JP2021535554A - 均一な高密度プラズマシートを発生させ処理するための方法 - Google Patents
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Abstract
Description
プラズマ発生システム3を含むプラズマ処理装置1は、スパッタリング標的、基材、及び遮蔽アセンブリを除いて、概略的には図1に表わすように且つ上述したように構成されている。アンテナ9の形状に等しい形状の平面的な永久磁石及び電磁石が、処理チャンバ2の内部に据え付けられ、永久磁石及び電磁石の位置は、後述のように変更される。アンテナ9は、管状のハウジング10を貫通している2つの直線状セクションを具備する、直径6mmの銅製管から構成されている。アンテナ9は、図示の如くハウジングの中心軸線からオフセットされるように、且つ、一方の端部において直径6mmの銅製管のさらなるセクション及び真鍮製コネクタと共に結合されるように成形されているので、延長された略‘U’字状のループを形成している。ハウジング10は、処理チャンバ2の壁を貫通して処理チャンバ2を横断している2つの同一の壁厚3mmの石英製管から成る。ハウジング10は、冷却するために、且つ、ハウジング10の内部におけるプラズマの発生を防止するために、ハウジング10の内部が大気に対して露呈するように真空シールされている。
2 処理チャンバ
3 プラズマ発生システム
4 標的アセンブリ
5 基材アセンブリ
6 磁石
7 電力供給部
8 プロセスガス供給システム
9 アンテナ
10 ハウジング
11 電磁石
11a 電力供給装置(DC電力供給部)
12 インピーダンス整合回路網
13 信号発生器(13.56MHzのRF発生器)
14 直線状セクション
15 直線状セクション
17 処理チャンバフィードスルー
18 取付アセンブリ
19 電源(DC電力供給部)
20 標的材料
21 シールド(標的シールド)
23 遮蔽アセンブリ
24 プラズマシート(局在プラズマ)
Claims (12)
- 一様な高密度プラズマシートを発生及び処理するための方法において、
チャンバの内部に配置されているプラズマ源を利用することによってプラズマを発生させるステップと、
前記チャンバの内部においてプラズマが一様な高密シートとして伝播されるように、前記チャンバの内部において磁場及び/又は電磁場を利用することによってプラズマを収容及び制限するステップと、
前記チャンバの内部において、プラズマが処理面と相互作用するように、プラズマを前記処理面に亘って通過させるステップと、
を備えていることを特徴とする方法。 - 前記プラズマ源が、所定の長さのアンテナを備えており、前記アンテナが、前記チャンバを貫通して延在しており、
前記磁場及び/又は前記電磁場が、前記アンテナの長さに対して垂直な一の方向においてシートとしてプラズマを伝播させることによって、並びに、前記アンテナの長さに対して垂直な他の方向及び前記アンテナの長手方向軸線の方向においてプラズマの伝播を制限することによって、プラズマを抑制及び整形することを特徴とする請求項1に記載の方法。 - 前記プラズマの前記シートが、前記処理面と略並行となるように伝播されることを特徴とする請求項2に記載の方法。
- 前記磁場及び/又は前記電磁場が、20ガウスより低い磁場強度を有していること特徴とする請求項1〜3のいずれか一項に記載の方法。
- 前記プラズマ源が、前記チャンバの内部に配置されている局在プラズマ源であることを特徴とする請求項1〜4のいずれか一項に記載の方法。
- 前記チャンバが、2つの壁を備えており、
アンテナが、2つの前記壁に接続されており、且つ、2つの前記壁の間に延在しており、
局在化された線形プラズマが、前記アンテナの長さ全体に沿って発生されることを特徴とする請求項1〜5のいずれか一項に記載の方法。 - アンテナが、RF送信機とされ、
前記アンテナが、RF周波数に対して少なくとも部分的に透過性を有しているハウジングに囲まれていることを特徴とする請求項1〜6のいずれか一項に記載の方法。 - 前記ハウジングが、利用時に前記チャンバと異なる圧力で維持される内部容積を有していることを特徴とする請求項7に記載の方法。
- 前記ハウジングが、前記チャンバの外部の大気に対して露呈していることを特徴とする請求項7に記載の方法。
- プラズマが、独立したプラズマチャンバの内部に発生しないことを特徴とする請求項1〜9のいずれか一項に記載の方法。
- 1つ以上の磁石が、4.8ガウスの磁場強度を有していることを特徴とする請求項1〜10のいずれか一項に記載の方法。
- 装置が、蒸着装置とされ、
前記処理面が、標的及び/又は蒸着面とされ、
プラズマシートが、前記標的及び/又は前記処理面に対して略平行な方向において、プラズマ処理空間で伝播されることを特徴とする請求項1〜11のいずれか一項に記載の方法。
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Application Number | Priority Date | Filing Date | Title |
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GB1813730.7 | 2018-08-23 | ||
GB1813730.7A GB2576547A (en) | 2018-08-23 | 2018-08-23 | A method |
PCT/GB2019/052345 WO2020039189A1 (en) | 2018-08-23 | 2019-08-21 | Method for generating and processing a uniform high density plasma sheet |
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JP2021535554A true JP2021535554A (ja) | 2021-12-16 |
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JP2021510106A Pending JP2021535554A (ja) | 2018-08-23 | 2019-08-21 | 均一な高密度プラズマシートを発生させ処理するための方法 |
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US (1) | US20210327690A1 (ja) |
JP (1) | JP2021535554A (ja) |
KR (1) | KR20210043674A (ja) |
CN (1) | CN112640028A (ja) |
GB (1) | GB2576547A (ja) |
WO (1) | WO2020039189A1 (ja) |
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GB2593863B (en) * | 2020-02-28 | 2022-08-03 | Plasma Quest Ltd | High Density Vacuum Plasma Source |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02104663A (ja) * | 1988-09-08 | 1990-04-17 | Asahi Glass Co Ltd | 高効率シートプラズマスパタリング装置 |
US20040060662A1 (en) * | 2002-09-26 | 2004-04-01 | Sungkyunkwan University | Inductively coupled plasma processing apparatus having internal linear antenna for large area processing |
WO2011131921A1 (en) * | 2010-04-20 | 2011-10-27 | Plasma Quest Limited | High density plasma source |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0684836A (ja) * | 1992-09-04 | 1994-03-25 | Hitachi Ltd | プラズマ処理装置 |
US5874807A (en) * | 1997-08-27 | 1999-02-23 | The United States Of America As Represented By The Secretary Of The Navy | Large area plasma processing system (LAPPS) |
US20060225653A1 (en) * | 2003-07-25 | 2006-10-12 | Xu Shu Y | Apparatus and method for generating uniform plasmas |
JP5080977B2 (ja) * | 2005-12-06 | 2012-11-21 | 新明和工業株式会社 | シートプラズマ成膜装置 |
-
2018
- 2018-08-23 GB GB1813730.7A patent/GB2576547A/en not_active Withdrawn
-
2019
- 2019-08-21 US US17/270,362 patent/US20210327690A1/en not_active Abandoned
- 2019-08-21 WO PCT/GB2019/052345 patent/WO2020039189A1/en active Application Filing
- 2019-08-21 KR KR1020217008043A patent/KR20210043674A/ko not_active Application Discontinuation
- 2019-08-21 JP JP2021510106A patent/JP2021535554A/ja active Pending
- 2019-08-21 CN CN201980055549.1A patent/CN112640028A/zh active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02104663A (ja) * | 1988-09-08 | 1990-04-17 | Asahi Glass Co Ltd | 高効率シートプラズマスパタリング装置 |
US20040060662A1 (en) * | 2002-09-26 | 2004-04-01 | Sungkyunkwan University | Inductively coupled plasma processing apparatus having internal linear antenna for large area processing |
WO2011131921A1 (en) * | 2010-04-20 | 2011-10-27 | Plasma Quest Limited | High density plasma source |
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Publication number | Publication date |
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KR20210043674A (ko) | 2021-04-21 |
GB2576547A (en) | 2020-02-26 |
WO2020039189A1 (en) | 2020-02-27 |
US20210327690A1 (en) | 2021-10-21 |
GB201813730D0 (en) | 2018-10-10 |
CN112640028A (zh) | 2021-04-09 |
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