JP2022020332A - Carrier plate removal method - Google Patents

Carrier plate removal method Download PDF

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Publication number
JP2022020332A
JP2022020332A JP2020123764A JP2020123764A JP2022020332A JP 2022020332 A JP2022020332 A JP 2022020332A JP 2020123764 A JP2020123764 A JP 2020123764A JP 2020123764 A JP2020123764 A JP 2020123764A JP 2022020332 A JP2022020332 A JP 2022020332A
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Prior art keywords
carrier plate
workpiece
adhesive tape
holding
outer peripheral
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Japanese (ja)
Inventor
逸人 木内
Itsuto Kiuchi
喜洋 大室
Yoshihiro Omuro
孝寿 櫻井
Takatoshi Sakurai
真一郎 堀
Shinichiro Hori
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Disco Corp
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Disco Abrasive Systems Ltd
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Priority to JP2020123764A priority Critical patent/JP2022020332A/en
Priority to KR1020210077763A priority patent/KR20220011075A/en
Priority to TW110126127A priority patent/TW202205462A/en
Priority to CN202110812287.8A priority patent/CN113964074A/en
Publication of JP2022020332A publication Critical patent/JP2022020332A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/568Temporary substrate used as encapsulation process aid
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386Separation by peeling

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Dicing (AREA)

Abstract

To provide a carrier plate removal method with which a carrier plate can be easily removed from a workpiece.SOLUTION: There is provided a carrier plate removal method for removing a carrier plate from a workpiece provided on a front face of the carrier plate with a temporary adhesive layer therebetween, and the method includes: a step part forming step of processing an outer peripheral part of the carrier plate from the front face on which the workpiece is provided along an outer peripheral edge of the carrier plate to form a step part in which a rear face of the carrier plate laterally projects beyond the front face of the carrier plate; an attachment step of attaching an adhesive tape to a surface of the workpiece exposed on the opposite side of the carrier plate and attaching an outer peripheral part of the adhesive tape to an annular frame; a holding step of, in a state in which the workpiece is located above the carrier plate, holding the workpiece from above with a holding unit with the adhesive tape therebetween; and a carrier plate removal step of applying a downward force to the step part with a push member and moving the carrier plate in a direction separating from the workpiece to remove the carrier plate from the workpiece.SELECTED DRAWING: Figure 3

Description

本発明は、仮接着層を介してキャリア板の表面に設けられたワークピースからキャリア板を除去するキャリア板の除去方法に関する。 The present invention relates to a method for removing a carrier plate from a workpiece provided on the surface of the carrier plate via a temporary adhesive layer.

携帯電話機やパーソナルコンピュータに代表される電子機器では、電子回路等のデバイスを備えるデバイスチップが必須の構成要素になっている。デバイスチップは、例えば、シリコン等の半導体材料でなるウェーハの表面を分割予定ライン(ストリート)で複数の領域に区画し、各領域にデバイスを形成した後、この分割予定ラインでウェーハを分割することにより得られる。 In electronic devices such as mobile phones and personal computers, device chips equipped with devices such as electronic circuits are indispensable components. For device chips, for example, the surface of a wafer made of a semiconductor material such as silicon is divided into a plurality of regions by a planned division line (street), devices are formed in each region, and then the wafer is divided by this planned division line. Obtained by

上述のような方法で得られたデバイスチップは、例えば、CSP(Chip Size Package)用のマザー基板に固定され、ワイヤボンディング等の方法でこのマザー基板の端子等に電気的に接続された後に、モールド樹脂で封止される。このように、モールド樹脂によってデバイスチップを封止してパッケージデバイスを形成することで、衝撃、光、熱、水等の外的な要因からデバイスチップを保護できるようになる。 The device chip obtained by the above method is fixed to, for example, a mother substrate for CSP (Chip Size Package), and after being electrically connected to terminals or the like of the mother substrate by a method such as wire bonding, the device chip is then electrically connected. Sealed with mold resin. By sealing the device chip with the mold resin to form the package device in this way, the device chip can be protected from external factors such as impact, light, heat, and water.

近年では、ウェーハレベルの再配線技術を用いてデバイスチップの領域外にパッケージ端子を形成するFOWLP(Fan-Out Wafer Level Package)と呼ばれるパッケージ技術が採用され始めている(例えば、特許文献1参照)。また、ウェーハよりサイズの大きいパネル(代表的には、液晶パネルの製造に用いられるガラス基板)のレベルでパッケージデバイスを一括して製造するFOPLP(Fan-Out Panel Level Package)と呼ばれるパッケージ技術も提案されている。 In recent years, a package technology called FOWLP (Fan-Out Wafer Level Package), which forms a package terminal outside the region of the device chip by using a wafer level rewiring technology, has begun to be adopted (see, for example, Patent Document 1). We also propose a packaging technology called FOPLP (Fan-Out Panel Level Package) that collectively manufactures package devices at the level of panels larger than wafers (typically glass substrates used in the manufacture of liquid crystal panels). Has been done.

FOPLPでは、例えば、仮の基板となるキャリア板の表面に仮接着層を介して配線層(RDL:Redistribution Layer)を形成し、この配線層にデバイスチップを接合する。次に、デバイスチップをモールド樹脂で封止して、パッケージパネルを得る。その後、パッケージパネルを研削等の方法によって薄くした上で、このパッケージパネルを分割することにより、パッケージデバイスが完成する。 In FOPLP, for example, a wiring layer (RDL: Redistribution Layer) is formed on the surface of a carrier plate to be a temporary substrate via a temporary adhesive layer, and a device chip is bonded to this wiring layer. Next, the device chip is sealed with a mold resin to obtain a package panel. After that, the package panel is thinned by a method such as grinding, and then the package panel is divided to complete the package device.

特開2016-201519号公報Japanese Unexamined Patent Publication No. 2016-201519

上述したFOPLPでは、例えば、パッケージパネルをパッケージデバイスへと分割した後に、このパッケージデバイスからキャリア板が除去される。具体的には、キャリア板から各パッケージデバイスをピックアップする。ところが、パッケージデバイスのサイズが小さいと、このパッケージデバイスをキャリア板からピックアップするのは難しい。 In the above-mentioned FOPLP, for example, after the package panel is divided into package devices, the carrier plate is removed from the package devices. Specifically, each package device is picked up from the carrier plate. However, if the size of the package device is small, it is difficult to pick up this package device from the carrier board.

一方で、パッケージパネルをパッケージデバイスへと分割する前に、パッケージパネルからキャリア板を剥離し、除去することも考えられる。しかしながら、仮接着層の接着力はある程度に強いので、パッケージパネルやキャリア板を損傷させることなくキャリア板をパッケージパネルから剥離するのが難しかった。 On the other hand, it is also conceivable to peel off and remove the carrier plate from the package panel before dividing the package panel into package devices. However, since the adhesive strength of the temporary adhesive layer is strong to some extent, it is difficult to peel the carrier plate from the package panel without damaging the package panel or the carrier plate.

本発明は、このような問題点に鑑みてなされたものであり、その目的とするところは、パッケージパネル等のワークピースからキャリア板を容易に除去できるキャリア板の除去方法を提供することである。 The present invention has been made in view of such problems, and an object of the present invention is to provide a method for removing a carrier plate which can easily remove a carrier plate from a workpiece such as a package panel. ..

本発明の一態様によれば、キャリア板の表面に仮接着層を介して設けられたワークピースから該キャリア板を除去するキャリア板の除去方法であって、該ワークピースが設けられた該表面側から該キャリア板の外周縁に沿って該キャリア板の外周部を加工し、該キャリア板の該表面側に比べて該キャリア板の裏面側が側方に突出した段差部を形成する段差部形成工程と、該段差部形成工程を実施した後、該ワークピースの該キャリア板とは反対側で露出する表面に粘着テープを貼付するとともに、該粘着テープの外周部を環状のフレームに貼付する貼付工程と、該貼付工程を実施した後、該キャリア板の上方に該ワークピースが位置付けられた状態で該粘着テープを介して該ワークピースを上方から保持ユニットで保持する保持工程と、該保持工程を実施した後、プッシュ部材で該段差部に下向きの力を加えて該キャリア板を該ワークピースから離れる方向に移動させることで該ワークピースから該キャリア板を除去するキャリア板除去工程と、を含むキャリア板の除去方法が提供される。 According to one aspect of the present invention, there is a method for removing a carrier plate from a workpiece provided on the surface of the carrier plate via a temporary adhesive layer, wherein the surface on which the workpiece is provided is provided. The outer peripheral portion of the carrier plate is processed from the side along the outer peripheral edge of the carrier plate, and a step portion is formed in which the back surface side of the carrier plate projects laterally as compared with the front surface side of the carrier plate. After performing the step and the step forming step, the adhesive tape is attached to the exposed surface of the workpiece on the opposite side of the carrier plate, and the outer peripheral portion of the adhesive tape is attached to the annular frame. A holding step of holding the work piece from above with a holding unit via the adhesive tape in a state where the work piece is positioned above the carrier plate after carrying out the step and the sticking step, and the holding step. After that, the carrier plate removing step of removing the carrier plate from the work piece by applying a downward force to the step portion with the push member and moving the carrier plate in a direction away from the work piece. A method for removing the carrier plate including the carrier plate is provided.

上述した本発明の一態様において、該粘着テープには、該プッシュ部材を通す貫通穴が設けられており、該キャリア板除去工程では、該貫通穴に挿入された該プッシュ部材で該段差部に下向きの力を加えて該ワークピースから該キャリア板を除去することが好ましい。 In one aspect of the present invention described above, the adhesive tape is provided with a through hole through which the push member is passed, and in the carrier plate removing step, the push member inserted into the through hole is used in the step portion. It is preferable to apply a downward force to remove the carrier plate from the workpiece.

また、上述した本発明の一態様において、該キャリア板除去工程では、該ワークピースと該キャリア板との間に流体を吹き付けた後に、又は該ワークピースと該キャリア板との間に流体を吹き付けながら、該段差部に下向きの力を加えて該ワークピースから該キャリア板を除去することが好ましい。 Further, in one aspect of the present invention described above, in the carrier plate removing step, after spraying a fluid between the workpiece and the carrier plate, or after spraying the fluid between the workpiece and the carrier plate, the fluid is sprayed. However, it is preferable to apply a downward force to the stepped portion to remove the carrier plate from the workpiece.

また、上述した本発明の一態様において、該キャリア板除去工程では、該ワークピースと該キャリア板とを液体に沈めた状態で、該段差部に下向きの力を加えることが好ましい。また、該液体には、界面活性剤を含ませても良い。 Further, in one aspect of the present invention described above, in the carrier plate removing step, it is preferable to apply a downward force to the step portion while the workpiece and the carrier plate are submerged in a liquid. Further, the liquid may contain a surfactant.

また、上述した本発明の一態様において、該キャリア板除去工程では、該ワークピースと該キャリア板とを該液体に沈めた状態で、該プッシュ部材に振動を付与しながら該段差部に下向きの力を加えることが好ましい。 Further, in one aspect of the present invention described above, in the carrier plate removing step, the work piece and the carrier plate are submerged in the liquid, and the push member is subjected to vibration while being downwardly directed to the step portion. It is preferable to apply force.

また、上述した本発明の一態様において、該キャリア板除去工程では、該ワークピースと該キャリア板とを該液体に沈めた状態で、該液体に振動を付与しながら該段差部に下向きの力を加えることが好ましい。 Further, in one aspect of the present invention described above, in the carrier plate removing step, a downward force is applied to the step portion while applying vibration to the liquid in a state where the workpiece and the carrier plate are submerged in the liquid. Is preferable to add.

本発明の一態様にかかるキャリア板の除去方法では、ワークピースが設けられたキャリア板の表面側からキャリア板の外周縁に沿ってキャリア板の外周部を加工し、キャリア板の表面側に比べてキャリア板の裏面側が側方に突出した段差部を形成する。よって、ワークピースを上方から保持ユニットで保持した状態で、段差部に下向きの力を加えることにより、ワークピースからキャリア板を容易に除去できる。 In the method for removing a carrier plate according to one aspect of the present invention, the outer peripheral portion of the carrier plate is processed from the surface side of the carrier plate provided with the workpiece along the outer peripheral edge of the carrier plate, as compared with the surface side of the carrier plate. The back surface side of the carrier plate forms a stepped portion protruding laterally. Therefore, the carrier plate can be easily removed from the workpiece by applying a downward force to the stepped portion while the workpiece is being held by the holding unit from above.

また、本発明の一態様にかかるキャリア板の除去方法では、段差部に加える下向きの力とともに、キャリア板に作用する重力を利用できるので、段差部に加える下向きの力が小さい場合でも、ワークピースからキャリア板を除去できる。更に、本発明の一態様にかかるキャリア板の除去方法では、ワークピースからキャリア板を除去する前に、ワークピースに粘着テープを貼付し、環状のフレームによってワークピースが保持された状態にしておくので、ワークピースからキャリア板を除去した後に、ワークピースが反り難くなる。 Further, in the method for removing the carrier plate according to one aspect of the present invention, since the gravity acting on the carrier plate can be used together with the downward force applied to the step portion, the work piece can be used even when the downward force applied to the step portion is small. The carrier plate can be removed from. Further, in the method for removing the carrier plate according to one aspect of the present invention, before removing the carrier plate from the workpiece, an adhesive tape is attached to the workpiece so that the workpiece is held by the annular frame. Therefore, after removing the carrier plate from the workpiece, the workpiece is less likely to warp.

図1(A)は、キャリア板とワークピースとを含む複合基板の構成例を示す断面図であり、図1(B)は、段差部形成工程で複合基板のキャリア板側が保持される様子を示す断面図である。FIG. 1A is a cross-sectional view showing a configuration example of a composite substrate including a carrier plate and a workpiece, and FIG. 1B shows a state in which the carrier plate side of the composite substrate is held in a step portion forming step. It is sectional drawing which shows. 図2(A)は、段差部形成工程でキャリア板に段差部が形成される様子を示す断面図であり、図2(B)は、キャリア板の外周部の全体に段差部が形成された状態を示す断面図である。FIG. 2A is a cross-sectional view showing how a stepped portion is formed on the carrier plate in the stepped portion forming step, and FIG. 2B shows a stepped portion formed on the entire outer peripheral portion of the carrier plate. It is sectional drawing which shows the state. 図3は、貼付工程でワークピースに粘着テープが貼付された状態を示す断面図である。FIG. 3 is a cross-sectional view showing a state in which the adhesive tape is attached to the workpiece in the attaching step. 図4(A)は、保持工程について示す断面図であり、図4(B)は、キャリア板除去工程について示す断面図であり、図4(C)は、ワークピースからキャリア板が除去された状態を示す断面図である。4 (A) is a cross-sectional view showing a holding process, FIG. 4 (B) is a cross-sectional view showing a carrier plate removing step, and FIG. 4 (C) shows a carrier plate removed from the workpiece. It is sectional drawing which shows the state. 図5(A)は、第1変形例のキャリア板除去工程について示す断面図であり、図5(B)は、第2変形例のキャリア板除去工程について示す断面図である。FIG. 5A is a cross-sectional view showing a carrier plate removing step of the first modification, and FIG. 5B is a cross-sectional view showing a carrier plate removing step of the second modification.

添付図面を参照して、本発明の一態様にかかる実施形態について説明する。本実施形態にかかるキャリア板の除去方法は、キャリア板の表面に仮接着層を介して設けられたワークピースからキャリア板を除去する際に用いられ、段差部形成工程(図1(B)、図2(A)及び図2(B)参照)、貼付工程(図3参照)、保持工程(図4(A)参照)及びキャリア板除去工程(図4(B)及び図4(C)参照)を含む。 An embodiment of the present invention will be described with reference to the accompanying drawings. The method for removing the carrier plate according to the present embodiment is used when removing the carrier plate from a workpiece provided on the surface of the carrier plate via a temporary adhesive layer, and is used in a step portion forming step (FIG. 1 (B), FIG. 2 (A) and 2 (B)), pasting step (see FIG. 3), holding step (see FIG. 4 (A)) and carrier plate removing step (see FIGS. 4 (B) and 4 (C)). )including.

段差部形成工程では、ワークピースが設けられたキャリア板の表面側からキャリア板の外周縁に沿ってキャリア板の外周部に切削ブレードを切り込ませ、このキャリア板に段差部を形成する。貼付工程では、ワークピースの露出した表面に粘着テープを貼付するとともに、この粘着テープの外周部を環状のフレームに貼付する。 In the step forming step, a cutting blade is cut into the outer peripheral portion of the carrier plate along the outer peripheral edge of the carrier plate from the surface side of the carrier plate provided with the workpiece, and the step portion is formed in the carrier plate. In the sticking step, the adhesive tape is stuck on the exposed surface of the workpiece, and the outer peripheral portion of the adhesive tape is stuck on the annular frame.

保持工程では、キャリア板の上方にワークピースが位置付けられた状態で、このワークピース側を上方から粘着テープを介して保持する。キャリア板除去工程では、プッシュ部材で段差部に下向きの力を加えてキャリア板をワークピースから離れる方向に移動させることで、ワークピースからキャリア板を除去する。以下、本実施形態にかかるキャリア板の除去方法について詳述する。 In the holding step, the workpiece is positioned above the carrier plate, and the workpiece side is held from above via the adhesive tape. In the carrier plate removing step, the carrier plate is removed from the workpiece by applying a downward force to the stepped portion with the push member to move the carrier plate away from the workpiece. Hereinafter, the method for removing the carrier plate according to the present embodiment will be described in detail.

図1(A)は、本実施形態にかかるキャリア板の除去方法で使用される複合基板1の構成例を示す断面図である。複合基板1は、例えば、ソーダガラス、ホウケイ酸ガラス、石英ガラス等の絶縁体材料で形成されたキャリア板3を含んでいる。このキャリア板3は、例えば、概ね平坦な第1面(表面)3aと、第1面3aとは反対側の第2面(裏面)3bとを有し、第1面3a側又は第2面3b側から見た平面視で矩形状に構成されている。キャリア板3の厚みは、例えば、2mm以下、代表的には、1.1mmである。 FIG. 1A is a cross-sectional view showing a configuration example of the composite substrate 1 used in the carrier plate removing method according to the present embodiment. The composite substrate 1 includes a carrier plate 3 made of an insulating material such as soda glass, borosilicate glass, or quartz glass. The carrier plate 3 has, for example, a substantially flat first surface (front surface) 3a and a second surface (back surface) 3b opposite to the first surface 3a, and has a first surface 3a side or a second surface. It is configured in a rectangular shape in a plan view seen from the 3b side. The thickness of the carrier plate 3 is, for example, 2 mm or less, typically 1.1 mm.

なお、本実施形態では、ソーダガラス、ホウケイ酸ガラス、石英ガラス等の絶縁体材料でなるキャリア板3を用いているが、キャリア板3の材質、形状、構造、大きさ等に特段の制限はない。例えば、半導体、セラミックス、樹脂、金属等の材料でなる板等をキャリア板3として用いることもできる。円盤状の半導体ウェーハ等をキャリア板3としても良い。 In the present embodiment, the carrier plate 3 made of an insulating material such as soda glass, borosilicate glass, and quartz glass is used, but there are no particular restrictions on the material, shape, structure, size, etc. of the carrier plate 3. do not have. For example, a plate or the like made of a material such as a semiconductor, ceramics, resin, or metal can be used as the carrier plate 3. A disk-shaped semiconductor wafer or the like may be used as the carrier plate 3.

キャリア板3の第1面3a側には、仮接着層5を介してワークピース7が設けられている。仮接着層5は、例えば、金属膜や絶縁体膜等を重ねることによって第1面3aの概ね全体に形成され、キャリア板3とワークピース7とを接着する機能を持つ。また、仮接着層5は、接着剤として機能する樹脂膜等によって構成されることもある。 A work piece 7 is provided on the first surface 3a side of the carrier plate 3 via a temporary adhesive layer 5. The temporary adhesive layer 5 is formed on substantially the entire surface of the first surface 3a by, for example, laminating a metal film, an insulator film, or the like, and has a function of adhering the carrier plate 3 and the workpiece 7. Further, the temporary adhesive layer 5 may be formed of a resin film or the like that functions as an adhesive.

仮接着層5の厚みは、例えば、20μm以下、代表的には、5μmである。後述するキャリア板除去工程でワークピース7からキャリア板3を剥離し、除去する際には、この仮接着層5が、キャリア板3側に密着した第1部分5a(図4(C)参照)と、ワークピース7側に密着した第2部分5b(図4(C)参照)とに分離される。 The thickness of the temporary adhesive layer 5 is, for example, 20 μm or less, typically 5 μm. When the carrier plate 3 is peeled off from the workpiece 7 and removed in the carrier plate removing step described later, the temporary adhesive layer 5 is in close contact with the carrier plate 3 side in the first portion 5a (see FIG. 4C). And the second portion 5b (see FIG. 4C) which is in close contact with the workpiece 7 side.

ワークピース7は、例えば、パッケージパネルやパッケージウェーハ等とも呼ばれ、仮接着層5に接する配線層(RDL)(不図示)と、配線層に接合された複数のデバイスチップ9と、各デバイスチップ9を封止するモールド樹脂層11とを含む。このワークピース7は、例えば、平面視でキャリア板3と概ね同じ大きさ、形状に構成されている。また、ワークピース7の厚みは、例えば、1.5mm以下、代表的には、0.6mmである。 The work piece 7 is also called, for example, a package panel, a package wafer, or the like, and has a wiring layer (RDL) (not shown) in contact with the temporary adhesive layer 5, a plurality of device chips 9 bonded to the wiring layer, and each device chip. Includes a mold resin layer 11 that seals 9. The work piece 7 is configured, for example, in a plan view having substantially the same size and shape as the carrier plate 3. The thickness of the workpiece 7 is, for example, 1.5 mm or less, typically 0.6 mm.

なお、ワークピース7の第1面(表面)7a側は、研削等の方法で加工されても良い。また、ワークピース7内で隣接するデバイスチップ9の間の領域には、分割予定ライン(切断予定ライン)が設定される。任意の分割予定ラインに沿ってワークピース7を切断することで、ワークピース7は、それぞれ1又は複数のデバイスチップ9を含む複数のワークピース片に分割される。 The first surface (surface) 7a side of the workpiece 7 may be processed by a method such as grinding. Further, a planned division line (scheduled cutting line) is set in the area between the adjacent device chips 9 in the workpiece 7. By cutting the workpiece 7 along an arbitrary scheduled division line, the workpiece 7 is divided into a plurality of workpiece pieces each including one or a plurality of device chips 9.

全ての分割予定ラインに沿ってワークピース7(又はワークピース片)を切断すれば、各デバイスチップ9に対応する複数のパッケージデバイスが得られる。ただし、ワークピース7の材質、形状、構造、大きさ等に特段の制限はない。例えば、ワークピース7は、主に配線層で構成され、デバイスチップ9やモールド樹脂層11等を含まないこともある。 By cutting the workpiece 7 (or the workpiece piece) along all the planned division lines, a plurality of package devices corresponding to each device chip 9 can be obtained. However, there are no particular restrictions on the material, shape, structure, size, etc. of the workpiece 7. For example, the workpiece 7 is mainly composed of a wiring layer and may not include a device chip 9, a mold resin layer 11, or the like.

本実施形態にかかるキャリア板の除去方法では、まず、上述した複合基板1を構成するキャリア板3の外周部に段差部を形成する段差部形成工程を行う。具体的には、まず、複合基板1のキャリア板3側を保持してワークピース7側を上方に露出させる。図1(B)は、段差部形成工程で複合基板1のキャリア板3側が保持される様子を示す断面図である。なお、図1(B)では、一部の構成要素を機能ブロックで示している。 In the method for removing the carrier plate according to the present embodiment, first, a step portion forming step of forming a step portion on the outer peripheral portion of the carrier plate 3 constituting the composite substrate 1 described above is performed. Specifically, first, the carrier plate 3 side of the composite substrate 1 is held and the workpiece 7 side is exposed upward. FIG. 1B is a cross-sectional view showing how the carrier plate 3 side of the composite substrate 1 is held in the step portion forming step. In addition, in FIG. 1B, some components are shown by functional blocks.

この段差部形成工程は、図1(B)等に示す切削装置2を用いて行われる。切削装置2は、複合基板1を保持するためのチャックテーブル4を備えている。チャックテーブル4は、例えば、ステンレス鋼に代表される金属材料でなる円筒状の枠体6と、多孔質材料でなり枠体6の上部に配置される保持板8とを含む。 This step portion forming step is performed using the cutting device 2 shown in FIG. 1 (B) and the like. The cutting device 2 includes a chuck table 4 for holding the composite substrate 1. The chuck table 4 includes, for example, a cylindrical frame 6 made of a metal material typified by stainless steel, and a holding plate 8 made of a porous material and arranged on the upper part of the frame 6.

保持板8の上面は、複合基板1のキャリア板3側を吸引し、保持するための保持面8aとなっている。この保持板8の下面側は、枠体6の内部に設けられた流路6aやバルブ10等を介して吸引源12に接続されている。そのため、バルブ10を開けば、吸引源12の負圧を保持面8aに作用させることができる。 The upper surface of the holding plate 8 is a holding surface 8a for sucking and holding the carrier plate 3 side of the composite substrate 1. The lower surface side of the holding plate 8 is connected to the suction source 12 via a flow path 6a provided inside the frame body 6, a valve 10, or the like. Therefore, if the valve 10 is opened, the negative pressure of the suction source 12 can be applied to the holding surface 8a.

チャックテーブル4(枠体6)は、モータ等の回転駆動源(不図示)に連結されており、この回転駆動源が生じる力によって、上述した保持面8aに対して概ね垂直な回転軸の周りに回転する。また、チャックテーブル4(枠体6)は、加工送り機構(不図示)によって支持されており、上述した保持面8aに対して概ね平行な加工送り方向に移動する。 The chuck table 4 (frame body 6) is connected to a rotation drive source (not shown) such as a motor, and the force generated by this rotation drive source causes the chuck table 4 (frame body 6) to be around a rotation axis substantially perpendicular to the holding surface 8a described above. Rotate to. Further, the chuck table 4 (frame body 6) is supported by a machining feed mechanism (not shown), and moves in a machining feed direction substantially parallel to the holding surface 8a described above.

複合基板1のキャリア板3側を保持してワークピース7側を上方に露出させる際には、図1(B)に示すように、例えば、キャリア板3の第2面3bをチャックテーブル4の保持面8aに接触させる。そして、バルブ10を開いて、吸引源12の負圧を保持面8aに作用させる。これにより、複合基板1のキャリア板3側がチャックテーブル4によって保持され、ワークピース7側が上方に露出する。 When holding the carrier plate 3 side of the composite substrate 1 and exposing the workpiece 7 side upward, for example, as shown in FIG. 1B, for example, the second surface 3b of the carrier plate 3 is attached to the chuck table 4. It is brought into contact with the holding surface 8a. Then, the valve 10 is opened to apply the negative pressure of the suction source 12 to the holding surface 8a. As a result, the carrier plate 3 side of the composite substrate 1 is held by the chuck table 4, and the workpiece 7 side is exposed upward.

複合基板1のキャリア板3側を保持してワークピース7側を上方に露出させた後には、キャリア板3の外周縁に沿って段差部を形成する。図2(A)は、段差部形成工程でキャリア板3に段差部3cが形成される様子を示す断面図である。なお、図2(A)では、一部の構成要素を機能ブロックで示している。 After holding the carrier plate 3 side of the composite substrate 1 and exposing the workpiece 7 side upward, a step portion is formed along the outer peripheral edge of the carrier plate 3. FIG. 2A is a cross-sectional view showing how the stepped portion 3c is formed on the carrier plate 3 in the stepped portion forming step. In addition, in FIG. 2A, some components are shown by functional blocks.

図2(A)に示すように、チャックテーブル4の上方には、切削ユニット14が配置されている。切削ユニット14は、保持面8aに対して概ね平行な回転軸となるスピンドル16を備えている。スピンドル16の一端側には、結合材に砥粒が分散されてなる環状の切削ブレード18が装着されている。 As shown in FIG. 2A, a cutting unit 14 is arranged above the chuck table 4. The cutting unit 14 includes a spindle 16 that is a rotation axis substantially parallel to the holding surface 8a. An annular cutting blade 18 in which abrasive grains are dispersed in a binder is mounted on one end side of the spindle 16.

スピンドル16の他端側には、モータ等の回転駆動源(不図示)が連結されており、スピンドル16の一端側に装着された切削ブレード18は、この回転駆動源が生じる力によって回転する。切削ユニット14は、例えば、昇降機構(不図示)と割り出し送り機構(不図示)とによって支持されており、保持面8aに対して概ね垂直な鉛直方向と、鉛直方向及び加工送り方向に対して概ね垂直な割り出し送り方向とに移動する。 A rotary drive source (not shown) such as a motor is connected to the other end side of the spindle 16, and the cutting blade 18 mounted on one end side of the spindle 16 rotates by the force generated by the rotary drive source. The cutting unit 14 is supported by, for example, an elevating mechanism (not shown) and an indexing feed mechanism (not shown), and is supported in a vertical direction substantially perpendicular to the holding surface 8a, and with respect to the vertical direction and the machining feed direction. It moves in the direction of indexing and feeding that is almost vertical.

キャリア板3に段差部3cを形成する際には、まず、複合基板1を保持したチャックテーブル4を回転させて、加工の対象となるキャリア板3の外周縁の一部(平面視で矩形の一辺に相当する部分)を、加工送り方向に対して概ね平行にする。次に、チャックテーブル4と切削ユニット14とを相対的に移動させて、上述した外周縁の一部の延長線上方に切削ブレード18を位置付ける。 When forming the stepped portion 3c on the carrier plate 3, first, the chuck table 4 holding the composite substrate 1 is rotated to partially rotate the outer peripheral edge of the carrier plate 3 to be processed (rectangular in a plan view). The part corresponding to one side) should be approximately parallel to the machining feed direction. Next, the chuck table 4 and the cutting unit 14 are relatively moved to position the cutting blade 18 above the extension line of a part of the outer peripheral edge described above.

また、切削ブレード18の下端を、キャリア板3の第1面3aより低く、第2面3bより高い位置に位置付ける。その後、切削ブレード18を回転させながら、チャックテーブル4を加工送り方向に移動させる。これにより、図2(A)に示すように、第1面3a側からキャリア板3の外周縁の一部に沿って切削ブレード18を切り込ませ、この外周縁の一部に相当するキャリア板3の外周部の一部を加工できる。 Further, the lower end of the cutting blade 18 is positioned lower than the first surface 3a of the carrier plate 3 and higher than the second surface 3b. After that, the chuck table 4 is moved in the machining feed direction while rotating the cutting blade 18. As a result, as shown in FIG. 2A, the cutting blade 18 is cut along a part of the outer peripheral edge of the carrier plate 3 from the first surface 3a side, and the carrier plate corresponding to a part of the outer peripheral edge is cut. A part of the outer peripheral portion of 3 can be processed.

ここでは、キャリア板3の第2面3bに達しない深さまで切削ブレード18を切り込ませている。そのため、外周部の一部には、第1面3a側に比べて第2面3b側が側方(第1面3a又は第2面3bに対して平行な方向において外向き)に突出した階段状の段差部3cが形成される。 Here, the cutting blade 18 is cut to a depth that does not reach the second surface 3b of the carrier plate 3. Therefore, a part of the outer peripheral portion has a stepped shape in which the second surface 3b side protrudes sideways (outward in a direction parallel to the first surface 3a or the second surface 3b) as compared with the first surface 3a side. Step portion 3c is formed.

キャリア板3(外周部)と切削ブレード18との重なりの幅(すなわち、形成される段差部3cの幅、又は突出量)は、ワークピース7から切り出されるパッケージデバイス等に影響が出ない範囲内で設定される。例えば、ワークピース7の外周部に設定される余剰領域(外周余剰領域)の幅が広い場合には、キャリア板3(外周部)と切削ブレード18との重なりの幅(段差部3cの幅)を広く設定できる。キャリア板3の除去し易さ等を考慮すると、段差部3cの幅は、例えば、0.2mm以上5mm以下に設定されることが好ましい。 The width of the overlap between the carrier plate 3 (outer peripheral portion) and the cutting blade 18 (that is, the width of the formed step portion 3c or the amount of protrusion) is within a range that does not affect the package device or the like cut out from the workpiece 7. Set in. For example, when the width of the surplus region (peripheral surplus region) set in the outer peripheral portion of the workpiece 7 is wide, the width of the overlap between the carrier plate 3 (outer peripheral portion) and the cutting blade 18 (width of the step portion 3c). Can be set widely. Considering the ease of removal of the carrier plate 3, the width of the stepped portion 3c is preferably set to, for example, 0.2 mm or more and 5 mm or less.

上述のように、仮接着層5及びワークピース7は、平面視でキャリア板3と概ね同じ大きさ、形状に構成されている。そのため、ワークピース7が設けられている第1面3a側からキャリア板3の外周部の一部に切削ブレード18を切り込ませると、仮接着層5及びワークピース7の対応する領域も同時に除去される。 As described above, the temporary adhesive layer 5 and the workpiece 7 are configured to have substantially the same size and shape as the carrier plate 3 in a plan view. Therefore, when the cutting blade 18 is cut into a part of the outer peripheral portion of the carrier plate 3 from the side of the first surface 3a where the workpiece 7 is provided, the corresponding regions of the temporary adhesive layer 5 and the workpiece 7 are also removed at the same time. Will be done.

上述のような手順でキャリア板3の外周部の一部に段差部3cを形成した後には、同様の手順でキャリア板3の外周部の他の部分にも段差部3cを形成する。キャリア板3の外周部の全体に段差部3cが形成されると、段差部形成工程は終了する。図2(B)は、キャリア板3の外周部の全体に段差部3cが形成された状態を示す断面図である。 After forming the stepped portion 3c on a part of the outer peripheral portion of the carrier plate 3 by the procedure as described above, the stepped portion 3c is also formed on the other portion of the outer peripheral portion of the carrier plate 3 by the same procedure. When the stepped portion 3c is formed on the entire outer peripheral portion of the carrier plate 3, the stepped portion forming step is completed. FIG. 2B is a cross-sectional view showing a state in which a step portion 3c is formed on the entire outer peripheral portion of the carrier plate 3.

なお、本実施形態では、図2(B)に示すように、キャリア板3の外周部の全体に段差部3cを形成しているが、段差部3cは、少なくともキャリア板3の外周部の任意の一部に形成されていれば良い。また、キャリア板やワークピースが平面視で円形(すなわち、円盤状)の場合には、例えば、切削ブレード18をキャリア板の外周部に切り込ませながらチャックテーブル4を回転させることで、キャリア板に段差部を形成できる。 In this embodiment, as shown in FIG. 2B, the stepped portion 3c is formed on the entire outer peripheral portion of the carrier plate 3, but the stepped portion 3c is at least arbitrary on the outer peripheral portion of the carrier plate 3. It suffices if it is formed in a part of. When the carrier plate or workpiece is circular (that is, disk-shaped) in a plan view, for example, the carrier plate is rotated by rotating the chuck table 4 while cutting the cutting blade 18 into the outer peripheral portion of the carrier plate. A stepped portion can be formed on the surface.

段差部形成工程の後には、ワークピース7の露出した第1面7aに粘着テープを貼付するとともに、この粘着テープの外周部を環状のフレームに貼付する貼付工程を行う。図3は、貼付工程でワークピース7に粘着テープ21が貼付された状態を示す断面図である。粘着テープ21は、例えば、ワークピース7(第1面7aの対角線)より大きい円形のフィルム状に構成された基材と、基材の一方の面に設けられた接着層(糊層)と、を含む。 After the step forming step, the adhesive tape is attached to the exposed first surface 7a of the workpiece 7, and the outer peripheral portion of the adhesive tape is attached to the annular frame. FIG. 3 is a cross-sectional view showing a state in which the adhesive tape 21 is attached to the workpiece 7 in the attaching step. The adhesive tape 21 includes, for example, a base material formed in a circular film shape larger than the workpiece 7 (diagonal line of the first surface 7a), an adhesive layer (glue layer) provided on one surface of the base material, and the like. including.

粘着テープ21の基材は、例えば、ポリオレフィン、塩化ビニル、ポリエチレンテレフタレート等の材料を用いて形成され、粘着テープ21の接着層は、例えば、アクリル系やゴム系の材料を用いて形成される。貼付工程では、例えば、粘着テープ21の接着層の中央部側を、ワークピース7の第1面7aに密着させる。これにより、ワークピース7の第1面7aに粘着テープ21の中央部が貼付される。 The base material of the adhesive tape 21 is formed by using a material such as polyolefin, vinyl chloride, or polyethylene terephthalate, and the adhesive layer of the adhesive tape 21 is formed by using, for example, an acrylic material or a rubber material. In the sticking step, for example, the central portion side of the adhesive layer of the adhesive tape 21 is brought into close contact with the first surface 7a of the workpiece 7. As a result, the central portion of the adhesive tape 21 is attached to the first surface 7a of the workpiece 7.

また、貼付工程では、粘着テープ21の接着層の外周部側を、ステンレス鋼(SUS)やアルミニウム等の金属で形成された環状のフレーム23に密着させる。ここで、環状のフレーム23は、その開口部にワークピース7が収容されるように、ワークピース7を囲む位置に配置される。これにより、環状のフレーム23に粘着テープ21の外周部が貼付され、ワークピース7は、粘着テープ21を介して環状のフレーム23によって支持された状態になる。 Further, in the sticking step, the outer peripheral side of the adhesive layer of the adhesive tape 21 is brought into close contact with the annular frame 23 made of a metal such as stainless steel (SUS) or aluminum. Here, the annular frame 23 is arranged at a position surrounding the work piece 7 so that the work piece 7 is accommodated in the opening thereof. As a result, the outer peripheral portion of the adhesive tape 21 is attached to the annular frame 23, and the workpiece 7 is in a state of being supported by the annular frame 23 via the adhesive tape 21.

なお、この貼付工程では、ワークピース7に粘着テープ21を貼付してから、フレーム23に粘着テープ21を貼付しても良いし、フレーム23に粘着テープ21を貼付してから、ワークピース7に粘着テープ21を貼付しても良い。もちろん、ワークピース7への粘着テープ21の貼付と、フレーム23への粘着テープ21の貼付と、が同時に行われても良い。また、本実施形態では、粘着テープ21のワークピース7に貼付される部分とフレーム23に貼付される部分との間の領域に粘着テープ21を厚みの方向に貫通する貫通穴21aが設けられた粘着テープ21が使用されている。 In this attaching step, the adhesive tape 21 may be attached to the work piece 7 and then the adhesive tape 21 may be attached to the frame 23, or the adhesive tape 21 may be attached to the frame 23 and then attached to the work piece 7. Adhesive tape 21 may be attached. Of course, the adhesive tape 21 may be attached to the workpiece 7 and the adhesive tape 21 may be attached to the frame 23 at the same time. Further, in the present embodiment, a through hole 21a that penetrates the adhesive tape 21 in the thickness direction is provided in the region between the portion of the adhesive tape 21 attached to the workpiece 7 and the portion attached to the frame 23. Adhesive tape 21 is used.

貼付工程の後には、複合基板1のワークピース7側を上方から粘着テープ21を介して保持する保持工程を行う。図4(A)は、保持工程について示す断面図である。保持工程は、図4(A)等に示す剥離装置22を用いて行われる。剥離装置22は、複合基板1のワークピース7側を上方から保持するための保持ユニット24を備えている。 After the sticking step, a holding step of holding the workpiece 7 side of the composite substrate 1 from above via the adhesive tape 21 is performed. FIG. 4A is a cross-sectional view showing the holding process. The holding step is performed using the peeling device 22 shown in FIG. 4A and the like. The peeling device 22 includes a holding unit 24 for holding the workpiece 7 side of the composite substrate 1 from above.

保持ユニット24の下部には、ワークピース7の第1面7aと同程度の大きさを持つ保持面24aが形成されている。この保持面24aには、流路(不図示)やバルブ(不図示)等を介して吸引源(不図示)が接続されている。そのため、バルブを開けば、吸引源の負圧を保持面24aに作用させることができる。また、保持ユニット24は、昇降機構(不図示)によって支持されており、鉛直方向に移動する。 At the lower part of the holding unit 24, a holding surface 24a having the same size as the first surface 7a of the workpiece 7 is formed. A suction source (not shown) is connected to the holding surface 24a via a flow path (not shown), a valve (not shown), or the like. Therefore, if the valve is opened, the negative pressure of the suction source can be applied to the holding surface 24a. Further, the holding unit 24 is supported by an elevating mechanism (not shown) and moves in the vertical direction.

保持工程では、図4(A)に示すように、例えば、キャリア板3の上方にワークピース7が位置付けられた状態で、ワークピース7に貼付された粘着テープ21に保持ユニット24の保持面24aを接触させる。つまり、ワークピース7の第1面7aに、粘着テープ21を介して保持ユニット24の保持面24aを接触させる。そして、バルブを開いて、吸引源の負圧を保持面24aに作用させる。これにより、複合基板1のワークピース7側が上方から粘着テープ21を介して保持ユニット24により保持される。 In the holding step, as shown in FIG. 4A, for example, with the work piece 7 positioned above the carrier plate 3, the holding surface 24a of the holding unit 24 is attached to the adhesive tape 21 attached to the work piece 7. To contact. That is, the holding surface 24a of the holding unit 24 is brought into contact with the first surface 7a of the workpiece 7 via the adhesive tape 21. Then, the valve is opened to apply the negative pressure of the suction source to the holding surface 24a. As a result, the workpiece 7 side of the composite substrate 1 is held by the holding unit 24 from above via the adhesive tape 21.

保持工程の後には、ワークピース7からキャリア板3を除去するキャリア板除去工程を行う。図4(B)は、キャリア板除去工程について示す断面図であり、図4(C)は、ワークピース7からキャリア板3が除去された状態を示す断面図である。このキャリア板除去工程は、引き続き剥離装置22を用いて行われる。 After the holding step, a carrier plate removing step of removing the carrier plate 3 from the workpiece 7 is performed. FIG. 4B is a cross-sectional view showing a carrier plate removing step, and FIG. 4C is a cross-sectional view showing a state in which the carrier plate 3 is removed from the workpiece 7. This carrier plate removing step is subsequently performed using the peeling device 22.

図4(B)に示すように、保持ユニット24の側方には、この保持ユニット24によって保持される複合基板1の段差部3cと粘着テープ21の貫通穴21aとに相当する位置に、棒状のプッシュ部材26が配置されている。このプッシュ部材26は、例えば、保持ユニット24を移動させる昇降機構とは別の昇降機構(不図示)によって支持されており、保持ユニット24から独立して鉛直方向に移動する。 As shown in FIG. 4B, on the side of the holding unit 24, a rod shape is formed at a position corresponding to the step portion 3c of the composite substrate 1 held by the holding unit 24 and the through hole 21a of the adhesive tape 21. The push member 26 of the above is arranged. The push member 26 is supported by, for example, an elevating mechanism (not shown) different from the elevating mechanism for moving the holding unit 24, and moves in the vertical direction independently of the holding unit 24.

キャリア板除去工程では、まず、保持ユニット24とプッシュ部材26とをともに上方に移動させて、保持ユニット24に保持されている複合基板1を持ち上げる。すなわち、キャリア板3の第2面3b側を下方に露出させる。次に、保持ユニット24の位置を保ったままプッシュ部材26の下端が貫通穴21aを通過するようにプッシュ部材26を下方に移動させ、プッシュ部材26の下端を段差部3cに接触させる。すなわち、貫通穴21aに挿入されたプッシュ部材26によって、キャリア板3の段差部3cに下向きの力を加える。 In the carrier plate removing step, first, both the holding unit 24 and the push member 26 are moved upward to lift the composite substrate 1 held by the holding unit 24. That is, the second surface 3b side of the carrier plate 3 is exposed downward. Next, the push member 26 is moved downward so that the lower end of the push member 26 passes through the through hole 21a while maintaining the position of the holding unit 24, and the lower end of the push member 26 is brought into contact with the step portion 3c. That is, the push member 26 inserted into the through hole 21a applies a downward force to the stepped portion 3c of the carrier plate 3.

上述のように、複合基板1のワークピース7側は、粘着テープ21を介して保持ユニット24により上方から保持されている。そのため、プッシュ部材26によってキャリア板3の段差部3cに下向きの力を加えると、キャリア板3は仮接着層5を境にワークピース7から剥離され、落下する。すなわち、キャリア板3は、ワークピース7から離れる方向に移動する。ワークピース7からキャリア板3の全体が分離され、キャリア板3がワークピース7から除去されると、キャリア板除去工程は終了する。 As described above, the workpiece 7 side of the composite substrate 1 is held from above by the holding unit 24 via the adhesive tape 21. Therefore, when a downward force is applied to the stepped portion 3c of the carrier plate 3 by the push member 26, the carrier plate 3 is peeled off from the work piece 7 with the temporary adhesive layer 5 as a boundary and falls. That is, the carrier plate 3 moves away from the workpiece 7. When the entire carrier plate 3 is separated from the workpiece 7 and the carrier plate 3 is removed from the workpiece 7, the carrier plate removing step is completed.

以上のように、本実施形態にかかるキャリア板の除去方法では、ワークピース7が設けられたキャリア板3の第1面(表面)3a側からキャリア板3の外周縁に沿ってキャリア板3の外周部を加工し、キャリア板3の第1面3a側に比べてキャリア板3の第2面(裏面)3b側が側方に突出した段差部3cを形成している。よって、ワークピース7を上方から保持ユニット24で保持した状態で、段差部3cに下向きの力を加えることにより、ワークピース7からキャリア板3を容易に除去できる。 As described above, in the method for removing the carrier plate according to the present embodiment, the carrier plate 3 is provided along the outer peripheral edge of the carrier plate 3 from the first surface (surface) 3a side of the carrier plate 3 provided with the workpiece 7. The outer peripheral portion is processed to form a stepped portion 3c in which the second surface (back surface) 3b side of the carrier plate 3 projects laterally as compared with the first surface 3a side of the carrier plate 3. Therefore, the carrier plate 3 can be easily removed from the work piece 7 by applying a downward force to the stepped portion 3c while the work piece 7 is held by the holding unit 24 from above.

また、段差部3cに加える下向きの力とともに、キャリア板3に作用する重力を利用できるので、段差部3cに加える下向きの力が小さい場合でも、ワークピース7からキャリア板3を除去できる。更に、ワークピース7からキャリア板3を除去する前に、ワークピース7に粘着テープ21を貼付し、環状のフレーム23によってワークピース7が保持された状態にしておくので、ワークピース7からキャリア板3を除去した後に、ワークピース7が反り難くなる。 Further, since the gravity acting on the carrier plate 3 can be used together with the downward force applied to the step portion 3c, the carrier plate 3 can be removed from the workpiece 7 even when the downward force applied to the step portion 3c is small. Further, before removing the carrier plate 3 from the work piece 7, the adhesive tape 21 is attached to the work piece 7 to keep the work piece 7 held by the annular frame 23, so that the carrier plate is held from the work piece 7. After removing 3, the workpiece 7 becomes less likely to warp.

なお、本発明は、上述した実施形態の記載に制限されず種々変更して実施可能である。例えば、上述した実施形態のプッシュ部材26は、保持ユニット24から独立して鉛直方向に移動できるように構成されているが、このプッシュ部材26は、少なくとも保持ユニット24に対して相対的に移動できれば良い。 The present invention is not limited to the description of the above-described embodiment, and can be modified in various ways. For example, the push member 26 of the above-described embodiment is configured to be able to move in the vertical direction independently of the holding unit 24, but if the push member 26 can move at least relative to the holding unit 24. good.

例えば、プッシュ部材26を剥離装置22の筐体(不図示)等に固定し、保持ユニット24のみを移動させることで、保持ユニット24に対してプッシュ部材26を相対的に移動させても良い。また、上述した実施形態では、1個のプッシュ部材26を使用しているが、複数のプッシュ部材26を使用することもできる。 For example, the push member 26 may be moved relative to the holding unit 24 by fixing the push member 26 to a housing (not shown) of the peeling device 22 and moving only the holding unit 24. Further, in the above-described embodiment, one push member 26 is used, but a plurality of push members 26 can also be used.

また、上述した実施形態では、ワークピース7側からキャリア板3の外周縁に沿って切削ブレード18を切り込ませることで段差部3cを形成しているが、例えば、ワークピース7側からキャリア板3の外周縁に沿ってレーザービームを照射することで段差部3cを形成しても良い。この場合には、切削装置2(切削ユニット14)の代わりに、少なくともキャリア板3に吸収される波長のレーザービームを照射できるレーザー加工装置(レーザー加工ユニット)が使用される。 Further, in the above-described embodiment, the stepped portion 3c is formed by cutting the cutting blade 18 from the workpiece 7 side along the outer peripheral edge of the carrier plate 3, but for example, the carrier plate is formed from the workpiece 7 side. A step portion 3c may be formed by irradiating a laser beam along the outer peripheral edge of 3. In this case, instead of the cutting device 2 (cutting unit 14), a laser processing device (laser processing unit) capable of irradiating a laser beam having a wavelength absorbed by at least the carrier plate 3 is used.

また、キャリア板除去工程においてキャリア板3を除去する際に、キャリア板3とワークピース7との間(仮接着層5に相当する領域)に流体を吹き付けることもできる。図5(A)は、第1変形例のキャリア板除去工程について示す断面図である。図5(A)に示すように、この第1変形例で使用される剥離装置22の保持ユニット24の側方には、ノズル32が配置されている。ノズル32には、流路(不図示)やバルブ(不図示)等を介して流体34の供給源(不図示)が接続されている。 Further, when the carrier plate 3 is removed in the carrier plate removing step, a fluid can be sprayed between the carrier plate 3 and the workpiece 7 (the region corresponding to the temporary adhesive layer 5). FIG. 5A is a cross-sectional view showing a carrier plate removing step of the first modification. As shown in FIG. 5A, a nozzle 32 is arranged on the side of the holding unit 24 of the peeling device 22 used in this first modification. A supply source (not shown) of the fluid 34 is connected to the nozzle 32 via a flow path (not shown), a valve (not shown), or the like.

このノズル32から、キャリア板3とワークピース7との間に流体34を吹き付けた後に、又は、キャリア板3とワークピース7との間に流体34を吹き付けながら、プッシュ部材26で段差部3cに下向きの力を加えることで、ワークピース7からキャリア板3をより容易に剥離できる。キャリア板3とワークピース7との間に吹き付ける流体34としては、例えば、エアーや水等を用いることができる。ただし、流体34の種類等に特段の制限はない。 After spraying the fluid 34 between the carrier plate 3 and the work piece 7 from this nozzle 32, or while spraying the fluid 34 between the carrier plate 3 and the workpiece 7, the push member 26 is used to blow the fluid 34 onto the step portion 3c. By applying a downward force, the carrier plate 3 can be more easily peeled off from the workpiece 7. As the fluid 34 to be sprayed between the carrier plate 3 and the workpiece 7, for example, air, water, or the like can be used. However, there are no particular restrictions on the type of fluid 34 or the like.

また、キャリア板除去工程においてキャリア板3を除去する際に、キャリア板3とワークピース7とを液体に沈めても良い。図5(B)は、第2変形例のキャリア板除去工程について示す断面図である。図5(B)に示すように、この第2変形例で使用される剥離装置22の保持ユニット24の下方には、キャリア板3とワークピース7とを収容できる大きさの槽42が配置されている。槽42内には、水等の液体44がためられる。 Further, when the carrier plate 3 is removed in the carrier plate removing step, the carrier plate 3 and the workpiece 7 may be submerged in a liquid. FIG. 5B is a cross-sectional view showing a carrier plate removing step of the second modification. As shown in FIG. 5B, a tank 42 having a size capable of accommodating the carrier plate 3 and the workpiece 7 is arranged below the holding unit 24 of the peeling device 22 used in the second modification. ing. A liquid 44 such as water is stored in the tank 42.

槽42内の液体44にキャリア板3とワークピース7とを沈めた状態で、プッシュ部材26で段差部3cに下向きの力を加え、ワークピース7からキャリア板3を剥離すると、ワークピース7から剥離されたキャリア板3は液体44中を落下する。その結果、キャリア板3を空気中で落下させる場合に比べて落下に伴う衝撃が小さくなり、キャリア板3の破損や、剥離装置22の振動等を防止できる。 With the carrier plate 3 and the workpiece 7 submerged in the liquid 44 in the tank 42, a downward force is applied to the stepped portion 3c by the push member 26 to peel the carrier plate 3 from the workpiece 7, and the carrier plate 3 is peeled off from the workpiece 7. The peeled carrier plate 3 falls in the liquid 44. As a result, the impact due to the drop is smaller than when the carrier plate 3 is dropped in the air, and damage to the carrier plate 3 and vibration of the peeling device 22 can be prevented.

なお、この液体44には界面活性剤を含ませても良い。液体44に含ませる界面活性剤としては、仮接着層5に侵入し易いアニオン界面活性剤やカチオン界面活性剤等を用いることができる。このように、仮接着層5に侵入し易い界面活性剤を液体44に含ませることで、界面活性剤が侵入した領域から仮接着層5が分離し易くなって、ワークピース7からキャリア板3をより容易に剥離できる。 The liquid 44 may contain a surfactant. As the surfactant to be contained in the liquid 44, an anionic surfactant, a cationic surfactant, or the like that easily penetrates into the temporary adhesive layer 5 can be used. By including the surfactant that easily penetrates into the temporary adhesive layer 5 in the liquid 44 in this way, the temporary adhesive layer 5 can be easily separated from the region where the surfactant has penetrated, and the work piece 7 to the carrier plate 3 can be easily separated. Can be peeled off more easily.

また、第2変形例では、キャリア板3とワークピース7とを液体44に沈めた後、プッシュ部材26で段差部3cに下向きの力を加える際に、このプッシュ部材26に超音波等の振動を付与しても良い。具体的には、超音波等の振動をプッシュ部材26に付与しながら、このプッシュ部材26で段差部3cに下向きの力を加える。この場合には、プッシュ部材26から伝わる振動の作用により、ワークピース7からキャリア板3をより容易に剥離できるようになる。 Further, in the second modification, after the carrier plate 3 and the workpiece 7 are submerged in the liquid 44, when a downward force is applied to the step portion 3c by the push member 26, vibration such as ultrasonic waves is applied to the push member 26. May be given. Specifically, while applying vibration such as ultrasonic waves to the push member 26, a downward force is applied to the step portion 3c by the push member 26. In this case, the carrier plate 3 can be more easily peeled from the workpiece 7 by the action of the vibration transmitted from the push member 26.

同様に、キャリア板3とワークピース7とを液体44に沈めた後、プッシュ部材26で段差部3cに下向きの力を加える際に、液体44に超音波等の振動を付与しても良い。具体的には、超音波等の振動を液体44に付与しながら、プッシュ部材26で段差部3cに下向きの力を加える。この場合には、液体44から伝わる振動の作用により、ワークピース7からキャリア板3をより容易に剥離できるようになる。 Similarly, after the carrier plate 3 and the workpiece 7 are submerged in the liquid 44, vibration such as ultrasonic waves may be applied to the liquid 44 when a downward force is applied to the step portion 3c by the push member 26. Specifically, while applying vibration such as ultrasonic waves to the liquid 44, a downward force is applied to the step portion 3c by the push member 26. In this case, the carrier plate 3 can be more easily peeled from the workpiece 7 by the action of the vibration transmitted from the liquid 44.

また、第2変形例に対して、更に第1変形例を組み合わせても良い。すなわち、キャリア板3とワークピース7とを液体44に沈めた後、キャリア板3とワークピース7との間(仮接着層5に相当する領域)に流体を吹き付けることもできる。例えば、キャリア板3とワークピース7との間に流体34を吹き付けた後に、又は、キャリア板3とワークピース7との間に流体34を吹き付けながら、プッシュ部材26で段差部3cに下向きの力を加えることで、ワークピース7からキャリア板3をより容易に剥離できる。 Further, the first modification may be further combined with the second modification. That is, after the carrier plate 3 and the work piece 7 are submerged in the liquid 44, the fluid can be sprayed between the carrier plate 3 and the work piece 7 (the region corresponding to the temporary adhesive layer 5). For example, after spraying the fluid 34 between the carrier plate 3 and the workpiece 7, or while spraying the fluid 34 between the carrier plate 3 and the workpiece 7, a downward force is applied to the step portion 3c by the push member 26. By adding the above, the carrier plate 3 can be more easily peeled off from the workpiece 7.

その他、上述した実施形態及び変形例にかかる構造、方法等は、本発明の目的の範囲を逸脱しない限りにおいて適宜変更して実施できる。 In addition, the structures, methods, and the like according to the above-described embodiments and modifications can be appropriately modified and implemented as long as they do not deviate from the scope of the object of the present invention.

1 複合基板
3 キャリア板
3a 第1面(表面)
3b 第2面(裏面)
3c 段差部
5 仮接着層
7 ワークピース
7a 第1面(表面)
9 デバイスチップ
11 モールド樹脂層
21 粘着テープ
21a 貫通穴
23 フレーム
2 切削装置
4 チャックテーブル
6 枠体
6a 流路
8 保持板
8a 保持面
10 バルブ
12 吸引源
14 切削ユニット
16 スピンドル
18 切削ブレード
22 剥離装置
24 保持ユニット
24a 保持面
26 プッシュ部材
32 ノズル
34 流体
42 槽
44 液体
1 Composite substrate 3 Carrier plate 3a First surface (surface)
3b 2nd side (back side)
3c Step 5 Temporary adhesive layer 7 Workpiece 7a First surface (surface)
9 Device chip 11 Mold resin layer 21 Adhesive tape 21a Through hole 23 Frame 2 Cutting device 4 Chuck table 6 Frame body 6a Flow path 8 Holding plate 8a Holding surface 10 Valve 12 Suction source 14 Cutting unit 16 Spindle 18 Cutting blade 22 Peeling device 24 Holding unit 24a Holding surface 26 Push member 32 Nozzle 34 Fluid 42 Tank 44 Liquid

Claims (7)

キャリア板の表面に仮接着層を介して設けられたワークピースから該キャリア板を除去するキャリア板の除去方法であって、
該ワークピースが設けられた該表面側から該キャリア板の外周縁に沿って該キャリア板の外周部を加工し、該キャリア板の該表面側に比べて該キャリア板の裏面側が側方に突出した段差部を形成する段差部形成工程と、
該段差部形成工程を実施した後、該ワークピースの該キャリア板とは反対側で露出する表面に粘着テープを貼付するとともに、該粘着テープの外周部を環状のフレームに貼付する貼付工程と、
該貼付工程を実施した後、該キャリア板の上方に該ワークピースが位置付けられた状態で該粘着テープを介して該ワークピースを上方から保持ユニットで保持する保持工程と、
該保持工程を実施した後、プッシュ部材で該段差部に下向きの力を加えて該キャリア板を該ワークピースから離れる方向に移動させることで該ワークピースから該キャリア板を除去するキャリア板除去工程と、を含むことを特徴とするキャリア板の除去方法。
A method for removing a carrier plate from a workpiece provided on the surface of the carrier plate via a temporary adhesive layer.
The outer peripheral portion of the carrier plate is processed from the front surface side on which the workpiece is provided along the outer peripheral edge of the carrier plate, and the back surface side of the carrier plate protrudes sideways as compared with the front surface side of the carrier plate. The step portion forming process for forming the stepped portion and the step portion forming process
After performing the step portion forming step, an adhesive tape is attached to the surface of the work piece exposed on the opposite side of the carrier plate, and the outer peripheral portion of the adhesive tape is attached to the annular frame.
After performing the pasting step, a holding step of holding the work piece from above with a holding unit via the adhesive tape in a state where the work piece is positioned above the carrier plate,
After performing the holding step, a carrier plate removing step of removing the carrier plate from the workpiece by applying a downward force to the step portion with a push member and moving the carrier plate in a direction away from the workpiece. A method for removing a carrier plate, which comprises.
該粘着テープには、該プッシュ部材を通す貫通穴が設けられており、
該キャリア板除去工程では、該貫通穴に挿入された該プッシュ部材で該段差部に下向きの力を加えて該ワークピースから該キャリア板を除去することを特徴とする請求項1に記載のキャリア板の除去方法。
The adhesive tape is provided with a through hole through which the push member is passed.
The carrier according to claim 1, wherein in the carrier plate removing step, the carrier plate is removed from the workpiece by applying a downward force to the stepped portion by the push member inserted into the through hole. How to remove the board.
該キャリア板除去工程では、該ワークピースと該キャリア板との間に流体を吹き付けた後に、又は該ワークピースと該キャリア板との間に流体を吹き付けながら、該段差部に下向きの力を加えて該ワークピースから該キャリア板を除去することを特徴とする請求項1又は請求項2に記載のキャリア板の除去方法。 In the carrier plate removing step, a downward force is applied to the step portion after spraying a fluid between the work piece and the carrier plate, or while spraying the fluid between the work piece and the carrier plate. The method for removing a carrier plate according to claim 1 or 2, wherein the carrier plate is removed from the work piece. 該キャリア板除去工程では、該ワークピースと該キャリア板とを液体に沈めた状態で、該段差部に下向きの力を加えることを特徴とする請求項1から請求項3のいずれかに記載のキャリア板の除去方法。 The method according to any one of claims 1 to 3, wherein in the carrier plate removing step, a downward force is applied to the stepped portion in a state where the workpiece and the carrier plate are submerged in a liquid. How to remove the carrier plate. 該液体には、界面活性剤を含ませたことを特徴とする請求項4に記載のキャリア板の除去方法。 The method for removing a carrier plate according to claim 4, wherein the liquid contains a surfactant. 該キャリア板除去工程では、該ワークピースと該キャリア板とを該液体に沈めた状態で、該プッシュ部材に振動を付与しながら該段差部に下向きの力を加えることを特徴とする請求項4又は請求項5に記載のキャリア板の除去方法。 4. The carrier plate removing step is characterized in that, in a state where the workpiece and the carrier plate are submerged in the liquid, a downward force is applied to the step portion while applying vibration to the push member. Alternatively, the method for removing the carrier plate according to claim 5. 該キャリア板除去工程では、該ワークピースと該キャリア板とを該液体に沈めた状態で、該液体に振動を付与しながら該段差部に下向きの力を加えることを特徴とする請求項4又は請求項5に記載のキャリア板の除去方法。 4. The carrier plate removing step is characterized in that, in a state where the workpiece and the carrier plate are submerged in the liquid, a downward force is applied to the step portion while applying vibration to the liquid. The method for removing a carrier plate according to claim 5.
JP2020123764A 2020-07-20 2020-07-20 Carrier plate removal method Pending JP2022020332A (en)

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JP2020123764A JP2022020332A (en) 2020-07-20 2020-07-20 Carrier plate removal method
KR1020210077763A KR20220011075A (en) 2020-07-20 2021-06-16 Method for removing carrier plate
TW110126127A TW202205462A (en) 2020-07-20 2021-07-15 Method for removing carrier plate in which a downward force is applied to a step portion of a carrier plate to have the carrier plate moved in a direction away from a workpiece positioned thereon to remove the carrier plate from the workpiece
CN202110812287.8A CN113964074A (en) 2020-07-20 2021-07-19 Method for removing carrier plate

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