JP2022087523A - EASILY SOLUBLE DIBENZO[g,p]CHRYSENE DERIVATIVE - Google Patents

EASILY SOLUBLE DIBENZO[g,p]CHRYSENE DERIVATIVE Download PDF

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JP2022087523A
JP2022087523A JP2020199500A JP2020199500A JP2022087523A JP 2022087523 A JP2022087523 A JP 2022087523A JP 2020199500 A JP2020199500 A JP 2020199500A JP 2020199500 A JP2020199500 A JP 2020199500A JP 2022087523 A JP2022087523 A JP 2022087523A
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哲郎 岩澤
Tetsuo Iwazawa
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Ryukoku University
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Abstract

To provide a dibenzo[g,p]chrysene derivative that has four or more substituent groups making it easier to dissolve in an organic solvent and a halogeno group selectively at four or more positions making it easier to react.SOLUTION: Provided is a dibenzo[g,p]chrysene derivative that has 4 or more substituent groups selected from the group consisting of an alkyl group, an alkenyl group, an alkynyl group, an alkanoyl group, an alkenoyl group, an alkinoyl group, a polyoxyalkylene group and/or a hydroxyl group, and 4 halogeno groups.SELECTED DRAWING: None

Description

本発明は、ジベンゾ[g,p]クリセン誘導体に関する。 The present invention relates to dibenzo [g, p] chrysene derivatives.

ジベンゾ[g,p]クリセンは、機能性材料として有望な材料である。ジベンゾ[g,p]クリセン構造の最大の特徴は、非平面性の高いパイ共役系構造にあり、多くの興味がもたれてきた。ここで、非平面性とは、芳香環がらせん状にねじれていることを意味し、らせん構造が薄膜トランジスターの正孔輸送物質や有機発光ダイオードの発光素子として期待されている。特に光量子物性(量子収率・励起寿命)、電子的特性、耐熱性において潜在的価値が高く、高分子材料へ組み込むことが試みられている。 Dibenzo [g, p] chrysene is a promising material as a functional material. The greatest feature of the dibenzo [g, p] chrysene structure is its highly non-planar pi-conjugated structure, which has attracted a lot of interest. Here, the non-planarity means that the aromatic ring is twisted in a spiral shape, and the spiral structure is expected as a hole transporting substance of a thin film or a light emitting element of an organic light emitting diode. In particular, it has high potential value in photon physical characteristics (quantum yield / excitation lifetime), electronic properties, and heat resistance, and attempts are being made to incorporate it into polymer materials.

しかしながら、ジベンゾ[g,p]クリセンは、反応性置換基を有しておらず、機能性材料として使用するためには反応性置換基を導入する必要がある。たとえば、ハロゲン、窒素、酸素、硫黄等のヘテロ原子を導入し、該ヘテロ原子を他の置換基に変換後、末端に三員環エーテル、メタクリレート基、末端アルケン等の重合可能な置換基を導入して、重合させたり高分子の側鎖や末端に反応させたりして機能性材料を作製する必要がある。特に、ジベンゾ[g,p]クリセンの3位、6位、11位と14位の位置、2位、7位、10位と15位の位置、9位、11位、14位と16位の位置、8位、9位、16位と1位の位置の対称的な4つの位置に選択的にハロゲノ基、特にブロモ基を導入すると、様々な置換基に変換しやすいため、機能性材料の中間体として有用な化合物となることが期待できる。しかしながら、多環式芳香族炭化水素は、有機溶媒に溶けにくいという問題がある。 However, dibenzo [g, p] chrysene does not have a reactive substituent, and it is necessary to introduce a reactive substituent in order to use it as a functional material. For example, a heteroatom such as halogen, nitrogen, oxygen, or sulfur is introduced, the heteroatom is converted to another substituent, and then a polymerizable substituent such as a three-membered ring ether, a methacrylate group, or a terminal alkene is introduced at the terminal. Then, it is necessary to produce a functional material by polymerizing or reacting with a side chain or a terminal of the polymer. In particular, the 3rd, 6th, 11th and 14th positions of dibenzo [g, p] chrysene, the 2nd, 7th, 10th and 15th positions, the 9th, 11th, 14th and 16th positions. When a halogeno group, especially a bromo group, is selectively introduced into four symmetrical positions at the positions, 8-position, 9-position, 16-position and 1-position, it is easy to convert into various substituents, so that it is a functional material. It can be expected to be a useful compound as an intermediate. However, the polycyclic aromatic hydrocarbon has a problem that it is difficult to dissolve in an organic solvent.

非特許文献1には、ジベンゾ[g,p]クリセンの2位と10位に水酸基を、6位と14位にn-ヘキシル基を有し、有機溶媒に対する溶解性が改善された化合物が開示されているが、4つのブロモ基を有する化合物は開示されていない。また、非特許文献2には、ジベンゾ[g,p]クリセンの7位と10位にブロモ基を、2位と15位にt-ブチル基を、それぞれ有する化合物が開示されているが、4つのブロモ基を有する化合物は開示されていない。 Non-Patent Document 1 discloses a compound having hydroxyl groups at the 2- and 10-positions of dibenzo [g, p] chrysene and n-hexyl groups at the 6- and 14-positions and having improved solubility in an organic solvent. However, the compound having four bromo groups is not disclosed. Further, Non-Patent Document 2 discloses a compound having a bromo group at the 7-position and a 10-position of dibenzo [g, p] chrysene and a t-butyl group at the 2-position and the 15-position, respectively. Compounds with one bromo group are not disclosed.

特許文献1には、複数の置換基を有するジベンゾ[g,p]クリセン誘導体が開示されているが、3つのヨード基を有する誘導体までしか開示されておらず、4つ以上のハロゲノ基を有する誘導体の製造方法も開示されていない。特許文献2には、複数の置換基を有するジベンゾ[g,p]クリセン誘導体が開示されているが、4つのヨード基を有する誘導体は開示されているが、それ以外の置換基を有する誘導体は開示されておらず、その製造方法も開示されていない。 Patent Document 1 discloses a dibenzo [g, p] chrysene derivative having a plurality of substituents, but only a derivative having three iodine groups and having four or more halogeno groups. The method for producing the derivative is also not disclosed. Patent Document 2 discloses a dibenzo [g, p] chrysene derivative having a plurality of substituents, but a derivative having four iodine groups is disclosed, but a derivative having other substituents is disclosed. It is not disclosed, nor is its manufacturing method disclosed.

Angew.Chem.Int.Ed.2019,58,7385-7389Angew. Chem. Int. Ed. 2019, 58, 7385-7389 Thin Solid Films,2017,636,8-14Thin Solid Films, 2017, 636, 8-14

国際公開2015/170734号公報International Publication 2015/170734 特開2013-227307号公報Japanese Unexamined Patent Publication No. 2013-227307

本発明は、有機溶媒に溶けやすくする4つ以上の置換基と、反応させやすくする4つ以上の位置に選択的にハロゲノ基を有するジベンゾ[g,p]クリセン誘導体を提供することを目的とする。 It is an object of the present invention to provide a dibenzo [g, p] chrysene derivative having four or more substituents that make it easily soluble in an organic solvent and four or more positions that make it easy to react, selectively having a halogeno group. do.

すなわち、本発明は、アルキル基、アルケニル基、アルキニル基、アルカノイル基、アルケノイル基、アルキノイル基、ポリオキシアルキレン基および/または水酸基からなる群から選択される置換基を4個以上と、ハロゲノ基を4個有するジベンゾ[g,p]クリセン誘導体に関する。 That is, the present invention comprises four or more substituents selected from the group consisting of an alkyl group, an alkenyl group, an alkynyl group, an alkanoyl group, an alkenoyl group, an alkinoyl group, a polyoxyalkylene group and / or a hydroxyl group, and a halogeno group. It relates to a dibenzo [g, p] chrysen derivative having four.

下記式

Figure 2022087523000001
Figure 2022087523000002
Figure 2022087523000003
Figure 2022087523000004
または
Figure 2022087523000005
で表される化合物であることが好ましい。 The following formula
Figure 2022087523000001
Figure 2022087523000002
Figure 2022087523000003
Figure 2022087523000004
or
Figure 2022087523000005
It is preferably a compound represented by.

また、本発明は、アルコキシ基および/またはポリオキシアルキレン基を6個以上と、ハロゲノ基を4個有するジベンゾ[g,p]クリセン誘導体に関する。 The present invention also relates to a dibenzo [g, p] chrysene derivative having 6 or more alkoxy groups and / or polyoxyalkylene groups and 4 halogeno groups.

下記式

Figure 2022087523000006
で表される化合物であることが好ましい。 The following formula
Figure 2022087523000006
It is preferably a compound represented by.

本発明のジベンゾ[g,p]クリセン誘導体は、有機溶媒に対する溶解性が高く、特定の位置にハロゲノ基を有するので、多彩かつ多様な官能基の導入が可能となり、クロスカップリング反応やリチウム-ハロゲン交換反応による精密な置換反応を行うことで、新化合物を生み出すことが可能となる。本願発明では、6種類の置換位置のパターンをもつ6置換型のジベンゾ[g,p]クリセン誘導体の足場分子(化合物1~5、14)を具体的に合成した。よって、本発明のジベンゾ[g,p]クリセン誘導体は、ジベンゾ[g,p]クリセンを基軸とした新しい機能性材料を生み出すきっかけとなる。 Since the dibenzo [g, p] chrysen derivative of the present invention has high solubility in an organic solvent and has a halogeno group at a specific position, it is possible to introduce a variety of various functional groups, such as a cross-coupling reaction and lithium-. By performing a precise substitution reaction by a halogen exchange reaction, it becomes possible to produce a new compound. In the present invention, scaffolding molecules (compounds 1 to 5, 14) of a 6-substitution type dibenzo [g, p] chrysene derivative having 6 kinds of substitution position patterns were specifically synthesized. Therefore, the dibenzo [g, p] chrysene derivative of the present invention is an opportunity to produce a new functional material based on dibenzo [g, p] chrysene.

(a)実施例3で合成した化合物8のORTEP図において、4つの炭素原子(C8、C9、C17、C18)によって決定されるねじれ角度を示す図である。(b)化合物3のORTEP図の上面図である。(c)ねじれ角度44.59°で記載したブチル基側フィヨルド領域からの側面図である。(d)ベイエリア領域からの側面図である。(A) In the ORTEP diagram of compound 8 synthesized in Example 3, it is a diagram showing a twist angle determined by four carbon atoms (C8, C9, C17, C18). (B) It is a top view of the ORTEP diagram of compound 3. (C) It is a side view from the butyl group side fjord region described in the twist angle 44.59 °. (D) It is a side view from the bay area area. (a)実施例4で合成した化合物4のORTEP図において、4つの炭素原子(C06、C07、C13、C14)によって決定されるねじれ角度を示す図である。(b)化合物4のORTEP図の上面図である。(c)ねじれ角度55.89°で記載したブチル基側フィヨルド領域からの側面図である。(d)ベイエリア領域からの側面図である。(A) In the ORTEP diagram of compound 4 synthesized in Example 4, it is a diagram showing a twist angle determined by four carbon atoms (C06, C07, C13, C14). (B) It is a top view of the ORTEP diagram of compound 4. (C) It is a side view from the butyl group side fjord region described in the twist angle 55.89 °. (D) It is a side view from the bay area area. (a)実施例5で合成した化合物5のORTEP図において、4つの炭素原子(C01、C02、C03、C04)によって決定されるねじれ角度を示す図である。(b)化合物4のORTEP図の上面図である。(c)ねじれ角度53.97°で記載したブチル基側フィヨルド領域からの側面図である。(d)ベイエリア領域からの側面図である。(A) In the ORTEP diagram of compound 5 synthesized in Example 5, it is a diagram showing a twist angle determined by four carbon atoms (C01, C02, C03, C04). (B) It is a top view of the ORTEP diagram of compound 4. (C) It is a side view from the butyl group side fjord region described in the twist angle 53.97 °. (D) It is a side view from the bay area area.

第1の本発明のジベンゾ[g,p]クリセン誘導体は、
アルキル基、アルケニル基、アルキニル基、アルカノイル基、アルケノイル基、アルキノイル基、ポリオキシアルキレン基および/または水酸基からなる群から選択される置換基を4個以上と、ハロゲノ基を4個有することを特徴とする。
The first dibenzo [g, p] chrysene derivative of the present invention is
It is characterized by having 4 or more substituents selected from the group consisting of an alkyl group, an alkenyl group, an alkynyl group, an alkanoyl group, an alkenoyl group, an alkinoyl group, a polyoxyalkylene group and / or a hydroxyl group, and 4 halogeno groups. And.

ジベンゾ[g,p]クリセンは、下記化学式

Figure 2022087523000007
で表される化合物である。各炭素の置換位置を図中に示す。 Dibenzo [g, p] chrysene has the following chemical formula
Figure 2022087523000007
It is a compound represented by. The substitution position of each carbon is shown in the figure.

アルキル基、アルケニル基、アルキニル基、アルカノイル基、アルケノイル基、アルキノイル基、ポリオキシアルキレン基、および/または、水酸基からなる群から選択される置換基の個数の下限は4個以上であるが、上限は8個以下が好ましい。ハロゲノ基の個数の下限は4個以上であるが、上限は8個以下が好ましい。 The lower limit of the number of substituents selected from the group consisting of an alkyl group, an alkenyl group, an alkynyl group, an alkanoyl group, an alkenoyl group, an alkinoyl group, a polyoxyalkylene group, and / or a hydroxyl group is 4 or more, but an upper limit. Is preferably 8 or less. The lower limit of the number of halogeno groups is 4 or more, but the upper limit is preferably 8 or less.

アルキル基、アルケニル基、アルキニル基、アルカノイル基、アルケノイル基、アルキノイル基、および、水酸基の中でも、幅広い種類の有機溶媒に対する溶解性の点で、アルキル基、水酸基が好ましい。 Among the alkyl group, alkenyl group, alkynyl group, alkanoyl group, alkenoyl group, alkinoyl group, and hydroxyl group, the alkyl group and the hydroxyl group are preferable in terms of solubility in a wide variety of organic solvents.

アルキル基等の置換基の位置は特に限定されないが、少なくとも4つのアルキル基等は、2位、7位、10位と15位の位置、2位、7位、10位と15位の位置、3位、8位、11位と12位の位置に置換されていることが好ましい。 The positions of substituents such as alkyl groups are not particularly limited, but at least four alkyl groups and the like have positions at the 2-position, 7-position, 10-position and 15-position, 2-position, 7-position, 10-position and 15-position, and the like. It is preferable that the positions are substituted at the 3rd, 8th, 11th and 12th positions.

ハロゲノ基の置換基の位置は特に限定されないが、少なくとも4つのハロゲノ基は、3位、6位、11位と14位の位置、2位、7位、10位と15位の位置、4位、5位、12位と13位の位置、8位、9位、16位と1位の位置に置換されていることが好ましい。 The positions of the substituents of the halogeno group are not particularly limited, but at least four halogeno groups are located at the 3-position, 6-position, 11-position and 14-position, 2-position, 7-position, 10-position and 15-position, and 4-position. It is preferable that the positions are substituted at the 5th, 12th and 13th positions, and the 8th, 9th, 16th and 1st positions.

アルキル基としては、置換基を有していてもよい直鎖状又は分枝状のアルキル基が挙げられる。アルキル基の炭素数は1~12が好ましく、3~8がより好ましい。例えば、メチル、エチル、n-プロピル、iso-プロピル、n-ブチル、iso-ブチル、n-ペンチル、2,2-ジメチルプロピル、n-ヘキシル、n-ヘプチル、n-オクチル、n-ノニル、n-デシル、n-ウンデシル、n-ドデシル等が挙げられ、n-プロピル、iso-プロピル、n-ブチル、iso-ブチル、n-ペンチル、2,2-ジメチルプロピル、n-ヘキシル、n-ヘプチル、n-オクチルが好ましい。アルケニル基は、前記アルキル基の内部または末端に二重結合を有する基であり、アルキニル基は、前記アルキル基の内部または末端に三重結合を有する基である。 Examples of the alkyl group include a linear or branched alkyl group which may have a substituent. The alkyl group preferably has 1 to 12 carbon atoms, more preferably 3 to 8 carbon atoms. For example, methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-butyl, n-pentyl, 2,2-dimethylpropyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, n. -Decil, n-undecyl, n-dodecyl and the like, including n-propyl, iso-propyl, n-butyl, iso-butyl, n-pentyl, 2,2-dimethylpropyl, n-hexyl, n-heptyl, n-octyl is preferred. An alkenyl group is a group having a double bond inside or at the end of the alkyl group, and an alkynyl group is a group having a triple bond inside or at the end of the alkyl group.

アルカノイル基としては、置換基を有していてもよい直鎖状又は分枝状のアルカノイル基が挙げられる。アルカノイル基の炭素数は1~12が好ましく、3~8がより好ましい。例えば、メタノイル、エタノイル、プロパノイル、n-ブタノイル、2―メチルプロパノイル、n-ペンタノイル、2,2-ジメチルプロパノイル、n-ヘキサノイル、n-ヘプタノイル、n-オクタノイル、n-ノナノイル、n-デカノイル、n-ウンデカノイル、n-ドデカノイル等が挙げられ、プロパノイル、n-ブタノイル、2―メチルプロパノイル、n-ペンタノイル、2,2-ジメチルプロパノイル、n-ヘキサノイル、n-ヘプタノイル、n-オクタノイルが好ましい。アルケノイル基は、前記アルカノイル基の内部または末端に二重結合を有する基であり、アルキノイル基は、前記アルカノイル基の内部または末端に三重結合を有する基である。 Examples of the alkanoyl group include a linear or branched alkanoyl group which may have a substituent. The alkanoyl group preferably has 1 to 12 carbon atoms, more preferably 3 to 8 carbon atoms. For example, metanoyl, etanoyl, propanoyl, n-butanoyl, 2-methylpropanoyl, n-pentanoyl, 2,2-dimethylpropanoyl, n-hexanoyl, n-heptanoyl, n-octanoyl, n-nonanoyl, n-decanoyl, Examples thereof include n-undecanoyl and n-dodecanoyl, with propanoyl, n-butanoyl, 2-methylpropanoyl, n-pentanoyl, 2,2-dimethylpropanoyl, n-hexanoyl, n-heptanoyl and n-octanoyl being preferred. An alkenoyl group is a group having a double bond inside or at the end of the alkanoyl group, and an alkinoyl group is a group having a triple bond inside or at the end of the alkanoyl group.

ポリオキシアルキレン基としては、アルキレンジオールの単独重合体または共重合体の末端の水素を取った置換基である。このような置換基を導入することで、水または水溶性有機溶媒に溶解しやすくなる。ポリオキシアルキレンとしては、ポリオキシエチレン、ポリオキシプロピレン、ポリオキシブチレン等が挙げられる。重合度は、ポリエチレングリコールの場合には4~450が好ましく、ポリエチレンオキシドの場合には450~10000が好ましい。 The polyoxyalkylene group is a homopolymer of an alkylenediol or a substituent obtained by removing hydrogen at the terminal of the copolymer. By introducing such a substituent, it becomes easy to dissolve in water or a water-soluble organic solvent. Examples of the polyoxyalkylene include polyoxyethylene, polyoxypropylene, polyoxybutylene and the like. The degree of polymerization is preferably 4 to 450 in the case of polyethylene glycol, and preferably 450 to 10000 in the case of polyethylene oxide.

ハロゲノ基としては、フルオロ基、クロロ基、ブロモ基、ヨード基が挙げられ、ブロモ基が好ましい。 Examples of the halogeno group include a fluoro group, a chloro group, a bromo group and an iodine group, and a bromo group is preferable.

前記ジベンゾ[g,p]クリセン誘導体の中でも、下記式

Figure 2022087523000008
(化合物1)
Figure 2022087523000009
(化合物2)
Figure 2022087523000010
(化合物3)
Figure 2022087523000011
(化合物4)
および
Figure 2022087523000012
(化合物5)
で表される化合物が好ましい。 Among the dibenzo [g, p] chrysene derivatives, the following formula
Figure 2022087523000008
(Compound 1)
Figure 2022087523000009
(Compound 2)
Figure 2022087523000010
(Compound 3)
Figure 2022087523000011
(Compound 4)
and
Figure 2022087523000012
(Compound 5)
The compound represented by is preferable.

化合物1の合成
ジベンゾ[g,p]クリセンを、臭素、N-ブロモスクシンイミド、1,3-ジブロモ-5,5-ジメチルヒダントインなどの臭素化剤で臭素化して、2、7、10、15位に臭素原子を有する臭素化体を合成した後に、臭素原子をn-BuLiなどでリチオ化してn-BuBrと反応させることにより、4つのブチル基が置換したジベンゾ[g,p]クリセン(化合物6)を合成する。懸濁状態であるにもかかわらず、高収率で合成することができる。化合物6は、ほとんどの有機溶媒に溶解するだけでなく、室温では無色透明の粘性物質である。そして、臭素、N-ブロモスクシンイミド、1,3-ジブロモ-5,5-ジメチルヒダントインなどの臭素化剤で臭素化して、化合物1を合成する。
Synthetic dibenzo [g, p] chrysen of compound 1 is brominated with a brominating agent such as bromine, N-bromosuccinimide, 1,3-dibromo-5,5-dimethylhydantoin, and the positions 2, 7, 10, and 15. After synthesizing a brominated product having a bromine atom in, the bromine atom was lithiated with n-BuLi or the like and reacted with n-BuBr to cause dibenzo [g, p] chrysen (compound 6) in which four butyl groups were substituted. ) Is synthesized. Despite being suspended, it can be synthesized in high yield. Compound 6 is not only soluble in most organic solvents, but is also a colorless and transparent viscous substance at room temperature. Then, compound 1 is synthesized by brominating with a brominating agent such as bromine, N-bromosuccinimide, and 1,3-dibromo-5,5-dimethylhydantoin.

化合物1は、室温でトルエンに溶解する。一方、ブチル基を有していない3位、6位、11位、14位の位置に臭素が置換した臭素化体は、トルエンに対してはほとんど溶解しない。 Compound 1 dissolves in toluene at room temperature. On the other hand, the brominated product in which bromine is substituted at the 3-position, 6-position, 11-position, and 14-position having no butyl group is hardly dissolved in toluene.

化合物2の合成
2,7-ジブロモ-9-フルオレノンを二量化して、3、6、11、14位に臭素原子が置換したジベンゾ[g,p]クリセンを合成する。該化合物を用い、化合物1と同様に、臭素原子をn-BuLiなどでリチオ化してn-BuBrと反応させることにより、4つのブチル基が置換したジベンゾ[g,p]クリセンを合成する。4臭素化体は、有機溶媒に非常に溶解しにくいが、リチオ化反応は進行する。そして、臭素、N-ブロモスクシンイミド、1,3-ジブロモ-5,5-ジメチルヒダントインなどの臭素化剤で臭素化して、化合物2を合成する。
Synthesis of Compound 2 Dimerize 2,7-dibromo-9-fluorenone to synthesize dibenzo [g, p] chrysene with bromine atoms substituted at positions 3, 6, 11 and 14. Using the compound, the bromine atom is lithiated with n-BuLi or the like and reacted with n-BuBr in the same manner as in Compound 1, to synthesize dibenzo [g, p] chrysene substituted with four butyl groups. 4 The brominated product is very difficult to dissolve in an organic solvent, but the lithiolysis reaction proceeds. Then, compound 2 is synthesized by brominating with a brominating agent such as bromine, N-bromosuccinimide, and 1,3-dibromo-5,5-dimethylhydantoin.

化合物2は、室温ではトルエン、ヘキサン、塩化メチレン、クロロホルム、テトラヒドロフランそれぞれに溶解する。一方、ブチル基を有していない2位、7位、10位、15位の位置に臭素が置換した臭素化体は、これらのどの溶媒にもほとんど溶解しない。 Compound 2 is dissolved in toluene, hexane, methylene chloride, chloroform and tetrahydrofuran at room temperature. On the other hand, the brominated product in which bromine is substituted at the 2-position, 7-position, 10-position and 15-position having no butyl group is hardly dissolved in any of these solvents.

化合物3の合成
ジベンゾ[g,p]クリセンとアルカノイルハライドを、三塩化アルミニウムや三塩化鉄などのルイス酸の存在下で反応させ、10,15-ジアルカノイルジベンゾクリセンを合成後、水素、水素化ホウ素ナトリウム、リチウムアルミニウムヒドリドなどの還元剤で還元し、1,3-ジブロモ-5,5-ジメチルヒダントイン、N-ブロモスクシンイミドなどでハロゲン化することにより、2,7-ジブロモ-10,15-ジアルキルジベンゾクリセンを合成する。ここで、臭素化剤としては、反応性の点で、1,3-ジブロモ-5,5-ジメチルヒダントインが好ましい。該化合物のブロモ基をリチオ化し、次いで例えば塩化ジメチルシランと反応させてビスジメチルシラン体とした後、例えばメタノールと反応させてジメトキシシリル体とし、さらに例えば過酸化水素を用いてフレミング-玉尾酸化することにより、2,7-ジヒドロキシ-10,15-ジアルキルジベンゾクリセンを合成する。そして、1,3-ジブロモ-5,5-ジメチルヒダントインなどにより臭素化することで1、3、6、8位が臭素化した化合物3を合成する。
Synthesis of Compound 3 Dibenzo [g, p] chrysen and alkanoyl halide are reacted in the presence of Lewis acids such as aluminum trichloride and iron trichloride to synthesize 10,15-dialkanoyl dibenzochrycene, followed by hydrogenation and hydrogenation. 2,7-Dibromo-10,15-dialkyl by reducing with a reducing agent such as sodium boron or lithium aluminum hydride and halogenating with 1,3-dibromo-5,5-dimethylhydantin, N-bromosuccinimide, etc. Synthesize dibenzocrysen. Here, as the brominating agent, 1,3-dibromo-5,5-dimethylhydantin is preferable in terms of reactivity. The bromo group of the compound is lithiolated and then reacted with, for example, dimethylsilane chloride to form a bisdimethylsilane form, then reacted with, for example, methanol to form a dimethoxysilyl form, and further with hydrogen peroxide, for example, Fleming-Tamao oxidation. By doing so, 2,7-dihydroxy-10,15-dialkyldibenzoglycene is synthesized. Then, by brominating with 1,3-dibromo-5,5-dimethylhydantoin or the like, compound 3 having brominated positions 1, 3, 6 and 8 is synthesized.

化合物4の合成
化合物2をCuIなどの銅試薬の存在下、ナトリウムメトキシドと反応させて、臭素原子をメトキシ基に置換させた。該化合物のメトキシ基を、BBr、アルカンチオールなどの試薬の使用により、脱メチル化することによりメトキシ基を水酸基に置換させる。そして、Br、1,3-ジブロモ-5,5-ジメチルヒダントイン、N-ブロモスクシンイミドなどの臭素化剤で臭素化することにより、化合物4を合成する。立体障害の大変大きい1位(8位、9位、16位)や4位であっても、直接、臭素化が可能である。
The synthetic compound 2 of the compound 4 was reacted with sodium methoxide in the presence of a copper reagent such as CuI to replace the bromine atom with a methoxy group. The methoxy group of the compound is demethylated by using a reagent such as BBr 3 , alkanethiol, thereby substituting the methoxy group with a hydroxyl group. Then, compound 4 is synthesized by brominating with a brominating agent such as Br 2 , 1,3-dibromo-5,5-dimethylhydantin and N-bromosuccinimide. Direct bromination is possible even at the 1st (8th, 9th, 16th) or 4th place where the steric hindrance is very large.

化合物5の合成
化合物1をCuIなどの銅試薬の存在下、ナトリウムメトキシドと反応させて、臭素原子をメトキシ基に置換させた。該化合物のメトキシ基を、BBr、またはアルカンチオールなどの試薬の使用により、脱メチル化することによりメトキシ基を水酸基に置換させる。そして、Br、1,3-ジブロモ-5,5-ジメチルヒダントイン、N-ブロモスクシンイミドなどの臭素化剤で臭素化することにより、化合物5を合成する。
The synthetic compound 1 of the compound 5 was reacted with sodium methoxide in the presence of a copper reagent such as CuI to replace the bromine atom with a methoxy group. The methoxy group of the compound is demethylated by using a reagent such as BBr 3 or alkanethiol to replace the methoxy group with a hydroxyl group. Then, compound 5 is synthesized by brominating with a brominating agent such as Br 2 , 1,3-dibromo-5,5-dimethylhydantin and N-bromosuccinimide.

第2の本発明のジベンゾ[g,p]クリセン誘導体は、アルコキシ基および/またはポリオキシアルキレン基を6個以上と、ハロゲノ基を4個有することを特徴とする。 The second dibenzo [g, p] chrysene derivative of the present invention is characterized by having 6 or more alkoxy groups and / or polyoxyalkylene groups and 4 halogeno groups.

アルコキシ基およびまたはポリオキシアルキレン基の個数の下限は6個以上であるが、上限は10個以下が好ましい。ハロゲノ基の個数の下限は4個以上であるが、上限は8個以下が好ましい。 The lower limit of the number of alkoxy groups and / or polyoxyalkylene groups is 6 or more, but the upper limit is preferably 10 or less. The lower limit of the number of halogeno groups is 4 or more, but the upper limit is preferably 8 or less.

アルコキシ基および/またはポリオキシアルキレン基の置換基の位置は特に限定されないが、少なくとも6つのアルキル基等は、2位、3位、6値、7位、10位、11位、14位の位置に置換されていることが好ましい。 The positions of the substituents of the alkoxy group and / or the polyoxyalkylene group are not particularly limited, but at least 6 alkyl groups and the like are located at the 2-position, 3-position, 6-value, 7-position, 10-position, 11-position and 14-position. It is preferable that it is replaced with.

ハロゲノ基の置換基の位置は特に限定されないが、少なくとも4つのハロゲノ基は、1位、5位、9位と13位の位置に置換されていることが好ましい。 The position of the substituent of the halogeno group is not particularly limited, but it is preferable that at least four halogeno groups are substituted at the 1-position, 5-position, 9-position and 13-position.

アルコキシ基としては、置換基を有していてもよい直鎖状又は分枝状のアルコキシ基が挙げられる。アルコキシ基の炭素数は1~12が好ましく、3~8がより好ましい。例えば、メトキシ、エトキシ、n-プロポキシ、n-ブトキシ、iso-ブトキシ、n-ペントキシ、2,2-ジメチルプロポキシ、n-ヘキトキシ、n-へプトキシ、n-オクトキシ、n-ノニルオキシ、n-デシルオキシ、n-ウンデシルオキシ、n-ドデシルオキシ等が挙げられる。なかでも、n-プロポキシ、n-ブトキシ、iso-ブトキシ、n-ペントキシル、2,2-ジメチルプロポキシ、n-ヘキトキシ、n-ヘプトキシ、n-オクトキシが好ましい。 Examples of the alkoxy group include a linear or branched alkoxy group which may have a substituent. The alkoxy group preferably has 1 to 12 carbon atoms, more preferably 3 to 8 carbon atoms. For example, methoxy, ethoxy, n-propoxy, n-butoxy, iso-butoxy, n-pentoxy, 2,2-dimethylpropoxy, n-hexitoxy, n-heptoxy, n-octoxy, n-nonyloxy, n-decyloxy, Examples thereof include n-undecyloxy and n-dodecyloxy. Of these, n-propoxy, n-butoxy, iso-butoxy, n-pentoxyl, 2,2-dimethylpropoxy, n-hexitoxy, n-heptoxy, and n-octoxy are preferable.

ポリオキシアルキレン基や、ハロゲノ基としては、前述したものが挙げられる。 Examples of the polyoxyalkylene group and the halogeno group include those described above.

前記ジベンゾ[g,p]クリセン誘導体の中でも、下記式

Figure 2022087523000013
(化合物14)
で表される化合物が好ましい。 Among the dibenzo [g, p] chrysene derivatives, the following formula
Figure 2022087523000013
(Compound 14)
The compound represented by is preferable.

化合物14の合成
3、6、11、14―テトラメトキシジベンゾ[g,p]クリセンを、臭素、1,3-ジブロモ-5,5-ジメチルヒダントイン、N-ブロモスクシンイミドなどの臭素化剤で臭素化して、2、7、10、15位に臭素原子を有する臭素化体を合成した後に、CuIなどの銅触媒の存在下、ナトリウムメトキシドなどによりエーテル化して、2、3、6、7、10、11、14、15-オクタメトキシジベンゾ[g,p]クリセンを合成する。Br、1,3-ジブロモ-5,5-ジメチルヒダントイン、N-ブロモスクシンイミドなどの臭素化剤で臭素化することにより、化合物14を合成する。
Synthesis of Compound 14 Brominated 3,6,11,14-tetramethoxydibenzo [g, p] chrysen with a brominating agent such as bromine, 1,3-dibromo-5,5-dimethylhydantin, N-bromosuccinimide, etc. After synthesizing a brominated product having a bromine atom at the 2, 7, 10, 15 position, it is etherified with sodium methoxide or the like in the presence of a copper catalyst such as CuI, and is 2, 3, 6, 7, 10 , 11, 14, 15-Octamethoxydibenzo [g, p] chrysen. Compound 14 is synthesized by brominating with a brominating agent such as Br 2 , 1,3-dibromo-5,5-dimethylhydantin, N-bromosuccinimide and the like.

本発明のジベンゾ[g,p]クリセン誘導体は、高分子材料、光機能性材料、電子材料の分野に適用される。具体的には、リソグラフィー用材料、有機EL用材料、接着剤等の樹脂用材料、スーパーエンジニアリングプラスチック用材料等が挙げられる。特に、薄膜トランジスターの正孔輸送物質や有機発光ダイオードの発光素子や、その前駆体の化合物として応用可能である。また、本発明のジベンゾ[g,p]クリセン誘導体の製造方法によれば、本発明の化合物を異性体の副生成をほとんど起こすこと無く、選択的かつ簡便に作製することができる。 The dibenzo [g, p] chrysene derivative of the present invention is applied to the fields of polymer materials, photofunctional materials, and electronic materials. Specific examples thereof include materials for lithography, materials for organic EL, materials for resins such as adhesives, materials for super engineering plastics, and the like. In particular, it can be applied as a hole transporting substance of a thin film, a light emitting element of an organic light emitting diode, or a compound of a precursor thereof. Further, according to the method for producing a dibenzo [g, p] chrysene derivative of the present invention, the compound of the present invention can be selectively and easily produced with almost no by-production of isomers.

以下、本発明の実施例について説明するが、本発明は、以下の実施例に限定されない。 Hereinafter, examples of the present invention will be described, but the present invention is not limited to the following examples.

実施例において、禁水反応はアルゴンまたは窒素雰囲気下で行なっており、特に断りのない限り実験は禁水条件で実施した。購入した無水溶媒・試薬は、改めて精製して純度を向上させることなく使用した。薄層クロマトグラフィーとしてMerck silica 60F254を使用し、カラムクロマトグラフィーとしてシリカゲル60(関東化学(株)製)を用いた。高分解能質量測定(HRMS)として飛行時間型質量分析法(MALDI-TOFまたはLCMS-IT-TOF)または直接質量分析法(DART-MS)のいずれかを用いた。 In the examples, the water-reactive reaction was carried out in an argon or nitrogen atmosphere, and the experiment was carried out under water-reactive conditions unless otherwise specified. The purchased anhydrous solvent / reagent was purified again and used without improving its purity. Merck silica 60F 254 was used for thin layer chromatography, and silica gel 60 N (manufactured by Kanto Chemical Co., Ltd.) was used for column chromatography. Either time-of-flight mass spectrometry (MALDI-TOF or LCMS-IT-TOF) or direct mass spectrometry (DART-MS) was used as high-resolution mass spectrometry (HRMS).

H-NMR、13C-NMRスペクトルについては、5mmのQNPプローブを用い、それぞれ400MHz、100MHzで測定した。化学シフト値はδ(ppm)で示しており、それぞれの溶媒中での基準値はH-NMR:CHCl(7.26),CHCl(5.32)、DMSO(2.50);13C-NMR:CDCl(77.0)、DMSO(39.5)としている。分裂のパターンは、s:単一線、d:二重線、t:三重線、q:四重線、m:多重線、br:幅広線で示す。 The 1 H-NMR and 13 C-NMR spectra were measured at 400 MHz and 100 MHz, respectively, using a 5 mm QNP probe. The chemical shift values are shown in δ (ppm), and the reference values in each solvent are 1 H-NMR: CHCl 3 (7.26), CH 2 Cl 2 (5.32), DMSO (2.50). ); 13 C-NMR: CDCl 3 (77.0), DMSO (39.5). The pattern of division is shown by s: single line, d: double line, t: triple line, q: quadruple line, m: multiple line, br: wide line.

Figure 2022087523000014
Figure 2022087523000014

実施例1(3,6,11,14-テトラブロモ-2,7,10,15-テトラブチルジベンゾ[g,p]クリセン(化合物1)の合成)

Figure 2022087523000015
Example 1 (Synthesis of 3,6,11,14-Tetrabromo-2,7,10,15-Tetrabutyldibenzo [g, p] chrysene (Compound 1))
Figure 2022087523000015

化合物6の合成
アルゴン雰囲気下、DBC(2-Br)(3.86g,6mmol)を無水テトラヒドロフラン(100mL)に懸濁させ、-78℃で、ノルマルブチルリチウム(22.5mL, 36mmol,1.59Mヘキサン溶液)を5分かけて滴下した。30分間撹拌後、1-ブロモブタン(5.8mL,54mmol)を5分かけて加え、室温まで自然昇温し、1時間撹拌した。0℃で、水(40mL)を用いて反応停止操作を行った後、有機層を分離し、水層に対してトルエン(20mL×3)で抽出操作を行った。合わせた有機層を飽和食塩水で洗浄(40mL)、芒硝乾燥、真空乾燥を行い、橙色粘性物質の粗生成物を得た。シリカゲルを用いたカラム精製操作(展開溶媒はヘキサン/トルエン=19/1)を行い、2.74g(83%)の化合物6を無色粘性物質として得た。
Synthesis of Compound 6 Under an argon atmosphere, DBC (2-Br) 4 (3.86 g, 6 mmol) was suspended in anhydrous tetrahydrofuran (100 mL) and at −78 ° C., normal butyllithium (22.5 mL, 36 mmol, 1. 59M hexane solution) was added dropwise over 5 minutes. After stirring for 30 minutes, 1-bromobutane (5.8 mL, 54 mmol) was added over 5 minutes, the temperature was naturally raised to room temperature, and the mixture was stirred for 1 hour. After the reaction was stopped using water (40 mL) at 0 ° C., the organic layer was separated and the aqueous layer was extracted with toluene (20 mL × 3). The combined organic layer was washed with saturated brine (40 mL), dried over Glauber's salt, and vacuum dried to obtain a crude product of an orange viscous substance. A column purification operation using silica gel (developing solvent was hexane / toluene = 19/1) was carried out to obtain 2.74 g (83%) of compound 6 as a colorless viscous substance.

HNMR(400MHz,CDCl)8.59(d,J=8.5Hz,4H),8.47(d,J=1.4Hz,4H),7.44(dd,J=8.5,1.4Hz,4H), 2.91(t,J=7.6Hz,8H),1.80(tt,J=7.6,7.6Hz,8H),1.48(tq,J=7.6,7.6Hz,8H),1.00(t,J=7.6Hz,12H)ppm
13CNMR(100MHz,CDCl)141.1,130.9,129.0,127.8,127.4,126.7,123.1,36.3,34.2,22.8,14.3ppm
MS(DART-TOFMS)m/z:553[MH]
IR(neat):2952,2925,2857,1610,1499,1455,1436,376,826cm-1
HRMS(DART-TOFMS)calcd for C4249:553.3829 [H],Found:553.3848
Anal.Calcd for C428:C,91.25;H,8.75.Found:C,91.24;H,8.71.
1 1 HNMR (400MHz, CDCl 3 ) 8.59 (d, J = 8.5Hz, 4H), 8.47 (d, J = 1.4Hz, 4H), 7.44 (dd, J = 8.5) 1.4Hz, 4H), 2.91 (t, J = 7.6Hz, 8H), 1.80 (tt, J = 7.6,7.6Hz, 8H), 1.48 (tq, J = 7) .6,7.6Hz, 8H), 1.00 (t, J = 7.6Hz, 12H) ppm
13 CNMR (100MHz, CDCl 3 ) 141.1, 130.9, 129.0, 127.8, 127.4, 126.7, 123.1, 36.3, 34.2, 22.8, 14. 3ppm
MS (DART-TOFMS) m / z: 553 [MH] +
IR (neat): 2952, 2925, 2857, 1610, 1499, 1455, 1436, 376, 826 cm -1
HRMS (DART-TOFMS) calcd for C 42 H 49 : 553.3829 [H] + , Found: 553.3848
Anal. Calcd for C 42 H 48 : C, 91.25; H, 8.75. Found: C, 91.24; H, 8.71.

化合物1の合成
アルゴン雰囲気下、100mLの一口フラスコに化合物6(2.74g,5.0mmol)と塩化メチレン(20mL)を加えた。-20℃で、臭素(10.2mL,43mmol,4.2M塩化メチレン溶液)を3分かけて滴下し、2時間撹拌後(茶色懸濁液)、0℃で飽和チオ硫酸ナトリウム(20mL)を加え、反応を停止した。反応溶液をメタノール(180mL)の入ったビーカーに注ぎ30分間撹拌した。析出した固体を水(250mL)で洗浄した後、得た固体をクロロホルムに溶かした。このクロロホルム溶液を飽和食塩水で洗浄(40mL)、芒硝乾燥、真空乾燥を行い、黄白色の粗生成物を得た。再結晶操作(トルエン/酢酸エチル=1/2,v/v)を行い、2.28g(61%)の化合物1を白色固体として得た。
Synthesis of Compound 1 Under an argon atmosphere, Compound 6 (2.74 g, 5.0 mmol) and methylene chloride (20 mL) were added to a 100 mL bite flask. Bromine (10.2 mL, 43 mmol, 4.2 M methylene chloride solution) was added dropwise at -20 ° C over 3 minutes, and after stirring for 2 hours (brown suspension), saturated sodium thiosulfate (20 mL) was added at 0 ° C. In addition, the reaction was stopped. The reaction solution was poured into a beaker containing methanol (180 mL) and stirred for 30 minutes. The precipitated solid was washed with water (250 mL), and then the obtained solid was dissolved in chloroform. This chloroform solution was washed with saturated brine (40 mL), dried with sardine and vacuum dried to obtain a yellowish white crude product. A recrystallization operation (toluene / ethyl acetate = 1/2, v / v) was carried out to obtain 2.28 g (61%) of Compound 1 as a white solid.

HNMR(400MHz,CDCl)8.71(s,4H),8.40(s,4H),3.00(t,J=7.6,8H),1.78(tt,J=7.6,7.6Hz,8H), 1.5(tq,J=7.6,7.6Hz,8H),1.05(t,J=7.6Hz,12H)ppm
13CNMR(100MHz,CDCl)140.8,131.8,129.3,128.2,125.3,124.6,124.0,36.5,32.6,22.9,14.2ppm
MS(DART-TOFMS)m/z:868[M]
IR(neat):2949,2917,2857,1606,1435,1061,868cm-1
HRMS(DART-TOFMS)calcd for C4244Br:868.0136[M],Found:868.0122
Anal. Calcd for C4244Br:C,58.09;H,5.11.Found:C,57.86;H,5.10
1 1 HNMR (400MHz, CDCl 3 ) 8.71 (s, 4H), 8.40 (s, 4H), 3.00 (t, J = 7.6,8H), 1.78 (tt, J = 7) .6,7.6Hz, 8H), 1.5 (tq, J = 7.6,7.6Hz, 8H), 1.05 (t, J = 7.6Hz, 12H) ppm
13 CNMR (100MHz, CDCl 3 ) 140.8, 131.8, 129.3, 128.2, 125.3, 124.6, 124.0, 36.5, 32.6, 22.9, 14. 2ppm
MS (DART-TOFMS) m / z: 868 [M] +
IR (neat): 2949, 2917, 2857, 1606, 1435, 1061, 868 cm -1
HRMS (DART-TOFMS) calcd for C 42 H 44 Br 4 : 868.0136 [M] + , Found: 868.0122
Anal. Calcd for C 42 H 44 Br 4 : C, 58.09; H, 5.11. Found: C, 57.86; H, 5.10

3位・6位・11位・14位に臭素が置換した臭素化体は、トルエンに対してはほとんど溶解しなかった。一方、100mgの化合物1は、室温下22mLのトルエンに溶解した。 The brominated product in which bromine was substituted at the 3-position, 6-position, 11-position, and 14-position was hardly dissolved in toluene. On the other hand, 100 mg of compound 1 was dissolved in 22 mL of toluene at room temperature.

実施例2(2,7,10,15-テトラブロモ-3,6,11,14-テトラブチルジベンゾ[g,p]クリセン(化合物2)の合成)

Figure 2022087523000016
Example 2 (Synthesis of 2,7,10,15-Tetrabromo-3,6,11,14-Tetrabutyldibenzo [g, p] chrysene (Compound 2))
Figure 2022087523000016

化合物7の合成
アルゴン雰囲気下、DBC(3-Br)4(4.64g,7.2mmol)を無水テトラヒドロフラン(140mL)に懸濁させ、-78℃でノルマルブチルリチウム(27.2 mL,1.59Mヘキサン溶液)を5分かけて滴下した。30分間撹拌後、1-ブロモブタン(7.0mL,65mmol)を5分かけて加え、室温まで自然昇温後1時間撹拌した。水(40mL)で反応停止操作を行った後、有機層を分離し、水層に対してトルエン(20mL×3)で抽出操作を行った。合わせた有機層を飽和食塩水で洗浄(40mL)、芒硝乾燥、真空乾燥を行い、黄色の粗生成物を得た。シリカゲルを用いたカラム精製(展開溶媒はヘキサン/塩化メチレン=4/1)を行い、2.60gの橙白色固体を得た。再沈殿操作(塩化メチレン/メタノール=1/8,v/v)後に、得られた白色固体2.58gに対して蒸留したプロピオニトリルを用いて再結晶操作(18mL/g)を行い、2.16g(54%)の化合物7を白色結晶として得た。
Synthesis of Compound 7 Under an argon atmosphere, DBC (3-Br) 4 (4.64 g, 7.2 mmol) was suspended in anhydrous tetrahydrofuran (140 mL) and at −78 ° C., normal butyllithium (27.2 mL, 1. 59M hexane solution) was added dropwise over 5 minutes. After stirring for 30 minutes, 1-bromobutane (7.0 mL, 65 mmol) was added over 5 minutes, and the mixture was naturally heated to room temperature and then stirred for 1 hour. After the reaction was stopped with water (40 mL), the organic layer was separated and the aqueous layer was extracted with toluene (20 mL × 3). The combined organic layers were washed with saturated brine (40 mL), dried over Glauber's salt and vacuum dried to obtain a crude yellow product. Column purification using silica gel (developing solvent was hexane / methylene chloride = 4/1) was performed to obtain 2.60 g of an orange-white solid. After the reprecipitation operation (methylene chloride / methanol = 1/8, v / v), a recrystallization operation (18 mL / g) was performed on 2.58 g of the obtained white solid using distilled propionitrile. .16 g (54%) of compound 7 was obtained as white crystals.

HNMR(400MHz, CDCl)8.57(d,J=8.4Hz,4H),8.50(d,J=1.5Hz,4H),7.49(dd,J=8.4,1.5Hz,4H), 2.8(t,J=7.5Hz,8H),1.75(tt,J=7.5,7.5Hz,8H), 1.44(tq,J=7.5,7.5Hz,8H),0.96(t,J=7.5Hz,12H)ppm
13CNMR(100MHz,CDCl)140.8,129.4,129.1,128.5,127.9,127.5,123.5,36.2,34.1,22.6,14.3ppm
MS(DART-TOFMS)m/z:553[MH]
IR(neat):2952,2921,2853,1610,1464,1376,802,739cm-1
HRMS(DART-TOF)calcd for C4249 [MH]:553.3829,Found:553.3838
Anal. Calcd for C4248;C,91.25;H,8.75.Found:C,91.26;H,8.90.
1 1 HNMR (400MHz, CDCl 3 ) 8.57 (d, J = 8.4Hz, 4H), 8.50 (d, J = 1.5Hz, 4H), 7.49 (dd, J = 8.4) 1.5Hz, 4H), 2.8 (t, J = 7.5Hz, 8H), 1.75 (tt, J = 7.5, 7.5Hz, 8H), 1.44 (tq, J = 7) .5, 7.5Hz, 8H), 0.96 (t, J = 7.5Hz, 12H) ppm
13 CNMR (100MHz, CDCl 3 ) 140.8, 129.4, 129.1, 128.5, 127.9, 127.5, 123.5, 36.2, 34.1, 22.6, 14. 3ppm
MS (DART-TOFMS) m / z: 553 [MH] +
IR (neat): 2952,2921,385,1610,1464,1376,802,739cm -1
HRMS (DART-TOF) calcd for C 42 H 49 [MH] + : 553.3829, Found: 553.3838
Anal. Calcd for C 42 H 48 ; C, 91.25; H, 8.75. Found: C, 91.26; H, 8.90.

化合物2の合成
アルゴン雰囲気下、100mLの一口フラスコに化合物7(2.32g,4.2mmol)と塩化メチレン(20mL)を加えた。室温で、臭素(1.0mL,20mmol,4.2 M塩化メチレン溶液)を3分かけて滴下し、2時間撹拌後、0℃で、3Mチオ硫酸ナトリウム水溶液(20mL)を用いて反応停止操作を行った。有機層を分離し、水層に対して塩化メチレン(20mL×3)で抽出操作を行った。合わせた有機層を飽和食塩水で洗浄(40mL)、芒硝乾燥、真空乾燥後、黄白色の粗生成物を得た。酢酸エチルを用いた再結晶操作(55mL/g)を行い、1.91g(52%)の化合物2を白色結晶として得た。
Synthesis of Compound 2 Under an argon atmosphere, Compound 7 (2.32 g, 4.2 mmol) and methylene chloride (20 mL) were added to a 100 mL bite flask. At room temperature, bromine (1.0 mL, 20 mmol, 4.2 M methylene chloride solution) was added dropwise over 3 minutes, and after stirring for 2 hours, the reaction was stopped at 0 ° C. using a 3 M aqueous sodium thiosulfate solution (20 mL). Was done. The organic layer was separated, and the aqueous layer was subjected to an extraction operation with methylene chloride (20 mL × 3). The combined organic layers were washed with saturated brine (40 mL), dried over Glauber's salt and vacuum dried to obtain a yellowish white crude product. A recrystallization operation (55 mL / g) using ethyl acetate was carried out to obtain 1.91 g (52%) of compound 2 as white crystals.

HNMR(400MHz,CDCl)8.63(s,4H),8.25(s,4H),2.84(t,J=7.6Hz,8H),1.70(tt,J=7.6,7.6Hz,8H),1.48(tq,J=7.6,7.6Hz,8H),0.99(t,J=7.6Hz,12H)ppm
13CNMR(100MHz,CDCl)140.1,128.7,128.5,127.5,127.4,126.1,123.8,36.4,32.5,22.9,14.2ppm
MS(DART-TOFMS)m/z:868[M]
IR(neat):2955,2924,2857,1460,1393,1013,871,728,468cm-1
HRMS(DART-TOFMS)calcd for C4244Br:868.0136[M],Found:868.0163
Anal. Calcd for C4244Br;C,58.09;H,5.11.Found:C,57.66;H,5.07
1 1 HNMR (400MHz, CDCl 3 ) 8.63 (s, 4H), 8.25 (s, 4H), 2.84 (t, J = 7.6Hz, 8H), 1.70 (tt, J = 7) .6,7.6Hz, 8H), 1.48 (tq, J = 7.6,7.6Hz, 8H), 0.99 (t, J = 7.6Hz, 12H) ppm
13 CNMR (100MHz, CDCl 3 ) 140.1, 128.7, 128.5, 127.5, 127.4, 126.1, 123.8, 36.4, 32.5, 22.9, 14. 2ppm
MS (DART-TOFMS) m / z: 868 [M] +
IR (neat): 2955, 2924, 2857, 1460, 1393, 1013, 871, 728, 468 cm -1
HRMS (DART-TOFMS) calcd for C 42 H 44 Br 4 : 868.0136 [M] + , Found: 868.0163
Anal. Calcd for C 42 H 44 Br 4 ; C, 58.09; H, 5.11. Found: C, 57.66; H, 5.07

100mgの化合物2は、室温で、0.4mLのトルエン、4mLのヘキサン、1.3mL 塩化メチレン、0.3mLのクロロホルム、0.3mLのテトラヒドロフランそれぞれに溶解した。一方、ブチル基を一つも持たない2位・7位・10位・15位臭素化体は、これらのどの溶媒にほとんど溶解しなかった。 100 mg of Compound 2 was dissolved at room temperature in 0.4 mL of toluene, 4 mL of hexane, 1.3 mL of methylene chloride, 0.3 mL of chloroform and 0.3 mL of tetrahydrofuran, respectively. On the other hand, the 2-position, 7-position, 10-position, and 15-position brominated products having no butyl group were hardly dissolved in any of these solvents.

実施例3(9,11,14,16-テトラブロモ-2,7-ジブチル-10,15-ジメトキシベンゾ[g,p]クリセン(化合物8)の合成)

Figure 2022087523000017
Example 3 (Synthesis of 9,11,14,16-Tetrabromo-2,7-dibutyl-10,15-dimethoxybenzo [g, p] chrysene (Compound 8))
Figure 2022087523000017

化合物3の合成
アルゴン雰囲気下、ジオール体(473mg,1.0 mmol)の無水クロロホルム(8 mL)溶液に1、3-ジブロモ-5、5-ジメチルヒダントイン(DBDMH,629mg, 2.2mmol)を室温で加えた。4時間撹拌後、飽和チオ硫酸ナトリウム水溶液(5mL)と1M塩酸(10mL)で反応停止操作を行った。水層に対して塩化メチレンで抽出操作(10mL×3)を行い、合わせた有機層を飽和食塩水で洗浄(10mL)、芒硝乾燥、真空乾燥後、粗生成物を得た。シリカゲルを用いた濾過カラム精製操作(展開溶媒はトルエン)を行い、550mg(70%)の化合物3を緑色固体として得た。
Synthesis of Compound 3 Under an argon atmosphere, 1,3-dibromo-5,5-dimethylhydantoin (DBDMH, 629 mg, 2.2 mmol) was added to a solution of diol (473 mg, 1.0 mmol) in anhydrous chloroform (8 mL) at room temperature. Added in. After stirring for 4 hours, the reaction was stopped with saturated aqueous sodium thiosulfate solution (5 mL) and 1 M hydrochloric acid (10 mL). An extraction operation (10 mL × 3) was carried out on the aqueous layer with methylene chloride, and the combined organic layer was washed with saturated brine (10 mL), dried with sardine and vacuum dried to obtain a crude product. A filtration column purification operation using silica gel (developing solvent was toluene) was carried out to obtain 550 mg (70%) of compound 3 as a green solid.

HNMR(400MHz,CDCl)8.99(d,J=1.7Hz,2H),8.55(s,2H),8.43(d,J=8.4Hz,2H),7.48(dd,J=8.4,1.7Hz,2H)6.53(s,2H),2.85(t,J=7.3Hz,4H), 1.76(tt,J=7.3,7.3Hz,4H),1.45(tq,J=7.3,7.3Hz,4H),0.96(t,J=7.3Hz,6H)ppm
13CNMR(100MHz,CDCl)148.8,139.9,131.1,130.2,128.9,128.38,128.36,127.9,127.8,125.5,123.6,109.5,108.4,36.0,22.7,14.3ppm
MS(DART-TOFMS)m/z:789[MH]
IR(neat):3470,2921,1575,1412,1176,826cm-1
HRMS(DART-TOF)calcd for C3429Br[MH]:788.8860,Found:788.8868
1 1 HNMR (400MHz, CDCl 3 ) 8.99 (d, J = 1.7Hz, 2H), 8.55 (s, 2H), 8.43 (d, J = 8.4Hz, 2H), 7.48 (Dd, J = 8.4, 1.7Hz, 2H) 6.53 (s, 2H), 2.85 (t, J = 7.3Hz, 4H), 1.76 (tt, J = 7.3) , 7.3Hz, 4H), 1.45 (tq, J = 7.3, 7.3Hz, 4H), 0.96 (t, J = 7.3Hz, 6H) ppm
13 CNMR (100MHz, CDCl 3 ) 148.8, 139.9, 131.1, 130.2, 128.9, 128.38, 128.36, 127.9, 127.8, 125.5, 123. 6,109.5,108.4,36.0,22.7,14.3ppm
MS (DART-TOFMS) m / z: 789 [MH] +
IR (neat): 3470, 2921, 1575, 1412, 1176, 826 cm -1
HRMS (DART-TOF) calcd for C 34 H 29 Br 4 O 2 [MH] + : 788.8860, Found: 788.88868

化合物8の合成
化合物3(398mg,0.5mmol)のアセトン(10mL)溶液にヨウ化メチル(0.57mL,10mmol)を加え、ジアザビシクロウンデセン(DBU,0.68mL,5mmol)を3分かけて滴下した。室温で15時間撹拌後に3M塩酸水溶液(10mL)で反応停止操作を行った。得られたサンプルをトルエンで希釈し、水層に対してトルエンで抽出操作(10mL×3)を行った。合わせた有機層を飽和食塩水で洗浄(10mL)、芒硝乾燥、真空乾燥後、粗生成物を得た。シリカゲルを用いた濾過カラム精製操作(展開溶媒はトルエン/ヘキサン=1/1)を行い、298mg(73%)の化合物8を黄白色固体として得た。
Synthesis of Compound 8 Methyl iodide (0.57 mL, 10 mmol) is added to a solution of Compound 3 (398 mg, 0.5 mmol) in acetone (10 mL), and diazabicycloundecene (DBU, 0.68 mL, 5 mmol) is added for 3 minutes. Dropped over. After stirring at room temperature for 15 hours, the reaction was stopped with a 3M aqueous hydrochloric acid solution (10 mL). The obtained sample was diluted with toluene, and the aqueous layer was subjected to an extraction operation (10 mL × 3) with toluene. The combined organic layers were washed with saturated brine (10 mL), dried over Glauber's salt and vacuum dried to obtain a crude product. A filtration column purification operation using silica gel (developing solvent was toluene / hexane = 1/1) was carried out to obtain 298 mg (73%) of Compound 8 as a yellowish white solid.

HNMR(400MHz,CDCl)9.09(d,J=1.6Hz,2H),8.59(s,2H),8.41(d,J=8.3Hz,2H),7.48(dd,J=8.3,1.6Hz,2H),4.06(s,6H),2.86(t,J=7.5Hz,4H),1.77(tt,J=7.5,7.5Hz,4H),1.45(tq,J=7.5,7.5Hz,4H),0.98(t,J=7.5Hz,6H)ppm
13CNMR(100MHz,CDCl)153.4,140.1,131.3,130.9,130.3,129.6,129.2,128.52,128.48,128.2,127.8,123.4,117.5,116.8,61.1,36.0,33.7, 22.5,14.2ppm
MS(DARTTOFMS)m/z:817[MH]
IR(neat):2952,2932,2857,1606,1369,997,827cm-1
HRMS(DART-TOF)calcd for C3633Br[MH]:816.9168,Found:816.9144
Anal.Calcd for C3632Br;C,52.97;H,3.95. Found:C,52.83;H,3.91
1 1 HNMR (400MHz, CDCl 3 ) 9.09 (d, J = 1.6Hz, 2H), 8.59 (s, 2H), 8.41 (d, J = 8.3Hz, 2H), 7.48 (Dd, J = 8.3, 1.6Hz, 2H), 4.06 (s, 6H), 2.86 (t, J = 7.5Hz, 4H), 1.77 (tt, J = 7. 5,7.5Hz, 4H), 1.45 (tq, J = 7.5,7.5Hz, 4H), 0.98 (t, J = 7.5Hz, 6H) ppm
13 CNMR (100MHz, CDCl 3 ) 153.4, 140.1, 131.3, 130.9, 130.3, 129.6, 129.2, 128.52, 128.48, 128.2, 127. 8, 123.4, 117.5, 116.8, 61.1, 36.0, 33.7, 22.5, 14.2 ppm
MS (DARTTOFMS) m / z: 817 [MH] +
IR (neat): 2952,2932,2857,1606,1369,997,827cm -1
HRMS (DART-TOF) calcd for C 36 H 33 Br 4 O 2 [MH] + : 816.9168, Found: 816.9144
Anal. Calcd for C 36 H 32 Br 4 O 2 ; C, 52.97; H, 3.95. Found: C, 52.83; H, 3.91

化合物3は熱に対して弱いため、化合物8について、X線構造解析を行った。図1にその結果を示す。ねじれ角は44.59°と大きな値であった。また、フェノール性水酸基をもつDBCは、ベイエリアのような立体的要請の大きな位置であっても、オルト位にて特異的に臭素化が進行することがわかった。 Since compound 3 is vulnerable to heat, X-ray structural analysis was performed on compound 8. The result is shown in FIG. The helix angle was as large as 44.59 °. It was also found that DBC having a phenolic hydroxyl group specifically promotes bromination at the ortho position even at a position having a large steric requirement such as the bay area.

実施例4(1,8,9,16-テトラブロモ-3,6,11,14-テトラブチル-2,7,10,15-テトラヒドロキシシベンゾ[g,p]クリセン(化合物4)の合成)

Figure 2022087523000018
Example 4 (Synthesis of 1,8,9,16-Tetrabromo-3,6,11,14-Tetrabutyl-2,7,10,15-Tetrahydroxycibenzo [g, p] chrysene (Compound 4))
Figure 2022087523000018

化合物9の合成
アルゴン雰囲気下、化合物2(2.5g,2.9mmol)をジメチルホルムアミド(240mL)に懸濁させ、ヨウ化銅(3.3g,17.3mmol)とナトリウムメトキシド(57mL,288mmol,28%メタノール溶液)を加えた。反応溶液を120℃で2時間撹拌後、3M塩酸水溶液(100mL)で反応停止操作を行った。得られたサンプルを塩化メチレンで希釈し、水層に対して塩化メチレンで抽出操作(50mL×3)を行った。合わせた有機層を飽和食塩水で洗浄(100mL)、芒硝乾燥、真空乾燥後、粗生成物を得た。シリカゲルを用いた濾過カラム精製操作(展開溶媒はヘキサン/トルエン=4/1)を行い、1.28g(66%)の化合物9を白色固体として得た。
Synthesis of Compound 9 Under an argon atmosphere, Compound 2 (2.5 g, 2.9 mmol) was suspended in dimethylformamide (240 mL), and copper iodide (3.3 g, 17.3 mmol) and sodium methoxide (57 mL, 288 mmol) were suspended. , 28% methanol solution) was added. The reaction solution was stirred at 120 ° C. for 2 hours, and then the reaction was stopped with a 3M aqueous hydrochloric acid solution (100 mL). The obtained sample was diluted with methylene chloride, and the aqueous layer was subjected to an extraction operation (50 mL × 3) with methylene chloride. The combined organic layers were washed with saturated brine (100 mL), dried over Glauber's salt and vacuum dried to obtain a crude product. A filtration column purification operation using silica gel (developing solvent was hexane / toluene = 4/1) was carried out to obtain 1.28 g (66%) of compound 9 as a white solid.

HNMR(400MHz,CDCl)8.44(s,4H),7.87(s,4H),4.11(s,12H),2.81(t,J=7.8Hz,8H),1.70(tt,J=7.8,7.8Hz,8H),1.45(tq,J=7.8,7.8Hz,8H),0.96(t,J=7.8Hz,12H)ppm
13CNMR(100MHz,CDCl)152.0,126.7,125.8,(two peaks are overlapped),125.3,119.3,98.5,51.3,28.1,26.2,18.6,9.9ppm
MS(DART-TOFMS)m/z:673[MH]
IR(neat):2956,2921,2853,1603,1459,1408,1129,1025,838cm-1
HRMS(DARTTOF)calcd for C4657[MH]:673.4252,Found:673.4238
Anal. Calcd for C4657;C,82.10;H,8.39.Found:C,82.09;H,8.37.
1 1 HNMR (400MHz, CDCl 3 ) 8.44 (s, 4H), 7.87 (s, 4H), 4.11 (s, 12H), 2.81 (t, J = 7.8Hz, 8H), 1.70 (tt, J = 7.8, 7.8Hz, 8H), 1.45 (tq, J = 7.8, 7.8Hz, 8H), 0.96 (t, J = 7.8Hz, 12H) ppm
13 CNMR (100MHz, CDCl 3 ) 152.0, 126.7, 125.8, (two peaks are overlapped), 125.3, 119.3, 98.5, 51, 28, 1, 26.2 , 18.6, 9.9ppm
MS (DART-TOFMS) m / z: 673 [MH] +
IR (neat): 2956,2921,3853,1603,1459,1408,1129,1025,838cm -1
HRMS (DARTTOF) calcd for C 46 H 57 O 4 [MH] + : 673.4252, Found: 673.4238
Anal. Calcd for C 46 H 57 O 4 ; C, 82.10; H, 8.39. Found: C, 82.09; H, 8.37.

化合物10の合成
アルゴン雰囲気下、100mLフラスコに化合物9(659mg,0.98mmol)と塩化メチレン(14mL)を加えた。0℃で1M三臭化ホウ素(5.9mL,5.9mmol,塩化メチレン溶液)を5分かけて滴下後、10分間撹拌させた。室温まで自然昇温し、2時間撹拌後に、水(20mL)を用いて反応停止操作を行った。得られたサンプルを酢酸エチルで希釈し、水層に対して酢酸エチルで抽出操作(15mL×3)を行った。合わせた有機層を飽和食塩水で洗浄(15mL)、芒硝乾燥、真空乾燥後、592mg(98%)の化合物10を紫色固体として得た。得られたサンプルはこれ以上精製することなく次の臭素化の実験に供した。
Synthesis of Compound 10 Under an argon atmosphere, compound 9 (659 mg, 0.98 mmol) and methylene chloride (14 mL) were added to a 100 mL flask. 1M Boron tribromide (5.9 mL, 5.9 mmol, methylene chloride solution) was added dropwise at 0 ° C. over 5 minutes, and the mixture was stirred for 10 minutes. The temperature was naturally raised to room temperature, and after stirring for 2 hours, the reaction was stopped using water (20 mL). The obtained sample was diluted with ethyl acetate, and the aqueous layer was subjected to an extraction operation (15 mL × 3) with ethyl acetate. The combined organic layers were washed with saturated brine (15 mL), dried over Glauber's salt and vacuum dried to give 592 mg (98%) of compound 10 as a purple solid. The resulting sample was subjected to the next bromination experiment without further purification.

HNMR(400MHz,CDCN)8.32(s,4H),7.84(s,4H), 7.24(brs,4H),2.76(t,J=7.5Hz,8H),1.70(tt,J=7.5,7.5Hz,8H),1.45(tq,J=7.5,7.5Hz,8H),0.96(t,J=7.5Hz,12H)ppm
13CNMR(100MHz,DMSO-d)154.0,129.4,129.1,129.0,123.1,122.0,107.0,31.8,29.9,22.2,14.0ppm
MS(DART-TOFMS)m/z:617[MH]
IR(neat):3331,2956,2925,2857,1615,1423,1217,842cm-1
HRMS(DARTTOF)calcd for C4249[MH]:617.3625,Found:617.3610
Anal.Calcd for C4248;C,81.78;H,7.84.Found:C,81.78;H,7.78
1 1 HNMR (400MHz, CD 3 CN) 8.32 (s, 4H), 7.84 (s, 4H), 7.24 (brs, 4H), 2.76 (t, J = 7.5Hz, 8H) , 1.70 (tt, J = 7.5, 7.5Hz, 8H), 1.45 (tq, J = 7.5, 7.5Hz, 8H), 0.96 (t, J = 7.5Hz) , 12H) ppm
13 CNMR (100MHz, DMSO-d 6 ) 154.0, 129.4, 129.1, 129.0, 123.1, 122.0, 107.0, 31.8, 29.9, 22.2 14.0ppm
MS (DART-TOFMS) m / z: 617 [MH] +
IR (neat): 3331,295,2925,2857,1615,1423,1217,842cm -1
HRMS (DARTTOF) calcd for C 42 H 49 O 4 [MH] + : 617.3625, Found: 617.3610
Anal. Calcd for C 42 H 48 O 4 ; C, 81.78; H, 7.84. Found: C, 81.78; H, 7.78

化合物4の合成
アルゴン雰囲気下、100mLフラスコに化合物10(617mg,1.0mmol)と塩化メチレン(25mL)を加えた。0℃で、臭素(7.4mL,32mmol,4.2 M塩化メチレン溶液)を5分かけて滴下後15分間撹拌した。室温まで自然昇温し、17時間撹拌後、0℃で飽和チオ硫酸ナトリウム水溶液(50mL)と3M塩酸水溶液(50 mL)を用いて反応停止操作を行った。得られたサンプルを塩化メチレンで希釈し、水層に対して塩化メチレンで抽出操作(20mL×3)を行った。合わせた有機層を飽和食塩水で洗浄(20mL)、芒硝乾燥、真空乾燥後、粗生成物を得た。シリカゲルを用いた濾過カラム精製操作(展開溶媒はヘキサン/塩化メチレン=2/1)を行い、550mg(60%)の化合物4を黄白色固体として得た。
Synthesis of Compound 4 Under an argon atmosphere, compound 10 (617 mg, 1.0 mmol) and methylene chloride (25 mL) were added to a 100 mL flask. At 0 ° C., bromine (7.4 mL, 32 mmol, 4.2 M methylene chloride solution) was added dropwise over 5 minutes and then stirred for 15 minutes. The temperature was naturally raised to room temperature, and after stirring for 17 hours, the reaction was stopped using a saturated aqueous sodium thiosulfate solution (50 mL) and a 3M aqueous hydrochloric acid solution (50 mL) at 0 ° C. The obtained sample was diluted with methylene chloride, and the aqueous layer was subjected to an extraction operation (20 mL × 3) with methylene chloride. The combined organic layers were washed with saturated brine (20 mL), dried over Glauber's salt and vacuum dried to obtain a crude product. A filtration column purification operation using silica gel (developing solvent was hexane / methylene chloride = 2/1) was carried out to obtain 550 mg (60%) of Compound 4 as a yellowish white solid.

HNMR(400MHz,CDCl)8.20(s,4H),6.14(s,4H), 2.93(dt,J=14.4,7.3Hz,4H),2.77(dt,J=14.4, 7.3Hz,4H),1.73(ddt,J=7.3,7.3,7.3Hz,8H),1.49(tq,J=7.3,7.3Hz,8H),0.99(t,J=7.3Hz,12H) ppm
13CNMR(100MHz,CDCl)150.3,131.6,129.2,128.1,126.7,126.2,111.2,32.2,31.7,23.4,14.7ppm
MS(DART-TOFMS)m/z:933[MH]
IR(neat):2949(OH,sharp),2917,2857,1606,1435,1061,868cm-1
HRMS(DART-TOFMS) calcd for C4245Br:933.0010[MH],Found:932.9993
Anal. Calcd for C4244Br:C,54.10;H,4.76. Found:C,54.08;H,4.52
1 1 HNMR (400MHz, CDCl 3 ) 8.20 (s, 4H), 6.14 (s, 4H), 2.93 (dt, J = 14.4, 7.3Hz, 4H), 2.77 (dt) , J = 14.4, 7.3Hz, 4H), 1.73 (ddt, J = 7.3, 7.3, 7.3Hz, 8H), 1.49 (tq, J = 7.3, 7) .3Hz, 8H), 0.99 (t, J = 7.3Hz, 12H) ppm
13 CNMR (100MHz, CDCl 3 ) 150.3, 131.6, 129.2, 128.1, 126.7, 126.2, 111.2, 32.2, 31.7, 23.4, 14. 7ppm
MS (DART-TOFMS) m / z: 933 [MH] +
IR (neat): 2949 (OH, sharp), 2917, 2857, 1606, 1435, 1061, 868 cm-1
HRMS (DART-TOFMS) calcd for C 42 H 45 Br 4 O 4 : 933.0010 [MH] + , Found: 932.9393
Anal. Calcd for C 42 H 44 Br 4 O 4 : C, 54.10; H, 4.76. Found: C, 54.08; H, 4.52

化合物4について、X線構造解析を行った。図2にその結果を示す。ねじれ角は55.89°と非常に大きな値であった。化合物4がうねるような形で非平面性を帯びた構造をとっていることが理解できる。この官能基が密集した影響は、IR分光分析においても確認でき、水酸基のピークが2949cm-1に鋭い罫線として確認された。水酸基が他の水酸基と会合していないことを意味しており、水酸基周辺が立体的に大変混んでいることの傍証である。 X-ray structure analysis was performed on compound 4. The result is shown in FIG. The helix angle was 55.89 °, which was a very large value. It can be understood that the compound 4 has a undulating and non-planar structure. The effect of this dense functional group was also confirmed by IR spectroscopic analysis, and the peak of the hydroxyl group was confirmed as a sharp ruled line at 2949 cm -1 . It means that the hydroxyl group does not associate with other hydroxyl groups, which is a proof that the area around the hydroxyl group is sterically very crowded.

実施例5(1,8,9,16-テトラブロモ-3,6,11,14-テトラブチル-2,7,10,15-テトラヒドロキシシベンゾ[g,p]クリセン(化合物5)の合成)

Figure 2022087523000019
Example 5 (Synthesis of 1,8,9,16-Tetrabromo-3,6,11,14-Tetrabutyl-2,7,10,15-Tetrahydroxycibenzo [g, p] chrysene (Compound 5))
Figure 2022087523000019

化合物11の合成
アルゴン雰囲気下、化合物1(2.6g,3.0mmol)をジメチルホルムアミド(240mL)に懸濁させ、ヨウ化銅(6.8g,36mmol)とナトリウムメトキシド(90mL,450mmol,28%メタノール溶液)を加えた。反応溶液を120度で2時間撹拌後、3M塩酸水溶液(150mL)で反応停止操作を行った。得られたサンプルをトルエンで希釈し、水層に対してトルエンで抽出操作(80mL×3)を行った。合わせた有機層を飽和食塩水で洗浄(150mL)、芒硝乾燥、真空乾燥後、粗生成物を得た。シリカゲルを用いた濾過カラム精製操作(展開溶媒はヘキサン/トルエン=9/1)を行い、1.09g(55%)の化合物11を白黄色固体として得た。
Synthesis of Compound 11 Under an argon atmosphere, Compound 1 (2.6 g, 3.0 mmol) was suspended in dimethylformamide (240 mL), and copper iodide (6.8 g, 36 mmol) and sodium methoxide (90 mL, 450 mmol, 28) were suspended. % Methanol solution) was added. The reaction solution was stirred at 120 ° C. for 2 hours, and then the reaction was stopped with a 3M aqueous hydrochloric acid solution (150 mL). The obtained sample was diluted with toluene, and the aqueous layer was subjected to an extraction operation (80 mL × 3) with toluene. The combined organic layers were washed with saturated brine (150 mL), dried over Glauber's salt and vacuum dried to obtain a crude product. A filtration column purification operation using silica gel (developing solvent was hexane / toluene = 9/1) was carried out to obtain 1.09 g (55%) of compound 11 as a white-yellow solid.

HNMR(400MHz,CDCl)8.35(s,4H),8.20(s,4H), 3.96(s,12H),2.90(t,J=7.7Hz,8H),1.78(tt,J =7.7,7.7Hz,8H),1.52(tq,J=7.7,7.7Hz,8H),1.03(t,J=7.7Hz,12H)ppm
13CNMR(100MHz,CDCl)156.2,131.9,128.4,127.7,124.8,124.6,108.4,55.9,32.8,31.0,23.2,14.5ppm
MS(DART-TOF)m/z:673[MH]
IR(neat):2952,2925,2857,1619,1496,1455,1412,1249,1145,1049,842cm-1
HRMS(DART-TOF)calcd for C4657[MH]:673.4251,Found673.4270
Anal. Calcd for C4656;C,82.10;H,8.39.Found:C,82.09;H,8.66
1 1 HNMR (400MHz, CDCl 3 ) 8.35 (s, 4H), 8.20 (s, 4H), 3.96 (s, 12H), 2.90 (t, J = 7.7Hz, 8H), 1.78 (tt, J = 7.7, 7.7Hz, 8H), 1.52 (tq, J = 7.7, 7.7Hz, 8H), 1.03 (t, J = 7.7Hz, 12H) ppm
13 CNMR (100MHz, CDCl 3 ) 156.2, 131.9, 128.4, 127.7, 124.8, 124.6, 108.4, 55.9, 32.8, 31.0, 23. 2,14.5ppm
MS (DART-TOF) m / z: 673 [MH] +
IR (neat): 2952, 2925, 2857, 1619, 1496, 1455, 1412, 1249, 1145, 1049, 842 cm -1
HRMS (DART-TOF) calcd for C 46 H 57 O 4 [MH] + : 673.4251, Found 673.4270
Anal. Calcd for C 46 H 56 O 4 ; C, 82.10; H, 8.39. Found: C, 82.09; H, 8.66

化合物12の合成
アルゴン雰囲気下、50mLフラスコに、化合物11(1.09g,1.6mmol)と塩化メチレン(10mL)を加えた。0℃で1M三臭化ホウ素(9.6mL,9.6mmol,塩化メチレン溶液)を5分かけて滴下した後、紫色溶液を0度下10分間撹拌させた。室温まで自然昇温し、2時間撹拌後に、0℃で水(15 mL)を用いて反応停止操作を行った。得られたサンプルを酢酸エチルで希釈し、水層に対して酢酸エチルで抽出操作(20mL×3)を行った。合わせた有機層を飽和食塩水で洗浄(20mL)、芒硝乾燥、真空乾燥後、964mg(98%)の化合物12を緑黄色固体として得た。得られたサンプルはこれ以上精製することなく次の臭素化の実験に供した。
Synthesis of Compound 12 Under an argon atmosphere, compound 11 (1.09 g, 1.6 mmol) and methylene chloride (10 mL) were added to a 50 mL flask. After dropping 1 M boron tribromide (9.6 mL, 9.6 mmol, methylene chloride solution) at 0 ° C. over 5 minutes, the purple solution was stirred at 0 ° C. for 10 minutes. The temperature was naturally raised to room temperature, and after stirring for 2 hours, the reaction was stopped at 0 ° C. using water (15 mL). The obtained sample was diluted with ethyl acetate, and the aqueous layer was subjected to an extraction operation (20 mL × 3) with ethyl acetate. The combined organic layers were washed with saturated brine (20 mL), dried over Glauber's salt and vacuum dried to give 964 mg (98%) of compound 12 as a green-yellow solid. The resulting sample was subjected to the next bromination experiment without further purification.

HNMR(400MHz,CDCN)8.37(s,4H),8.15(s,4H),7.28(s,4H),2.84(t,J=7.5Hz,8H),1.74(tt,J= 7.5,7.5Hz,8H),1.48(tq,J=7.5,7.5Hz,8H),1.00(t,J=7.5Hz,12H)ppm
13CNMR(100MHz,CDCN)153.9,130.8,128.8,127.3,125.4,125.2,112.9,33.1,31.1,23.4,14.3ppm
MS(DART-TOFMS)m/z:617[MH]
IR(neat):3339,2952,2925,2857,1623,1499,1423,1236,1137,989,870cm-1
HRMS(DART-TOF) calcd for C4249[MH]:617.3625, Found: 617.3652
1 1 HNMR (400MHz, CD 3 CN) 8.37 (s, 4H), 8.15 (s, 4H), 7.28 (s, 4H), 2.84 (t, J = 7.5Hz, 8H) , 1.74 (tt, J = 7.5, 7.5Hz, 8H), 1.48 (tq, J = 7.5, 7.5Hz, 8H), 1.00 (t, J = 7.5Hz) , 12H) ppm
13 CNMR (100MHz, CD 3 CN) 153.9, 130.8, 128.8, 127.3, 125.4, 125.2, 112.9, 33.1, 31.1, 23.4, 14 .3ppm
MS (DART-TOFMS) m / z: 617 [MH] +
IR (neat): 3339, 2952, 2925, 2857, 1623, 1499, 1423, 1236, 1137, 989, 870 cm -1
HRMS (DART-TOF) calcd for C 42 H 49 O 4 [MH] + : 617.3625, Found: 617.3652

化合物5の合成
アルゴン雰囲気下、100mLフラスコに、化合物12(617mg,1.0mmol)と塩化メチレン(20mL)を加えた。-20℃で、臭素(4.8mL,4.8mmol,1M塩化メチレン溶液)を5分かけて滴下した。15分間撹拌後(茶色懸濁液)、室温まで自然昇温し7時間撹拌した。0℃で、飽和チオ硫酸ナトリウム水溶液(20mL)と1M塩酸水溶液(40mL)で反応停止操作を行った。得られたサンプルを塩化メチレンで希釈し、水層に対して塩化メチレンで抽出操作(20mL×3)を行った。合わせた有機層を飽和食塩水で洗浄(20mL)、芒硝乾燥、真空乾燥後、粗生成物を得た。シリカゲルを用いた濾過カラム精製操作(展開溶媒はヘキサン/トルエン=4/1)を行い、573mg(61%)の化合物5を黄色固体として得た。
Synthesis of Compound 5 Under an argon atmosphere, compound 12 (617 mg, 1.0 mmol) and methylene chloride (20 mL) were added to a 100 mL flask. Bromine (4.8 mL, 4.8 mmol, 1 M methylene chloride solution) was added dropwise at −20 ° C. over 5 minutes. After stirring for 15 minutes (brown suspension), the temperature was naturally raised to room temperature and the mixture was stirred for 7 hours. The reaction was stopped at 0 ° C. with a saturated aqueous solution of sodium thiosulfate (20 mL) and a 1 M aqueous solution of hydrochloric acid (40 mL). The obtained sample was diluted with methylene chloride, and the aqueous layer was subjected to an extraction operation (20 mL × 3) with methylene chloride. The combined organic layers were washed with saturated brine (20 mL), dried over Glauber's salt and vacuum dried to obtain a crude product. A filtration column purification operation using silica gel (developing solvent was hexane / toluene = 4/1) was carried out to obtain 573 mg (61%) of compound 5 as a yellow solid.

HNMR(400MHz,CDCl)8.31(s,4H),6.11(s,4H),2.96(t,J=7.5Hz,8H),1.80(tt,J=7.5,7.5Hz,8H),1.52(tq,J=7.5,7.5Hz,8H),1.02(t,J=7.5Hz,12H)ppm
13CNMR(100MHz,CDCl)149.5,133.1,130.2,127.8,124.11,124.09,110.2,32.2,31.7,23.0,22.9,14.2ppm
MS(DART-TOFMS)m/z:933[MH]
IR(neat):3450,2952,2925,2857,1606,1459,1408,1176,1137,1021,870cm-1
HRMS(DART-TOFMS)calcd for C4245Br:933.0010[MH],Found:993.0013
Anal. Calcd for C4244Br:C,54.10;H,4.76. Found:C,54.09;H,4.52.
1 1 HNMR (400MHz, CDCl 3 ) 8.31 (s, 4H), 6.11 (s, 4H), 2.96 (t, J = 7.5Hz, 8H), 1.80 (tt, J = 7) .5, 7.5Hz, 8H), 1.52 (tq, J = 7.5, 7.5Hz, 8H), 1.02 (t, J = 7.5Hz, 12H) ppm
13 CNMR (100MHz, CDCl 3 ) 149.5, 133.1, 130.2, 127.8, 124.11, 124.09, 110.2, 32.2, 31.7, 23.0, 22. 9,14.2 ppm
MS (DART-TOFMS) m / z: 933 [MH] +
IR (neat): 3450, 2952, 2925, 2857, 1606, 1459, 1408, 1176, 1137, 1021, 870 cm -1
HRMS (DART-TOFMS) calcd for C 42 H 45 Br 4 O 4 : 933.0010 [MH] + , Found: 993.0013
Anal. Calcd for C 42 H 44 Br 4 O 4 : C, 54.10; H, 4.76. Found: C, 54.09; H, 4.52.

化合物5について、X線構造解析を行った。図3にその結果を示す。ねじれ角は53.97°と非常に大きな値であった。化合物5がうねるような形で非平面性を帯びた構造をとっていることが理解できる。ねじれ角は化合物4の55.89°と同程度であり、フィヨルド領域がDBCに与える構造的歪みとベイエリア領域がDBCに与える構造的歪みが同じくらいである言える。 X-ray structure analysis was performed on compound 5. The result is shown in FIG. The helix angle was 53.97 °, which was a very large value. It can be understood that the compound 5 has a undulating and non-planar structure. The helix angle is about the same as 55.89 ° of compound 4, and it can be said that the structural strain that the fjord region gives to the DBC and the structural strain that the bay area region gives to the DBC are about the same.

実施例6(1,5,9,14-テトラブロモ-2,3,6,7,10,11、14,15-オクタメトキシ-ベンゾ[g,p]クリセン(化合物14)の合成)

Figure 2022087523000020
Example 6 (Synthesis of 1,5,9,14-Tetrabromo-2,3,6,7,10,11,14,15-Octamethoxy-benzo [g, p] chrysene (Compound 14))
Figure 2022087523000020

化合物13の合成
アルゴン雰囲気下、2,7,10,15-テトラブロモ-3,6,11,14-テトラメトキシ-ベンゾ[g,p]クリセン(1.53g,2.0mmol)をジメチルホルムアミド(80mL)に懸濁させ、ヨウ化銅(3.37g,24mmol)とナトリウムメトキシド(60mL,300mmol,28%メタノール溶液)を加えた。反応溶液を120℃で2時間撹拌後、3M塩酸水溶液(100mL)で反応停止操作を行った。得られたサンプルを塩化メチレンで希釈し、水層に対して塩化メチレンで抽出操作(40mL×3)を行った。合わせた有機層を飽和食塩水で洗浄(100mL)、芒硝乾燥、真空乾燥後、粗生成物を得た。シリカゲルを用いた濾過カラム精製操作(展開溶媒は塩化メチレン/酢酸エチル=19/1)を行い、751mg(66%)の化合物13を白茶色固体として得た。
Synthesis of Compound 13 Under an argon atmosphere, 2,7,10,15-tetrabromo-3,6,11,14-tetramethoxy-benzo [g, p] chrysen (1.53 g, 2.0 mmol) was added to dimethylformamide (80 mL). ), And copper iodide (3.37 g, 24 mmol) and sodium methoxide (60 mL, 300 mmol, 28% methanol solution) were added. The reaction solution was stirred at 120 ° C. for 2 hours, and then the reaction was stopped with a 3M aqueous hydrochloric acid solution (100 mL). The obtained sample was diluted with methylene chloride, and the aqueous layer was subjected to an extraction operation (40 mL × 3) with methylene chloride. The combined organic layers were washed with saturated brine (100 mL), dried over Glauber's salt and vacuum dried to obtain a crude product. A filtration column purification operation using silica gel (developing solvent was methylene chloride / ethyl acetate = 19/1) was carried out to obtain 751 mg (66%) of compound 13 as a white-brown solid.

HNMR(400MHz,CDCl)8.21(s,4H),7.89(s,4H),4.18(s,12H),4.01(s,12H)ppm
13CNMR(100MHz,CDCl)149.0,148.5,125.6,124.9,123.7,109.7,104.8,56.4,56.3ppm
MS(DART-TOFMS)m/z:569[MH]
IR(neat):2992,2956,2928,2829,1503,1458,1411,1248,1180,1140,1041,845,746cm-1
HRMS(DART-TOFMS)calcd for C3433:569.2175[MH],Found:569.2156
1 1 HNMR (400MHz, CDCl 3 ) 8.21 (s, 4H), 7.89 (s, 4H), 4.18 (s, 12H), 4.01 (s, 12H) ppm
13 CNMR (100MHz, CDCl 3 ) 149.0, 148.5, 125.6, 124.9, 123.7, 109.7, 104.8, 56.4, 56.3ppm
MS (DART-TOFMS) m / z: 569 [MH] +
IR (neat): 2992, 2965, 2928, 2829, 1503, 1458, 1411, 1248, 1180, 1140, 1041,845,746 cm -1
HRMS (DART-TOFMS) calcd for C 34 H 33 O 8 : 569.2175 [MH] + , Found: 569.2156

化合物14の合成
アルゴン雰囲気下、化合物13(100mg,0.18mmol)を塩化メチレンと酢酸の混合溶媒(1/1v/v,v=2mL)に懸濁させ、臭素(2.8mL,2.8mmol,1M塩化メチレン溶液)を3分かけて滴下した。室温下24時間撹拌後、0℃で、飽和チオ硫酸ナトリウム水溶液(5mL)で反応停止操作を行った。得られたサンプルを塩化メチレンで希釈し、水層に対して塩化メチレンで抽出操作(10mL×3)を行った。合わせた有機層を飽和食塩水で洗浄(10mL)、芒硝乾燥、真空乾燥後、粗生成物を得た。シリカゲルを用いた濾過カラム精製操作(展開溶媒はヘキサン/酢酸エチル=4/1)を行い、43mg(28%)の化合物14を黄色固体として得た。
Synthesis of Compound 14 Under an argon atmosphere, compound 13 (100 mg, 0.18 mmol) was suspended in a mixed solvent of methylene chloride and acetic acid (1 / 1v / v, v = 2 mL), and bromine (2.8 mL, 2.8 mmol) was suspended. , 1M methylene chloride solution) was added dropwise over 3 minutes. After stirring at room temperature for 24 hours, the reaction was stopped at 0 ° C. with a saturated aqueous sodium thiosulfate solution (5 mL). The obtained sample was diluted with methylene chloride, and the aqueous layer was subjected to an extraction operation (10 mL × 3) with methylene chloride. The combined organic layers were washed with saturated brine (10 mL), dried over Glauber's salt and vacuum dried to obtain a crude product. A filtration column purification operation using silica gel (developing solvent was hexane / ethyl acetate = 4/1) was carried out to obtain 43 mg (28%) of compound 14 as a yellow solid.

HNMR(400MHz,CDCl)8.94(s,2H),7.36(s,2H), 4.15(s,6H),3.98(s,6H),3.94(s,6H),3.93(s,6H)ppm
13CNMR(100MHz,CDCl)152.0,150.7,147.4,146.7,131.1,129.1,128.6,123.8,122.5,116.5,115.9,113.1,111.4,61.1,61.0,56.7,56.4 ppm
MS(DART-TOFMS)m/z:884[MH]
IR(neat):2997,2933,2829,1587,1459,1391,1272,1141,1053,1038,993,858cm-1
HRMS(DART-TOFMS)calcd for C3428Br:883.8555[MH],Found:884.8565
Anal.Calcd for C3428Br:C,46.19;H,3.19.Found:C,46.37;H,3.11
1 1 HNMR (400MHz, CDCl 3 ) 8.94 (s, 2H), 7.36 (s, 2H), 4.15 (s, 6H), 3.98 (s, 6H), 3.94 (s, 6H), 3.93 (s, 6H) ppm
13 CNMR (100MHz, CDCl 3 ) 152.0, 150.7, 147.4, 146.7, 131.1, 129.1, 128.6, 123.8, 122.5, 116.5, 115. 9, 113.1, 111.4, 61.1, 61.0, 56.7, 56.4 ppm
MS (DART-TOFMS) m / z: 884 [MH] +
IR (neat): 2997,2933,2829,1587,1459,1391,1272,1141,1053,1038,993,858cm -1
HRMS (DART-TOFMS) calcd for C 34 H 28 Br 4 O 8 : 883.8555 [MH] + , Found: 884.85565
Anal. Calcd for C 34 H 28 Br 4 O 8 : C, 46.19; H, 3.19. Found: C, 46.37; H, 3.11

本発明のジベンゾ[g,p]クリセン誘導体の製造方法は、薄膜トランジスターの正孔輸送物質や有機発光ダイオードの発光素子として有用なジベンゾ[g,p]クリセン誘導体の製造方法として適用可能である。また、本発明のジベンゾ[g,p]クリセン誘導体は、薄膜トランジスターの正孔輸送物質や有機発光ダイオードの発光素子に適用可能である。
The method for producing a dibenzo [g, p] chrysen derivative of the present invention can be applied as a method for producing a dibenzo [g, p] chrysen derivative useful as a hole transporting substance for a thin film or a light emitting device for an organic light emitting diode. Further, the dibenzo [g, p] chrysen derivative of the present invention can be applied to a hole transporting substance of a thin film and a light emitting device of an organic light emitting diode.

Claims (4)

アルキル基、アルケニル基、アルキニル基、アルカノイル基、アルケノイル基、アルキノイル基、ポリオキシアルキレン基および/または水酸基からなる群から選択される置換基を4個以上と、ハロゲノ基を4個有するジベンゾ[g,p]クリセン誘導体。 Dibenzo [g] having 4 or more substituents selected from the group consisting of an alkyl group, an alkenyl group, an alkynyl group, an alkanoyl group, an alkenoyl group, an alkinoyl group, a polyoxyalkylene group and / or a hydroxyl group, and 4 halogeno groups. , P] Chrysen derivative. 下記式
Figure 2022087523000021
Figure 2022087523000022
Figure 2022087523000023
Figure 2022087523000024
または
Figure 2022087523000025
で表される請求項1に記載のジベンゾ[g,p]クリセン誘導体。
The following formula
Figure 2022087523000021
Figure 2022087523000022
Figure 2022087523000023
Figure 2022087523000024
or
Figure 2022087523000025
The dibenzo [g, p] chrysene derivative according to claim 1.
アルコキシ基および/またはポリオキシアルキレン基を6個以上と、ハロゲノ基を4個有するジベンゾ[g,p]クリセン誘導体。 A dibenzo [g, p] chrysene derivative having 6 or more alkoxy groups and / or polyoxyalkylene groups and 4 halogeno groups. 下記式
Figure 2022087523000026
で表される請求項3に記載のジベンゾ[g,p]クリセン誘導体。



The following formula
Figure 2022087523000026
The dibenzo [g, p] chrysene derivative according to claim 3.



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