JP2023024401A - Polymer, polymer solution, photosensitive resin composition, and cured product - Google Patents

Abstract

To provide a polymer which has improved heat characteristics, thereby is excellent in processability and pattern formation property by photolithography processing, and is excellent in such resin cured product sensitivity as to have sensitivity, alkali solubility and thermal yellowing resistance in a good balance.SOLUTION: A polymer includes at least one structural unit selected from a structural unit having norbornene, a structural unit having adjacent linear or branched alkyl carboxylates having 1 to 12 carbon atoms, a structural unit where a carboxyl group and carboxylate are adjacent to each other, and the carboxylate is ester of alcohol having two or more (meth) acryloyl groups, and a structural unit where carboxylate is ester of alcohol having one (meth) acryloyl group.SELECTED DRAWING: None

Description

TECHNICAL FIELD The present invention relates to a polymer, a polymer solution containing the polymer, a photosensitive resin composition containing the polymer solution, and a cured product of the photosensitive resin composition.

A liquid crystal display device or a solid-state imaging device usually includes a color filter, a black matrix, spacers (eg, photospacers, colored spacers, black spacers), and partition walls (eg, transparent banks, black banks). The color filter, black matrix, spacer, and partition wall material are configured by forming structures such as a colored pattern and a protective film on a substrate. Among these structures, a method of forming a colored pattern or a protective film by photolithography using a photosensitive resin composition has become mainstream. Various studies have been made on photosensitive resin compositions. For example, in Patent Document 1, at least in a side chain, an alkaline compound having a group having an acidic group and two or more different polymerizable unsaturated groups A photosensitive resin composition is described that includes a soluble resin, a polymerizable compound, and a photoinitiator. Further, in Examples of Patent Document 1, it is described that a methacrylic acid/allyl methacrylate/glycidyl adduct was synthesized as an alkali-soluble resin, and a photosensitive resin composition was prepared using this.

WO2012/147706

A photosensitive resin composition for forming a color filter, a black matrix, a spacer, or a partition wall material uses a resin having a property of being cured by a polymerization reaction caused by light. A color filter, a black matrix, a spacer, or a partition material is produced by patterning a photosensitive resin composition by exposure and development, and then curing the pattern. In photosensitive resin compositions, "increase in sensitivity" seems to be a general issue, but with the increasing complexity and spread of display devices and imaging devices, there is a demand for a higher level of sensitivity. The higher the sensitivity of the photosensitive resin composition, the shorter the time required for exposure, and the productivity can be improved. In addition, the photosensitive resin composition is required to have excellent processability in development processing using an alkaline developer. Furthermore, the cured product of the photosensitive resin composition is required to have high transparency.
In addition, especially when dyes and pigments are contained in the photosensitive resin composition, the bottom surface of the pattern is less likely to receive light than the top surface of the pattern during exposure, curing due to exposure becomes insufficient, and the side portion of the bottom surface of the pattern dissolves during development. phenomena may occur. At that time, if the pattern is melted by heat during curing after development, the melted portion on the bottom side of the pattern can be filled, so the cured product of the photosensitive resin composition is required to have a low softening point and melting point. be done.

The present inventors have improved the polymer used in the photosensitive resin composition and the formulation of the composition to have a low softening point and melting point, thereby improving workability and pattern formability in photolithography processing. The present inventors have found that a cured resin product having excellent sensitivity, alkali solubility, and heat-resistant yellowing resistance in a good balance can be obtained, leading to the present invention.

式（ＮＢ）中、Ｒ^１、Ｒ^２、Ｒ^３およびＲ^４は、それぞれ独立して、水素原子または炭素数１～３０の有機基であり、ａ_１は０、１または２であり、

式（ＡＤ）中、Ｒ^１１およびＲ^１２は、それぞれ独立して、炭素数１～１２の直鎖または分枝鎖のアルキル基であり、

式（１）中、Ｒ^ｐは、２以上の（メタ）アクリロイル基を有する基であり、Ｒ^２１およびＲ^２２は、それぞれ独立して、水素原子または炭素数１～３の有機基であり、

式（２）中、Ｒ^ｓは、１つの（メタ）アクリロイル基を有する基であり、Ｒ^２１およびＲ^２２は、それぞれ独立して、水素原子または炭素数１～３の有機基である、ポリマーが提供される。 According to the invention,
a structural unit represented by the formula (NB);
a structural unit represented by the formula (AD);
at least one structural unit selected from structural units represented by formula (1) and structural units represented by formula (2);
A polymer comprising

In formula (NB), R ¹ , R ² , R ³ and R ⁴ are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, a ₁ is 0, 1 or 2,

In formula (AD), R ¹¹ and R ¹² are each independently a linear or branched alkyl group having 1 to 12 carbon atoms,

In formula (1), R ^p is a group having two or more (meth)acryloyl groups, R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms,

In formula (2), R ^s is a group having one (meth)acryloyl group, and R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms, polymer is provided.

The present invention also provides a polymer solution containing the above polymer.

Further, according to the present invention, there is provided a photosensitive resin composition containing the above polymer solution and a photopolymerization initiator.

Moreover, according to this invention, the hardened|cured material of the said photosensitive resin composition is provided.

式（ＮＢ）中、Ｒ^１、Ｒ^２、Ｒ^３およびＲ^４は、それぞれ独立して、水素原子または炭素数１～３０の有機基であり、ａ_１は０、１または２であり、

式（ＭＡ）中、Ｒ^２１およびＲ^２２は、それぞれ独立して、水素原子または炭素数１～３の有機基であり、

式（ＡＤ）中、Ｒ^１１およびＲ^１２は、それぞれ独立して、炭素数１～１２の直鎖または分枝鎖のアルキル基である、ポリマーが提供される。 Also according to the present invention,
a structural unit represented by the formula (NB);
a structural unit represented by the formula (AD);
A polymer comprising a structural unit represented by the formula (MA),

In formula (NB), R ¹ , R ² , R ³ and R ⁴ are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, a ₁ is 0, 1 or 2,

In formula (MA), R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms,

A polymer is provided wherein R ¹¹ and R ¹² in formula (AD) are each independently a linear or branched alkyl group having 1 to 12 carbon atoms.

According to the present invention, the softening point and melting point are low, so that the pattern formability after curing is excellent, and the composition has high alkali solubility, so that the developability is excellent, yellowing is reduced, and heat discoloration is high. A polymer is provided as a resin material for use in a photosensitive resin composition having properties.

1 is a diagram (cross-sectional view) schematically showing an example of the structure of a liquid crystal display device and/or a solid-state imaging device; FIG. 13 is a ¹³ C-NMR chart of Raw Polymer 4. FIG. 4 is a TMA chart of Raw Polymer 4. FIG.

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below. In addition, in all the drawings, the same constituent elements are denoted by the same reference numerals, and the description thereof will be omitted as appropriate. Also, all drawings are for illustration purposes only. The shape and dimensional ratio of each member in the drawings do not necessarily correspond to the actual article. In this specification, the notation "a to b" in the description of numerical ranges means "a or more and b or less" unless otherwise specified. For example, "5 to 90%" means "5% to 90%".

In the description of a group (atomic group) in the present specification, a description without indicating whether it is substituted or unsubstituted includes both those having no substituent and those having a substituent. For example, an "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).

The notation "(meth)acryl" used herein represents a concept that includes both acryl and methacryl. The same applies to similar notations such as "(meth)acrylate".
In particular, the "(meth)acryloyl group" used herein means an acryloyl group represented by -C(=O)-CH=CH ₂ and -C(=O)-C(CH ₃ )=CH ₂ Represents a concept including a methacryloyl group represented by.

[Polymer P]
The polymer of the present invention (herein referred to as "polymer P") is described. Unless otherwise specified, structural units or compounds represented by the same structural formula have common definitions and preferred aspects are the same across all embodiments.

(First embodiment)
(Polymer P (I))
The polymer in the first embodiment of the present invention (hereinafter referred to as "polymer P(I)") comprises a structural unit represented by (NB), a structural unit represented by formula (AD), and a structural unit represented by formula ( 1) and at least one structural unit selected from structural units represented by formula (2).

In formula (NB), R ¹ , R ² , R ³ and R ⁴ are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, and a ₁ is 0, 1 or 2.

In formula (AD), R ¹¹ and R ¹² are each independently a linear or branched alkyl group having 1 to 12 carbon atoms.

In formula (1), R ^p is a group having two or more (meth)acryloyl groups, and R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms.

In formula (2), R ^s is a group having one (meth)acryloyl group, and R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms.

Polymer P(I) of the present embodiment has a norbornene-derived structural unit represented by formula (NB). Structural units derived from norbornene monomers are chemically robust. Therefore, the polymer P(I) containing this as a structural unit undergoes little weight loss and is stable when subjected to heat treatment.

Moreover, the polymer P(I) of the present embodiment has a structural unit derived from the unsaturated carboxylic acid dialkyl ester represented by the formula (AD). By introducing a structural unit (AD) derived from an unsaturated carboxylic acid dialkyl ester into the polymer P(I), the softening point of the polymer P(I) can be increased without changing sensitivity, alkali solubility and heat yellowing. and lower the melting point. As a result, the polymer P(I) having the structural unit (AD) derived from the unsaturated carboxylic acid dialkyl ester is easily melted by heat during curing, and has excellent workability and pattern formability in photolithography. Therefore, the photosensitive resin composition containing the polymer P(I) can be suitably used for producing films and filters for use in liquid crystal display devices and solid-state imaging devices that require heat resistance.

In the structural unit derived from the unsaturated carboxylic acid dialkyl ester represented by the formula (AD), the configuration of the -C(=O)-OR ¹¹ group and the -C(=O)-OR ¹² group is There is no limitation, and it may be cis-type or trans-type. More specifically, as described in the production method of the polymer P(I) below, the structural unit derived from the unsaturated carboxylic acid dialkyl ester represented by the formula (AD) is a cis-unsaturated dicarboxylic acid dialkyl ester It may be a structure derived from or a structure derived from a trans-unsaturated dicarboxylic acid dialkyl ester.

Further, the polymer P(I) of the present embodiment contains a structural unit represented by formula (1) and/or a structural unit represented by formula (2). In other words, the polymer P(I) contains either or both of the structural unit represented by formula (1) and the structural unit represented by formula (2). Thereby, the photosensitive resin composition containing the polymer P(I) has excellent sensitivity when subjected to photolithography. This is probably because the (meth)acryloyl group contained in the structural unit represented by formula (1) or formula (2) accelerates the curing reaction (polymerization reaction).

In a preferred embodiment, polymer P(I) contains a structural unit represented by general formula (1) as an essential constituent. Since the structural unit represented by formula (1) has at least one (meth)acryloyl group, the polymer P(I) containing it has high sensitivity in photolithographic processing.

In the structural unit represented by the formula (NB) constituting the polymer P(I), the organic group having 1 to 30 carbon atoms that can constitute R ¹ to R ⁴ is a saturated or unsaturated linear , branched or cyclic hydrocarbon groups having 1 to 30 carbon atoms, alkoxy groups, heterocyclic groups, and carboxy groups. Hydrocarbon groups include, for example, alkyl groups, alkenyl groups, alkynyl groups, alkylidene groups, aryl groups, aralkyl groups, alkaryl groups, cycloalkyl groups, and the like.

Examples of alkyl groups include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, neopentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group and the like.

Alkenyl groups include, for example, allyl groups, pentenyl groups, and vinyl groups.
Examples of alkynyl groups include ethynyl groups.
The alkylidene group includes, for example, a methylidene group and an ethylidene group.
Aryl groups include, for example, tolyl, xylyl, phenyl, naphthyl, and anthracenyl groups.

The aralkyl group includes, for example, a benzyl group and a phenethyl group.
Examples of the alkaryl group include tolyl group and xylyl group.
Cycloalkyl groups include, for example, adamantyl, cyclopentyl, cyclohexyl, and cyclooctyl groups.
Examples of alkoxy groups include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, sec-butoxy, isobutoxy, tert-butoxy, n-pentyloxy, and neopentyloxy groups. , n-hexyloxy group and the like.
Heterocyclic groups include, for example, an epoxy group and an oxetanyl group.

R ¹ , R ² , R ³ and R ⁴ in the structural unit represented by formula (NB) are preferably hydrogen or alkyl groups, more preferably hydrogen.
The hydrogen atoms in the organic groups having 1 to 30 carbon atoms of R ¹ , R ² , R ³ and R ⁴ may be substituted with arbitrary atomic groups. For example, it may be substituted with a fluorine atom, a hydroxy group, a carboxy group, or the like. More specifically, a fluorinated alkyl group or the like may be selected as the organic group having 1 to 30 carbon atoms for R ¹ , R ² , R ³ and R ⁴ .
In the structural unit represented by formula (NB), _a1 is preferably 0 or 1, more preferably 0.

The ratio of the structural unit represented by the formula (NB) in the total structural units constituting the polymer P(I) is preferably 25 to 75 mol%, more preferably 30 to 65 mol%, and still more preferably 35 to 75 mol%. 60 mol %.

In the structural unit represented by the formula (AD) constituting the polymer P(I), R ¹¹ and R ¹² are each independently a linear or branched alkyl group having 1 to 12 carbon atoms. .
Linear or branched alkyl groups having 1 to 12 carbon atoms that can constitute R ¹¹ and R ¹² in the structural unit of formula (AD) include, for example, methyl group, ethyl group, n-propyl group and isopropyl group. , n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, neopentyl group, hexyl group, ethylhexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, etc. mentioned. Among them, since the obtained polymer P(I) has a low softening point and a low melting point without impairing the heat yellowing resistance, R ¹¹ and R ¹² are linear or branched alkyl having 1 to 12 carbon atoms. groups are preferred.

The ratio of the structural unit represented by the formula (AD) in the total structural units constituting the polymer P(I) is preferably 2 to 30 mol%, more preferably 3 to 28 mol%, still more preferably 5 to 25 in mol %. By setting the ratio of the structural unit represented by the formula (AD) in the polymer P(I) to the above range, the polymer P(I) has a low softening point and a low melting point, and a good balance between sensitivity, alkali solubility and heat discoloration resistance. A highly improved polymer P(I) can be obtained.

Polymer P(I) is a structural unit containing two or more (meth)acryloyl groups (-C(=O)-CH=CH ₂ ) represented by formula (1), or represented by formula (2) or a structural unit containing one (meth)acryloyl group, or a combination thereof. By containing such structural units, the polymer P(I) has better sensitivity in exposure processing.

In formula (1) or formula (2), the organic group having 1 to 3 carbon atoms that can constitute R ²¹ and R ²² includes methyl group, ethyl group, n-propyl group and isopropyl group. Both R ²¹ and R ²² are preferably hydrogen atoms.

In the structural unit represented by formula (1), R ^p is a group containing 2 or more (meth)acryloyl groups, preferably a group containing 2 to 6 (meth)acryloyl groups, more preferably It is a group containing 3 to 5 (meth)acryloyl groups. By optimizing the number of (meth)acryloyl groups contained in ^Rp , the sensitivity of the polymer P(I) containing this in exposure processing can be further enhanced. In addition, it becomes easier to achieve both sensitivity and alkali solubility of the polymer P(I) to a higher degree. Furthermore, the heat resistance of the polymer P(I) can be improved.

R ^p in formula (1) is preferably a group represented by formula (1b), a group represented by formula (1c), or a group represented by formula (1d), and is selected from these At least one type is included. With such a group, there is a tendency to easily obtain the various effects described above.

In formula (1b),
k is 2 or 3,
R is a hydrogen atom or a methyl group, multiple R may be the same or different,
X ¹ is a single bond, an alkylene group having 1 to 6 carbon atoms or a group represented by -ZX- (where Z is -O- or -OCO- and X is an alkylene group having 1 to 6 carbon atoms ), and multiple X ¹ may be the same or different,
X ¹ ' is a single bond, an alkylene group having 1 to 6 carbon atoms or a group represented by -X'-Z'- (X' is an alkylene group having 1 to 6 carbon atoms, Z' is -O- or -COO-),
X ² is a k+1 valent organic group having 1 to 12 carbon atoms.
R is preferably a hydrogen atom from the viewpoint of further improvement of sensitivity (ease of polymerization).
Although k may be 2 or 3, it is preferably 3 from the standpoints of availability of raw materials and further improvement of sensitivity.

When X ¹ is an alkylene group having 1 to 6 carbon atoms, the alkylene group may be linear or branched.
When X ¹ is an alkylene group having 1 to 6 carbon atoms, X ¹ is preferably a linear alkylene group, more preferably a linear alkylene group having 1 to 3 carbon atoms, still more preferably -CH _2- (methylene group).

When X ¹ is a group represented by -ZX- (Z is -O- or -OCO- and X is an alkylene group having 1 to 6 carbon atoms), X has 1 to 6 carbon atoms Alkylene groups can be straight or branched.
The alkylene group having 1 to 6 carbon atoms of X is preferably a linear alkylene group, more preferably a linear alkylene group having 1 to 3 carbon atoms, and still more preferably -CH ₂ -CH ₂ -( ethylene group) or —CH ₂ —CH(CH ₃ )—.

When X ¹ ' is an alkylene group having 1 to 6 carbon atoms, specific aspects thereof are the same as those of X ¹ .
When X ¹ ' is a group represented by -X'-Z'-, specific aspects of X' are the same as X above.

Examples of the (k+1)-valent organic group having 1 to 12 carbon atoms for X ² include any group obtained by removing (k+1) hydrogen atoms from any organic compound. The “any organic compound” used herein is, for example, an organic compound having a molecular weight of 300 or less, preferably 200 or less, more preferably 100 or less.
X ² is, for example, a group obtained by removing (k+1) hydrogen atoms from a straight-chain or branched hydrocarbon having 1 to 12 carbon atoms (preferably 1 to 6 carbon atoms). More preferably, it is a group obtained by removing (k+1) hydrogen atoms from a straight-chain hydrocarbon having 1 to 3 carbon atoms. In addition, the hydrocarbon here may contain an oxygen atom (for example, an ether bond, a hydroxy group, etc.). Also, the hydrocarbon is preferably a saturated hydrocarbon.
Alternatively, X ² may be a group containing a cyclic structure. Examples of the group containing a cyclic structure include groups containing an alicyclic structure, groups containing a heterocyclic structure (eg, isocyanuric acid structure), and the like.

In formula (1c),
k, R, X ¹ and X ² are respectively synonymous with R, k, X ¹ and X ² in formula (1b); X ¹ may be the same or different,
X ³ is a divalent organic group having 1 to 6 carbon atoms,
X ⁴ and X ⁵ are each independently a single bond or a divalent organic group having 1 to 6 carbon atoms,
X ⁶ is a divalent organic group having 1 to 6 carbon atoms.

Specific aspects and preferred aspects of R, k, X ¹ and X ² are the same as those described for formula (1b).
Examples of the divalent organic group having 1 to 6 carbon atoms of X ³ and X ⁶ include a group obtained by removing two hydrogen atoms from a linear or branched hydrocarbon having 1 to 6 carbon atoms. can be done. In addition, the hydrocarbon here may contain an oxygen atom (for example, an ether bond, a hydroxy group, etc.). Also, the hydrocarbon is preferably a saturated hydrocarbon.
Examples of the divalent organic group having 1 to 6 carbon atoms for X ⁴ and X ⁵ include linear or branched alkylene groups. The number of carbon atoms in the linear or branched alkylene group is preferably 1-3.

In formula (1d), n is an integer of 2-5, preferably 2 or 3.
Specific aspects and preferred aspects of R are the same as those described for formula (1b).

When polymer P(I) contains structural units represented by formula (1), the ratio of structural units represented by formula (1) to all structural units of polymer P(I) is preferably 3. ~40 mol%, more preferably 3 to 30 mol%.

In the structural unit represented by formula (2) that can constitute the polymer P(I), R ^S is a group containing only one (meth)acryloyl group. In particular, in the design of ordinary photosensitive resin compositions, when the curability is increased in order to increase the sensitivity, the curing proceeds too much and the developability tends to deteriorate. Polymer P(I) may contain either or both structural units represented by formula (1) and structural units represented by formula (2), since curing tends to be insufficient in some cases. This is preferable because both sensitivity and developability can be achieved with a good balance.

R ^s is, for example, a group represented by formula (2a) below.

In formula (2a), X ¹⁰ is a divalent organic group and R is a hydrogen atom or a methyl group. The total carbon number of X ¹⁰ is preferably 1-30, more preferably 1-20, even more preferably 1-10.
As the divalent organic group for X ¹⁰ , for example, an alkylene group is preferable. A part of --CH ₂ -- in this alkylene group may be an ether group (--O--). The alkylene group may be linear or branched, but is more preferably linear.

More preferably, the divalent organic group for X ¹⁰ is a linear alkylene group having 3 to 6 carbon atoms in total. By appropriately selecting the carbon number of ^X10 (chain length of ^X10 ), the structural unit represented by formula (2) is more likely to participate in the cross-linking reaction, and the sensitivity can be enhanced.

The divalent organic group (eg, alkylene group) of X ¹⁰ may be substituted with any substituent. Examples of substituents include alkyl groups, aryl groups, alkoxy groups, and aryloxy groups.
Also, the divalent organic group of X ¹⁰ may be any group other than an alkylene group. For example, it may be a divalent group formed by linking one or more groups selected from an alkylene group, a cycloalkylene group, an arylene group, an ether group, a carbonyl group, a carboxy group, and the like.

When the polymer P(I) contains the structural unit represented by formula (2), the proportion of the structural unit represented by formula (2) in the total structural units of the polymer P is preferably 5 to 30 mol%. , more preferably 10 to 20 mol %.

Further, when the polymer P(I) contains both the structural unit represented by the formula (1) and the structural unit represented by the formula (2), the formula (1) in the polymer P(I) The total ratio of the structural unit represented by the formula (2) to the structural unit represented by the formula (2) is preferably 5 to 40 mol%, more preferably 10, based on the total structural units constituting the polymer P(I). to 35 mol %, more preferably 15 to 30 mol %.

Polymer P(I) of the present embodiment may contain a structural unit represented by formula (3) in addition to the structural units described above. Polymer P(I) has high alkali solubility by containing the structural unit represented by Formula (3). As a result, the photosensitive resin composition containing the polymer P(I) has excellent developability when subjected to photolithography using an alkaline aqueous solution as a developer. The proportion of the structural unit represented by formula (3) in the total structural units of the polymer P(I) is preferably 1-10 mol %, more preferably 2-7 mol %.

Polymer P(I) of the present embodiment may contain a structural unit represented by formula (MA) in addition to the structural units described above. The structural unit represented by formula (MA) is ring-opened by an alkaline developer to generate two carboxyl groups. Therefore, the polymer P(I) has excellent developability. When polymer P(I) contains structural units represented by formula (MA), the number of structural units represented by formula (MA) in all structural units of polymer P(I) is preferably 3 to 40. mol %, more preferably 10 to 30 mol %.

The content (ratio) of each structural unit contained in the polymer P(I) is determined by the charged amount (molar amount) of raw materials used when synthesizing the polymer, the amount of raw materials remaining after synthesis, various spectra (e.g., IR Spectra, ¹ H-NMR spectrum, ¹³ C-NMR spectrum) can be estimated/calculated from the presence of peaks, peak areas, and the like.

The weight average molecular weight Mw of polymer P(I) is, for example, 3,000 to 15,000. The weight average molecular weight Mw of polymer P(I) is preferably 3,500 to 12,000, more preferably 4,000 to 10,000. By appropriately adjusting the weight average molecular weight, it is possible to adjust sensitivity and solubility in an alkaline developer.
Further, the degree of dispersion (weight average molecular weight Mw/number average molecular weight Mn) of the polymer P(I) of the present embodiment is preferably 1.0 to 5.0, more preferably 1.0 to 4.0, even more preferably is between 1.0 and 3.0. By appropriately adjusting the degree of dispersion, the physical properties of the polymer P can be made uniform, which is preferable. These values can be obtained by gel permeation chromatography (GPC) measurement using polystyrene as a standard substance.

The glass transition temperature of the polymer P(I) is preferably 100-250°C, more preferably 120-230°C. When mainly containing the structural unit of formula (NB), the glass transition temperature tends to be high, while when containing the structural unit of formula (AD), the glass transition temperature tends to be low. The polymer P of the present embodiment has a preferable glass transition temperature by including the structural unit represented by the formula (NB) and the structural unit represented by the formula (AD). This is preferable in that the pattern formed on the substrate can exist stably in manufacturing liquid crystal display devices and solid-state imaging devices. The glass transition temperature can be determined by, for example, differential thermal analysis (DTA).

The acid value of the polymer P(I) is 70 mgKOH/g or more and 150 mgKOH/g or less, preferably 80 mgKOH/g or more and 140 mgKOH/g or less. The double bond equivalent of the polymer P1 is 100 g/mol or more and 900 g/mol or less, preferably 200 g/mol or more and 850 g/mol or less, more preferably 200 g/mol or more and 800 g/mol or less.
Favorable developability can be obtained because the acid value of the polymer P(I) is 70 mgKOH/g or more. Further, when the double bond equivalent is 900 g/mol or less, the sensitivity of the photosensitive resin composition containing the polymer P(I) can be increased.

If the acid value of the polymer P(I) is too high, the exposed portion is likely to dissolve during development with an alkaline developer, resulting in an increase in the amount of exposure required for photocuring, or an undesirable pattern shape. There is concern that it will be enough. Therefore, in this embodiment, the upper limit of the acid value is set to 150 mgKOH/g.
In addition, if the double bond equivalent of the polymer P(I) is too small (that is, if the density of the double bonds in the polymer is too high), the unexposed areas and underexposed areas will dissolve during development with an alkaline developer. It tends to be difficult to remove, and a residual film tends to occur during development. On the other hand, if the double bond equivalent is too small, the molecular weight will excessively increase due to cross-linking, and there is a concern that the solubility will be excessively lowered. Therefore, in this embodiment, the lower limit of the double bond equivalent is set to 100 g/mol.

By providing the above configuration, the polymer P(I) of the present embodiment can have an alkali dissolution rate of 40 nm/s or more, preferably 100 nm/s or more, more preferably , 500 nm/s or more, and more preferably 1000 nm/s or more. Although the upper limit is not particularly limited, it can be, for example, 2000 nm/s or less. In the specification of the present application, the alkali dissolution rate is a value measured under the following conditions.
(Method for Measuring Alkaline Dissolution Rate) Polymer P(I) is dissolved in propylene glycol monomethyl ether acetate (PGMEA) to prepare a solution having a solid concentration of 30% by mass. Next, the resulting polymer solution is spin-coated on the wafer, the PGMEA is dried, and pre-baked at 100° C. for 2 minutes to form a resin film with a film thickness of 2 μm±0.2. This resin film, together with the wafer, is immersed in a 2.0% by mass sodium carbonate aqueous solution at a temperature of 23°C. The immersed wafer was visually observed to measure the time until the resin film dissolved and the interference pattern disappeared. Calculate the dissolution rate (μm/sec).

By adjusting the acid value and/or double bond equivalent of the polymer P(I), both sensitivity and developability can be achieved at a higher level.

The acid value and double bond equivalent of polymer P(I) can be determined by spectral measurement or the like. For example, it can be determined by the following procedure (more specifically, see Examples).
(1) From the ¹ H-NMR chart of the polymer, the area (integral value) of the peaks corresponding to the hydrogen atoms of the carboxy group and the hydrogen atoms in the vicinity of the polymerizable carbon-carbon double bond is obtained.
(2) Based on the area obtained in (1) and the area of the peak derived from the standard substance, the amount of carboxy groups and the amount of carbon-carbon double bonds are obtained.
(3) Convert the amount of carboxy groups obtained in (2) into an acid value (mgKOH/g). Also, the amount of the polymerizable carbon-carbon double bond obtained in (2) is converted into a double bond equivalent (g/mol).

The acid value and double bond equivalent of the polymer P(I) are contained in the ratio of the structural units introduced into the polymer P(I), particularly the structural units represented by formula (1) or formula (2) (meta ) can be adjusted to a desired value by appropriately designing the number of polymerizable carbon-carbon double bonds possessed by the acryloyl group.

The content (ratio) of each structural unit contained in the polymer P(I) of the present embodiment includes the charged amount (molar amount) of raw materials during polymer synthesis, the amount of raw materials remaining after synthesis, and the peak area of various spectra. (eg, peak area of ¹ H-NMR), etc. can be estimated/calculated.

Polymer P(I) of the present embodiment has a low softening point of 110° C. or lower due to the inclusion of the structural unit represented by formula (AD). The softening point of polymer P(I) is preferably 100° C. or lower, more preferably 90° C. or lower. Moreover, the polymer P(I) of the present embodiment has a low melting point of 140° C. or lower due to the inclusion of the structural unit represented by the formula (AD). The melting point of polymer P(I) is preferably 130° C. or lower, more preferably 120° C. or lower.
In the specification of the present application, the softening point and melting point of a polymer are values measured under the following conditions.
(Method for measuring softening point)
0.1 to 1.0 mg of the polymer to be measured is placed in an aluminum sample pan, and the softening point is measured using a differential thermal analyzer (manufactured by Hitachi High-Tech Science Co., Ltd., "EXSTAR TMA/SS6100") under a nitrogen atmosphere. It was measured. The measurement mode was compression, the load was 30 mN, and the temperature was raised from 30°C to 200°C at a rate of 3°C/min. When the sample softens due to heating, the sample deforms and is detected as a displacement (μm). The extension of the straight portion without displacement on the low temperature side, or the tangent to the portion with the lowest displacement speed and the tangent to the portion with the highest displacement speed. was taken as the softening point.
(Measuring method of melting point)
1 to 2 mg of the polymer to be measured is placed in an aluminum sample pan, and under a nitrogen atmosphere, using a differential thermal analyzer (manufactured by Hitachi High-Technologies Corporation, "STA7200RV"), image observation is performed from 30 ° C. The temperature was raised at a temperature elevation rate of 10°C/min. The temperature at which the sample started to melt was visually confirmed and taken as the melting point.

(Method for producing polymer P(I))
Polymer P(I) can be produced (synthesized) by any method. Typically, polymer P(I) can be produced by the following steps aI, aII, and aIII.
Step aI: A step of preparing a raw material polymer containing a structural unit represented by formula (NB), a structural unit represented by formula (AD), and a structural unit represented by formula (MA);
Step aII: The raw material polymer obtained in Step aI, a compound having a hydroxy group and two or more (meth)acryloyl groups (polyfunctional (meth)acrylic compound), and/or a hydroxy group and one (meth)acryloyl A compound having a group (monofunctional (meth)acrylic compound) is reacted in the presence of a basic catalyst to obtain a structural unit represented by formula (NB), a structural unit represented by formula (AD), and Preparing a polymer P(I) comprising structural units of formula (1) and/or structural units of formula (2) and optionally further comprising structural units of formula (MA) can be manufactured by

When the polymer P(I) further comprises a structural unit represented by formula (3), step aIII below is carried out.
Step aIII: In step aII, a structural unit represented by formula (NB), a structural unit represented by formula (AD), a structural unit represented by formula (1) and/or a structural unit represented by formula (2) A structural unit and a polymer precursor containing a structural unit represented by formula (MA) (corresponding to polymer P(I) in step aII above) are prepared, and then the polymer precursor is treated in the presence of a base catalyst, Treatment with water to obtain polymer P(I).

In step aII, when both a polyfunctional (meth)acrylic compound and a monofunctional (meth)acrylic compound are used, first the polyfunctional (meth)acrylic compound is reacted with the raw material polymer obtained in step aI to obtain It is preferable to react a monofunctional (meth)acrylic compound with the reaction mixture.

Each step will be described below.
(Step aI)
The step of preparing a raw material polymer containing a structural unit represented by the formula (NB), a structural unit represented by the formula (AD), and a structural unit represented by the formula (MA) in step aI includes the formula (NBm ), a monomer represented by the formula (ADm), and a monomer represented by the formula (MAm) are polymerized (addition polymerization). Here, the definitions of R ¹ , R ² , R ³ and R ⁴ and a ₁ in formula (NBm) are the same as those in formula (NB). The definitions of R ¹¹ and R ¹² in formula (ADm) are the same as those in formula (AD). The definitions of R ²¹ and R ²² in formula (MAm) are the same as those in formula (MA).

Monomers represented by formula (NBm) include, for example, norbornene, bicyclo[2.2.1]-hept-2-ene (common name: 2-norbornene), 5-methyl-2-norbornene, 5-ethyl -2-norbornene, 5-butyl-2-norbornene, 5-hexyl-2-norbornene, 5-decyl-2-norbornene, 5-allyl-2-norbornene, 5-(2-propenyl)-2-norbornene, 5 -(1-methyl-4-pentenyl)-2-norbornene, 5-ethynyl-2-norbornene, 5-benzyl-2-norbornene, 5-phenethyl-2-norbornene, 2-acetyl-5-norbornene, 5-norbornene -2-methyl carboxylate, 5-norbornene-2,3-dicarboxylic anhydride and the like. At the time of polymerization, the monomer represented by the formula (NBm) may be used alone or in combination of two or more.

In the unsaturated dicarboxylic acid dialkyl ester as a monomer represented by the formula (ADm), the configuration regarding the double bond may be either cis-type or trans-type, and represented by the trans-type formula (t-ADm). or a monomer represented by the formula (c-ADm) which is cis-type. Specific examples of the monomer represented by the formula (t-ADm) include dibutyl fumarate, diethyl fumarate, bis(2-ethylhexyl) fumarate, and dimethyl fumarate. Examples of monomers used include dibutyl maleate, diethyl maleate, bis(2-ethylhexyl) maleate, dimethyl maleate, and the like.

Although the polymerization method is not limited, radical polymerization using a radical polymerization initiator is preferred. Examples of polymerization initiators that can be used include azo compounds and organic peroxides.
Specific examples of azo compounds include azobisisobutyronitrile (AIBN), dimethyl 2,2′-azobis(2-methylpropionate), 1,1′-azobis(cyclohexanecarbonitrile) (ABCN), and the like. can be mentioned.
Examples of organic peroxides include hydrogen peroxide, di-tert-butyl peroxide (DTBP), benzoyl peroxide (benzoyl peroxide, BPO), and methyl ethyl ketone peroxide (MEKP).
As for the polymerization initiator, only one type may be used, or two or more types may be used in combination.

As the solvent used for the polymerization reaction, for example, organic solvents such as diethyl ether, tetrahydrofuran, toluene and methyl ethyl ketone can be used. The polymerization solvent may be a single solvent or a mixed solvent.

The raw material polymer is synthesized by dissolving a monomer represented by the formula (NBm), a monomer represented by the formula (ADm), a monomer represented by the formula (MAm), and a polymerization initiator in a solvent, and adding them to a reaction vessel. It is carried out by charging and then heating to proceed addition polymerization. The heating temperature is, for example, 50 to 80° C., and the heating time is, for example, 5 to 20 hours.
The molar ratio (ADm+MAm) of the total amount of the monomer represented by the formula (NBm), the monomer represented by the formula (ADm) and the monomer represented by the formula (MAm) when charged into the reaction vessel is (NBm ):(ADm+MAm)=0.5:1 to 1:0.5. From the viewpoint of molecular structure control, the molar ratio is preferably 1:1. The molar ratio of the monomer represented by the formula (ADm) to the monomer represented by the formula (MAm) is preferably (ADm):(MAm) = 0.5:9.5 to 5:5, A ratio of 1:9 to 4:6 is more preferred.
A "raw material polymer" can be obtained by such a process.
The raw material polymer may be any of random copolymers, alternating copolymers, block copolymers, periodic copolymers, and the like. Typically they are random or alternating copolymers. Maleic anhydride is generally known as a monomer having strong alternating copolymerizability.

After synthesis of the raw material polymer, a step of removing low-molecular-weight components such as unreacted monomers, oligomers and residual polymerization initiators may be carried out.
Specifically, the organic phase containing the synthesized starting polymer and low-molecular-weight components is concentrated and then mixed with an organic solvent such as tetrahydrofuran (THF) to obtain a solution. This solution is then mixed with a poor solvent such as methanol to precipitate the monomer. By filtering and drying the precipitate, the purity of the starting polymer can be increased.

(Step aII)
In step aII, the raw material polymer obtained in step aI is reacted with a polyfunctional (meth)acrylic compound and/or a monofunctional (meth)acrylic compound in the presence of a basic catalyst to obtain Part of the structural unit represented by the formula (MA) is ring-opened to form the structural unit represented by the formula (1) and/or the structural unit represented by the formula (2), and the formula (NB ), a structural unit represented by formula (AD), and a structural unit represented by formula (1) and/or a structural unit represented by formula (2), optionally represented by formula ( A polymer precursor containing structural units represented by MA) is obtained. The polymer precursor obtained here can be used as the polymer P(I) of the present embodiment, but is referred to as a polymer precursor for convenience of explanation.

More specifically, first, a solution is prepared by dissolving a raw material polymer in a suitable organic solvent. As the organic solvent, a single solvent or a mixed solvent such as methyl ethyl ketone (MEK), propylene glycol monomethyl ether acetate (PGMEA), dimethylacetamide (DMAc), N-methylpyrrolidone (NMP), tetrahydrofuran (THF) can be used. , but not limited to these, various organic solvents used in synthesizing organic compounds and polymers can be used.

A structural unit represented by formula (NB), a structural unit represented by formula (AD), and a polymer precursor containing both a structural unit represented by formula (1) and a structural unit represented by formula (2) When obtaining a body, a polyfunctional (meth)acrylic compound is then added to the above solution. Additionally, a basic catalyst is added. Then, the solution is appropriately mixed to form a uniform solution, thereby obtaining a polymer precursor containing at least the structural unit of formula (NB), the structural unit of formula (AD), and the structural unit of formula (1) (Step aII-i ).

Examples of polyfunctional (meth)acrylic compounds that can be used here include compounds represented by formula (1b-m), compounds represented by formula (1c-m), and compounds represented by formula (1d-m). compounds that are The definitions and specific embodiments of k, R, X ¹ , X ¹ ' and X ² in formula (1b-m) are the same as in formula (1b) above. The definitions and specific embodiments of k, R, X ¹ , X ² , X ³ , X ⁴ , X ⁵ and X ⁶ in formula (1c-m) are the same as in formula (1c) above. n and R in formula (1dm) are the same as in formula (1d) above.

Then, the polymer obtained in step aII-i is reacted with a monofunctional (meth)acrylic compound in the presence of a basic catalyst to obtain a structural unit of formula (NB), a structural unit of formula (AD), A polymer precursor comprising structural units of formula (1) and structural units of formula (2) can be obtained (step aII-ii).

As the basic catalyst, amine compounds, nitrogen-containing heterocyclic compounds, and the like, which are known in the field of organic synthesis, can be appropriately used. For example, an amine compound such as triethylamine, pyridine, dimethylaminopyridine, or a nitrogen-containing heterocyclic compound can be used as a catalyst. The amount of the basic catalyst used can be, for example, about 10 to 60 parts by mass with respect to 100 parts by mass of the starting polymer. It should be noted that if the basic catalyst is used excessively, the amount of acid required for neutralization increases, which may complicate purification.

The above solution is preferably heated at 60 to 80° C. for about 3 to 9 hours to open the structural unit of formula (MA) contained in the raw material polymer/form the structural unit of formula (1). be.

Incidentally, for example, during the above heating, by additionally adding a monofunctional (meth)acrylic compound having a hydroxy group to the reaction system, the structural unit of the formula (MA) contained in the raw material polymer is ring-opened/ Formation of structural units of formula (2) is carried out to produce polymer P(I) having structural units represented by formula (2).

From the viewpoint of reaction steric hindrance, a monofunctional (meth)acrylic compound having a hydroxy group tends to react more easily with a raw material polymer than a polyfunctional (meth)acrylic compound having a hydroxy group. Therefore, when preparing a polymer precursor having a structural unit of formula (2), a monofunctional (meth)acrylic compound having a hydroxy group is not charged into the reaction system from the beginning, but is additionally added into the reaction system. is preferred.
Monofunctional (meth)acrylic compounds having a hydroxy group include, for example, compounds represented by the following formulas (2a-m).
In formulas (2a-m), the definitions of X ¹⁰ and R are the same as in formula (2a).

Specific examples of compounds represented by formula (2a-m) include 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 1,4-cyclohexanedimethanol mono(meth)acrylate, 2- to mention hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, 2-(meth)acryloyloxyethyl-2-hydroxyethyl-phthalic acid, etc. can be done.

A structural unit represented by formula (NB), a structural unit represented by formula (AD), and any one of a structural unit represented by formula (1) and a structural unit represented by formula (2) When obtaining a polymer precursor, either step aII-i or step aII-ii may be carried out after step (I).

(Step aIII)
When carrying out step aIII, a step of treating the polymer precursor obtained in step aII with water in the presence of a basic catalyst is used. In step aIII, the structural unit represented by formula (MA) contained in the polymer precursor obtained in step aII is ring-opened to form the structural unit represented by formula (3), resulting in formula (NB) A structural unit represented by the formula (AD), a structural unit represented by the formula (1) and / or a structural unit represented by the formula (2), and a structural unit represented by the formula (3) Polymers P(I) can be prepared that contain structural units of When some of the structural units of formula (MA) are ring-opened and some of the structural units of formula (MA) remain unopened, the polymer P(I) is represented by formula (MA) Further includes a structural unit represented by

Basic catalysts used in step aIII include amine compounds such as triethylamine, pyridine and dimethylaminopyridine, or nitrogen-containing heterocyclic compounds.

In step aIII, water is added to the reaction system containing the polymer precursor obtained in step aII, and the obtained reaction solution is preferably heated at 60 to 80° C. for about 0.25 to 6 hours. , the structural unit represented by the formula (MA) contained in this polymer is ring-opened to generate the structural unit represented by the formula (3). As the basic catalyst, the catalyst remaining in the reaction system obtained in step aII can be used as it is. Therefore, step aIII is preferably carried out in situ by adding water to the reaction mixture obtained in step aII without any post-treatment.

The polymer P(I) of the present embodiment can be obtained by the above steps, but from the viewpoint of the effect of the present invention, the following steps may be performed as appropriate in order to remove unnecessary components other than the desired polymer. can also

First, the above reaction solution diluted with an organic solvent and added with an acid (for example, formic acid) is vigorously stirred in a separatory funnel for at least 3 minutes. This is allowed to stand still for 30 minutes or more, separated into an organic phase and an aqueous phase, and the aqueous phase is removed. An organic solution of the polymer is thus obtained.

The resulting organic solution of polymer P(I) is purified using a reprecipitation method or a liquid-liquid extraction method. In the reprecipitation method, the resulting organic solution of polymer P(I) is added to an excess amount of toluene or water to reprecipitate the polymer. In addition, the polymer powder obtained by reprecipitation is further washed several times with toluene or water.
Furthermore, in order to remove formic acid and a basic catalyst, an operation of washing the obtained polymer powder with ion-exchanged water is repeated several times (about 1 to 3 times).
A high-purity polymer can be obtained by drying the polymer powder washed with ion-exchanged water, for example, at 30 to 60° C. for 16 hours or longer.
In the liquid-liquid extraction method, water is added to the resulting organic solution of polymer P(I) and vigorously stirred in a separatory funnel for at least 3 minutes. This is allowed to stand still for 30 minutes or more, separated into an organic phase and an aqueous phase, and the aqueous phase is removed. Further water is added to the organic solution of the polymer after the water has been removed and stirred vigorously with a separatory funnel for at least 3 minutes. This is allowed to stand still for 30 minutes or more, separated into an organic phase and an aqueous phase, and the aqueous phase is removed. An organic solution of the polymer is thus obtained. If necessary, the steps of adding water and removing the aqueous phase may be further performed.
The resulting organic solution of polymer P(I) is heated with a rotary evaporator under reduced pressure to concentrate, and then the operation of adding a final solvent (such as PGMEA) and diluting is repeated to obtain a polymer solution dissolved in the final solvent. can be obtained. In addition, purification may be performed by a reprecipitation method after solvent replacement.

Moreover, the polymer solution may contain the polyfunctional (meth)acrylic compound and/or the monofunctional (meth)acrylic compound used when synthesizing the polymer P(I). When the polymer solution contains these (meth) acrylic compounds, the peak area derived from the polyfunctional (meth) acrylic compound in the gel permeation chromatography (GPC) chart is 3 to 50% with respect to the peak area of the polymer P. The amount is preferably 5 to 48%, and the peak area derived from the monofunctional (meth) acrylic compound is 1 to 50% with respect to the peak area of the polymer P, particularly 2 An amount of ~35% is preferred. As a result, the photosensitive resin composition containing this polymer solution has good alkali solubility and good sensitivity in photolithography.

(Second embodiment)
The polymer in the second embodiment of the present invention (herein referred to as “polymer P(II)”) comprises a monomer represented by the following formula (NBm) and a monomer represented by the following formula (ADm) and a monomer represented by the following formula (MAm) is polymerized in the presence of a monofunctional or difunctional or higher thiol group-containing compound to prepare a raw material polymer (step bI),
This raw material polymer is reacted with a compound having a hydroxy group and two or more (meth)acryloyl groups and/or a compound having a hydroxy group and one (meth)acryloyl group in the presence of a basic catalyst. (step bII), the polymer.

In formula (NBm), R ¹ , R ² , R ³ and R ⁴ are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, and a ₁ is 0, 1 or 2.

In formula (ADm), R ¹¹ and R ¹² are each independently a straight or branched chain alkyl group having 1 to 12 carbon atoms.

In formula (MAm), R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms.

Polymer P (II) is a structural unit derived from the raw material monomer used in the above step I (i.e., a structural unit derived from a monofunctional or difunctional or higher thiol group-containing compound, a norbornene monomer represented by the formula (NBm) A raw material polymer composed of a structural unit derived from, a structural unit derived from an unsaturated dicarboxylic acid dialkyl ester represented by the formula (ADm), and a structural unit derived from a maleic anhydride monomer represented by the formula (MAm)), A compound having a hydroxy group and two or more (meth)acryloyl groups (herein referred to as a "polyfunctional (meth)acrylic compound") used in step bII above, and/or a hydroxy group and one It has a structure in which a side chain derived from a compound having a (meth)acryloyl group (herein referred to as a “monofunctional (meth)acrylic compound”) is introduced. Here, the side chain derived from the polyfunctional/monofunctional (meth)acrylic compound is a residue obtained by removing a hydrogen atom from the hydroxy group of the polyfunctional/monofunctional (meth)acrylic compound, and at least one It is a group having a (meth)acryloyl group.

Physical properties such as weight average molecular weight Mw, dispersity (weight average molecular weight Mw/number average molecular weight Mn), glass transition temperature, softening point, melting point, acid value, double bond equivalent, and alkali dissolution rate of polymer P(II) are the same as the physical properties of polymer P(I) described above.

The polymer P(II) of the present embodiment contains in its structure a thioether group derived from a monofunctional or bifunctional or more functional thiol group-containing compound. By having a thioether group, P(II) has excellent sensitivity in photolithography, has higher alkali solubility, and can therefore provide a resin cured product with excellent developability. In addition, the polymer P(II) containing a thioether group can provide a resin cured product with reduced yellowing and excellent transparency.

Moreover, P(II) of the present embodiment has a norbornene-derived structural unit represented by the formula (NBm). Structural units derived from norbornene monomers are chemically robust. Therefore, the polymer P containing this as a structural unit undergoes little weight loss and is stable when subjected to heat treatment.

Moreover, the polymer P(II) of the present embodiment has a structural unit derived from the unsaturated dicarboxylic acid dialkyl ester represented by the formula (ADm). By introducing a structural unit derived from an unsaturated dicarboxylic acid dialkyl ester into the polymer P (II), the softening point and low melting point of the polymer P are lowered without changing sensitivity, alkali solubility and heat yellowing. be able to. As a result, the polymer P(II) having a structural unit derived from an unsaturated dicarboxylic acid dialkyl ester is easily melted by heat during curing, and has excellent workability and pattern formability in photolithography. Therefore, the photosensitive resin composition containing the polymer P(II) can be suitably used for producing films and filters for use in liquid crystal display devices and solid-state imaging devices that require heat resistance.

Moreover, the polymer P(II) of this embodiment has an organic group containing a (meth)acryloyl group in a side chain. Polymer P(II) is, for example, a resin having a thioether group and a monofunctional (meth)acryloyl group, a resin having a thioether group and a polyfunctional (meth)acryloyl group, a resin having a thioether group and a monofunctional (meth)acryloyl group, It may be a resin having polyfunctional (meth)acryloyl groups. The polymer P(II) has excellent sensitivity because the curing reaction (polymerization reaction) is promoted by having a (meth)acryloyl group.

(Third embodiment)
The polymer in the third embodiment of the present invention (herein referred to as “polymer P(III)”) comprises a monomer represented by the above formula (NBm) and a monomer represented by the above formula (ADm) and a monomer represented by the above formula (MAm) is polymerized in the presence of a monofunctional or difunctional or higher thiol group-containing compound to prepare a raw material polymer (step bI),
This raw material polymer is reacted with a compound having a hydroxy group and two or more (meth)acryloyl groups and/or a compound having a hydroxy group and one (meth)acryloyl group in the presence of a basic catalyst, preparing a polymer precursor (step bII),
The polymer is obtained by treating this polymer precursor with water in the presence of a basic catalyst (step bIII).

Physical properties such as weight average molecular weight Mw, dispersity (weight average molecular weight Mw/number average molecular weight Mn), glass transition temperature, softening point, melting point, acid value, double bond equivalent, and alkali dissolution rate of polymer P(III) are the same as the physical properties of polymer P(I) described above.

The polymer P(III) in the third embodiment has, in addition to the structural units constituting the polymer P(II) in the second embodiment, the formula (MAm) contained in the polymer precursor obtained in step bII The structural unit derived from the maleic anhydride monomer represented by has a structural unit (dicarboxylic acid structural unit) ring-opened with water by the treatment of step bIII. Such polymer P(III) can have high alkali solubility, and as a result, the photosensitive resin composition containing polymer P(III) has been subjected to a photolithography method using an alkaline aqueous solution as a developer. In some cases, it has excellent developability.

(Fourth embodiment)
The polymer in the fourth embodiment of the present invention (herein referred to as "polymer P(IV)") comprises a structural unit represented by (NB) and a structural unit represented by formula (AD) , a structural unit represented by formula (1), and at least one structural unit selected from structural units represented by formula (2), and has a structure represented by formula (P2). The polymer P (IV) is represented by "Y" in the formula (P2) and is a monovalent to hexavalent organic group having 1 to 30 carbon atoms derived from a monofunctional or difunctional or higher thiol group-containing compound. , typically having a structure in which polymer chains composed of structural units A, structural units B, and structural units C are bonded. The monovalent to hexavalent organic group having 1 to 30 carbon atoms derived from the monofunctional or bifunctional or higher thiol group-containing compound is typically a 30 organic groups.

In formula (P2),
n is an integer from 1 to 6,
p, q, and r represent the molar content of structural units A, B, and C contained in each polymer chain in n [ ],
p, q, and r may be the same or different for each n number of polymer chains in [ ],
p + q + r = 1, p is 0 or more, q is 0 or more, r is 0 or more,
Let p ^t , q t , and r ^t be the molar contents of structural units A, B, and C contained in the polymer, respectively, then p ^{t +} q ^t +r ^t =1,
^pt is greater than 0, preferably 0.25 to 0.75, more preferably 0.3 to 0.65, more preferably 0.35 to 0.60.
^qt is greater than 0, preferably 0.10 to 0.6, more preferably 0.2 to 0.50, more preferably 0.25 to 0.45.
r ^t is greater than 0, preferably 0.03 to 0.3, more preferably 0.04 to 0.28, particularly preferably 0.05 to 0.25.
X is hydrogen or an organic group having 1 to 30 carbon atoms.
Y is a monovalent to hexavalent organic group having 1 to 30 carbon atoms derived from a monofunctional or bifunctional or higher thiol group-containing compound.
A is a structural unit represented by the above formula (NB).
B contains at least one structural unit selected from structural units represented by the above formula (1) and structural units represented by the above formula (2).
C represents a structural unit represented by formula (AD).
Multiple A's, B's, and C's may be the same or different.

The polymer P(IV) represented by the formula (P2) may contain, as the structural unit B, a structural unit represented by the above formula (3).
Polymer P(IV) represented by formula (P2) may contain, as structural unit B, a structural unit represented by formula (MA) above.

In formula (P2), X is hydrogen or an organic group having 1 to 30 carbon atoms. The organic group having 1 to 30 carbon atoms is the same as the organic group having 1 to 30 carbon atoms constituting R ³¹ in the above formula (NB).

Y is a monovalent to hexavalent organic group having 1 to 30 carbon atoms (referred to herein as “organic group (i)”) derived from a monofunctional or bifunctional or higher thiol group-containing compound. In this embodiment, the valence is the number of functional groups (the number of thiol groups). That is, the monofunctional or bifunctional or more thiol group-containing compound contains one or two or more thiol groups, and the organic group (i) is derived from the thiol group through 1 to 6 thioether groups. It binds to the structural unit in [ ]n and the structural unit in [ ]m. The organic group (i) may have a thiol group that does not participate in bonding with the structural units in [ ]n and the structural units in [ ]m, and the polymer P(I) has (n+m) It can be obtained as a mixture of resins having 1 to 6 (number of bonds).
The organic group (i) having 1 to 30 carbon atoms is monofunctional or bifunctional or more, preferably bifunctional or more, more preferably trifunctional or more. Although the upper limit is not particularly limited, it is hexafunctional or less.
From the viewpoint of the effect of the present invention, the valence of the organic group (i) having 1 to 30 carbon atoms is, for example, 1 to 6 valences, preferably 2 to 6 valences, more preferably 3 to 6 valences. value.

The monovalent to hexavalent organic group (i) having 1 to 30 carbon atoms may contain one or more atoms selected from O, N, S, P and Si. Examples of monovalent to hexavalent organic groups (i) having 1 to 30 carbon atoms include alkyl groups, alkenyl groups and alkynyl groups having 1 to 6 thioether groups (-S-* (* is a bond)). groups, alkylidene groups, aryl groups, aralkyl groups, alkaryl groups, cycloalkyl groups, alkoxy groups and heterocyclic groups.

Examples of alkyl groups include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, neopentyl group, hexyl group and heptyl group. , octyl, nonyl, and decyl groups. Alkenyl groups include, for example, allyl groups, pentenyl groups, and vinyl groups.

Alkynyl groups include ethynyl groups.
The alkylidene group includes, for example, a methylidene group and an ethylidene group. Aryl groups include, for example, tolyl, xylyl, phenyl, naphthyl, and anthracenyl groups.
Aralkyl groups include, for example, benzyl groups and phenethyl groups.
The alkaryl group includes, for example, a tolyl group and a xylyl group.

Cycloalkyl groups include, for example, adamantyl, cyclopentyl, cyclohexyl, and cyclooctyl groups.
Examples of alkoxy groups include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, s-butoxy, isobutoxy, t-butoxy, n-pentyloxy, and neopentyloxy groups. , and n-hexyloxy groups.
Heterocyclic groups include, for example, epoxy groups and oxetanyl groups.

Examples of monofunctional or bifunctional or higher thiol group-containing compounds from which Y in formula (P2) can be derived include compounds represented by the following chemical formulas (s-1) to (s-21). That is, the polymer P(IV) contains a monovalent to hexavalent organic group (i) having 1 to 30 carbon atoms derived from a monofunctional or difunctional or higher thiol group-containing compound represented by the following.

The monofunctional or bifunctional or more functional thiol group-containing compounds may be used singly or in combination of two or more. Among them, it is preferable to use tri- to hexa-functional (tri- to hexavalent) thiol group-containing compounds having 3 to 6 thiol groups in one molecule from the viewpoint of excellent reactivity with other monomers.
In the present embodiment, the monofunctional or bifunctional or more functional thiol group-containing compound is, among the compounds represented by the chemical formulas (s-1) to (s-21), chemical formulas (s-1) to (s- 3), (s-5) and (s-8) to (s-10) more preferably contain compounds represented by the chemical formulas (s-1) to (s-3), (s-5) and (s-9) are particularly preferred.
The monovalent to hexavalent organic group (i) having 1 to 30 carbon atoms has a terminal thioether group (-S-* (* is a bond)) derived from the thiol group of these thiol group-containing compounds. , binds to the structural unit in [ ]n and the structural unit in [ ]m via a thioether group. The organic group (i) may have a thiol group that does not participate in bonding with the structural unit in [ ]n and the structural unit in [ ]m.

When the polymer P (IV) of the present embodiment uses a tetrafunctional (tetravalent) thiol group-containing compound represented by the above formula (s-2) as a monofunctional or bifunctional or more thiol group-containing compound , for example, can have a structure as represented by the following formula (I).

In formula (I), A, B, C, X, p, q and r have the same definitions as in formula (P2). However, in formula (I), for the sake of explanation, p, q, and r for each polymer chain in the four [ ] are p ¹ to p ⁴ , q ¹ to q ⁴ , and r ¹ to r ⁴ respectively. Describe.
In formula (I), p ¹ to p ⁴ , q ¹ to q ⁴ , r ¹ to r ⁴ may be the same or different for each of the four polymer chains in [ ], and p ¹ +q ¹ +r ¹ =1, ^p2 + ^q2 + ^r2 =1, ^p3 + ^q3 + ^r3 =1, ^p4 + ^q4 + ^r4 =1.
Let p ^t , q ^t , and r ^t be the molar contents of structural units A, B, and C contained in the polymer represented by formula (I), respectively, then p ^t = p ¹ + p ² + p ³ +p ⁴ , q ^t =q ¹ +q ² +q ³ +q ⁴ , r ^t =r ¹ +r ² +r ³ +r ⁴ .

In formula (I), the bonding order of A, B and C is not particularly limited, and any of A, B and C may be bonded to a thioether group. Further, in formula (I), four structural units in [ ] are bonded via thioether groups derived from four mercapto groups of the compound represented by chemical formula (s-2). 1 to 3 structural units in [ ] are bonded to thioether groups derived from four mercapto groups, and the remaining thioether groups are bonded to organic groups different from the structural units in [ ]. There may be. In this embodiment, the polymer P can be obtained as a mixture containing at least one compound in which 1 to 4 structures in [ ] are bonded.

Physical properties such as weight average molecular weight Mw, dispersity (weight average molecular weight Mw/number average molecular weight Mn), glass transition temperature, softening point, melting point, acid value, double bond equivalent, and alkali dissolution rate of polymer P (IV) are the same as the physical properties of polymer P(I) described above.

(Method for producing polymer P(II), polymer P(III) or polymer P(IV))
The method for producing the polymer P(II), the polymer P(III) or the polymer P(IV) will be explained using the polymer P(IV) as an example.
Polymer P(IV) can be produced (synthesized) by any method. Typically, polymer P(IV) can be produced by the following steps bI, bII, and bIII.
Step bI: a structural unit represented by formula (NB), a structural unit represented by formula (AD), a structural unit represented by formula (MA), and a monovalent to hexavalent organic group having 1 to 30 carbon atoms (i) providing a raw material polymer comprising;
Step bII: the raw material polymer obtained in step bI, a compound having a hydroxy group and two or more (meth)acryloyl groups (polyfunctional (meth)acrylic compound), and/or a hydroxy group and one (meth)acryloyl A compound having a group (monofunctional (meth) acrylic compound) is reacted in the presence of a basic catalyst to form a structural unit represented by the formula (NB), a structural unit represented by the formula (AD), carbon A monovalent to hexavalent organic group (i) of numbers 1 to 30, and a structural unit represented by formula (1) and/or a structural unit represented by formula (2), optionally further comprising formula (MA) preparing a polymer P(IV) containing structural units represented by

If polymer P(IV) further comprises structural units of formula (3), step bIII below is carried out.
Step bIII: In step bII, a structural unit represented by formula (NB), a structural unit represented by formula (AD), a structural unit represented by formula (1) and/or a structural unit represented by formula (2) A structural unit and a polymer precursor containing a structural unit represented by formula (MA) (corresponding to polymer P(IV) in step bII above) are prepared, and then the polymer precursor is reacted in the presence of a base catalyst, Treatment with water to obtain polymer P(IV).

In step bII, when both a polyfunctional (meth)acrylic compound and a monofunctional (meth)acrylic compound are used, first the polyfunctional (meth)acrylic compound is reacted with the raw material polymer obtained in step bI to obtain It is preferable to react a monofunctional (meth)acrylic compound with the reaction mixture.

Each step will be described below.
(Step bI)
In step bI, a structural unit represented by formula (NB), a structural unit represented by formula (AD), a structural unit represented by formula (MA), and a monovalent to hexavalent organic having 1 to 30 carbon atoms The step of preparing a raw material polymer containing the group (i) includes a monomer represented by the formula (NBm), a monomer represented by the formula (ADm), and a monomer represented by the formula (MAm). The composition can be polymerized (addition polymerization) in the presence of a monofunctional or difunctional or higher thiol group-containing compound.

The monofunctional or bifunctional or higher functional thiol group-containing compound includes, but is not limited to, the compounds represented by the chemical formulas (s-1) to (s-21). The monofunctional or bifunctional or more functional thiol group-containing compounds may be used singly or in combination of two or more.
Specific conditions for step bI are the same as for step aI in the method for producing polymer P(I) of the first embodiment.

(Step bII)
For step bII, the same conditions as for step aII in the method for producing polymer P(I) of the first embodiment can be applied.

(Step bIII)
In step bIII, the same conditions as in step aIII in the method for producing polymer P(I) of the first embodiment can be applied.

(Fifth embodiment)
The polymer in the fifth embodiment of the present invention (herein referred to as "polymer P(V)") comprises a structural unit represented by formula (NB) and a structural unit represented by formula (AD) and a structural unit represented by the formula (MA).

In formula (NB), R ¹ , R ² , R ³ and R ⁴ are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, and a ₁ is 0, 1 or 2.

In formula (MA), R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms,

In formula (AD), R ¹¹ and R ¹² are each independently a linear or branched alkyl group having 1 to 12 carbon atoms, and -C(=O)-OR ¹¹ group and - The steric configuration with the C(=O)-OR ¹² group is not limited, and even if it is a structure derived from a cis-type unsaturated dicarboxylic acid dialkyl ester, it may be a structure derived from a trans-type unsaturated dicarboxylic acid dialkyl ester. There may be. The softening point and melting point of polymer P(V) tend to decrease as the number of carbon atoms in R ¹¹ and R ¹² increases.

The polymer P(V) is a raw material polymer used in the production of the polymer P(I) in the first embodiment, and is the polymer obtained in the above step aI.

Polymer P(V) has a low softening point of 130° C. or lower due to the structural unit represented by formula (AD). The softening point of the polymer P(V) is preferably 125°C or lower, more preferably 120°C or lower. Moreover, the polymer P(V) has a low melting point of 160° C. or less due to the inclusion of the structural unit represented by the formula (AD). The melting point of polymer P(V) is preferably 155° C. or lower, more preferably 150° C. or lower.

The weight average molecular weight Mw of polymer P(V) is, for example, 1,000 to 5,000. The weight average molecular weight Mw of polymer P(I) is preferably from 1,000 to 4,500. By appropriately adjusting the weight-average molecular weight, it becomes possible to adjust the weight-average molecular weight of the polymer P(I) obtained from the polymer P(V), and as a result, the sensitivity of the polymer P(I) and the alkali developer can be adjusted to the desired degree.
Further, the degree of dispersion (weight average molecular weight Mw/number average molecular weight Mn) of the polymer P(V) is preferably 1.0 to 5.0, more preferably 1.0 to 4.0, still more preferably 1.0. ~3.0.

(Sixth embodiment)
The polymer in the sixth embodiment of the present invention (herein referred to as "polymer P (VI)") comprises a monomer represented by the following formula (NBm) and a monomer represented by the following formula (ADm) and a monomer represented by the following formula (MAm) by polymerizing a monomer composition in the presence of a monofunctional or difunctional or higher thiol group-containing compound.

In formula (NBm), R ¹ , R ² , R ³ and R ⁴ are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, and a ₁ is 0, 1 or 2.

In formula (ADm), R ¹¹ and R ¹² are each independently a straight or branched chain alkyl group having 1 to 12 carbon atoms.

In formula (MAm), R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms,

Polymer P(VI) is a raw material polymer used in the production of polymer P(II), polymer P(III) or polymer P(IV) described above, and is the polymer obtained in the step bI described above.

The weight average molecular weight Mw, dispersity (weight average molecular weight Mw/number average molecular weight Mn), softening point, and melting point of the polymer P(VI) are the same as those of the polymer P(V) described above.

(Seventh embodiment)
The polymer in the seventh embodiment of the present invention (herein referred to as "polymer P (VII)") comprises a structural unit represented by formula (NB) and a structural unit represented by formula (MA) and a structural unit represented by formula (AD), and a structure represented by formula (P4). The polymer P (VII) is represented as "Y" in the formula (P4) and is a mono- to hexavalent organic group having 1 to 30 carbon atoms derived from a monofunctional or bifunctional or higher thiol group-containing compound. , typically a structural unit A, and a structural unit B, in which a polymer chain is bonded. The monovalent to hexavalent organic group having 1 to 30 carbon atoms derived from the monofunctional or bifunctional or higher thiol group-containing compound is typically a 30 organic groups.

In formula (P4),
n is an integer from 1 to 6,
p, q, and r represent the molar content of structural units A, B, and C contained in each polymer chain in n [ ],
p, q, and r may be the same or different for each n number of polymer chains in [ ],
p + q + r = 1, p is 0 or more, q is 0 or more, r is 0 or more,
Let p ^t , q t , and r ^t be the molar contents of structural units A, B, and C contained in the polymer, respectively, p ^{t +} q ^t + r ^t = 1,
^pt is greater than 0, preferably 0.25 to 0.75, more preferably 0.3 to 0.65, more preferably 0.35 to 0.60.
^qt is greater than 0, preferably 0.10 to 0.6, more preferably 0.2 to 0.50, more preferably 0.25 to 0.45.
r ^t is greater than 0, preferably 0.03 to 0.3, more preferably 0.04 to 0.28, particularly preferably 0.05 to 0.25.
X is hydrogen or an organic group having 1 to 30 carbon atoms.
Y is a monovalent to hexavalent organic group having 1 to 30 carbon atoms derived from a monofunctional or bifunctional or higher thiol group-containing compound.
A is a structural unit represented by formula (NB).
B' is a structural unit represented by formula (MA).
C represents a structural unit represented by formula (AD).
Multiple A's, B''s, and C's may be the same or different.

The polymer P(VII) is a starting polymer used in the production of the polymer P(II), the polymer P(III) or the polymer P(IV), and is the polymer obtained in the step bI above.

The weight average molecular weight Mw, dispersity (weight average molecular weight Mw/number average molecular weight Mn), softening point, and melting point of the polymer P(VI) are the same as those of the polymer P(V) described above.

[Polymer solution]
The polymer solution of this embodiment comprises polymer P(I), polymer P(II), polymer P(III) or polymer P(IV) as described above. The polymer solution of this embodiment is selected from polyfunctional (meth)acrylic compounds and monofunctional (meth)acrylic compounds along with polymer P(I), polymer P(II), polymer P(III) or P(IV). may include at least one of

(Polyfunctional (meth)acrylic compound)
The polyfunctional (meth)acrylic compound or monofunctional (meth)acrylic compound that can be contained in the polymer solution of the present embodiment is the (meth)acrylic compound used in the above step aII or step bII in the production of the polymer P. It may be a reactant or may be added separately.

Examples of the polyfunctional (meth)acrylic compound that can be incorporated into the polymer solution include compounds represented by the following formula (1b-p), compounds represented by the formula (1c-p), and formula (1d -p), but are not limited to these.

The definitions and specific embodiments of k, R, X ¹ , X ¹ ' and X ² in formula (1b-p) are the same as in formula (1b) above. The definitions and specific embodiments of k, R, X ¹ , X ² , X ³ , X ⁴ , X ⁵ and X ⁶ in formula (1c-p) are the same as in formula (1c) above.

Y in Formula (1b-p), Formula (1c-p) and Formula (1d-p) is a hydrogen atom, a (meth)acryloyl group, or a combination thereof.

Compounds of formula (1b-p), formula (1c-p) and formula (1d-p) in which Y is a hydrogen atom are unreacted monomers (i.e. formulas (1b-p), formulas (1c-p) and compound represented by the formula (1d-p)), or can be added separately.
n in the formula (1dp) is an integer of 2 or more, preferably an integer of 2-5, more preferably an integer of 2-3.

Separately from the unreacted polyfunctional (meth)acrylic compound used in the production of polymer P(I), polymer P(II), polymer P(III) or P(IV), When the polyfunctional (meth)acrylic compound is blended, the blending amount is such that the peak area derived from the polyfunctional (meth)acrylic compound in the gel permeation chromatography (GPC) chart of the polymer solution is polymer P (I ), preferably 10% or less, more preferably 5% or less, and even more preferably 2% or less relative to the peak area of polymer P(II), polymer P(III) or P(IV). can be done.

(Monofunctional (meth)acrylic compound)
Examples of the monofunctional (meth)acrylic compound blended in the polymer solution of the present embodiment include compounds represented by the following formulas (2a-m). In formulas (2a-m), the definitions of X ¹⁰ and R are the same as in formula (2a).

Separately from the unreacted monofunctional (meth)acrylic compound used in the production of polymer P(I), polymer P(II), polymer P(III) or P(IV), When a monofunctional (meth)acrylic compound is blended, the blending amount is such that the peak area derived from the monofunctional (meth)acrylic compound in the gel permeation chromatography (GPC) chart of the polymer solution is the polymer P (I ), preferably 10% or less, more preferably 5% or less, and even more preferably 2% or less relative to the peak area of polymer P(II), polymer P(III) or P(IV). can be done.

The polymer solution of this embodiment typically contains an organic solvent and is provided in the form of a liquid or varnish. As the organic solvent, one or more of ketone-based solvents, ester-based solvents, ether-based solvents, alcohol-based solvents, lactone-based solvents, carbonate-based solvents, and the like can be used.

Specific examples of organic solvents include propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, γ-butyl lactone, N-methylpyrrolidone and cyclohexanone. These may be used individually by 1 type, and may be used in combination of 2 or more type.
The amount of the organic solvent to be used is not particularly limited, but it is used in such an amount that the concentration of non-volatile components is, for example, 10 to 70% by mass, preferably 15 to 60% by mass.

[Production of polymer solution]
The polymer solution of this embodiment can be prepared by mixing the above components by a known method. The polymer solution of this embodiment is used as a resin material for the photosensitive resin composition described below.

[Photosensitive resin composition]
The photosensitive resin composition of the present embodiment contains the above polymer P(I), polymer P(II), polymer P(III) or polymer P(IV), and a photopolymerization initiator. That is, the photosensitive resin composition of this embodiment contains the polymer solution of this embodiment described above and a photopolymerization initiator. Each component is explained below.

(Photoinitiator)
A photoradical polymerization initiator is mentioned as a photoinitiator used for the photosensitive resin composition of this embodiment. As the radical photopolymerization initiator, known compounds can be used. methyl-1-phenylpropan-1-one, 1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1-{4- [4-(2-hydroxy-2-methylpropionyl)benzyl]phenyl}-2-methylpropan-1-one, 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one, 2 -benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1,2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl) ) phenyl]-1-butanone and other alkylphenone compounds; benzophenone, 4,4'-bis(dimethylamino)benzophenone, 2-carboxybenzophenone and other benzophenone compounds; benzoin compounds such as benzoin isobutyl ether; thioxanthone compounds such as thioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, and 2,4-diethylthioxanthone; 2-(4- methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-ethoxynaphthyl)- Halomethylated triazine compounds such as 4,6-bis(trichloromethyl)-s-triazine, 2-(4-ethoxycarbonylnaphthyl)-4,6-bis(trichloromethyl)-s-triazine; 2-trichloromethyl -5-(2′-benzofuryl)-1,3,4-oxadiazole, 2-trichloromethyl-5-[β-(2′-benzofuryl)vinyl]-1,3,4-oxadiazole, 4 -oxadiazole, halomethylated oxadiazole compounds such as 2-trichloromethyl-5-furyl-1,3,4-oxadiazole; 2,2′-bis(2-chlorophenyl)-4,4′, 5,5′-tetraphenyl-1,2′-biimidazole, 2 ,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-trichlorophenyl) -Biimidazole compounds such as 4,4',5,5'-tetraphenyl-1,2'-biimidazole; 1,2-octanedione, 1-[4-(phenylthio)-2-(O-benzoyl oxime)], ethanone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-, 1-(O-acetyloxime) and other oxime ester compounds; bis(η5 -2,4-cyclopentadien-1-yl)-bis(2,6-difluoro-3-(1H-pyrrol-1-yl)-phenyl)titanium compounds such as titanocene compounds; p-dimethylaminobenzoic acid, p -benzoic acid ester compounds such as diethylaminobenzoic acid; acridine compounds such as 9-phenylacridine; A photoradical polymerization initiator may be used individually by 1 type, and may be used in combination of 2 or more type.
The radical photopolymerization initiator is used in an amount of, for example, 1 to 20 parts by weight, preferably 3 to 10 parts by weight, per 100 parts by weight of the polymer P.

Since the photosensitive resin composition of the present embodiment contains the above components, it has high sensitivity in photolithography processing and excellent alkali solubility. Therefore, the photosensitive resin composition has excellent developability and excellent processability in photolithography.

(coloring agent)
As one aspect, the photosensitive resin composition may contain a colorant. By containing a coloring agent, it can be preferably used as a material for forming a color filter of a liquid crystal display device or a solid-state imaging device. Various pigments or dyes can be used as colorants.
An organic pigment or an inorganic pigment can be used as the pigment.

Organic pigments include azo-based pigments, phthalocyanine-based pigments, quinacridone-based pigments, perylene-based pigments, perinone-based pigments, isoindolinone-based pigments, isoindoline-based pigments, dioxazine-based pigments, thioindigo-based pigments, anthraquinone-based pigments, and quinophthalone-based pigments. Pigments, metal complex pigments, diketopyrrolopyrrole pigments, xanthene pigments, pyrromethene pigments, dye lake pigments, and the like can be used.

Inorganic pigments include white and extender pigments (titanium oxide, zinc oxide, zinc sulfide, clay, talc, barium sulfate, calcium carbonate, etc.), chromatic pigments (yellow, cadmium-based, chrome vermillion, nickel titanium, chrome titanium , yellow iron oxide, red iron oxide, zinc chromate, red lead, ultramarine blue, navy blue, cobalt blue, chrome green, chromium oxide, bismuth vanadate, etc.), luster pigments (pearl pigments, aluminum pigments, bronze pigments, etc.), fluorescent pigments ( zinc sulfide, strontium sulfide, strontium aluminate, etc.) can be used.

As the dye, for example, known dyes described in JP-A-2003-270428, JP-A-9-171108, JP-A-2008-50599, etc. can be used.
When the photosensitive resin composition contains a coloring agent, the photosensitive resin composition may contain only one coloring agent, or may contain two or more coloring agents.

Colorants (particularly pigments) having an appropriate average particle size can be used depending on the purpose and application. Particle size is preferred, and when concealing properties such as paint are required, a large average particle size of 0.5 μm or more is preferred.

The colorant may be subjected to surface treatment such as rosin treatment, surfactant treatment, resin-based dispersant treatment, pigment derivative treatment, oxide film treatment, silica coating, wax coating, etc., depending on the purpose and application.

When the photosensitive resin composition contains a colorant, the amount thereof may be appropriately set according to the purpose and application. It is preferably 3 to 70% by mass, more preferably 5 to 60% by mass, still more preferably 10 to 50% by mass, based on the total components (components excluding the solvent).

(Surfactant)
The photosensitive resin composition of the present embodiment can contain a surfactant, and the surfactant is preferably a nonionic surfactant.

By including a nonionic surfactant, the coating properties of the photosensitive resin composition are improved when a resin film is obtained by applying the composition onto a substrate, and a coating film having a uniform thickness can be obtained. In addition, it is possible to prevent residues and patterns from rising when the coating film is developed.

A nonionic surfactant is, for example, a compound containing a fluorine group (eg, a fluorinated alkyl group) or a silanol group, or a compound having a siloxane bond as a main skeleton. In this embodiment, it is more preferable to use a fluorine-based surfactant or a silicone-based surfactant as the nonionic surfactant, and it is particularly preferable to use a fluorine-based surfactant. Examples of fluorosurfactants include Megafac F-171, F-173, F-444, F-470, F-471, F-475, F-482, F-477 and F manufactured by DIC Corporation. -554, F-556, and F-557, Novec FC4430 and FC4432 manufactured by Sumitomo 3M Limited, and the like, but are not limited thereto.
When a surfactant is used, the amount of the surfactant to be blended is preferably 0.01 to 10% by weight with respect to 100 parts by mass of the resin.

(solvent)
The photosensitive resin composition can typically contain a solvent. An organic solvent is preferably used as the solvent. Specifically, one or more of ketone-based solvents, ester-based solvents, ether-based solvents, alcohol-based solvents, lactone-based solvents, carbonate-based solvents, and the like can be used.

Examples of solvents include propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), ethyl lactate, methyl isobutyl carbinol (MIBC), gamma-butyrolactone (GBL), N-methylpyrrolidone (NMP), methyl- n-amyl ketone (MAK), diethylene glycol monomethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, cyclohexanone, or mixtures thereof.
The amount of the solvent used is not particularly limited, but it is used in such an amount that the concentration of non-volatile components is, for example, 10 to 70% by mass, preferably 15 to 60% by mass.

(Light shielding agent)
The resin composition of this embodiment can contain a light shielding agent. The photosensitive resin composition may contain only 1 type of light shielding agents, and may contain 2 or more types.

When the photosensitive resin composition contains a light-shielding agent, the amount thereof may be appropriately set according to the purpose and application. It is preferably 3 to 70% by mass, more preferably 5 to 60% by mass, still more preferably 10 to 50% by mass, based on the total components (components excluding the solvent).

(crosslinking agent)
The photosensitive resin composition of this embodiment can contain a cross-linking agent.
The cross-linking agent is not particularly limited as long as it can cross-link the polymer P (chemically bond with the polymer P) by the action of the active chemical species generated from the photopolymerization initiator.
The cross-linking agent may not only chemically bond with the polymer, but may react with each other to form a bond.

The cross-linking agent is, for example, preferably a polyfunctional compound having two or more polymerizable double bonds in one molecule, and a polyfunctional (meth) acrylic compound having two or more (meth)acryloyl groups in one molecule. is more preferred (but the cross-linking agent does not fall under the aforementioned polymers). It is preferable to use a cross-linking agent having the same type of cross-linking group as the cross-linking group (polymerizable double bond) of the polymer, from the viewpoint of uniform curability and further improvement of sensitivity.
Although there is no particular upper limit for the number of functionalities (the number of polymerizable double bonds) per molecule of the cross-linking agent, it is, for example, 8 or less, preferably 6 or less.

Specific examples of cross-linking agents include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, butylene glycol di(meth)acrylate, hexanediol di(meth)acrylate, (meth)acrylates, cyclohexanedimethanol di(meth)acrylate, bisphenol A alkylene oxide di(meth)acrylate, bisphenol F alkylene oxide di(meth)acrylate, trimethylolpropane tri(meth)acrylate, ditrimethylolpropane tetra(meth) Acrylate, glycerin tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, ethylene oxide-added trimethylolpropane tri(meth)acrylate, ethylene oxide-added ditrimethylol Propane tetra(meth)acrylate, ethylene oxide-added pentaerythritol tetra(meth)acrylate, ethylene oxide-added dipentaerythritol hexa(meth)acrylate, propylene oxide-added trimethylolpropane tri(meth)acrylate, propylene oxide-added ditrimethylolpropane tetra(meth)acrylate Acrylates, propylene oxide-added pentaerythritol tetra(meth)acrylate, propylene oxide-added dipentaerythritol hexa(meth)acrylate, ε-caprolactone-added trimethylolpropane tri(meth)acrylate, ε-caprolactone-added ditrimethylolpropane tetra(meth)acrylate , ε-caprolactone-added pentaerythritol tetra (meth) acrylate, ε-caprolactone-added dipentaerythritol hexa (meth) acrylate, polyfunctional (meth) acrylates;
Ethylene glycol divinyl ether, diethylene glycol divinyl ether, polyethylene glycol divinyl ether, propylene glycol divinyl ether, butylene glycol divinyl ether, hexanediol divinyl ether, bisphenol A alkylene oxide divinyl ether, bisphenol F alkylene oxide divinyl ether, trimethylolpropane trivinyl ether, ditri Methylolpropane tetravinyl ether, glycerin trivinyl ether, pentaerythritol tetravinyl ether, dipentaerythritol pentavinyl ether, dipentaerythritol hexavinyl ether, ethylene oxide-added trimethylolpropane trivinyl ether, ethylene oxide-added ditrimethylolpropane tetravinyl ether, ethylene oxide-added pentaerythritol tetravinyl ether, ethylene oxide Polyfunctional vinyl ethers such as adduct dipentaerythritol hexavinyl ether;
2-vinyloxyethyl (meth) acrylate, 3-vinyloxypropyl (meth) acrylate, 1-methyl-2-vinyloxyethyl (meth) acrylate, 2-vinyloxypropyl (meth) acrylate, 4 (meth) acrylic acid -vinyloxybutyl, 4-vinyloxycyclohexyl (meth)acrylate, 5-vinyloxypentyl (meth)acrylate, 6-vinyloxyhexyl (meth)acrylate, 4-vinyloxymethylcyclohexylmethyl (meth)acrylate, ( Vinyl ether group-containing (meth) such as p-vinyloxymethylphenylmethyl meth)acrylate, 2-(vinyloxyethoxy)ethyl (meth)acrylate, and 2-(vinyloxyethoxyethoxyethoxy)ethyl (meth)acrylate acrylic acid esters;
ethylene glycol diallyl ether, diethylene glycol diallyl ether, polyethylene glycol diallyl ether, propylene glycol diallyl ether, butylene glycol diallyl ether, hexanediol diallyl ether, bisphenol A alkylene oxide diallyl ether, bisphenol F alkylene oxide diallyl ether, trimethylolpropane triallyl ether, ditrimethylolpropane tetraallyl ether, glycerin triallyl ether, pentaerythritol tetraallyl ether, dipentaerythritol pentaallyl ether, dipentaerythritol hexaallyl ether, ethylene oxide-added trimethylolpropane triallyl ether, ethylene oxide-added ditrimethylolpropane tetraallyl ether, Polyfunctional allyl ethers such as ethylene oxide-added pentaerythritol tetraallyl ether and ethylene oxide-added dipentaerythritol hexaallyl ether;
Allyl group-containing (meth)acrylic acid esters such as allyl (meth)acrylate;
Polyfunctional (meth)acryloyl such as tri(acryloyloxyethyl) isocyanurate, tri(methacryloyloxyethyl) isocyanurate, alkylene oxide-added tri(acryloyloxyethyl) isocyanurate, alkylene oxide-added tri(methacryloyloxyethyl) isocyanurate group-containing isocyanurates;
Polyfunctional allyl group-containing isocyanurates such as triallyl isocyanurate;
Reaction of polyfunctional isocyanates such as tolylene diisocyanate, isophorone diisocyanate and xylylene diisocyanate with hydroxyl group-containing (meth)acrylic acid esters such as 2-hydroxyethyl (meth)acrylate and 2-hydroxypropyl (meth)acrylate Polyfunctional urethane (meth) acrylates obtained in;
Polyfunctional aromatic vinyls such as divinylbenzene;
etc. can be mentioned.

Among them, trifunctional (meth)acrylates such as trimethylolpropane tri(meth)acrylate and pentaerythritol tri(meth)acrylate, tetrafunctional (meth)acrylates such as pentaerythritol tetra(meth)acrylate and ditrimethylolpropane tetra(meth)acrylate ) acrylate and hexafunctional (meth)acrylate such as dipentaerythritol hexa(meth)acrylate are preferred.

When the photosensitive resin composition contains a cross-linking agent, the photosensitive resin composition may contain only one cross-linking agent, or two or more cross-linking agents. When the photosensitive resin composition contains a cross-linking agent, the amount thereof may be appropriately set according to the purpose and application. As an example, the amount of the cross-linking agent can be usually about 30 to 70 parts by weight, preferably about 40 to 60 parts by weight, per 100 parts by weight of the photosensitive resin.

(Other additives)
Depending on various purposes and required properties, the photosensitive resin composition may contain fillers, binder resins other than the above-mentioned polymers, acid generators, heat resistance improvers, development aids, plasticizers, polymerization inhibitors, ultraviolet absorbers, oxidation Ingredients such as inhibitors, matting agents, antifoaming agents, leveling agents, antistatic agents, dispersants, slip agents, surface modifiers, thixotropic agents, thixotropic aids, silane coupling agents, polyhydric phenol compounds, etc. may include

[Use]
A patterned film can be obtained by forming a film using the photosensitive resin composition described above, exposing and developing the film to form a pattern. This film is applied to color filters, black matrices, and the like. That is, a color filter can be obtained by forming a pattern using a photosensitive resin composition containing a colorant. Moreover, a black matrix can be obtained by forming a pattern using a photosensitive resin composition containing a light shielding agent. Then, a liquid crystal display device and a solid-state imaging device having color filters and a black matrix can be manufactured.
A typical procedure for forming a pattern will be described.

(Formation of photosensitive resin film)
For example, a photosensitive resin film is first obtained by applying the above photosensitive resin composition onto an arbitrary substrate and drying it as necessary.

The substrate to which the composition is applied is not particularly limited. Examples include glass substrates, silicon wafers, ceramic substrates, aluminum substrates, SiC wafers, GaN wafers, and copper-clad laminates.
The substrate may be an unprocessed substrate or a substrate having electrodes or elements formed thereon. It may be surface-treated to improve adhesion.

The method of applying the photosensitive resin composition is not particularly limited. It can be applied by spin coating using a spinner, spray coating using a spray coater, immersion, printing, roll coating, inkjet method, or the like.

Drying of the photosensitive resin composition coated on the substrate is typically performed by heat treatment using a hot plate, hot air, an oven, or the like. The heating temperature is usually 80-140°C, preferably 90-120°C. The heating time is usually 30 to 600 seconds, preferably about 30 to 300 seconds.

The film thickness of the photosensitive resin film is not particularly limited, and may be appropriately adjusted according to the pattern to be finally obtained. In addition, the film thickness can be adjusted by the content of the solvent in the photosensitive resin composition, the coating method, and the like.

(exposure)
Exposure is typically performed by exposing the photosensitive resin film to actinic rays through a suitable photomask.

Actinic rays include, for example, X-rays, electron beams, ultraviolet rays, and visible rays. Light with a wavelength of 200 to 500 nm is preferable. From the viewpoint of pattern resolution and handleability, the light source is preferably g-line, h-line or i-line of a mercury lamp, and particularly preferably i-line. Also, two or more rays may be mixed and used. A contact aligner, mirror projection or stepper is preferred as the exposure device.
The amount of light for exposure may be appropriately adjusted depending on the amount of the photosensitive agent in the photosensitive resin film, and is, for example, about 100 to 500 mJ/cm ² .

After the exposure, the photosensitive resin film may be heated again as necessary (post-exposure heating: Post Exposure Bake). The temperature is, for example, 70-150°C, preferably 90-120°C. Also, the time is, for example, 30 to 600 seconds, preferably 30 to 300 seconds. Heating after exposure accelerates the reaction by radicals generated from the photoradical polymerization initiator, further accelerating the curing reaction.

(developing)
By developing the exposed photosensitive resin film with a suitable developer, a pattern can be obtained and a patterned substrate can be manufactured.
Since the photosensitive resin film made of the photosensitive resin composition containing the polymer solution of the present embodiment has excellent adhesion to the substrate, peeling of the pattern is suppressed in the development process.

In the development step, development can be carried out using a suitable developer, for example, by a dipping method, a puddle method, a rotary spray method, or the like. By development, the exposed portion (in the case of a positive type) or the unexposed portion (in the case of a negative type) of the photosensitive resin film is eluted and removed to obtain a pattern.
Usable developer is not particularly limited. For example, an alkaline aqueous solution or an organic solvent can be used.

Specific examples of alkaline aqueous solutions include (i) inorganic alkaline aqueous solutions such as sodium hydroxide, sodium carbonate, sodium silicate and ammonia, (ii) organic amine aqueous solutions such as ethylamine, diethylamine, triethylamine and triethanolamine, and (iii) Examples include aqueous solutions of quaternary ammonium salts such as tetramethylammonium hydroxide and tetrabutylammonium hydroxide.
Since the polymer of the present embodiment has adjusted alkali solubility and excellent sensitivity, when using a strongly basic developer such as a TMAH (tetramethylammonium hydroxide) solution, the pattern after exposure and development can be formed as designed. can have the shape of

Specific examples of organic solvents include ketone solvents such as cyclopentanone, ester solvents such as propylene glycol monomethyl ether acetate (PGMEA) and butyl acetate, and ether solvents such as propylene glycol monomethyl ether.
A water-soluble organic solvent such as methanol or ethanol, or a surfactant may be added to the developer.

In this embodiment, it is preferable to use an alkaline aqueous solution as the developer, and it is more preferable to use tetramethylammonium hydroxide, a sodium carbonate aqueous solution, or a potassium hydroxide aqueous solution.
The concentration of the alkaline aqueous solution is preferably 0.01 to 10% by mass, more preferably 0.5 to 5% by mass.
Through the above steps, a pattern can be obtained/a patterned substrate can be manufactured, and various treatments may be performed after development.

For example, after development, the pattern and substrate may be washed with a rinse. Examples of rinse liquids include distilled water, methanol, ethanol, isopropanol, propylene glycol monomethyl ether, and the like. These may be used alone or in combination of two or more.

Alternatively, the obtained pattern may be heated to sufficiently harden it. The heating temperature is typically 150-400°C, preferably 160-300°C, more preferably 200-250°C. The heating time is not particularly limited, but is, for example, within the range of 15 to 300 minutes. This heat treatment can be performed using a hot plate, an oven, a heating oven in which a temperature program can be set, or the like. The atmospheric gas for the heat treatment may be air or an inert gas such as nitrogen or argon. Moreover, you may heat under pressure reduction.
FIG. 1 schematically shows an example of the structure of a liquid crystal display device and/or solid-state imaging device having color filters and/or black matrices. A black bank may be used as the black matrix, but a liquid crystal display device and/or a solid-state imaging device having a color filter and a black matrix will be described below.

A black matrix 11 and color filters 12 are formed on the substrate 10 . A protective film 13 and a transparent electrode layer 14 are provided on the black matrix 11 and the color filter 12 .

The substrate 10 is generally made of a material that transmits light, such as glass, polyester, polycarbonate, polyolefin, polysulfone, or a cyclic olefin polymer. The substrate 10 may be subjected to corona discharge treatment, ozone treatment, chemical treatment, or the like, if necessary.
Substrate 10 is preferably composed of glass.
The black matrix 11 is composed of, for example, a cured photosensitive resin composition containing a light shielding agent.

As the color filter 12, there are usually three colors of red, green and blue. The color filter 12 is composed of a cured photosensitive resin composition containing a colorant corresponding to each color.

式（ＮＢｍ）中、Ｒ^１、Ｒ^２、Ｒ^３およびＲ^４は、それぞれ独立して、水素原子または炭素数１～３０の有機基であり、ａ_１は０、１または２であり、

式（ＡＤｍ）中、Ｒ^１１およびＲ^１２は、それぞれ独立して、炭素数１～１２の直鎖または分枝鎖のアルキル基であり、

式（ＭＡｍ）中、Ｒ^２１およびＲ^２２は、それぞれ独立して、水素原子または炭素数１～３の有機基である、
ポリマーの製造方法。
［２］ 下記式（ＮＢｍ）で表されるモノマーと、下記式（ＡＤｍ）で表されるモノマーと、下記式（ＭＡｍ）で表されるモノマーとを含むモノマー組成物を、単官能または２官能以上のチオール基含有化合物の存在下で重合させて原料ポリマーを調製する工程と、
前記原料ポリマーを、塩基性触媒の存在下で、ヒドロキシル基および２つ以上の（メタ）アクリロイル基を有する化合物、および／またはヒドロキシル基および１つの（メタ）アクリロイル基を有する化合物と反応させて、ポリマー前駆体を調製する工程と、
前記ポリマー前駆体を、塩基性触媒の存在下で、水で処理することによりポリマーを得る工程と、を含む、ポリマーの製造方法であって、

式（ＮＢｍ）中、Ｒ^１、Ｒ^２、Ｒ^３およびＲ^４は、それぞれ独立して、水素原子または炭素数１～３０の有機基であり、ａ_１は０、１または２であり、

式（ＡＤｍ）中、Ｒ^１１およびＲ^１２は、それぞれ独立して、炭素数１～１２の直鎖または分枝鎖のアルキル基であり、

式（ＭＡｍ）中、Ｒ^２１およびＲ^２２は、それぞれ独立して、水素原子または炭素数１～３の有機基である、
ポリマーの製造方法。
［２］ 前記単官能または２官能以上のチオール基含有化合物が、式（ｓ－１）～式（ｓ－２１）から選択される少なくとも１つの化合物である、［１］または［２］に記載のポリマーの製造方法。

［３］ ［１］または［２］に記載のポリマーの製造方法であって、
前記ポリマーの重量平均分子量が、３，０００以上１５，０００以下である、ポリマーの製造方法。
［４］ ［１］乃至［３］のいずれかに記載のポリマーの製造方法により得られたポリマーを含む、ポリマー溶液。
［５］ ［４］に記載のポリマー溶液であって、
多官能（メタ）アクリル化合物もしくは単官能（メタ）アクリル化合物、またはこれらの組み合わせをさらに含む、ポリマー溶液。
［６］ ［４］または［５］に記載のポリマー溶液であって、
カラーフィルタまたはブラックマトリクスの形成に用いられる、ポリマー溶液。
［７］ ［１］乃至［３］のいずれかに記載のポリマーの製造方法により得られたポリマーと、
光ラジカル重合開始剤と、を含む、
感光性樹脂組成物。
［８］ 下記式（ＮＢｍ）で表されるモノマーと、下記式（ＡＤｍ）で表されるモノマーと、下記式（ＭＡｍ）で表されるモノマーとを含むモノマー組成物を、単官能または２官能以上のチオール基含有化合物の存在下で重合させてポリマーを得る工程を含む、ポリマーの製造方法であって、

式（ＮＢｍ）中、Ｒ^１、Ｒ^２、Ｒ^３およびＲ^４は、それぞれ独立して、水素原子または炭素数１～３０の有機基であり、ａ_１は０、１または２であり、

式（ＡＤｍ）中、Ｒ^１１およびＲ^１２は、それぞれ独立して、炭素数１～１２の直鎖または分枝鎖のアルキル基であり、

式（ＭＡｍ）中、Ｒ^２１およびＲ^２２は、それぞれ独立して、水素原子または炭素数１～３の有機基である、
ポリマーの製造方法。
［９］ 前記単官能または２官能以上のチオール基含有化合物が、式（ｓ－１）～式（ｓ－２１）から選択される少なくとも１つの化合物である、［８］に記載のポリマーの製造方法。

［１０］ ［９］に記載のポリマーの製造方法であって、
前記ポリマーの軟化点が、６０℃以上１３０℃以下である、ポリマーの製造方法。 Although the embodiments of the present invention have been described above, these are examples of the present invention, and various configurations other than those described above can also be adopted.
In the following, examples of further embodiments of the invention are appended.
[1] A monomer composition containing a monomer represented by the following formula (NBm), a monomer represented by the following formula (ADm), and a monomer represented by the following formula (MAm) is monofunctionally or difunctionally A step of polymerizing in the presence of the above thiol group-containing compound to prepare a raw material polymer;
The raw material polymer is reacted with a compound having a hydroxyl group and two or more (meth)acryloyl groups and/or a compound having a hydroxyl group and one (meth)acryloyl group in the presence of a basic catalyst to obtain a polymer A method for producing a polymer comprising the step of obtaining

In formula (NBm), R ¹ , R ² , R ³ and R ⁴ are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, a ₁ is 0, 1 or 2,

In formula (ADm), R ¹¹ and R ¹² are each independently a linear or branched alkyl group having 1 to 12 carbon atoms,

In formula (MAm), R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms,
A method of making a polymer.
[2] Monofunctional or bifunctional monomer composition containing a monomer represented by the following formula (NBm), a monomer represented by the following formula (ADm), and a monomer represented by the following formula (MAm) A step of polymerizing in the presence of the above thiol group-containing compound to prepare a raw material polymer;
The raw material polymer is reacted with a compound having a hydroxyl group and two or more (meth)acryloyl groups and/or a compound having a hydroxyl group and one (meth)acryloyl group in the presence of a basic catalyst, preparing a polymer precursor;
and obtaining a polymer by treating the polymer precursor with water in the presence of a basic catalyst, wherein

In formula (NBm), R ¹ , R ² , R ³ and R ⁴ are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, a ₁ is 0, 1 or 2,

In formula (ADm), R ¹¹ and R ¹² are each independently a linear or branched alkyl group having 1 to 12 carbon atoms,

In formula (MAm), R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms,
A method of making a polymer.
[2] According to [1] or [2], wherein the monofunctional or bifunctional or higher thiol group-containing compound is at least one compound selected from formulas (s-1) to (s-21). of the polymer.

[3] A method for producing the polymer according to [1] or [2],
A method for producing a polymer, wherein the polymer has a weight average molecular weight of 3,000 or more and 15,000 or less.
[4] A polymer solution containing a polymer obtained by the method for producing a polymer according to any one of [1] to [3].
[5] The polymer solution according to [4],
A polymer solution further comprising a polyfunctional (meth)acrylic compound or a monofunctional (meth)acrylic compound, or a combination thereof.
[6] The polymer solution according to [4] or [5],
A polymer solution used to form a color filter or black matrix.
[7] a polymer obtained by the method for producing a polymer according to any one of [1] to [3];
and a photoradical polymerization initiator,
A photosensitive resin composition.
[8] A monomer composition containing a monomer represented by the following formula (NBm), a monomer represented by the following formula (ADm), and a monomer represented by the following formula (MAm) is monofunctionally or difunctionally A method for producing a polymer, comprising the step of obtaining a polymer by polymerizing in the presence of the above thiol group-containing compound,

In formula (NBm), R ¹ , R ² , R ³ and R ⁴ are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, a ₁ is 0, 1 or 2,

In formula (ADm), R ¹¹ and R ¹² are each independently a linear or branched alkyl group having 1 to 12 carbon atoms,

In formula (MAm), R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms,
A method of making a polymer.
[9] The monofunctional or bifunctional or higher thiol group-containing compound is at least one compound selected from formulas (s-1) to (s-21), producing the polymer according to [8]. Method.

[10] A method for producing the polymer according to [9],
A method for producing a polymer, wherein the softening point of the polymer is 60°C or higher and 130°C or lower.

EXAMPLES The present invention will be described below with reference to Examples and Comparative Examples, but the present invention is not limited to these.

The compounds used in Examples may be indicated by the following abbreviations or trade names.
・MAN: maleic anhydride ・NB: 2-norbornene ・FADB: dibutyl fumarate ・FADE: diethyl fumarate ・FABEH: dibis(2-ethylhexyl) fumarate
・MADB: dibutyl maleate ・MEK: methyl ethyl ketone ・PEMP: pentaerythritol tetrakis (3-mercaptopropionate), a thiol group-containing compound of the above formula (s-2) (manufactured by SC Organic Chemical Co., Ltd.)
・4-HBA: 4-hydroxybutyl acrylate ・A-TMM-3LM-N: A mixture of the following two compounds, the amount of the left compound in the mixture based on gas chromatography measurement is about 57% (Shin-Nakamura Chemical Co., Ltd. manufactured by the company)

<Synthesis of raw polymer>
(Synthesis of Raw Polymer 1)
602.56 g of a 75% toluene solution of 2-norbornene (451.92 g as 2-norbornene, 4.8 mol), maleic anhydride (MAN, 470.69 g) were placed in a reaction vessel equipped with a stirrer, condenser and dropping funnel. , 4.8 mol) and 2281.74 g of methyl ethyl ketone (MEK) were added, stirred and dissolved. Then, after removing dissolved oxygen in the system by nitrogen bubbling, it is heated, and when the internal temperature reaches 80 ° C., dimethyl 2,2′-azobisisobutyrate (manufactured by Wako Pure Chemical Industries, trade name: V-601 , 44.21 g, 0.19 mol) and PEMP (93.82 g, 0.19 mol) dissolved in 193.4 g of MEK was added over 1 hour. After that, the mixture was further reacted at 80° C. for 7 hours. The reaction mixture was then cooled to room temperature. The polymerization solution obtained above was added dropwise to 3686.4 g of methanol to precipitate a white solid. The resulting white solid was further washed with 3686.4 g of methanol and then vacuum dried at a temperature of 120° C. to obtain a polymer having structural units derived from 2-norbornene and structural units derived from maleic anhydride ( 910.1 g of raw polymer 1) was obtained.
As a result of measuring the obtained raw material polymer 1 using gel permeation chromatography (GPC), the weight average molecular weight Mw was 3,500, and the polydispersity (weight average molecular weight Mw)/(number average molecular weight Mn) was was 1.62.

(Confirmation of thioether structure contained in raw material polymer 1)
^{A 13} C-NMR measurement of PEMP alone represented by the following chemical formula confirmed a peak a derived from carbon a at around 19.0 ppm and a peak b derived from carbon b at around 62.0 ppm.

In the ¹³ C-NMR measurement of raw material polymer 1 synthesized using PEMP, the appearance of peak b derived from carbon b was confirmed near 62.0 ppm. In the GPC measurement of the reaction solution, no PEMP single peak was observed, and no unreacted PEMP remained.

In addition, in the ¹³ C-NMR measurement of the raw material polymer 1, the peak a derived from carbon a was not confirmed, and instead, the peak c corresponding to the thioether (RSR') appeared around 28 ppm. Since the integrated value of this peak c is approximately twice the integrated value of peak b, the starting polymer 1 has a skeleton having a thioether group as shown below, and the thiol group has disappeared.

The conditions for ¹³ C-NMR measurement are as follows.
(Test conditions) A measurement sample was prepared by adding a measurement solvent to a weighed sample to adjust the concentration, and then pouring a specified amount into a sample tube for NMR measurement.
・Measuring device: JEOL JNM-ECA400 superconducting FT-NMR device ・Resonance frequency: 100.53MHz
・Measurement nuclei: ¹³ C
・Measurement method: NNE measurement (inverse gate decoupling method)
・Pulse width: 3.83 μsec
・Pulse repetition waiting time: 30s
・Number of accumulations: 4096 times ・Measurement temperature: room temperature ・Measurement solvent: DMSO-d ₆ (deuterated dimethyl sulfoxide)
・ Sample concentration: 20% (w / v)
The amount of sulfur in the obtained polymer was confirmed by elemental analysis by flask combustion and ion chromatography, and the presence of elemental sulfur in the polymer was confirmed. Also in the GPC measurement of the reaction solution before dropping methanol, the PEMP-derived peak disappeared, confirming that PEMP was incorporated into the raw material polymer 1.

As a result of elemental analysis, the sulfur content in the starting polymer 1 was found to be 2.4 wt %.

(Synthesis of raw material polymer 2)
In a reaction vessel equipped with a stirrer and condenser and dropping funnel, 602.56 g of a 75% toluene solution of 2-norbornene (451.92 g as NB, 4.8 mol), maleic anhydride (MA, 470.69 g, 4 .8 mol) and 2238.50 g of methyl ethyl ketone (MEK) were added, stirred and dissolved. Then, after removing dissolved oxygen in the system by nitrogen bubbling, it is heated, and when the internal temperature reaches 80 ° C., dimethyl 2,2′-azobisisobutyrate (manufactured by Wako Pure Chemical Industries, trade name: V-601 , 44.21 g, 0.19 mol) and pentaerythritol tetrakis(3-mercaptopropionate) (PEMP, 140.73 g, 0.29 mol) in 189.74 g of MEK was added over 1 hour. After that, the mixture was further reacted at 80° C. for 7 hours. The reaction mixture was then cooled to room temperature. The polymerization solution obtained above was added dropwise to 3686.4 g of methanol to precipitate a white solid. The resulting white solid was further washed with 3686.4 g of methanol and then vacuum dried at a temperature of 120° C. to obtain a polymer having structural units derived from 2-norbornene and structural units derived from maleic anhydride ( 908.1 g of raw polymer 2) was obtained.
As a result of measuring the obtained raw material polymer 2 using gel permeation chromatography (GPC), the weight average molecular weight Mw was 2,700, and the polydispersity (weight average molecular weight Mw)/(number average molecular weight Mn) was was 1.57.

The amount of sulfur in the obtained polymer was confirmed by elemental analysis by flask combustion and ion chromatography, and the presence of elemental sulfur in the polymer was confirmed. Also in the GPC measurement of the reaction solution before dropping methanol, the PEMP-derived peak disappeared, confirming that PEMP was incorporated into the polymer.

(Synthesis of Raw Polymer 3)
In a reaction vessel equipped with a stirrer, condenser and dropping funnel, 50.21 g of a 75% toluene solution of 2-norbornene (37.66 g as 2-norbornene, 0.400 mol), maleic anhydride (MAN, 78. 45 g, 0.800 mol), 91.32 g (0.400 mol) of dibutyl fumarate (FADB), and 540.04 g of methyl ethyl ketone (MEK) were added, stirred and dissolved. Then, after removing dissolved oxygen in the system by nitrogen bubbling, it is heated, and when the internal temperature reaches 80 ° C., dimethyl 2,2′-azobisisobutyrate (manufactured by Wako Pure Chemical Industries, trade name: V-601 , 7.37 g, 0.032 mol) and PEMP (15.64 g, 0.032 mol) dissolved in 45.78 g of MEK was added over 1 hour. After that, the mixture was further reacted at 80° C. for 7 hours. The reaction mixture was then cooled to room temperature. The polymerization solution obtained above was added dropwise to 3213.2 g of methanol to precipitate a white solid. The resulting white solid was further washed with 803.3 g of methanol, and then vacuum-dried at a temperature of 120° C. to obtain a structural unit derived from 2-norbornene, a structural unit derived from dibutyl fumarate, and maleic anhydride. 67.7 g of a polymer (raw material polymer 3) having a structural unit derived from was obtained.
As a result of measuring the obtained polymer using gel permeation chromatography (GPC), the weight average molecular weight Mw was 2,300, and the polydispersity (weight average molecular weight Mw)/(number average molecular weight Mn) was 1.0. was 52.

The amount of sulfur in the obtained raw material polymer 3 was confirmed by elemental analysis by flask combustion and ion chromatography, and the presence of elemental sulfur in the raw material polymer 3 was confirmed. Also in the GPC measurement of the reaction solution before dropping methanol, the PEMP-derived peak disappeared, confirming that PEMP was incorporated into the polymer.

(Synthesis of Raw Polymer 4)
In a reaction vessel equipped with a stirrer, condenser and dropping funnel, 112.98 g of a 75% toluene solution of 2-norbornene (84.75 g as 2-norbornene, 0.900 mol), maleic anhydride (MAN, 88. 25 g, 0.900 mol), 102.73 g (0.450 mol) of dibutyl fumarate, and 179.12 g of methyl ethyl ketone (MEK) were added, stirred and dissolved. Then, after removing dissolved oxygen in the system by nitrogen bubbling, it is heated, and when the internal temperature reaches 70 ° C., dimethyl 2,2′-azobisisobutyrate (manufactured by Wako Pure Chemical Industries, trade name: V-601 , 10.36 g, 0.045 mol) and PEMP (32.98 g, 0.0675 mol) dissolved in 76.77 g of MEK was added over 1 hour. Further, the temperature was raised to 80°C, and after the temperature was raised, reaction was carried out at 80°C for 7 hours. The reaction mixture was then cooled to room temperature. The polymerization solution obtained above was added dropwise to 3016.2 g of methanol to precipitate a white solid. The obtained white solid was further washed with 754.1 g of methanol, and then vacuum-dried at a temperature of 120° C. to obtain a structural unit derived from 2-norbornene, a structural unit derived from dibutyl fumarate, and maleic anhydride. 154.2 g of a polymer (raw material polymer 4) having a structural unit derived from was obtained.
As a result of measuring the obtained polymer using gel permeation chromatography (GPC), the weight average molecular weight Mw was 2,800, and the polydispersity (weight average molecular weight Mw)/(number average molecular weight Mn) was 1.0. was 54.

[Structural analysis of raw polymer 4]
At the start of the reaction, the synthesis of the raw material polymer 4 starts with the monomer and PEMP dissolved in a solvent, after which the reaction progresses to produce a polymer. Analysis of the reaction solution and the resulting polymer yielded the following results.

(a) Analysis of reaction solution No peak of PEMP alone was observed in the GPC measurement of the reaction solution before reprecipitation purification. That is, it was confirmed that no PEMP remained in the reaction solution. In addition, in GC (gas chromatography) measurement of the reaction solution before reprecipitation purification, the peaks of norbornene alone, dibutyl fumarate alone, and maleic anhydride alone in the reaction solution after the reaction are reduced compared to before the reaction. , norbornene, dibutyl fumarate and maleic anhydride reacted to form a polymer.

(b) Polymer Analysis GPC measurement of the polymer after reprecipitation and purification showed no peaks for PEMP alone, norbornene alone, dibutyl fumarate alone, or maleic anhydride alone. That is, it was confirmed that PEMP, simple norbornene, simple dibutyl fumarate, and simple maleic anhydride did not remain in the polymer.

Regarding raw material polymer 4, the ratio of structures derived from each monomer actually introduced into the raw material polymer calculated by ¹³ C-NMR was norbornene:dibutyl fumarate:maleic anhydride=48.0%:9.0%: 46.7%, and the amount of PEMP actually introduced into the starting polymer was 3.4 mol % with respect to the total amount of each monomer.

The amount of sulfur in the obtained raw material polymer 4 was confirmed by elemental analysis by flask combustion and ion chromatography, and the presence of elemental sulfur in the raw material polymer 4 was confirmed. Also in the GPC measurement of the reaction solution before dropping methanol, the PEMP-derived peak disappeared, confirming that PEMP was incorporated into the polymer.

(Confirmation of structure of raw material polymer 4)
In the raw material polymer 4, a structural unit derived from PEMP, a structural unit derived from dibutyl fumarate (FADB) (structural unit of formula (AD)), a structural unit derived from maleic anhydride (MAN) (structural unit of formula (MA)) , and norbornene (NB)-derived structures (structural units of formula (NB)) (molar fraction, mol%) were calculated by integral value analysis of ¹³ C-NMR. A ¹³ C-NMR chart is shown in FIG.
The chemical shifts in the ¹³ C-NMR chart were assigned to each structural unit as follows, and the corresponding integral values were measured.
・ k (4C) of PEPM: 62.0 to 64.0 ppm
Alkyl terminal (2C) of FADB: 13.0 to 15.0 ppm
· g of maleic anhydride (2C) + PEMP (4C): 170.0 to 174.7 ppm
· Maleic acid ester (2C) + FADB ester (2C): 174.7 to 178.0 ppm
・ Alkyl chain: 20 to 60 ppm
· DMSO: around 40 ppm · Norbornene (7C) = alkyl chain - DMSO - PEMP (9C, h + i + j) - maleic anhydride (2C) - maleic acid (2C) - FADB (6C)
Here, the structural ratio derived from maleic anhydride actually introduced into the raw material polymer was calculated including the structure of maleic acid ring-opened from maleic anhydride in addition to the structural units of the formula (MA).

(Synthesis of Raw Polymer 5)
A structural unit derived from 2-norbornene, a structural unit derived from dibutyl fumarate, and a Thus, 111.5 g of a polymer (raw material polymer 5) having a structural unit derived from maleic anhydride was obtained.
As a result of measuring the obtained polymer using gel permeation chromatography (GPC), the weight average molecular weight Mw was 3,000, and the polydispersity (weight average molecular weight Mw)/(number average molecular weight Mn) was 1.0. was 69.

The amount of sulfur in the obtained raw material polymer 5 was confirmed by elemental analysis by flask combustion and ion chromatography, and the presence of elemental sulfur in the raw material polymer 5 was confirmed. Also in the GPC measurement of the reaction solution before dropping methanol, the PEMP-derived peak disappeared, confirming that PEMP was incorporated into the polymer.

(Synthesis of Raw Polymer 6)
Structural units derived from 2-norbornene and fumarate 148.1 g of a polymer (raw material polymer 6) having a structural unit derived from diethyl acid and a structural unit derived from maleic anhydride was obtained.
The obtained polymer was measured by gel permeation chromatography (GPC) and found to have a weight average molecular weight Mw of 2,600 and a polydispersity (weight average molecular weight Mw)/(number average molecular weight Mn) of 1.0. was 52.

The amount of sulfur in the obtained raw material polymer 6 was confirmed by elemental analysis by flask combustion and ion chromatography, and the presence of elemental sulfur in the raw material polymer 6 was confirmed. Also in the GPC measurement of the reaction solution before dropping methanol, the PEMP-derived peak disappeared, confirming that PEMP was incorporated into the polymer.

(Synthesis of Raw Polymer 7)
Derived from 2-norbornene in the same manner as the starting polymer 4 except that 153.22 g (0.450 mol) of bis(2-ethylhexyl) fumarate (FABEH) was used instead of dibutyl fumarate (FADB). 169.1 g of a polymer (raw material polymer 7) having a structural unit, a structural unit derived from bis(2-ethylhexyl) fumarate, and a structural unit derived from maleic anhydride was obtained.
As a result of measuring the obtained polymer using gel permeation chromatography (GPC), the weight average molecular weight Mw was 2,900, and the polydispersity (weight average molecular weight Mw)/(number average molecular weight Mn) was 1.0. was 59.

The amount of sulfur in the obtained raw material polymer 7 was confirmed by elemental analysis by flask combustion and ion chromatography, and the presence of elemental sulfur in the raw material polymer 7 was confirmed. Also in the GPC measurement of the reaction solution before dropping methanol, the PEMP-derived peak disappeared, confirming that PEMP was incorporated into the polymer.

(Synthesis of Raw Polymer 8)
Structural units derived from 2-norbornene and maleic 155.1 g of a polymer (raw material polymer 8) having a structural unit derived from dibutyl acid and a structural unit derived from maleic anhydride was obtained.
As a result of measuring the obtained polymer using gel permeation chromatography (GPC), the weight average molecular weight Mw was 2,400, and the polydispersity (weight average molecular weight Mw)/(number average molecular weight Mn) was 1.0. was 45.

The amount of sulfur in the raw material polymer 8 obtained was confirmed by elemental analysis by flask combustion and ion chromatography, and the presence of elemental sulfur in the raw material polymer 8 was confirmed. Also in the GPC measurement of the reaction solution before dropping methanol, the PEMP-derived peak disappeared, confirming that PEMP was incorporated into the polymer.

For raw material polymers 3 to 8, the amount of each monomer in the reaction solution before and after the reaction was measured by gas chromatography (GC) measurement, and the consumption of each monomer was calculated. The ratio of monomers was calculated.
Table 1 below shows the charging ratio of the monomers used in the synthesis of the raw material polymer, the ratio of the monomers introduced into the raw material polymer, the weight average molecular weight (Mw) and other dispersity (Mw/Mn) of the raw material polymer.
The measurement conditions for the gas chromatography measurement are as follows.
・GC device: GC-2030 (Shimadzu Corporation)
・Carrier gas: _N2
・ Detector: Flame ionization (FID) detector, FID temperature: 300 ° C.
・ Column: SH-RXi-1HT, inner diameter 0.25, length 30 m, film thickness 0.25 μm (Shimadzu GLC Co., Ltd.)
・Vaporization chamber temperature: 210°C
・Column flow rate: 0.64 mL/min
・Column heating conditions: 50° C. 5 min hold, 20° C./min up to 300° C., 300° C. 10 min hold

<Synthesis of Polymer P>
Polymer P was prepared using the following method.

(Preparation Example 1)
A polymer P1 was prepared by ring-opening the MA unit of the raw material polymer 1 with a monofunctional (meth)acrylic compound. Details will be described below.
First, 18.44 g of MEK was added to 10.00 g of raw material polymer 1 (0.052 mol in terms of MA calculated from the charged amount of raw material polymer 1) to prepare a solution. Next, 9.38 g (0.065 mol) of 4-HBA was added to this solution, and then 3.00 g (0.030 mol) of triethylamine was added and reacted at a temperature of 70° C. for 6 hours to obtain a reaction solution. was made.
The resulting reaction solution was diluted with MEK and treated with an aqueous citric acid solution to remove the aqueous phase from the reaction solution. After that, the polymer was purified by the following reprecipitation method.
- Reprecipitation method: The polymer was reprecipitated with an excess amount of water. The operation of washing the polymer powder obtained by reprecipitation with an excessive amount of water was repeated twice. The resulting reaction product was dried at 40° C. for 12 hours.
As a result, 8.7 g of polymer P1 was obtained in which the maleic anhydride-derived structural unit in raw material polymer 1 was ring-opened with 4-HBA.
The obtained polymer P1 was subjected to GPC measurement to determine the weight average molecular weight and polydispersity of polymer P1. Table 2 shows the results.
Further, disappearance of the peak of the monofunctional (meth)acrylic compound used was confirmed by GPC measurement of the polymer P1. Thereby, it was confirmed that the obtained polymer P1 contained no unreacted monofunctional (meth)acrylic compound.

(Preparation Example 2)
A polymer P2 was prepared by ring-opening the MA unit of the starting polymer 1 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound and water. Details will be described below.
First, 99.93 g of MEK was added to 60.00 g of raw material polymer 1 (0.312 mol in terms of MA calculated from the charged amount of raw material polymer 1) to prepare a solution. Next, 77.49 g of A-TMM-3LM-N was added to this solution, and then 18.00 g (0.178 mol) of triethylamine was added and reacted at a temperature of 70° C. for 2 hours. After that, 56.27 g (0.390 mol) of 4-HBA was added and reacted at a temperature of 70° C. for 4 hours to prepare a reaction solution.
Then, 3.00 g (0.167 mol) of water was added to the reaction solution without post-treatment, and the mixture was reacted at 70° C. for 2 hours.
The resulting reaction solution was diluted with MEK and treated with an aqueous citric acid solution to remove the aqueous phase from the reaction solution. Furthermore, liquid-liquid extraction and then solvent replacement were performed in the following procedure.
Liquid-liquid extraction: The reaction solution was diluted with MEK, then water was added and treated to remove the aqueous phase from the reaction solution, and then the same operation was performed once.
- Solvent replacement: The solvent was removed from the resulting reaction mixture at 50°C under reduced pressure using a rotary evaporator. After confirming that the solid content concentration of the polymer solution reached 27±2% by mass as measured by a heat drying moisture meter, the solvent removal operation was discontinued. After that, PGMEA was added so that the solid content concentration was 18% by mass, and mixed until uniform. The solvent is removed at 50° C. under reduced pressure in the same manner, and after adjusting the solid content concentration to 27±2% by mass as measured by a heat drying moisture meter, PGMEA is added so that the solid content concentration becomes 18% by mass. and mixing until uniform was repeated two more times. Thereafter, the solvent was removed or PGMEA was added so that the solid content concentration became 30±3% by mass, and the mixture was stirred until uniform. The above operation removes the solvent used for the reaction and replaces the solvent with PGMEA. After that, it was further purified by the following procedure.
• The polymer was reprecipitated with an excess amount of toluene.
- The operation of washing the polymer powder obtained by reprecipitation with an excessive amount of toluene was repeated twice.
- The operation of washing the polymer powder after washing twice with an excessive amount of water was repeated three times.
• The resulting reaction product was dried at 40°C for 12 hours.
As described above, a polymer P2 was prepared by ring-opening the MA unit of the raw material polymer 1 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound, and water.
GPC measurement was performed on the resulting polymer P2 to determine the weight average molecular weight and polydispersity of polymer P2. Table 2 shows the results.
Further, disappearance of the peaks of the polyfunctional (meth)acrylic compound and the monofunctional (meth)acrylic compound used was confirmed by GPC measurement of the polymer P2. Thus, it was confirmed that the obtained polymer P2 contained neither unreacted polyfunctional (meth)acrylic compound nor monofunctional (meth)acrylic compound.
Further, by ¹³ C-NMR measurement, it was confirmed that polymer P2 has a structure in which structural units derived from maleic anhydride are ring-opened with A-TMM-3LM-N, 4-HBA and water.

(Preparation Example 3)
A resin mixture (polymer solution P3) containing polymer P3 obtained by ring-opening the MA unit of raw material polymer 1 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound, and water was prepared. Details will be described below.
First, 99.93 g of MEK was added to 60.00 g of raw material polymer 1 (0.312 mol in terms of MA calculated from the charged amount of raw material polymer 1) to prepare a solution. Next, 77.49 g of A-TMM-3LM-N was added to this solution, and then 18.00 g (0.178 mol) of triethylamine was added and reacted at a temperature of 70° C. for 2 hours. After that, 56.27 g (0.390 mol) of 4-HBA was added and reacted at a temperature of 70° C. for 4 hours to prepare a reaction solution.
Then, 3.00 g (0.167 mol) of water was added to the reaction solution without post-treatment, and the mixture was reacted at 70° C. for 2 hours.
The resulting reaction solution was diluted with MEK and treated with an aqueous formic acid solution and an aqueous citric acid solution to remove the aqueous phase from the reaction solution. Furthermore, liquid-liquid extraction and subsequent solvent replacement were performed in the following procedure.
Liquid-liquid extraction: The reaction solution was diluted with MEK, then water was added and treated to remove the aqueous phase from the reaction solution, and then the same operation was performed once.
- Solvent replacement: The solvent was removed from the resulting reaction mixture at 50°C under reduced pressure using a rotary evaporator. After confirming that the solid content concentration of the polymer solution reached 27±2% by mass as measured by a heat drying moisture meter, the solvent removal operation was discontinued. After that, PGMEA was added so that the solid content concentration was 18% by mass, and mixed until uniform. The solvent is removed at 50° C. under reduced pressure in the same manner, and after adjusting the solid content concentration to 27±2% by mass as measured by a heat drying moisture meter, PGMEA is added so that the solid content concentration becomes 18% by mass. and mixing until uniform was repeated two more times. Thereafter, the solvent was removed or PGMEA was added so that the solid content concentration became 30±3% by mass, and the mixture was stirred until uniform. The above operation removes the solvent used for the reaction and replaces the solvent with PGMEA.

As described above, the structural units derived from maleic anhydride in the raw material polymer 1 are A-TMM-3LM-N, the polymer P3 ring-opened with 4-HBA and water, and the residual (free) A-TMM-3LM-N and residual (free) 4-HBA (polymer solution P3) was obtained.
The resulting polymer solution P3 was analyzed by gel permeation chromatography to determine the amount of polymer P3, free polyfunctional (meth)acrylic compound and free monofunctional (meth)acrylic compound contained in the solution, and the amount of polymer P3. Weight average molecular weight and polydispersity were measured. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P3 in the gel permeation chromatography (GPC) chart of the resin mixture.
In addition, the measurement conditions of the gel permeation chromatography method are as follows.
- As a GPC measurement device, HLC-8320GPC EcoSEC manufactured by Tosoh Corporation was used. The column temperature was set to 40.0° C. and the pump flow rate to 0.350 mL/min.
・Peak position (retention time)
Polymer P3: Peak detected before 20 minutes (peak with shorter retention time and higher molecular weight than A-TMM-3LM-N and 4-HBA)
A-TMM-3LM-N: Sum of two peaks at 20.0 to 20.6 minutes and 20.6 to 21.5 minutes 4-HBA: 21.7 to 22.4 minutes Measurement conditions: Differential refractive index detection It was analyzed with a detector (RI detector).

(Preparation Example 4)
In the same manner as in Preparation Example 3, except that 60.00 g of the starting polymer 2 (0.312 mol in terms of MA calculated from the charged amount of the starting polymer 2) was used instead of the starting polymer 1, the MA unit of the starting polymer 2 was , a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound, and a polymer P4 obtained by ring-opening with water (polymer solution P4) was prepared.

The obtained polymer solution P4 was analyzed by gel permeation chromatography under the same conditions as in Preparation Example 3, and the polymer P4 contained in the solution, the free polyfunctional (meth) acrylic compound and the free monofunctional (meth) acrylic The amount of compound was measured, as well as the weight average molecular weight and polydispersity of polymer P4. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P4 in the gel permeation chromatography (GPC) chart of the resin mixture.

(Preparation Example 5)
In the same manner as in Preparation Example 4 except that 116.24 g of A-TMM-3LM-N was used, the MA unit of the starting polymer 2 was replaced with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound and water. A resin mixture (polymer solution P5) containing polymer P5 obtained by ring-opening was prepared.

The obtained polymer solution P5 was analyzed by gel permeation chromatography under the same conditions as in Preparation Example 3, and the polymer P5 contained in the solution, the free polyfunctional (meth) acrylic compound and the free monofunctional (meth) acrylic The amount of compound was determined, as well as the weight average molecular weight and polydispersity of polymer P5. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P5 in the gel permeation chromatography (GPC) chart of the resin mixture.

(Preparation Example 6)
Raw materials were prepared in the same manner as in Preparation Example 1 except that 10.00 g of raw polymer 4 (calculated from the composition ratio calculated from GC measurement of raw polymer 4, 0.034 mol in terms of MA) was used instead of raw polymer 1. Polymer P6 was prepared by ring-opening the MA unit of polymer 4 with a monofunctional (meth)acrylic compound.
GPC measurements were performed on the resulting polymer P6 to determine the weight average molecular weight and polydispersity of polymer P6. Table 2 shows the results.
Further, disappearance of the peak of the monofunctional (meth)acrylic compound used was confirmed by GPC measurement of the polymer P6. Thereby, it was confirmed that the obtained polymer P6 contained no unreacted monofunctional (meth)acrylic compound.
Further, by ¹³ C-NMR measurement, it was confirmed that polymer P6 has a structure in which structural units derived from maleic anhydride are ring-opened with 4-HBA.

(Preparation Example 7)
Raw materials were prepared in the same manner as in Preparation Example 3, except that 60.00 g of raw polymer 3 (calculated from the composition ratio calculated from GC measurement of raw polymer 3, 0.220 mol in terms of MA) was used instead of raw polymer 1. A resin mixture (polymer solution P7) containing polymer P7 obtained by ring-opening the MA unit of polymer 3 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound, and water was prepared.
The obtained polymer solution P7 was analyzed by gel permeation chromatography under the same conditions as in Preparation Example 3, and the polymer P7 contained in the polymer solution P7, the free polyfunctional (meth) acrylic compound and the free monofunctional (meth) ) the amount of acrylic compound and the weight average molecular weight and polydispersity of polymer P11 were determined. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P7 in the gel permeation chromatography (GPC) chart of the resin mixture.

(Preparation Example 8)
A raw material was prepared in the same manner as in Preparation Example 2 except that 60.00 g of raw polymer 4 (0.204 mol in terms of MA calculated from the composition ratio calculated from GC measurement of raw polymer 4) was used instead of raw polymer 1. A polymer P8 was prepared by ring-opening the MA unit of the polymer 4 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound and water.
GPC measurements were performed on the resulting polymer P8 to determine the weight average molecular weight and polydispersity of polymer P8. Table 2 shows the results.
Further, disappearance of the peaks of the polyfunctional (meth)acrylic compound and the monofunctional (meth)acrylic compound used was confirmed by GPC measurement of the polymer P8. Thus, it was confirmed that the obtained polymer P8 contained neither unreacted polyfunctional (meth)acrylic compound nor monofunctional (meth)acrylic compound.
Further, by ¹³ C-NMR measurement, it was confirmed that polymer P8 had a structure in which structural units derived from maleic anhydride were ring-opened with A-TMM-3LM-N, 4-HBA and water.

(Preparation Example 9)
Raw materials were prepared in the same manner as in Preparation Example 4, except that 60.00 g of raw polymer 4 (calculated from the composition ratio calculated from GC measurement of raw polymer 4, 0.204 mol in terms of MA) was used instead of raw polymer 2. A resin mixture (polymer solution P9) containing polymer P9 obtained by ring-opening the MA unit of polymer 4 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound, and water was prepared.
The obtained polymer solution P9 was analyzed by gel permeation chromatography under the same conditions as in Preparation Example 3, and the polymer P9 contained in the solution, the free polyfunctional (meth) acrylic compound and the free monofunctional (meth) acrylic The amount of compound was determined, as well as the weight average molecular weight and polydispersity of polymer P9. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P9 in the gel permeation chromatography (GPC) chart of the resin mixture.

(Preparation Example 10)
A raw material was prepared in the same manner as in Preparation Example 5 except that 60.00 g of raw polymer 4 (0.204 mol in terms of MA calculated from the composition ratio calculated from GC measurement of raw polymer 4) was used instead of raw polymer 2. A resin mixture (polymer solution P10) containing polymer P10 obtained by ring-opening the MA unit of polymer 4 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound, and water was prepared.
The obtained polymer solution P10 was analyzed by gel permeation chromatography under the same conditions as in Preparation Example 5, and the polymer P10 contained in the solution, the free polyfunctional (meth) acrylic compound and the free monofunctional (meth) acrylic The amount of compound was measured, as well as the weight average molecular weight and polydispersity of polymer P10. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P10 in the gel permeation chromatography (GPC) chart of the resin mixture.

(Preparation Example 11)
A raw material was prepared in the same manner as in Preparation Example 7 except that 60.00 g of raw polymer 5 (calculated from the composition ratio calculated from GC measurement of raw polymer 5, 0.239 mol in terms of MA) was used instead of raw polymer 3. A resin mixture (polymer solution P11) containing polymer P11 obtained by ring-opening the MA unit of polymer 5 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound and water was prepared.
The obtained polymer solution P11 was analyzed by gel permeation chromatography under the same conditions as in Preparation Example 3, and the polymer P11 contained in the solution, the free polyfunctional (meth) acrylic compound and the free monofunctional (meth) acrylic The amount of compound was measured, as well as the weight average molecular weight and polydispersity of polymer P11. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P11 in the gel permeation chromatography (GPC) chart of the resin mixture.

(Preparation Example 12)
Raw materials were prepared in the same manner as in Preparation Example 8 except that 60.00 g of raw polymer 5 (0.239 mol in terms of MA calculated from the composition ratio calculated from GC measurement of raw polymer 5) was used instead of raw polymer 4. A polymer P12 was prepared by ring-opening the MA unit of the polymer 5 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound and water.
GPC measurements were performed on the resulting polymer P12 to determine the weight average molecular weight and polydispersity of polymer P12. Table 2 shows the results.
Further, disappearance of the peaks of the polyfunctional (meth)acrylic compound and the monofunctional (meth)acrylic compound used was confirmed by GPC measurement of the polymer P12. Thus, it was confirmed that the obtained polymer P8 contained neither unreacted polyfunctional (meth)acrylic compound nor monofunctional (meth)acrylic compound.
¹³ C-NMR measurement confirmed that the polymer P12 had a structure in which structural units derived from maleic anhydride were ring-opened with A-TMM-3LM-N, 4-HBA and water.

(Preparation Example 13)
Raw materials were prepared in the same manner as in Preparation Example 7, except that 60.00 g of raw polymer 6 (calculated from the composition ratio calculated from GC measurement of raw polymer 6, 0.230 mol in terms of MA) was used instead of raw polymer 3. A resin mixture (polymer solution P13) containing polymer P13 obtained by ring-opening the MA unit of polymer 6 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound and water was prepared.
The obtained polymer solution P13 was analyzed by gel permeation chromatography under the same conditions as in Preparation Example 3, and the polymer P13 contained in the solution, the free polyfunctional (meth) acrylic compound and the free monofunctional (meth) acrylic The amount of compound was measured, as well as the weight average molecular weight and polydispersity of polymer P13. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P13 in the gel permeation chromatography (GPC) chart of the resin mixture.

(Preparation Example 14)
Raw materials were prepared in the same manner as in Preparation Example 8, except that 60.00 g of raw polymer 6 (calculated from the composition ratio calculated from GC measurement of raw polymer 6, 0.230 mol in terms of MA) was used instead of raw polymer 4. A polymer P14 was prepared by ring-opening the MA unit of the polymer 6 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound and water.
GPC measurements were performed on the resulting polymer P14 to determine the weight average molecular weight and polydispersity of polymer P14. Table 2 shows the results.
Further, disappearance of the peaks of the polyfunctional (meth)acrylic compound and the monofunctional (meth)acrylic compound used was confirmed by GPC measurement of the polymer P14. As a result, it was confirmed that the obtained polymer P8 contained neither unreacted polyfunctional (meth)acrylic compound nor monofunctional (meth)acrylic compound.
¹³ C-NMR measurement confirmed that polymer P14 had a structure in which structural units derived from maleic anhydride were ring-opened with A-TMM-3LM-N, 4-HBA and water.

(Preparation Example 15)
Raw material was prepared in the same manner as in Preparation Example 7 except that 60.00 g of raw material polymer 7 (calculated from the composition ratio calculated from GC measurement of raw material polymer 7, 0.213 mol in terms of MA) was used instead of raw material polymer 3. A resin mixture (polymer solution P15) containing polymer P15 obtained by ring-opening the MA unit of polymer 7 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound and water was prepared.
The resulting polymer solution P15 was analyzed by gel permeation chromatography under the same conditions as in Preparation Example 3, and the polymer P15 contained in the solution, the free polyfunctional (meth) acrylic compound and the free monofunctional (meth) acrylic The amount of compound was measured, as well as the weight average molecular weight and polydispersity of polymer P15. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P15 in the gel permeation chromatography (GPC) chart of the resin mixture.

(Preparation Example 16)
Raw materials were prepared in the same manner as in Preparation Example 8, except that 60.00 g of raw polymer 7 (calculated from the composition ratio calculated from GC measurement of raw polymer 7, 0.213 mol in terms of MA) was used instead of raw polymer 4. A polymer P16 was prepared by ring-opening the MA unit of the polymer 7 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound and water.
GPC measurements were performed on the resulting polymer P16 to determine the weight average molecular weight and polydispersity of polymer P14. Table 2 shows the results.
Further, disappearance of the peaks of the polyfunctional (meth)acrylic compound and the monofunctional (meth)acrylic compound used was confirmed by GPC measurement of the polymer P16. As a result, it was confirmed that the obtained polymer P8 contained neither unreacted polyfunctional (meth)acrylic compound nor monofunctional (meth)acrylic compound.
¹³ C-NMR measurement confirmed that the polymer P16 had a structure in which structural units derived from maleic anhydride were ring-opened with A-TMM-3LM-N, 4-HBA and water.

(Preparation Example 17)
A raw material was prepared in the same manner as in Preparation Example 7, except that 60.00 g of raw polymer 8 (calculated from the composition ratio calculated from GC measurement of raw polymer 8, 0.246 mol in terms of MA) was used instead of raw polymer 3. A resin mixture (polymer solution P17) containing polymer P17 obtained by ring-opening the MA unit of polymer 8 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound and water was prepared.
The obtained polymer solution P17 was analyzed by gel permeation chromatography under the same conditions as in Preparation Example 3, and the polymer P17 contained in the solution, the free polyfunctional (meth) acrylic compound and the free monofunctional (meth) acrylic The amount of compound was determined, as well as the weight average molecular weight and polydispersity of polymer P17. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P17 in the gel permeation chromatography (GPC) chart of the resin mixture.

(Preparation Example 18)
A raw material was prepared in the same manner as in Preparation Example 8 except that 60.00 g of raw polymer 8 (calculated from the composition ratio calculated from GC measurement of raw polymer 8, 0.246 mol in terms of MA) was used instead of raw polymer 4. A polymer P18 was prepared by ring-opening the MA unit of the polymer 8 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound and water.
GPC measurements were performed on the resulting polymer P18 to determine the weight average molecular weight and polydispersity of polymer P18. Table 2 shows the results.
Further, disappearance of the peaks of the polyfunctional (meth)acrylic compound and the monofunctional (meth)acrylic compound used was confirmed by GPC measurement of the polymer P18. Thus, it was confirmed that the obtained polymer P8 contained neither unreacted polyfunctional (meth)acrylic compound nor monofunctional (meth)acrylic compound.
¹³ C-NMR measurement confirmed that the polymer P18 had a structure in which structural units derived from maleic anhydride were ring-opened with A-TMM-3LM-N, 4-HBA and water.

(Preparation Example 19)
A resin mixture (polymer solution P19) containing polymer P19 obtained by ring-opening the MA unit of starting polymer 3 with a trifunctional (meth)acrylic compound, a monofunctional (meth)acrylic compound, and water was prepared. Details will be described below.
First, 99.93 g of MEK was added to 60.00 g of raw material polymer 3 (0.220 mol in terms of MA calculated from the charged amount of raw material polymer 3) to prepare a solution. Next, 77.49 g of A-TMM-3LM-N was added to this solution, and then 18.00 g (0.178 mol) of triethylamine was added and reacted at a temperature of 70° C. for 2 hours. After that, 56.27 g (0.390 mol) of 4-HBA was added and reacted at a temperature of 70° C. for 4 hours to prepare a reaction solution.
Then, 3.00 g (0.167 mol) of water was added to the reaction solution without post-treatment, and the mixture was reacted at 70° C. for 2 hours.
The resulting reaction solution was diluted with MEK and treated with an aqueous formic acid solution and an aqueous citric acid solution to remove the aqueous phase from the reaction solution. Furthermore, liquid-liquid extraction and then solvent replacement were performed in the following procedure.
- Liquid-liquid extraction: The reaction solution was diluted with MEK, then a water/methanol mixed solvent was added and treated to remove the aqueous phase from the reaction solution, and then the same operation was performed once more.
- Solvent replacement: The solvent was removed from the resulting reaction mixture at 50°C under reduced pressure using a rotary evaporator. After confirming that the solid content concentration of the polymer solution reached 27±2% by mass as measured by a heat drying moisture meter, the solvent removal operation was discontinued. After that, PGMEA was added so that the solid content concentration was 18% by mass, and mixed until uniform. The solvent is removed at 50° C. under reduced pressure in the same manner, and after adjusting the solid content concentration to 27±2% by mass as measured by a heat drying moisture meter, PGMEA is added so that the solid content concentration becomes 18% by mass. and mixing until uniform was repeated two more times. Thereafter, the solvent was removed or PGMEA was added so that the solid content concentration became 30±3% by mass, and the mixture was stirred until uniform. The above operation removes the solvent used for the reaction and replaces the solvent with PGMEA.

As described above, the structural units derived from maleic anhydride in the starting polymer 3 are A-TMM-3LM-N, the polymer P19 ring-opened with 4-HBA and water, and the residual (free) A-TMM-3LM-N and residual (free) 4-HBA (polymer solution P19) was obtained.

The obtained polymer solution P19 was analyzed by gel permeation chromatography under the same conditions as in Preparation Example 3, and the polymer P19 contained in the solution, the free polyfunctional (meth) acrylic compound and the free monofunctional (meth) acrylic The amount of compound was determined, as well as the weight average molecular weight and polydispersity of polymer P19. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P19 in the gel permeation chromatography (GPC) chart of the resin mixture.

(Preparation Example 20)
A resin mixture (polymer solution P20) containing polymer P20 obtained by ring-opening the MA unit of raw material polymer 6 with a trifunctional (meth)acrylic compound and water was prepared. Details will be described below.
First, 99.93 g of MEK was added to 60.00 g of raw polymer 6 (0.230 mol in terms of MA calculated from the charged amount of raw polymer 4) to prepare a solution. Next, 77.49 g of A-TMM-3LM-N was added to this solution, and then 18.00 g (0.178 mol) of triethylamine was added and reacted at a temperature of 70° C. for 2 hours.
Then, 3.00 g (0.167 mol) of water was added to the reaction solution without post-treatment, and the mixture was reacted at 70° C. for 2 hours.
The resulting reaction solution was diluted with MEK and treated with an aqueous formic acid solution and an aqueous citric acid solution to remove the aqueous phase from the reaction solution. Furthermore, the same liquid-liquid extraction and solvent replacement as in Preparation Example 3 were performed.
Thus, a resin mixture (polymer solution P20) containing polymer P20 obtained by ring-opening the MA unit of raw material polymer 6 with a trifunctional (meth)acrylic compound and water was prepared.

The resulting polymer solution P30 was analyzed by gel permeation chromatography under the same conditions as in Preparation Example 3 to determine the amount of polymer P20 and free polyfunctional (meth)acrylic compound contained in the solution, and the amount of polymer P20. Weight average molecular weight and polydispersity were measured. Table 2 shows the results. The amount of the free (meth)acrylic compound is shown as the ratio (%) of the peak area of the free (meth)acrylic compound to the peak area of the polymer P20 in the gel permeation chromatography (GPC) chart of the resin mixture.

(Evaluation of the physical properties)
The acid value and double bond equivalent of each polymer P prepared in Preparation Examples 6, 8, 12, 14, 16 and 18 were measured by the methods shown below.

(acid number)
The acid value of the polymer was measured by the following method.
About 50 mg of polymer and about 5 mg of dimethyl terephthalate as an internal standard were weighed and dissolved in DMSO-d6. This solution was subjected to ¹ H-NMR measurement using a nuclear magnetic resonance spectrometer JNM-AL300 (manufactured by JEOL). Based on the integrated value of the 4H peak (around 8.1 ppm) of the phenyl group of the dimethyl terephthalate internal standard measured by ¹ H-NMR, the H peak (around 12.4 ppm) of the carboxy group (—COOH) of the polymer. Calculate the amount of carboxyl groups from the integrated value of . Then, the acid value (mgKOH/g) can be calculated from the amount. A larger acid value indicates a larger amount of carboxy groups per unit mass of the polymer.
Table 1 shows the results. When the acid value is 50 gKOH/g or more, it can be considered that the carboxy groups necessary for the polymer to have sufficient developability are present in the polymer.

(double bond equivalent)
The double bond equivalent weight of the polymer was measured by the following method.
¹ H-NMR was measured in the same manner as the acid value measurement method described above. The amount of acryloyl groups in the polymer was determined from the integral ratio of the signal (5.6-5.8 ppm, 3H) derived from the acryloyl group in the spectrum chart obtained and the signal (8.1 ppm, 4H) of the phenyl group of the internal standard substance. (mol/g), and the double bond equivalent (g/mol) was calculated from the calculated acryloyl group amount (mol/g) in the polymer.
Table 2 shows the results. A smaller double bond equivalent value indicates a higher amount of C═C double bonds per unit mass of the polymer.

(Examples 1 to 15, Comparative Examples 1 to 5)
In each example and comparative example, a resin composition was produced and evaluated for the following items.
<Evaluation>
[Alkaline Dissolution Rate of Resin Composition]
Polymers P1, P2, P6, P8, P12, P14, P16, and P18 obtained in Preparation Examples 1, 2, 6, 8, 12, 14, 16, and 18 are dissolved in propylene glycol monomethyl ether acetate (PGMEA). Resin compositions 1, 2, 6, and 8 having a solid content concentration of 30% by mass were produced.
Then, the above resin composition 1, 2, 6, 8, 12, 14, 16, 18 or preparation examples 3 to 5, 7, 9, 10, 11, 13, 15, 17, 19, 20 obtained on the wafer Resin compositions 3 to 5, 7, 9, 10, 11, 13, 15, 17, 19 consisting of polymer solutions P3 to P5, P7, P9, P10, P11, P13, P15, P17, P19, P20, 20 was spin-coated, the PGMEA was dried, and pre-baked at a temperature of 100° C. for 2 minutes to prepare a resin film with a film thickness of about 2 μm.
This resin film was immersed together with the wafer in a 2% sodium carbonate aqueous solution at a temperature of 23° C., and the dissolution rate of the resin film was measured.
The dissolution rate was calculated by visually observing the immersed wafer, measuring the time until the resin film dissolved and the interference pattern disappeared, and dividing the film thickness by that time. Table 3 shows the results. If the alkali dissolution rate is 40 nm/s or more, it can be used as a photosensitive material without any problem. 1000 nm/s or more can be considered particularly good.

[Softening point of raw material polymer]
The softening points of the starting polymers 1 to 8 were measured by the following method.
First, 0.1 to 1.0 mg of the polymer to be measured (raw polymer 1 to 8) is placed in an aluminum sample pan, and under a nitrogen atmosphere, a differential thermal analysis device (manufactured by Hitachi High-Tech Science Co., Ltd., "EXSTAR TMA/ SS6100") was used to measure the softening point. The measurement mode was compression, the load was 30 mN, and the temperature was raised in the range of 30° C. to 200° C. at a temperature elevation rate of 3° C./min. When the sample softens due to heating, the sample deforms and is detected as displacement (μm). It is an extension of the linear portion without displacement on the low temperature side, or a tangent to the portion with the lowest displacement speed and a tangent to the portion with the highest displacement speed. was taken as the softening point. As an example, a TMA chart of Raw Polymer 4 is shown in FIG. Table 1 shows the softening point measurement results.
If the softening point of the raw material polymer is 130°C or lower, it can be said that the softening point is low, if it is 120°C or lower, it can be said that it is lower, if it is 100°C or lower, it can be said that it is particularly low, and if it is 90°C or lower, it can be said that it is particularly low. can be said to be lower than

[Melting point of raw polymer]
The melting points of the starting polymers 1 to 8 were measured by the following method.
First, 1 to 2 mg of the polymer to be measured (raw polymers 1 to 8) is placed in an aluminum sample pan, and a differential thermal analyzer (manufactured by Hitachi High-Tech Science Co., Ltd., "STA7200RV") is used in a nitrogen atmosphere. The temperature was raised from 30° C. at a rate of 10° C./min while observing the image. The temperature at which the sample starts to melt was visually confirmed and defined as the melting point.
If the melting point of the raw material polymer is 160°C or lower, it can be said that the melting point is low; if it is 140°C or lower, it can be said to be lower; if it is 120°C or lower, it can be said to be particularly low; can be said to be lower than Table 1 shows the results.

[Softening point of polymer P]
The softening points of the polymers P1, P2, P6, P8, P12, P14, P16 and P18 obtained in Preparation Examples 1, 2, 6, 8, 12, 14, 16 and 18 were measured by the following method.
First, 0.1 to 1.0 mg of the polymer to be measured (polymer P1, P2, P6, P8, P12, P14, P16, P18) was placed in an aluminum sample pan, and under a nitrogen atmosphere, a differential thermal analyzer (stock The softening point was measured using "EXSTAR TMA/SS6100" manufactured by Hitachi High-Tech Science Co., Ltd. The measurement mode was compression, the load was 30 mN, and the temperature was raised from 30°C to 200°C at a rate of 3°C/min. When the sample softens due to heating, the sample deforms and is detected as a displacement (μm). The extension of the straight portion without displacement on the low temperature side, or the tangent to the portion with the lowest displacement speed and the tangent to the portion with the highest displacement speed. was taken as the softening point. Table 2 shows the results.
If the softening point of the polymer P is 110°C or lower, it can be said that the softening point is low; if it is 90°C or lower, it can be said that it is lower; can be said to be lower than

[Melting point of polymer P]
The melting points of polymers P1, P2, P6, P8, P12, P14, P16 and P18 obtained in Preparation Examples 1, 2, 6, 8, 12, 14, 16 and 18 were measured by the following method.
First, 1 to 2 mg of the polymer to be measured (polymer P1, P2, P6, P8, P12, P14, P16, P18) was placed in an aluminum sample pan, and under a nitrogen atmosphere, a differential thermal analyzer (Hitachi High-Technologies Corporation The temperature was raised from 30° C. at a temperature elevation rate of 10° C./min while observing the image using “STA7200RV” manufactured by Co., Ltd.). The temperature at which the sample starts to melt was visually confirmed and defined as the melting point. Table 2 shows the results.
If the melting point of the polymer P is 140°C or lower, it can be said that the melting point is low; if it is 130°C or lower, it can be said to be lower; can be said to be lower than

[Softening point of cured product of photosensitive resin composition]
Polymers P1, P2, P6, P8, P12, P14, P16, P18 obtained in Preparation Examples 1, 2, 6, 8, 12, 14, 16, 18 or Preparation Examples 3-5, 7, 9, 10 , 11, 13, 15, 17, 19, 20 Polymer solutions P3 to P5, P7, P9, P10, P11, P13, P15, P17, P19, softening point of photosensitive resin composition prepared from P20 was measured by the following method.
First, a photosensitive resin composition was obtained by dissolving the following components in propylene glycol monomethyl ether acetate (PGMEA) so that the total solid concentration was 30% by mass.
Polymers P1, P2, P6, P8, P12, P14, P16, P18 (Polymers P1, P2, P6, P8, P12, P14 of Preparation Examples 1, 2, 6, 8, 12, 14, 16, 18, respectively) , P16, P18) or resin mixtures 3-5, 7, 9, 10, 11, 13, 15, 17, 19, 20 (respectively Preparation Examples 3-5, 7, 9, 10, 11, 13, 15, 17, 19, 20 polymer solutions P3-P5, P7, P9, P10, P11, P13, P15, P17, P19, P20): 100 parts by weight (where resin mixtures 3-5, 7, 9, 10, For 11, 13, 15, 17, 19, 20, the total of solid content (polymers P3 to P5, P7, P9, P10, P11, P13, P15, P17, P19, P20) and polyfunctional (meth) acrylic compounds Amount) was weighed to 100 parts by mass. )
- Photopolymerization initiator (manufactured by BASF, Irgacure OXE01): 5 parts by mass The obtained photosensitive resin composition was coated with a Teflon adhesive tape (Nitoflon adhesive tape, No. 903UL (thickness 0.08 mm, width 25 mm, length 10 mm), Nitto Denko Co., Ltd.) was pasted without gaps, and then poured into a container having dimensions of 2 cm x 2 cm and a height of 5 mm, followed by vacuum drying at 40°C for 16 hours to remove the solvent. Thereafter, g+h+i line exposure was performed using a g+h+i line mask aligner (PLA-600F) manufactured by Canon Inc. at an exposure amount of 100 mJ/cm ² . After exposure, the cured product was peeled off from the Teflon adhesive tape to obtain a cured product of the photosensitive resin composition.
0.1 to 1.0 mg of the cured product of the photosensitive resin composition to be measured is placed in an aluminum sample pan and subjected to a differential thermal analysis device (manufactured by Hitachi High-Tech Science Co., Ltd., "EXSTAR TMA / SS6100") under a nitrogen atmosphere. ) was used to measure the softening point. The measurement mode was compression, the load was 30 mN, and the temperature was raised in the range of 30° C. to 200° C. at a temperature elevation rate of 1° C./min. When the sample softens due to heating, the sample deforms and is detected as a displacement (μm). The extension of the straight portion without displacement on the low temperature side, or the tangent to the portion with the lowest displacement speed and the tangent to the portion with the highest displacement speed. was taken as the softening point.
Table 3 shows the evaluation results of the softening point of the cured product of the photosensitive resin composition evaluated according to the following criteria.
◯: Softening point lower than 100° C. ×: Softening point 100° C. or higher If the softening point of the cured product of the photosensitive resin composition is 100° C. or lower, it can be said that the softening point is low and the pattern formability is good.

[Sensitivity evaluation 1 of photosensitive resin composition (exposure amount at which residual film rate is 90% or more)]
First, a photosensitive resin composition was obtained by dissolving the following components in propylene glycol monomethyl ether acetate (PGMEA) so that the total solid concentration was 30% by mass.
Polymers P1, P2, P6, P8, P12, P14, P16, P18 (polymers P of Preparation Examples 1, 2, 6, 8, 12, 14, 16, 18, respectively) or resin compositions 3-5, 7 , 9, 10, 11, 13, 15, 17, 19, 20 (polymer solutions P3-P5, P7 of Preparation Examples 3-5, 7, 9, 10, 11, 13, 15, 17, 19, 20, respectively) , P9, P10, P11, P13, P15, P17, P19, P20): 100 parts by mass (here, for resin compositions 3 to 5, 7, 9, 10, 11, 13, 15, 17, 19, 20 The total amount of solids (polymers P3 to P5, P7, P9, P10, P11, P13, P15, P17, P19, P20) and polyfunctional (meth)acrylic compound) was weighed to 100 parts by mass. . )
- Polyfunctional acrylate (dipentaerythritol hexaacrylate, manufactured by Shin-Nakamura Chemical Co., Ltd., A-DPH): 50 parts by mass - Photopolymerization initiator (manufactured by BASF, Irgacure OXE01): 5 parts by mass - Adhesion aid (Shin-Etsu Chemical Kogyo Co., Ltd., KBM-403): 1 part by mass Surfactant (DIC Corporation, F-556): 0.5 parts by mass

The resulting photosensitive resin composition was spin-coated on a 3-inch silicon wafer treated with HMDS (Hexamethyldisilazane), and baked on a hot plate at 100° C. for 120 seconds to form a film with a thickness of about 3.0 μm (±0.3 μm). A thin film A was obtained.
This thin film A was exposed to g+h+i rays at an exposure amount of 100 mJ/cm ² using a g+h+i ray mask aligner (PLA-501F) manufactured by Canon Inc. through a photomask having a gradation with a light shielding rate of 1 to 100%.
After the exposure, the thin film was developed in a 2.0% by mass sodium carbonate aqueous solution at 23° C. for 60 seconds (the whole wafer was immersed) to obtain a thin film B exposed and developed at each exposure amount of 1 to 100 mJ/cm ² . .
From the film thicknesses of thin film A and thin film B obtained by the above method, the residual film ratio was calculated from the following formula.
Remaining film ratio (%) = (film thickness of thin film B/film thickness of thin film A at each exposure dose) x 100
Then, the exposure amount at which the residual film rate becomes 90% or more was defined as the sensitivity of each photosensitive resin composition. Table 3 shows the results. If the exposure amount at which the residual film rate becomes 90% or more is 25 mJ/cm ² or less, it can be used as a photosensitive composition without problems, and if it is 20 mJ/cm ² or less, the sensitivity is considered to be good. 15 mJ/cm ² or less can be considered better, and 12 mJ/cm ² or less can be considered particularly good.

[Sensitivity evaluation 2 of photosensitive resin composition (remaining film ratio after exposure with low exposure dose)]
(Remaining film rate at an exposure dose of 5 mJ/cm ² )
The photosensitive resin composition prepared in Sensitivity Evaluation 1 above was spin-coated on a 3-inch silicon wafer treated with HMDS (Hexamethyldisilazane) and baked on a hot plate at 100° C. for 120 seconds to obtain a thickness of 3.0 μm (± A thin film A of 0.3 μm) was obtained.
This thin film A was exposed to g+h+i rays at an exposure amount of 5 mJ/cm ² using a g+h+i ray mask aligner (PLA-501F) manufactured by Canon Inc. through a photomask having a gradation with a light shielding rate of 1 to 100%.
After the exposure, thin film B was obtained by developing the thin film in a 2.0% by mass sodium carbonate aqueous solution at 23° C. for 60 seconds (immersing the wafer together).
From the film thicknesses of thin film A and thin film B obtained by the above method, the residual film ratio was calculated from the following formula.
Remaining film ratio (%) = (film thickness of thin film B/film thickness of thin film A at each exposure dose) x 100
Table 3 shows the results. It can be considered that the higher the residual film ratio at an exposure dose of 5 mJ/cm ² is, the better the sensitivity is because the curing is performed at a lower exposure dose.

(Remaining film rate at an exposure dose of 10 mJ/cm ² )
The photosensitive resin composition prepared in Sensitivity Evaluation 1 above was spin-coated on a 3-inch silicon wafer treated with HMDS (Hexamethyldisilazane) and baked on a hot plate at 100° C. for 120 seconds to obtain a thickness of 3.0 μm (± A thin film A of 0.3 μm) was obtained.
This thin film A was exposed to g+h+i rays at an exposure amount of 10 mJ/cm ² using a g+h+i ray mask aligner (PLA-501F) manufactured by Canon Inc. through a photomask having a gradation with a light shielding rate of 1 to 100%.
After the exposure, thin film B was obtained by developing the thin film in a 2.0% by mass sodium carbonate aqueous solution at 23° C. for 60 seconds (immersing the wafer together).
From the film thicknesses of thin film A and thin film B obtained by the above method, the residual film ratio was calculated from the following formula.
Remaining film ratio (%) = (film thickness of thin film B/film thickness of thin film A at each exposure dose) x 100
Table 3 shows the results. It can be considered that the higher the residual film ratio at an exposure dose of 10 mJ/cm ² is, the better the sensitivity is because the film is cured at a lower exposure dose.

[Alkaline dissolution rate of photosensitive resin composition (2.0% by mass sodium carbonate aqueous solution)]
The photosensitive resin composition prepared in Sensitivity Evaluation 1 was spin-coated on a wafer, the PGMEA was dried, and pre-baked at 100° C. for 2 minutes to prepare a resin film having a thickness of about 2 μm.
This resin film was immersed together with the wafer in a 2% sodium carbonate aqueous solution at a temperature of 23° C., and the dissolution rate of the resin film was measured.
The dissolution rate was calculated by visually observing the immersed wafer, measuring the time until the resin film dissolved and the interference pattern disappeared, and dividing the film thickness by that time. Table 3 shows the results. If the alkali dissolution rate is 100 nm/s or more, it can be used as a photosensitive material without any problem. 700 nm/s or more can be considered particularly good.

[Yellow Index]
The photosensitive resin composition prepared in Sensitivity Evaluation 1 was spin-coated on Eagle XG glass (manufactured by Corning, thickness 0.5 mm) and baked on a hot plate at 100° C. for 120 seconds. A thin film of 0 μm thickness (±0.1 μm) was obtained.
This thin film was exposed to g+h+i rays at an exposure dose of 100 mJ/cm ² using a g+h+i ray mask aligner (PLA-600F) manufactured by Canon Inc.
After the exposure, the thin film was developed in a 2.0% by mass sodium carbonate aqueous solution at 23° C. for 60 seconds (the whole wafer was immersed) to obtain an exposed and developed thin film with an exposure amount of 100 mJ/cm ² .
The thin film was heat treated at 230° C. for 30 minutes in air. After cooling the thin film at room temperature under air, the thin film was again heat-treated at 230° C. for 30 minutes under air. The same operation was repeated, and the heat treatment was performed three times in total for 30 minutes in the air.
The yellow index (YI) of the thin film obtained by the above method was measured three times at different measurement points using a color difference meter CR-5 (manufactured by Konica Minolta), and the average value was taken as the YI value. The measurement type was transmission measurement, and uncoated Eagle XG glass (manufactured by Corning, thickness 0.5 mm) was used for 100% calibration. Table 3 shows the results. If the yellow index is 1.10 or less, it can be considered that the heat discoloration resistance is good. It can be considered particularly good if:

Table 3 shows the results of developability evaluation and sensitivity evaluation.

By comparing raw polymers 3 to 8 with raw polymers 1 and 2, raw polymers 3 to 8 containing structural units derived from unsaturated dicarboxylic acid dialkyl esters have softening points and melting points compared to raw polymers 1 and 2. had declined significantly.
Polymers P6, P8, P12, P14, P16, and P18 containing structural units derived from unsaturated dicarboxylic acid dialkyl esters have a softening point of 110° C. or lower and a melting point of 140° C. or lower. had a point.
The cured products of the photosensitive resin compositions prepared from the polymers of Comparative Examples 2 to 5, which did not contain a structural unit derived from unsaturated dicarboxylic acid dialkyl ester, had softening points exceeding 100°C. On the other hand, the cured products of the photosensitive resin compositions prepared from the polymers of Examples 1 to 15 containing a structural unit derived from an unsaturated dicarboxylic acid dialkyl ester have a softening point of less than 100°C and are easily melted by heat during curing. , is expected to have good processability and patternability in photolithographic processing. In addition, the photosensitive resin compositions containing the polymers of Examples 1 to 15 had well-balanced alkali solubility, sensitivity and resistance to heat discoloration. The cured product of the photosensitive resin composition prepared from the polymer of Comparative Example 1 had a softening point of 100° C. or lower, but the sensitivity of the photosensitive resin composition was insufficient. Examples 2 to 15 photosensitive resin compositions containing a structural unit derived from an unsaturated dicarboxylic acid dialkyl ester and containing a polymer having a structure ring-opened with a polyfunctional (meth) acrylic compound had a residual film rate of 90. % or more was lower, and the sensitivity was particularly excellent.

<Production of color filter/spacer>
Colored photosensitive resin compositions were prepared by adding an appropriate amount of pigment dispersion NX-061 (manufactured by Dainichiseika Kogyo Co., Ltd., green) to the photosensitive resin compositions prepared in Examples 1 to 15.
A green color filter could be formed by forming a film of this on a substrate, and performing exposure, alkali development, and the like.
Further, by using NX-053 (blue), NX-032 (red), etc. manufactured by the same company as the pigment dispersion instead of NX-061, a blue or red color filter could be formed.

<Preparation of black matrix/black bank/black spacer>
A black photosensitive resin composition was prepared by further adding an appropriate amount of carbon black dispersion NX-595 (manufactured by Dainichi Seika Kogyo Co., Ltd.) to the photosensitive resin compositions prepared in Examples 1 to 15.
A black matrix/black bank/black spacer could be formed by forming a film of this on a substrate, and subjecting it to exposure, alkali development, and the like.

10 substrate 11 black matrix 12 color filter 13 protective film 14 transparent electrode layer

Claims (15)

a structural unit represented by the formula (NB);
a structural unit represented by the formula (AD);
at least one structural unit selected from structural units represented by formula (1) and structural units represented by formula (2);
A polymer comprising

In formula (NB), R ¹ , R ² , R ³ and R ⁴ are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, a ₁ is 0, 1 or 2,

In formula (AD), R ¹¹ and R ¹² are each independently a linear or branched alkyl group having 1 to 12 carbon atoms,

In formula (1), R ^p is a group having two or more (meth)acryloyl groups, R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms,

In formula (2), R ^s is a group having one (meth)acryloyl group, and R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms.
polymer. A polymer according to claim 1, wherein
further comprising a structural unit represented by formula (3),

A polymer in which R ²¹ and R ²² in formula (3) are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms. A polymer according to claim 1, wherein
further comprising a structural unit represented by the formula (MA),

A polymer in which R ²¹ and R ²² in formula (MA) are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms. A polymer according to claim 1, wherein
The polymer contains a structural unit represented by the formula (1),
R ^p in the formula (1) is at least one selected from the group represented by the formula (1b), the group represented by the formula (1c), and the group represented by the formula (1d). ,

In formula (1b),
k is 2 or 3;
R is a hydrogen atom or a methyl group, multiple R may be the same or different,
X ¹ is a single bond, an alkylene group having 1 to 6 carbon atoms or a group represented by -ZX- (where Z is -O- or -OCO- and X is an alkylene group having 1 to 6 carbon atoms ), and multiple X ¹ may be the same or different,
X ¹ ' is a single bond, an alkylene group having 1 to 6 carbon atoms or a group represented by -X'-Z'- (X' is an alkylene group having 1 to 6 carbon atoms, Z' is -O- or -COO-),
X ² is a (k+1)-valent organic group having 1 to 12 carbon atoms,

In formula (1c),
k, R, X ¹ and X ² are respectively synonymous with R, k, X ¹ and X ² in formula (1b); X ¹ may be the same or different,
X ³ is a single bond or a divalent organic group having 1 to 6 carbon atoms,
X ⁴ and X ⁵ are each independently a single bond or a divalent organic group having 1 to 6 carbon atoms,
X ⁶ is a divalent organic group having 1 to 6 carbon atoms,

In formula (1d),
n is an integer from 2 to 5,
R is independently a hydrogen atom or a methyl group;
polymer. A polymer according to claim 1, wherein
The polymer contains a structural unit represented by the formula (2),
R ^s in the formula (2) is a group represented by formula (2a),

In formula (2a), X ¹⁰ is a divalent organic group and R is a hydrogen atom or a methyl group.
polymer. A polymer according to claim 1, wherein
The polymer has a structure represented by formula (P2),

In formula (P2),
n is an integer from 1 to 6,
p, q, and r represent the molar content of structural units A, B, and C contained in each polymer chain in n [ ],
p, q, and r may be the same or different for each n number of polymer chains in [ ],
p + q + r = 1, p is 0 or more, q is 0 or more, r is 0 or more,
Let p ^t , q ^{t , and r t} be the ^molar contents of ^structural units A, B, and C contained in the polymer, respectively. large, q ^t is greater than 0, r ^t is greater than 0,
X is hydrogen or an organic group having 1 to 30 carbon atoms,
Y is a monovalent to hexavalent organic group having 1 to 30 carbon atoms derived from a monofunctional or bifunctional or higher thiol group-containing compound,
A represents a structural unit represented by the formula (NB),
B contains at least one structural unit selected from structural units represented by the formula (1) and structural units represented by the formula (2),
C represents a structural unit represented by the formula (AD),
A polymer in which a plurality of A's, B's, and C's may be the same or different. A polymer according to claim 1, wherein
A polymer having a weight average molecular weight of 3,000 or more and 15,000 or less. A polymer solution comprising a polymer according to any one of claims 1-7. A polymer solution according to claim 8,
A polymer solution further comprising a polyfunctional (meth)acrylic compound or a monofunctional (meth)acrylic compound, or a combination thereof. A polymer solution according to claim 8 or 9,
A polymer solution used to form color filters, black matrices, spacers, or barrier ribs. a polymer according to any one of claims 1 to 7;
and a photoradical polymerization initiator,
A photosensitive resin composition. A cured product formed from the photosensitive resin composition according to claim 11 . a structural unit represented by the formula (NB);
a structural unit represented by the formula (AD);
A polymer comprising a structural unit represented by the formula (MA),

In formula (NB), R ¹ , R ² , R ³ and R ⁴ are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, a ₁ is 0, 1 or 2,

In formula (MA), R ²¹ and R ²² are each independently a hydrogen atom or an organic group having 1 to 3 carbon atoms,

In formula (AD), R ¹¹ and R ¹² are each independently a linear or branched alkyl group having 1 to 12 carbon atoms;
polymer. 14. The polymer of claim 13,
The polymer has a structure represented by formula (P4),

In formula (P4),
n is an integer from 1 to 6,
p, q, and r represent the molar content of structural units A, B', and C contained in each polymer chain in n [ ],
p, q, and r may be the same or different for each n number of polymer chains in [ ],
p + q + r = 1, p is 0 or more, q is 0 or more, r is 0 or more,
Let p t , q t , and r ^t be the molar contents of structural units A, B′, and C contained in the polymer, respectively, ^then p ^{t +} q ^t +r ^t =1 and p ^t is 0 is greater than, q ^t is greater than 0, r ^t is greater than 0,
X is hydrogen or an organic group having 1 to 30 carbon atoms,
Y is a monovalent to hexavalent organic group having 1 to 30 carbon atoms derived from a monofunctional or bifunctional or higher thiol group-containing compound,
A represents a structural unit represented by the formula (NB),
B' represents a structural unit represented by the formula (MA),
C represents a structural unit represented by the formula (AD),
A polymer in which a plurality of A's, B''s, and C's may be the same or different. 15. A polymer according to any of claims 13 or 14,
A polymer having a softening point of 60° C. or higher and 130° C. or lower.

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