JP2021010876A - Automatic cleaning device, biofiltration treatment apparatus, and automatic cleaning method of biofiltration treatment apparatus - Google Patents

Automatic cleaning device, biofiltration treatment apparatus, and automatic cleaning method of biofiltration treatment apparatus Download PDF

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JP2021010876A
JP2021010876A JP2019126431A JP2019126431A JP2021010876A JP 2021010876 A JP2021010876 A JP 2021010876A JP 2019126431 A JP2019126431 A JP 2019126431A JP 2019126431 A JP2019126431 A JP 2019126431A JP 2021010876 A JP2021010876 A JP 2021010876A
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automatic cleaning
gas
gas reservoir
sewage
treatment tank
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JP7328034B2 (en
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銑一 宝藏
Senichi Takarakura
銑一 宝藏
淳三 加藤
Junzo Kato
淳三 加藤
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BEST PLANT Ltd CO
Okamura
Okamura Corp
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BEST PLANT Ltd CO
Okamura
Okamura Corp
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00Technologies for wastewater treatment
    • Y02W10/10Biological treatment of water, waste water, or sewage

Abstract

To provide an automatic cleaning device capable of effectively cleaning a filter medium and a treatment tank bottom part in a short time.SOLUTION: Provided is an automatic cleaning device 5 of a biofiltration treatment apparatus 1 comprising: a treatment tank 2 for storing waste water WM; and a filter layer 4 including a plurality of filter media 3 floating in the waste water. The automatic cleaning device comprises: a cylindrical closed-top gas reservoir 51 erected at a bottom part in the treatment tank 2; a cylindrical bottomed water sealing container 52 erected inside the gas reservoir 51; a drain pipe 53 of which at least one portion is disposed in the water sealing container 52; a trigger pipe 55 of which at least one portion is disposed in the water sealing container 52; and a gas supply pipe 54 which is disposed outside the treatment tank 2, and supplies gas into the gas reservoir 51. In the automatic cleaning device, a lower end of the drain pipe 53 is disposed at the bottom part of the water sealing container 52, and penetrates a top plate of the gas reservoir 51 by extending upward from the lower end, whereas an upper end is disposed outside the treatment tank 2, and a lower end of a trigger pipe 55 is connected to an aperture formed in a peripheral wall in the vicinity of the lower end of the drain pipe 53, and the upper end is open in the vicinity of the top plate.SELECTED DRAWING: Figure 1

Description

本発明は、自動洗浄装置、生物濾過処理装置及び生物濾過処理装置の自動洗浄方法に関する。 The present invention relates to an automatic cleaning device, a biological filtration processing device, and an automatic cleaning method for the biological filtration processing device.

浄化槽での汚水処理法としては、汚水を濾過材に通過させることで、汚水中の固形物を分離すると共に、嫌気性微生物で有機物を分離及び浄化する嫌気性処理をして、BOD(Biochemical Oxygen Demand:生物化学的酸素要求量)が0〜50%、固形物及び油分を80〜90%除去した一次処理水とし、この一次処理水に空気を供給して曝気処理により所定の水質基準まで処理した二次処理水を水路に放流する方法が知られている。 As a sewage treatment method in a septic tank, BOD (Biochemical Oxygen) is performed by passing sewage through a filter material to separate solids in the sewage and anaerobic treatment to separate and purify organic substances with anaerobic microorganisms. Demand: Biochemical oxygen demand) is 0 to 50%, solids and oils are removed by 80 to 90% as primary treated water, and air is supplied to this primary treated water and treated to the specified water quality standard by aeration treatment. A method of discharging the secondary treated water to the water channel is known.

放流可能な処理水の水質に関しては、各国や自治体が法律の定めに従って、BOD、油分、固形物等の基準が一般的に定められている。これらと共に、近年では東南アジア等の国々において、アンモニア性窒素の除去が厳しく定められている。 Regarding the quality of treated water that can be discharged, the standards for BOD, oil, solids, etc. are generally set by each country and local government in accordance with the provisions of the law. Along with these, in recent years, the removal of ammoniacal nitrogen has been strictly regulated in countries such as Southeast Asia.

アンモニア性窒素の除去を効率的に行う方法として、浮上性濾過に担持させた微生物で上記一次処理水を処理する生物濾過処理法が知られている。この生物濾過処理法においては、上記濾過材で硝化菌、雑菌等が繁殖し、さらに上記濾過材に上記一次処理水の汚泥等が付着して濾過抵抗が過大になり、汚水の処理効率が低下する。また、処理槽に流入する汚水に含まれる汚泥等が処理槽底部に沈殿することも、汚水の処理効率を低下させる一因となる。このため、上記濾過材及び処理槽底部の定期的な洗浄が求められる。 As a method for efficiently removing ammoniacal nitrogen, a biological filtration treatment method is known in which the primary treated water is treated with a microorganism carried on a floating filtration. In this biological filtration treatment method, nitrifying bacteria, miscellaneous bacteria, etc. propagate in the filter material, and sludge, etc. of the primary treated water adheres to the filter material, resulting in excessive filtration resistance and reduced sewage treatment efficiency. To do. In addition, sludge and the like contained in the sewage flowing into the treatment tank settles on the bottom of the treatment tank, which also contributes to a decrease in the treatment efficiency of the sewage. Therefore, regular cleaning of the filter medium and the bottom of the treatment tank is required.

本発明者は、水位を低下させることにより濾過材を撹拌し、濾過材表面の余剰付着物を除去すると共に、処理槽底部の汚泥を排出する自動洗浄装置を発案した(特開2010−184210号公報)。この洗浄装置によれば、球状濾過材の表面に付着した雑菌や汚泥等の余剰付着物を効果的に除去することができるが、近年、担持する微生物をより多くするために濾過材の形状を複雑化して表面積を増大させる傾向があり、このような複雑な形状を有する濾過材を効率的に洗浄する方法が求められている。また、汚水処理効率を向上するため、上記濾過材及び処理槽底部の洗浄に要する時間をより短縮することが求められている。 The present inventor has devised an automatic cleaning device that agitates the filter medium by lowering the water level to remove excess deposits on the surface of the filter medium and discharges sludge from the bottom of the treatment tank (Japanese Patent Laid-Open No. 2010-184210). Gazette). According to this cleaning device, excess deposits such as germs and sludge adhering to the surface of the spherical filter medium can be effectively removed, but in recent years, the shape of the filter medium has been changed in order to carry more microorganisms. It tends to be complicated and the surface area is increased, and there is a demand for a method for efficiently cleaning a filter medium having such a complicated shape. Further, in order to improve the sewage treatment efficiency, it is required to further shorten the time required for cleaning the filter medium and the bottom of the treatment tank.

特開2010−184210号公報JP-A-2010-184210

上述のような事情に鑑みて、本発明は、短時間で濾過材及び処理槽底部を効果的に洗浄できる自動洗浄装置及び自動洗浄方法と、汚水の処理効率に優れた生物濾過処理装置とを提供することを目的とする。 In view of the above circumstances, the present invention provides an automatic cleaning device and an automatic cleaning method capable of effectively cleaning the filter medium and the bottom of the treatment tank in a short time, and a biological filtration treatment device having excellent sewage treatment efficiency. The purpose is to provide.

上記課題を解決するためになされた本発明の一態様は、汚水を貯留する処理槽及び上記汚水中で浮上する複数の濾過材を有する濾過層を備える生物濾過処理装置の自動洗浄装置であって、上記処理槽内底部に立設される有天筒状の気体貯留器と、上記気体貯留器内に立設される有底筒状の水封器と、少なくとも一部が上記水封器内に配設される排水管と、少なくとも一部が上記水封器内に配設されるトリガー管と、上記処理槽の外部に配設され、上記気体貯留器内に気体を供給する気体供給機とを備え、上記排水管の下端が上記水封器の底部に配置され、この下端から上方に延伸して上記気体貯留器の天板を貫通すると共に、上端が上記処理槽外に配置され、上記トリガー管の下端が上記排水管の下端近傍の周壁に形成されている開口に接続され、上端が上記天板近傍で開口している自動洗浄装置である。 One aspect of the present invention made to solve the above problems is an automatic cleaning device for a biological filtration treatment device including a treatment tank for storing sewage and a filtration layer having a plurality of filtration media floating in the sewage. , A ceiling-shaped gas reservoir erected at the bottom of the treatment tank, a bottomed tubular water sealer erected in the gas reservoir, and at least a part of the inside of the water sealer. A drainage pipe arranged in the water sealer, a trigger pipe arranged at least partly in the water sealer, and a gas supply machine arranged outside the treatment tank to supply gas into the gas reservoir. The lower end of the drain pipe is arranged at the bottom of the water sealer, extends upward from the lower end to penetrate the top plate of the gas reservoir, and the upper end is arranged outside the treatment tank. This is an automatic cleaning device in which the lower end of the trigger pipe is connected to an opening formed in the peripheral wall near the lower end of the drain pipe, and the upper end is opened near the top plate.

本発明の自動洗浄装置及び自動洗浄方法は、短時間で濾過材及び処理槽底部を効果的に洗浄できる。また、本発明の生物濾過処理装置は、上記自動洗浄装置による自動洗浄方法によって、短時間で効果的な濾過材及び処理槽底部の洗浄が行われるため、汚水の処理効率に優れる。 The automatic cleaning device and the automatic cleaning method of the present invention can effectively clean the filter medium and the bottom of the treatment tank in a short time. In addition, the biological filtration treatment device of the present invention is excellent in sewage treatment efficiency because effective cleaning of the filter medium and the bottom of the treatment tank is performed in a short time by the automatic cleaning method by the automatic cleaning device.

本発明の一実施形態である生物濾過処理装置の概念的断面図である。It is a conceptual sectional view of the biological filtration processing apparatus which is one Embodiment of this invention. 図1の生物濾過処理装置が有する自動洗浄装置による自動洗浄の工程の一つの様子を示す概念的断面図である。It is a conceptual cross-sectional view which shows one state of the process of the automatic cleaning by the automatic cleaning apparatus which the biological filtration processing apparatus of FIG. 1 has. 図2と異なる自動洗浄の工程の様子を示す概念的断面図である。It is a conceptual cross-sectional view which shows the state of the automatic cleaning process different from FIG. 図2,3と異なる自動洗浄の工程の様子を示す概念的断面図である。It is a conceptual cross-sectional view which shows the state of the automatic cleaning process different from FIGS. 2 and 3. 図2,3,4と異なる自動洗浄の工程の様子を示す概念的断面図である。It is a conceptual cross-sectional view which shows the state of the automatic cleaning process different from FIGS. 2, 3 and 4. 図1の生物濾過処理装置に用いられる濾過材の模式的斜視図である。It is a schematic perspective view of the filter material used for the biological filtration processing apparatus of FIG. 図6と異なる濾過材の模式的斜視図である。It is a schematic perspective view of the filter material different from FIG. 図6,7と異なる濾過材の模式的斜視図である。It is a schematic perspective view of the filter material different from FIGS. 6 and 7. 図1の生物濾過処理装置が有する自動洗浄装置に含まれるトリガー管の概念的斜視図である。It is a conceptual perspective view of the trigger tube included in the automatic cleaning apparatus included in the biological filtration processing apparatus of FIG. 図9と異なるトリガー管の概念的斜視図である。It is a conceptual perspective view of the trigger tube different from FIG.

[生物濾過処理装置]
本発明の一態様である生物濾過処理装置は浄化槽に含まれ、嫌気性処理等によって一次処理された汚水(一次処理水)を生物濾過方法によって二次処理する装置である。図1が示すように、生物濾過処理装置1は、汚水Wを貯留する処理槽2と、汚水W中で浮上する複数の濾過材3を有する濾過層4と、自動洗浄装置5とを主に有する。
[Biofiltration device]
The biological filtration treatment device according to one aspect of the present invention is a device included in a septic tank and secondaryly treating sewage (primary treated water) that has been primarily treated by anaerobic treatment or the like by a biological filtration method. As shown in FIG. 1, the biological filtration device 1 comprises a processing tank 2 for storing the sewage W M, and the filtration layer 4 having a plurality of filtering material 3 which floated in the sewage W M, and an automatic cleaning device 5 Mainly has.

<処理槽>
処理槽2は、後述する濾過層4及び自動洗浄装置5を内部に有する。処理槽2は、流入する汚水W(一次処理水)を貯留すると共に、この汚水Wを濾過処理して処理水W(二次処理水)とし、この処理水Wを排出する。具体的には、処理槽2は、濾過層4より下で汚水Wが流入する汚水流入口21と、濾過層4より上で処理水Wを排出する処理水排出口22を有する。汚水流入口21より流入する汚水Wは、濾過層4で濾過処理され、処理水Wとして処理水排出口22から排出される。
<Processing tank>
The treatment tank 2 has a filtration layer 4 and an automatic cleaning device 5 described later inside. Treatment vessel 2, together with storing the sewage W M (primary treatment water) flowing, and the sewage W M filtration to treated water W C (secondary treated water) is discharged the treated water W C. Specifically, the processing tank 2 includes a sewage inlet 21 the sewage W M flows, the treated water outlet 22 for discharging the treated water W C above the filtration layer 4 below the filtration layer 4. Sewage W M flowing from the sewage inlet 21 is filtered treated by filtration layer 4 is discharged from treated water outlet 22 as treated water W C.

<濾過層>
濾過層4は、汚水Wを濾過処理して処理水Wとする。換言すると、汚水流入口21より流入する汚水Wは、処理水排出口22から送出されるまでに濾過層4を通過することで処理水Wに浄化される。具体的には、濾過層4は、汚水W中で浮上する複数の濾過材3で形成され、濾過材3が担持する微生物によって汚水Wを浄化して処理水Wとする。
<Filtration layer>
Filtration layer 4, a sewage W M filtration to the treated water W C. In other words, sewage W M flowing from the sewage inlet 21 is purified in the treated water W C by passing through the filtering layer 4 before being transmitted from the treated water outlet 22. Specifically, the filtration layer 4 is formed of a plurality of filtering material 3 which floated in the sewage W M, filtration material 3 and sewage W M purification to the treated water W C by microorganisms bearing.

濾過層4は、濾過材3の分散を防止するため、層の上面に上面スクリーン41、及び層の下面に下面スクリーン42を有するのが好ましい。上面スクリーン41及び下面スクリーン42は、汚水W及び処理水Wが通過可能で、濾過材3が通過不可能な複数の孔を有する。上面スクリーン41及び下面スクリーン42は、処理槽2の所定の位置に固定される。このようにすることで、濾過材3が処理槽2の所定の領域を超えて分散することが抑制される。 The filtration layer 4 preferably has an upper surface screen 41 on the upper surface of the layer and a lower surface screen 42 on the lower surface of the layer in order to prevent dispersion of the filter medium 3. Top screen 41 and the lower surface screen 42, sewage W M and process water W C can pass a, having a plurality of holes can not pass through the filtering material 3. The upper surface screen 41 and the lower surface screen 42 are fixed at predetermined positions in the processing tank 2. By doing so, it is possible to prevent the filter medium 3 from being dispersed beyond a predetermined region of the treatment tank 2.

(濾過材)
複数の濾過材3は、汚水W中で浮上して濾過層4を形成する。濾過材3は、汚水Wを浄化する微生物を担持する。濾過材3の形状としては、特に限定されるものではなく、球状、柱状等とすることができるが、筒状であることが好ましい。この筒状の横断面形状としては、特に限定されるものではなく、矩形、多角形、楕円形等とすることができるが、円形であることが好ましい。濾過材3の形状を円筒状とすることで、濾過材3内部及び隣接する濾過材3同士の間に形成される隙間を汚水Wが通過することができるため、濾過抵抗を比較的小さくすることができる。
(Filter material)
A plurality of filtering material 3 forms a filtration layer 4 emerged in sewage W M. Filtering material 3 carries a microorganism for purifying sewage W M. The shape of the filter material 3 is not particularly limited, and may be spherical, columnar, or the like, but is preferably tubular. The tubular cross-sectional shape is not particularly limited and may be rectangular, polygonal, elliptical or the like, but is preferably circular. By the shape of the filter member 3 and cylindrical, it is possible the gap formed between the filtering material 3 between which the filtration media 3 inside and adjacent sewage W M passes, a relatively small filtration resistance be able to.

円筒状の濾過材3の外径の上限としては、20mmが好ましく、18mmがより好ましく、15mmがさらに好ましい。円筒状の濾過材3の外径の下限としては、特に限定されるものではないが、例えば5mmとすることができる。濾過材3の外径が上記上限を超えると、濾過層4を形成する濾過材3の数が低減され、効率的な濾過処理ができなくなるおそれがある。濾過材3の外径が上記下限に満たないと、濾過材3の取り扱いが困難になるおそれがある。なお、「濾過材3の外径」とは、円筒状の濾過材3の横断面で、上記円形の外周面の直径のことである。 The upper limit of the outer diameter of the cylindrical filter medium 3 is preferably 20 mm, more preferably 18 mm, and even more preferably 15 mm. The lower limit of the outer diameter of the cylindrical filter medium 3 is not particularly limited, but may be, for example, 5 mm. If the outer diameter of the filter medium 3 exceeds the above upper limit, the number of the filter media 3 forming the filter layer 4 is reduced, and efficient filtration treatment may not be possible. If the outer diameter of the filter material 3 does not meet the above lower limit, it may be difficult to handle the filter material 3. The "outer diameter of the filter medium 3" is a cross section of the cylindrical filter medium 3 and is the diameter of the outer peripheral surface of the circle.

円筒状の濾過材3の長さの上限としては、18mmが好ましく、15mmがより好ましく、10mmがさらに好ましい。円筒状の濾過材3の長さの下限としては、特に限定されるものではないが、例えば5mmとすることができる。濾過材3の長さが上記上限を超えると、濾過層4を形成する濾過材3の数が低減され、効率的な濾過処理ができなくなるおそれがある。濾過材3の長さが上記下限に満たないと、濾過材3の取り扱いが困難になるおそれがある。なお、「濾過材3の長さ」とは、上記外径の中心軸方向の長さのことである。 The upper limit of the length of the cylindrical filter medium 3 is preferably 18 mm, more preferably 15 mm, still more preferably 10 mm. The lower limit of the length of the cylindrical filter medium 3 is not particularly limited, but may be, for example, 5 mm. If the length of the filter medium 3 exceeds the above upper limit, the number of the filter media 3 forming the filter layer 4 is reduced, and efficient filtration treatment may not be possible. If the length of the filter material 3 does not reach the above lower limit, it may be difficult to handle the filter material 3. The "length of the filter medium 3" is the length of the outer diameter in the central axis direction.

円筒状の濾過材3は、内周面に少なくとも一つの壁板31が配設されることが好ましい。このようにすることで、濾過材3の表面積を増大することができ、より多くの微生物を担持することができる。壁板31の形状としては、特に限定されるものではないが、濾過材3の径方向の中心軸を含んで配設されていることが好ましい。具体的には、図6に示すように、壁板31の上記径方向の端部がいずれも濾過材3の内周面に接続され、この接続される2つの上記端部が上記中心軸で対称に位置することが好ましい。このように壁板31が配設されることで、壁板31の表面積を大きくすることができる。壁板31の他の形状としては、図7に示すように、両端が接続される2つの内周面が径方向の中心に対称に位置しない壁板32、図8に示すように、一端が濾過材3の内周面に接続されて他端が内周面に接続されない壁板33等とすることができる。壁板31,32,33の長さとしては、濾過材3の長さと同一としてもよいし、濾過材3の長さ以下としてもよい。 It is preferable that at least one wall plate 31 is arranged on the inner peripheral surface of the cylindrical filter medium 3. By doing so, the surface area of the filter medium 3 can be increased, and more microorganisms can be supported. The shape of the wall plate 31 is not particularly limited, but it is preferable that the wall plate 31 is arranged including the radial central axis of the filter medium 3. Specifically, as shown in FIG. 6, the radial ends of the wall plate 31 are all connected to the inner peripheral surface of the filter medium 3, and the two connected ends are at the central axis. It is preferably located symmetrically. By arranging the wall plate 31 in this way, the surface area of the wall plate 31 can be increased. As other shapes of the wall plate 31, as shown in FIG. 7, two inner peripheral surfaces to which both ends are connected are not located symmetrically with respect to the center in the radial direction, and one end thereof is as shown in FIG. It can be a wall plate 33 or the like that is connected to the inner peripheral surface of the filter medium 3 and the other end is not connected to the inner peripheral surface. The lengths of the wall plates 31, 32, 33 may be the same as the length of the filter medium 3, or may be equal to or less than the length of the filter medium 3.

濾過材3は、汚泥等が付着することにより重くなるため、濾過材3の比重が0.98以上であると、浮上して濾過層4を形成できなくなるおそれがある。濾過材3の比重の上限としては、0.95が好ましく、0.92がより好ましく、0.90がさらに好ましい。濾過材3の比重の下限としては、0.3が好ましく、0.5がより好ましく、0.7がさらに好ましい。濾過材3の比重が上記上限を超えると、濾過材3が水中で浮上することが困難になり、濾過層4の形成が困難になるおそれがある。濾過材3の比重が上記下限に満たないと、濾過材3の浮上力が過度に大きくなり、濾過層4の形成が困難になるおそれがある。 Since the filter material 3 becomes heavy due to the adhesion of sludge and the like, if the specific gravity of the filter material 3 is 0.98 or more, it may float and the filter layer 4 cannot be formed. The upper limit of the specific gravity of the filter material 3 is preferably 0.95, more preferably 0.92, and even more preferably 0.90. The lower limit of the specific gravity of the filter material 3 is preferably 0.3, more preferably 0.5, and even more preferably 0.7. If the specific gravity of the filter material 3 exceeds the above upper limit, it becomes difficult for the filter material 3 to float in water, and it may become difficult to form the filter layer 4. If the specific gravity of the filter material 3 does not reach the above lower limit, the levitation force of the filter material 3 becomes excessively large, and the formation of the filter layer 4 may become difficult.

濾過材3の材質としては、特に限定されるものではないが、微生物の担持が容易で、比重を調整することが比較的容易な樹脂等とすることが好ましい。 The material of the filter material 3 is not particularly limited, but it is preferable to use a resin or the like which can easily carry microorganisms and can relatively easily adjust the specific gravity.

<自動洗浄装置>
自動洗浄装置5は、処理槽2内の底部に立設される有天筒状の気体貯留器51、気体貯留器51内に立設される有底筒状の水封器52、少なくとも一部が水封器52内に位置するように配設される排水管53、及び少なくとも一部が上記水封器52内に位置するように配設されるトリガー管55と、処理槽2の外部に配設される気体供給機(不図示)とを主に有する。自動洗浄装置5は、本発明の一態様である。図1において、自動洗浄装置5は、処理槽2の略中央に配設されている。
<Automatic cleaning device>
The automatic cleaning device 5 includes a ceiling-shaped gas reservoir 51 erected at the bottom of the treatment tank 2, a bottomed tubular water sealer 52 erected in the gas reservoir 51, and at least a part thereof. On the outside of the treatment tank 2, the drain pipe 53 is arranged so that the gas is located inside the water sealer 52, and the trigger pipe 55 is arranged so that at least a part of the gas is located inside the water sealer 52. It mainly has a gas feeder (not shown) to be arranged. The automatic cleaning device 5 is an aspect of the present invention. In FIG. 1, the automatic cleaning device 5 is arranged substantially in the center of the processing tank 2.

(気体貯留器)
気体貯留器51は、処理槽2底部に立設される。気体貯留器51は、横断面が円形状、多角形状等とされる筒状である。気体貯留器51は、有天筒状である。具体的には、気体貯留器51は、底部が開口し、上端を閉ざす天板を有する。気体貯留器51は、底部が処理槽2底部に近接するように配設される。気体貯留器51の底部側には、気体貯留器51と気体供給機とを連通する気体供給管54が配設される。気体貯留器51は、気体供給管54から供給される気体Aを貯留する。
(Gas reservoir)
The gas reservoir 51 is erected at the bottom of the treatment tank 2. The gas reservoir 51 has a tubular shape having a circular cross section, a polygonal shape, or the like. The gas reservoir 51 has a topped cylinder shape. Specifically, the gas reservoir 51 has a top plate whose bottom is open and whose upper end is closed. The gas reservoir 51 is arranged so that the bottom portion is close to the bottom portion of the treatment tank 2. On the bottom side of the gas reservoir 51, a gas supply pipe 54 for communicating the gas reservoir 51 and the gas supply machine is arranged. The gas reservoir 51 stores the gas A supplied from the gas supply pipe 54.

気体貯留器51の天板は、水平に配設されてもよいが、例えば気体貯留器51の横断面の中心に向けて仰角を有する等、傾斜して配設されるのが好ましい。このようにすることで、天板の最上部から気体Aの貯留が開始されるため、気体Aを安定して貯留することができる。 The top plate of the gas reservoir 51 may be arranged horizontally, but it is preferable that the top plate of the gas reservoir 51 is arranged at an inclination such as having an elevation angle toward the center of the cross section of the gas reservoir 51. By doing so, the storage of the gas A is started from the uppermost portion of the top plate, so that the gas A can be stably stored.

(水封器)
水封器52は、気体貯留器51内に立設される。水封器52は、有底筒状である。具体的には、水封器52は、底部が閉止しており、上端が開口している。水封器52は、横断面が円形状、多角形状等の筒状であり、底部下面(底部外面)が処理槽2の底部上面(底部内面)に接することが好ましい。
(Water sealer)
The water sealer 52 is erected in the gas reservoir 51. The water sealer 52 has a bottomed tubular shape. Specifically, the bottom of the water sealer 52 is closed and the upper end is open. The water sealer 52 preferably has a cylindrical shape having a circular cross section, a polygonal shape, or the like, and the lower surface of the bottom portion (outer surface of the bottom portion) is in contact with the upper surface of the bottom portion (inner surface of the bottom portion) of the treatment tank 2.

(排水管)
排水管53は、少なくともその一部が水封器52内に位置するように配設される。排水管53は、下端が水封器52の底部に配置され、この下端から上方に延伸して気体貯留器51の天板を貫通すると共に、上端が処理槽2外に配置される。すなわち、排水管53は、水封器52の底部近傍と処理槽2外とを連通する。排水管53は、横断面が円形状、多角形状等の管(筒状)である。排水管53は、処理槽2に貯留される汚水Wの一部を処理槽2の外に排出する。排水管53の下端近傍の周壁には、開口56が形成されている。
(Drainage pipe)
The drain pipe 53 is arranged so that at least a part thereof is located in the water sealer 52. The lower end of the drain pipe 53 is arranged at the bottom of the water sealer 52, extends upward from the lower end to penetrate the top plate of the gas reservoir 51, and the upper end is arranged outside the treatment tank 2. That is, the drain pipe 53 communicates the vicinity of the bottom of the water sealer 52 with the outside of the treatment tank 2. The drainage pipe 53 has a circular or polygonal cross section (cylindrical shape). Drain pipe 53 discharges a part of the sewage W M that is stored in the processing tank 2 to the outside of the treatment tank 2. An opening 56 is formed in the peripheral wall near the lower end of the drain pipe 53.

排水管53は、少なくともその一部が処理層2の水面より高い位置にあるように配置されることが好ましい。具体的には、排水管53の少なくとも一部が処理層2の処理水排出口22より高い位置にあるように配置されることが好ましい。排水管53の全体が処理水排出口22より低い位置にある場合、排水管53から汚水Wが流出して処理槽2の水位が低下し、処理水Wの排出が困難になるおそれがある。 It is preferable that the drain pipe 53 is arranged so that at least a part thereof is higher than the water surface of the treatment layer 2. Specifically, it is preferable that at least a part of the drain pipe 53 is arranged at a position higher than the treated water discharge port 22 of the treatment layer 2. If the entire drainage tube 53 is lower than the processing water outlet 22 position, from the drain pipe 53 the sewage W M flows out reduces the water level in the treatment tank 2, is a possibility that the discharge of treated water W C becomes difficult is there.

(トリガー管)
トリガー管55は、少なくともその一部が水封器52内に位置するように配設される。トリガー管55は、下端が排水管53の下端近傍の周壁に形成されている開口56に接続され、上端が気体貯留器51の天板近傍で開口している。すなわち、トリガー管55は、排水管53の下端近傍の内部と、気体貯留器51内の上方の領域とを連通する。
(Trigger tube)
The trigger pipe 55 is arranged so that at least a part thereof is located in the water sealer 52. The lower end of the trigger pipe 55 is connected to an opening 56 formed in the peripheral wall near the lower end of the drain pipe 53, and the upper end is opened near the top plate of the gas reservoir 51. That is, the trigger pipe 55 communicates with the inside near the lower end of the drain pipe 53 and the upper region in the gas reservoir 51.

トリガー管55の形状としては、排水管53の下端近傍の内部と気体貯留器51内の上方の領域とを連通するものであれば特に限定されるものではなく、例えば、図9が示すように、断面が円形状、多角形状等の筒状部材としてもよいし、図10が示すように、板状部材で、排水管53の開口56及び周壁の外面の一部を覆う側板と、開口56の下側に位置し、上記側板と排水管53の周壁との間隙を閉ざす底板とで形成されてもよい。 The shape of the trigger pipe 55 is not particularly limited as long as it communicates between the inside near the lower end of the drain pipe 53 and the upper region in the gas reservoir 51. For example, as shown in FIG. A tubular member having a circular or polygonal cross section may be used, or as shown in FIG. 10, a plate-shaped member, an opening 56 of the drain pipe 53, a side plate covering a part of the outer surface of the peripheral wall, and an opening 56. It may be formed by a bottom plate which is located on the lower side and closes a gap between the side plate and the peripheral wall of the drain pipe 53.

[自動洗浄方法]
本発明の一態様である生物濾過処理装置の自動洗浄方法は、気体供給機から供給される気体Aを気体貯留器51に貯留する工程と、貯留される気体Aの圧力で、少なくとも排出管53内及び水封器52内の汚水Wが排出管53の上端から流出する工程と、気体Aが、排水管53の下端近傍の周壁に形成されている開口56に到達すると共に、少なくとも排水管53に残存する汚水W及び気体Aが排出管53の上端から噴出する工程とを有し、上記噴出工程が、処理槽2の汚水W及び汚泥Mを、気体貯留器内51、水封器52内、及び排出管53内に導入する工程と、上記導入によって処理槽2の水位を急低下させ、この急低下による水位落差によって複数の濾過材3が水中で展開及び撹拌する工程と、上記展開及び撹拌によって、濾過材3に付着している余剰付着物を洗浄する工程とを含む。
[Automatic cleaning method]
The automatic cleaning method of the biofiltration treatment apparatus according to one aspect of the present invention includes at least the discharge pipe 53 in the step of storing the gas A supplied from the gas supply machine in the gas reservoir 51 and the pressure of the stored gas A. a step of sewage W M of the inner and water sealing vessel 52 flows out from the upper end of the discharge pipe 53, the gas a reaches the opening 56 formed in the peripheral wall near the lower end of the drain pipe 53, at least drainpipe sewage W M and the gas a remaining 53 and a step of ejecting from the upper end of the discharge pipe 53, the ejection process, the sewage W M and sludge M of the processing tank 2, the gas reservoir 51, a water seal A step of introducing into the vessel 52 and a discharge pipe 53, a step of rapidly lowering the water level of the treatment tank 2 by the above introduction, and a step of deploying and stirring a plurality of filtering materials 3 in water due to the water level drop due to the sudden drop. The step of cleaning the excess deposits adhering to the filter material 3 by the above-mentioned development and stirring is included.

この自動洗浄方法は、定期的に行われることが好ましい。自動洗浄の間隔としては、特に限定されるものではなく、24時間、2日間、1週間に一度等とすることができる。この自動洗浄方法は、上記各工程の全てを1サイクルとして、一度の自動洗浄で1サイクルが行われてもよく、2サイクル以上が行われてもよい。 This automatic cleaning method is preferably performed on a regular basis. The interval of automatic cleaning is not particularly limited, and may be 24 hours, 2 days, once a week, or the like. In this automatic cleaning method, all of the above steps are regarded as one cycle, and one cycle may be performed by one automatic cleaning, or two or more cycles may be performed.

この自動洗浄方法は、処理槽2への汚水Wの供給を継続しながら行うことができるが、処理槽2への汚水Wの供給を停止して行うことが好ましい。すなわち、濾過処理をしつつ当該自動洗浄方法が行われてもよいが、濾過処理を停止して当該自動洗浄方法が行われるのが好ましい。処理槽2への汚水Wの供給を停止して行うことで、後述する濾過材撹拌工程における水位低下を大きくすることができる。以下では、処理槽2への汚水Wの供給を停止して行う自動洗浄方法で説明する。 The automatic cleaning process may be carried out while continuing the supply of sewage W M into the processing vessel 2 is preferably performed by stopping the supply of sewage W M into the processing tank 2. That is, the automatic cleaning method may be performed while performing the filtration treatment, but it is preferable to stop the filtration process and perform the automatic cleaning method. The supply of sewage W M into the processing tank 2 by making stopped, it is possible to increase the water level drop in the filtration material agitation process described below. The following describes the automatic cleaning process performed by stopping the supply of sewage W M into the processing tank 2.

<気体貯留工程>
自動洗浄がされない時、すなわち濾過処理が行われている時は、処理槽2には汚水Wが汚水流入口21から供給される。この供給される汚水Wは、濾過層4で濾過処理されて処理水Wとして処理水排出口22から排出される。任意に定めた自動洗浄の時期になると、処理槽2の外部に配設される気体供給機から気体Aが気体供給管54を通じて気体貯留器51内に供給される。この気体Aの供給は、処理槽2への汚水Wの供給を停止してから開始してもよいし、気体Aの供給を開始してから所定の時間が経過した後に、処理槽2への汚水Wの供給を停止してもよい。
<Gas storage process>
When the automatic cleaning is not, i.e. when the filtering process is performed, the processing tank 2 sewage W M is supplied from the sewage inlet 21. This the supplied sewage W M is discharged from the treated water outlet 22 is filtration filtration layer 4 as treated water W C. At an arbitrarily determined automatic cleaning time, the gas A is supplied into the gas reservoir 51 from the gas supply machine arranged outside the treatment tank 2 through the gas supply pipe 54. This supply of gas A is, to the supply of sewage W M into the processing vessel 2 may be started from the stop, after a lapse of a predetermined time from the start of the supply of gas A, to the treatment tank 2 of the supply of sewage W M may be stopped.

<汚水流出工程>
図2に示すように、気体Aは、その体積を気体貯留器51の天板から処理槽2の底部に向けて増加し、気体貯留器51内の水位を低下させる。気体貯留器51内の水位低下により、水封器52内及び排出管53内に貯留されていた汚水Wと、水封器52底部で沈殿する汚泥Mとが処理槽2外に配置される排出管53の上端から流出する。
<Sewage outflow process>
As shown in FIG. 2, the volume of the gas A increases from the top plate of the gas reservoir 51 toward the bottom of the treatment tank 2 and lowers the water level in the gas reservoir 51. The drawdown in the gas reservoir 51, and sewage W M, which had been reserved in the water seal 52 and within the discharge pipe 53, and the sludge M to be precipitated in water seal 52 bottom is arranged outside the processing tank 2 It flows out from the upper end of the discharge pipe 53.

<汚水噴出工程>
図3に示すように、気体Aは、処理槽2内の汚水W及び処理水Wの水圧を受けつつ、さらにその体積を増加する。気体Aが排水管53の下端近傍に形成されている開口56に到達すると、気体貯留器51内の気体Aの全部が瞬間的に排水管53内に流入し、排水管53の上端から放出される。気体Aは、排水管53から放出されると同時に、排水管53に残存する汚水Wを排水管53の上端から噴出させる。また、水封器52の底部に残存する少なくとも一部の汚水W及び汚泥Mが吸引されて、排水管53の上端から噴出される。
<Sewage ejection process>
As shown in FIG. 3, the gas A, while receiving a pressure of sewage W M and process water W C in the processing tank 2, further increasing its volume. When the gas A reaches the opening 56 formed near the lower end of the drain pipe 53, all of the gas A in the gas reservoir 51 momentarily flows into the drain pipe 53 and is discharged from the upper end of the drain pipe 53. To. Gas A, at the same time is released from the drain pipe 53, jetting sewage W M remaining in the drain pipe 53 from the upper end of the drain pipe 53. At least a part of the sewage W M and sludge M remaining in the bottom of the water seal 52 is sucked and ejected from the upper end of the drain pipe 53.

図4に示すように、この噴出工程は、処理槽2の汚水W及び汚泥Mを、気体貯留器51内等に導入する工程と、上記導入によって処理槽2の水位を急低下させ、この水位落差によって濾過材3が水中で展開及び撹拌する工程と、上記展開及び撹拌によって、濾過材3の余剰付着物を洗浄する工程とを含んでいる。 As shown in FIG. 4, the ejection process, the sewage W M and sludge M of the processing tank 2, a step of introducing the inner gas reservoir 51 or the like, to sharply lower the water level in the treatment tank 2 by the introduction, this It includes a step of developing and stirring the filter material 3 in water by the water level drop, and a step of cleaning excess deposits of the filter material 3 by the above-mentioned development and stirring.

(汚水導入工程)
気体Aの放出によって気体貯留器51内及び排出管53内が略真空の状態になり、処理槽2内に貯留されている気体貯留器51外の汚水Wが、気体貯留器51内、水封器52内、及び排出管53内に奔流となって導入される。この汚水Wの奔流と共に、処理槽2底部に沈殿されている汚泥Mの少なくとも一部が、水封器52底部に移動する。水封器52底部に移動された汚泥Mは、次回の自動洗浄で排出管53から排出される。
(Sewage introduction process)
The gas reservoir 51 and the discharge pipe 53 by the release of gas A is in the state of substantial vacuum, sewage W M outside the gas reservoir 51 which is stored in the processing tank 2, inside the gas reservoir 51, water It is introduced as a torrent in the sealer 52 and the discharge pipe 53. With torrent of sewage W M, at least a portion of the sludge M being precipitated in the processing tank 2 bottom, moves to the water seal 52 bottom. The sludge M moved to the bottom of the water sealer 52 is discharged from the discharge pipe 53 in the next automatic cleaning.

(濾過材撹拌工程)
放出される気体Aの体積と略同一の体積の汚水Wが上記奔流となって導入されるのと同時に、処理槽2の水位が急低下する。この急低下する水位落差による衝撃で、濾過層4を形成している複数の濾過材3が汚水W及び処理水W中で展開及び撹拌する。
(Filter material stirring process)
Sewage W M of volume and substantially the same volume of emitted gas A at the same time as that introduced a the torrent, the water level in the treatment tank 2 decreases sharply. This impact by sudden decrease water level drop, a plurality of filtering material 3 forming the filter layer 4 is deployed and stirred in sewage W M and process water W C.

(汚泥洗浄工程)
上記水位落差による衝撃で、水中で展開及び撹拌する濾過材3は、上記衝撃、濾過材3同士の接触等により、濾過材3表面の余剰付着物を剥離する等によって洗浄を行う。剥離された余剰付着物は沈降して、処理槽2底部に沈殿する汚泥Mの一部になる。なお、「余剰付着物」とは、汚水Wに含まれる汚泥、濾過材3表面で繁殖した硝化菌、雑菌等を意味する。
(Sludge cleaning process)
The filter medium 3 that develops and stirs in water due to the impact of the water level drop is cleaned by peeling off excess deposits on the surface of the filter medium 3 by the impact, contact between the filter media 3 and the like. The exfoliated excess deposits settle and become a part of the sludge M that settles at the bottom of the treatment tank 2. Note that the "excess deposit" means sludge contained in the sewage W M, nitrifying bacteria was propagated in the filtering material 3 surface, the bacteria and the like.

上記汚水噴出工程は、貯留される気体Aが排水管53の開口56に到達することを契機とする気体Aの瞬間的な放出によって、排出管53内の汚水Wの噴出、汚水Wの気体貯留器51等への奔流、処理槽2の水位の急低下及び濾過材3の展開及び撹拌を短時間で行うことができる。特に、濾過材3の洗浄を効果的に行うため、濾過材3は急速に展開及び撹拌されることが好ましい。濾過材3の展開及び撹拌の開始から終了まで、すなわち、濾過材3が、展開及び撹拌を開始してから、単位体積当たりの濾過材3の数(密度)が最も小さくなるまでの時間の上限としては、3秒が好ましく、2.5秒がより好ましい。上記時間が上記上限を超える場合、複雑な形状を有する濾過材に対して効果的な洗浄ができないおそれがある。 The sewage ejection step, the instantaneous release of gas A that triggered that gas A to be stored reaches the opening 56 of the drainage tube 53, ejection of sewage W M in the discharge pipe 53, sewage W M The torrent to the gas reservoir 51 and the like, the sudden drop in the water level of the treatment tank 2, the deployment of the filter medium 3 and the stirring can be performed in a short time. In particular, in order to effectively wash the filter material 3, it is preferable that the filter material 3 is rapidly developed and stirred. The upper limit of the time from the start to the end of the development and stirring of the filter material 3, that is, from the start of the development and stirring of the filter material 3 to the minimum number (density) of the filter material 3 per unit volume. 3 seconds is preferable, and 2.5 seconds is more preferable. If the above time exceeds the above upper limit, effective cleaning of the filter medium having a complicated shape may not be possible.

図5に示すように、水中で展開及び撹拌された濾過材3は処理槽2内を浮上し、再び濾過層4を形成する。処理槽2には、汚水Wの供給が再開される。 As shown in FIG. 5, the filter medium 3 developed and stirred in water floats in the treatment tank 2 and forms the filter layer 4 again. The treatment tank 2, the supply of sewage W M is resumed.

[利点]
自動洗浄装置5は、処理槽2内に配置される気体貯留器51、水封器52、排水管53及びトリガー管55と、処理槽2の外部に配設される気体供給機とを有する簡易な構成であるため、低コストで生産できると共に、処理槽2への配設が比較的容易である。
[advantage]
The automatic cleaning device 5 is a simple one having a gas reservoir 51, a water sealer 52, a drain pipe 53 and a trigger pipe 55 arranged in the processing tank 2 and a gas supply machine arranged outside the processing tank 2. Because of this configuration, it can be produced at low cost and can be relatively easily arranged in the processing tank 2.

自動洗浄装置5による自動洗浄方法は、処理槽2に沈殿する汚泥Mの排出及び濾過材3の余剰付着物の洗浄を短時間で終了することができるため、汚水Wの濾過処理の効率が低下することを抑制できる。当該自動洗浄は短時間で行うことができるため、洗浄効果をより高めるために2サイクル以上連続して行う場合であっても、濾過処理の効率が低下することを比較的抑制できる。また、水位の急低下による衝撃と、濾過材3の展開及び撹拌とにより余剰付着物が洗浄されるため、濾過材3の洗浄を効果的に行うことができ、濾過材3が複雑な形状を有する等の場合でも洗浄効果に比較的優れる。当該自動洗浄方法は、上記簡易な構成を有する自動洗浄装置5によって、2.5秒乃至3秒以内の急速な濾過材3の展開及び撹拌が可能であり、複雑な形状を有する濾過材にも効果的な洗浄力を発揮することができる。 Automatic cleaning method by the automatic cleaning device 5, it is possible to end the discharge and cleaning of the excess deposits of filtering material 3 of the sludge M to be precipitated in the processing tank 2 in a short time, the efficiency of filtration of sewage W M It is possible to suppress the decrease. Since the automatic cleaning can be performed in a short time, it is possible to relatively suppress a decrease in the efficiency of the filtration treatment even when the automatic cleaning is performed continuously for two or more cycles in order to further enhance the cleaning effect. Further, since the excess deposits are washed by the impact due to the sudden drop in the water level and the deployment and stirring of the filter material 3, the filter material 3 can be effectively washed, and the filter material 3 has a complicated shape. Even if it has, the cleaning effect is relatively excellent. In the automatic cleaning method, the automatic cleaning device 5 having the above-mentioned simple configuration enables rapid deployment and stirring of the filter material 3 within 2.5 seconds to 3 seconds, and even a filter material having a complicated shape can be used. It can exert effective cleaning power.

生物濾過処理装置1は、短時間で効果的な自動洗浄をすることができる低コストの自動洗浄装置5を備えるため、濾過処理の効率に優れると共に、低コストで生産できる。 Since the biological filtration processing device 1 includes a low-cost automatic cleaning device 5 capable of performing effective automatic cleaning in a short time, the efficiency of the filtration processing is excellent and the production can be performed at low cost.

[その他の実施形態]
上記開示された実施の形態は全ての点で例示であって制限的なものではないと考えられるべきである。本発明の範囲は、上記実施形態の構成に限定されるものではなく、特許請求の範囲によって示され、特許請求の範囲と均等の意味及び範囲内での全ての変更が含まれることが意図される。
[Other Embodiments]
It should be considered that the disclosed embodiments are exemplary in all respects and not restrictive. The scope of the present invention is not limited to the configuration of the above embodiment, but is indicated by the scope of claims, and is intended to include all modifications within the meaning and scope equivalent to the scope of claims. To.

上記実施の形態では、自動洗浄装置を処理槽底部の略中央に配置した例で説明したが、これに限定されるものでなく、処理槽の下部を拡幅して、この拡幅した領域に自動洗浄装置を配置してもよい。 In the above embodiment, the example in which the automatic cleaning device is arranged substantially in the center of the bottom of the processing tank has been described, but the present invention is not limited to this, and the lower part of the processing tank is widened and automatic cleaning is performed in this widened area. The device may be arranged.

本発明の自動洗浄装置及び生物濾過処理装置の自動洗浄方法は、上述のように、短時間で効率的な自動洗浄をすることができるので、生物濾過処理装置に好適に用いることができる。本発明の自動洗浄装置を備える生物濾過処理装置は、濾過処理の効率に優れるため、浄化槽に好適に用いることができる。 As described above, the automatic cleaning method for the automatic cleaning device and the biological filtration processing device of the present invention can perform efficient automatic cleaning in a short time, and thus can be suitably used for the biological filtration processing device. The biological filtration treatment device provided with the automatic cleaning device of the present invention can be suitably used for a septic tank because of its excellent filtration treatment efficiency.

1 生物濾過処理装置
2 処理槽
3 濾過材
4 濾過層
5 自動洗浄装置
21 汚水流入口
22 処理水排出口
31,32,33 板壁
41 上面スクリーン
42 下面スクリーン
51 気体貯留器
52 水封器
53 排水管
54 気体供給管
55 トリガー管
56 開口
M 汚泥
汚水
処理水
1 Biological filtration treatment device 2 Treatment tank 3 Filter material 4 Filter layer 5 Automatic cleaning device 21 Sewage inlet 22 Treated water discharge port 31, 32, 33 Board wall 41 Top screen 42 Bottom screen 51 Gas reservoir 52 Water sealer 53 Drain pipe 54 gas supply pipe 55 triggers pipe 56 opening M sludge W M sewage W C treated water

Claims (6)

汚水を貯留する処理槽及び上記汚水中で浮上する複数の濾過材を有する濾過層を備える生物濾過処理装置の自動洗浄装置であって、
上記処理槽内底部に立設される有天筒状の気体貯留器と、
上記気体貯留器内に立設される有底筒状の水封器と、
少なくとも一部が上記水封器内に配設される排水管と、
少なくとも一部が上記水封器内に配設されるトリガー管と、
上記処理槽の外部に配設され、上記気体貯留器内に気体を供給する気体供給機と
を備え、
上記排水管の下端が上記水封器の底部に配置され、この下端から上方に延伸して上記気体貯留器の天板を貫通すると共に、上端が上記処理槽外に配置され、
上記トリガー管の下端が上記排水管の下端近傍の周壁に形成されている開口に接続され、上端が上記天板近傍で開口している自動洗浄装置。
An automatic cleaning device for a biological filtration treatment device including a treatment tank for storing sewage and a filtration layer having a plurality of filter media floating in the sewage.
The topped cylinder-shaped gas reservoir installed at the bottom of the processing tank and
A bottomed tubular water sealer installed in the gas reservoir and
The drainage pipe, which is at least partly arranged in the water sealer,
A trigger tube, at least part of which is placed inside the water sealer,
It is provided with a gas supply machine that is arranged outside the treatment tank and supplies gas to the gas reservoir.
The lower end of the drainage pipe is arranged at the bottom of the water sealer, extends upward from the lower end to penetrate the top plate of the gas reservoir, and the upper end is arranged outside the treatment tank.
An automatic cleaning device in which the lower end of the trigger pipe is connected to an opening formed in the peripheral wall near the lower end of the drain pipe, and the upper end is opened near the top plate.
汚水を貯留する処理槽、上記汚水中で浮上する複数の濾過材を有する濾過層、及び自動洗浄装置を有し、
上記自動洗浄装置が、
上記処理槽内底部に立設される有天筒状の気体貯留器と、
上記気体貯留器内に立設される有底筒状の水封器と、
少なくとも一部が上記水封器内に配設される排水管と、
少なくとも一部が上記水封器内に配設されるトリガー管と、
上記処理槽の外部に配設され、上記気体貯留器内に気体を供給する気体供給機と
を備え、
上記排水管の下端が上記水封器の底部に配置され、この下端から上方に延伸して上記気体貯留器の天板を貫通すると共に、上端が上記処理槽外に配置され、
上記トリガー管の下端が上記排水管の下端近傍の周壁に形成されている開口に接続され、上端が上記天板近傍で開口している生物濾過処理装置。
It has a treatment tank for storing sewage, a filtration layer having a plurality of filter media floating in the sewage, and an automatic cleaning device.
The above automatic cleaning device
The topped cylinder-shaped gas reservoir installed at the bottom of the processing tank and
A bottomed tubular water sealer installed in the gas reservoir and
The drainage pipe, which is at least partly arranged in the water sealer,
A trigger tube, at least part of which is placed inside the water sealer,
It is provided with a gas supply machine that is arranged outside the treatment tank and supplies gas to the gas reservoir.
The lower end of the drainage pipe is arranged at the bottom of the water sealer, extends upward from the lower end to penetrate the top plate of the gas reservoir, and the upper end is arranged outside the treatment tank.
A biological filtration treatment device in which the lower end of the trigger pipe is connected to an opening formed in the peripheral wall near the lower end of the drainage pipe, and the upper end is open in the vicinity of the top plate.
上記濾過材が、円筒状であり、外径が18mm以下、長さが18mm以下、及び比重が0.98以下である請求項2に記載の生物濾過処理装置。 The biological filtration processing apparatus according to claim 2, wherein the filter medium is cylindrical, has an outer diameter of 18 mm or less, a length of 18 mm or less, and a specific gravity of 0.98 or less. 上記濾過材の内周面に少なくとも一つの壁板が配設されている請求項3に記載の生物濾過処理装置。 The biological filtration processing apparatus according to claim 3, wherein at least one wall plate is arranged on the inner peripheral surface of the filter material. 上記壁板が、上記濾過材の径方向の中心軸を含んで配設されている請求項4に記載の生物濾過処理装置。 The biological filtration processing apparatus according to claim 4, wherein the wall plate is arranged including a radial central axis of the filter medium. 汚水を貯留する処理槽、上記汚水中で浮上する複数の濾過材を有する濾過層、及び自動洗浄装置を備える生物濾過処理装置を、上記自動洗浄装置で自動洗浄する方法であって、
上記自動洗浄装置が、
上記処理槽内底部に立設される有天筒状の気体貯留器と、
上記気体貯留器内に立設される有底筒状の水封器と、
少なくとも一部が上記水封器内に配設される排水管と、
少なくとも一部が上記水封器内に配設されるトリガー管と、
上記処理槽の外部に配設され、上記気体貯留器内に気体を供給する気体供給機と
を備え、
上記排水管の下端が上記水封器の底部に配置され、この下端から上方に延伸して上記気体貯留器の天板を貫通すると共に、上端が上記処理槽外に配置され、
上記トリガー管の下端が上記排水管の下端近傍の周壁に形成されている開口に接続され、上端が上記天板近傍で開口し、
上記気体供給機から供給される上記気体を上記気体貯留器に貯留する工程と、
上記貯留される気体の圧力で、少なくとも上記排出管内及び上記水封器内の汚水が上記排出管の上端から流出する工程と、
上記気体が、上記排水管の下端近傍の周壁に形成されている開口に到達すると共に、少なくとも上記排水管に残存する汚水及び上記気体が上記排出管の上端から噴出する工程と
を備え、
上記噴出工程が、
上記処理槽の汚水及び汚泥を、上記気体貯留器内、上記水封器内、及び上記排出管内に導入する工程と、
上記導入によって上記処理槽の水位を急低下させ、この急低下による水位落差によって上記複数の濾過材が水中で展開及び撹拌する工程と、
上記展開及び撹拌によって、上記濾過材に付着している余剰付着物を洗浄する工程と
を含む生物濾過処理装置の自動洗浄方法。

A method of automatically cleaning a biological filtration treatment device including a treatment tank for storing sewage, a filtration layer having a plurality of filter media floating in the sewage, and an automatic cleaning device by the automatic cleaning device.
The above automatic cleaning device
The topped cylinder-shaped gas reservoir installed at the bottom of the processing tank and
A bottomed tubular water sealer installed in the gas reservoir and
The drainage pipe, which is at least partly arranged in the water sealer,
A trigger tube, at least part of which is placed inside the water sealer,
It is provided with a gas supply machine that is arranged outside the treatment tank and supplies gas to the gas reservoir.
The lower end of the drainage pipe is arranged at the bottom of the water sealer, extends upward from the lower end to penetrate the top plate of the gas reservoir, and the upper end is arranged outside the treatment tank.
The lower end of the trigger pipe is connected to an opening formed in the peripheral wall near the lower end of the drainage pipe, and the upper end opens near the top plate.
The process of storing the gas supplied from the gas supply machine in the gas reservoir and
At least the sewage in the discharge pipe and the water sealer flows out from the upper end of the discharge pipe at the pressure of the stored gas.
The gas reaches the opening formed in the peripheral wall near the lower end of the drainage pipe, and at least the sewage remaining in the drainage pipe and the gas are ejected from the upper end of the drainage pipe.
The above ejection process
The step of introducing the sewage and sludge from the treatment tank into the gas reservoir, the water sealer, and the discharge pipe.
A step of rapidly lowering the water level of the treatment tank by the above introduction, and developing and stirring the plurality of filter media in water due to the water level drop due to the sudden drop.
An automatic cleaning method for a biological filtration treatment device, which comprises a step of cleaning excess deposits adhering to the filter medium by the above development and stirring.

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05504295A (en) * 1990-01-23 1993-07-08 カルドネス ミリョーテクノロジ アクスイェ セルスカブ Methods and reactors for water purification
JPH10296287A (en) * 1997-04-30 1998-11-10 Shinko Pantec Co Ltd Method and device for treating water containing organic matter
JP2010184210A (en) * 2009-02-13 2010-08-26 Best Plant Ltd Co Automatic cleaning device for floating filter medium layer for biofiltration treatment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05504295A (en) * 1990-01-23 1993-07-08 カルドネス ミリョーテクノロジ アクスイェ セルスカブ Methods and reactors for water purification
JPH10296287A (en) * 1997-04-30 1998-11-10 Shinko Pantec Co Ltd Method and device for treating water containing organic matter
JP2010184210A (en) * 2009-02-13 2010-08-26 Best Plant Ltd Co Automatic cleaning device for floating filter medium layer for biofiltration treatment

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