JP2019180654A - Convergent electromagnet and charged particle beam irradiation device - Google Patents

Convergent electromagnet and charged particle beam irradiation device Download PDF

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JP2019180654A
JP2019180654A JP2018073303A JP2018073303A JP2019180654A JP 2019180654 A JP2019180654 A JP 2019180654A JP 2018073303 A JP2018073303 A JP 2018073303A JP 2018073303 A JP2018073303 A JP 2018073303A JP 2019180654 A JP2019180654 A JP 2019180654A
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charged particle
particle beam
electromagnet
magnetic field
axis
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JP6364141B1 (en
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康太 水島
Kota Mizushima
康太 水島
卓司 古川
Takuji Furukawa
卓司 古川
英里 竹下
Eri Takeshita
英里 竹下
原洋介
Yosuke Hara
洋介 原
直也 早乙女
Naoya Saotome
直也 早乙女
有一 皿谷
Yuichi Saraya
有一 皿谷
亮平 丹正
Ryohei Tansei
亮平 丹正
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B Dot Medical Inc
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B Dot Medical Inc
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Priority to US16/185,888 priority patent/US10431418B1/en
Priority to EP19207511.7A priority patent/EP3653263A1/en
Priority to EP18206301.6A priority patent/EP3549637B1/en
Priority to CN201811454848.6A priority patent/CN110339491B/en
Priority to KR1020180153100A priority patent/KR101974425B1/en
Priority to US16/359,414 priority patent/US10446364B1/en
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Abstract

To provide a convergent electromagnet that deflects a charged particle beam incident from a large angular range, and converges it in an isocenter.SOLUTION: A convergent electromagnet of the present invention is provided as follows: the convergent electromagnet includes coil pairs arranged to sandwich a path of a charged particle beam; the coil pairs generates an effective magnetic field region where a magnetic field is directed in the direction (Z-axis) perpendicular to the traveling direction (X-axis) of the charged particle beam, and performs deflection by a deflection angle φ to the X-axis in a deflection starting point Q in the XY surface; the incident charged particle beam is deflected by the effective magnetic field region, and is applied to an isocenter by an irradiation angle θ to the X-axis; any point P2 on the boundary of an emission side of the effective magnetic field region is present in a position of equal distance rfrom the isocenter; the point P1 and the point P2 on the boundary of the incident side of the effective magnetic field region are present on the circular arc of a radius rand a central angle θ+φ; and a distance R between the deflection starting point Q and the point P1 satisfies a relational expression (4) where the distance between the deflection starting point Q and the isocenter is assumed L.SELECTED DRAWING: Figure 1

Description

本発明は、収束電磁石及び収束電磁石を用いた荷電粒子ビーム照射装置に関する。   The present invention relates to a focusing electromagnet and a charged particle beam irradiation apparatus using the focusing electromagnet.

従来より、高エネルギーに加速された荷電粒子ビームを癌などの悪性腫瘍に照射し、悪性腫瘍を治療する粒子線治療が行われている。   Conventionally, particle beam therapy for irradiating a malignant tumor such as cancer with a charged particle beam accelerated to high energy to treat the malignant tumor has been performed.

荷電粒子ビームを物体に照射すると、物体内の荷電粒子ビームの経路に沿って物体にエネルギー(線量)が付与される。物体内部の限られた領域(標的)に集中して線量を付与する場合、荷電粒子ビームが標的に重なるように、荷電粒子ビームを様々な方向から照射することで線量の集中性を高めることが行われる。   When an object is irradiated with a charged particle beam, energy (dose) is applied to the object along the path of the charged particle beam in the object. When concentrating a dose on a limited area (target) inside an object, the concentration of the dose can be improved by irradiating the charged particle beam from various directions so that the charged particle beam overlaps the target. Done.

粒子線治療の分野において、正常な組織の被ばくを抑えつつ、体内の標的に多くの線量を付与するために、複数の方向から荷電粒子ビームを照射する方法が一般的である。複数の方向から標的に荷電粒子ビームを照射する装置として、治療室に複数の固定照射ポートを設け、荷電粒子ビームの特性を変化させる機器を複数の固定照射ポートで共用する装置が知られている(特許文献1)。また、標的自体を回転させることで、1つの固定照射ポートから出射された荷電粒子ビームを複数の方向から標的に照射する装置(特許文献2)や、荷電粒子ビームの輸送装置全体を回転させる回転照射装置(特許文献3)も知られている。   In the field of particle beam therapy, a method of irradiating a charged particle beam from a plurality of directions is generally used in order to give a large dose to a target in the body while suppressing normal tissue exposure. As a device for irradiating a target with a charged particle beam from a plurality of directions, a device is known in which a plurality of fixed irradiation ports are provided in a treatment room and a device for changing the characteristics of the charged particle beam is shared by the plurality of fixed irradiation ports. (Patent Document 1). Further, by rotating the target itself, a device that irradiates the target with a charged particle beam emitted from one fixed irradiation port from a plurality of directions (Patent Document 2), or a rotation that rotates the entire charged particle beam transport device. An irradiation apparatus (Patent Document 3) is also known.

特開2002−113118号公報JP 2002-113118 A 特開昭60−20439号公報Japanese Patent Laid-Open No. 60-20439 特許第2836446号Japanese Patent No. 2836446

特許文献1に記載の方法は、標的に荷電粒子ビームを照射する方向の数が、固定照射ポートの数と同じであり、荷電粒子ビームを標的に照射する方向(照射角)は、連続的ではない。また、照射方向の数だけ荷電粒子ビームの輸送ラインも必要となり、製造コストや設置スペースの面でも問題がある。特許文献2に記載の方法では、患者を回転させることで標的に様々な方向から荷電粒子ビームを照射するものであるため、回転する患者への負荷が大きく、回転に起因する腫瘍(標的)の変形が起こりやすい問題がある。特許文献3に記載の方法では、標的に対して荷電粒子ビームを連続的に照射できる一方で、荷電粒子ビームの輸送ライン及び照射ポートを一体的に回転させるための巨大な機構が必要となり、そのような機構を製造するコストや設置するスペースの面でも問題がある。   In the method described in Patent Document 1, the number of directions in which a target is irradiated with a charged particle beam is the same as the number of fixed irradiation ports, and the direction in which the target is irradiated with a charged particle beam (irradiation angle) is not continuous. Absent. In addition, as many transport lines for charged particle beams as the number of irradiation directions are required, and there are problems in terms of manufacturing cost and installation space. In the method described in Patent Document 2, since the target is irradiated with the charged particle beam from various directions by rotating the patient, the load on the rotating patient is large, and the tumor (target) caused by the rotation There is a problem that deformation is likely to occur. In the method described in Patent Document 3, while a charged particle beam can be continuously irradiated onto a target, a huge mechanism for integrally rotating a charged particle beam transport line and an irradiation port is required. There is also a problem in terms of the cost of manufacturing such a mechanism and the installation space.

このような事情に鑑み、本発明は、広い角度範囲から入射する荷電粒子ビームを偏向しアイソセンターに収束させる収束電磁石、及びそれを用いた荷電粒子ビーム照射装置を提供することを目的とする。   In view of such circumstances, an object of the present invention is to provide a converging electromagnet that deflects a charged particle beam incident from a wide angle range and converges it to an isocenter, and a charged particle beam irradiation apparatus using the same.

本発明には以下の態様〔1〕〜〔11〕が含まれる。
〔1〕
荷電粒子ビームの経路を挟むように配置されたコイル対を備えた収束電磁石であって、
前記コイル対は、電流を入力すると、荷電粒子ビームの進行方向(X軸)に直交する方向(Z軸)に磁場が向いた有効磁場領域を生成するよう構成されており、ここで、X軸とZ軸の両方に直交する軸をY軸とし、
XY面において、
偏向起点QにてX軸に対する偏向角φで偏向し、前記有効磁場領域に入射した荷電粒子ビームは、前記有効磁場領域により偏向され、X軸に対する照射角θでアイソセンターに照射され、
前記有効磁場領域の荷電粒子ビームの出射側の境界上の任意の点P2は、前記アイソセンターから等距離rの位置にあり、
前記有効磁場領域の荷電粒子ビームの入射側の境界上の点P1と前記点P2は、半径r及び中心角(θ+φ)の円弧上にあり、
前記偏向起点Qと前記点P1との間の距離Rは、前記偏向起点Qと前記アイソセンターとの間の距離をLとすると、関係式(4):
を満たす、前記収束電磁石。
〔2〕
前記収束電磁石は、前記コイル対を二組以上備え、
前記二組以上のコイル対は、荷電粒子ビームの経路を挟み且つY軸方向に並ぶように配置され、
前記二組以上のコイル対のうち第1のコイル対及び第2のコイル対に電流切替器が接続されており、
前記電流切替器は、電流を前記第1のコイル対及び前記第2のコイル対のいずれか1つに供給するよう構成され、
前記第1のコイル対及び前記第2のコイル対は、生成する有効磁場領域の磁場の向きが互いに反対となるよう構成されている、〔1〕に記載の収束電磁石。
〔3〕
前記偏向起点Qと前記アイソセンターはX軸上にある、〔1〕又は〔2〕に記載の収束電磁石。
〔4〕
荷電粒子ビームを生成する加速器と、
前記加速器からの荷電粒子ビームを、前記偏向起点Qにて10度以上の偏向角φで偏向する振分電磁石装置と
〔1〕〜〔3〕のいずれか1項に記載の収束電磁石と、
前記収束電磁石に電流を供給し励磁するための電源装置と、
を有する荷電粒子ビーム照射装置。
〔5〕
前記振分電磁石装置と前記収束電磁石とを接続する真空ダクト
をさらに有し、
前記真空ダクトは、XY面において扇型形状をしており、前記10度以上の偏向角φで偏向された荷電粒子ビームであっても前記真空ダクト内を通過できるよう構成されている、〔4〕に記載の荷電粒子ビーム照射装置。
〔6〕
X軸のまわりに回転角ωで前記収束電磁石を回転させる駆動装置、
をさらに有し、
前記回転角ωと前記照射角θの任意の組み合わせの範囲から、荷電粒子ビームをアイソセンターに照射するよう構成されている〔4〕又は〔5〕に記載の荷電粒子ビーム照射装置。
〔7〕
前記収束電磁石は、前記荷電粒子ビーム照射装置が設置される照射室の床面に対して前記収束電磁石の長手方向を傾斜して配置できるように構成されている、〔4〕〜〔6〕のいずれか1項に記載の荷電粒子ビーム照射装置。
〔8〕
前記振分電磁石装置の上流側に設けられ、荷電粒子ビームのビーム形状を調整するための四極電磁石をさらに有する〔4〕〜〔7〕のいずれか1項に記載の荷電粒子ビーム照射装置。
〔9〕
荷電粒子ビームのビーム形状を照射角θごとに調整するために、前記四極電磁石の励磁電流は、照射角θごとに制御される、〔8〕に記載の荷電粒子ビーム照射装置。
〔10〕
前記振分電磁石装置の上流側に設けられたステアリング電磁石装置と、
前記収束電磁石の前記出射側に設けられたビームモニタ装置と
をさらに有し、
前記ビームモニタ装置からの荷電粒子ビームのビーム位置の情報から、前記振分電磁石装置、前記収束電磁石、及び前記ステアリング電磁石のうちの少なくとも1つの励磁電流をフィードバック制御する、〔4〕〜〔9〕のいずれか1項に記載の荷電粒子ビーム照射装置。
〔11〕
前記アイソセンターにある標的を挟むように設けられた画像撮影装置をさらに有し、
前記画像撮影装置は、前記標的に荷電粒子ビームを照射する前又は照射中に、前記標的の画像情報を生成するよう構成されている、〔4〕〜〔10〕のいずれか1項に記載の荷電粒子ビーム照射装置。
The present invention includes the following embodiments [1] to [11].
[1]
A focusing electromagnet having a coil pair arranged so as to sandwich a path of a charged particle beam,
The coil pair is configured to generate an effective magnetic field region in which a magnetic field is directed in a direction (Z axis) orthogonal to a traveling direction (X axis) of a charged particle beam when current is input. The axis perpendicular to both the Z axis and the Y axis is the Y axis,
In the XY plane,
The charged particle beam deflected by the deflection angle φ with respect to the X axis at the deflection start point Q and incident on the effective magnetic field region is deflected by the effective magnetic field region, and is irradiated to the isocenter at an irradiation angle θ with respect to the X axis.
An arbitrary point P2 on the boundary of the effective magnetic field region on the emission side of the charged particle beam is located at an equal distance r 1 from the isocenter,
The point P2 and the point P1 on the boundary of the entrance side of the charged particle beam of the effective magnetic field region is in a circular arc on a radius r 2 and the central angle (theta + phi),
The distance R between the deflection starting point Q and the point P1 is represented by the relational expression (4), where L is the distance between the deflection starting point Q and the isocenter.
Satisfying the converging electromagnet.
[2]
The convergence electromagnet includes two or more pairs of the coil pairs,
The two or more pairs of coils are arranged so as to sandwich the path of the charged particle beam and line up in the Y-axis direction,
A current switch is connected to the first coil pair and the second coil pair among the two or more coil pairs,
The current switch is configured to supply current to any one of the first coil pair and the second coil pair;
[1] The focusing electromagnet according to [1], wherein the first coil pair and the second coil pair are configured such that directions of magnetic fields in an effective magnetic field region to be generated are opposite to each other.
[3]
The converging electromagnet according to [1] or [2], wherein the deflection starting point Q and the isocenter are on the X axis.
[4]
An accelerator that generates a charged particle beam;
A distributed electromagnet device that deflects the charged particle beam from the accelerator at a deflection angle φ of 10 degrees or more at the deflection start point Q; and the focusing electromagnet according to any one of [1] to [3];
A power supply for supplying and exciting current to the converging electromagnet;
A charged particle beam irradiation apparatus.
[5]
A vacuum duct connecting the distribution electromagnet device and the converging electromagnet;
The vacuum duct has a fan shape on the XY plane, and is configured so that even a charged particle beam deflected at a deflection angle φ of 10 degrees or more can pass through the vacuum duct. ] The charged particle beam irradiation apparatus of description.
[6]
A driving device for rotating the focusing electromagnet around the X axis at a rotation angle ω;
Further comprising
The charged particle beam irradiation apparatus according to [4] or [5], wherein the charged particle beam is irradiated to the isocenter from an arbitrary combination range of the rotation angle ω and the irradiation angle θ.
[7]
The converging electromagnet is configured so that the longitudinal direction of the converging electromagnet can be inclined with respect to a floor surface of an irradiation chamber in which the charged particle beam irradiation apparatus is installed, [4] to [6] The charged particle beam irradiation apparatus of any one of Claims.
[8]
The charged particle beam irradiation apparatus according to any one of [4] to [7], further including a quadrupole electromagnet provided on an upstream side of the sorting electromagnet apparatus and configured to adjust a beam shape of the charged particle beam.
[9]
The charged particle beam irradiation apparatus according to [8], wherein the excitation current of the quadrupole electromagnet is controlled for each irradiation angle θ in order to adjust the beam shape of the charged particle beam for each irradiation angle θ.
[10]
A steering electromagnet device provided upstream of the distribution electromagnet device;
A beam monitor device provided on the exit side of the focusing electromagnet;
[4] to [9] feedback control of at least one exciting current of the sorting electromagnet device, the converging electromagnet, and the steering electromagnet from information on the beam position of the charged particle beam from the beam monitor device The charged particle beam irradiation apparatus according to any one of the above.
[11]
It further has an image capturing device provided so as to sandwich the target in the isocenter,
The image capturing device according to any one of [4] to [10], wherein the image capturing device is configured to generate image information of the target before or during irradiation of the target with a charged particle beam. Charged particle beam irradiation device.

本発明の一実施形態に係る収束電磁石は、荷電粒子ビームを標的に照射する方向(照射角θ)を連続的にできる。収束電磁石は、広い角度範囲(例えば±10度〜±90度未満)から荷電粒子ビームが入射されてきたとしても、荷電粒子ビームを標的に収束できる。収束電磁石10を用いることで、標的(患者)を動かす必要もなく、患者への負荷及び移動にともなう標的の変形を防止又は低減できる。また、収束電磁石10では、荷電粒子ビームが偏向角φに応じて、標的に収束するような照射角θが決まるように有効磁場領域15が形成されるため、該収束電磁石を物理的に動かすための巨大な機構を必要とせず、その分だけ製造コストや設置スペースの問題を低減できる。   The focusing electromagnet according to one embodiment of the present invention can continuously make a direction (irradiation angle θ) in which a target is irradiated with a charged particle beam. The focusing electromagnet can focus the charged particle beam on the target even if the charged particle beam is incident from a wide angle range (for example, ± 10 degrees to less than ± 90 degrees). By using the focusing electromagnet 10, it is not necessary to move the target (patient), and the deformation of the target accompanying the load and movement on the patient can be prevented or reduced. In the converging electromagnet 10, the effective magnetic field region 15 is formed so that the irradiation angle θ is determined so that the charged particle beam converges on the target in accordance with the deflection angle φ, so that the converging electromagnet is physically moved. Therefore, the problem of manufacturing cost and installation space can be reduced by that amount.

一実施形態に係る収束電磁石の概略構成図である。It is a schematic block diagram of the convergence electromagnet which concerns on one Embodiment. 一実施形態に係る有効磁場領域の形成を説明するための図である。It is a figure for demonstrating formation of the effective magnetic field area | region which concerns on one Embodiment. 一実施形態に係る電源装置の概略構成図である。It is a schematic block diagram of the power supply device which concerns on one Embodiment. 一実施形態に係る荷電粒子ビーム照射装置の概略構成図である。It is a schematic block diagram of the charged particle beam irradiation apparatus which concerns on one Embodiment. 一実施形態に係る荷電粒子ビーム照射装置の概略構成図である。It is a schematic block diagram of the charged particle beam irradiation apparatus which concerns on one Embodiment. 一実施形態に係る荷電粒子ビーム照射装置の概略構成図である。It is a schematic block diagram of the charged particle beam irradiation apparatus which concerns on one Embodiment. 一実施形態に係る荷電粒子ビーム照射装置の概略構成図である。It is a schematic block diagram of the charged particle beam irradiation apparatus which concerns on one Embodiment. 一実施形態に係る荷電粒子ビーム照射装置の概略構成図である。It is a schematic block diagram of the charged particle beam irradiation apparatus which concerns on one Embodiment. 一実施形態に係る荷電粒子ビーム照射装置の概略構成図である。It is a schematic block diagram of the charged particle beam irradiation apparatus which concerns on one Embodiment.

〔第1実施形態〕
本発明の第1実施形態は、広い角度範囲から入射する荷電粒子ビームを偏向し、アイソセンターに収束させる収束電磁石10に関する。
[First Embodiment]
The first embodiment of the present invention relates to a converging electromagnet 10 that deflects a charged particle beam incident from a wide angle range and converges it to an isocenter.

図1(a)は、本実施形態に係る収束電磁石10の概略構成図である。荷電粒子ビームの進行方向をX軸、収束電磁石10が生成する磁場の方向をZ軸、X軸及びZ軸に直交する方向をY軸とする。収束電磁石10は、XY面において、X軸に対する偏向角φの広い範囲から入射する荷電粒子ビームを、アイソセンターOに収束させるよう構成されている。   FIG. 1A is a schematic configuration diagram of a converging electromagnet 10 according to the present embodiment. The traveling direction of the charged particle beam is the X axis, the direction of the magnetic field generated by the focusing electromagnet 10 is the Z axis, and the direction orthogonal to the X axis and the Z axis is the Y axis. The converging electromagnet 10 is configured to converge a charged particle beam incident from a wide range of a deflection angle φ with respect to the X axis on the XY plane to the isocenter O.

ここで、本実施形態では図2に示すようにアイソセンターOをXYZ空間の原点とし、上流側(加速器側)をX軸の正の方向としているが、これに限定されない。偏向角φの範囲は、−90度超〜+90度未満の範囲にあり、プラス(+Y軸方向)の偏向角範囲とマイナス(−Y軸方向)の偏向角範囲は異なっていてもよい(非対称)。例えば、プラス側の最大偏向角(φ=φmax)を45度とし、マイナス側の最大偏向角(φ=−φmax)を−30度とするなどしてもよい。   In this embodiment, as shown in FIG. 2, the isocenter O is the origin of the XYZ space and the upstream side (accelerator side) is the positive direction of the X axis, but this is not limitative. The range of the deflection angle φ is in the range of more than −90 degrees to less than +90 degrees, and the plus (+ Y axis direction) deflection angle range and the minus (−Y axis direction) deflection angle range may be different (asymmetrical). ). For example, the maximum positive deflection angle (φ = φmax) may be 45 degrees, and the maximum negative deflection angle (φ = −φmax) may be −30 degrees.

収束電磁石10は、1組以上のコイル対を備え、該コイル対は、荷電粒子ビームの進行方向と荷電粒子ビームの偏向角φの広がり方向に直交する方向(図中Z軸方向)を向いた一様な磁場を生成し(有効磁場領域15a、15b)、荷電粒子ビームの経路を挟むように配置されている。収束電磁石10の1組のコイル対が生成する有効磁場領域は、図1(a)に示すようにXY平面において三日月様の形状を有し、その詳細については後述する。なお、荷電粒子ビームが通過する、対向するコイル対間の隙間は(Z軸方向の距離)、XY面における荷電粒子ビームが広がる範囲に比べて十分に小さいため、ここでは荷電粒子ビームのZ軸方向の広がりについては考慮しない。   The converging electromagnet 10 includes one or more pairs of coils, and the coil pairs are oriented in a direction (Z-axis direction in the figure) perpendicular to the traveling direction of the charged particle beam and the spreading direction of the deflection angle φ of the charged particle beam. A uniform magnetic field is generated (effective magnetic field regions 15a and 15b), and arranged so as to sandwich the path of the charged particle beam. The effective magnetic field region generated by one pair of coils of the focusing electromagnet 10 has a crescent-like shape on the XY plane as shown in FIG. 1A, and details thereof will be described later. Note that the gap between the opposing coil pairs through which the charged particle beam passes (distance in the Z-axis direction) is sufficiently smaller than the range in which the charged particle beam spreads on the XY plane. We do not consider the spread of direction.

図1(b)は、収束電磁石10のA−A線断面図である。本実施形態では、収束電磁石10は、好ましくは少なくとも二組のコイル対11a、11bを備える。コイル11a、11bの内部にはそれぞれ磁極12a、12bが組み込まれ、磁極12a、12bにはヨーク13が接続されている。収束電磁石10には後述する電源装置(図3)が接続されている。電源装置からコイル対11a、11bに電流(励磁電流ともいう。)が供給されることで、収束電磁石10が励磁し、有効磁場領域15a、15bが形成される。なお、有効磁場領域15aの範囲と有効磁場領域15bの範囲は、異なっていてもよい(非対称)。例えば、プラス(+Y軸方向)の偏向角範囲とマイナス(−Y軸方向)の偏向角範囲が非対称であれば、それに応じて有効磁場領域15a、15bも非対称に形成することで、使用されない有効磁場領域を低減できる。   FIG. 1B is a cross-sectional view of the focusing electromagnet 10 taken along the line AA. In the present embodiment, the focusing electromagnet 10 preferably includes at least two sets of coil pairs 11a and 11b. Magnetic poles 12a and 12b are incorporated in the coils 11a and 11b, respectively, and a yoke 13 is connected to the magnetic poles 12a and 12b. A power supply device (FIG. 3) described later is connected to the converging electromagnet 10. By supplying current (also referred to as excitation current) to the coil pairs 11a and 11b from the power supply device, the converging electromagnet 10 is excited and effective magnetic field regions 15a and 15b are formed. Note that the range of the effective magnetic field region 15a and the range of the effective magnetic field region 15b may be different (asymmetric). For example, if the plus (+ Y-axis direction) deflection angle range and the minus (-Y-axis direction) deflection angle range are asymmetric, the effective magnetic field regions 15a and 15b are formed asymmetrically accordingly, and are not used effectively. The magnetic field region can be reduced.

振分電磁石装置20により偏向され、収束電磁石10に入射する荷電粒子ビームの偏向角φの範囲は、プラスの最大偏向角(φ=φmax)からマイナスの最大偏向角(φ=−φmax)の範囲であり、プラスの最大偏向角φmaxは、10度以上90度未満の角度であり、マイナスの最大偏向角−φmaxは、−90度超−10度以下の角度である。偏向角φ及び後述する照射角θは、XY面において、X軸に対する荷電粒子ビームの経路の角度である。   The range of the deflection angle φ of the charged particle beam deflected by the sorting electromagnet device 20 and incident on the converging electromagnet 10 ranges from the maximum positive deflection angle (φ = φmax) to the maximum negative deflection angle (φ = −φmax). The positive maximum deflection angle φmax is an angle between 10 degrees and less than 90 degrees, and the negative maximum deflection angle −φmax is an angle greater than −90 degrees and −10 degrees or less. A deflection angle φ and an irradiation angle θ described later are the angles of the path of the charged particle beam with respect to the X axis on the XY plane.

プラスの偏向角範囲(φ=0超〜φmax)で入射した荷電粒子ビームは、第1のコイル対11aの有効磁場領域15aにより偏向され、アイソセンターOに照射される。マイナスの偏向角範囲(φ=0未満〜−φmax)で入射した荷電粒子ビームは、第2のコイル対11bの有効磁場領域15bにより偏向され、アイソセンターOに照射される。有効磁場領域15aと有効磁場領域15bの磁場の向きは互いに反対方向である。なお、振分電磁石装置20から偏向角φ=0で収束電磁石10に入射する荷電粒子ビームは、有効磁場領域15a、15bのいずれか又は両領域15a、15bの間を通過し、アイソセンターOに収束する。   The charged particle beam incident in the positive deflection angle range (φ = 0 to φmax) is deflected by the effective magnetic field region 15a of the first coil pair 11a and irradiated to the isocenter O. The charged particle beam incident in the negative deflection angle range (less than φ = 0 to −φmax) is deflected by the effective magnetic field region 15b of the second coil pair 11b and irradiated to the isocenter O. The directions of the effective magnetic field region 15a and the effective magnetic field region 15b are opposite to each other. The charged particle beam incident on the converging electromagnet 10 at the deflection angle φ = 0 from the sorting electromagnet apparatus 20 passes through one of the effective magnetic field regions 15a and 15b or between both the regions 15a and 15b, and enters the isocenter O. Converge.

収束電磁石10に入射する荷電粒子ビームの偏向角φは、振分電磁石装置20により制御される。振分電磁石装置20は、加速器(不図示)から供給される荷電粒子ビームの進行方向(図中X軸)に直交する方向(図中Z軸)を向いた磁場を生成し、通過する荷電粒子ビームを偏向する電磁石と、該磁場の強度及び向きを制御する制御部とを備える(不図示)。振分電磁石装置20は、磁場の強度及び向き(Z軸方向)を制御することで、XY面において荷電粒子ビームを偏向し、偏向起点Qにて偏向角φで偏向した荷電粒子ビームを収束電磁石10に出射する。ここで、偏向起点QとアイソセンターOはX軸上にある。   The deflection angle φ of the charged particle beam incident on the focusing electromagnet 10 is controlled by the sorting electromagnet apparatus 20. The distributed electromagnet device 20 generates a magnetic field directed in a direction (Z axis in the figure) perpendicular to the traveling direction (X axis in the figure) of a charged particle beam supplied from an accelerator (not shown), and passes charged particles. An electromagnet that deflects the beam and a control unit that controls the intensity and direction of the magnetic field (not shown). The distribution electromagnet apparatus 20 controls the intensity and direction (Z-axis direction) of the magnetic field to deflect the charged particle beam on the XY plane, and converges the charged particle beam deflected at the deflection start point Q with the deflection angle φ. 10 is emitted. Here, the deflection starting point Q and the isocenter O are on the X axis.

加速器と振分電磁石装置20との間及び振分電磁石装置20と収束電磁石10との間には真空ダクト(不図示)が設けられ、荷電粒子ビームは、その中を輸送されることで、途中で大きく減衰しない。   A vacuum duct (not shown) is provided between the accelerator and the sorting electromagnet device 20 and between the sorting electromagnet device 20 and the converging electromagnet 10, and the charged particle beam is transported in the middle, thereby Does not attenuate significantly.

図2を参照して、収束電磁石10の有効磁場領域15aを形成するための計算式について説明する。なお、Z軸方向への荷電粒子ビームの偏向は考慮しないので、XY面における有効磁場領域の形成について説明する。収束電磁石10の有効磁場領域15aについて説明するが、有効磁場領域15bについても同じであるため、説明は省略する。   A calculation formula for forming the effective magnetic field region 15a of the converging electromagnet 10 will be described with reference to FIG. Since the deflection of the charged particle beam in the Z-axis direction is not considered, the formation of an effective magnetic field region on the XY plane will be described. Although the effective magnetic field region 15a of the converging electromagnet 10 will be described, the same applies to the effective magnetic field region 15b, and the description thereof will be omitted.

まず、収束電磁石10の荷電粒子ビームの出射側17の有効磁場領域15aの境界は、アイソセンターOから等距離rの位置にある範囲となるように決める。次に、収束電磁石10の荷電粒子ビームの入射側16の有効磁場領域15aの境界は、後述する関係式(1)〜(5)に基づき、アイソセンターOから所定の距離Lの位置にある仮想上の偏向起点Qにて偏向角φで偏向し、入射する荷電粒子ビームが、アイソセンターOに収束するように決められる。ここで、仮想上の偏向起点Qは、振分電磁石装置20の中心で荷電粒子ビームが偏向角φのキックを極短距離の間に受けると仮定した点である。 First, the boundary of the effective magnetic field region 15a of the exit side 17 of the charged particle beam focusing electromagnet 10 is determined to be in the range of from isocenter O to the position of equidistant r 1. Next, the boundary of the effective magnetic field region 15a on the incident side 16 of the charged particle beam of the focusing electromagnet 10 is a virtual position located at a predetermined distance L from the isocenter O based on relational expressions (1) to (5) described later. It is determined so that the charged particle beam which is deflected by the deflection angle φ at the upper deflection starting point Q and converges on the isocenter O. Here, the hypothetical deflection starting point Q is a point that is assumed that the charged particle beam receives a kick with a deflection angle φ at an extremely short distance at the center of the sorting electromagnet apparatus 20.

偏向角φで輸送されてきた荷電粒子ビームは、入射側16の有効磁場領域15aの境界上の任意の点P1から入り、有効磁場領域15a内で曲率半径rの円運動を行い(このときの中心角は(φ+θ)となる。)、出射側17の有効磁場領域15aの境界上の点P2から出て、アイソセンターOに照射される。つまり、点P1と点P2とは半径r及び中心角(φ+θ)の円弧上にある。 The charged particle beam that has been transported by the deflection angle φ enters from any point P1 on the boundary of the effective magnetic field region 15a on the incident side 16 performs circular motion radius of curvature r 2 in the effective magnetic field region 15a (at this time The central angle of (2) is (φ + θ).) The light exits from the point P2 on the boundary of the effective magnetic field region 15a on the emission side 17 and is irradiated to the isocenter O. That is, the points P1 and P2 are on a circular arc having a radius r 2 and the central angle (φ + θ).

XY面内でアイソセンターOを原点とするXY座標系を想定する。出射側17の点P2とアイソセンターOとを結ぶ直線とX軸とがなす角度を照射角θとすると、入射側16の点P1の座標(x,y)、偏向角φ、及び点Qと点P1との間の距離Rは、以下の関係式(1)〜(4)から求まる。
Assume an XY coordinate system with the isocenter O as the origin in the XY plane. Assuming that the angle formed by the X axis and the straight line connecting the point P2 on the emission side 17 and the isocenter O is the irradiation angle θ, the coordinates (x, y), the deflection angle φ, and the point Q of the point P1 on the incident side 16 The distance R to the point P1 is obtained from the following relational expressions (1) to (4).

ここで、有効磁場領域15aには一様な磁束密度Bの磁場が生じており、荷電粒子ビームの運動量をp(およそ加速器に依存する)、電荷をqとすると、磁場中で偏向される荷電粒子ビームの曲率半径rは、式(5)で表される。
Here, a magnetic field having a uniform magnetic flux density B is generated in the effective magnetic field region 15a. If the momentum of the charged particle beam is p (approximately depending on the accelerator) and the charge is q, the charge deflected in the magnetic field is charged. the radius of curvature r 2 of the particle beam is represented by the formula (5).

上記関係式(1)〜(5)に基づき、収束電磁石10のコイル対11a及び磁極12aの形状及び配置を調整し、コイル対11aに流す電流を調整することで、有効磁場領域15aの境界の形状を調整できる。すなわち、出射側17の有効磁場領域15aの境界上の任意の点P2とアイソセンターOとの間の距離が等距離rとなるように境界を定め、有効磁場領域15aの磁束密度Bを調整して式(5)からrを決め、入射側16の有効磁場領域15aの境界上の点P1と偏向起点Qとの間の距離Rが式(4)の関係を有するように、入射側16の有効磁場領域15aの境界を定める。式(3)のφの極大値が、最大偏向角φmaxとなる。なお、限定されるものではないが、偏向起点Qを通過する荷電粒子ビームが収束電磁石10による偏向を受けなくともアイソセンターOに収束するように、偏向起点Q、収束電磁石10、及びアイソセンターOの配置を調整しておくと、装置構成をよりシンプルにできるため好ましい。 Based on the relational expressions (1) to (5), the shape and arrangement of the coil pair 11a and the magnetic pole 12a of the converging electromagnet 10 are adjusted, and the current flowing through the coil pair 11a is adjusted. The shape can be adjusted. In other words, it bounded so that the distance becomes equidistant r 1 between any point P2 and the isocenter O on the boundary of the effective magnetic field region 15a of the exit side 17, adjusting the flux density B of the effective magnetic field region 15a Then, r 2 is determined from the equation (5), and the incident side is set so that the distance R between the point P1 on the boundary of the effective magnetic field region 15a on the incident side 16 and the deflection starting point Q has the relationship of the equation (4). The boundaries of the 16 effective magnetic field regions 15a are defined. The maximum value of φ in Equation (3) is the maximum deflection angle φmax. Although not limited thereto, the deflection start point Q, the focusing electromagnet 10, and the isocenter O so that the charged particle beam passing through the deflection starting point Q converges on the isocenter O without being deflected by the focusing electromagnet 10. It is preferable to adjust the arrangement in order to simplify the apparatus configuration.

上記のようにして求まる収束電磁石10の有効磁場領域15a、15bの境界は、荷電粒子ビームをアイソセンターOに収束させるための理想的な形状である。なお実際には、この理想的な形状からのずれや磁場分布の不均一性があったとしても、収束電磁石10の励磁量(磁束密度B)を偏向角φごとに予め微調整し、その情報を電源装置(不図示)に記憶させておき、偏向角φと収束電磁石10の電流量とが連動するようにそれらを制御することで、荷電粒子ビームをアイソセンターOに合わせて偏向させることができる。また、事前に磁場分布の不均一性を予測できる場合には、収束電磁石10のコイル対11a及び磁極12aの形状及び配置を補正することで、荷電粒子ビームの軌道を微調整することも可能である。   The boundary between the effective magnetic field regions 15a and 15b of the converging electromagnet 10 obtained as described above is an ideal shape for converging the charged particle beam to the isocenter O. Actually, even if there is a deviation from the ideal shape or non-uniformity of the magnetic field distribution, the amount of excitation (magnetic flux density B) of the focusing electromagnet 10 is finely adjusted in advance for each deflection angle φ, and the information is obtained. Can be stored in a power supply device (not shown), and the charged particle beam can be deflected in accordance with the isocenter O by controlling them so that the deflection angle φ and the current amount of the focusing electromagnet 10 are linked. it can. In addition, when the non-uniformity of the magnetic field distribution can be predicted in advance, it is possible to finely adjust the trajectory of the charged particle beam by correcting the shape and arrangement of the coil pair 11a and the magnetic pole 12a of the focusing electromagnet 10. is there.

図3は、収束電磁石10に電流を供給する電源装置30の概略構成図である。電源装置30は、収束電磁石10のコイル対11a、11bの電流供給端であるブスバー18a、18bに接続された電流切替器31と、電源切替器31を通じてコイル11a、11bに電流を流す電源32と、電流切替器31及び電源32を制御する照射角制御部33とを備える。   FIG. 3 is a schematic configuration diagram of the power supply device 30 that supplies current to the converging electromagnet 10. The power supply device 30 includes a current switch 31 connected to the bus bars 18a and 18b that are current supply ends of the coil pairs 11a and 11b of the converging electromagnet 10, and a power supply 32 that supplies current to the coils 11a and 11b through the power switch 31. And an irradiation angle control unit 33 that controls the current switch 31 and the power source 32.

荷電粒子ビームは基本的にコイル対11a、11bのいずれか一方を通過するものであるため、電源装置30は、電源32からコイル対11a、11bに供給する電流(励磁電流)を電流切替器31により切り替え、荷電粒子ビームが通過するコイル対11a、11bのいずれかに電流を流すように構成されている。   Since the charged particle beam basically passes through one of the coil pairs 11a and 11b, the power supply device 30 supplies a current (excitation current) supplied from the power supply 32 to the coil pairs 11a and 11b as a current switch 31. And the current is passed through one of the coil pairs 11a and 11b through which the charged particle beam passes.

電流切替器31及び電源32は、照射角制御部33により制御される。荷電粒子ビームのエネルギー及び/又は振分電磁石装置20による荷電粒子ビームの偏向角φに応じて、照射角制御部33は、電源32を制御することでコイル対11a、11bに流す電流を制御し、電流切替器31を制御することで電流を供給すべきコイル対11a、11bを切り替える。照射角制御部33が電流切替器31によりコイル対11a、11bに流す電流を切り替えることで、電源32に同時に接続されるコイル対の数が減り、減った分のコイル対の分だけインダクタンスと抵抗を低減できることから、電源32の電源容量を小さくできる。   The current switch 31 and the power source 32 are controlled by the irradiation angle control unit 33. Depending on the energy of the charged particle beam and / or the deflection angle φ of the charged particle beam by the distribution magnet device 20, the irradiation angle control unit 33 controls the current flowing through the coil pairs 11a and 11b by controlling the power source 32. By controlling the current switch 31, the coil pair 11 a and 11 b to be supplied with current is switched. The irradiation angle control unit 33 switches the currents to be supplied to the coil pairs 11a and 11b by the current switch 31, so that the number of coil pairs simultaneously connected to the power source 32 is reduced, and the inductance and resistance corresponding to the reduced coil pairs are reduced. Therefore, the power capacity of the power source 32 can be reduced.

照射角制御部33は、振分電磁石装置20による荷電粒子ビームの偏向方向(偏向角φ)と同期制御するようにしてもよい。また、照射角制御部33は、振分電磁石装置20から周期的に荷電粒子ビームの偏向角φについての情報を入力し、それに基づき電流切替器31及び電源32を制御するようにしてもよい。なお、偏向角φに応じた荷電粒子ビームのエネルギー及び励磁量(コイル対11a、11bごとの電流値)を予め求め、照射角制御部33に偏向角φに関連付けて記憶させておき、照射角制御部33は、それを参照することで、偏向角φに応じて励磁量を制御するようにしてもよい。   The irradiation angle control unit 33 may perform synchronous control with the deflection direction (deflection angle φ) of the charged particle beam by the sorting electromagnet device 20. Further, the irradiation angle control unit 33 may periodically input information about the deflection angle φ of the charged particle beam from the sorting electromagnet device 20 and control the current switch 31 and the power source 32 based on the information. The energy and excitation amount (current value for each coil pair 11a and 11b) of the charged particle beam corresponding to the deflection angle φ are obtained in advance and stored in the irradiation angle control unit 33 in association with the deflection angle φ. The control unit 33 may control the excitation amount according to the deflection angle φ by referring to it.

なお、コイル11a、11bに流す電流量がコイル対11a、11bの両方で等しくてよい場合、すなわち偏向角φごとに励磁量を変えない場合には、コイル対11aとコイル対11bとを互いに直列に接続し、一つの電源32により両方のコイル対11a、11bに電流を流すようにしてもよい。この場合、電源装置30は、電流切替器31を備えていなくてもよい。   When the amount of current flowing through the coils 11a and 11b may be equal in both the coil pairs 11a and 11b, that is, when the amount of excitation is not changed for each deflection angle φ, the coil pair 11a and the coil pair 11b are connected in series. And a single power source 32 may cause current to flow through both coil pairs 11a and 11b. In this case, the power supply device 30 may not include the current switch 31.

本実施形態に係る収束電磁石10は、荷電粒子ビームを標的(アイソセンターO)に照射する方向(照射角θ)を連続的にできる。収束電磁石10は、広い角度範囲(例えば±10度〜90度未満)から荷電粒子ビームが入射されてきたとしても、荷電粒子ビームを標的に収束できる。収束電磁石10を用いることで、標的(患者)を動かす必要もなく、患者を動かす従来技術に比べて、患者への負荷及び移動にともなう標的の変形を防止又は低減できる。また、収束電磁石10では、荷電粒子ビームが偏向角φに応じて、標的に収束するような照射角θが決まるように有効磁場領域が形成されるため、該収束電磁石を物理的に動かすための巨大な機構を必要とせず、その分だけ製造コストや設置スペースの問題を低減できる。   The focusing electromagnet 10 according to the present embodiment can continuously make a direction (irradiation angle θ) in which a charged particle beam is irradiated onto a target (isocenter O). The converging electromagnet 10 can converge the charged particle beam to the target even if the charged particle beam is incident from a wide angle range (for example, ± 10 degrees to less than 90 degrees). By using the focusing electromagnet 10, it is not necessary to move the target (patient), and the deformation of the target due to the load and movement on the patient can be prevented or reduced as compared with the conventional technique for moving the patient. In the converging electromagnet 10, an effective magnetic field region is formed so that the irradiation angle θ is determined so that the charged particle beam converges on the target in accordance with the deflection angle φ, so that the converging electromagnet can be physically moved. A huge mechanism is not required, and the problem of manufacturing cost and installation space can be reduced accordingly.

〔第2実施形態〕
本発明の第2実施形態は、第1実施形態に係る収束電磁石10を用いた荷電粒子ビーム照射装置100に関する。
[Second Embodiment]
The second embodiment of the present invention relates to a charged particle beam irradiation apparatus 100 using the converging electromagnet 10 according to the first embodiment.

図4(a)は、本実施形態に係る荷電粒子ビーム照射装置100の概略構成図であり、図4(b)は荷電粒子ビーム照射装置100の上流側の加速器40から下流側の収束電磁石10までの概略斜視図である。荷電粒子ビーム照射装置100は、収束電磁石10、振分電磁石装置20、電源装置30、及び加速器40を有する。また、荷電粒子ビーム照射装置100は、ビームスリット装置50、四極電磁石装置52、ステアリング電磁石装置54、及びビームモニタ装置60のうちの少なくとも1つ以上をさらに有するようにしてもよい。   FIG. 4A is a schematic configuration diagram of the charged particle beam irradiation apparatus 100 according to the present embodiment, and FIG. 4B is a focusing electromagnet 10 on the downstream side from the accelerator 40 on the upstream side of the charged particle beam irradiation apparatus 100. It is a schematic perspective view up to. The charged particle beam irradiation apparatus 100 includes a focusing electromagnet 10, a sorting electromagnet apparatus 20, a power supply apparatus 30, and an accelerator 40. The charged particle beam irradiation apparatus 100 may further include at least one of a beam slit device 50, a quadrupole electromagnet device 52, a steering electromagnet device 54, and a beam monitor device 60.

加速器40は、荷電粒子ビームを生成する装置であり、例えばシンクロトロン、サイクロトロン、又は線形加速器である。加速器40で生成された荷電粒子ビームは、内部が真空に保たれた真空ダクト70中を通じて振分電磁石装置20に導かれる。荷電粒子ビーム照射装置100がビームスリット装置50、四極電磁石装置52、及びステアリング電磁石装置54を有する場合は、加速器40、ビームスリット装置50、四極電磁石装置52、ステアリング電磁石装置54、及び振分電磁石装置20それぞれの間は真空ダクト70で接続される。   The accelerator 40 is a device that generates a charged particle beam, and is, for example, a synchrotron, a cyclotron, or a linear accelerator. The charged particle beam generated by the accelerator 40 is guided to the sorting electromagnet apparatus 20 through the vacuum duct 70 whose interior is kept in a vacuum. When the charged particle beam irradiation device 100 includes the beam slit device 50, the quadrupole electromagnet device 52, and the steering electromagnet device 54, the accelerator 40, the beam slit device 50, the quadrupole electromagnet device 52, the steering electromagnet device 54, and the sorting electromagnet device. Each of the 20 is connected by a vacuum duct 70.

ビームスリット装置50は、荷電粒子ビームのビーム形状及び/又は線量を調整するスリットと、スリット幅を制御する制御部を備える。該制御部は、後述するように、ビームモニタ装置60からの情報を基にスリット幅を制御し、ビーム形状及び/又は線量を調整するようにしてもよい。   The beam slit device 50 includes a slit that adjusts the beam shape and / or dose of a charged particle beam, and a controller that controls the slit width. As will be described later, the control unit may control the slit width based on information from the beam monitor device 60 to adjust the beam shape and / or dose.

四極電磁石装置52は、荷電粒子ビームのビーム形状を調整するための1つ以上の四極電磁石と、四極電磁石に流す電流を制御し、ビーム形状の調整量を制御する制御部とを備える。該制御部は、後述するように、ビームモニタ装置60からの情報を基に四極電磁石に流す電流量を制御し、ビーム形状を調整するようにしてもよい。例えば、四極電磁石装置52は、Y軸方向のビーム形状を調整するための四極電磁石と、Z軸方向のビーム形状を調整するための四極電磁石との2つの四極電磁石を少なくとも備える。   The quadrupole electromagnet apparatus 52 includes one or more quadrupole electromagnets for adjusting the beam shape of the charged particle beam, and a control unit that controls a current flowing through the quadrupole electromagnet and controls an adjustment amount of the beam shape. As will be described later, the control unit may control the amount of current flowing through the quadrupole electromagnet based on information from the beam monitor device 60 to adjust the beam shape. For example, the quadrupole electromagnet apparatus 52 includes at least two quadrupole electromagnets, a quadrupole electromagnet for adjusting the beam shape in the Y-axis direction and a quadrupole electromagnet for adjusting the beam shape in the Z-axis direction.

ステアリング電磁石装置54は、荷電粒子ビームのビーム位置を微調整するための1つ以上の電磁石と、該電磁石に流す電流を制御し、荷電粒子ビームのビーム位置を制御する制御部を備える。該制御部は、ビームモニタ装置60からの情報を基に、電磁石に流す電流を制御し、ビーム位置を調整するようにしてもよい。   The steering electromagnet device 54 includes one or more electromagnets for finely adjusting the beam position of the charged particle beam, and a control unit that controls a current flowing through the electromagnet and controls the beam position of the charged particle beam. The control unit may control the current passed through the electromagnet based on information from the beam monitor device 60 to adjust the beam position.

荷電粒子ビームの振分電磁石20からアイソセンターOまでの経路は、照射角θに応じて異なることから、荷電粒子ビームが受ける光学的要素も照射角θに応じて変わり、アイソセンターOでの荷電粒子ビームのビーム形状が照射角θに応じて変わることがある。これに対しては、例えば、収束電磁石10よりも上流側に設けられた四極電磁石装置52は、四極電磁石を励磁する電流を照射角θごとに制御し、アイソセンターOにおける荷電粒子ビームのビーム形状が適切になるように調整するようにしてもよい。また、荷電粒子ビームのビーム形状の調整は、ビームスリット装置50により行うようにしてもよい。この場合も同様に、ビームスリット装置50のスリット幅を照射角θごとに制御するようにするとよい。   Since the path of the charged particle beam from the distribution magnet 20 to the isocenter O varies depending on the irradiation angle θ, the optical element received by the charged particle beam also varies depending on the irradiation angle θ, and charging at the isocenter O is performed. The beam shape of the particle beam may change depending on the irradiation angle θ. In response to this, for example, the quadrupole electromagnet apparatus 52 provided on the upstream side of the focusing electromagnet 10 controls the current for exciting the quadrupole electromagnet for each irradiation angle θ, and the beam shape of the charged particle beam at the isocenter O. May be adjusted to be appropriate. The beam shape of the charged particle beam may be adjusted by the beam slitting device 50. Similarly in this case, the slit width of the beam slitting device 50 may be controlled for each irradiation angle θ.

高い照射精度を維持するためには、アイソセンターOに照射される荷電粒子ビームの照射角θを正確に制御することが好ましい。しかし、荷電粒子ビーム照射装置100の各種機器のアライメントエラーや、各種電磁石の磁場の誤差により、照射角θの精度が低下する可能性がある。そこで、収束電磁石10の出射側17に、荷電粒子ビームの位置を監視するビームモニタ装置60を設け、ビームモニタ装置60から荷電粒子ビームのビーム位置及びビーム形状(ビーム幅など)の情報を、ビームスリット装置50、四極電磁石装置52、ステアリング電磁石装置54、振分電磁石装置20、及び収束電磁石10の電源装置30の照射角制御部33のうちの1つ以上に出力し、それぞれがフィードバック制御を行うようにするとよい。   In order to maintain high irradiation accuracy, it is preferable to accurately control the irradiation angle θ of the charged particle beam irradiated to the isocenter O. However, the accuracy of the irradiation angle θ may decrease due to alignment errors of various devices of the charged particle beam irradiation apparatus 100 and magnetic field errors of various electromagnets. Therefore, a beam monitor device 60 for monitoring the position of the charged particle beam is provided on the exit side 17 of the focusing electromagnet 10, and information on the beam position and beam shape (beam width, etc.) of the charged particle beam is obtained from the beam monitor device 60 as a beam. Output to one or more of the irradiation angle control unit 33 of the power supply device 30 of the slitting device 50, the quadrupole electromagnet device 52, the steering electromagnet device 54, the distribution electromagnet device 20, and the converging electromagnet 10, and each performs feedback control. It is good to do so.

例えば、ビームモニタ装置60からの情報を入力すると、ビームスリット装置50はスリット幅を制御して荷電粒子ビームのビーム形状を調整し、四極電磁石装置52は四極電磁石に流す励磁電流を制御して荷電粒子ビームのビーム形状を調整し、ステアリング電磁石装置54は電磁石に流す励磁電流を制御して荷電粒子ビームのビーム位置を調整し、振分電磁石装置20は電磁石に流す励磁電流を制御して出射する荷電粒子ビームの偏向角φを調整し、又は照射角制御部33はアイソセンターOに照射する荷電粒子ビームの照射角θを調整する。   For example, when information from the beam monitor device 60 is input, the beam slit device 50 controls the slit width to adjust the beam shape of the charged particle beam, and the quadrupole electromagnet device 52 controls the excitation current flowing through the quadrupole electromagnet to charge the beam. The beam shape of the particle beam is adjusted, the steering electromagnet device 54 controls the excitation current that flows through the electromagnet to adjust the beam position of the charged particle beam, and the sorting electromagnet device 20 controls the excitation current that flows through the electromagnet and emits it. The deflection angle φ of the charged particle beam is adjusted, or the irradiation angle control unit 33 adjusts the irradiation angle θ of the charged particle beam irradiated to the isocenter O.

ビームモニタ装置60を用いたフィードバック制御により、アイソセンターOに対する照射精度をより向上できる。なお、フィードバックする情報(ビーム位置及びビーム形状)と、ビームスリット装置50、四極電磁石装置52、ステアリング電磁石装置54、振分電磁石装置20、及び照射角制御部33それぞれの調整量との間の関係を予め調べておき、各装置に予め記憶させておくとよい。   By feedback control using the beam monitor device 60, the irradiation accuracy with respect to the isocenter O can be further improved. The relationship between feedback information (beam position and beam shape) and adjustment amounts of the beam slit device 50, the quadrupole electromagnet device 52, the steering electromagnet device 54, the sorting electromagnet device 20, and the irradiation angle control unit 33. It is good to check beforehand and memorize | store in each apparatus beforehand.

荷電粒子ビーム照射装置100において、振分電磁石装置20と収束電磁石10との間には、荷電粒子ビームを輸送するための真空ダクト72が設けられる。真空ダクト72は、振分電磁石装置20の最大偏向角φの範囲をカバーする扇型状(XY面)の真空ダクトである。XY面における真空ダクト72の形状を扇型状とすることで、矩形状のものと比べて小型化でき、設置スペースを低減できる。   In the charged particle beam irradiation apparatus 100, a vacuum duct 72 for transporting the charged particle beam is provided between the sorting electromagnet apparatus 20 and the focusing electromagnet 10. The vacuum duct 72 is a fan-shaped (XY plane) vacuum duct that covers the range of the maximum deflection angle φ of the sorting electromagnet device 20. By making the shape of the vacuum duct 72 on the XY plane into a fan shape, the size can be reduced as compared with the rectangular shape, and the installation space can be reduced.

真空ダクト72は、図5に示すように振分電磁石装置20の出射口に接続された筒状の真空ダクトであってもよい。この構造により、真空ダクトのさらなる小型化及び設置スペースの低減が可能となる。この場合、駆動機構(不図示)が、振分電磁石装置20の偏向角φに連動して、XY面においてプラスの最大偏向角(φmax)からマイナスの最大偏向角(−φmax)の範囲で真空ダクト72を移動させるようにしてもよい。   The vacuum duct 72 may be a cylindrical vacuum duct connected to the exit of the sorting electromagnet device 20 as shown in FIG. With this structure, the vacuum duct can be further reduced in size and installation space can be reduced. In this case, the driving mechanism (not shown) is evacuated in the range from the positive maximum deflection angle (φmax) to the negative maximum deflection angle (−φmax) on the XY plane in conjunction with the deflection angle φ of the sorting electromagnet device 20. The duct 72 may be moved.

図6は、荷電粒子ビーム照射装置100を患者に対する粒子線治療に用いた使用概略図である。荷電粒子ビーム照射装置100が設置される粒子線治療を行う照射室において、収束電磁石10を、収束電磁石10の長手方向を照射室の床面に対して傾斜させて配置することにより、装置の設置に必要な天井高さを低く抑えることができる。この場合、加速器40からの荷電粒子ビームの進行方向とアイソセンターOとは一直線上にはないので、振分電磁石装置20における荷電粒子ビームの偏向起点QとアイソセンターOとを結ぶ線をX軸とすると、図2で説明したように関係式(1)〜(5)を基に有効磁場領域15a、15bを形成できる。   FIG. 6 is a schematic diagram showing the use of the charged particle beam irradiation apparatus 100 for particle beam therapy for a patient. In the irradiation chamber for performing particle beam therapy in which the charged particle beam irradiation apparatus 100 is installed, the focusing electromagnet 10 is disposed with the longitudinal direction of the focusing electromagnet 10 being inclined with respect to the floor surface of the irradiation chamber. The ceiling height required for the installation can be kept low. In this case, since the traveling direction of the charged particle beam from the accelerator 40 and the isocenter O are not in a straight line, the line connecting the deflection starting point Q of the charged particle beam and the isocenter O in the sorting electromagnet apparatus 20 is the X axis. Then, as described in FIG. 2, the effective magnetic field regions 15a and 15b can be formed based on the relational expressions (1) to (5).

〔第3実施形態〕
本発明の第3実施形態は、1組のコイル対11aを備えた収束電磁石200を用いた荷電粒子ビーム照射装置300に関する。
[Third Embodiment]
The third embodiment of the present invention relates to a charged particle beam irradiation apparatus 300 using a converging electromagnet 200 provided with a pair of coils 11a.

図7(a)及び(b)に示すように、本実施形態に係る収束電磁石200は、第1実施形態の収束電磁石10のうちコイル対11a、磁極12a、及びヨーク13を備えたものである。収束電磁石200は、第1実施形態の収束電磁石10に比べて、コイル対11b及び磁極12bの分だけ電磁石を構成するヨーク13の体積を低減でき、収束電磁石200の重量も軽くできる。   As shown in FIGS. 7A and 7B, the converging electromagnet 200 according to this embodiment includes the coil pair 11a, the magnetic pole 12a, and the yoke 13 in the converging electromagnet 10 of the first embodiment. . Compared with the focusing electromagnet 10 of the first embodiment, the focusing electromagnet 200 can reduce the volume of the yoke 13 constituting the electromagnet by the amount of the coil pair 11b and the magnetic pole 12b, and can also reduce the weight of the focusing electromagnet 200.

図示していないが、荷電粒子ビーム照射装置300は、第2実施形態と同様に、振分電磁石装置20、電源装置30、及び加速器40を有し、さらに、収束電磁石200をアイソセンターOを通るX軸のまわりに回転させる駆動装置220を有する。収束電磁石200と振分電磁石20は真空ダクト240を通じて接続されている。また、荷電粒子ビーム照射装置300は、図示していないが、ビームスリット装置50、四極電磁石装置52、ステアリング電磁石装置54、及びビームモニタ装置60のうちの少なくとも1つ以上をさらに有するようにしてもよい。   Although not shown, the charged particle beam irradiation apparatus 300 includes the sorting electromagnet apparatus 20, the power supply apparatus 30, and the accelerator 40 as in the second embodiment, and further passes through the focusing electromagnet 200 through the isocenter O. A driving device 220 that rotates around the X axis is included. The focusing electromagnet 200 and the sorting electromagnet 20 are connected through a vacuum duct 240. Although not shown, the charged particle beam irradiation apparatus 300 may further include at least one of a beam slit device 50, a quadrupole electromagnet device 52, a steering electromagnet device 54, and a beam monitor device 60. Good.

図8に示すように、荷電粒子ビーム照射装置300では、駆動装置220が収束電磁石200をX軸のまわりで回転させることで、任意の立体角(X軸周りの回転角ωとXY平面の照射角θとの組み合わせ)の範囲からアイソセンターOに荷電粒子ビームを照射できる。このように、荷電粒子ビーム照射装置300は、患者を動かすことなく、あたかもガンマナイフ機構のような立体的な多方向照射による粒子線治療を可能にする。   As shown in FIG. 8, in the charged particle beam irradiation apparatus 300, the driving apparatus 220 rotates the focusing electromagnet 200 around the X axis, so that an arbitrary solid angle (rotation angle ω around the X axis and irradiation on the XY plane). The charged particle beam can be irradiated to the isocenter O from the range of the combination with the angle θ. In this way, the charged particle beam irradiation apparatus 300 enables particle beam treatment by three-dimensional multidirectional irradiation like a gamma knife mechanism without moving the patient.

〔第4実施形態〕
本発明の第4実施形態は、第2実施形態の荷電粒子ビーム照射装置100(又は第3実施形態の荷電粒子ビーム照射装置300)にさらに、体内の標的を見るための画像撮影装置420を設けた荷電粒子ビーム照射装置400に関する。
[Fourth Embodiment]
In the fourth embodiment of the present invention, the charged particle beam irradiation apparatus 100 of the second embodiment (or the charged particle beam irradiation apparatus 300 of the third embodiment) is further provided with an image capturing apparatus 420 for viewing a target in the body. The present invention also relates to the charged particle beam irradiation apparatus 400.

図9に示すように、X線又は磁気共鳴技術を用いた画像撮影装置420を患者の近くに配置することで、荷電粒子ビームの照射前または照射中に、患者内部の標的(悪性腫瘍)の形状を確認できる。荷電粒子ビームの照射前に、画像撮影装置420を用いて体内の標的の形状を確認できれば、照射する荷電粒子ビームを標的の位置により精度良くアライメントすることも可能となる。また、画像撮影装置420で撮影した画像情報を基に、時間とともに変化する標的の形状に合わせて、事前に計画された照射領域の形状(荷電粒子ビームの形状)を微調整することも可能となる。また、標的は荷電粒子ビームの照射中にも移動したり変形したりする場合があるが、そのような場合でも荷電粒子ビームの照射中に画像撮影装置420を用いて標的の画像情報を取得し、該情報を基に、手動で又は第2実施形態で述べたフィードバック制御により荷電粒子ビームの形状を調整することで、照射精度をより向上できる。   As shown in FIG. 9, an imaging apparatus 420 using X-ray or magnetic resonance technology is arranged near the patient, so that the target (malignant tumor) inside the patient can be detected before or during irradiation with the charged particle beam. The shape can be confirmed. If the shape of the target in the body can be confirmed using the image capturing device 420 before the irradiation of the charged particle beam, the charged particle beam to be irradiated can be accurately aligned with the position of the target. In addition, based on the image information captured by the image capturing device 420, it is possible to finely adjust the shape of the irradiation region (the shape of the charged particle beam) planned in advance according to the shape of the target that changes with time. Become. Further, the target may move or deform during the irradiation of the charged particle beam. Even in such a case, the image information of the target is acquired using the image capturing device 420 during the irradiation of the charged particle beam. Based on this information, the irradiation accuracy can be further improved by adjusting the shape of the charged particle beam manually or by the feedback control described in the second embodiment.

上記実施形態で説明される寸法、材料、形状、構成要素の相対的な位置等は、本発明が適用される装置の構造又は様々な条件に応じて変更される。説明に用いた特定の用語及び実施形態に限定されることは意図しておらず、当業者であれば、他の同等の構成要素を使用することができ、上記実施形態は、本発明の趣旨又は範囲から逸脱しない限り、他の変形及び変更も可能である。また、本発明の一つの実施形態に関連して説明した特徴を、たとえ明確に前述していなくても、他の実施形態とともに用いることも可能である。   The dimensions, materials, shapes, relative positions of components, and the like described in the above embodiments are changed according to the structure of the apparatus to which the present invention is applied or various conditions. It is not intended to be limited to the specific terms and embodiments used in the description, and other equivalent components can be used by those skilled in the art, and the above embodiments are within the spirit of the invention. Other variations and modifications are possible without departing from the scope. Also, features described in connection with one embodiment of the invention may be used with other embodiments, even if not explicitly described above.

10、200 収束電磁石
11a、11b コイル対
12a、12b 磁極
13 ヨーク
15a、15b 有効磁場領域
16 荷電粒子ビームの入射側
17 荷電粒子ビームの出射側
18 ブスバー
20 振分電磁石装置
30 電源装置
31 電流切替器
32 電源
33 照射角制御部
40 加速器
50 ビームスリット装置
52 四極電磁石装置
54 ステアリング電磁石装置
60 ビームモニタ装置
70、72 真空ダクト
100、300、400 荷電粒子ビーム照射装置
220 駆動装置
420 画像撮影装置
DESCRIPTION OF SYMBOLS 10,200 Focusing electromagnet 11a, 11b Coil pair 12a, 12b Magnetic pole 13 Yoke 15a, 15b Effective magnetic field area 16 Incident side 17 of charged particle beam Ejection side 18 of charged particle beam 18 Bus bar 20 Distribution magnet device 30 Power supply device 31 Current switch 32 Power supply 33 Irradiation angle control unit 40 Accelerator 50 Beam slit device 52 Quadrupole electromagnet device 54 Steering electromagnet device 60 Beam monitor devices 70, 72 Vacuum ducts 100, 300, 400 Charged particle beam irradiation device 220 Drive device 420 Image photographing device

Claims (11)

荷電粒子ビームの経路を挟むように配置されたコイル対を備えた収束電磁石であって、
前記コイル対は、電流を入力すると、荷電粒子ビームの進行方向(X軸)に直交する方向(Z軸)に磁場が向いた有効磁場領域を生成するよう構成されており、ここで、X軸とZ軸の両方に直交する軸をY軸とし、
XY面において、
偏向起点QにてX軸に対する偏向角φで偏向し、前記有効磁場領域に入射した荷電粒子ビームは、前記有効磁場領域により偏向され、X軸に対する照射角θでアイソセンターに照射され、
前記有効磁場領域の荷電粒子ビームの出射側の境界上の任意の点P2は、前記アイソセンターから等距離rの位置にあり、
前記有効磁場領域の荷電粒子ビームの入射側の境界上の点P1と前記点P2は、半径r及び中心角(θ+φ)の円弧上にあり、
前記偏向起点Qと前記点P1との間の距離Rは、前記偏向起点Qと前記アイソセンターとの間の距離をLとすると、関係式(4):
を満たす、前記収束電磁石。
A focusing electromagnet having a coil pair arranged so as to sandwich a path of a charged particle beam,
The coil pair is configured to generate an effective magnetic field region in which a magnetic field is directed in a direction (Z axis) orthogonal to a traveling direction (X axis) of a charged particle beam when current is input. The axis perpendicular to both the Z axis and the Y axis is the Y axis,
In the XY plane,
The charged particle beam deflected by the deflection angle φ with respect to the X axis at the deflection start point Q and incident on the effective magnetic field region is deflected by the effective magnetic field region, and is irradiated to the isocenter at an irradiation angle θ with respect to the X axis.
An arbitrary point P2 on the boundary of the effective magnetic field region on the emission side of the charged particle beam is located at an equal distance r 1 from the isocenter,
The point P2 and the point P1 on the boundary of the entrance side of the charged particle beam of the effective magnetic field region is in a circular arc on a radius r 2 and the central angle (theta + phi),
The distance R between the deflection starting point Q and the point P1 is represented by the relational expression (4), where L is the distance between the deflection starting point Q and the isocenter.
Satisfying the converging electromagnet.
前記収束電磁石は、前記コイル対を二組以上備え、
前記二組以上のコイル対は、荷電粒子ビームの経路を挟み且つY軸方向に並ぶように配置され、
前記二組以上のコイル対のうち第1のコイル対及び第2のコイル対に電流切替器が接続されており、
前記電流切替器は、電流を前記第1のコイル対及び前記第2のコイル対のいずれか1つに供給するよう構成され、
前記第1のコイル対及び前記第2のコイル対は、生成する有効磁場領域の磁場の向きが互いに反対となるよう構成されている、請求項1に記載の収束電磁石。
The convergence electromagnet includes two or more pairs of the coil pairs,
The two or more pairs of coils are arranged so as to sandwich the path of the charged particle beam and line up in the Y-axis direction,
A current switch is connected to the first coil pair and the second coil pair among the two or more coil pairs,
The current switch is configured to supply current to any one of the first coil pair and the second coil pair;
2. The converging electromagnet according to claim 1, wherein the first coil pair and the second coil pair are configured such that directions of magnetic fields in a generated effective magnetic field region are opposite to each other.
前記偏向起点Qと前記アイソセンターはX軸上にある、請求項1又は2に記載の収束電磁石。   The focusing electromagnet according to claim 1, wherein the deflection starting point Q and the isocenter are on the X axis. 荷電粒子ビームを生成する加速器と、
前記加速器からの荷電粒子ビームを、前記偏向起点Qにて10度以上の偏向角φで偏向する振分電磁石装置と
請求項1〜3のいずれか1項に記載の収束電磁石と、
前記収束電磁石に電流を供給し励磁するための電源装置と、
を有する荷電粒子ビーム照射装置。
An accelerator that generates a charged particle beam;
A focusing electromagnet device that deflects the charged particle beam from the accelerator at a deflection angle φ of 10 degrees or more at the deflection start point Q; and the focusing electromagnet according to any one of claims 1 to 3;
A power supply for supplying and exciting current to the converging electromagnet;
A charged particle beam irradiation apparatus.
前記振分電磁石装置と前記収束電磁石とを接続する真空ダクト
をさらに有し、
前記真空ダクトは、XY面において扇型形状をしており、前記10度以上の偏向角φで偏向された荷電粒子ビームであっても前記真空ダクト内を通過できるよう構成されている、請求項4に記載の荷電粒子ビーム照射装置。
A vacuum duct connecting the distribution electromagnet device and the converging electromagnet;
The vacuum duct has a fan shape on an XY plane, and is configured to allow the charged particle beam deflected at the deflection angle φ of 10 degrees or more to pass through the vacuum duct. 4. The charged particle beam irradiation apparatus according to 4.
X軸のまわりに回転角ωで前記収束電磁石を回転させる駆動装置、
をさらに有し、
前記回転角ωと前記照射角θの任意の組み合わせの範囲から、荷電粒子ビームをアイソセンターに照射するよう構成されている請求項4又は5に記載の荷電粒子ビーム照射装置。
A driving device for rotating the focusing electromagnet around the X axis at a rotation angle ω;
Further comprising
The charged particle beam irradiation apparatus according to claim 4 or 5, wherein the charged particle beam irradiation apparatus is configured to irradiate the isocenter with a charged particle beam from an arbitrary combination range of the rotation angle ω and the irradiation angle θ.
前記収束電磁石は、前記荷電粒子ビーム照射装置が設置される照射室の床面に対して前記収束電磁石の長手方向を傾斜して配置できるように構成されている、請求項4〜6のいずれか1項に記載の荷電粒子ビーム照射装置。   The said focusing electromagnet is comprised so that the longitudinal direction of the said focusing electromagnet can be inclined and arrange | positioned with respect to the floor surface of the irradiation chamber in which the said charged particle beam irradiation apparatus is installed. 2. The charged particle beam irradiation apparatus according to item 1. 前記振分電磁石装置の上流側に設けられ、荷電粒子ビームのビーム形状を調整するための四極電磁石をさらに有する請求項4〜7のいずれか1項に記載の荷電粒子ビーム照射装置。   The charged particle beam irradiation apparatus according to any one of claims 4 to 7, further comprising a quadrupole electromagnet provided on the upstream side of the sorting electromagnet apparatus and configured to adjust a beam shape of the charged particle beam. 荷電粒子ビームのビーム形状を照射角θごとに調整するために、前記四極電磁石の励磁電流は、照射角θごとに制御される、請求項8に記載の荷電粒子ビーム照射装置。   The charged particle beam irradiation apparatus according to claim 8, wherein an excitation current of the quadrupole electromagnet is controlled for each irradiation angle θ in order to adjust a beam shape of the charged particle beam for each irradiation angle θ. 前記振分電磁石装置の上流側に設けられたステアリング電磁石装置と、
前記収束電磁石の前記出射側に設けられたビームモニタ装置と
をさらに有し、
前記ビームモニタ装置からの荷電粒子ビームのビーム位置の情報から、前記振分電磁石装置、前記収束電磁石、及び前記ステアリング電磁石のうちの少なくとも1つの励磁電流をフィードバック制御する、請求項4〜9のいずれか1項に記載の荷電粒子ビーム照射装置。
A steering electromagnet device provided upstream of the distribution electromagnet device;
A beam monitor device provided on the exit side of the focusing electromagnet;
The feedback control of at least one exciting current among the sorting electromagnet device, the converging electromagnet, and the steering electromagnet is performed based on information on a beam position of the charged particle beam from the beam monitor device. The charged particle beam irradiation apparatus according to claim 1.
前記アイソセンターにある標的を挟むように設けられた画像撮影装置をさらに有し、
前記画像撮影装置は、前記標的に荷電粒子ビームを照射する前又は照射中に、前記標的の画像情報を生成するよう構成されている、請求項4〜10のいずれか1項に記載の荷電粒子ビーム照射装置。

It further has an image capturing device provided so as to sandwich the target in the isocenter,
The charged particle according to any one of claims 4 to 10, wherein the imaging device is configured to generate image information of the target before or during irradiation of the target with a charged particle beam. Beam irradiation device.

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