JP2020095958A - Particle beam system and method for operating particle beam system - Google Patents

Abstract

To provide a method for preventing a degradation in particle beam precision of a second particle beam column due to an electrostatic field produced in a first particle beam column.SOLUTION: A particle beam system 1 includes a first particle beam column 3 (for example, an electron beam column) and a second particle beam column 5 (for example, an ion beam column). In a first operating mode of the particle beam system, an end cap 61 arranged in an opening 63 is arranged outside a beam path 22 of a first particle beam 21 (for example, an electron beam). In a second operating mode of the particle beam system, the end cap is arranged so that the beam path of the first particle beam can pass through the opening of the end cap so that secondary particles coming from a work region 53 pass through the opening of the end cap to reach a detector 39 within the first particle beam column.SELECTED DRAWING: Figure 2

Description

The present invention relates to a particle beam system for treating an object and a method of operating a particle beam system.

It is an object of the invention to provide a particle beam system and a method for operating a particle beam system in which an object can be processed with the maximum possible precision.

One aspect of the invention relates to a particle beam system for treating an object. The particle beam system includes a first particle beam train and a second particle beam train having a common working area. The first particle beam train is configured to generate a first particle beam and the second particle beam train is configured to generate a second particle beam. The objects to be treated can be arranged in a common working area so that both the first particle beam and the second particle beam can be directed (simultaneously) onto the same area of the object. The principal axis of the first particle beam train and the principal axis of the second particle beam train may be arranged at an angle of about 54° with respect to each other.

The first particle beam train includes therein one or more detectors for detecting secondary particles. For ease of explanation, the detector will be referred to below only in its singular form. Secondary particles may be generated by both the interaction of the object with the first particle beam and the interaction of the object with the second particle beam. Here, the secondary particles particularly refer to backscattered electrons, secondary electrons, or secondary ions.

The particle beam system further includes an end cap having an aperture disposed therein.

The particle beam system can be operated in the first mode of operation. In the first mode of operation, the end cap is located outside the beam path of the first particle beam. In addition, the end cap in the first mode of operation is located outside the beam path of the second particle beam, so that the end cap in the first mode of operation includes the beam path of the first particle beam and the second particle beam. Substantially does not affect the beam path of the particle beam or the trajectories of secondary particles.

The particle beam system may also be operated in the second mode of operation. In the second mode of operation, the endcap is arranged so that the beam path of the first particle beam can pass through the opening of the endcap and secondary particles coming from the common working area pass through the opening of the endcap. Arranged to reach the detectors in one particle beam train. If the first particle beam in the second mode of operation is directed onto the object, then the first particle beam will pass through the opening of the end cap. In the second mode of operation, secondary particles traveling to the detector in the first train of particle beams further pass through the opening in the end cap.

The first particle beam train may be an electron beam train, which means that the first particle beam train may be an electron beam. Alternatively, the first particle beam train may be an ion beam train, which means that the first particle beam train may be an ion beam.

The second particle beam train may be an electron beam train, which means that the second particle beam train may be an electron beam. Alternatively, the second particle beam train may be an ion beam train, which means that the second particle beam may be an ion beam.

The first train of particle beams may include at least one electrode that produces an electrostatic field, the electrostatic field being suitable for decelerating or accelerating the first particle beam. The electrostatic field is such that at least a portion of the electric field is emitted from the exit aperture (the first particle beam exits the first particle beam train through the aperture) while the particle beam system is in the first mode of operation. 23) and can be generated so as to be located between. As a result, the electrostatic field also has the effect that secondary particles coming from the object are accelerated to a detector arranged in the first particle beam train, so that a large amount of secondary particles can be detected. As a result, the first train of particle beams in the first mode of operation provides a very high resolution for recording an image of the object. However, the electrostatic field here has the disadvantage that it also acts on the second particle beam and thus affects the beam path of the second particle beam. For this reason, the accuracy with which the second particle beam can be directed onto the object is reduced in the first mode of operation by the electrostatic field.

In the second mode of operation, the strength of the electrostatic field in the common working area is reduced by the placement of the end cap between the first particle beam train and the object, which results in the second mode of operation in the second mode of operation. The effect of the electrostatic field on the particle beam is smaller than that in the first mode of operation. As a result, the second particle beam can be directed onto the object with higher accuracy in the second mode of operation. Even if the electrostatic field in the common working area is weaker in the second mode of operation than in the first mode of operation, the secondary particles are sufficient so that they can still be detected by this detector during the second mode of operation. And is still accelerated to a detector located in the first train of particle beams.

As a result, the particle beam system provides a first mode of operation in which the first particle beam train operates with extremely high precision and a second mode of operation in which the second particle beam train operates with extremely high precision. As a result, the secondary particles detected during the first mode of operation can be used to generate image data representing a high definition image of the object. These image data are then used to control the second particle beam or the second particle beam train in a second mode of operation in which the second particle beam can be directed onto the object with very high precision. Can be done.

To control processing in the particle beam system, the particle beam system can have a controller configured to cause the particle beam system to perform the methods described herein.

Another aspect of the invention relates to a method of operating a particle beam system, particularly a particle beam system described herein. The method includes a first sequence and a second sequence. At the beginning of the first sequence, the particle beam system is put into the first operating mode such that all further steps performed in the course of the first sequence are performed in the first operating mode. At the beginning of the second sequence, the particle beam system is put into the second operating mode so that all further steps performed in the course of the second sequence are performed in the second operating mode.

According to an exemplary embodiment, the first sequence includes secondary particles coming from an object located in the common working area in the first particle beam train while the particle beam system is in the first mode of operation. Detecting by using at least one detector located at. In this way, a high definition image of the object can be generated during the first sequence. The second sequence includes the step of treating the object with the second particle beam, especially based on the secondary particles recorded during the first sequence, while the particle beam system is in the second mode of operation. .. In this way, the object can be processed with high accuracy by the second particle beam, in particular on the basis of the images based on the secondary particles recorded with high accuracy during the first sequence.

According to another embodiment, the method further generates an electrostatic field suitable for decelerating or accelerating the first particle beam by the first train of particle beams during the first and second sequences. Including the step of The electrostatic field that slows down the particle beam has two essential effects. First, the particles of the first particle beam train may pass through the first particle beam train at high kinetic energy (eg, 10 keV) before exiting the first particle beam train. This reduces the effect of Coulomb interactions between the particles of the first particle beam and results in a high accuracy of the first particle beam train. The particles of the first particle beam that are decelerated by the electrostatic field do not damage the object or damage the object to a lesser extent because the particles of the first particle beam have been decelerated by the electrostatic field. The electrostatic field that accelerates the particle beam can contribute to improving/changing the contrast of the recorded image of the object, especially if a positive voltage is applied to the object.

A further essential effect of the electrostatic field is that secondary particles generated due to the interaction of the object with the first particle beam and/or the second particle beam are arranged in the first particle beam train. Accelerated to at least one detector, so that a large amount of the produced secondary particles can be detected and thus improve the accuracy of the image of the object which can be produced by the detected secondary particles. is there.

During the generation of the electrostatic field, the voltage or voltage groups or potentials or potential groups applied to the electrodes (and the object) to generate the electrostatic field are maintained substantially constant. Therefore, there is no need to change the voltage or potential during the first and second sequences.

The electrostatic field is contrasted with the exit aperture (where the first particle beam can exit the first particle beam train through this aperture) for at least part of the electric field while the particle beam system is in the first mode of operation. It can be generated so as to be located between objects. In this way, secondary particles coming from the object can be efficiently detected.

In the second mode of operation, the end cap is located between the first train of particle beams and the object. For example, an end cap can be placed between the exit aperture of the first particle beam train and the object to place the particle beam system in the second mode of operation. Thereby, the intensity of the electrostatic field in the working area is reduced compared to when the particle beam system is in the first operating mode. As a result, the strength of the electrostatic field, which negatively affects the accuracy of the second particle beam train, decreases in the second working mode in the common working area.

According to one embodiment, the first sequence further comprises placing the particle beam system in a first mode of operation. For example, the particle beam system is placed in the first mode of operation by placing the end cap outside the beam path of the first particle beam.

According to an exemplary embodiment, the second sequence includes placing the particle beam system in a second operating mode. The particle beam system may be put into the second mode of operation by, for example, placing an end cap between the first train of particle beams and the working area.

According to another exemplary embodiment, the first sequence may include the following further steps: generating image data representative of an image of the object based on the secondary particles detected during the first sequence; And/or directing the second particle beam and/or the first particle beam onto the object while the particle beam system is in the first mode of operation to generate secondary particles coming from the object; and And/or treating the object with the second particle beam while the particle beam system is in the first mode of operation. These steps can be performed one after the other during the first sequence or simultaneously and repeatedly.

According to another exemplary embodiment, the second sequence comprises the following further steps: at least one detection arranged in the first particle beam train while the particle beam system is in the second mode of operation. Detecting secondary particles coming from the object and passing through the opening of the end cap using a vessel; and/or representing an image of the object based on the secondary particles detected during the second sequence. Generating image data; and/or a second particle beam passing through the aperture of the end cap while the particle beam system is in the second mode of operation to generate secondary particles coming from the object and/or Or directing the first particle beam onto the object. These steps of the second sequence may be performed one after the other during the second sequence or simultaneously and repeatedly.

According to another embodiment, the first sequence is performed before (especially immediately before) the second sequence. Additionally or alternatively, the first sequence may occur after (especially immediately after) the second sequence. As a result, the first sequence may be repeated before and/or after the second sequence and especially with the second sequence. As a result, the first and second sequences may be sequentially repeated, for example alternatingly. The method may end, for example, if the end condition is met.

Embodiments of the present invention will be described in more detail below with reference to the accompanying drawings.

3 illustrates a particle beam system according to one embodiment in a first mode of operation. 2 shows a first illustration of the particle beam system shown in FIG. 1 in a second mode of operation. 2 shows a second illustration of the particle beam system shown in FIG. 1 in a second mode of operation. Figure 4 illustrates possible steps of a method of operating the particle beam system shown in Figures 1-3. 4 illustrates another embodiment of a method of operating the particle beam system shown in FIGS.

FIG. 1 shows a particle beam system 1 according to one embodiment in a first mode of operation. The particle beam system 1 comprises a first particle beam train. In this example, the first particle beam train is an electron beam train 3 configured in the form of a scanning electron microscope. The particle beam system 1 further comprises a second particle beam train. In this example, the second particle beam train is the ion beam train 5. However, the first particle beam train can also be an ion beam train and the second particle beam train can also be an electron beam train.

The electron beam train 3 includes a particle source 7, a condenser lens 9, a booster 11, and an objective lens 13. The particle source 7 includes a cathode 15, a suppression electrode 17, and an extraction electrode 19.

An electron beam 21 which spreads between the cathode 15 and the surface of the object 23 to be inspected or treated is generated by the particle source 7.

The electron beam 21 passes through the condenser lens 9, the booster 11, and the objective lens 13. The electron beam train 3 (particularly the objective lens 13) is configured such that the electron beam 21 is focused on the objective surface 25 on which the object 23 is or can be placed.

The booster 11 is configured to surround a portion of the electron beam 21 so that the electrons of the electron beam 21 can traverse the booster 11 with high kinetic energy having a kinetic energy of, for example, 10 keV. As a result, the spherical aberration and chromatic aberration of the electron beam 21 are minimized, and the influence of the disturbing electric field is reduced.

The objective lens 13 includes an inner pole piece 27, an outer pole piece 29, and an exciter coil 31 to generate a magnetic field in the gap 33 between the inner pole piece 27 and the outer pole piece 29. Objective lens 13 further includes a first electrode 35 formed by the object-side end portion of booster 11 and a second electrode 37 positioned at the object-side end portion of outer pole piece 29. As a result, the objective lens 13 is a combined magnetic field and electrostatic field objective lens. The second electrode 37 may be electrically isolated from the outer pole piece 29 in such a manner that a potential different from the potential applied to the outer pole piece 29 may be applied to the second electrode 37.

The electron beam train 3 further comprises a first detector 39 for detecting secondary particles (in particular secondary electrons) which is arranged in the booster 11 and thus in the electron beam train 3. To be done. The first detector 39 is a secondary particle generated due to the interaction between the object 23 and the electron beam 21 and passes through the object-side exit opening 41 of the electron beam array 3 to the electron beam array 3 of the electron beam array 3. It is configured to detect secondary particles that enter the interior and impinge on the first detector 39. An exemplary trajectory 43 of secondary electrons is shown by a dashed line.

The electron beam train 3 includes a second detector 45 for detecting secondary particles in the booster 11. The second detector propagates from the object 23 through the exit aperture 41 into the objective lens 13 and through the aperture 47 into the first detector 39 and enters the second detector 45 with secondary particles ( In particular, it is configured to detect backscattered electrons). An exemplary trajectory 49 of backscattered electrons is shown by the dashed line.

The first potential may be applied to the first electrode 35, the second potential may be applied to the second electrode 37, and the second potential is less than the first potential. In this way, the electron beam 21 is decelerated after passing through the booster 11 and before exiting the electron beam train 3 through the exit aperture 41, ie the kinetic energy of the electrons of the particle beam 21 is reduced. It Alternatively, the first potential may be applied to the first electrode 35, the second potential may be applied to the second electrode 37, and the second potential is greater than the first potential. In this way, the electron beam 21 is accelerated, ie after passing through the booster 11 and before exiting the electron beam train 3 through the exit opening 41, ie the kinetic energy of the electrons of the particle beam 21 is increased. ..

In addition, a third potential below the second potential of the second electrode 37 or above the second potential may be applied to the object 23.

By applying the above-mentioned potential to the first electrode 35 and the second electrode 37 (and the object 23), secondary particles (especially secondary electrons) generated by the interaction between the object 23 and the electron beam 21. And backscattered electrons) are accelerated towards the exit aperture 41 and pass through the exit aperture 41 into the electron beam train 3 and are incident on the first detector 39 or the second detector 45. An electrostatic field is produced which has the effect of propagating in the interior up to. In this way a large amount of secondary particles can be guided to the first detector 39 and the second detector 45 and the object 23 can be analyzed with very high spatial resolution due to this configuration of the electron beam train 3. Will result.

The ion beam train 5 is configured to generate an ion beam 51 suitable for treating the object 23 (in particular, removing material from the object 23 or cutting material from the object 23 by feeding a processing gas). It The electron beam train 3 and the ion beam train 5 have a common work area 53 where the main axis 55 of the electron beam train 3 and the main shaft 57 of the ion beam train 5 intersect. The ion beam train 5 includes a deflector 59 capable of deflecting the ion beam 51 so that various parts of the object 23 can be processed.

The ion beam 51 propagates in an electrostatic field generated between the second electrode 37 and the object 23 by the first electrode 35 and the second electrode 37. As a result, the ion beam 51 is deflected by the electrostatic field, which has a bad influence on the accuracy with which the ion beam 51 can be guided onto the object 23, after it has exited the ion beam train 5.

The particle beam system 1 further includes an end cap 61. The end cap 61 has an opening 63 which may be smaller than the exit opening 41 of the electron beam train 3. The end cap 61 is arranged so that the end cap 61 does not interfere with the beam path 22 of the electron beam 21, the beam path of the ion beam 51, and the trajectories 43, 49 of the secondary particles passing through the exit opening 41. 21 connected to a movement device 65 configured to be arranged outside the beam path 22 (and outside the beam path of the ion beam 51). In the state of the particle beam system 1 shown in FIG. 1, a particle beam in which an end cap 61 is arranged so as not to interfere with the beam paths of the electron beam 21 and the ion beam 51 and the trajectories of secondary particles passing through the exit opening 41. The state of system 1 is designated as the first mode of operation of particle beam system 1.

FIG. 2 shows details of the particle beam system 1 shown in FIG. 1 in the second operating mode. In the second mode of operation of the particle beam system 1, the end cap 61 is arranged so that the beam path 22 of the electron beam 21 can pass through the opening 63 of the end cap 61, and the secondary particles coming from the common working area 53 end. It is arranged so that it can pass through the opening 63 of the cap 61 and reach the detector 39. In the second mode of operation of the particle beam system 1, the end cap 61 is arranged between the electron beam train 3 and the object 23, in particular between the objective lens 13 and the object 23, more specifically in the second mode. Is placed between the electrode 37 and the object 23. The movement device 65 is configured to position the end cap 61 accordingly, and further the particle beam system transitions from the first operating mode to the second operating mode and from the second operating mode to the first operating mode. Is configured to move the end cap 61 so that it can be moved.

In the second mode of operation of the particle beam system 1, the electron beam 21 may continue to be guided through the opening 63 of the end cap 61 into the common working area 53 of the object 23. In addition, the ion beam 51 may continue to be directed into the common work area 53 on the object 23. In other words, the common working area 53 of the electron beam train 3 and the ion beam train 5 is present even in the second operating mode.

In the second operation mode of the particle beam system 1, the end cap 61 causes the electrostatic field generated by the first electrode 35 and the second electrode 37 between the electrode 37 and the object 23 to be generated by the particle beam system 1. It has an effect that it is weak in the common work area 53 as compared with the case of the first operation mode. Even if the end cap 61 weakens the electrostatic field, the weakened electrostatic field compared to the first mode of operation causes the secondary particles coming from the object 23 to be a less efficient electron beam train. It still passes through the opening 63 of the end cap 61 so that it continues to be accelerated up to the outlet opening 41 of the three and thus to the first detector 39 and the second detector 45. Therefore, the resolution of the electron beam train 3 that can be realized in the second operation mode is lower than that in the first operation mode.

On the other hand, the weakened electrostatic field compared to the first mode of operation has a smaller effect on the beam path of the ion beam 51 in the second mode of operation. This means that the ion beam can be directed onto the object 23 with greater accuracy than in the first mode of operation.

Both the electron beam 21 and the ion beam 51 in the first operating mode of the particle beam system 1 shown in FIG. 1 and also in the second operating mode of the particle beam system 1 shown in FIG. In order to generate image data based on the detected secondary particles representing the image of the object 23, and secondly to treat the object 23 with the ion beam 51, onto the same area of the object 23 Guided to the next or at the same time. The secondary particles used to generate the image data may be generated by the interaction between the object 23 and the electron beam 21, or the interaction between the object 23 and the ion beam 51, or the object 23 and the electron. It can be generated by the interaction of both the beam 21 and the ion beam 51.

The particle beam system 1 may further include a controller (not shown in the accompanying drawings) capable of controlling the electron beam train 3, the ion beam train 5, and the movement device 65. In particular, the controller is arranged to put the particle beam system 1 in a first mode of operation. This is accomplished by placing the end cap 61 outside the beam path 22 of the electron beam 21, as shown by way of example in FIG. Further, the controller may put the particle beam system 1 in a second mode of operation. This is achieved by placing an end cap between the electron beam train 3 and the common work area 53. In particular, the end cap 61 is arranged so that the beam path 22 of the electron beam 21 can pass through the opening 63 of the end cap 61, and the secondary particles coming from the common working area 53 pass through the opening 63 of the end cap 61. Arranged so that one of the detectors 39, 45 of row 3 can be reached.

Further, the controller is configured to control the particle beam system 1 in such a manner as to perform the methods described herein.

1 and 2, the object 23 is shown as oriented substantially orthogonal to the first particle beam train (electron beam train 3). However, in various applications of the particle beam system 1, the object 23 can also be oriented substantially orthogonal to the second particle beam train (ion beam train 5). Both the first sequence and the second sequence are such that the object is substantially orthogonal to the major axis 55 of the first particle beam train 3 or to the major axis 57 of the second particle beam train 5. It may include moving the object in a manner such that it is oriented.

FIG. 3 shows details of the particle beam system 1 in a second mode of operation in which the object 23 is oriented substantially orthogonal to the second particle beam train (ion beam train 5). Rather than arranging the movement device 65 in the manner shown in FIGS. 1 and 2, as shown in FIG. 3, transverse to the main axis 55 of the first particle beam train (electron beam train 3) (specifically Position the movement device 65 along a direction oriented substantially transversely to the main axis 57 of the second particle beam train (ion beam train 5) (specifically substantially perpendicular). May be advantageous. In this way, it is possible to prevent the collision between the object 23 and the movement device 65. However, the orientation of the object 23 is not limited to a substantially orthogonal orientation with respect to the first particle beam train 3 and/or the second particle beam train 5. Rather, the object 23 may have any conceivable/possible orientation. In particular, the objects 23 in the first sequence may remain in one orientation with respect to the first particle beam train 3 and/or with respect to the second particle beam train 5 or may be oriented differently. Furthermore, the object 23 may also remain in one orientation with respect to the first particle beam train 3 and/or with respect to the second particle beam train 5 or may be oriented differently during the second sequence. In particular, the orientations in the first and second sequences may be different or the same.

A method that can be performed by the particle beam system 1 is described below with reference to FIGS. 4 and 5. FIG. 4 shows an exemplary compilation of steps that may be part of the method.

The exemplary method includes a first sequence S1 and a second sequence S2. The steps of the first sequence are performed while the particle beam system 1 is in the first operating mode, and the steps of the second sequence are performed while the particle beam system 1 is in the second operating mode. The only exception here is the transition of the particle beam system between operating modes.

The first sequence S1 may include the step of bringing the particle beam system 1 into the first operation mode as the first step S11. In the first mode of operation the electron beam train 3 is very strong compared to the second mode of operation due to the electrostatic field between the electron beam train 3 and the object 23 (or in the common working area 53). To operate with high precision. In contrast, the ion beam train 5 operates with reduced accuracy compared to the second mode of operation due to the strong electrostatic field.

After the particle beam system 1 is put into the first operation mode (S11), the steps described below may be performed during the first sequence. For example, the electron beam 21 and/or the ion beam 51 or both are guided onto the object 23 to generate secondary particles (S12). Secondary particles can be detected by using the detectors 39, 45 arranged in the electron beam train 3 (S13). Image data representing an image of the object 23 may be generated based on the detected secondary particles (S14). The progress of the processing of the object 23 can be evaluated and controlled based on the image data.

Before, after, or at the same time, the ion beam may be directed thereon to treat the object 23, ie to remove or trim material from it by the addition of a treatment gas (S15).

During the first sequence, an electrostatic field can be generated between the electron beam train 3 and the object 23 (or in the common working area 53), which contributes to the improved detection of secondary particles (S13) S0.

Depending on the application, the first sequence S1 comprises only some of the steps S12 to S14 described above. For example, the object 23 is not processed by the ion beam 51 during the first sequence; rather, only image data of the object 23 is generated using the electron beam 21 and/or using the ion beam 51. It is generated by detecting secondary particles (S12) (S13) (S14). As a result, only the advantages of the first mode of operation are utilized here, whereby the electron beam train 3 operates with extremely high precision.

The steps of the first sequence S1 can be performed multiple times during the first sequence and can be particularly repeated. For example, first, the electron beam 21 is directed onto an object so as to generate image data (S14) (S12). Parameters are determined based on the image data of the first sequence for the subsequent processing of the object by the ion beam (S15). After processing the object 23 in the first sequence by using the ion beam 51 (S15), the electron beam 21 processes the object again by using the ion beam 51 (S15). It can be redirected (S12) onto the object to be regenerated (S14). Therefore, the steps of the first sequence S1 may be repeated many times before the first sequence S1 is ended and the second sequence S2 is generated.

The second sequence S2 may occur after and/or before the first sequence S1.

The second sequence S2 may include, as a first step, a step (S21) of bringing the particle beam system 1 into a second operation mode. In the second mode of operation, the electron beam train 3 is much weaker than in the first mode of operation due to the electrostatic field between the electron beam train 3 and the object 23 (or in the common working area 53). Operates with low accuracy. In contrast, the ion beam train 5 operates with a very high accuracy compared to the first mode of operation, thanks to the weakened electrostatic field.

After the particle beam system 1 is put into the second operation mode (S21), the steps described below can be performed in the second sequence S2. For example, the electron beam 21 and/or the ion beam 51 or both are directed onto the object 23 to generate secondary particles (S22). Secondary particles can be detected by using the detectors 39, 45 arranged in the electron beam train 3 (S23). Image data representing an image of the object 23 may be generated based on the detected secondary particles (S24). The progress of the processing of the object 23 can be evaluated and controlled based on the image data.

Before, after, or at the same time, the ion beam may be directed thereon to treat the object 23, ie to remove or trim material from the object 23 by the addition of the treatment gas (S25). ..

During the second sequence S2, an electrostatic field, which is weakened in the common working area by virtue of the end caps compared to the first mode of operation, but which still contributes to the improved detection of secondary particles, is the electron beam train 3 Between the target object 23 and the target object 23 (or in the common work area 53) (S0).

Depending on the application, the second sequence S2 comprises only some of the steps S22-S25 described above. For example, the object 23 is processed only with the ion beam 51 during the second sequence S2 (S25) and no image data of the object 23 is generated (S24). As a result, only the advantages of the second mode of operation are utilized, which allows the ion beam train 5 to operate with very high precision.

The steps of the second sequence S2 can be performed multiple times during the second sequence S2 and can be particularly repeated. For example, first the electron beam 21 is directed onto an object to generate image data (S22). Parameters are determined based on the image data of the second sequence for the subsequent processing of the object by the ion beam (S25). After the processing of the object 23 in the second sequence by using the ion beam 51 (S25), the electron beam 21 processes the object again by using the ion beam 51 (S25). It can be redirected (S22) onto the object to generate (S24). Therefore, the steps of the second sequence S2 can be repeated many times before the second sequence S2 is finished and the first sequence S1 occurs.

The image data recorded (S14) during the first sequence S1 may be used to control the electron beam 21 and/or the ion beam 51 during the first and second sequences (S12, S15, S22, S25). The image data recorded (S24) during the second sequence S2 may also be used to control the electron beam 21 and/or the ion beam 51 during the first and second sequences (S12, S15, S22, S25).

FIG. 5 illustrates another exemplary method of operating the particle beam system 1. The method begins by performing the steps of the first sequence. After the first sequence, a check is made as to whether the first termination condition has been met. The first termination condition depends on what type of object is created or how the object is processed. For example, an evaluation as to whether the object has the desired shape is made based on the image data recorded during the first sequence. The first termination condition may also be that the object is processed and analyzed to a certain extent.

If the first termination condition is met, the method ends. If the first termination condition is not met, the steps of the second sequence are performed.

After the steps of the second sequence have been performed, a check is made as to whether the second termination condition has been met. The second end condition may be the same as the first end condition, but may be different from the first end condition.

If the second termination condition check indicates that the second termination condition has been met, the method ends. If the checking of the second end condition indicates that the second end condition is not met, the method continues with the first sequence.

According to a variant of the method shown in FIG. 5, the checking of the first or second termination condition may be omitted.

1 Particle Beam System 3 Electron Beam Array 5 Ion Beam Array 7 Particle Source 9 Condensing Lens 11 Booster 13 Objective Lens 15 Cathode 17 Suppression Electrode 19 Extraction Electrode 21 Electron Beam 22 Beam Path 23 Object 25 Objective Surface 27 Inner Pole Piece 29 Outside Pole piece 31 Exciter coil 33 Gap 35 First electrode 37 Second electrode 39 First detector 41 Exit opening 43 Orbit 45 Second detector 47 Open 49 Orbit 51 Ion beam 53 Common working area 55 Spindle 57 Spindle 59 Deflector 61 End cap 63 Opening 65 Movement device S1 First sequence S0, S11, S12, S13, S15, S14 process S2 Second sequence S21, S22, S23, S24, S25 process

Claims (13)

A method of operating a particle beam system (1), comprising:
The particle beam system (1) comprises a first particle beam train (3) and a second particle beam train (5) having a common working area (53),
The first particle beam train (3) is configured to generate a first particle beam (21),
The second particle beam train (5) is configured to generate a second particle beam (51);
Said first particle beam train (3) comprises detectors (39, 45) arranged within said first particle beam train (3) for detecting secondary particles;
The particle beam system (1) further comprises an end cap (61) in which an opening (63) is arranged,
The end cap (61) is arranged outside the beam path (22) of the first particle beam (21) during the first mode of operation of the particle beam system (1),
The end cap (61) is configured such that during the second mode of operation of the particle beam system (1), the beam path (22) of the first particle beam (21) causes the opening (63) of the end cap (61). ) And so that secondary particles coming from the working area (53) pass through the opening (63) in the end cap (61) and reach the detector (39, 45). ,
The method includes a first sequence and a second sequence;
The first sequence is
From an object (23) located in the working area (53) by using the detectors (39, 45) while the particle beam system (1) is in the first operating mode; Detecting the incoming secondary particles;
The second sequence is
The object by the second particle beam (51) while the particle beam system (1) is in the second mode of operation, in particular on the basis of the secondary particles detected in the course of the first sequence. A method comprising the step of treating an article (23). Further creating an electrostatic field suitable for decelerating or accelerating the first particle beam (21) by the first particle beam train (3) during the first and second sequences. The method of claim 1 including. The method according to claim 2, wherein the voltage producing the electric field is kept substantially constant during the period in which the particle beam system (1) is in the first and second operating modes. While the particle beam system (1) is in the first mode of operation, the electric field is such that at least a portion of the electric field exits the opening (41) (the first particle beam (21) passes through this opening). Method according to claim 2 or 3, which is generated such that it is located between a first train of particle beams (3) and the object (23). The particle beam system (1) is put into the second mode of operation by placing the end cap (61) between the outlet opening (41) and the object (23). The method according to 4. While the particle beam system (1) is in the second operating mode, the end cap (61) has the end cap compared to when the particle beam system (1) is in the first operating mode. The method according to any one of claims 2 to 5, wherein (61) is arranged to reduce the strength of the electric field in the working area (53). The first sequence further includes moving the particle beam system (1) to the first particle beam (21) by placing the end cap (61) outside the beam path (22) of the first particle beam (21). 7. The method according to any one of claims 1 to 6, including the step of putting into an operating mode. Said second sequence further comprises said particle beam system (1) by arranging said end cap (61), in particular between said first particle beam train (3) and said working area (53). 8. A method according to any one of claims 1 to 7, including the step of entering a second mode of operation. The first sequence further comprises
Generating image data representing an image of the object (23) based on the secondary particles detected during the first sequence; and/or the secondary particles coming from the object (23). In order to generate the particle beam system (1) in the first mode of operation, the second particle beam (51) and/or the first particle beam (21) is applied to the object (23). ) Leading up; and/or in particular on the basis of the image data generated in the course of the first sequence, the second particles while the particle beam system (1) is in the first operating mode. 9. A method according to any one of claims 1 to 8, comprising treating the object (23) with a beam (51). The second sequence further comprises
The detector for the secondary particles originating from the object (23) and passing through the opening (63) of the end cap (61) while the particle beam system (1) is in the second mode of operation. Detecting using (39, 45); and/or generating image data representing an image of the object (23) based on the secondary particles detected during the second sequence. And/or the aperture (61) of the end cap (61) while the particle beam system (1) is in the second mode of operation to generate the secondary particles coming from the object (23). 63. Any one of claims 1 to 9 including the step of directing the second particle beam (51) and/or the first particle beam (21) that has passed through 63) onto the object (23). The method described in. The first sequence is performed before, especially immediately before, the second sequence, and/or the first sequence is performed, particularly, immediately after, the second sequence, and/or the first sequence. The method according to any one of claims 1 to 10, wherein the sequence of 1 and the second sequence are alternately repeated in sequence until a termination condition is met. The method according to any one of claims 1 to 11, wherein the first particle beam is an electron beam or an ion beam, and the second particle beam is an electron beam or an ion beam. A particle beam system (1) for treating an object, comprising a first particle beam train (3) and a second particle beam train (5) having a common working area (53) ( In 1),
The first particle beam train (3) is configured to generate a first particle beam (21), and the second particle beam train (5) is used to generate a second particle beam (51). Is composed of;
The first particle beam train (3) is
A detector (39, 45) arranged in said first particle beam train (3) for detecting secondary particles;
An end cap (61) having an opening (63) arranged therein, said end cap (61) of said first particle beam (21) during a first mode of operation of said particle beam system (1). Located outside the beam path (22), the end cap (61) is the beam path (22) of the first particle beam (21) during a second mode of operation of the particle beam system (1). Can pass through the opening (63) of the end cap (61), and secondary particles coming from the working area (53) can pass through the opening (63) of the end cap (61) to detect the An end cap (61) arranged to reach the vessel (39, 45),
A particle beam system (1) comprising: a controller configured to control the particle beam system (1) in a manner to perform the method according to any one of claims 1-12.