JP2022173038A - Transparent heat insulation film - Google Patents
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Abstract
Description
本発明は、透明断熱フィルムに関するものであり、特にタッチパネル用の透明断熱フィルムに関するものである。 TECHNICAL FIELD The present invention relates to a transparent heat insulating film, and more particularly to a transparent heat insulating film for touch panels.
電子機器の普及に伴い、電子機器の外観の軽量化、薄型化が求められている。しかしながら、これらの薄型化された電子機器の放熱は困難になるため、これらの電子機器の表面温度は、特に大型で薄型のディスプレイパネルの場合に著しく上昇する。このため、大規模集積回路の設計や電子機器のパッケージングの過程において、放熱問題は依然として緊急の課題である。 With the spread of electronic devices, there is a demand for the appearance of electronic devices to be lighter and thinner. However, since it becomes difficult to dissipate heat from these thinned electronic devices, the surface temperature of these electronic devices rises significantly, especially in the case of large and thin display panels. Therefore, in the process of designing large-scale integrated circuits and packaging electronic devices, the problem of heat dissipation remains an urgent issue.
このような高発熱の電子製品の放熱問題を解決するために、ユーザが電子製品に触れたときの過熱などの問題を回避するために、製品の表面に断熱フィルムを備えている製品がほとんどである。現在、電子機器の表面上には熱伝導率の高い金属製のヒートシンクが設置されていることが多く、熱伝導性金属として銀、銅、アルミニウムなどが一般的に使用されている。しかし、より優れた放熱性や断熱効果が求められる場合には、熱伝導性金属の量を増やす必要がある。ディスプレイパネルの光学特性が影響を受ける。 In order to solve the heat dissipation problem of such high heat electronic products, most products have a heat insulating film on the surface of the product to avoid problems such as overheating when the user touches the electronic product. be. At present, heat sinks made of metals with high thermal conductivity are often installed on the surface of electronic devices, and silver, copper, aluminum, etc. are generally used as thermally conductive metals. However, when better heat dissipation and heat insulation are required, the amount of thermally conductive metal must be increased. The optical properties of the display panel are affected.
本開示は、第1の表面及び第2の表面を含むベース層と、ハードコート層と、銀ナノワイヤ層と、内表面及び外表面を含む保護層と、を備える、新規な透明断熱フィルムを提供する。ハードコート層及び銀ナノワイヤ層は、ベース層の第1の表面と保護層記内表面との間に配置される。ベース層の第2の表面の温度がT1(℃)、保護層の外表面の温度がT2(℃)、T1とT2との温度差(T1-T2)が△Tである。T1=50~100℃でベース層及び保護層の両方が熱平衡に達したとき、△T=0.15T1~0.35T1である。 The present disclosure provides a novel transparent thermal insulation film comprising a base layer including first and second surfaces, a hardcoat layer, a silver nanowire layer, and a protective layer including inner and outer surfaces. do. The hardcoat layer and the silver nanowire layer are disposed between the first surface of the base layer and the inner surface of the protective layer. The temperature of the second surface of the base layer is T1 (° C.), the temperature of the outer surface of the protective layer is T2 (° C.), and the temperature difference (T1−T2) between T1 and T2 is ΔT. When both the base layer and the protective layer reach thermal equilibrium at T1=50-100° C., ΔT=0.15T1-0.35T1.
本開示の一実施形態では、透明断熱フィルムの透明度は85~99%、透明断熱フィルムのヘイズは0.5~2.5%、波長550nmにおける反射率は0.5~2%である。 In one embodiment of the present disclosure, the transparent thermal insulation film has a transparency of 85-99%, a haze of the transparent thermal insulation film of 0.5-2.5%, and a reflectance of 0.5-2% at a wavelength of 550 nm.
本開示の一実施形態では、銀ナノワイヤ層の表面抵抗は10~150 opsである。 In one embodiment of the present disclosure, the silver nanowire layer has a surface resistance of 10-150 ops.
本開示の一実施形態では、ベース層の第2の表面と保護層の外表面との両方が熱平衡に達するのに必要な時間が5分未満である。 In one embodiment of the present disclosure, the time required for both the second surface of the base layer and the outer surface of the protective layer to reach thermal equilibrium is less than 5 minutes.
本開示の一実施形態では、ベース層の第1の表面上にハードコート層が配置され、ハードコート層上に銀ナノワイヤ層が配置され、銀ナノワイヤ層上に保護層が配置される。 In one embodiment of the present disclosure, a hardcoat layer is disposed on the first surface of the base layer, a silver nanowire layer is disposed on the hardcoat layer, and a protective layer is disposed on the silver nanowire layer.
本開示の一実施形態では、透明断熱フィルムは、接着面及びタッチ面を含む反射防止フィルムをさらに備え、反射防止フィルムは、反射防止フィルムの接着面を介して保護層の外表面に取り付けられている。 In one embodiment of the present disclosure, the transparent heat insulating film further comprises an antireflection film including an adhesive surface and a touch surface, and the antireflection film is attached to the outer surface of the protective layer via the adhesive surface of the antireflection film. there is
本開示は、第1の表面及び第2の表面を含むベース層と、ハードコート層と、銀ナノワイヤ層と、内表面及び外表面を含む保護層と、接着面及びタッチ面を含む反射防止フィルムと、を備える、別の新規な透明断熱フィルムを提供する。保護層の内表面は、銀ナノワイヤ層に対向している。ハードコート層及び銀ナノワイヤ層は、ベース層の第1の表面と保護層の内表面との間に配置され、反射防止フィルムは、接着面を介して保護層の外表面に取り付けられている。ベース層の第2の表面の温度がT3(℃)、反射防止フィルムのタッチ面の温度がT4(℃)、T3とT4との温度差(T3-T4)が△Tである。T3=50~100℃でベース層及び反射防止フィルムが熱平衡に達したとき、△T=0.12T3~0.32T3である。 The present disclosure provides a base layer including a first surface and a second surface, a hard coat layer, a silver nanowire layer, a protective layer including an inner surface and an outer surface, and an antireflective film including an adhesive surface and a touch surface. and to provide another novel transparent heat insulating film. The inner surface of the protective layer faces the silver nanowire layer. The hard coat layer and the silver nanowire layer are disposed between the first surface of the base layer and the inner surface of the protective layer, and the antireflection film is attached to the outer surface of the protective layer via an adhesive surface. The temperature of the second surface of the base layer is T3 (°C), the temperature of the touch surface of the antireflection film is T4 (°C), and the temperature difference between T3 and T4 (T3-T4) is ΔT. When the base layer and the antireflection film reach thermal equilibrium at T3=50-100° C., ΔT=0.12T3-0.32T3.
本開示の一実施形態では、銀ナノワイヤ層の表面抵抗は、10~40 opsである。 In one embodiment of the present disclosure, the silver nanowire layer has a surface resistance of 10-40 ops.
本開示の一実施形態では、ベース層の第1の表面上にハードコート層が配置され、ハードコート層上に銀ナノワイヤ層が配置され、銀ナノワイヤ層上に保護層が配置される。 In one embodiment of the present disclosure, a hardcoat layer is disposed on the first surface of the base layer, a silver nanowire layer is disposed on the hardcoat layer, and a protective layer is disposed on the silver nanowire layer.
本開示の一実施形態では、反射防止フィルムは、互いに積層された高屈折層及び低屈折層を含む。 In one embodiment of the present disclosure, an antireflective film includes a high refractive layer and a low refractive layer laminated together.
本開示の一実施形態では、高屈折層の屈折率は1.6~1.7であり、低屈折層の屈折率は1.3~1.4である。 In one embodiment of the present disclosure, the refractive index of the high refractive layer is 1.6-1.7 and the refractive index of the low refractive layer is 1.3-1.4.
本開示の一実施形態では、透明断熱フィルムの硬度が2H以上である。 In one embodiment of the present disclosure, the transparent thermal insulation film has a hardness of 2H or higher.
本明細書における用語「上」は、本明細書において、構成要素間の相対位置を説明するために使用され得ることに留意されたい。例えば、第2の要素「上」に配置された第1の要素は、第1の要素が第2の要素と直接接触して形成される実施形態を含み、第1の要素と第2の要素との間に追加の構成要素が形成されてもよい実施形態も含み得る。 Note that the term "above" may be used herein to describe relative positions between components. For example, a first element positioned “above” a second element includes embodiments in which the first element is formed in direct contact with the second element, where the first element and the second element It may also include embodiments in which additional components may be formed between.
さらに、本明細書中の用語「熱平衡」は、透明断熱フィルムの各層間の温度勾配に変化がない状態を表すために用いることができる。例えば、本開示では、ベース層の第2の表面がある温度に一定時間加熱された後、保護層の外表面とベース層の第2の表面との間の温度差が同じままである場合、ベース層と保護層は熱平衡に達する。 Furthermore, the term "thermal equilibrium" can be used herein to describe the state in which there is no change in the temperature gradient between the layers of the transparent insulating film. For example, in the present disclosure, if the temperature difference between the outer surface of the protective layer and the second surface of the base layer remains the same after the second surface of the base layer has been heated to a temperature for a period of time, The base layer and protective layer reach thermal equilibrium.
本開示において、断熱材として機能する透明断熱フィルムの銀ナノワイヤ層は、優れた放熱・断熱効果、優れた光学特性、及び高硬度を有する。また、高温高湿環境下でも、銀ナノワイヤの損傷を防ぎ、保存安定性を効果的に向上させることができる。 In the present disclosure, the silver nanowire layer of the transparent heat insulating film, which functions as a heat insulating material, has excellent heat dissipation and heat insulating effect, excellent optical properties, and high hardness. In addition, even in a high-temperature and high-humidity environment, the silver nanowires can be prevented from being damaged, and the storage stability can be effectively improved.
まず、本開示の第1の実施形態の透明断熱フィルム1000の断面図は図1に示されており、透明断熱フィルム1000は、ベース層1、ハードコート層2、銀ナノワイヤ層3、及び保護層4を備える。ベース層1は、第1の表面11と第2の表面12とを有する。ベース層1の厚さは40~100μmとすることができ、また、ベース層1は、ガラス、サファイア、アクリル(PMMA)、ポリ塩化ビニル(PVC)、ポリプロピレン(PP)、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリカーボネート(PC)、ポリスチレン(PS)、ポリイミド(Polyimide)、セルローストリアセテートフィルム(TACフィルム)、及び他の透明材料から作ることができるが、本開示はこれらに限定されない。
First, a cross-sectional view of the transparent
ハードコート層2は、ベース層1の第1の表面11上に形成されている。ハードコート層2の厚さは0.5~2.0μmとすることができ、また、ハードコート層2は、メラミン樹脂、ウレタン樹脂、アルキド樹脂、アクリル樹脂、シリコーン樹脂等の硬化性樹脂を含む硬化膜によって形成することができるが、本開示はこれに限定されるものではない。
銀ナノワイヤ層3はハードコート層2上に形成され、銀ナノワイヤ層3の表面抵抗は10~150 ops(ohm per square, Ω/□)とすることができる。
The
保護層4は、銀ナノワイヤ層3上に形成され、銀ナノワイヤ層3を保護する。保護層4は、内表面41及び外表面42を有し、内表面41は、銀ナノワイヤ層3に対向して接触する。保護層4の厚さは40~100nmとすることができ、また、保護層4は当該技術分野で知られている保護フィルム用の材料、例えばポリエステル、ポリエチレンテレフタレート(PET)、ポリブチレンテレフタレート(PBT)、ポリメチルメタクリレート(PMMA)、アクリル樹脂、ポリカーボネート(PC)、ポリスチレン(PS)、ポリ塩化ビニル(PVC)、ポリビニルアルコール(PVA)、ポリ塩化ビニリデン(PVDC)、ポリエチレン(PE)、エチレン酢酸ビニル共重合体(EVA)、ポリウレタン(PU)、セロファン、ポリオレフィン、環状オレフィン共重合体(COP)、ポリテトラフルオロエチレン(PTFE)、又はこれらの混合物などとすることができる。
A protective layer 4 is formed on the
本開示の第2の実施形態の透明断熱フィルム2000の断面図は図2に示されており、透明断熱フィルム2000は、ベース層1、ハードコート層2、銀ナノワイヤ層3、保護層4、及び反射防止フィルム5を備える。
A cross-sectional view of the transparent
本開示の第2の実施形態では、ベース層1、ハードコート層2、銀ナノワイヤ層3及び保護層4は、第1の実施形態で説明したものと同様であるが、反射防止フィルム5が保護層4の外表面42上に配置されている。
In the second embodiment of the present disclosure, the
反射防止フィルム5は、接着面51及びタッチ面52を有し、接着面51は保護層4の外表面42に取り付けられている。反射防止フィルム5は、高屈折層53と低屈折層54との積層構造であってもよく、高屈折層53の屈折率は1.6~1.7とすることができ、高屈折層53の厚さは50~100nmとすることができる。低屈折層54の屈折率は1.3~1.4とすることができ、低屈折層54の厚さは100~200nmとすることができる。高屈折層53及び低屈折層54は、透明断熱フィルム2000の光学特性を調整するために配置される。
The
[透明断熱フィルムの光学特性と断熱効果の評価]
まず、ベース層、ハードコート層、及び銀ナノワイヤ層が順次積層された積層構造体を準備し、銀ナノワイヤの量が異なるために表面抵抗が<10、15、20、150 opsである銀ナノワイヤ層を実施例1~実施例4としてそれぞれ準備する。ベース層、ハードコート層、高屈折層、低屈折層が順次積層された積層構造体を比較例1として準備する。本評価では、実施例1~実施例4及び比較例1の積層構造の透明度、ヘイズ及び反射率を試験する。また、実施例1~4及び比較例1のベース層の第2の表面を50℃(T1)に設定した恒温加熱板に取り付けて、断熱効果の評価方法を実施する。熱平衡後、実施例1~実施例4の銀ナノワイヤ層及び比較例1の低屈折層の露出面の温度(T2)を熱撮像装置(赤外線(IR)カメラ)で測定する。断熱効果は、2つの面の温度差(△T)から評価する。評価結果を表1に示す。銀ナノワイヤ層の表面抵抗が10 ops未満である場合、銀ナノワイヤ層中の銀ナノワイヤの量は、透明断熱フィルムの視認性に影響を及ぼし得ることに留意されたい。反対に、銀ナノワイヤ層の表面抵抗が150 ops超の場合、断熱効果は非効率的である。
[Evaluation of optical properties and heat insulation effect of transparent heat insulation film]
First, prepare a laminated structure in which a base layer, a hard coat layer, and a silver nanowire layer are sequentially laminated, and the silver nanowire layers having surface resistances <10, 15, 20, 150 ops due to different amounts of silver nanowires. are prepared as Examples 1 to 4, respectively. A laminated structure in which a base layer, a hard coat layer, a high refractive layer, and a low refractive layer are sequentially laminated is prepared as Comparative Example 1. In this evaluation, the laminate structures of Examples 1-4 and Comparative Example 1 are tested for transparency, haze and reflectance. In addition, the second surface of the base layer of Examples 1 to 4 and Comparative Example 1 is attached to a constant temperature heating plate set at 50° C. (T1) to carry out the evaluation method of the heat insulating effect. After thermal equilibration, the temperature (T2) of the exposed surface of the silver nanowire layers of Examples 1-4 and the low-refractive layer of Comparative Example 1 is measured with a thermal imaging device (infrared (IR) camera). The heat insulating effect is evaluated from the temperature difference (ΔT) between the two surfaces. Table 1 shows the evaluation results. Note that the amount of silver nanowires in the silver nanowire layer can affect the visibility of the transparent thermal insulation film if the surface resistance of the silver nanowire layer is less than 10 ops. On the contrary, when the surface resistance of the silver nanowire layer is over 150 ops, the heat insulating effect is inefficient.
透明断熱フィルムの断熱効果及び視認性の要求を満たすため、銀ナノワイヤ層の表面抵抗は、好ましくは15~150 ops、より好ましくは15~50 ops、最も好ましくは15~25 opsであり、その結果、透明度85~99%、ヘイズ0.5~2.5%、及び反射率(550nm)0.5~2%を含む光学特性が達成され得る。 In order to meet the requirements of the thermal insulation effect and visibility of the transparent thermal insulation film, the surface resistance of the silver nanowire layer is preferably 15-150 ops, more preferably 15-50 ops, most preferably 15-25 ops, so that , transparency of 85-99%, haze of 0.5-2.5%, and reflectance (550 nm) of 0.5-2% can be achieved.
次に、25 opsの銀ナノワイヤ層を有する透明断熱フィルムを実施例5として準備する。そのベース層の第2の表面は、50℃、60℃、70℃、80℃、90℃、100℃、及び110℃(加熱板温度T1)に加熱され、一方、銀ナノワイヤ層の露出温度(T2)は、熱平衡に達した後に測定される。断熱効果を評価するために温度差△Tを算出し、その結果を表2に示す。 Next, a transparent thermal insulation film with a 25 ops silver nanowire layer is prepared as Example 5. The second surface of the base layer is heated to 50° C., 60° C., 70° C., 80° C., 90° C., 100° C., and 110° C. (heat plate temperature T1), while the exposure temperature of the silver nanowire layer ( T2) is measured after reaching thermal equilibrium. The temperature difference ΔT was calculated in order to evaluate the heat insulating effect, and the results are shown in Table 2.
表1~2に示す結果によると、加熱板温度T1と、銀ナノワイヤ層を有する透明断熱フィルムに基づく温度差△Tとの間には、△T(℃)=0.15T1~0.35T1の関係がある。 According to the results shown in Tables 1 and 2, between the hot plate temperature T1 and the temperature difference ΔT based on the transparent heat insulating film having the silver nanowire layer, ΔT (° C.) = 0.15T1 to 0.35T1. There is a relationship.
以上の評価結果によると、銀ナノワイヤを有する透明断熱フィルムは、優れた断熱効果を有する。また、熱平衡に達するのに必要な時間が非常に短く、2つの面の間の温度差は5分間で一定に保たれる。また、銀ナノワイヤ層中の銀ナノワイヤの量(表面抵抗)によって、2つの面の間の温度差を7.7~16℃に調整することができる。すなわち、透明断熱フィルムのベース層の第2の表面の温度を50℃に上昇させると、透明断熱フィルムの他方の面の温度を34~42.3℃に維持することができる。ベース層の第2の表面の温度が60~110℃に上昇しても、透明断熱フィルムの2つの面の温度差を17.3~37.7℃にできる。これに対して、比較例1の銀ナノワイヤ層を有しない透明断熱フィルムの2つの面の温度差は0.4℃に過ぎず、断熱効果が低い。さらに、実施例1~実施例4の透明断熱フィルムは、透明度が87.6~92.9%、ヘイズが4%未満、反射率が3%未満という優れた光学特性を有する。 According to the above evaluation results, the transparent heat insulating film with silver nanowires has excellent heat insulating effect. Also, the time required to reach thermal equilibrium is very short and the temperature difference between the two surfaces remains constant for 5 minutes. Also, the temperature difference between the two surfaces can be adjusted to 7.7-16° C. depending on the amount of silver nanowires (surface resistance) in the silver nanowire layer. That is, when the temperature of the second surface of the base layer of the transparent heat insulating film is increased to 50°C, the temperature of the other surface of the transparent heat insulating film can be maintained at 34-42.3°C. Even if the temperature of the second surface of the base layer rises to 60-110°C, the temperature difference between the two surfaces of the transparent insulating film can be 17.3-37.7°C. In contrast, the temperature difference between the two surfaces of the transparent heat insulating film without the silver nanowire layer of Comparative Example 1 was only 0.4° C., indicating a low heat insulating effect. Furthermore, the transparent thermal insulation films of Examples 1-4 have excellent optical properties such as transparency of 87.6-92.9%, haze of less than 4%, and reflectance of less than 3%.
次に、ベース層、ハードコート層、銀ナノワイヤ層、保護層及び反射防止層が順次積層された透明断熱フィルムを準備する。反射防止層は、高屈折層と低屈折層とを含み、高屈折層の屈折率は1.628であり、低屈折層の屈折率は1.380である。表面抵抗が10、20、40 opsの銀ナノワイヤ層を有する透明断熱フィルムを実施例6~実施例8としてそれぞれ準備する。上記比較例1も比較のために準備する。実施例6~実施例8及び前述の比較例1の光学特性及び断熱効果についても上記と同様の方法で評価する。すなわち、ベース層の第2の表面を50℃(T3(℃)、加熱板の温度)に加熱して、熱平衡に達した後の反射防止フィルムのタッチ面の温度T4(℃)を測定することによって、その断熱効果を評価する。評価結果を表3に示す。 Next, a transparent heat insulating film is prepared in which a base layer, a hard coat layer, a silver nanowire layer, a protective layer and an antireflection layer are sequentially laminated. The antireflection layer includes a high refractive layer and a low refractive layer, the high refractive layer having a refractive index of 1.628 and the low refractive layer having a refractive index of 1.380. Transparent thermal insulation films having silver nanowire layers with surface resistances of 10, 20 and 40 ops are prepared as Examples 6 to 8, respectively. Comparative Example 1 above is also prepared for comparison. The optical properties and heat insulation effects of Examples 6 to 8 and Comparative Example 1 are also evaluated in the same manner as described above. That is, the second surface of the base layer is heated to 50°C (T3 (°C), the temperature of the heating plate), and the temperature T4 (°C) of the touch surface of the antireflection film after reaching thermal equilibrium is measured. to evaluate its thermal insulation effect. Table 3 shows the evaluation results.
表3に示す結果によると、実施例6~実施例8の反射防止層を備える透明断熱フィルムは、2つの面の温度差が6.2~15.7℃と優れた断熱効果を示す。このため、ユーザがタッチパネルを操作して透明断熱フィルムのタッチ面に触れても、熱を感じることがない。また、光学特性がさらに向上し、透明度が91.1~95.5%であり、ヘイズが2.18%未満であり、反射率が2%未満である。 According to the results shown in Table 3, the transparent heat insulating films provided with the antireflection layers of Examples 6 to 8 exhibit an excellent heat insulating effect with a temperature difference of 6.2 to 15.7°C between the two surfaces. Therefore, even if the user operates the touch panel and touches the touch surface of the transparent heat insulating film, the user does not feel heat. Also, the optical properties are further improved, with a transparency of 91.1-95.5%, a haze of less than 2.18%, and a reflectance of less than 2%.
透明断熱フィルムの断熱効果の要件を満たすために、透明断熱フィルムを備える銀ナノワイヤ層の表面抵抗は、好ましくは10~40 ops、より好ましくは10~25 ops、最も好ましくは20~25 opsである。同時に、透明断熱フィルムの光学的視認性の要件である、透明度85~99%、ヘイズ0.5~2.5%、波長550nmにおける反射率0.5~2%も達成される。 In order to meet the requirements of the thermal insulation effect of the transparent thermal insulation film, the surface resistance of the silver nanowire layer with the transparent thermal insulation film is preferably 10-40 ops, more preferably 10-25 ops, most preferably 20-25 ops. . At the same time, the requirements for optical visibility of the transparent heat insulating film, 85-99% transparency, 0.5-2.5% haze, and 0.5-2% reflectance at a wavelength of 550 nm are also achieved.
断熱効果評価の実施例9として、表面抵抗25 opsの銀ナノワイヤを備える透明断熱フィルムを準備する。上記と同様の方法で断熱効果を評価する。すなわち、ベース層の第2の表面を50℃、60℃、70℃、80℃、90℃、100℃、110℃(T3(℃)、加熱板の温度)に加熱して、熱平衡に達した後の反射防止フィルムのタッチ面の温度T4(℃)を測定することによって、その断熱効果を評価する。
評価結果を表4に示す。
As Example 9 of thermal insulation effect evaluation, a transparent thermal insulation film comprising silver nanowires with a surface resistance of 25 ops is prepared. Evaluate the thermal insulation effect in the same manner as above. That is, the second surface of the base layer was heated to 50° C., 60° C., 70° C., 80° C., 90° C., 100° C., 110° C. (T3 (° C.), the temperature of the hot plate) to reach thermal equilibrium. The thermal insulation effect is evaluated by measuring the temperature T4 (° C.) of the touch surface of the antireflection film afterward.
Table 4 shows the evaluation results.
表3~表4に示す結果によると、加熱板温度T3と、銀ナノワイヤ層を有する透明断熱フィルムに基づく温度差△Tとの間には、△T(℃)=0.12T3~0.32T3の関係がある。 According to the results shown in Tables 3 and 4, between the hot plate temperature T3 and the temperature difference ΔT based on the transparent heat insulating film having the silver nanowire layer, ΔT (° C.)=0.12T3 to 0.32T3 There is a relationship
次に、屈折率の異なる高屈折層及び低屈折層を用いて、透明断熱フィルムの反射膜の断熱効果及び光学特性を最適化する。実施例10~実施例13の高屈折膜及び低屈折膜の屈折率及び銀ナノワイヤ層の表面抵抗を表5に示す。上記の方法により、光学特性及び断熱効果を評価する。結果を表5に示す。 Next, a high-refractive layer and a low-refractive layer having different refractive indices are used to optimize the heat-insulating effect and optical properties of the reflective film of the transparent heat-insulating film. Table 5 shows the refractive indices of the high and low refractive films and the surface resistance of the silver nanowire layers of Examples 10 to 13. The optical properties and heat insulating effect are evaluated by the methods described above. Table 5 shows the results.
この結果によると、屈折率の異なる低屈折層と高屈折層とを備える実施例10~実施例13の透明断熱フィルムは、いずれも優れた断熱効果及び光学特性を示し、実施例13が最も優れた断熱効果及び光学特性を示す。実施例13の透明断熱フィルムは、低屈折層の屈折率が1.383、高屈折層の屈折率が1.677、及び銀ナノワイヤ層の表面抵抗が25 opsのとき、透明度が93.8%、ヘイズが1.14%、反射率が0.73%、及び温度差が13.2℃である。 According to this result, the transparent heat insulating films of Examples 10 to 13, which have a low refractive layer and a high refractive layer with different refractive indices, all exhibit excellent heat insulating effects and optical properties, and Example 13 is the most excellent. It shows thermal insulation effect and optical properties. The transparent thermal insulation film of Example 13 has a transparency of 93.8% when the refractive index of the low refractive layer is 1.383, the refractive index of the high refractive layer is 1.677, and the surface resistance of the silver nanowire layer is 25 ops. , a haze of 1.14%, a reflectance of 0.73%, and a temperature difference of 13.2°C.
ベース層、ハードコート層、銀ナノワイヤ層、保護層及び反射防止フィルムが順次積層された透明断熱フィルムを実施例14及び実施例15として準備し、高屈折層の屈折率は1.677、低屈折層の屈折率は1.383、銀ナノワイヤ層の表面抵抗はそれぞれ25 ops及び40 opsである。断熱効果と光学特性の評価にもかかわらず、高温高湿環境における85℃と湿度85%での銀ナノワイヤ層の硬度、耐擦傷性、及び安定性も試験する。評価結果を表6及び図3に示す。 Transparent heat insulating films in which a base layer, a hard coat layer, a silver nanowire layer, a protective layer and an antireflection film are sequentially laminated were prepared as Examples 14 and 15, and the refractive index of the high refractive layer was 1.677 and the low refractive index The refractive index of the layer is 1.383 and the surface resistance of the silver nanowire layer is 25 ops and 40 ops respectively. Despite the evaluation of thermal insulation effect and optical properties, we also test the hardness, scratch resistance and stability of the silver nanowire layer at 85° C. and 85% humidity in a hot and humid environment. Evaluation results are shown in Table 6 and FIG.
表6及び図3に示す評価結果によると、実施例14及び実施例15の透明断熱フィルムは、優れた断熱効果及び光学特性を有する。さらに、実施例14及び実施例15の透明断熱フィルムは、高硬度であり、耐擦傷性が高い。高温高湿環境下では、85℃、湿度85%の高温高湿環境下における銀ナノワイヤ層の硬度、耐擦傷性、安定性の試験結果に基づき、反射防止フィルムは銀ナノワイヤ層の損傷を防止し、銀ナノワイヤ層の保存安定性を効果的に向上させることができる。 According to the evaluation results shown in Table 6 and FIG. 3, the transparent heat insulating films of Examples 14 and 15 have excellent heat insulating effect and optical properties. Furthermore, the transparent heat insulating films of Examples 14 and 15 have high hardness and high scratch resistance. In a high temperature and high humidity environment, the antireflection film prevents damage to the silver nanowire layer based on the test results of hardness, scratch resistance, and stability of the silver nanowire layer in a high temperature and high humidity environment of 85 ° C and 85% humidity. , the storage stability of the silver nanowire layer can be effectively improved.
上記の開示は、その詳細な技術的内容及び発明的特徴に関する。当業者は、その特徴から逸脱することなく、記載された開示の開示及び提案に基づいて様々な修正及び置換を進めることができる。それにもかかわらず、そのような変更及び置換は、上記の説明において完全には開示されていないが、それらは実質的に、添付の特許請求の範囲に包含されている。 The above disclosure relates to its detailed technical content and inventive features. Those skilled in the art can proceed with various modifications and replacements based on the disclosures and suggestions of the described disclosure without departing from its characteristics. Nevertheless, although such modifications and replacements have not been fully disclosed in the above description, they are substantially encompassed within the scope of the appended claims.
1 ベース層
2 ハードコート層
3 銀ナノワイヤ層
4 保護層
5 反射防止フィルム
11 第1の表面
12 第2の表面
25 表面抵抗
41 内表面
42 外表面
51 接着面
52 タッチ面
53 高屈折層
54 低屈折層
1000、2000 透明断熱フィルム
1
Claims (12)
第1の表面及び第2の表面を含むベース層と、
ハードコート層と、
銀ナノワイヤ層と、
内表面及び外表面を含む保護層と、を備え、
前記ハードコート層及び前記銀ナノワイヤ層は、前記ベース層の前記第1の表面と前記保護層の前記内表面との間に配置され、前記ベース層の前記第2の表面の温度がT1(℃)、前記保護層の前記外表面の温度がT2(℃)、T1とT2との間の温度差(T1-T2)が△Tであり、T1=50~100℃で前記ベース層及び前記保護層が熱平衡に達したとき、△T=0.15T1~0.35T1である、
透明断熱フィルム。 A transparent heat insulating film,
a base layer comprising a first surface and a second surface;
a hard coat layer;
a silver nanowire layer;
a protective layer comprising an inner surface and an outer surface;
The hard coat layer and the silver nanowire layer are disposed between the first surface of the base layer and the inner surface of the protective layer, and the temperature of the second surface of the base layer is T1 (°C. ), the temperature of the outer surface of the protective layer is T2 (° C.), the temperature difference between T1 and T2 (T1−T2) is ΔT, and the base layer and the protective layer are formed at T1=50 to 100° C. ΔT=0.15T1 to 0.35T1 when the layer reaches thermal equilibrium;
Transparent insulation film.
第1の表面及び第2の表面を含むベース層と、
ハードコート層と、
銀ナノワイヤ層と、
内表面及び外表面を含む保護層と、
接着面及びタッチ面を含む反射防止フィルムと、を備え、
前記保護層の前記内表面は前記銀ナノワイヤ層に対向しており、
前記ハードコート層及び前記銀ナノワイヤ層は、前記ベース層の前記第1の表面と前記保護層の前記内表面との間に配置され、前記反射防止フィルムは、前記反射防止フィルムの前記接着面を介して前記保護層の前記外表面に取り付けられており、前記ベース層の前記第2の表面の温度がT3(℃)、前記反射防止フィルムの前記タッチ面の温度がT4(℃)、T3とT4との温度差(T3-T4)が△Tであり、T3=50~100℃で前記ベース層及び前記反射防止フィルムが熱平衡に達したとき、△T=0.12T3~0.32T3である、
透明断熱フィルム。 A transparent heat insulating film,
a base layer comprising a first surface and a second surface;
a hard coat layer;
a silver nanowire layer;
a protective layer comprising an inner surface and an outer surface;
and an antireflection film including an adhesive surface and a touch surface,
The inner surface of the protective layer faces the silver nanowire layer,
The hard coat layer and the silver nanowire layer are disposed between the first surface of the base layer and the inner surface of the protective layer, and the antireflection film covers the adhesive surface of the antireflection film. The temperature of the second surface of the base layer is T3 (° C.), and the temperature of the touch surface of the antireflection film is T4 (° C.), T3. The temperature difference (T3-T4) from T4 is ΔT, and when the base layer and the antireflection film reach thermal equilibrium at T3=50 to 100° C., ΔT=0.12T3 to 0.32T3. ,
Transparent insulation film.
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Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102602076A (en) * | 2012-03-01 | 2012-07-25 | 昆山市中迪新材料技术有限公司 | Heat conductive insulation sheet and structural adhesive |
JP2014019273A (en) * | 2012-07-17 | 2014-02-03 | Shiroki Corp | Door frame structure of vehicle |
JP2014026071A (en) * | 2012-07-26 | 2014-02-06 | Toray Advanced Film Co Ltd | Hard coat film, transparent conductive film and touch panel |
US20150047885A1 (en) * | 2013-08-16 | 2015-02-19 | Industrial Technology Research Institute | Patterned conductive film, method of fabricating the same, and application thereof |
JP2016028880A (en) * | 2014-07-18 | 2016-03-03 | パナソニックIpマネジメント株式会社 | Composite sheet and production method of the same, and electronic equipment using composite sheet |
JP2017032790A (en) * | 2015-07-31 | 2017-02-09 | 富士フイルム株式会社 | Heat ray reflective material, window, and manufacturing method for heat ray reflective material |
WO2018074527A1 (en) * | 2016-10-18 | 2018-04-26 | マクセルホールディングス株式会社 | Transparent heat-shielding heat-insulating member |
CN109239990A (en) * | 2018-08-22 | 2019-01-18 | 苏州美嘉写智能显示科技有限公司 | A kind of liquid crystal laminated film and preparation method thereof of upper conversion nano material doping |
JP2019104110A (en) * | 2017-12-08 | 2019-06-27 | 大日本印刷株式会社 | Heat control laminate, and heat radiation unit using the same, heating unit, display device and glass for windows |
JP2022076358A (en) * | 2020-11-09 | 2022-05-19 | 三星電子株式会社 | Resin film, formation method for resin film, and display device |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2009116363A1 (en) * | 2008-03-21 | 2011-07-21 | 株式会社きもと | Optical film, laminate and touch panel |
CN102789827A (en) * | 2011-05-19 | 2012-11-21 | 智盛全球股份有限公司 | Conductive thin film |
KR101526649B1 (en) * | 2012-11-21 | 2015-06-05 | (주)엘지하우시스 | Antireflection film with excellent optical characteristics having a hard coating layer |
JP2014162039A (en) * | 2013-02-22 | 2014-09-08 | Reiko Co Ltd | Transparent conductive film and touch panel |
CN103979802B (en) * | 2014-05-27 | 2016-08-24 | 东莞市鑫聚光电科技有限公司 | A kind of production method of nano-silver thread transparent conducting glass |
CN203941708U (en) * | 2014-07-07 | 2014-11-12 | 苏州斯迪克新材料科技股份有限公司 | A kind of flexible transparent conductive film based on nano-silver thread |
CN104992752B (en) * | 2015-07-16 | 2016-12-14 | 城步新鼎盛电子科技有限公司 | A kind of production method of nano-silver thread transparent conductive film |
CN107710123B (en) * | 2015-07-27 | 2020-09-01 | 富士胶片株式会社 | Composite with transparent electrode, transfer film, method for manufacturing composite with transparent electrode, and capacitive input device |
CN207458608U (en) * | 2017-09-22 | 2018-06-05 | 南昌欧菲显示科技有限公司 | Transparent conducting film and touch screen |
CN212809800U (en) * | 2020-08-10 | 2021-03-26 | 天材创新材料科技(厦门)有限公司 | Transparent conductive film |
-
2021
- 2021-05-06 CN CN202110492551.4A patent/CN115302879A/en active Pending
- 2021-09-16 KR KR1020210123928A patent/KR20220152501A/en not_active Application Discontinuation
- 2021-09-17 JP JP2021151925A patent/JP7197655B2/en active Active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102602076A (en) * | 2012-03-01 | 2012-07-25 | 昆山市中迪新材料技术有限公司 | Heat conductive insulation sheet and structural adhesive |
JP2014019273A (en) * | 2012-07-17 | 2014-02-03 | Shiroki Corp | Door frame structure of vehicle |
JP2014026071A (en) * | 2012-07-26 | 2014-02-06 | Toray Advanced Film Co Ltd | Hard coat film, transparent conductive film and touch panel |
US20150047885A1 (en) * | 2013-08-16 | 2015-02-19 | Industrial Technology Research Institute | Patterned conductive film, method of fabricating the same, and application thereof |
JP2016028880A (en) * | 2014-07-18 | 2016-03-03 | パナソニックIpマネジメント株式会社 | Composite sheet and production method of the same, and electronic equipment using composite sheet |
JP2017032790A (en) * | 2015-07-31 | 2017-02-09 | 富士フイルム株式会社 | Heat ray reflective material, window, and manufacturing method for heat ray reflective material |
WO2018074527A1 (en) * | 2016-10-18 | 2018-04-26 | マクセルホールディングス株式会社 | Transparent heat-shielding heat-insulating member |
JP2019104110A (en) * | 2017-12-08 | 2019-06-27 | 大日本印刷株式会社 | Heat control laminate, and heat radiation unit using the same, heating unit, display device and glass for windows |
CN109239990A (en) * | 2018-08-22 | 2019-01-18 | 苏州美嘉写智能显示科技有限公司 | A kind of liquid crystal laminated film and preparation method thereof of upper conversion nano material doping |
JP2022076358A (en) * | 2020-11-09 | 2022-05-19 | 三星電子株式会社 | Resin film, formation method for resin film, and display device |
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