JP2021113319A - Polyarylene sulfide resin composition, molded article thereof, and surface mounting electronic component - Google Patents
Polyarylene sulfide resin composition, molded article thereof, and surface mounting electronic component Download PDFInfo
- Publication number
- JP2021113319A JP2021113319A JP2021062730A JP2021062730A JP2021113319A JP 2021113319 A JP2021113319 A JP 2021113319A JP 2021062730 A JP2021062730 A JP 2021062730A JP 2021062730 A JP2021062730 A JP 2021062730A JP 2021113319 A JP2021113319 A JP 2021113319A
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- JP
- Japan
- Prior art keywords
- polyarylene sulfide
- sulfide resin
- group
- resin composition
- acid
- Prior art date
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- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 title claims abstract description 102
- 229920000412 polyarylene Polymers 0.000 title claims abstract description 101
- 239000011342 resin composition Substances 0.000 title claims abstract description 49
- 229920005989 resin Polymers 0.000 claims abstract description 101
- 239000011347 resin Substances 0.000 claims abstract description 101
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 64
- 238000000034 method Methods 0.000 claims abstract description 29
- 239000003112 inhibitor Substances 0.000 claims abstract description 28
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 25
- 150000001491 aromatic compounds Chemical class 0.000 claims abstract description 18
- 125000000524 functional group Chemical group 0.000 claims abstract description 16
- 229920001971 elastomer Polymers 0.000 claims abstract description 12
- 239000000806 elastomer Substances 0.000 claims abstract description 12
- 239000011256 inorganic filler Substances 0.000 claims abstract description 11
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 11
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 125000003277 amino group Chemical group 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
- 239000012803 melt mixture Substances 0.000 claims description 9
- 238000000465 moulding Methods 0.000 claims description 8
- 150000003839 salts Chemical class 0.000 claims description 5
- 238000005227 gel permeation chromatography Methods 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 26
- 239000000203 mixture Substances 0.000 abstract description 26
- 238000010438 heat treatment Methods 0.000 abstract description 23
- 238000002844 melting Methods 0.000 abstract description 16
- 230000008018 melting Effects 0.000 abstract description 16
- -1 diiodine aromatic compound Chemical class 0.000 description 38
- 150000001875 compounds Chemical class 0.000 description 29
- 239000003822 epoxy resin Substances 0.000 description 27
- 229920000647 polyepoxide Polymers 0.000 description 27
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 26
- 239000000047 product Substances 0.000 description 22
- 239000002904 solvent Substances 0.000 description 22
- 239000004734 Polyphenylene sulfide Substances 0.000 description 21
- 229920000069 polyphenylene sulfide Polymers 0.000 description 21
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 20
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 18
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 16
- 125000004432 carbon atom Chemical group C* 0.000 description 16
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 16
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 14
- 239000007789 gas Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 125000003118 aryl group Chemical group 0.000 description 13
- 239000007795 chemical reaction product Substances 0.000 description 13
- 239000000155 melt Substances 0.000 description 13
- 229910052717 sulfur Inorganic materials 0.000 description 13
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 12
- 239000011593 sulfur Substances 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- 239000001361 adipic acid Substances 0.000 description 10
- 235000011037 adipic acid Nutrition 0.000 description 10
- 229910052740 iodine Inorganic materials 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 239000012298 atmosphere Substances 0.000 description 9
- 229920003986 novolac Polymers 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 238000012360 testing method Methods 0.000 description 9
- 239000004952 Polyamide Substances 0.000 description 8
- 230000001590 oxidative effect Effects 0.000 description 8
- 229920002647 polyamide Polymers 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 7
- 239000006166 lysate Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- SXJVFQLYZSNZBT-UHFFFAOYSA-N nonane-1,9-diamine Chemical compound NCCCCCCCCCN SXJVFQLYZSNZBT-UHFFFAOYSA-N 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 0 CC(C)(C)[N+](*)[O-] Chemical compound CC(C)(C)[N+](*)[O-] 0.000 description 6
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000005452 bending Methods 0.000 description 5
- 150000004985 diamines Chemical class 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 238000011049 filling Methods 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229920002725 thermoplastic elastomer Polymers 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- 229920003189 Nylon 4,6 Polymers 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 238000004898 kneading Methods 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 3
- GAMSSMZJKUMFEY-UHFFFAOYSA-N 4-[(4-carboxyphenyl)disulfanyl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1SSC1=CC=C(C(O)=O)C=C1 GAMSSMZJKUMFEY-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 150000004984 aromatic diamines Chemical class 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 230000005496 eutectics Effects 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 238000001746 injection moulding Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- 239000004711 α-olefin Substances 0.000 description 3
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 2
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- LFMWZTSOMGDDJU-UHFFFAOYSA-N 1,4-diiodobenzene Chemical compound IC1=CC=C(I)C=C1 LFMWZTSOMGDDJU-UHFFFAOYSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- NQMUGNMMFTYOHK-UHFFFAOYSA-N 1-methoxynaphthalene Chemical compound C1=CC=C2C(OC)=CC=CC2=C1 NQMUGNMMFTYOHK-UHFFFAOYSA-N 0.000 description 2
- SWTNRXKFJNGFRF-UHFFFAOYSA-N 14-aminotetradecanoic acid Chemical compound NCCCCCCCCCCCCCC(O)=O SWTNRXKFJNGFRF-UHFFFAOYSA-N 0.000 description 2
- AVYGCQXNNJPXSS-UHFFFAOYSA-N 2,5-dichloroaniline Chemical compound NC1=CC(Cl)=CC=C1Cl AVYGCQXNNJPXSS-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 2
- 208000015943 Coeliac disease Diseases 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- BTZVDPWKGXMQFW-UHFFFAOYSA-N Pentadecanedioic acid Chemical compound OC(=O)CCCCCCCCCCCCCC(O)=O BTZVDPWKGXMQFW-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 2
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical compound C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N c1ccccc1 Chemical compound c1ccccc1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000004917 carbon fiber Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical compound C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 2
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000000816 ethylene group Polymers [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- BTCSSZJGUNDROE-UHFFFAOYSA-N gamma-aminobutyric acid Chemical compound NCCCC(O)=O BTCSSZJGUNDROE-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 150000003951 lactams Chemical class 0.000 description 2
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N methyl alcohol Substances OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- PZYDAVFRVJXFHS-UHFFFAOYSA-N n-cyclohexyl-2-pyrrolidone Chemical compound O=C1CCCN1C1CCCCC1 PZYDAVFRVJXFHS-UHFFFAOYSA-N 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- 150000002828 nitro derivatives Chemical class 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 150000005181 nitrobenzenes Chemical class 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- BNJOQKFENDDGSC-UHFFFAOYSA-N octadecanedioic acid Chemical compound OC(=O)CCCCCCCCCCCCCCCCC(O)=O BNJOQKFENDDGSC-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical group C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000012265 solid product Substances 0.000 description 2
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 2
- LWBHHRRTOZQPDM-UHFFFAOYSA-N undecanedioic acid Chemical compound OC(=O)CCCCCCCCCC(O)=O LWBHHRRTOZQPDM-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- QQFIQWBUKYSUHM-UHFFFAOYSA-N (2,3-diiodophenyl)-phenylmethanone Chemical compound IC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1I QQFIQWBUKYSUHM-UHFFFAOYSA-N 0.000 description 1
- MEIFVWINIHKENC-UHFFFAOYSA-N (2-iodophenyl)-phenylmethanone Chemical compound IC1=CC=CC=C1C(=O)C1=CC=CC=C1 MEIFVWINIHKENC-UHFFFAOYSA-N 0.000 description 1
- KGANAERDZBAECK-UHFFFAOYSA-N (3-phenoxyphenyl)methanol Chemical compound OCC1=CC=CC(OC=2C=CC=CC=2)=C1 KGANAERDZBAECK-UHFFFAOYSA-N 0.000 description 1
- KGSFMPRFQVLGTJ-UHFFFAOYSA-N 1,1,2-triphenylethylbenzene Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(C=1C=CC=CC=1)CC1=CC=CC=C1 KGSFMPRFQVLGTJ-UHFFFAOYSA-N 0.000 description 1
- DBNWBEGCONIRGQ-UHFFFAOYSA-N 1,1-diphenylpropan-2-one Chemical compound C=1C=CC=CC=1C(C(=O)C)C1=CC=CC=C1 DBNWBEGCONIRGQ-UHFFFAOYSA-N 0.000 description 1
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
- LSESTAVEDKBXPP-UHFFFAOYSA-N 1,2-diiodo-3,4-dimethylbenzene Chemical group CC1=CC=C(I)C(I)=C1C LSESTAVEDKBXPP-UHFFFAOYSA-N 0.000 description 1
- BBOLNFYSRZVALD-UHFFFAOYSA-N 1,2-diiodobenzene Chemical compound IC1=CC=CC=C1I BBOLNFYSRZVALD-UHFFFAOYSA-N 0.000 description 1
- UYHYZAYIQAVJCN-UHFFFAOYSA-N 1,2-diiodonaphthalene Chemical compound C1=CC=CC2=C(I)C(I)=CC=C21 UYHYZAYIQAVJCN-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- YFKBXYGUSOXJGS-UHFFFAOYSA-N 1,3-Diphenyl-2-propanone Chemical compound C=1C=CC=CC=1CC(=O)CC1=CC=CC=C1 YFKBXYGUSOXJGS-UHFFFAOYSA-N 0.000 description 1
- JTNRGGLCSLZOOQ-UHFFFAOYSA-N 1,3-diphenoxybenzene Chemical compound C=1C=CC(OC=2C=CC=CC=2)=CC=1OC1=CC=CC=C1 JTNRGGLCSLZOOQ-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- YFOOEYJGMMJJLS-UHFFFAOYSA-N 1,8-diaminonaphthalene Chemical compound C1=CC(N)=C2C(N)=CC=CC2=C1 YFOOEYJGMMJJLS-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- HQJQYILBCQPYBI-UHFFFAOYSA-N 1-bromo-4-(4-bromophenyl)benzene Chemical group C1=CC(Br)=CC=C1C1=CC=C(Br)C=C1 HQJQYILBCQPYBI-UHFFFAOYSA-N 0.000 description 1
- DLKQHBOKULLWDQ-UHFFFAOYSA-N 1-bromonaphthalene Chemical compound C1=CC=C2C(Br)=CC=CC2=C1 DLKQHBOKULLWDQ-UHFFFAOYSA-N 0.000 description 1
- JTPNRXUCIXHOKM-UHFFFAOYSA-N 1-chloronaphthalene Chemical compound C1=CC=C2C(Cl)=CC=CC2=C1 JTPNRXUCIXHOKM-UHFFFAOYSA-N 0.000 description 1
- APWZAIZNWQFZBK-UHFFFAOYSA-N 1-ethoxynaphthalene Chemical compound C1=CC=C2C(OCC)=CC=CC2=C1 APWZAIZNWQFZBK-UHFFFAOYSA-N 0.000 description 1
- GPYDMVZCPRONLW-UHFFFAOYSA-N 1-iodo-4-(4-iodophenyl)benzene Chemical group C1=CC(I)=CC=C1C1=CC=C(I)C=C1 GPYDMVZCPRONLW-UHFFFAOYSA-N 0.000 description 1
- SCCCFNJTCDSLCY-UHFFFAOYSA-N 1-iodo-4-nitrobenzene Chemical compound [O-][N+](=O)C1=CC=C(I)C=C1 SCCCFNJTCDSLCY-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- IYDMICQAKLQHLA-UHFFFAOYSA-N 1-phenylnaphthalene Chemical compound C1=CC=CC=C1C1=CC=CC2=CC=CC=C12 IYDMICQAKLQHLA-UHFFFAOYSA-N 0.000 description 1
- JMVIVASFFKKFQK-UHFFFAOYSA-N 1-phenylpyrrolidin-2-one Chemical compound O=C1CCCN1C1=CC=CC=C1 JMVIVASFFKKFQK-UHFFFAOYSA-N 0.000 description 1
- XAUQWYHSQICPAZ-UHFFFAOYSA-N 10-amino-decanoic acid Chemical compound NCCCCCCCCCC(O)=O XAUQWYHSQICPAZ-UHFFFAOYSA-N 0.000 description 1
- GUOSQNAUYHMCRU-UHFFFAOYSA-N 11-Aminoundecanoic acid Chemical compound NCCCCCCCCCCC(O)=O GUOSQNAUYHMCRU-UHFFFAOYSA-N 0.000 description 1
- QFGCFKJIPBRJGM-UHFFFAOYSA-N 12-[(2-methylpropan-2-yl)oxy]-12-oxododecanoic acid Chemical compound CC(C)(C)OC(=O)CCCCCCCCCCC(O)=O QFGCFKJIPBRJGM-UHFFFAOYSA-N 0.000 description 1
- QJGFZBNNVXTCLL-UHFFFAOYSA-N 16-aminohexadecanoic acid Chemical compound NCCCCCCCCCCCCCCCC(O)=O QJGFZBNNVXTCLL-UHFFFAOYSA-N 0.000 description 1
- ACQSOZZSYSEKHC-UHFFFAOYSA-N 18-aminooctadecanoic acid Chemical compound NCCCCCCCCCCCCCCCCCC(O)=O ACQSOZZSYSEKHC-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- JCUZDQXWVYNXHD-UHFFFAOYSA-N 2,2,4-trimethylhexane-1,6-diamine Chemical compound NCCC(C)CC(C)(C)CN JCUZDQXWVYNXHD-UHFFFAOYSA-N 0.000 description 1
- DPQHRXRAZHNGRU-UHFFFAOYSA-N 2,4,4-trimethylhexane-1,6-diamine Chemical compound NCC(C)CC(C)(C)CCN DPQHRXRAZHNGRU-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- VALABLHQPAMOBO-UHFFFAOYSA-N 2,4-diiodo-1-nitrobenzene Chemical compound [O-][N+](=O)C1=CC=C(I)C=C1I VALABLHQPAMOBO-UHFFFAOYSA-N 0.000 description 1
- DCJKUXYSYJBBRD-UHFFFAOYSA-N 2,5-diphenyl-1,3,4-oxadiazole Chemical compound C1=CC=CC=C1C1=NN=C(C=2C=CC=CC=2)O1 DCJKUXYSYJBBRD-UHFFFAOYSA-N 0.000 description 1
- CNRNYORZJGVOSY-UHFFFAOYSA-N 2,5-diphenyl-1,3-oxazole Chemical compound C=1N=C(C=2C=CC=CC=2)OC=1C1=CC=CC=C1 CNRNYORZJGVOSY-UHFFFAOYSA-N 0.000 description 1
- AHKDVDYNDXGFPP-UHFFFAOYSA-N 2,6-dimethoxynaphthalene Chemical compound C1=C(OC)C=CC2=CC(OC)=CC=C21 AHKDVDYNDXGFPP-UHFFFAOYSA-N 0.000 description 1
- ATGFTMUSEPZNJD-UHFFFAOYSA-N 2,6-diphenylphenol Chemical compound OC1=C(C=2C=CC=CC=2)C=CC=C1C1=CC=CC=C1 ATGFTMUSEPZNJD-UHFFFAOYSA-N 0.000 description 1
- PPKHAIRFQKFMLE-UHFFFAOYSA-N 2,7-dimethoxynaphthalene Chemical compound C1=CC(OC)=CC2=CC(OC)=CC=C21 PPKHAIRFQKFMLE-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- LBEMXJWGHIEXRA-UHFFFAOYSA-N 2-[(2-carboxyphenyl)disulfanyl]benzoic acid Chemical compound OC(=O)C1=CC=CC=C1SSC1=CC=CC=C1C(O)=O LBEMXJWGHIEXRA-UHFFFAOYSA-N 0.000 description 1
- UBPDKIDWEADHPP-UHFFFAOYSA-N 2-iodoaniline Chemical compound NC1=CC=CC=C1I UBPDKIDWEADHPP-UHFFFAOYSA-N 0.000 description 1
- KQDJTBPASNJQFQ-UHFFFAOYSA-N 2-iodophenol Chemical compound OC1=CC=CC=C1I KQDJTBPASNJQFQ-UHFFFAOYSA-N 0.000 description 1
- GAGWMWLBYJPFDD-UHFFFAOYSA-N 2-methyloctane-1,8-diamine Chemical compound NCC(C)CCCCCCN GAGWMWLBYJPFDD-UHFFFAOYSA-N 0.000 description 1
- GSKNLOOGBYYDHV-UHFFFAOYSA-N 2-methylphenol;naphthalen-1-ol Chemical compound CC1=CC=CC=C1O.C1=CC=C2C(O)=CC=CC2=C1 GSKNLOOGBYYDHV-UHFFFAOYSA-N 0.000 description 1
- UFMBOFGKHIXOTA-UHFFFAOYSA-N 2-methylterephthalic acid Chemical compound CC1=CC(C(O)=O)=CC=C1C(O)=O UFMBOFGKHIXOTA-UHFFFAOYSA-N 0.000 description 1
- 125000003504 2-oxazolinyl group Chemical group O1C(=NCC1)* 0.000 description 1
- ILYSAKHOYBPSPC-UHFFFAOYSA-N 2-phenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C1=CC=CC=C1 ILYSAKHOYBPSPC-UHFFFAOYSA-N 0.000 description 1
- 229940061334 2-phenylphenol Drugs 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical compound CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 1
- WVDRSXGPQWNUBN-UHFFFAOYSA-N 4-(4-carboxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C=C1 WVDRSXGPQWNUBN-UHFFFAOYSA-N 0.000 description 1
- NEQFBGHQPUXOFH-UHFFFAOYSA-N 4-(4-carboxyphenyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1 NEQFBGHQPUXOFH-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- QJENIOQDYXRGLF-UHFFFAOYSA-N 4-[(4-amino-3-ethyl-5-methylphenyl)methyl]-2-ethyl-6-methylaniline Chemical compound CC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(C)C=2)=C1 QJENIOQDYXRGLF-UHFFFAOYSA-N 0.000 description 1
- VTDMBRAUHKUOON-UHFFFAOYSA-N 4-[(4-carboxyphenyl)methyl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C=C1 VTDMBRAUHKUOON-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- JDUYPUMQALQRCN-UHFFFAOYSA-N 4-bromophenyl phenyl ether Chemical compound C1=CC(Br)=CC=C1OC1=CC=CC=C1 JDUYPUMQALQRCN-UHFFFAOYSA-N 0.000 description 1
- FJVIHKKXPLPDSV-UHFFFAOYSA-N 4-phenoxybenzene-1,2-diamine Chemical compound C1=C(N)C(N)=CC=C1OC1=CC=CC=C1 FJVIHKKXPLPDSV-UHFFFAOYSA-N 0.000 description 1
- SLXKOJJOQWFEFD-UHFFFAOYSA-N 6-aminohexanoic acid Chemical compound NCCCCCC(O)=O SLXKOJJOQWFEFD-UHFFFAOYSA-N 0.000 description 1
- XDOLZJYETYVRKV-UHFFFAOYSA-N 7-Aminoheptanoic acid Chemical compound NCCCCCCC(O)=O XDOLZJYETYVRKV-UHFFFAOYSA-N 0.000 description 1
- UQXNEWQGGVUVQA-UHFFFAOYSA-N 8-aminooctanoic acid Chemical compound NCCCCCCCC(O)=O UQXNEWQGGVUVQA-UHFFFAOYSA-N 0.000 description 1
- FKDIWXZNKAZCBY-UHFFFAOYSA-N 9,10-dichloroanthracene Chemical compound C1=CC=C2C(Cl)=C(C=CC=C3)C3=C(Cl)C2=C1 FKDIWXZNKAZCBY-UHFFFAOYSA-N 0.000 description 1
- FCNCGHJSNVOIKE-UHFFFAOYSA-N 9,10-diphenylanthracene Chemical compound C1=CC=CC=C1C(C1=CC=CC=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 FCNCGHJSNVOIKE-UHFFFAOYSA-N 0.000 description 1
- QXAIDADUIMVTPS-UHFFFAOYSA-N 9-(9h-fluoren-9-yl)-9h-fluorene Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1C1C2=CC=CC=C2C2=CC=CC=C21 QXAIDADUIMVTPS-UHFFFAOYSA-N 0.000 description 1
- VWPQCOZMXULHDM-UHFFFAOYSA-N 9-aminononanoic acid Chemical compound NCCCCCCCCC(O)=O VWPQCOZMXULHDM-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- CFSFEIZUJGTCRB-UHFFFAOYSA-N CC1CC(C2)C2C1 Chemical compound CC1CC(C2)C2C1 CFSFEIZUJGTCRB-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- UVGTXNPVQOQFQW-UHFFFAOYSA-N Disophenol Chemical compound OC1=C(I)C=C([N+]([O-])=O)C=C1I UVGTXNPVQOQFQW-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- ZWXPDGCFMMFNRW-UHFFFAOYSA-N N-methylcaprolactam Chemical compound CN1CCCCCC1=O ZWXPDGCFMMFNRW-UHFFFAOYSA-N 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- SLGBZMMZGDRARJ-UHFFFAOYSA-N Triphenylene Natural products C1=CC=C2C3=CC=CC=C3C3=CC=CC=C3C2=C1 SLGBZMMZGDRARJ-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- QCEUXSAXTBNJGO-UHFFFAOYSA-N [Ag].[Sn] Chemical compound [Ag].[Sn] QCEUXSAXTBNJGO-UHFFFAOYSA-N 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 229960002684 aminocaproic acid Drugs 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000005362 aryl sulfone group Chemical group 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- RFVHVYKVRGKLNK-UHFFFAOYSA-N bis(4-methoxyphenyl)methanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=C(OC)C=C1 RFVHVYKVRGKLNK-UHFFFAOYSA-N 0.000 description 1
- 238000000071 blow moulding Methods 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 235000013339 cereals Nutrition 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- YQLZOAVZWJBZSY-UHFFFAOYSA-N decane-1,10-diamine Chemical compound NCCCCCCCCCCN YQLZOAVZWJBZSY-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- ALVPFGSHPUPROW-UHFFFAOYSA-N di-n-propyl disulfide Natural products CCCSSCCC ALVPFGSHPUPROW-UHFFFAOYSA-N 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- AFZSMODLJJCVPP-UHFFFAOYSA-N dibenzothiazol-2-yl disulfide Chemical compound C1=CC=C2SC(SSC=3SC4=CC=CC=C4N=3)=NC2=C1 AFZSMODLJJCVPP-UHFFFAOYSA-N 0.000 description 1
- NZZIMKJIVMHWJC-UHFFFAOYSA-N dibenzoylmethane Chemical compound C=1C=CC=CC=1C(=O)CC(=O)C1=CC=CC=C1 NZZIMKJIVMHWJC-UHFFFAOYSA-N 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- ZXPDYFSTVHQQOI-UHFFFAOYSA-N diethoxysilane Chemical compound CCO[SiH2]OCC ZXPDYFSTVHQQOI-UHFFFAOYSA-N 0.000 description 1
- HIPNYJBGYFRVAY-UHFFFAOYSA-N diiodomethylbenzene Chemical compound IC(I)C1=CC=CC=C1 HIPNYJBGYFRVAY-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- GWZCCUDJHOGOSO-UHFFFAOYSA-N diphenic acid Chemical compound OC(=O)C1=CC=CC=C1C1=CC=CC=C1C(O)=O GWZCCUDJHOGOSO-UHFFFAOYSA-N 0.000 description 1
- FHESUNXRPBHDQM-UHFFFAOYSA-N diphenyl benzene-1,3-dicarboxylate Chemical compound C=1C=CC(C(=O)OC=2C=CC=CC=2)=CC=1C(=O)OC1=CC=CC=C1 FHESUNXRPBHDQM-UHFFFAOYSA-N 0.000 description 1
- ROORDVPLFPIABK-UHFFFAOYSA-N diphenyl carbonate Chemical compound C=1C=CC=CC=1OC(=O)OC1=CC=CC=C1 ROORDVPLFPIABK-UHFFFAOYSA-N 0.000 description 1
- DWNAQMUDCDVSLT-UHFFFAOYSA-N diphenyl phthalate Chemical compound C=1C=CC=C(C(=O)OC=2C=CC=CC=2)C=1C(=O)OC1=CC=CC=C1 DWNAQMUDCDVSLT-UHFFFAOYSA-N 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- XWKIXFQOFAVHQI-UHFFFAOYSA-N disodium;sulfide;pentahydrate Chemical compound O.O.O.O.O.[Na+].[Na+].[S-2] XWKIXFQOFAVHQI-UHFFFAOYSA-N 0.000 description 1
- QFTYSVGGYOXFRQ-UHFFFAOYSA-N dodecane-1,12-diamine Chemical compound NCCCCCCCCCCCCN QFTYSVGGYOXFRQ-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000012765 fibrous filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000004088 foaming agent Substances 0.000 description 1
- 229960003692 gamma aminobutyric acid Drugs 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- SNHMUERNLJLMHN-UHFFFAOYSA-N iodobenzene Chemical compound IC1=CC=CC=C1 SNHMUERNLJLMHN-UHFFFAOYSA-N 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010128 melt processing Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- DCNUQRBLZWSGAV-UHFFFAOYSA-N n,n-diphenylformamide Chemical compound C=1C=CC=CC=1N(C=O)C1=CC=CC=C1 DCNUQRBLZWSGAV-UHFFFAOYSA-N 0.000 description 1
- DEQZTKGFXNUBJL-UHFFFAOYSA-N n-(1,3-benzothiazol-2-ylsulfanyl)cyclohexanamine Chemical compound C1CCCCC1NSC1=NC2=CC=CC=C2S1 DEQZTKGFXNUBJL-UHFFFAOYSA-N 0.000 description 1
- VSWALKINGSNVAR-UHFFFAOYSA-N naphthalen-1-ol;phenol Chemical compound OC1=CC=CC=C1.C1=CC=C2C(O)=CC=CC2=C1 VSWALKINGSNVAR-UHFFFAOYSA-N 0.000 description 1
- SJNXJRVDSTZUFB-UHFFFAOYSA-N naphthalen-2-yl(phenyl)methanone Chemical compound C=1C=C2C=CC=CC2=CC=1C(=O)C1=CC=CC=C1 SJNXJRVDSTZUFB-UHFFFAOYSA-N 0.000 description 1
- ABMFBCRYHDZLRD-UHFFFAOYSA-N naphthalene-1,4-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1 ABMFBCRYHDZLRD-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- WPUMVKJOWWJPRK-UHFFFAOYSA-N naphthalene-2,7-dicarboxylic acid Chemical compound C1=CC(C(O)=O)=CC2=CC(C(=O)O)=CC=C21 WPUMVKJOWWJPRK-UHFFFAOYSA-N 0.000 description 1
- DDLUSQPEQUJVOY-UHFFFAOYSA-N nonane-1,1-diamine Chemical compound CCCCCCCCC(N)N DDLUSQPEQUJVOY-UHFFFAOYSA-N 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- 235000010292 orthophenyl phenol Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920006111 poly(hexamethylene terephthalamide) Polymers 0.000 description 1
- 229920006128 poly(nonamethylene terephthalamide) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000008247 solid mixture Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 150000003504 terephthalic acids Chemical class 0.000 description 1
- ISXOBTBCNRIIQO-UHFFFAOYSA-N tetrahydrothiophene 1-oxide Chemical compound O=S1CCCC1 ISXOBTBCNRIIQO-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- LZTRCELOJRDYMQ-UHFFFAOYSA-N triphenylmethanol Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(O)C1=CC=CC=C1 LZTRCELOJRDYMQ-UHFFFAOYSA-N 0.000 description 1
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
- C08L77/06—Polyamides derived from polyamines and polycarboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/02—Fibres or whiskers
- C08K7/04—Fibres or whiskers inorganic
- C08K7/14—Glass
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
- C08L81/02—Polythioethers; Polythioether-ethers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Supply And Installment Of Electrical Components (AREA)
Abstract
Description
本発明は、ポリアリーレンスルフィド樹脂組成物及びその成形品、並びに表面実装電子部品に関する。 The present invention relates to a polyarylene sulfide resin composition, a molded product thereof, and a surface mount electronic component.
近年、電気・電子工業の分野では、製品の小型化や生産性の向上に伴い、樹脂系電子部品のプリント基板上への実装方式がサーフェスマウント方式(以下「SMT方式」と略すことがある。)と呼ばれる表面実装方式に移行している。このSMT方式により電子部品を基板上に実装する技術は、従来、錫−鉛共晶はんだ(融点184℃)が一般的であったが、近年、環境汚染の問題から、その代替材料として錫をベースに数種類の金属を添加した鉛フリーはんだが利用されている。 In recent years, in the field of electrical and electronic industries, the mounting method of resin-based electronic components on a printed circuit board may be abbreviated as the surface mount method (hereinafter, "SMT method") with the miniaturization of products and the improvement of productivity. ) Is shifting to a surface mount method. Conventionally, tin-lead eutectic solder (melting point 184 ° C.) has been generally used as a technique for mounting electronic components on a substrate by this SMT method, but in recent years, due to the problem of environmental pollution, tin has been used as an alternative material. Lead-free solder with several types of metals added to the base is used.
このような鉛フリーはんだは、錫−鉛共晶はんだよりも融点が高く、例えば、錫−銀共晶はんだの場合には融点が220℃に達するため、表面実装時には加熱炉(リフロー炉)の温度をさらに上昇させなければならなかった。そのため、コネクター等の樹脂系電子部品をはんだ付けする際、加熱炉(リフロー炉)内において当該電子部品が融解又は変形を生じてしまうという問題があった。したがって、表面実装電子部品に用いられる樹脂材料には耐熱性の高いものが強く求められていた。 Such lead-free solder has a higher melting point than tin-lead eutectic solder. For example, in the case of tin-silver eutectic solder, the melting point reaches 220 ° C. The temperature had to be raised further. Therefore, when soldering a resin-based electronic component such as a connector, there is a problem that the electronic component is melted or deformed in a heating furnace (reflow furnace). Therefore, there is a strong demand for a resin material having high heat resistance as a resin material used for surface mount electronic components.
これに対して、高耐熱性の樹脂材料としてポリフェニレンスルフィド樹脂(以下「PPS樹脂」と略すことがある。)に代表されるポリアリーレンスルフィド樹脂(以下「PAS樹脂」と略すことがある。)を用いることが提案されており、該ポリアリーレンスルフィド樹脂を含む樹脂組成物の成形品と金属端子とを備えた表面実装電子部品が、加熱炉(リフロー炉)内においても当該電子部品の融解又は変形を抑制しうることが提案されている(例えば特許文献1参照)。 On the other hand, as a highly heat-resistant resin material, a polyphenylene sulfide resin (hereinafter, may be abbreviated as "PAS resin") represented by a polyphenylene sulfide resin (hereinafter, may be abbreviated as "PPS resin") is used. It has been proposed to use a surface-mounted electronic component provided with a molded product of a resin composition containing the polyarylene sulfide resin and a metal terminal, and the electronic component is melted or deformed even in a heating furnace (reflow furnace). It has been proposed that this can be suppressed (see, for example, Patent Document 1).
ところが、従来のポリアリーレンスルフィド樹脂を含む組成物では、成形加工の際などの加熱により発生するガスの量が比較的多く、電子部品の金属端子を腐食させるおそれがあった。また、従来のポリアリーレンスルフィド樹脂組成物あるいはその成形品においては、機械的強度、金属密着性、キャビティーバランス等の特性にも未だ改善の余地があった。 However, in the conventional composition containing a polyarylene sulfide resin, the amount of gas generated by heating during molding is relatively large, and there is a risk of corroding the metal terminals of electronic parts. Further, in the conventional polyarylene sulfide resin composition or a molded product thereof, there is still room for improvement in properties such as mechanical strength, metal adhesion, and cavity balance.
そこで、本発明が解決しようとする課題は、加熱炉(リフロー炉)内において表面実装電子部品が融解又は変形することを防ぎつつ、かつ、加熱によるガス発生量を抑制でき、さらに樹脂組成物あるいはその成形品において、優れた機械的強度、金属密着性、キャビティーバランス特性を有する、ポリアリーレンスルフィド樹脂組成物、該樹脂組成物を用いた成形品、及び該成形品を備える表面実装電子部品を提供することにある。 Therefore, the problem to be solved by the present invention is that the amount of gas generated by heating can be suppressed while preventing the surface mount electronic components from melting or deforming in the heating furnace (reflow furnace), and the resin composition or the resin composition or In the molded product, a polyarylene sulfide resin composition having excellent mechanical strength, metal adhesion, and cavity balance characteristics, a molded product using the resin composition, and a surface mount electronic component provided with the molded product are provided. To provide.
本発明者らは種々の検討を行った結果、末端に特定の官能基を有するポリアリーレンスルフィド樹脂を用いることで上記課題を解決できることを見出し、本発明を完成するに至った。 As a result of various studies, the present inventors have found that the above problems can be solved by using a polyarylene sulfide resin having a specific functional group at the terminal, and have completed the present invention.
すなわち、本発明は、ポリアリーレンスルフィド樹脂と、無機質充填剤、ポリアリーレンスルフィド樹脂以外の熱可塑性樹脂、エラストマー、及び2以上の架橋性官能基を有する架橋性樹脂からなる群より選ばれる、少なくとも1種の他の成分と、を含有する、表面実装電子部品用ポリアリーレンスルフィド樹脂組成物であって、ポリアリーレンスルフィド樹脂が、ジヨード芳香族化合物と、単体硫黄と、重合禁止剤とを、ジヨード芳香族化合物、単体硫黄及び重合禁止剤を含む溶融混合物中で反応させることを含む方法により得ることのできるものである、表面実装電子部品用ポリアリーレンスルフィド樹脂組成物に関する。 That is, the present invention is selected from the group consisting of a polyarylene sulfide resin, an inorganic filler, a thermoplastic resin other than the polyarylene sulfide resin, an elastomer, and a crosslinkable resin having two or more crosslinkable functional groups, at least one. A polyarylene sulfide resin composition for a surface-mounted electronic component containing other components of a species, wherein the polyarylene sulfide resin contains a diiode aromatic compound, a simple sulfur, and a polymerization inhibitor. The present invention relates to a polyarylene sulfide resin composition for a surface-mounted electronic component, which can be obtained by a method including reaction in a molten mixture containing a group compound, a simple sulfur and a polymerization inhibitor.
本発明によれば、加熱炉(リフロー炉)内において表面実装電子部品が融解又は変形することを防ぎつつ、かつ、加熱によるガス発生量を抑制でき、さらに樹脂組成物あるいはその成形品において、優れた機械的強度、金属密着性、キャビティーバランス特性を有する、ポリアリーレンスルフィド樹脂組成物、該樹脂組成物を用いた成形品、及び該成形品を備える表面実装電子部品を提供することにある。 According to the present invention, it is possible to prevent the surface mount electronic components from melting or deforming in the heating furnace (reflow furnace) and to suppress the amount of gas generated by heating, and the resin composition or its molded product is excellent. An object of the present invention is to provide a polyarylene sulfide resin composition having mechanical strength, metal adhesion, and cavity balance characteristics, a molded product using the resin composition, and a surface mount electronic component including the molded product.
なお、キャビティーバランスは、複数のキャビティーを有する金型を用いた射出成形により、同時に複数の成形品を成形したときの、各キャビティーの充填度の均一性に関連する。成形材料のキャビティーバランスが十分でないと、一部のキャビティーが十分に充填されないといった成形不良が発生し易くなる傾向がある。 The cavity balance is related to the uniformity of the filling degree of each cavity when a plurality of molded products are molded at the same time by injection molding using a mold having a plurality of cavities. If the cavity balance of the molding material is not sufficient, molding defects such that some cavities are not sufficiently filled tend to occur.
以下、本発明の好適な実施形態について詳細に説明する。ただし、本発明は以下の実施形態に限定されるものではない。 Hereinafter, preferred embodiments of the present invention will be described in detail. However, the present invention is not limited to the following embodiments.
本実施形態に用いられるポリアリーレンスルフィド樹脂は、ジヨード芳香族化合物と、単体硫黄と、重合禁止剤とを、ジヨード芳香族化合物、単体硫黄及び重合禁止剤を含有する溶融混合物中で反応させることを含む方法により得ることができる。このような方法によれば、フィリップス法をはじめとする従来法に比べ、比較的高分子量の重合体としてポリアリーレンスルフィド樹脂を得ることができる。 In the polyarylene sulfide resin used in the present embodiment, the diiode aromatic compound, elemental sulfur, and a polymerization inhibitor are reacted in a molten mixture containing the diiode aromatic compound, elemental sulfur, and the polymerization inhibitor. It can be obtained by the method including. According to such a method, a polyarylene sulfide resin can be obtained as a polymer having a relatively high molecular weight as compared with a conventional method such as the Philips method.
ジヨード芳香族化合物は、芳香族環と、芳香族環に直接結合した2個のヨウ素原子とを有する。ジヨード芳香族化合物としては、ジヨードベンゼン、ジヨードトルエン、ジヨードキシレン、ジヨードナフタレン、ジヨードビフェニル、ジヨードベンゾフェノン、ジヨードジフェニルエーテル及びジヨードジフェニルスルフォン等が挙げられるが、これらに限定されない。2つのヨウ素原子の置換位置は特に限定されないが、好ましくは2つの置換位置が分子内で出来る限り遠い位置にあることが望ましい。好ましい置換位置は、パラ位、及び4,4’−位である。 A diiodot aromatic compound has an aromatic ring and two iodine atoms directly attached to the aromatic ring. Examples of the diiodine aromatic compound include, but are not limited to, diiodobenzene, diiodotoluene, diiodoxylene, diiodonaphthalene, diiodobiphenyl, diiodobenzophenone, diiododiphenyl ether and diiododiphenyl sulfone. The substitution positions of the two iodine atoms are not particularly limited, but it is preferable that the substitution positions are as far as possible in the molecule. Preferred substitution positions are the para position and the 4,4'-position.
ジヨード芳香族化合物の芳香族環は、フェニル基、ヨウ素原子以外のハロゲン原子、ヒドロキシ基、ニトロ基、アミノ基、炭素原子数1〜6のアルコキシ基、カルボキシル基、カルボキシレート、アリールスルホンおよびアリールケトンから選ばれる少なくとも1種の置換基によって置換されていてもよい。ただし、ポリアリーレンスルフィド樹脂の結晶化度及び耐熱性等の観点から、未置換のジヨード芳香族化合物に対する置換されたジヨード芳香族化合物の割合は、好ましくは0.0001〜5質量%の範囲であり、より好ましくは0.001〜1質量%の範囲である。 The aromatic ring of the diiodo aromatic compound includes a phenyl group, a halogen atom other than an iodine atom, a hydroxy group, a nitro group, an amino group, an alkoxy group having 1 to 6 carbon atoms, a carboxyl group, a carboxylate, an aryl sulfone and an aryl ketone. It may be substituted with at least one substituent selected from. However, from the viewpoint of crystallinity and heat resistance of the polyarylene sulfide resin, the ratio of the substituted diiodo aromatic compound to the unsubstituted diiodo aromatic compound is preferably in the range of 0.0001 to 5% by mass. , More preferably in the range of 0.001 to 1% by mass.
単体硫黄は、硫黄原子のみによって構成される物質(S8、S6、S4、S2等)を意味し、その形態は限定されない。具体的には、局法医薬品として市販されている単体硫黄を用いてもよいし、汎用的に入手することができる、S8及びS6等を含む混合物を用いてもよい。単体硫黄の純度も特に限定されない。単体硫黄は、室温(23℃)で固体であれば、粒形状又は粉末状であってもよい。単体硫黄の粒径は、特に限定されないが、好ましくは0.001〜10mmの範囲であり、より好ましくは0.01〜5mmの範囲であり、更に好ましくは0.01〜3mmの範囲である。 Elemental sulfur means a substance composed only of sulfur atoms (S 8 , S 6 , S 4 , S 2, etc.), and its form is not limited. More specifically, the present invention may be used elemental sulfur which is commercially available as Tsuboneho medicament may be obtained generically, may be used a mixture containing S 8 and S 6 and the like. The purity of elemental sulfur is also not particularly limited. Elemental sulfur may be in the form of grains or powder as long as it is solid at room temperature (23 ° C.). The particle size of the elemental sulfur is not particularly limited, but is preferably in the range of 0.001 to 10 mm, more preferably in the range of 0.01 to 5 mm, and further preferably in the range of 0.01 to 3 mm.
重合禁止剤は、ポリアリーレンスルフィド樹脂の重合反応において当該重合反応を禁止又は停止する化合物であれば、特に制限なく用いることができる。重合禁止剤は、ポリアリーレンスルフィド樹脂の主鎖の末端にヒドロキシ基、アミノ基、カルボキシル基及びカルボキシル基の塩からなる群より選ばれる少なくとも一種の基を導入し得る化合物を含むことが好ましい。すなわち、重合禁止剤としては、ヒドロキシ基、アミノ基、カルボキシル基及びカルボキシル基の塩からなる群より選ばれる少なくとも一種の基を1又は2以上有す化合物が好ましい。また、重合禁止剤が上記官能基を有していてもよいし、重合の停止反応等によって、上記官能基を生成してもよい。 The polymerization inhibitor can be used without particular limitation as long as it is a compound that prohibits or terminates the polymerization reaction in the polymerization reaction of the polyarylene sulfide resin. The polymerization inhibitor preferably contains a compound capable of introducing at least one group selected from the group consisting of a hydroxy group, an amino group, a carboxyl group and a salt of a carboxyl group at the end of the main chain of the polyarylene sulfide resin. That is, as the polymerization inhibitor, a compound having at least one or two or more groups selected from the group consisting of a hydroxy group, an amino group, a carboxyl group and a salt of a carboxyl group is preferable. Further, the polymerization inhibitor may have the above-mentioned functional group, or the above-mentioned functional group may be generated by a polymerization termination reaction or the like.
ヒドロキシ基又はアミノ基を有する重合禁止剤としては、例えば、下記式(1)又は(2)で表される化合物が重合禁止剤として用いられ得る。 As the polymerization inhibitor having a hydroxy group or an amino group, for example, a compound represented by the following formula (1) or (2) can be used as the polymerization inhibitor.
一般式(1)で表される化合物としては、例えば、2−ヨードフェノール、2−アミノアニリンなどが挙げられる。一般式(2)で表される化合物としては、2−ヨードベンゾフェノンが挙げられる。 Examples of the compound represented by the general formula (1) include 2-iodophenol and 2-aminoaniline. Examples of the compound represented by the general formula (2) include 2-iodobenzophenone.
カルボキシル基を有する重合禁止剤としては、例えば、下記一般式(3)、(4)又は(5)で表される化合物から選ばれる1種以上の化合物が用いられ得る。 As the polymerization inhibitor having a carboxyl group, for example, one or more compounds selected from the compounds represented by the following general formulas (3), (4) or (5) can be used.
一般式(3)、(4)又は(5)で表される化合物によれば、下記式(6)又は(7)で表される一価の基が主鎖の末端基として導入される。これら特定構造の末端の構成単位の存在は、一般式(3)、(4)又は(5)で表される化合物を用いた溶融重合により得られたポリアリーレンスルフィド樹脂に特徴的である。 According to the compound represented by the general formula (3), (4) or (5), the monovalent group represented by the following formula (6) or (7) is introduced as the terminal group of the main chain. The presence of the terminal structural units of these specific structures is characteristic of the polyarylene sulfide resin obtained by melt polymerization using the compounds represented by the general formulas (3), (4) or (5).
重合禁止剤として、カルボキシル基等の官能基を有していない化合物等を使用してもよい。このような化合物としては、例えば、ジフェニルジスルフィド、モノヨードベンゼン、チオフェノール、2,2’−ジベンゾチアゾリルジスルフィド、2−メルカプトベンゾチアゾール、N−シクロヘキシル−2−ベンゾチアゾリルスルフェンアミド、2−(モルホリノチオ)ベンゾチアゾール及びN,N’−ジシクロヘキシル−1,3−ベンゾチアゾール−2−スルフェンアミドから選ばれる少なくとも1種の化合物を用いることができる。 As the polymerization inhibitor, a compound or the like that does not have a functional group such as a carboxyl group may be used. Examples of such compounds include diphenyl disulfide, monoiodobenzene, thiophenol, 2,2'-dibenzothiazolyl disulfide, 2-mercaptobenzothiazole, N-cyclohexyl-2-benzothiazolyl sulfenamide, 2 At least one compound selected from- (morpholinothio) benzothiazole and N, N'-dicyclohexyl-1,3-benzothiazole-2-sulfenamide can be used.
本実施形態に係るポリアリーレンスルフィド樹脂は、ジヨード芳香族化合物と、単体硫黄と、重合禁止剤と、必要に応じて触媒と含む混合物を加熱して得られる溶融混合物中で溶融重合を行うことによって生成する。溶融混合物中のジヨード芳香族化合物の割合は、単体硫黄1モルに対して、好ましくは0.5〜2モルの範囲であり、より好ましくは0.8〜1.2モルの範囲である。また、混合物中の重合禁止剤の割合は、固体硫黄1モルに対して、好ましくは0.0001〜0.1モルの範囲であり、より好ましくは0.0005〜0.05モルの範囲である。 The polyarylene sulfide resin according to the present embodiment is subjected to melt polymerization in a melt mixture obtained by heating a mixture containing a diiode aromatic compound, elemental sulfur, a polymerization inhibitor and, if necessary, a catalyst. Generate. The ratio of the diiodo aromatic compound in the melt mixture is preferably in the range of 0.5 to 2 mol, more preferably in the range of 0.8 to 1.2 mol, with respect to 1 mol of elemental sulfur. The ratio of the polymerization inhibitor in the mixture is preferably in the range of 0.0001 to 0.1 mol, more preferably in the range of 0.0005 to 0.05 mol, based on 1 mol of solid sulfur. ..
重合禁止剤を添加する時期は、特に制限されないが、ジヨード芳香族化合物、単体硫黄及び必要に応じて添加される触媒を含む混合物を加熱して、混合物の温度が好ましくは200℃〜320℃の範囲、より好ましくは250〜320℃の範囲となった時点で重合禁止剤を添加することができる。 The timing of adding the polymerization inhibitor is not particularly limited, but the mixture containing the diiode aromatic compound, elemental sulfur and a catalyst added as needed is heated, and the temperature of the mixture is preferably 200 ° C. to 320 ° C. The polymerization inhibitor can be added when the temperature reaches the range, more preferably 250 to 320 ° C.
溶融混合物にニトロ化合物を触媒として添加して、重合速度を調節することができる。このニトロ化合物としては、通常、各種ニトロベンゼン誘導体を用いることができる。ニトロベンゼン誘導体としては、例えば1,3−ジヨード−4−ニトロベンゼン、1−ヨード−4−ニトロベンゼン、2,6−ジヨード−4−ニトロフェノール及び2,6−ジヨード−4−ニトロアミンが挙げられる。触媒の量は、通常、触媒として添加される量であればよく、例えば単体硫黄100質量部に対して0.01〜20質量部の範囲であることが好ましい。 The polymerization rate can be adjusted by adding a nitro compound as a catalyst to the melt mixture. As this nitro compound, various nitrobenzene derivatives can be usually used. Examples of the nitrobenzene derivative include 1,3-diiodo-4-nitrobenzene, 1-iodo-4-nitrobenzene, 2,6-diiodo-4-nitrophenol and 2,6-diiodo-4-nitroamine. The amount of the catalyst may be an amount usually added as a catalyst, and is preferably in the range of 0.01 to 20 parts by mass with respect to 100 parts by mass of elemental sulfur, for example.
溶融重合の条件は、重合反応が適切に進行するように、適宜調整される。溶融重合の温度は、好ましくは、175℃以上、生成するポリアリーレンスルフィド樹脂の融点+100℃以下の範囲、より好ましくは180〜350℃の範囲である。溶融重合は、絶対圧が好ましくは1[cPa]〜100[kPa]の範囲、より好ましくは13[cPa]〜60[kPa]の範囲で行われる。溶融重合の条件は、一定である必要は無い。例えば、重合初期は温度を好ましくは175〜270℃の範囲、より好ましくは180〜250℃の範囲とし、かつ、絶対圧を6.7〜100[kPa]の範囲とし、その後、連続的に又は階段状に昇温及び減圧させながら重合を行い、重合後期は、温度を好ましくは270℃以上、生成するポリアリーレンスルフィド樹脂の融点+100℃以下の範囲、より好ましくは300〜350℃の範囲とし、かつ、絶対圧を1[cPa]〜6[kPa]の範囲として重合を行うことができる。本明細書において、樹脂の融点は、示差走査熱量計(パーキンエルマー製DSC装置 Pyris Diamond)を用いてJIS K 7121に準拠して測定される値を意味する。 The conditions for melt polymerization are appropriately adjusted so that the polymerization reaction proceeds appropriately. The temperature of the melt polymerization is preferably 175 ° C. or higher, the melting point of the produced polyarylene sulfide resin + 100 ° C. or lower, and more preferably 180 to 350 ° C. The melt polymerization is carried out with an absolute pressure preferably in the range of 1 [cPa] to 100 [kPa], more preferably in the range of 13 [cPa] to 60 [kPa]. The conditions for melt polymerization do not have to be constant. For example, in the initial stage of polymerization, the temperature is preferably in the range of 175 to 270 ° C., more preferably in the range of 180 to 250 ° C., and the absolute pressure is in the range of 6.7 to 100 [kPa], and then continuously or continuously. Polymerization is carried out stepwise while raising the temperature and reducing the pressure, and in the latter stage of the polymerization, the temperature is preferably set to 270 ° C. or higher, the melting point of the polyarylene sulfide resin to be produced + 100 ° C. or lower, and more preferably 300 to 350 ° C. Moreover, the polymerization can be carried out with the absolute pressure in the range of 1 [cPa] to 6 [kPa]. In the present specification, the melting point of the resin means a value measured according to JIS K 7121 using a differential scanning calorimeter (PerkinElmer DSC device Pyris Diamond).
溶融重合は、酸化架橋反応を防ぎつつ、高い重合度を得る観点から、好ましくは、非酸化性雰囲気下で行う。非酸化性雰囲気において、気相の酸素濃度は好ましくは5体積%未満の範囲、より好ましくは2体積%未満の範囲であり、更に好ましくは気相が酸素を実質的に含有しない。非酸化性雰囲気は、好ましくは、窒素、ヘリウム及びアルゴン等の不活性ガス雰囲気である。 Melt polymerization is preferably carried out in a non-oxidizing atmosphere from the viewpoint of obtaining a high degree of polymerization while preventing an oxidative cross-linking reaction. In a non-oxidizing atmosphere, the oxygen concentration of the gas phase is preferably in the range of less than 5% by volume, more preferably in the range of less than 2% by volume, and even more preferably the gas phase contains substantially no oxygen. The non-oxidizing atmosphere is preferably an inert gas atmosphere such as nitrogen, helium and argon.
溶融重合は、例えば、加熱装置、減圧装置及び撹拌装置を備える溶融混練機を用いて行うことができる。溶融混錬機としては、例えば、バンバリーミキサー、ニーダー、連続混練機、単軸押出機及び二軸押出機が挙げられる。 The melt polymerization can be carried out by using, for example, a melt kneader equipped with a heating device, a depressurizing device and a stirring device. Examples of the melt kneader include a Banbury mixer, a kneader, a continuous kneader, a single-screw extruder and a twin-screw extruder.
溶融重合のための溶融混合物は、溶媒を実質的に含有しないことが好ましい。より具体的には、溶融混合物に含まれる溶媒の量が、ジヨード芳香族化合物と、単体硫黄と、重合禁止剤と、必要に応じて触媒との合計100質量部に対して、好ましくは10質量部以下の範囲、より好ましくは5質量部以下の範囲、さらに好ましくは1質量部以下の範囲である。溶媒の量は、0質量部以上、0.01質量部以上の範囲、又は0.1質量部以上の範囲であってもよい。 The melt mixture for melt polymerization preferably contains substantially no solvent. More specifically, the amount of the solvent contained in the melt mixture is preferably 10 parts by mass with respect to 100 parts by mass in total of the diiode aromatic compound, elemental sulfur, the polymerization inhibitor and, if necessary, the catalyst. The range is less than a part, more preferably 5 parts by mass or less, still more preferably 1 part by mass or less. The amount of the solvent may be in the range of 0 parts by mass or more, 0.01 parts by mass or more, or 0.1 parts by mass or more.
溶融重合後の溶融混合物(反応生成物)を冷却して固体状態の混合物を得た後、減圧下、又は非酸化性雰囲気の大気圧下で、混合物を加熱して重合反応を更に進行させてもよい。これによりさらに分子量を増大させることができるだけでなく、生成したヨウ素分子が昇華されて除去されるため、ポリアリーレンスルフィド樹脂中のヨウ素原子濃度を低く抑えることができる。好ましくは100〜260℃の範囲、より好ましくは130〜250℃の範囲、更に好ましくは150〜230℃の範囲の温度まで冷却することで、固体状態の混合物を得ることができる。固体状態への冷却後の加熱は、溶融重合と同様の温度及び圧力条件下で行うことができる。 After the melt mixture (reaction product) after melt polymerization is cooled to obtain a solid mixture, the mixture is heated under reduced pressure or at atmospheric pressure in a non-oxidizing atmosphere to further proceed the polymerization reaction. May be good. As a result, not only the molecular weight can be further increased, but also the generated iodine molecules are sublimated and removed, so that the iodine atom concentration in the polyarylene sulfide resin can be kept low. A mixture in a solid state can be obtained by cooling to a temperature in the range of preferably 100 to 260 ° C., more preferably in the range of 130 to 250 ° C., and even more preferably in the range of 150 to 230 ° C. The heating after cooling to the solid state can be performed under the same temperature and pressure conditions as the melt polymerization.
溶融重合工程により得られたポリアリーレンスルフィド樹脂を含む反応生成物は、そのまま直接、溶融混練機に投入する等の方法により樹脂組成物を製造するためのこともできるが、当該反応生成物に当該反応生成物が溶解する溶媒を加えて溶解物を調製し、当該溶解物の状態で反応装置から反応生成物を取り出すことが、生産性に優れるだけでなくさらに反応性も良好となるため好ましい。当該反応生成物が溶解する溶媒の添加は、溶融重合後に行うことが好ましいが、溶融重合の反応後期に行ってもよく、また、上記のとおり溶融混合物(反応生成物)を冷却して固体状態の混合物を得た後、加圧下、減圧下、又は非酸化性雰囲気の大気圧下で、混合物を加熱して重合反応を更に進行させた後であってもよい。当該溶解物を調製する工程は、非酸化性雰囲気下で行ってもよい。また、加熱溶解の温度としては、前記反応生成物が溶解する溶媒の融点以上の範囲であればよく、好ましくは200〜350℃の範囲、より好ましくは210〜250℃の範囲であり、加圧下で行うことが好ましい。 The reaction product containing the polyarylene sulfide resin obtained in the melt polymerization step can be directly put into a melt kneader or the like to produce a resin composition, but the reaction product is said to be the same. It is preferable to prepare a lysate by adding a solvent in which the reaction product dissolves, and to take out the reaction product from the reaction apparatus in the state of the lysate because not only the productivity is excellent but also the reactivity is further improved. The addition of the solvent in which the reaction product dissolves is preferably carried out after the melt polymerization, but it may be carried out in the latter stage of the reaction of the melt polymerization, and the melt mixture (reaction product) is cooled as described above to be in a solid state. After obtaining the mixture of, the mixture may be heated under pressure, reduced pressure, or atmospheric pressure in a non-oxidizing atmosphere to further proceed the polymerization reaction. The step of preparing the lysate may be carried out in a non-oxidizing atmosphere. The temperature for heating and dissolving may be in the range above the melting point of the solvent in which the reaction product dissolves, preferably in the range of 200 to 350 ° C, more preferably in the range of 210 to 250 ° C, and under pressure. It is preferable to carry out with.
前記溶解物を調製するために用いる、前記反応生成物が溶解する溶媒の配合割合は、ポリアリーレンスルフィド樹脂を含む反応生成物100質量部に対して、好ましくは90〜1000質量部の範囲、より好ましくは200〜400質量部の範囲である。 The blending ratio of the solvent in which the reaction product dissolves used for preparing the solution is preferably in the range of 90 to 1000 parts by mass with respect to 100 parts by mass of the reaction product containing the polyarylene sulfide resin. It is preferably in the range of 200 to 400 parts by mass.
反応生成物が溶解する溶媒としては、例えば、フィリップス法等の溶液重合において重合反応溶媒として用いられる溶媒を用いることができる。好ましい溶媒の例としては、N−メチル−2−ピロリドン(以下、NMPと略記)、N−シクロヘキシル−2−ピロリドン、2−ピロリドン、1,3−ジメチル−2−イミダゾリジノン酸、ε−カプロラクタム、N−メチル−ε−カプロラクタム等の脂肪族環状アミド化合物、ヘキサメチルリン酸トリアミド(HMPA)、テトラメチル尿素(TMU)、ジメチルホルムアミド(DMF)、及びジメチルアセトアミド(DMA)等のアミド化合物、ポリエチレングリコールジアルキルエーテル(重合度は2000以下で、炭素原子数1〜20のアルキル基を有するもの)等のエーテル化ポリエチレングリコール化合物、並びに、テトラメチレンスルホキシド、及びジメチルスルホキシド(DMSO)等のスルホキシド化合物が挙げられる。その他の使用可能な溶媒の例として、ベンゾフェノン、ジフェニルエーテル、ジフェニルスルフィド、4,4’−ジブロモビフェニル、1−フェニルナフタレン、2,5−ジフェニル−1,3,4−オキサジアゾール、2,5−ジフェニルオキサゾール、トリフェニルメタノール、N,N−ジフェニルホルムアミド、ベンジル、アントラセン、4−ベンゾイルビフェニル、ジベンゾイルメタン、2−ビフェニルカルボン酸、ジベンゾチオフェン、ペンタクロロフエノール、1−ベンジル−2−ピロリジオン、9−フルオレノン、2−ベンゾイルナフタレン、1−ブロモナフタレン、1,3−ジフェノキシベンゼン、フルオレン、1−フェニル−2−ピロリジノン、1−メトキシナフタレン、1−エトキシナフタレン、1,3−ジフェニルアセトン、1,4−ジベンゾイルプタン、フェナントレン、4−ベンゾイルビフェニル、1,1−ジフェニルアセトン、o,o’−ビフェノール、2,6−ジフェニルフェノール、トリフェニレン、2−フェニルフェノール、チアントレン、3−フェノキシベンジルアルコール、4−フェニルフェノール、9,10−ジクロロアントラセン、トリフェニルメタン、4,4’−ジメトキシベンゾフェノン、9,10−ジフェニルアントラセン、フルオランテン、ジフェニルフタレート、ジフェニルカルボネート、2,6−ジメトキシナフタレン、2,7−ジメトキシナフタレン、4−ブロモジフェニルエーテル、ピレン、9,9’−ビ−フルオレン、4,4’−イソプロピルリデン−ジフェノール、イプシロン−カプロラクタム、N−シクロヘキシル−2−ピロリドン、ジフェニルイソフタレート、ジフェニルーターフタレート及び1−クロロナフタレンからなる群から選ばれる1種以上の溶媒が挙げられる。 As the solvent in which the reaction product is dissolved, for example, a solvent used as a polymerization reaction solvent in solution polymerization such as the Phillips method can be used. Examples of preferable compounds are N-methyl-2-pyrrolidone (hereinafter abbreviated as NMP), N-cyclohexyl-2-pyrrolidone, 2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone acid, ε-caprolactam. , N-Methyl-ε-caprolactam and other aliphatic cyclic amide compounds, hexamethylphosphate triamide (HMPA), tetramethylurea (TMU), dimethylformamide (DMF), and dimethylacetamide (DMA) and other amide compounds, polyethylene. Examples thereof include etherified polyethylene glycol compounds such as glycol dialkyl ether (having a degree of polymerization of 2000 or less and having an alkyl group having 1 to 20 carbon atoms), and sulfoxide compounds such as tetramethylene sulfoxide and dimethyl sulfoxide (DMSO). Be done. Examples of other usable solvents are benzophenone, diphenyl ether, diphenyl sulfide, 4,4'-dibromobiphenyl, 1-phenylnaphthalene, 2,5-diphenyl-1,3,4-oxadiazole, 2,5- Diphenyloxazole, triphenylmethanol, N, N-diphenylformamide, benzyl, anthracene, 4-benzoylbiphenyl, dibenzoylmethane, 2-biphenylcarboxylic acid, dibenzothiophene, pentachlorophenyl, 1-benzyl-2-pyrrolidion, 9- Fluolenone, 2-benzoylnaphthalene, 1-bromonaphthalene, 1,3-diphenoxybenzene, fluorene, 1-phenyl-2-pyrrolidinone, 1-methoxynaphthalene, 1-ethoxynaphthalene, 1,3-diphenylacetone, 1,4 -Dibenzoylptan, phenanthrene, 4-benzoylbiphenyl, 1,1-diphenylacetone, o, o'-biphenol, 2,6-diphenylphenol, triphenylene, 2-phenylphenol, thiantorene, 3-phenoxybenzyl alcohol, 4- Phenylphenol, 9,10-dichloroanthracene, triphenylmethane, 4,4'-dimethoxybenzophenone, 9,10-diphenylanthracene, fluorantene, diphenylphthalate, diphenylcarbonate, 2,6-dimethoxynaphthalene, 2,7-dimethoxy Naphthalene, 4-bromodiphenyl ether, pyrene, 9,9'-bifluorene, 4,4'-isopropyllidene-diphenol, epsilon-caprolactam, N-cyclohexyl-2-pyrrolidone, diphenylisophthalate, diphenyl-terphthalate and Included is one or more solvents selected from the group consisting of 1-chloronaphthalene.
反応装置から取り出された当該溶解物は、後処理を行った後、前記他の成分と溶融混練して樹脂組成物を調製することが、反応性がより良好となるため好ましい。溶解物の後処理の方法としては、特に制限されるものではないが、例えば、以下の方法が挙げられる。
(1)当該溶解物を、そのまま、又は酸若しくは塩基を加えた後、減圧下又は常圧化で溶媒を留去し、次いで溶媒留去後の固形物を水、当該溶解物に用いた溶媒(又は低分子ポリマーに対して同等の溶解度を有する有機溶媒)、アセトン、メチルエチルケトン及びアルコール類などから選ばれる溶媒で1回又は2回以上洗浄し、更に中和、水洗、濾過及び乾燥する方法。
(2)当該溶解物に水、アセトン、メチルエチルケトン、アルコール、エーテル、ハロゲン化炭化水素、芳香族炭化水素及び脂肪族炭化水素などの溶媒(当該溶解物の溶媒に可溶であり、且つ少なくともポリアリーレンスルフィド樹脂に対しては貧溶媒である溶媒)を沈降剤として添加して、ポリアリーレンスルフィド樹脂及び無機塩等を含む固体状生成物を沈降させ、固体状生成物を濾別、洗浄及び乾燥する方法。
(3)当該溶解物に、当該溶解物に用いた溶媒(又は低分子ポリマーに対して同等の溶解度を有する有機溶媒)を加えて撹拌した後、濾過して低分子量重合体を除いた後、水、アセトン、メチルエチルケトン及びアルコールなどから選ばれる溶媒で1回又は2回以上洗浄し、その後中和、水洗、濾過及び乾燥をする方法。
It is preferable that the dissolved product taken out from the reaction apparatus is subjected to post-treatment and then melt-kneaded with the other components to prepare a resin composition because the reactivity becomes better. The method for post-treatment of the dissolved substance is not particularly limited, and examples thereof include the following methods.
(1) The solvent is distilled off from the solution as it is or after adding an acid or a base, and then the solvent is distilled off under reduced pressure or at normal pressure, and then the solid after distilling off the solvent is water, the solvent used for the solution. (Or an organic solvent having the same solubility as a low molecular weight polymer), a method of washing once or twice or more with a solvent selected from acetone, methyl ethyl ketone, alcohols and the like, and further neutralizing, washing with water, filtering and drying.
(2) Solvents such as water, acetone, methyl ethyl ketone, alcohol, ether, halogenated hydrocarbons, aromatic hydrocarbons and aliphatic hydrocarbons in the solution (soluble in the solvent of the solution and at least polyarylene). A solvent that is a poor solvent for the sulfide resin) is added as a precipitant to precipitate the solid product containing the polyarylene sulfide resin and the inorganic salt, and the solid product is filtered, washed and dried. Method.
(3) The solvent used for the lysate (or an organic solvent having the same solubility as that of the low molecular weight polymer) is added to the lysate, and the mixture is stirred and then filtered to remove the low molecular weight polymer. A method of washing once or twice or more with a solvent selected from water, acetone, methyl ethyl ketone, alcohol and the like, and then neutralizing, washing with water, filtering and drying.
なお、上記(1)〜(3)に例示したような後処理方法において、ポリアリーレンスルフィド樹脂の乾燥は真空中で行なってもよいし、空気中又は窒素のような不活性ガス雰囲気中で行なってもよい。酸素濃度が5〜30体積%の範囲の酸化性雰囲気中又は減圧条件下で熱処理を行い、ポリアリーレンスルフィド樹脂を酸化架橋させることもできる。 In the post-treatment methods as illustrated in (1) to (3) above, the polyarylene sulfide resin may be dried in a vacuum, in the air, or in an atmosphere of an inert gas such as nitrogen. You may. The polyarylene sulfide resin can also be oxidatively crosslinked by performing heat treatment in an oxidizing atmosphere having an oxygen concentration in the range of 5 to 30% by volume or under reduced pressure conditions.
ポリアリーレンスルフィド樹脂が溶融重合により生成する反応を、以下に例示する。 The reaction produced by the polyarylene sulfide resin by melt polymerization is illustrated below.
溶融重合により得られるポリアリーレンスルフィド樹脂を含む反応生成物は、原料に由来するヨウ素原子を含有する。そのため、ポリアリーレンスルフィド樹脂は、通常、ヨウ素原子を含む混合物の状態で、紡糸用樹脂組成物の調製などのために用いられる。該混合物におけるヨウ素原子の濃度は、例えば、ポリアリーレンスルフィド樹脂に対して0.01〜10000ppmの範囲であり、好ましくは10〜5000ppmの範囲である。ヨウ素分子の昇華性を利用して、ヨウ素原子濃度を低く抑えることも可能であり、その場合には、900ppm以下の範囲、好ましくは100ppm以下の範囲、さらには10ppm以下の範囲とすることも可能である。さらにヨウ素原子を検出限界以下に除去することも可能ではあるものの、生産性を考えると実用的ではない。検出限界は、例えば0.01ppm程度である。溶融重合により得られる本実施形態のポリアリーレンスルフィド樹脂又はこれを含む反応生成物は、ヨウ素原子を含んでいる点で、例えば、フィリップス法等のジクロロ芳香族化合物の有機極性溶媒中での溶液重合法により得られたポリアリーレンスルフィドと明確に区別され得る。 The reaction product containing the polyarylene sulfide resin obtained by melt polymerization contains iodine atoms derived from the raw material. Therefore, the polyarylene sulfide resin is usually used in the state of a mixture containing iodine atoms for the preparation of a resin composition for spinning and the like. The concentration of iodine atoms in the mixture is, for example, in the range of 0.01 to 10000 ppm, preferably in the range of 10 to 5000 ppm with respect to the polyarylene sulfide resin. It is also possible to keep the iodine atom concentration low by utilizing the sublimation property of the iodine molecule, and in that case, it is also possible to set it in the range of 900 ppm or less, preferably 100 ppm or less, and further 10 ppm or less. Is. Furthermore, although it is possible to remove iodine atoms below the detection limit, it is not practical in terms of productivity. The detection limit is, for example, about 0.01 ppm. The polyarylene sulfide resin of the present embodiment obtained by melt polymerization or a reaction product containing the polyarylene sulfide resin contains an iodine atom, and thus contains a solution weight of a dichloroaromatic compound such as the Phillips method in an organic polar solvent. It can be clearly distinguished from legally obtained polyarylene sulfides.
上記反応式からも理解されるように、溶融重合により得られるポリアリーレンスルフィド樹脂は、ジヨード芳香族化合物に由来する芳香族環及びこれに直接結合した硫黄原子からなるアリーレンスルフィド単位から主として構成される主鎖と、該主鎖の末端に結合した所定の置換基Rとを含む。所定の置換基Rは、主鎖の末端の芳香族環に、直接、又は重合禁止剤に由来する部分構造を介して結合している。 As can be understood from the above reaction formula, the polyarylene sulfide resin obtained by melt polymerization is mainly composed of an arylene sulfide unit composed of an aromatic ring derived from a diiodo aromatic compound and a sulfur atom directly bonded thereto. It contains a backbone and a predetermined substituent R attached to the end of the backbone. The predetermined substituent R is attached to the aromatic ring at the end of the main chain either directly or via a partial structure derived from a polymerization inhibitor.
一実施形態に係るポリアリーレンスルフィド樹脂としてのポリフェニレンスルフィド樹脂は、例えば、下記一般式(10): The polyphenylene sulfide resin as the polyarylene sulfide resin according to the embodiment is described by, for example, the following general formula (10):
一実施形態に係るポリフェニレンスルフィド樹脂は、下記一般式(11): The polyphenylene sulfide resin according to one embodiment has the following general formula (11):
本実施形態のポリアリーレンスルフィド樹脂は、上記アリーレンスルフィド単位から主として構成されるが、通常、原料の単体硫黄に由来する、下記式(20): The polyarylene sulfide resin of the present embodiment is mainly composed of the above allylene sulfide units, but is usually derived from the elemental sulfur of the raw material, according to the following formula (20):
本実施形態に係るポリアリーレンスルフィド樹脂のMw/Mtopは、好ましくは0.80〜1.70の範囲であり、より好ましくは0.90〜1.30の範囲である。Mw/Mtopをこのような範囲とすることで、ポリアリーレンスルフィド樹脂の加工性を向上させることができ、良好なキャビティーバランスを付与することができる。本明細書において、Mwはゲル浸透クロマトグラフィーにより測定される重量平均分子量のことを示し、Mtopは同測定により得られるクロマトグラムの検出強度が最大となる点の平均分子量(ピーク分子量)を示す。Mw/Mtopは、測定対象の分子量の分布を示し、通常、この値が1に近いと分子量の分布が狭いことを示し、この値が大きくなるにつれて、分子量の分布が広いことを示す。なお、ゲル浸透クロマトグラフィーの測定条件は、本明細書の実施例と同一の測定条件とする。ただし、Mw、Mw/Mtopの値に実質的な影響を及ぼさない範囲で、測定条件を変更することは可能である。 The Mw / Mtop of the polyarylene sulfide resin according to the present embodiment is preferably in the range of 0.80 to 1.70, and more preferably in the range of 0.99 to 1.30. By setting Mw / Mtop in such a range, the processability of the polyarylene sulfide resin can be improved, and a good cavity balance can be imparted. In the present specification, Mw indicates the weight average molecular weight measured by gel permeation chromatography, and Mtop indicates the average molecular weight (peak molecular weight) at the point where the detection intensity of the chromatogram obtained by the measurement is maximized. Mw / Mtop indicates the distribution of the molecular weight to be measured. Normally, when this value is close to 1, the distribution of the molecular weight is narrow, and as this value is large, the distribution of the molecular weight is wide. The measurement conditions for gel permeation chromatography are the same as those used in the examples herein. However, it is possible to change the measurement conditions within a range that does not substantially affect the values of Mw and Mw / Mtop.
本実施形態に係るポリアリーレンスルフィド樹脂の重量平均分子量は、本発明の効果を損なわなければ特に限定されるものではないが、その下限は、機械的強度に優れる点から28,000以上であることが好ましく、さらに30,000以上の範囲であることがより好ましい。一方、上限は、より良好なキャビティーバランスを付与することができる点から100,000以下の範囲であることが好ましく、さらに60,000以下の範囲であることがより好ましく、さらに55,000以下の範囲であることが最も好ましい。さらに、機械的強度に優れつつ、かつ、良好なキャビティーバランスを付与できる観点から、28,000〜60,000の範囲のポリアリーレンスルフィド樹脂、より好ましくは30,000〜55,000の範囲のポリアリーレンスルフィド樹脂と共に、重量平均分子量が60,000超100,000以下の範囲にあるポリアリーレンスルフィド樹脂を使用してもよい。 The weight average molecular weight of the polyarylene sulfide resin according to the present embodiment is not particularly limited as long as the effects of the present invention are not impaired, but the lower limit thereof is 28,000 or more from the viewpoint of excellent mechanical strength. Is preferable, and more preferably in the range of 30,000 or more. On the other hand, the upper limit is preferably in the range of 100,000 or less, more preferably in the range of 60,000 or less, and further in the range of 55,000 or less from the viewpoint that a better cavity balance can be imparted. It is most preferably in the range of. Further, from the viewpoint of excellent mechanical strength and being able to impart a good cavity balance, a polyarylene sulfide resin in the range of 28,000 to 60,000, more preferably in the range of 30,000 to 55,000. A polyarylene sulfide resin having a weight average molecular weight in the range of more than 60,000 and 100,000 or less may be used together with the polyarylene sulfide resin.
ポリアリーレンスルフィド樹脂の非ニュートニアン指数は、好ましくは0.95〜1.75の範囲であり、より好ましくは1.0〜1.70の範囲である。非ニュートニアン指数をこのような範囲とすることで、ポリアリーレンスルフィド樹脂の加工性を向上させることができ、良好なキャビティーバランスを付与することができる。本明細書において、非ニュートニアン指数は温度300℃の条件下におけるせん断速度とせん断応力との下記関係式を満たす指数をいう。非ニュートニアン指数は、測定対象の分子量、又は直鎖、分岐、架橋といった分子構造に関する指標となりえ、通常、この値が1に近いと樹脂の分子構造が直鎖状であることを示し、この値が大きくなるにつれて、分岐や架橋構造が多く含まれることを示す。
D=α×Sn
(上記式中、Dはせん断速度を表し、Sはせん断応力を表し、αは定数を表し、nは非ニュートニアン指数を表す。)
The non-Nutonian index of the polyarylene sulfide resin is preferably in the range of 0.95 to 1.75, more preferably in the range of 1.0 to 1.70. By setting the non-neutonian index in such a range, the processability of the polyarylene sulfide resin can be improved, and a good cavity balance can be imparted. In the present specification, the non-Newtonian index refers to an index that satisfies the following relational expression between the shear rate and the shear stress under the condition of a temperature of 300 ° C. The non-Nutonian index can be an index related to the molecular weight to be measured or the molecular structure such as linear, branched, or crosslinked. Normally, when this value is close to 1, it indicates that the molecular structure of the resin is linear. The larger the value, the more branched and crosslinked structures are included.
D = α × Sn
(In the above equation, D represents the shear rate, S represents the shear stress, α represents a constant, and n represents the non-Nutonian exponent.)
上述の特定範囲のMw/Mtop及び非ニュートニアン指数を有するポリアリーレンスルフィド樹脂は、例えば、ジヨード芳香族化合物と、単体硫黄と、重合禁止剤とを、ジヨード芳香族化合物、単体硫黄及び重合禁止剤を含有する溶融混合物中で反応(溶液重合)させる方法において、かかるポリアリーレンスルフィド樹脂をある程度高分子量化させることにより得ることが可能である。 The polyarylene sulfide resin having the above-mentioned specific range of Mw / Mtop and non-neutonian index includes, for example, a diiode aromatic compound, a simple substance sulfur, a polymerization inhibitor, a diiode aromatic compound, a simple substance sulfur and a polymerization inhibitor. In the method of reacting (solution polymerization) in a molten mixture containing the above, it can be obtained by increasing the amount of the polyarylene sulfide resin to some extent.
本実施形態に係るポリアリーレンスルフィド樹脂の融点は、好ましくは250〜300℃の範囲であり、より好ましくは265〜300℃の範囲である。ポリアリーレンスルフィド樹脂の300℃における溶融粘度(V6)は、好ましくは1〜2000[Pa・s]の範囲であり、より好ましくは5〜1700[Pa・s]の範囲である。ここで、溶融粘度(V6)は、フローテスターを用いて、温度300℃、荷重1.96MPa、オリフィス長とオリフィス径との比(オリフィス長/オリフィス径)が10/1であるオリフィスを使用して6分間保持した後の溶融粘度を意味する。 The melting point of the polyarylene sulfide resin according to the present embodiment is preferably in the range of 250 to 300 ° C, more preferably in the range of 265 to 300 ° C. The melt viscosity (V6) of the polyarylene sulfide resin at 300 ° C. is preferably in the range of 1 to 2000 [Pa · s], and more preferably in the range of 5 to 1700 [Pa · s]. Here, the melt viscosity (V6) uses an orifice having a temperature of 300 ° C., a load of 1.96 MPa, and a ratio of the orifice length to the orifice diameter (orifice length / orifice diameter) of 10/1 using a flow tester. It means the melt viscosity after holding for 6 minutes.
本実施形態に係るポリアリーレンスルフィド樹脂組成物は、1種又は2種以上の無機質充填剤を含有することができる。無機充填材が配合されることにより、高剛性、高耐熱安定性の組成物が得られる。無機充填材としては、例えばカーボンブラック、炭酸カルシウム、シリカ及び酸化チタン等の粉末状充填材、タルク及びマイカ等の板状充填材、ガラスビーズ、シリカビーズ及びガラスバルーン等の粒状充填材、ガラス繊維、炭素繊維及びウォラストナイト繊維等の繊維状充填材、並びにガラスフレークが挙げられる。ポリアリーレンスルフィド樹脂組成物は、ガラス繊維、炭素繊維、カーボンブラック、及び炭酸カルシウムからなる群より選ばれる少なくとも1種の無機質充填剤を含有することが特に好ましい。 The polyarylene sulfide resin composition according to the present embodiment may contain one kind or two or more kinds of inorganic fillers. By blending the inorganic filler, a composition having high rigidity and high heat resistance stability can be obtained. Examples of the inorganic filler include powder fillers such as carbon black, calcium carbonate, silica and titanium oxide, plate fillers such as talc and mica, granular fillers such as glass beads, silica beads and glass balloons, and glass fibers. , Fibrous fillers such as carbon fibers and wollastonite fibers, and glass flakes. It is particularly preferable that the polyarylene sulfide resin composition contains at least one inorganic filler selected from the group consisting of glass fiber, carbon fiber, carbon black, and calcium carbonate.
無機充填材の含有量は、ポリアリーレンスルフィド樹脂100質量部に対して、好ましくは1〜300質量部の範囲であり、より好ましくは5〜200質量部の範囲であり、更に好ましくは15〜150質量部の範囲である。無機質充填剤の含有量がこれらの範囲にあることにより、成形品の機械的強度保持の点でより優れた効果が得られる。 The content of the inorganic filler is preferably in the range of 1 to 300 parts by mass, more preferably in the range of 5 to 200 parts by mass, and further preferably in the range of 15 to 150 parts by mass with respect to 100 parts by mass of the polyarylene sulfide resin. It is in the range of parts by mass. When the content of the inorganic filler is in these ranges, a better effect can be obtained in terms of maintaining the mechanical strength of the molded product.
本実施形態に係るポリアリーレンスルフィド樹脂組成物は、熱可塑性樹脂、エラストマー、及び架橋性樹脂から選ばれる、ポリアリーレンスルフィド樹脂以外の樹脂を含有することができる。これら樹脂は、無機質充填剤とともに樹脂組成物中に配合することもできる。 The polyarylene sulfide resin composition according to the present embodiment can contain a resin other than the polyarylene sulfide resin selected from a thermoplastic resin, an elastomer, and a crosslinkable resin. These resins can also be blended in the resin composition together with the inorganic filler.
ポリアリーレンスルフィド樹脂組成物に配合される熱可塑性樹脂としては、例えば、ポリエステル、ポリアミド、ポリイミド、ポリエーテルイミド、ポリカーボネート、ポリフェニレンエーテル、ポリスルフォン、ポリエーテルスルホン、ポリエーテルエーテルケトン、ポリエーテルケトン、ポリエチレン、ポリプロピレン、ポリ四弗化エチレン、ポリ二弗化エチレン、ポリスチレン、ABS樹脂、シリコーン樹脂、及び液晶ポリマー(液晶ポリエステル等)が挙げられる。 Examples of the thermoplastic resin blended in the polyarylene sulfide resin composition include polyester, polyamide, polyimide, polyetherimide, polycarbonate, polyphenylene ether, polysulphon, polyethersulfone, polyetheretherketone, polyetherketone, and polyethylene. , Polypropylene, polytetrafluorinated ethylene, polydifluorinated ethylene, polystyrene, ABS resin, silicone resin, and liquid crystal polymer (liquid crystal polyester, etc.).
ポリアミドは、アミド結合(−NHCO−)を有するポリマーである。ポリアミド樹脂としては、例えば、(i)ジアミンとジカルボン酸の重縮合から得られるポリマー、(ii)アミノカルボン酸の重縮合から得られるポリマー、及び(iii)ラクタムの開環重合から得られるポリマー等が挙げられる。ポリアミドは、単独で又は2種以上を組み合わせて使用することができる。 Polyamide is a polymer having an amide bond (-NHCO-). Examples of the polyamide resin include (i) a polymer obtained by polycondensation of diamine and dicarboxylic acid, (ii) a polymer obtained by polycondensation of aminocarboxylic acid, and (iii) a polymer obtained by ring-opening polymerization of lactam. Can be mentioned. The polyamide can be used alone or in combination of two or more.
ポリアミドを得るためのジアミンの例としては、脂肪族系ジアミン、芳香族系ジアミン、及び脂環族系ジアミン類が挙げられる。脂肪族系ジアミンとしては、直鎖状又は側鎖を有する炭素数3〜18のジアミンが好ましい。好適な脂肪族系ジアミンの例としては、1,3−トリメチレンジアミン、1,4−テトラメチレンジアミン、1,5−ペンタメチレンジアミン、1,6−ヘキサメチレンジアミン、1,7−ヘプタメチレンジアミン、1,8−オクタメチレンジアミン、2−メチル−1,8−オクタンジアミン、1,9−ノナメチレンジアミン、1,10−デカメチレンジアミン、1,11−ウンデカンメチレンジアミン、1,12−ドデカメチレンジアミン、1,13−トリデカメチレンジアミン、1,14−テトラデカメチレンジアミン、1,15−ペンタデカメチレンジアミン、1,16−ヘキサデカメチレンジアミン、1,17−ヘプタデカメチレンジアミン、1,18−オクタデカメチレンジアミン、2,2,4−トリメチルヘキサメチレンジアミン、及び2,4,4−トリメチルヘキサメチレンジアミンが挙げられる。これらは単独で又は2種以上を組み合わせて用いることができる。 Examples of diamines for obtaining polyamides include aliphatic diamines, aromatic diamines, and alicyclic diamines. As the aliphatic diamine, a diamine having a linear or side chain and having 3 to 18 carbon atoms is preferable. Examples of suitable aliphatic diamines are 1,3-trimethylenediamine, 1,4-tetramethylenediamine, 1,5-pentamethylenediamine, 1,6-hexamethylenediamine, 1,7-heptamethylenediamine. , 1,8-octamethylenediamine, 2-methyl-1,8-octanediamine, 1,9-nonamethylenediamine, 1,10-decamethylenediamine, 1,11-undecamethylenediamine, 1,12-dodecamethylene Diamine, 1,13-tridecamethylenediamine, 1,14-tetradecamethylenediamine, 1,15-pentadecamethylenediamine, 1,16-hexamethylenediamine, 1,17-heptadecamethylenediamine, 1,18 − Octadecamethylenediamine, 2,2,4-trimethylhexamethylenediamine, and 2,4,4-trimethylhexamethylenediamine. These can be used alone or in combination of two or more.
芳香族系ジアミンとしては、フェニレン基を有する炭素数6〜27のジアミンが好ましい。好適な芳香族系ジアミンの例としては、o−フェニレンジアミン、m−フェニレンジアミン、p−フェニレンジアミン、m−キシリレンジアミン、p−キシリレンジアミン、3,4−ジアミノジフェニルエーテル、4,4'−ジアミノジフェニルエーテル、4,4'−ジアミノジフェニルメタン、3,3'−ジアミノジフェニルスルフォン、4,4'−ジアミノジフェニルスルフォン、4,4'−ジアミノジフェニルスルフィド、4,4'−ジ(m−アミノフェノキシ)ジフェニルスルフォン、4,4'−ジ(p−アミノフェノキシ)ジフェニルスルフォン、ベンジジン、3,3'−ジアミノベンゾフェノン、4,4'−ジアミノベンゾフェノン、2,2−ビス(4−アミノフェニル)プロパン、1,5−ジアミノナフタレン、1,8−ジアミノナフタレン、4,4'−ビス(4−アミノフェノキシ)ビフェニル、2,2−ビス[4−(4−アミノフェノキシ)フェニル]ヘキサフルオロプロパン、1,4−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(3−アミノフェノキシ)ベンゼン、1,3−ビス(3−アミノフェノキシ)ベンゼン、4,4'−ジアミノ−3,3'−ジエチル−5,5'−ジメチルジフェニルメタン、4,4'−ジアミノ−3,3',5,5'−テトラメチルジフェニルメタン、2,4−ジアミノトルエン、及び2,2'−ジメチルベンジジンが挙げられる。
これらは単独で又は2種以上を組み合わせて用いることができる。
As the aromatic diamine, a diamine having a phenylene group and having 6 to 27 carbon atoms is preferable. Examples of suitable aromatic diamines include o-phenylenediamine, m-phenylenediamine, p-phenylenediamine, m-xylylenediamine, p-xylylenediamine, 3,4-diaminodiphenyl ether, 4,4'-. Diaminodiphenyl ether, 4,4'-diaminodiphenylmethane, 3,3'-diaminodiphenylsulphon, 4,4'-diaminodiphenylsulphon, 4,4'-diaminodiphenylsulfide, 4,4'-di (m-aminophenoxy) Diphenyl sulphon, 4,4'-di (p-aminophenoxy) diphenyl sulphon, benzidine, 3,3'-diaminobenzophenone, 4,4'-diaminobenzophenone, 2,2-bis (4-aminophenyl) propane, 1 , 5-Diaminonaphthalene, 1,8-diaminonaphthalene, 4,4'-bis (4-aminophenoxy) biphenyl, 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane, 1,4 -Bis (4-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene, 4 , 4'-diamino-3,3'-diethyl-5,5'-dimethyldiphenylmethane, 4,4'-diamino-3,3', 5,5'-tetramethyldiphenylmethane, 2,4-diaminotoluene, and Included are 2,2'-dimethylbenzidine.
These can be used alone or in combination of two or more.
脂環族系ジアミンとしては、シクロヘキシレン基を有する炭素数4〜15のジアミンが好ましい。好適な脂環族系ジアミンの例としては、4,4'−ジアミノ−ジシクロヘキシレンメタン、4,4'−ジアミノ−ジシクロヘキシレンプロパン、4,4'−ジアミノ−3,3'−ジメチル−ジシクロヘキシレンメタン、1,4−ジアミノシクロヘキサン、及びピペラジンが挙げられる。これらは単独で又は2種以上を組み合わせて用いることができる。 As the alicyclic diamine, a diamine having a cyclohexylene group and having 4 to 15 carbon atoms is preferable. Examples of suitable alicyclic diamines are 4,4'-diamino-dicyclohexylenemethane, 4,4'-diamino-dicyclohexylenepropane, 4,4'-diamino-3,3'-dimethyl-. Included are dicyclohexylene methane, 1,4-diaminocyclohexane, and piperazine. These can be used alone or in combination of two or more.
ポリアミドを得るためのジカルボン酸としては、脂肪族系ジカルボン酸、芳香族系ジカルボン酸、及び脂環族系ジカルボン酸を挙げることができる。 Examples of the dicarboxylic acid for obtaining a polyamide include an aliphatic dicarboxylic acid, an aromatic dicarboxylic acid, and an alicyclic dicarboxylic acid.
脂肪族系ジカルボン酸としては、炭素原子数2〜18の飽和又は不飽和のジカルボン酸が好ましい。好適な脂肪族系ジカルボン酸の例としては、蓚酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸、ウンデカン二酸、ドデカン二酸、プラシリン酸、テトラデカン二酸、ペンタデカン二酸、オクタデカン二酸、マレイン酸、及びフマル酸が挙げられる。これらは単独で又は2種以上を組み合わせて用いることができる。 As the aliphatic dicarboxylic acid, a saturated or unsaturated dicarboxylic acid having 2 to 18 carbon atoms is preferable. Examples of suitable aliphatic dicarboxylic acids include oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, undecanedioic acid, dodecanedioic acid, placeric acid, tetradecane. Examples include diacid, pentadecanedioic acid, octadecanedioic acid, maleic acid, and fumaric acid. These can be used alone or in combination of two or more.
芳香族系ジカルボン酸としては、フェニレン基を有する炭素数8〜15のジカルボン酸が好ましい。好適な芳香族系ジカルボン酸の例としては、イソフタル酸、テレフタル酸、メチルテレフタル酸、ビフェニル−2,2'−ジカルボン酸、ビフェニル−4,4'−ジカルボン酸、ジフェニルメタン−4,4'−ジカルボン酸、ジフェニルエーテル−4,4'−ジカルボン酸、ジフェニルスルフォン−4,4'−ジカルボン酸、2,6−ナフタレンジカルボン酸、2,7−ナフタレンジカルボン酸、及び1,4−ナフタレンジカルボン酸が挙げられる。これらは単独で又は2種以上を組み合わせて用いることができる。更に、トリメリット酸、トリメシン酸、及びピロメリット酸等の多価カルボン酸を、溶融成形可能な範囲内で用いることもできる。 As the aromatic dicarboxylic acid, a dicarboxylic acid having a phenylene group and having 8 to 15 carbon atoms is preferable. Examples of suitable aromatic dicarboxylic acids are isophthalic acid, terephthalic acid, methylterephthalic acid, biphenyl-2,2'-dicarboxylic acid, biphenyl-4,4'-dicarboxylic acid, diphenylmethane-4,4'-dicarboxylic acid. Examples thereof include acid, diphenyl ether-4,4'-dicarboxylic acid, diphenylsulphon-4,4'-dicarboxylic acid, 2,6-naphthalenedicarboxylic acid, 2,7-naphthalenedicarboxylic acid, and 1,4-naphthalenedicarboxylic acid. .. These can be used alone or in combination of two or more. Further, polyvalent carboxylic acids such as trimellitic acid, trimesic acid, and pyromellitic acid can be used within a range that can be melt-molded.
アミノカルボン酸としては、炭素数4〜18のアミノカルボン酸が好ましい。好適なアミノカルボン酸の例としては、4−アミノ酪酸、6−アミノヘキサン酸、7−アミノヘプタン酸、8−アミノオクタン酸、9−アミノノナン酸、10−アミノデカン酸、11−アミノウンデカン酸、12−アミノドデカン酸、14−アミノテトラデカン酸、16−アミノヘキサデカン酸、及び18−アミノオクタデカン酸が挙げられる。これらは単独で又は2種以上を組み合わせて用いることができる。 As the aminocarboxylic acid, an aminocarboxylic acid having 4 to 18 carbon atoms is preferable. Examples of suitable aminocarboxylic acids are 4-aminobutyric acid, 6-aminohexanoic acid, 7-aminoheptanoic acid, 8-aminooctanoic acid, 9-aminononanoic acid, 10-aminodecanoic acid, 11-aminoundecanoic acid, 12 Included are −aminododecanoic acid, 14-aminotetradecanoic acid, 16-aminohexadecanoic acid, and 18-aminooctadecanoic acid. These can be used alone or in combination of two or more.
ポリアミドを得るためのラクタムとしては、例えば、ε−カプロラクタム、ω−ラウロラクタム、ζ−エナントラクタム、及びη−カプリルラクタムが挙げられる。これらは単独で又は2種以上を組み合わせて用いることができる。 Examples of the lactam for obtaining a polyamide include ε-caprolactam, ω-laurolactam, ζ-enantractam, and η-caprilactam. These can be used alone or in combination of two or more.
好ましいポリアミドの原料の組み合わせとしては、ε−カプロラクタム(ナイロン6)、1,6−ヘキサメチレンジアミン/アジピン酸(ナイロン6,6)、1,4−テトラメチレンジアミン/アジピン酸(ナイロン4,6)、1,6−ヘキサメチレンジアミン/テレフタル酸、1,6−ヘキサメチレンジアミン/テレフタル酸/ε−カプロラクタム、1,6−ヘキサメチレンジアミン/テレフタル酸/アジピン酸、1,9−ノナメチレンジアミン/テレフタル酸、1,9−ノナメチレンジアミン/テレフタル酸/ε−カプロラクタム、1,9−ノナメチレンジアミン/1,6−ヘキサメチレンジアミン/テレフタル酸/アジピン酸、及びm−キシリレンジアミン/アジピン酸が挙げられる。これらの中でも、1,4−テトラメチレンジアミン/アジピン酸(ナイロン4,6)、1,6−ヘキサメチレンジアミン/テレフタル酸/ε−カプロラクタム、1,6−ヘキサメチレンジアミン/テレフタル酸/アジピン酸、1,9−ノナメチレンジアミン/テレフタル酸、1,9−ノナメチレンジアミン/テレフタル酸/ε−カプロラクタム、又は1,9−ノナメチレンジアミン/1,6−ヘキサメチレンジアミン/テレフタル酸/アジピン酸から得られるリアミド樹脂が更に好ましい。 Preferred combinations of polyamide raw materials include ε-caprolactam (nylon 6), 1,6-hexamethylenediamine / adipic acid (nylon 6,6), 1,4-tetramethylenediamine / adipic acid (nylon 4,6). , 1,6-Hexamethylenediamine / terephthalic acid, 1,6-hexamethylenediamine / terephthalic acid / ε-caprolactam, 1,6-hexamethylenediamine / terephthalic acid / adipic acid, 1,9-nonamethylenediamine / terephthalic acid Acids, 1,9-nonamethylenediamine / terephthalic acid / ε-caprolactam, 1,9-nonamethylenediamine / 1,6-hexamethylenediamine / terephthalic acid / adipic acid, and m-xylylenediamine / adipic acid. Be done. Among these, 1,4-tetramethylenediamine / adipic acid (nylon 4,6), 1,6-hexamethylenediamine / terephthalic acid / ε-caprolactam, 1,6-hexamethylenediamine / terephthalic acid / adipic acid, Obtained from 1,9-nonamethylenediamine / terephthalic acid, 1,9-nonamethylenediamine / terephthalic acid / ε-caprolactam, or 1,9-nonamethylenediamine / 1,6-hexamethylenediamine / terephthalic acid / adipic acid The rearmid resin to be obtained is more preferable.
熱可塑性樹脂の含有量は、ポリアリーレンスルフィド樹脂100質量部に対して、好ましくは1〜300質量部の範囲であり、より好ましくは3〜100質量部の範囲であり、更に好ましくは5〜45質量部の範囲である。ポリアリーレンスルフィド樹脂以外の熱可塑性樹脂の含有量がこれらの範囲にあることにより、耐熱性、耐薬品性及び機械的物性の更なる向上という効果が得られる。 The content of the thermoplastic resin is preferably in the range of 1 to 300 parts by mass, more preferably in the range of 3 to 100 parts by mass, and further preferably 5 to 45 parts by mass with respect to 100 parts by mass of the polyarylene sulfide resin. It is in the range of parts by mass. When the content of the thermoplastic resin other than the polyarylene sulfide resin is in these ranges, the effect of further improving the heat resistance, chemical resistance and mechanical properties can be obtained.
ポリアリーレンスルフィド樹脂組成物に配合されるエラストマーとしては、熱可塑性エラストマーが用いられることが多い。熱可塑性エラストマーとしては、例えば、ポリオレフィン系エラストマー、弗素系エラストマー及びシリコーン系エラストマーが挙げられる。なお、本明細書において、熱可塑性エラストマーは、前記熱可塑性樹脂ではなくエラストマーに分類される。 As the elastomer to be blended in the polyarylene sulfide resin composition, a thermoplastic elastomer is often used. Examples of the thermoplastic elastomer include polyolefin-based elastomers, fluorine-based elastomers, and silicone-based elastomers. In addition, in this specification, a thermoplastic elastomer is classified into an elastomer instead of the thermoplastic resin.
エラストマー(特に熱可塑性エラストマー)は、ヒドロキシ基、アミノ基、カルボキシル基及びカルボキシル基の塩からなる群より選ばれる少なくとも一種の基と反応し得る官能基を有することが好ましい。これにより、接着性及び耐衝撃性等の点で特に優れ、また加熱によるガス発生量を抑制できる樹脂組成物を得ることができる。係る官能基としては、エポキシ基、アミノ基、水酸基、カルボキシル基、メルカプト基、イソシアネート基、オキサゾリン基、及び、式:R(CO)O(CO)−又はR(CO)O−(式中、Rは炭素原子数1〜8のアルキル基を表す。)で表される基が挙げられる。係る官能基を有する熱可塑性エラストマーは、例えば、α−オレフィンと前記官能基を有するビニル重合性化合物との共重合により得ることができる。α−オレフィンは、例えば、エチレン、プロピレン及びブテン−1等の炭素数2〜8のα−オレフィン類が挙げられる。前記官能基を有するビニル重合性化合物としては、例えば、(メタ)アクリル酸及び(メタ)アクリル酸エステル等のα,β−不飽和カルボン酸及びそのアルキルエステル、マレイン酸、フマル酸、イタコン酸及びその他の炭素数4〜10のα、β−不飽和ジカルボン酸及びその誘導体(モノ若しくはジエステル、及びその酸無水物等)、並びにグリシジル(メタ)アクリレート等が挙げられる。これらの中でも、エポキシ基、カルボキシル基、及び、式:R(CO)O(CO)−又はR(CO)O−(式中、Rは炭素原子数1〜8のアルキル基を表す。)で表される基からなる群から選ばれる少なくとも1種の官能基を有するエチレン−プロピレン共重合体及びエチレン−ブテン共重合体が、靭性及び耐衝撃性の向上の点から好ましい。 The elastomer (particularly the thermoplastic elastomer) preferably has a functional group capable of reacting with at least one group selected from the group consisting of a hydroxy group, an amino group, a carboxyl group and a salt of the carboxyl group. As a result, it is possible to obtain a resin composition that is particularly excellent in terms of adhesiveness, impact resistance, etc., and that can suppress the amount of gas generated by heating. Examples of the functional group include an epoxy group, an amino group, a hydroxyl group, a carboxyl group, a mercapto group, an isocyanate group, an oxazoline group, and a formula: R (CO) O (CO)-or R (CO) O- (in the formula, R represents an alkyl group having 1 to 8 carbon atoms.). The thermoplastic elastomer having such a functional group can be obtained, for example, by copolymerizing an α-olefin with the vinyl polymerizable compound having the functional group. Examples of the α-olefin include α-olefins having 2 to 8 carbon atoms such as ethylene, propylene and butene-1. Examples of the vinyl polymerizable compound having a functional group include α, β-unsaturated carboxylic acids such as (meth) acrylic acid and (meth) acrylic acid ester and alkyl esters thereof, maleic acid, fumaric acid, itaconic acid and the like. Other examples include α, β-unsaturated dicarboxylic acid having 4 to 10 carbon atoms and a derivative thereof (mono or diester, an acid anhydride thereof, etc.), glycidyl (meth) acrylate, and the like. Among these, an epoxy group, a carboxyl group, and a formula: R (CO) O (CO)-or R (CO) O- (in the formula, R represents an alkyl group having 1 to 8 carbon atoms). An ethylene-propylene copolymer and an ethylene-butene copolymer having at least one functional group selected from the group consisting of the represented groups are preferable from the viewpoint of improving toughness and impact resistance.
エラストマーの含有量は、その種類、用途により異なるため一概に規定することはできないが、例えば、ポリアリーレンスルフィド樹脂100質量部に対して好ましくは1〜300質量部の範囲であり、より好ましくは3〜100質量部の範囲であり、更に好ましくは5〜45質量部の範囲である。エラストマーの含有量がこれらの範囲にあることにより、成形品の耐熱性、靭性の確保の点でより一層優れた効果が得られる。 The content of the elastomer cannot be unconditionally specified because it differs depending on the type and application, but for example, it is preferably in the range of 1 to 300 parts by mass, and more preferably 3 with respect to 100 parts by mass of the polyarylene sulfide resin. It is in the range of ~ 100 parts by mass, more preferably 5 to 45 parts by mass. When the content of the elastomer is within these ranges, an even more excellent effect can be obtained in terms of ensuring the heat resistance and toughness of the molded product.
ポリアリーレンスルフィド樹脂組成物に配合される架橋性樹脂は、2以上の架橋性官能基を有する。架橋性官能基としては、エポキシ基、フェノール性水酸基、アミノ基、アミド基、カルボキシル基、酸無水物基、及びイソシアネート基などが挙げられる。架橋性樹脂としては、例えば、エポキシ樹脂、フェノール樹脂、及びウレタン樹脂が挙げられる。 The crosslinkable resin blended in the polyarylene sulfide resin composition has two or more crosslinkable functional groups. Examples of the crosslinkable functional group include an epoxy group, a phenolic hydroxyl group, an amino group, an amide group, a carboxyl group, an acid anhydride group, and an isocyanate group. Examples of the crosslinkable resin include epoxy resin, phenol resin, and urethane resin.
エポキシ樹脂としては、芳香族系エポキシ樹脂が好ましい。芳香族系エポキシ樹脂は、ハロゲン基又は水酸基等を有していてもよい。好適な芳香族系エポキシ樹脂の例としては、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビフェニル型エポキシ樹脂、テトラメチルビフェニル型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、テトラフェニルエタン型エポキシ樹脂、ジシクロペンタジエン−フェノール付加反応型エポキシ樹脂、フェノールアラルキル型エポキシ樹脂、ナフトールノボラック型エポキシ樹脂、ナフトールアラルキル型エポキシ樹脂、ナフトール−フェノール共縮ノボラック型エポキシ樹脂、ナフトール−クレゾール共縮ノボラック型エポキシ樹脂、芳香族炭化水素ホルムアルデヒド樹脂変性フェノール樹脂型エポキシ樹脂、及びビフェニルノボラック型エポキシ樹脂が挙げられる。これらの芳香族系エポキシ樹脂は、単独で又は2種以上を組み合わせて用いることができる。これら芳香族系エポキシ樹脂の中でも特に、他の樹脂成分との相溶性に優れる点から、ノボラック型エポキシ樹脂が好ましく、クレゾールノボラック型エポキシ樹脂がより好ましい。 As the epoxy resin, an aromatic epoxy resin is preferable. The aromatic epoxy resin may have a halogen group, a hydroxyl group, or the like. Examples of suitable aromatic epoxy resins include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, biphenyl type epoxy resin, tetramethylbiphenyl type epoxy resin, phenol novolac type epoxy resin, and cresol novolac. Type epoxy resin, bisphenol A novolak type epoxy resin, triphenylmethane type epoxy resin, tetraphenylethane type epoxy resin, dicyclopentadiene-phenol addition reaction type epoxy resin, phenol aralkyl type epoxy resin, naphthol novolac type epoxy resin, naphthol aralkyl Examples thereof include type epoxy resin, naphthol-phenol co-condensed novolak type epoxy resin, naphthol-cresol co-condensed novolak type epoxy resin, aromatic hydrocarbon formaldehyde resin modified phenol resin type epoxy resin, and biphenyl novolac type epoxy resin. These aromatic epoxy resins can be used alone or in combination of two or more. Among these aromatic epoxy resins, a novolac type epoxy resin is preferable, and a cresol novolac type epoxy resin is more preferable, because it is excellent in compatibility with other resin components.
架橋性樹脂の含有量は、ポリアリーレンスルフィド樹脂100質量部に対して、好ましくは1〜300質量部の範囲であり、より好ましくは3〜100質量部の範囲であり、更に好ましくは5〜30質量部の範囲である。架橋性樹脂の含有量がこれら範囲にあることにより、成形品の剛性及び耐熱性の向上という効果が特に顕著に得られる。 The content of the crosslinkable resin is preferably in the range of 1 to 300 parts by mass, more preferably in the range of 3 to 100 parts by mass, and further preferably 5 to 30 parts by mass with respect to 100 parts by mass of the polyarylene sulfide resin. It is in the range of parts by mass. When the content of the crosslinkable resin is in these ranges, the effect of improving the rigidity and heat resistance of the molded product is particularly remarkable.
ポリアリーレンスルフィド樹脂組成物は、ヒドロキシ基、アミノ基、カルボキシル基及びカルボキシル基の塩からなる群より選ばれる少なくとも一種の基と反応し得る官能基を有するシラン化合物を含有することができる。これにより、ポリアリーレンスルフィド樹脂と他の成分との相溶性を向上し、また、加熱によるガス発生量を抑制できる樹脂組成物を得ることができる。係るシラン化合物としては、例えば、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、γ−グリシドキシプロピルメチルジエトキシシラン及びγ−グリシドキシプロピルメチルジメトキシシラン等のシランカップリング剤が挙げられる。 The polyarylene sulfide resin composition can contain a silane compound having a functional group capable of reacting with at least one group selected from the group consisting of a hydroxy group, an amino group, a carboxyl group and a salt of a carboxyl group. As a result, it is possible to obtain a resin composition capable of improving the compatibility between the polyarylene sulfide resin and other components and suppressing the amount of gas generated by heating. Examples of such silane compounds include γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, and γ-glycidoxypropylmethyl. Examples thereof include silane coupling agents such as diethoxysilane and γ-glycidoxypropylmethyldimethoxysilane.
シラン化合物の含有量は、例えば、ポリアリーレンスルフィド樹脂100質量部に対して0.01〜10質量部の範囲であることが好ましく、さらに0.1〜5質量部の範囲であることがより好ましい。シラン化合物の含有量がこれらの範囲にあることにより、ポリアリーレンスルフィド樹脂と前記他の成分との相溶性向上という効果が得られる。 The content of the silane compound is, for example, preferably in the range of 0.01 to 10 parts by mass, and more preferably in the range of 0.1 to 5 parts by mass with respect to 100 parts by mass of the polyarylene sulfide resin. .. When the content of the silane compound is in these ranges, the effect of improving the compatibility between the polyarylene sulfide resin and the other components can be obtained.
本実勢形態に係るポリアリーレンスルフィド樹脂組成物は、離型剤、着色剤、耐熱安定剤、紫外線安定剤、発泡剤、防錆剤、難燃剤及び滑剤等のその他の添加剤を含有してもよい。添加剤の含有量は、例えば、ポリアリーレンスルフィド樹脂100質量部に対して、1〜10質量部の範囲であることが好ましい。 The polyarylene sulfide resin composition according to the present embodiment may contain other additives such as a mold release agent, a colorant, a heat stabilizer, an ultraviolet stabilizer, a foaming agent, a rust preventive, a flame retardant and a lubricant. good. The content of the additive is preferably in the range of 1 to 10 parts by mass with respect to 100 parts by mass of the polyarylene sulfide resin, for example.
ポリアリーレンスルフィド樹脂組成物は、上記方法により得られたポリアリーレンスルフィド樹脂と、前記他の成分とを溶融混練する方法により、例えば、ペレット状のコンパウンド等の形態で得ることができる。溶融混錬の温度は、例えば、250〜350℃の範囲であることが好ましく、さらに290〜330℃の範囲であることがより好ましい。溶融混錬は、2軸押出機等を用いて行うことができる。 The polyarylene sulfide resin composition can be obtained, for example, in the form of a pellet-like compound or the like by a method of melt-kneading the polyarylene sulfide resin obtained by the above method with the other components. The temperature of melt kneading is preferably in the range of, for example, 250 to 350 ° C, and more preferably in the range of 290 to 330 ° C. Melt kneading can be performed using a twin-screw extruder or the like.
本実施形態に係るポリアリーレンスルフィド樹脂組成物は、単独で又は前記他の成分などの材料と組み合わせて、射出成形、押出成形、圧縮成形及びブロー成形のような各種溶融加工法により、耐熱性、成形加工性、寸法安定性等に優れた成形品に加工することができる。本実施形態に係るポリアリーレンスルフィド樹脂組成物は、加熱されたときのガス発生量が少ないことから、高品質の成形品の容易な製造を可能にする。 The polyarylene sulfide resin composition according to the present embodiment has heat resistance by various melt processing methods such as injection molding, extrusion molding, compression molding and blow molding, alone or in combination with materials such as the other components. It can be processed into a molded product with excellent moldability, dimensional stability, and the like. The polyarylene sulfide resin composition according to the present embodiment enables easy production of high-quality molded products because the amount of gas generated when heated is small.
このようにして得られる成形品は、表面実装電子部品に好適に用いられる。表面実装電子部品は、例えば、ポリアリーレンスルフィド樹脂組成物の成形品と、金属端子とを構成要素とするもので、プリント印刷された配線基板や回路基板上に表面実装方式によって固定されるものである。この電子部品を表面実装方式で基板に固定させるには、該電子部品の金属端子がハンダボールを介して基板上の通電部に接するように基板表面に載せて、上記した加熱方式によってリフロー炉内で加熱することによって、該電子部品を基板にハンダ付けする方法が挙げられる。かかる表面実装電子部品としては、具体的には、表面実装方式対応用のコネクター、スイッチ、センサー、抵抗器、リレー、コンデンサー、ソケット、ジャック、ヒューズホルダー、コイルボビン、ICやLEDのハウジング等が挙げられる。 The molded product thus obtained is suitably used for surface mount electronic components. The surface mount electronic component is, for example, a molded product of a polyarylene sulfide resin composition and a metal terminal as components, and is fixed on a printed wiring board or circuit board by a surface mount method. be. In order to fix the electronic component to the substrate by the surface mount method, the metal terminal of the electronic component is placed on the substrate surface so as to be in contact with the energized portion on the substrate via a solder ball, and the inside of the reflow furnace is subjected to the above heating method. A method of soldering the electronic component to the substrate by heating with the above can be mentioned. Specific examples of such surface mount electronic components include connectors, switches, sensors, resistors, relays, capacitors, sockets, jacks, fuse holders, coil bobbins, IC and LED housings, etc. for surface mount methods. ..
本実施形態に係るポリアリーレンスルフィド樹脂組成物を表面実装電子部品に用いると、加熱によるガス発生量を低減させることができるため、金属端子等の腐食を抑制できる。また、本実施形態に係るポリアリーレンスルフィド樹脂組成物によれば、例えばスナップフィット部を有する成形品に成形した場合にも、優れた機械強度を示す。 When the polyarylene sulfide resin composition according to the present embodiment is used for a surface mount electronic component, the amount of gas generated by heating can be reduced, so that corrosion of metal terminals and the like can be suppressed. Further, according to the polyarylene sulfide resin composition according to the present embodiment, excellent mechanical strength is exhibited even when molded into, for example, a molded product having a snap-fit portion.
以下、実施例を挙げて本発明についてさらに具体的に説明する。ただし、本発明はこれら実施例に限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to these examples.
1.評価法
[曲げ特性]
・準拠試験方法…ASTM D−790
・試験片…3.2mm(厚)×12.7mm(幅)×127mm(長)
・試験結果…試験数n=10の平均値
1. 1. Evaluation method [Bending characteristics]
-Compliance test method ... ASTM D-790
-Test piece: 3.2 mm (thickness) x 12.7 mm (width) x 127 mm (length)
・ Test result: Average value of the number of tests n = 10
[耐熱水性]
試験片を95℃の熱水に浸漬し、曲げ強さの経時変化を調べた。
・試験片…3.2mm(厚)×12.7mm(幅)×127mm(長)
・曲げ強さの試験方法…ASTM D−790
・評価項目…1000時間、3000時間後の曲げ強さの初期強さに対する保持率
・試験結果…試験数n=5の平均値
[Heat-resistant water]
The test piece was immersed in hot water at 95 ° C., and the change in bending strength with time was examined.
-Test piece: 3.2 mm (thickness) x 12.7 mm (width) x 127 mm (length)
-Bending strength test method ... ASTM D-790
-Evaluation items: Retention rate of flexural strength after 1000 hours and 3000 hours with respect to initial strength-Test results: Average value of the number of tests n = 5
[金属密着強さ]
金型にセットした4×10×49mmの金属片(SUS304)に、同寸法分のポリアリーレンスルフィド樹脂組成物を射出、成形したものについて、チャック間20mm、引張速度1mm/minの条件で引張試験を実施し、金属密着強さを測定した。
[Metal adhesion strength]
A tensile test was performed on a 4 × 10 × 49 mm metal piece (SUS304) set in a mold by injecting and molding a polyarylene sulfide resin composition having the same dimensions under the conditions of a chuck distance of 20 mm and a tensile speed of 1 mm / min. Was carried out, and the metal adhesion strength was measured.
[キャビティーバランス]
40個分のキャビティーを有するワッシャー金型を用いて、一次スプルーに最も近い位置のキャビティー(C1)が完全に充填される限りで最低の成形条件でPPSコンパウンドを射出成形した。成形条件は75トン成形機、シリンダー温度320℃、金型温度140℃、保圧無しとした。
[Cavity balance]
Using a washer mold with 40 cavities, the PPS compound was injection molded under the lowest molding conditions as long as the cavity (C1) closest to the primary sprue was completely filled. The molding conditions were a 75-ton molding machine, a cylinder temperature of 320 ° C., a mold temperature of 140 ° C., and no holding pressure.
成型後の、キャビティー(C1)と同じランナーにある一次スプルーから最も遠いキャビティー(C10)の充填度を比較した。充填度(質量%)は、キャビティー(C1)の成形品に対する、キャビティー(C10)の成形品の質量比から求めた。キャビティー(C10)の充填度が高いほど、キャビティーバランスが優れていると言える。充填度に基づいて、各組成物のキャビティーバランスを以下の基準で判定した。
AA:100〜90質量%の範囲
A:89〜80質量%の範囲
B:79〜70質量%の範囲
C:69〜60質量%の範囲
D:59%質量以下の範囲
After molding, the filling degree of the cavity (C10) farthest from the primary sprue in the same runner as the cavity (C1) was compared. The filling degree (mass%) was determined from the mass ratio of the molded product of the cavity (C10) to the molded product of the cavity (C1). It can be said that the higher the filling degree of the cavity (C10), the better the cavity balance. Based on the degree of filling, the cavity balance of each composition was determined according to the following criteria.
AA: Range of 100 to 90% by mass A: Range of 89 to 80% by mass B: Range of 79 to 70% by mass C: Range of 69 to 60% by mass D: Range of 59% by mass or less
[ガス発生量]
ガスクロマトグラフ質量分析装置を用いて、ポリアリーレンスルフィド樹脂又は樹脂組成物の所定量のサンプルを325℃で15分間加熱し、そのときのガス発生量を質量%として定量した。
[Gas generation amount]
Using a gas chromatograph mass spectrometer, a predetermined amount of sample of the polyarylene sulfide resin or resin composition was heated at 325 ° C. for 15 minutes, and the amount of gas generated at that time was quantified as mass%.
[耐リフロー加熱性]
樹脂組成物のペレットを、射出成形機を用いて成形し、形状が縦70mm×横10mm×高さ8mm、0.8mm厚さの箱形コネクターを作成した。次いで、この箱形コネクターをプリント基板の上に載せて、下記リフロー条件で加熱した。加熱後に箱形コネクターを目視観察し、下記の2段階の基準で外観評価を行った。
〇:外観に変化なし。
×:ブリスタ又は融解が観察された。
(リフロー条件)
リフロー加熱は赤外線リフロー装置(アサヒエンジニアリング社製「TPF−2」)で行った。この際の加熱条件としては、それぞれ180℃で100秒間予備加熱した後、基体表面が280℃に到達するまで加熱保持を行った。つまり、200℃以上の領域で100秒間、220℃以上の領域で90秒間、240℃以上の領域で80秒間、260℃以上の領域で60秒間となるように温度プロファイル(温度曲線)をリフロー装置にて設定を行い、加熱保持を行った。
[Reflow heat resistance]
The pellets of the resin composition were molded using an injection molding machine to prepare a box-shaped connector having a shape of 70 mm in length × 10 mm in width × 8 mm in height and 0.8 mm in thickness. Next, this box-shaped connector was placed on a printed circuit board and heated under the following reflow conditions. After heating, the box-shaped connector was visually observed, and the appearance was evaluated according to the following two-step criteria.
〇: No change in appearance.
X: Blister or melting was observed.
(Reflow condition)
The reflow heating was performed by an infrared reflow device (“TPF-2” manufactured by Asahi Engineering Co., Ltd.). As the heating conditions at this time, after preheating each at 180 ° C. for 100 seconds, heating and holding was performed until the surface of the substrate reached 280 ° C. That is, the temperature profile (temperature curve) is reflowed so that the temperature is 100 seconds in the region of 200 ° C. or higher, 90 seconds in the region of 220 ° C. or higher, 80 seconds in the region of 240 ° C. or higher, and 60 seconds in the region of 260 ° C. or higher. The setting was made in, and heating was held.
2.ポリフェニレンスルフィド樹脂(PPS樹脂)の合成
(合成例1:PPS−1の合成)
p−ジヨードベンゼン(東京化成株式会社、p−ジヨードベンゼン純度98.0%以上)300.0g、固体硫黄(関東化学株式会社製、硫黄(粉末))27.00g、4,4’−ジチオビス安息香酸(和光純薬工業株式会社製、4,4’−ジチオビス安息香酸、Technical Grade)2.0gを180℃に加熱してそれらを窒素下で溶解、混合した。次に220℃に昇温し、絶対圧26.6kPaまで減圧した。得られた溶融混合物を、320℃で絶対圧133Paとなるように、段階的に温度と圧力変化させて、8時間溶融重合した。反応終了後、NMP200gを加えて、220℃で加熱撹拌し、得られた溶解物をろ過した。ろ過後の溶解物にNMP320gを加え、ケーキ洗浄ろ過を行った。得られたNMPを含むケーキにイオン交換水1Lを加え、オートクレーブ中で200℃10分間攪拌した。次いでケーキをろ過し、ろ過後のケーキに70℃のイオン交換水1Lを加えケーキ洗浄を行った。得られた含水ケーキにイオン交換水1Lを加えて10分間攪拌した。次いでケーキをろ過し、ろ過後のケーキに70℃のイオン交換水1Lを加えケーキ洗浄を行った。この操作をもう一度繰り返した後、ケーキを120℃で4時間乾燥し、PPS樹脂(PPS−1)91gを得た。
2. Synthesis of polyphenylene sulfide resin (PPS resin) (Synthesis Example 1: Synthesis of PPS-1)
300.0 g of p-diiodobenzene (Tokyo Kasei Co., Ltd., p-diiodobenzene purity of 98.0% or more), 27.00 g of solid sulfur (manufactured by Kanto Chemical Co., Inc., sulfur (powder)), 4,4'- 2.0 g of dithiobis benzoic acid (manufactured by Wako Pure Chemical Industries, Ltd., 4,4'-dithiobis benzoic acid, Technical Grade) was heated to 180 ° C. to dissolve and mix them under nitrogen. Next, the temperature was raised to 220 ° C. and the pressure was reduced to an absolute pressure of 26.6 kPa. The obtained melt mixture was melt-polymerized for 8 hours by gradually changing the temperature and pressure so as to have an absolute pressure of 133 Pa at 320 ° C. After completion of the reaction, 200 g of NMP was added, the mixture was heated and stirred at 220 ° C., and the obtained lysate was filtered. 320 g of NMP was added to the lysate after filtration, and cake washing and filtration were performed. 1 L of ion-exchanged water was added to the obtained cake containing NMP, and the mixture was stirred in an autoclave at 200 ° C. for 10 minutes. Next, the cake was filtered, and 1 L of ion-exchanged water at 70 ° C. was added to the filtered cake to wash the cake. 1 L of ion-exchanged water was added to the obtained hydrous cake, and the mixture was stirred for 10 minutes. Next, the cake was filtered, and 1 L of ion-exchanged water at 70 ° C. was added to the filtered cake to wash the cake. After repeating this operation once more, the cake was dried at 120 ° C. for 4 hours to obtain 91 g of PPS resin (PPS-1).
(合成例2:PPS−2の合成)
「4,4’−ジチオビス安息香酸」の替りに「2−ヨードアニリン(東京化成株式会社製)」を用いたこと以外は合成例1と同様にして、PPS樹脂(PPS−2)91gを得た。
(Synthesis Example 2: Synthesis of PPS-2)
91 g of PPS resin (PPS-2) was obtained in the same manner as in Synthesis Example 1 except that "2-iodoaniline (manufactured by Tokyo Kasei Co., Ltd.)" was used instead of "4,4'-dithiobis benzoic acid". rice field.
(合成例3:PPS−3の合成)
「4,4’−ジチオビス安息香酸」の替りに「ジフェニルジスルフィド(住友精化株式会社、DPDS)」を用いたこと以外は合成例1と同様にしてPPS樹脂(PPS−3)91gを得た。
(Synthesis Example 3: Synthesis of PPS-3)
91 g of PPS resin (PPS-3) was obtained in the same manner as in Synthesis Example 1 except that "diphenyl disulfide (Sumitomo Seika Chemical Co., Ltd., DPDS)" was used instead of "4,4'-dithiobisbenzoic acid". ..
(合成例4:PPS−4の合成)
2LのオートクレーブにN−メチルピロリドン600gと硫化ナトリウム5水塩336.3g(2.0mol)とを仕込み、窒素雰囲気下、200℃まで昇温することにより水−NMP混合物を留去した。次いでこの系に、p−ジクロルベンゼン292.53g(1.99mol)と2,5−ジクロルアニリン1.62g(0.01mol)とをNMP230gに溶かした溶液を添加し、220℃で5時間、さらに240℃で2時間、窒素雰囲気下で反応させた。反応容器から冷却後内容物を取り出し、一部をサンプリングし、未反応2,5−ジクロロアニリンをガスクロマトグラフで定量した。また残りのスラリは熱水で数回洗浄し、ポリマーケーキを濾別した。このケーキを80℃減圧乾燥し、粉末のアミノ基含有ポリフェニレンスルフィド(PPS−4)を得た。
(Synthesis Example 4: Synthesis of PPS-4)
600 g of N-methylpyrrolidone and 336.3 g (2.0 mol) of sodium sulfide pentahydrate were charged in a 2 L autoclave, and the temperature was raised to 200 ° C. in a nitrogen atmosphere to distill off the water-NMP mixture. Next, a solution of 292.53 g (1.99 mol) of p-dichlorobenzene and 1.62 g (0.01 mol) of 2,5-dichloroaniline dissolved in 230 g of NMP was added to this system, and the mixture was added at 220 ° C. for 5 hours. The reaction was further carried out at 240 ° C. for 2 hours in a nitrogen atmosphere. After cooling, the contents were taken out from the reaction vessel, a part was sampled, and unreacted 2,5-dichloroaniline was quantified by gas chromatography. The remaining slurry was washed with hot water several times and the polymer cake was filtered off. The cake was dried under reduced pressure at 80 ° C. to obtain a powdered amino group-containing polyphenylene sulfide (PPS-4).
合成例1〜4で得られたPPS−1〜PPS−4の性状を表1に示す。 Table 1 shows the properties of PPS-1 to PPS-4 obtained in Synthesis Examples 1 to 4.
[原料]
PPS樹脂組成物を調製するため、以下の材料を準備した。
(熱可塑性樹脂)
PA6T:テレフタル酸65モル%、イソフタル酸25モル%、アジピン酸10モル%を必須の単量体成分として反応させて得られた芳香族ポリアミド(融点310℃、Tg120℃)
PA9T:ノナンジアミンとテレフタル酸とを反応させて得られたポリアミド(株式会社クラレ製、「ジェネスタ N1000A」)
PA46:ポリアミド46(ディーエスエム ジャパン エンジニアリング プラスチックス株式会社製、「スタニール TS300」)
(無機質充填剤)
GF:ガラス繊維チョップドストランド(繊維径10μm、長さ3mm)
[material]
The following materials were prepared to prepare the PPS resin composition.
(Thermoplastic resin)
PA6T: Aromatic polyamide obtained by reacting 65 mol% of terephthalic acid, 25 mol% of isophthalic acid, and 10 mol% of adipic acid as essential monomer components (melting point 310 ° C., Tg 120 ° C.).
PA9T: Polyamide obtained by reacting nonanediamine with terephthalic acid (manufactured by Kuraray Co., Ltd., "Genesta N1000A")
PA46: Polyamide 46 (manufactured by DSM Japan Engineering Plastics Co., Ltd., "Stanil TS300")
(Inorganic filler)
GF: Glass fiber chopped strand (fiber diameter 10 μm, length 3 mm)
[コンパウンドの作製と評価]
表1に示す配合組成で各原料をタンブラーによって均一に混合した後、2軸混練押出機(TEM−35B、東芝機械)を用いて300℃で溶融混練して、ペレット状のコンパウンドを得た。得られたコンパウンドをシリンダー温度300℃、金型温度140℃の条件で射出成形し、曲げ特性、金属密着強さ、キャビティーバランス及び耐熱水性試験に用いる試験片を作製し、各種評価を行った。また、PPS樹脂単体及びコンパウンドについて、ガス発生量を測定した。評価結果を表2に示す。
[Preparation and evaluation of compound]
Each raw material was uniformly mixed by a tumbler with the compounding composition shown in Table 1, and then melt-kneaded at 300 ° C. using a twin-screw kneading extruder (TEM-35B, Toshiba Machine Co., Ltd.) to obtain a pellet-shaped compound. The obtained compound was injection-molded under the conditions of a cylinder temperature of 300 ° C. and a mold temperature of 140 ° C. to prepare test pieces used for bending characteristics, metal adhesion strength, cavity balance and heat resistance and water resistance test, and various evaluations were performed. .. In addition, the amount of gas generated was measured for the PPS resin alone and the compound. The evaluation results are shown in Table 2.
Claims (6)
無機質充填剤、前記ポリアリーレンスルフィド樹脂以外の熱可塑性樹脂、エラストマー、及び2以上の架橋性官能基を有する架橋性樹脂からなる群より選ばれる、少なくとも1種の他の成分と、
を含有する、表面実装電子部品用ポリアリーレンスルフィド樹脂組成物であって、
前記ポリアリーレンスルフィド樹脂が、ジヨード芳香族化合物と、単体硫黄と、重合禁止剤とを、前記ジヨード芳香族化合物、前記単体硫黄及び前記重合禁止剤を含む溶融混合物中で反応させることを含む方法により得ることのできるものである、表面実装電子部品用ポリアリーレンスルフィド樹脂組成物。 Polyarylene sulfide resin and
With at least one other component selected from the group consisting of an inorganic filler, a thermoplastic resin other than the polyarylene sulfide resin, an elastomer, and a crosslinkable resin having two or more crosslinkable functional groups.
A polyarylene sulfide resin composition for surface mount electronic components containing
By a method in which the polyarylene sulfide resin comprises reacting a diiode aromatic compound, elemental sulfur, and a polymerization inhibitor in a melt mixture containing the diiode aromatic compound, the elemental sulfur, and the polymerization inhibitor. A polyaromatic sulfide resin composition for surface-mounted electronic parts, which can be obtained.
前記Mw及びMtopはそれぞれゲル浸透クロマトグラフィーにより測定される重量平均分子量及びピーク分子量である、請求項1又は2に記載の表面実装電子部品用ポリアリーレンスルフィド樹脂組成物。 The polyarylene sulfide resin has a Mw / Mtop of 0.80 to 1.70.
The polyarylene sulfide resin composition for surface mount electronic components according to claim 1 or 2, wherein Mw and Mtop are weight average molecular weights and peak molecular weights measured by gel permeation chromatography, respectively.
前記Mw及びMtopはそれぞれゲル浸透クロマトグラフィーにより測定される重量平均分子量及びピーク分子量である、請求項1〜3のいずれか一項に記載の表面実装電子部品用ポリアリーレンスルフィド樹脂組成物。 The polyarylene sulfide resin has a non-Nutonian index of 0.95 to 1.75 at 300 ° C. and a Mw / Mtop of 0.80 to 1.70.
The polyarylene sulfide resin composition for surface mount electronic components according to any one of claims 1 to 3, wherein Mw and Mtop are weight average molecular weights and peak molecular weights measured by gel permeation chromatography, respectively.
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US20190031879A1 (en) * | 2016-03-24 | 2019-01-31 | Ticona Llc | Polyarylene Sulfide Composition with Improved Adhesion to Metal Components |
CN110225821B (en) * | 2017-01-27 | 2021-06-25 | Dic株式会社 | Metal/resin composite structure and method for producing same |
KR101887654B1 (en) * | 2017-04-28 | 2018-08-10 | 한국화학연구원 | Preparation method of polyphenylene sulfide copolymer and copolymer prepared using the same |
CN111655795A (en) * | 2018-01-31 | 2020-09-11 | 住友化学株式会社 | Resin composition |
EP3778219A4 (en) * | 2018-04-10 | 2021-12-29 | DIC Corporation | Composite structure and manufacturing method therefor |
JP7156872B2 (en) * | 2018-09-07 | 2022-10-19 | 帝人株式会社 | resin composition |
TW202035569A (en) * | 2019-02-19 | 2020-10-01 | 日商Dic股份有限公司 | Film and layered body |
KR20210100814A (en) * | 2020-02-07 | 2021-08-18 | 에스케이케미칼 주식회사 | Polymerization inhibitor for a polyarylene sulfide resin |
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CN110283457A (en) | 2019-09-27 |
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CN105579529A (en) | 2016-05-11 |
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