JP2021170104A - ホログラフィックセキュリティラベルの製造方法 - Google Patents
ホログラフィックセキュリティラベルの製造方法 Download PDFInfo
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- 239000010410 layer Substances 0.000 claims abstract description 53
- 239000011159 matrix material Substances 0.000 claims abstract description 51
- 238000000609 electron-beam lithography Methods 0.000 claims abstract description 28
- 238000010894 electron beam technology Methods 0.000 claims abstract description 24
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 17
- 229920006254 polymer film Polymers 0.000 claims abstract description 17
- 229910052782 aluminium Inorganic materials 0.000 claims description 26
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 26
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 21
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 18
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 18
- 239000000853 adhesive Substances 0.000 claims description 7
- 230000001070 adhesive effect Effects 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 238000000059 patterning Methods 0.000 claims description 7
- 238000013461 design Methods 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical group [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- 238000001771 vacuum deposition Methods 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 3
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- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
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- 229910001873 dinitrogen Inorganic materials 0.000 description 2
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- 239000004744 fabric Substances 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- NPURPEXKKDAKIH-UHFFFAOYSA-N iodoimino(oxo)methane Chemical compound IN=C=O NPURPEXKKDAKIH-UHFFFAOYSA-N 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- -1 polypropylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 238000007781 pre-processing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
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- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N 2-propanol Substances CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- QCDFBFJGMNKBDO-UHFFFAOYSA-N Clioquinol Chemical compound C1=CN=C2C(O)=C(I)C=C(Cl)C2=C1 QCDFBFJGMNKBDO-UHFFFAOYSA-N 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- 238000007774 anilox coating Methods 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
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- 238000000025 interference lithography Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
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- CIBMHJPPKCXONB-UHFFFAOYSA-N propane-2,2-diol Chemical compound CC(C)(O)O CIBMHJPPKCXONB-UHFFFAOYSA-N 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
- G03H1/0011—Adaptation of holography to specific applications for security or authentication
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
- B42D25/29—Securities; Bank notes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/328—Diffraction gratings; Holograms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
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- G—PHYSICS
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0276—Replicating a master hologram without interference recording
- G03H2001/0296—Formation of the master hologram
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/30—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
- G03H2001/303—Interleaved sub-holograms, e.g. three RGB sub-holograms having interleaved pixels for reconstructing coloured holobject
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- G—PHYSICS
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- G—PHYSICS
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Security & Cryptography (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Finance (AREA)
- Accounting & Taxation (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Business, Economics & Management (AREA)
- Holo Graphy (AREA)
- Credit Cards Or The Like (AREA)
Abstract
Description
[使用された略語]
PMMA‐ポリメタクリル酸メチル(Polymethylmethacrylate)
CGH‐コンピュータで生成されたホログラム(Computer Generated Hologram)
MIBK‐メチルイソブチルケトン(methylisobuthilketone)
IPA‐イソプロピルアルコール(isopropyl alcohol)
PET‐ポリエチレンテレフタレート(Polyethylene terephthalate)
Claims (3)
- ホログラフィックセキュリティラベルを製造するための方法であって、
試料上に、アートデザインの定義された領域におけるホログラムおよびアライメントマークのドットマトリックスレーザパターニングを行う段階と、
前記試料の裏側に前記アライメントマークを現像する段階と、
100nmから200nmの厚さを有する補助アルミニウムフィルムを真空堆積する段階と、
PMMAの単一の層をスピンコートする段階と、
走査型電子顕微鏡により、ドットマトリックス領域と電子ビームパターニング領域との間において、位置合わせおよび角度補正を正確に実行する段階と、
フォーカスされた電子ビームによりパターニングする段階と、
PMMAを現像する段階と、
Ce(NH4)2(NO3)6:HNO3を使用して前記補助アルミニウムフィルムをエッチングする段階と、
フォトレジストの露光(λ=405nm)を実行する段階と、
Ce(NH4)2(NO3)6:HNO3を使用して、前記補助アルミニウムフィルムのエッチングおよびPMMAのリフトオフを行う段階と、
前記フォトレジストを現像して、したがってドットマトリックスおよび電子ビームでパターニングされたホログラムの位置合わせ領域を製造する段階と、
銀フィルムを真空堆積する段階と、
電気化学的手段を使用してニッケルフィルムを堆積する段階と、
ロール・ツー・ロール複製のためのニッケルシムを製作する段階と、
多層の金属化されたまたは透明のポリマーフィルムにおいて前記ホログラムを複製する段階と、
感圧性、熱可塑性または熱硬化性の接着剤で前記ポリマーフィルムをコーティングして、前記ポリマーフィルムを個別ラベルに分割する段階と
を備える、方法。 - 前記ドットマトリックスレーザパターニングの設計および電子ビームパターニングの設計は、中間アルミニウム層を使用して1つの感光層において結合されており、前記ドットマトリックスレーザパターニングの領域および電子ビームパターニングの領域は、走査型電子顕微鏡を使用して正確に位置合わせされる、請求項1に記載の方法。
- 請求項1に記載の方法に従って取得されたホログラフィックセキュリティラベル。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20169233 | 2020-04-13 | ||
EP20169233.2A EP3896529A1 (en) | 2020-04-13 | 2020-04-13 | Fabrication method of holographic security label |
Publications (2)
Publication Number | Publication Date |
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JP2021170104A true JP2021170104A (ja) | 2021-10-28 |
JP7000647B2 JP7000647B2 (ja) | 2022-01-19 |
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JP2021006841A Active JP7000647B2 (ja) | 2020-04-13 | 2021-01-20 | ホログラフィックセキュリティラベルの製造方法 |
Country Status (3)
Country | Link |
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US (1) | US11846888B2 (ja) |
EP (1) | EP3896529A1 (ja) |
JP (1) | JP7000647B2 (ja) |
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2020
- 2020-04-13 EP EP20169233.2A patent/EP3896529A1/en active Pending
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2021
- 2021-01-20 JP JP2021006841A patent/JP7000647B2/ja active Active
- 2021-02-18 US US17/178,281 patent/US11846888B2/en active Active
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JP2012150272A (ja) * | 2011-01-19 | 2012-08-09 | Dainippon Printing Co Ltd | ホログラムラベル |
US20160187850A1 (en) * | 2014-12-31 | 2016-06-30 | Electronics And Telecommunications Research Institute | Data format for hologram, and apparatus and method for holographic video system |
CN105807348A (zh) * | 2016-05-23 | 2016-07-27 | 东南大学 | 一种反射型体全息光栅波导结构 |
US20180129166A1 (en) * | 2016-11-10 | 2018-05-10 | Samsung Electronics Co., Ltd. | Holographic display apparatus for providing expanded viewing window |
CN107167920A (zh) * | 2017-06-19 | 2017-09-15 | 东南大学 | 一种高亮度全息波导显示装置 |
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US11846888B2 (en) | 2023-12-19 |
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