JP2020016789A5 - - Google Patents

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JP2020016789A5
JP2020016789A5 JP2018140553A JP2018140553A JP2020016789A5 JP 2020016789 A5 JP2020016789 A5 JP 2020016789A5 JP 2018140553 A JP2018140553 A JP 2018140553A JP 2018140553 A JP2018140553 A JP 2018140553A JP 2020016789 A5 JP2020016789 A5 JP 2020016789A5
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film
dense
forming
coating
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Claims (31)

基材上に形成されている多孔質膜を含む膜であって、該多孔質膜の表面にフッ素化合物を担持した緻密膜を有しており、前記緻密膜の前記多孔質膜の表面に対する面積占有率が30%以上70%以下であり、前記緻密膜の膜厚が10nm以上30nm以下であることを特徴とする膜A porous film formed on the substrate a including film has a dense film carrying the fluorine compound on the front surface of the porous film, the surface of the porous film of the dense membrane area occupancy rate is 70% or less than 30% film you, wherein the thickness of the dense membrane is 30nm hereinafter more 10nm against. 前記フッ素化合物が、前記緻密膜の前記多孔質膜とは反対側の表面に付着していることを特徴とする、請求項1に記載の膜。The film according to claim 1, wherein the fluorine compound is attached to the surface of the dense film opposite to the porous film. 前記多孔質膜の厚さが、80nm以上200nm以下であることを特徴とする、請求項1または2に記載の膜The thickness of the porous membrane, characterized in that at 80nm or more 200nm or less, films according to claim 1 or 2. 前記緻密膜の前記多孔質膜の表面に対する面積占有率が、40%以上65%以下であることを特徴とする、請求項1から3のいずれか1項に記載の膜The area occupancy to the surface of the porous membrane, characterized in that it is 65% or less 40%, the film according to any one of claims 1 to 3 of the dense membrane. 前記緻密膜の膜厚が、15nm以上25nm以下であることを特徴とする、請求項1から4のいずれか1項に記載の膜The dense film thickness of the film, characterized in that at 15nm or more 25nm or less, the film according to any one of claims 1 4. 前記緻密膜の表面の算術平均粗さが、3nm以下であることを特徴とする、請求項1から5のいずれか1記載の膜The dense arithmetic average roughness of the surface of the membrane, characterized in that it is 3nm or less, the film according to any one of claims 1 to 5. 前記緻密膜が、酸化ケイ素バインダーまたは樹脂で構成されることを特徴とする、請求項1からのいずれか1項に記載の膜The dense membrane, characterized in that consists of silicon oxide binder or resin, film according to any one of claims 1 to 6. 前記多孔質膜が、粒子とバインダーを含むことを特徴とする、請求項1から5のいずれか1項に記載の膜Said porous membrane, characterized in that it comprises a particle element and a binder, film according to any one of claims 1 to 5. 記粒子の平均粒子径が、10nm以上80nm以下であることを特徴とする、請求項8に記載の膜The average particle diameter before Symbol grains element, characterized in that at 10nm or more 80nm or less, the film of claim 8. 記粒子が、中空粒子または鎖状の粒子であることを特徴とする、請求項8または9に記載の膜Before Symbol particles child, characterized in that it is a hollow particle or a chain of particles, film according to claim 8 or 9. 記粒子が中空粒子であり、該中空粒子のシェルの厚みが平均粒子径の10%以上50%以下であることを特徴とする、請求項8から10のいずれか1項に記載の膜Hollow particles before Symbol particles child, wherein the thickness of the shell of the hollow particles is 10% to 50% of the average particle diameter, film according to any one of claims 8 10 .. 前記粒子が、金属酸化物またはフッ化マグネシウムを含むことを特徴とする、請求項8から11のいずれか1項に記載の膜。The film according to any one of claims 8 to 11, wherein the particles contain a metal oxide or magnesium fluoride. 前記粒子が、酸化ケイ素の粒子であることを特徴とする、請求項12に記載の膜。The film according to claim 12, wherein the particles are silicon oxide particles. 前記バインダーが酸化ケイ素バインダーであることを特徴とする、請求項12または13に記載の膜。The film according to claim 12 or 13, wherein the binder is a silicon oxide binder. 前記フッ素化合物が、単分子膜構造を有することを特徴とする、請求項1から14のいずれか1項に記載の膜Wherein the fluorine compound is characterized by having a monolayer structure, the film according to any one of claims 1 14. 記膜の屈折率が、1.19以上1.32以下であることを特徴とする、請求項1から15のいずれか1項に記載の膜Before the refractive index of Kimaku, characterized in that at 1.19 or more 1.32 or less, the film according to any one of claims 1 to 15. 基材と、該基材上に形成されている、請求項1から16のいずれか1項に記載の膜を有することを特徴とする部材 Member, wherein the base material is formed on the substrate, to have a film according to any one of claims 1 to 16. 透明基材と、該透明基材上に形成されている、請求項16に記載の膜を有することを特徴とする光学部材。An optical member having a transparent base material and the film according to claim 16 formed on the transparent base material. 前記透明基材が、レンズであることを特徴とする、請求項18に記載の光学部材The optical member according to claim 18 , wherein the transparent base material is a lens. 請求項18または19に記載の光学部材を備える撮像機器。An imaging device comprising the optical member according to claim 18 or 19. 請求項18または19に記載の光学部材を備える投影機器。A projection device comprising the optical member according to claim 18 or 19. 少なくとも粒子とバインダーと溶剤を含有する第1の塗料を基材の表面に塗工して第1の膜を成膜する工程と、該第1の膜を乾燥して多孔質膜を形成する工程と、該多孔質膜の表面の一部に膜材料と溶剤からなる第2の塗料を塗工して緻密膜を形成する工程と、該緻密膜の表面上にフッ素化合物を担持させる工程を有することを特徴とする膜の製造方法。 A step of forming a first film least the first coating material also contains a particle element and a binder and a solvent by coating the surface of the substrate, the porous membrane by drying the first film A step of forming, a step of applying a second paint composed of a film material and a solvent to a part of the surface of the porous film to form a dense film, and a step of supporting a fluorine compound on the surface of the dense film. film production method of you and a step. 前記緻密膜を形成する工程において、前記第2の塗料中の膜材料の濃度と該第2の塗料の付与量を調整することにより、前記緻密膜の前記多孔質膜の表面に対する面積占有率を30%以上70%以下とすることを特徴とする、請求項22に記載の方法。 In the step of forming the dense layer, by adjusting the concentration and the application amount of the second coating film material of the second paint, the area occupancy with respect to the surface of the porous film of the dense membrane The method according to claim 22 , wherein the content is 30% or more and 70% or less. 前記第1の膜を成膜する工程を、20℃以上30℃以下で行うことを特徴とする、請求項22または23に記載の方法。 The method according to claim 22 or 23 , wherein the step of forming the first film is performed at 20 ° C. or higher and 30 ° C. or lower. 前記第1の膜を成膜する工程において、前記第1の塗料の塗工時における粘度が1.3mPa・s以上2mPa・s以下であることを特徴とする、請求項24に記載の方法。 In the above first film forming step, wherein the viscosity at the time of coating of the first coating material is less than 1.3 mPa · s or more 2 mPa · s, the method of claim 24. 前記緻密膜を形成する工程において、前記第2の塗料として酸化ケイ素バインダー塗料を用いることを特徴とする、請求項22から25のいずれか1項に記載の方法。The method according to any one of claims 22 to 25, wherein a silicon oxide binder coating material is used as the second coating material in the step of forming the dense film. 基材を用意する工程と、少なくとも粒子とバインダーと溶剤を含有する第1の塗料を該基材の表面に塗工して第1の膜を成膜する工程と、該第1の膜を乾燥して多孔質膜を形成する工程と、該多孔質膜の表面の一部に膜材料と溶剤からなる第2の塗料を塗工して緻密膜を形成する工程と、該緻密膜の表面上にフッ素化合物を担持させる工程を有することを特徴とする部材の製造方法。A step of preparing a base material, a step of applying a first paint containing at least particles, a binder and a solvent to the surface of the base material to form a first film, and a step of drying the first film. A step of forming a porous film, a step of applying a second paint composed of a film material and a solvent to a part of the surface of the porous film to form a dense film, and a step of forming a dense film on the surface of the dense film. A method for producing a member, which comprises a step of supporting a fluorine compound in the coating film. 前記緻密膜を形成する工程において、前記第2の塗料中の膜材料の濃度と該第2の塗料の付与量を調整することにより、前記緻密膜の前記多孔質膜の表面に対する面積占有率を30%以上70%以下とすることを特徴とする、請求項27に記載の方法。In the step of forming the dense film, the area occupancy of the dense film with respect to the surface of the porous film is determined by adjusting the concentration of the film material in the second coating film and the amount of the second coating film applied. The method according to claim 27, wherein the content is 30% or more and 70% or less. 前記第1の膜を成膜する工程を、20℃以上30℃以下で行うことを特徴とする、請求項27または28に記載の方法。The method according to claim 27 or 28, wherein the step of forming the first film is performed at 20 ° C. or higher and 30 ° C. or lower. 前記第1の膜を成膜する工程において、前記第1の塗料の塗工時における粘度が1.3mPa・s以上2mPa・s以下であることを特徴とする、請求項29に記載の方法。The method according to claim 29, wherein in the step of forming the first film, the viscosity of the first coating film at the time of coating is 1.3 mPa · s or more and 2 mPa · s or less. 前記緻密膜を形成する工程において、前記第2の塗料として酸化ケイ素バインダー塗料を用いることを特徴とする、請求項27から30のいずれか1項に記載の方法。The method according to any one of claims 27 to 30, wherein a silicon oxide binder coating material is used as the second coating material in the step of forming the dense film.
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