JP2022114974A - 光学系、露光装置および物品製造方法 - Google Patents
光学系、露光装置および物品製造方法 Download PDFInfo
- Publication number
- JP2022114974A JP2022114974A JP2021011490A JP2021011490A JP2022114974A JP 2022114974 A JP2022114974 A JP 2022114974A JP 2021011490 A JP2021011490 A JP 2021011490A JP 2021011490 A JP2021011490 A JP 2021011490A JP 2022114974 A JP2022114974 A JP 2022114974A
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- Prior art keywords
- optical element
- supports
- optical system
- supported
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003287 optical effect Effects 0.000 title claims abstract description 252
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 230000007246 mechanism Effects 0.000 claims abstract description 97
- 239000000758 substrate Substances 0.000 claims description 17
- 230000004075 alteration Effects 0.000 claims description 11
- 238000005259 measurement Methods 0.000 claims description 5
- 238000012545 processing Methods 0.000 claims description 5
- 238000005286 illumination Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 13
- 230000001105 regulatory effect Effects 0.000 description 10
- 229920006324 polyoxymethylene Polymers 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 239000010409 thin film Substances 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 5
- 239000004677 Nylon Substances 0.000 description 4
- 229930182556 Polyacetal Natural products 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 229920001778 nylon Polymers 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/005—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration for correction of secondary colour or higher-order chromatic aberrations
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021011490A JP2022114974A (ja) | 2021-01-27 | 2021-01-27 | 光学系、露光装置および物品製造方法 |
| TW111100509A TW202230046A (zh) | 2021-01-27 | 2022-01-06 | 光學系統、曝光裝置以及物品製造方法 |
| KR1020220006331A KR20220108720A (ko) | 2021-01-27 | 2022-01-17 | 광학계, 노광 장치 및 물품 제조 방법 |
| CN202210076491.2A CN114815514A (zh) | 2021-01-27 | 2022-01-24 | 光学系统、曝光装置以及物品制造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021011490A JP2022114974A (ja) | 2021-01-27 | 2021-01-27 | 光学系、露光装置および物品製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2022114974A true JP2022114974A (ja) | 2022-08-08 |
Family
ID=82527074
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021011490A Pending JP2022114974A (ja) | 2021-01-27 | 2021-01-27 | 光学系、露光装置および物品製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2022114974A (ko) |
| KR (1) | KR20220108720A (ko) |
| CN (1) | CN114815514A (ko) |
| TW (1) | TW202230046A (ko) |
-
2021
- 2021-01-27 JP JP2021011490A patent/JP2022114974A/ja active Pending
-
2022
- 2022-01-06 TW TW111100509A patent/TW202230046A/zh unknown
- 2022-01-17 KR KR1020220006331A patent/KR20220108720A/ko active Search and Examination
- 2022-01-24 CN CN202210076491.2A patent/CN114815514A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN114815514A (zh) | 2022-07-29 |
| TW202230046A (zh) | 2022-08-01 |
| KR20220108720A (ko) | 2022-08-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231124 |