JP2021134186A - Novel strong acid and use thereof - Google Patents
Novel strong acid and use thereof Download PDFInfo
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- JP2021134186A JP2021134186A JP2020032778A JP2020032778A JP2021134186A JP 2021134186 A JP2021134186 A JP 2021134186A JP 2020032778 A JP2020032778 A JP 2020032778A JP 2020032778 A JP2020032778 A JP 2020032778A JP 2021134186 A JP2021134186 A JP 2021134186A
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- 239000002253 acid Substances 0.000 title claims abstract description 31
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims abstract description 12
- 150000007513 acids Chemical class 0.000 claims abstract description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 7
- 229920001774 Perfluoroether Polymers 0.000 claims abstract description 5
- 125000002252 acyl group Chemical group 0.000 claims abstract description 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 5
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 5
- 150000002367 halogens Chemical class 0.000 claims abstract description 5
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 5
- 238000004519 manufacturing process Methods 0.000 claims description 80
- -1 bis (trifluoromethyl) phenyl group Chemical group 0.000 claims description 15
- 239000003054 catalyst Substances 0.000 claims description 7
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims description 2
- 150000002894 organic compounds Chemical class 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 3
- 230000007062 hydrolysis Effects 0.000 abstract description 2
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 12
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 12
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 6
- 229910002091 carbon monoxide Inorganic materials 0.000 description 6
- 238000007334 copolymerization reaction Methods 0.000 description 6
- XEKTVXADUPBFOA-UHFFFAOYSA-N 1-bromo-2,3,4,5,6-pentafluorobenzene Chemical compound FC1=C(F)C(F)=C(Br)C(F)=C1F XEKTVXADUPBFOA-UHFFFAOYSA-N 0.000 description 5
- 150000001336 alkenes Chemical class 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical class CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 150000001733 carboxylic acid esters Chemical class 0.000 description 4
- 150000001735 carboxylic acids Chemical class 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- HZYABSBSRWFZEG-BSWSSELBSA-N (1E,3E)-octa-1,3-dien-1-ol Chemical compound CCCC\C=C\C=C\O HZYABSBSRWFZEG-BSWSSELBSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- ANFXTILBDGTSEG-UHFFFAOYSA-N 1-methyl-4,5-dihydroimidazole Chemical class CN1CCN=C1 ANFXTILBDGTSEG-UHFFFAOYSA-N 0.000 description 2
- 125000004361 3,4,5-trifluorophenyl group Chemical group [H]C1=C(F)C(F)=C(F)C([H])=C1* 0.000 description 2
- 125000004801 4-cyanophenyl group Chemical group [H]C1=C([H])C(C#N)=C([H])C([H])=C1* 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- HEFNNWSXXWATRW-UHFFFAOYSA-N Ibuprofen Chemical compound CC(C)CC1=CC=C(C(C)C(O)=O)C=C1 HEFNNWSXXWATRW-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 150000001242 acetic acid derivatives Chemical class 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000010426 asphalt Substances 0.000 description 2
- 238000009876 asymmetric hydrogenation reaction Methods 0.000 description 2
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000002872 contrast media Substances 0.000 description 2
- 150000001989 diazonium salts Chemical class 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000000295 fuel oil Substances 0.000 description 2
- 238000007037 hydroformylation reaction Methods 0.000 description 2
- 150000002466 imines Chemical class 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 238000006317 isomerization reaction Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000011255 nonaqueous electrolyte Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-O phenylazanium Chemical group [NH3+]C1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-O 0.000 description 2
- 229920002779 poly(alkoxythiophenes) Polymers 0.000 description 2
- 229920003050 poly-cycloolefin Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical group C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 2
- 150000003233 pyrroles Chemical class 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000011232 storage material Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000007651 thermal printing Methods 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- CSVCVIHEBDJTCJ-UHFFFAOYSA-N 1-bromo-3,5-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC(Br)=CC(C(F)(F)F)=C1 CSVCVIHEBDJTCJ-UHFFFAOYSA-N 0.000 description 1
- ZDFBKZUDCQQKAC-UHFFFAOYSA-N 1-bromo-4-nitrobenzene Chemical compound [O-][N+](=O)C1=CC=C(Br)C=C1 ZDFBKZUDCQQKAC-UHFFFAOYSA-N 0.000 description 1
- HQSCPPCMBMFJJN-UHFFFAOYSA-N 4-bromobenzonitrile Chemical compound BrC1=CC=C(C#N)C=C1 HQSCPPCMBMFJJN-UHFFFAOYSA-N 0.000 description 1
- HKJCELUUIFFSIN-UHFFFAOYSA-N 5-bromo-1,2,3-trifluorobenzene Chemical compound FC1=CC(Br)=CC(F)=C1F HKJCELUUIFFSIN-UHFFFAOYSA-N 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 229920001429 chelating resin Polymers 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 125000003678 cyclohexadienyl group Chemical group C1(=CC=CCC1)* 0.000 description 1
- 238000006477 desulfuration reaction Methods 0.000 description 1
- 230000023556 desulfurization Effects 0.000 description 1
- VURFVHCLMJOLKN-UHFFFAOYSA-N diphosphane Chemical compound PP VURFVHCLMJOLKN-UHFFFAOYSA-N 0.000 description 1
- UPWPDUACHOATKO-UHFFFAOYSA-K gallium trichloride Chemical compound Cl[Ga](Cl)Cl UPWPDUACHOATKO-UHFFFAOYSA-K 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 230000033444 hydroxylation Effects 0.000 description 1
- 238000005805 hydroxylation reaction Methods 0.000 description 1
- 229960001680 ibuprofen Drugs 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000000636 p-nitrophenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)[N+]([O-])=O 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
本発明は下記一般式(1)
[(R1)( R2)( R3)( R4)Ga]−H+ [I]
〔式(1)中、R1〜R4は互いに独立して、パーフルオロアルキル基、パーフルオロアルコキシ基、ニトロ基、シアノ基、アシル基及びハロゲンからなる群より選ばれる基で置換されてよいフェニル基又はパーフルオロアルキル基を表す。〕
で表される酸に関する。
本発明は、さらにまた本発明による酸の使用に関する。
The present invention has the following general formula (1).
[(R 1 ) (R 2 ) (R 3 ) (R 4 ) Ga] − H + [I]
[In formula (1), R 1 to R 4 may be independently substituted with a group selected from the group consisting of a perfluoroalkyl group, a perfluoroalkoxy group, a nitro group, a cyano group, an acyl group and a halogen. Represents a phenyl group or a perfluoroalkyl group. ]
With respect to the acid represented by.
The present invention further relates to the use of acids according to the present invention.
超強酸として知られているHPF6、HSbF6、HPF3(C2F5)3は、有機化学の触媒として使用されているが、これらの超強酸は水により容易に加水分解しフッ化水素酸が発生することから、取扱いに特に注意が必要となる。 HPF 6 , HSbF 6 , and HPF 3 (C 2 F 5 ) 3 , which are known as super strong acids, are used as catalysts in organic chemistry, but these super strong acids are easily hydrolyzed by water and hydrogen fluoride. Since acid is generated, special care must be taken in handling.
従って、本発明は、従来技術の欠点を有さない、新規超強酸を提供することを目的とする。 Therefore, an object of the present invention is to provide a novel superstrong acid that does not have the drawbacks of the prior art.
本発明者らは、上記の目的を達成するべく検討を行った結果、本発明に到達した。
すなわち、本発明は、下記一般式(1)
[(R1)( R2)( R3)( R4)Ga]−H+ (1)
〔式(1)中、R1〜R4は互いに独立して、パーフルオロアルキル基、パーフルオロアルコキシ基、ニトロ基、シアノ基、アシル基及びハロゲンからなる群より選ばれる基で置換されてよいフェニル基又はパーフルオロアルキル基を表す。〕
で表される酸である。
The present inventors have arrived at the present invention as a result of studies for achieving the above object.
That is, the present invention has the following general formula (1).
[(R 1 ) (R 2 ) (R 3 ) (R 4 ) Ga] − H + (1)
[In formula (1), R 1 to R 4 may be independently substituted with a group selected from the group consisting of a perfluoroalkyl group, a perfluoroalkoxy group, a nitro group, a cyano group, an acyl group and a halogen. Represents a phenyl group or a perfluoroalkyl group. ]
It is an acid represented by.
これまでに知られている超強酸と同等以上の高いプロトン活性を有しかつ加水分解によりフッ化水素酸を発生することがないという効果を奏する。 It has the effect of having a high proton activity equal to or higher than that of the super strong acids known so far and not generating hydrofluoric acid by hydrolysis.
一般式(1)において、R1〜R4は互いに独立して、パーフルオロアルキル基、パーフルオロアルコキシ基、ニトロ基、シアノ基、アシル基及びハロゲンからなる群より選ばれる基で置換されてよいフェニル基又はパーフルオロアルキル基を表す。
好ましくはR1〜R4がパーフルオロアルキル基又はフッ素原子で置換されたフェニル基であり、特に好ましくはR1〜R4がペンタフルオロフェニル基又はビス(トリフルオロメチル)フェニル基である。
In the general formula (1), R 1 to R 4 may be independently substituted with a group selected from the group consisting of a perfluoroalkyl group, a perfluoroalkoxy group, a nitro group, a cyano group, an acyl group and a halogen. Represents a phenyl group or a perfluoroalkyl group.
Preferably R 1 to R 4 is a perfluoroalkyl group or a phenyl group substituted with a fluorine atom, and particularly preferably R 1 to R 4 is a pentafluorophenyl group or a bis (trifluoromethyl) phenyl group.
本発明は、本発明の酸の有機化合物の製造における触媒としての使用にも関する。
本発明の酸は、特に化学反応においてHPF6、HSbF6およびHPF3(C2F5)3の代替品として適当である。
本発明の酸は、以下の方法で好ましく使用される。
・感光性ポリマーの製造[CA(Chemical Abstracts) 110:15956e]
・ジヒドロキシジアリール化合物の製造[CA 110:94679t]
・金属表面処理[CA 110:139975e]
・電気導電性アニリンポリマーの製造[CA 110:155067r]
・カルボン酸およびカルボン酸エステルの製造[CA 110:233613g]
・高分子量ジアゾニウム化合物の製造[CA 110:87472n]
・エポキシ樹脂の製造[CA 111:135490r]
・アミン様化合物からの電気導電性材料の製造[CA 112:46758n]
・オクタジエノールの製造 [CA 112:98016p]
・オレフィンのカルボアミノ化またはカルボアミド化[CA 112:161007d]
・ブテンの異性化[CA 112:157653u]
・電気導電性ポリアルコキシチオフェンの製造[CA 115:50551u]
・オイルおよび廃液の脱硫化[CA 116:261878q]
・トリグリシジルトリメチロールアルカンベースの組成物の製造[CA 117:92344a]
・スチレンおよび一酸化炭素からのポリマーの製造[CA 117:172290v]
・情報の貯蔵のための有機塩の製造[CA 117:17381g]
・良好な光抵抗を有する情報キャリアの製造[CA 115:267063w]
・触媒のためのシリコン支持材の製造[CA 117:74989k]
・ピロール誘導体の製造[CA 117:70577b]
・一酸化炭素およびオレフィン性不飽和化合物の共重合[CA 118:7520h]
・電気導電性ポリマーの製造[CA 118:137707k]
・磁性造影剤の製造[CA 118:299355x]
・ポリマーコーティングの製造[CA 119:54608y]
・ステンレス鋼の酸化層の除去[CA 119:77272y]
・メチルtert-ブチルエーテルの合成[CA 119:202992m]
・5〜7個の炭素を含む環状スルホニウム塩の製造[CA 119:249826a]
・シクロシロキサンの製造[CA 120:108008u]
・重油およびビチューメンの精製[CA 120:195633k]
・アルミニウム化合物の処理[CA 120:283104u]
・第4級ピリジニウムまたはアニリニウム塩の製造[CA 121:9165g]
・および一酸化炭素の共重合[CA 121:10209f]
・芳香族ヒドロキシル化合物の製造[CA 121:133684q]
・酢酸エステル誘導体の製造[CA 121:157308w]
・ジアルケニルベンゼンおよびポリアリールアミンからの樹脂の製造[CA 122:70050c]
・置換ピロロピリミジン−4−オンの製造[CA 122:314562q]
・石油の回収[CA 122:295102w]
・非水性電解液としての使用[CA 122:118595j]
・安定なメチルカチオンの製造[CA 124:288639q]
・環状スルホニウム塩の製造[CA 125:114470h]
・光学貯蔵材料の製造[CA 125:127895a]
・共役フルオロピリジニウム塩の製造[CA 125:119500c]
・イリジウム/ジホスフィン錯体の製造[CA 126:226760e]
・イミンの不斉水素化[CA 126:225097g]
・不飽和化合物のヒドロホルミル化[CA 126:225032g]
・ポリマーの合成[CA 126:104554v]
・シリル基を有するポリシクロオレフィンからのポリマーの製造[CA 127:110414m]
・ルテニウム触媒の製造[CA 127:83071p]
・イブプロフェンの製造[CA 127:318741y]
・シクロヘキサジエニル化合物の製造 [CA 126:212225x]
・オレフィンの共重合[CA 126:199931c]
・無機メチルイミダゾリニウム塩の製造[CA 128:167423p]
・SiCOおよびSiCセラミック繊維の製造[CA 128:234151p]
・温熱印刷材料の製造[CA 128:210892e]
・ポリマーの製造[CA 129:317091r]
・アジリジン−ポリエーテル化合物の製造[CA 131:35901v]
・ジカルボン酸ジエステルの製造[CA 131:199417t]
・芳香族炭化水素の水酸化 [CA 129:218223d]
・カルボン酸およびカルボン酸エステルの製造[CA 129:216347y]
・リソグラフ印刷板の前処理[CA 129:195815g]
The present invention also relates to the use of the acid of the present invention as a catalyst in the production of organic compounds.
The acids of the present invention are suitable as alternatives to HPF 6 , HSbF 6 and HPF 3 (C 2 F 5 ) 3, especially in chemical reactions.
The acid of the present invention is preferably used by the following methods.
-Manufacture of photosensitive polymers [CA (Chemical Abstracts) 110: 15956e]
-Production of dihydroxydiaryl compounds [CA 110: 94679t]
-Metal surface treatment [CA 110: 139975e]
-Manufacture of electrically conductive aniline polymer [CA 110: 155067r]
-Manufacture of carboxylic acids and carboxylic acid esters [CA 110: 233613g]
-Manufacture of high molecular weight diazonium compounds [CA 110: 87472n]
・ Manufacturing of epoxy resin [CA 111: 135490r]
-Manufacture of electrically conductive materials from amine-like compounds [CA 112: 46758n]
・ Manufacture of octadienol [CA 112: 98016p]
Carboaminolation or carboamidization of olefins [CA 112: 161007d]
・ Isomerization of butene [CA 112: 157653u]
-Manufacture of electrically conductive polyalkoxythiophene [CA 115: 50551u]
・ Desulfurization of oil and waste liquid [CA 116: 261878q]
-Manufacture of triglycidyl trimethylolpropane alkane-based compositions [CA 117: 92344a]
-Manufacture of polymers from styrene and carbon monoxide [CA 117: 172290v]
-Manufacture of organic salts for information storage [CA 117: 17381g]
-Manufacturing of information carriers with good light resistance [CA 115: 267063w]
-Manufacture of silicon supports for catalysts [CA 117: 74989k]
-Manufacture of pyrrole derivatives [CA 117: 70577b]
-Copolymerization of carbon monoxide and olefinically unsaturated compounds [CA 118: 7520h]
-Manufacture of electrically conductive polymers [CA 118: 137707k]
・ Manufacturing of magnetic contrast agent [CA 118: 299355x]
-Manufacturing of polymer coating [CA 119: 54608y]
-Removal of oxide layer of stainless steel [CA 119: 77272y]
-Synthesis of methyl tert-butyl ether [CA 119: 202992m]
-Production of cyclic sulfonium salt containing 5 to 7 carbons [CA 119: 249826a]
-Manufacturing of cyclosiloxane [CA 120: 108008u]
・ Refining of heavy oil and bitumen [CA 120: 195633k]
-Treatment of aluminum compounds [CA 120: 283104u]
-Manufacture of quaternary pyridinium or anilinium salt [CA 121: 9165g]
-And carbon monoxide copolymerization [CA 121: 10209f]
-Manufacture of aromatic hydroxyl compounds [CA 121: 133684q]
-Manufacture of acetate derivatives [CA 121: 157308w]
-Manufacture of resins from dialkenylbenzene and polyarylamine [CA 122: 70050c]
-Manufacture of substituted pyrolopyrimidine-4-one [CA 122: 314562q]
・ Oil recovery [CA 122: 295102w]
-Use as a non-aqueous electrolyte solution [CA 122: 118595j]
-Production of stable methyl cations [CA 124: 288639q]
-Manufacture of cyclic sulfonium salt [CA 125: 114470h]
-Manufacture of optical storage materials [CA 125: 127895a]
-Production of conjugated fluoropyridinium salt [CA 125: 119500c]
-Production of iridium / diphosphane complex [CA 126: 226760e]
・ Asymmetric hydrogenation of imine [CA 126: 225097g]
-Hydroformylation of unsaturated compounds [CA 126: 225032g]
-Polymer synthesis [CA 126: 104554v]
-Production of polymers from polycycloolefins having a silyl group [CA 127: 110414m]
-Manufacturing of ruthenium catalyst [CA 127: 83071p]
-Manufacture of ibuprofen [CA 127: 318741y]
-Production of cyclohexadienyl compound [CA 126: 212225x]
-Copolymerization of olefins [CA 126: 199931c]
-Manufacture of inorganic methylimidazolinium salt [CA 128: 167423p]
-Manufacturing of SiCO and SiC ceramic fibers [CA 128: 234151p]
-Manufacturing of thermal printing materials [CA 128: 210892e]
-Manufacturing of polymers [CA 129: 317091r]
-Production of aziridine-polyether compound [CA 131: 35901v]
-Manufacture of dicarboxylic acid diester [CA 131: 199417t]
-Hydrocarbonated aromatic hydrocarbons [CA 129: 218223d]
-Manufacture of carboxylic acids and carboxylic acid esters [CA 129: 216347y]
・ Pretreatment of lithographic printing board [CA 129: 195815g]
以下に本発明を実施例によって具体的に説明するが、本発明は実施例に何ら限定されるものではない。なお、以下特記しない限り、部は重量部、%は重量%を意味する。 Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited to the Examples. Unless otherwise specified, parts mean parts by weight and% means% by weight.
(実施例1)テトラキス(ペンタフルオロフェニル)ガレート酸の合成
窒素雰囲気下で十分に乾燥させた125mL4つ口フラスコに超脱水ジエチルエーテル360部及びペンタフルオロブロモベンゼン30部仕込み、これをドライアイス/アセトン浴を用いて−78℃に冷却した。2.5mol/Lのn−ブチルリチウムヘキサン溶液70部を10分かけて滴下し、その後、−78℃で30分撹拌した。これに、塩化ガリウム(III)5部を溶解させたジエチルエーテル溶液68部を10分かけて滴下し、−78℃で3時間撹拌した。反応液を徐々に室温に戻しながら攪拌し、室温に戻してから更に5時間撹拌した。析出した固体をろ過し、反応液をエバポレーターに移し、溶媒を留去することにより、灰白色の生成物を得た。生成物を超脱水ヘキサン50部で4回洗浄した後、一晩真空乾燥させ、50%溶液になるようにメタノールを加えた後、イオン交換樹脂(Amberlite@IR120 Aldrich社製)中に通すことにより、テトラキス(ペンタフルオロフェニル)ガレート酸を得た。生成物は19F−NMRにて同定した。
(Example 1) Synthesis of tetrakis (pentafluorophenyl) gallate acid 360 parts of super-dehydrated diethyl ether and 30 parts of pentafluorobromobenzene were placed in a 125 mL four-necked flask sufficiently dried under a nitrogen atmosphere, and these were charged with dry ice / acetone. It was cooled to −78 ° C. using a bath. 70 parts of a 2.5 mol / L n-butyllithium hexane solution was added dropwise over 10 minutes, and then the mixture was stirred at −78 ° C. for 30 minutes. To this, 68 parts of a diethyl ether solution in which 5 parts of gallium (III) chloride was dissolved was added dropwise over 10 minutes, and the mixture was stirred at −78 ° C. for 3 hours. The reaction mixture was stirred while gradually returning to room temperature, and after returning to room temperature, the mixture was further stirred for 5 hours. The precipitated solid was filtered, the reaction solution was transferred to an evaporator, and the solvent was distilled off to obtain a grayish white product. The product was washed 4 times with 50 parts of ultra-dehydrated hexane, vacuum dried overnight, methanol was added to make a 50% solution, and then passed through an ion exchange resin (Amberlite @ IR120 Aldrich). , Tetrakis (pentafluorophenyl) gallate acid was obtained. The product was identified by 19 F-NMR.
(実施例2)テトラキス(3,5−ビス(トリフルオロメチル)フェニル)ガレート酸の合成
ペンタフルオロブロモベンゼン30部を1−ブロモ−3,5−ビス(トリフルオロメチル)ベンゼン35.59部に変更した以外、実施例1と同様にして、テトラキス(3,5−ビス(トリフルオロメチル)フェニル)ガレート酸を得た。生成物は19F−NMRにて同定した。
(Example 2) Synthesis of tetrakis (3,5-bis (trifluoromethyl) phenyl) gallate acid 30 parts of pentafluorobromobenzene was added to 35.59 parts of 1-bromo-3,5-bis (trifluoromethyl) benzene. Tetrakiss (3,5-bis (trifluoromethyl) phenyl) gallate acid was obtained in the same manner as in Example 1 except for the modification. The product was identified by 19 F-NMR.
(実施例3)テトラキス(3,4,5−トリフルオロフェニル)ガレート酸の合成
ペンタフルオロブロモベンゼン30部を1−ブロモ−3,4,5−トリフルオロベンゼン25.63部に変更した以外、実施例1と同様にして、テトラキス(3,4,5−トリフルオロフェニル)ガレート酸を得た。生成物は19F−NMRにて同定した。
(Example 3) Synthesis of tetrakis (3,4,5-trifluorophenyl) gallate acid 30 parts of pentafluorobromobenzene was changed to 25.63 parts of 1-bromo-3,4,5-trifluorobenzene. Tetrakiss (3,4,5-trifluorophenyl) gallate acid was obtained in the same manner as in Example 1. The product was identified by 19 F-NMR.
(実施例4)テトラキス(4−ニトロフェニル)ガレート酸の合成
ペンタフルオロブロモベンゼン30部を1−ブロモ−4−ニトロベンゼン24.54部に変更した以外、実施例1と同様にして、テトラキス(4−ニトロフェニル)ガレート酸を得た。生成物は19F−NMRにて同定した。
(Example 4) Synthesis of tetrakis (4-nitrophenyl) gallate acid Tetrakis (4) was carried out in the same manner as in Example 1 except that 30 parts of pentafluorobromobenzene was changed to 24.54 parts of 1-bromo-4-nitrobenzene. -Nitrophenyl) Galate acid was obtained. The product was identified by 19 F-NMR.
(実施例5)テトラキス(4−シアノフェニル)ガレート酸の合成
ペンタフルオロブロモベンゼン30部を1−ブロモ−4−シアノベンゼン21.62部に変更した以外、実施例1と同様にして、テトラキス(3,5−ビス(トリフルオロメチル)フェニル)ガレート酸を得た。生成物は19F−NMRにて同定した。
(Example 5) Synthesis of tetrakis (4-cyanophenyl) gallate acid Tetrakis (4-cyanophenyl) in the same manner as in Example 1 except that 30 parts of pentafluorobromobenzene was changed to 21.62 parts of 1-bromo-4-cyanobenzene. 3,5-Bis (trifluoromethyl) phenyl) gallate acid was obtained. The product was identified by 19 F-NMR.
感光性ポリマーの製造、ジヒドロキシジアリール化合物の製造、金属表面処理、電気導電性アニリンポリマーの製造、カルボン酸およびカルボン酸エステルの製造、高分子量ジアゾニウム化合物の製造、エポキシ樹脂の製造、アミン様化合物からの電気導電性材料の製造、オクタジエノールの製造、オレフィンのカルボアミノ化またはカルボアミド化、ブテンの異性化、電気導電性ポリアルコキシチオフェンの製造、オイルおよび廃液の脱硫化、 トリグリシジルトリメチロールアルカンベースの組成物の製造、スチレンおよび一酸化炭素からのポリマーの製造、情報の貯蔵のための有機塩の製造、良好な光抵抗を有する情報キャリアの製造、触媒のためのシリコン支持材の製造、ピロール誘導体の製造、一酸化炭素およびオレフィン性不飽和化合物の共重合、電気導電性ポリマーの製造、磁性造影剤の製造、ポリマーコーティングの製造、ステンレス鋼の酸化層の除去、メチルtert-ブチルエーテルの合成、5〜7個の炭素を含む環状スルホニウム塩の製造、シクロシロキサンの製造、重油およびビチューメンの精製、アルミニウム化合物の処理、第4級ピリジニウムまたはアニリニウム塩の製造、オレフィンおよび一酸化炭素の共重合、芳香族ヒドロキシル化合物の製造、酢酸エステル誘導体の製造、ジアルケニルベンゼンおよびポリアリールアミンからの樹脂の製造、置換ピロロピリミジン−4−オンの製造、石油の回収、非水性電解液としての使用、安定なメチルカチオンの製造、環状スルホニウム塩の製造、光学貯蔵材料の製造、共役フルオロピリジニウム塩の製造、イリジウム/ジホスフィン錯体の製造
、イミンの不斉水素化、不飽和化合物のヒドロホルミル化、ポリマーの合成、シリル基を有するポリシクロオレフィンからのポリマーの製造、ルテニウム触媒の製造、イブプロフェンの製造、シクロヘキサジエニル化合物の製造、オレフィンの共重合、無機メチルイミダゾリニウム塩の製造、SiCOおよびSiCセラミック繊維の製造、温熱印刷材料の製造、ポリマーの製造、アジリジン−ポリエーテル化合物の製造、ジカルボン酸ジエステルの製造、芳香族炭化水素の水酸化、カルボン酸およびカルボン酸エステルの製造、リソグラフ印刷板の前処理に好適に用いられる。
Production of photosensitive polymers, production of dihydroxydiaryl compounds, metal surface treatment, production of electroconductive aniline polymers, production of carboxylic acids and carboxylic acid esters, production of high molecular weight diazonium compounds, production of epoxy resins, production of amine-like compounds. Production of electroconductive materials, production of octadienol, carboaminolation or carboamidization of olefins, isomerization of butene, production of electroconductive polyalkoxythiophene, desulfidening of oils and effluents, composition of triglycidyl trimethylalkane bases Manufacture of compounds, polymers from styrene and carbon monoxide, organic salts for information storage, information carriers with good photoresistance, silicon supports for catalysts, pyrrole derivatives Production, copolymerization of carbon monoxide and olefinically unsaturated compounds, production of electroconductive polymers, production of magnetic contrast agents, production of polymer coatings, removal of oxide layers of stainless steel, synthesis of methyltert-butyl ether, 5- Production of cyclic sulfonium salt containing 7 carbons, production of cyclosiloxane, purification of heavy oil and bitumen, treatment of aluminum compounds, production of quaternary pyridinium or anilinium salt, copolymerization of olefins and carbon monoxide, aromatic hydroxyl Production of compounds, production of acetate derivatives, production of resins from dialkenylbenzene and polyarylamine, production of substituted pyrolopyrimidin-4-one, recovery of petroleum, use as non-aqueous electrolyte solution, stable methyl cations Production, production of cyclic sulfonium salt, production of optical storage material, production of conjugated fluoropyridinium salt, production of iridium / diphosphin complex, asymmetric hydrogenation of imine, hydroformylation of unsaturated compound, synthesis of polymer, having silyl group Production of polymers from polycycloolefins, production of ruthenium catalysts, production of ibuprofene, production of cyclohexadienyl compounds, copolymerization of olefins, production of inorganic methylimidazolinium salts, production of SiCO and SiC ceramic fibers, thermal printing materials Is preferably used for the production of polymers, the production of aziridine-polyether compounds, the production of dicarboxylic acid diesters, the hydroxylation of aromatic hydrocarbons, the production of carboxylic acids and carboxylic acid esters, and the pretreatment of lithograph printing plates.
Claims (5)
[(R1)( R2)( R3)( R4)Ga]−H+ [I]
〔式(1)中、R1〜R4は互いに独立して、パーフルオロアルキル基、パーフルオロアルコキシ基、ニトロ基、シアノ基、アシル基及びハロゲンからなる群より選ばれる基で置換されてよいフェニル基又はパーフルオロアルキル基を表す。〕
で表される酸。 The following general formula (1)
[(R 1 ) (R 2 ) (R 3 ) (R 4 ) Ga] − H + [I]
[In formula (1), R 1 to R 4 may be independently substituted with a group selected from the group consisting of a perfluoroalkyl group, a perfluoroalkoxy group, a nitro group, a cyano group, an acyl group and a halogen. Represents a phenyl group or a perfluoroalkyl group. ]
Acid represented by.
Use of the acid according to any one of claims 1 to 3 as a substitute for the acids HPF 6 , HSbF 6 and HPF 3 (C 2 F 5 ) 3 in a chemical reaction.
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JP2003531231A (en) * | 2000-04-15 | 2003-10-21 | ダウ・コ−ニング・コ−ポレ−ション | Method for condensing compounds having silicon-bonded hydroxy or alkoxy groups |
JP2017048325A (en) * | 2015-09-03 | 2017-03-09 | サンアプロ株式会社 | Curable composition and cured body using the same |
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JP2017048325A (en) * | 2015-09-03 | 2017-03-09 | サンアプロ株式会社 | Curable composition and cured body using the same |
Non-Patent Citations (2)
Title |
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NIEMANN,M. ET AL.: "Synthesis, Properties, and Application of Tetrakis(pentafluoroethyl)gallate, [Ga(C2F5)4]-", ANGEWANDTE CHEMIE, INTERNATIONAL EDITION, vol. 58, no. 26, JPN7023000996, 2019, pages 8938 - 8942, XP055661497, ISSN: 0005153614, DOI: 10.1002/anie.201904197 * |
REN,K. ET AL.: "Synthesis, properties and photolysis of new iodonium tetrakis(pentafluorophenyl)gallate photoinitiat", TETRAHEDRON, vol. 58, no. 26, JPN7023000995, 2002, pages 5267 - 5273, XP004369388, ISSN: 0005153613, DOI: 10.1016/S0040-4020(02)00497-0 * |
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