JP2022163081A - Method of fabricating waveguide combiners - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide waveguide combiners having input coupling regions, waveguide regions, and output coupling regions formed from inorganic or hybrid (organic and inorganic) materials that define fine light gratings.

SOLUTION: In one embodiment, waveguide structures are formed from imprinting stamps having positive waveguide patterns on resists disposed on surfaces of substrates to create negative waveguide structures. The inorganic or hybrid materials are deposited on the substrates and the resists are then removed to form waveguide structures with regions corresponding to at least one of input coupling regions, waveguide regions, and output coupling regions formed from inorganic or hybrid (organic and inorganic) materials.

SELECTED DRAWING: Figure 5D

COPYRIGHT: (C)2023,JPO&INPIT

Description

[0001] Embodiments of the present disclosure generally relate to waveguides for augmented, virtual and mixed reality. More specifically, embodiments described herein present methods of waveguide fabrication.

Description of the Related Art [0002] Virtual reality is generally considered to be a computer-generated simulated environment in which the user has an apparent physical presence. The virtual reality experience is generated in 3D and viewed with a head-mounted display (HMD) such as eyeglasses or other wearable display devices having an ocular display panel as a lens for displaying a virtual reality environment that replaces the real environment. be able to.

[0003] Augmented reality, however, allows a user to see the surrounding environment through the display lenses of glasses or other HMD devices, but also see images of virtual objects that are generated for display and appear as part of the environment. make possible the experience. Augmented reality can include any type of input, such as voice and tactile input, as well as virtual images, graphics, and video that enhance or augment the environment experienced by the user. As a new technology, augmented reality presents many challenges and design constraints.

[0004] One such challenge is displaying a virtual image superimposed on the surrounding environment. A director is used to aid in the registration of the images. The generated light is propagated through the waveguide until the light exits the waveguide and is superimposed on the surrounding environment. Manufacture of waveguides can be difficult because waveguides tend to have non-uniform properties. Therefore, what is needed in the art is an improved extension waveguide and method of making the same.

[0005] In one embodiment, a method of manufacturing a waveguide structure is presented. The method includes imprinting a stamp into the resist. The stamp has a convex waveguide pattern that includes at least one pattern portion. The imprint forms a concave waveguide structure that includes an inverse region with a residual layer. A resist is disposed on the surface of a portion of the substrate, the substrate having a first refractive index. The resist is cured on the surface of the substrate. The stamp is removed and the residual layer removed. A coating is deposited. The coating has a second refractive index that substantially matches or is greater than the first refractive index of the surface of the substrate. Resist is removed from the waveguide structure containing the region.

[0006] In another embodiment, a method of manufacturing a waveguide structure is presented. The method includes depositing a coating having a second index of refraction over the recessed waveguide structures of the stamp. The second refractive index substantially matches or is greater than the first refractive index of the substrate. A concave waveguiding structure includes an inverse region. The coating is planarized and bonded to the surface of the portion of the substrate. The stamp is removed to form a waveguide structure containing regions.

[0007] In yet another embodiment, a method of manufacturing a waveguide structure is presented. The method includes depositing a coating having a second refractive index between 1.5 and 2.5 over the recessed waveguide structures of the stamp. The coating is substantially flat on the concave waveguide structure. The second refractive index substantially matches or exceeds the first refractive index of the substrate between 1.5 and 2.5. The concave waveguide structure includes an inverse input coupling region and an inverse output coupling region. A coating is bonded to the surface of a portion of the substrate. An optical adhesive having a third index of refraction substantially matching the first index of refraction and the second index of refraction is disposed on the surface of the substrate. The stamp is removed to form a waveguide structure with regions.

[0008] So that the above-described features of the disclosure may be understood in detail, a more specific description of the disclosure, briefly summarized above, can be had by reference to the embodiments, some embodiments of which are described below. is illustrated in the accompanying drawings. It should be noted, however, that the attached drawings depict only exemplary embodiments and are therefore not to be considered limiting of the scope of the disclosure, as other equally effective embodiments are permissible.

1 is a perspective front view of a waveguide coupler according to one embodiment; FIG. 1 is a flow diagram illustrating steps in a method for manufacturing a waveguide structure according to one embodiment; FIG. FIG. 4A is a schematic cross-sectional view of a waveguide structure in a method of manufacturing a waveguide structure according to one embodiment; FIG. 4A is a schematic cross-sectional view of a waveguide structure in a method of manufacturing a waveguide structure according to one embodiment; FIG. 4A is a schematic cross-sectional view of a waveguide structure in a method of manufacturing a waveguide structure according to one embodiment; FIG. 4A is a schematic cross-sectional view of a waveguide structure in a method of manufacturing a waveguide structure according to one embodiment; FIG. 4A is a schematic cross-sectional view of a waveguide structure in a method of manufacturing a waveguide structure according to one embodiment; FIG. 4A is a schematic cross-sectional view of a waveguide structure in a method of manufacturing a waveguide structure according to one embodiment; 1 is a flow diagram illustrating steps in a method for manufacturing a waveguide structure according to one embodiment; FIG. FIG. 4A is a schematic cross-sectional view of a waveguide structure in a method of manufacturing a waveguide structure according to one embodiment; FIG. 4A is a schematic cross-sectional view of a waveguide structure in a method of manufacturing a waveguide structure according to one embodiment; FIG. 4A is a schematic cross-sectional view of a waveguide structure in a method of manufacturing a waveguide structure according to one embodiment; FIG. 4A is a schematic cross-sectional view of a waveguide structure in a method of manufacturing a waveguide structure according to one embodiment;

[0014] For ease of understanding, where possible, identical reference numerals have been used to designate identical elements common to the figures. It is believed that elements and features of one embodiment may be beneficially incorporated into other embodiments without further recitation.

[0015] Embodiments described herein relate to methods for fabricating waveguide structures. The methods described herein enable the fabrication of waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from inorganic or hybrid (organic and inorganic) materials.

[0016] FIG. 1 is a perspective front view of a waveguide coupler 100. FIG. It should be understood that the waveguide coupler 100 described below is an exemplary waveguide coupler. Waveguide coupler 100 includes an input coupling region 102 defined by a plurality of gratings 108 , a waveguide region 104 and an output coupling region 106 defined by a plurality of gratings 110 .

[0017] The input coupling region 102 receives an incident beam of intense light (virtual image) from the microdisplay. Each grating in the plurality of gratings 108 splits the incident beam into multiple modes, each beam having a mode. The zero-order mode (T0) beam is refracted back or lost within the waveguide coupler 100, and the positive first-order mode (T1) beam passes through the waveguide coupler 100 into the waveguide region 104. to the output coupling region 106, and the negative first-order mode (T-1) beam propagates through the waveguide coupler 100 in the opposite direction to the T1 beam. The T1 beam undergoes total internal reflection (TIR) through waveguide coupler 100 until the T1 beam contacts multiple gratings 110 in output coupling region 106 . The T1 beams contact the gratings of the plurality of gratings 110 where the T1 beams are refracted back or lost within the waveguide coupler 100 and the T1 beams are separated from the plurality of gratings 110 . is split into a T1 beam that undergoes TIR in the output coupling region 106 until it contacts the grating of , and a T-1 beam that is outcoupled from waveguide coupler 100 .

[0018] Figure 2 is a flow diagram illustrating the steps of a method 200 for manufacturing a waveguide structure 300, as shown in Figures 3A-3F. In one embodiment, waveguide structure 300 corresponds to at least one of input coupling region 102 , waveguide region 104 , and output coupling region 106 of waveguide coupler 100 . In one embodiment, waveguide structure 300 corresponds to a master of at least one of input coupling region 102 , waveguide region 104 , and output coupling region 106 of waveguide coupler 100 . At step 201, a stamp 308 having a convex waveguide pattern 310 is imprinted onto a resist 326 located on the surface 306 of a portion 302 of a substrate 304 to form a concave waveguide structure 312. . Substrate 304 has a first refractive index. In one embodiment, substrate 304 includes at least one of a glass material and a plastic material.

[0019] As shown in FIG. includes at least one pattern portion 314 to provide. As shown in FIGS. 3A and 3B, the recessed waveguide structure 312 includes an inverse region 316 having a residual layer 318, often referred to as the bottom surface. In one embodiment, the inverse region 316 is used to form at least one of the plurality of gratings 108 in the input coupling region 102, the plurality of gratings 110 in the output coupling region 106, and the waveguide region 104. , including a plurality of inverse gratings 320 . In one embodiment, the inverted grating 320 has an inverted top surface 322 parallel to the surface 306 of the substrate 304 , an inverted sidewall surface 324 , and a residual layer 318 parallel to the surface 306 of the substrate 304 . In one embodiment, each of the reverse sidewall surfaces 324 of the reverse grating 320 is oriented perpendicular to the surface 306 of the substrate 304 . In another embodiment, each of the reverse sidewall surfaces 324 of the reverse grating 320 is angled with respect to the surface 306 of the substrate 304 . In yet another embodiment, a portion of reverse sidewall 324 is oriented vertically and a portion of reverse sidewall 324 of reverse grating 320 is angled with respect to surface 306 of substrate 304 .

[0020] At step 202, the resist 326 on the surface 306 of the substrate 304 is cured to stabilize the resist 326. FIG. In step 203 stamp 308 is removed from resist 326 . In one embodiment, stamp 308 is fabricated from a waveguide master having a recessed pattern that includes reverse pattern portions. A stamp 308 is molded from a waveguide master. Stamp 308 comprises a translucent material such as fused silica or polydimethylsiloxane (PDMS), and resist 326 can be cured by exposure to electromagnetic radiation such as infrared (IR) or ultraviolet (UV) radiation. In one embodiment, resist 326 comprises a UV curable material (such as mr-N210 available from Micro Resist Technology) that can be nanoimprinted by stamp 308 comprising PDMS. In one embodiment, the surface 306 of the substrate 304 is spun on a UV curable material by UV ozone treatment, oxygen (O ₂ ) plasma treatment, or application of a primer (such as mr-APS1 available from Micro Resist Technology). Prepared for coating. Alternatively, resist 326 may be heat cured. In another embodiment, resist 326 comprises a thermosetting material that can be cured by a solvent evaporation curing process including thermal heating or infrared radiation heating. Resist 326 may be formed by liquid injection casting, spin-on coating, liquid spray coating, dry powder coating, screen printing, doctor blading, physical vapor deposition (PVD), chemical vapor deposition (CVD). , a flow CVD (FCVD) process, or an atomic layer deposition (ALD) process may be used to dispose on the surface 306 .

[0021] In step 204, the residual layer 318 is removed. In one embodiment, residual layer 318 uses a plasma containing oxygen gas ( _O2 ), a plasma containing fluorine gas (F2), a plasma containing chlorine gas _{( Cl2} ), and/or a plasma containing methane ₍ CH4). can be removed by plasma ashing (often referred to as plasma descumming). In another embodiment, radio frequency (RF) power is applied to _O2 and an inert gas such as argon (Ar) or nitrogen (N) until the residual layer 318 is removed. As shown in FIG. 3C, the reverse grating 320 has reverse depths 328 , 330 extending from the reverse top surface 322 to the surface 306 of the substrate 304 . In one embodiment, reverse depth 328 and reverse depth 330 are substantially the same. In another embodiment, reverse depth 328 and reverse depth 328 are different.

[0022] At step 205, a coating 322 is deposited on the surface 306 of the substrate 304. As shown in FIG. In one embodiment, coating 322 is deposited on surface 306 of substrate 304 and remaining protrusions of recessed waveguide structure 312, as shown in FIGS. 3D and 3E. Coating 322 has a second refractive index that substantially matches or is greater than the first refractive index. Coating 322 may be spin-on-glass (SOG), flowable SOG, sol-gel, organic nanoimprintable materials, inorganic nanoimprintable materials, and hybrid (organic and inorganic) nanoimprintable materials such as silicon oxycarbide (SiOC), Titanium dioxide (TiO ₂ ), silicon dioxide (SiO ₂ ), vanadium (IV) oxide (VO _x ), aluminum oxide (Al ₂ O ₃ ), indium tin oxide (ITO), zinc oxide (ZnO), tantalum pentoxide ( Ta ₂ O ₅ ), silicon nitride (Si ₃ N ₄ ), titanium nitride (TiN), and/or at least one of zirconium dioxide (ZrO ₂ ) containing materials. The coating 322 is formed using a liquid injection casting process, a spin-on coating process, a liquid spray coating process, a dry powder coating process, a screen printing process, a doctor blading process, a PVD process, a CVD process, an FCVD process, or an ALD process. It can be placed on surface 306 . Additionally, the coating 322, such as a SiOC coating, may undergo UV curing or thermal curing. As shown in FIG. 3D, in one embodiment, excess coating 322 may be present. In embodiments, excess coating 322 is removed using material thermal reflow or etching. As shown in FIG. 3E , the coating 322 may be coplanar with the remaining protrusions of the recessed waveguide structure 312 or extend above the substrate 304 to the same height as the remaining protrusions of the recessed waveguide structure 312 . exist. In one embodiment, coating 322 is liquid deposited and excess coating 322 is removed by mechanical planarization.

[0023] The refractive index of coating 322 results from a first refractive index of substrate 304 and a plurality of diffraction gratings 108 obtained from input coupling region 102 and/or output coupling region 106 formed by method 200. and the strength of a grating, such as the plurality of gratings 110 . The refractive index of coating 322 controls the in-coupling (incident) and out-coupling (output) of light and facilitates the propagation of light through waveguide structure 300, so that the first refractive index and diffraction Adjusted based on grid strength. For example, the material of surface 306 of substrate 304 has a first refractive index between about 1.5 and about 2.5, and the material of coating 322 has a first refractive index of between about 1.5 and about 2.5. It has a second refractive index. By matching the refractive indices of the material utilized to fabricate the substrate 304 and the material of the coating 322, the substrate 304 can be coated without substantial light refraction at the interface between the surface 306 of the substrate 304 and the material of the coating 322. Light propagation through both 304 and coating 322 materials can be achieved. By utilizing a material for coating 322 that has a higher refractive index than the material utilized to fabricate substrate 304, more light is coupled in and out of waveguide structure 300 through light acceptance angles. will be ringed. The materials of substrate 304 and coating 322 collectively constitute waveguide structure 300 . Total internal reflection, or at least higher-order Reflection is achieved to facilitate light propagation through waveguide structure 300 .

[0024] In step 206, the resist 326 is removed from the waveguide structure 300. FIG. In one embodiment, resist 326 is removed by plasma ashing using O2 _- containing plasma, F2 _- containing plasma, _Cl2 -containing plasma, and/or CH4 _- containing plasma. In another embodiment, RF power is applied to _O2 and an inert gas such as argon (Ar) or nitrogen (N) until resist 326 is removed. As shown in FIG. 3F, waveguide structure 300 includes region 334 . In one embodiment, region 334 corresponds to at least one of input coupling region 102 , waveguide region 104 , and output coupling region 106 of waveguide coupler 100 . Region 334 includes a plurality of diffraction gratings 336 . In one embodiment, region 334 includes a plurality of diffraction gratings corresponding to at least one of the plurality of diffraction gratings 108 in input coupling region 102 , the plurality of diffraction gratings 110 in output coupling region 106 , and the waveguide region 104 . Grid 336 is included. In one embodiment, diffraction grating 336 has a top surface 338 and sidewall surfaces 340 that are parallel to surface 306 of substrate 304 . In one embodiment, each of sidewall surfaces 340 of grating 336 is oriented perpendicular to surface 306 of substrate 304 . In another embodiment, each of sidewall surfaces 340 of grating 336 is angled with respect to surface 306 of substrate 304 . In yet another embodiment, a portion of sidewall surface 340 is oriented vertically and a portion of sidewall surface 340 of diffraction grating 336 is angled with respect to surface 306 of substrate 304 . In one embodiment, sidewall surface 340 is angled at an angle of about 15° to about 75°. Grating 336 has depths 342 , 344 that extend from surface 306 of substrate 304 to top surface 338 . In one embodiment, depth 342 and depth 344 are substantially the same. In another embodiment, depth 342 and depth 344 are different.

[0025] Figure 4 is a flow diagram illustrating the steps of a method 400 for manufacturing a waveguide structure 500, as shown in Figures 5A-5D. Corresponding to at least one of input coupling region 102 , waveguiding region 104 , and output coupling region 106 of coupler 100 . In another embodiment, waveguide structure 500 corresponds to the master of at least one of input coupling region 102 , waveguide region 104 , and output coupling region 106 of waveguide coupler 100 . At step 401 a coating 322 is deposited over the recessed waveguide structure 512 of the stamp 308 . In one embodiment, the deposited coating 322 is conformal to the recessed waveguide structures 512 of the stamp 308, as shown in FIG. 5A. As shown in FIG. 5B, in one embodiment, deposited coating 322 is substantially planar with respect to recessed waveguide structures 512 of stamp 308 . Therefore, there is no need to planarize coating 322 in optional operation 402 . At optional step 402, in one embodiment, planarizing coating 322 includes mechanical planarization by gravity, thermal reflow, or chemical mechanical polishing (CMP).

[0026] The stamp 308 is molded from a waveguide master and manufactured from a translucent material such as fused silica or PDMS material so that the coating 322 can be cured by exposure to electromagnetic radiation such as IR or UV radiation. may In one embodiment, stamp 308 includes a rigid backing sheet, such as a sheet of glass, to add mechanical strength to facilitate deposition and planarization of coating 322 .

[0027] Coating 322 may include SOG, flowable SOG, sol-gel, organic nanoimprintable materials, inorganic nanoimprintable materials, and hybrid (organic and inorganic) nanoimprintable materials (SiOC, _TiO2 , _SiO2 , _VOx , _Al2O3 , ITO, ZnO, _Ta2O5 , _{Si3N4 ,} TiN, and at _{least one} of ZrO2 _- containing materials). Coating 322 is deposited using liquid injection casting, spin-on coating, liquid spray coating, dry powder coating, screen printing, doctor blading, PVD, CVD, FCVD, or ALD. may be In one embodiment, the coating material is doped with a dopant material to reduce the melting temperature of the coating material and allow for improved flow of the coating material during planarization. Dopant materials can include phosphorous (P)-containing materials and/or boron (B)-containing materials that enable thermal reflow at lower temperatures.

[0028]As shown in FIGS. Inverse region 516 forms a plurality of inverse gratings to form at least one of a plurality of gratings 108 in input coupling region 102 , a plurality of gratings 110 in output coupling region 106 , and a waveguide region 104 . 520 included. In one embodiment, reverse grating 520 has reverse top surface 522 parallel to bottom surface 521 of stamp 308 , reverse sidewall surfaces 524 , and reverse bottom surface 523 parallel to bottom surface 521 of stamp 308 . In one embodiment, each of the reverse sidewall surfaces 524 of the reverse grating 520 is oriented perpendicular to the bottom surface 521 of the stamp 308 . In another embodiment, each of the reverse sidewalls 524 of the reverse grating 520 is angled with respect to the bottom surface 521 of the stamp 308 . In another embodiment, reverse grating 520 includes reverse blazed surface 502 angled with respect to bottom surface 521 of stamp 308 and reverse sidewall surface 524 oriented perpendicular to bottom surface 521 of stamp 308 . It is a blazed reverse angled diffraction grating. In yet another embodiment, the reverse region 516 is a blazed reverse angled grating and a portion of the reverse sidewall 524 is oriented perpendicular to the bottom surface of the stamp 308 . and a plurality of inverse gratings 520 angled with respect to 521 . As shown in FIGS. 5A and 5B, the reverse grating 520 has reverse depths 528 , 530 extending from the reverse top surface 522 to the bottom surface 521 of the stamp 308 . In one embodiment, reverse depth 528 and reverse depth 530 are substantially the same. In another embodiment, reverse depth 528 and reverse depth 530 are different.

[0029] At operation 403, coating 322 is adhered to surface 306 of portion 302 of substrate 304, as shown in Figure 5C. Optical adhesive 501 is used to bond coating 322 to surface 306 of substrate 304 . In one embodiment, optical adhesive 501 may comprise a transparent metal oxide material or a transparent acrylic polymer. Optical adhesive 501 has a third refractive index.

[0030] Coating 322 has a second refractive index that substantially matches or is greater than the first refractive index of substrate 304 . The second refractive index of the coating is the same as the first refractive index of the substrate 304 and the resulting plurality of diffraction gratings 108 in the input coupling regions 102 and/or output coupling regions 106 formed by method 400. and the intensity of the resulting gratings, such as the plurality of gratings 110 . The refractive index of coating 322 is based on the first refractive index of substrate 304 and the strength of the grating to control the in-coupling and out-coupling of light and facilitate the propagation of light through waveguide structure 500. adjusted. Also, the optical adhesive 501 has a third refractive index that substantially matches the first refractive index and the second refractive index. For example, the material of surface 306 of substrate 304 has a first refractive index between about 1.5 and about 2.5, and the material of optical adhesive 501 has a first refractive index of between about 1.5 and about 2.5. and the material of coating 322 has a second refractive index between about 1.5 and about 2.5. By matching the refractive indices of the material utilized to fabricate the substrate 304, the material of the optical adhesive 501, and the material of the coating 322, Light propagation can be achieved without substantial light refraction at the interface between the substrate 304 , the optical adhesive 501 material, and the coating 322 material. By utilizing a material for coating 322 that has a refractive index greater than that of the material utilized to fabricate substrate 304, more light is in-coupled from waveguide structure 500 through the light acceptance angle. Ring and outcoupled. By utilizing materials with a refractive index of between about 1.5 and about 2.5 as compared to the refractive index of air (1.0) for substrate 304 and optical adhesive 501, total internal reflection, Or at least that higher order of reflection is achieved, facilitating the propagation of light through waveguide structure 500 .

[0031] At step 404, the stamp 308 is removed to form the waveguide structure 500. FIG. As shown in FIG. 5D, waveguide structure 500 includes region 534 . In one embodiment, region 534 corresponds to at least one of input coupling region 102 , waveguide region 104 , and output coupling region 106 of waveguide coupler 100 . Region 534 includes a plurality of diffraction gratings 536 . In one embodiment, the plurality of gratings 536 correspond to at least one of the plurality of gratings 108 in the input coupling region 102, the plurality of gratings 110 in the output coupling region 106, and the waveguide region 104. . In one embodiment, diffraction grating 536 has a top surface 538 and sidewall surfaces 540 that are parallel to surface 306 of substrate 304 . In one embodiment, each of sidewall surfaces 540 of grating 536 is oriented perpendicular to surface 306 of substrate 304 . In another embodiment, each of sidewall surfaces 540 of grating 536 is angled with respect to surface 306 of substrate 304 . In another embodiment, diffraction grating 536 includes blazed surfaces 506 angled with respect to surface 306 of substrate 304 and sidewall surfaces 540 oriented perpendicular to surface 306 of substrate 304 at a blazed angle. It is a diffraction grating with In yet another embodiment, region 534 comprises a blazed angled grating and a portion of sidewall surface 540 of grating 536 oriented perpendicular and a portion of sidewall surface 540 angled with respect to surface 306 of substrate 304 . includes a diffraction grating 536 marked with . Grating 536 has depths 542 , 544 extending from optical adhesive 501 to top surface 538 . In one embodiment, depth 542 and depth 544 are substantially the same. In another embodiment, depth 542 and depth 544 are different.

[0032] In summary, a method of manufacturing a waveguide coupler is described herein. The method provides a waveguide coupler having an input coupling region, a waveguide region, and an output coupling region formed from inorganic or hybrid (organic and inorganic) materials that define a fine optical grating. Compared to non-imprintable organic resists, inorganic or hybrid waveguide structures are stable and have low optical absorption losses in forming a grating with a refractive index suitable for the propagation of light through the waveguide. It has a low, optimal refractive index for light propagation through the waveguide coupler.

[0033] While the above is directed to embodiments of the present disclosure, other and further embodiments of the disclosure may be devised without departing from the basic scope of the disclosure. The scope is determined by the claims that follow.

[0033] While the above is directed to embodiments of the present disclosure, other and further embodiments of the disclosure may be devised without departing from the basic scope of the disclosure. The scope is determined by the claims that follow.
Moreover, this application includes the aspects described below.
(Aspect 1)
A method of manufacturing a waveguide structure, comprising:
imprinting a stamp having a convex waveguiding pattern comprising at least one pattern portion into a resist disposed on a surface of a portion of a substrate having a first refractive index, the imprint resulting in a residual layer imprinting a resist forming a recessed waveguide structure including an inverse region having
curing the resist on the surface of the substrate;
removing the stamp;
removing the residual layer;
depositing a coating having a second refractive index substantially matching or greater than the first refractive index of the surface of the substrate;
removing the resist to form a waveguide structure including a region;
A method, including
(Aspect 2)
The coating comprises silicon oxycarbide (SiOC), titanium dioxide (TiO2 ₎ , silicon dioxide (SiO2 ), vanadium (IV) oxide (VOx ₎ , aluminum oxide (Al2O3 _{) , indium} tin oxide ( ITO). , zinc oxide (ZnO), tantalum pentoxide (Ta2O5), _silicon nitride (Si3N4 ) _{, titanium} nitride ₍ TiN), and zirconium dioxide (ZrO2 ₎ containing materials; A method according to aspect 1.
(Aspect 3)
Aspect 1. The method of aspect 1, wherein the region is at least one of an input coupling region, a guiding region, and an output coupling region of a waveguide coupler.
(Aspect 4)
4. The method of aspect 3, wherein the region comprises a plurality of gratings in at least one of the input coupling region and the output coupling region.
(Aspect 5)
5. The method of aspect 4, wherein the plurality of diffraction gratings comprise top surfaces parallel to the surface of the substrate and sidewall surfaces slanted by an amount with respect to the surface of the substrate.
(Aspect 6)
A method of manufacturing a waveguide structure, comprising:
depositing a coating having a second refractive index over the recessed waveguide structures of the stamp, wherein the second refractive index substantially matches or is greater than the first refractive index of the substrate; depositing a coating, wherein the concave waveguide structure includes an inverse region;
planarizing the coating;
bonding the coating to a surface of a portion of the substrate;
removing the stamp to form a waveguide structure including a region;
A method, including
(Aspect 7)
Said deposition of said coating may be liquid material injection casting process, spin-on coating process, liquid spray coating process, dry powder coating process, screen printing process, doctor blading process, physical vapor deposition (PVD) process, chemical vapor deposition ( 7. The method of aspect 6, comprising a CVD) process, a fluidized CVD (FCVD) process, or an atomic layer deposition (ALD) process.
(Aspect 8)
The coating comprises silicon oxycarbide (SiOC), titanium dioxide (TiO2 ₎ , silicon dioxide (SiO2 ), vanadium (IV) oxide (VOx ₎ , aluminum oxide (Al2O3 _{) , indium} tin oxide ( ITO). , zinc oxide (ZnO), tantalum pentoxide (Ta2O5), _silicon nitride (Si3N4 ) _{, titanium} nitride ₍ TiN), and/or zirconium dioxide (ZrO2 ₎ containing materials. the method of.
(Aspect 9)
7. The method of aspect 6, wherein the region comprises a plurality of gratings in at least one of an input coupling region and an output coupling region of a waveguide coupler.
(Mode 10)
An optical adhesive is used to bond the coating to the surface of the substrate, the optical adhesive having a third refractive index substantially matching the first refractive index and the second refractive index. A method according to aspect 6, comprising:
(Aspect 11)
A method of manufacturing a waveguide structure, comprising:
depositing a coating having a second refractive index between 1.5 and 2.5 over the recessed waveguide structures of the stamp, the coating being substantially planar over the recessed waveguide structures; and wherein the second refractive index substantially matches or is greater than the first refractive index of the substrate between 1.5 and 2.5, and the concave waveguide structure is an inverse input cup. depositing a coating comprising a ring region and a reverse output coupling region;
bonding the coating to a surface of a portion of the substrate, the surface of the substrate having a third refractive index substantially matching the first refractive index and the second refractive index; bonding the coating, wherein an optical adhesive having
removing the stamp to form a waveguide structure having a region;
A method, including
(Aspect 12)
12. The method of aspect 11, wherein the optical adhesive comprises a transparent metal oxide material or a transparent acrylic polymer and the third refractive index is between about 1.5 and about 2.5.
(Aspect 13)
12. The method of aspect 11, wherein the region comprises a plurality of gratings in at least one of an input coupling region and an output coupling region of a waveguide coupler.
(Aspect 14)
14. The method of aspect 13, wherein the plurality of diffraction gratings comprise top surfaces parallel to the surface of the substrate and sidewall surfaces slanted by an amount with respect to the surface of the substrate.
(Aspect 15)
The plurality of diffraction gratings are blazed angled diffraction gratings including blazed surfaces angled with respect to the surface of the substrate and sidewall surfaces oriented perpendicular to the surface of the substrate. A method according to aspect 13.

Claims (15)

A method of manufacturing a waveguide structure, comprising:
imprinting a stamp having a convex waveguiding pattern comprising at least one pattern portion into a resist disposed on a surface of a portion of a substrate having a first refractive index, the imprint resulting in a residual layer imprinting a resist forming a recessed waveguide structure including an inverse region having
curing the resist on the surface of the substrate;
removing the stamp;
removing the residual layer;
depositing a coating having a second refractive index substantially matching or greater than the first refractive index of the surface of the substrate;
removing the resist to form a waveguide structure including a region;
A method, including The coating comprises silicon oxycarbide (SiOC), titanium dioxide ( _TiO2 ), silicon dioxide ( _SiO2 ), vanadium (IV) oxide ( _VOx ), aluminum oxide ( _Al2O3 ) _, indium tin oxide (ITO). , zinc oxide (ZnO), tantalum pentoxide _{( Ta2O5} ), silicon nitride _{( Si3N4} ), titanium nitride (TiN), and zirconium dioxide ₍ ZrO2) containing materials; The method of claim 1. 2. The method of claim 1, wherein the region is at least one of an input coupling region, a guiding region, and an output coupling region of a waveguide coupler. 4. The method of claim 3, wherein said region comprises a plurality of gratings in at least one of said input coupling region and said output coupling region. 5. The method of claim 4, wherein the plurality of diffraction gratings comprise top surfaces parallel to the surface of the substrate and sidewall surfaces slanted by an amount with respect to the surface of the substrate. A method of manufacturing a waveguide structure, comprising:
depositing a coating having a second refractive index over the recessed waveguide structures of the stamp, wherein the second refractive index substantially matches or is greater than the first refractive index of the substrate; depositing a coating, wherein the concave waveguide structure includes an inverse region;
planarizing the coating;
bonding the coating to a surface of a portion of the substrate;
removing the stamp to form a waveguide structure including a region;
A method, including Said deposition of said coating may be liquid material injection casting process, spin-on coating process, liquid spray coating process, dry powder coating process, screen printing process, doctor blading process, physical vapor deposition (PVD) process, chemical vapor deposition ( 7. The method of claim 6, comprising a CVD) process, a fluidized CVD (FCVD) process, or an atomic layer deposition (ALD) process. The coating comprises silicon oxycarbide (SiOC), titanium dioxide ( _TiO2 ), silicon dioxide ( _SiO2 ), vanadium (IV) oxide ( _VOx ), aluminum oxide ( _Al2O3 ) _, indium tin oxide (ITO). , zinc oxide (ZnO), tantalum pentoxide _{( Ta2O5} ), silicon nitride _{( Si3N4} ), titanium nitride (TiN), and/or zirconium dioxide ₍ ZrO2) containing materials. described method. 7. The method of claim 6, wherein said regions comprise a plurality of gratings in at least one of an input coupling region and an output coupling region of a waveguide coupler. An optical adhesive is used to bond the coating to the surface of the substrate, the optical adhesive having a third refractive index substantially matching the first refractive index and the second refractive index. 7. The method of claim 6, comprising: A method of manufacturing a waveguide structure, comprising:
depositing a coating having a second refractive index between 1.5 and 2.5 over the recessed waveguide structures of the stamp, the coating being substantially planar over the recessed waveguide structures; and wherein the second refractive index substantially matches or is greater than the first refractive index of the substrate between 1.5 and 2.5, and the concave waveguide structure is an inverse input cup. depositing a coating comprising a ring region and a reverse output coupling region;
bonding the coating to a surface of a portion of the substrate, the surface of the substrate having a third refractive index substantially matching the first refractive index and the second refractive index; bonding the coating, wherein an optical adhesive having
removing the stamp to form a waveguide structure having a region;
A method, including 12. The method of claim 11, wherein said optical adhesive comprises a transparent metal oxide material or a transparent acrylic polymer and said third refractive index is between about 1.5 and about 2.5. 12. The method of claim 11, wherein said regions comprise a plurality of gratings in at least one of an input coupling region and an output coupling region of a waveguide coupler. 14. The method of claim 13, wherein the plurality of diffraction gratings comprise top surfaces parallel to the surface of the substrate and sidewall surfaces slanted by an amount with respect to the surface of the substrate. The plurality of diffraction gratings are blazed angled diffraction gratings including blazed surfaces angled with respect to the surface of the substrate and sidewall surfaces oriented perpendicular to the surface of the substrate. 14. The method of claim 13.

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