole 672 b for connecting the first hand support 672 and the second hand support 674 with a pin 675 . A bottom surface 672f of the first hand support 672 is formed with a tapered surface 672c that tapers toward the second hand support 674 . A notch 672d having a trapezoidal shape in plan view is formed in a side surface 672g of the first hand support 672 on the second hand support 674 side. A pair of tapered surfaces 672e are formed on the trapezoidal legs of the notch 672d. In this embodiment, an example in which the trapezoidal notch 672d is formed in plan view is shown, but the shape of the notch 672d is arbitrary.

On the other hand, the lower support 674-1 is formed with a pin hole 674-1b for connecting the first hand support 672 and the second hand support 674 with a pin 675. As shown in FIG. A tapered surface 674-1c that is inclined corresponding to the tapered surface 672c is formed in the connecting region 674c. Specifically, an upper surface 674-1a of the lower support 674-1 is formed with a tapered surface 674-1c that slopes upward toward the connecting member 674-2. The tapered surface 674-1c is inclined corresponding to the tapered surface 672c.

Also, the connecting region 674c is formed with a protrusion 674-2d having tapered surfaces 674-2e that are inclined corresponding to the pair of tapered surfaces 672e of the trapezoidal legs of the notch 672d. Specifically, the protrusion 674-2d is formed to protrude from the connecting member 674-2 toward the first hand support 672 side. The protrusion 674-2d has a shape corresponding to the notch 672d, and has a trapezoidal shape in plan view. A pair of tapered surfaces 674-2e are formed on the trapezoidal legs of the protrusion 674-2d. In this embodiment, an example in which the notch 672d is formed in the first hand support 672 and the protrusion 674-2d is formed in the second hand support 674 is shown, but the present invention is not limited to this. For example, a notch may be formed in the second hand support 674 and a protrusion having a shape corresponding to the notch may be formed in the first hand support 672 .

The hand support 670 of this embodiment supports the hand 600 by inserting the first hand support 672 into the connecting region 674c and connecting the first hand support 672 and the second hand support 674 with the pin 675. It can be attached to member 610 .

According to the hand support 670 of this embodiment, the hand 600 can be attached to the support member 610 at an accurate position in a short time. In other words, the parts of the hand 600, particularly the seating members 630-1 to 630-5 that come into contact with the substrate, are subject to wear and the like, so it is desirable to replace them periodically. In order to replace the parts, the hand 600 needs to be removed from the support member 610 and reattached to the support member 610 after the parts are replaced. Here, for example, when the hand support 660 is directly attached to the support member 610 as shown in FIG. 10, it is difficult to position the hand 600, and it takes time to perform attachment with high accuracy, resulting in poor work efficiency.

On the other hand, according to the hand support 670, when the first hand support 672 is inserted into the connection region 674c, the tapered surface 672c is guided by the tapered surface 674-1c, and the pair of tapered surfaces 672e are tapered. Being guided by the surface 674-2e, the first hand support 672 can be easily positioned in the correct position within the coupling area 674c. When the first hand support 672 is positioned accurately, the pin hole 672b and the pin hole 674-1b are aligned, so that the pin 675 can be inserted into the first hand support without bolting. 672 and second hand support 674 can be easily connected. In this embodiment, an example is shown in which the first hand support 672 is attached to the hand 600 and the second hand support 674 is attached to the support member 610, but the present invention is not limited to this. A first hand support 672 may be attached to the support member 610 and a second hand support 674 may be attached to the hand 600 .

Although some embodiments of the present invention have been described above, the above-described embodiments of the present invention are intended to facilitate understanding of the present invention, and do not limit the present invention. The present invention may be modified and improved without departing from its spirit, and the present invention includes equivalents thereof. In addition, any combination or omission of each component described in the claims and the specification is possible within the range that at least part of the above problems can be solved or at least part of the effect is achieved. is.

The present application provides, as one embodiment, a hand for holding a substrate, the hand comprising a hand main body, a plurality of seating members attached to the hand main body on which the substrate is seated, and a seat on which the substrate is seated. A plurality of guide members attached to the hand body at predetermined intervals so as to surround the seating area, and a plurality of positioning members attached to the hand body at predetermined intervals to surround the seating area. and wherein each of the plurality of guide members has a substrate receiving surface that slopes downward toward the seating area, and each of the plurality of positioning members has a positioning portion that contacts an outer edge of the seating area. Reveal your hand.

Furthermore, the present application discloses, as one embodiment, a hand in which each of the plurality of positioning members includes a cylindrical positioning post.

Further, according to one embodiment of the present application, each of the plurality of seating members is a shaft member supported by the hand main body and a lever member supported by the shaft member, and has a seating portion on which a substrate is seated. a lever member including a first end and a second end provided on the opposite side of the first end across the shaft member; a biasing member for imparting a force on the lever member to rotate the lever member such that the second end moves downward; and the second end moves upward. A hand is disclosed, further comprising a seating sensor configured to detect a .

Further, in one embodiment, the present application provides a hand, wherein the second end of the lever member is provided with a magnet, and the seating sensor includes a magnetic sensor that detects upward movement of the magnet. Disclose.

Further, according to one embodiment, the seating sensor includes an optical sensor having a light emitting part and a light receiving part, and the lever member moves the light emitting part when the second end moves upward. Disclosed is a hand supported by the shaft member so as to shield between the optical component and the light receiving component.

Further, according to an embodiment of the present application, the second end of the lever member is provided with a first electrical contact, and the seating sensor detects the seat position when the second end moves upward. A hand is disclosed that includes an electrical sensor having a second electrical contact in contact with the first electrical contact.

Furthermore, the present application discloses, as one embodiment, a hand, wherein at least some of the plurality of seating members further include a housing configured to cover the second end of the lever member and the seating sensor. do.

Further, according to an embodiment of the present application, the plurality of seating members are attached to the hand body with a predetermined space therebetween so as to surround a seating area on which the substrate is seated, and the lever member is attached to the first Disclosed is a hand supported by the shaft member so that an end thereof protrudes into the seating area.

Furthermore, the present application discloses, as one embodiment, a hand in which each of the plurality of seating members includes a bearing for supporting both end portions of the shaft member and an elastic member for supporting the bearing. .

Furthermore, the present application further includes, as an embodiment, a support member for supporting the hand, and a hand support for attaching the hand to the support member, the hand support includes the hand and the support member. and a second hand support attached to the other of the hand and the support member, wherein the bottom surface of the first hand support includes the first The second hand support has a connecting region into which the first hand support is inserted, and the connecting region includes , wherein a tapered surface that is inclined corresponding to the tapered surface of the first hand support is formed.

Further, according to an embodiment of the present application, a notch is formed in a side surface of the first hand support on the side of the second hand support, and the connecting region has a notch formed in the notch. Disclosed is a hand in which a projection having a tapered surface that is inclined corresponding to the tapered surface is formed.

Furthermore, the present application discloses, as an embodiment, a transport device including any one of the hands described above and a drive mechanism for moving the hand.

Further, the present application provides, as an embodiment, a polishing apparatus configured to polish a substrate, a cleaning apparatus configured to clean a substrate, and a substrate to be processed by the polishing apparatus or the cleaning apparatus. A substrate processing apparatus is disclosed, including a transport apparatus according to any of the above, configured to:

6 First linear transporter (conveyor)
7 Second linear transporter (conveyor)
600 Hand 600-1 First hand 600-2 Second hand 600-3 Third hand 600-4 Fourth hand 610 Support member 620 Hand body 630 Seat member 631 Pedestal 632 Shaft member 634 Lever member 634-1 First end 634-1a Seating portion 634-2 Second end 634-2a Magnet 635 Elastic member 636 Biasing member 638 Seating sensor 639 Housing 640 Guide member 641 Guide body 642 Board receiving surface 680 Driving mechanism 650 Positioning member 652 positioning part 654 positioning post 660 hand support 670 hand support 672 first hand support 672c tapered surface 672d notch 672e tapered surface 672f bottom surface 672g side surface 674 second hand support 674-1c tapered surface 674-2d protrusion 674-2e Tapered surface 674c Connection area 1000 CMP apparatus SA Seating area W Substrate

Claims (13)

A hand for holding a substrate,
The hand includes a hand main body, a plurality of seating members attached to the hand main body on which the substrate is seated, and a plurality of seating members attached to the hand main body at predetermined intervals so as to surround a seating area on which the substrate is seated. a plurality of guide members, and a plurality of positioning members attached to the hand body at predetermined intervals so as to surround the seating area;
each of the plurality of guide members has a substrate receiving surface that slopes downward toward the seating area;
each of the plurality of positioning members has a positioning portion in contact with an outer edge of the seating area;
hand. each of the plurality of positioning members includes a positioning post formed in a cylindrical shape;
A hand according to claim 1 . Each of the plurality of seating members includes a shaft member supported by the hand body, a lever member supported by the shaft member, and having a first end portion having a seating portion on which the substrate is seated, and the shaft member. a lever member including a second end provided opposite the first end across the
At least a portion of the plurality of seating members includes a biasing member for applying a force to the lever member to rotate the lever member such that the second end moves downward; a seat sensor configured to detect upward movement of the part;
3. A hand according to claim 1 or 2. a magnet is provided at the second end of the lever member;
The seating sensor includes a magnetic sensor that detects that the magnet has moved upward,
A hand according to claim 3. The seating sensor includes an optical sensor having a light emitting component and a light receiving component,
The lever member is supported by the shaft member so as to shield between the light projecting component and the light receiving component when the second end moves upward.
A hand according to claim 3. a first electrical contact is provided at the second end of the lever member;
The seating sensor includes an electrical sensor having a second electrical contact that makes contact with the first electrical contact when the second end moves upward.
A hand according to claim 3. at least a portion of the plurality of seating members further includes a housing configured to cover the second end of the lever member and the seating sensor;
A hand according to any one of claims 1 to 6. the plurality of seating members are attached to the hand body at predetermined intervals so as to surround a seating area on which the board is seated;
The lever member is supported by the shaft member such that the first end protrudes into the seating area.
A hand according to any one of claims 1 to 7. each of the plurality of seating members includes a bearing for supporting both end portions of the shaft member; an elastic member for supporting the bearing;
comprising
A hand according to any one of claims 1 to 8. a support member for supporting the hand;
a hand support for attaching the hand to the support member;
further comprising
The hand support includes a first hand support attached to one of the hand and the support member, and a second hand support attached to the other of the hand and the support member,
The bottom surface of the first hand support is formed with a tapered surface that tapers toward the second hand support,
The second hand support has a connection area into which the first hand support is inserted, and the connection area is formed with a tapered surface that is inclined corresponding to the tapered surface of the first hand support. has been
A hand according to any one of claims 1 to 9. A notch is formed in a side surface of the first hand support on the side of the second hand support,
A protrusion having a tapered surface that is inclined corresponding to the tapered surface formed in the notch is formed in the connecting region,
11. A hand according to claim 10. a hand according to any one of claims 1 to 11;
a driving mechanism for moving the hand;
A conveying device, comprising: a polishing apparatus configured to polish a substrate;
a cleaning apparatus configured to clean a substrate;
13. The transfer device according to claim 12, configured to transfer a substrate to be processed by the polishing device or the cleaning device;
A substrate processing apparatus comprising:

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