JP2021142752A - Transfer film, electrode protective film of capacitance type input device, laminate and capacitance type input device - Google Patents

Abstract

To provide a transfer film having photolithography property, less in generation of air bubbles and less in transfer defect, an electrode protective film of a capacitance type input device, a laminate, the capacitance type input device and an image display device.SOLUTION: There is provided a transfer film having a temporary supporter, a curable resin layer, and a protective film in this order, with an oxygen permeability coefficient of the protective film of 100 cm3 25 μm/m2 24 hr. atm or more and a surface roughness Ra of a surface in the curable resin layer side of the protective film of 5 to 60 nm.SELECTED DRAWING: None

Description

The present invention relates to a transfer film, an electrode protective film of a capacitance type input device, a laminate, and a capacitance type input device.

In recent years, electronic devices such as mobile phones, car navigation systems, personal computers, ticket vending machines, and bank terminals are equipped with a liquid crystal display device having a touch panel type input device, and a finger or a touch pen or the like is used to display an image displayed on the liquid crystal display device. There are electronic devices that can be brought into contact with each other to input desired instructions.
Such an input device (touch panel) includes a resistive film type and a capacitance type.
The capacitance type input device has an advantage that a translucent conductive film may simply be formed on a single substrate. In such a capacitance type input device, for example, the electrode patterns are extended in the directions intersecting each other, and when a finger or the like comes into contact, the change in capacitance between the electrodes is detected to detect the input position. There are types (see, for example, Patent Documents 1 to 3).

Further, in Patent Document 4, in order to prevent the transparent electrode pattern of the capacitance type input device described in Patent Documents 1 to 3 from being visually recognized, the transparent substrate has a refractive index of 1.6 to 1.78. The region in which the first transparent film having a thickness of 55 to 110 nm, the transparent electrode pattern, and the second transparent film having a refractive index of 1.6 to 1.78 and having a thickness of 55 to 110 nm are laminated in this order is in-plane. The laminate contained in is disclosed.
Various methods are known as a method for forming a transparent film as described in Patent Document 4. Patent Document 4 describes a method of sputtering a metal oxide and a method of transferring a curable resin layer formed on a temporary support onto a substrate. In Patent Document 4, a transfer film is used to install a pressure-sensitive (press-type mechanical mechanism, not change in capacitance) switch on a part of the front plate (the surface that is in direct contact with a finger). When the curable resin layer is formed, the resist component does not leak or squeeze out from the opening, and the step of removing the leaked or squeezed out portion is omitted. It is stated that efficiency can be increased.

Patent Document 5 has a temporary support, a curable resin layer, and a second resin layer arranged adjacent to the curable resin layer in this order, and has a refractive index of the second resin layer. Disclosed is a transfer film in which is higher than the refractive index of the curable resin layer and the refractive index of the second resin layer is 1.6 or more.

Patent Document 6 describes a method of forming a resin pattern having good developability by using a photosensitive composition containing a resin having an acidic group in a side chain, a polymerizable compound, and a photopolymerization initiator. Have been described.

Japanese Unexamined Patent Publication No. 2010-86684 JP-A-2010-152809 Japanese Unexamined Patent Publication No. 2010-257492 Japanese Unexamined Patent Publication No. 2014-010814 Japanese Unexamined Patent Publication No. 2014-108541 Japanese Unexamined Patent Publication No. 2012-0785828

In Patent Document 5, a transfer film is formed by forming a curable resin layer on a temporary support, curing the curable resin layer by exposure, and then laminating a second resin layer by coating. There is.

Here, in a generally used capacitance type input device, a frame portion is provided around an image display area. Therefore, a transfer film is used to adjust the refractive index of the capacitance type input device (a layer for making the transparent electrode pattern difficult to see and improving the hiding property of the transparent electrode pattern) and a transparent protective layer (also called an overcoat layer). In the case of forming the transparent electrode pattern, the refractive index adjusting layer is laminated on the image display area to solve the problem that the transparent electrode pattern is visually recognized, and at the same time, the refractive index adjusting layer and the transparent protective layer are not laminated on the frame portion. As described above, it is required that it can be easily formed into a desired pattern shape. As a method of forming a desired pattern, a method of cutting the shape of the transfer film according to the shape of the frame portion of the capacitance type input device (die-cut method or half-cut method) can be considered. However, from the viewpoint of further increasing productivity, a photo can be developed into a desired pattern by using photolithography after transferring at least one of the refractive index adjusting layer and the transparent protective layer from the transfer film onto the transparent electrode pattern. It is desired to form a laminate having good lithographic properties (patternability using photolithography).

Under such circumstances, the inventors of the present invention produced a transfer film provided with a protective film without curing the curable resin layer for the purpose of imparting photolithography. However, when the protective film is peeled off from the obtained transfer film, a part of the uncured curable resin layer is transferred to the protective film, and transfer defects of the curable resin layer (a part of the curable resin layer is lost). There was a case where a problem occurred in which many defects) occurred. The curable resin layer that has not been cured has high adhesiveness, and the cause is that a part of the curable resin layer adheres to the protective film that should not be transferred.

As a result of diligent studies by the inventors of the present invention in order to solve the transfer defects of the curable resin layer, it was found that the transfer defects of the curable resin layer can be reduced by increasing the surface roughness Ra of the protective film. I arrived.
However, it has been found that the transfer film having an increased surface roughness Ra of the protective film has a problem that many bubbles are generated at the interface between the protective film and the curable resin layer.

That is, there has been no known transfer film that can be developed into a desired pattern by photolithography, has few bubbles, and has few transfer defects.

The present invention has been made in view of the current situation.
An object to be solved by the present invention is to provide a transfer film having photolithography property, less generation of bubbles, and less transfer defects.
The problem to be solved by the present invention is an electrode protective film of a capacitance type input device in which a temporary support is removed from a transfer film having photolithography, less generation of bubbles, and few transfer defects. It is an object of the present invention to provide a laminate having an electrode protective film of a capacitance type input device, an electrode protection film of the capacitance type input device, or a capacitance type input device including the laminate.

The inventors of the present invention have found that the above problems can be solved by combining an uncured curable resin layer with a protective film in which the surface roughness Ra and the oxygen permeability coefficient are controlled within a specific range. rice field.
The present invention, which is a specific means for solving the above problems, and preferred embodiments of the present invention are as follows.

[1] Temporary support and
A curable resin layer that is curable,
Protective film and
In this order,
Oxygen permeability coefficient of the protective film is not less ^{100cm 3 · 25μm / m 2 ·} 24 hr · atm or more,
A transfer film having a surface roughness Ra of 5 to 60 nm on the surface of the protective film on the curable resin layer side.
Transfer film according to [2] the oxygen permeability coefficient of the protective film is not more than ^{5000cm 3 · 25μm / m 2 ·} 24 hr · atm [1].
[3] The transfer film according to [1] or [2], wherein the protective film has a thickness of 10 to 75 μm.
[4] The transfer film according to any one of [1] to [3], wherein the protective film contains polyethylene terephthalate or polypropylene.
[5] A second resin layer is provided between the protective film and the curable resin layer.
The transfer according to any one of [1] to [4], wherein the second resin layer contains particles having a refractive index of 1.50 or more in an amount of 60 to 90% by mass based on the total solid content of the second resin layer. the film.
[6] The transfer film according to [5], which satisfies the following formula 1;
Equation 1: n ₁ <n ₂
n ₁ represents the refractive index of the curable resin layer, and n ₂ represents the refractive index of the second resin layer.
[7] The transfer film according to any one of [5] and [6], wherein the second resin layer is curable.
[8] The transfer film according to any one of [5] to [7], wherein the particles having a refractive index of 1.50 or more are zirconium oxide particles or titanium oxide particles.
[9] The transfer film according to any one of [5] to [8], wherein the curable resin layer and the second resin layer are in direct contact with each other.
[10] The transfer film according to any one of [5] to [9], wherein the curable resin layer and the second resin layer are alkali-soluble.
[11] The curable resin layer contains a polymerizable compound and a binder polymer, and contains
The transfer film according to any one of [1] to [10], wherein the binder polymer is an alkali-soluble resin.
[12] The transfer film according to any one of [1] to [11], which has a roll shape.
[13] The electrode protective film of the capacitance type input device from which the protective film has been removed from the transfer film according to any one of [1] to [12].
[14] A substrate including electrodes of a capacitance type input device and
A laminate having the electrode protective film of the capacitance type input device according to [13].
[15] A capacitance type input device having the electrode protective film of the capacitance type input device according to [13] or the laminate according to [14].

According to the present invention, it is possible to provide a transfer film having photolithography property, less generation of bubbles, and less transfer defects. Further, according to the present invention, it is possible to provide an electrode protective film, a laminate, a capacitance type input device and an image display device of a capacitance type input device.

It is sectional drawing which shows an example of the structure of the capacitance type input device of this invention. It is sectional drawing which shows another example of the structure of the capacitance type input device of this invention. It is explanatory drawing which shows an example of the front surface plate in this invention. It is explanatory drawing which shows an example of the relationship between a transparent electrode pattern and a non-pattern region in this invention. It is a top view which shows an example of the front plate which formed the opening. It is a top view which shows an example of the front plate on which a mask layer was formed. It is a top view which shows an example of the front plate on which the first transparent electrode pattern was formed. It is a top view which shows an example of the front plate which formed the 1st and 2nd transparent electrode patterns. It is a top view which shows an example of the front plate which formed the conductive element different from the 1st and 2nd transparent electrode patterns. It is the schematic which shows an example of the desired pattern in which the curable resin layer and the second resin layer were cured. It is explanatory drawing which shows an example of the taper shape of the end part of a transparent electrode pattern. It is sectional drawing which shows an example of the structure of the laminated body of this invention. It is sectional drawing which shows an example of the structure of the transfer film of this invention. It is a top view which shows another example of the structure of the capacitance type input device of this invention, and shows the aspect which includes the terminal part (end part) of the routing wiring which is pattern-exposed and is not covered with a curable resin layer. .. An outline showing an example of a state before the transfer film of the present invention having a curable resin layer and a second resin layer is laminated on a transparent electrode pattern of a capacitance type input device by lamination and cured by exposure or the like. It is a figure.

Hereinafter, the transfer film of the present invention, the electrode protective film of the capacitance type input device, the laminate, and the capacitance type input device will be described. The description of the constituent elements described below may be based on typical embodiments and specific examples of the present invention, but the present invention is not limited to such embodiments and specific examples. The numerical range represented by using "~" in the present specification means a range including the numerical values before and after "~" as the lower limit value and the upper limit value.

[Transfer film]
The transfer film of the present invention has a temporary support and
A curable resin layer that is curable,
Protective film and
In this order,
Oxygen permeability coefficient of the protective film is not less ^{100cm 3 · 25μm / m 2 ·} 24 hr · atm or more,
The surface roughness Ra of the surface of the protective film on the curable resin layer side is 5 to 60 nm.
With such a configuration, it is possible to provide a transfer film having photolithography property, less generation of bubbles, and less transfer defects.
By using the curable resin layer, which is curable, the curable resin layer can be transferred from the transfer film and then developed into a desired pattern by photolithography.
The oxygen permeability coefficient of the protective film through the protective film by a ^{100cm 3 · 25μm / m 2 ·} 24 hr · atm or higher, the bubbles are discharged to the outside of the transfer film. Further, by setting the surface roughness Ra of the surface of the protective film on the curable resin layer side to 60 nm or less, the amount of gas mixed when the protective film is laminated on the surface of the curable resin layer can be reduced, and bubbles can be reduced. Can be reduced.
By setting the surface roughness Ra of the protective film to 5 nm or more, the adhesion between the protective film and the curable resin layer can be lowered, and transfer defects can be reduced.
Herein, that the layer has a curing property, using a Fourier transform infrared spectrophotometer to measure the wavelength region of ^{400cm -1 ~4000cm} -1 of the resin layer, C = C bond from the 810 cm ^-1 It can be detected by measuring the peak intensity of. Than the peak intensity of 810 cm ^-1 of C = C bonds from the layer, further curing step (exposure and heating at least one) a peak of C = C bond from the 810 cm ^-1 in the layer after the layer When the strength is low, it can be detected that it has curability. A layer that has not been completely cured (for example, a semi-cured layer) may have curability.
The curability of the layer is preferably determined from the double bond consumption rate of the layer.
The curable resin layer that is curable is preferably a curable resin layer having a double bond consumption rate of less than 10%. In the state of the transfer film, the curable resin layer does not have to be cured, and in that case, the double bond consumption rate of the curable resin layer is 0%. Further, in the state of the transfer film, the curable resin layer may be cured in a range where the double bond consumption rate is less than 10%, in which case the double bond consumption rate of the curable resin layer exceeds 0%. It will be less than 10%. From the viewpoint of imparting photolithography, the double bond consumption rate of the curable resin layer is more preferably 0%.
On the other hand, in the transfer film of the present invention, the curability of the curable resin layer (preferably the double bond consumption rate is less than 10%) is satisfied before the exposure for photolithography is performed. good. When photolithography is performed using the transfer film of the present invention, a curable resin layer having a curable property (preferably a double bond consumption rate of less than 10%) is exposed to expose the double bond consumption rate of the curable resin layer. May be 10% or more. For example, in the transfer film of the present invention, a curable resin layer (and, if necessary, a second resin layer) is photolithographically processed into a desired pattern in a desired pattern before being transferred to a transfer target to obtain a double bond consumption rate. After making it 10% or more, the curable resin layer (and, if necessary, the second resin layer) may be transferred to the transferee. Further, in the transfer film of the present invention, after the curable resin layer (and the second resin layer if necessary) is transferred to the transferred body, the curable resin layer (and the second resin layer if necessary) is transferred to a desired pattern. The resin layer) may be processed by photolithography to increase the double bond consumption rate to 10% or more.
Hereinafter, preferred embodiments of the transfer film of the present invention will be described.

<Composition of transfer film>
The transfer film of the present invention has a temporary support, a curable resin layer, and a protective film in this order. The temporary support and the curable resin layer may be arranged in direct contact with each other, or may be arranged via another layer. Examples of the other layer include a second resin layer, a thermoplastic resin layer and an intermediate layer, which will be described later. It is preferable that the temporary support and the curable resin layer are arranged in direct contact with each other.
FIG. 12 shows an example of a preferable layer structure of the transfer film of the present invention. FIG. 12 is a schematic view of the transfer film 30 of the present invention in which the temporary support 26, the curable resin layer 7, the second resin layer 12, and the protective film 29 are laminated in this order in direct contact with each other.
In the transfer film of the present invention, it is preferable that the curable resin layer and the second resin layer are in direct contact with each other from the viewpoint of ease of production.
In the transfer film of the present invention, it is preferable that the second resin layer and the protective film are in direct contact with each other from the viewpoint of reducing transfer defects.

The transfer film of the present invention preferably has a roll shape. Here, when the transfer film is formed into a roll shape, dent defects due to foreign matter are propagated, and dent defects tend to increase. In a preferred embodiment of the transfer film of the present invention, dent defects can be reduced. Therefore, even if the transfer film is rolled, dent defects can be reduced.

<Protective film>
The transfer film of the present invention has a protective film and
Oxygen permeability coefficient of the protective film is not less ^{100cm 3 · 25μm / m 2 ·} 24 hr · atm or more,
The surface roughness Ra of the surface of the protective film on the curable resin layer side is 5 to 60 nm.

(Oxygen permeability coefficient)
In the present invention, the oxygen permeability coefficient of the protective film is ^{100cm 3 · 25μm / m 2 ·} 24 hr · atm or higher.
Oxygen permeability coefficient of the protective film is preferably ^{100~5000cm 3 · 25μm / m 2 ·} 24 hr · atm, particularly preferably ^{200~4500cm 3 · 25μm / m 2 ·} 24 hr · atm, 500~4000cm ³ · 25μm / m ² · 24 hr · atm is more preferred. By setting the oxygen permeability of the protective film to be equal to or higher than the lower limit of the preferable range, the generation of bubbles can be reduced. From the viewpoint of obtaining the effect of reducing the generation of bubbles, there is no limitation on the upper limit of the oxygen permeability of the protective film. By setting the oxygen permeability of the protective film to be equal to or lower than the upper limit of the preferable range, the strength of the protective film can be maintained and the dent defects described later can be reduced.
The oxygen permeability coefficient of the protective film is measured by the method described later. The oxygen permeability coefficient of the protective film is the same value even when the protective film is peeled off from the state of the transfer film and measured, as in the case of the protective film alone before production.

(Surface roughness Ra)
In the present invention, the surface roughness Ra of the surface of the protective film on the curable resin layer side is 5 to 60 nm, preferably 10 nm to 50 nm, and more preferably 15 to 45 nm.
Surface roughness Ra means arithmetic mean roughness.
The surface roughness Ra of the protective film is measured by the method described later. The surface roughness Ra of the protective film is the same value as in the case of the protective film alone before production, even when the protective film is peeled off from the state of the transfer film and measured.

(Thickness)
In the present invention, the thickness of the protective film is preferably 10 to 75 μm, more preferably 20 to 65 μm, and particularly preferably 25 to 35 μm.
Here, a curable resin layer (preferably having a double bond consumption rate of less than 10%) is formed (or a second resin layer is further formed on the film), and then a protective film is formed. When the transfer film obtained by laminating the above layers is wound into a roll, the curable resin layer (and / or the second resin layer) is dented, and dent defects are likely to occur. When dust generated in the manufacturing process is wound on the protective film, the winding pressure causes imprints through the dust, causing the curable resin layer (and / or the second resin layer) to collapse. Presumed. It is preferable to reduce the number of dent defects in order to suppress distortion of the image on the image display device. The curable (preferably less than 10% double bond consumption) curable resin layer (and / or the curable (preferably less than 10% double bond consumption) second resin layer) is soft. Dent defects are likely to occur.
It is preferable that the thickness of the protective film is 10 μm or more from the viewpoint of reducing dent defects (defects in which the curable resin layer and / or the second resin layer is dented).
It is preferable that the thickness of the protective film is 25 to 35 μm from the viewpoint that bubbles, transfer defects and dent defects can be reduced.

(resin)
The resin of the protective film is not particularly limited. At least one of the oxygen permeability and the surface roughness of the protective film can be controlled by the type of resin. Examples of the resin of the protective film include polyester (preferably polyethylene terephthalate), polyolefin (preferably polypropylene), polyvinyl chloride, polycarbonate and the like.
In the present invention, the protective film preferably contains polyethylene terephthalate or polypropylene, and more preferably the protective film contains polypropylene.

In particular, conventionally, polyester (preferably polyethylene terephthalate) films and polyolefin (preferably polypropylene) films having a surface roughness Ra in the above-mentioned preferable range have not been widely used as protective films for transfer films.
In the present invention, it is preferable to use a polyester film and a polyolefin film having a surface roughness Ra in the above-mentioned preferable range. Examples of the method for controlling the surface roughness Ra of the polyester film and the polyolefin film include a method of controlling the degree of orientation of the protective film, a method of controlling the density, and a method of smoothing or roughening. In particular, the polyolefin (preferably polypropylene) film has conventionally had a large surface roughness Ra. In the present invention, the surface roughness Ra of the polyolefin (preferably polypropylene) film is reduced by controlling the stretching conditions and the cooling conditions after stretching to control the crystal state, and is controlled within the above-mentioned preferable range. Is preferable.
As a method of controlling the oxygen permeability of the protective film, a method of controlling the degree of orientation of the protective film, controlling the density, smoothing treatment or roughening treatment can be mentioned.

As the protective film, among the protective films described in paragraphs 0083 to 0087 and 093 of JP-A-2006-259138, those having oxygen permeability and surface roughness within the above ranges can be appropriately used.

As the protective film, a commercially available protective film may be used. Examples of commercially available protective films include Alfan E201F, Alfan FG201 (above, polypropylene film manufactured by Oji F-Tex Co., Ltd.), NF-15 (manufactured by Tamapoli Co., Ltd.), and the like.

<Temporary support>
The transfer film of the present invention has a temporary support.
The temporary support used for the transfer film is not particularly limited.

(Thickness)
The thickness of the temporary support is not particularly limited and is generally in the range of 5 to 200 μm, and is particularly preferably in the range of 10 to 150 μm in terms of ease of handling and versatility.

(Material)
The temporary support is preferably a film, more preferably a resin film.
As the film used as the temporary support, a material having flexibility and not causing significant deformation, shrinkage or elongation under pressure or under pressure and heating can be used. Examples of such a temporary support include polyethylene terephthalate film, cellulose triacetate film, polystyrene film, polycarbonate film and the like, and among them, biaxially stretched polyethylene terephthalate film is particularly preferable.

Further, the temporary support may be transparent, or may contain silicon dyed, alumina sol, chromium salt, zirconium salt and the like.
Further, the temporary support can be imparted with conductivity by the method described in Japanese Patent Application Laid-Open No. 2005-221726.

<Curable resin layer>
(Double bond consumption rate of curable resin layer)
The transfer film of the present invention has a curable resin layer.
The double bond consumption rate of the curable resin layer is preferably less than 10%, more preferably 0%. The double bond consumption rate of the curable resin layer is determined by the method described in Examples described later.

The curable resin layer may be thermosetting, photocurable, thermosetting and photocurable. It is preferable that the curable resin layer is at least thermosetting from the viewpoint that it can be thermosetting after transfer to impart the reliability of the film. It is more preferable that the curable resin layer is thermosetting and photocurable from the viewpoint that it can be easily photocured after transfer to form a film and can be heat-cured after film formation to impart the reliability of the film.

The cured layer obtained by curing the curable resin layer may lose its curability (thermosetting or photocurable). In the present specification, for convenience of explanation, the cured layer that has lost its curability is also referred to as a curable resin layer.

(Refractive index)
The refractive index n ₁ of the curable resin layer is preferably 1.45 ≦ n ₁ ≦ 1.59, _{more preferably 1.5 ≦ n 1} ≦ 1.53, and 1.5 ≦ n ₁ It is particularly preferable that ≦ 1.52, and more particularly preferably _{1.51 ≦ n 1 ≦ 1.52.}

There is no particular limitation as a method for controlling the refractive index of the curable resin layer. For example, a curable resin layer having a desired refractive index can be used alone, a curable resin layer to which particles such as metal oxide particles, metal particles, and metal oxide particles are added can be used, or a metal salt and a polymer can be used. Complexes can be used.

(Thickness)
The thickness of the curable resin layer is preferably 1 to 20 μm, more preferably 2 to 15 μm, and particularly preferably 3 to 12 μm. The curable resin layer is preferably used for the image display portion of the capacitance type input device, and in that case, high transparency and high transmittance are important. When the thickness of the curable resin layer is sufficiently thin, the decrease in transmittance due to the absorption of the curable resin layer is less likely to occur, and the short waves are less likely to be absorbed, so that yellow coloring is less likely to occur.
In the present specification, T ₁ represents the average thickness of the curable resin layer. In the present specification, the term "thickness of the curable resin layer" means " _{average thickness T 1 of the curable resin layer" without particular notice.}

(Alkali soluble)
In the transfer film of the present invention, it is preferable that the curable resin layer is alkali-soluble. The fact that the resin layer is alkali-soluble means that it is dissolved by a weak alkaline aqueous solution. It is more preferable that the curable resin layer can be developed with a weak alkaline aqueous solution.

(composition)
The curable resin layer of the transfer film may be a negative type material or a positive type material. It is preferable that the curable resin layer of the transfer film is a negative type material.
When the curable resin layer of the transfer film is a negative type material, the curable resin layer preferably contains a binder polymer, a polymerizable compound, a polymerization initiator, and a compound that can react with an acid by heating. Further, the curable resin layer may contain metal oxide particles. Further, the curable resin layer may contain additives.

-Binder polymer-
In the transfer film of the present invention, it is preferable that the curable resin layer contains a binder polymer.
The binder polymer of the curable resin layer is not particularly limited. In the transfer film of the present invention, it is preferable that the binder polymer of the curable resin layer is an alkali-soluble resin.
The alkali-soluble resin is not particularly limited. The alkali-soluble resin is preferably a carboxyl group-containing resin. When the curable resin layer contains a carboxyl group-containing resin, the curable resin layer preferably further contains a compound (preferably blocked isocyanate) that can react with an acid by heating. When the curable resin layer contains a carboxyl group-containing resin and a compound that can react with an acid by heating (preferably blocked isocyanate), thermal cross-linking increases the three-dimensional cross-linking density of the curable resin layer and carboxyl groups. The carboxyl group of the contained resin can be made anhydrous and made hydrophobic. By making the curable resin layer hydrophobic, the wet and heat resistance of the curable resin layer can be enhanced.
The details of the compound that can react with the acid by heating will be described later.

The binder polymer contained in the curable resin layer preferably contains an acrylic resin. Here, it is preferable that the second resin layer described later contains a resin having an acid group. The binder polymer contained in the curable resin layer and the resin having an acid group contained in the second resin layer both contain an acrylic resin, so that the interlayer adhesion between the curable resin layer and the second resin layer It is more preferable from the viewpoint of enhancing.

The binder polymer contained in the curable resin layer is particularly preferably a binder polymer that is a carboxyl group-containing resin and is an acrylic resin.

The curable resin layer may contain a binder polymer other than the carboxyl group-containing resin. As the other binder polymer, any polymer component can be used without particular limitation. As the other binder polymer, a binder polymer having high surface hardness and heat resistance is preferable from the viewpoint of using it as a transparent protective layer of a capacitance type input device.
The other binder polymer is more preferably an alkali-soluble resin.
Examples of other binder polymers include photosensitive siloxane resin materials known as alkali-soluble resins.

The binder polymer used for the curable resin layer is not particularly limited as long as it does not contradict the gist of the present invention, and can be appropriately selected from known ones. It is preferable to use the polymer described in paragraphs 0033 to 0052 of Japanese Patent Application Laid-Open No. 2010-237589. Moreover, the following compound A is mentioned as a preferable example of the binder polymer which is a carboxyl group-containing resin and is an acrylic resin.

The acid value of the binder polymer is preferably 60 to 200 mgKOH / g, more preferably 60 to 150 mgKOH / g, and particularly preferably 60 to 110 mgKOH / g.
For the acid value of the binder polymer, the value of the theoretical acid value calculated by the calculation method described in the following documents and the like is used. Japanese Unexamined Patent Publication No. 2004-149806 [0063] and Japanese Unexamined Patent Publication No. 2012-21128 [0070].

The curable resin layer may contain a polymer latex as a binder polymer. The polymer latex referred to here is water-insoluble polymer particles dispersed in water. Polymer latex is described in, for example, "Chemistry of Polymer Latex (Published by Polymer Publishing Association (1973))" by Soichi Muroi.
Polymer particles that can be used include acrylic-based, vinyl acetate-based, rubber-based (for example, styrene-butadiene-based, chloroprene-based), olefin-based, polyester-based, polyurethane-based, and polystyrene-based polymers, and polymers composed of copolymers thereof. Particles are preferred.
It is preferable to strengthen the bonding force between the polymer chains constituting the polymer particles. As a means for strengthening the bonding force between the polymer chains, there are a method of utilizing the interaction generated by a hydrogen bond and a method of forming a covalent bond.

As a means for imparting the interaction generated by hydrogen bonding, it is preferable to introduce a monomer having a polar group in the polymer chain by copolymerization or graft polymerization.
The polar groups of the binder polymer include carboxyl groups (contained in acrylic acid, methacrylic acid, itaconic acid, fumaric acid, maleic acid, crotonic acid, partially esterified maleic acid, etc.), primary, secondary and tertiary amino groups. , Ammonium base, sulfonic acid group (styrene sulfonic acid group, etc.) and the like. The binder polymer preferably has at least a carboxyl group.
The preferred range of the copolymerization ratio of the monomers having these polar groups is 5 to 50% by mass, more preferably 5 to 40% by mass, and further preferably 20 to 30% by mass with respect to 100% by mass of the polymer. be.

Means for forming a covalent bond include hydroxyl groups, carboxyl groups, primary and secondary amino groups, acetoacetyl groups, sulfonic acid groups, epoxy compounds, blocked isocyanates, isocyanates, vinyl sulfone compounds, aldehyde compounds, methylol compounds, and carboxylic acids. Examples thereof include a method of reacting an acid anhydride or the like.

The polymer latex that can be used in the present invention may be obtained by emulsion polymerization or may be obtained by emulsification. The method for preparing these polymer latex is described in, for example, "Emulsion Latex Handbook" (edited by the Emulsion Latex Handbook Editorial Committee, published by Taiseisha Co., Ltd. (1975)).
Examples of the polymer latex that can be used in the present invention include an aqueous dispersion of polyethylene ionomer (trade name: Chemipearl S120, manufactured by Mitsui Chemicals, Inc., solid content 27%) (trade name: Chemipearl S100, manufactured by Mitsui Chemicals, Inc.). . Solid content 27%) (Product name: Chemipearl S111 Mitsui Chemicals Co., Ltd. Solid content 27%) (Product name: Chemipearl S200 Mitsui Chemicals Co., Ltd. Solid content 27%) (Product name: Chemipearl S300 Mitsui Chemicals Co., Ltd.) Made by Co., Ltd. Solid content 35%) (Product name: Chemipal S650 Mitsui Chemicals Co., Ltd. Solid content 27%) (Product name: Chemipearl S75N Mitsui Chemicals Co., Ltd. Solid content 24%) and polyether Aqueous dispersion of polyethylene (trade name: Hydran WLS-201 DIC Co., Ltd. Solid content 35%, Tg-50 ° C, Tg is Glass Latex Polymer; abbreviation for glass transition temperature) (trade name: Hydran WLS-202) DIC Co., Ltd. Solid content 35%, Tg-50 ° C) (Product name: Hydran WLS-221 DIC Co., Ltd. Solid content 35%, Tg-30 ° C) (Product name: Hydran WLS-210 DIC (Product name: Hydran WLS-210 DIC) Made by Co., Ltd. Solid content 35%, Tg-15 ° C) (Product name: Hydran WLS-213 DIC Co., Ltd. Solid content 35%, Tg-15 ° C) (Product name: Hydran WLI-602 DIC Co., Ltd. Manufactured by. Solid content 39.5%, Tg-50 ° C) (Product name: Hydran WLI-611 DIC Co., Ltd. Solid content 39.5%, Tg-15 ° C), Alkyl copolymer ammonium acrylate (Product name: Julimer AT-210 manufactured by Nippon Pure Chemicals, alkyl copolymer ammonium acrylate (trade name: Julimer ET-410 manufactured by Nippon Pure Chemicals), alkyl copolymer ammonium acrylate (trade name: Julimer AT-510 manufactured by Nippon Pure Chemicals), polyacrylic An acid (trade name: Julimer AC-10L manufactured by Nippon Pure Chemicals Co., Ltd.) is neutralized with ammonia and emulsified.

The weight average molecular weight of the binder polymer is preferably 10,000 or more, more preferably 20,000 to 100,000.

-Polymerizable compound-
In the transfer film of the present invention, the curable resin layer preferably contains a polymerizable compound, more preferably contains a polymerizable compound having an ethylenically unsaturated group, and a photopolymerizable compound having an ethylenically unsaturated group. Is particularly preferable. The polymerizable compound preferably has at least one ethylenically unsaturated group as the polymerizable group. The polymerizable compound may have an epoxy group or the like in addition to the ethylenically unsaturated group. It is more preferable that the polymerizable compound of the curable resin layer contains a compound having a (meth) acryloyl group.
As the polymerizable compound, only one kind may be used alone, or two or more kinds may be used in combination.

The polymerizable compound preferably contains a bifunctional polymerizable compound, more preferably contains a compound having two ethylenically unsaturated groups, and particularly preferably contains a compound having two (meth) acryloyl groups. ..
The polymerizable compound having a bifunctional ethylenically unsaturated group is not particularly limited as long as it is a compound having two ethylenically unsaturated groups in the molecule, and a commercially available (meth) acrylate compound can be used. For example, tricyclodecanedimethanol diacrylate (A-DCP manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), tricyclodecanedimenanol dimethacrylate (manufactured by DCP Shin-Nakamura Chemical Industry Co., Ltd.), 1,9-nonanediol di. Acrylate (A-NOD-N manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), 1,6-hexanediol diacrylate (A-HD-N manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) and the like can be preferably used.
The content of the bifunctional polymerizable compound is preferably in the range of 20 to 90% by mass, preferably in the range of 30 to 80% by mass, based on all the polymerizable compounds contained in the curable resin layer. It is more preferably in the range of 35 to 75% by mass, and particularly preferably in the range of 35 to 75% by mass.

It is preferable that at least one of the polymerizable compounds contains a carboxyl group because the carboxyl group of the binder polymer and the carboxyl group of the polymerizable compound can form a carboxylic acid anhydride in the curable resin layer.
The polymerizable compound containing a carboxyl group is not particularly limited, and a commercially available compound can be used. For example, Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), Aronix M-520 (manufactured by Toagosei Co., Ltd.), Aronix M-510 (manufactured by Toagosei Co., Ltd.) and the like can be preferably used.
The content of the polymerizable compound containing a carboxyl group is preferably in the range of 1 to 50% by mass, preferably in the range of 1 to 30% by mass, based on all the polymerizable compounds contained in the curable resin layer. It is more preferable, and it is particularly preferable that it is in the range of 5 to 15% by mass.

The polymerizable compound preferably contains a urethane (meth) acrylate compound.
The number of functional groups of the polymerizable group, that is, the number of (meth) acryloyl groups in the urethane (meth) acrylate compound is preferably trifunctional or higher, and more preferably tetrafunctional or higher.
The urethane (meth) acrylate compound is not particularly limited, and a commercially available compound can be used. For example, 8UX-015A (manufactured by Taisei Fine Chemical Co., Ltd.) and the like can be preferably used.
The content of the urethane (meth) acrylate compound is preferably 10% by mass or more, more preferably 20% by mass or more, based on all the polymerizable compounds contained in the curable resin layer.

The polymerizable compound may contain a trifunctional or higher functional polymerizable compound.
The photopolymerizable compound having a trifunctional or higher functional ethylenically unsaturated group is not particularly limited as long as it is a compound having three or more ethylenically unsaturated groups in the molecule. For example, skeleton (meth) of skeletons such as dipentaerythritol (tri / tetra / penta / hexa) acrylate, pentaerythritol (tri / tetra) acrylate, trimethylolpropane triacrylate, dimethylolpropane tetraacrylate, isocyanuric acid acrylate, and glycerin triacrylate. ) Acrylate compounds can be used, and those having a long span length between (meth) acrylates are preferable. Specifically, the above-mentioned dipentaerythritol (tri / tetra / penta / hexa) acrylate, pentaerythritol (tri / tetra) acrylate, trimethylol propanetriacrylate, ditrimethylol propanetetraacrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) AD-TMP, etc.), caprolactone-modified compounds of skeletal (meth) acrylate compounds such as isocyanuric acid acrylate (KAYARAD DPCA manufactured by Nippon Kayaku, A-9300-1CL manufactured by Shin-Nakamura Chemical Industry, etc.), alkylene oxide-modified compounds (Japan) KAYARAD RP-1040 manufactured by Yakuhin, ATM-35E, A-9300 manufactured by Shin-Nakamura Chemical Industry Co., Ltd., EBECRYL 135 manufactured by Daicel Ornex, etc.), Glycerin triacrylate ethoxylated (A-GLY-9E manufactured by Shin-Nakamura Chemical Industry Co., Ltd., etc.) Etc. can be preferably used. Further, it is preferable to use urethane (meth) acrylate having trifunctionality or higher. Examples of trifunctional or higher functional urethane (meth) acrylates include 8UX-015A (manufactured by Taisei Fine Chemical Co., Ltd.), UA-32P (manufactured by Shin-Nakamura Chemical Co., Ltd.), and UA-1100H (manufactured by Shin-Nakamura Chemical Co., Ltd.). ) And the like can be preferably used.
The content of the trifunctional or higher-functional polymerizable compound is preferably in the range of 3 to 50% by mass, preferably in the range of 5 to 30% by mass, based on all the polymerizable compounds contained in the curable resin layer. Is more preferable, and the range is particularly preferably in the range of 7 to 20% by mass.

The polymerizable compound used for the curable resin layer preferably has a weight average molecular weight of 200 to 3000, more preferably 250 to 2600, and particularly preferably 280 to 2200.
In the transfer film, the molecular weight of the polymerizable compound, which is the smallest of all the polymerizable compounds contained in the curable resin layer, is preferably 250 or more, more preferably 280 or more, and 300 or more. It is particularly preferable to have.
In the transfer film, the curable resin layer contains a polymerizable compound, and the ratio of the content of the polymerizable compound having a molecular weight of 300 or less to the content of all the polymerizable compounds contained in the curable resin layer is 30% or less. It is preferably 25% or less, and particularly preferably 20% or less.

-Polymerization initiator-
In the transfer film of the present invention, the curable resin layer preferably contains a polymerization initiator, and more preferably contains a photopolymerization initiator. By including the polymerizable compound and the polymerization initiator in the curable resin layer, the pattern of the curable resin layer can be easily formed.
The polymerization initiator used for the curable resin layer is not particularly limited. As the polymerization initiator used for the curable resin layer, for example, the photopolymerization initiator described in paragraphs 0031 to 0042 of JP-A-2011-95716 can be used. For example, 1,2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)] (trade name: IRGACURE OXE-01, manufactured by BASF), ethanone, 1- [9- Ethyl-6- (2-methylbenzoyl) -9H-carbazole-3-yl]-, 1- (O-acetyloxime) (trade name: IRGACURE OXE-02, manufactured by BASF), 2- (dimethylamino) -2 -[(4-Methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone (trade name: IRGACURE 379EG, manufactured by BASF), 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one (trade name: IRGACURE 907, manufactured by BASF), 2-hydroxy-1- {4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] phenyl}- 2-Methyl-Propane-1-one (trade name: IRGACURE 127, manufactured by BASF), 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 (trade name: IRGACURE 369, BASF) , 2-Hydroxy-2-methyl-1-phenyl-propane-1-one (trade name: IRGACURE 1173, manufactured by BASF), 1-hydroxy-cyclohexyl-phenyl-ketone (trade name: IRGACURE 184, manufactured by BASF) , 2,2-Dimethoxy-1,2-diphenylethane-1-one (trade name: IRGACURE 651, manufactured by BASF), oxime ester-based (trade name: Lunar 6, manufactured by DKSH Japan Co., Ltd.), etc. are preferably used. Can be done.
The polymerization initiator is preferably contained in an amount of 1% by mass or more, more preferably 2% by mass or more, based on the curable resin layer. The above-mentioned polymerization initiator is preferably contained in an amount of 10% by mass or less, more preferably 5% by mass or less, based on the curable resin layer, from the viewpoint of improving the patterning property.

-Compounds that can react with acids when heated-
In the transfer film of the present invention, it is preferable that the curable resin layer contains a compound that can react with an acid by heating.

The compound capable of reacting with an acid by heating is not particularly limited as long as it does not contradict the gist of the present invention. The compound capable of reacting with the acid by heating is preferably a compound having a higher reactivity with the acid after heating at more than 25 ° C. as compared with the reactivity with the acid at 25 ° C. A compound that can react with an acid by heating is a compound that has a group that can react with an acid that is temporarily inactivated by the blocking agent, and the group derived from the blocking agent dissociates at a predetermined dissociation temperature. preferable.
Examples of the compound capable of reacting with an acid by heating include a carboxylic acid compound, an alcohol compound, an amine compound, a blocked isocyanate (also referred to as a blocked isocyanate), and an epoxy compound, and a blocked isocyanate is preferable. ..

The compound which has a hydrophilic group in the molecule and can react with the acid by heating is not particularly limited, and a known compound can be used. The method for preparing a compound that has a hydrophilic group in the molecule and can react with an acid by heating is not particularly limited, but can be prepared, for example, by synthesis.
As the compound having a hydrophilic group in the molecule and capable of reacting with an acid by heating, a blocked isocyanate having a hydrophilic group in the molecule is preferable. Details of compounds that have a hydrophilic group in the molecule and can react with an acid by heating will be described later in the description of blocked isocyanate.

Blocked isocyanate means "a compound having a structure in which the isocyanate group of isocyanate is protected (masked) with a blocking agent".

The initial Tg of the blocked isocyanate is preferably −40 ° C. to 10 ° C., more preferably −30 ° C. to 0 ° C.

The dissociation temperature of the blocked isocyanate is preferably 100 ° C. to 160 ° C., more preferably 130 to 150 ° C.
The dissociation temperature of blocked isocyanate in the present specification is associated with the deprotection reaction of blocked isocyanate when measured by DSC (Differential scanning calorimetry) analysis with a differential scanning calorimeter (DSC6200, manufactured by Seiko Instruments Co., Ltd.). It refers to the temperature of the endothermic peak.

Examples of the blocking agent having a dissociation temperature of 100 ° C. to 160 ° C. or lower include pyrazole compounds (3,5-dimethylpyrazole, 3-methylpyrazole, 4-bromo-3,5-dimethylpyrazole, 4-nitro-3,5-dimethyl). Pyrazole, etc.), active methylene compounds (malonic acid diesters (dimethyl malonate, diethyl malonate, din-butyl malate, di2-ethylhexyl malonate, etc.), etc.), triazole compounds (1,2,4-triazole, etc.) ), Oxime-based compounds (compounds having a structure represented by -C (= N-OH)-in the molecule such as formaldehyde, acetaldoxime, acetoxime, methylethylketooxime, cyclohexanoneoxime) and the like. Of these, oxime-based and pyrazole-based compounds are preferable, and oxime-based compounds are particularly preferable, from the viewpoint of storage stability.

It is preferable that the blocked isocyanate has an isocyanurate structure from the viewpoint of film brittleness and substrate adhesion. The blocked isocyanate having an isocyanurate structure can be prepared, for example, by converting hexamethylene diisocyanate into isocyanurate.
Among the blocked isocyanates having an isocyanurate structure, a compound having an oxime structure using an oxime compound as a blocking agent is easier to set the dissociation temperature in a preferable range than a compound having no oxime structure, and has less development residue. It is preferable from the viewpoint of easy operation.

The number of blocked isocyanate groups per molecule of the blocked isocyanate is preferably 1 to 10, more preferably 2 to 6, and particularly preferably 3 to 4.

As the blocked isocyanate, the blocked isocyanate compounds described in JP-A-2006-208824, 0074 to 0085, may be used, and the contents of this publication are incorporated in the present specification.
Specific examples of the blocked isocyanate used in the transfer film include the following compounds. However, the blocked isocyanate used in the present invention is not limited to the following specific examples.

Examples of the blocked isocyanate used in the transfer film include commercially available blocked isocyanate. For example, Takenate (registered trademark) B870N (manufactured by Mitsui Chemicals, Inc.), which is a methylethylketone oxime blocked product of isophorone diisocyanate, Duranate (registered trademark) MF-K60B, TPA-B80E, X3071 which is a hexamethylene diisocyanate-based blocked isocyanate compound. 04 (all manufactured by Asahi Kasei Chemicals Co., Ltd.) and the like can be mentioned.

The blocked isocyanate having a hydrophilic group in the molecule is preferably a blocked isocyanate in which at least a part of the isocyanate group is an aqueous isocyanate group to which a hydrophilic group is added. By reacting the isocyanate group of the polyisocyanate with a blocking agent (sometimes referred to as an amine compound), a blocked isocyanate having a hydrophilic group in the molecule can be obtained. Examples of this reaction method include a method of adding a hydrophilic group to a part of the isocyanate groups of the polyisocyanate by a chemical reaction.
The hydrophilic group of the compound capable of reacting with an acid by heating is not particularly limited, and specific examples thereof include a nonionic hydrophilic group and a cationic hydrophilic group.

The nonionic hydrophilic group is not particularly limited, and specific examples thereof include a compound obtained by adding ethylene oxide or propylene oxide to the hydroxyl group of an alcohol such as methanol, ethanol, butanol, ethylene glycol, or diethylene glycol. That is, the hydrophilic group of the compound which has a hydrophilic group in the molecule and can react with the acid by heating is preferably an ethylene oxide chain or a propylene oxide chain. These compounds have active hydrogen that reacts with the isocyanate group, which allows them to be added to the isocyanate group. Among these, monoalcohols that can be dispersed in water with a small amount of use are preferable.
The number of ethylene oxide chains or propylene oxide chains added is preferably 4 to 30, more preferably 4 to 20. When the number of additions is 4 or more, the water dispersibility tends to be further improved. Further, when the number of additions is 30 or less, the initial Tg of the obtained blocked isocyanate tends to be further improved.
Addition of a cationic hydrophilic group is a method using a compound having both a cationic hydrophilic group and an active hydrogen that reacts with an isocyanate group; a functional group such as a glycidyl group is introduced into polyisocyanate in advance. Then, for example, there is a method of reacting a specific compound such as sulfide or phosphine with this functional group. The former method is easy.
The active hydrogen that reacts with the isocyanate group is not particularly limited, and specific examples thereof include a hydroxyl group and a thiol group. The compound having both a cationic hydrophilic group and an active hydrogen that reacts with an isocyanate group is not particularly limited, and specific examples thereof include dimethylethanolamine, diethylethanolamine, diethanolamine, and methyldiethanolamine. The tertiary amino group introduced thereby can also be quaternized with dimethyl sulfate, diethyl sulfate, or the like.

The equivalent ratio of the isocyanate group to which the hydrophilic group is added to the blocked isocyanate group is preferably 1:99 to 80:20, more preferably 2:98 to 50:50, and 5:95 to 30. : 70 is particularly preferable. The above-mentioned preferable range is preferable from the viewpoint of compatibility between isocyanate reactivity and development residue.

As a blocked isocyanate having a hydrophilic group in the molecule and a method for synthesizing the blocked isocyanate, the aqueous blocked polyisocyanate described in JP-A-2014-065833 (A) 0010 to 0045 can be preferably used, and the contents of this publication are described herein. Is incorporated into.

When synthesizing a blocked isocyanate having a hydrophilic group in the molecule, the addition reaction of the hydrophilic group and the blocking reaction of the isocyanate group can be carried out in the presence of a synthetic solvent. The synthetic solvent in this case is preferably one that does not contain active hydrogen, and examples thereof include dipropylene glycol monomethyl ether and propylene glycol monomethyl ether acetate methoxypropyl acetate.
When synthesizing a blocked isocyanate having a hydrophilic group in the molecule, the compound having a hydrophilic group is preferably added in an amount of 2 to 80% by mass, preferably 1 to 100% by mass, based on the polyisocyanate. Is more preferable.
When synthesizing a blocked isocyanate having a hydrophilic group in the molecule, the blocking agent is preferably added in an amount of 20 to 99% by mass, more preferably 10 to 100% by mass, based on the polyisocyanate.

The blocked isocyanate used in the transfer film preferably has a weight average molecular weight of 200 to 3000, more preferably 250 to 2600, and particularly preferably 280 to 2200.

-Metal oxide particles-
The curable resin layer may or may not contain particles (preferably metal oxide particles) for the purpose of adjusting the refractive index and light transmittance. In order to control the refractive index of the curable resin layer, metal oxide particles can be included in an arbitrary ratio depending on the type of polymer or polymerizable compound used. Among the curable resin layers, the metal oxide particles are preferably contained in an amount of 0 to 35% by mass, more preferably 0 to 10% by mass, and particularly preferably not contained in the curable resin layer. .. It is preferable that the curable resin layer does not contain the metal oxide particles, but the case where the curable resin layer contains the metal oxide particles is also included in the present invention. Examples of the types of metal oxide particles when the curable resin layer contains metal oxide particles include ZrO ₂ particles, Nb ₂ O ₅ particles, and TiO ₂ particles.
Since the metal oxide particles have high transparency and light transmittance, a curable resin layer having a high refractive index and excellent transparency can be obtained.
The refractive index of the metal oxide particles described above is preferably higher than the refractive index of the composition composed of the material obtained by removing the metal oxide particles from the curable resin layer. In other words, the refractive index of the metal oxide particles is preferably higher than the refractive index of the curable resin layer that does not contain the metal oxide particles.

The metal of the metal oxide particles described above also includes metalloids such as B, Si, Ge, As, Sb, and Te.
Examples of metal oxide particles having high light transmittance and high refractive index include Be, Mg, Ca, Sr, Ba, Sc, Y, La, Ce, Gd, Tb, Dy, Yb, Lu, Ti, Zr, Hf, and Nb. , Mo, W, Zn, B, Al, Si, Ge, Sn, Pb, Sb, Bi, Te and other oxide particles are preferable, and titanium oxide, titanium composite oxide, zinc oxide, zirconium oxide and indium are preferable. / Tin oxide and antimon / tin oxide are more preferable, titanium oxide, titanium composite oxide and zirconium oxide are more preferable, and titanium oxide and zirconium oxide are particularly preferable. As the titanium oxide, a rutile type having a particularly high refractive index is preferable. The surface of these metal oxide particles can also be treated with an organic material in order to impart dispersion stability.

From the viewpoint of the transparency of the curable resin layer, the average primary particle size of the metal oxide particles described above is preferably 1 to 200 nm, and particularly preferably 3 to 80 nm. Here, the average primary particle size of the particles refers to the arithmetic average of 200 arbitrary particles measured by an electron microscope. If the shape of the particle is not spherical, the longest side is the diameter.

Further, the above-mentioned metal oxide particles may be used alone or in combination of two or more.

-Additives-
Further, an additive may be used for the above-mentioned curable resin layer. Examples of the above-mentioned additives include the surfactants described in paragraphs 0017 of Japanese Patent No. 4502784 and paragraphs 0060 to 0071 of JP2009-237362, known fluorine-based surfactants, and Japanese Patent Application Laid-Open No. 4502784. The thermal polymerization inhibitor described in paragraph 0018 of the above, and other additives described in paragraphs 0058 to 0071 of JP-A-2000-310706 can be mentioned. Examples of the additive preferably used for the curable resin layer include Megafvck F-551 (manufactured by DIC Corporation), which is a known fluorine-based surfactant.

Although the case where the curable resin layer of the transfer film of the present invention is a negative type material has been mainly described above, the curable resin layer of the transfer film of the present invention may be a positive type material.

<Second resin layer>
The transfer film may have a second resin layer.
The transfer film of the present invention has a second resin layer between the protective film and the curable resin layer, so that two or more resin layers can be laminated at once from the transfer film, so that the productivity is improved. ,preferable.
It is preferable that the second resin layer contains particles from the viewpoint of reducing transfer defects. The second resin layer is preferably formed by applying a coating liquid for forming a second resin layer containing particles.

(Double bond consumption rate of the second resin layer)
In the transfer film of the present invention, it is preferable that the second resin layer is curable. The double bond consumption rate of the second resin layer is determined by the method described in Examples described later.
It is practically required that photolithography be performed on a curable resin layer that is closer to the outside than the second resin layer after transfer. The second resin layer, which becomes a layer closer to the inside than the curable resin layer after transfer, does not have to have photolithography. In the present invention, since the curable resin layer has curability in the state of a transfer film, the curable resin layer which becomes a layer closer to the outside than the second resin layer after transfer has photolithography.
The second resin layer may be thermosetting, photocurable, thermosetting and photocurable. Among them, it is preferable that the second resin layer is at least a thermosetting resin layer from the viewpoint of being able to impart thermosetting the reliability of the film after transfer, and it is a thermosetting resin layer and a photocurable resin layer. This is more preferable from the viewpoint that it can be easily photo-cured after transfer to form a film and can be thermoset after film-forming to impart the reliability of the film.
When the second resin layer is curable, the second resin layer does not have to be cured in the state of the transfer film, in which case the double bond consumption rate of the curable resin layer is 0%. .. Further, when the second resin layer is curable, the double bond consumption rate of the second resin layer may be cured in the state of the transfer film, in which case the double of the second resin layer is doubled. The combined consumption rate is preferably more than 0% and less than 10%.
From the viewpoint of imparting photolithography to the second resin layer, the double bond consumption rate of the second resin layer is preferably less than 10%, more preferably 0%.

(Refractive index)
The transfer film of the present invention preferably satisfies the following formula 1.
Equation 1: n ₁ <n ₂
n ₁ represents the refractive index of the curable resin layer, and n ₂ represents the refractive index of the second resin layer.
The transparent electrode pattern (preferably Indium Tin Oxide; including a metal oxide such as ITO) generally has a higher refractive index than the resin layer. By satisfying the formula 1: n ₁ <n ₂ , the transfer film has the difference in refractive index between the transparent electrode pattern and the above-mentioned second resin layer, and the above-mentioned second resin layer and the above-mentioned curable resin layer. It is possible to obtain a transfer film in which the difference in refractive index of the film is small, and when the laminate is formed on the visual side of the transparent electrode pattern, light reflection is reduced and the transparent electrode pattern becomes difficult to see, and the transparent electrode pattern is concealed. You can improve your sex.
Even if the second resin layer is laminated without curing the curable resin layer after laminating the curable resin layer, the layer fraction is good when the method for producing a transfer film described later is used. In this case, the transparent electrode pattern hiding property can be improved by the above mechanism, and the refractive index adjusting layer (that is, the curable resin layer and the second resin layer) is transferred from the transfer film onto the transparent electrode pattern, and then photolithography is performed. Can be developed into a desired pattern. When the layer fractionation of the curable resin layer and the second resin layer is good, the effect of adjusting the refractive index obtained by the above mechanism can be sufficiently obtained, and the transparent electrode pattern hiding property tends to be sufficiently improved. ..
The transfer film preferably has a higher refractive index of the second resin layer than that of the curable resin layer. The value of n _2- n ₁ is preferably 0.03 to 0.30, more preferably 0.05 to 0.20.
The refractive index n ₂ of the second resin layer is preferably 1.60 or more.
The refractive index of the second resin layer needs to be adjusted by the refractive index of the transparent electrode pattern, and the upper limit of the value is not particularly limited, but is preferably 2.1 or less, and is preferably 1.78 or less. More preferably. The refractive index n ₂ of the second resin layer is preferably 1.60 ≦ n ₂ ≦ 1.75. The refractive index of the second resin layer described above may be 1.74 or less.
When the refractive index of the transparent electrode pattern exceeds 2.0 as in the case of oxides of In and Zn (Indium Zinc Oxide; IZO), the refractive index n ₂ of the second resin layer is 1.7. It is preferably 1.85 or less.

The method for controlling the refractive index of the second resin layer is not particularly limited, but a resin layer having a desired refractive index can be used alone, or a resin layer to which particles such as metal particles and metal oxide particles are added can be used. Alternatively, a composite of a metal salt and a polymer can be used.

(Thickness of the second resin layer)
The thickness of the second resin layer is preferably 500 nm or less, more preferably 110 nm or less. The thickness of the second resin layer described above is preferably 20 nm or more. The thickness of the second resin layer described above is particularly preferably 55 to 100 nm, more preferably 60 to 100 nm, and even more preferably 70 to 100 nm.
In the present specification, T ₂ represents the average thickness of the second resin layer. In the present specification, when the term "thickness of the second resin layer" is used without particular notice, it means " _{average thickness T 2 of the second resin layer".}

(Alkali soluble)
In the transfer film of the present invention, it is preferable that the second resin layer is alkali-soluble.

(composition)
The second resin layer of the transfer film may be a negative type material or a positive type material. It is preferable that the second resin layer of the transfer film is a negative type material.
When the second resin layer of the transfer film is a negative type material, the second resin layer preferably contains a resin having an acid group, a monomer having an acid group, particles, and a metal oxidation inhibitor. Furthermore, the second resin layer may contain other binder polymers, polymerizable compounds, and polymerization initiators. Furthermore, the second resin layer may contain additives.

-Resin with acid group-
The resin having an acid group is preferably a resin having a monovalent acid group (carboxyl group or the like).
The resin having an acid group is preferably a resin having solubility in an aqueous solvent (preferably water or a mixed solvent of a lower alcohol having 1 to 3 carbon atoms and water). The resin having an acid group is not particularly limited as long as it does not contradict the gist of the present invention, and can be appropriately selected from known ones.
The resin having an acid group used in the second resin layer is preferably an alkali-soluble resin. The alkali-soluble resin is a linear organic polymer polymer, and is a group that promotes at least one alkali solubility in a molecule (preferably a molecule having an acrylic copolymer or a styrene-based copolymer as a main chain). (That is, an acid group: for example, a carboxyl group, a phosphoric acid group, a sulfonic acid group, etc.) can be appropriately selected from the alkali-soluble resins. Of these, more preferably, it is soluble in an organic solvent and can be developed using a weak alkaline aqueous solution.
As the acid group of the resin having an acid group, a carboxyl group is more preferable.

For the production of the alkali-soluble resin, for example, a method using a known radical polymerization method can be applied. Polymerization conditions such as temperature, pressure, type and amount of radical initiator, type of solvent, etc. when producing an alkali-soluble resin by a radical polymerization method can be easily set by those skilled in the art, and the conditions are experimentally determined. You can also do it.

As the linear organic polymer polymer, a polymer having a carboxylic acid in the side chain is preferable. For example, Japanese Patent Application Laid-Open No. 59-44615, Japanese Patent Application Laid-Open No. 54-34327, Japanese Patent Application Laid-Open No. 58-125777, Japanese Patent Application Laid-Open No. 54-25957, Japanese Patent Application Laid-Open No. 59-53836, Japanese Patent Application Laid-Open No. 59-71048, Japanese Patent Application Laid-Open No. 59-71048 Poly (meth) acrylic acid, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, croton as described in the publications of Nos. 46-2121 and 56-40824. Acid copolymers, maleic acid copolymers such as styrene / maleic acid, partially esterified maleic acid copolymers, etc., and acidic cellulose derivatives and hydroxyl groups having carboxylic acid in the side chains such as carboxyalkyl cellulose and carboxyalkyl starch. A polymer polymer obtained by adding an acid anhydride to the polymer having an acid anhydride and further having a reactive functional group such as a (meth) acryloyl group in the side chain is also preferable.

The resin having an acid group is preferably an acrylic resin.
As a specific structural unit of the resin having an acid group, a copolymer of (meth) acrylic acid and another monomer copolymerizable therewith is particularly preferable.

Examples of other monomers copolymerizable with (meth) acrylic acid include alkyl (meth) acrylates, aryl (meth) acrylates, vinyl compounds and the like. Here, the hydrogen atoms of the alkyl group and the aryl group may be substituted with a substituent.
Specific examples of alkyl (meth) acrylate and aryl (meth) acrylate include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, and pentyl (meth) acrylate. ) Acrylate, hexyl (meth) acrylate, octyl (meth) acrylate, phenyl (meth) acrylate, benzyl acrylate, trill acrylate, naphthyl acrylate, cyclohexyl acrylate and the like can be mentioned.

Examples of the vinyl compound include styrene, α-methylstyrene, vinyltoluene, glycidyl methacrylate, acrylonitrile, vinyl acetate, N-vinylpyrrolidone, tetrahydrofurfuryl methacrylate, polystyrene macromonomer, polymethylmethacrylate macromonomer, CH ₂ =. CR ¹ R ² , CH ₂ = C (R ¹ ) (COOR ³ ) [Here, R ¹ represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and R ² is an aromatic hydrocarbon having 6 to 10 carbon atoms. represents hydrogen ring, ^{R 3} represents an alkyl group or an aralkyl group having 6 to 12 carbon atoms having 1 to 8 carbon atoms. ] Etc. can be mentioned.

These other copolymerizable monomers may be used alone or in combination of two or more. Other preferred copolymerizable monomers are selected from CH ₂ = CR ¹ R ² , CH ₂ = C (R ¹ ) (COOR ³ ), phenyl (meth) acrylate, benzyl (meth) acrylate and styrene. At least one type, and particularly preferably CH ₂ = CR ¹ R ² and / or CH ₂ = C (R ¹ ) (COOR ³ ).

In addition, an ethylenically unsaturated double bond is formed by reacting a (meth) acrylic compound having a reactive functional group, silicic acid, or the like with a linear polymer having a substituent capable of reacting with the reactive functional group. Can be mentioned as a resin in which the above is introduced into this linear polymer. Examples of the reactive functional group include a hydroxyl group, a carboxyl group and an amino group, and examples of the substituent capable of reacting with the reactive functional group include an isocyanate group, an aldehyde group and an epoxy group.

The resin having an acid group is more preferably a benzyl (meth) acrylate / (meth) acrylic acid copolymer or a multidimensional copolymer composed of benzyl (meth) acrylate / (meth) acrylic acid / other monomer.
In addition, a copolymer obtained by copolymerizing 2-hydroxyethyl methacrylate and the like are also preferably used as the resin having an acid group.
The resin having an acid group can be mixed and used in an arbitrary amount.

In addition to the above, the resin having an acid group includes 2-hydroxypropyl (meth) acrylate / polystyrene macromonomer / benzyl methacrylate / methacrylate copolymer and 2-hydroxy-3-3, which are described in JP-A-7-140654. Phenoxypropyl acrylate / polymethylmethacrylate macromonomer / benzylmethacrylate / methacrylate copolymer, 2-hydroxyethylmethacrylate / polystyrene macromonomer / methylmethacrylate / methacrylate copolymer, 2-hydroxyethylmethacrylate / polystyrene macromonomer / benzylmethacrylate / Methacrylic acid copolymer and the like can be mentioned.

Among these, as the resin having an acid group, an acrylic resin having an acid group is preferable, a copolymer resin of (meth) acrylic acid / vinyl compound is preferable, and (meth) acrylic acid / (meth) acrylic acid / (meth). ) It is particularly preferable that it is a copolymer resin of allyl acrylate. In the present specification, the acrylic resin includes both a methacrylic resin and an acrylic resin, and similarly, the (meth) acrylic contains methacrylic and an acrylic.

The weight average molecular weight of the resin having an acid group is preferably 10,000 or more, more preferably 20,000 to 100,000.

The resin having an acid group is preferably contained in an amount of 10 to 80% by mass, more preferably 15 to 65% by mass, and particularly preferably 20 to 50% by mass with respect to the second resin layer.

-Monomer with acid group-
As the monomer having an acid group, an acrylic monomer such as (meth) acrylic acid or a derivative thereof, or the following monomer can be preferably used.
For example, a radically polymerizable monomer having 3 to 4 functions (pentaerythritol tri and a tetraacrylate skeleton having a carboxylic acid group introduced therein. Acid value = 80 to 120 mgKOH / g) and a radically polymerizable monomer having 5 to 6 functions (dipenta). A carboxylic acid group is introduced into the erythritol penta and hexaacrylate skeletons. Acid value = 25 to 70 mgKOH / g) and the like. Although the specific name is not described, a bifunctional alkali-soluble radically polymerizable monomer may be used if necessary.
In addition, the monomers having an acid group described in Japanese Patent Application Laid-Open No. 2004-239942 [0025] to [0030] can also be preferably used, and the contents of this publication are incorporated in the present invention.
Further, among the polymerizable compounds listed as the polymerizable compounds used for the curable resin layer, a monomer having an acid group can also be preferably used.
Among these, a polymerizable compound containing a carboxyl group is preferable, and an acrylic monomer such as (meth) acrylic acid or a derivative thereof can be used more preferably. Among them, Aronix TO-2349 (manufactured by Toagosei Co., Ltd.) Especially preferable. In the present specification, the acrylic monomer includes both a methacrylic monomer and an acrylic monomer.
The second resin layer preferably contains 1 to 50% by mass of the monomer having an acid group, more preferably 3 to 20% by mass, and 6 to 15% by mass with respect to the resin having an acid group. Is particularly preferable.

-Particles-
It is preferable that the second resin layer contains particles from the viewpoint of controlling the adhesion to the protective film and reducing transfer defects.
The second resin layer preferably contains particles in an amount of 60 to 90% by mass based on the total solid content of the second resin layer from the viewpoint of reducing transfer defects, and more preferably 65 to 90% by mass. , 70% by mass or more and less than 85% by mass is more preferable. The second resin layer may contain particles in an amount of 60% by mass or more based on the total solid content of the second resin layer, so that the second resin layer (and / or the curable resin layer) is transferred to the protective film. It is preferable from the viewpoint of reducing the adhesiveness to the extent that transfer defects can be reduced. The second resin layer may contain particles in an amount of 90% by mass or less based on the total solid content of the second resin layer, so that the protective film contains the second resin layer (and / or the curable resin layer) and bubbles. It is preferable from the viewpoint of increasing the adhesiveness to the extent that the occurrence can be suppressed.
The refractive index of the particles is preferably higher than the refractive index of the composition composed of the material obtained by removing the particles from the second resin layer. In other words, the refractive index of the particles is preferably higher than the refractive index of the second resin layer containing no particles. The particles contained in the second resin layer are preferably particles having a refractive index of 1.50 or more from the viewpoint of hiding the transparent electrode pattern. The second resin layer more preferably contains particles having a refractive index of 1.55 or more, further preferably contains particles having a refractive index of 1.70 or more, and contains particles having a refractive index of 1.90 or more. It is particularly preferable, and it is most preferable to contain 2.00 or more particles.
The refractive index of the particles contained in the second resin layer is the refractive index of light having a wavelength of 400 nm to 750 nm. Here, the refractive index of light having a wavelength of 400 nm to 750 nm is 1.50 or more, which means that the average refractive index of light having a wavelength in the above range is 1.50 or more. It is not necessary that the refractive index of all light having a wavelength is 1.50 or more. The average refractive index is a value obtained by dividing the total of the measured values of the refractive index for each light having a wavelength in the above range by the number of measurement points.
The transfer film of the present invention preferably contains particles having a refractive index of 1.50 or more in the second resin layer in an amount of 60 to 90% by mass based on the total solid content of the second resin layer.

The particles having a refractive index of 1.50 or more are more preferably metal oxide particles from the viewpoint of adjusting the refractive index and light transmittance.
The second resin layer may contain metal oxide particles in an arbitrary ratio depending on the resin used, the type and content of the polymerizable monomer, the type of metal oxide particles used, and the like.
The type of the metal oxide particles is not particularly limited, and known metal oxide particles can be used. The metal oxide particles mentioned in the above-mentioned curable resin layer can also be used in the second resin layer.
In the present invention, the second resin layer has at least one of _{zirconium oxide particles (ZrO 2} particles), Nb ₂ O ₅ particles and titanium oxide particles (TIO _{2 particles).} It is preferable from the viewpoint of controlling the refractive index within the range of the refractive index of. The metal oxide particles are more preferably zirconium oxide particles or titanium oxide particles, and particularly preferably zirconium oxide particles. Commercially available products may be used as the particles, and for example, those manufactured by Nanouse OZ-S30M (Nissan Chemical Industries, Ltd.) can be preferably used.
When zirconium oxide particles are used as the metal oxide particles, the content of the zirconium oxide particles is the total content of the second resin layer from the viewpoint of imparting appropriate adhesion to the protective film and reducing air bubbles and transfer defects. It is preferably 60% to 90% by mass, more preferably 65% to 90% by mass, and further preferably 70% by mass or more and less than 85% by mass with respect to the solid content.
On the other hand, as a more preferable embodiment when titanium oxide particles are used as the metal oxide particles, the metal oxide particles are preferably contained in an amount of 30 to 70% by mass, more than 40% by mass, based on the second resin layer. More preferably, it is contained in an amount of less than 60% by mass. By setting the above-mentioned preferable range, it is possible to prepare a laminated body in which defects of the second resin layer having metal oxide particles are hard to be seen after transfer and the transparent electrode pattern has good hiding property.

In addition, one type of metal oxide particles may be used alone, or two or more types may be used in combination.

-Metal oxidation inhibitor-
The second resin layer preferably contains a metal oxidation inhibitor. When the second resin layer contains a metal oxidation inhibitor, the second resin layer is laminated on a transparent substrate (the transparent substrate preferably includes a transparent electrode pattern, a metal wiring portion, etc.). It is possible to surface-treat the metal wiring portion that is in direct contact with the second resin layer. It is considered that the protective property of the metal wiring portion provided by the above surface treatment is effective even after the second resin layer (and the functional layer on the support side) is removed.
The metal oxidation inhibitor used in the present invention is preferably a compound having an aromatic ring containing a nitrogen atom in the molecule.
Further, as the metal oxidation inhibitor, at least the aromatic ring containing a nitrogen atom is selected from the group consisting of an imidazole ring, a triazole ring, a tetrazole ring, a thiadiazole ring, and a fused ring between them and another aromatic ring. It is preferably one ring, and more preferably the aromatic ring containing a nitrogen atom is an imidazole ring or a fused ring of an imidazole ring and another aromatic ring.
The other aromatic ring may be a mono-prime ring or a heterocyclic ring, but a mono-prime ring is preferable, a benzene ring or a naphthalene ring is more preferable, and a benzene ring is further preferable.
Preferred metal oxidation inhibitors are preferably imidazole, benzimidazole, tetrazole, mercaptothiazazole, and benzotriazole, with imidazole, benzimidazole and benzotriazole being more preferred. As the metal oxidation inhibitor, a commercially available product may be used, and for example, BT120 manufactured by Johoku Chemical Industry Co., Ltd. containing benzotriazole or the like can be preferably used.
The content of the metal oxidation inhibitor is preferably 0.1 to 20% by mass, more preferably 0.5 to 10% by mass, based on the total mass of the second resin layer. It is more preferably ~ 5% by mass.

その他の水系樹脂組成物に用いられる光重合性化合物としては、メタノールなどの炭素原子数１乃至３の低級アルコールと水との混合溶媒にも溶解性を有することが、金属酸化物粒子のアルコール分散液を水系樹脂組成物に併用する場合に好ましい。水もしくは炭素原子数１乃至３の低級アルコールと水との混合溶媒に対して溶解性を有する重合性化合物としては、水酸基を有するモノマー、分子内にエチレンオキサイドやポリプロピレンオキサイド、およびリン酸基を有するモノマーが使用できる。炭素原子数１乃至３の低級アルコールと水との混合溶媒にも溶解性を有する重合性化合物としては、カヤラッドＲＰ−１０４０（日本化薬（株）製）、アロニックスＴＯ−２３４９（東亞合成社製）、重合性モノマー Ａ−９３００（新中村化学工業（社）製）、Ａ−ＧＬＹ−２０Ｅ（新中村化学工業（社）製）などが好ましい。なお、重合性化合物が炭素原子数１乃至３の低級アルコールと水との混合溶媒にも溶解性を有するとは、アルコールと水との混合溶媒に０．１質量％以上溶解することを言う。
また、重合性化合物の含有量は、第二の樹脂層の全固形分に対し、０〜２０質量％であることが好ましく、０〜１０質量％であることがより好ましく、０〜５質量％であることが更に好ましい。 -Polymerizable compound-
It is preferable that the above-mentioned second resin layer contains a polymerizable compound such as a photopolymerizable compound or a thermopolymerizable compound from the viewpoint of curing to increase the strength of the film. The second resin layer may contain only the above-mentioned monomer having an acid group as a polymerizable compound, or may contain other polymerizable compounds other than the above-mentioned monomer having an acid group.
As the polymerizable compound used for the second resin layer, the polymerizable compound described in paragraphs 0023 to 0024 of Japanese Patent No. 4098550 can be used. Among them, pentaerythritol tetraacrylate, pentaerythritol triacrylate, and pentaerythritol ethylene oxide adduct tetraacrylate can be preferably used. These polymerizable compounds may be used alone or in combination of two or more. When a mixture of pentaerythritol tetraacrylate and pentaerythritol triacrylate is used, the ratio of pentaerythritol triacrylate to the entire mixture of pentaerythritol tetraacrylate and pentaerythritol triacrylate is preferably 0 to 80% by mass ratio, and 10 to 10%. More preferably, it is 60%.
As the polymerizable compound used for the second resin layer, specifically, a water-soluble polymerizable compound represented by the following structural formula 1 and a pentaerythritol tetraacrylate mixture (NK ester A-TMMT Shin-Nakamura Chemical Industry Co., Ltd.) ), Contains about 10% triacrylate as an impurity), a mixture of pentaerythritol tetraacrylate and triacrylate (NK ester A-TMM3LM-N manufactured by Shin-Nakamura Chemical Industry Co., Ltd., triacrylate 37%), pentaerythritol tetraacrylate Mix of triacrylate (NK ester A-TMM-3L manufactured by Shin-Nakamura Chemical Industry Co., Ltd., triacrylate 55%), mixture of pentaerythritol tetraacrylate and triacrylate (NK ester A-TMM3 manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) , Triacrylate 57%), tetraacrylate (Kayarad RP-1040 manufactured by Nippon Kayaku Co., Ltd.), which is an adduct of pentaerythritol ethylene oxide, and the like.

As a photopolymerizable compound used in other aqueous resin compositions, the alcohol dispersion of metal oxide particles is that it is also soluble in a mixed solvent of water and a lower alcohol having 1 to 3 carbon atoms such as methanol. It is preferable when the liquid is used in combination with the aqueous resin composition. Examples of the polymerizable compound having solubility in water or a mixed solvent of water or a lower alcohol having 1 to 3 carbon atoms and water include a monomer having a hydroxyl group, ethylene oxide or polypropylene oxide in the molecule, and a phosphate group. Monomers can be used. As polymerizable compounds having solubility in a mixed solvent of a lower alcohol having 1 to 3 carbon atoms and water, Kayarad RP-1040 (manufactured by Nippon Kayaku Co., Ltd.) and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.) ), Polymerizable monomer A-9300 (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), A-GLY-20E (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) and the like are preferable. The fact that the polymerizable compound is soluble in a mixed solvent of a lower alcohol having 1 to 3 carbon atoms and water means that the compound is dissolved in a mixed solvent of alcohol and water in an amount of 0.1% by mass or more.
The content of the polymerizable compound is preferably 0 to 20% by mass, more preferably 0 to 10% by mass, and 0 to 5% by mass with respect to the total solid content of the second resin layer. Is more preferable.

-Polymerization initiator-
The polymerization initiator used in the second resin layer is not particularly limited. The polymerization initiator used in the second resin layer is preferably soluble in water or a mixed solvent of water or a lower alcohol having 1 to 3 carbon atoms and water.
As the polymerization initiator used in the second resin layer, IRGACURE 2959 or a polymerization initiator represented by the following structural formula 2 can be used.
The content of the polymerization initiator is preferably 0 to 5% by mass, preferably 0 to 1% by mass, based on the total solid content of the resin composition used for forming the second resin layer. It is more preferably 0 to 0.5% by mass, further preferably 0 to 0.5% by mass.

-Other binder polymers-
The second resin layer may contain other binder polymers having no acid group. The other binder polymer is not particularly limited. As another binder polymer, the binder polymer used for the above-mentioned curable resin layer can be used.

-Additives-
The second resin layer may contain additives. Examples of the above-mentioned additives include surfactants described in paragraphs 0017 of Japanese Patent No. 4502784 and paragraphs 0060 to 0071 of JP2009-237362, and thermal polymerization described in paragraph 0018 of Japanese Patent No. 4502784. Inhibitors and other additives described in paragraphs 0058 to 0071 of JP-A-2000-310706 can be mentioned. Examples of the additive preferably used for the second resin layer include Megafvck F-444 (manufactured by DIC Corporation), which is a known fluorine-based surfactant.

Although the case where the second resin layer of the transfer film is a negative type material has been mainly described above, the second resin layer of the transfer film may be a positive type material. When the second resin layer of the transfer film is a positive type material, for example, the material described in Japanese Patent Application Laid-Open No. 2005-221726 is used for the above-mentioned second resin layer.

<Arbitrary resin layer>
The transfer film may have any other layer in addition to the temporary support, the curable resin layer, the second resin layer and the protective film as long as the effects of the present invention are not impaired. Other optional layers may include a thermoplastic resin layer and an intermediate layer.

(Thermoplastic resin layer)
In the transfer film of the present invention, a thermoplastic resin layer may be provided between the above-mentioned temporary support and the above-mentioned curable resin layer. As the thermoplastic resin layer, the thermoplastic resin layer described in [0041] to [0047] of JP-A-2014-108541 can be used as a reference. The contents of this gazette are incorporated herein by reference.

(Middle class)
In the transfer film of the present invention, an intermediate layer may be provided between the above-mentioned thermoplastic resin layer and the above-mentioned curable resin layer. The intermediate layer is described as a "separation layer" in Japanese Patent Application Laid-Open No. 5-72724.

<Manufacturing method of transfer film>
The method for producing the transfer film of the present invention is not particularly limited, and the transfer film can be produced by a known method.
When producing a transfer film having a curable resin layer and a protective film on the temporary support, a step of forming a curable resin layer on the temporary support and a protective film are formed on the above-mentioned curable resin layer. It is preferable to have a process.

Further, in the case of producing a transfer film having a second resin layer, a step of forming a curable resin layer on the temporary support, a step of forming a second resin layer on the above-mentioned curable resin layer, and a step of forming the second resin layer. It is preferable to have a step of forming a protective film on the above-mentioned second resin layer.
The step of forming the curable resin layer is preferably a step of applying the organic solvent-based resin composition on the above-mentioned temporary support.
The step of forming the second resin layer is the step of forming the second resin layer directly on the curable resin layer from the viewpoint of the interlayer adhesion between the curable resin layer and the second resin layer. preferable.
The step of forming the second resin layer is preferably a step of applying the aqueous resin composition from the viewpoint of improving the layer fractionation. By applying the aqueous resin composition on the curable resin layer obtained by the organic solvent-based resin composition to form the second resin layer, the second resin is formed without curing the curable resin layer. Even if the layers are formed, layer mixing does not occur, and the layer fraction is good.

Further, the curable resin layer obtained by coating and drying is coated with the aqueous resin composition used for forming the above-mentioned second resin layer without exposing the second resin layer. However, it is preferable from the viewpoint that the curable resin layer can be imparted with curability in the state of the dry resist film. It is preferable to provide a second resin layer or a protective film without curing after applying the curable resin layer from the viewpoint of imparting photolithography. In this case, the double bond consumption rate of the curable resin layer is 0%.
On the other hand, the second resin layer may be formed after the curable resin layer is cured. After applying the curable resin layer, the double bond consumption rate is cured in the range of less than 10% to reduce the adhesiveness of the curable resin layer in the range where the photolithography property can be sufficiently maintained, and then the second step. A resin layer or a protective film may be provided. In this case, the double bond consumption rate of the curable resin layer exceeds 0% and is less than 10%.
From the viewpoint of imparting photolithography, it is preferable to provide a second resin layer or a protective film without curing after applying the curable resin layer.
As a method for curing the curable resin layer, the same method as the method for curing the curable resin layer after transfer can be used in the method for producing a laminate described later.
Hereinafter, preferred embodiments of each step will be described.

(Step of forming a curable resin layer on the temporary support)
The method for producing the transfer film preferably includes a step of forming a curable resin layer on the temporary support.

-Organic solvent-based resin composition-
The step of forming the curable resin layer is preferably a step of applying the organic solvent-based resin composition on the above-mentioned temporary support.
The organic solvent-based resin composition refers to a resin composition that can be dissolved in an organic solvent.
As the organic solvent, a general organic solvent can be used. Examples of the organic solvent include methyl ethyl ketone, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate (1-methoxy-2-propyl acetate), cyclohexanone, methyl isobutyl ketone, ethyl lactate, methyl lactate, caprolactam and the like.
In addition, one type of organic solvent may be used alone, or two or more types may be used in combination.

In the method for producing a transfer film, it is preferable that the organic solvent-based resin composition used for forming the curable resin layer contains a binder polymer, a polymerizable compound, and a polymerization initiator.
Further, since the organic solvent-based resin composition used for forming the curable resin layer contains a surfactant containing a fluorine atom (also referred to as a fluorine-based surfactant), the curable resin layer is not cured. Even if the second resin layer is formed, layer mixing does not occur, and the uniformity of the thickness of the second resin layer becomes good. Further, by adjusting the content of the surfactant in the organic solvent-based resin composition so that the content of the surfactant with respect to the total solid content of the curable resin layer is 0.01 to 0.50% by mass. When the laminate described later is produced, the adhesion between the second resin layer and the transparent electrode pattern is improved.

(Step of forming the second resin layer)
The method for producing the transfer film preferably includes a step of forming a second resin layer.

-Aqueous resin composition-
The step of forming the second resin layer is preferably a step of applying the aqueous resin composition.
Since the second resin layer obtained by using the aqueous resin composition is easily dissolved in water, it is preferable to have a composition in which the problem of wet heat resistance of the transfer film does not easily occur. Specifically, as the aqueous resin composition, it is preferable to use an aqueous resin composition containing an ammonium salt of a monomer having an acid group or an ammonium salt of a resin having an acid group. When the second resin layer obtained by using such an aqueous resin composition is dried, it is composed of an ammonium salt of a monomer having an acid group or an ammonium salt of a resin having an acid group, and ammonia having a boiling point lower than that of water. Is easy to volatilize. Therefore, an acid group can be generated (regenerated) from the state of the ammonia salt and present in the second resin layer as a monomer having an acid group or a resin having an acid group. Since the monomer having an acid group or the resin having an acid group constituting the second resin layer in which the acid group is generated is insoluble in water, the wet and heat resistance of the transfer film can be improved.

The aqueous resin composition refers to a resin composition that can be dissolved in an aqueous solvent.
As the aqueous solvent, water or a mixed solvent of water or a lower alcohol having 1 to 3 carbon atoms and water is preferable. In a preferred embodiment of the method for producing a transfer film, the solvent of the aqueous resin composition used for forming the second resin layer preferably contains water and an alcohol having 1 to 3 carbon atoms, and has 1 to 3 carbon atoms. More preferably, it contains water or a mixed solvent having an alcohol / water mass ratio of 20/80 to 80/20.
A mixed solvent of water, water and methanol, a mixed solvent of water and ethanol is preferable, and a mixed solvent of water and methanol is more preferable from the viewpoint of drying and coatability.
In particular, when a mixed solvent of water and methanol is used when forming the second resin layer, the mass ratio (mass% ratio) of methanol / water is preferably 20/80 to 80/20, and is 30/70. It is more preferably ~ 70/30, and particularly preferably 40/60 to 70/30. By controlling within the above range, the curable resin layer and the second resin layer can be coated and quickly dried without being mixed between layers. As a result, it is easy to manufacture a transfer film capable of producing a laminate having good concealing property of the transparent electrode pattern, in which defects of the second resin layer having metal oxide particles are hard to be seen after transfer.

The pH (Power of Hydrogen) of the aqueous resin composition at 25 ° C. is preferably 7.0 or more and 12.0 or less, more preferably 7.0 to 10.0, and 7.0 to 8. 5 is particularly preferable. For example, the pH of the aqueous resin composition can be adjusted to the above-mentioned preferable range by using an excess amount of ammonia with respect to the acid group and adding a monomer having an acid group or a resin having an acid group.
Further, as a method for producing a transfer film, it is preferable that the water-based resin composition used for forming the second resin layer is at least one of thermosetting and photocurable. Curable resin layer When the curable resin layer is curable, according to the method for producing a transfer film, even if the second resin layer is laminated without being cured after laminating the curable resin layer, the layer fraction is good and the transparent electrode is transparent. The pattern hiding property can be improved. In this case, in the laminate described later, after the curable resin layer and the second resin layer are simultaneously transferred onto the transparent electrode pattern from the obtained transfer film, the second resin layer is at least transferred by photolithography. A curable resin layer, which is a layer closer to the outside than the outside, can be developed into a desired pattern. It is more preferable that the second resin layer has curability. In this embodiment, the curable resin layer and the second resin layer are simultaneously transferred onto the transparent electrode pattern and then simultaneously developed into a desired pattern by photolithography. can.
It is preferable to provide a protective film without curing the second resin layer from the viewpoint of imparting photolithography. In this case, the double bond consumption rate of the second resin layer is 0%.
Further, the second resin layer is cured in a range where the double bond consumption rate is less than 10% to reduce the adhesiveness of the curable resin layer in a range in which photolithography can be sufficiently maintained, and then a protective film is provided. You may. In this case, the double bond consumption rate of the second resin layer exceeds 0% and is less than 10%.

-Resin with acid group or monomer with acid group-
It is particularly preferable that the aqueous resin composition used for forming the second resin layer contains an ammonium salt of a monomer having an acid group or an ammonium salt of a resin having an acid group.
The ammonium salt of the monomer having an acid group or the ammonium salt of the resin having an acid group is not particularly limited.
It is preferable that the ammonium salt of the above-mentioned monomer having an acid group or the ammonium salt of the resin having an acid group of the second resin layer is an acrylic monomer having an acid group or an ammonium salt of an acrylic resin.

The step of forming the second resin layer is an aqueous resin composition containing a monomer having an acid group or a resin having an acid group dissolved in an aqueous ammonia solution, and at least a part of the acid group described above is ammonium chloride chloride. It is preferable to include a step of preparing the above.
In the method for producing a transfer film, the aqueous resin composition used for forming the second resin layer contains an ammonium salt of a monomer having an acid group or an ammonium salt of a resin having an acid group, and a binder polymer and light or heat. It preferably contains a polymerizable compound and a light or thermal polymerization initiator. Only the ammonium salt of the resin having an acid group may be a binder polymer, and other binder polymers may be used in combination with the ammonium salt of the resin having an acid group. The ammonium salt of the monomer having an acid group may be a light or thermopolymerizable compound, and in addition to the ammonium salt of the monomer having an acid group, a light or thermopolymerizable compound may be further used in combination.

(Ammonia volatilization)
The method for producing a transfer film preferably includes a step of producing an acid group by volatilizing ammonia from an ammonium salt of a monomer having an acid group or an ammonium salt of a resin having an acid group. The step of generating an acid group by volatilizing ammonia from the ammonium salt of the monomer having an acid group or the ammonium salt of a resin having an acid group is the step of heating the applied aqueous resin composition. It is preferable to have.
The preferable range of the detailed conditions of the step of heating the applied water-based resin composition is shown below.
As the heating and drying method, a method of passing through a furnace equipped with a heating device or a method of blowing air may be used. The heating and drying conditions may be appropriately set according to the organic solvent used, and examples thereof include a method of heating to a temperature of 40 to 150 ° C. Among these conditions, heating at a temperature of 50 to 120 ° C. is particularly preferable, and heating at a temperature of 60 to 100 ° C. is even more preferable. As the composition after heating and drying, the water content in the wetting standard is preferably 5% by mass or less, more preferably 3% by mass or less, and further preferably 1% by mass or less.

(Step of forming a protective film)
The method for producing the transfer film preferably includes a step of forming a protective film. The step of forming the protective film is not particularly limited, and a known method can be used. For example, a method of pressure-bonding the protective film to the curable resin layer or the second resin layer can be mentioned.

(Step of forming a roll)
The method for producing the transfer film preferably includes a step of forming a roll. The step of forming the protective film is not particularly limited, and a known method can be used. For example, a method of winding the transfer film on which the protective film is formed into a roll so that the protective film is on the outside can be mentioned.

<Other processes>
A step of further forming a thermoplastic resin layer may be included before forming the above-mentioned curable resin layer on the above-mentioned temporary support.

After the step of forming the above-mentioned thermoplastic resin layer, a step of forming an intermediate layer between the above-mentioned thermoplastic resin layer and the above-mentioned curable resin layer may be included. When forming a transfer film having an intermediate layer, a solution in which an additive is dissolved together with a thermoplastic organic polymer (a coating solution for a thermoplastic resin layer) is applied onto a temporary support, and the film is dried and heated. It is preferable to provide a plastic resin layer. On the obtained thermoplastic resin layer, a preparation solution (coating solution for intermediate layer) prepared by adding a resin or an additive to a solvent that does not dissolve the thermoplastic resin layer can be applied, dried, and the intermediate layer can be laminated. preferable. It is preferable that a coating liquid for a curable resin layer prepared by using a solvent that does not dissolve the intermediate layer is further applied onto the intermediate layer, dried, and the curable resin layer is laminated.

As another method for producing the curable resin layer or the second resin layer, the method for producing the photosensitive transfer material described in paragraphs 0094 to 0098 of JP-A-2006-259138 can be adopted.

<Use>
The transfer film of the present invention is preferably for an electrode protective film of a capacitance type input device, and is preferably for a transparent insulating layer or a transparent protective layer among the electrode protective films. The curable resin layer of the transfer film may be in an uncured state. In that case, a transfer for forming a laminated pattern of an electrode protective film of a capacitance type input device on a transparent electrode pattern by a photolithography method. It can be used as a film, more preferably as a transfer film for forming a laminated pattern of a refractive index adjusting layer and an overcoat layer (transparent protective layer).
The transfer film of the present invention is preferably a film for dry resist. In the present specification, the dry resist refers to a product in which the transfer film is in the form of a film.

[Electrode protective film for capacitive input device]
The electrode protective film of the capacitance type input device of the present invention is the transfer film of the present invention from which the protective film has been removed.
The electrode protective film of the capacitance type input device of the present invention is preferably one in which the protective film and the temporary support are removed from the transfer film of the present invention.
The electrode protective film of the capacitance type input device of the present invention is more preferably one obtained by transferring a curable resin layer onto a transparent electrode pattern from the transfer film of the present invention and curing the curable resin layer.
The electrode protective film is a film having a function of protecting the electrodes (transparent electrode pattern, etc.) of the capacitance type input device.
The electrode protective film of the capacitance type input device is preferably photocured with a curable resin layer, and more preferably photocured and heat-treated.

[Laminate]
The laminate of the present invention has a substrate including electrodes of the capacitance type input device and an electrode protective film of the capacitance type input device of the present invention.

The electrode of the capacitance type input device may be a transparent electrode pattern or a routing wiring. In the laminated body, the electrodes of the capacitance type input device are preferably an electrode pattern, and more preferably a transparent electrode pattern.

The laminate has a substrate including the electrodes of the capacitance type input device and a curable resin layer formed on the substrate, and preferably has at least a substrate, a transparent electrode pattern, and a curable resin layer, and the substrate. It is more preferable to have a transparent electrode pattern, a second resin layer arranged adjacent to the transparent electrode pattern, and a curable resin layer arranged adjacent to the second resin layer.
The laminate has a substrate, a transparent electrode pattern, a second resin layer arranged adjacent to the transparent electrode pattern, and a curable resin layer arranged adjacent to the second resin layer. It is particularly preferable that the refractive index of the above-mentioned second resin layer is higher than the refractive index of the above-mentioned curable resin layer, and more particularly that the refractive index of the above-mentioned second resin layer is 1.6 or more. preferable. With such a configuration, it is possible to solve the problem that the transparent electrode pattern is visually recognized.

<Structure of laminated body>
The laminate of the present invention is a transparent film having a refractive index of 1.6 to 1.78 and a thickness of 55 to 110 nm on the side of the transparent electrode pattern opposite to the side on which the second resin layer is formed. Is preferable from the viewpoint of further improving the concealing property of the transparent electrode pattern. In the present specification, when the term "transparent film" is used without particular notice, it refers to the above-mentioned "transparent film having a refractive index of 1.6 to 1.78 and a thickness of 55 to 110 nm".
The laminate of the present invention further has a transparent substrate on the side opposite to the side on which the above-mentioned transparent electrode pattern of the above-mentioned transparent film having a refractive index of 1.6 to 1.78 and a thickness of 55 to 110 nm is formed. Is preferable.

FIG. 11 shows an example of the configuration of the laminated body of the present invention.
FIG. 11 shows a transparent substrate 1, a transparent film 11 having a refractive index of 1.6 to 1.78 and a thickness of 55 to 110 nm, a transparent electrode pattern 4, a second resin layer 12, and a curable resin layer. 7 has a region 21 stacked in this order in the plane. Further, in FIG. 11, in the above-mentioned laminated body, in addition to the above-mentioned region, the transparent substrate 1 and the transparent film 11 are laminated in this order (in the configuration of FIG. 11, the second resin layer 12 and the curable resin). It is shown that the layer 7 includes a region 22 in which the layers 7 are laminated in this order (that is, a non-patterned region 22 in which the transparent electrode pattern is not formed).
In other words, the above-mentioned laminate includes a region 21 in which the transparent substrate 1, the transparent film 11, the transparent electrode pattern 4, the second resin layer 12, and the curable resin layer 7 are laminated in this order in the in-plane direction.
The in-plane direction means a direction substantially parallel to a surface parallel to the transparent substrate of the laminated body. Therefore, the fact that the transparent electrode pattern 4, the second resin layer 12, and the curable resin layer 7 are laminated in this order in the plane includes the transparent electrode pattern 4, the second resin layer 12, and the curable resin layer. It means that the normal projection of the region where 7 is laminated in this order on the plane parallel to the transparent substrate of the laminated body exists in the plane parallel to the transparent substrate of the laminated body.
Here, when the laminate of the present invention is used in a capacitance type input device described later, the transparent electrode patterns are the first transparent electrode pattern and the second transparent electrode pattern in two directions substantially orthogonal to each other in the row direction and the column direction, respectively. It may be provided as an electrode pattern (see, for example, FIG. 3). For example, in the configuration of FIG. 3, the transparent electrode pattern in the laminated body of the present invention may be the second transparent electrode pattern 4 or the pad portion 3a of the first transparent electrode pattern 3. In other words, in the following description of the laminated body of the present invention, the reference numeral of the transparent electrode pattern may be represented by "4". The transparent electrode pattern in the laminated body of the present invention is not limited to the use for the second transparent electrode pattern 4 in the capacitance type input device of the present invention, and is used, for example, as the pad portion 3a of the first transparent electrode pattern 3. You may.

The laminate of the present invention preferably contains a non-patterned region in which the above-mentioned transparent electrode pattern is not formed. In the present specification, the non-patterned region means a region in which the transparent electrode pattern 4 is not formed.
FIG. 11 shows an embodiment in which the laminate of the present invention includes a non-patterned region 22.
In the laminated body of the present invention, the above-mentioned transparent substrate, the above-mentioned transparent film, and the above-mentioned second resin layer are laminated in this order on at least a part of the non-pattern region 22 on which the above-mentioned transparent electrode pattern is not formed. It is preferable to include the region in the plane.
In the laminated body of the present invention, the above-mentioned transparent film and the above-mentioned second resin layer are adjacent to each other in the region where the above-mentioned transparent substrate, the above-mentioned transparent film and the above-mentioned second resin layer are laminated in this order. It is preferable to have.
However, in the other region of the non-patterned region 22 described above, other members may be arranged at arbitrary positions as long as it does not contradict the gist of the present invention. When used in a mold input device, the mask layer 2 in FIG. 1A, the insulating layer 5, another conductive element 6, and the like can be laminated.

In the laminate of the present invention, it is preferable that the above-mentioned transparent substrate and transparent film are adjacent to each other.
FIG. 11 shows a mode in which the above-mentioned transparent film 11 is laminated adjacent to the above-mentioned transparent substrate 1.
However, a third transparent film may be laminated between the above-mentioned transparent substrate and the above-mentioned transparent film as long as it does not contradict the gist of the present invention. For example, it is preferable to include a third transparent film having a refractive index of 1.5 to 1.52 (not shown in FIG. 11) between the above-mentioned transparent substrate and the above-mentioned transparent film.

The thickness of the transparent film of the laminate is preferably 55 to 110 nm, more preferably 60 to 110 nm, and particularly preferably 70 to 90 nm.
Here, the transparent film described above may have a single-layer structure or a laminated structure of two or more layers. When the transparent film has a laminated structure of two or more layers, the thickness of the transparent film means the total thickness of all the layers.

In the laminated body, it is preferable that the above-mentioned transparent film and the above-mentioned transparent electrode pattern are adjacent to each other.
FIG. 11 shows a mode in which the above-mentioned transparent electrode pattern 4 is laminated adjacent to a part of the above-mentioned transparent film 11.
The shape of the end portion of the transparent electrode pattern 4 described above is not particularly limited, but may have a tapered shape as shown in FIG. 11. For example, the surface on the transparent substrate side described above is described above. It may have a tapered shape wider than the surface opposite to the transparent substrate of.
Here, when the end of the transparent electrode pattern described above has a tapered shape, the angle of the end of the transparent electrode pattern (hereinafter, also referred to as a taper angle) is preferably 30 ° or less, preferably 0.1 to 15 ° C. It is more preferably °, and particularly preferably 0.5 to 5 °.
The method for measuring the taper angle in the present specification can be obtained by taking a micrograph of the end of the transparent electrode pattern described above, approximating the tapered portion of the micrograph to a triangle, and directly measuring the taper angle. ..
FIG. 10 shows an example in which the end portion of the transparent electrode pattern has a tapered shape. The triangle that approximates the tapered portion in FIG. 10 has a bottom surface of 800 nm and a height (thickness of the upper bottom portion substantially parallel to the bottom surface) of 40 nm, and the taper angle α at this time is about 3 °. The bottom surface of the triangle that approximates the tapered portion is preferably 10 to 3000 nm, more preferably 100 to 1500 nm, and particularly preferably 300 to 1000 nm.
The preferable range of the height of the triangle that approximates the tapered portion is the same as the preferable range of the thickness of the transparent electrode pattern.

The laminate of the present invention preferably contains a region in which the above-mentioned transparent electrode pattern and the above-mentioned second resin layer are adjacent to each other.
In FIG. 11, in the region 21 in which the above-mentioned transparent electrode pattern, the above-mentioned second resin layer and the above-mentioned curable resin layer are laminated in this order, the above-mentioned transparent electrode pattern, the above-mentioned second resin layer and the curable resin are shown. Aspects in which the layers are adjacent to each other are shown.

Further, in the laminated body of the present invention, both the above-mentioned transparent electrode pattern and the above-mentioned non-pattern region 22 on which the above-mentioned transparent electrode pattern is not formed are continuously directly formed by the above-mentioned transparent film and the above-mentioned second resin layer. Alternatively, it is preferably coated via another layer.
Here, "continuously" means that the above-mentioned transparent film and the above-mentioned second resin layer are not a pattern film but a continuous film. That is, it is preferable that the above-mentioned transparent film and the above-mentioned second resin layer do not have an opening from the viewpoint of making the transparent electrode pattern difficult to see.
Further, it is preferable that the transparent electrode pattern and the non-patterned region 22 described above are directly coated by the transparent film and the second resin layer described above, rather than being coated via other layers. Examples of the "other layer" in the case of being coated via another layer include the insulating layer 5 included in the capacitance type input device of the present invention described later and the capacitance type input device of the present invention described later. As described above, when two or more transparent electrode patterns are included, a second layer of transparent electrode patterns and the like can be mentioned.
FIG. 11 shows a mode in which the above-mentioned second resin layer 12 is laminated. The second resin layer 12 described above is laminated over a region on the transparent film 11 where the transparent electrode pattern 4 is not laminated and a region where the transparent electrode pattern 4 is laminated. That is, the above-mentioned second resin layer 12 is adjacent to the above-mentioned transparent film 11, and the above-mentioned second resin layer 12 is adjacent to the above-mentioned transparent electrode pattern 4.
When the end of the transparent electrode pattern 4 has a tapered shape, it is preferable that the above-mentioned second resin layer 12 is laminated along the tapered shape (with the same inclination as the taper angle).

FIG. 11 shows an embodiment in which the curable resin layer 7 is laminated on the surface of the second resin layer 12 described above, which is opposite to the surface on which the transparent electrode pattern is formed. There is.

<Material of laminate>
(Transparent board)
The laminate of the present invention has a substrate including electrodes of a capacitive input device. The substrate including the electrodes of the capacitance type input device preferably has the electrodes as separate members from the substrate.
In the laminate of the present invention, the transparent substrate described above is preferably a glass substrate or a transparent film substrate, and more preferably a transparent film substrate. The refractive index of the above-mentioned transparent substrate is preferably 1.5 to 1.55, and particularly preferably 1.5 to 1.52.
The above-mentioned transparent substrate may be made of a translucent substrate such as a glass substrate, and tempered glass typified by Corning's gorilla glass can be used. Further, as the above-mentioned transparent substrate, the materials used in JP-A-2010-86684, JP-A-2010-152809 and JP-A-2010-257492 can be preferably used.
When a transparent film substrate is used as the transparent substrate, it is more preferable to use one that is not optically distorted or has high transparency. Specific examples of the transparent film substrate include a transparent film substrate containing polyethylene terephthalate (PET), polyethylene naphthalate, polycarbonate, triacetyl cellulose or cycloolefin resin.

(Transparent electrode pattern)
The refractive index of the above-mentioned transparent electrode pattern is preferably 1.75 to 2.1.
The material of the transparent electrode pattern described above is not particularly limited, and a known material can be used. For example, it can be produced by using a translucent conductive metal oxide film such as ITO or IZO, or a metal film. Examples of such a metal oxide film and a metal film include an ITO film; a metal film such as Al, Zn, Cu, Fe, Ni, Cr, and Mo; and a metal oxide film such as _{SiO 2.} At this time, the thickness of each element can be 10 to 200 nm. Further, since the amorphous ITO film is made into a polycrystalline ITO film by firing, the electrical resistance can be reduced. Further, the first transparent electrode pattern 3 described above, the second transparent electrode pattern 4 and another conductive element 6 described later are photosensitive having a conductive photocurable resin layer using conductive fibers. It can also be manufactured using a film. In addition, when the first conductive pattern or the like is formed by ITO or the like, paragraphs 0014 to 0016 of Japanese Patent No. 4506785 can be referred to. Among them, the transparent electrode pattern described above is preferably an ITO film.
The laminate of the present invention preferably has the above-mentioned transparent electrode pattern as an ITO film having a refractive index of 1.75 to 2.1.

(Curable resin layer and second resin layer)
The preferable range of the curable resin layer and the second resin layer contained in the laminate of the present invention is the same as the preferable range of the above-mentioned curable resin layer and the above-mentioned second resin layer in the transfer film of the present invention. ..
Among them, it is preferable that the curable resin layer contains a carboxylic acid anhydride from the viewpoint of providing an electrode protective film for a capacitance type input device having excellent wet and heat resistance. By adding blocked isocyanate to the carboxyl group-containing resin of the curable resin layer and thermally cross-linking it, the three-dimensional cross-linking density can be increased, and the carboxyl groups of the carboxyl group-containing resin can be made anhydrous and made hydrophobic. , It is presumed to contribute to the improvement of moist heat resistance.
The method for incorporating the carboxylic acid anhydride in the curable resin layer is not particularly limited, but the curable resin layer after transfer is heat-treated to obtain at least a part of the carboxyl group-containing acrylic resin as the carboxylic acid anhydride. The method is preferred. When at least one of the polymerizable compounds contains a carboxyl group, the carboxyl group-containing acrylic resin and the carboxyl group-containing polymerizable compound may form a carboxylic acid anhydride, and may contain a carboxyl group. The polymerizable compounds may form a carboxylic acid anhydride.

(Transparent film)
In the laminate of the present invention, the above-mentioned transparent film has a refractive index of 1.6 to 1.78, preferably 1.65 to 1.74. Here, the transparent film described above may have a single-layer structure or a laminated structure of two or more layers. When the transparent film has a laminated structure of two or more layers, the refractive index of the transparent film means the refractive index of all layers.
As long as the range of the refractive index is satisfied, the material of the transparent film described above is not particularly limited.

The preferred range of the material of the transparent film and the preferred range of physical properties such as the refractive index are the same as those of the second resin layer described above.
In the laminate of the present invention, it is preferable that the above-mentioned transparent film and the above-mentioned second resin layer are made of the same material from the viewpoint of optical homogeneity.

In the laminate of the present invention, the transparent film described above is preferably a transparent resin film.
The metal oxide particles, resin (binder), and other additives used in the transparent resin film are not particularly limited as long as they do not contradict the gist of the present invention, and can be applied to the above-mentioned second resin layer in the transfer film of the present invention. The resin and other additives used can be preferably used.
In the laminate of the present invention, the transparent film described above may be an inorganic film. Examples of the material used for the inorganic film include the material used for the above-mentioned second resin layer.

(Third transparent film)
The refractive index of the third transparent film described above is preferably 1.5 to 1.55, which is preferable from the viewpoint of improving the hiding property of the transparent electrode pattern by approaching the refractive index of the transparent substrate described above. It is more preferably ~ 1.52.

<Manufacturing method of laminated body>
The method for producing the laminate of the present invention is not limited, and it can be produced by a known method.
Among them, the laminate of the present invention is produced by a production method including a step of laminating the above-mentioned second resin layer and the above-mentioned curable resin layer of the transfer film of the present invention on a transparent electrode pattern in this order. Is preferable. With such a configuration, the second resin layer of the laminate and the above-mentioned curable resin layer can be collectively transferred, and the laminate without the problem of visually recognizing the transparent electrode pattern can be easily and productively produced. Can be manufactured.
The above-mentioned second resin layer in the method for producing a laminated body is formed on the above-mentioned transparent electrode pattern and, in the above-mentioned non-pattern region, directly on the above-mentioned transparent film or via another layer. Will be done.

(Surface treatment of transparent substrate)
Further, in order to improve the adhesion of each layer after laminating in the subsequent transfer step, among the surfaces of the transparent substrate (the surface of the transparent substrate constituting the capacitance type input device) of the transparent substrate (front plate) in advance. Surface treatment can be applied to the surface on the side opposite to the surface on which the input means such as a finger is brought into contact. As the above-mentioned surface treatment, it is preferable to carry out a surface treatment (silane coupling treatment) using a silane compound. The silane coupling agent preferably has a functional group that interacts with the photosensitive resin. For example, a solution containing a silane coupling agent (0.3% by mass aqueous solution of N-β (aminoethyl) γ-aminopropyltrimethoxysilane, trade name: KBM603, manufactured by Shin-Etsu Chemical Co., Ltd.) is sprayed with a shower for 20 seconds. Shower clean with pure water. After that, the reaction is carried out by heating. A heating tank may be used, and the reaction can be promoted by preheating the substrate of the laminator.

(Transparent electrode pattern film formation)
The above-mentioned transparent electrode pattern uses the method of forming the first transparent electrode pattern 3, the second transparent electrode pattern 4, and another conductive element 6 in the description of the capacitance type input device of the present invention described later. Therefore, a film can be formed on a transparent substrate or a transparent film having a refractive electrode of 1.6 to 1.78 and a thickness of 55 to 110 nm, and a method using a photosensitive film described later is preferable.

(Film formation of curable resin layer and second resin layer)
The method for forming the curable resin layer includes a protective film removing step of removing the protective film from the transfer film of the present invention and a transfer step of transferring the curable resin layer of the transfer film from which the protective film has been removed onto a transparent electrode pattern. A method including an exposure step of exposing the curable resin layer transferred onto the transparent electrode pattern and a developing step of developing the exposed curable resin layer can be mentioned.
When the transfer film of the present invention has a second resin layer, it is preferable that the curable resin layer and the second resin layer are simultaneously transferred, exposed and developed in the transfer step, the exposure step and the developing step.

-Transfer process-
The above-mentioned transfer step is a step of transferring the curable resin layer (preferably the curable resin layer and the second resin layer) of the transfer film from which the above-mentioned protective film has been removed onto the transparent electrode pattern.
At this time, a method including a step of laminating the curable resin layer (preferably the curable resin layer and the second resin layer) of the transfer film on the transparent electrode pattern and then removing the temporary support is preferable.
The transfer (bonding) of the curable resin layer (preferably the curable resin layer and the second resin layer) to the surface of the transparent electrode pattern is performed by the curable resin layer (preferably the curable resin layer and the second resin layer). Is superposed on the surface of the transparent electrode pattern, and is pressurized and heated. For bonding, known laminators such as a laminator, a vacuum laminator, and an auto-cut laminator capable of further increasing productivity can be used.

-Exposure process, development process, and other processes-
As an example of the above-mentioned exposure step, development step, and other steps, the method described in paragraphs 0035 to 0051 of JP-A-2006-23696 can be preferably used in the present invention.

The above-mentioned exposure step is a step of exposing the curable resin layer (preferably the curable resin layer and the second resin layer) transferred onto the transparent electrode pattern.
Specifically, a predetermined mask is placed above the curable resin layer (preferably the curable resin layer and the second resin layer) and the temporary support formed on the transparent electrode pattern described above, and then above the mask. A method of exposing a curable resin layer (preferably a curable resin layer and a second resin layer) from the light source of the above (via a mask and a temporary support) can be mentioned.
Here, the light source for the above-mentioned exposure is one that can irradiate light in a wavelength region (for example, 365 nm, 405 nm, etc.) capable of curing the curable resin layer (preferably the curable resin layer and the second resin layer). If there is, it can be appropriately selected and used. Specific examples thereof include ultra-high pressure mercury lamps, high pressure mercury lamps, and metal halide lamps. The exposure amount is usually ^{about 5 to 200 mJ / cm 2} , preferably about 10 to 100 mJ / cm ^2.

The development step described above is a step of developing the exposed curable resin layer (preferably the curable resin layer and the second resin layer).
In the present invention, the above-mentioned developing step is a developing step in a narrow sense in which a pattern-exposed curable resin layer (preferably a curable resin layer and a second resin layer) is pattern-developed with a developing solution.
The above-mentioned development can be performed using a developing solution. The developer is not particularly limited, and a known developer such as the developer described in JP-A-5-72724 can be used. The developer is preferably a developer in which the photocurable resin layer has a dissolution-type development behavior. For example, pKa (The negative domain of the acid dissociation constant; Ka is a compound of acid dissociation constant) = 7 to 13. A developer containing a concentration of .05 to 5 mol / L is preferable. On the other hand, when the curable resin layer (preferably the curable resin layer and the second resin layer) itself does not form a pattern, the developer has a development behavior of a type that does not dissolve the above-mentioned non-alkali development type coloring composition layer. A developing solution is preferable, and for example, a developing solution containing a compound having pKa = 7 to 13 at a concentration of 0.05 to 5 mol / L is preferable. A small amount of an organic solvent miscible with water may be further added to the developing solution. Organic solvents that are miscible with water include methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-butyl ether, and benzyl alcohol. , Acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, ε-caprolactam, N-methylpyrrolidone and the like. The concentration of the organic solvent is preferably 0.1% by mass to 30% by mass.
Further, a known surfactant can be further added to the above-mentioned developer. The concentration of the surfactant is preferably 0.01% by mass to 10% by mass.

The development method described above may be any of paddle development, shower development, shower & spin development, dip development and the like. Here, the above-mentioned shower development will be described. By spraying the developing solution on the above-mentioned curable resin layer and the above-mentioned second resin layer after exposure by a shower, the uncured portion can be removed. When a thermoplastic resin layer or an intermediate layer is provided, an alkaline liquid having low solubility in the photocurable resin layer is sprayed by a shower or the like before development to remove the thermoplastic resin layer and the intermediate layer. It is preferable to keep it. Further, after the development, it is preferable to spray a cleaning agent or the like with a shower and rub with a brush or the like to remove the development residue. The liquid temperature of the developing solution is preferably 20 ° C. to 40 ° C., and the pH of the developing solution is preferably 8 to 13.

The method for manufacturing the capacitance type input device described above may include other steps such as a post-exposure step and a post-baking step. When the curable resin layer (preferably the curable resin layer and the second resin layer) is thermosetting, it is preferable to carry out a post-baking step.

The patterning exposure and the entire surface exposure may be performed after the temporary support is peeled off, or may be exposed before the temporary support is peeled off, and then the temporary support may be peeled off. The exposure may be through a mask, or may be digital exposure using a laser or the like.

-Heating process-
The method for producing the laminate preferably includes a step of heat-treating the curable resin layer after transfer, and heat-treats the curable resin layer after transfer to make at least a part of the carboxyl group-containing acrylic resin carboxylic acid. It is more preferable to include a step of making an anhydride. The heat treatment of the curable resin layer after transfer is preferably after exposure and development, that is, a post-baking step after exposure and development. When the above-mentioned curable resin layer and the above-mentioned second resin layer are thermosetting, it is particularly preferable to carry out a post-baking step. Further, it is preferable to perform the post-baking step from the viewpoint of adjusting the resistance value of the transparent electrode such as ITO.
A film substrate is used as a substrate when the heating temperature in the step of heat-treating the curable resin layer after transfer to convert at least a part of the carboxyl group-containing acrylic resin into a carboxylic acid anhydride is 100 to 160 ° C. It is preferable in some cases, and more preferably 140 to 150 ° C.

(Transparent film formation)
The laminate of the present invention is a transparent film having a refractive index of 1.6 to 1.78 and a thickness of 55 to 110 nm on the side opposite to the side of the transparent electrode pattern on which the second resin layer is formed. The above-mentioned transparent film is preferably formed directly on the above-mentioned transparent electrode pattern or through another layer such as the above-mentioned third transparent film.
The method for forming the transparent film described above is not particularly limited, but it is preferable to form the film by transfer or sputtering.
Among them, the laminated body is preferably formed by transferring the above-mentioned transparent film onto the above-mentioned transparent substrate by transferring the curable resin layer for forming the transparent film formed on the temporary support. It is more preferable that the film is later cured to form a film. As the transfer and curing methods, the photosensitive film described in the description of the capacitance type input device of the present invention described later is used, and the above-mentioned curable resin layer and the above-mentioned second resin layer in the method for producing a laminate are transferred. Examples of the method of performing transfer, exposure, development and other steps in the same manner as the method of performing the process. In that case, it is preferable to adjust the refractive index of the transparent film within the above range by dispersing the above-mentioned metal oxide particles in the photocurable resin layer in the photosensitive film.

On the other hand, when the above-mentioned transparent film is an inorganic film, it is preferably formed by sputtering.
As the method of sputtering, the methods used in JP-A-2010-86684, JP-A-2010-152809 and JP-A-2010-257492 can be preferably used.

(Third transparent film formation)
The above-mentioned third transparent film forming method is the same as the method for forming a transparent film having a refractive index of 1.6 to 1.78 and a thickness of 55 to 110 nm on a transparent substrate.

The method for producing the laminate preferably includes a step of simultaneously curing the curable resin layer and the second resin layer, and more preferably includes a step of simultaneously curing the pattern. In the transfer film of the present invention, it is preferable that the curable resin layer is laminated and then the second resin layer is laminated without curing the curable resin layer. The curable resin layer and the second resin layer transferred from the transfer film of the present invention thus obtained can be cured at the same time. Thereby, after the curable resin layer and the second resin layer are transferred from the transfer film of the present invention onto the transparent electrode pattern, it can be developed into a desired pattern by photolithography.
The method for producing the laminate is that after the step of simultaneously curing the curable resin layer and the second resin layer, only the uncured portion of the curable resin layer and the second resin layer (in the case of photocuring, only the unexposed portion). Or, it is more preferable to include a step of developing and removing (only the exposed portion).

[Capacitive input device]
The capacitance type input device of the present invention includes the electrode protective film of the capacitance type input device of the present invention or the laminate of the present invention.
In the capacitance type input device, it is preferable that the above-mentioned curable resin layer of the transfer film is laminated on the transparent substrate including the transparent electrode pattern by using the transfer film of the present invention. It is more preferable that the above-mentioned second resin layer and the above-mentioned curable resin layer of the transfer film are laminated in this order on the transparent substrate including the transparent electrode pattern. The second resin layer and the curable resin layer arranged adjacent to the above-mentioned second resin layer were transferred from the transfer film of the present invention onto the transparent electrode pattern of the capacitance type input device. Is particularly preferable.
In the capacitance type input device of the present invention, it is preferable that the curable resin layer and the second resin layer transferred from the transfer film are cured at the same time, and the curable resin layer and the second resin layer are simultaneously patterned and cured. It is more preferable to be done. When the curable resin layer and the second resin layer transferred from the transfer film are cured at the same time, it is preferable that the temporary support is not peeled off from the transfer film.
The capacitance type input device of the present invention develops and removes the uncured portion of the curable resin layer and the second resin layer which are transferred from the transfer film of the present invention and simultaneously pattern-cured. preferable. It is preferable to peel off the protective film from the transfer film of the present invention after simultaneously curing the curable resin layer and the second resin layer transferred from the transfer film of the present invention and before developing. Since the capacitance type input device of the present invention needs to be connected to the flexible wiring formed on the polyimide film at the terminal portion of the routing wiring, it is covered with a curable resin layer (and a second resin layer). It is preferable not to.
The aspect is shown in FIG. FIG. 13 shows a capacitance type input device having the following configuration, which includes a routing wiring (another conductive element 6) of a transparent electrode pattern and a terminal portion 31 of the routing wiring.
Since the curable resin layer on the terminal portion 31 of the routing wiring is an uncured portion (unexposed portion), it is removed by development, and the terminal portion 31 of the routing wiring is exposed.
Specific exposure and development modes are shown in FIGS. 14 and 9. FIG. 14 shows a state in which the transfer film 30 of the present invention having the curable resin layer and the second resin layer is laminated on the transparent electrode pattern of the capacitance type input device by lamination and cured by exposure or the like. Is shown. When photolithography is used, that is, when curing is performed by exposure, the cured resin layer having the shape shown in FIG. 9 and the cured portion (exposed portion) 33 of the second resin layer are patterned and unexposed using a mask. It can be obtained by developing the exposed portion. Specifically, in FIG. 9, the opening 34 corresponding to the terminal portion of the routing wiring as the uncured portion of the curable resin layer and the second resin layer, and the outside of the outline of the frame portion of the capacitance type input device. The curable resin layer and the curable resin layer for not covering the terminal portion (take-out wiring portion) of the routing wiring from which the end portion of the transfer film of the present invention having the protruding curable resin layer and the second resin layer have been removed. A cured portion (desired pattern) of the second resin layer is obtained.
As a result, the flexible wiring produced on the polyimide film can be directly connected to the terminal portion 31 of the routing wiring, whereby the signal of the sensor can be sent to the electric circuit.
The capacitance type input device of the present invention has a transparent electrode pattern, a second resin layer arranged adjacent to the transparent electrode pattern, and a curable resin arranged adjacent to the second resin layer. A laminated body having a layer, the refractive index of the second resin layer described above being higher than the refractive index of the curable resin layer described above, and the refractive index of the second resin layer described above being 1.6 or more. It is preferable to have.
Hereinafter, the details of the preferred embodiment of the capacitance type input device of the present invention will be described.

The capacitance type input device of the present invention has a front plate (corresponding to the above-mentioned transparent substrate in the laminate of the present invention) and at least the following (3) to (5) on the non-contact surface side of the above-mentioned front plate. It has the elements (7) and (8), and preferably has the laminate of the present invention.
(3) A plurality of first transparent electrode patterns formed by a plurality of pad portions extending in the first direction via a connecting portion;
(4) A plurality of second electrode patterns composed of a plurality of pad portions that are electrically insulated from the above-mentioned first transparent electrode pattern and are formed so as to extend in a direction intersecting the above-mentioned first direction;
(5) An insulating layer that electrically insulates the above-mentioned first transparent electrode pattern and the above-mentioned second electrode pattern;
(7) A second resin layer formed so as to cover all or part of the above-mentioned elements (3) to (5);
(8) A curable resin layer formed adjacently so as to cover the above-mentioned element (7).
Here, the above-mentioned second resin layer (7) corresponds to the above-mentioned second resin layer in the laminate of the present invention. Further, the above-mentioned (8) curable resin layer corresponds to the above-mentioned curable resin layer in the laminate of the present invention. The above-mentioned curable resin layer is preferably a so-called transparent protective layer in a generally known capacitance type input device.

In the capacitance type input device of the present invention, the above-mentioned (4) second electrode pattern may or may not be a transparent electrode pattern, but a transparent electrode pattern is preferable.
The capacitive input device of the present invention further comprises (6) the above-mentioned first transparent electrode pattern, which is electrically connected to at least one of the above-mentioned first transparent electrode pattern and the above-mentioned second electrode pattern. It may have a conductive element different from the pattern and the above-mentioned second electrode pattern.
Here, when the above-mentioned (4) second electrode pattern is not a transparent electrode pattern and the above-mentioned (6) does not have another conductive element, the above-mentioned (3) first transparent electrode pattern is It corresponds to the transparent electrode pattern in the laminated body of the present invention.
When the above-mentioned (4) second electrode pattern is a transparent electrode pattern and does not have the above-mentioned (6) another conductive element, the above-mentioned (3) first transparent electrode pattern and the above-mentioned (4) ) At least one of the second electrode patterns corresponds to the transparent electrode pattern in the laminate of the present invention.
When the above-mentioned (4) second electrode pattern is not a transparent electrode pattern and has the above-mentioned (6) another conductive element, the above-mentioned (3) first transparent electrode pattern and the above-mentioned (6) At least one of the conductive elements of the above corresponds to the transparent electrode pattern in the laminate of the present invention.
When the above-mentioned (4) second electrode pattern is a transparent electrode pattern and has the above-mentioned (6) another conductive element, the above-mentioned (3) first transparent electrode pattern and the above-mentioned (4) first At least one of the second electrode pattern and the other conductive element (6) described above corresponds to the transparent electrode pattern in the laminate of the present invention.

In the capacitance type input device of the present invention, (2) a transparent film is further formed between the above-mentioned (3) first transparent electrode pattern and the above-mentioned front plate, and the above-mentioned (4) second electrode pattern and the above-mentioned front surface. It is preferable to have it between the plates or between the above-mentioned another conductive element (6) and the above-mentioned front plate. Here, the fact that the above-mentioned transparent film (2) corresponds to a transparent film having a refractive index of 1.6 to 1.78 and a thickness of 55 to 110 nm in the laminated body of the present invention conceals the transparent electrode pattern. It is preferable from the viewpoint of further improving the sex.

The capacitive input device of the present invention preferably further has (1) a mask layer and / or a decorative layer, if necessary. The above-mentioned mask layer is provided as a black frame around the area touched by a finger or a touch pen so that the wiring of the transparent electrode pattern cannot be seen from the contact side or is decorated. The above-mentioned decorative layer is provided as a frame around the area touched by a finger or a touch pen for decoration, and it is preferable to provide, for example, a white decorative layer.
The above-mentioned (1) mask layer and / or decorative layer is between the above-mentioned (2) transparent film and the above-mentioned front plate, the above-mentioned (3) between the first transparent electrode pattern and the above-mentioned front plate, and the above-mentioned (4). It is preferably provided between the second transparent electrode pattern and the above-mentioned front plate, or between the above-mentioned (6) another conductive element and the above-mentioned front plate. It is more preferable that the above-mentioned (1) mask layer and / or decoration layer is provided adjacent to the above-mentioned front plate.

Even when the capacitance type input device of the present invention includes such various members, the above-mentioned second resin layer and the above-mentioned second resin arranged adjacent to the transparent electrode pattern By including the above-mentioned curable resin layer arranged adjacent to the layer, the transparent electrode pattern can be made inconspicuous, and the problem of hiding property of the transparent electrode pattern can be improved. Further, as described above, the transparent electrode pattern is sandwiched between the transparent film having a refractive index of 1.6 to 1.78 and a thickness of 55 to 110 nm and the second resin layer described above. Therefore, the problem of hiding property of the transparent electrode pattern can be improved.

<Configuration of capacitive input device>
First, a preferable configuration of the capacitance type input device of the present invention will be described together with a method of manufacturing each member constituting the device. FIG. 1A is a cross-sectional view showing a preferable configuration of the capacitance type input device of the present invention. In FIG. 1A, the capacitance type input device 10 includes a transparent substrate (front plate) 1, a mask layer 2, a transparent film 11 having a refractive index of 1.6 to 1.78 and a thickness of 55 to 110 nm, and a third layer. One transparent electrode pattern (shown is the connection portion 3b of the first transparent electrode pattern), a second transparent electrode pattern 4, an insulating layer 5, another conductive element 6, and a second. An embodiment composed of a resin layer 12 and a curable resin layer 7 is shown.
Further, FIG. 1B showing an XY cross section in FIG. 3 described later is also a cross-sectional view showing a preferable configuration of the capacitance type input device of the present invention. In FIG. 1B, the capacitance type input device 10 includes a transparent substrate (front plate) 1, a transparent film 11 having a refractive index of 1.6 to 1.78 and a thickness of 55 to 110 nm, and a first transparent electrode pattern. An embodiment composed of 3, a second transparent electrode pattern 4, a second resin layer 12, and a curable resin layer 7 is shown.

As the transparent substrate (front plate) 1, the material mentioned as the material of the transparent electrode pattern in the laminated body of the present invention can be used. Further, in FIG. 1A, the side on which each element of the transparent substrate 1 which is the front plate is provided is referred to as a non-contact surface side. In the capacitance type input device 10 of the present invention, input is performed by bringing a finger or the like into contact with the contact surface (the surface opposite to the non-contact surface) of the transparent substrate 1 which is the front plate.

Further, a mask layer 2 is provided on the non-contact surface of the transparent substrate 1 which is a front plate. The mask layer 2 is a frame-shaped pattern around the display area formed on the non-contact surface side of the touch panel front plate, and is formed so that the routing wiring and the like cannot be seen.
In the capacitance type input device 10 of the present invention, as shown in FIG. 2, the mask layer 2 covers a part of the transparent substrate 1 which is the front plate (the region other than the input surface in FIG. 2). Is provided. Further, the transparent substrate 1 which is the front plate may be partially provided with an opening 8 as shown in FIG. A pressing type mechanical switch can be installed in the opening 8.

On the non-contact surface of the transparent substrate 1 which is the front plate, a plurality of first transparent electrode patterns 3 formed by extending a plurality of pad portions in a first direction via a connecting portion, and a first A plurality of second transparent electrode patterns 4 composed of a plurality of pad portions that are electrically insulated from the transparent electrode pattern 3 and are formed so as to extend in a direction intersecting the first direction, and a first transparent electrode pattern. An insulating layer 5 that electrically insulates the third and the second transparent electrode pattern 4 is formed. As the first transparent electrode pattern 3, the second transparent electrode pattern 4, and another conductive element 6 described later, those listed as the material of the transparent electrode pattern in the laminate of the present invention can be used. It is possible, and it is preferable that it is an ITO film.

Further, at least one of the first transparent electrode pattern 3 and the second transparent electrode pattern 4 is on the opposite side of the non-contact surface of the transparent substrate 1 which is the front plate and the transparent substrate 1 which is the front plate of the mask layer 2. It can be installed across both areas of the surface. In FIG. 1A, the second transparent electrode pattern 4 straddles both the non-contact surface of the transparent substrate 1 which is the front plate and the surface opposite to the transparent substrate 1 which is the front plate of the mask layer 2. The figure installed is shown.
In this way, even when the photosensitive film is laminated over the mask layer that requires a certain thickness and the non-contact surface of the front plate, by using a photosensitive film having a specific layer structure described later, a vacuum laminator or the like can be used. It is possible to perform laminating without the generation of bubbles at the boundary of the mask portion in a simple process without using expensive equipment.

The first transparent electrode pattern 3 and the second transparent electrode pattern 4 will be described with reference to FIG. FIG. 3 is an explanatory diagram showing an example of the first transparent electrode pattern and the second transparent electrode pattern in the present invention. As shown in FIG. 3, the first transparent electrode pattern 3 is formed by the pad portion 3a extending in the first direction C via the connecting portion 3b. Further, the second transparent electrode pattern 4 is electrically insulated from the first transparent electrode pattern 3 by the insulating layer 5, and is in a direction intersecting the first direction C (second direction D in FIG. 3). ) Extends and is formed by a plurality of pad portions. Here, when the first transparent electrode pattern 3 is formed, the pad portion 3a and the connection portion 3b described above may be integrally manufactured, or only the connection portion 3b may be manufactured to form the pad portion 3a and the second. The transparent electrode pattern 4 of the above may be integrally manufactured (patterned). When the pad portion 3a and the second transparent electrode pattern 4 are integrally manufactured (patterned), as shown in FIG. 3, a part of the connecting portion 3b and a part of the pad portion 3a are connected and an insulating layer. Each layer is formed by 5 so that the first transparent electrode pattern 3 and the second transparent electrode pattern 4 are electrically insulated from each other.
Further, the region in which the first transparent electrode pattern 3 or the second transparent electrode pattern 4 in FIG. 3 or another conductive element 6 described later is not formed corresponds to the non-patterned region 22 in the laminated body of the present invention. ..

In FIG. 1A, another conductive element 6 is installed on the surface side opposite to the transparent substrate 1 which is the front plate of the mask layer 2. Another conductive element 6 is electrically connected to at least one of the first transparent electrode pattern 3 and the second transparent electrode pattern 4, and the first transparent electrode pattern 3 and the second transparent electrode pattern 4 Is another element.
FIG. 1A shows an aspect in which another conductive element 6 is connected to the second transparent electrode pattern 4.

Further, in FIG. 1A, the curable resin layer 7 is installed so as to cover all of the constituent elements. The curable resin layer 7 may be configured to cover only a part of each component. The insulating layer 5 and the curable resin layer 7 may be made of the same material or different materials. As the material constituting the insulating layer 5, those listed as the material of the curable resin layer or the second resin layer in the laminate of the present invention can be preferably used.

<Manufacturing method of capacitance type input device>
As an example of the embodiment formed in the process of manufacturing the capacitance type input device of the present invention, the embodiments shown in FIGS. 4 to 8 can be mentioned. FIG. 4 is a top view showing an example of the transparent substrate 1 in which the opening 8 is formed. FIG. 5 is a top view showing an example of the front plate on which the mask layer 2 is formed. FIG. 6 is a top view showing an example of a front plate on which the first transparent electrode pattern 3 is formed. FIG. 7 is a top view showing an example of a front plate on which the first transparent electrode pattern 3 and the second transparent electrode pattern 4 are formed. FIG. 8 is a top view showing an example of a front plate on which a conductive element 6 different from the first and second transparent electrode patterns is formed. These are examples that embody the following description, and the scope of the present invention is not construed as limiting by these drawings.

In the method of manufacturing a capacitance type input device, when the above-mentioned second resin layer 12 and the above-mentioned curable resin layer 7 are formed, the above-mentioned elements are arbitrarily formed by using the transfer film of the present invention. It can be formed by transferring the above-mentioned second resin layer and the above-mentioned curable resin layer to the surface of the transparent substrate 1 which is the front plate of the above.

In the method of manufacturing the capacitance type input device, at least one element of the mask layer 2, the first transparent electrode pattern 3, the second transparent electrode pattern 4, the insulating layer 5, and another conductive element 6. However, it is preferable that the film is formed by using a photosensitive film having a temporary base material and a photocurable resin layer in this order.
When the above-mentioned elements are formed by using the transfer film of the present invention or the above-mentioned photosensitive film, the resist component does not leak or protrude from the opening even in the transparent substrate (front plate) having the opening. In particular, in the mask layer where it is necessary to form a light-shielding pattern up to just above the boundary line of the edge of the front plate, the resist component does not leak or protrude from the edge of the transparent substrate, so that the non-contact surface of the transparent substrate is not contaminated. A thin and lightweight touch panel can be manufactured by a simple process.

The above-mentioned photosensitive film is used as a permanent material such as the first transparent electrode pattern, the second transparent electrode pattern, and the conductive element when the above-mentioned mask layer, insulating layer, and conductive photocurable resin layer are used. The photosensitive film may be laminated on a transparent substrate or the like, and then patterned-exposed, if necessary. The above-mentioned photosensitive film may be a negative type material or a positive type material. A pattern can be obtained by developing and removing an unexposed portion when the above-mentioned photosensitive film is a negative type material and an exposed portion when the photosensitive film is a positive type material. For development, the thermoplastic resin layer and the photocurable resin layer may be developed and removed with separate liquids, or may be removed with the same liquid. If necessary, known developing equipment such as a brush or a high-pressure jet may be combined. After development, post-exposure and post-baking may be performed as needed.

(Photosensitive film)
Photosensitive films other than the transfer film of the present invention, which are preferably used when manufacturing the capacitance type input device of the present invention, are described in [0222] to [0255] of JP-A-2014-178922. , The contents of this publication are incorporated herein by reference.

<Image display device>
The capacitance type input device of the present invention and the image display device provided with this capacitance type input device as a component are "Latest Touch Panel Technology" (Techno Times Co., Ltd., published on July 6, 2009), Mitani. Supervision of Yuji, "Touch Panel Technology and Development", CMC Publishing (2004, 12), FPD International 2009 Forum T-11 Lecture Textbook, Cypress Semiconductor Corporation Application Note AN2292, etc. can be applied. ..

Hereinafter, the present invention will be described in more detail with reference to examples. The materials, amounts used, ratios, treatment contents, treatment procedures, etc. shown in the following examples can be appropriately changed as long as they do not deviate from the gist of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. Unless otherwise specified, "parts" and "%" are based on mass.

[Example 1]
<Making a transfer film>
(Formation of curable resin layer)
On a polyethylene terephthalate film (temporary support) having a thickness of 75 μm, a slit-shaped nozzle was used to adjust a coating liquid for a curable resin layer composed of the following formulation 101 so that the thickness after drying was 10 μm. It was applied and dried at 100 ° C. for 2 minutes, and then further dried at 120 ° C. for 1 minute to form a curable resin layer.

-Coating liquid for curable resin layer: Formulation 101 (organic solvent-based resin composition)-
(Polymerizable compound)
・ Tricyclodecanedimethanol diacrylate 5.63 parts A-DCP: manufactured by Shin-Nakamura Chemical Industry Co., Ltd. ・ Carboxylic acid-containing monomer 0.93 parts Aronix TO2349: manufactured by Toagosei Co., Ltd. ・ Urethane acrylate 2.81 parts 8UX -015A: Made by Taisei Fine Chemical Co., Ltd.

(Binder polymer)
-The following compound A (acid value 95 mgKOH / g) 15.63 parts

(Polymerization initiator)
-Irgacare OXE-02: 0.11 part of BASF's photopolymerization initiator-Irgacare 907: 0.11 part of BASF's photopolymerization initiator

(Compound that can react with acid by heating)
-Duranate X3071.04: Block isocyanate manufactured by Asahi Kasei Chemicals Co., Ltd.
3.63 copies

(Additive)
・ Mega Fvck F551: 0.02 copy made by DIC Corporation

(Organic solvent)
・ 31.03 parts of 1-methoxy-2-propyl acetate ・ 40.00 parts of methyl ethyl ketone

(Formation of second resin layer)
Next, a coating liquid for a second resin layer consisting of the following formulation 201 was applied onto the curable resin layer after adjusting the thickness to 100 nm after drying, and dried at 80 ° C. for 1 minute. After that, it was further dried at 110 ° C. for 1 minute to form a second resin layer arranged in direct contact with the curable resin layer. Here, Formulation 201 is prepared using a resin having an acid group and an aqueous ammonia solution, and the resin having an acid group is neutralized with the aqueous ammonia solution and contains an ammonium salt of the resin having an acid group. The coating liquid for the second resin layer is prepared.

-Coating liquid for the second resin layer: Formulation 201 (water-based resin composition)-
(Resin having an acid group)
-Acrylic resin 0.47 parts Methacrylic acid / allyl methacrylate copolymer resin Weight average molecular weight 25,000, composition ratio (molar ratio) = 40/60, solid content 99.8%

(Monomer having an acid group)
・ Aronix TO-2349: Carboxylic acid-containing monomer 0.04 part manufactured by Toagosei Co., Ltd.

(particle)
-Nano Youth OZ-S30M: manufactured by Nissan Chemical Industries, Ltd. 4.28 parts Solid content 30.5%, methanol 69.5%, refractive index 2.2, average particle size of about 12 nm ZrO ₂ particles be.

(Metal oxidation inhibitor)
・ BT120: Benzotriazole 0.04 part manufactured by Johoku Chemical Industry Co., Ltd.

(Additive)
・ Mega Fvck F444 0.01 part DIC Corporation

(solvent)
・ Ammonia aqueous solution (2.5%) 7.84 parts ・ Distilled water 29.50 parts ・ Methanol 65.70 parts

(Formation of protective film)
For a laminate obtained in this order, the curable resin layer and the second resin layer arranged in direct contact with the curable resin layer are provided on the temporary support obtained as described above. Finally, the protective film A1 shown below was pressure-bonded onto the second resin layer to prepare the transfer film of Example 1.
-Protective film A1-
Name: Alfan FG201 (manufactured by Oji F-Tex Co., Ltd., polypropylene film)
Oxygen permeability ^{coefficient: 2500cm 3 · 25μm / m 2} · 24 hr · atm
Thickness: 30 μm
Surface roughness Ra: 40 nm

(Roll formation)
The obtained transfer film of Example 1 was wound into a roll shape so that the protective film was on the outside to form a roll. It was stored in a roll state at 40 ° C. and a relative humidity of 80% for 7 days.
In the evaluation of the transfer film described later, the transfer film unwound from the roll was used.

[Example 2]
In Example 1, the transfer film of Example 2 was produced in the same manner as in Example 1 except that the protective film A1 was replaced with the protective film A2 shown below.
-Protective film A2-
Name: Alfan E201F (manufactured by Oji F-Tex Co., Ltd., polypropylene film)
Oxygen permeability ^{coefficient: 2700cm 3 · 25μm / m 2} · 24 hr · atm
Thickness: 30 μm
Surface roughness Ra: 50 nm

[Example 3]
In Example 1, the transfer film of Example 3 was produced in the same manner as in Example 1 except that the protective film A1 was replaced with the protective film A3 shown below.
-Protective film A3-
Name: GF-8 (polyethylene film, NF-15 analog made by Tamapoli according to Example 1 of Japanese Patent No. 5257648)
Oxygen permeability ^{coefficient: 2600cm 3 · 25μm / m 2} · 24 hr · atm
Thickness: 30 μm
Surface roughness Ra: 60 nm

[Examples 4 to 14 and Comparative Examples 1 to 3]
In Example 1, transfer films of Examples 4 to 14 and Comparative Examples 1 to 3 were prepared in the same manner as in Example 1 except that the protective film A1 was replaced with the protective films A4 to A17 shown in the table below.
The characteristics of the protective films A4 to A17 are shown below.
The protective film A4 is a PET film.
The protective film A5 is a polyvinyl chloride film.
The protective film A6 is a polycarbonate film.
The protective film A7 is a highly oriented PET film.
The protective film A8 is a low density polyethylene film.
The protective film A9 is a smooth PET film.
The protective film A10 is a polypropylene film.
The protective film A11 is an ultra-smooth PET film.
The protective film A12 is a roughened polypropylene film.
The protective film A13 is a polypropylene film having a thickness of 12 μm.
The protective film A14 is a polypropylene film having a thickness of 15 μm.
The protective film A15 is a polypropylene film having a thickness of 20 μm.
The protective film A16 is a polypropylene film having a thickness of 70 μm.
The protective film A17 is a polypropylene film having a thickness of 80 μm.

[Examples 15 to 19]
In Example 1, but substituting respectively ZrO ₂ particles added to the second resin layer coating liquid so that the content shown in the following table in the same manner as in Example 1, transcription of Example 15 to 19 A film was made.

[Characteristics of transfer film]
<Double bond consumption rate>
The double bond consumption rate of the curable resin layer and the second resin layer was measured by the following method.
(1) Double bond consumption rate of the curable resin layer When the curable resin layer was applied and dried on the temporary support, a section of the curable resin layer was cut from the surface using a microtome. To 0.1 mg of this section, 2 mg of KBr powder was added and mixed well under a yellow light to prepare a measurement sample of a UV (ultraviolet) uncured product of the curable resin layer in the measurement of the double bond consumption rate.
FT-IR apparatus (Thermo Nicolet Japan Ltd., Nicolet 710) ^was used to measure the wavelength region of 400cm ^-1 ~4000cm -1, was determined peak intensity of 810 cm ^-1 derived from C = C bond. FT-IR is a Fourier Transform Infrared Spectroscopy. _{The peak intensity (residual amount of double bonds) A 1} of the UV uncured product of the curable resin layer only for coating and drying, and _{the peak intensity B 1} of the film section of the curable resin layer in the transfer films of each example and comparative example. Asked. The double bond consumption rate of the curable resin layer was calculated according to the following formula.
formula:
Double bond consumption rate of curable resin layer = {1- (B ₁ / A ₁ )} x 100%
In the transfer films of each Example and Comparative Example, the curable resin layer was not exposed after the curable resin layer was applied and dried on the temporary support. However, when a transfer film of a reference example in which a second resin layer or a protective film is laminated after the curable resin layer is applied and dried on the temporary support and the curable resin layer is exposed, the reference is made. _{The peak strength C 1} of the film section of the curable resin layer in the transfer film of the example is determined. Then, the double bond consumption rate of the curable resin layer in the transfer film of the reference example is calculated according to the following formula.
formula:
Double bond consumption rate of the curable resin layer in the transfer film of the reference example = {1- (C ₁ / A ₁ )} × 100%
Further, the peak intensity A ₁ of the UV uncured product of the curable resin layer may be obtained by separately preparing a UV uncured product sample of the curable resin layer for measuring _{A 1.} Specifically, the composition of the curable resin layer of the transfer film can be analyzed and specified, a UV uncured sample of the curable resin layer for _{A 1 measurement can be prepared, and A 1} can be obtained from this sample. ..

(2) Double bond consumption rate of the second resin layer When the second resin layer is applied and dried on the curable resin layer, the second resin layer is sectioned from the surface using a microtome. I cut it. To 0.1 mg of this section, 2 mg of KBr powder was added and mixed well under a yellow light to prepare a measurement sample of a UV uncured product of the second resin layer in the measurement of the double bond consumption rate.
FT-IR apparatus (Thermo Nicolet Japan Ltd., Nicolet 710) ^was used to measure the wavelength region of 400cm ^-1 ~4000cm -1, was determined peak intensity of 810 cm ^-1 derived from C = C bond. _{The peak intensity (double bond residual amount) A 2} of the UV uncured product of the second resin layer only for coating and drying, and the peak intensity of the film section of the second resin layer in the transfer films of each example and comparative example. I asked for B _2. The double bond consumption rate was calculated for the second resin layer according to the following formula.
formula:
Double bond consumption rate of the second resin layer = {1- (B ₂ / A ₂ )} x 100%
In the transfer films of each Example and Comparative Example, the second resin layer was not exposed after the second resin layer was applied and dried on the curable resin layer. However, in the case of producing a transfer film of a reference example in which a protective film is laminated after the second resin layer is applied and dried on the curable resin layer and the second resin layer is exposed, the transfer of the reference example is performed. _{The peak intensity C 2} of the film section of the second resin layer in the film is determined. Then, the double bond consumption rate of the second resin layer in the transfer film of the reference example is calculated according to the following formula.
formula:
Double bond consumption rate of the second resin layer in the transfer film of the reference example = {1- (C ₂ / A ₂ )} × 100%
_{Further, the peak intensity A 2} of the UV uncured product of the second resin layer may be obtained by separately preparing a UV uncured product sample of the curable resin layer for _{A 2 measurement.} Specifically, the composition of the second resin layer of the transfer film is analyzed and specified, a UV uncured sample of the second resin layer for _{A 2 measurement is prepared, and A 2} is obtained from this sample. Can be done.

The double bond consumption rates of the obtained curable resin layer and the second resin layer are shown in the table below.

<Refractive index and thickness>
For the refractive index n ₁ and thickness T _{1 of} the curable resin layer and the refractive index n ₂ and thickness T ₂ of the second resin layer, a reflection spectroscopic film thickness meter FE-3000 (manufactured by Otsuka Electronics Co., Ltd.) was used. Then, I asked for it as follows.
(1) A transparent adhesive tape (OCA tape 8171CL: manufactured by 3M Co., Ltd.) is provided on one surface of the temporary support used in each of the Examples and Comparative Examples, which is cut out to a length of 5 cm × 5 cm in length and width. , PT100 NB (manufactured by Lintec Co., Ltd.), which is a black polyethylene terephthalate (PET) material, was adhered to prepare a laminate. Using reflectance spectroscopy film thickness meter FE-3000, reflection spectrum of the laminate of the temporary support and the black PET (wavelength: 430~800nm) evaluated to determine the refractive index _{n 0} of the temporary support at each wavelength.
(2) A transparent adhesive tape is applied to the surface of the temporary support of the sample in which only the curable resin layer is formed on the temporary support in the same manner as in each example and the comparative example, which is cut out to a length of 5 cm × 5 cm in the vertical and horizontal sides. (OCA tape 8171CL: manufactured by 3M Co., Ltd.) was used to prepare a laminate in which a black PET material was brought into contact with the material. Using a transmission electron microscope (Transmission Electron Microscope; TEM: HT7700, Hitachi High-Tech Fielding Co., Ltd.), a structure analysis of a laminated body of a curable resin layer, a temporary support, and a black PET was performed. The thickness of the curable resin layer was measured at 10 points to obtain an average value, and the first estimated value T ₁ (I) of the average value of the thickness of the curable resin layer was obtained. Using a reflection spectroscopic film thickness meter FE-3000 manufactured by Otsuka Electronics Co., Ltd., the reflection spectrum (wavelength: 430 to 800 nm) of the laminated body of the curable resin layer, the temporary support and the black PET was evaluated, and curing at each wavelength was performed. _{The second estimated value T 1} (II) of the average value of the refractive index n ₁ of the sex resin layer and the thickness of the curable resin layer _{was determined, and the refractive index n 1} of the curable resin layer at a wavelength of 550 nm is shown in the table below. .. At this time, in order to consider the reflection at the interface between the curable resin layer and the temporary support, _{the value of the refractive index n 0} of the temporary support obtained in (1) above and the average value of the thicknesses of the curable resin layer are the first. The estimated value T _{1 (I) of 1 is input to the thickness calculation software attached to the FE3000, and then the refractive index n 1} of the curable resin layer and the refractive index n 1 of the curable resin layer are obtained from the reflection spectrum of the laminated body of the curable resin layer, the temporary support and the black PET. _{The second estimated value T 1} (II) of the average value of the thickness of the curable resin layer was obtained by fitting by simulation calculation.
(3) A transparent adhesive tape (Optically Clear Adhesive (OCA) tape) is provided on the surface of the temporary support of the transfer films of the Examples and Comparative Examples in which the protective film is peeled off, which is cut out to a length of 5 cm × 5 cm in the vertical and horizontal sides. A sample piece in which a black PET material was brought into contact was prepared via 8171CL: manufactured by 3M Co., Ltd. The sample piece is structurally analyzed using a transmission electron microscope (TEM), the thickness of the second resin layer is measured at 10 points to obtain an average value, and the estimated value T of the average value of the thickness of the second resin layer is obtained. ₂ (I) was calculated. For the sample piece, using the reflection spectroscopic film thickness meter FE-3000, the reflection spectrum of 200 measurement points (that is, 4 cm length) on a straight line in an arbitrary direction at a measurement spot: 40 μm in diameter and at 0.2 mm intervals. Was evaluated, and this was repeated for 5 rows at 1 cm intervals in the direction orthogonal to the above-mentioned linear direction, for a total of 1000 points. At this time, the reflection at the interface between the curable resin layer and the temporary support and the interface between the curable resin layer and the second resin layer are taken into consideration. _{Therefore, the second estimated value of the refractive index n 0} of the temporary support determined in (1) _{above, the refractive index n 1} of the curable resin layer determined in (2) above, and the average thickness of the curable resin layer. With T _{1 (II) and the estimated value T 2} (I) of the average thickness of the second resin layer substituted into the calculation formula, the second resin layer, the curable resin layer, and the temporary support From the reflection spectrum of the black PET laminate, the refractive index n _{2 of} the second resin layer and the thicknesses of the curable resin layer and the second resin layer at 1000 measurement points were obtained by fitting by simulation calculation. Further, the average value of the thicknesses of the curable resin layer and the second resin layer was calculated to obtain n ₁ , n ₂ , T ₁ , and T ₂ .
The fitting accuracy of the simulation can be improved by inputting the estimated values obtained by performing structural analysis on the thickness of the curable resin layer and the thickness of the second resin layer by TEM into the reflection spectroscopic film thickness meter.
The refractive index n ₂ of the refractive index n ₁ and a second resin layer of the cured resin layer described in the following Table.

<Oxygen permeability coefficient of protective film>
The oxygen permeability coefficient of the protective film was measured using a gas permeability measuring device GTR-31A (manufactured by GTR Tech Co., Ltd.) in accordance with the differential pressure method described in JIS K 7126-1.
The oxygen permeability coefficient of the obtained protective film is shown in the table below. JIS is a Japanese Industrial Standard (Japanese Industrial Standards).

<Surface roughness Ra of protective film>
Using ET-350K (manufactured by Kosaka Laboratory Co., Ltd.), which is a fine shape measuring instrument, the unevenness of the surface of the protective film was measured under the following conditions. The obtained measurement result was calculated according to JIS B 0601-2001 using the following three-dimensional analysis software, and the surface roughness Ra of the protective film was determined.
3D analysis software: TDA-22 (manufactured by Kosaka Laboratory Co., Ltd.)
・ Stylus pressure: 0.04mN
・ Measurement length: 0.5 mm
・ Feed speed: 0.1 mm / sec ・ Line pitch: 5 μm
・ Number of lines: 40 ・ Height magnification: × 50,000
-Measurement direction: MD direction (MD is Machine Direction)
The surface roughness Ra of the obtained protective film is shown in the table below.

[Evaluation of transfer film]
<Bubble>
The protective film of the obtained transfer film is not peeled off, and is visually observed under the illumination of a fluorescent lamp to extract bubbles having a diameter of 100 μm or more. The area of 1 m ² of the transfer film is observed three times, and the number of bubbles per ^{1 m 2 of the transfer film is calculated on average.}
The number of bubbles per 1 m ^{2 of the} transfer film was scored according to the following criteria.
5 points: 0 pieces / m ²
4 points: 1 / ^{m 2} less than 3 points: 1 / ^{m 2} or more, two / ^{m 2} less than 2 points: 2 / ^{m 2} or more, 10 / ^{m 2} less than 1 point: 10 / ^{m 2} or more The results obtained are listed in the table below. The evaluation of bubbles is practically necessary to be 3 to 5 points, preferably 4 or 5 points, and more preferably 5 points.

<Transfer defect>
The protective film of the obtained transfer film was peeled off. The surface of the peeled protective film was visually observed under the illumination of a fluorescent lamp, and transferred from the layer in contact with the protective film (second resin layer or curable resin layer) to the surface of the protective film, having a diameter of 100 μm or more. Extract the transcript. The area of 1 m ² of the protective film is observed three times, and the number of transcripts per ^{1 m 2 of the protective film is calculated on average.} The number of transferred substances per ^{1 m 2} of the surface of the protective film was defined as the number of transfer defects per ^{1 m 2 of the transfer film.}
The number of transfer defects per 1 m ^{2 of the} transfer film was scored according to the following criteria.
5 points: 0 pieces / m ²
4 points: 1 / ^{m 2} less than 3 points: 1 / ^{m 2} or more, two / ^{m 2} less than 2 points: 2 / ^{m 2} or more, 10 / ^{m 2} less than 1 point: 10 / ^{m 2} or more The results obtained are listed in the table below. The evaluation of the transfer defect is practically necessary to be 3 to 5 points, preferably 4 or 5 points, and more preferably 5 points.

<Dent>
(Number of dent defects)
The protective film of the obtained transfer film was peeled off. After the protective film is peeled off, the transfer film is visually observed under the illumination of a fluorescent lamp to extract a dent having a diameter of 100 μm or more. At this time, ^{the area of 1 m 2} of the transfer film is observed three times, and the number of dent defects per ^{1 m 2 of the transfer film is calculated on average.}
The number of dent defects per 1 m ^{2 of the} transfer film was scored according to the following criteria.
5 points: 0 pieces / m ²
4 points: 1 / ^{m 2} less than 3 points: 1 / ^{m 2} or more, two / ^{m 2} less than 2 points: 2 / ^{m 2} or more, 10 / ^{m 2} less than 1 point: 10 / ^{m 2} or more The results obtained are listed in the table below. The evaluation of the number of dent defects is preferably 3 to 5 points, more preferably 4 or 5 points, and particularly preferably 5 points.

(Simple evaluation of dents)
Thirty sheets of the obtained transfer film are cut out at a size of 10 cm square, stacked, and placed on a smooth aluminum plate. A sapphire needle having a diameter of 0.7 mm at the tip is pressed from above the transfer film with a load of 400 g for 10 minutes.
Then, the needle is removed and allowed to stand for 5 minutes, and then the number of transfer films in which the trace of the needle is visually observed is counted. The number of transfer films in which the traces of the needles were pressed was used as a simple evaluation of the dents.
The results obtained are listed in the table below. The smaller the simple evaluation of the dent (the number of transfer films in which the trace of the needle is pressed) is, the more the transfer film is prevented from being dented. The simple evaluation of the dents is preferably 10 or less, and more preferably 5 or less.

[Evaluation of laminated body]
<Manufacturing of laminated body>
(Preparation of transparent electrode pattern film used for fabrication of laminate)
-Formation of transparent film-
A cycloolefin resin film having a thickness of 38 μm and a refractive index of 1.53 is used as a wire electrode having an output voltage of 100%, an output of 250 W, a diameter of 1.2 mm, an electrode length of 240 mm, and a work electrode distance of 1.5 mm using a high-frequency oscillator. The surface was modified by corona discharge treatment for 3 seconds under the conditions of. The obtained film was used as a transparent film substrate.
Next, the material of Material-C shown in the table below is coated on a transparent film substrate using a slit-shaped nozzle, then irradiated with ultraviolet rays (integrated light amount 300 mJ / cm ² ) and dried at about 110 ° C. As a result, a transparent film having a refractive index of 1.60 and a thickness of 80 nm was formed.

構造式（３）

なお、本明細書中の「ｗｔ％」は「質量％」と同義である。

Structural formula (3)

In addition, "wt%" in this specification is synonymous with "mass%".

-Formation of transparent electrode layer-
A transparent film substrate on which a transparent film is formed is introduced into a vacuum chamber, and DC magnetron sputtering is performed using an ITO target (indium: tin = 95: 5 (molar ratio)) having _{a SnO 2 content of 10% by mass.} (Conditions: transparent film substrate temperature 150 ° C., argon pressure 0.13 Pa, oxygen pressure 0.01 Pa) forms an ITO thin film with a thickness of 40 nm and a refractive index of 1.82, and a transparent film and a transparent electrode are formed on the transparent film substrate. A layered film was obtained. The surface resistance of the ITO thin film was 80Ω / □ (square per Ω). DC is direct current.

-Preparation of photosensitive film E1 for etching-
A coating liquid for a thermoplastic resin layer having the following formulation H1 was applied and dried on a polyethylene terephthalate film temporary substrate having a thickness of 75 μm using a slit-shaped nozzle. Next, a coating liquid for an intermediate layer consisting of the following formulation P1 was applied and dried. Further, a coating liquid for an etching photocurable resin layer consisting of the following formulation E1 was applied and dried. In this way, a laminate composed of a thermoplastic resin layer having a dry thickness of 15.1 μm, an intermediate layer having a dry thickness of 1.6 μm, and a photocurable resin layer for etching having a thickness of 2.0 μm is formed on the temporary base material. Finally, a protective film (thickness 12 μm polypropylene film) was pressure-bonded. In this way, a photosensitive film E1 for etching, which is a transfer material in which a temporary base material, a thermoplastic resin layer, an intermediate layer (oxygen blocking film), and a photocurable resin layer for etching are integrated, was produced.

--Applying liquid for photocurable resin layer for etching: Formulation E1-
-Methyl methacrylate / styrene / methacrylic acid copolymer (copolymer composition (mass%): 31/40/29, weight average molecular weight 60,000,
Acid value 163 mgKOH / g): 16.0 parts by mass Monomer 1 (trade name: BPE-500, manufactured by Shin-Nakamura Chemical Industry Co., Ltd.): 5.6 parts by mass, hexaethylene oxide monomethacrylate 0.5 of hexamethylene diisocyanate Mol adduct
: 7.0 parts by mass ・ Cyclohexanedimethanol monoacrylate as a compound having one polymerizable group in the molecule
: 2.8 parts by mass, 2-chloro-N-butylacridone: 0.42 parts by mass, 2,2-bis (orthochlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole
: 2.17 parts by mass, malachite green oxalate: 0.02 parts by mass, leuco crystal violet: 0.26 parts by mass, phenothiazine: 0.013 parts by mass, surfactant (trade name: Megafuck F-780F, Made by Dainippon Ink Co., Ltd.)
: 0.03 parts by mass ・ Methyl ethyl ketone: 40 parts by mass ・ 1-methoxy-2-propanol: 20 parts by mass The viscosity of the coating liquid E1 for the photocurable resin layer for etching after removing the solvent is 2,500 Pa.・ It was seconds.

--Coating liquid for thermoplastic resin layer: Formulation H1-
-Methanol: 11.1 parts by mass-Propropylene glycol monomethyl ether acetate: 6.36 parts by mass-Methyl ethyl ketone: 52.4 parts by mass-Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymerization composition ratio) (Methyl ratio) = 55 / 11.7 / 4.5 / 28.8, weight average molecular weight = 100,000, Tg ≈ 70 ° C)
: 5.83 parts by mass ・ Styrene / acrylic acid copolymer (copolymerization composition ratio (molar ratio) = 63/37, weight average molecular weight = 10,000, Tg ≈ 100 ° C.)
: 13.6 parts by mass, monomer 1 (trade name: BPE-500, manufactured by Shin-Nakamura Chemical Industry Co., Ltd.): 9.1 parts by mass, fluorine-based polymer: 0.54 parts by mass The above-mentioned fluorine-based polymer is C. ₆ F ₁₃ CH ₂ CH ₂ OCOCH = CH ₂ 40 parts and H (OCH (CH ₃ ) CH ₂ ) ₇ OCOCH = CH ₂ 55 parts and H (OCH ₂ CH ₂ ) ₇ OCOCH = CH ₂ 5 parts It is a polymer, a solution having a weight average molecular weight of 30,000 and a methyl ethyl ketone 30% by mass (trade name: Megafuck F780F, manufactured by Dainippon Ink and Chemicals Co., Ltd.).

--Applying liquid for intermediate layer: Formulation P1-
Polyvinyl alcohol: 32.2 parts by mass (trade name: PVA205, manufactured by Kuraray Co., Ltd., saponification degree = 88%, polymerization degree 550)
-Polyvinylpyrrolidone: 14.9 parts by mass (Product name: K-30, manufactured by ASP Japan Co., Ltd.)
-Distilled water: 524 parts by mass-Methanol: 429 parts by mass

-Formation of transparent electrode pattern-
The surface of the transparent electrode layer and the surface of the photocurable resin layer for etching face each other in the photosensitive film E1 for etching from which the film in which the transparent film and the transparent electrode layer are formed on the transparent film substrate is washed and the protective film is removed. (Transparent film substrate temperature: 130 ° C., rubber roller temperature 120 ° C., linear pressure 100 N / cm, transport speed 2.2 m / min). After the temporary base material was peeled off, the thermoplastic resin layer and the intermediate layer were transferred to the surface of the transparent electrode layer together with the photocurable resin layer for etching. The distance between the surface of the exposure mask (quartz exposure mask having a transparent electrode pattern) and the photocurable resin layer for etching is set to 200 μm, and the photocurability for etching is set through the thermoplastic resin layer and the intermediate layer. The resin layer was pattern-exposed with an exposure amount of 50 mJ / cm ² (i-line).
Next, using a triethanolamine-based developer (containing 30% by mass of triethanolamine, trade name: T-PD2 (manufactured by Fujifilm Co., Ltd.) diluted 10-fold with pure water), 100 at 25 ° C. Develop for seconds, dissolve the thermoplastic resin layer and intermediate layer, and use a surfactant-containing cleaning solution (trade name: T-SD3 (manufactured by Fujifilm Co., Ltd.) diluted 10-fold with pure water). It was washed at 33 ° C. for 20 seconds. Pure water is sprayed from the ultra-high pressure cleaning nozzle, the residue on the thermoplastic resin layer is removed with a rotating brush, and post-baking treatment is further performed at 130 ° C. for 30 minutes to form a transparent film and a transparent electrode layer on the transparent film substrate. A film having a photocurable resin layer pattern for etching was obtained.
A film in which a transparent film, a transparent electrode layer, and a photocurable resin layer pattern for etching are formed on a transparent film substrate is immersed in an etching tank containing ITO etchant (hydrochloric acid, potassium chloride aqueous solution, liquid temperature 30 ° C.). A film with a transparent electrode pattern with a photocurable resin layer pattern for etching is treated for 100 seconds (etching treatment) to dissolve and remove the transparent electrode layer in the exposed region not covered with the photocurable resin layer for etching. Got
Next, a film with a transparent electrode pattern with a photocurable resin layer pattern for etching is applied to a resist stripping solution (N-methyl-2-pyrrolidone, monoethanolamine, surfactant (trade name: Surfinol 465, air). Immerse in a resist stripping tank containing (manufactured by Products Co., Ltd.) liquid temperature 45 ° C.) and treat for 200 seconds (peeling treatment) to remove the photocurable resin layer for etching, and make a transparent film and transparent on a transparent film substrate. A transparent electrode pattern film having an electrode pattern formed was obtained.

(Formation of electrode protective film for capacitive input device)
The protective film was peeled off from the transfer films of each Example and Comparative Example to obtain an electrode protective film of the capacitance type input device of each Example and Comparative Example.

(Preparation of laminate)
− Transcription −
A transparent electrode pattern in which a transparent film and a transparent electrode pattern are formed on a transparent film substrate using the transfer films of Examples 1 to 18 in which the protective film is peeled off and the transfer film (electrode protective film of the capacitance type input device) of each comparative example. From the transfer film of each Example and Comparative Example to the transparent electrode pattern film, the second resin layer, the curable resin layer and the temporary support so that the transparent film and the transparent electrode pattern of the film are covered with the second resin layer. Was transferred in this order to obtain a laminate before exposure. The transfer was carried out at a transparent film substrate temperature of 40 ° C., a rubber roller temperature of 110 ° C., a linear pressure of 3 N / cm, and a transport speed of 2 m / min.
When the transfer film of Example 19 from which the protective film was peeled off was used, the transparent film and the transparent electrode pattern of the transparent electrode pattern film having the transparent film and the transparent electrode pattern formed on the transparent film substrate were covered with the curable resin layer. Then, the curable resin layer and the temporary support were transferred from the transfer film of Example 19 to the transparent electrode pattern film in this order to obtain a laminated body before exposure.

-Photolithography-
After that, an exposure mask (quartz exposure mask having a pattern for forming an overcoat) was used on the obtained laminate before exposure using a proximity type exposure machine (manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd.) having an ultra-high pressure mercury lamp. ) The distance between the surface and the temporary support was set to 125 μm, ^{and pattern exposure was performed through the temporary support with an exposure amount of 100 mJ / cm 2} (i-line). After peeling off the temporary support, the laminated body (transparent film substrate) after pattern exposure was washed with a 2% aqueous solution of sodium carbonate at 32 ° C. for 60 seconds. The residue was removed by injecting ultrapure water from an ultrapure water cleaning nozzle onto the transparent film substrate after the cleaning treatment. Subsequently, air was blown to remove water on the transparent film substrate, and post-baking treatment was performed at 145 ° C. for 30 minutes. When the transfer films of Examples 1 to 18 and each Comparative Example were used, the transparent film, the transparent electrode pattern, the second resin layer arranged in direct contact with the transparent electrode pattern, and the second The laminates of Examples 1 to 18 and Comparative Examples having curable resin layers arranged in direct contact with the resin layer of Examples 1 to 18 in this order were obtained. In the region where the transparent electrode pattern does not exist, the second resin layer is arranged in direct contact with the transparent film.
When the transfer film of Example 19 is used, the transparent film, the transparent electrode pattern, and the curable resin layer arranged in direct contact with the transparent electrode pattern are continuously provided on the transparent film substrate in this order. Was obtained.
From the above steps, it was confirmed that the transfer film of the present invention has photolithography.

<Evaluation of laminated body>
(Concealment of transparent electrode pattern)
The laminated body of each Example and Comparative Example and the black PET material are placed adjacent to each other via a transparent adhesive tape (manufactured by 3M Co., Ltd., trade name, OCA tape 8171CL) so that the black PET material and the curable resin layer are adjacent to each other. An evaluation substrate was prepared in which the entire substrate was shielded from light.
In a dark room, using a fluorescent lamp (light source) and the prepared evaluation substrate, light is incident from the transparent film substrate surface side of the evaluation substrate, and the reflected light from the surface of the transparent film substrate on the incident side is emitted. , Visually observed from an angle.
The concealing property of the transparent electrode pattern was evaluated based on the following evaluation criteria.
-Evaluation criteria-
A: The transparent electrode pattern is not visible.
B: The transparent electrode pattern is visually recognized.
The results obtained are shown in Table 2 below. The hiding power of the transparent electrode pattern is preferably A.

From the obtained results, it was found that the transfer film of the present invention has photolithographic properties, generates few bubbles, and has few transfer defects.
On the other hand, the transfer film of Comparative Example 1 in which the oxygen permeability of the protective film was lower than the lower limit specified in the present invention had many bubbles. The transfer film of Comparative Example 2 in which the surface roughness of the protective film was less than the lower limit specified in the present invention had many transfer defects. The transfer film of Comparative Example 3 in which the surface roughness of the protective film exceeded the upper limit value specified in the present invention had many bubbles.

_{The n 1} , n ₂ , T ₁ and T ₂ in the laminates of each Example and Comparative Example were consistent with _{n 1} , n ₂ , T ₁ and T ₂ in the transfer films of each Example and Comparative Example, respectively.
_{For n 1} , n ₂ , T ₁ and T ₂ in the obtained laminate, the same method as the calculation _{of n 1} , n ₂ , T ₁ and T ₂ in the transfer films of each Example and Comparative Example was performed layer by layer. FE-3000 (manufactured by Otsuka Electronics Co., Ltd.) was used to obtain the results. The outline is shown below.
(1) Regarding the laminated body of Examples and Comparative Examples, a sample in which the transparent film substrate, the transparent film, and the transparent electrode pattern used in each Example and the Comparative Example are laminated in order, the transparent film substrate, the transparent film, the transparent electrode pattern, and the transparent electrode pattern For a sample in which the second resin layer was laminated in order, the refractive index of each layer and the estimated value of the thickness of each layer were measured in advance.
(2) In the laminated body, a portion having a five-layer structure of a transparent film substrate / transparent film / transparent electrode pattern / second resin layer / curable resin layer is cut out to a length of 5 cm × 5 cm in length and width and is transparent. A sample piece in which the black PET material was brought into contact with the adhesive tape (OCA tape 8171CL: manufactured by 3M Co., Ltd.) was prepared. The sample piece was structurally analyzed using a transmission electron microscope (TEM), and the estimated value of the thickness of each layer was obtained. For the sample piece, using FE-3000 (manufactured by Otsuka Electronics Co., Ltd.), the reflection spectrum at 100 measurement points on a straight line in any direction at a measurement spot: 40 μm in diameter and at 0.2 mm intervals. evaluated. At this time, in order to consider the interface between the second resin layer and the transparent electrode pattern and the interface between the curable resin layer and the second resin layer, the second resin layer, the transparent film substrate, the transparent film, and the transparent electrode pattern Transparent film substrate / transparent film / transparent electrode pattern with the estimated value of the average value of the refractive index and the thickness of the curable resin layer and the estimated value of the average value of the thickness of the second resin layer substituted into the calculation formula. curable in / the second resin layer / cured resin layer 5 layer component measurement point of the refractive index n ₂ and 100 points of refractive index n ₁ and the second resin layer of the cured resin layer from the reflection spectra of the The thicknesses of the resin layer and the second resin layer were obtained by fitting by simulation calculation. Further, the average value, the maximum value, the minimum value, and the standard deviation of the thicknesses of the curable resin layer and the second resin layer were calculated to calculate n ₁ , n ₂ , T ₁ and T ₂ . In the present specification, an arbitrary direction is defined as a direction parallel to one side of the sample piece, and 100 measurement points (that is, a length of 2 cm) are set to a range of 1 cm each evenly from the center of one side of the sample piece.

Further, the contents of the metal oxide particles of the curable resin layer and the second resin layer of the laminates of each Example and Comparative Example were measured by the following methods and found to be the values shown in the above table.
After cutting the cross section of the laminate, the cross section is observed with a TEM (transmission electron microscope). The ratio of the occupied area of the metal oxide particles to the film cross-sectional area of the curable resin layer or the second resin layer of the laminated body is measured at any three points in the layer, and the average value is the volume fraction (VR). Consider as.
The volume fraction (VR) and the weight fraction (WR) are converted by the following formulas to obtain the weight fraction (WR) of the metal oxide particles in the curable resin layer or the second resin layer of the laminate. Is calculated.
WR = D * VR / (1.1 * (1-VR) + D * VR)
D: Specific gravity of metal oxide particles D = 4.0 can be calculated when the metal oxide particles are titanium oxide, and D = 6.0 when the metal oxide particles are zirconium oxide.
The content of the metal oxide particles in the curable resin layer or the second resin layer of the laminates of each Example and Comparative Example can also be calculated from the composition of the curable resin layer or the second resin layer. ..

The transfer film of the present invention can be preferably used as a material for a touch panel (particularly a capacitance type input device) and a material for an image display device including a touch panel (particularly a capacitance type input device) as a component. .. Since the transfer film of the present invention has photolithography, when it is desired to form a desired pattern using the transfer film of the present invention, the pattern can be formed by photolithography, which is more productive than the cutting method.

1 Transparent substrate 2 Mask layer 3 First transparent electrode pattern 3a Pad portion 3b Connection portion 4 Transparent electrode pattern (second transparent electrode pattern)
5 Insulation layer 6 Another conductive element 7 Curable resin layer 8 Opening 10 Capacitive input device 11 Transparent film 12 Second resin layer 13 Laminated body 21 Transparent electrode pattern, second resin layer and curable resin Region where layers are laminated in this order 22 Non-patterned region α Tapered angle 26 Temporary support 29 Protective film 30 Transfer film 31 Terminal part of routing wiring 33 Curing portion of curable resin layer and second resin layer 34 End of routing wiring Opening corresponding to the part (uncured part of the curable resin layer and the second resin layer)
C 1st direction D 2nd direction

Claims (15)

Temporary support and
A curable resin layer that is curable,
Protective film and
In this order,
Oxygen permeability coefficient of the protective film is not less ^{100cm 3 · 25μm / m 2 ·} 24 hr · atm or more,
A transfer film having a surface roughness Ra of 5 to 60 nm on the surface of the protective film on the curable resin layer side. Transfer film of the oxygen permeability coefficient of the protective film is not more than ^{5000cm 3 · 25μm / m 2 ·} 24 hr · atm, according to claim 1. The transfer film according to claim 1 or 2, wherein the protective film has a thickness of 10 to 75 μm. The transfer film according to any one of claims 1 to 3, wherein the protective film contains polyethylene terephthalate or polypropylene. A second resin layer is provided between the protective film and the curable resin layer.
The invention according to any one of claims 1 to 4, wherein the second resin layer contains particles having a refractive index of 1.50 or more in an amount of 60 to 90% by mass based on the total solid content of the second resin layer. Transfer film. The transfer film according to claim 5, which satisfies the following formula 1.
Equation 1: n ₁ <n ₂
n ₁ represents the refractive index of the curable resin layer, and n ₂ represents the refractive index of the second resin layer. The transfer film according to any one of claims 5 or 6, wherein the second resin layer is curable. The transfer film according to any one of claims 5 to 7, wherein the particles having a refractive index of 1.50 or more are zirconium oxide particles or titanium oxide particles. The transfer film according to any one of claims 5 to 8, wherein the curable resin layer and the second resin layer are in direct contact with each other. The transfer film according to any one of claims 5 to 9, wherein the curable resin layer and the second resin layer are alkali-soluble. The curable resin layer contains a polymerizable compound and a binder polymer, and contains
The transfer film according to any one of claims 1 to 10, wherein the binder polymer is an alkali-soluble resin. The transfer film according to any one of claims 1 to 11, which has a roll shape. An electrode protective film of a capacitance type input device from which the protective film has been removed from the transfer film according to any one of claims 1 to 12. The substrate containing the electrodes of the capacitive input device and
A laminate having the electrode protective film of the capacitance type input device according to claim 13. A capacitance type input device having the electrode protective film of the capacitance type input device according to claim 13 or the laminate according to claim 14.

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