JP2021139842A - High temperature processing device - Google Patents

Abstract

To reduce a change in the internal temperature and to prevent contamination in a high temperature processing device for pretreating an analyte at a protein denaturation temperature.SOLUTION: A rotor 82 includes: a rotary table 84; a plurality of partition walls 88; and an inner peripheral wall 90. A plurality of cuvettes 98 housing a plurality of specimens therein is held by the rotary table 84. A plurality of small rooms 94 is defined by the plurality of partition walls 88. A cover 73 covering the rotor 82 has a plurality of ceiling surfaces 75A corresponding to the plurality of small rooms 94. Each ceiling surface 75A is an inclined surface.SELECTED DRAWING: Figure 5

Description

The present invention relates to a high temperature processing apparatus, and more particularly to a high temperature processing apparatus that processes a sample at a high temperature in a sample analyzer.

Immunoassay devices, biochemical analyzers, and the like are known as sample analyzers. The sample is blood, urine, tissue, etc. collected from a living body. The immunoassay device will be described below.

The immunoassay device is a device that analyzes a sample by utilizing an immune reaction (specifically, an antibody-antigen reaction). In the immunoassay device, for example, a first reaction treatment, a second reaction treatment, a chemiluminescence treatment, and a luminescence measurement are sequentially performed. In the first reaction treatment and the second reaction treatment, the reagent dispensing step, the sample dispensing step, the reaction step, and the BF (Bound / Free) washing step are sequentially carried out, respectively. In the chemiluminescence treatment, a substrate liquid dispensing step and an enzyme reaction step are sequentially carried out. Prior to performing the first reaction treatment, the pretreatment is applied to the sample, if necessary.

Patent Document 1 discloses a pretreatment mechanism provided in a sample analyzer. The pretreatment mechanism is to carry out dilution and pretreatment. The pretreatment mechanism has a plurality of dilution disk units arranged in a ring shape. The temperature of each dilution disk unit is controlled individually. Patent Document 1 does not disclose high-temperature treatment of a sample.

Japanese Unexamined Patent Publication No. 2011-232212

In the sample analyzer, it is conceivable to perform pretreatment of the sample at a high temperature, that is, processing of the sample at a high temperature that denatures the protein (hereinafter referred to as high temperature treatment). The high temperature treatment is aimed at, for example, inactivating a specific antibody or monomolecularizing an antigen.

When the sample analyzer is provided with a high temperature processing unit (hereinafter, also referred to as a high temperature processing unit in some cases), it is desired to stabilize the heating temperature in the high temperature processing unit. For example, when the sample is put into the high temperature processing unit or when the sample is taken out from the high temperature processing unit, it is required to reduce the fluctuation of the temperature inside the high temperature processing unit. Further, in the high temperature processing section, since the sample inevitably evaporates, it is required to prevent contamination (particularly, contamination with other samples).

An object of the present invention is to provide a high temperature processing apparatus capable of stabilizing the internal temperature. Alternatively, an object of the present invention is to provide a high temperature processing apparatus capable of preventing contamination.

The high-temperature processing apparatus according to the present invention heats a holding member having a plurality of holding holes for holding a plurality of sample containers and a plurality of sample containers held in the plurality of holding holes, thereby causing the plurality of samples. A heating unit that raises the temperature of a plurality of liquids contained in a container to a protein denaturation temperature, and a plurality of partitions that partition a space existing above the plurality of holding holes into a plurality of subspaces corresponding to the plurality of holding holes. It is characterized by including a wall.

According to the present invention, the internal temperature can be stabilized in the high temperature processing apparatus. Alternatively, according to the present invention, contamination can be prevented in the high temperature processing apparatus.

It is a top view which shows the sample analyzer which concerns on embodiment. It is a perspective view which shows the high temperature processing part in an open state. It is a perspective view which shows the high temperature processing part in a closed state. It is a perspective view which shows the inside of the high temperature processing part. It is sectional drawing of the high temperature processing part. It is an enlarged cross-sectional view of a high temperature processing part. It is another enlarged sectional view of the high temperature processing part. It is a flowchart which shows the operation example of a high temperature processing part.

Hereinafter, embodiments will be described with reference to the drawings.

(1) Outline of the Embodiment The high temperature treatment apparatus according to the embodiment has a holding member, a heating portion, and a plurality of partition walls. The holding member has a plurality of holding holes for holding a plurality of sample containers. The heating unit raises the temperature of the plurality of liquids contained in the plurality of sample containers to the protein denaturation temperature by heating the plurality of sample containers held in the plurality of holding holes. The plurality of partition walls partition the space existing above the plurality of holding holes into a plurality of subspaces corresponding to the plurality of holding holes.

According to the above configuration, the space above the holding member is divided into a plurality of subspaces, and the free flow of gas, liquid, etc. between adjacent subspaces is restricted, so that the sample container can be taken in and out. It is possible to suppress the internal temperature change due to the above, and also to suppress the contamination.

This will be described in detail. A specific subspace communicates with the outside world when the sample container is taken in and out. At that time, even if the temperature of the specific subspace changes, the thermal influence on other subspaces adjacent to the specific subspace becomes small due to the plurality of partition walls defining the specific subspace. On the other hand, the liquid (usually the sample and the pretreatment drug) in the sample container evaporates due to the high temperature treatment. When the sample container is not provided with a stopper, the gas generated by evaporation is released through the opening of the sample container to a specific subspace including the opening. Multiple partition walls that demarcate a particular subspace limit the free movement of the released gas into other subspaces. In the unlikely event that liquid is ejected from the sample container to a specific subspace due to high heat treatment, the ejected liquid will not freely scatter to other subspaces due to the multiple partition walls that define the specific subspace. ..

In the embodiment, each subspace is a semi-enclosed space. For example, when, for example, 90% or more or 95% or more of the surface of a subspace is always surrounded by a wall except when the sample container is taken in and out, the space can be said to be a semi-enclosed space. Each subspace may be configured as a closed space. Packing or the like may be provided in the gap generated between the adjacent subspaces.

Condensation can occur on the walls facing the individual subspaces. In the embodiment, a structure or equipment for promoting the discharge of dew condensation water generated by dew condensation is provided. In the embodiment, all or a part of the surface facing each subspace is processed or treated to promote the movement of condensed water. The concept of processing or treatment that promotes the movement of condensed water includes processing or treatment that brings about water-repellent action or drainage promoting action, and specifically includes unevenness formation, groove formation, film formation, chemical treatment, and the like. included. The protein denaturation temperature is generally 60 ° C. or higher. In the embodiment, the temperature of each sample is raised to a predetermined temperature in the range of, for example, 80-98 ° C.

In the embodiment, the holding member is a rotary table. The plurality of partition walls are arranged radially on the turntable. By using the rotary table, it is possible to fix the position where the sample container is taken in and out. The concept of a holding member may include a fixedly installed table, a table that moves in two dimensions, and the like.

In embodiments, the high temperature treatment apparatus includes an inner peripheral wall, an outer peripheral wall and a ceiling wall. The inner peripheral wall is provided on the rotary table in the radial direction of a plurality of subspaces, and a plurality of partition walls are connected to the inner peripheral wall. The outer peripheral wall is provided on the radial outer side of the plurality of subspaces. The ceiling wall covers a plurality of subspaces. According to this configuration, individual subspaces are surrounded by a turntable, an inner peripheral wall, an outer peripheral wall and a ceiling wall.

In an embodiment, the high temperature processing apparatus includes a cover as a non-rotating member covering the rotary table. The cover comprises an outer wall and a ceiling wall. According to this configuration, the configuration of the rotating body including the rotary table can be simplified and the drive source of the rotary table can be miniaturized. However, the cover may be configured as a part of the rotating body. In that case, the degree of sealing of each subspace can be increased.

In an embodiment, the ceiling wall includes a plurality of ceiling surfaces covering a plurality of subspaces. Each ceiling surface is an inclined surface. According to this configuration, when the vaporized gas condenses on the ceiling surface and dew condensation water is generated, the movement of the dew condensation water can be promoted. It is possible to prevent or reduce the careless dripping of condensed water.

In the embodiment, the radial outer height of each ceiling surface is lower than the radial inner height of each ceiling surface. In the embodiment, the plurality of ceiling surfaces are continuous with the wall surface of the outer peripheral wall. Immediately below the wall surface of the outer peripheral wall, a groove is provided to collect the condensed water dripping from the wall surface. According to this configuration, the condensed water generated on the ceiling surface and the wall surface of the outer peripheral wall is collected in the groove and discharged to the outside through the groove.

In the embodiment, the ceiling wall has an opening through which the sample container before and after the high temperature treatment is passed. A shutter member that opens and closes the opening is provided. If the opening is closed by the shutter member, the change in the internal temperature can be prevented or reduced, and foreign matter can be prevented from entering through the opening. A shutter member may be provided for each subspace.

In an embodiment, the shutter member has a lower surface. The lower surface is an inclined surface. According to this configuration, even if dew condensation water is generated on the lower surface, its movement and discharge can be promoted. As a result, dripping of condensed water can be prevented.

(2) Details of the Embodiment FIG. 1 shows an immunoassay device according to the embodiment. The immunoassay is a kind of sample analyzer, and specifically, it is a fully automatic immunoassay according to chemiluminescent enzyme immunoassay (CLEIA).

The immunoassay apparatus according to the embodiment has a function of pretreating a sample at a high temperature (high temperature treatment function) while using a reagent for pretreatment, as will be described in detail later. Various processes can be mentioned as pre-processes. This includes a process that acts on the protein in the sample, and also includes a process that causes the complex in the sample to dissociate. To give a specific example, for example, high-temperature treatment is carried out for the purpose of inactivating an antibody against an HBV (hepatitis B virus) antigen, making the antigen monomolecular, or the like. Although it depends on the conditions of high temperature treatment, the sensitivity can be dramatically improved by high temperature treatment. Various antibodies and various antigens can be subject to high temperature treatment.

In FIG. 1, a sample rack supply unit 14, a sample rack discharge unit 16, a transport path 20, a transport path 22, and the like are provided on the upper surface of the apparatus main body 12. A plurality of sample racks 18 are placed on the sample rack supply unit 14. A plurality of samples (to be exact, a sample container containing the samples) are held by the individual sample racks 18. Each sample is blood (serum or plasma), urine, etc. collected from a living body. Individual sample racks 18 are sent from the sample rack supply unit 14 to the transport path 20. Each of the fed sample racks 18 is transported by the transport path 20.

A barcode label reader (BCR) (not shown) is provided in the middle of the transport path 20. The BCR optically reads the contents of the barcode label attached to each sample, that is, the barcode. Thereby, one or a plurality of analysis items are specified for each sample. In FIG. 1, reference numeral 18A indicates a sample rack positioned in the sample suction position.

The transport path 20 is a feed transport path, and the transport path 22 is a return transport path. The transport paths 20 and 22 are each composed of a belt conveyor. A lateral feed mechanism 24 is provided between the transport paths 20 and 22. The sample rack is sent out from the transport path 22 to the sample rack discharge unit 16. A plurality of sample racks after analysis are accumulated on the sample rack discharge unit 16.

The apparatus main body 12 is provided with a reaction processing unit 26, a cuvette supply unit 32, a first reagent cold storage 34, a second reagent cold storage 36, a pretreatment unit 37, and a measuring unit 44.

The reaction processing unit 26 has a rotary table. In the illustrated example, the rotary table is provided with a ring-shaped first hole row 28 and a ring-shaped second hole row 30, which are arranged concentrically. The first hole row 28 is composed of a plurality of holding holes arranged in a ring shape, and the second hole row 30 is also composed of a plurality of holding holes arranged in a ring shape. A cuvette, which is a sample container, is inserted into each holding hole (see reference numeral 50). The first hole row 28 and the second hole row 30 rotate independently of each other. In the reaction processing unit 26, for example, sample dispensing, reagent dispensing, substrate liquid dispensing, BF washing (BF separation), enzyme treatment, stirring, and the like are executed. Reference numeral 52 indicates sample dispensing. The reaction processing unit 26 has a constant temperature function, and maintains the temperature of each sample at, for example, 37 ° C.

In the pretreatment unit 37, pretreatment is performed. Among the sample group to be analyzed, the sample for which the pretreatment is specified is the pretreatment target. In the illustrated configuration example, the pretreatment section 37 includes a high temperature treatment section 38, a low temperature treatment section 40, and a stirring section 42. In FIG. 1, the pretreatment unit 37 is provided on the left side of the reaction processing unit 26, but it may be provided at another position.

The high temperature treatment unit 38 performs high temperature treatment on the sample using the pretreatment liquid. In the high temperature treatment, the temperature of the sample is raised to the protein denaturation temperature. The protein denaturation temperature is 60 ° C. or higher. In an embodiment, the temperature of the specimen is raised to a designated temperature within the range of 80-98 ° C., which temperature is maintained for a designated processing time. For example, the high temperature processing time is specified within the range of 1 to 5 minutes. The temperature for high temperature processing is also specified. The high temperature processing unit 38 has a plurality of holding holes for holding a plurality of cuvettes. The structure and operation of the high temperature processing unit 38 will be described in detail later.

The low temperature treatment unit 40 is for cooling the sample after the high temperature treatment. The low temperature processing unit 40 includes, for example, a cooling member having a specified temperature within the range of 10 to 30 ° C. Each sample is cooled through the cooling member. The time of the low temperature treatment is specified, for example, in the range of 1 to 2 minutes. The low temperature treatment after the high temperature treatment may be omitted. The low temperature treatment unit 40 has a plurality of holding holes for holding a plurality of cuvettes.

The stirring unit 42 stirs the liquid (sample and pretreatment liquid) in the cuvette. For example, the liquid in the cuvette is agitated by vibrating the cuvette or causing the cuvette to move. If necessary, stirring is performed before the high temperature treatment, after the high temperature treatment, and after the low temperature treatment. In the illustrated example, the stirring unit 42 has a plurality of holding holes for holding a plurality of cuvettes.

In FIG. 1, the transfer of the cuvette from the reaction processing unit 26 to the stirring unit 42 is indicated by reference numeral 58. The transfer of the cuvette from the stirring unit 42 to the high temperature processing unit 38 is indicated by reference numeral 60. The transfer of the cuvette from the high temperature processing unit 38 to the stirring unit 42 is indicated by reference numeral 62. The transfer of the cuvette from the stirring unit 42 to the low temperature processing unit 40 is indicated by reference numeral 64. The transfer of the cuvette from the low temperature processing unit 40 to the reaction processing unit 26 is indicated by reference numeral 66. The illustrated transfer route is exemplary.

The first reagent cool box 34 is configured as a constant temperature bath, and a plurality of reagent bottles for accommodating a plurality of reagents are provided inside the first reagent cool box 34. Each of the plurality of reagents is a reagent containing magnetic particles to which an antibody or an antigen is bound. These reagents are those used in immune response processing. Reagent dispensing is indicated by reference numeral 54.

Like the first reagent cool box 34, the second reagent cool box 36 is configured as a constant temperature bath, and a plurality of reagent bottles containing a plurality of reagents are provided inside the second reagent cool box 36. The plurality of reagents may include reagents used in an immune reaction treatment, reagents used in a pretreatment, reagents used in an enzymatic reaction treatment, and the like. Reagent dispensing is indicated by reference numeral 56.

The measuring unit 44 is a unit that measures the light generated in the sample after the enzyme reaction treatment. The concentration of the substance to be analyzed is calculated from the amount of light emitted based on the calibration curve created in advance. Reference numeral 68 indicates the transfer of the cuvette from the reaction processing unit 26 to the measuring unit 44.

In FIG. 1, the cuvette transfer mechanism and the dispensing mechanism are omitted, and the BF cleaning mechanism and the stirring mechanism provided in the reaction processing unit 26 are omitted. Although a plurality of turntables are shown in FIG. 1, some of them may be integrated or the number of turntables may be increased. The operation of each component shown in FIG. 1 is controlled by a control unit (not shown). The control unit includes a processor, specifically, a CPU that operates according to a program.

2 and 3 show the appearance of the high temperature processing unit 38. The high temperature processing unit 38 functions as a high temperature processing device. In FIG. 2, the high temperature processing unit 38 has a housing 70. The housing 70 is a member that encloses a rotating body, a cover 73, and a heater block provided inside, and is composed of a lower portion 71 and an upper portion 72. The housing 70 is composed of a heat insulating member. The heat insulating member limits the outflow of heat to the outside world and maintains the temperature inside the housing 70. A shield layer may be provided in or on the surface of the housing 70 to prevent radiation to the outside. A vacuum insulation layer may be formed on the housing 70.

A shutter mechanism 76 is provided on the upper part of the housing 70. The shutter mechanism 76 is a mechanism for opening and closing the opening 78 formed in the cover 73. In FIG. 2, the shutter mechanism 76 in the closed state is shown. A slit 77 extending in the radial direction is formed in the upper portion 72. The shutter mechanism 76 includes a shutter member 80 that moves in the slit 77 and an actuator that drives and moves the shutter member 80. The actuator is not shown.

The opening 78 functions as a passage when the cuvette is taken in and out by the manipulator. At that time, the manipulator holding the cuvette passes through the opening 78. When the shutter member 80 is located at the radial outer end, the opening 78 is closed and the flow of gas through the opening 78 is restricted. When the shutter member 80 is located at the inner end in the radial direction, the opening 78 is opened (see FIG. 3). The cuvette is put in and out in the open state. The opening 78 is formed in a specific direction.

The shutter member 80 may be moved by utilizing the kinetic force of the manipulator. Instead of the illustrated slide method, a rotation method may be adopted. A plurality of shutter mechanisms corresponding to a plurality of small rooms described later may be provided.

FIG. 4 shows the internal structure of the high temperature processing unit. The high temperature processing unit has a rotating body 82. Inside the lower portion 71, a drive mechanism including a motor for driving the rotating body 82 is provided.

The rotating body 82 has a rotating table 84, a partition structure 86, and an inner peripheral wall 90. The rotating body 82 is made of a material that can withstand high temperatures, and specifically, is made of metal, resin, ceramic, or the like.

The rotary table 84 is a rotating disk. A plurality of holding holes 96 arranged in an annular shape are formed in the rotary table 84. A plurality of cuvettes 98 are inserted into the holding holes 96. In the holding state of each cuvette 98, only its head appears on the turntable 84. The body of each cuvette 98 is located below the turntable 84.

The partition structure 86 is composed of a plurality of partition walls 88 arranged radially along the radial direction on the rotary table 84. The radial inner ends of the plurality of partition walls 88 are connected to the inner peripheral wall 90.

The space above the rotary table 84 is evenly divided into a plurality of small rooms (plurality of subspaces) 94 by a plurality of partition walls 88. The inner peripheral wall 90 is a cylindrical upright wall. Each partition wall 88 is a flat plate-shaped upright wall. The upper surface of each partition wall 88 is inclined from the inside in the radial direction to the outside in the radial direction. The shape of each partition wall 88 is trapezoidal when viewed from the circumferential direction. The radial outer end faces of the partition walls 88 are aligned with the cylindrical end faces of the rotary table 84. A holding hole 96 is formed in the center of the bottom surface of each small room 94.

Each surface of the rotating body 82 facing the plurality of small chambers 94 is processed or treated to promote the discharge of condensed water. For example, surface processing for water repellency, formation of a film having a water repellent action, and the like are carried out. As surface processing, a large number of grooves, fine irregularities and the like may be formed. As the film formation, a coating film made of a chemical substance having a water-repellent effect may be formed. The upper surface of the rotary table 84 may be an inclined surface.

FIG. 5 shows a cross section of the high temperature processing section. A rotating body 82, a cover 73, a heating block 100, and the like are provided inside the lower portion 71 and the upper portion 72 that constitute the housing. As described above, the rotating body 82 has a rotating table 84, a plurality of partition walls 88, and an inner peripheral wall 90. Those members may be integrated. One small chamber 94 is formed per one holding hole 96.

The rotating body 82 is covered with the cover 73. The cover 73 is composed of a cover main body 74 and a ceiling wall 75. The cover body 74 has a cylindrical shape in which one end side (upper side) is closed and the other end side (lower side) is open. Specifically, the cover main body 74 is composed of a circular upper wall 74A and a cylindrical outer peripheral wall 74B.

An annular ceiling wall 75 is provided above the plurality of small rooms 94. The ceiling wall 75 is fixed to the upper wall 74A and the outer peripheral wall 74B. The cover 73 is made of a heat-resistant member, and may be made of, for example, metal, resin, ceramic, or the like. As described above, each surface of the cover 73 facing the plurality of small rooms 94 is processed or treated to promote the discharge of condensed water.

The ceiling wall 75 has a wedge-shaped cross section when viewed from the circumferential direction. The ceiling wall 75 has a plurality of ceiling surfaces 75A facing the plurality of small rooms 94. Each ceiling surface 75A is an inclined surface. The radial outer height of each ceiling surface 75A is smaller than the radial inner height. As a result, the dew condensation water generated on each ceiling surface 75A is promoted to move outward in the radial direction.

The wall surface of the outer peripheral wall 74B facing the plurality of small rooms 94 is close to the end face of the rotating body 82 (the end face of the rotary table 84 and the end face of the plurality of partition walls 88) with a slight gap. .. The condensed water that has moved from the inclined ceiling surface 75A to the wall surface of the outer peripheral wall 74B moves downward along the wall surface and flows downward through the above-mentioned gap.

The lower surface 80A of the shutter member 80 is an inclined surface. The radial outer height of the lower surface 80A is larger than the radial inner height of the lower surface 80A. The gradient direction may be reversed, or the direction orthogonal to the radial direction may be the gradient direction. An opening 78 is formed in the upper wall 74A. An opening 75B is formed in the ceiling wall 75 in a polymerization relationship with the opening 78. The opening 78 and the opening 75B are passages through which the manipulator holding the cuvette passes, respectively.

The heating block 100 is made of a metal such as aluminum or copper, which includes a heater (not shown). An annular groove 102 is formed in the heating block 100. A plurality of circular cuvettes 98 held in the plurality of holding holes 96 are inserted into the groove 102. By the action of the heating block 100, the temperature of the liquid of each cuvette 98 is raised to a predetermined temperature. As a result, the sample is subjected to high temperature treatment. The rotating body 82 rotates one step every cycle time. One cycle time is, for example, in the range of 15 to 20 seconds. The cover 73 may be connected to the rotating body 82 to integrate the two. That is, the cover 73 may be rotated together with the rotating body 82.

FIG. 6 is an enlarged cross-sectional view of a portion shown by VI in FIG. The shutter member 80 slides on the upper wall 74A. The lower surface 80A of the shutter member 80 is an inclined surface as described above. The wall surface 80C facing the internal space of the shutter member 80 is located at the point indicated by reference numeral 106 in the closed state of the shutter mechanism, that is, in the state where the shutter member 80 completely covers the opening 78. At that position, a groove 108 is formed to collect the dew condensation water dripping from the wall surface 80C. The wall surface 80B facing the internal space of the shutter member 80 is located at a point indicated by reference numeral 104 in the closed state of the shutter mechanism. At that position, a groove 110 for collecting the condensed water dripping from the wall surface 80B is formed. A mechanism for discharging the condensed water collected in the grooves 108 and 110 to the outside is provided, but the illustration thereof is omitted.

FIG. 7 is an enlarged cross-sectional view of a portion shown by VII in FIG. The lower end of the ceiling surface 75A is in contact with the wall surface 75C. The upper end of the ceiling surface 75A is close to the upper end of the inner peripheral wall. The wall surface of the inner peripheral wall is indicated by reference numeral 75D. Immediately below the wall surface 75C of the outer peripheral wall, an annular groove 112 for collecting dew condensation water dripping from the wall surface 75C is formed. The condensed water that has entered the groove 112 is discharged to the outside through the drainage path 114. At that time, a discharge pump (not shown) operates.

The gap between the inner peripheral wall and the cover and the gap between the upper surface of the plurality of partition walls and the cover are very small, and the gas flow through these gaps is small. Packing may be provided in those gaps. A structure that promotes the discharge of condensed water adhering to the wall surface of the inner peripheral wall or the upper surface of the rotary table may be added.

FIG. 8 illustrates the operation of the high temperature processing unit. In S10, it is determined whether or not there is a cuvette to be taken out. If the cuvette needs to be taken out, the steps after S12 are executed, and if the cuvette does not need to be taken out, the steps after S20 are executed. In S12, the shutter mechanism is opened to form a state in which the opening is exposed. In S14, the cuvette is taken out from the small room immediately below the opening through the opening, and the cuvette is transported to the transport destination. After that, in S16, the shutter mechanism closes. In S18, the rotating body rotates one step.

In S20, it is determined whether or not to end this process. If this process is not terminated, the presence or absence of a cuvette to be incorporated is determined in S22. When the cuvette uptake is required, the steps after S24 are executed, and when the cuvette uptake is not required, S30 is executed. In S24, the shutter mechanism opens. Using the exposed opening, the cuvette is inserted into the holding hole immediately below the opening in S26. After that, in S28, the shutter mechanism closes.

In S30, the necessary drainage is carried out, and the standby state is maintained until the next cycle. Drainage is performed, for example, every predetermined number of cycles, or when predetermined drainage conditions are met.

According to the above embodiment, since the space on the turntable is divided into a plurality of small rooms by a plurality of partition walls, contamination can be effectively prevented. Moreover, even if a specific small room communicates with the outside world, the influence is unlikely to affect a plurality of other small rooms. That is, the internal temperature can be stabilized.

In the above embodiment, equipment for cleaning a small room that has been emptied after taking out the cuvette may be added. Further, before opening the shutter mechanism, a facility for sucking the small room to be opened may be provided. Alternatively, a suction facility may be provided for each small room.

37 Pretreatment section, 38 high temperature treatment section (high temperature treatment device), 40 low temperature treatment section, 42 stirring section, 73 cover, 82 rotating body, 84 rotary table, 88 partition wall, 90 inner peripheral wall, 74B outer peripheral wall.

Claims (10)

A holding member having a plurality of holding holes for holding a plurality of sample containers,
A heating unit that raises the temperature of the plurality of liquids contained in the plurality of sample containers to the protein denaturation temperature by heating the plurality of sample containers held in the plurality of holding holes.
A plurality of partition walls that partition the space existing above the plurality of holding holes into a plurality of subspaces corresponding to the plurality of holding holes.
A high temperature processing apparatus comprising. In the high temperature processing apparatus according to claim 1,
The holding member is a rotary table.
The plurality of partition walls are arranged radially on the turntable.
A high temperature processing device characterized by the fact that. In the high temperature processing apparatus according to claim 2.
An inner peripheral wall provided on the rotary table in the radial direction of the plurality of subspaces and to which the plurality of partition walls are connected.
An outer peripheral wall provided on the radial outer side of the plurality of subspaces,
The ceiling wall covering the plurality of subspaces and
A high temperature processing apparatus comprising. In the high temperature processing apparatus according to claim 3,
A cover as a non-rotating member is provided to cover the rotary table.
The cover comprises the outer peripheral wall and the ceiling wall.
A high temperature processing device characterized by the fact that. In the high temperature processing apparatus according to claim 4,
The ceiling wall includes a plurality of ceiling surfaces covering the plurality of subspaces.
Each of the ceiling surfaces is an inclined surface.
A high temperature processing device characterized by the fact that. In the high temperature processing apparatus according to claim 5.
The radial outer height of each ceiling surface is lower than the radial inner height of each ceiling surface.
A high temperature processing device characterized by the fact that. In the high temperature processing apparatus according to claim 6,
The plurality of ceiling surfaces are connected to the wall surface of the outer peripheral wall.
Immediately below the wall surface of the outer peripheral wall, a groove for collecting condensed water dripping from the wall surface of the outer peripheral wall is provided.
A high temperature processing device characterized by the fact that. In the high temperature processing apparatus according to claim 3,
The ceiling wall has an opening through which the sample container before and after the high temperature treatment can pass.
A shutter member for opening and closing the opening is provided.
A high temperature processing device characterized by the fact that. In the high temperature processing apparatus according to claim 8.
The shutter member has a lower surface and has a lower surface.
The lower surface is an inclined surface.
A high temperature processing device characterized by the fact that. In the high temperature processing apparatus according to claim 1,
All or part of the surface facing each subspace is processed or treated to promote the movement of condensed water.
A high temperature processing device characterized by the fact that.

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