JP2022018951A5 - - Google Patents
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- JP2022018951A5 JP2022018951A5 JP2020122414A JP2020122414A JP2022018951A5 JP 2022018951 A5 JP2022018951 A5 JP 2022018951A5 JP 2020122414 A JP2020122414 A JP 2020122414A JP 2020122414 A JP2020122414 A JP 2020122414A JP 2022018951 A5 JP2022018951 A5 JP 2022018951A5
- Authority
- JP
- Japan
- Prior art keywords
- shaped portion
- short side
- deposition mask
- length
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000007740 vapor deposition Methods 0.000 claims 6
- 238000000427 thin-film deposition Methods 0.000 claims 5
- 239000002184 metal Substances 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
Claims (8)
一対の長辺および一対の短辺を有した縁と、複数のマスク孔を備えたマスク部とを含む帯状部と、
前記帯状部を囲む枠状部と、
前記帯状部の少なくとも前記短辺と前記枠状部との間に位置し、前記帯状部を前記枠状部に連結する連結部と、を備え、
前記帯状部は、前記短辺に両端が接続され、当該短辺から他の短辺に向かう突状を有した線状の脆弱線と、前記短辺のうちの前記両端に挟まれた線分と、前記脆弱線とによって囲まれ、かつ、前記線分と前記脆弱線とを含む切取領域とを備え、
前記蒸着マスク中間体は、前記切取領域内において、前記切取領域を囲む縁の一部に接続される貫通孔を備える
蒸着マスク中間体。 A vapor deposition mask intermediate formed from a metal sheet,
A strip-shaped portion including an edge having a pair of long sides and a pair of short sides, and a mask portion having a plurality of mask holes.
The frame-shaped portion surrounding the strip-shaped portion and
A connecting portion located between at least the short side of the strip-shaped portion and the frame-shaped portion and connecting the strip-shaped portion to the frame-shaped portion is provided.
The band-shaped portion has a linear fragile line having both ends connected to the short side and having a protrusion from the short side to another short side, and a line segment sandwiched between the short sides. And a cut area surrounded by the fragile line and including the line segment and the fragile line.
The thin-film deposition mask intermediate is a thin-film deposition mask intermediate having a through hole connected to a part of an edge surrounding the cut-out area in the cut-out area.
前記第１端部は、前記線分に接続され、
前記第２端部は、前記脆弱線に接続されている
請求項１に記載の蒸着マスク中間体。 The through hole has a shape extending from the first end to the second end.
The first end is connected to the line segment and
The vapor deposition mask intermediate according to claim 1, wherein the second end is connected to the fragile wire.
前記貫通孔は、前記長辺に沿って延びる帯状を有する
請求項２に記載の蒸着マスク中間体。 The fragile line has a substantially U-shape and has a substantially U-shape.
The vapor deposition mask intermediate according to claim 2, wherein the through hole has a band shape extending along the long side.
前記第２端部は、前記脆弱線の長さを二等分する
請求項３に記載の蒸着マスク中間体。 The first end portion divides the line segment into two equal parts in the direction in which the short side extends.
The vapor deposition mask intermediate according to claim 3, wherein the second end portion bisects the length of the fragile line.
前記線分の長さと、前記脆弱線の長さとの総和が第２長さであり、
前記第２長さが、前記第１長さよりも長い
請求項４に記載の蒸着マスク中間体。 In the direction in which the short side extends, the sum of the length of the first end portion and the length of the second end portion is the first length.
The sum of the length of the line segment and the length of the fragile line is the second length.
The vapor deposition mask intermediate according to claim 4, wherein the second length is longer than the first length.
請求項１に記載の蒸着マスク中間体。 The vapor deposition mask according to claim 1, wherein the through hole has a band shape connecting a position closest to the other short side in the cut area and a position facing the short side in the frame-shaped portion. Intermediate.
一対の長辺および一対の短辺を有した縁と、
複数のマスク孔を備えたマスク部と、を備え、
各短辺は、他方の前記短辺に向けて窪むＵ字状を有した切り欠きであって、２つの直線部と各直線部の端部を繋ぐ湾曲部とを備える前記切り欠きを含み、
前記切り欠きは、前記湾曲部の少なくとも一部に切断痕を有する
蒸着マスク。 A thin-film deposition mask with a band shape.
An edge with a pair of long sides and a pair of short sides,
With a mask part with multiple mask holes,
Each short side is a U-shaped notch recessed towards the other short side and includes the notch comprising two straight portions and a curved portion connecting the ends of the straight portions. ,
The notch is a thin-film mask having a cut mark in at least a part of the curved portion.
前記帯状部から蒸着マスクを形成することと、を備え、
前記帯状部は、前記短辺に両端が接続され、当該短辺から他の短辺に向かう突状を有した線状の脆弱線と、前記短辺のうちの前記両端に挟まれた線分と、前記脆弱線とによって囲まれ、かつ、前記線分と前記脆弱線とを含む切取領域とを備え、
前記蒸着マスク中間体は、前記切取領域内において、前記切取領域を囲む縁の一部に接続される貫通孔を備える
蒸着マスクの製造方法。 A band-shaped portion including a pair of long sides and an edge having a pair of short sides, a mask portion having a plurality of mask holes, a frame-shaped portion surrounding the strip-shaped portion, and at least the short side of the strip-shaped portion. Forming a vapor-deposited mask intermediate from a metal sheet, which is located between the frame-shaped portion and includes a connecting portion for connecting the strip-shaped portion to the frame-shaped portion.
To form a thin-film mask from the strip,
The band-shaped portion has a linear fragile line having both ends connected to the short side and having a protrusion from the short side to another short side, and a line segment sandwiched between the short sides. And a cut area surrounded by the fragile line and including the line segment and the fragile line.
The thin-film deposition mask intermediate is a method for manufacturing a thin-film deposition mask having a through hole connected to a part of an edge surrounding the cut-out area in the cut-out area.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020122414A JP7151745B2 (en) | 2020-07-16 | 2020-07-16 | Evaporation mask intermediate, evaporation mask, and evaporation mask manufacturing method |
| TW110125816A TWI821707B (en) | 2020-07-16 | 2021-07-14 | Evaporation mask intermediate, evaporation mask and method for manufacturing evaporation mask |
| CN202121607184.XU CN216107159U (en) | 2020-07-16 | 2021-07-15 | Intermediate for vapor deposition mask and vapor deposition mask |
| KR1020237001061A KR102604344B1 (en) | 2020-07-16 | 2021-07-15 | Deposition mask intermediate, deposition mask, and method of producing the deposition mask |
| PCT/JP2021/026563 WO2022014662A1 (en) | 2020-07-16 | 2021-07-15 | Vapor deposition mask intermediate, vapor deposition mask, and method for manufacturing vapor deposition mask |
| CN202180049368.5A CN115803471B (en) | 2020-07-16 | 2021-07-15 | Vapor deposition mask intermediate, vapor deposition mask, and method for manufacturing vapor deposition mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020122414A JP7151745B2 (en) | 2020-07-16 | 2020-07-16 | Evaporation mask intermediate, evaporation mask, and evaporation mask manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022018951A JP2022018951A (en) | 2022-01-27 |
| JP2022018951A5 true JP2022018951A5 (en) | 2022-04-07 |
| JP7151745B2 JP7151745B2 (en) | 2022-10-12 |
Family
ID=79555655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020122414A Active JP7151745B2 (en) | 2020-07-16 | 2020-07-16 | Evaporation mask intermediate, evaporation mask, and evaporation mask manufacturing method |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7151745B2 (en) |
| KR (1) | KR102604344B1 (en) |
| CN (2) | CN115803471B (en) |
| TW (1) | TWI821707B (en) |
| WO (1) | WO2022014662A1 (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002001694A (en) | 2000-06-19 | 2002-01-08 | Dainippon Printing Co Ltd | Trimming method and trimming device |
| TWI472631B (en) | 2012-03-30 | 2015-02-11 | Au Optronics Corp | Shadow mask strip |
| TWI661063B (en) * | 2016-08-05 | 2019-06-01 | 日商凸版印刷股份有限公司 | Metal mask for vapor deposition, production method for metal mask for vapor deposition, and production method for display device |
| JP7121918B2 (en) * | 2016-12-14 | 2022-08-19 | 大日本印刷株式会社 | Evaporation mask device and method for manufacturing evaporation mask device |
| CN210711709U (en) | 2018-09-07 | 2020-06-09 | 凸版印刷株式会社 | Intermediate for vapor deposition mask and vapor deposition mask |
| TWI819236B (en) * | 2019-09-06 | 2023-10-21 | 日商凸版印刷股份有限公司 | Evaporation mask intermediate, evaporation mask and method for manufacturing evaporation mask |
-
2020
- 2020-07-16 JP JP2020122414A patent/JP7151745B2/en active Active
-
2021
- 2021-07-14 TW TW110125816A patent/TWI821707B/en active
- 2021-07-15 KR KR1020237001061A patent/KR102604344B1/en active IP Right Grant
- 2021-07-15 CN CN202180049368.5A patent/CN115803471B/en active Active
- 2021-07-15 CN CN202121607184.XU patent/CN216107159U/en active Active
- 2021-07-15 WO PCT/JP2021/026563 patent/WO2022014662A1/en active Application Filing
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