JP2020173256A - Measuring device, measuring system, processing device, and measuring method - Google Patents

Abstract

To provide a measuring device, measuring system, processing device, and measuring method capable of precisely measuring an amount of liquid.SOLUTION: The measuring device includes: a measurement pipe 2a configured to locate a first end 2a1 to which gas is supplied, in the upper side of a second end 2a2 to which liquid is supplied; an exhaust pipe 2c that is connected to the measurement pipe at the first end side; a discharge pipe 2b that is connected to the measurement pipe at the second end side; a first detection part 3b provided closer to the second end side than an opening 2c1 of the exhaust pipe for detecting liquid inside the measurement pipe; a second detection part 3a provided closer to the second end side than the first detection part and closer to the first end side than an opening 2b1 of the discharge pipe and detecting the liquid inside the measurement pipe; a gas control part 6 for controlling the pressure of gas to be supplied from the first end to the inside of the measurement pipe; a first on-off valve 2f provided at an end of the exhaust pipe in the opposite side of the measurement pipe side; and a second on-off valve 2e provided at the end of the discharge pipe in the opposite side of the measurement pipe side.SELECTED DRAWING: Figure 1

Description

Embodiments of the present invention relate to weighing devices, weighing systems, processing devices, and weighing methods.

In the manufacture of electronic devices such as semiconductor devices and flat panel displays, etching treatments and cleaning treatments using a predetermined chemical solution are performed.
For example, chemical treatment using buffered hydrofluoric acid (BHF), APM (ammonium hydrogen-peroxide mixture), SPM (sulfuric acid peroxide mixture), or the like is performed (see, for example, Patent Document 1). ..
In such a chemical treatment, it is necessary to accurately measure the amount (volume) of the chemical to be supplied.
For example, it is necessary to accurately measure the amount of the chemical solution according to the concentration of the chemical solution.

Further, in such a chemical treatment, a plurality of kinds of raw material solutions may be mixed to generate a chemical solution, and the generated chemical solution may be used for the treatment.
When the treatment is performed using the generated chemical solution, the ratio (component ratio) of each component constituting the chemical solution has a great influence on the treatment rate (for example, etching rate).
Therefore, when producing a chemical solution, it is necessary to accurately measure the raw material solution of the chemical solution.
For example, it is necessary to accurately measure the amount of the raw material solution of the chemical solution according to the concentration of the raw material solution of the chemical solution.

Further, in recent years, used chemical solutions have been reused.
In the used chemical solution, some of the components constituting the chemical solution may be consumed, or some of the components constituting the chemical solution may be volatilized.
Therefore, when reusing a used chemical solution, it is necessary to replenish the components that are lost or deficient.
Even in such a case, it is necessary to accurately measure the amount of the solution containing the component of the drug solution that is lost or deficient.
Therefore, it has been desired to develop a technique capable of accurately measuring the amount of liquid.

Japanese Unexamined Patent Publication No. 2005-251936

An object to be solved by the present invention is to provide a weighing device, a weighing system, a processing device, and a weighing method capable of accurately measuring the amount of liquid.

The measuring device according to the embodiment has a tubular shape, and has a measuring tube provided so that the first end is located above the second end to which the liquid is supplied, and a first measuring tube of the measuring tube. A gas supply unit that connects to the end side of the measuring pipe and supplies gas to the measuring pipe, an introduction part that connects to the measuring pipe at the second end and supplies the liquid to the measuring pipe, and the above. On the side of the second end, from a discharge pipe connected to the measuring pipe and discharging the liquid measured by the measuring pipe to the outside and an opening of the discharge pipe opening inside the measuring pipe. Also provided on the first end side, has a first detection unit for detecting the liquid inside the measuring pipe, and a control unit, and the control unit is measured by the introduction unit. The gas supply unit supplies the liquid to the inside of the pipe, stops the supply of the liquid by detecting the liquid level of the liquid by the first detection unit, and does not discharge the liquid from the measuring pipe. After the gas is supplied above the liquid supplied to the measuring tube, the liquid level of the liquid is detected by the first detection unit, and the liquid level of the liquid is detected by the first detection unit. If not, the liquid is supplied to the inside of the measuring pipe again by the introduction unit without discharging the liquid from the measuring pipe, and the liquid level is detected by the first detecting unit. It is characterized by stopping the supply of.

According to an embodiment of the present invention, a weighing device, a weighing system, a processing device, and a weighing method capable of accurately measuring the amount of liquid are provided.

It is a schematic diagram for exemplifying the measuring apparatus 1 which concerns on 1st Embodiment. It is a schematic diagram for exemplifying the measurement system 11 which concerns on 2nd Embodiment. It is a block diagram for exemplifying the processing apparatus 100 which concerns on 3rd Embodiment.

Hereinafter, embodiments will be illustrated with reference to the drawings. In each drawing, similar components are designated by the same reference numerals and detailed description thereof will be omitted as appropriate.
[First Embodiment]
FIG. 1 is a schematic view for exemplifying the weighing device 1 according to the first embodiment.
As shown in FIG. 1, the measuring device 1 is provided with a measuring unit 2, a detecting unit 3, a gas supply unit 4, an introduction unit 5, and a control unit 6.

The measuring unit 2 is provided with a measuring pipe 2a, a discharge pipe 2b, an exhaust pipe 2c, and an on-off valve 2d to 2g.
The measuring pipe 2a, the exhaust pipe 2b, and the exhaust pipe 2c are tubular.
The measuring pipe 2a, the discharge pipe 2b, and the exhaust pipe 2c can be, for example, a cylindrical pipe.
In the measuring tube 2a, the end 2a1 to which the gas is supplied (corresponding to an example of the first end) has more gravity than the end 2a2 to which the chemical solution is supplied (corresponding to an example of the second end). It is provided so as to be located on the upper side in the direction. The measuring pipe 2a can be provided upright, for example, so as to extend in the vertical direction.

As will be described later, the amount (volume) of the chemical solution inside the measuring tube 2a is measured by determining the liquid level position of the chemical solution supplied to the inside of the measuring tube 2a. Therefore, it is preferable that the area of the cross section in the direction perpendicular to the central axis of the measuring tube 2a is substantially constant.
By doing so, highly accurate weighing can be easily performed.
The cross-sectional area, length, wall thickness, etc. of the measuring tube 2a are not particularly limited, and are appropriately determined in consideration of the amount and viscosity of the chemical solution to be measured, the resistance to pressurization by the gas supply unit 4, and the like. Can be done.
In this case, the wall thickness of the measuring tube 2a needs to be a dimension that enables the detection unit 3 to detect the liquid level of the chemical solution. Therefore, the wall thickness of the measuring tube 2a can be appropriately determined in consideration of the detection method (for example, the transmittance of the detected light) in the detection unit 3.

The material of the measuring tube 2a is not particularly limited, and is appropriately considered in consideration of the detection method in the detection unit 3, resistance to the chemical solution to be measured (chemical resistance), resistance to pressurization by the gas supply unit 4, and the like. Can be decided.
The material of the measuring tube 2a is not particularly limited as long as the detection unit 3 can detect the liquid level of the chemical solution. The material of the measuring tube 2a can be, for example, glass.

The discharge pipe 2b is connected to the measuring pipe 2a on the side of the end portion 2a2 of the measuring pipe 2a. The discharge pipe 2b is provided to discharge the chemical solution measured in the measuring pipe 2a to the outside of the measuring pipe 2a.
The discharge pipe 2b extends in a direction perpendicular to the central axis of the measuring pipe 2a, for example.
The space inside the discharge pipe 2b is connected to the space inside the measuring pipe 2a.

The cross-sectional area, length, wall thickness, and material in the direction perpendicular to the central axis of the discharge pipe 2b are not particularly limited, and the amount and viscosity of the chemical solution to be measured, the resistance to the chemical solution to be measured (chemical resistance), and the gas supply unit. It can be appropriately determined in consideration of the resistance to pressurization (pressure resistance) by 4.
In this case, the cross-sectional area, wall thickness, material, and the like of the discharge pipe 2b can be the same as those of the measuring pipe 2a.

The exhaust pipe 2c is connected to the measuring pipe 2a on the side of the end portion 2a1 of the measuring pipe 2a.
The exhaust pipe 2c is provided to discharge the gas supplied from the inside of the measuring pipe 2a by the gas supply unit 4 to the outside of the measuring pipe 2a.
The exhaust pipe 2c extends in a direction perpendicular to the central axis of the measuring pipe 2a, for example.
The space inside the exhaust pipe 2c is connected to the space inside the measuring pipe 2a.

The cross-sectional area, length, wall thickness, and material in the direction perpendicular to the central axis of the exhaust pipe 2c are not particularly limited, and resistance to the chemical solution to be measured (chemical resistance) and resistance to pressurization by the gas supply unit 4 (pressure resistance). It can be decided as appropriate in consideration of sex) and the like.
In this case, the cross-sectional area, wall thickness, material, and the like of the exhaust pipe 2c can be the same as those of the measuring pipe 2a.
Further, the measuring pipe 2a, the discharge pipe 2b, and the exhaust pipe 2c may be integrally formed or may be formed by joining.

The on-off valve 2d is connected to the end portion 2a2 of the measuring pipe 2a.
The on-off valve 2d stops the supply and supply of the chemical solution through the introduction section 5 and prevents the backflow of the chemical solution from the inside of the measuring pipe 2a to the introduction section 5.
The on-off valve 2e (corresponding to an example of the second on-off valve) is connected to the end of the discharge pipe 2b on the side opposite to the measuring pipe 2a side.
The on-off valve 2e discharges and stops the discharge of the chemical solution through the discharge pipe 2b, and prevents the chemical solution from flowing back into the measuring pipe 2a.
A pipe 112 for supplying the measured chemical solution to an external tank, a processing device, or the like can be connected to the side of the on-off valve 2e opposite to the side to which the discharge pipe 2b is connected.
The on-off valve 2f (corresponding to an example of the first on-off valve) is connected to the end of the exhaust pipe 2c on the side opposite to the measuring pipe 2a side.
The on-off valve 2f discharges gas through the exhaust pipe 2c, stops the discharge, and prevents backflow of gas into the measuring pipe 2a.
The on-off valve 2g is connected to the end portion 2a1 of the measuring pipe 2a.
The on-off valve 2g prevents the supply and supply of gas from the gas supply unit 4 to the inside of the measuring pipe 2a, and prevents the backflow of gas from the inside of the measuring pipe 2a to the gas supply unit 4.

The type of the on-off valve 2d to 2g is not particularly limited, and can be appropriately determined in consideration of resistance to the chemical solution to be measured (chemical resistance), resistance to pressurization by the gas supply unit 4, and the like.
The on-off valve 2d to 2g can be, for example, an air-operated valve for a chemical solution.

Here, when the supply of the chemical solution to the inside of the measuring tube 2a is stopped, the chemical solution in the portion where the chemical solution passes inside the on-off valve 2d may be pushed out to the inside of the measuring tube 2a.
When the chemical solution in the portion through which the chemical solution passes is pushed out into the measuring tube 2a, the liquid level position of the chemical solution becomes higher than the desired stop position.
That is, the amount of the chemical solution inside the measuring tube 2a becomes larger than the desired amount, and the supply amount of the chemical solution varies.
Further, when the discharge of the chemical solution from the inside of the measuring pipe 2a is stopped, the chemical solution in the portion where the chemical solution passes inside the on-off valve 2e may be pushed out to the outside.
When the chemical solution in the part through which the chemical solution passes is pushed out, the supply amount of the chemical solution varies.

Therefore, it is preferable that the on-off valves 2d and 2e have as small a capacity as possible in the portion through which the chemical solution passes.
For example, as the on-off valves 2d and 2e, it is preferable to select one having a flow path length as short as possible inside.

The detection unit 3 is provided with a lower end detection unit 3a (corresponding to an example of the second detection unit), an upper end detection unit 3b (corresponding to an example of the first detection unit), and a bubble detection unit 3c. ..
The lower end detection unit 3a and the upper end detection unit 3b detect the liquid level of the chemical solution inside the measuring tube 2a.
The lower end detecting portion 3a is provided above the opening 2b1 of the discharge pipe 2b.
Further, the lower end detection unit 3a is provided below the upper end detection unit 3b.
The upper end detecting portion 3b is provided below the opening 2c1 of the exhaust pipe 2c.
A plurality of upper end detecting portions 3b can be provided along the direction in which the measuring pipe 2a extends.
For example, a plurality of upper end detection units 3b can be arranged at equal intervals to measure the amount of the chemical solution and determine whether or not the amount of the chemical solution is within the permissible range.
In this case, the amount of the chemical solution between the detection position by the lower end detection unit 3a and the liquid level detected by a predetermined one among the plurality of upper end detection units 3b is the measured amount of the chemical solution.
Although six upper end detection units 3b1 to 3b6 are illustrated in FIG. 1, the number and spacing of the upper end detection units 3b and the distance between the lower end detection unit 3a and the upper end detection unit 3b may be appropriately changed. it can.
For example, the distance between the upper end detection units 3b1 to 3b6 can be about 1 mm.
For example, the distance between the lower end detection unit 3a and the upper end detection unit 3b can be appropriately set according to the amount of the chemical solution supplied to an external tank, processing device, or the like.
Further, for example, one upper end detection unit 3b can be provided, the lower lower end detection unit 3a can be used for measuring the chemical solution, and the upper upper end detection unit 3b can be used for detecting the allowable limit of the chemical solution amount.

However, if the number of the upper end detection units 3b is increased, the measurement range of the amount of the chemical solution can be expanded.
Further, if the distance between the upper end detection portions 3b is narrowed, the permissible range in the measurement of the chemical solution is narrowed, so that the measurement accuracy can be improved.
For example, if the upper end detection unit 3b is a fiber sensor or the like, the distance between the upper end detection units 3b can be narrowed.

The bubble detection unit 3c detects the passage of bubbles when returning the chemical solution containing the bubbles to the supply unit 101 described later.
When bubbles are detected by the bubble detection unit 3c, the chemical solution inside the measuring pipe 2a can be discarded via the discharge pipe 2b or returned to the supply unit 101 via the introduction unit 5. ..
The bubble detection unit 3c is not always necessary, and may be provided as needed.
The lower end detection unit 3a, the upper end detection unit 3b, and the bubble detection unit 3c can be, for example, a photoelectric sensor having a light emitting unit and a light receiving unit.
In this case, since the refractive index of the chemical solution is different from the refractive index of the gas or bubbles, the refraction angle changes depending on the presence or absence of the chemical solution or the presence or absence of bubbles.
That is, the traveling direction of the light emitted from the measuring tube 2a changes. When the traveling direction of the light emitted from the measuring tube 2a changes, the amount of light incident on the light receiving portion changes, so that the liquid level and bubbles of the chemical solution can be detected.
The lower end detection unit 3a, the upper end detection unit 3b, and the bubble detection unit 3c are not limited to the photoelectric sensor, and may be any one that can detect the liquid level of the chemical solution and bubbles.

The gas supply unit 4 supplies gas from the end 2a1 of the measuring pipe 2a to the inside of the measuring pipe 2a.
The gas supply unit 4 can be, for example, a cylinder in which gas having a pressure higher than the atmospheric pressure is stored.
The gas stored in the gas supply unit 4 can be made difficult to react with the chemical solution.
The gas stored in the gas supply unit 4 can be, for example, an inert gas such as nitrogen gas or helium gas, air, or a mixed gas containing these.

Further, a gas control unit 4a for controlling the pressure and flow rate of the gas supplied from the gas supply unit 4 can be provided.
The gas control unit 4a is connected to the gas supply unit 4 via the pipe 4b1.
The gas control unit 4a is connected to the on-off valve 2g via the pipe 4b2.

The introduction unit 5 guides the chemical solution supplied from the supply unit 101, which will be described later, into the inside of the measuring pipe 2a.
The introduction section 5 is provided with a first introduction pipe 5a, a second introduction pipe 5b, and an on-off valve 5c.
The first introduction pipe 5a and the second introduction pipe 5b are tubular.
The first introduction pipe 5a and the second introduction pipe 5b can be, for example, a cylindrical pipe.

The first introduction pipe 5a has a connection portion 5a1, a gas-liquid separation portion 5a2, and a gas discharge portion 5a3.
A connecting portion 5a1 is connected to one end of the gas-liquid separating portion 5a2. A gas discharge section 5a3 is connected to the other end of the gas-liquid separation section 5a2.
In this case, the connecting portion 5a1, the gas-liquid separating portion 5a2, and the gas discharging portion 5a3 may be integrally formed or may be formed by joining.

One end of the connection 5a1 is connected to the supply 101.
The connecting portion 5a1 is not always necessary, and the gas-liquid separating portion 5a2 can be connected to the supply unit 101.
Further, the form of the connecting portion 5a1 is not limited to the example, and can be appropriately changed depending on the positional relationship between the measuring device 1 and the supply unit 101 and the like.

The gas-liquid separation unit 5a2 separates the chemical solution from the gas such as air bubbles.
For example, the gas-liquid separation portion 5a2 can be provided so as to extend in the horizontal direction.
By doing so, the gas such as air bubbles gathers on the upper side inside the gas-liquid separation portion 5a2, so that the chemical solution and the gas such as air bubbles can be separated.
The form of the gas-liquid separation unit 5a2 is not limited to the example, and can be changed as appropriate. That is, the form of the gas-liquid separation unit 5a2 may be any one capable of separating the chemical solution and the gas such as air bubbles.

The gas discharge unit 5a3 collects the separated gas and discharges it to the outside.
The gas discharge portion 5a3 can be provided so as to extend upward from the gas-liquid separation portion 5a2.
In this way, the gas such as bubbles is collected in the gas discharge section 5a3 on the downstream side by the flow of the chemical solution. Then, the collected gas is captured inside the gas discharging portion 5a3 extending upward.

The second introduction pipe 5b has a U-shaped shape.
One end of the second introduction pipe 5b is connected to the lower surface of the gas-liquid separation portion 5a2.
In this case, the first introduction pipe 5a and the second introduction pipe 5b may be integrally formed or may be formed by joining.
If one end of the second introduction pipe 5b is connected to the lower surface of the gas-liquid separation portion 5a2, the gas collected on the upper side inside the gas-liquid separation portion 5a2 will be inside the second introduction pipe 5b. It can suppress invasion. If the second introduction pipe 5b has a U-shape, even if a gas such as a bubble enters the inside of the second introduction pipe 5b, the gas such as a bubble tends to move upward. Therefore, it is possible to suppress the flow of gas such as bubbles to the downstream side.

The on-off valve 5c is connected to the end of the gas discharge portion 5a3.
The on-off valve 5c discharges gas from the gas discharge unit 5a3 and stops the discharge (prevents foreign matter from entering the gas discharge unit 5a3).
The type of on-off valve 5c is not particularly limited, and can be appropriately determined in consideration of resistance to the chemical solution to be measured (chemical resistance) and the like.
The on-off valve 5c can be, for example, an air-operated valve for a chemical solution.

The control unit 6 controls the operation of each element provided in the weighing device 1.
For example, the control unit 6 controls the on-off valve 2d based on the output from the detection unit 3 to supply and stop the supply of the chemical solution via the introduction unit 5. That is, the control unit 6 causes the chemical solution to be measured.
The control unit 6 controls, for example, the on-off valve 2g and the gas supply unit 4 to remove air bubbles in the measured chemical solution.
The control unit 6 controls the gas control unit 4a to determine the pressure of the gas supplied to the inside of the measuring pipe 2a when the on-off valve 2e is closed (when removing air bubbles in the chemical solution) and the on-off valve. The pressure of the gas supplied to the inside of the measuring tube 2a when 2e is open (when discharging the chemical solution) is different from that of the gas.
In this case, the pressure of the gas supplied when the on-off valve 2e is closed is higher than the pressure of the gas supplied when the on-off valve 2e is open.
The control unit 6 controls, for example, the on-off valve 2f to bring the pressure of the gas above the measured chemical solution to a predetermined value (for example, atmospheric pressure).
The control unit 6 controls, for example, the on-off valve 2e, the on-off valve 2g, and the gas supply unit 4 to discharge the measured chemical solution to the outside of the measuring pipe 2a.
The control unit 6 controls, for example, the on-off valve 5c to discharge the gas from the gas discharge unit 5a3 and stop the discharge.

Next, the operation of the measuring device 1 will be described.
First, the on-off valve 2d is opened, and the chemical solution is supplied to the inside of the measuring pipe 2a via the introduction portion 5.
At this time, the on-off valve 2f is opened at the same time as or before the on-off valve 2d. By doing so, it is possible to suppress an increase in the pressure inside the measuring tube 2a, so that the chemical solution can be smoothly supplied.
Further, by applying a predetermined pressure to the chemical solution, the chemical solution can be supplied to the inside of the measuring tube 2a.
The liquid level of the chemical solution supplied to the inside of the measuring tube 2a is detected by the lower end detection unit 3a.
When the liquid level of the chemical solution is detected by the lower end detection unit 3a, the control related to weighing is started.
When the liquid level of the chemical solution rises further and the liquid level of the chemical solution is detected by a predetermined one of the plurality of upper end detection units 3b, the on-off valve 2d is closed and the supply of the chemical solution is stopped. To.
At this time, after closing the on-off valve 2d, the on-off valve 2f is closed.
It is also possible to measure the chemical solution without using the detection unit 3.
For example, the supply time until the liquid level is detected by the predetermined upper end detection unit 3b may be obtained in advance, and the on-off valve 2d may be closed based on the obtained supply time.
The amount of the chemical solution between the detection position by the lower end detection unit 3a and the liquid level detected by the predetermined upper end detection unit 3b is the measured amount of the chemical solution.

Here, bubbles may be present in the measured chemical solution. In this case, if air bubbles adhere to the inner wall of the measuring tube 2a or the like, the air bubbles do not escape from the chemical solution, and the measurement accuracy may deteriorate.
Therefore, next, the air bubbles in the measured chemical solution are removed.
When removing air bubbles in the chemical solution, the on-off valve 2g is opened, and gas at a predetermined pressure (corresponding to an example of the first pressure) is supplied from the gas supply unit 4 above the measured chemical solution. To.
When the gas is supplied above the chemical solution, the chemical solution inside the measuring tube 2a is pressurized and the bubbles in the chemical solution are crushed and removed.
If the amount of bubbles is large, the position of the liquid level will drop. The position of the lowered liquid level is detected by any one of a plurality of upper end detection units 3b.
In this case, when the upper end detecting unit 3b detects that the position of the liquid surface is out of the predetermined range, it can be regarded as a measurement failure. When the measurement becomes defective, the chemical solution inside the measuring pipe 2a can be discarded via the discharge pipe 2b and the on-off valve 2e, or can be returned to the supply unit 101.
After discarding the chemical solution or returning it to the supply unit 101, the above-mentioned chemical solution can be weighed again. Alternatively, instead of discarding or returning to the supply unit 101, the chemical solution can be added by the supply unit 101 and the measurement of the chemical solution can be redone.
When the chemical solution is returned to the supply unit 101 via the introduction unit 5, the bubble detection unit 3c can detect the passage of bubbles contained in the chemical solution.

Here, the pressure of the gas above the measured chemical solution is set to a pressure at which bubbles can be removed. The pressure at which bubbles can be removed can be obtained by experiments or the like.
Next, the on-off valve 2f is opened to discharge the gas above the measured chemical solution, and the pressure of the gas above the measured chemical solution is set to a predetermined value (for example, atmospheric pressure).
That is, the pressure of the gas above the chemical solution is reduced to a predetermined value.

Next, the on-off valve 2f is closed, the on-off valve 2g is opened, and a gas having a pressure (corresponding to an example of the second pressure) that makes the discharge rate of the chemical solution appropriate causes the gas control unit 4a. It is supplied above the medicinal solution weighed through. In addition, the on-off valve 2e is opened.
Then, the measured chemical solution inside the measuring tube 2a is pushed out by the pressure of the gas from the gas supply section 4, and is sent to the chemical solution storage section 102 or the processing section 103, which will be described later, via the discharge pipe 2b.
Here, if the pressure of the gas above the measured chemical solution is high, when the measured chemical solution is discharged through the discharge pipe 2b, the discharge rate becomes too fast and the chemical solution on the peripheral portion of the liquid surface May be left behind in a state of being attached to the inner wall of the measuring tube 2a. If the chemical solution is left in a state of being attached to the inner wall of the measuring tube 2a, the amount of the discharged chemical solution will be insufficient.
Therefore, the pressure is set so that the discharge rate of the chemical solution becomes appropriate.

Next, when the liquid level of the chemical solution is detected by the lower end detection unit 3a, the on-off valve 2e is closed.
Here, if the detection position of the lower end detection unit 3a is not above the opening 2b1 of the discharge pipe 2b, the chemical solution above the on-off valve 2d may be caught and discharged. When the chemical solution above the on-off valve 2d is caught and discharged, the amount of the discharged chemical solution becomes excessive.
In the present embodiment, since the detection position of the lower end detection unit 3a is above the opening 2b1 of the discharge pipe 2b, the chemical liquid above the on-off valve 2d is the chemical liquid measured inside the measuring pipe 2a. It is possible to prevent the chemical solution storage unit 102, the processing unit 103, and the like from being sent together.
Not only can the amount of the chemical solution be accurately measured, but the measured chemical solution can be sent to the chemical solution storage unit 102, the processing unit 103, or the like in the same amount and state as when the measured chemical solution was measured.

The pressure suitable for removing air bubbles and the pressure at which the discharge rate of the chemical solution is appropriate have an influence on the viscosity of the chemical solution, the cross-sectional area of the measuring tube 2a, the properties of the inner wall of the measuring tube 2a, and the like. receive.
Therefore, it is preferable to obtain these pressures in advance by conducting experiments or simulations.

Further, the on-off valve 5c is opened as necessary to discharge the gas inside the gas discharge unit 5a3.
The on-off valve 5c can be opened and closed, for example, at predetermined time intervals.
According to the measuring device 1 according to the present embodiment, the amount of liquid can be accurately measured.

[Second Embodiment]
FIG. 2 is a schematic diagram for exemplifying the weighing system 11 according to the second embodiment.

As shown in FIG. 2, the weighing system 11 is provided with a plurality of weighing devices 1, a mixing unit 13, and a control unit 16.
In addition, in FIG. 2, in order to avoid complication, some elements provided in the measuring device 1 are omitted.

The mixing unit 13 is provided with a mixing container 12, a gas supply unit 14, a gas control unit 14a, an on-off valve 15a, and an on-off valve 15b.
The mixing container 12 has a tubular shape.
The mixing container 12 is provided so that one end 12a1 is located above the other end 12a2 in the direction of gravity. The mixing container 12 can be provided upright, for example, so as to extend in the vertical direction.
The form of the mixing container 12 is not limited to the tubular shape, but if the mixing container 12 has a tubular shape, the stirring property can be improved.

A supply pipe 12b1 and a supply pipe 12b2 are connected to the side wall of the mixing container 12.
The end of the supply pipe 12b1 opposite to the mixing container 12 side is connected to an on-off valve 2e provided in one of the measuring devices 1. Therefore, the chemical solution measured by one of the measuring devices 1 can be supplied to the inside of the mixing container 12.
The end of the supply pipe 12b2 on the side opposite to the mixing container 12 side is connected to an on-off valve 2e provided in the other measuring device 1. Therefore, the chemical solution measured by the other measuring device 1 can be supplied to the inside of the mixing container 12.

The mixing container 12, the supply pipe 12b1 and the supply pipe 12b2 may be integrally formed or may be formed by joining.
The materials of the mixing container 12, the supply pipe 12b1 and the supply pipe 12b2 are not particularly limited as long as they have resistance (chemical resistance) to the chemical solution to be measured.

The gas supply unit 14 supplies gas to the inside of the mixing container 12 in order to discharge the chemical solution produced by the mixing.
The gas supply unit 14 can be the same as the gas supply unit 4 described above. Further, the gas supplied from the gas supply unit 14 can be the same as the gas supplied from the gas supply unit 4.
The gas control unit 14a controls the pressure and flow rate of the gas supplied from the gas supply unit 14.
The gas control unit 14a is connected to the gas supply unit 14 via the pipe 14b1.
The gas control unit 14a is connected to the on-off valve 15a via the pipe 14b2.
The on-off valve 15a is connected to the end portion 12a1 of the mixing container 12.
The on-off valve 15a prevents the supply and supply of gas from the gas supply unit 14 to the inside of the mixing container 12 and the backflow of gas from the inside of the mixing container 12 to the gas supply unit 14.
The on-off valve 15b is connected to the end portion 12a2 of the mixing container 12.
The on-off valve 15b discharges the chemical solution from the inside of the mixing container 12, stops the discharge, and the like.
Further, the on-off valve 15b can be connected to a chemical liquid storage unit 102 or a processing unit 103, which will be described later, via a pipe 122 or the like.
The on-off valve 15a and the on-off valve 15b can be, for example, an air-operated valve for a chemical solution.

The control unit 16 controls the operation of each element provided in the plurality of measuring devices 1 and the mixing unit 13.
The control unit 16 controls, for example, the on-off valve 15a, the on-off valve 15b, and the gas supply unit 14 to discharge the chemical solution from the inside of the mixing container 12 and stop the discharge.
The control unit 16 controls, for example, the on-off valve 2e connected to the supply pipe 12b1 and the on-off valve 2e connected to the supply pipe 12b2 to generate the chemical solution by diluting or mixing the chemical solution.

In FIG. 2, the case where two measuring devices 1 are provided is illustrated, but the number of measuring devices 1 can be changed as appropriate.
In this case, the number and arrangement of the upper end detection units 3b and the distance between the lower end detection unit 3a and the upper end detection unit 3b in each of the plurality of measuring devices 1 should be appropriately changed according to the type and viscosity of the chemical solution. Can be done.
For example, the distance between the lower end detection unit 3a and the upper end detection unit 3b can be appropriately set according to the amount of the chemical solution supplied to the chemical solution storage unit 102 or the processing unit 103, which will be described later.

Further, when a plurality of measuring devices 1 are provided, pure water or the like can be measured by at least one measuring device 1.
That is, the chemical solution in the present specification may be any liquid, for example, a liquid containing a chemical substance, pure water for dilution, or the like.
The chemical solution can be, for example, hydrofluoric acid, ammonium fluoride, ammonia, sulfuric acid, hydrochloric acid, hydrogen peroxide, pure water for dilution, alcohol or the like.
In this case, highly volatile chemicals such as ammonia-based chemicals containing ammonium fluoride and alcohol-based chemicals are likely to generate bubbles. Therefore, it is difficult to accurately measure a highly volatile chemical solution without variation.
According to the measuring device 1 and the measuring system 11 according to the present embodiment, even a highly volatile chemical solution can be accurately measured without variation.
Therefore, the measured chemical solutions can be mixed to produce a stable chemical solution having a predetermined concentration.
For example, if pure water or the like is weighed by at least one measuring device 1, it is possible to suppress variations in the concentration of the diluted chemical solution.
Further, when two or more chemical solutions are mixed, it is possible to suppress variations in the component ratios of the chemical solutions produced by the mixing.

Next, the operation of the weighing system 11 will be described.
First, in the same manner as described above, one measuring device 1 measures the first chemical solution, and the other measuring device 1 measures the second chemical solution.
Next, the on-off valve 2e connected to the supply pipe 12b1 and the on-off valve 2e connected to the supply pipe 12b2 are opened, and the first chemical solution and the second chemical solution are simultaneously or sequentially supplied to the inside of the mixing container 12. Will be done.
The first chemical solution and the second chemical solution are mixed inside the mixing container 12, and a diluted chemical solution having a predetermined concentration or a chemical solution having a predetermined component ratio is produced.

Next, the on-off valve 2e connected to the supply pipe 12b1 and the on-off valve 2e connected to the supply pipe 12b2 are closed. After that, the on-off valves 15a and 15b are opened, and a gas having a predetermined pressure is supplied to the inside of the mixing container 12 via the gas control unit 14a.
The diluted chemical solution inside the mixing container 12 and the chemical solution generated by mixing are sent to the chemical solution storage unit 102 and the processing unit 103, which will be described later, via a pipe (not shown).

As described above, the diluted chemical solution and the chemical solution produced by mixing can be sent to the chemical solution storage unit 102, the processing unit 103, and the like.

In the above, the case where the chemical solution to be used for the treatment is produced by diluting or mixing the chemical solution has been illustrated, but the present invention is not limited to this.
For example, the amount of the chemical solution supplied to the processing unit 103 or the type of the chemical solution can be changed according to the material to be treated.
Further, if a part of the chemical solution component stored in the chemical solution storage unit 102 is consumed or a part of the chemical solution component is volatilized, the chemical solution component may be lost or insufficient. It is also possible to measure the liquid containing the above and supply it to the chemical liquid storage unit 102.

According to the measuring device 1 and the measuring system 11 according to the present embodiment, not only the amount of the chemical solution can be accurately measured, but also the chemical solution storage unit 102 and the processing unit 103 can be measured in the same amount and in the same state as when the measured chemical solution was measured. Can be sent to. Therefore, it is possible to suppress variations in the concentration of the diluted chemical solution. Alternatively, it is possible to suppress variations in the component ratio in the chemical solution produced by mixing.

[Third Embodiment]
Next, the processing apparatus 100 according to the third embodiment will be illustrated.
FIG. 3 is a block diagram for exemplifying the processing device 100 according to the third embodiment.
FIG. 3 shows a case where a plurality of measuring devices 1 and a mixing unit 13 are provided, that is, a case where a measuring system 11 is provided. The same can be applied when one measuring device 1 is provided.
As shown in FIG. 3, the processing device 100 is provided with a measuring system 11, a supply unit 101, a chemical liquid storage unit 102, a processing unit 103, and a control unit 106.

The supply unit 101 supplies the chemical solution to be weighed to the measuring device 1.
The chemical solution can be, for example, hydrofluoric acid, ammonium fluoride, ammonia, sulfuric acid, hydrochloric acid, hydrogen peroxide, pure water for dilution, or the like.
The supply unit 101 may, for example, supply the chemical solution by pressurizing with a gas, or may supply the chemical solution by a chemical pump or the like.

The chemical solution storage unit 102 stores the diluted chemical solution supplied from the measuring system 11 or the chemical solution produced by mixing.
Further, the chemical solution storage unit 102 supplies the stored chemical solution to the processing unit 103. The chemical solution storage unit 102 may, for example, supply the chemical solution by pressurizing with a gas, or may supply the chemical solution by a chemical pump or the like.

The chemical solution storage unit 102 is not always necessary, and the chemical solution diluted from the measuring system 11 or the chemical solution produced by mixing can be supplied to the processing unit 103.
However, if the chemical solution storage unit 102 is provided, the diluted chemical solution or the chemical solution produced by mixing can be stably supplied to the processing unit 103.

The processing unit 103 can be an etching device or a cleaning device that uses a diluted chemical solution or a chemical solution produced by mixing.
In this case, the processing unit 103 includes a single-wafer type device (for example, a device for supplying a chemical solution to a rotated processed object), a batch type device (for example, a device for immersing a plurality of processed objects in the chemical solution), and the like. can do.
Since a known etching device, cleaning device, or the like can be used for the processing unit 103, detailed description thereof will be omitted.
When the chemical solution measured by the measuring device 1 and the measuring system 11, the diluted chemical solution, and the chemical solution produced by mixing are used in, for example, an etching apparatus, fluctuations in the etching rate can be suppressed, so that the chemical solution is stable. Etching processing becomes possible.

It is also possible to provide a recovery device (not shown) to recover the chemical solution used in the processing unit 103, remove metal ions and the like, and then return the chemical solution to the chemical solution storage unit 102. That is, the chemical solution can be reused.
Further, when the chemical solution is circulated and reused, the chemical solution can be discarded depending on the deterioration state of the chemical solution, and a new chemical solution can be generated and used by the measuring device 1 and the measuring system 11.
The criteria for discarding the chemical solution or generating a new chemical solution can be appropriately determined based on the time required for the predetermined treatment, the detection result of deterioration of the chemical solution, and the like.
Further, a plurality of measuring devices 1 and measuring systems 11 can be installed to supply the chemical solution to the processing unit 103.

The control unit 106 controls the operation of each element provided in the processing device 100.
The control unit 106 controls, for example, the supply unit 101 to send the chemical solution to the measuring system 11.
For example, the control unit 106 controls the measuring system 11 to generate a diluted chemical solution or a chemical solution produced by mixing, and supplies these to the chemical solution storage unit 102.
The control unit 106 controls, for example, the chemical solution storage unit 102 to supply the stored chemical solution to the processing unit 103.
The control unit 106 controls, for example, the processing unit 103 to perform processing with a chemical solution on a processed object (for example, a semiconductor wafer or the like).

[Fourth Embodiment]
Next, the weighing method according to the fourth embodiment will be illustrated.
The measuring method according to the fourth embodiment can include, for example, the following steps.
A step of supplying a liquid to the inside of a tubular measuring tube 2a until a predetermined amount is reached.
A step of supplying a gas having a first pressure above the liquid inside the measuring tube 2a.
The process of reducing the pressure of the gas above the liquid to a predetermined value.
A step of supplying a gas having a second pressure above the liquid inside the measuring pipe 2a to discharge the liquid inside the measuring pipe 2a.
In this case, the first pressure can be higher than the second pressure.
Further, a step of mixing the liquids discharged from the inside of the plurality of measuring pipes 2a can be further provided.
Since the contents of each step can be the same as those described above, detailed description thereof will be omitted.

The embodiment has been illustrated above. However, the present invention is not limited to these descriptions.
With respect to the above-described embodiment, those skilled in the art appropriately adding, deleting or changing the design of components, or adding, omitting or changing the conditions of processes also have the features of the present invention. As long as it is included in the scope of the present invention.
For example, the shape, size, material, arrangement, number, and the like of each element provided in the measuring device 1 and the measuring system 11 are not limited to those illustrated, and can be changed as appropriate.
In addition, the elements included in each of the above-described embodiments can be combined as much as possible, and the combination thereof is also included in the scope of the present invention as long as the features of the present invention are included.

1 Weighing device, 2 Weighing unit, 2a measuring pipe, 2b discharge pipe, 2b1 opening, 2c exhaust pipe, 2c1 opening, 2d to 2g on-off valve, 3 detection part, 3a lower end detection part, 3b upper end detection part, 3b1 3b6 Upper end detection unit, 4 gas supply unit, 4a gas control unit, 5 introduction unit, 6 control unit, 11 measuring system, 12 mixing container, 13 mixing unit, 14 gas supply unit, 14a gas control unit, 15a on-off valve, 16 Control unit, 100 processing equipment, 101 supply unit, 102 chemical storage unit, 103 processing unit, 106 control unit

Claims (6)

A measuring tube that is tubular and is provided so that the first end is located above the second end to which the liquid is supplied.
A gas supply unit connected to the first end side of the measuring pipe and supplying gas to the measuring pipe,
At the second end, an introduction section that connects to the measuring tube and supplies the liquid to the measuring tube.
On the side of the second end, a discharge pipe connected to the measuring pipe and discharging the liquid measured by the measuring pipe to the outside.
A first detection unit that is provided on the first end side of the opening of the discharge pipe that opens inside the measuring pipe and detects the liquid inside the measuring pipe.
Has a control unit,
The control unit supplies the liquid to the inside of the measuring tube by the introduction unit, stops the supply of the liquid by detecting the liquid level of the liquid by the first detecting unit, and supplies the liquid to the measuring tube. After the gas is supplied above the liquid supplied to the measuring tube by the gas supply unit without being discharged from the water, the liquid level of the liquid is detected by the first detection unit, and the liquid level is detected by the first detection unit. When the liquid level of the liquid is not detected by the detection unit of the above, the liquid is supplied to the inside of the measuring pipe again by the introduction unit in a state where the liquid is not discharged from the measuring pipe, and the first detecting unit performs the liquid. A weighing device characterized in that the supply of the liquid is stopped by detecting the liquid level of the liquid. A plurality of the first detection units are provided on the measuring tube at predetermined intervals.
The measuring device according to claim 1, wherein the control unit stops the supply of the liquid by detecting the liquid level of the liquid by any one of the plurality of first detecting units provided. A plurality of weighing devices according to claim 1 or 2,
A mixing unit that mixes the liquids discharged from the plurality of measuring devices, and
A weighing system characterized by being equipped with. The weighing device according to claim 1 or 2, or the weighing system according to claim 3 and
A processing unit that processes a processed product using the measuring device or the liquid discharged from the measuring system, and a processing unit.
A processing device characterized by being equipped with. The process of supplying liquid to the inside of the tubular measuring tube until it reaches a predetermined amount,
A step of supplying gas above the liquid inside the measuring tube without discharging the liquid supplied to the inside of the measuring tube from the measuring tube.
When the liquid level of the liquid is not detected by the detection unit in the step of detecting the liquid level of the liquid by the detection unit provided in the measuring tube after the gas is supplied above the liquid, the liquid A measuring method characterized in that the liquid is supplied to the inside of the measuring pipe again in a state where the liquid is not discharged from the measuring pipe, and the supply of the liquid is stopped by detecting the liquid level of the liquid by the detecting unit. .. The step of detecting the liquid level of the liquid is performed by any one of a plurality of detection units provided on the measuring tube at predetermined intervals, and any of the plurality of detection units provided. The measuring method according to claim 5, wherein the supply of the liquid is stopped by detecting the liquid level of the liquid.

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