JP2020040407A5 - - Google Patents

Description

The content of the oligomer (C) in the composition for model material of the present invention is preferably 1 to 30% by mass, more preferably 5% by mass based on the total mass of the polymerizable compounds contained in the composition for model material. It is at least mass%, more preferably at least 10 mass%, more preferably at most 25 mass % , further preferably at most 23 mass % . When the content of the oligomer (C) is within the range of the above upper and lower limits, the breaking strength of the obtained model material is increased while maintaining the viscosity of the model material composition within an appropriate range, and the model material has appropriate toughness. Therefore, it is possible to obtain a stereolithography product that is hard to break even when bent.

The surface tension of the composition for model materials of the present invention is preferably 24 to 30 mN / m, more preferably 24.5 mN / m or more, further preferably 25 mN / m or more, and more preferably 29. 5 mN / m or less, still more preferably below 29 mN / m. When the surface tension is within the above range, the droplets ejected from the nozzle can be formed normally even during high-speed ejection of the material jet, and it is possible to ensure an appropriate droplet amount and landing accuracy and to prevent satellite generation. It is possible to suppress, and it becomes easy to improve modeling accuracy.

Claims (17)

A composition for a model material for forming a model material by a material jet stereolithography method, comprising a polymerizable compound, a photopolymerization initiator, and a siloxane compound having one polymerizable group in one molecule. The composition for model material , wherein the compound has a number average molecular weight of 300 to 10,000, and the polymerizable compound contains an oligomer (C) .   When the composition for model material was dropped onto the cured product of the composition for model material and landed, the contact angle of the droplet of the composition for model material with the cured product was 0.3 seconds after landing. The composition for model materials according to claim 1, which is at least °.   The composition for model materials according to claim 1 or 2, wherein the polymerizable group contained in the siloxane compound is a group selected from the group consisting of an acryloyl group, a methacryloyl group, a vinyl group, an allyl group and a vinyl ether group.   The composition for model materials according to any one of claims 1 to 3, which contains 0.005 to 5 mass% of the siloxane compound with respect to the total mass of the composition for model materials.   The composition for model materials according to any one of claims 1 to 4, which has a surface tension of 24 to 30 mN / m.   The composition for model materials according to claim 1, wherein the siloxane compound is a siloxane compound having a polymerizable group at one end. The siloxane compound has the following formula (1):

[In the formula,
R ¹ represents a hydrogen atom or a methyl group,
R ² represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms,
R ³ is selected from the group consisting of (CH ₂ ) _m , (EO) _x , (PO) _y and combinations thereof, m is 1 to 10 and (EO) is (C ₂ H ₄ O) , (PO) represents (C ₃ H ₆ O), x and y are each 0 to 50,
n is 3 to 220]
The composition for model materials according to any one of claims 1 to 6, which has a structure shown by. The composition for model materials according to claim 1 , further comprising a monofunctional ethylenically unsaturated monomer (A) and a polyfunctional ethylenically unsaturated monomer (B) as the polymerizable compound. .   The composition for model materials according to claim 8, comprising 50% by mass or more of the monofunctional ethylenically unsaturated monomer (A) with respect to the total mass of the polymerizable compound.   The composition for model materials according to claim 8 or 9, which comprises 1 to 30 mass% of the polyfunctional ethylenically unsaturated monomer (B) with respect to the total mass of the polymerizable compound. The composition for a model material according to any one of claims 1 to 10, which contains 1 to 30 mass% of the oligomer (C) with respect to the total mass of the polymerizable compound.   The composition for model materials according to any one of claims 8 to 11, wherein the monofunctional ethylenically unsaturated monomer (A) is a monofunctional ethylenically unsaturated monomer having a cyclic structure in the molecule.   The model according to any one of claims 8 to 12, wherein SP values of the monofunctional ethylenically unsaturated monomer (A) and the polyfunctional ethylenically unsaturated monomer (B) are each 11.0 or less. Composition for lumber.   The composition for model materials according to any one of claims 1 to 13, further comprising a colorant.   A composition set for material jet stereolithography, comprising the composition for model material according to any one of claims 1 to 14 and a composition for support material for shaping a support material by a material jet stereolithography method. .   The material jet stereolithography composition set according to claim 15, wherein the support material composition is water-soluble. A method for producing a stereolithography product by using the composition for model material according to any one of claims 1 to 14 or the composition set for material jet stereolithography according to claim 15 or 16, which is 320 to 410 nm. The method for producing a stereolithography product, comprising curing the composition for model material by irradiating with an active energy ray having a cumulative light amount per layer of 300 mJ / cm ² or more in the wavelength range of.