JP2020167220A - Sample holding tool - Google Patents

Sample holding tool Download PDF

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JP2020167220A
JP2020167220A JP2019064627A JP2019064627A JP2020167220A JP 2020167220 A JP2020167220 A JP 2020167220A JP 2019064627 A JP2019064627 A JP 2019064627A JP 2019064627 A JP2019064627 A JP 2019064627A JP 2020167220 A JP2020167220 A JP 2020167220A
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support
sample
sample holder
heat insulating
insulating material
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JP7244329B2 (en
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大野 達也
Tatsuya Ono
達也 大野
祥平 笈川
Shohei Oikawa
祥平 笈川
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Kyocera Corp
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Abstract

To provide a sample holding tool that is hardly affected by an external environment, and can quickly achieve and maintain a change in sample temperature and a uniform temperature distribution in a sample.SOLUTION: A sample holding tool 10 of the present disclosure comprises: a plate-like ceramic substrate 1 that has a top face 1a on which a sample can be placed; a base plate 2 that supports the ceramic substrate 1 from below; a coolant channel R that is formed inside the base plate 2; and a heat insulating material 3 that is disposed below the coolant channel R.SELECTED DRAWING: Figure 3

Description

本開示は、半導体集積回路の製造工程または液晶表示装置の製造工程等において用いられる、半導体ウエハ等の試料を保持する試料保持具に関する。 The present disclosure relates to a sample holder for holding a sample such as a semiconductor wafer, which is used in a manufacturing process of a semiconductor integrated circuit, a manufacturing process of a liquid crystal display device, or the like.

半導体製造装置等に用いられる試料保持具として、静電チャックが知られている。静電チャックは、ウエハ等の試料(被処理物またはワークともいう)を載置して吸着保持するための試料保持面を有する、試料保持部材(基体またはセラミック体ともいう)と、この試料保持部材を下側から支承する、金属製の支持部材(ベースプレートともいう)とを、接着剤等の接合材により接合して構成されている。 An electrostatic chuck is known as a sample holder used in a semiconductor manufacturing apparatus or the like. The electrostatic chuck is a sample holding member (also referred to as a substrate or a ceramic body) having a sample holding surface for placing and adsorbing and holding a sample (also referred to as an object or a work) such as a wafer, and this sample holding. It is configured by joining a metal support member (also called a base plate) that supports the member from below with a bonding material such as an adhesive.

試料保持具は、試料保持面に試料を載置または保持した状態で複数の処理工程を経ることから、試料を各処理に適した温度に変更および維持する必要がある。そのため、試料保持面に載置された試料の温度分布を均一にするための機構を備えている。なお、試料の温度分布が均一なことを均熱と、試料の温度分布を均一に維持または制御する機器性能を均熱性という場合がある。 Since the sample holder undergoes a plurality of treatment steps with the sample placed or held on the sample holding surface, it is necessary to change and maintain the sample at a temperature suitable for each treatment. Therefore, it is provided with a mechanism for making the temperature distribution of the sample placed on the sample holding surface uniform. The uniform temperature distribution of the sample may be referred to as heat equalization, and the device performance for maintaining or controlling the uniform temperature distribution of the sample may be referred to as heat equalization.

たとえば、試料保持具は、試料を目標とする温度まで上昇させるために、上側の試料保持部材の中に、該試料保持部材を通して試料を加熱し昇温させるための、ヒータ等の加熱装置を備える。また、下側の支持部材の中には、該支持部材および試料保持部材を介して試料を冷却または降温させるための、液体等の流体(熱媒体)を冷媒として流通させる流路と循環系とを備える冷却装置が、配設されている(特許文献1を参照)。 For example, the sample holder includes a heating device such as a heater for heating the sample through the sample holding member and raising the temperature in the upper sample holding member in order to raise the sample to a target temperature. .. Further, in the lower support member, a flow path and a circulation system for circulating a fluid (heat medium) such as a liquid as a refrigerant for cooling or lowering the temperature of the sample via the support member and the sample holding member are provided. A cooling device is provided (see Patent Document 1).

特開2017−143182号公報JP-A-2017-143182

ところで、試料の処理または加工のために、雰囲気温度等の環境が制御されている試料保持具上側(試料保持面側)の空間に対して、試料保持具下側(支持部材底面側)の環境は、それほど厳密な温度制御がなされているわけではない。 By the way, the environment on the lower side of the sample holder (bottom side of the support member) with respect to the space on the upper side (sample holding surface side) where the environment such as atmospheric temperature is controlled for processing or processing the sample. Is not so strict in temperature control.

そのため、試料保持具下側の環境温度の影響を受けて、試料保持面に保持された試料の温度分布がばらついたり、前述の加熱装置または冷却装置による加熱(昇温)または冷却(降温)の効率や、反応応答の早さが低下したりする場合があることが、分かってきた。 Therefore, due to the influence of the environmental temperature on the lower side of the sample holder, the temperature distribution of the sample held on the sample holding surface may vary, or heating (increasing) or cooling (lowering) by the above-mentioned heating device or cooling device may occur. It has been found that efficiency and speed of reaction response may decrease.

本開示の目的は、外部環境の影響を受け難く、試料温度の変更と、試料における温度分布の均一とを、素早く達成して維持することのできる試料保持具を提供することである。 An object of the present disclosure is to provide a sample holder that is not easily affected by the external environment and can quickly achieve and maintain a change in sample temperature and a uniform temperature distribution in a sample.

本開示の試料保持具は、試料を載置可能な上面を有する平板状の試料保持部材と、前記試料保持部材を下側から支承する支持部材と、該支持部材の内部に形成された冷媒の流路と、前記冷媒の流路の下側に配設された断熱材と、を備える。 The sample holder of the present disclosure includes a flat plate-shaped sample holding member having an upper surface on which a sample can be placed, a support member that supports the sample holding member from below, and a refrigerant formed inside the support member. It includes a flow path and a heat insulating material disposed below the flow path of the refrigerant.

本開示によれば、試料保持面に保持された試料は、試料保持具下方の外部環境から、熱あるいは温度の影響を受けることが抑制される。そのため、本開示の試料保持具は、試料温度の変更と、試料における温度分布の均一とを、素早く達成して維持することができる。 According to the present disclosure, the sample held on the sample holding surface is suppressed from being affected by heat or temperature from the external environment below the sample holding tool. Therefore, the sample holder of the present disclosure can quickly achieve and maintain a change in the sample temperature and a uniform temperature distribution in the sample.

実施形態の試料保持具の分解斜視図である。It is an exploded perspective view of the sample holder of an embodiment. 実施形態の試料保持具の組み立て後の斜視図である。It is a perspective view after assembling the sample holder of an embodiment. 第1実施形態の試料保持具の要部構成の配置を示す断面図である。It is sectional drawing which shows the arrangement of the main part structure of the sample holder of 1st Embodiment. 第2実施形態の試料保持具の要部構成の配置を示す断面図である。It is sectional drawing which shows the arrangement of the main part structure of the sample holder of 2nd Embodiment. 第3実施形態の試料保持具の要部構成の配置を示す断面図である。It is sectional drawing which shows the arrangement of the main part structure of the sample holder of the 3rd Embodiment. 第4実施形態の試料保持具の要部構成の配置を示す断面図である。It is sectional drawing which shows the arrangement of the main part structure of the sample holder of 4th Embodiment. 第5実施形態の試料保持具の要部構成の配置を示す断面図である。It is sectional drawing which shows the arrangement of the main part structure of the sample holder of 5th Embodiment. 第6実施形態の試料保持具の要部構成の配置を示す断面図である。It is sectional drawing which shows the arrangement of the main part composition of the sample holder of 6th Embodiment. (a)は第7実施形態の試料保持具の断面図であり、(b)は(a)のP部拡大図、(c)は(b)の変形例を示す。(A) is a cross-sectional view of the sample holder of the seventh embodiment, (b) is an enlarged view of part P of (a), and (c) shows a modified example of (b). (a)は第8実施形態の試料保持具の断面図であり、(b)は(a)のQ部拡大図、(c)は(b)の変形例を示す。(A) is a cross-sectional view of the sample holder of the eighth embodiment, (b) is an enlarged view of the Q part of (a), and (c) shows a modified example of (b).

以下、本開示の実施形態について、図面を用いて説明する。
なお、各図面において説明を行わない試料保持具の構成、たとえば、ヘリウム等の気体が流過するガス流路やガスの噴気口、電気配線、および試料保持具に冷媒を供給する機構等は、図示を省略している。
Hereinafter, embodiments of the present disclosure will be described with reference to the drawings.
The configuration of the sample holder, which is not described in each drawing, for example, the gas flow path through which a gas such as helium flows, the gas fumarole, the electrical wiring, and the mechanism for supplying the refrigerant to the sample holder are described. The illustration is omitted.

実施形態で説明する第1〜第8実施形態の試料保持具10,20,30,40,50,60,70,80は、半導体集積回路の製造工程において、セラミック基体1の内部に配設された半円状の電極E1,E2間に電流を印加することにより発生する静電力によって、試料保持面である基体上面1aに載置された半導体ウエハ等の試料(通称ワーク:図示省略)を、静電吸着して試料保持面上に位置固定する、静電チャックである。 The sample holders 10, 20, 30, 40, 50, 60, 70, 80 of the first to eighth embodiments described in the embodiment are arranged inside the ceramic substrate 1 in the manufacturing process of the semiconductor integrated circuit. Due to the electrostatic force generated by applying an electric current between the semicircular electrodes E1 and E2, a sample (commonly known as a work: not shown) such as a semiconductor wafer placed on the upper surface 1a of the substrate, which is a sample holding surface, is moved. An electrostatic chuck that electrostatically attracts and fixes its position on the sample holding surface.

各実施形態の試料保持具は、共通の基本構成を有する。代表して示す、第1実施形態の試料保持具10の分解斜視図である図1、および、その組み立て後の斜視図である図2に示すように、各試料保持具は、上側の、絶縁体からなる円板状の基体(セラミック基体1)の下側に、後述する接着剤等を接合材4として用いて、金属からなる円板状の支持体(ベースプレート2)を接合し、構成されている。セラミック基体1は、本開示の試料保持部材の一例であり、ベースプレート2は、本開示の支持部材の一例である。 The sample holders of each embodiment have a common basic configuration. As shown in FIG. 1 which is an exploded perspective view of the sample holder 10 of the first embodiment and FIG. 2 which is a perspective view after assembly thereof, each sample holder is insulated from the upper side. A disk-shaped support made of metal (base plate 2) is joined to the lower side of a disk-shaped substrate (ceramic substrate 1) made of a body by using an adhesive or the like described later as a bonding material 4. ing. The ceramic substrate 1 is an example of the sample holding member of the present disclosure, and the base plate 2 is an example of the supporting member of the present disclosure.

なお、隠れ線(点線)で示す、ベースプレート2の内部に形成された冷媒の流路(以下、冷媒流路R)およびその導入口(インレット)および導出口(アウトレット)は、代表的な形状のものを簡略化して描いている。たとえば、実施形態においては同心円状の複数の流路として例示しているが、その配列・配置はこれに限定されるものではなく、蛇行状や放射状に配置されていてもよい。また、導入口および導出口も、流路の形状・配置に対応して、他の位置に設けられる場合がある。 The refrigerant flow path (hereinafter, refrigerant flow path R) formed inside the base plate 2 and its introduction port (inlet) and outlet port (outlet), which are indicated by hidden lines (dotted lines), have typical shapes. Is simplified and drawn. For example, in the embodiment, it is illustrated as a plurality of concentric flow paths, but the arrangement / arrangement thereof is not limited to this, and may be arranged in a meandering shape or in a radial pattern. Further, the inlet and the outlet may also be provided at other positions according to the shape and arrangement of the flow path.

そして、各実施形態の試料保持具に共通の構成は、図3の第1実施形態に示すように、試料保持面(基体上面1a)を有するセラミック基体1と、支持部材であるベースプレート2の内部に形成された冷媒流路Rとを含む試料保持具10において、冷媒流路Rの下方または下側の位置に、断熱層を形成する断熱材3を備える点である。 As shown in the first embodiment of FIG. 3, the configuration common to the sample holders of each embodiment is the inside of the ceramic substrate 1 having the sample holding surface (base upper surface 1a) and the base plate 2 which is the support member. In the sample holder 10 including the refrigerant flow path R formed in the above, a heat insulating material 3 for forming a heat insulating layer is provided at a position below or below the refrigerant flow path R.

試料保持具の詳細な構成について、試料保持具10(図3)を用いて説明する。なお、後記の試料保持具20〜80に関する、試料保持具10と同じ構成は、同じ符号を付して、その詳細な説明を省略する。 The detailed configuration of the sample holder will be described with reference to the sample holder 10 (FIG. 3). The same configurations as those of the sample holders 10 with respect to the sample holders 20 to 80 described later are designated by the same reference numerals, and detailed description thereof will be omitted.

試料保持具10のセラミック基体1は、全体形状が円板状で、主面である基体上面1aが、試料保持面となっている。セラミック基体1(試料保持部材)の構成材料は、たとえばアルミナ、窒化アルミニウム、窒化珪素、またはイットリア等とすることができる。 The ceramic substrate 1 of the sample holder 10 has a disk shape as a whole, and the upper surface 1a of the substrate, which is the main surface, serves as the sample holding surface. The constituent material of the ceramic substrate 1 (sample holding member) can be, for example, alumina, aluminum nitride, silicon nitride, yttria, or the like.

セラミック基体1は、その内部に、前述の静電吸着用の電極E1,E2を備える。さらに、セラミック基体1は、その内部に、基体上面1aに載置された試料を加熱し昇温させるための、ヒータH等の加熱装置を備えている。 The ceramic substrate 1 is provided with the above-mentioned electrodes E1 and E2 for electrostatic adsorption inside. Further, the ceramic substrate 1 is provided with a heating device such as a heater H for heating and raising the temperature of the sample placed on the upper surface 1a of the substrate.

なお、セラミック基体1は、板状の部材であるが、外形形状は限定されず、例のような円板(円盤)状のほか、角板状、多角形状等としてもよい。 The ceramic substrate 1 is a plate-shaped member, but the outer shape is not limited, and the ceramic substrate 1 may have a disk shape as in the example, a square plate shape, a polygonal shape, or the like.

セラミック基体1と後記のベースプレート2との間は、接合材4を用いて接合される。接合材4としては、シリコーン樹脂またはフッ素樹脂等からなる接着剤を用いることができる。 The ceramic substrate 1 and the base plate 2 described later are joined by using a joining material 4. As the bonding material 4, an adhesive made of silicone resin, fluororesin, or the like can be used.

ベースプレート2は、セラミック基体1を下側から支持・支承する部材である。ベースプレート2を構成する材料としては、アルミニウム等の金属を用いることができる。ベースプレート2の外形形状は特に限定されず、円形状のほか、四角形状、多角形状等、前述のセラミック基体1の形状に対応した外形形状とされる。 The base plate 2 is a member that supports and supports the ceramic substrate 1 from below. As a material constituting the base plate 2, a metal such as aluminum can be used. The outer shape of the base plate 2 is not particularly limited, and the outer shape corresponds to the shape of the ceramic substrate 1 described above, such as a circular shape, a quadrangular shape, and a polygonal shape.

ベースプレート2は、その内部、この例ではベースプレート2の厚み(高さ)方向でかつ図示上下方向の中央付近に、1つ(1本)以上の溝形状の冷媒流路Rが設けられている。なお、先にも述べたが、冷媒流路Rは、水平方向(平面視)において同心円状または、蛇行状や放射状等に配置されるため、縦方向断面を表す図3〜図8における冷媒流路Rの図示本数は、実際の溝形状の本数とは必ずしも一致しない。 The base plate 2 is provided with one (one) or more groove-shaped refrigerant flow paths R inside, in this example, in the thickness (height) direction of the base plate 2 and near the center in the vertical direction shown in the drawing. As described above, since the refrigerant flow paths R are arranged concentrically, meanderingly, radially, or the like in the horizontal direction (plan view), the refrigerant flow in FIGS. 3 to 8 showing the vertical cross section. The number of roads R shown does not necessarily match the actual number of groove shapes.

さらに、実施形態におけるベースプレート2は、前述の冷媒流路Rの溝形状の形状加工(彫り込み形成または型成形等)のために、少なくとも流路の上端位置または下端位置で、上下方向に複数のブロックに分割される場合がある。 Further, the base plate 2 in the embodiment has a plurality of blocks in the vertical direction at least at the upper end position or the lower end position of the flow path for the groove shape processing (engraving formation, mold molding, etc.) of the refrigerant flow path R described above. It may be divided into.

実施形態においては、分割可能なベースプレート2のブロックのうち、上側の、セラミック基体1側に位置するものを第1支持体2Aと呼び、下側の、試料保持具外側に位置するブロックを第2支持体2Bと呼ぶ。なお、第1支持体2Aと第2支持体2Bとは、材質等を含め、形状以外の性質に特に差異はない。したがって、後記の図4および図6〜図8のように、分離・分割可能ではあるが、構成上、特に分ける必要がなく、一体と見なすことができる場合は、上記のような個別の呼称は使用せず、図面では同じハッチングを続けて施して、1つの部材名称(ベースプレート2)として呼称する場合もある。断面図中の点線は、一体化されたベースプレート2中の、分割可能な位置を示す。 In the embodiment, among the blocks of the divisible base plate 2, the block located on the upper side of the ceramic substrate 1 is called the first support 2A, and the lower block located on the outer side of the sample holder is called the second support. It is called the support 2B. There is no particular difference between the first support 2A and the second support 2B in properties other than the shape, including the material. Therefore, as shown in FIGS. 4 and 6 to 8 described later, when they can be separated and divided, but there is no particular need to separate them in terms of configuration and they can be regarded as one, the above-mentioned individual names are used. It may not be used, and the same hatching may be continuously applied in the drawings to refer to it as one member name (base plate 2). Dotted lines in the cross-sectional view indicate divisible positions in the integrated base plate 2.

また、第1〜第6実施形態は、上側の第1支持体2Aと下側の第2支持体2Bとが同じ外径、同じ直径のベースプレート2を用いた例であるが、これら両者の直径・寸法が異なっている場合を、後記の第7,第8実施形態において説明する。 Further, the first to sixth embodiments are examples in which the upper first support 2A and the lower second support 2B use the base plate 2 having the same outer diameter and the same diameter, but the diameters of both of them. -The case where the dimensions are different will be described in the seventh and eighth embodiments described later.

前述のように、ベースプレート2が、上側の第1支持体2Aと下側の第2支持体2Bとに分割可能な、第1実施形態の試料保持具10においては、冷媒流路Rを構成する溝構造または溝構造部は、第2支持体2Bと対向する第1支持体2Aの下面に、上向き凹状、すなわち下方に向けて下面に開口する溝形状に、形成されている。 As described above, in the sample holder 10 of the first embodiment in which the base plate 2 can be divided into the upper first support 2A and the lower second support 2B, the refrigerant flow path R is formed. The groove structure or the groove structure portion is formed on the lower surface of the first support 2A facing the second support 2B in an upward concave shape, that is, in a groove shape that opens downward to the lower surface.

そして、第1支持体2Aと第2支持体2Bとの間を断熱する断熱材3は、第1支持体2Aと第2支持体2Bとの間に配設され、第1支持体2Aの下面に当接して、この下面に開口する溝構造の開口を覆うまたは塞ぐことにより、冷媒流路Rからの冷媒の漏れを防止している。これにより、第1支持体2Aと断熱材3との接触する面積を減らすことができる。その結果、試料保持具下方の外部環境の熱が試料まで伝わりにくくすることができる。 The heat insulating material 3 that insulates between the first support 2A and the second support 2B is arranged between the first support 2A and the second support 2B, and is arranged between the first support 2A and the second support 2B, and is the lower surface of the first support 2A. By covering or closing the opening of the groove structure that opens on the lower surface, the leakage of the refrigerant from the refrigerant flow path R is prevented. As a result, the area of contact between the first support 2A and the heat insulating material 3 can be reduced. As a result, it is possible to make it difficult for the heat of the external environment below the sample holder to be transferred to the sample.

断熱材3を構成する材料としては、たとえば、樹脂からなる発泡体等を好適に使用することができる。具体例としては、シリコーン樹脂系の接着剤、ウレタン樹脂製の発泡体(シート)、あるいは、ポリエステル樹脂の不織布等があげられる。 As the material constituting the heat insulating material 3, for example, a foam made of resin or the like can be preferably used. Specific examples include a silicone resin-based adhesive, a foam (sheet) made of urethane resin, and a non-woven fabric made of polyester resin.

また、前述した断熱材3を構成する材料は、ベースプレート2(第1支持体2Aおよび第2支持体2Bを含む)を構成する材料(この例ではアルミ)より、線膨張係数の低い材料が選択されている。これにより、第1支持体2A側から第2支持体2B側に伝わる応力あるいは第2支持体2B側から第1支持体2A側に伝わる応力が緩和されるため、断熱材3に剥がれまたは剥離が生じるのを抑制することができる。 Further, as the material constituting the heat insulating material 3 described above, a material having a lower coefficient of linear expansion than the material (aluminum in this example) constituting the base plate 2 (including the first support 2A and the second support 2B) is selected. Has been done. As a result, the stress transmitted from the first support 2A side to the second support 2B side or the stress transmitted from the second support 2B side to the first support 2A side is relaxed, so that the heat insulating material 3 is peeled off or peeled off. It can be suppressed from occurring.

以上の試料保持具10の構成によれば、試料保持面1aに保持された試料(図示省略)が、試料保持具10の下方の外部環境から、熱あるいは温度の影響を受けることを抑制することができる。したがって、第1実施形態の試料保持具10は、セラミック基体1に内蔵されたヒータH等の加熱装置および冷媒流路R内を流れる冷媒を使用する冷却装置による試料温度の変更と、試料における温度分布の均一(均熱)とを、素早く達成し維持することができる。 According to the above configuration of the sample holder 10, it is possible to prevent the sample (not shown) held on the sample holding surface 1a from being affected by heat or temperature from the external environment below the sample holder 10. Can be done. Therefore, in the sample holder 10 of the first embodiment, the sample temperature is changed by the heating device such as the heater H built in the ceramic substrate 1 and the cooling device using the refrigerant flowing in the refrigerant flow path R, and the temperature in the sample. Uniformity of distribution (uniform heat) can be quickly achieved and maintained.

従来、断熱材3が冷媒流路Rの上方に設けられる場合は、冷媒流路Rと試料保持面(上面1a)と間に、断熱材3が位置するため、冷媒による試料保持面の冷却が妨げられるおそれがあった。 Conventionally, when the heat insulating material 3 is provided above the refrigerant flow path R, the heat insulating material 3 is located between the refrigerant flow path R and the sample holding surface (upper surface 1a), so that the sample holding surface can be cooled by the refrigerant. There was a risk of being hindered.

しかしながら、本開示によれば、冷媒流路Rの下方または下側の位置に、断熱材3が位置しているため、冷媒流路Rと試料保持面と間に、断熱材が配設されることなく、試料保持具10の下方の外部の環境から、熱あるいは温度の影響を受けることを抑制することができる。その結果、冷媒による試料保持面の冷却を妨げることなく、試料の均熱を、素早くかつ効率的に達成することができた。 However, according to the present disclosure, since the heat insulating material 3 is located below or below the refrigerant flow path R, the heat insulating material is arranged between the refrigerant flow path R and the sample holding surface. Without this, it is possible to suppress the influence of heat or temperature from the external environment below the sample holder 10. As a result, the soaking of the sample could be achieved quickly and efficiently without hindering the cooling of the sample holding surface by the refrigerant.

なお、断熱材3の配置は、冷媒流路Rの下側または下方に配設されていればよく、種々の変更が可能である。 The arrangement of the heat insulating material 3 may be arranged below or below the refrigerant flow path R, and various changes can be made.

たとえば、図4に示す第2実施形態の試料保持具20の場合、冷媒流路Rは、第1支持体2Aの下面ではなく、第1支持体2Aの上下(高さ)方向中央付近に配置されている。この場合も、試料保持具10と同じく、断熱材3を第1支持体2Aと第2支持体2Bとの間に配設すれば、第1実施形態と同様の効果を奏することができる。 For example, in the case of the sample holder 20 of the second embodiment shown in FIG. 4, the refrigerant flow path R is arranged not on the lower surface of the first support 2A but near the center in the vertical (height) direction of the first support 2A. Has been done. In this case as well, if the heat insulating material 3 is arranged between the first support 2A and the second support 2B as in the sample holder 10, the same effect as that of the first embodiment can be obtained.

また、図5に示す第3実施形態の試料保持具30のように、試料保持具30の下面(底面)、すなわち、冷媒流路Rの下方に離れた第2支持体2Bの下面に断熱材3を取り付けても、第1実施形態と同様の効果を奏することができる。 Further, as in the sample holder 30 of the third embodiment shown in FIG. 5, a heat insulating material is provided on the lower surface (bottom surface) of the sample holder 30, that is, the lower surface of the second support 2B separated below the refrigerant flow path R. Even if 3 is attached, the same effect as that of the first embodiment can be obtained.

さらに、図6に示す第4実施形態の試料保持具40、図7に示す第5実施形態の試料保持具50および図8に示す第6実施形態の試料保持具60のように、断熱材3の端部(端面)が試料保持具の端面に露出せず、断熱材3の全体が試料保持具の中に埋没するよう形成されている場合も、同様である。 Further, as in the sample holder 40 of the fourth embodiment shown in FIG. 6, the sample holder 50 of the fifth embodiment shown in FIG. 7, and the sample holder 60 of the sixth embodiment shown in FIG. 8, the heat insulating material 3 is further formed. The same applies when the end portion (end face) of the sample holder is not exposed on the end face of the sample holder and the entire heat insulating material 3 is formed so as to be buried in the sample holder.

すなわち、図6に示す第4実施形態の試料保持具40の場合、断熱材3は、第1実施形態の試料保持具10と同様、冷媒流路Rの溝構造部の下側に当接するよう配置されている。 That is, in the case of the sample holder 40 of the fourth embodiment shown in FIG. 6, the heat insulating material 3 abuts on the lower side of the groove structure portion of the refrigerant flow path R as in the sample holder 10 of the first embodiment. Have been placed.

また、図7に示す第5実施形態の試料保持具50の場合、図中に点線で示す分割可能な位置に沿って、その上側の部材(第2実施形態の試料保持具20における第1支持体2Aに相当)の下面に形成された上向き凹部(開口は下向き)の空間の中に、断熱材3が嵌め込まれている。 Further, in the case of the sample holder 50 of the fifth embodiment shown in FIG. 7, the member above the sample holder 50 (the first support in the sample holder 20 of the second embodiment) along the divisible position shown by the dotted line in the figure. The heat insulating material 3 is fitted in the space of the upward concave portion (opening is downward) formed on the lower surface of the body 2A).

さらに、図8に示す第6実施形態の試料保持具60の場合も、図中に点線で示す分割可能な位置に沿って、そのした側の部材(第2実施形態の試料保持具20における第2支持体2Bに相当)の上面に形成された凹部(開口上向き)の空間の中に、断熱材3が嵌め込まれている。 Further, also in the case of the sample holder 60 of the sixth embodiment shown in FIG. 8, the member on the side thereof (the third member of the sample holder 20 of the second embodiment) along the divisible position shown by the dotted line in the figure. The heat insulating material 3 is fitted in the space of the concave portion (opening upward) formed on the upper surface of the 2 support 2B).

以上の、断熱材3の全体が各試料保持具40,50,60の中に埋没するよう配設された実施形態においても、断熱材3はいずれも、冷媒流路Rの下側あるいは下方に配設されていることから、第1,第2実施形態と同様の効果を奏することができる。 Even in the above-described embodiment in which the entire heat insulating material 3 is buried in the sample holders 40, 50, 60, the heat insulating material 3 is located below or below the refrigerant flow path R. Since it is arranged, the same effect as that of the first and second embodiments can be obtained.

前述の第1,第2実施形態は、ベースプレート2を構成する、上側の第1支持体2Aと下側の第2支持体2Bとが、同じ外形形状で同径の場合について述べたものであるが、つぎに、第1支持体2Aの直径第2支持体2Bの直径とが異なっている、すなわち、両者が同径でない場合について説明する。 The first and second embodiments described above describe a case where the upper first support 2A and the lower second support 2B constituting the base plate 2 have the same outer shape and the same diameter. However, next, a case where the diameter of the first support 2A is different from the diameter of the second support 2B, that is, both are not the same diameter will be described.

図9に示す第7実施形態は、下側の第2支持体2Bの直径が上側の第1支持体2Aの直径よりも大きい試料保持具70について説明する図であり、図10に示す第8実施形態は、下側の第2支持体2Bの直径が上側の第1支持体2Aの直径よりも小さい試料保持具80について説明する図である。 The seventh embodiment shown in FIG. 9 is a diagram for explaining the sample holder 70 in which the diameter of the lower second support 2B is larger than the diameter of the upper first support 2A, and is the eighth embodiment shown in FIG. The embodiment is a diagram illustrating a sample holder 80 in which the diameter of the lower second support 2B is smaller than the diameter of the upper first support 2A.

まず、図9(a)に示す試料保持具70において、断熱材3は、冷媒流路Rよりも下側で、かつ、ベースプレート2(第2支持体2B)の下面よりも上側の位置に配設されている。また、断熱材3の水平方向の端面3aは、ベースプレート2の端面2cから露出している。 First, in the sample holder 70 shown in FIG. 9A, the heat insulating material 3 is arranged at a position below the refrigerant flow path R and above the lower surface of the base plate 2 (second support 2B). It is installed. Further, the horizontal end surface 3a of the heat insulating material 3 is exposed from the end surface 2c of the base plate 2.

ここで、ベースプレート2を構成する、第1支持体2Aの直径は、第2支持体2Bの直径よりも小さい。そのため、ヒータに近い第1支持体2Aの体積を小さく、第2支持体2Bの体積を大きくできる。言い換えれば、ヒータに近い第1支持体2Aの熱膨張を低減しつつ、第2支持体2Bの熱容量を増やすことができる。 Here, the diameter of the first support 2A constituting the base plate 2 is smaller than the diameter of the second support 2B. Therefore, the volume of the first support 2A close to the heater can be reduced and the volume of the second support 2B can be increased. In other words, the heat capacity of the second support 2B can be increased while reducing the thermal expansion of the first support 2A close to the heater.

したがって、この構成により、第1支持体2Aの熱膨張により第1支持体2Aと第2支持体2Bとの間に応力が集中し、破損してしまうおそれを低減しつつ、試料保持具下方の外部環境の熱が試料まで伝わりにくくすることができる。 Therefore, with this configuration, stress is concentrated between the first support 2A and the second support 2B due to thermal expansion of the first support 2A, and the possibility of damage is reduced while reducing the possibility of damage to the lower part of the sample holder. It is possible to make it difficult for the heat of the external environment to be transferred to the sample.

加えて、断熱材3の端面3aは、図9(b)に示すように、上下方向(鉛直方向)に対して傾斜する傾斜面になっている。すなわち、断熱材3のうち、ヒータの近くに位置する第1支持体2Aに接する部分が小さく、試料保持具下方の外部装置の近くに位置する第2支持体2Bに接する部分が大きくなっている。 In addition, as shown in FIG. 9B, the end surface 3a of the heat insulating material 3 is an inclined surface that is inclined with respect to the vertical direction (vertical direction). That is, in the heat insulating material 3, the portion in contact with the first support 2A located near the heater is small, and the portion in contact with the second support 2B located near the external device below the sample holder is large. ..

これにより、第1支持体2Aの熱膨張によって第1支持体2Aと断熱材3との間に応力が集中し、破損してしまうおそれを低減しつつ、試料保持具下方の外部環境の熱が第2支持体2Bを介して第1支持体2Aまで伝わりにくくすることができる。 As a result, stress is concentrated between the first support 2A and the heat insulating material 3 due to the thermal expansion of the first support 2A, and the heat of the external environment below the sample holder is reduced while reducing the risk of damage. It is possible to make it difficult to transmit to the first support 2A via the second support 2B.

なお、断熱材3の端面3aは、図9(c)に示すように、湾曲する曲面で構成してもよい。 As shown in FIG. 9C, the end surface 3a of the heat insulating material 3 may be formed of a curved curved surface.

このように、断熱材3の端面3aの形状を、角部に応力の集中することのない形状とすることにより、断熱材3の端部(露出部)を起点に発生する、断熱材3の、第1支持体2Aまたは第2支持体2Bからの剥がれの発生を、抑制することができる。 In this way, by making the shape of the end surface 3a of the heat insulating material 3 into a shape in which stress is not concentrated on the corners, the heat insulating material 3 is generated from the end portion (exposed portion) of the heat insulating material 3. , The occurrence of peeling from the first support 2A or the second support 2B can be suppressed.

また、第1支持体2Aの直径が、第2支持体2Bの直径よりも大きい場合も同様である。すなわち、図10(a)に示す試料保持具80において、ベースプレート2の端面2cから露出する、断熱材3の端面3aは、図10(b)に示すように、上下方向(鉛直方向)に対して傾斜する傾斜面になっている。 The same applies when the diameter of the first support 2A is larger than the diameter of the second support 2B. That is, in the sample holder 80 shown in FIG. 10A, the end surface 3a of the heat insulating material 3 exposed from the end surface 2c of the base plate 2 is in the vertical direction (vertical direction) as shown in FIG. 10B. It is an inclined surface that slopes.

なお、第7実施形態と同様、試料保持具80の断熱材3の端面3aも、図10(c)に示すように、湾曲する曲面としてもよい。 As in the seventh embodiment, the end face 3a of the heat insulating material 3 of the sample holder 80 may also have a curved curved surface as shown in FIG. 10C.

以上の構成により、応力が集中することに起因する、断熱材3の端部(露出部)を起点に発生する断熱材3の剥離を、抑制することができる。 With the above configuration, it is possible to suppress the peeling of the heat insulating material 3 that occurs starting from the end portion (exposed portion) of the heat insulating material 3 due to the concentration of stress.

1 セラミック基体
1a 基体上面(試料保持面)
2 ベースプレート
2A 第1支持体
2B 第2支持体
2c 端面
3 断熱材
3a 端面
4 接合材
10,20,30,40,50,60,70,80 試料保持具
H ヒータ
R 冷媒流路
1 Ceramic substrate 1a Upper surface of the substrate (sample holding surface)
2 Base plate 2A 1st support 2B 2nd support 2c End face 3 Insulation material 3a End face 4 Joining material 10, 20, 30, 40, 50, 60, 70, 80 Sample holder H Heater R Refrigerant flow path

Claims (6)

試料を載置可能な上面を有する平板状の試料保持部材と、
前記試料保持部材を下側から支承する支持部材と、
該支持部材の内部に形成された冷媒の流路と、
前記冷媒の流路の下側に配設された断熱材と、を備える試料保持具。
A flat sample holding member having an upper surface on which a sample can be placed,
A support member that supports the sample holding member from below, and
The flow path of the refrigerant formed inside the support member and
A sample holder comprising a heat insulating material disposed below the flow path of the refrigerant.
前記断熱材が、前記冷媒の流路よりも下側で、かつ、前記支持部材の下面よりも上側の位置に配設され、該断熱材の水平方向端面が、前記支持部材の端面から露出している、請求項1に記載の試料保持具。 The heat insulating material is disposed at a position below the flow path of the refrigerant and above the lower surface of the support member, and the horizontal end surface of the heat insulating material is exposed from the end surface of the support member. The sample holder according to claim 1. 前記水平方向端面が、鉛直方向に対して傾斜する傾斜面または曲面で構成されている請求項2に記載の試料保持具。 The sample holder according to claim 2, wherein the horizontal end face is formed of an inclined surface or a curved surface that is inclined with respect to the vertical direction. 前記断熱材は、前記支持部材よりも線膨張係数が小さい、請求項1〜3のいずれか1つに記載の試料保持具。 The sample holder according to any one of claims 1 to 3, wherein the heat insulating material has a coefficient of linear expansion smaller than that of the support member. 前記支持部材は、上側の、前記試料保持部材側に位置する板状の第1支持体と、該第1支持体の下側に位置する板状の第2支持体と、を含み、
前記第1支持体は、前記第2支持体と対向する下面に、前記冷媒の流路となる上向き凹状の溝構造部を含み、
前記断熱材は、前記第1支持体と前記第2支持体との間に配設されている、請求項1〜4のいずれか1つに記載の試料保持具。
The support member includes an upper plate-shaped first support located on the sample holding member side and a plate-shaped second support located on the lower side of the first support.
The first support includes an upward concave groove structure portion that serves as a flow path for the refrigerant on the lower surface facing the second support.
The sample holder according to any one of claims 1 to 4, wherein the heat insulating material is disposed between the first support and the second support.
前記第1支持体および前記第2支持体はともに円板状であり、
前記円板状第1支持体の直径は、前記円板状第2支持体の直径よりも小さい、請求項5に記載の試料保持具。
Both the first support and the second support have a disc shape.
The sample holder according to claim 5, wherein the diameter of the disc-shaped first support is smaller than the diameter of the disc-shaped second support.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06181186A (en) * 1992-12-11 1994-06-28 Tokyo Electron Ltd Joint
JP2007266342A (en) * 2006-03-29 2007-10-11 Tokyo Electron Ltd Mounting stand and vacuum processor
JP2011205000A (en) * 2010-03-26 2011-10-13 Tokyo Electron Ltd Mount table
WO2016067785A1 (en) * 2014-10-30 2016-05-06 東京エレクトロン株式会社 Substrate placing table
JP2017126641A (en) * 2016-01-13 2017-07-20 日本特殊陶業株式会社 Holding device
JP2019021845A (en) * 2017-07-20 2019-02-07 東京エレクトロン株式会社 Substrate mounting table and substrate inspection apparatus

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06181186A (en) * 1992-12-11 1994-06-28 Tokyo Electron Ltd Joint
JP2007266342A (en) * 2006-03-29 2007-10-11 Tokyo Electron Ltd Mounting stand and vacuum processor
JP2011205000A (en) * 2010-03-26 2011-10-13 Tokyo Electron Ltd Mount table
WO2016067785A1 (en) * 2014-10-30 2016-05-06 東京エレクトロン株式会社 Substrate placing table
JP2017126641A (en) * 2016-01-13 2017-07-20 日本特殊陶業株式会社 Holding device
JP2019021845A (en) * 2017-07-20 2019-02-07 東京エレクトロン株式会社 Substrate mounting table and substrate inspection apparatus

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