JP2022550053A - エネルギー回収を伴う非線形伝送線路高電圧パルスシャープニング - Google Patents
エネルギー回収を伴う非線形伝送線路高電圧パルスシャープニング Download PDFInfo
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/53—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/53—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback
- H03K3/57—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback the switching device being a semiconductor device
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K5/00—Manipulating of pulses not covered by one of the other main groups of this subclass
- H03K5/01—Shaping pulses
- H03K5/12—Shaping pulses by steepening leading or trailing edges
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H11/00—Networks using active elements
- H03H11/02—Multiple-port networks
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Electronic Switches (AREA)
Abstract
Description
115、200、300、400、500、600、1015 非線形伝送線路
120 出力
210A、210B、210C、210D 抵抗器
205A、205B、205C、205D 非線形半導体接合容量(NSJC)素子
215A、215B、215C、215D インダクタ
250A、205B、250C、250D 回路素子
1400 高電圧スイッチ
1410 スイッチ
1415 スナバダイオード
1416 スナバ抵抗
1420 スナバコンデンサ
1425 フリーホイーリングダイオード
1440 電源
1450 クローバダイオード
1460 高電圧電源
Claims (18)
- 100Vを超える電圧を提供する電源と、
前記電源と電気的に結合されたスイッチと、
前記スイッチと電気的に結合された非線形伝送線路と、
前記非線形伝送線路に電気的に結合されたアンテナと、
前記電源及び前記アンテナと電気的に結合されたダイオード及びインダクタを備えたエネルギー回収回路と、を備えた非線形伝送線路システム。 - 前記エネルギー回収回路は前記非線形伝送線路と並列である、請求項1に記載の非線形伝送線路システム。
- 前記アンテナはRFエネルギーを放射する、請求項1に記載の非線形伝送線路システム。
- 前記アンテナによって放射されない前記非線形伝送線路からの一部のエネルギーは前記電源に回収される、請求項1に記載の非線形伝送線路システム。
- 前記ダイオードは、前記アンテナ及び/又は前記非線形伝送線路から前記電源にエネルギーが流れることを可能にするように配置される、請求項1に記載の非線形伝送線路システム。
- 前記電源がエネルギー蓄積コンデンサを備えている、請求項1に記載の非線形伝送線路システム。
- 更に、前記アンテナ及び/又は前記非線形伝送線路に結合された高周波フィルタを備える、請求項1に記載の非線形伝送線路システム。
- 更に、第2の電源と第2のスイッチとを備え、前記エネルギー回収回路が前記第2の電源を充電する、請求項1に記載の非線形伝送線路システム。
- 前記スイッチは、約1kHzを超えるパルス繰り返し周波数でスイッチングする、請求項1に記載の非線形伝送線路システム。
- エネルギー蓄積コンデンサと、
約1kVを超える電圧の高電圧パルスを生成する前記エネルギー蓄積コンデンサと電気的に結合された高電圧スイッチと、
前記高電圧スイッチと電気的に結合された非線形伝送線路と、
前記非線形伝送線路と電気的に結合された負荷と、
ダイオードとインダクタを備え、前記エネルギー蓄積コンデンサ及び前記負荷と電気的に結合しているエネルギー回収回路と、を備えた非線形伝送線路システム。 - 前記高電圧スイッチはナノ秒パルサーを備えている、請求項10に記載の非線形伝送線路システム。
- 前記負荷はRFエネルギーを放射するアンテナである、請求項10に記載の非線形伝送線路システム。
- 前記高電圧スイッチは約1kHzより大きいパルス繰り返し周波数でスイッチングする、請求項10に記載の非線形伝送線路システム。
- 前記高電圧スイッチはナノ秒パルサーを備えている、請求項10に記載の非線形伝送線路システム。
- エネルギー蓄積コンデンサと、
約1kVを超える電圧のパルスを生成する前記エネルギー蓄積コンデンサと電気的に結合された高電圧スイッチと、
前記高電圧スイッチと電気的に結合され、前記パルスの上にRF信号を生成する非線形伝送線路と、
前記RF信号を伴う前記パルスからRFエネルギーを放射する前記非線形伝送線路と電気的に結合されたアンテナと、
前記電源及び前記アンテナと電気的に結合されたダイオード及びインダクタを備えたエネルギー回収回路と、を備えた非線形伝送線路システム。 - 前記非線形伝送線路は前記パルスの上にRF信号を生成する、請求項15に記載の非線形伝送線路システム。
- 前記高電圧スイッチは約1kHzより大きいパルス繰り返し周波数でスイッチングする、請求項15に記載の非線形伝送線路システム。
- 前記高電圧スイッチはナノ秒パルサーを備えている、請求項15に記載の非線形伝送線路システム。
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JP2024071070A JP2024099719A (ja) | 2019-09-25 | 2024-04-25 | エネルギー回収を伴う非線形伝送線路高電圧パルスシャープニング |
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US201962905504P | 2019-09-25 | 2019-09-25 | |
US62/905,504 | 2019-09-25 | ||
PCT/US2020/052817 WO2021062223A1 (en) | 2019-09-25 | 2020-09-25 | Nonlinear transmission line high voltage pulse sharpening with energy recovery |
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US (2) | US11108384B2 (ja) |
EP (1) | EP4035267A4 (ja) |
JP (2) | JP2022550053A (ja) |
KR (1) | KR20220070269A (ja) |
CN (1) | CN114762251A (ja) |
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US10555412B2 (en) | 2018-05-10 | 2020-02-04 | Applied Materials, Inc. | Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
US11476145B2 (en) | 2018-11-20 | 2022-10-18 | Applied Materials, Inc. | Automatic ESC bias compensation when using pulsed DC bias |
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US11508554B2 (en) | 2019-01-24 | 2022-11-22 | Applied Materials, Inc. | High voltage filter assembly |
US11462388B2 (en) | 2020-07-31 | 2022-10-04 | Applied Materials, Inc. | Plasma processing assembly using pulsed-voltage and radio-frequency power |
US11798790B2 (en) | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US11901157B2 (en) | 2020-11-16 | 2024-02-13 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
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US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11967483B2 (en) | 2021-06-02 | 2024-04-23 | Applied Materials, Inc. | Plasma excitation with ion energy control |
US20220399185A1 (en) | 2021-06-09 | 2022-12-15 | Applied Materials, Inc. | Plasma chamber and chamber component cleaning methods |
US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
US11776788B2 (en) | 2021-06-28 | 2023-10-03 | Applied Materials, Inc. | Pulsed voltage boost for substrate processing |
US11476090B1 (en) * | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
US12106938B2 (en) | 2021-09-14 | 2024-10-01 | Applied Materials, Inc. | Distortion current mitigation in a radio frequency plasma processing chamber |
US11694876B2 (en) | 2021-12-08 | 2023-07-04 | Applied Materials, Inc. | Apparatus and method for delivering a plurality of waveform signals during plasma processing |
US11972924B2 (en) | 2022-06-08 | 2024-04-30 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
US12111341B2 (en) | 2022-10-05 | 2024-10-08 | Applied Materials, Inc. | In-situ electric field detection method and apparatus |
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- 2020-09-25 CN CN202080081738.9A patent/CN114762251A/zh active Pending
- 2020-09-25 KR KR1020227013911A patent/KR20220070269A/ko active IP Right Grant
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JPH03174264A (ja) * | 1989-09-14 | 1991-07-29 | Hitachi Metals Ltd | 高電圧パルス発生装置およびこれを用いた静電集塵器 |
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US20180331655A1 (en) * | 2017-05-09 | 2018-11-15 | Eagle Harbor Technologies, Inc. | Efficient high power microwave generation using recirculating pulses |
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EP4035267A1 (en) | 2022-08-03 |
US20210091759A1 (en) | 2021-03-25 |
EP4035267A4 (en) | 2023-11-01 |
WO2021062223A1 (en) | 2021-04-01 |
US11515864B2 (en) | 2022-11-29 |
US20210399721A1 (en) | 2021-12-23 |
US11108384B2 (en) | 2021-08-31 |
KR20220070269A (ko) | 2022-05-30 |
CN114762251A (zh) | 2022-07-15 |
JP2024099719A (ja) | 2024-07-25 |
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