JP2020204766A - Manufacturing method of liquid crystal display device - Google Patents

Abstract

To provide a manufacturing method of a liquid crystal display device capable of satisfactorily suppressing luminance unevenness.SOLUTION: A manufacturing method of a liquid crystal display device includes a step of forming an alignment film material layer in which a first alignment film material layer 211 is formed by applying a first alignment film material in a display area X of a substrate and a second alignment film material layer 311 is formed by applying a second alignment film material in at least a part of a peripheral area Y which is an area other than the display area X located on the periphery of the substrate. The coating amount per unit area of the second alignment film material is larger than the coating amount per unit area of the first alignment film material.SELECTED DRAWING: Figure 1

Description

The present invention relates to a method for manufacturing a liquid crystal display device.

A liquid crystal display device is a display device that uses a liquid crystal composition for display, and a typical display method thereof is to irradiate a liquid crystal panel in which a liquid crystal composition is enclosed between a pair of substrates with light from a backlight. However, the amount of light transmitted through the liquid crystal panel is controlled by applying a voltage to the liquid crystal composition to change the orientation of the liquid crystal molecules. In a liquid crystal display device, the orientation of liquid crystal molecules in a state where no voltage is applied is generally controlled by an alignment film. The alignment film can be obtained, for example, by subjecting a film obtained by applying an alignment film material on a substrate and drying the alignment film material layer to an alignment treatment.

Here, although not in the field of liquid crystal display devices, Patent Document 1 discloses a technique relating to coating film formation. Patent Document 1 describes a practical coating film forming step of forming a practical coating film by applying a first ink containing a volatile solvent into a practical area of a printed matter, and a second ink containing a volatile solvent. An external dummy coating film forming step of forming an external dummy coating film by applying the coating film to the outside of the outermost edge of the practical coating film or so as to surround the outermost edge, and the practical coating film and the external dummy coating film are applied. A method for forming a printing pattern for an electronic component including a drying step of simultaneously drying is disclosed.

JP-A-2015-66504

Hereinafter, a method for manufacturing a liquid crystal display device of Comparative Form 1 in which an alignment film is formed on a substrate by using the pattern forming method of Patent Document 1 will be described. FIG. 18 is a schematic plan view for explaining the alignment film material layer forming step included in the manufacturing method of the liquid crystal display device of Comparative Form 1. FIG. 19 is an enlarged plan schematic view showing a region surrounded by a broken line in FIG.

In the method for manufacturing a liquid crystal display device of Comparative Form 1, a plurality of liquid crystal panels are manufactured at the same time using mother glass. Specifically, an alignment film is formed on a thin film transistor (TFT) substrate manufactured using mother glass and a color filter (CF) substrate manufactured using mother glass, respectively. Then, after the two substrates are bonded together to provide a liquid crystal layer between the two substrates, the TFT substrate and the CF substrate are cut in the region corresponding to each liquid crystal panel to simultaneously manufacture a plurality of liquid crystal panels.

As shown in FIGS. 18 and 19, the method of manufacturing the liquid crystal display device of Comparative Form 1 includes a step of preparing a TFT substrate 100R having a TFT provided on the mother glass 110 and an alignment film material on the TFT substrate 100R. It comprises a step of forming an alignment film material layer which is applied to form a first alignment film material layer 211R and a second alignment film material layer 311R. The TFT substrate 100R is provided with a plurality of regions 200 forming one liquid crystal panel in a matrix so that a plurality of liquid crystal panels can be manufactured at the same time. Hereinafter, the area constituting one liquid crystal panel is also referred to as a liquid crystal panel area.

In the alignment film material layer forming step of Comparative Form 1, the first alignment film material is applied to the display area X, which is the area where the image is displayed when the liquid crystal panel is formed, so that the first alignment film material layer is formed. By forming the 211R and applying the second alignment film material to a part of the peripheral region Y which is located on the peripheral edge V of the TFT substrate 100R and is a region outside the display region X, the second alignment film material is formed. Alignment film material layer 311R is formed. The first alignment film material layer 211R and the second alignment film material layer 311R are dried (prebaked) to become alignment films 210R and 310R, respectively. Here, the second alignment film material layer 311R is an alignment film material layer formed in the peripheral region Y, and is also referred to as a dummy pattern.

In the alignment film material layer forming step of Comparative Form 1, the coating amount of the first alignment film material per unit area and the coating amount of the second alignment film material per unit area are the same.

FIG. 20 is a graph showing the film thickness distribution of the alignment film formed by the manufacturing method of the liquid crystal display device of Comparative Form 1. FIG. 21 is a graph showing the brightness distribution of the liquid crystal panel manufactured by the manufacturing method of the liquid crystal display device of the comparative form 1. 20 and 21 are graphs showing the state of the cross section taken along the line A1-A2 of FIG. 19, and show the state in which the first alignment film material layer 211R has dried to become the alignment film 210R.

After applying the first and second alignment film materials on the TFT substrate 100R to form the first and second alignment film material layers 211R and 311R, prebaking is performed to form the alignment films 210R and 310R. As shown in FIGS. 18 to 20, the film thickness of the alignment film 210R becomes thin at the end of the liquid crystal panel region 200AR located at the peripheral edge V of the TFT substrate 100R, and the film thickness of the alignment film 210R becomes thin at the end and the center of the liquid crystal panel region 200AR. There is a difference in film thickness of the alignment film 210R. As a result, the voltage-transmittance curve (VT curve) is deviated, and the brightness unevenness as shown in FIG. 21 occurs. The reason for this can be considered as follows. Generally, in a method of manufacturing a liquid crystal display device that simultaneously manufactures a plurality of liquid crystal panels using mother glass, the liquid crystal panel area located at the peripheral edge of the substrate is surrounded on all four sides by other liquid crystal panel areas. Not at least one of them has no adjacent liquid crystal panel area. Therefore, the drying rate of the alignment film material at the time of prebaking differs between the liquid crystal panel region located on the peripheral edge of the substrate and the other liquid crystal panel regions, and the film thickness unevenness of the alignment film on the liquid crystal panel located on the peripheral edge of the TFT substrate. Is likely to occur.

In order to suppress this film thickness unevenness, in the method for manufacturing the liquid crystal display device of Comparative Form 1, a second alignment film material layer 311R which is a dummy pattern is provided in the peripheral region Y, but the first alignment film material Since the coating amount per unit area and the coating amount of the second alignment film material per unit area are the same, if the width of the peripheral region Y is narrow, only a small amount of the second alignment film material can be applied. It is considered that the second alignment film material layer 311R cannot fully function as a countermeasure against uneven drying of the alignment film. As a result, it is considered that the film thickness unevenness as shown in FIG. 20 occurs and the luminance unevenness as shown in FIG. 21 occurs. As described above, even if the technique of Patent Document 1 is used, when the area where the dummy pattern is arranged is narrow, only a small amount of the dummy pattern can be arranged, and it cannot function as a countermeasure against uneven drying of the alignment film, and the brightness Unevenness cannot be sufficiently suppressed.

The present invention has been made in view of the above situation, and an object of the present invention is to provide a method for manufacturing a liquid crystal display device capable of sufficiently suppressing luminance unevenness.

(1) In one embodiment of the present invention, the first alignment film material is formed by applying the first alignment film material to the display region of the substrate, and the first alignment film material layer is formed, and is located at the peripheral edge of the substrate. A step of forming an alignment film material layer for forming a second alignment film material layer by applying a second alignment film material to at least a part of a peripheral region which is a region outside the display region is provided, and the second alignment is provided. A method for manufacturing a liquid crystal display device in which the coating amount per unit area of the film material is larger than the coating amount per unit area of the first alignment film material.

(2) Further, in an embodiment of the present invention, in addition to the configuration of (1) above, the substrate has a first side, a second side, a third side, and a fourth side along the circumferential direction. It has a rectangular shape arranged in order, and in the alignment film material forming step, the first side, the second side, the third side, and the second side along the fourth side. A method for manufacturing a liquid crystal display device, which applies the alignment film material of.

(3) Further, in an embodiment of the present invention, in addition to the configuration of (1) above, the second alignment film material layer is provided in a part of the peripheral region along the first side of the substrate. In the step of forming the alignment film material layer, the third alignment film material is applied to a part of the peripheral region along the second side of the substrate to come into contact with the second alignment film material layer. A third alignment film material layer having a width wider than the width of the second alignment film material layer is further formed, and the coating amount of the third alignment film material per unit area is determined. A method for manufacturing a liquid crystal display device, which is the same as the coating amount per unit area of the first alignment film material.

(4) Further, in an embodiment of the present invention, in addition to the above (1), the above (2), or the above (3), the substrate has a plurality of display areas and forms the alignment film material layer. In the step, the first alignment film material layer is formed for each display region, and the fourth alignment film material is applied to at least a part of the boundary region which is a region between adjacent display regions. A fourth alignment film material layer is further formed, and the coating amount of the fourth alignment film material per unit area is larger than the coating amount of the first alignment film material per unit area of the liquid crystal display device. Production method.

According to the present invention, it is possible to provide a method for manufacturing a liquid crystal display device capable of sufficiently suppressing uneven brightness.

It is a plane schematic diagram explaining the alignment film material layer forming process provided in the manufacturing method of the liquid crystal display device of Embodiment 1. It is an enlarged plan schematic view which shows the region surrounded by the broken line of FIG. It is a graph which shows the film thickness distribution of the alignment film formed by the manufacturing method of the liquid crystal display apparatus of Embodiment 1 and Comparative Embodiment 1. It is a graph which shows the luminance distribution of the liquid crystal panel manufactured by the manufacturing method of the liquid crystal display device of Embodiment 1 and comparative Embodiment 1. It is a schematic diagram explaining the flexographic printing method used in the manufacturing method of the liquid crystal display device of Embodiment 1. It is a schematic diagram which showed the relationship between the plate cylinder and the printing plate used in the manufacturing method of the liquid crystal display device of Embodiment 1. It is a perspective schematic view of the printing plate used in the manufacturing method of the liquid crystal display device of Embodiment 1. FIG. It is a figure regarding the alignment film material layer forming process provided in the manufacturing method of the liquid crystal display device of the comparative form 1, the upper figure is a planar schematic view of the TFT substrate provided with the alignment film material layer, and the lower figure is the printing plate. It is a cross-sectional schematic diagram. It is an enlarged cross-sectional schematic diagram in the region surrounded by the broken line of the printing plate shown in FIG. It is sectional drawing of the 1st alignment film material layer and the 2nd alignment film material layer formed by using the printing plate shown in FIG. It is a figure concerning the alignment film material layer forming process provided in the manufacturing method of the liquid crystal display device of Embodiment 1, the upper figure is a planar schematic view of the TFT substrate provided with the alignment film material layer, and the lower figure is the printing plate. It is a cross-sectional schematic diagram. An example of the structure of the surface of the printing plate used in the alignment film material layer forming step provided in the method for manufacturing the liquid crystal display device of the first embodiment, which is provided corresponding to the region where the second alignment film material layer is formed. It is the figure shown, the upper figure is a plan view of the printing plate, and the lower figure is a sectional view of the printing plate. An example of the structure of the surface of the printing plate used in the alignment film material layer forming step provided in the method for manufacturing the liquid crystal display device of the first embodiment, which is provided corresponding to the region where the first alignment film material layer is formed. It is the figure shown, the upper figure is a plan view of the printing plate, and the lower figure is a sectional view of the printing plate. Others of the surface structure of the printing plate used in the alignment film material layer forming step provided in the method for manufacturing the liquid crystal display device of the first embodiment, which is provided corresponding to the region where the second alignment film material layer is formed. It is sectional drawing which showed the example. It is an enlarged sectional schematic diagram in the region surrounded by the broken line of the printing plate shown in FIG. 11A. It is sectional drawing of the 1st alignment film material layer and the 2nd alignment film material layer formed by using the printing plate shown in FIG. It is a plane schematic diagram explaining the alignment film material layer forming process provided in the manufacturing method of the liquid crystal display device of Embodiment 2. It is a perspective schematic view of the printing plate used in the manufacturing method of the liquid crystal display device of Embodiment 2. It is a plane schematic diagram explaining the alignment film material layer forming process provided in the manufacturing method of the liquid crystal display device of Embodiment 3. It is a perspective schematic view of the printing plate used in the manufacturing method of the liquid crystal display device of Embodiment 3. It is a plane schematic diagram explaining the alignment film material layer forming process provided in the manufacturing method of the liquid crystal display device of the comparative form 1. It is an enlarged plan schematic view which shows the region surrounded by the broken line of FIG. It is a graph which shows the film thickness distribution of the alignment film formed by the manufacturing method of the liquid crystal display device of the comparative form 1. It is a graph which shows the luminance distribution of the liquid crystal panel manufactured by the manufacturing method of the liquid crystal display device of the comparative form 1.

Hereinafter, embodiments of the present invention will be described. The present invention is not limited to the contents described in the following embodiments, and the design can be appropriately changed within a range that satisfies the configuration of the present invention. The configurations described in the embodiments may be combined or modified as appropriate without departing from the gist of the present invention.

In the method for manufacturing a liquid crystal display device according to the embodiment of the present invention, the first alignment film material is applied to the display region of the substrate to form the first alignment film material layer, and the first alignment film material layer is formed and is located at the peripheral edge of the substrate. In addition, the alignment film material layer forming step of forming the second alignment film material layer by applying the second alignment film material to at least a part of the peripheral region which is a region outside the display region is provided. The coating amount per unit area of the second alignment film material is larger than the coating amount per unit area of the first alignment film material. In the present specification, the alignment film material is also referred to as an ink, and the alignment film material layer is also referred to as an ink layer. Further, the coating amount per unit area is also simply referred to as a coating amount.

Generally, when the ink layer formed by applying ink is dried, the ink dries faster at the edges than at the center of the ink layer, so that the density difference between the edges and the center Is generated, and the undried ink moves to the end of the ink layer, so that the end is raised, that is, a so-called coffee stain phenomenon occurs.

In the method for manufacturing the liquid crystal display device of the present embodiment, the first alignment film material is formed by applying the first alignment film material to the display region of the substrate, and the second alignment film material layer is formed on at least a part of the peripheral region. By providing the alignment film material layer forming step of forming the second alignment film material layer by applying the alignment film material, the solvent contained in the second alignment film material layer is volatilized by drying and volatilized in the peripheral region. The concentration of the solvent can be increased, and the rate at which the ink dries at the end of the first alignment film material layer located on the side where the second alignment film material layer is formed can be suppressed. Further, in the method for manufacturing the liquid crystal display device of the present embodiment, since the coating amount of the second alignment film material per unit area is larger than the coating amount of the first alignment film material per unit area, in the peripheral region. Since the concentration of the volatile solvent can be sufficiently increased, the rate at which the ink dries at the end of the first alignment film material layer located on the side where the second alignment film material layer is formed is sufficiently suppressed. Can be done. As a result, the occurrence of the coffee stain phenomenon can be sufficiently suppressed, and the film thickness unevenness when the first alignment film material layer is dried can be sufficiently suppressed. Therefore, the uneven film thickness of the alignment film can be sufficiently suppressed, and the uneven brightness of the liquid crystal display device can be sufficiently suppressed. Here, the pattern provided in the peripheral region is also referred to as a dummy pattern.

Examples of the substrate include a TFT substrate having a thin film transistor (TFT), a CF substrate having a color filter (CF), and the like.

The coating amount per unit area of the alignment film material is the volume per unit area of the alignment film material coated on the substrate, and is the volume per unit area of the alignment film material before the solvent is dried.

When the coating amount of the second alignment film material per unit area is larger than the coating amount of the first alignment film material per unit area, the coating amount of the second alignment film material per unit area is the second. It means that the coating amount per unit area of one alignment film material is 1.1 times or more.

The coating amount per unit area of the second alignment film material is preferably 1.1 times or more and 3 times or less, preferably 1.2 times or more, the coating amount per unit area of the first alignment film material. It is more preferably 2.7 times or less, and further preferably 1.3 times or more and 2.5 times or less.

The thickness of the second alignment film material layer is preferably 1.1 times or more and 3 times or less, and 1.2 times or more and 2.7 times or less the thickness of the first alignment film material layer. Is more preferable, and 1.3 times or more and 2.5 times or less are further preferable.

The first alignment film material layer is, for example, rectangular, and the second alignment film material layer is, for example, strip-shaped (linear). The width of the second alignment film material layer is preferably 0.3 mm or more, more preferably 2 mm or more, and further preferably 5 mm or more. The upper limit of the width of the second alignment film material layer is not particularly limited, and the wider the width, the more effectively the uneven brightness can be suppressed, but for example, it is 20 mm or less.

The first alignment film material and the second alignment film material are inks (compositions) for the alignment film, respectively. That is, the first alignment film material and the second alignment film material are applied onto the TFT substrate to form the first alignment film material layer and the second alignment film material layer, and these alignment film materials are formed. An alignment film can be formed by drying the layer. Here, the alignment film has a function of controlling the orientation of liquid crystal molecules in the liquid crystal layer of the liquid crystal display device, and is mainly oriented when the voltage applied to the liquid crystal layer is less than the threshold voltage (including no voltage applied). The action of the film controls the orientation of the liquid crystal molecules in the liquid crystal layer.

The first alignment film material and the second alignment film material contain a solvent and a polymer, respectively. The solvent contained in the first alignment film material and the second alignment film material may be different from each other or the same, and the polymer contained in the first alignment film material and the second alignment film material may be different from each other or the same. Although they may be different from each other or the same, it is preferable that the first alignment film material and the second alignment film material have the same composition. With such an embodiment, the first alignment film material layer and the second alignment film material layer can be formed at the same time, and a liquid crystal display device can be manufactured more easily.

The polymer is a general polymer in the field of alignment films for liquid crystal display devices, such as a polymer having a polyimide as a main chain, a polymer having a polyamic acid as a main chain, and a polymer having a polysiloxane as a main chain. The solvent is not particularly limited as long as it can dissolve these polymers, and is a solvent generally used in the field of alignment films for liquid crystal display devices.

The method of applying the first alignment film material and the second alignment film material is not particularly limited, and for example, these alignment film materials are applied onto a substrate by using a printing method such as a flexographic printing method or an inkjet printing method. Can be applied. In the flexographic printing method, the amount of ink applied per unit area can be changed by adjusting the amount of ink applied to the printing plate or the like. Further, in the inkjet printing method, the amount of ink applied per unit area can be changed by changing the volume per ejected droplet, changing the number of droplets ejected per unit area, or the like. it can.

The step of applying the first alignment film material and the step of applying the second alignment film material may be executed at different timings from each other, but are preferably executed at the same time. With such an embodiment, the liquid crystal display device can be manufactured more easily.

The display area is an area in which an image is displayed when the liquid crystal panel is used, that is, an area in which pixels are arranged. The substrate preferably has at least one display area and preferably has a plurality of display areas. With such an embodiment, it is possible to manufacture a plurality of liquid crystal panels at the same time.

The peripheral area is a region located on the peripheral edge of the substrate and outside the display area. The peripheral edge of the substrate is a frame-shaped region along the edge of the substrate.

The substrate usually has a rectangular shape composed of a first side, a second side, a third side and a fourth side.

In the alignment film material forming step, it is preferable to apply the second alignment film material along the first side, the second side, the third side, and the fourth side. With such an aspect, it is possible to suppress the uneven brightness over the entire circumference of the peripheral region of the substrate.

The alignment film material layer of the first side formed by applying the second alignment film material along the first side, and the second alignment film material applied along the second side. The alignment film material layer on the second side formed by the above, the alignment film material layer on the third side formed by applying the second alignment film material along the third side, and , The alignment film material layer of the fourth side formed by applying the second alignment film material along the fourth side may be provided independently of each other, and may be provided on adjacent sides. The aligned alignment film material layers may be provided continuously with each other. For example, the alignment film material layer on the first side, the alignment film material layer on the second side, the alignment film material layer on the third side, and the alignment film material layer on the fourth side are adjacent to each other. It may be connected to the membrane material layer.

The second alignment film material layer is provided in a part of the peripheral region along the first side of the substrate, and in the alignment film material layer forming step, the peripheral region is formed along the second side of the substrate. By partially applying the third alignment film material, the third alignment film is not in contact with the second alignment film material layer and has a width wider than the width of the second alignment film material layer. It is preferable that the material layer is further formed and the coating amount of the third alignment film material per unit area is the same as the coating amount of the first alignment film material per unit area. By adopting such an aspect, it is possible to increase the amount of ink applied in the area where the brightness unevenness is desired to be further suppressed and to suppress the amount of ink used in the other areas, so that the brightness unevenness can be efficiently performed. Can be suppressed. For example, when the width of the peripheral region along the second side of the substrate is wider than the width of the peripheral region along the first side, a dummy pattern (third alignment film) is arranged in the wider region. By increasing the amount of ink applied in the dummy pattern (second alignment film material layer) arranged in a region narrower than the material layer), the amount of ink used can be suppressed and the brightness unevenness can be achieved efficiently. Can be suppressed. Further, when the second alignment film material layer is provided in a part of the peripheral area along the first side of the substrate, the area between the first side of the substrate and the display area in the peripheral area. It means that it is provided in a part of the inside. Further, when the third alignment film material is applied to a part of the peripheral region along the second side of the substrate, one of the peripheral regions in the region between the second side of the substrate and the display region. It means applying a third alignment film material to the part.

The coating amount per unit area of the third alignment film material is the same as the coating amount per unit area of the first alignment film material, that is, the coating amount of the third alignment film material and the coating amount of the first alignment film material. This includes the case where the coating amount of the material is substantially the same, and includes the case where there is a difference in the coating amount between the two in terms of manufacturing error.

More specifically, the coating amount per unit area of the third alignment film material may be 0.8 times or more and less than 1.1 times the coating amount per unit area of the first alignment film material. It is preferably 0.9 times or more and less than 1.1 times.

The thickness of the third alignment film material layer is preferably 0.8 times or more and less than 1.1 times, preferably 0.9 times or more and less than 1.1 times the thickness of the first alignment film material layer. More preferably.

The third alignment film material layer is, for example, strip-shaped (linear). The width of the third alignment film material layer is preferably 0.3 mm or more, more preferably 2 mm or more, and further preferably 5 mm or more. The upper limit of the width of the third alignment film material layer is not particularly limited, and the wider the width, the more effectively the luminance unevenness can be suppressed, but it is, for example, 20 mm or less.

In the present specification, the width of one alignment film material layer is wider than the width of another alignment film material layer, that is, the width of one alignment film material layer is 1.1 times or more the width of another alignment film material layer. It means that the width of one alignment film material layer is at least twice the width of another alignment film material layer, and more preferably the width of one alignment film material layer is other. It means that it is 5 times or more the width of the alignment film material layer, and more preferably 10 times or more. Further, the fact that the width of a certain alignment film material layer is the same as the width of another alignment film material layer includes the case where the widths of the two are substantially the same, and there is a difference in the width between the two in terms of manufacturing error. Includes the case where

Further, in the present specification, the width of the peripheral edge region along a certain side of the substrate is wider than the width of the peripheral edge region along the other side of the substrate. , 1.1 times or more the width of the peripheral region along the other side of the substrate, preferably the width of one alignment film material layer is twice or more the width of another alignment film material layer. It means that the width of one alignment film material layer is 5 times or more, more preferably 10 times or more the width of another alignment film material layer. Further, the width of the peripheral region along a certain side of the substrate is the same as the width of the peripheral region along the other side of the substrate, including the case where the widths of both are substantially the same. This includes the case where there is a difference in the width of the manufacturing error.

When the width of the peripheral region along the first side of the substrate is the same as the width of the peripheral region along the second side, the second alignment film material layer is the first of the substrates. It is preferable that it is provided in a part of the peripheral region along the side and is provided in a part of the peripheral region along the second side of the substrate. By adopting such an embodiment, for example, when the width of the peripheral region along the first side and the width of the peripheral region along the second side are similarly narrow, the brightness unevenness of the liquid crystal display device becomes more sufficient. Can be suppressed.

As described above, in the method for manufacturing the liquid crystal display device of the present embodiment, an ink layer is formed by applying ink to a region where the width of the peripheral region is relatively narrow by relatively increasing the coating amount per unit area. However, in the region where the width of the peripheral region is relatively wide, the amount of ink used is reduced by applying ink to the region where the coating amount per unit area is relatively small to form a third alignment film material layer. While suppressing it, it is possible to more sufficiently suppress the uneven brightness of the liquid crystal display device.

The substrate has a plurality of the display regions, forms the first alignment film material layer for each display region in the alignment film material layer forming step, and is a region between adjacent display regions. A fourth alignment film material layer is further formed by applying the fourth alignment film material to at least a part of the boundary region, and the coating amount of the fourth alignment film material per unit area is the above-mentioned first. It is preferably larger than the coating amount per unit area of the alignment film material. With such an aspect, it is possible to suppress the luminance unevenness not only in the vicinity of the peripheral region of the substrate but also in the inside thereof.

When the coating amount of the fourth alignment film material per unit area is larger than the coating amount of the first alignment film material per unit area, the coating amount of the fourth alignment film material per unit area is the fourth. It means that the coating amount per unit area of one alignment film material is 1.1 times or more.

The coating amount per unit area of the fourth alignment film material is preferably 1.1 times or more and 3 times or less, preferably 1.2 times or more, the coating amount per unit area of the first alignment film material. It is more preferably 2.7 times or less, and further preferably 1.3 times or more and 2.5 times or less.

The thickness of the fourth alignment film material layer is preferably 1.1 times or more and 3 times or less, and 1.2 times or more and 2.7 times or less the thickness of the first alignment film material layer. Is more preferable, and 1.3 times or more and 2.5 times or less are further preferable.

The fourth alignment film material layer is, for example, strip-shaped (linear). The width of the fourth alignment film material layer is preferably 0.3 mm or more, more preferably 2 mm or more, and further preferably 5 mm or more. The upper limit of the width of the fourth alignment film material layer is not particularly limited, and the wider the width, the more effectively the uneven brightness can be suppressed, but for example, it is 20 mm or less.

The boundary region is a region that is not located in the peripheral region of the substrate and is outside the display region.

The third alignment film material and the fourth alignment film material include a solvent and a polymer. As the solvent and polymer contained in the third alignment film material and the fourth alignment film material, the same ones as those mentioned in the first alignment film material and the second alignment film material can be used. .. The first alignment film material, the second alignment film material, the third alignment film material, and the fourth alignment film material may have at least one ink different from the other inks, but they are all the same. The composition is preferably. By adopting such an embodiment, the first alignment film material layer, the second alignment film material layer, the third alignment film material layer, and the fourth alignment film material layer can be formed at the same time. This makes it possible to manufacture a liquid crystal display device more easily.

The step of applying the first alignment film material, the step of applying the second alignment film material, the step of applying the third alignment film material, and the step of applying the fourth alignment film material are at least one step. May be executed at a timing different from that of other steps, but it is preferable that all steps are executed at the same time. With such an embodiment, the liquid crystal display device can be manufactured more easily.

The method for manufacturing a liquid crystal display device of the present embodiment further includes a drying step of drying the first alignment film material layer and the second alignment film material layer after the alignment film material layer forming step. When the third alignment film material layer is formed, the third alignment film material layer is also dried in the drying step. When the fourth alignment film material layer is formed, the fourth alignment film material layer is also dried in the drying step. The drying step can be performed by a method generally used when forming an alignment film. By performing the drying step, an alignment film can be formed from the first alignment film material layer, the second alignment film material layer, the third alignment film material layer, and the fourth alignment film material layer.

After that, the TFT substrate as the substrate provided with the alignment film (second alignment film) and the CF substrate as the substrate provided with the alignment film (first alignment film) are bonded together between the two substrates. The step of enclosing the liquid crystal layer in the liquid crystal layer, the step of cutting the TFT substrate and the CF substrate in the region corresponding to each liquid crystal panel, the first polarizing plate on the observation surface side of each liquid crystal panel, and the second polarizing plate on the back side. The liquid crystal display device is completed by sequentially performing the steps of arranging the plate and the backlight.

The liquid crystal display device manufactured by the method for manufacturing the liquid crystal display device of the present embodiment has a first polarizing plate, a CF substrate as the substrate, and a first alignment film in this order from the observation surface side to the back surface side. A liquid crystal layer, a second alignment film, a TFT substrate as the substrate, a second polarizing plate, and a backlight are provided. The method for manufacturing the liquid crystal display device of the present embodiment can be used when forming the first alignment film and the second alignment film.

Hereinafter, the display device according to another embodiment of the present invention will be described in more detail with reference to the drawings. In the following description, the same reference numerals are appropriately used for the same parts or parts having similar functions in different drawings, and the repeated description thereof will be omitted as appropriate.

(Embodiment 1)
FIG. 1 is a schematic plan view illustrating an alignment film material layer forming step included in the manufacturing method of the liquid crystal display device of the first embodiment. FIG. 2 is an enlarged plan schematic view showing a region surrounded by a broken line in FIG. FIG. 3 is a graph showing the film thickness distribution of the alignment film formed by the manufacturing method of the liquid crystal display device of the first embodiment and the first comparative embodiment. FIG. 4 is a graph showing the brightness distribution of the liquid crystal panel manufactured by the manufacturing method of the liquid crystal display device of the first embodiment and the first comparative embodiment. The graphs relating to the first embodiment of FIGS. 3 and 4 are graphs showing the state of the cross section taken along the line B1-B2 of FIG. 2, and the first alignment film material layer 211 is dried to become the alignment film 210. Represents. The graphs relating to Comparative Form 1 of FIGS. 3 and 4 are graphs showing the state of the cross section taken along the line A1-A2 of FIG. 19, and the first alignment film material layer 211R is dried to become the alignment film 210R. Represents.

In the method for manufacturing a liquid crystal display device of the present embodiment, as shown in FIGS. 1 and 2, first, a TFT substrate 100 having a TFT provided on a mother glass 110 is prepared. The TFT substrate 100 is provided with a plurality of regions (liquid crystal panel regions) 200 constituting one liquid crystal panel in a matrix shape. In the case of a liquid crystal panel, the TFT substrate 100 has a plurality of pixel electrodes, common electrodes, a TFT layer provided with a TFT, and a plurality of extending in parallel with each other in order from the side that becomes the observation surface to the side that becomes the back surface. It includes a source line, a plurality of gate lines extending parallel to each other in a direction intersecting each source line, and a transparent substrate. The plurality of gate lines and the plurality of source lines are formed in a grid pattern as a whole so as to partition each pixel. A TFT as a switching element is arranged at the intersection of each source line and each gate line. In this embodiment, the common electrode is provided on the TFT substrate, but the common electrode may be provided on the CF substrate.

Next, the alignment film material layer forming step is performed. Specifically, as shown in FIGS. 1 and 2, the first alignment film material layer 211 is formed and the first alignment film material layer 211 is formed by applying the first alignment film material to the display region X of each liquid crystal panel region 200. , The second alignment film material layer 311 is formed by applying the second alignment film material to a part of the peripheral region Y which is located on the peripheral edge V of the TFT substrate 100 and is a region outside the display region X. To form. The first alignment film material layer 211 and the second alignment film material layer 311 are subsequently dried (prebaked) to become alignment films 210 and 310, respectively.

In the present embodiment, in the alignment film material layer forming step, the coating amount of the second alignment film material per unit area is made larger than the coating amount of the first alignment film material per unit area. With such an embodiment, it is possible to suppress the drying speed of the ink applied to the display region X located in the vicinity of the peripheral region Y of the TFT substrate 100. As a result, as shown in FIGS. 1 to 3, the film thickness of the alignment film 210 is suppressed from becoming thin at the end of the liquid crystal panel region 200A located at the peripheral edge V of the TFT substrate 100, and the edge of the liquid crystal panel region 200A is suppressed. It is possible to suppress the difference in film thickness of the alignment film 210 between the portion and the center portion, and the alignment film provided in the display region X is compared with the case where the manufacturing method of the liquid crystal display device of Comparative Form 1 is used. It is possible to suppress uneven film thickness. As a result, as shown in FIG. 4, the brightness unevenness of the liquid crystal panel manufactured by the manufacturing method of the liquid crystal display device of the present embodiment can be improved as compared with the comparative embodiment 1.

The TFT substrate 100 (mother glass 110) has a rectangular shape in which the first side 101, the second side 102, the third side 103, and the fourth side 104 are sequentially arranged along the circumferential direction. The width w1 between the first side 101 and the display area X and the width w3 between the third side 103 and the display area X are the same, and between the second side 102 and the display area X. The width w2 and the width w4 between the fourth side 104 and the display area are the same. The widths w1 and w3 are narrower than the widths w2 and w4.

The second alignment film material layer 311 is provided in a part of the peripheral region Y along the first side 101, and is provided in a part of the peripheral region Y along the third side 103. Further, the third alignment film material layer 411 is provided in a part of the peripheral region Y along the second side 102, and is provided in a part of the peripheral region Y along the fourth side 104. There is. The third alignment film material layer 411 becomes an alignment film 410 through a drying step. The coating amount of the third alignment film material per unit area is the same as the coating amount of the first alignment film material per unit area, that is, the coating amount of the third alignment film material per unit area is It is less than the coating amount per unit area of the second alignment film material. In the present embodiment, the second alignment film material layer 311 having a larger amount of ink applied per unit area is formed in a region where the width between the side constituting the TFT substrate 100 and the display region X is narrower. Efficiently by forming a third alignment film material layer 411 with a smaller amount of ink applied per unit area in a region having a wider width between the side constituting the TFT substrate 100 and the display region X. It is possible to suppress uneven film thickness of the alignment film 210.

The coating method used in the alignment film material layer forming step will be specifically described. In the method for manufacturing a liquid crystal display device of the present embodiment, ink is applied onto the TFT substrate 100 by using a flexographic printing method.

FIG. 5 is a schematic view illustrating a flexographic printing method used in the method for manufacturing a liquid crystal display device according to the first embodiment. FIG. 6 is a schematic view showing the relationship between the plate cylinder and the printing plate used in the method for manufacturing the liquid crystal display device of the first embodiment. In the alignment film material layer forming step, as shown in FIGS. 5 and 6, the ink CL dropped from the nozzle 11 passes between the anix roll 12 and the doctor roll 13, and the printing is provided on the plate cylinder 14. Granted on version 20. After that, the rotation axis X3 of the plate cylinder 14 moves in the traveling direction (from right to left in FIG. 5) due to the rotation of the plate cylinder 14, so that the ink applied from the nozzle 11 to the TFT substrate 100 on the stage 16 is applied. CL is transcribed.

FIG. 7 is a schematic perspective view of a printing plate used in the method for manufacturing a liquid crystal display device according to the first embodiment. As the printing plate 20, for example, the one shown in FIG. 7 can be used. As shown in FIG. 7, the printing plate 20 transfers the ink onto the base material 25 to the surface on which the ink is not transferred, that is, the surface 21 that is not transferred to the substrate, and the surface to which the ink is transferred, that is, the display area of the substrate. It includes a surface 22 and surfaces 231 and 232 that are transferred to the peripheral region of the substrate. The surface 231 transferred to the peripheral region of the substrate is arranged corresponding to a region having a narrower width between the side constituting the TFT substrate 100 and the display region X, and the surface 232 transferred to the peripheral region of the substrate is a TFT. The side forming the substrate 100 and the display area X are arranged so as to correspond to a wider area.

In the alignment film material layer forming step of the present embodiment, the amount of ink applied to the surface 231 transferred to the peripheral area of the substrate is larger than the amount of ink applied to the surface 22 transferred to the display area of the substrate. As a result, the coating amount per unit area of the second alignment film material forming the second alignment film material layer 311 is applied to the unit area of the first alignment film material forming the first alignment film material layer 211. It is more than the coating amount of. Further, by making the amount of ink applied to the surface 232 transferred to the peripheral area of the substrate the same as the amount of ink applied to the surface 22 transferred to the display area of the substrate, the third alignment film material can be obtained. The coating amount per unit area and the coating amount of the first alignment film material per unit area are the same.

FIG. 8 is a diagram relating to an alignment film material layer forming step included in the manufacturing method of the liquid crystal display device of Comparative Form 1, the upper diagram is a schematic plan view of a TFT substrate provided with an alignment film material layer, and the lower diagram is a plan view. , It is a cross-sectional schematic diagram of a printing plate. In FIG. 8, the positional relationship between the TFT substrate provided with the alignment film material layer and the printing plate is matched. FIG. 9 is a schematic enlarged cross-sectional view of the area surrounded by the broken line of the printing plate shown in FIG. FIG. 10 is a schematic cross-sectional view of a first alignment film material layer and a second alignment film material layer formed by using the printing plate shown in FIG.

In the method for manufacturing the liquid crystal display device of Comparative Form 1, the printing plate 20R shown in FIG. 8 is used. The printing plate 20R is a surface provided on the base material 25 corresponding to the region where the first alignment film material layer 211R is formed, and the surface 22R transferred to the display region of the substrate and the second orientation. It is a surface provided corresponding to the region where the film material layer 311R is formed, and includes a surface 231R to be transferred to the peripheral region of the substrate. As shown in FIG. 9, the same mesh is provided on the surface 22R transferred to the display area of the substrate and the surface 231R transferred to the peripheral region of the substrate, and the surface 22R transferred to the display area of the substrate and the surface 22R The amount of ink retained on the surface 231R transferred to the peripheral region of the substrate is the same. Therefore, the amount of ink applied to the first alignment film material layer 211R formed by using the printing plate 20R and the amount of ink applied to the second alignment film material layer 311R are the same as shown in FIG. Become. Therefore, as described above, when the area where the dummy pattern is arranged is narrow, only a small amount of ink can be arranged, and uneven brightness cannot be sufficiently suppressed.

FIG. 11A is a diagram relating to the alignment film material layer forming step provided in the method for manufacturing the liquid crystal display device of the first embodiment, the upper diagram is a schematic plan view of a TFT substrate provided with the alignment film material layer, and the lower diagram is a plan view. , It is a cross-sectional schematic diagram of a printing plate. FIG. 11B shows a surface of the printing plate used in the alignment film material layer forming step provided in the method for manufacturing the liquid crystal display device of the first embodiment, which is provided corresponding to the region where the second alignment film material layer is formed. It is a figure which showed an example of the structure, the upper figure is a plan view of a printing plate, and the lower figure is a sectional view of a printing plate. FIG. 11C shows a surface of the printing plate used in the alignment film material layer forming step provided in the method for manufacturing the liquid crystal display device of the first embodiment, which is provided corresponding to the region where the first alignment film material layer is formed. It is a figure which showed an example of the structure, the upper figure is a plan view of a printing plate, and the lower figure is a sectional view of a printing plate. FIG. 11D shows a surface of the printing plate used in the alignment film material layer forming step provided in the manufacturing method of the liquid crystal display device of the first embodiment, which is provided corresponding to the region where the second alignment film material layer is formed. It is sectional drawing which showed the other example of a structure. In FIGS. 11A to 11C, the positional relationship between the TFT substrate provided with the alignment film material layer and the printing plate is matched. FIG. 12 is a schematic enlarged cross-sectional view of the area surrounded by the broken line of the printing plate shown in FIG. 11A. FIG. 13 is a schematic cross-sectional view of the first alignment film material layer and the second alignment film material layer formed by using the printing plate shown in FIG.

In the alignment film material layer forming step included in the manufacturing method of the liquid crystal display device of the present embodiment, the printing plate 20 shown in FIG. 11A is used. The printing plate 20 is a surface provided on the base material 25 corresponding to the region where the first alignment film material layer 211 is formed, and the surface 22 transferred to the display region of the substrate and the second orientation. It is a surface provided corresponding to the region where the film material layer 311 is formed, and includes a surface 231 to be transferred to the peripheral region of the substrate.

As shown in FIGS. 11B and 11C, the printing plate 20 has a dot pattern DP in which dots D, which are protrusions, are regularly provided. One dot D is also called a halftone dot, and the dot pattern DP is also called a mesh (mesh).

The surface is provided corresponding to the region where the second alignment film material layer 311 is formed, and the surface 231 transferred to the peripheral region of the substrate has, for example, a dot pattern having a pitch of 300 dots / inch shown in FIG. 11B. The surface on which the DP is provided and corresponds to the region where the first alignment film material layer 211 is formed, and the surface 22 transferred to the display region of the substrate is, for example, 400 dots / inch shown in FIG. 11C. The dot pattern DP of the pitch of is provided. The dot pattern DP shown in FIG. 11B has a smaller number of dots D per inch than the dot pattern DP shown in FIG. 11C. As a result, the depth DD of the ink holding portion DI formed from the space (gap) between the dots D becomes deeper in the dot pattern DP of FIG. 11B having a smaller number of pitches than the dot pattern DP of FIG. 11C having a larger number of pitches. , The volume of the ink holding portion DI in the dot pattern DP shown in FIG. 11B can be further increased. As a result, the amount of ink held on the surface having the dot pattern DP shown in FIG. 11B can be made larger than the amount of ink held on the surface having the dot pattern DP shown in FIG. 11C. By changing the dot size (pitch) in this way, the volume of the ink holding portion DI formed from the space (gap) between the dots D is changed, and the amount of ink held in the printing plate 20 is changed. be able to.

Further, as shown in FIGS. 11C and 11D, even if the number of dots D per inch is the same, that is, the pitch is the same, the depth DD is set in the dot pattern DP shown in FIG. 11D rather than the dot pattern DP shown in FIG. 11C. By deepening and expanding the ink holding portion DI, the volume of the ink holding portion DI in the dot pattern DP shown in FIG. 11D can be further increased. As a result, the amount of ink retained on the surface having the dot pattern DP shown in FIG. 11D can be made larger than the amount of ink retained on the surface having the dot pattern shown in FIG. 11C.

As shown in FIG. 12, a mesh having a larger volume of the ink holding portion DI than the surface 22 transferred to the display region of the substrate is formed on the surface 231 transferred to the peripheral region of the substrate. Therefore, the amount of ink retained on the surface 231 transferred to the peripheral region of the substrate is larger than the amount of ink retained on the surface 22 transferred to the display region of the substrate, and is formed by using the printing plate 20 as shown in FIG. The amount of ink applied to the second alignment film material layer 311 is larger than the amount of ink applied to the first alignment film material layer 211. As a result, as described above, the second alignment film material layer 311 suppresses the drying rate of the first alignment film material layer 211 in the liquid crystal panel region 200A located at the peripheral edge of the TFT substrate 100, and the alignment film 210. It is possible to sufficiently suppress the uneven film thickness of the liquid crystal display device, and it is possible to sufficiently suppress the uneven brightness of the liquid crystal display device.

As described above, in the comparative form 1, the ink retention amount of the printing plate 20R is the same in the region corresponding to the first alignment film material layer 211R and the region corresponding to the second alignment film material layer 311R. In the present embodiment, the ink retention amount of the printing plate 20 itself is increased in the region corresponding to the second alignment film material layer 311 with respect to the region corresponding to the first alignment film material layer 211, and the TFT is used. By slowing the drying rate of the first alignment film material layer 211 in the liquid crystal panel region 200A located at the peripheral edge V of the substrate 100, the film thickness reduction of the alignment film 210 in the display region X due to the coffee stain phenomenon is suppressed. By suppressing the decrease in film thickness, it is possible to suppress the previously occurring uneven brightness and improve the display quality.

(Embodiment 2)
In the present embodiment, the features peculiar to the present embodiment will be mainly described, and the description of the contents overlapping with the above-described embodiment will be omitted. The method for manufacturing the liquid crystal display device of the present embodiment is the same as that of the first embodiment except that the third alignment film material layer 411 is not formed and the region for forming the second alignment film material layer 311 is different. It has the structure of.

FIG. 14 is a schematic plan view for explaining the alignment film material layer forming step included in the method for manufacturing the liquid crystal display device of the second embodiment. As shown in FIG. 14, the width w1 between the first side 101 and the display area X, the width w2 between the second side 102 and the display area X, and the third side 103 and the display area X. The width w3 between them and the width w4 between the fourth side 104 and the display area X are the same.

In the method for manufacturing the liquid crystal display device of the second embodiment, the second alignment film material layer 311 has a peripheral region along the first side 101, the second side 102, the third side 103, and the fourth side 104. It is provided in a part of Y. In the present embodiment, the width between each of the first side 101, the second side 102, the third side 103, and the fourth side 104 and the display area X is narrow. Therefore, by applying a second alignment film material in which the amount of ink applied per unit area is larger than that of the first alignment film material to form the second alignment film material layer 311, the alignment film is formed. It is possible to sufficiently suppress the uneven film thickness of 210, and it is possible to suppress the uneven brightness of the liquid crystal display device.

FIG. 15 is a schematic perspective view of a printing plate used in the method for manufacturing a liquid crystal display device according to a second embodiment. In the alignment film material layer forming step provided in the method for manufacturing the liquid crystal display device of the second embodiment, the first alignment film material layer 211 and the second alignment film material layer 311 are formed by using the printing plate 20 shown in FIG. be able to. The printing plate 20 is provided on the base material 25 corresponding to a surface 21 that is not transferred to the substrate, a surface 22 that is transferred to the display region of the substrate, and a region where the second alignment film material layer 311 is formed. It is a surface and includes a surface 231 that is transferred to the peripheral region of the substrate. A mesh having a larger volume of the ink holding portion DI than the surface 22 transferred to the display area of the substrate is formed on the surface 231 transferred to the peripheral region of the substrate. Therefore, the amount of ink retained on the surface 231 transferred to the peripheral region of the substrate is larger than the amount of ink retained on the surface 22 transferred to the display region of the substrate, and the second alignment film material formed by using the printing plate 20. The amount of ink applied to layer 311 is larger than the amount of ink applied to the first alignment film material layer 211. As a result, as described above, the second alignment film material layer 311 suppresses the drying rate of the first alignment film material layer 211 in the liquid crystal panel region 200A located at the peripheral edge V of the TFT substrate 100, and the alignment film. The uneven film thickness of 210 can be sufficiently suppressed, and the uneven brightness of the liquid crystal display device can be sufficiently suppressed.

(Embodiment 3)
In the present embodiment, the features peculiar to the present embodiment will be mainly described, and the description of the contents overlapping with the above-described embodiment will be omitted. The method for manufacturing a liquid crystal display device of the present embodiment has the same configuration as that of the second embodiment except that a fourth alignment film material layer is formed between the display regions X.

FIG. 16 is a schematic plan view illustrating an alignment film material layer forming step included in the method for manufacturing the liquid crystal display device of the third embodiment. As shown in FIG. 16, the width w1 between the first side 101 and the display area X, the width w2 between the second side 102 and the display area X, and the third side 103 and the display area X. The width w3 between them and the width w4 between the fourth side 104 and the display area X are the same.

In the method for manufacturing a liquid crystal display device of the present embodiment, as shown in FIG. 16, a fourth alignment film material is applied to a part of a boundary region Z which is a region between display regions X. The alignment film material layer 511 is formed. The coating amount per unit area of the fourth alignment film material is larger than the coating amount per unit area of the first alignment film material. Therefore, it is possible to sufficiently suppress the film thickness unevenness of the alignment film 210 even inside the peripheral region Y, and it is possible to further suppress the brightness unevenness of the liquid crystal display device.

In the present embodiment, the coating amount of the fourth alignment film material per unit area is the same as the coating amount of the second alignment film material per unit area. The fourth alignment film material layer 511 becomes an alignment film 510 through a drying step.

FIG. 17 is a schematic perspective view of a printing plate used in the method for manufacturing a liquid crystal display device according to a third embodiment. In the alignment film material layer forming step provided in the method for manufacturing the liquid crystal display device of the third embodiment, the first alignment film material layer 211, the second alignment film material layer 311 and the fourth alignment film material layer 21 are used by using the printing plate 20 shown in FIG. Alignment film material layer 511 can be formed. The printing plate 20 corresponds to a surface 22 transferred to the display region of the substrate, a surface 231 transferred to the peripheral region of the substrate, and a region on which the fourth alignment film material layer 511 is formed on the base material 25. It is provided with a surface 24 to be transferred to the boundary region of the substrate. Similar to the surface 231 transferred to the peripheral region of the substrate, the surface 24 transferred to the boundary region of the substrate is formed with a mesh having a larger volume of the ink holding portion DI than the surface 22 transferred to the display region of the substrate. .. Therefore, the amount of ink retained on the surface 24 transferred to the boundary region of the substrate is larger than the amount of ink retained on the surface 22 transferred to the display region of the substrate, and the fourth alignment film material formed by using the printing plate 20. The amount of ink applied to layer 511 is larger than the amount of ink applied to the first alignment film material layer 211. As a result, as described above, the fourth alignment film material layer 511 suppresses the drying rate of the first alignment film material layer 211 even in the liquid crystal panel region 200 located inside the peripheral edge of the TFT substrate 100. , The uneven film thickness of the alignment film 210 can be sufficiently suppressed, and the uneven brightness of the liquid crystal display device can be further suppressed.

As shown in FIG. 16, in the present embodiment, the second alignment film material layer 311 is independent for each of the first side 101, the second side 102, the third side 103, and the fourth side 104. However, the second alignment film material layer 311 provided on the adjacent side may be provided continuously with each other. Further, in the present embodiment, the fourth alignment film material layer 511 is provided independently for each side constituting the display region X, but the fourth orientation provided on the adjacent side of the display region X. The film material layer 511 may be provided continuously with each other. Further, in the present embodiment, the second alignment film material layer 311 and the fourth alignment film material layer 511 are provided independently of each other, but the second alignment film material layer 311 and the fourth alignment film material layer 311 and the fourth are adjacent to each other. The alignment film material layer 511 may be provided continuously with each other. For example, the second alignment film material layer 311 and the fourth alignment film material layer 511 shown in FIG. 16 may all be connected to form a network-like alignment film material layer.

Each aspect of the present invention shown above may be appropriately combined as long as it does not deviate from the gist of the present invention.

11: Nozzle 12: Anix roll 13: Kuta roll 14: Plate cylinder 16: Stage 20: Printed plate 21: Surfaces 22, 22R, 231 and 231R, 232: Transferred to the display area of the substrate 24: Substrates Surface 25 to be transferred to the boundary region of 25: Base material 100, 100R: TFT substrate 110: Mother glass 200, 200A, 200AR: Region used for one liquid crystal panel (liquid crystal panel region)
210, 210R, 310, 310R, 410, 510: Alignment film 211, 211R, 311, 311R, 411, 511: Alignment film material layer CL: Ink D: Dot DD: Depth DI: Ink holder DP: Dot pattern V : Peripheral portion w1, w2, w3, w4: Width X: Display area X3: Rotation axis Y: Peripheral region Z: Boundary region

Claims (4)

By applying the first alignment film material to the display region of the substrate, the first alignment film material layer is formed, and the peripheral region located at the peripheral edge of the substrate and outside the display region. A step of forming an alignment film material layer for forming a second alignment film material layer by applying a second alignment film material to at least a part thereof is provided.
A method for manufacturing a liquid crystal display device, wherein the coating amount of the second alignment film material per unit area is larger than the coating amount of the first alignment film material per unit area. The substrate has a rectangular shape in which the first side, the second side, the third side, and the fourth side are arranged in order along the circumferential direction.
A claim characterized in that, in the alignment film material forming step, the second alignment film material is applied along the first side, the second side, the third side, and the fourth side. Item 2. The method for manufacturing a liquid crystal display device according to item 1. The second alignment film material layer is provided in a part of the peripheral region along the first side of the substrate.
In the step of forming the alignment film material layer, the third alignment film material is applied to a part of the peripheral region along the second side of the substrate so as to be in contact with the second alignment film material layer. A third alignment film material layer having a width wider than the width of the second alignment film material layer is further formed.
The production of the liquid crystal display device according to claim 1, wherein the coating amount per unit area of the third alignment film material is the same as the coating amount per unit area of the first alignment film material. Method. The substrate has a plurality of the display areas.
In the alignment film material layer forming step, the first alignment film material layer is formed for each display region, and a fourth alignment film is formed on at least a part of a boundary region which is a region between adjacent display regions. By applying the material, a fourth alignment film material layer is further formed,
The liquid crystal according to any one of claims 1 to 3, wherein the coating amount of the fourth alignment film material per unit area is larger than the coating amount of the first alignment film material per unit area. How to manufacture a display device.

Images