JP2022113921A - X-ray diffraction measurement apparatus and diffraction image width measurement method using x-ray diffraction measurement apparatus - Google Patents

Abstract

To provide an X-ray diffraction measurement apparatus capable of obtaining a diffraction image width that is not affected by the distance from an X-ray irradiation spot to a diffraction ring imaging surface and a collimator that emits X-rays.SOLUTION: The X-ray diffraction measurement apparatus includes means for detecting an irradiation spot-imaging plane distance L that is the distance from an X-ray irradiation spot to an imaging plane of a diffraction ring, and an X-ray emission diameter R and an X-ray divergence angle θh of a collimator emitting X-rays are stored in an arithmetic device. The arithmetic device calculates a normal diffraction image width including elements of the ratio to the irradiation spot-imaging plane distance L, excluding elements based on the size of the X-ray irradiation spot and elements based on the X-ray divergence angle θh from the detected diffraction image width W, using the detected irradiation spot-imaging plane distance L, the stored X-ray emission diameter R and X-ray divergence angle θh.SELECTED DRAWING: Figure 6

Description

The present invention provides an X-ray diffraction measurement apparatus for irradiating an object to be measured with X-rays and measuring the diffraction pattern width in the radial direction of a diffraction ring formed by the X-rays diffracted by the object to be measured, and the X-ray diffraction measurement. The present invention relates to a diffraction pattern width measuring method for detecting arithmetic numerical values necessary for measurement using an apparatus together with measurement of diffraction pattern width.

Conventionally, an object to be measured is irradiated with X-rays at a predetermined incident angle, and the X-rays diffracted by the object to be measured are received to capture an image of a diffraction ring, and the shape of the imaged diffraction ring is detected to detect cos α An X-ray diffraction measurement apparatus is known that performs analysis by a method and measures the residual stress of an object to be measured. For example, the X-ray diffraction measurement apparatus disclosed in Patent Document 1 includes an X-ray emitter, a diffraction ring imaging means such as an imaging plate, a diffraction ring reading means such as a laser detection device and a laser scanning mechanism, and an LED irradiator. Diffraction ring elimination means and the like are provided in one housing. Then, a position and attitude adjusting process for adjusting the position and attitude of the X-ray diffraction measurement device with respect to the object to be measured, and an imaging process for imaging the diffraction ring on the imaging plate using diffracted X-rays generated by irradiating the object to be measured with X-rays. , a reading step of detecting the shape of the diffraction ring by irradiating the imaging plate while scanning a laser beam from a laser detection device, and an erasing step of erasing the diffraction ring by irradiating LED light, The residual stress of the object to be measured can be measured by arithmetically processing the shape of the obtained diffraction ring. In addition to the residual stress, the properties of the object to be measured that can be measured from the diffraction ring imaged by the X-ray diffraction measurement device include surface hardness. For example, in Patent Document 2, the X-ray intensity distribution of the imaged diffraction ring is detected by performing the same process as in Patent Document 1, and half of the X-ray intensity distribution in the radial direction of the diffraction ring is detected over the entire circumference of the diffraction ring. X-ray for measuring the surface hardness of the object to be measured by detecting and averaging the value width and applying the obtained average value of the half value width to the relationship between the half value width and the surface hardness obtained in advance A diffractometer is shown.

When measuring the surface hardness of the object to be measured by the X-ray diffraction measurement device of Patent Document 2, the distance from the X-ray irradiation point of the object to be measured to the imaging surface where the diffraction ring is imaged (hereinafter, irradiation point-imaging surface ) and the collimator for emitting X-rays must match the values obtained when the relationship between the half width and the surface hardness is obtained.
The collimator is a through-hole through which X-rays pass. If expressed numerically, the diameter of the emitted X-rays (hereinafter referred to as the X-ray emission diameter) and the degree of spread of the emitted X-rays in the traveling direction (hereinafter referred to as the X-ray spread angle). The reason why it is necessary to match is that the half width varies depending on the distance between the irradiation point and the imaging surface, the X-ray emission diameter, and the X-ray divergence angle. Then, in order to set the value of the distance between the irradiation point and the imaging surface to a preset value, visible LED light is emitted on the same optical axis as the emitted X-rays, as shown in Patent Document 1, and irradiation of visible light is performed. The position of the visible light irradiation point on the captured image may be set to a predetermined position using the function of obtaining the captured image near the point. In addition, the relationship between the half-value width and the surface hardness is obtained for each collimator (fixture 18 in Patent Documents 1 and 2) after setting the distance between the irradiation point and the imaging surface to a set value, and the calculation of the surface hardness is performed. is stored in the computer device that performs the above, and when the collimator is changed, the identification information of the collimator can be input to the computer device.

Japanese Patent No. 5835191 Japanese Patent No. 6055970

However, the work of adjusting the position and posture of the X-ray diffraction measurement device with respect to the object to be measured so that the position of the visible light irradiation point on the photographed image is at a predetermined position may take time if the shape of the object to be measured is not constant. For example, when continuously measuring objects with uneven thickness flowing in a line, measurement efficiency decreases when measuring many objects with uneven shapes. There is a problem of getting worse. In addition, when there are many types of collimators in the X-ray diffraction measurement device, it takes time to obtain and store the relationship between the half-value width and the characteristic value such as the surface hardness for each collimator, resulting in poor work efficiency. There is also the problem of becoming This is not limited to the half-value width, but is the same for any width as long as it indicates the degree of spread of the X-ray intensity distribution in the radial direction of the diffraction ring. The width indicating the degree of spread of the intensity distribution is generically called the diffraction pattern width.

The present invention has been made to solve this problem, and its object is to irradiate an object to be measured with X-rays, and measure the width of the diffraction pattern in the radial direction of the diffraction ring formed by the X-rays diffracted by the object to be measured. Provided is an X-ray diffraction measurement apparatus capable of acquiring a diffraction image width (hereinafter referred to as normal diffraction image width) that is not affected by the distance between the irradiation point and the imaging surface or the collimator in the X-ray diffraction measurement apparatus to be measured. That's what it is. That is, there is no need to adjust the position and posture of the X-ray diffraction measurement device, and there is no need to obtain the relationship between the diffraction image width and the characteristic value such as surface hardness for each collimator, so the characteristic value can be efficiently measured. The object is to provide an X-ray diffraction measuring apparatus capable of achieving the above. Another object of the present invention is to provide a method for measuring the width of a diffraction pattern, which measures the width of the normal diffraction pattern and detects the arithmetic numerical value used in calculating the width of the normal diffraction pattern in the X-ray diffraction measurement apparatus.

In order to achieve the above object, X-ray emitting means for passing X-rays emitted from an X-ray tube through a through hole and emitting them toward an object to be measured; When an object is irradiated with X-rays, the diffracted X-rays generated at the X-ray irradiation point of the object to be measured are received by the imaging surface, and the X-rays in the radial direction of the diffraction ring formed by the diffracted X-rays Using the X-ray intensity distribution detecting means for detecting the intensity distribution and the X-ray intensity distribution detected by the X-ray intensity distribution detecting means, the diffraction image width, which is the width based on the X-ray intensity distribution in the radial direction of the diffraction ring, is determined. an X-ray diffraction measurement apparatus comprising a diffraction image width detecting means for detecting a diffraction image width, comprising a distance detecting means for detecting a distance between an irradiation point and an imaging surface, which is the distance from an X-ray irradiation point to an imaging surface, and detecting a diffraction image width; The means includes the irradiation point-imaging surface distance L detected by the distance detection means, the X-ray emission diameter R which is the diameter of the X-ray emitted by the X-ray emission means stored in advance, and the X-ray emitted by the X-ray emission means. Using the X-ray divergence angle θh, which is the degree of divergence in the traveling direction of the rays, the size of the X-ray irradiation point is determined from the diffraction image width W detected from the X-ray intensity distribution detected by the X-ray intensity distribution detecting means. and the element based on the X-ray divergence angle θh are removed, and the normal diffraction pattern width is calculated including the factor of the ratio to the distance L between the irradiation point and the imaging plane.

According to this, the diffraction image width W detected from the X-ray intensity distribution in the radial direction of the diffraction ring varies depending on the distance L between the irradiation point and the imaging surface, the X-ray exit diameter R, and the X-ray divergence angle θh. Diffraction image width detection means detects the detected diffraction image width W from the detected diffraction image width W using the irradiation point-imaging surface distance L detected by the distance detection means and the X-ray emission diameter R and the X-ray divergence angle θh stored in advance. By calculating the normal diffraction image width including the factor of the ratio to the distance L between the irradiation point and the imaging plane, while excluding the element based on the size of the X-ray irradiation point and the element based on the X-ray divergence angle θh, the irradiation point - It is possible to obtain a regular diffraction pattern width that is not affected by the distance L between imaging surfaces and the collimator (X-ray exit diameter R and X-ray divergence angle θh). That is, it is possible to eliminate the need to adjust the position and attitude of the X-ray diffraction measurement apparatus and obtain the relationship between the diffraction image width and the characteristic value such as surface hardness for each collimator.

Another feature of the present invention is that the diffraction image width detection means uses the irradiation point-imaging plane distance L detected by the distance detection means to determine the X-ray intensity distribution detected by the X-ray intensity distribution detection means. A first calculation step of detecting the diffraction pattern width W in units of angles with the X-ray irradiation point as the origin, the irradiation point-imaging surface distance L detected by the distance detection means, and the X-ray emission diameter stored in advance. Using R and the X-ray divergence angle θh, a second calculation step of calculating the diffraction pattern width based on the size of the X-ray irradiation point in units of angles with the X-ray irradiation point as the origin; a third calculation step of subtracting the diffraction pattern width based on the size of the X-ray irradiation spot in angular units and adding the X-ray divergence angle θh in angular units to obtain a normal diffraction pattern width; I did it.

According to this, it is possible to obtain a regular diffraction pattern width that is not affected by the irradiation point-imaging surface distance L and the collimator (X-ray emission diameter R and X-ray divergence angle θh) by simple calculation.

Another feature of the present invention is that it comprises incident angle detection means for detecting the X-ray incident angle on the object to be measured when the object to be measured is irradiated with X-rays from the X-ray emitting means, and a diffraction image is obtained. The width detection means detects the diffraction image width W in units of angle for each rotation angle of the diffraction ring in the first calculation step, and detects the incident angle for each rotation angle of the diffraction ring in the second calculation step. Also using the X-ray incident angle detected by means, a diffraction pattern width based on the size of the X-ray irradiation spot is calculated in units of angles, and in a third calculation step, normalized for each rotation angle of the diffraction ring A diffraction pattern width is calculated and a plurality of normal diffraction pattern widths obtained are averaged.

According to this, even if part of the diffracted X-rays are obstructed due to the object being measured having a complicated shape, etc., and the entire circumference of the diffraction ring cannot be formed, the regular diffraction image width can be obtained with high accuracy. can ask. As shown in Patent Document 2 of the prior art document, when the X-ray is incident on the object to be measured from a direction other than perpendicular, the diffraction image width W changes with respect to the circumferential direction (rotation angle) of the diffraction ring. Although the amplitude of the change curve varies depending on the X-ray incident angle, the average value of the diffraction image width W for each rotation angle over the entire circumference of the diffraction ring is constant regardless of the X-ray incident angle. In other words, the value obtained by averaging the diffraction pattern width W for each rotation angle over the entire circumference of the diffraction ring is obtained by making the X-ray incident on the object to be measured from the vertical direction, and diffracting the diffraction image width with respect to the rotation angle of the diffraction ring. This value is equal to the diffraction pattern width W when W is kept unchanged. Therefore, if the normal diffraction image width is calculated using the average value of the diffraction image width W for each rotation angle over the entire circumference of the diffraction ring, the change in the diffraction image width W with respect to the rotation angle of the diffraction ring can be ignored. can. However, if the diffraction ring cannot be formed around the entire circumference, it becomes impossible to average the diffraction image width W for each rotation angle over the entire circumference of the diffraction ring. Even in such a case, the normal diffraction image width can be obtained with high accuracy by calculating the normal diffraction image width for each rotation angle of the diffraction ring and averaging the obtained normal diffraction image widths.

Another feature of the present invention is visible light emitting means for emitting visible parallel light having the same optical axis as the X-ray emitted by the X-ray emitting means, and irradiation of the visible light emitted from the visible light emitting means. a camera having an imaging lens that forms an image of an object to be measured in an area including points, and an imaging device that takes an image formed by the imaging lens, and outputs a signal representing the imaged image; When the imaging lens receives the reflected light of visible light emitted by the visible light emitting means and the image pickup device receives the reflected light, the size of the light receiving point in the captured image created from the signal output by the image pickup device is detected. Then, by applying the size of the light-receiving point to the relationship between the size of the light-receiving point stored in advance, the X-ray emission diameter R, and the X-ray divergence angle θh, the X-ray emission used for calculation by the diffraction pattern width detection means and a calculation numerical value determination means for determining the diameter R and the X-ray divergence angle θh.

According to this, when the collimator of the X-ray diffraction measuring device is replaced, if the standard sample is measured by the X-ray diffraction measuring device without inputting the identification information of the collimator, the numerical value determination means for calculation can determine the light receiving point. Since the X-ray emission diameter R and the X-ray divergence angle .theta.h, which are the characteristics of the collimator, are determined as values to be used for calculation from the size, it is possible to prevent forgetting to input them. When the collimator of the X-ray diffraction measurement device is replaced, a standard sample is measured to confirm that the measured values are normal. At that time, as shown in Patent Document 1 of the prior art document, visible light is emitted by the visible light emitting means before measurement, the vicinity of the irradiation point of the visible light is photographed by the camera, and the irradiation point and the irradiation point in the photographed image The position and orientation of the X-ray diffraction measurement apparatus with respect to the object to be measured are adjusted so that the position of the light-receiving point generated by the reflected light of the visible light on the photographed image is the set position. Since the size of the light receiving point on the photographed image at this time varies depending on the collimator, that is, the through hole of the X-ray emitting means, If the sizes are associated with each other and stored, the X-ray emission diameter R and the X-ray divergence angle θh used for calculation can be determined from the size of the light receiving point.

Another feature of the present invention is that the X-ray emitted from the X-ray tube passes through the through-hole and is emitted toward the object to be measured, and the X-ray emission means performs measurement. When an object is irradiated with X-rays, the diffracted X-rays generated at the X-ray irradiation point of the object to be measured are received by the imaging surface, and the X-ray in the radial direction of the diffraction ring formed by the diffracted X-rays Using the X-ray intensity distribution detection means for detecting the X-ray intensity distribution and the X-ray intensity distribution detected by the X-ray intensity distribution detection means, the diffraction image width which is the width based on the X-ray intensity distribution in the radial direction of the diffraction ring and a distance detection means for detecting the distance between the X-ray irradiation point and the image pickup surface, which is the distance from the X-ray irradiation point to the image pickup surface. From the diffraction image width W detected by the width detection means, the X-ray emission diameter R, which is the diameter of the X-rays emitted by the X-ray emission means, and the degree of spread of the X-rays emitted by the X-ray emission means in the traveling direction, X Using the line divergence angle θh, the element based on the size of the X-ray irradiation point and the element based on the X-ray divergence angle θh are removed, and the normal diffraction image width including the element of the ratio to the distance between the irradiation point and the imaging plane In the diffraction pattern width measurement method for measuring, the X-ray diffraction measurement device is operated at each of at least three irradiation point-imaging plane distances, and from at least three X-ray intensity distributions obtained on the same measurement object, at least three a measurement step of detecting two diffraction image widths W and detecting at least three distances L between the irradiation point and the imaging surface by distance detection means; , from at least three equations established by substituting at least three diffraction image widths W and at least three irradiation point-imaging surface distances L into the equations established by the X-ray emission diameter R and the X-ray divergence angle θh, The diffraction pattern width measuring method comprises the steps of calculating the X-ray emission diameter R and the X-ray divergence angle θh, which are unknown quantities, and calculating the normal diffraction pattern width.

According to this, the diffraction image width W of the same measurement object is measured with an X-ray diffraction measurement device at least three irradiation point-imaging surface distances L, and the normal diffraction image width is calculated only by performing arithmetic processing. It is possible to obtain the X-ray emission diameter R and the X-ray divergence angle θh necessary for , and also to obtain the normal diffraction pattern width of the measured object.

Further, if the X-ray diffraction measurement apparatus is provided with incident angle detection means for detecting the X-ray incident angle on the object to be measured when the object to be measured is irradiated with X-rays from the X-ray emitting means, By changing the diffraction pattern width measurement method described above, the X-ray diffraction measurement device is operated at each of at least two irradiation point-imaging plane distances, and at least two X-ray intensity distributions obtained on the same measurement object are: The diffraction image width W is detected from the vicinity of the rotation angles of 0° and 180° of the diffraction ring, the distance detection means detects at least two irradiation point-imaging surface distances L, and the incident angle detection means detects at least two distances. Established by the measurement step of detecting the X-ray incident angle θx, the diffraction image width W, the distance L between the irradiation point and the imaging surface, the X-ray incident angle θx, the normal diffraction image width, the X-ray exit diameter R, and the X-ray divergence angle θh From at least four equations established by substituting at least four diffraction image widths W, at least two irradiation point-imaging surface distances L, and incident angles θx into the equations, the unknown X-ray emission diameter R and A diffraction pattern width measuring method may be provided that includes a calculation step of calculating the X-ray divergence angle θh and calculating the normal diffraction pattern width.

According to this, the diffraction image width W of the same measurement object is measured with an X-ray diffraction measurement device at least two irradiation point-imaging surface distances L, and the normal diffraction image width is calculated only by performing arithmetic processing. It is possible to obtain the X-ray emission diameter R and the X-ray divergence angle θh necessary for , and also to obtain the normal diffraction pattern width of the measured object.

1 is an overall schematic diagram showing an X-ray diffraction measurement system including an X-ray diffraction measurement device according to an embodiment of the present invention; FIG. FIG. 2 is an enlarged view of the X-ray diffraction measurement apparatus of FIG. 1; 3 is a partial cross-sectional view showing an enlarged X-ray emission mechanism portion in the X-ray diffraction measurement apparatus of FIG. 2; FIG. FIG. 4 is an enlarged perspective view showing a portion of FIG. 3 that emits visible LED light having the same optical axis as that of emitted X-rays. FIG. 4 is a diagram showing how the position of a visible light irradiation point in an image captured by a camera of an X-ray diffraction measurement device changes depending on the distance between the irradiation point and the imaging surface. The half-value width W of the diffraction ring is divided into the elements of the half-value width Wp due to the diameter of the X-ray irradiation point, the half-value width Wh due to the X-ray divergence angle θh, and the half-value width Wc due to the characteristics of the measurement object, and the X-ray is emitted. It is the figure which exaggerated and showed the diameter R and the X-ray divergence angle (theta)h. The half-value width Wp due to the diameter of the X-ray irradiation point and the half-value width Wh due to the X-ray divergence angle θh are excluded from the half-value width W of the diffraction ring in FIG. 4 is a diagram conceptually showing a state; FIG. FIG. 4 is a diagram showing a change curve of the half-value width with respect to the circumferential direction (rotational angle) of the diffraction ring for each X-ray incident angle; 7 is a diagram similar to FIG. 6 showing the half width W of the diffraction ring at 0° and 180° when X-rays are incident at an incident angle θx; FIG. FIG. 10 is a diagram showing the vicinity of the X-ray irradiation point in FIG. 9 only with incident X-rays and diffracted X-rays directed toward the vicinity of 180° of the diffraction ring. FIG. 10 is a diagram showing the vicinity of the X-ray irradiation point in FIG. 9 only with incident X-rays and diffracted X-rays directed toward the vicinity of 0° of the diffraction ring. It is a figure which shows a mode that the missing part generate|occur|produces in a diffraction ring by the shape of a measuring object. A diagram for theoretically explaining that the change curve of the half-value width with respect to the circumferential direction of the diffraction ring becomes a sine curve. It is the figure seen from the normal line direction (solid line) of an object. It is a diagram for theoretically explaining that the change curve of the half-value width with respect to the circumferential direction of the diffraction ring becomes a sine curve, and is an enlarged view of the X-ray irradiation point as seen from the direction parallel to the X-axis. This is a diagram for theoretically explaining that the change curve of the half-value width with respect to the circumferential direction of the diffraction ring becomes a sine curve. It is a diagram showing. A diagram for theoretically explaining that the change curve of the half-value width with respect to the circumferential direction of the diffraction ring becomes a sine curve. FIG. 4 is a diagram shown by coordinates;

A configuration of an X-ray diffraction measurement system including an X-ray diffraction measurement apparatus according to an embodiment of the present invention will be described with reference to FIGS. 1 to 5. FIG. Note that this X-ray diffraction measurement system differs from the X-ray diffraction measurement system disclosed in Patent Document 1 of the prior art document, and the point related to the invention of the present application is that the calculation executed by the controller 91 of the computer device 90 The only difference is that the program has a new calculation program, and the external configuration of the X-ray diffraction measurement system has nothing to do with the present invention. However, since the X-ray diffraction measurement apparatus of the present embodiment is based on the X-ray diffraction measurement apparatus developed by the applicant of the present application to reduce the size of the X-ray diffraction measurement apparatus disclosed in Patent Document 1, There are some points that are different from the X-ray diffraction measurement apparatus shown in Patent Document 1 in points that are not directly related to the invention. Furthermore, since the X-ray diffraction measurement system of the present embodiment is a system for continuously measuring the surface hardness and residual stress of the measurement object OB flowing in the line, the X-ray diffraction measurement system shown in Patent Document 1 is also used in this respect. There are some points that are different from the measurement system. In the following, portions having the same functions and structures as those of the X-ray diffraction measurement system disclosed in Patent Document 1 will be simply described as being the same, and different portions will be described in detail. do.

As shown in FIGS. 1 and 2, this X-ray diffraction measurement system comprises an X-ray diffraction measurement device 1, a computer device 90, a high voltage power supply 95, an arm-type moving device (only the tip 51 is shown), and a transport device. be. In this X-ray diffraction measurement system, each time an object to be measured OB placed on the stage St of the transport device at predetermined intervals comes directly under the X-ray diffraction measurement device 1, the X-ray diffraction measurement device 1 The surface hardness and residual stress of the measurement object OB are measured by irradiating it with X-rays. The method of measuring the surface hardness is to image the diffraction ring with diffracted X-rays generated by X-ray irradiation, read the imaged diffraction ring, and obtain the half width of the X-ray intensity distribution curve in the radial direction of the diffraction ring in advance. The surface hardness is obtained by applying it to the relationship between the half-value width and the surface hardness stored in the controller 91, as shown in Patent Document 2 of the prior art document. The characteristic point of the invention of the present application is that the normal The point is that after calculating the half-value width, it is applied to the stored relationship between the normal half-value width and the surface hardness to obtain the surface hardness. 1 and 2, the X-axis direction, the horizontal direction (moving direction of the stage St) as the Y-axis direction, and the vertical direction as the Z-axis direction.

As shown in FIGS. 1 and 2, the X-ray diffraction measurement apparatus 1 includes an X-ray tube 10, a table 16 for mounting an imaging plate 15, a table driving mechanism 20 for rotating and moving the table 16, and a diffraction ring. A laser detection device 30 or the like for detecting is provided. The X-ray diffraction measurement apparatus 1 is connected to the X-ray tube 10, the table drive mechanism 20 and the laser detection device 30 in the housing 50, and is used for controlling their operations and for inputting detection signals. Various circuits are also built in, and the various circuits enclosed by the two-dot chain lines shown outside the housing 50 in FIG. These various circuits are connected to the computer device 90 and operate according to commands input from the controller 91 of the computer device 90 . The computer device 90 has an input device 92 and a display device 93, and by input from the input device 92 and the operation of the installed program, commands are output to the various circuits described above, and the various circuits output commands. Enter data and store in memory. Further, as shown in FIG. 1, the X-ray diffraction measurement system includes a high voltage power supply 95, and the high voltage power supply 95 outputs to the X-ray tube 10 voltage and current for the X-ray tube 10 to emit X-rays. . These configurations are the same as the X-ray diffraction measurement system shown in Patent Document 1.

As shown in FIG. 2, the housing 50 of the X-ray diffraction measurement apparatus 1 includes a bottom wall 50a, a front wall 50b, a rear wall 50e, a top wall 50f, a side wall (not shown), a bottom wall 50a and a front wall 50b. A notch wall 50c and a connecting wall 50d provided so as to cut out the corners from the front side to the back side of the paper surface, and a sloped wall 50g provided so as to eliminate the corners of the rear wall 50e and the upper wall 50f is formed in The notch wall 50c is composed of a flat plate forming a predetermined angle with respect to the bottom wall 50a and a flat plate substantially parallel to the bottom wall 50a, and the connecting wall 50d is perpendicular to the side walls and has a predetermined angle with the front wall 50b. ing. This predetermined angle is, for example, 30 to 40 degrees, and since the X-rays emitted from the X-ray diffraction measurement apparatus 1 are substantially parallel to the front wall 50b and the side walls, the connecting wall 50d is arranged parallel to the stage St. By adjusting the posture of the housing 50 of the X-ray diffraction measurement apparatus 1, the X-ray incident angle with respect to the measurement object OB becomes equal to this predetermined angle. The notch wall 50c has a circular hole 50c1, and X-rays are emitted through the circular hole 50c1 when imaging the diffraction ring. image is captured.

A controller 91 of the computer device 90 is an electronic control device whose main part is a microcomputer having a CPU, a ROM, a RAM, a large-capacity storage device, and the like. The stored program is executed to control the operation of the X-ray diffraction measurement apparatus 1, and the input digital data is used to perform calculations to calculate characteristic values such as surface hardness. The controller 91 also displays the measurement conditions input from the input device 92, the operation status of the X-ray diffraction measurement system, the characteristic values obtained as a result of calculation, the distribution map, and the like on the display device 93. FIG. The configuration and functions of the computer device 90 are the same as those of the X-ray diffraction measurement system disclosed in Patent Document 1.

As shown in FIGS. 1 and 2, the X-ray tube 10 is fixed in the upper part of the housing 50 so as to extend in the horizontal direction. This fixation is performed by fitting the side surface of the X-ray tube 10 into a groove shaped as a part of the cylindrical side surface formed in the plate-like plate 26 of the table driving mechanism 20, which will be described later. It is done on the ground. When the X-ray tube 10 receives a high voltage from the high voltage power supply 95, the X-ray tube 10 emits X-rays downward in the drawing from a circular emission port 11 formed on its side surface. As shown in FIG. 3, a through-hole 26a is formed in the plate-like plate 26 at a location that is aligned with the exit port 11, and the X-rays emitted from the exit port 11 travel downward through the through-hole 26a. When a command is input from the controller 91, the X-ray control circuit 71 adjusts the drive current and drive voltage supplied from the high voltage power supply 95 to the X-ray tube 10 so that the X-ray tube 10 emits X-rays of constant intensity. Control. The X-ray tube 10 also includes a cooling device (not shown), and the X-ray control circuit 71 also controls drive signals supplied to this cooling device.

As shown in FIG. 2 , the table driving mechanism 20 is fixed to the housing 50 and has a moving stage 21 below the X-ray tube 10 . A convex portion is provided on the opposite side of the moving stage 21, and this convex portion fits into grooves in the block 19 fixed to the plate-like plate 26 of the table driving mechanism 20 and the plate-like guide 25 fixed to the block 29. are in agreement. As a result, the moving stage 21 is movable only in the direction of the groove in the plate-shaped guide 25, and the feed motor 22 fixed to the block 19, the screw rod 23, and the bearing 24 fixed to the block 29 rotate. to move. This moving direction is the direction of the central axis of the X-ray tube 10 , or in other words, the direction perpendicular to the optical axis of the emitted X-rays and parallel to the side walls of the housing 50 . An encoder 22a is incorporated in the feed motor 22, and when the feed motor 22 rotates, the encoder 22a outputs a pulse train signal to the position detection circuit 72 and the feed motor control circuit 73 shown in FIG.

The position detection circuit 72 and the feed motor control circuit 73 are operated by commands from the controller 91, and the position detection circuit 72 counts the pulse train signal from the encoder 22a, thereby detecting the movement, which is the movement distance with the movement limit position as the origin. The position is output to feed motor control circuit 73 and controller 91 . Further, the feed motor control circuit 73 outputs drive signals to the feed motor 22 until the movement position input from the controller 91 becomes equal to the movement position input from the position detection circuit 72 . Further, when the moving direction and moving speed are input from the controller 91, the feed motor control circuit 73 controls the intensity of the drive signal so that the moving speed calculated from the pulse train signal from the encoder 22a becomes the input moving speed. With these functions of the position detection circuit 72 and the feed motor control circuit 73, the controller 91 outputs commands to move the moving stage 21 and the spindle motor 27 integrated with the moving stage 21, the table 16, the imaging plate 15, and the like. moves to the diffraction ring imaging position, the diffraction ring reading position, and the diffraction ring erasing position, and moves in the movement direction designated by the controller 91 at the movement speed designated. These functions are the same as those of the X-ray diffraction measurement system shown in Patent Document 1.

When the moving stage 21 is at the diffraction ring imaging position by a command from the controller 91, as shown in FIG. advances in the direction of the rotating plate 45 . As will be described later, the rotary plate 45 is connected to the output shaft 46a of the motor 46, and changes its position as the motor 46 rotates. can do. In this state, the X-rays passing through the through hole 26 a are incident on the through hole 21 a formed in the moving stage 21 . The X-rays incident on the through-hole 21 a pass through a through-hole 28 a of a passage member 28 fixed to the tip of a through-hole 27 b formed in a spindle motor 27 fixed to the moving stage 21 . A through-hole 27a1 is formed in the output shaft 27a of the spindle motor 27, and the through-hole 27b is connected to the through-hole 27a1 with its center axis aligned. Therefore, the X-rays passing through the through-hole 28a pass through the through-hole 27b and the through-hole 27a1.

The table 16 is disk-shaped, and is fixed to the output shaft 27a of the spindle motor 27 so that the through hole 16a formed in the central axis thereof is aligned with the through hole 27a1 of the output shaft 27a of the spindle motor 27. As shown in FIG. The table 16 has a projecting portion 17 projecting downward from the central portion of the lower surface around the central axis, and a screw thread is formed on the outer peripheral surface of the projecting portion 17 . The imaging plate 15 is attached to the lower surface of the table 16 so that the projection 17 is fitted into the through hole 15a, and the imaging plate 15 is fixed to the table 16 by screwing a nut-shaped fixture 18 onto the outer peripheral surface of the projection 17. be done. The projecting portion 17 is also formed with a through hole 17a so as to be aligned with the through hole 27a1 and the through hole 16a. ing. Therefore, the X-rays passing through the through-hole 27b and through-hole 27a1 pass through the through-hole 16a, through-hole 17a and through-hole 18a, become substantially parallel X-rays, and exit from the circular hole 50c1 of the housing 50. . As described above, the structure in which the X-rays emitted from the X-ray tube 10 pass through the group of through-holes and are emitted is the same as that of the X-ray diffraction measurement apparatus disclosed in Japanese Unexamined Patent Application Publication No. 2002-200013. Note that the through hole 18a of the fixture 18 corresponds to a collimator, and replacing the collimator means replacing the fixture 18 .

An encoder 27c is incorporated in the spindle motor 27, and the encoder 27c outputs a pulse train signal to the spindle motor control circuit 74 and the rotation angle detection circuit 75 shown in FIG. Furthermore, the encoder 27c outputs an index signal to the rotation angle detection circuit 75 and the controller 91 each time the spindle motor 27 rotates once. When the spindle motor control circuit 74 receives a rotation speed input from the controller 91, it outputs a drive signal to the spindle motor 27 so that the rotation speed calculated from the pulse train signal input from the encoder 27c becomes the input rotation speed. Further, the rotation angle detection circuit 75 sets the rotation angle to 0 at the timing when the index signal is input from the encoder 27 c , calculates the rotation angle from the pulse number of the pulse train signal input after that, and outputs the rotation angle to the controller 91 . As a result, the table 16 rotates at a designated rotational speed according to a command from the controller 91 , and rotation angle data is input to the controller 91 . These functions are the same as those of the X-ray diffraction measurement system shown in Patent Document 1. The position of the imaging plate 15 at a rotation angle of 0° is irradiated with a laser beam when an index signal is input when reading a diffraction ring imaged on the imaging plate 15 by laser irradiation from a laser detection device 30, which will be described later. This position is a line because it is at each radial position of the imaging plate 15 . In the movement of the moving stage 21, the central axis of the imaging plate 15 is maintained within the plane formed by the optical axis of the emitted X-rays and the line of the imaging plate 15 with a rotation angle of 0°. Move perpendicular to the axis. Hereinafter, the plane formed by the optical axis of the emitted X-ray and the line of the imaging plate 15 with a rotation angle of 0° will be referred to as a reference plane. The reference plane is the YZ plane in FIG.

As shown in FIG. 1, the laser detection device 30 is controlled by a laser detection control circuit 77 to irradiate the imaging plate 15 with an image of the diffraction ring with a laser beam. The intensity of the diffracted X-rays at the position is detected. When the moving stage 21 is moved to the diffraction ring reading position by a command from the controller 91 and the spindle motor 27 and the feed motor 22 start rotating, a command is input from the controller 91 to the laser detection control circuit 77 . controls the laser detection device 30 such as laser light emission, intensity control of the emitted laser light, focus control of the laser light irradiation point on the imaging plate 15, and output of the emission intensity of the imaging plate 15 to the controller 91. conduct. The structure of the laser detection device 30 is the same as that of the X-ray diffraction measurement system shown in Patent Document 1 of the prior art document, and the function of the laser detection control circuit 77 is the same as that of Patent Document 1. In the X-ray diffraction measurement system disclosed in Patent Document 1, the laser detection control circuit 77 is divided into several circuits for each control described above. After outputting commands to the laser detection control circuit 77, the spindle motor control circuit 74, and the feed motor control circuit 73, the controller 91 transmits the data of the emission intensity input from the laser detection control circuit 77 to the position detection circuit 72 and the rotation angle detection. It is captured at the same timing as the digital data output by the circuit 75 . As a result, the intensity data of the diffracted X-rays in the imaged diffraction ring are accumulated in the controller 91 together with the movement distance data and the rotation angle data. This is the diffraction ring reading function, and this function is the same as the X-ray diffraction measurement system disclosed in Patent Document 1.

2, the laser detection device 30 is provided with an LED light source 43. The LED light source 43 is controlled by the LED driving circuit 84 shown in FIG. Erase the imaged diffraction ring. After the diffraction ring is read, when the moving stage 21 returns to a predetermined position while the table 16 continues to rotate according to a command from the controller 91 and resumes movement, a command is input from the controller 91 to the LED driving circuit 84 to drive the LED. A circuit 84 outputs a drive signal for causing the LED light source 43 to emit visible light of a predetermined intensity. This is the diffraction ring elimination function, and this function is also the same as that of the X-ray diffraction measurement system disclosed in Patent Document 1.

As shown in FIG. 3, the moving stage 21 has a motor 46 attached to its surface facing the plate-like plate 26, and the motor 46 has a rotary plate 45 attached to its output shaft 46a. FIG. 4 is an enlarged perspective view of the motor 46 and the rotary plate 45. As shown in FIG. The LED light source 44 is attached so that when the rotating plate 45 is rotated by the rotation of the motor 46 until the rotating plate 45 hits the stopper 47a, the intersection of the central axes of the through holes 26a and 21a and the rotating plate 45 becomes the center. . The LED light source 44 emits visible light when a drive signal is input from the LED drive circuit 85 shown in FIG. be done. Thereby, the optical axis of the emitted X-rays and the irradiation point of the X-rays can be grasped as the optical axis and the irradiation point of the visible light. Further, when the rotating plate 45 rotates until it hits the stopper 47b due to the rotation of the motor 46, there is nothing between the through hole 26a and the through hole 21a. incident on. The motor 46 rotates in directions D1 and D2 shown in FIG. 5 by a drive signal from the motor control circuit 86 shown in FIG. Then, until the pulse train signal from the encoder 46b of the motor 46 is no longer input, a driving signal for rotating in the input rotation direction is output. Also, the LED driving circuit 85 outputs a driving signal to the LED light source 44 when a command from the controller 91 is input. Thereby, the rotational position of the rotating plate 45 and visible light irradiation from the LED light source 44 are controlled by the controller 91 . The structure and control method for irradiating visible light on the same optical axis as the emitted X-ray are the same as those of the X-ray diffraction measurement system disclosed in Patent Document 1, except for the mounting location of the motor 46 .

As shown in FIGS. 1 and 2, a camera CA is attached to the notch wall 50c of the housing 50. As shown in FIG. The camera CA is composed of a lens barrel to which an imaging lens 48 is attached and an imaging device 49 , and the imaging device 49 is provided at a position where an image is formed by the imaging lens 48 . The imaging device 49 is composed of a CCD photodetector or a CMOS photodetector, and outputs to the sensor signal extraction circuit 88 a signal having an intensity corresponding to the intensity of light received by each imaging element. The camera CA functions as a digital camera that captures an image of an area around the visible light irradiation point on the measurement object OB located at a reference position with respect to the imaging plate 15 . The reference position with respect to the imaging plate 15 is a position where the distance from the irradiation point of visible light to the imaging plate 15 (that is, the distance between the irradiation point and the imaging surface) is a reference value. In this case, the depth of field by the image forming lens 48 and the image pickup device 49 is set in a range before and after the irradiation point. The sensor signal extraction circuit 88 outputs the signal intensity data for each imaging element of the imaging device 49 to the controller 91 together with data indicating the position of each imaging element (that is, the pixel position) or in order of the position of each imaging element. The controller 91 uses the input signal strength data to display the captured image on the display device 93 . This camera function is the same as that of the X-ray diffraction measurement system disclosed in Patent Document 1.

When the controller 91 inputs a position and orientation adjustment command from the input device 92, the controller 91 issues a command to the motor control circuit 86 to rotate the motor 46 in the D1 direction, outputs a visible light emission command to the LED drive circuit 85, and furthermore An operation start command is output to the sensor signal extraction circuit 88 . As a result, the object to be measured OB is irradiated with visible light whose optical axis is the same as that of the emitted X-rays. A photographed image created from the photographed image data is displayed. The operator places an object OB to be measured having a reference thickness on the stage St, and while viewing the photographed image, adjusts the visible light irradiation point and the visible light receiving point on the photographed image to the reference positions to be described later. , the position and attitude of the X-ray diffraction measurement apparatus 1 are adjusted using the arm-type moving device. This adjustment method is the same as the X-ray diffraction measurement system disclosed in Patent Document 1, except that the position and orientation of the X-ray diffraction measurement apparatus 1 are adjusted instead of adjusting the position and orientation of the object to be measured OB. is.

The size of the visible light receiving point on the captured image varies depending on the inner diameter of the collimator (the through hole 18a of the fixture 18), ie, the X-ray emission diameter R and the X-ray divergence angle θh. The memory of the controller 91 stores the identification information of the fixture 18, the X-ray emission diameter R, and the X-ray divergence angle θh in association with the size of the visible light receiving point. When a position and attitude adjustment command is input from the input device 92, the controller 91 outputs the command as described above, and then receives visible light when the irradiation point and the light reception point of the visible light come to the reference positions on the captured image. The size of the point is detected, applied to the above stored relationship, the corresponding identification information of the fixture 18, the X-ray emission diameter R and the X-ray divergence angle θh are selected, and the selected X-ray emission diameter R and the X-ray divergence angle .theta.h match the X-ray emission diameter R and the X-ray divergence angle .theta.h used in calculations described later. If they match, the controller 91 does nothing, but if they are different, after displaying the difference on the display device, the X-ray emission diameter R and the X-ray divergence angle θh used for calculation are set. Change to your choice. The identification information of the fixture 18 can be input by the operator from the input device 91, and the X-ray emission diameter R and the X-ray divergence angle θh to be used for calculation are also applied to the above stored relationships. can be determined. However, even if the operator forgets to input the identification information of the fixture 18 after changing the fixture 18, if the position and posture of the X-ray diffraction measurement apparatus 1 are adjusted, the data can be used for the calculation described later. The X-ray exit diameter R and the X-ray divergence angle θh can be justified. A method of detecting the X-ray emission diameter R and the X-ray divergence angle θh for each fixture 18 will be described later.

In addition, since the measurement objects OB placed on the stage St have different thicknesses, the X-ray diffraction measurement device 1 is fixed after the position and posture of the X-ray diffraction measurement device 1 are adjusted. The irradiation point-imaging plane distance differs for each measurement object OB. The controller 91 has a function of calculating the distance between the irradiation point and the imaging surface from the input photographed image data. This is performed by detecting the position of the visible light irradiation point on the photographed image and applying it to the previously stored relationship between the position of the visible light irradiation point on the photographed image and the distance between the irradiation point and the imaging surface. FIG. 5 is a diagram showing the position of the surface of the measurement object OB and the position of the visible light irradiation point on the photographed image in comparison. As shown in FIG. 5, when the surface of the object to be measured OB is at a position where the distance between the irradiation point and the imaging surface is the reference value, the position of the visible light irradiation point on the captured image is the center position of the captured image (that is, reference position), but if the distance between the irradiation point and the imaging plane becomes smaller than this, the position of the visible light irradiation point on the captured image moves upward, and if it becomes larger, the visible light irradiation on the captured image The position of the point moves downward. That is, there is a one-to-one relationship between the position of the visible light irradiation point on the captured image and the distance between the irradiation point and the imaging surface. , the distance between the irradiation point and the imaging plane can be detected. The relationship between the position of the visible light irradiation point on the photographed image and the distance between the irradiation point and the imaging surface is obtained after detecting the position of the visible light irradiation point on the photographed image with the stress-free measurement object OB coated with metal powder. , can be obtained by irradiating X-rays, capturing an image of the diffraction ring on the imaging plate 15, and measuring the diameter of the imaged diffraction ring. In this case, the angle between the optical axis of the emitted X-ray and the diffracted X-ray forming the diffraction ring (180°-diffraction angle) is known from the material of the metal. It can be calculated from the diameter.

As shown in FIGS. 1 and 2, an edge detection sensor 60 for detecting the tip of the measurement object OB is attached near the side surface of the stage St. The edge detection sensor 60 detects the edge of the object to be measured OB based on whether or not the laser beam is received in the vicinity of the side surface on the opposite side of the stage St. Upon receiving the laser beam, it outputs a signal with a predetermined intensity, If there is no light reception, there is no signal output. The edge detection circuit 61 is integrated with the edge detection sensor 60, and when the intensity of the signal input from the edge detection sensor 60 becomes 0 from a predetermined intensity after an operation command is input from the controller 91, it means "front edge detection". A signal is output to the controller 91. The line detected by the edge detection sensor 60 (the optical axis of the laser beam on the opposite side) is located at a position that intersects the optical axis of the emitted X-ray. A command is output to the LED driving circuit 85 and the sensor signal extracting circuit 88, and the distance between the irradiation point and the imaging surface is detected at regular time intervals, as described above. Further, the moving speed of the stage St is inputted in advance to the controller 91, and the distance from the tip of the object to be measured OB is detected when the distance between the irradiation point and the imaging surface is detected by time measurement by the built-in timer. be able to. As a result, the controller 91 can acquire the surface profile of the measurement object OB and detect the incident angle of visible light (equal to the X-ray incident angle) at the visible light irradiation point. The incident angle of visible light (X-ray incident angle) is not used for the calculation of the normal half width and the calculation of the surface hardness, which will be described later, but is used for the calculation of the residual stress measured at the same time.

A controller (not shown) of the transport device that moves the stage St also receives the "front end detection" signal from the edge detection circuit 61, and the controller of the transport device starts measuring time after the signal is input by the built-in timer. When the time to be measured has passed a preset time, the movement of the stage St is stopped and the timer is stopped to reset the time. Furthermore, it outputs a signal of “stop moving” to the controller 91 . As a result, the position of the visible light (X-ray) irradiation point on the measurement object OB from the tip of the measurement object OB is always constant, and the controller 91 can start X-ray diffraction measurement. Further, when the horizontal length of the object to be measured OB is input, the controller of the transport device calculates the time required to move half the input length, and sets that time as the set time. As a result, the visible light (X-ray) irradiation point of the measurement object OB, that is, the measurement point is always the center of the measurement object OB. Note that the end of the surface profile of the object to be measured OB acquired by the controller 91 is the measurement point, but since the surface profile of the object to be measured OB up to that point is obtained, the incident angle (X line incidence angle) can be detected.

Various circuits in the computer device 90 and the X-ray diffraction measurement device 1 when sequentially measuring the surface hardness and residual stress of the measurement object OB placed on the stage St by operating the X-ray diffraction measurement system are described below. will be explained, and in the explanation, the calculation method for calculating the normal half-value width, which is the characteristic point of the present invention, will be explained. The position and orientation of the X-ray diffraction measurement apparatus 1 are determined by placing the measurement object OB having the reference thickness on the stage St, irradiating visible LED light as described above, and obtaining a visible image on the captured image of the camera CA. Assume that the light irradiation point and the light receiving point have already been adjusted by adjusting the reference positions. First, the operator inputs the lateral length of the object to be measured OB to the controller of the conveying device and then inputs the start of operation, and also inputs the start of measurement from the input device 92 . As a result, the controller 91 outputs commands to various circuits in the X-ray diffraction measurement apparatus 1 and the edge detection circuit 61, brings the table drive mechanism 20 to the diffraction ring imaging position, and rotates the rotary plate 45 to the end in the D1 direction. Then, when the "tip detection" signal is input from the edge detection circuit 61, a command is output to the LED drive circuit 85 and the sensor signal extraction circuit 88 to acquire the surface profile of the measurement object OB as described above, When a "stop movement" signal is input from the controller of the transport device, the distance between the irradiation point and the imaging surface and the X-ray incident angle at the end of the obtained surface profile of the object to be measured OB are calculated and stored. Next, a command to stop operation is output to the LED drive circuit 85 and the sensor signal output circuit 88, a command is output to the motor control circuit 86 to rotate the rotating plate 45 to the end of the D2 direction, and the spindle motor control circuit 74 and the rotation A command is output to the angle detection circuit 75 to set the rotation angle of the imaging plate 15 to 0°, and a command is output to the X-ray control circuit 71 to cause the X-ray tube 10 to emit X-rays.

As a result, a diffraction ring is imaged on the imaging plate 15 by the diffracted X-rays generated by the measurement object OB. The controller 91 has a time measuring function, and measures the elapsed time after outputting a command to the X-ray control circuit 71 . When the elapsed time reaches a preset time, a command is output to the X-ray control circuit 71 to stop the X-ray emission from the X-ray tube 10 . After that, the controller 91 outputs commands to various circuits in the X-ray diffraction measurement device 1 to move the imaging plate 15 to the diffraction ring reading position, and irradiate the laser light from the laser detection device 30 while rotating and moving. input the digital data output by various circuits. The diffraction ring imaged on the imaging plate 15 is thereby read, and this is the same as the X-ray diffraction measurement system shown in the prior art document US Pat. The reading of the diffraction ring is to input and store the X-ray intensity data together with the position data (rotational angle data and radius data) on the imaging plate 15 into the controller 91. By processing the input data, the diffraction ring can be read. A radial X-ray intensity distribution curve can be obtained, and the half width can be calculated from this curve. Since the diffraction ring is a circle, there are many directions in the radial direction. average the half-value width of . There is a one-to-one relationship between the half-value width and the surface hardness of the object to be measured OB. By storing this relationship in advance, the surface hardness of the object to be measured OB can be calculated from the half-value width. . However, since the value of the half-value width varies depending on the distance between the irradiation point and the imaging surface, the X-ray emission diameter R, and the X-ray divergence angle θh, the calculated half-value width is used to determine the irradiation point detected before the X-ray diffraction measurement. Using the distance between the imaging planes and the X-ray emission diameter R and the X-ray divergence angle θh stored in the controller 91, the half-value width that is not affected by the distance between the irradiation point and the imaging plane and the collimator, in other words, the measurement object After calculating the normal half-value width, which is the half-value width based only on the OB characteristics, the surface hardness is calculated.

A method for calculating the normal half-value width will be described below. FIG. 6 shows the half-value width W of the imaged diffraction ring when looking at the measurement object OB and the imaging plate 15 in a cross section including the optical axis of the emitted X-ray, divided into half-value widths for each element. It is a diagram. In FIG. 6, all half-value widths are shown as half-value widths on only one side from the center line of the diffracted X-rays forming the diffraction ring, and the actual half-value widths are both twice this value. , the half-value width of only one side is shown for the sake of clarity, since it should be uniformly doubled. As shown in FIG. 6, the half-value width W is divided into the half-value width Wp due to the diameter of the X-ray irradiation point, the half-value width Wh due to the spread of the emitted X-rays, and the half-value width Wc due to the characteristics of the measurement object OB. The half-value width Wp is the half-value width when it is assumed that the diffracted X-rays forming the diffraction ring from each portion of the X-ray irradiation point are all generated at the same angle θd with respect to the optical axis of the emitted X-rays. Since the emitted X-ray spreads, the half-value width Wh is equal to the incident angle of the X-ray with respect to the measurement object OB at the outer peripheral portion of the X-ray irradiation point, and the angle of the diffracted X-ray forming the diffraction ring with respect to the optical axis of the emitted X-ray is This is the half-value width that is reduced from the half-value width Wp by the decrease. The half-value width Wc is the normal half-value width and is a value to be calculated. As can be seen from FIG. 6, by subtracting the half-value width (Wp-Wh) from the detected half-value width W, the normal half-value width Wc, which is the half-value width due to the characteristics of the object to be measured OB, can be obtained. can. FIG. 7 is a diagram visually showing the case where the half-value width (Wp−Wh) is subtracted from the detected half-value width W to obtain only the normal half-value width Wc. is to set the cross-sectional diameter of emitted X-rays to be the half-value width when the measured object OB is irradiated with the X-rays and the diffraction ring is imaged.

However, as can be seen from FIG. 7, the value of the normal half-value width Wc also varies depending on the distance L between the irradiation point and the imaging surface. There is a need. In order to calculate the normal half-value width that does not depend on the distance L between the irradiation point and the imaging surface, the normal half-value width including the factor of the ratio to the distance L between the irradiation point and the imaging surface can be used. The normal half width should be calculated in units of . That is, the angle indicated by θw in FIG. 7 should be calculated. A method of calculating the normal half width θw in angular units will be described below. The data obtained by reading the imaged diffraction ring is a data group in which the diffraction X-ray intensity, the rotation angle and the radius value are set as one data as described above, but the radius value is tan ⁻¹ {radius value/ (Irradiation point-imaging surface distance L)}, the radius value can be the value of the angle formed with the optical axis of the emitted X-rays. By detecting the half-value width W from this data, the half-value width W can be obtained in units of angles. The half-value width W in units of length is W=Wp−Wh+Wc as described above, but the half-value width W in units of angles is represented by Equation 1 below from FIG.
(Number 1)
W=tan ⁻¹ {(Wp·cos θd)/D} −θh +θw
θw is the normal half-value width in angle units, θh is the angle unit of the half-value width Wh, and this angle is the angle of incidence of the X-rays on the measurement object OB in the outer peripheral portion of the X-ray irradiation point, and the X-ray divergence angle θh. tan ⁻¹ {(Wp·cos θd)/D} is the angular unit of the half width Wp, and D in this formula is the distance from the X-ray irradiation point to the point where the diffraction ring is imaged. As can be seen from FIG. 6, the half width Wp is equal to the diameter of the X-ray irradiation point, and the diameter of the X-ray irradiation point is the difference between the X-ray emission diameter R and the diameter of the X-ray irradiation point due to the spread of the emitted X-rays. This is the value obtained by adding the increment F. Therefore, Wp=F+R, and the increment F of the diameter of the X-ray irradiation point can be expressed as F=L·tan θh using the X-ray divergence angle θh and the distance L between the irradiation point and the imaging surface. Also, as can be seen from FIG. 6, the distance D can be D=L/sin θd. Therefore, Equation 1 can be transformed into Equation 2 below.
(Number 2)
W=tan ⁻¹ {(R+L·tan θh)·cos θd·sin θd}/L}−θh+θw
The following Equation 3 is obtained by converting Equation 2 into an equation with the normal half width θw on the left side.
(Number 3)
θw=W−tan ⁻¹ {(R+L·tan θh)·cos θd·sin θd}/L}+θh

In Equation 3, if the material of the object OB to be measured is known, θd is (180°-diffraction angle), which is a known value. Further, the distance L between the irradiation point and the imaging plane and the half width W in units of angle are values detected as described above. Therefore, if the X-ray emission diameter R and the X-ray divergence angle θh are stored in the memory of the controller 91 and the values used for calculation are selected, the normal half width θw in angular units is calculated using Equation 3. be able to. The X-ray emission diameter R and the X-ray divergence angle θh used for calculation are determined by the operator inputting the identification information of the fixture 18 from the input device 92 as described above, or by the controller 91 determining the light receiving point of the reflected light in the captured image. is selected by detecting the size of A method of detecting the X-ray emission diameter R and the X-ray divergence angle θh for each fixture 18 to be stored in the memory of the controller 91 will be described later.

After calculating the normal half-value width θw, the controller 91 applies the calculated normal half-value width θw to the previously stored relationship between the normal half-value width θw and the surface hardness of the object to be measured OB. Calculate the surface hardness of In addition, the residual stress of the object to be measured OB is calculated from the shape of the diffraction ring, which is a shape connecting the peak points of the X-ray intensity distribution curve in the radial direction of the diffraction ring. is the same as the X-ray diffraction measurement system shown in . The controller 91 displays the obtained characteristic values such as the surface hardness and residual stress of the object OB to be measured on the display device 93 together with the measurement conditions and a map based on the intensity distribution of the diffracted X-rays. Display the pass/fail judgment by comparing with the value. Further, the controller 91 performs the above-described calculation and displays the result on the display device 93, and at the same time erases the diffraction ring imaged on the imaging plate 15. FIG. This diffraction ring elimination method is also the same as the X-ray diffraction measurement system disclosed in Patent Document 1 of the prior art document. After the diffraction ring is erased, the controller 91 returns the imaging plate 15 to the diffraction ring imaging position, sets the rotation angle to 0°, rotates the rotation plate to the end in the D1 direction, and outputs a signal indicating "measurement end". Output to the transport device controller. As a result, the controller of the transport device resumes movement of the stage St. After that, the above-described operation is repeated, the measurement object OB placed on the stage St is measured one after another, and the results are displayed on the display device 93 . Then, when the operation is finished, a command to stop the measurement is input from the input device 92, and the operation stop is input to the controller of the conveying device.

In the above description of the method for calculating the normal half-value width θw, it is assumed that the X-rays are irradiated perpendicularly to the object to be measured OB as shown in FIGS. As shown in , the object to be measured OB is irradiated with X-rays at an incident angle near the set incident angle, and the X-ray incident angle is obtained by measuring the surface profile of the object to be measured OB before X-ray diffraction measurement, as described above. detected. When X-rays are irradiated onto the object to be measured OB at a certain incident angle and the image of the diffraction ring is captured on the imaging plate 15, the half width of the diffraction ring with respect to the circumferential direction (rotational angle) changes as shown in FIG. , the degree of this change increases as the X-ray incident angle increases. However, if the half-value widths detected at equal intervals in the circumferential direction of the diffraction ring are averaged, the average half-value widths will be the same value regardless of the X-ray incident angle if the conditions other than the X-ray incident angle are the same. . In other words, the half-value width is constant in the circumferential direction (rotation angle) of the diffraction ring when X-rays are irradiated perpendicularly to the measurement object OB. Even such a value is equal to this constant half-value width. Although this has been confirmed by actual measurements, it can be proved theoretically, and this proof will be described later. Therefore, for the average value of the half-value width over the entire circumference of the diffraction ring, the explanation of the calculation method of the normal half-value width θw performed assuming that the X-rays are irradiated perpendicularly to the measurement object OB holds true. .

In the proof described later, it is also proved that the change curve of the half width with respect to the circumferential direction (rotational angle) of the diffraction ring is a sine curve. Therefore, in the above description, the half-value width is averaged at equal intervals in the circumferential direction of the diffraction ring. It is also possible to use a method of calculating an equation of a sine curve that is closest to the width change curve, and then calculating the value of the center line of the sine curve as the average value of the half-value width. This calculation method is effective when the diffraction ring cannot be formed over the entire circumference due to the characteristics, shape, or the like of the object to be measured OB.

In the X-ray diffraction measurement system described above, the X-ray emission diameter R and the X-ray divergence angle θh are stored in the memory of the controller 91, and these values are used in calculating the normal half width θw. , the X-ray emission diameter R and the X-ray divergence angle θh will be described below. This method can also be applied as a method for measuring the normal half-value width θw when the X-ray emission diameter R and the X-ray divergence angle θh are unknown. It will be explained as a method of measurement.

In this method, the operator places one measurement object OB for measuring the normal half width θw on the stage St, but does not operate the transport device and does not move the stage St. Then, the operator inputs a command from the input device 92, irradiates the visible LED light from the X-ray diffraction measurement system as described above, operates the camera CA, and looks at the photographed image displayed on the display device 93. The position and posture of the X-ray diffraction measuring apparatus 1 are adjusted by moving the arm type moving device while holding the position. When the adjustment is completed, an instruction is input from the input device 92 to obtain the distance L between the irradiation point and the imaging surface, and an instruction to start measurement is input from the input device 92 to perform the X-ray diffraction measurement as described above. Obtain the average value of the half-value width in the circumferential direction of the diffraction ring. This is performed for three values L1, L2, and L3 of the distance L between the irradiation point and the imaging surface.

Assuming that W1, W2, and W3 are the average values of the half-value widths in angular units at the distances L1, L2, and L3 between the irradiation point and the imaging plane, the X-ray emission diameter R and the X-ray divergence angle can be obtained by calculation using these values. By calculating θh, the normal half width θw can also be calculated. The calculation method will be described in order below. Equations 2 are established for the half widths W1, W2, and W3 in angular units at the distances L1, L2, and L3 between the irradiation point and the imaging plane. Then, the following three equations can be obtained by transforming the equations of Equation 2.
(Number 4)
tan(W1−θw+θh)/cosθd·sinθd=R/L1+tanθh
(Number 5)
tan(W2−θw+θh)/cosθd·sinθd=R/L2+tanθh
(Number 6)
tan(W3-θw+θh)/cosθd·sinθd=R/L3+tanθh
By subtracting and transforming Equation 5 from Equation 4, Equation 7 below is obtained.
(Number 7)
R = {L1 · L2 / (L2 - L1)} · {tan (W1 - θw + θh) / cos θd · sin θd - tan (W2 - θw + θh) / cos θd · sin θd}
Also, by subtracting and transforming Equation 6 from Equation 5, Equation 8 below is obtained.
(Number 8)
R = {L2 · L3 / (L3 - L2)} · {tan (W2 - θw + θh) / cos θd · sin θd - tan (W3 - θw + θh) / cos θd · sin θd}
By subtracting Eq. 8 from Eq. 7, Eq. 9 below is obtained.
(Number 9)
0={L1 L2/(L2−L1)}・{tan (W1−θw+θh)/cos θd・sin θd−tan (W2−θw+θh)/cos θd・sin θd}−{L2・L3/(L3−L2)}・{tan(W2−θw+θh)/cosθd·sinθd−tan(W3−θw+θh)/cosθd·sinθd}

In Equation 9, the distances L1, L2, L3 between the irradiation point and the imaging plane and the half widths W1, W2, W3 are obtained, and θd is (180°-diffraction angle), which is a known value. Therefore, the unknowns are θw and θh, but if (θw-θh) is regarded as one variable, the only variable in Equation 9 is (θw-θh). Therefore, (θw-θh) can be obtained by changing (θw-θh) in Expression 9 and calculating (θw-θh) at which the right side converges to 0. Then, by substituting the obtained (θw−θh) into Equation 7 or Equation 8, the X-ray emission diameter R can be obtained. By substituting in Equation 6, tan θh can be obtained, and from this, the X-ray divergence angle θh can be obtained. Since (θw-θh) has already been obtained, the normal half width θw can also be obtained.

The method of detecting the X-ray emission diameter R, the X-ray divergence angle θh, and the normal half width θw described above can be modified if the X-ray incident angle with respect to the measurement object OB can be detected. The X-ray incident angle can be detected by moving the stage St and detecting the surface profile of the measurement object OB as described above. Another method for detecting the X-ray emission diameter R and the X-ray divergence angle θh and calculating the normal half width θw will be described below. In this method, the operator places one measurement object OB for measuring the normal half-value width θw on the stage St, inputs a command from the input device 92, Visible LED light is irradiated, the camera CA is operated, and the arm-type moving device is moved while viewing the photographed image displayed on the display device 93 to adjust the position and attitude of the X-ray diffraction measurement device 1 . When the adjustment is completed, the transport device is operated to move the stage St, a command is input from the input device 92, and the distance L between the irradiation point and the imaging surface is obtained at regular intervals, thereby obtaining the surface profile of the measurement object OB. is obtained, and the distance L between the irradiation point and the imaging surface at the measurement point and the X-ray incident angle are detected. Thereafter, the operator inputs a command to start measurement from the input device 92, performs the X-ray diffraction measurement as described above, and obtains the half-value width near the rotation angles of 180° and 0° of the diffraction ring. This is performed for two values L1 and L2 of the distance L between the irradiation point and the imaging surface. Calculations are performed using the half widths W1′, W1″, W2′, and W2″ near the rotation angles of 180° and 0° of the diffraction ring thus obtained to obtain the X-ray emission diameter R and the X-ray divergence angle By calculating θh, the normal half width θw can also be calculated. The calculation method will be described in order below.

The half-value widths W′ and W″ near the rotation angle of 180° and 0° of the diffraction ring when the X-ray is incident at the incident angle θx are different as shown in FIG. 9. FIG. It is a diagram showing only diffracted X-rays formed around 180° of the diffraction ring by enlarging the vicinity. The value is obtained by subtracting the length of B from the diameter (R + F) of .As can be seen from Fig. 10, B = A tan θd and A = (R + F) tan θx, so the size of the X-ray irradiation point The half-value width Wp' due to the height is given by the following equation (10).
(Number 10)
Wp′=(R+F)·(1−tan θd·tan θx)
In Equation 10, (1−tan θd·tan θx) is a known value, so if this is Ka, then Wp′=Ka·(R+F). Substituting this equation for Wp in Equation 1 and substituting F=L·tan θh and D=L/sin θd yields Equation 11 below.
(Number 11)
W′=tan ⁻¹ {Ka·(R+L·tan θh)·cos θd·sin θd}/L}−θh+θw

FIG. 11 is a diagram showing only the diffracted X-rays formed near the 0° diffraction ring by enlarging the vicinity of the X-ray irradiation point. The value width Wp'' is a value obtained by adding the length of d to the diameter (R+F) of the X-ray irradiation point. As can be seen from FIG. Therefore, the half-value width Wp″ due to the diameter of the X-ray irradiation point is given by the following equation (12).
(Number 12)
Wp"=(R+F)·(1+tan θd·tan θx)
In Equation 12, (1+tan θd·tan θx) is a known value, so if this is Kb, then Wp″=Kb·(R+F). By substituting D=L/sin θd, the following Equation 13 holds.
(Number 13)
W′=tan ⁻¹ {Kb·(R+L·tan θh)·cos θd·sin θd}/L}−θh+θw

Substituting the half widths W1′, W1″, W2′, W2″ near the rotation angles of 180° and 0° of the diffraction ring obtained at the distances L1 and L2 between the irradiation point and the imaging plane into Equations 11 and 13, The transformation yields the following four equations. Since the X-ray incident angle θx differs between the irradiation point and the imaging surface distances L1 and L2, Ka and Kb also differ. Ka' and Kb' are set when the inter-surface distance is L2.
(number 14)
tan(W1′−θw+θh)/Ka·cos θd·sin θd=R/L1+tan θh
(Number 15)
tan(W1″-θw+θh)/Kb·cos θd·sin θd=R/L1+tan θh
(Number 16)
tan(W2′−θw+θh)/Ka′·cos θd·sin θd=R/L2+tan θh
(number 17)
tan(W2″-θw+θh)/Kb′cos θd sin θd=R/L2+tan θh
By subtracting and transforming Equation 16 from Equation 14, Equation 18 below is obtained.
(Number 18)
R={L1 L2/(L2−L1)}・{tan(W1′−θw+θh)/Ka・cosθd・sinθd−tan(W2′−θw+θh)/Ka′・cosθd・sinθd}
Also, by subtracting and transforming Equation 17 from Equation 15, Equation 19 below is obtained.
(Number 19)
R={L1 L2/(L2−L1)}・{tan(W1″−θw+θh)/Kb・cosθd・sinθd−tan(W2″−θw+θh)/Kb′・cosθd・sinθd}
By subtracting Equation 19 from Equation 18, Equation 20 below is obtained.
(number 20)
0={L1 L2/(L2−L1)}・{tan(W1′−θw+θh)/Ka・cosθd・sinθd−tan(W2′−θw+θh)/Ka′・cosθd・sinθd}−{L1・L2/ (L2−L1)}・{tan(W1″−θw+θh)/Kb・cosθd・sinθd−tan(W2″−θw+θh)/Kb′・cosθd・sinθd}

In Equation 20, the distances L1 and L2 between the irradiation point and the imaging plane, the half-value widths W1′, W1″, W2′, and W2″ are the values to be detected, θd is (180°−diffraction angle), A known value. Also, Ka, Kb, Ka', and Kb' are values determined when the X-ray incident angle .theta.x is detected. Therefore, the unknowns are θw and θh, but if (θw-θh) is regarded as one variable, there is only one variable (θw-θh) in Equation (20). Therefore, (θw-θh) can be obtained by changing (θw-θh) in Equation 20 and calculating (θw-θh) at which the right side converges to 0. Then, by substituting the obtained (θw−θh) into Equation 18 or Equation 19, the X-ray emission diameter R can be obtained. 17, tan .theta.h can be obtained, and from this, the X-ray divergence angle .theta.h can be obtained. Since (θw-θh) has already been obtained, the normal half width θw can also be obtained.

As can be understood from the above description, in the above embodiment, the X-rays emitted from the X-ray tube 10 pass through the through-holes 26a, 21a, 28a, 27b, 27a1, 16a, 17a, 18a and reach the object. and diffraction generated at the X-ray irradiation point of the object to be measured OB when the object to be measured OB is irradiated with X-rays by the X-ray emitting means A program installed in the laser detection device 30, the laser detection control circuit 77, and the controller 91 for receiving X-rays at the imaging plate 15 and detecting the X-ray intensity distribution in the radial direction of the diffraction ring formed by the diffracted X-rays. etc., and the X-ray intensity distribution detected by the X-ray intensity distribution detecting means, the half width, which is the width based on the X-ray intensity distribution in the radial direction of the diffraction ring, is detected. In an X-ray diffraction measurement system equipped with half-value width detection means consisting of an arithmetic program installed in a controller 91, the distance between the irradiation point and the imaging plane, which is the distance from the X-ray irradiation point to the imaging plate 15, is detected. The LED light source 44, the camera CA, the sensor signal extraction circuit 88, and the distance detection means including programs installed in the controller 91 are provided. L, X-ray emission diameter R, which is the diameter of X-rays emitted by the X-ray emission means, and X-ray divergence angle θh, which is the degree of expansion of X-rays emitted by the X-ray emission means in the direction of travel, which are stored in advance. the element based on the size of the X-ray irradiation point and the element based on the X-ray divergence angle θh are removed from the half width W detected from the X-ray intensity distribution detected by the X-ray intensity distribution detecting means, The normal half-value width θw including the factor of the ratio with respect to the distance L between the irradiation point and the imaging surface is calculated.

According to this, the half width W detected from the X-ray intensity distribution in the radial direction of the diffraction ring changes depending on the distance L between the irradiation point and the imaging surface, the X-ray exit diameter R, and the X-ray divergence angle θh. A half-value width detection means uses the distance L between the irradiation point and the imaging surface detected by the distance detection means, the X-ray emission diameter R and the X-ray divergence angle θh stored in advance, and from the detected half-value width W Excluding the element based on the size of the X-ray irradiation point and the element based on the X-ray divergence angle θh, and calculating the normal half width including the element of the ratio to the distance L between the irradiation point and the imaging plane, the irradiation point - It is possible to obtain a normal half width θw that is not affected by the distance L between imaging surfaces and the collimator (X-ray exit diameter R and X-ray divergence angle θh). That is, it is not necessary to adjust the position and posture of the X-ray diffraction measurement apparatus 1, and it is necessary to obtain the relationship between the half width and the characteristic value such as surface hardness for each collimator (through hole 18a of the fixture 18). can be prevented.

Further, in the above-described embodiment, the half-value width detection means uses the distance L between the irradiation point and the imaging plane detected by the distance detection means to determine the half-value width from the X-ray intensity distribution detected by the X-ray intensity distribution detection means. A first calculation step of detecting the width W in units of angles with the X-ray irradiation point as the origin, the irradiation point-imaging surface distance L detected by the distance detection means, the X-ray emission diameter R stored in advance, and A second calculation step of calculating, using the X-ray divergence angle θh, the half-value width based on the size of the X-ray irradiation point in units of angles with the X-ray irradiation point as the origin; and a third calculation step of subtracting the half-value width based on the size of the X-ray irradiation point in units and adding the X-ray divergence angle θh in units of angles to obtain the normal half-value width θw. ing.

According to this, by a simple calculation, it is possible to obtain a normal half value that is not affected by the distance L between the irradiation point and the imaging surface and the collimator (X-ray diameter R and X-ray divergence angle θh) that is the through hole 18a of the fixture 18. width can be obtained.

In the above-described embodiment, the visible light emitting means including the LED light source 44, the rotating plate 45, the LED driving circuit 85, and the like for emitting visible parallel light having the same optical axis as the X-ray emitted by the X-ray emitting means. , an imaging lens 48 that forms an image of the object to be measured OB in an area including the irradiation point of the visible light emitted from the visible light emitting means, and an imaging device 49 that picks up the image formed by the imaging lens 48. and a camera CA that outputs a signal representing a captured image, and an image forming lens 48 receives the reflected light of visible light emitted by the visible light emitting means and the image pickup device 49 receives the reflected light. , the size of the light receiving point in the photographed image created through the sensor signal extracting circuit 88 is detected from the signal output from the image pickup device 49, and the size of the light receiving point is compared with the size of the light receiving point stored in advance. A program installed in the controller 91 for determining the X-ray emission diameter R and the X-ray divergence angle θh used for calculation by the half-value width detection means by applying to the relationship between the diameter R and the X-ray divergence angle θh. A calculation numerical value determination means is provided.

According to this, when the fixture 18 of the X-ray diffraction measurement apparatus 1 is replaced, even if the identification information of the fixture 18 is not input, if the standard sample is measured by the X-ray diffraction measurement system, numerical values for calculation can be determined. Since the means determines the X-ray emission diameter R and the X-ray divergence angle θh, which are the characteristics of the collimator, from the size of the light-receiving point as values to be used for calculation, it is possible to prevent forgetting to input.

Further, in the above embodiment, the half-value width measuring method for measuring the normal half-value width θw when the X-ray emission diameter R and the X-ray divergence angle θh are unknown in the X-ray diffraction measurement system configured as described above is provided. , operate the X-ray diffraction measurement system at each of at least three irradiation point-imaging plane distances, and detect at least three half widths W from at least three X-ray intensity distributions obtained at the same measurement object OB. In addition, a measuring step of detecting at least three irradiation point-imaging plane distances L by a distance detection means, a half width W, an irradiation point-imaging plane distance L, a normal half width θw, an X-ray emission diameter R, and From at least three equations established by substituting at least three half widths W and at least three irradiation point-imaging plane distances L into the equation established by the X-ray divergence angle θh, the unknown X-ray emission diameter A calculation step of calculating the R and the X-ray divergence angle θh and calculating the normal half width θw.

According to this, the normal half-value width θw It is possible to obtain the X-ray emission diameter R and the X-ray divergence angle θh necessary for calculating , and also obtain the normal half width θw of the measured object OB.

Further, in the above embodiment, the X-ray diffraction measurement system detects the X-ray incident angle on the measurement object OB when the X-ray emission means irradiates the measurement object OB with distance detection. Since it is provided with an incident angle detection means consisting of a program installed in means, a conveying device, and a controller 91, the half width measurement method described above is changed, and at least two distances between the irradiation point and the imaging plane , operating the X-ray diffraction measurement system, and detecting the half width W from the vicinity of the rotation angles of 0 ° and 180 ° of the diffraction ring in at least two X-ray intensity distributions obtained in the same measurement object OB, and a measuring step of detecting at least two distances L between the irradiation point and the imaging surface by distance detection means and detecting at least two X-ray incident angles θx by the incident angle detection means; At least four half widths W and at least two points between the irradiation point and the imaging plane calculating the X-ray emission diameter R and the X-ray divergence angle θh, which are unknowns, and calculating the normal half width θw from at least four equations established by substituting the distance L and the incident angle θx. A half-value width measurement method may also be used.

According to this, the normal half-value width θw It is possible to obtain the X-ray emission diameter R and the X-ray divergence angle θh necessary for calculating , and also obtain the normal half width θw of the measured object OB.

(Modification)
In the above embodiment, the X-ray intensity distribution curve in the radial direction of the diffraction ring is detected at equal intervals in the circumferential direction of the diffraction ring, the half-value width obtained from each curve is averaged, and the detected half-value width W. As described above, the average value of the half-value width is the same value as the half-value width when the output X-ray is vertically irradiated onto the object to be measured OB and the half-value width in the circumferential direction of the diffraction ring is kept constant. Therefore, if the X-ray emission diameter R and the X-ray divergence angle θh are known, the normal half width θw can be calculated regardless of the X-ray incident angle. In addition, even if the diffraction ring is not formed over the entire circumference, a sine curve that is the closest to the change curve of the half-value width with respect to the circumferential direction (rotation angle) of the diffraction ring as shown in Patent Document 2 of the prior art document By calculating the following formula, a method of adopting the value of the center line of the sine curve as the average value of the half-value width can be used. However, as shown in FIG. 12, for example, since the measurement object OB has a complicated shape, there are cases where many parts of the diffraction ring are not formed. It becomes difficult to accurately calculate the equation of the sine curve that is closest to the change curve of the half-value width with respect to the angle). Even in such a case, the normal half-value width θw can be calculated with high accuracy by changing the method of calculating the normal half-value width θw from the detected half-value width W of the diffraction ring. This calculation method will be described below.

In the above embodiment, a plurality of half-value widths detected for each circumferential position (rotational angle) of the diffraction ring are averaged to obtain the half-value width W, from which the normal half-value width θw is calculated. A normal half-value width is calculated from half-value widths detected at respective rotation angles of the diffraction ring, and a plurality of obtained normal half-value widths are averaged to obtain a normal half-value width θw. Hereinafter, the half-value width detected for each rotation angle θp of the diffraction ring is defined as W(θp), and the normal half-value width for each rotation angle θp of the diffraction ring is defined as θw(θp). When the half width W(θp) is detected in angular units, Equation 1 holds as in the above embodiment. However, since it cannot be assumed that the X-rays are irradiated perpendicularly to the measurement object OB, the X-ray irradiation point becomes an ellipse, and the half width Wp due to the size of the X-ray irradiation point for each rotation angle θp of the diffraction ring, that is, The half-value width Wp depending on the diameter of the X-ray irradiation point varies depending on the rotation angle θp of the diffraction ring, and is Wp(θp). Therefore, Equation 1 becomes Equation 21 below.
(Number 21)
W(θp)=tan ⁻¹ {(Wp(θp)·cos θd)/D}−θh+θw(θp)
A formula for obtaining the half-value width Wp(θp) for each rotation angle θp of the diffraction ring can be theoretically calculated, and is the following formula (22). The proof that this formula holds will be described later.
(number 22)
Wp(θp)=(R+F)·{1−tan θx·tan θd·sin(θp−90°)}
By substituting Equation 22 into Equation 21 and further substituting F=L·tan θh to transform the equation, Equation 23 below is obtained.
(number 23)
θw (θp) = W (θp) - tan ^-1 [{(R+L tan θh) (1-tan θx tan θd sin (θp-90°)) cos θd sin θd}/L] + θh

In the right side of Equation 23, W(θp) is a value detected for each rotation angle θp of the diffraction ring, and the irradiation point-imaging plane distance L and the X-ray incident angle θx are detected before X-ray diffraction measurement. If the material of the measurement object OB is known, θd is a known value, and the X-ray emission diameter R and X-ray divergence angle θh used for calculation are stored in the memory of the controller 91 . Therefore, the normal half width θw(θp) for each rotation angle θp of the diffraction ring can be calculated from Equation (23). By averaging the calculated normal half-value width θw (θp), the normal half-value width θw can be calculated in the same manner as in the above embodiment. Theoretically, since the normal half-value width θw is a value that does not depend on the rotation angle θp of the diffraction ring, the change curve of the normal half-value width θw (θp) with respect to the rotation angle θp of the diffraction ring fluctuates at the same level. become a curve.

Next, it will be proved that the half-value width Wp(θp) by the diameter of the X-ray irradiation point for each rotation angle θp of the diffraction ring can be calculated by Equation (22). By transforming Equation 22, Equation 24 below is obtained.
(number 24)
Wp(θp)=−{(R+F)・tanθx・tanθd}・sin(θp−90°)+(R+F)
Equation 24 shows that the half width Wp(θp) becomes a sine curve, that the amplitude of the sine curve increases as the X-ray incident angle θx increases, and that the center line (ie average value) of the sine curve is a sine curve It shows that it is constant regardless of the amplitude of the curve (that is, regardless of the X-ray incident angle). Since the X-ray divergence angle θh and the normal half-value width θw are values that do not depend on the rotation angle θp of the diffraction ring, the detected half-value width W (θp) also becomes a sine curve, and the half-value width Wp (θp ) has the same properties as Therefore, the proof that the formula of Equation 22 holds is that the change curve of the detected half-value width with respect to the rotation angle of the diffraction ring becomes a sine curve, and the center line (that is, the average value) of the sine curve is the X-ray incident angle It is also to prove that it is constant regardless of the

FIG. 13 is a view of the X-ray irradiation point viewed on the XY plane, with the X-axis direction and the Y-axis direction aligned with the directions of the coordinate axes shown in FIG. Also, FIG. 13 shows that when the viewpoint is changed and the X-ray irradiation point is viewed from the direction of the optical axis of the emitted X-rays, it becomes a dotted line. When the X-rays are incident on the object to be measured OB at a certain incident angle, the X-ray irradiation point becomes an ellipse as shown by the solid line in FIG. When the X-ray irradiation point is viewed from the direction of the optical axis of the emitted X-rays, it becomes a perfect circle as indicated by the dotted line in FIG. A point R on the outer circumference of the X-ray irradiation point seen from the direction of the optical axis of the emitted X-rays can be regarded as a point R' when the viewpoint is changed to the normal direction of the object to be measured OB. The imaging plane on which the diffraction ring is formed is perpendicular to the direction of the optical axis of the emitted X-rays, and the optical axis of the emitted X-rays passes through the center point of the diffraction ring. The rotation angle θp is the same as the rotation angle θp that defines a point on the circumference of the diffraction ring. The radius of the X-ray irradiation point at the point R on the outer circumference of the X-ray irradiation point is the point R' when the X-ray irradiation point is viewed from the normal direction of the object to be measured OB. It is the distance to R'. Since this distance changes with the rotation angle θp, it is Xcr(θp), and when the minor axis radius of the ellipse of the X-ray irradiation point is a and the major axis radius is b, the following equation 25 is established by applying the formula of the ellipse do.

なお、図１４ではＸ軸方向から見ているため、Ｘｃｒはθｐ＝９０°のときの値であり、Ｘｃｒ＝Ｘｒ／ｃｏｓθｘであるが、上述したようにＸｃｒは回転角度θｐにより変化する値である。また、Ｘ線照射点における出射Ｘ線の半径Ｘｒは、上記実施形態ではＸ線出射径ＲにＸ線照射点の径の増加分Ｆを加算した値であり、Ｘｒ＝（Ｒ＋Ｆ）である。 Next, when the X-ray irradiation point is viewed on the YZ plane, that is, when the X-ray irradiation point is viewed parallel to the X-axis direction, it becomes as shown in FIG. Assuming that the incident angle is θx, the major axis radius of the ellipse at the X-ray irradiation point is Xr/cos θx. The minor axis radius is Xr because it is the same as the radius of the emitted X-rays. Therefore, Equation 25 can be rewritten as Equation 26 below.

Since FIG. 14 is viewed from the X-axis direction, Xcr is a value when θp=90°, and Xcr=Xr/cos θx. be. In the above-described embodiment, the radius Xr of the emitted X-rays at the X-ray irradiation point is the sum of the X-ray emission diameter R and the increment F of the diameter of the X-ray irradiation point, where Xr=(R+F).

なお、図１４ではＸ軸方向から見ているため、θｋ＝１８０°－θｘ－θｄであるが、ＸＹ平面と回折環を形成する回折Ｘ線の進行方向とが成す角度は、回転角度θｐにより変化する値である。 Next, consider the half width Wp(θp) based on the size of the X-ray irradiation point when the radius at the X-ray irradiation point is Xcr(θp). In FIG. 14, the plane parallel to the imaging plane is indicated by Pe, and the half width Wp (θp) is the plane Pe, the center of the X-ray irradiation point, and the emitted X-rays from points on the periphery of the X-ray irradiation point. is the length between the points where two lines forming an angle of .theta.d and .theta.d intersect. The width of the two lines at half width Wp(θp) is Wp(θp)·cos θd as shown in FIG. Assuming that the angle formed by the traveling direction of the X-ray is θk(θp), Wp(θp)·cos θd is Xcr(θp)·sin θk(θp). Therefore, Equation 26 becomes Equation 27 below.

In FIG. 14, θk=180°−θx−θd because it is viewed from the X-axis direction. It is a variable value.

Next, consider a formula for obtaining the angle θk (θp) formed by the diffracted X-rays with the XY plane. First, as shown in FIG. 15, assuming that emitted X-rays are emitted perpendicularly to the plane of the object to be measured OB, let the central coordinates of the X-ray irradiation point be (0, 0, 0), and the emitted X-rays Let (0, 0, L) be the coordinates of the point where the optical axis and the imaging plane intersect. Since the angle θd between the optical axis of the emitted X-rays and the diffracted X-rays forming the diffraction ring is constant, the X-ray irradiation is performed on the plane containing the optical axis of the emitted X-rays and the line of the rotation angle θp of the imaging plane. The distance from the center of the point to the point where the diffracted X-ray generated intersects the imaging plane is L·tan θd. Therefore, the coordinates of the point where the diffracted X-ray generated from the center of the X-ray irradiation point intersects the imaging plane on the plane including the optical axis of the emitted X-ray and the line of the rotation angle θp of the imaging plane are (L·tan θd· cos θp, L·tan θd·sin θp, L).

この（ｘ，ｙ，ｚ）に座標（０，０，０）、（０，０，Ｌ）及び（Ｌ・ｔａｎθｄ・ｃｏｓθｐ，Ｌ・ｔａｎθｄ・ｓｉｎθｐ，Ｌ）を代入したとき、対応する（ｘ’，ｙ’，ｚ’）の座標は、（０，０，０）、（０，Ｌ・ｓｉｎθｘ，Ｌ・ｃｏｓθｘ）及び（Ｌ・ｔａｎθｄ・ｃｏｓθｐ，Ｌ・ｔａｎθｄ・ｃｏｓθｘ・ｓｉｎθｐ＋Ｌ・ｓｉｎθｘ，－Ｌ・ｔａｎθｄ・ｓｉｎθｘ・ｓｉｎθｐ＋Ｌ・ｃｏｓθｘ）になる。この座標を座標Ｏ、座標Ｉｃ、座標Ｒとする。 Next, from this state, as shown in FIG. 16, a state in which emitted X-rays are tilted about the X-axis by an angle of θx (a state in which the X-ray incident angle is set to θx) is considered. Since this can be considered as a state in which the coordinate group is rotated counterclockwise toward the X-axis direction with the X-axis as the rotation axis, the coordinates (x, y, z) before rotation and the coordinates (x ', y', z') holds the following equation (28).

When the coordinates (0, 0, 0), (0, 0, L) and (L tan θd cos θp, L tan θd sin θp, L) are substituted for this (x, y, z), the corresponding (x ', y', z') are (0, 0, 0), (0, L · sin θx, L · cos θx) and (L · tan θd · cos θp, L · tan θd · cos θx · sin θp + L · sin θx, - L·tan θd·sin θx·sin θp+L·cos θx). Let these coordinates be the coordinate O, the coordinate Ic, and the coordinate R.

ベクトルＦとベクトルＤの成分を座標Ｏ、座標Ｉｃ、座標Ｒの座標値と外積の計算により求め、数２９に代入し、式を整理すると、以下の数３０の式が成り立つ。

Next, a vector S obtained by cross product of a vector V directed from the coordinate O to the coordinate Ic and a vector D directed from the coordinate O to the coordinate R is considered. This vector S is a normal vector of a plane including the optical axis of the emitted X-ray and the line of the rotation angle θp of the imaging plane. Next, a vector F is obtained by cross product of this vector S and a unit vector of (0, 0, 1). This vector F is parallel to the line where the plane including the optical axis of the emitted X-ray and the line of the rotation angle θp of the imaging plane intersects the plane of the X-ray irradiation point (the plane of the object to be measured OB, which is the XY plane). is a vector. As shown in FIG. 16, the angle θk (θp) formed between the XY plane and the diffracted X-ray forming the diffraction ring at the rotation angle θp is the angle formed by the vector F and the vector D. Assuming that the magnitudes are |F| and |D|, it can be obtained by Equation 29, which is the inner product formula of the vectors below.

The components of vector F and vector D are obtained by calculating the coordinate values of coordinate O, coordinate Ic, and coordinate R, and the cross product, and substituting them into Equation 29 to rearrange the equations, the following Equation 30 holds.

Since the equation for obtaining the angle θk formed by the diffracted X-ray with the plane is thus obtained, equation 32 is obtained by converting equation 30 into equation sin θk using equation 31 below and substituting equation 27 into equation 32.

Using the equations cos ² θ=1/(tan ² θ+1), sin ² θ=tan ² θ/(tan ² θ+1), sin θ·cos θ=tan θ/(tan ² θ+1), Taking out cos θd outside and arranging the remaining √ into an equation consisting of tan θx, tan θd, and sin θp yields Equation 33 below.
(number 33)
Wp (θp) cos θd=Xr cos θd (1-tan θx tan θd sin θp)
Eliminating cos θd from both sides of this equation and substituting Xr=(R+F) yields Equation 34 below.
(number 34)
Wp (θp) = (R + F) (1-tan θx tan θd sin θp)
Equation 34 is an expression when the X-axis direction in FIG. Since it is the direction from the center of the diffraction ring to the point where the line and the normal to the X-ray irradiation point intersect, using the original rotation angle θp, sin θp in Equation 34 becomes sin (θp−90°), Equation 22 is thus established. By the above calculations, it was possible to prove that Equation 22 was theoretically established.

Thus, in the above modification, in the first calculation step, the half-value width W(θp) is detected in angular units for each rotation angle θp of the diffraction ring, and in the second calculation step, the diffraction ring For each rotation angle θp, the X-ray emission diameter R, X-ray divergence angle θh, and X-ray incidence angle θx are used to calculate the half width based on the size of the X-ray irradiation spot in units of angles. In the calculation step of , the half-value width based on the size of the X-ray irradiation point is subtracted from the half-value width W (θp) for each rotation angle θp of the diffraction ring, and the X-ray divergence angle θh is added, whereby the normal half-value The width θw (θp) is calculated, and a plurality of obtained normal half-value widths θw (θp) are averaged to obtain the normal half-value width θw. According to this, even if part of the diffracted X-rays are obstructed due to the object to be measured OB having a complicated shape, etc., and the diffraction ring cannot be formed all around, the normal half-value width θw can be obtained. It can be obtained with high accuracy.

Furthermore, the implementation of the present invention is not limited to the above-described embodiments and modifications, and various modifications are possible without departing from the object of the present invention.

The X-ray diffraction measurement apparatus 1 in the above embodiment and modified example is a device that captures an image of the diffraction ring on the imaging plate 15 and reads the imaged diffraction ring by laser scanning. The present invention can be applied to any X-ray diffraction measurement apparatus as long as it can be used. For example, the present invention can be applied to an X-ray diffraction measurement apparatus in which solid-state imaging devices such as X-ray CCDs are arranged on the imaging surface. The present invention can be applied even to an X-ray diffraction measurement device that scans with . Further, if an X-ray is irradiated perpendicularly to the object to be measured OB, the present invention can be applied to an X-ray diffraction measurement apparatus that can detect the intensity distribution of diffracted X-rays in a part of the formed diffraction ring. can be applied. Also, if the X-ray incident angle can be accurately detected without irradiating the object OB to be measured perpendicularly, the intensity distribution of diffracted X-rays in a part of the formed diffraction ring can be detected. The above modification can be applied to any X-ray diffraction measurement device.

In addition, the X-ray diffraction measurement system in the above-described embodiment and modification has the surface hardness and residual stress of the measurement object OB that is placed on the stage St of the transport device and transported directly below the X-ray diffraction measurement device 1 one after another. However, if the X-ray diffraction measurement device 1 is a device that detects the intensity distribution of diffracted X-rays in the diffraction ring, a mechanism that arranges the measurement object OB immediately below the X-ray diffraction measurement device 1 or The present invention can be applied to any method. For example, it can be applied to a method in which an operator holds the measurement object OB by hand and successively places it on the stage directly below the X-ray diffraction measurement apparatus 1, or an X A method of sequentially changing the position and orientation of the diffraction measurement apparatus 1 so as to irradiate X-rays onto the measurement location of the measurement object OB can also be applied.

Further, in the method of measuring the normal half width θw when the X-ray emission diameter R and the X-ray divergence angle θh in the above embodiment are unknown, the calculation is performed by the calculation program in the controller 91 of the X-ray diffraction measurement system. However, the controller 91 only acquires the X-ray intensity distribution data of the diffraction ring, the distance between the irradiation point and the imaging surface, and the X-ray incident angle, and uses the obtained data to perform calculations in another computer device, and X The radiation diameter R, the X-ray divergence angle θh, and the normal half width θw may be calculated. In this case, as a method of inputting data to another computer device, various methods such as a method of transferring data via a storage medium and a method of transferring data via a network line are conceivable.

Further, in the above-described embodiment and modification, visible LED light on the same optical axis as the emitted X-rays is emitted, and the distance between the irradiation point and the imaging surface is detected from the irradiation point position of the visible light in the image captured by the camera CA. However, as long as the distance between the irradiation point and the imaging surface can be accurately detected, any principle and method may be used for the measuring means. For example, a laser beam having the same optical axis as that of emitted X-rays may be emitted, reflected light may be received, and the distance between the irradiation point and the imaging surface may be detected using the time-of-flight measurement principle. If it is known that the residual stress of the measurement object OB is small, the average value of the radius of the diffraction ring is calculated from the obtained shape data of the diffraction ring, and this value is compared with the diffraction angle of the measurement object OB. may be used to calculate the distance between the irradiation point and the imaging plane.

Further, in the above-described embodiment and modification, the X-ray incident angle with respect to the measurement object OB is detected by continuously measuring the distance between the irradiation point and the imaging surface and detecting the surface profile of the measurement object OB. made it However, as long as it is possible to measure the X-ray incident angle with high accuracy, any principle and method may be used for the measuring means. For example, as shown in Japanese Patent No. 6115597, it is possible to irradiate visible LED light on the same optical axis as the emitted X-rays, and to irradiate patterned light around which the shape changes depending on the X-ray incident angle. .

Further, in the above-described embodiment and modification, the normal half-value width is calculated by detecting the half-value width from the X-ray intensity distribution curve in the radial direction of the diffraction ring. If it is the indicated width, a width other than the half-value width may be detected, and the normal value may be calculated by the same calculation as in the above embodiment. For example, it may be an integral width, or a width obtained by slicing the X-ray intensity distribution curve at a level of 1/a of the peak value and setting a to an appropriate value. The diffraction image width in the claims includes any width as long as it indicates the degree of spread of the intensity distribution in the radial direction of the diffraction ring.

In addition, in the above-described embodiment and modified example, the normal half-value width θw is calculated in units of angles, so that the normal half-value width θw is calculated independently of the distance between the irradiation point and the imaging surface. However, this is one method of calculating the normal half-value width that does not depend on the distance between the irradiation point and the imaging surface by including the ratio element with respect to the distance between the irradiation point and the imaging surface. A different value may be calculated if the normal half-value width can be calculated without depending on the distance between the irradiation point and the imaging surface. For example, the normal half width at the reference irradiation point-imaging plane distance may be calculated in units of length.

Further, in the above-described embodiment and modified example, the X-ray emission diameter R is the diameter of the cross section of the emitted X-ray and is expressed in the unit of length, and the X-ray divergence angle θh is the degree of expansion of the emitted X-ray in the traveling direction and is expressed in the unit of angle. As described above, the X-ray emission diameter R and the X-ray divergence angle θh may be any values as long as they can be converted into length and angle values. The X-ray emission diameter R and the X-ray divergence angle θh in the claims are intended to include all values that can be converted into length and angle values.

Reference Signs List 1 X-ray diffraction measuring device 10 X-ray tube 11 Output port 15 Imaging plate 15a, 16a, 17a, 18a, 21a, 27a1, 27b, 28a Through hole 16 Table 17 Protrusion Part 18 Fixing tool 19 Block 20 Table driving mechanism 21 Moving stage 22 Feed motor 23 Screw rod 24 Bearing 25 Guide 26 Plate 27 Spindle Motor 28 Passage member 29 Block 30 Laser detector 43 LED light source 44 LED light source 45 Rotating plate 46 Motor 47a, 47b Stopper 48 Imaging lens 49 Image pickup device 50 Housing 50a Bottom wall 50c Notch wall 50c1 Circular hole 50d Connecting wall 51 Tip of arm type moving device 60 End detection sensor 90 Computer device 91 ... controller, 92 ... input device, 93 ... display device, OB ... object to be measured, CA ... camera, St ... stage

Claims (6)

X-ray emitting means for emitting the X-rays emitted from the X-ray tube through the through-hole toward an object to be measured;
When the object to be measured is irradiated with X-rays by the X-ray emitting means, the diffracted X-rays generated at the X-ray irradiation point of the object to be measured are received by the imaging surface, and the diffracted X-rays X-ray intensity distribution detection means for detecting the X-ray intensity distribution in the radial direction of the formed diffraction ring;
a diffraction image width detection means for detecting a diffraction image width, which is a width based on the X-ray intensity distribution in the radial direction of the diffraction ring, using the X-ray intensity distribution detected by the X-ray intensity distribution detection means. In the X-ray diffraction measurement device,
distance detection means for detecting a distance between the irradiation point and the imaging plane, which is the distance from the X-ray irradiation point to the imaging plane;
The diffraction image width detection means detects a distance L between the irradiation point and the imaging surface detected by the distance detection means, an X-ray emission diameter R which is a diameter of the X-ray emitted by the X-ray emission means stored in advance, and the From the diffraction image width W detected from the X-ray intensity distribution detected by the X-ray intensity distribution detecting means, using the X-ray divergence angle θh, which is the degree of spread of the X-rays emitted by the X-ray emitting means in the traveling direction, , excluding the element based on the size of the X-ray irradiation point and the element based on the X-ray divergence angle θh, and calculating the normal diffraction pattern width including the element of the ratio to the distance L between the irradiation point and the imaging plane. An X-ray diffraction measurement device characterized by: In the X-ray diffraction measurement device according to claim 1,
The diffraction image width detection means is
The diffraction image width W from the X-ray intensity distribution detected by the X-ray intensity distribution detection means is an angle with the X-ray irradiation point as the origin, using the distance L between the irradiation point and the imaging surface detected by the distance detection means. A first calculation step of detecting in units of
A diffraction image based on the size of the X-ray irradiation point using the irradiation point-imaging surface distance L detected by the distance detection means, the X-ray emission diameter R and the X-ray divergence angle θh stored in advance. a second calculation step of calculating the width in units of angles with the X-ray irradiation point as the origin;
The normal diffraction pattern width is obtained by subtracting the diffraction pattern width based on the size of the X-ray irradiation point in units of angles from the diffraction pattern width W, and adding the X-ray divergence angle θh in units of angles from the diffraction pattern width W. 3. An X-ray diffraction measurement apparatus characterized by performing the calculation step of 3. In the X-ray diffraction measurement device according to claim 2,
an incident angle detection means for detecting an X-ray incident angle on the object to be measured when the object to be measured is irradiated with X-rays from the X-ray emitting means;
The diffraction image width detection means is
In the first calculation step, the diffraction image width W is detected in units of angles for each rotation angle of the diffraction ring;
In the second calculation step, the X-ray incident angle detected by the incident angle detection means is also used for each rotation angle of the diffraction ring to determine the diffraction pattern width based on the size of the X-ray irradiation spot. Calculated in units of
The X-ray diffraction measurement apparatus, wherein in the third calculation step, the normal diffraction image width is calculated for each rotation angle of the diffraction ring, and the obtained normal diffraction image widths are averaged. In the X-ray diffraction measurement apparatus according to any one of claims 1 to 3,
visible light emitting means for emitting visible parallel light having the same optical axis as the X-ray emitted by the X-ray emitting means;
An imaging lens that forms an image of the object to be measured in an area including the irradiation point of the visible light emitted from the visible light emitting means, and an imaging device that picks up the image formed by the imaging lens. and a camera that outputs a signal representing the captured image;
A light-receiving point in a photographed image created from a signal output by the imaging device when the imaging lens receives the reflected light of the visible light emitted by the visible light emitting means and the imaging device receives the reflected light. The size of the light receiving point is detected, and the size of the light receiving point is applied to the relationship between the size of the light receiving point stored in advance, the X-ray emission diameter R, and the X-ray divergence angle θh, and the diffraction image width detection means detects An X-ray diffraction measurement apparatus, comprising calculation numerical value determination means for determining an X-ray emission diameter R and an X-ray divergence angle θh used for calculation. X-ray emitting means for emitting the X-rays emitted from the X-ray tube through the through-hole toward an object to be measured;
When the object to be measured is irradiated with X-rays by the X-ray emitting means, the diffracted X-rays generated at the X-ray irradiation point of the object to be measured are received by the imaging surface, and the diffracted X-rays X-ray intensity distribution detection means for detecting the X-ray intensity distribution in the radial direction of the formed diffraction ring;
diffraction image width detection means for detecting a diffraction image width, which is a width based on the X-ray intensity distribution in the radial direction of the diffraction ring, using the X-ray intensity distribution detected by the X-ray intensity distribution detection means;
An X-ray diffraction measurement device equipped with a distance detection means for detecting the distance between the irradiation point and the imaging plane, which is the distance from the X-ray irradiation point to the imaging plane, is operated, and the diffraction image width detected by the diffraction image width detection means is operated. From the diffraction pattern width W, the X-ray emission diameter R, which is the diameter of the X-rays emitted by the X-ray emission means, and the X-ray divergence angle θh, which is the degree of expansion in the traveling direction of the X-rays emitted by the X-ray emission means, are calculated. Measure the normal diffraction image width including the factor based on the size of the X-ray irradiation spot and the factor based on the X-ray divergence angle θh, and including the factor of the ratio to the distance between the irradiation point and the imaging plane. In the diffraction pattern width measurement method,
Operate the X-ray diffraction measurement device at each of at least three irradiation point-imaging plane distances, and detect at least three diffraction image widths W from at least three X-ray intensity distributions obtained from the same measurement object. , a measuring step of detecting at least three irradiation point-imaging plane distances L by the distance detection means;
At least three diffraction pattern widths W and at least three irradiation points- and calculating the X-ray emission diameter R and the X-ray divergence angle θh, which are unknown quantities, from at least three equations that are established by substituting the distance L between the imaging surfaces, and calculating the normal diffraction pattern width. A diffraction pattern width measurement method characterized by: X-ray emitting means for emitting the X-rays emitted from the X-ray tube through the through-hole toward an object to be measured;
When the object to be measured is irradiated with X-rays by the X-ray emitting means, the diffracted X-rays generated at the X-ray irradiation point of the object to be measured are received by the imaging surface, and the diffracted X-rays X-ray intensity distribution detection means for detecting the X-ray intensity distribution in the radial direction of the formed diffraction ring;
diffraction image width detection means for detecting a diffraction image width, which is a width based on the X-ray intensity distribution in the radial direction of the diffraction ring, using the X-ray intensity distribution detected by the X-ray intensity distribution detection means;
distance detection means for detecting a distance between the irradiation point and the imaging plane, which is the distance from the X-ray irradiation point to the imaging plane;
activating an X-ray diffraction measurement apparatus comprising incident angle detection means for detecting an X-ray incident angle on the object to be measured when the object to be measured is irradiated with X-rays from the X-ray emitting means; , an X-ray emission diameter R, which is the diameter of the X-ray emitted by the X-ray emission means, and a traveling direction of the X-ray emitted by the X-ray emission means, from the diffraction image width W detected by the diffraction image width detection means. Using the X-ray divergence angle θh, which is the degree of divergence in the X-ray irradiation point, the element based on the size of the X-ray irradiation point and the element based on the X-ray divergence angle θh are removed, and the ratio of the irradiation point to the imaging plane distance In a diffraction pattern width measurement method for measuring a normal diffraction pattern width including elements,
Rotation angles of 0° and 180° of the diffraction ring in at least two X-ray intensity distributions obtained on the same measurement object by operating the X-ray diffraction measurement device at each of at least two irradiation point-imaging plane distances. A measurement in which a diffraction image width W is detected from the vicinity, at least two irradiation point-imaging surface distances L are detected by the distance detection means, and at least two X-ray incident angles θx are detected by the incident angle detection means. a step;
At least four diffraction image widths W, And from at least four equations established by substituting the distance L between the irradiation point and the imaging surface and the incident angle θx, the X-ray emission diameter R and the X-ray divergence angle θh, which are unknown quantities, are calculated, and the normal diffraction pattern is obtained. A diffraction pattern width measuring method, comprising: a calculating step of calculating the width.

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