JP2021532263A5 - - Google Patents

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Publication number
JP2021532263A5
JP2021532263A5 JP2021503861A JP2021503861A JP2021532263A5 JP 2021532263 A5 JP2021532263 A5 JP 2021532263A5 JP 2021503861 A JP2021503861 A JP 2021503861A JP 2021503861 A JP2021503861 A JP 2021503861A JP 2021532263 A5 JP2021532263 A5 JP 2021532263A5
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Japan
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metal
metalloid
reaction chamber
semiconductor
polymer substrate
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JP2021503861A
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English (en)
Japanese (ja)
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JP7587100B2 (ja
JP2021532263A (ja
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Priority claimed from PCT/EP2019/069970 external-priority patent/WO2020020972A1/en
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Publication of JP2021532263A5 publication Critical patent/JP2021532263A5/ja
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JP2021503861A 2018-07-24 2019-07-24 有機-無機ハイブリッド材料の製造方法 Active JP7587100B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP18382552 2018-07-24
EP18382552.0 2018-07-24
PCT/EP2019/069970 WO2020020972A1 (en) 2018-07-24 2019-07-24 Method for producing organic-inorganic hybrid materials

Publications (3)

Publication Number Publication Date
JP2021532263A JP2021532263A (ja) 2021-11-25
JP2021532263A5 true JP2021532263A5 (enExample) 2024-01-19
JP7587100B2 JP7587100B2 (ja) 2024-11-20

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JP2021503861A Active JP7587100B2 (ja) 2018-07-24 2019-07-24 有機-無機ハイブリッド材料の製造方法

Country Status (5)

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US (1) US12392034B2 (enExample)
EP (1) EP3827111A1 (enExample)
JP (1) JP7587100B2 (enExample)
KR (1) KR20210080348A (enExample)
WO (1) WO2020020972A1 (enExample)

Families Citing this family (5)

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Publication number Priority date Publication date Assignee Title
CN113789534B (zh) * 2020-05-26 2022-09-23 中国科学院理化技术研究所 一种多级孔道结构的电催化析氢电极及其制备方法和应用
CN112526663A (zh) * 2020-11-04 2021-03-19 浙江大学 一种基于原子层沉积的吸收膜及其制作方法
CN116640350B (zh) * 2023-05-31 2026-01-30 陕西科技大学 一种氧化铝/氧化锌共掺杂的聚噻吩衍生物导电薄膜及其制备方法和应用
US20260114243A1 (en) * 2024-10-17 2026-04-23 Tokyo Electron Limited Molecular layer infiltration of photoresists
CN119751956B (zh) * 2024-12-31 2026-03-03 陕西科技大学 一种氧化钛/氧化锌共掺杂聚醚酰亚胺抗静电薄膜及其制备方法和应用

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI493058B (zh) * 2007-05-15 2015-07-21 應用材料股份有限公司 鎢材料的原子層沈積法
WO2009070574A2 (en) * 2007-11-27 2009-06-04 North Carolina State University Methods for modification of polymers, fibers and textile media
WO2013071065A1 (en) * 2011-11-10 2013-05-16 Research Triangle Institute Nanostructured polymer-inorganic fiber media
WO2014092085A1 (ja) * 2012-12-14 2014-06-19 コニカミノルタ株式会社 ガスバリア性フィルム、その製造方法、およびこれを用いた電子デバイス
US9443998B2 (en) * 2013-03-14 2016-09-13 Nanoco Technologies Ltd. Multi-layer-coated quantum dot beads
US8900467B1 (en) 2013-05-25 2014-12-02 HGST Netherlands B.V. Method for making a chemical contrast pattern using block copolymers and sequential infiltration synthesis
US10763103B2 (en) * 2015-03-31 2020-09-01 Versum Materials Us, Llc Boron-containing compounds, compositions, and methods for the deposition of a boron containing films
JP6697706B2 (ja) 2015-12-07 2020-05-27 凸版印刷株式会社 原子層堆積装置
US10550010B2 (en) * 2015-12-11 2020-02-04 Uchicago Argonne, Llc Oleophilic foams for oil spill mitigation
KR102577001B1 (ko) * 2016-08-11 2023-09-12 삼성디스플레이 주식회사 플렉서블 기판, 플렉서블 기판의 제조방법, 및 플렉서블 기판을 포함하는 디스플레이 장치
US10364491B2 (en) 2016-11-02 2019-07-30 Georgia Tech Research Corporation Process to chemically modify polymeric materials by static, low-pressure infiltration of reactive gaseous molecules
LU93390B1 (en) * 2016-12-21 2018-07-24 Luxembourg Inst Science & Tech List Method for depositing alumina by atomic layer deposition

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