JP2020529257A - 低温大気プラズマ・システム用の拡散型アプリケータ - Google Patents
低温大気プラズマ・システム用の拡散型アプリケータ Download PDFInfo
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- H—ELECTRICITY
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
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- H—ELECTRICITY
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Abstract
Description
本出願は、2017年8月4日に本発明者によって出願された、米国特許仮出願第62/541,225号の出願日の利益を主張する。
なし
Claims (10)
- 低温大気プラズマ処置を行うための装置であって、
ハウジングと、
前記ハウジング内のチャンバと、
前記チャンバへの入口ポートと、
前記チャンバからの複数の出口ポートと、
前記ハウジング内に取り付けられた複数の電極と、
を備え、
前記複数の電極のそれぞれは、前記複数の出口ポートのうちの1つと位置が揃う遠位端を有し、
前記入口ポート、前記チャンバ、前記出口ポート、および前記複数の電極が、前記入口ポートから前記チャンバを通って前記出口ポートへ流れる不活性ガスを提供し、前記複数の電極に印加される電気エネルギによってプラズマ化して前記出口ポートから流れ出る低温プラズマを形成するように構成されている、装置。 - 前記複数の出口ポートのそれぞれが、前記チャンバへの近位端開口と、前記チャネルを通って流れるガスを前記ハウジングから出すように構成された遠位端開口とを有する出口チャネルを備え、前記複数の電極のうちの1つの遠位端が各出口チャネルの中に延びる、請求項1に記載の低温大気プラズマ処置を行うための装置。
- 各出口チャネル内に、前記チャネル内に電極の一部を支持するための支持部材をさらに備える、請求項1に記載の低温大気プラズマ処置を行うための装置。
- 前記複数の電極のそれぞれを、電気外科手術エネルギ源に接続するための電気コネクタと、
前記チャンバへの前記入口ポートを不活性ガス源に接続するためのガス・コネクタと、
をさらに備える、請求項1、2、または3に記載の低温大気プラズマ処置を行うための装置。 - ガス・アシスト式電気外科手術発生器をさらに備え、前記電気コネクタおよび前記ガス・コネクタが前記ガス・アシスト式電気外科手術発生器に接続されている、請求項4に記載の低温大気プラズマ処置を行うための装置。
- 拡散型アプリケータ組立体を備える低温大気プラズマ装置であって、
前記拡散型アプリケータ組立体が、生体適合性プラスチック・ハウジングと、複数の電極とを備え、
前記生体適合性プラスチック・ハウジングが、側壁、遠位端面、前記遠位端面を通って延びる複数の出口チャネル、および、各出口チャネル内の電極支持部材を備える遠位端ピースと、前記遠位端ピースに接続された近位端ピースと、を備え、
前記遠位端ピースが、前記近位端ピースを通って延びる入口チャネル、および、前記近位端ピースを通って延びる複数の電極チャネルを備え、
前記遠位端ピースと前記近位端ピースとが、前記生体適合性ハウジング内にチャンバを形成し、
前記複数の電極の各電極が、前記複数の電極チャネルのうちの1つを通って前記チャンバの中に延び、各電極がさらに、前記チャンバを通って前記複数の出口チャネルのうちの1つの中に延び、それぞれの前記電極が、前記電極チャネルのうちの1つ、および前記出口チャネルのうちの1つにある電極支持部材によって支持されている、装置。 - 前記入口ポートを不活性ガス源に接続し、かつ前記複数の電極を電気外科手術エネルギ源に接続するためのコネクタをさらに備える、請求項6に記載の低温大気プラズマ装置。
- 前記生体適合性ハウジングに接続されたハンドピースをさらに備える、請求項6に記載の低温大気プラズマ装置。
- 前記生体適合性ハウジングに接続されたアームアクチュエータをさらに備える、請求項6に記載の低温大気プラズマ装置。
- ガス・アシスト式電気外科手術発生器をさらに備え、前記複数の電極および前記入口チャネルが前記ガス・アシスト式電気外科手術発生器に接続されている、請求項6に記載の低温大気プラズマ装置。
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PCT/US2018/045411 WO2019028466A1 (en) | 2017-08-04 | 2018-08-06 | DIFFUSION APPLICATOR FOR COLD ATMOSPHERIC PLASMA SYSTEM |
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JP6916393B2 (ja) * | 2018-06-29 | 2021-08-11 | 積水化学工業株式会社 | プラズマ照射装置 |
CN113068295A (zh) * | 2021-03-17 | 2021-07-02 | 电子科技大学 | 等离子体射流装置及等离子体切割系统 |
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CN111050678B (zh) | 2023-12-26 |
US20200261135A1 (en) | 2020-08-20 |
CN111050678A (zh) | 2020-04-21 |
US10912598B2 (en) | 2021-02-09 |
EP3661443A4 (en) | 2021-06-09 |
AU2018312113A1 (en) | 2020-02-13 |
BR112020002309A2 (pt) | 2020-08-04 |
WO2019028466A1 (en) | 2019-02-07 |
AU2018312113B2 (en) | 2023-09-14 |
RU2749804C1 (ru) | 2021-06-17 |
CA3071020A1 (en) | 2019-02-07 |
EP3661443A1 (en) | 2020-06-10 |
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