JP2022160434A - Abnormality determination method and substrate processing system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To appropriately determine abnormality without impairing productivity in a substrate processing system.

SOLUTION: An abnormality determination method includes a monitoring imaging step of imaging a substrate with an imaging device before and after starting substrate processing, a device identification step of identifying a processing device that is estimated to have an abnormality from among a plurality of processing devices on the basis of the initial imaging result and information used for the processing, an abnormality determination imaging step of performing another first step on the inspection substrate and imaging the inspection substrate before and after the first step, a comparison imaging step of performing a second step on another inspection substrate by using another processing device that performs the same type of step as the processing device identified in the device identification step to perform imaging before and after the second step, and an abnormality presence/absence determination step of determining whether there is an actual abnormality in the one processing device identified in the device identification step on the basis of a first imaging result of the inspection substrate acquired in the abnormality determination imaging step, and a second imaging result of the other inspection substrate acquired in the comparison imaging step.

SELECTED DRAWING: Figure 13

COPYRIGHT: (C)2023,JPO&INPIT

Description

The present disclosure relates to an abnormality determination method and a substrate processing system.

US Pat. No. 6,200,000 discloses a substrate processing system for forming uniform line widths. In this substrate processing system, a substrate on which a resist film is formed is imaged by an imaging unit before pattern exposure, and the film thickness distribution of the resist film on the substrate before pattern exposure is measured based on the imaging result. In addition, the same substrate is pattern-exposed, heat-treated, and then imaged by the imaging section, and the film thickness distribution of the resist film on the substrate after the heat treatment is measured based on the imaging result. Then, film thickness difference data is generated from the film thickness distribution of the resist film before pattern exposure and the film thickness distribution of the resist film after heat treatment, and the line width of the resist pattern is estimated based on the film thickness difference data. be done. Correction processing is performed on the resist film according to the correction conditions for the resist film based on this estimation result.

JP 2017-28086 A

The technology according to the present disclosure makes it possible to appropriately determine the presence or absence of an abnormality without impairing productivity in a substrate processing system having a small number of imaging devices.

One aspect of the present disclosure is a method for a substrate processing system, comprising: a monitoring imaging step of capturing images of the substrate with an imaging device before and after a series of processing on the substrate; The system is configured to perform the series of processes, and among a plurality of processing apparatuses including at least one liquid processing apparatus and at least one heat treatment apparatus, one processing apparatus that is estimated to have an abnormality is used for monitoring. Based on an initial imaging result in the imaging step and information on a plurality of processing devices used in the series of processes, a device specifying step of specifying, and using the one processing device specified in the device specifying step Then, a first process, which is different from the series of processes, is performed on the inspection substrate under predetermined processing conditions, and a first imaging result of the inspection substrate is obtained before and after performing the first process. and performing an abnormality determination imaging step of imaging the inspection board with the imaging device, and a step of the same type as the processing device identified in the device identification step among the plurality of processing devices. using the processing apparatus to perform the second step on another inspection substrate, and obtain a second imaging result of the another inspection substrate before and after performing the second step; a comparison imaging step of imaging another inspection substrate with the imaging device; a first imaging result of the inspection substrate acquired in the abnormality determination imaging step and the another acquired in the comparison imaging step; and an abnormality presence/absence determination step of determining whether or not there is an actual abnormality in the one processing device identified in the device identification step, based on the second imaging result of the inspection board.

Advantageous Effects of Invention According to the present disclosure, it is possible to appropriately determine the presence or absence of an abnormality without impairing productivity in a substrate processing system having a small number of imaging devices.

1 is a plan view showing a schematic configuration of a substrate processing system according to a first embodiment; FIG. 1 is a front view showing a schematic configuration of a substrate processing system according to a first embodiment; FIG. 1 is a rear view showing the outline of the configuration of a substrate processing system according to a first embodiment; FIG. 1 is a vertical cross-sectional view showing the outline of the configuration of a resist coating apparatus; FIG. 1 is a cross-sectional view showing the outline of the configuration of a resist coating apparatus; FIG. 1 is a vertical cross-sectional view showing the outline of the configuration of a heat treatment apparatus; FIG. It is a cross-sectional view which shows the outline of a structure of a heat processing apparatus. FIG. 3 is a plan view showing the outline of the configuration of the hot plate of the heat treatment apparatus; It is a longitudinal cross-sectional view which shows the outline of a structure of an inspection apparatus. It is a cross-sectional view which shows the outline of a structure of an inspection apparatus. 3 is a block diagram schematically showing the outline of the configuration of a control unit; FIG. FIG. 10 is a diagram showing that there is a correlation between the line width of the resist pattern on the wafer and the imaging result using the imaging device; 4 is a flowchart for explaining an example of wafer processing according to the first embodiment; It is a top view showing an outline of composition of a substrate processing system concerning a 2nd embodiment. It is a front view which shows the outline of a structure of the substrate processing system concerning 2nd Embodiment.

2. Description of the Related Art In the photolithography process in the manufacturing process of semiconductor devices and the like, a series of processes are performed to form a predetermined resist pattern on a semiconductor wafer (hereinafter referred to as "wafer") as a substrate.
The series of processes includes, for example, a resist coating process of coating a wafer with a resist solution to form a resist film, an exposure process of exposing the resist film, a development process of developing the exposed resist film, various heat treatments, and the like. be The various heat treatments include heat treatment (PAB treatment) for heating the resist film before exposure and heat treatment (PEB treatment) for promoting chemical reaction in the resist film after exposure.

The resist coating process described above is a spin coating process in which a coating liquid is supplied to the wafer while rotating the wafer to form a coating film. Processing conditions such as the processing rotation speed of the wafer in this resist coating processing affect the resist film thickness. Therefore, if the film thickness of the resist film is measured based on the imaging result of the imaging unit as in Patent Document 1, the desired film thickness can be obtained by adjusting the processing conditions for the resist coating process based on the measurement result. be done.
Further, processing conditions such as heat treatment temperature in the PEB processing affect the line width of the resist pattern. Therefore, if the film thickness of the resist film is measured based on the imaging result of the imaging unit as in Patent Document 1, and the line width of the resist pattern is estimated based on the film thickness, the above processing in the PEB processing can be performed based on the estimation result. A desired line width can be obtained by adjusting the conditions.

By the way, in a series of processes in the photolithography process, a lower layer film and an intermediate layer film are formed as a base for the resist film. In some cases, a laminated film is used. Since the layered films other than the resist film also need to be formed to the desired film thickness in the same manner as the resist film, the film thickness of each layered film is measured, and the processing conditions for forming each layered film are determined based on the measurement results. can be adjusted. However, if an imaging unit for film thickness measurement is provided for each layered film, a substrate processing system for forming a laminated film composed of these layered films becomes expensive. Also, if the wafer is imaged both before and after each layered film forming process in order to measure the film thickness more accurately, and if different imaging units are used both before and after the above-described layered film formation process, , becomes more expensive. In addition, when imaging each layered film, if the number of imaging units is reduced and shared between different layered films instead of providing an imaging unit for each layered film, a waiting time is required for using the imaging unit, resulting in poor productivity. Become.

Patent Document 1 does not disclose or suggest anything in this regard.

Each layered film of the underlayer film, the intermediate film and the resist film is formed by the spin coating process described above. The above-described problems related to the processing conditions of the spin coating process and the like are the adjustment of the processing conditions in the process of forming each layered film by a method other than the spin coating process, and the etching process for removing part or all of the layered film. The same applies to the adjustment of conditions.

Therefore, the present disclosure makes it possible to provide a processing condition correction method and a substrate processing system that appropriately correct processing conditions without impairing productivity even when there are few imaging devices. A processing condition setting method and a substrate processing system according to this embodiment will be described below. In the present specification and drawings, elements having substantially the same functional configuration are denoted by the same reference numerals, thereby omitting redundant description.

(First embodiment)
FIG. 1 is an explanatory diagram showing the outline of the internal configuration of a substrate processing system 1 according to the first embodiment. 2 and 3 are a front view and a rear view, respectively, showing an outline of the internal configuration of the substrate processing system 1. FIG. In this embodiment, the case where the substrate processing system 1 is a coating and developing system that performs coating and developing on a wafer W will be described as an example.

The substrate processing system 1 performs a series of processes in which a layered film is formed and removed on a wafer W one or more times, or either one of them is performed a plurality of times, to bring the wafer W into a predetermined state. The substrate processing system 1 of the present embodiment performs, as the series of processes described above, a layered film such as an underlayer film, an intermediate film, and a resist film formed by spin coating and a coating and developing process for developing the resist film.
As shown in FIG. 1, the substrate processing system 1 includes a cassette station 2 into which a cassette containing a plurality of wafers W is loaded and unloaded, and a plurality of processing apparatuses for performing unit processing constituting coating and developing processing. and a processing station 3. The substrate processing system 1 has a configuration in which a cassette station 2, a processing station 3, and an interface station 5 for transferring wafers W to and from an exposure apparatus 4 adjacent to the processing station 3 are integrally connected. ing.

The cassette station 2 is divided into, for example, a cassette loading/unloading section 10 and a wafer transfer section 11 . For example, the cassette loading/unloading section 10 is provided at the end of the substrate processing system 1 in the negative Y direction (leftward direction in FIG. 1). A cassette mounting table 12 is provided in the cassette loading/unloading section 10 . A plurality of, for example, four mounting plates 13 are provided on the cassette mounting table 12 . The mounting plates 13 are arranged in a row in the horizontal X direction (vertical direction in FIG. 1). The cassette C can be placed on these placement plates 13 when the cassette C is carried in and out of the substrate processing system 1 .

The wafer transfer section 11 is provided with a wafer transfer device 21 which is movable on a transfer path 20 extending in the X direction as shown in FIG. The wafer transfer device 21 is movable in the vertical direction and around the vertical axis (.theta. direction), and moves between the cassette C on each mounting plate 13 and the transfer device in the third block G3 of the processing station 3, which will be described later. A wafer W can be transported between them.

The processing station 3 is provided with a plurality of, for example, first to fourth blocks G1, G2, G3 and G4, each having various devices. For example, a first block G1 is provided on the front side of the processing station 3 (negative X direction side in FIG. 1), and a second block G1 is provided on the back side of the processing station 3 (positive X direction side in FIG. 1). A block G2 of is provided. A third block G3 is provided on the cassette station 2 side of the processing station 3 (negative Y direction side in FIG. 1), and the interface station 5 side of the processing station 3 (positive Y direction side in FIG. 1). is provided with a fourth block G4.

The first block G1 is provided with liquid processing devices as processing devices. For example, as shown in FIG. Devices 33 are arranged in this order from the bottom. The development processing device 30 performs a development processing in which the wafer W on which the resist film is formed is supplied with a developer after the exposure and the wafer W is developed. The lower layer film forming apparatus 31 performs the lower layer film forming process of supplying the coating liquid for forming the lower layer film to the wafer W to form the lower layer film on the wafer W. FIG. The lower layer film is, for example, an SoC (Spin On Carbon) film. The intermediate layer film forming apparatus 32 performs an intermediate layer film forming process of supplying a coating liquid for forming an intermediate layer film to the wafer W to form a lower layer film on the wafer W. FIG. The intermediate layer film is, for example, a silicon-containing antireflection film (SiARC film). The resist film forming device 33 performs a resist film forming process of supplying a resist liquid to the wafer W to form a resist film on the wafer W. FIG. The development process, the underlayer film formation process, the intermediate layer film formation process, and the resist film process are examples of unit processes that constitute the coating and development process, which is the series of processes described above.

For example, three development processing devices 30, lower layer film forming devices 31, intermediate layer film forming devices 32, and resist film forming devices 33 are arranged horizontally. The number and arrangement of the development processing device 30, the lower layer film forming device 31, the intermediate layer film forming device 32 and the resist film forming device 33 can be arbitrarily selected.

In the development processing device 30, the lower layer film forming device 31, the intermediate layer film forming device 32, and the resist film forming device 33, for example, spin coating of applying a predetermined processing liquid onto the wafer W is performed. In spin coating, for example, the processing liquid is discharged onto the wafer W from a coating nozzle, and the wafer W is rotated to spread the processing liquid on the surface of the wafer W. FIG. The configuration of the resist film forming device 33 will be described later.

For example, in the second block G2, as shown in FIG. 3, heat treatment apparatuses 40 for performing heat treatment such as heating and cooling of the wafer W are arranged vertically and horizontally. The number and arrangement of heat treatment apparatuses 40 can also be arbitrarily selected. The heat treatment apparatus 40 includes one for heating an underlayer film, one for heating an intermediate layer film, and one for PAB processing. The heat treatment device 40 for heating the lower layer film heats the wafer W on which the lower layer film is formed by the lower layer film forming device 31 to harden the lower layer film. In the heat treatment device 40 for heating the intermediate layer film, heat treatment for the intermediate layer film is performed by heating the wafer W on which the intermediate layer film is formed by the intermediate layer film forming device 32 to harden the intermediate layer film. In the heat treatment device 40 for PAB processing, the wafer W on which the resist film is formed by the resist film forming device 33 is heated before exposure to perform the PAB processing in which the resist film is cured. Further, the heat treatment apparatus 40 includes a heat treatment apparatus for PB processing that heats the resist film on the wafer W after exposure and development processing. The heat treatment for the lower layer film, the heat treatment for the intermediate layer film, the PAB treatment, the PEB treatment, and the PB treatment are examples of the unit processes constituting the coating and developing process, which is the series of processes described above. In addition, the configuration of the heat treatment apparatus 40 will be described later.

A third block G3 is provided with a plurality of delivery devices 50, on which inspection devices 51 and 52 are provided. The configuration of the inspection device 51 will be described later. A plurality of transfer devices 60 are provided in the fourth block G4.

As shown in FIG. 1, a wafer transfer area D is formed in an area surrounded by first block G1 to fourth block G4. In the wafer transfer area D, for example, a wafer transfer device 70 is arranged.

The wafer transfer device 70 has a transfer arm 70a movable in, for example, the Y direction, the front-rear direction, the θ direction, and the vertical direction. The wafer transfer device 70 moves within the wafer transfer area D and transfers the wafer W to predetermined devices in the surrounding first block G1, second block G2, third block G3 and fourth block G4. can. For example, as shown in FIG. 3, a plurality of wafer transfer devices 70 are arranged vertically, and the wafers W can be transferred to predetermined devices having approximately the same height in each of the blocks G1 to G4.

Further, in the wafer transfer area D, a shuttle transfer device 71 is provided for transferring the wafer W linearly between the third block G3 and the fourth block G4.

The shuttle transport device 71 is linearly movable in the Y direction in FIG. 3, for example. The shuttle transport device 71 moves in the Y direction while supporting the wafer W, and transfers the wafer W between the transfer device 50 of the third block G3 and the transfer device 60 of the fourth block G4, which are approximately the same height. can be transported.

As shown in FIG. 1, a wafer transfer device 72 is provided on the positive X-direction side of the third block G3. The wafer transfer device 72 has a transfer arm 72a that can move, for example, in the front-rear direction, the θ direction, and the vertical direction. The wafer transfer device 72 can move up and down while supporting the wafer W to transfer the wafer W to each transfer device 50 in the third block G3.

The interface station 5 is provided with a wafer transfer device 73 and a transfer device 74 . The wafer transfer device 73 has a transfer arm 73a movable in, for example, the Y direction, the θ direction, and the vertical direction. The wafer transfer device 73 supports the wafer W on, for example, a transfer arm 73a, and can transfer the wafer W between the transfer devices 60, the transfer device 74, and the exposure device 4 in the fourth block G4.

Next, the configuration of the resist film forming apparatus 33 described above will be described. 4 and 5 are a vertical sectional view and a horizontal sectional view, respectively, showing an outline of the structure of the resist film forming apparatus 33. As shown in FIG.
As shown in FIGS. 4 and 5, the resist film forming apparatus 33 has a processing container 100 whose inside can be sealed. A loading/unloading port (not shown) for the wafer W is formed on the side surface of the processing container 100 on the wafer transfer device 70 side, and the loading/unloading port is provided with an open/close shutter (not shown).

A spin chuck 110 that holds and rotates the wafer W is provided in the center of the processing container 100 . The spin chuck 110 has a horizontal upper surface, and the upper surface is provided with a suction port (not shown) for sucking the wafer W, for example. The wafer W can be sucked and held on the spin chuck 110 by suction from this suction port.

Below the spin chuck 110, a chuck drive unit 111 including, for example, a motor is provided. The spin chuck 110 can be rotated at a predetermined speed by the chuck driving unit 111 . In addition, the chuck drive unit 111 is provided with an elevation drive source such as a cylinder, so that the spin chuck 110 can be raised and lowered.

A cup 112 is provided around the spin chuck 110 to receive and collect the liquid that scatters or drops from the wafer W. As shown in FIG. A discharge pipe 113 for discharging the collected liquid and an exhaust pipe 114 for evacuating the atmosphere in the cup 112 are connected to the lower surface of the cup 112 .

As shown in FIG. 5, a rail 120 extending along the Y direction (horizontal direction in FIG. 5) is formed on the negative side of the cup 112 in the X direction (downward direction in FIG. 5). The rail 120 is formed, for example, from the outside of the cup 112 in the negative Y direction (left direction in FIG. 5) to the outside in the positive Y direction (right direction in FIG. 5). An arm 121 is attached to the rail 120 .

The arm 121 supports a coating nozzle 122 for supplying the resist solution onto the wafer W, as shown in FIGS. The arm 121 is movable on the rail 120 by a nozzle driving section 123 shown in FIG. As a result, the coating nozzle 122 can move from the standby section 124 installed outside the cup 112 in the positive direction in the Y direction to above the central portion of the wafer W in the cup 112, and the wafer W can be moved over the wafer W. Can move radially. Further, the arm 121 can be moved up and down by a nozzle driving section 123, and the height of the coating nozzle 122 can be adjusted.

A supply pipe 125 for supplying the resist solution to the coating nozzle 122 is connected to the coating nozzle 122 as shown in FIG. The supply pipe 125 communicates with a resist liquid supply source 126 that stores resist liquid therein. Further, the supply pipe 125 is provided with a supply device group 127 including a valve for controlling the flow of the resist solution, a flow control unit, and the like.

The structures of the developing device 30, the lower layer film forming device 31, and the intermediate layer film forming device 32 are the same as those of the resist film forming device 33 described above. However, the processing liquid supplied from the coating nozzle is different between the developing apparatus 30 and the like and the resist film forming apparatus 33 .

Next, the configuration of the heat treatment apparatus 40 will be described. 6 and 7 are a vertical sectional view and a horizontal sectional view, respectively, showing an outline of the structure of the heat treatment apparatus 40. FIG.
For example, the heat treatment apparatus 40 includes a heating unit 131 that heats the wafer W and a cooling unit 132 that cools the wafer W in the housing 130, as shown in FIGS. As shown in FIG. 7, a loading/unloading port 133 for loading/unloading the wafer W is formed on both side surfaces of the housing 130 near the cooling unit 132 .

As shown in FIG. 6, the heating unit 131 includes a lid body 140 which is positioned on the upper side and which is vertically movable, and a hot plate housing part which is positioned on the lower side and forms a processing chamber S together with the lid body 140. 141 is provided.

The lid body 140 has a substantially cylindrical shape with an open lower surface, and covers the upper surface, which is the surface to be processed, of the wafer W placed on a hot plate 142 which will be described later. An exhaust portion 140 a is provided in the central portion of the upper surface of the lid 140 . The atmosphere in the processing chamber S is exhausted from the exhaust part 140a.
Further, the lid 140 is provided with a temperature sensor 143 which is a temperature measuring section for measuring the temperature of the lid 140 . Although the temperature sensor 143 is provided at the end of the lid 140 in the illustrated example, it may be provided at the center of the lid 140 or the like.

A hot plate 142 for heating the placed wafer W is provided in the center of the hot plate accommodating portion 141 . The hot plate 142 has a thick, substantially disk-like shape, and a heater 150 for heating the upper surface of the hot plate 142, that is, the mounting surface of the wafer W is provided therein. An electric heater, for example, is used as the heater 150 . The configuration of this hot plate 142 will be described later.

The hot plate accommodating portion 141 is provided with lifting pins 151 that pass through the hot plate 142 in the thickness direction. The lifting pins 151 can be moved up and down by a lifting drive unit 152 such as a cylinder, and protrude from the upper surface of the hot plate 142 to transfer the wafer W to and from a cooling plate 170 to be described later.

For example, as shown in FIG. 6, the hot plate accommodating portion 141 includes an annular holding member 160 that accommodates the hot plate 142 and holds the outer peripheral portion of the hot plate 142, and a substantially cylindrical support that surrounds the outer periphery of the holding member 160. It has a ring 161 .

A cooling unit 132 adjacent to the heating unit 131 is provided with a cooling plate 170 on which, for example, a wafer W is mounted and cooled. The cooling plate 170 has, for example, a substantially square flat plate shape as shown in FIG. 7, and the end surface on the heating unit 131 side is curved in an arc shape. A cooling member (not shown) such as a Peltier element is built in the cooling plate 170, and the cooling plate 170 can be adjusted to a predetermined set temperature.

The cooling plate 170 is supported, for example, by a support arm 171 as shown in FIG. A cooling plate 170 can be moved on rails 172 by a drive mechanism 173 attached to a support arm 171 . This allows the cooling plate 170 to move above the hot plate 142 on the heating unit 131 side.

The cooling plate 170 is formed with, for example, two slits 174 along the X direction in FIG. The slit 174 is formed from the end surface of the cooling plate 170 on the heating unit 131 side to the vicinity of the central portion of the cooling plate 170 . This slit 174 prevents interference between the cooling plate 170 moved to the heating unit 131 side and the lifting pin 151 on the heating plate 142 . As shown in FIG. 6, a lifting pin 175 is provided below the cooling plate 170 positioned inside the cooling section 132 . The lift pin 175 can be lifted and lowered by the lift driver 176 . The elevating pins 175 rise from below the cooling plate 170, pass through the slits 174, protrude above the cooling plate 170, and enter the housing 130 through the loading/unloading port 133, for example. Wafer W can be transferred.

Next, the configuration of the hot plate 142 will be described in detail. FIG. 8 is a plan view showing the outline of the configuration of the hot plate 142. As shown in FIG. As shown in FIG. 8, the hot plate 142 is divided into a plurality of, for example, five hot plate regions R1 to R5. The hot plate 142 is divided into, for example, a circular hot plate region R1 located in the center when viewed from the top, and hot plate regions R2 to R5 obtained by dividing the circumference of the hot plate region R1 into four equal arcs. there is

A heater 180 is individually incorporated in each of the hot plate regions R1 to R5 of the hot plate 142, so that each of the hot plate regions R1 to R5 can be individually heated. The amount of heat generated by the heater 180 in each of the hot plate regions R1 to R5 is adjusted by a temperature control device 181, for example. The temperature control device 181 can adjust the amount of heat generated by each heater 180 to control the processing temperature of each hot plate region R1 to R5 to a predetermined set temperature. Temperature setting in the temperature control device 181 is performed by the control section 300 .

Next, the configuration of the inspection device 51 will be described. 9 and 10 are a vertical cross-sectional view and a cross-sectional view, respectively, showing an outline of the configuration of the inspection device 51. FIG. The inspection device 51 has a casing 190 as shown in FIGS. A mounting table 200 on which the wafer W is mounted is provided in the casing 190 . The mounting table 200 can be freely rotated and stopped by a rotation drive unit 201 such as a motor. The bottom surface of the casing 190 is provided with a guide rail 202 extending from one end (negative direction in the X direction in FIG. 10) to the other end (positive direction in the X direction in FIG. 10) in the casing 190. . The mounting table 200 and the rotation driving section 201 are provided on the guide rail 202 and can be moved along the guide rail 202 by the driving device 203 .

An imaging device 210 is provided on the side surface of the casing 190 on the other end side (the positive side in the X direction in FIG. 10). A wide-angle CCD camera, for example, is used as the imaging device 210 .

A half mirror 211 is provided near the upper center of the casing 190 . The half mirror 211 is provided at a position facing the imaging device 210 in a state in which the mirror surface faces vertically downward and is inclined upward by 45 degrees toward the imaging device 210 . A lighting device 212 is provided above the half mirror 211 . The half mirror 211 and the illumination device 212 are fixed to the upper surface inside the casing 190 . Light from the illumination device 212 passes through the half mirror 211 and is illuminated downward. Therefore, the light reflected by the object below the illumination device 212 is further reflected by the half mirror 211 and captured by the imaging device 210 . That is, the imaging device 210 can capture an image of an object in the area illuminated by the illumination device 212 .

The configuration of the inspection device 52 is the same as the configuration of the inspection device 51 described above.

The substrate processing system 1 described above is provided with a controller 300 as shown in FIG. The control unit 300 is configured by a computer including, for example, a CPU and memory, and has a program storage unit (not shown). The program storage unit stores a program for controlling the processing of the wafer W in the substrate processing system 1, including a program for correcting the processing conditions of the unit processing constituting the series of processing described above. The program may be recorded in a computer-readable storage medium H and installed in the control unit 300 from the storage medium H.

11, the control unit 300 includes a storage unit 310, a first acquisition unit 311, a device identification unit 312, a second acquisition unit 313, a third acquisition unit 314, an abnormality It has a presence/absence determination unit 315 , a processing condition correction unit 316 , and a correction propriety determination unit 317 .

The storage unit 310 stores various information. In the substrate processing system 1, as the series of processes described above, a coating and developing process is performed in which a laminated film of a lower layer film, an intermediate layer film, and a resist film is formed, and the resist film after exposure is developed. The storage unit 310 stores, for each wafer W, information on the processing apparatus used in the coating and developing process (hereinafter referred to as “history information”). In other words, the history information is conveying route information indicating which lower layer film forming apparatus 31 among the plurality of lower layer film forming apparatuses 31 has been passed during the coating and developing process.

For each wafer W, the first acquisition unit 311 obtains the imaging result of the wafer W before the coating and developing process is started and the imaging result of the wafer W after the coating and developing process is finished, by the inspection device 51. Alternatively, it is obtained from the imaging device 210 of the inspection device 52 .

The apparatus identifying unit 312 determines that there is an abnormality based on the imaging results before and after the coating and developing process, which are acquired by the first acquiring unit 311, and the history information/transfer route information stored for each wafer W. A processing device (estimated abnormal device A) that is estimated to be is specified. The reason why the image pickup result of the wafer W before the start of the coating and developing process is used in addition to the image pickup result of the wafer W after the coating and developing process is finished is to exclude the case where the wafer W has an abnormality before the start of the coating and developing process. be.

The second acquisition unit 313 controls the presumed abnormal device A to perform the unit process A in the device on the inspection wafer W under predetermined processing conditions. The predetermined processing conditions are the same processing conditions as during the coating and developing process. Then, the second acquisition unit 313 acquires the imaging result of the inspection wafer W before the unit process A is performed and the imaging result of the inspection wafer W after the unit process A by the presumed abnormality apparatus A, Alternatively, it is obtained from the imaging device 210 of the inspection device 52 .

The third acquisition unit 314 controls another processing device of the same type (same type processing device A*) that performs the same unit processing A as the presumed abnormal device A, and inspects the unit processing A under predetermined processing conditions. The wafer W is made to perform. Then, the third acquisition unit 314 acquires the imaging result of the inspection wafer W before the unit process A is performed from the imaging device 210 of the inspection device 51 . Further, the imaging result of the inspection wafer W after the unit processing A by the same type processing apparatus A* is also obtained from the imaging device 210 of the inspection device 52 .

The abnormality presence/absence determination unit 315 determines whether or not there is an actual abnormality in the presumed abnormal device A based on the imaging result acquired by the second acquisition unit 313 . For example, the abnormality presence/absence determination unit 315 obtains the imaging result before and after the unit processing A by the presumed abnormal device A acquired by the second acquisition unit 313, and the processing device A of the same type acquired by the third acquisition unit 314. The presence or absence of an actual abnormality is determined based on the imaging results before and after unit processing A by *. The use of not only the imaging result of the inspection wafer W after the unit process A but also the imaging result of the inspection wafer W before the unit process A excludes the case where the inspection wafer W before the unit process A has an abnormality. It's for.

Then, the processing condition correction unit 316 corrects the processing conditions of the unit processing A for the presumed abnormal device A (abnormal device A#) determined to actually have an abnormality by the following method.

It is known that there is a correlation between the RGB data of the captured image based on the imaging result of the imaging device 210 and the film thickness of the resist film (see Patent Document 1).
Further, as a result of extensive studies by the present inventors, it was found that there is a correlation between the RGB data of the captured image based on the imaging result of the imaging device 210 and the line width of the resist pattern on the wafer W.

FIG. 12 is a diagram showing that there is a correlation between the RGB data of the image captured by the imaging device 210 and the line width of the resist pattern on the wafer W. As shown in FIG. Although the images I1 to I4 are shown in grayscale in FIGS. 12A to 12D, they are actually color images.

Images I1 and I3 in FIGS. 12A and 12C are obtained as follows. That is, the wafer W on which the resist pattern is formed is divided into 437 regions, the line width of the resist pattern on each region is measured by SEM, and the average value of the line width is calculated for each region. Also, the average value of the calculated line widths is converted into RGB data. RGB data is data including pixel values/luminance values of R (red), G (green), and B (blue). Then, for each region, a table is created in which coordinates of the region are associated with RGB data converted from the average value of line widths. Based on the table, RGB images I1 and I3 showing the line width distribution of the resist pattern as shown in FIGS. 12A and 12C are obtained.

Images I2 and I4 in FIGS. 12B and 12D are obtained as follows. That is, the entire wafer W on which the resist pattern is formed is imaged using the imaging device 210 of the inspection device 51 . Then, the wafer W is divided into 437 regions, and in each region, average values of R, G, and B pixel values of pixels included in the region are calculated. Then, for each region, a table is created in which the coordinates of the region and the average value of the pixel values, that is, the average value of the RGB data are associated with each other. Then, the table is calibrated according to the optical system of the inspection device 51 and the like. RGB images I2 and I4 as shown in FIGS. 12B and 12D are acquired based on the calibrated table. In this specification, the term “captured image” refers to an image acquired as described above from the imaging result of the imaging device 210, for example.

The processing conditions (including various processing equipment used) for the wafer W are the same in FIGS. 12A and 12B, and are the same in FIGS. 12C and 12D. is. However, the processing conditions for the wafer W are different between FIG. 12(A) and FIG. 12(C).
The image I1 in FIG. 12A and the image I2 in FIG. 12B have the same color distribution, and the image I3 in FIG. 12C and the image I3 in FIG. The distribution of colors is similar between Therefore, there is a correlation between the color information, that is, the RGB data in the captured image showing the state of the surface of the wafer W and the line width of the resist pattern on the wafer W obtained from the imaging result using the imaging device 210. It is clear that

As described above, there is a correlation between the RGB data of the image captured by the imaging device 210 and the film thickness of the resist film. There is a correlation between
Therefore, the processing condition correction unit 316 uses a correlation model between the amount of change in the RGB data in the captured image and the amount of change in the processing condition, and based on the imaging result acquired by the second acquisition unit 313, the abnormal device A# Correct the processing conditions in

The correction propriety determination unit 317 controls the abnormal apparatus A# to perform the unit process A on the inspection wafer W under the corrected process conditions. Then, the correction appropriateness determining unit 317 acquires the imaging result of the inspection wafer W after the unit processing A based on the processing condition after correction, and determines whether the correction by the processing condition correcting unit 316 is appropriate based on the imaging result. determine whether

Wafer processing including processing condition correction processing according to the present embodiment will be described below. FIG. 13 is a flow chart for explaining an example of the above wafer processing.

<1. Mass production process (monitoring imaging process)>
In the wafer processing according to this embodiment, a coating and developing process is performed on a mass-production wafer W (step S1). In this step, the imaging devices 210 of the inspection devices 51 and 52 image each wafer W for mass production before and after the coating and developing process.

Specifically, first, the wafers W for mass production are sequentially taken out from the cassette C on the cassette mounting table 12 and transferred to the inspection device 51 of the third block G3 of the processing station 3 . The imaging device 210 captures an image of the mass-production wafer W before the coating and developing process is started, and the captured image of the mass-production wafer W is acquired by the first acquisition unit 311 .

After that, the wafer W for mass production is transferred to the lower layer film forming apparatus 31 of the first block G1, and the lower layer film is formed on the wafer W. As shown in FIG. Next, the mass-production wafer W is transported to the heat treatment apparatus 40 for heating the lower layer film, and is heat-treated.

After that, the wafer W for mass production is transported to the intermediate layer film forming device 32, and an intermediate layer film is formed on the lower layer film of the wafer W concerned. Next, the mass-production wafer W is transported to the heat treatment apparatus 40 for intermediate layer films and heat-treated.

After that, the mass production wafer W is transported to the resist film forming device 33 and a resist film is formed thereon. Next, the mass-production wafer W is transported to the heat treatment apparatus 40 for PAB processing, and is subjected to PAB processing.
After that, the mass production wafer W is transferred to the exposure device 4 and exposed in a predetermined pattern.

Next, the wafer W for mass production is transferred to the heat treatment apparatus 40 for PEB processing, and is subjected to PEB processing. After that, the mass production wafer W is transported to the development processing device 30 and developed. After completion of the development process, the mass-production wafer W is transported to the heat treatment apparatus 40 for post-baking process and post-baking process is performed. This completes the coating and developing process. Then, the mass production wafer W is transported to the inspection device 52, the image of the mass production wafer W after the completion of the coating and developing process is captured by the imaging device 210, and the captured image of the mass production wafer W is acquired by the first acquisition unit 311. be done. After that, the mass-production wafer W is transferred to the cassette C on the cassette mounting table 12, and a series of photolithography processes for the mass-production wafer W is completed. The series of photolithography processes described above are performed on all the wafers W for mass production.

<2. Device identification process>
Before the mass production process, the processing conditions in each processing equipment are adjusted to appropriate ones. However, the processing conditions may become inappropriate in some processing equipment while the operation is continued. Therefore, after the above-described mass production process or in parallel with the mass production process, the apparatus identification unit 312 obtains the captured image of each of the mass production wafers W acquired by the first acquisition unit 311 and the processing apparatus used for the series of processes. Based on the information, the presumed abnormal device A is specified (step S2).
Specifically, first, for each of the mass-production wafers W acquired by the first acquisition unit 311, based on the captured image before the start of the coating and developing process and the captured image after the coating and developing process is completed, the presumed abnormal wafer W is identified. A presumed abnormal wafer W is a mass-production wafer W presumed to have undergone an abnormal unit process.

The first acquisition unit 311 identifies, as an estimated abnormal wafer W, a mass-production wafer W that satisfies both (P) and (Q) below, for example.

(P) When there is no difference between the captured image before starting the coating and developing process and the first reference image.
(Q) When there is a difference between the captured image after the coating and developing process and the second reference image.

The first reference image is, for example, an average image of the captured images of the mass production wafer W before the coating and developing process is started, and the second reference image is, for example, the captured image of the mass production wafer W after the coating and developing process is finished. is the average image of
In addition, "there is no difference" in the above (P) and (Q) means, for example, that the difference in pixel value at each coordinate of the image is within a predetermined range between the captured image and the reference image. Say things.

Then, based on the history information related to the mass-production wafer W identified as the presumed abnormality wafer W, that is, the information of the processing apparatus used in the coating and developing process of the mass-production wafer W identified as the presumed abnormality wafer W , a presumed anomalous device A is identified.

<3. Imaging process for abnormality determination>
Using the presumed abnormal device A identified in the device identifying step of step S2, the unit processing A in the device is performed on the inspection wafer W under predetermined processing conditions. The inspection wafer W is imaged by the imaging device 210 (step S3). The inspection wafer W is, for example, a bare wafer. A bare wafer is a wafer whose surface is flat and only the substrate of the wafer (if the wafer is a silicon wafer, only silicon) is exposed on the surface.

In step S3 of this example, in addition to the presumed abnormal device A, another type of predetermined processing device (different type processing device B) related to another unit process B related to the unit process A is controlled. B is also performed on the inspection wafer W under predetermined processing conditions. For example, when the unit process A is a resist film formation process, the unit process B is a PAB process, and when the unit process A is a PEB process, the unit process B is a resist film formation process, a PAB process and a development process. Information as to which unit process B corresponds to which unit process A is stored in the storage unit 310 .

Specifically, in step S3, first, the inspection wafer W is taken out from the cassette C on the cassette mounting table 12 and transported to the inspection device 51 of the third block G3. Then, the inspection wafer W is imaged by the imaging device 210 of the inspection device 51, and the imaged image of the inspection wafer W on which neither the unit process A nor the unit process B is performed is acquired by the second acquisition unit 313. be. Next, the inspection wafer W is transferred to, for example, one of the resist film forming apparatuses 33 as the presumed abnormal apparatus A, and the resist film forming process as the unit process A is performed under predetermined process conditions. After that, the inspection wafer W is transferred to, for example, one of the heat treatment apparatuses 40 for PAB treatment as the other type treatment apparatus B, and the PAB treatment as the unit treatment B is performed under predetermined treatment conditions. Next, the inspection wafer W is transferred to the inspection device 52 of the third block G3. Then, the inspection wafer W is imaged by the imaging device 210 of the inspection device 52, and the imaged image of the inspection wafer W after the unit processing A by the presumed abnormal device A and the unit processing B by the other type processing device B is the second Acquired by the acquisition unit 313 .

<4. Imaging process for comparison>
Next, for comparison with the imaging result acquired in step S3, the unit processing A is performed on the inspection wafer W under predetermined processing conditions using the above-described processing apparatus A* of the same type, and the unit processing is performed. The inspection wafer W is imaged by the imaging device 210 before and after the inspection (step S4). The imaging process for comparison may be performed before the imaging process for abnormality determination.

In step S4 of this example, as in step S3, the other-type processing apparatus B is controlled, and the unit processing B is also performed on the inspection wafer W under predetermined processing conditions.
Note that the presumed abnormal device A used in step S3 and the same-type processing device A* used in step S4 are different processing devices of the same type. The other kind of processing equipment B to be used is the same processing equipment.

Specifically, in step S4, first, the inspection wafer W is taken out from the cassette C on the cassette mounting table 12 and transported to the inspection device 51 of the third block G3. Then, the inspection wafer W is imaged by the imaging device 210 of the inspection device 51, and the imaged image of the inspection wafer W on which neither the unit process A nor the unit process B is performed is acquired by the third acquisition unit 314. be. Next, the inspection wafer W is transferred to one of the resist film forming apparatuses 33 as the same type processing apparatus A*, for example, and the resist film forming process as the unit process A is performed under predetermined process conditions. After that, the inspection wafer W is transferred to, for example, one of the heat treatment apparatuses 40 for PAB treatment as the other type treatment apparatus B, and the PAB treatment as the unit treatment B is performed under predetermined treatment conditions. Next, the inspection wafer W is transferred to the inspection device 52 of the third block G3. Then, the inspection wafer W is imaged by the imaging device 210 of the inspection device 52, and the captured image of the inspection wafer W after the unit processing A by the processing device A* of the same type and the unit processing B by the processing device B of the different type is the 3 is obtained by the obtaining unit 314 of No. 3.

<5. Abnormality Presence Judgment Process>
After that, it is determined whether or not there is an actual abnormality in the presumed abnormal device A based on the imaging result acquired in the imaging process for abnormality determination (step S5).

In step S5 in this example, the presence or absence of an actual abnormality in the presumed abnormal device A is determined based on the captured image acquired in the abnormality determination imaging process and the captured image acquired in the comparison imaging process. . More specifically, when both of the following (S) and (T) are satisfied, it is determined that the presumed abnormal device A is actually abnormal.

(S) Regarding the captured images of the unprocessed inspection wafer W on which neither the unit process A nor the unit process B has been performed, the image acquired in the imaging process for abnormality determination and the image acquired in the imaging process for comparison If there is no difference between
(T) Captured image of inspection wafer W after unit processing A by presumed abnormal apparatus A and unit processing B by other type processing apparatus B, and unit processing A by same type processing apparatus A* and unit by other type processing apparatus B When there is a difference from the captured image of the inspection wafer W after the process B.

In the above (S) and (T), "no/has a difference" means, for example, that the difference in pixel values at each coordinate of the captured images is/is not within a predetermined range between the captured images. .

If it is determined in step S5 that there is actually no abnormality, the wafer processing is returned to step S1, and if it is determined that there is actually an abnormality, the process proceeds to step S6.

<6. Processing Condition Correction Step>
In step S6, the processing condition correction unit 316 sets the processing conditions of the unit processing A for the abnormal device A#, which is the presumed abnormal device A determined to actually have an abnormality, based on the imaging result in the imaging process for abnormality. corrected.

In step S6, first, the captured image of the inspection wafer W after the unit processing A and the unit processing B acquired in the abnormality imaging process and the similar captured image acquired in the comparison imaging process are both captured images. A shift amount of RGB data between is calculated. Then, using a correlation model between the amount of change in the RGB data in the captured image and the amount of change in the processing condition of the unit processing A, the processing condition of the unit processing A in the abnormal device A# is corrected based on the deviation amount of the RGB data. Amount is calculated. Then, the conditions currently set as the processing conditions for the coating and developing processing of the unit processing A for the abnormal device A# are corrected based on the calculated correction amount.

<7. Correction Adequacy Judgment Process>
Then, using the abnormal device A#, the unit process A is performed on a new inspection wafer W under the corrected process conditions, and the inspection wafer W is scanned by the imaging device 210 before and after the unit process A is performed. , and based on the imaging result, it is determined whether or not the correction of the processing conditions is appropriate (step S7).

In step S7 of this example, in addition to the abnormal device A, the other type processing device B is controlled, and the unit processing B is also performed on the inspection wafer W under predetermined processing conditions, as in the imaging process for abnormality determination.

Specifically, in step S7, first, the inspection wafer W is taken out from the cassette C on the cassette mounting table 12 and transported to the inspection device 51 of the third block G3. Then, the inspection wafer W is imaged by the imaging device 210 of the inspection device 51, and the imaged image of the inspection wafer W on which neither the unit process A nor the unit process B is performed is acquired by the correction adequacy determination unit 317. . Next, the inspection wafer W is transferred to, for example, one of the resist film forming apparatuses 33 as the abnormal apparatus A#, and the resist film forming process as the unit process A is performed under the corrected process conditions. After that, the inspection wafer W is transferred to, for example, one of the heat treatment apparatuses 40 for PAB treatment as the other type treatment apparatus B, and the PAB treatment as the unit treatment B is performed under predetermined treatment conditions. Next, the inspection wafer W is transferred to the inspection device 52 of the third block G3. Next, the inspection wafer W is imaged by the imaging device 210 of the inspection device 52, and the inspection wafer W after the unit processing A by the abnormal device A# and the unit processing B by the other type processing device B under the processing conditions after correction. is acquired by the correction propriety determination unit 317 . Then, based on the captured image acquired in step S7 and the captured image acquired in the comparison imaging process, it is determined whether the correction of the processing conditions by the processing condition correction unit 316 is appropriate. More specifically, when both (U) and (V) below are satisfied, it is determined that the correction of the processing conditions is appropriate.

(U) Regarding the captured images of the unprocessed inspection wafer W on which neither the unit process A nor the unit process B has been performed, the image acquired in the imaging process for comparison judgment and the image acquired in the correction adequacy judgment process If there is no difference between
(T) Captured image of inspection wafer W after unit process A by same type processing apparatus A* and unit process B by other type processing apparatus B, and unit process A by abnormal apparatus A# under corrected processing conditions When there is no difference from the photographed image of the inspection wafer W after the unit processing B by the processing apparatus B of another type.

In the above (U) and (V), "no difference" means, for example, that the difference in pixel values at each coordinate of the captured images is within a predetermined range between the captured images.

If it is determined in step S7 that the correction of the processing conditions is appropriate, the wafer processing returns to step S1. On the other hand, if it is determined that the processing conditions are not appropriate, it is notified that the processing conditions cannot be corrected (step S8), the wafer processing ends, and the coating and developing processing for mass-production wafers W is stopped. The notification method may be, for example, a method using voice, a method using screen display, or the like.

Next, two examples of methods for creating a correlation model between the amount of change in RGB data in a captured image and the amount of change in processing conditions for unit processing A will be described.

The first correlation model is a correlation model between the amount of change in RGB data in a captured image and the processing rotation speed of the wafer W, that is, the rotation speed of the spin chuck 110, which is the processing condition of the resist film formation processing.

When creating this correlation model, the resist film forming apparatus 33 and the thermal processing apparatus for PAB used for creating the correlation model are selected from among the plurality of resist film forming apparatuses 33 and the plurality of thermal processing apparatuses 40 for PAB processing. The 40 combinations are determined according to user input or the like.

Also, the wafer W for correlation model creation is taken out from the cassette C on the cassette mounting table 12 and transported to the inspection device 51 . The wafer W for creating the correlation model is, for example, a bare wafer. After that, the wafer W is imaged by the imaging device 210 to obtain a captured image.

Next, the wafer W is transported to the resist film forming apparatus 33 determined according to the user's input, etc., and a resist film is formed under the initial setting conditions for creating the correlation model.

After that, the wafer W is transported to the heat treatment apparatus 40 for PAB processing determined according to the above-described user input, etc., and is subjected to the PAB processing under predetermined processing conditions.

Next, the wafer W is transported to the inspection device 52 and imaged by the imaging device 210 to obtain a captured image. Then, the wafer W is transferred to the cassette C on the cassette mounting table 12 .

The above steps are then repeated multiple times. However, the processing rotation speed of the wafer W in the process of forming the resist film is set to be different each time, and the process is repeated multiple times. As a result, a plurality of pieces of information about the processing rotation speed of the wafer W are obtained, and further, the captured image captured after processing at each processing rotation speed is obtained. Then, the difference in the RGB data of the captured image and the difference in the rotation speed of the wafer W when the captured image was obtained are calculated. From this calculation result, a correlation model is created that shows the correlation between the amount of change in the RGB data in the captured image and the amount of change in the processing rotation speed of the wafer W. FIG. Note that the difference in the RGB data of the captured image used for creating the correlation model is, for example, the difference in the average values of the RGB data of the captured image of the entire surface of the wafer W, and can be calculated based on the table described above.

The second correlation model is a correlation model that indicates the correlation between the amount of change in the RGB data in the captured image and the amount of change in the processing temperature of the hot plate 142, which is the processing condition of the PEB processing, for each of the regions R1 to R5.

When creating this correlation model, the combination of the resist film forming device 33, the thermal processing device 40 for PAB processing, the thermal processing device 40 for PEB processing, and the development processing device 30 used for creating the correlation model is input by the user. etc.

Also, the wafer W for correlation model creation is taken out from the cassette C on the cassette mounting table 12 and transported to the inspection device 51 . After that, the surface of the wafer W is imaged by the imaging device 210, and a captured image is obtained.

Next, the wafer W is transported to the resist film forming apparatus 33 determined according to the user's input, etc., and a resist film is formed under the initial setting conditions for creating the correlation model.

After that, the wafer W is transported to the heat treatment apparatus 40 for PAB processing determined according to the above-described user input, etc., and is subjected to the PAB processing under predetermined processing conditions.

Next, the wafer W is transferred to the exposure device 4 and exposed in a predetermined pattern.

After that, the wafer W is transported to the heat treatment apparatus 40 for PEB processing determined according to the above-described user input or the like, and is subjected to PEB processing. Next, the wafer W is transferred to the developing device 30 determined according to the user's input or the like, and developed.

Next, the wafer W is transported to the inspection device 52 and imaged by the imaging device 210 to obtain a captured image. Then, the wafer W is transferred to the cassette C on the cassette mounting table 12 .

The above steps are then repeated multiple times. However, the processing temperature of the hot plate 142 in the PEB processing step is set to be different each time, and the processing is repeated multiple times. As a result, a plurality of pieces of information about the processing temperatures of the regions R1 to R5 of the hot plate 142 are obtained, and further, captured images captured after the PEB processing is performed at each processing temperature are obtained. Then, for each of the regions R1 to R5, the difference in RGB data between captured images and the difference in processing temperature of the hot plate 142 when the captured image was obtained are calculated. Based on this calculation result, a correlation model is created that indicates the correlation between the amount of change in the RGB data in the captured image obtained from the result of imaging using the imaging device 210 and the amount of change in the processing temperature of the hot plate 142 for each of the regions R1 to R5. be. Note that the difference in RGB data between the captured images of the region R1 used for creating the correlation model is, for example, the difference in the average values of the RGB data of the captured images included in the position corresponding to the region R1. It can be calculated based on the table. The same applies to the difference in RGB data between captured images of regions R2 to R5.

According to this embodiment, the mass production wafer W is imaged only before and after the coating and developing process as a series of processes, and the presumed abnormal device A is specified based on the imaging results. In addition, using the presumed abnormality apparatus A, the unit processing A in the apparatus A is performed on the inspection wafer W under predetermined processing conditions, and before and after the unit processing A is performed, the inspection wafer W is imaged, and the imaging result is Based on this, it is determined whether or not there is an actual abnormality in the presumed abnormality device A. Then, based on the imaging result of the inspection wafer W, the processing conditions of the unit processing A are corrected for the presumed abnormal device A determined to actually have an abnormality. Therefore, in the substrate processing system 1 having a small number of imaging devices 210, the processing conditions can be corrected appropriately. In addition, since the number of times the imaging device is used is small, there is no waiting time for using the imaging device, and productivity is not impaired.

Further, according to the present embodiment, since the suitability of the correction in the process condition correction step is determined, the wafer W is not wasted due to the mass production process being performed after the process condition is erroneously set.

Further, according to the present embodiment, the captured images of the inspection wafer W before and after performing the unit processing A using the presumed abnormality apparatus A, and the inspection wafer before and after performing the unit processing using the processing apparatus A* of the same type. The presence or absence of an actual abnormality in the presumed abnormal device A is determined based on the captured image of W. Therefore, it is not necessary to create a reference image for actually determining the presence or absence of an abnormality, so productivity can be improved.

Furthermore, according to this embodiment, since a bare wafer is used as the inspection wafer W, the processing conditions can be corrected at low cost.

(Second embodiment)
FIG. 14 is an explanatory diagram showing the outline of the internal configuration of the substrate processing system 1a according to the second embodiment. FIG. 15 is a front view showing an outline of the internal configuration of the substrate processing system 1a.

In the first embodiment, the wafers W for inspection are housed in the cassette C on the cassette mounting table 12 . On the other hand, in this embodiment, as shown in FIG. 14, the substrate processing system 1a has a wafer accommodation part 401 that accommodates the wafer W for inspection. Therefore, since it is not necessary to store the inspection wafers W in the cassette C, the number of mass-produced wafers W to be mounted in the cassette can be increased. Incidentally, in this example, the wafer accommodation section 401 is provided on the side of the wafer transfer section 11 of the cassette station 2 .

The substrate processing system 1a also has a resist film stripping device 402 as a stripping device, as shown in FIG. Therefore, when the resist film is formed on the bare wafer as the inspection wafer W, the bare wafer can be reused by stripping the resist film from the inspection wafer W after imaging by the resist film stripping device 402. Cost can be reduced. In place of or in addition to the resist film stripping device 402, at least one of an intermediate layer film forming device for stripping the intermediate layer film and an underlayer film stripping device for stripping the underlayer film is provided. good too. The resist film forming apparatus 33 may be used to remove the resist film from the bare wafer without providing the resist film removing apparatus 402 .

When peeling a layered film such as a resist film from a bare wafer as the inspection wafer W, it is preferable to image the surface of the bare wafer with the imaging device 210 of the inspection device 51 or the inspection device 52 after the peeling. Then, based on the imaging result, the state of the surface of the bare wafer is checked, and if no layered film remains, the bare wafer is returned to the cassette C and reused. On the other hand, if the layered band remains, the wafer is re-transferred to a stripping device such as the resist film stripping device 402, and the stripping process is additionally performed. Thereafter, the stripping process is repeated until the layered strip is removed from the surface of the bare wafer.
In this way, even when a bare wafer is reused, since no layered film remains on the surface of the bare wafer, it is possible to appropriately correct the processing conditions.

It should be noted that a stripping device such as the resist film stripping device 402 may be provided even when bare wafers as inspection wafers W are stored in a cassette as in the first embodiment. In this case, the peeling device peels off the layered film from the bare wafer as the inspection wafer W, and the peeled bare wafer is returned to the cassette C for reuse. Also in this case, it is preferable to image the surface of the bare wafer with the imaging device 210 of the inspection device 51 or the inspection device 52 after peeling.

In the above description, the RGB data of the captured image are used as data correlated with the line width of the resist pattern and the film thickness of the resist film. Information is not limited to RGB data. Note that the color information is luminance information of light of a specific wavelength. The color information may be luminance information of any one of R, G, and B, or may be luminance information of colors other than R, G, and B.

Further, the substrate processing system of the above example is configured as a coating and developing system, and performs coating and developing processing as a series of processing. However, the technology according to the present disclosure includes a series of processes including film formation processing of a predetermined layered film such as a TiN film on the wafer W under a reduced pressure atmosphere and etching processing of the layered film on the wafer W under a reduced pressure atmosphere. It can also be applied to a substrate processing system that performs In this case, the processing condition correction method according to the present disclosure can be used to correct processing conditions in film formation processing under a reduced pressure atmosphere and correction of processing conditions in etching processing under a reduced pressure atmosphere.

It should be considered that the embodiments disclosed this time are illustrative in all respects and not restrictive. The embodiments described above may be omitted, substituted, or modified in various ways without departing from the scope and spirit of the appended claims.

Note that the following configuration also belongs to the technical scope of the present disclosure.
(1) A method for correcting processing conditions in a substrate processing system, comprising:
The substrate processing system includes
performing a series of processes in which the formation and removal of the layered film on the substrate are each performed one or more times, or one of which is performed multiple times;
A plurality of processing devices for performing unit processes constituting the series of processes are provided for each of the unit processes,
Furthermore, comprising an imaging device for imaging the substrate,
The method is
a monitoring imaging step of imaging each substrate with the imaging device before and after the series of processes is started and completed;
a device identifying step of identifying the processing device presumed to have an abnormality based on the imaging result of the monitoring imaging step and the information of the processing device used in the series of processes;
Using the processing apparatus specified in the apparatus specifying step, the unit processing in the processing apparatus is performed on a substrate for inspection under predetermined processing conditions, and the substrate for inspection is subjected to the above-mentioned process before and after performing the unit processing. an abnormality determination imaging step of imaging with an imaging device;
an abnormality presence/absence determination step of determining whether or not there is an actual abnormality in the processing device identified in the device identification step based on the imaging result of the abnormality determination imaging step;
Processing condition correction for correcting the processing conditions of the unit process in the processing apparatus determined to actually have an abnormality in the abnormality presence/absence determination step, based on the imaging result of the imaging step for abnormality determination. A processing condition correction method, comprising:
In the above (1), images are taken only before and after the series of processes are started, and a processing device presumed to have an abnormality is specified based on the imaged results. Also, using the specified processing apparatus, a unit process in the specified processing apparatus is performed on the inspection substrate under predetermined processing conditions, and based on the imaging result of imaging the inspection substrate, the specified processing apparatus Determine the presence or absence of an actual abnormality in Then, based on the imaging result of the inspection board, the processing conditions of the unit processing are corrected for the processing apparatus determined to actually have an abnormality. Therefore, it is possible to appropriately correct the processing conditions in a substrate processing system having a small number of imaging devices. In addition, since the number of times the imaging device is used is small, there is no waiting time for using the imaging device, and productivity is not impaired.

(2) Using the processing apparatus determined to actually have an abnormality in the abnormality presence/absence determination step, performing the unit processing in the processing apparatus on the substrate for inspection under the processing conditions after correction, The processing condition correction method according to (1) above, further comprising a correction adequacy determination step of capturing an image of the inspection substrate with the imaging device and determining appropriateness of the correction in the processing condition correction step based on the imaging result.

(3) using another processing apparatus that performs the same unit processing as the processing apparatus specified in the apparatus specifying step, performing the unit processing in the processing apparatus on a substrate for inspection under predetermined processing conditions; Before and after performing the unit processing, a comparison imaging step of imaging the inspection board with the imaging device,
The abnormality presence/absence determination step determines the presence/absence of the actual abnormality based on the imaging result of the abnormality determination imaging step and the imaging result of the comparison imaging step. ) processing conditions correction method described in.

(4) The processing condition correction method according to any one of (1) to (3), wherein the inspection substrate is a bare wafer.

(5) The processing condition correcting method according to (4), wherein the bare wafer is housed in the substrate processing system.

(6) The process condition correction method according to (4) or (5) above, wherein the layered film formed on the bare wafer is peeled off by a peeling device after the imaging by the imaging device.

(7) The processing condition correcting method according to (6), wherein the bare wafer after the separation is imaged by the imaging device.

(8) A substrate processing system for processing a substrate,
A series of processes in which a layered film is formed and removed from a substrate one or more times or either one of them is performed multiple times,
A plurality of processing devices for performing unit processes constituting the series of processes are provided for each of the unit processes,
Furthermore, an imaging device for imaging the substrate;
a first acquisition unit that acquires an imaging result of the imaging device before and after the series of processes for each substrate;
a device identifying unit that identifies the processing device that is presumed to have an abnormality based on the imaging result obtained by the first obtaining unit and information on the processing device used in the series of processes;
Using the processing device specified by the device specifying unit, the unit processing in the processing device is performed on the inspection substrate under predetermined processing conditions, and the inspection substrate before and after the unit processing is performed. a second acquisition unit that acquires an imaging result obtained by the imaging device;
an abnormality presence/absence determination unit that determines whether or not there is an actual abnormality in the processing device identified by the device identification unit based on the imaging result obtained by the second obtaining unit;
Processing conditions for correcting the processing conditions of the unit processing in the processing device that is actually determined to have an abnormality in the abnormality presence/absence determination step, based on the imaging result acquired by the second acquisition unit. and a substrate processing system.

1, 1a Substrate processing system 30 Developing device 31 Lower layer film forming device 32 Intermediate layer film forming device 33 Resist film forming device 40 Heat treatment device 210 Imaging device 300 Control unit 311 First acquisition unit 312 Device specifying unit 313 Second acquisition Unit 315 Abnormality presence/absence determination unit 316 Processing condition correction unit W Wafer

Claims (14)

A method for a substrate processing system, comprising:
a monitoring imaging step of imaging the substrate with an imaging device before and after a series of processes on the substrate;
One of a plurality of processing apparatuses configured to perform the series of processes in the substrate processing system and including at least one liquid processing apparatus and at least one heat treatment apparatus, one processing apparatus presumed to be abnormal, a device identifying step of identifying based on the initial imaging result in the monitoring imaging step and information on a plurality of processing devices used in the series of processes;
Using the one processing apparatus specified in the apparatus specifying step, a first step different from the series of processes is performed on the inspection substrate under predetermined processing conditions, and before and after performing the first step an abnormality determination imaging step of imaging the inspection substrate with the imaging device so as to obtain a first imaging result of the inspection substrate;
performing the second step on another substrate for inspection using another processing apparatus that performs a process of the same type as the processing apparatus identified in the apparatus identifying step, among the plurality of processing apparatuses; a comparison imaging step of imaging the different test substrate with the imaging device before and after performing the second step so as to obtain a second imaging result of the different test substrate;
The device specifying step based on the first imaging result of the inspection substrate acquired in the abnormality determination imaging step and the second imaging result of the another inspection substrate acquired in the comparison imaging step. and an abnormality determination step of determining whether or not there is an actual abnormality in the one processing apparatus specified in . For the one processing apparatus determined to actually have an abnormality in the abnormality presence/absence determination step, the one processing is performed based on the first imaging result of the inspection substrate acquired in the abnormality determination imaging step. a processing condition correction step of correcting the processing conditions of the apparatus;
In the abnormality presence/absence determination step, using the one processing apparatus determined to actually have an abnormality, a new process in the one processing apparatus is performed on a new inspection substrate under the corrected processing conditions, obtaining a third imaging result of the new inspection substrate by imaging the new inspection substrate with the imaging device; and based on the third imaging result of the new inspection substrate, in the processing condition correction step 2. The abnormality determination method according to claim 1, further comprising a correction adequacy determination step of determining whether the correction of is appropriate. In the first step of the abnormality determination imaging step, a processing device different from the one processing device is used in the series of processes,
In the second step of the imaging step for comparison, a processing device different from the another processing device is used in the series of processes,
2. The abnormality determination method according to claim 1, wherein said different processing device used in said first step and said different processing device used in said second step are the same processing device. 2. The abnormality determination method according to claim 1, wherein said inspection substrate is a bare wafer. 5. The abnormality determination method according to claim 4, wherein said bare wafer is housed in said substrate processing system. 5. The abnormality determination method according to claim 4, wherein the layered film formed on said bare wafer is peeled off by a peeling device after being imaged by said imaging device. 7. The abnormality determination method according to claim 6, wherein said bare wafer after said peeling is imaged by said imaging device. A substrate processing system,
A plurality of processing apparatuses including at least one liquid processing apparatus and at least one heat treatment apparatus, wherein a series of processes are performed to form and remove a layered film on a substrate one or more times or a plurality of times. the plurality of processing devices configured in
an imaging device for imaging the substrate;
a control unit;
The control unit
a monitoring imaging step of imaging the substrate with the imaging device before and after the series of processes on the substrate;
One of the plurality of processing devices that is presumed to be abnormal is selected based on the initial imaging result in the monitoring imaging step and information on the plurality of processing devices used in the series of processes. and a device identification step to identify
Using the one processing apparatus specified in the apparatus specifying step, a first step different from the series of processes is performed on the inspection substrate under predetermined processing conditions, and before and after performing the first step an abnormality determination imaging step of imaging the inspection substrate with the imaging device so as to obtain a first imaging result of the inspection substrate;
performing the second step on another substrate for inspection using another processing apparatus that performs a process of the same type as the processing apparatus identified in the apparatus identifying step, among the plurality of processing apparatuses; a comparison imaging step of imaging the different test substrate with the imaging device before and after performing the second step so as to obtain a second imaging result of the different test substrate;
The device specifying step based on the first imaging result of the inspection substrate acquired in the abnormality determination imaging step and the second imaging result of the another inspection substrate acquired in the comparison imaging step. and an abnormality presence/absence determination step of determining whether or not there is an actual abnormality in the one processing apparatus identified in (1). The control unit
For the one processing apparatus determined to actually have an abnormality in the abnormality presence/absence determination step, the one processing is performed based on the first imaging result of the inspection substrate acquired in the abnormality determination imaging step. a processing condition correction step of correcting the processing conditions of the apparatus;
In the abnormality presence/absence determination step, using the one processing apparatus determined to actually have an abnormality, a new process in the one processing apparatus is performed on a new inspection substrate under the corrected processing conditions, obtaining a third imaging result of the new inspection substrate by imaging the new inspection substrate with the imaging device; and based on the third imaging result of the new inspection substrate, in the processing condition correction step 9. The substrate processing system according to claim 8, further configured to perform a correction adequacy determination step of determining whether the correction of is appropriate. In the first step of the abnormality determination imaging step, a processing device different from the one processing device is used in the series of processes,
In the second step of the imaging step for comparison, a processing device different from the another processing device is used in the series of processes,
9. The substrate processing system according to claim 8, wherein said different processing apparatus used in said first step and said different processing apparatus used in said second step are the same processing apparatus. 9. The substrate processing system according to claim 8, wherein said inspection substrate is a bare wafer. 12. The substrate processing system of claim 11, wherein said bare wafer is housed within said substrate processing system. 12. The substrate processing system according to claim 11, wherein said layered film formed on said bare wafer is peeled off by a peeling device after imaging by said imaging device. 14. The substrate processing system according to claim 13, wherein said bare wafer after said peeling is imaged by said imaging device.

Images