JP2021136333A - Grinding method - Google Patents

Grinding method Download PDF

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JP2021136333A
JP2021136333A JP2020031535A JP2020031535A JP2021136333A JP 2021136333 A JP2021136333 A JP 2021136333A JP 2020031535 A JP2020031535 A JP 2020031535A JP 2020031535 A JP2020031535 A JP 2020031535A JP 2021136333 A JP2021136333 A JP 2021136333A
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grinding
surface side
holding
workpiece
ground
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JP7403919B2 (en
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佳一 鈴木
Keiichi Suzuki
佳一 鈴木
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Disco Corp
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Disco Abrasive Systems Ltd
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Abstract

To reduce the amount of grinding dust attached to an external part of a holding surface and an external part of a protective member.SOLUTION: A grinding method of grinding a back surface side of a processed material having a device region and an outer periphery excessive region surrounding the circumference of the device region on a front surface side, comprises: a front surface protective step of covering the front surface side of the processed material with a protective member; a holding step of sucking and holding the front surface side of the processed material via the protective member with a chuck table having a holding surface of which a diameter is larger than a diameter of the device region and smaller than an outer diameter of the processed material; and a grinding step of forming a disc-like concave part structured by: a circular ground part that rotates the chuck table in the circumference of a first rotational axis, and contacts a grinding whetstone to one part of the back surface side while supplying a grinding water to the grinding whetstone in a state where a grinding wheel is rotated in the circumference of a second rotational axis to grind one part of the back surface side, and to which the grinding is executed; and a ring-like reinforcement part which surrounds the circumference of the ground part and to which the grinding is not executed.SELECTED DRAWING: Figure 2

Description

本発明は、被加工物の裏面側の一部を研削することにより、研削が施された円形の被研削部と、被研削部の周囲を囲み且つ研削が施されていないリング状補強部と、で構成される円盤状の凹部を、被加工物の裏面側に形成する研削方法に関する。 The present invention includes a circular portion to be ground that has been ground by grinding a part of the back surface side of the workpiece, and a ring-shaped reinforcing portion that surrounds the portion to be ground and has not been ground. The present invention relates to a grinding method for forming a disk-shaped recess composed of, on the back surface side of a work piece.

互いに交差する複数の分割予定ラインが表面側に設定され、複数の分割予定ラインで区画される各領域にIC(Integrated Circuit)、LSI(Large Scale Integration)等のデバイスが形成された被加工物は、研削、切削等を経て複数のデバイスチップに分割される。 A work piece in which a plurality of scheduled division lines intersecting each other are set on the surface side, and devices such as ICs (Integrated Circuits) and LSIs (Large Scale Integration) are formed in each area partitioned by the plurality of scheduled division lines. It is divided into a plurality of device chips through grinding, cutting, etc.

例えば、研削装置を用いて円盤状の被加工物の裏面側の全体を研削して所定の厚さまで薄化した後、切削装置を用いて被加工物を各分割予定ラインに沿って切削され、被加工物は複数のデバイスチップに分割される。 For example, after grinding the entire back surface side of the disk-shaped workpiece using a grinding device to thin it to a predetermined thickness, the workpiece is cut along each scheduled division line using a cutting device. The work piece is divided into a plurality of device chips.

被加工物を研削する前には、被加工物の表面側に樹脂で形成された円盤状のシート(保護部材)を貼り付ける。保護部材は、基材層と、基材層の第1面に設けられた糊層とを有する。第1面側を被加工物に貼り付けた後、第1面とは反対側に位置する第2面(被保持面)側を、研削装置に搭載されたチャックテーブルで吸引して保持する。 Before grinding the work piece, a disk-shaped sheet (protective member) made of resin is attached to the surface side of the work piece. The protective member has a base material layer and a glue layer provided on the first surface of the base material layer. After the first surface side is attached to the workpiece, the second surface (held surface) side located on the side opposite to the first surface is sucked and held by a chuck table mounted on the grinding device.

チャックテーブルはセラミックスで形成された円盤状の枠体を有する。枠体には、円盤状の凹部が形成されており、この凹部には円盤状のポーラス板が固定されている。ポーラス板の上面は略平坦であり、凹部の外側に位置する枠体の環状の上面と、略面一を成す。 The chuck table has a disk-shaped frame made of ceramics. A disk-shaped recess is formed in the frame body, and a disk-shaped porous plate is fixed to the recess. The upper surface of the porous plate is substantially flat and forms substantially flush with the annular upper surface of the frame body located outside the recess.

ポーラス板の下面には、流路の一端が接続されており、この流路の他端には、真空ポンプ等の吸引源が接続されている。吸引源により発生された負圧は、流路を介して、ポーラス板の上面に作用する。 One end of the flow path is connected to the lower surface of the porous plate, and a suction source such as a vacuum pump is connected to the other end of the flow path. The negative pressure generated by the suction source acts on the upper surface of the porous plate via the flow path.

ポーラス板の上面と、枠体の環状の上面とは、被加工物の表面側(即ち、保護部材の被保持面側)を吸引して保持する保持面を構成する。研削装置では、被加工物の外径の公差や、被加工物を保持面に載置したときの配置ずれ等を考慮して、通常、被加工物の外径よりも大きな直径を有する保持面を備えたチャックテーブルが使用される。 The upper surface of the porous plate and the annular upper surface of the frame form a holding surface that sucks and holds the surface side (that is, the held surface side of the protective member) of the workpiece. In a grinding machine, a holding surface having a diameter larger than the outer diameter of the work piece is usually taken into consideration, such as the tolerance of the outer diameter of the work piece and the misalignment when the work piece is placed on the holding surface. A chuck table equipped with is used.

研削時には、円環状の研削ホイールを用いて、加工点に純水等の研削水を供給しながら、被加工物の裏面側の全体を研削する。このとき、加工屑を含んでいる使用後の研削水は、被加工物の裏面側の外周部から保持面の外周部へ流れ、更に、ポーラス板の吸引力により保護部材の被保持面と保持面との間に浸入する。それゆえ、保護部材の被保持面の外周部と、保持面の外周部とに、研削屑が付着する。 At the time of grinding, an annular grinding wheel is used to grind the entire back surface side of the workpiece while supplying grinding water such as pure water to the machining point. At this time, the used grinding water containing machining debris flows from the outer peripheral portion on the back surface side of the workpiece to the outer peripheral portion of the holding surface, and is further held with the held surface of the protective member by the suction force of the porous plate. Infiltrate between the surface. Therefore, grinding debris adheres to the outer peripheral portion of the held surface of the protective member and the outer peripheral portion of the holding surface.

ところで、被加工物の裏面側の全体ではなく、デバイス領域に対応する裏面側の一部(即ち、円形領域)を研削する手法が知られている(例えば、特許文献1参照)。研削が施された円形領域(即ち、被研削部)の周囲を囲む様に、研削が施されないリング状補強部を残すことで、研削後の被加工物の搬送等の取り扱いが容易になる。 By the way, there is known a method of grinding a part of the back surface side (that is, a circular region) corresponding to a device region, not the entire back surface side of the workpiece (see, for example, Patent Document 1). By leaving a ring-shaped reinforcing portion that is not ground so as to surround the circular region (that is, the portion to be ground) that has been ground, it becomes easy to handle the work piece after grinding.

リング状補強部を残存させる様に裏面側を研削する場合にも、上述の様に、表面側に保護部材を貼り付けた上で、被加工物の外径よりも大きな直径の保持面を有するチャックテーブルで、被加工物の表面側を吸引保持する。 Even when the back surface side is ground so as to leave the ring-shaped reinforcing portion, as described above, after attaching the protective member to the front surface side, it has a holding surface having a diameter larger than the outer diameter of the workpiece. The chuck table sucks and holds the surface side of the work piece.

それゆえ、保持面の外周部と、保護部材の被保持面の外周部とに、研削屑が付着することになる。保持面の外周部に研削屑が付着した状態を放置すると、研削装置の汚れとなる。また、研削に続く工程で使用される装置にも、研削屑等の汚れが付着した被加工物を介して汚れが付着する。 Therefore, the grinding debris adheres to the outer peripheral portion of the holding surface and the outer peripheral portion of the held surface of the protective member. If the state in which the grinding debris adheres to the outer peripheral portion of the holding surface is left unattended, the grinding apparatus becomes dirty. In addition, dirt adheres to the apparatus used in the process following grinding through the workpiece to which dirt such as grinding dust has adhered.

更に、保持面に研削屑等の汚れが付着したまま、被加工物を加工すると、研削屑が付着した位置に応力が集中して被加工物が割れることがある。また、研削屑等に起因して保持面での吸引力が低下し、研削不良が生じる場合もある。加えて、吸着装置で被加工物を吸着して搬送する際には、研削屑等に起因して吸引不良が生じ、被加工物が落下して割れることもある。 Further, if the workpiece is processed while dirt such as grinding chips is attached to the holding surface, the stress may be concentrated at the position where the grinding chips are attached and the workpiece may be cracked. In addition, the suction force on the holding surface may decrease due to grinding debris or the like, resulting in poor grinding. In addition, when the work piece is sucked and conveyed by the suction device, suction failure may occur due to grinding debris or the like, and the work piece may fall and crack.

特開2007−19461号公報Japanese Unexamined Patent Publication No. 2007-19461

本発明は係る問題点に鑑みてなされたものであり、保持面の外周部及び保護部材の被保持面の外周部に付着する研削屑の量を低減することを目的とする。 The present invention has been made in view of the above problems, and an object of the present invention is to reduce the amount of grinding debris adhering to the outer peripheral portion of the holding surface and the outer peripheral portion of the held surface of the protective member.

本発明の一態様によれば、複数のデバイスが形成されたデバイス領域と該デバイス領域の周囲を囲む外周余剰領域とを表面側に有する被加工物の裏面側を、研削砥石を有する研削ホイールで研削する被加工物の研削方法であって、該被加工物の該表面側を保護部材で覆う表面保護ステップと、該デバイス領域の直径よりも大きく且つ該被加工物の外径よりも小さい直径の保持面を有するチャックテーブルで、該保護部材を介して該被加工物の該表面側を吸引して保持する保持ステップと、該チャックテーブルを第1の回転軸の周りで回転させ、且つ、該研削ホイールを第2の回転軸の周りで回転させた状態で、該研削砥石に研削水を供給しながら該研削砥石を該裏面側の一部に接触させることにより該裏面側の一部を研削して、研削が施された円形の被研削部と、該被研削部の周囲を囲み且つ研削が施されていないリング状補強部と、で構成される円盤状の凹部を形成する研削ステップと、を備える研削方法が提供される。 According to one aspect of the present invention, a grinding wheel having a grinding wheel is used on the back surface side of a workpiece having a device region on which a plurality of devices are formed and an outer peripheral surplus region surrounding the device region on the front surface side. A method for grinding a work piece to be ground, which is a surface protection step in which the surface side of the work piece is covered with a protective member, and a diameter larger than the diameter of the device region and smaller than the outer diameter of the work piece. A holding step of sucking and holding the surface side of the workpiece through the protective member and the chuck table being rotated around a first rotation axis and holding the chuck table. In a state where the grinding wheel is rotated around the second rotation axis, the grinding grindstone is brought into contact with a part of the back surface side while supplying grinding water to the grinding grindstone, so that a part of the back surface side is formed. A grinding step that grinds to form a disk-shaped recess composed of a circular ground portion that has been ground and a ring-shaped reinforcing portion that surrounds the ground portion and has not been ground. And, a grinding method comprising.

本発明の一態様に係る研削ステップでは、研削砥石を裏面側の一部に接触させることにより、裏面側の全体ではなく、裏面側の一部を研削して、円形の被研削部を形成する。つまり、被研削部の周囲を囲み且つ研削が施されないリング状補強部を残す。 In the grinding step according to one aspect of the present invention, the grinding wheel is brought into contact with a part of the back surface side to grind a part of the back surface side instead of the entire back surface side to form a circular portion to be ground. .. That is, a ring-shaped reinforcing portion that surrounds the portion to be ground and is not ground is left.

この様に、研削ステップでは研削が施されない部分があるので、被加工物の表面側の全面を吸引保持する必要が無い。本願は、係る点に着目したものであり、保持ステップでは、デバイス領域の直径よりも大きく且つ被加工物の外径よりも小さい直径の保持面を有するチャックテーブルで、被加工物の表面側を吸引して保持する。 As described above, since there is a portion that is not ground in the grinding step, it is not necessary to suck and hold the entire surface side of the workpiece. The present application focuses on this point, and in the holding step, a chuck table having a holding surface having a diameter larger than the diameter of the device region and smaller than the outer diameter of the work piece is used to hold the surface side of the work piece. Suction and hold.

それゆえ、研削ステップでは、加工屑を含む使用後の研削水が、被加工物の裏面側の外周部から下方へ落下又は飛散する。これにより、保持面の外周部及び保護部材の被保持面の外周部に、使用後の研削水が回り込み難くなる。従って、保持面の外周部及び保護部材の被保持面の外周部に回り込んで付着する研削屑の量を低減できる。 Therefore, in the grinding step, the used grinding water containing the machining chips falls or scatters downward from the outer peripheral portion on the back surface side of the workpiece. As a result, it becomes difficult for the used grinding water to get around the outer peripheral portion of the holding surface and the outer peripheral portion of the held surface of the protective member. Therefore, it is possible to reduce the amount of grinding debris that wraps around and adheres to the outer peripheral portion of the holding surface and the outer peripheral portion of the held surface of the protective member.

表面保護ステップを示す斜視図である。It is a perspective view which shows the surface protection step. 図2(A)は研削ステップを示す一部断面側面図であり、図2(B)は図2(A)の部分拡大図である。FIG. 2A is a partial cross-sectional side view showing the grinding step, and FIG. 2B is a partially enlarged view of FIG. 2A. 図3(A)は研削ステップ後の被加工物ユニットの斜視図であり、図3(B)は研削ステップ後の被加工物ユニットの断面図である。FIG. 3A is a perspective view of the workpiece unit after the grinding step, and FIG. 3B is a cross-sectional view of the workpiece unit after the grinding step. 研削方法のフロー図である。It is a flow chart of a grinding method. 図5(A)は比較例に係る研削ステップを示す一部断面側面図であり、図5(B)は比較例に係る研削後の保持面の上面図であり、図5(C)は比較例に係る研削後の被加工物ユニットの底面図である。5 (A) is a partial cross-sectional side view showing a grinding step according to a comparative example, FIG. 5 (B) is a top view of a holding surface after grinding according to a comparative example, and FIG. 5 (C) is a comparison. It is a bottom view of the work piece unit after grinding which concerns on an example.

添付図面を参照して、本発明の一態様に係る実施形態について説明する。まず、図1を用いて、研削が施される被加工物11等について説明する。被加工物11は、例えば、シリコン等の半導体材料でなる円盤状のウェーハである。 An embodiment according to one aspect of the present invention will be described with reference to the accompanying drawings. First, the workpiece 11 and the like to be ground will be described with reference to FIG. The workpiece 11 is, for example, a disk-shaped wafer made of a semiconductor material such as silicon.

被加工物11の表面11a側は、互いに交差する複数の分割予定ライン(ストリート)13によって複数の領域に区画されており、各領域には、IC、LSI等のデバイス15が形成されている。 The surface 11a side of the workpiece 11 is divided into a plurality of regions by a plurality of scheduled division lines (streets) 13 intersecting each other, and devices 15 such as ICs and LSIs are formed in each region.

なお、被加工物11の材質、形状、構造、大きさ等に制限はない。例えば、シリコン以外の他の半導体材料でなる基板を被加工物11として用いることもできる。同様に、デバイス15の種類、数量、形状、構造、大きさ、配置等にも制限はない。 There are no restrictions on the material, shape, structure, size, etc. of the workpiece 11. For example, a substrate made of a semiconductor material other than silicon can be used as the workpiece 11. Similarly, there are no restrictions on the type, quantity, shape, structure, size, arrangement, etc. of the device 15.

被加工物11の表面11a側には、複数のデバイス15を含む円形のデバイス領域17aと、デバイス領域17aの周囲を囲み、デバイス15が設けられていない環状の外周余剰領域17bとが設けられている。 On the surface 11a side of the workpiece 11, a circular device region 17a including a plurality of devices 15 and an annular outer peripheral surplus region 17b surrounding the device region 17a and not provided with the device 15 are provided. There is.

図1では、デバイス領域17aと外周余剰領域17bとの境界線を破線で示すが、この境界線は、仮想線であり、実際には被加工物11に付されていない。なお、被加工物11の表面11a側及び裏面11b側における各外周部には、角部が面取りされたベベル部(図2(A)等参照)が形成されている。 In FIG. 1, the boundary line between the device area 17a and the outer peripheral surplus area 17b is shown by a broken line, but this boundary line is a virtual line and is not actually attached to the workpiece 11. Bevel portions (see FIG. 2A and the like) having chamfered corners are formed on the outer peripheral portions of the workpiece 11 on the front surface 11a side and the back surface 11b side.

次に、図1から図4を用いて、被加工物11の裏面11b側を研削して、裏面11b側に円盤状の凹部を形成する方法を説明する。図4は、本発明の一実施形態に係る研削方法のフロー図である。 Next, a method of grinding the back surface 11b side of the workpiece 11 to form a disk-shaped recess on the back surface 11b side will be described with reference to FIGS. 1 to 4. FIG. 4 is a flow chart of a grinding method according to an embodiment of the present invention.

まず、表面11a側を保護するために、被加工物11の表面11a側に保護部材19を貼り付けて、表面11a側が保護部材19で覆われた被加工物ユニット21を形成する(表面保護ステップ(S10))。 First, in order to protect the surface 11a side, a protective member 19 is attached to the surface 11a side of the workpiece 11, to form a workpiece unit 21 whose surface 11a side is covered with the protective member 19 (surface protection step). (S10)).

図1は、表面保護ステップ(S10)を示す斜視図である。保護部材19は、表面11aに加えて、表面11a側のベベル部も覆う様に貼り付けられる。保護部材19は、樹脂で形成された円盤状のシートであり、基材層と、基材層の第1面に設けられた糊層とを有する。 FIG. 1 is a perspective view showing a surface protection step (S10). The protective member 19 is attached so as to cover the bevel portion on the surface 11a side in addition to the surface 11a. The protective member 19 is a disk-shaped sheet made of resin, and has a base material layer and a glue layer provided on the first surface of the base material layer.

糊層は、例えば、紫外線硬化樹脂で構成されるが、熱硬化性樹脂や自然硬化性樹脂で構成されてもよい。なお、基材層には必ずしも糊層が設けられなくてもよい。例えば、保護部材19は、基材層のみで構成され、熱圧着等の代替的な手法で表面11a側に貼り付けられてもよい。 The glue layer is made of, for example, an ultraviolet curable resin, but may be made of a thermosetting resin or a naturally curable resin. The base material layer does not necessarily have to be provided with a glue layer. For example, the protective member 19 may be composed of only the base material layer and may be attached to the surface 11a side by an alternative method such as thermocompression bonding.

表面保護ステップ(S10)の後、研削装置20を用いて裏面11b側を研削する。研削装置20は、チャックテーブル22を備える。チャックテーブル22は、セラミックスで形成された円盤状の枠体24を有する。 After the front surface protection step (S10), the back surface 11b side is ground using the grinding device 20. The grinding device 20 includes a chuck table 22. The chuck table 22 has a disk-shaped frame body 24 made of ceramics.

枠体24には、円盤状の凹部24aが形成されており、凹部24aには円盤状のポーラス板26が固定される。ポーラス板26の下面側には、所定の流路(不図示)の一端が接続されている。流路の他端には、真空ポンプ等の吸引源(不図示)が接続されている。吸引源により発生された負圧は、流路を介してポーラス板26の上面26aに作用する。 A disk-shaped recess 24a is formed in the frame body 24, and a disk-shaped porous plate 26 is fixed to the recess 24a. One end of a predetermined flow path (not shown) is connected to the lower surface side of the porous plate 26. A suction source (not shown) such as a vacuum pump is connected to the other end of the flow path. The negative pressure generated by the suction source acts on the upper surface 26a of the porous plate 26 via the flow path.

上面26aは略平坦であり、凹部24aの外側に位置する枠体24の環状の上面24bと、略面一を成す。ポーラス板26の上面26aと、枠体24の上面24bとは、被加工物11の表面11a側を吸引して保持する保持面28を構成する。 The upper surface 26a is substantially flat and forms substantially flush with the annular upper surface 24b of the frame body 24 located outside the recess 24a. The upper surface 26a of the porous plate 26 and the upper surface 24b of the frame body 24 form a holding surface 28 that attracts and holds the surface 11a side of the workpiece 11.

本実施形態の保持面28は、デバイス領域17aの直径よりも大きく且つ被加工物11の外径よりも小さい直径を有する。枠体24の下部には、モーター等の回転駆動源(不図示)の出力軸(第1の回転軸)30が固定されている。 The holding surface 28 of the present embodiment has a diameter larger than the diameter of the device region 17a and smaller than the outer diameter of the workpiece 11. An output shaft (first rotation shaft) 30 of a rotation drive source (not shown) such as a motor is fixed to the lower portion of the frame body 24.

出力軸30は、保持面28と略直交する様に、Z軸方向(研削送り方向)に沿って配置されている。チャックテーブル22の上方には、研削ユニット32が配置されている。研削ユニット32は、高さ方向がZ軸方向に沿って配置された円筒状のスピンドルハウジング(不図示)を有する。 The output shaft 30 is arranged along the Z-axis direction (grinding feed direction) so as to be substantially orthogonal to the holding surface 28. A grinding unit 32 is arranged above the chuck table 22. The grinding unit 32 has a cylindrical spindle housing (not shown) arranged in the height direction along the Z-axis direction.

スピンドルハウジングには、スピンドルハウジングをZ軸方向に沿って移動させるためのボールネジ式の研削送り機構(不図示)が連結されている。スピンドルハウジングの内部には、円柱状のスピンドル(第2の回転軸)34の一部が回転可能な態様で支持されている。 A ball screw type grinding feed mechanism (not shown) for moving the spindle housing along the Z-axis direction is connected to the spindle housing. Inside the spindle housing, a part of a columnar spindle (second rotating shaft) 34 is supported in a rotatable manner.

スピンドル34は、チャックテーブル22の出力軸30と略平行になる様に配置されている。スピンドル34の上端部には、モーター等の回転駆動源が連結されており、スピンドル34の下端部には、円盤状のホイールマウント36が固定されている。 The spindle 34 is arranged so as to be substantially parallel to the output shaft 30 of the chuck table 22. A rotary drive source such as a motor is connected to the upper end of the spindle 34, and a disk-shaped wheel mount 36 is fixed to the lower end of the spindle 34.

ホイールマウント36の下面には、環状の研削ホイール38が装着されている。研削ホイール38は、環状のホイール基台38aを有する。ホイール基台38aの一面側には、ブロック状の複数の研削砥石38bが、ホイール基台38aの周方向に沿って略等間隔で離散的に配置されている。 An annular grinding wheel 38 is mounted on the lower surface of the wheel mount 36. The grinding wheel 38 has an annular wheel base 38a. On one surface side of the wheel base 38a, a plurality of block-shaped grinding wheels 38b are discretely arranged at substantially equal intervals along the circumferential direction of the wheel base 38a.

複数の研削砥石38bがスピンドル34の周りに回転すると、複数の研削砥石38bが移動する軌跡により、環状の領域が形成される。本実施形態では、環状の領域の最外周の直径は、デバイス領域17aの半径よりも大きく、且つ、デバイス領域17aの直径よりも小さくなる様に、設定されている。 When the plurality of grinding wheels 38b rotate around the spindle 34, an annular region is formed by the locus of movement of the plurality of grinding wheels 38b. In the present embodiment, the diameter of the outermost circumference of the annular region is set to be larger than the radius of the device region 17a and smaller than the diameter of the device region 17a.

表面保護ステップ(S10)の後、位置合わせ装置(不図示)を用いて、表面11a(又は裏面11b)の中心位置を調整する。その後、表面11a(又は裏面11b)の中心と保持面28の中心とが略一致する様に、被加工物11を保持面28に載置する。 After the surface protection step (S10), the center position of the front surface 11a (or the back surface 11b) is adjusted using an alignment device (not shown). After that, the workpiece 11 is placed on the holding surface 28 so that the center of the front surface 11a (or the back surface 11b) and the center of the holding surface 28 substantially coincide with each other.

次いで、図2に示す様に、被加工物ユニット21の表面11a側(即ち、保護部材19の被保持面側)を保持面28で吸引保持する(保持ステップ(S20))。上述の様に、保持面28の直径は、デバイス領域17aの外径以上、且つ、被加工物11の外径以下である。 Next, as shown in FIG. 2, the surface 11a side of the workpiece unit 21 (that is, the holding surface side of the protective member 19) is suction-held by the holding surface 28 (holding step (S20)). As described above, the diameter of the holding surface 28 is equal to or larger than the outer diameter of the device region 17a and equal to or smaller than the outer diameter of the workpiece 11.

それゆえ、外周余剰領域17bの少なくとも一部は、保持面28の外側に位置する。この状態で、出力軸30の周りにチャックテーブル22を第1の回転数で回転させ、更に、スピンドル34の周りに研削ホイール38を第2の回転数で、例えば、出力軸30と同じ方向に回転させる。 Therefore, at least a part of the outer peripheral excess region 17b is located outside the holding surface 28. In this state, the chuck table 22 is rotated around the output shaft 30 at the first rotation speed, and the grinding wheel 38 is further rotated around the spindle 34 at the second rotation speed, for example, in the same direction as the output shaft 30. Rotate.

加えて、研削ホイール38に設けられた研削水供給口(不図示)から、研削砥石38bに純水等の研削水40を供給しながら、研削ホイール38を研削送りする。そして、デバイス領域17aに対応する裏面11b側の領域に、研削砥石38bを接触させる(研削ステップ(S30))。 In addition, the grinding wheel 38 is grounded and fed while supplying the grinding water 40 such as pure water to the grinding wheel 38b from the grinding water supply port (not shown) provided on the grinding wheel 38. Then, the grinding wheel 38b is brought into contact with the region on the back surface 11b side corresponding to the device region 17a (grinding step (S30)).

図2(A)は、研削ステップ(S30)を示す一部断面側面図であり、図2(B)は、図2(A)の部分拡大図である。研削ステップ(S30)では、デバイス領域17aに対応する裏面11b側の一部を研削し、円形の被研削部11cを形成する。 FIG. 2A is a partial cross-sectional side view showing the grinding step (S30), and FIG. 2B is a partially enlarged view of FIG. 2A. In the grinding step (S30), a part of the back surface 11b side corresponding to the device region 17a is ground to form a circular portion to be ground 11c.

研削ステップ(S30)では、加工屑を含む使用後の研削水40が、被加工物11の裏面11b側の外周部から下方へ落下又は飛散するので、保持面28の外周部及び保護部材19の外周部に、使用後の研削水40が回り込み難くなる。それゆえ、保持面28及び保護部材19の外周部に付着する研削屑の量を低減できる。 In the grinding step (S30), the used grinding water 40 containing the machining chips falls or scatters downward from the outer peripheral portion on the back surface 11b side of the workpiece 11, so that the outer peripheral portion of the holding surface 28 and the protective member 19 It becomes difficult for the used grinding water 40 to wrap around the outer peripheral portion. Therefore, the amount of grinding debris adhering to the outer peripheral portion of the holding surface 28 and the protective member 19 can be reduced.

加えて、保持面28の直径をデバイス領域17aの外径以上とすることで、デバイス領域17aを適切に支持した上で、デバイス領域17aに対応する裏面11b側の領域を研削できるので、被研削部11cにおける研削不良を回避できる。 In addition, by setting the diameter of the holding surface 28 to be equal to or larger than the outer diameter of the device region 17a, it is possible to grind the region on the back surface 11b side corresponding to the device region 17a while appropriately supporting the device region 17a. Grinding defects in the portion 11c can be avoided.

図3(A)は、研削ステップ(S30)後の被加工物ユニット21の斜視図であり、図3(B)は、研削ステップ(S30)後の被加工物ユニット21の断面図である。被研削部11cの周囲を囲む様に、研削が施されていないリング状補強部11dが残存している。被研削部11c及びリング状補強部11dは、円盤状の凹部11eを構成する。 FIG. 3A is a perspective view of the workpiece unit 21 after the grinding step (S30), and FIG. 3B is a cross-sectional view of the workpiece unit 21 after the grinding step (S30). A ring-shaped reinforcing portion 11d that has not been ground remains so as to surround the periphery of the portion 11c to be ground. The portion to be ground 11c and the ring-shaped reinforcing portion 11d form a disk-shaped recess 11e.

次に、図5(A)から図5(C)を用いて、比較例について説明する。比較例に係る研削装置50は、チャックテーブル52を備える。チャックテーブル52は、セラミックスで形成された円盤状の枠体54を有する。 Next, a comparative example will be described with reference to FIGS. 5 (A) to 5 (C). The grinding device 50 according to the comparative example includes a chuck table 52. The chuck table 52 has a disk-shaped frame 54 made of ceramics.

枠体54には、円盤状の凹部54aが形成されている。凹部54aには、凹部54aの直径よりも小さな外径を有する円盤状のポーラス板56が設けられている。また、ポーラス板56の外周と凹部54aの内周との間には、ポーラス板56の細孔に比べて小さな細孔を有する環状のバリア部58が設けられている。 A disk-shaped recess 54a is formed in the frame body 54. The recess 54a is provided with a disk-shaped porous plate 56 having an outer diameter smaller than the diameter of the recess 54a. Further, an annular barrier portion 58 having pores smaller than the pores of the porous plate 56 is provided between the outer circumference of the porous plate 56 and the inner circumference of the recess 54a.

ポーラス板56及びバリア部58の下面側には、所定の流路(不図示)の一端が接続されている。この流路の他端には、真空ポンプ等の吸引源(不図示)が接続されている。吸引源により発生された負圧は、流路を介してポーラス板26の上面26aと、バリア部58の上面58aとに作用する。 One end of a predetermined flow path (not shown) is connected to the lower surface side of the porous plate 56 and the barrier portion 58. A suction source (not shown) such as a vacuum pump is connected to the other end of this flow path. The negative pressure generated by the suction source acts on the upper surface 26a of the porous plate 26 and the upper surface 58a of the barrier portion 58 via the flow path.

なお、バリア部58は、ポーラス板56の細孔に比べて小さな細孔を有するので、バリア部58の上面58aに作用する負圧の大きさは、ポーラス板26の上面26aに作用する負圧の大きさに比べて小さくなる。 Since the barrier portion 58 has pores smaller than the pores of the porous plate 56, the magnitude of the negative pressure acting on the upper surface 58a of the barrier portion 58 is the negative pressure acting on the upper surface 26a of the porous plate 26. It is smaller than the size of.

上面56a及び上面58aは略平坦であり、凹部54aの外側に位置する枠体54の環状の上面54bと、略面一を成す。上面26a及び上面58aと、上面54bとは、被加工物11の表面11a側を吸引して保持する保持面60を構成する。 The upper surface 56a and the upper surface 58a are substantially flat and form substantially flush with the annular upper surface 54b of the frame body 54 located outside the recess 54a. The upper surface 26a and the upper surface 58a and the upper surface 54b form a holding surface 60 that sucks and holds the surface 11a side of the workpiece 11.

保持面60は、被加工物11の外径よりも大きい直径を有する。枠体54の下部には、モーター等の回転駆動源(不図示)の出力軸62が固定されている。チャックテーブル52の上方には、上述の実施形態と同じ、研削ユニット32が配置されている。 The holding surface 60 has a diameter larger than the outer diameter of the workpiece 11. An output shaft 62 of a rotation drive source (not shown) such as a motor is fixed to the lower part of the frame body 54. The grinding unit 32, which is the same as that of the above-described embodiment, is arranged above the chuck table 52.

比較例に係る研削装置50を用いて被加工物11の裏面11b側の一部を研削するときには、上述の実施形態と同様に、表面保護ステップ(S10)から研削ステップ(S30)を順次行う。 When a part of the back surface 11b side of the workpiece 11 is ground by using the grinding device 50 according to the comparative example, the surface protection step (S10) to the grinding step (S30) are sequentially performed in the same manner as in the above-described embodiment.

図5(A)は、比較例に係る研削ステップ(S30)を示す一部断面側面図である。被加工物11は、被加工物11の外径よりも大きな直径を有する保持面60で吸引保持される。特に、バリア部58の上面58aには、保護部材19に接していない露出領域が存在する。 FIG. 5A is a partial cross-sectional side view showing the grinding step (S30) according to the comparative example. The workpiece 11 is suction-held by a holding surface 60 having a diameter larger than the outer diameter of the workpiece 11. In particular, the upper surface 58a of the barrier portion 58 has an exposed region that is not in contact with the protective member 19.

それゆえ、研削ステップ(S30)では、加工屑を含んでいる使用後の研削水40が、被加工物11の裏面11b側から、被加工物11の外周部のベベル部を経て、保持面60の外周部へ流れる。このとき、使用後の研削水40は、ポーラス板56及びバリア部58の吸引力により保護部材19の被保持面と保持面60との間に浸入する。 Therefore, in the grinding step (S30), the used grinding water 40 containing the machining chips passes from the back surface 11b side of the workpiece 11 through the bevel portion of the outer peripheral portion of the workpiece 11 and the holding surface 60. Flows to the outer periphery of. At this time, the used grinding water 40 penetrates between the held surface and the holding surface 60 of the protective member 19 by the suction force of the porous plate 56 and the barrier portion 58.

従って、保持面60の外周部と、保護部材19の被保持面の外周部とには、研削屑64(図5(B)及び図5(C)参照)が付着する。図5(B)は、比較例に係る研削後の保持面60の上面図である。図5(B)に示す様に、研削後には、バリア部58の上面58aと、ポーラス板56の上面56aとの境界付近に、多量の研削屑64が付着している。 Therefore, grinding debris 64 (see FIGS. 5B and 5C) adheres to the outer peripheral portion of the holding surface 60 and the outer peripheral portion of the held surface of the protective member 19. FIG. 5B is a top view of the holding surface 60 after grinding according to the comparative example. As shown in FIG. 5B, after grinding, a large amount of grinding debris 64 is attached near the boundary between the upper surface 58a of the barrier portion 58 and the upper surface 56a of the porous plate 56.

また、研削後には、保護部材19の被保持面の外周部にも、多量の研削屑64が付着している。図5(C)は、比較例に係る研削後の被加工物ユニット21の底面図である。なお、図5(C)に示す破線は、上面58aと上面56aとの境界を意味する。 Further, after grinding, a large amount of grinding debris 64 also adheres to the outer peripheral portion of the held surface of the protective member 19. FIG. 5C is a bottom view of the work piece unit 21 after grinding according to the comparative example. The broken line shown in FIG. 5C means the boundary between the upper surface 58a and the upper surface 56a.

図5(A)から図5(C)の比較例に示す様に、被加工物11の外径よりも大きな直径を有する保持面60を有するチャックテーブル52を使用する場合には、研削後の研削屑64の付着が問題となる。 As shown in the comparative examples of FIGS. 5A to 5C, when a chuck table 52 having a holding surface 60 having a diameter larger than the outer diameter of the workpiece 11 is used, it is after grinding. Adhesion of grinding debris 64 becomes a problem.

これに対して、上述の実施形態では、保持面28の外周部及び保護部材19の被保持面の外周部に付着する研削屑64の量を低減できる。その他、上記実施形態に係る構造、方法等は、本発明の目的の範囲を逸脱しない限りにおいて適宜変更して実施できる。 On the other hand, in the above-described embodiment, the amount of grinding debris 64 adhering to the outer peripheral portion of the holding surface 28 and the outer peripheral portion of the held surface of the protective member 19 can be reduced. In addition, the structure, method, and the like according to the above-described embodiment can be appropriately modified and implemented as long as they do not deviate from the scope of the object of the present invention.

11:被加工物、11a:表面、11b:裏面、11c:被研削部、11d:リング状補強部、11e:凹部
13:分割予定ライン
15:デバイス
17a:デバイス領域、17b:外周余剰領域
19:保護部材
20:研削装置
21:被加工物ユニット
22:チャックテーブル
24:枠体、24a:凹部、24b:上面
26:ポーラス板、26a:上面
28:保持面
30:出力軸
32:研削ユニット
34:スピンドル
36:ホイールマウント
38:研削ホイール、38a:ホイール基台、38b:研削砥石
40:研削水
50:研削装置
52:チャックテーブル
54:枠体、54a:凹部、54b:上面
56:ポーラス板、56a:上面
58:バリア部、58a:上面
60:保持面
62:出力軸
64:研削屑
11: Work piece, 11a: Front surface, 11b: Back surface, 11c: Grinded portion, 11d: Ring-shaped reinforcing portion, 11e: Recessed portion 13: Scheduled division line 15: Device 17a: Device region, 17b: Outer peripheral surplus region 19: Protective member 20: Grinding device 21: Work unit 22: Chuck table 24: Frame, 24a: Recess, 24b: Top surface 26: Porous plate, 26a: Top surface 28: Holding surface 30: Output shaft 32: Grinding unit 34: Spindle 36: Wheel mount 38: Grinding wheel, 38a: Wheel base, 38b: Grinding grindstone 40: Grinding water 50: Grinding device 52: Chuck table 54: Frame body, 54a: Recessed shape, 54b: Top surface 56: Porous plate, 56a : Top surface 58: Barrier portion, 58a: Top surface 60: Holding surface 62: Output shaft 64: Grinding waste

Claims (1)

複数のデバイスが形成されたデバイス領域と該デバイス領域の周囲を囲む外周余剰領域とを表面側に有する被加工物の裏面側を、研削砥石を有する研削ホイールで研削する被加工物の研削方法であって、
該被加工物の該表面側を保護部材で覆う表面保護ステップと、
該デバイス領域の直径よりも大きく且つ該被加工物の外径よりも小さい直径の保持面を有するチャックテーブルで、該保護部材を介して該被加工物の該表面側を吸引して保持する保持ステップと、
該チャックテーブルを第1の回転軸の周りで回転させ、且つ、該研削ホイールを第2の回転軸の周りで回転させた状態で、該研削砥石に研削水を供給しながら該研削砥石を該裏面側の一部に接触させることにより該裏面側の一部を研削して、研削が施された円形の被研削部と、該被研削部の周囲を囲み且つ研削が施されていないリング状補強部と、で構成される円盤状の凹部を形成する研削ステップと、を備えることを特徴とする研削方法。
A method of grinding a workpiece that has a device region on which a plurality of devices are formed and an outer peripheral surplus region surrounding the device region on the front surface side, and the back surface side of the workpiece is ground with a grinding wheel having a grinding wheel. There,
A surface protection step that covers the surface side of the work piece with a protective member,
A chuck table having a holding surface having a diameter larger than the diameter of the device region and smaller than the outer diameter of the work piece, and holding the work piece by sucking and holding the surface side of the work piece through the protective member. Steps and
With the chuck table rotated around the first axis of rotation and the grinding wheel rotated around the second axis of rotation, the grinding wheel was moved while supplying grinding water to the grinding wheel. A part of the back surface side is ground by contacting a part of the back surface side, and a circular ground portion to be ground and a ring shape surrounding the ground portion and not being ground. A grinding method comprising a reinforcing portion and a grinding step for forming a disk-shaped recess composed of the reinforcing portion.
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