JP2019177358A - Stirring device - Google Patents

Stirring device Download PDF

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JP2019177358A
JP2019177358A JP2018068963A JP2018068963A JP2019177358A JP 2019177358 A JP2019177358 A JP 2019177358A JP 2018068963 A JP2018068963 A JP 2018068963A JP 2018068963 A JP2018068963 A JP 2018068963A JP 2019177358 A JP2019177358 A JP 2019177358A
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opening
chamber
flow path
separation chamber
carrier
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JP7097733B2 (en
Inventor
浩史 上野
Hiroshi Ueno
浩史 上野
石間 智生
Tomoo Ishima
智生 石間
市川 真治
Shinji Ichikawa
真治 市川
好一 加藤
Koichi Kato
好一 加藤
健一 吾郷
Kenichi Ago
健一 吾郷
孝宏 根本
Takahiro Nemoto
孝宏 根本
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Aquas Corp
Satake Chemical Equipment Mfg Ltd
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Aquas Corp
Satake Chemical Equipment Mfg Ltd
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Abstract

To provide a stirring device which can discharge only treatment water with no carrier from a treatment tank to the outside.SOLUTION: A stirring device of the invention includes: a treatment tank in which a liquid with a carrier is placed; a rotary vane provided within the treatment tank; a stator vane fixed to a bottom part of the treatment tank and extending radially; and a carrier separation chamber. The carrier separation chamber comprises: a passage chamber part having an upper opening and a lower opening which are formed so as to communicate with the treatment tank; and a separation chamber part having a drainage opening which is formed so as to communicate with a lower part of the passage chamber part and a discharge port provided at an upper part.SELECTED DRAWING: Figure 1

Description

本発明は撹拌装置、特に、微生物や触媒を担持した担体を有する排水などの液体を撹拌しながら処理する微生物反応装置や排水処理装置などの撹拌装置に関するものである。   The present invention relates to an agitation device, and more particularly to an agitation device such as a microbial reaction device or a waste water treatment device for treating a liquid such as waste water having a carrier carrying microorganisms or a catalyst while stirring.

排水を処理するために、排水に微生物や触媒を担持した担体を撹拌して、排水を浄化する方法がある。   In order to treat the wastewater, there is a method of purifying the wastewater by stirring a carrier carrying microorganisms or a catalyst in the wastewater.

図19及び図20は従来の微生物反応装置などの撹拌装置を示し、1は、撹拌装置、2は、該撹拌装置1の処理槽を示し、該処理槽2は、例えば、槽径(直径)が1〜10m、高さが、槽径に対して、0.5〜5倍の高さの縦型の円筒状よりなる。   19 and 20 show a stirring device such as a conventional microbial reactor, 1 is a stirring device, 2 is a treatment tank of the stirring device 1, and the treatment tank 2 is, for example, a tank diameter (diameter). 1 to 10 m, and the height is a vertical cylindrical shape having a height of 0.5 to 5 times the tank diameter.

3は、回転翼を示し、該回転翼3は、例えば、翼径が槽径に対して0.3〜0.6倍の長さであり、前記処理槽2の上部から垂設された回転軸3aの下端に半径方向に放射状に固定される。   3 indicates a rotating blade, and the rotating blade 3 has, for example, a blade diameter of 0.3 to 0.6 times the tank diameter, and a rotating blade suspended from the upper part of the processing tank 2 It is radially fixed to the lower end of the shaft 3a in the radial direction.

前記回転翼3は、例えば、4枚のフラットパドル翼などの矩形板状の翼板からなり、モータ等の駆動手段(図示せず)により前記回転軸3aを介して、前記処理槽2内に所望の高さまで容れられた液体内の上部、例えば、液面の近傍において回転するように設けられている。   The rotary blade 3 is composed of, for example, a rectangular blade plate such as four flat paddle blades, and is placed in the processing tank 2 via the rotary shaft 3a by a driving means (not shown) such as a motor. It is provided to rotate in the upper part of the liquid contained up to a desired height, for example, in the vicinity of the liquid level.

4は、静翼を示し、該静翼4は、例えば、4枚の複数の直線状の帯状板からなり、前記回転翼3の下方の前記処理槽2の底部2aの中心に放射状に等角度に離間して固定される。   Reference numeral 4 denotes a stationary blade. The stationary blade 4 is composed of, for example, a plurality of linear strips of four sheets, and is radially equiangular at the center of the bottom 2a of the processing tank 2 below the rotary blade 3. It is fixed to be separated.

また、前記各帯状板は、例えば、図20に示すように、該帯状板の交差部に相当する前記帯状体の中心部は互に間隙5を有すると共に、該各帯状板は、例えば、前記回転翼3の回転方向の前方で、前記底部2aの中心を通る半径線Rから間隔dを開けて並行に固定されている。   Further, for example, as shown in FIG. 20, the center portions of the strips corresponding to the intersecting portions of the strip plates have a gap 5 therebetween, and the strip plates are, for example, The rotary blade 3 is fixed in parallel at a distance d from a radial line R passing through the center of the bottom 2a in front of the rotating direction of the rotary blade 3.

6は、流入管を示し、該流入管6は、例えば、前記処理槽2の側壁の下部に設けられ、処理すべき処理水などの液体を前記処理槽2内に容れるように設けられている。なお、該流入管6は、前記処理槽2の上部に設けてもよい。   Reference numeral 6 denotes an inflow pipe. The inflow pipe 6 is provided, for example, in a lower portion of the side wall of the processing tank 2 so as to contain a liquid such as processing water to be processed in the processing tank 2. . The inflow pipe 6 may be provided in the upper part of the processing tank 2.

7は、担体分離室を示し、該担体分離室7は、例えば、上下方向に延びる箱体よりなり、前記処理槽2の側壁の外側に設けられ、下端において、前記処理槽2の側壁の下端に設けられた開口部8に連通し、上部において、排水を排出する排出口9が設けられている。   Reference numeral 7 denotes a carrier separation chamber. The carrier separation chamber 7 is formed of, for example, a box extending in the vertical direction, and is provided outside the side wall of the processing tank 2, and at the lower end, the lower end of the side wall of the processing tank 2. A discharge port 9 for discharging the waste water is provided in the upper part, communicating with the opening 8 provided in the upper part.

前記従来の撹拌装置においては、微生物や触媒などを担持した担体を有する処理水などの液体を、前記処理槽2内に所望の高さまで流入させて、前記回転翼3を回転させることにより、前記処理槽2内の処理水は、図19に示すように、前記回転翼3により、半径方向外方に吐出されて、前記処理槽2の側壁内面に当接し、そして、該側壁内面に沿って旋回しながら下方の槽底部に向かう緩やかな下降流Pを形成し、その後、前記処理槽2の底部の中心部において、前記静翼4により、上昇流Qを引き起こし、これにより、前記回転翼3と前記静翼4との間で循環流が形成され、前記処理槽2内で例えば、低せん断かつ低動力により担体のダメージを防ぎ、液体の混合・均一分散化を図ることができるようになる。   In the conventional stirring device, a liquid such as treated water having a carrier carrying microorganisms or a catalyst is allowed to flow into the treatment tank 2 to a desired height, and the rotating blade 3 is rotated, thereby As shown in FIG. 19, the treated water in the treatment tank 2 is discharged radially outward by the rotary blades 3 and comes into contact with the inner surface of the side wall of the treatment tank 2, and along the inner surface of the side wall. A gentle downward flow P toward the bottom of the tank is formed while swirling, and thereafter, an upward flow Q is caused by the stationary blade 4 at the center of the bottom of the processing tank 2. A circulation flow is formed between the blade and the stationary blade 4, and for example, the carrier can be prevented from being damaged by low shear and low power in the processing tank 2, and liquid can be mixed and uniformly dispersed. .

また、生物処理等された処理水は、前記開口部8を通じて、前記担体分離室7に流入し、そして、処理水に含まれる担体は前記担体分離室7内で、下方に沈下し、前記開口部8から処理槽2内に戻され、担体のない処理水のみが、上部の前記排出口9から、外部に排出されるようになる。   Further, the treated water subjected to the biological treatment flows into the carrier separation chamber 7 through the opening 8, and the carrier contained in the treated water sinks downward in the carrier separation chamber 7, and the opening Only the treated water having no carrier returned from the section 8 into the treatment tank 2 is discharged to the outside from the upper discharge port 9.

特開2000−246269号公報JP 2000-246269 A

しかしながら、前記従来の担体分離室7では、該担体分離室7内に入り込んだ担体が、処理槽2内に戻りにくく、また、担体のない処理水のみを効率よく排出口9から外部に排出することができなかった。   However, in the conventional carrier separation chamber 7, the carrier that has entered the carrier separation chamber 7 is unlikely to return to the treatment tank 2, and only treated water without the carrier is efficiently discharged from the discharge port 9 to the outside. I couldn't.

本発明は、簡単な構成で、担体等の処理槽外部への排出を防ぎ、担体のない処理水のみを効率よく外部に排出できる撹拌装置を提供することを目的とする。   An object of the present invention is to provide an agitation device that has a simple configuration, prevents discharge of a carrier or the like to the outside of a treatment tank, and can efficiently discharge only treated water without a carrier to the outside.

前記の目的を達成すべく、本発明の撹拌装置は、担体を有する液体が容れられる処理槽と、該処理槽内に設けられた回転翼と、前記処理槽の底部に固定された放射状に延びる静翼と、担体分離室とよりなり、該担体分離室は、前記処理槽内に連通するよう形成した上部開口部及び下部開口部とを有する流路室部と、前記流路室部の下部に連通するよう形成した排水用開口部と上部に設けた排出口とを有する分離室部とよりなることを特徴とする。   In order to achieve the above-mentioned object, the stirring device of the present invention extends in a radial manner fixed to a treatment tank containing a carrier-containing liquid, a rotary blade provided in the treatment tank, and a bottom of the treatment tank. The carrier separation chamber includes a stationary blade and a carrier separation chamber, and the carrier separation chamber has a channel chamber portion having an upper opening and a lower opening formed so as to communicate with the inside of the processing tank, and a lower portion of the channel chamber portion. And a separation chamber having a drain opening formed so as to communicate with the drain and an outlet provided in the upper part.

また、前記下部開口部の、前記回転翼の回転方向の後方側には、該回転方向の前方側に向かって、前記処理槽内の中心方向側に傾斜したカバー板が設けられていることを特徴とする。   In addition, a cover plate that is inclined toward the center side in the processing tank toward the front side in the rotation direction is provided on the rear side in the rotation direction of the rotary blade of the lower opening. Features.

また、前記下部開口部は、該下部開口部の開口面積が、前記上部開口部の開口面積よりも大きく形成されていることを特徴とする。   Further, the lower opening is formed such that an opening area of the lower opening is larger than an opening area of the upper opening.

また、前記流路室部は、上部の流路室部の流路断面積が、下部の流路室部の流路断面積よりも、小さく形成されていることを特徴とする。   Further, the flow path chamber portion is characterized in that a flow passage cross-sectional area of an upper flow passage chamber portion is formed smaller than a flow passage cross-sectional area of a lower flow passage chamber portion.

また、前記担体分離室は、第1の仕切板を有する箱体により形成され、前記流路室部と前記分離室部とは、該箱体の天井板から、下方の所望の位置まで延びる前記第1の仕切板により仕切られてそれぞれ形成されることを特徴とする。   The carrier separation chamber is formed by a box having a first partition plate, and the flow path chamber portion and the separation chamber portion extend from a ceiling plate of the box to a desired position below. Each of the first partition plates is formed to be partitioned.

また、前記流路室部は、上部の上部流路室部と下部の下部流路室部とにより形成され、前記上部の上部流路室部は、前記流路室部の天井板から、下方の所望の位置まで延びる第2の仕切板が設けられ、該第2の仕切板により、上部の上部流路室部の流路断面積が、下部の下部流路室部の流路断面積よりも、小さく形成されていることを特徴とする。   Further, the flow path chamber portion is formed by an upper upper flow path chamber portion and a lower lower flow path chamber portion, and the upper upper flow path chamber portion extends downward from the ceiling plate of the flow path chamber portion. A second partition plate extending to a desired position is provided, and the second partition plate allows the flow passage cross-sectional area of the upper upper flow passage chamber portion to be less than the flow passage cross-sectional area of the lower lower flow passage chamber portion. Is also characterized by being formed small.

また、前記第1の仕切板の下部には、前記下部開口部側に向かう下方に傾斜した傾斜面を有する整流部を設けたことを特徴とする。   Further, the first partition plate is provided with a rectifying unit having an inclined surface that is inclined downward toward the lower opening side at the lower part of the first partition plate.

また、前記分離室部内に、前記第1の仕切板に対向する、底面から所望の高さまで延びる衝立板を更に設けたことを特徴とする。   Further, a partition plate extending from the bottom surface to a desired height, which faces the first partition plate, is further provided in the separation chamber.

本発明は、簡単な構成で、担体等の処理槽外部への排出を防ぎ、担体のない処理水のみを効率よく外部に排出できる撹拌装置を提供することができる。   INDUSTRIAL APPLICABILITY The present invention can provide a stirring device that has a simple configuration, prevents discharge of a carrier and the like to the outside of the treatment tank, and can efficiently discharge only treated water without a carrier to the outside.

本発明の実施例1の撹拌装置の縦断側面図である。It is a vertical side view of the stirring apparatus of Example 1 of this invention. 本発明の実施例1の撹拌装置の横断平面図である。It is a cross-sectional top view of the stirring apparatus of Example 1 of this invention. 本発明の担体分離室の縦断側面図である。It is a vertical side view of the carrier separation chamber of the present invention. 本発明の、処理槽内から見た担体分離室の正面図である。It is a front view of the support | carrier separation chamber seen from the inside of a processing tank of this invention. 本発明の担体分離室の説明用斜視図である。It is a perspective view for description of the carrier separation chamber of the present invention. 本発明の、カバー体を分離した担体分離室の説明用斜視図である。It is a perspective view for explanation of a carrier separation room which separated a cover body of the present invention. 本発明の担体分離室の他の実施例の縦断側面図である。It is a vertical side view of the other Example of the carrier separation chamber of this invention. 本発明の担体分離室の説明用縦断側面図である。It is a vertical side view for description of the carrier separation chamber of the present invention. 本発明の担体分離室の説明用模式図である。It is a schematic diagram for description of the carrier separation chamber of the present invention. 本発明の担体分離室の説明用模式図である。It is a schematic diagram for description of the carrier separation chamber of the present invention. 本発明の担体分離室の説明用模式図である。It is a schematic diagram for description of the carrier separation chamber of the present invention. 本発明の第2実施例の担体分離室の説明用斜視図である。It is a perspective view for description of the carrier separation chamber of the second embodiment of the present invention. 本発明の第2実施例の、処理槽内から見た担体分離室の説明用正面図である。It is a front view for description of the carrier separation chamber of the second embodiment of the present invention as seen from inside the treatment tank. 本発明の第3実施例の担体分離室の説明用縦断側面図である。It is a vertical side view for description of the carrier separation chamber of the third embodiment of the present invention. 本発明の第3実施例の担体分離室の他の実施例の説明用斜視図である。It is a perspective view for description of other Examples of the carrier separation chamber of 3rd Example of this invention. 本発明の第3実施例の担体分離室の他の実施例の説明用縦断側面図である。It is a vertical side view for description of the other Example of the carrier separation chamber of 3rd Example of this invention. 本発明の、処理槽内から見た担体分離室の他の例の正面図である。It is a front view of the other example of the support | carrier separation chamber seen from the inside of a processing tank of this invention. 本発明の、処理槽内から見た担体分離室の更に他の例の正面図である。It is a front view of the further another example of the carrier separation chamber seen from the inside of the treatment tank of the present invention. 従来の撹拌装置の縦断側面図である。It is a vertical side view of the conventional stirring apparatus. 従来の撹拌装置の横断平面図である。It is a cross-sectional top view of the conventional stirring apparatus.

本発明を実施するための形態の実施例を以下に示す。なお、前記従来例と同じ部分には、同じ符号を付け、説明を省略する。   The example of the form for carrying out the present invention is shown below. In addition, the same code | symbol is attached | subjected to the same part as the said prior art example, and description is abbreviate | omitted.

本発明の実施例1を図1〜図11によって説明する。   A first embodiment of the present invention will be described with reference to FIGS.

(1.担体分離室の説明) (1. Explanation of carrier separation chamber)

本発明の撹拌装置10は、前記従来の撹拌装置1において、前記担体分離室7を用いる代わりに、前記処理槽2の側壁の外側に、担体分離室11を設ける。   The stirring device 10 of the present invention is provided with a carrier separation chamber 11 outside the side wall of the processing tank 2 instead of using the carrier separation chamber 7 in the conventional stirring device 1.

該担体分離室11は、図1及び図2に示すように、流路室部12と分離室部13との前後又は左右に並列する2室よりなる。また、前記流路室部12は、上下方向に延びて形成され、前記処理槽2内からの処理水が入流するよう、前記処理槽2内に連通するよう形成した上部開口部14と、該流路室部12内に流入した処理水が、前記処理槽2内に流出するよう、前記処理槽2内に連通するよう形成した、前記上部開口部14よりも下方に設けた下部開口部15とを有する。また、前記分離室部13は、上下方向に延びて形成され、前記流路室部12内の処理水の一部が流入するよう、該流路室部12内の下部に連通するように形成された排水用開口部16を下部に有すると共に、上部に排出口17を有する。   As shown in FIGS. 1 and 2, the carrier separation chamber 11 includes two chambers arranged in parallel in the front-rear or right-and-left direction of the flow path chamber portion 12 and the separation chamber portion 13. Further, the flow path chamber 12 is formed to extend in the vertical direction, and the upper opening 14 is formed so as to communicate with the inside of the treatment tank 2 so that treated water from the inside of the treatment tank 2 flows in, The lower opening 15 provided below the upper opening 14 is formed so as to communicate with the treatment tank 2 so that the treated water flowing into the flow path chamber 12 flows into the treatment tank 2. And have. Further, the separation chamber portion 13 is formed to extend in the vertical direction, and is formed to communicate with the lower portion in the flow channel chamber portion 12 so that a part of the treated water in the flow channel chamber portion 12 flows in. The drainage opening 16 is provided in the lower part and the discharge port 17 is provided in the upper part.

なお、前記上部開口部14から前記流路室部12内に流入した、前記処理槽2からの処理水が、前記排水用開口部16よりも、前記下部開口部15から流出しやすくするために、前記分離室部13の排水用開口部16の上端開口縁は、前記下部開口部15の上端開口縁と同じ高さ、あるいは、若干下方にあることが好ましい。   In order to make it easier for the treated water from the treatment tank 2 that has flowed into the flow path chamber 12 from the upper opening 14 to flow out from the lower opening 15 than from the drain opening 16. The upper end opening edge of the drain opening 16 of the separation chamber 13 is preferably the same height as the upper end opening edge of the lower opening 15 or slightly below.

(2.カバー体の説明) (2. Explanation of cover body)

また、前記下部開口部15の、前記回転翼3の回転方向の後方側の縁部15aに、回転方向の前方側に向かって、処理槽2の中心方向側に傾斜して延びるカバー板18aを有するカバー体18を設け、前記処理槽2内の側壁の内周面を旋回する処理水が、前記下部開口部15から前記流路室部12内に入流することを防止するようにしてもよい。   Further, a cover plate 18a extending obliquely toward the central direction of the processing tank 2 toward the front side in the rotation direction is provided on the edge 15a on the rear side in the rotation direction of the rotary blade 3 of the lower opening 15. The cover body 18 may be provided to prevent the treated water swirling on the inner peripheral surface of the side wall in the treatment tank 2 from flowing into the flow path chamber portion 12 from the lower opening 15. .

(3.担体分離室の一例の説明) (3. Description of an example of the carrier separation chamber)

前記担体分離室11は、例えば、図3〜図6に示すように、その面が互いに平行に対向して配置された垂直方向に延びる左右の側壁11a、11bと、前記処理槽2の側壁の外周面に固定された前面板11cと、該前面板11cの面に対向して配置された背面板11dと、底面板11eと、水平状に延びる天井板11fとの箱体に形成され、前記前面板11cの上端には、前記処理槽2内に連通した前記上部開口部14が形成されると共に、前記前面板11cの下端に、前記処理槽2内に連通した前記下部開口部15が形成される。   For example, as shown in FIGS. 3 to 6, the carrier separation chamber 11 includes left and right side walls 11 a and 11 b extending in the vertical direction and arranged in parallel with each other, and side walls of the treatment tank 2. A front plate 11c fixed to the outer peripheral surface, a back plate 11d arranged to face the surface of the front plate 11c, a bottom plate 11e, and a ceiling plate 11f extending horizontally, The upper opening 14 communicating with the processing tank 2 is formed at the upper end of the front plate 11c, and the lower opening 15 communicating with the processing tank 2 is formed at the lower end of the front plate 11c. Is done.

なお、前記下部開口部15の開口面積は、前記上部開口部14の開口面積より大きく形成することが望ましい。   The opening area of the lower opening 15 is preferably larger than the opening area of the upper opening 14.

なお、前記担体分離室11は、前記処理槽2の下方に設けられ、例えば、図1に示すように、前記処理槽の底部からの高さ(L1)が、例えば、槽径に対して0.1〜0.5倍の高さに設けられる。   The carrier separation chamber 11 is provided below the processing tank 2, and, for example, as shown in FIG. 1, the height (L1) from the bottom of the processing tank is, for example, 0 with respect to the tank diameter. .1 to 0.5 times higher.

また、前記箱体状の担体分離室11は、例えば、図3及び図4に示すように、縦方向の長さ(L2)が槽径に対して0.3〜0.6倍の長さ、横方向(左右方向)の長さ(L3)が槽径に対して0.1〜0.3倍の長さ、奥行きの長さ(L4)が槽径に対して0.2〜0.4倍の長さである。   The box-shaped carrier separation chamber 11 has a longitudinal length (L2) of 0.3 to 0.6 times the tank diameter, for example, as shown in FIGS. The length (L3) in the lateral direction (left-right direction) is 0.1 to 0.3 times the length of the tank diameter, and the length (L4) of the depth is 0.2 to 0. Four times as long.

また、前記箱体内において、前記前面板11cと前記背面板11dとの間に、前記箱体内を、前面側と背面側とに仕切る、例えば、両側辺が前記左右の側壁11a、11bに接続され、前記天井板11fから下方の所望の位置まで延びる、垂直状の矩形状の第1の仕切板19が設けられる。   In the box, the box is partitioned into a front side and a back side between the front plate 11c and the back plate 11d. For example, both sides are connected to the left and right side walls 11a and 11b. A vertical rectangular first partition plate 19 extending from the ceiling plate 11f to a desired position below is provided.

なお、前記第1の仕切板19は、図3に示すように、前記前面板11cから、所望の距離(L5)、例えば、槽径に対して0.05〜0.2倍の距離、離間して設けられる。   As shown in FIG. 3, the first partition plate 19 is separated from the front plate 11c by a desired distance (L5), for example, a distance of 0.05 to 0.2 times the tank diameter. Provided.

該第1の仕切板19は、天井板11fから、例えば、前記下部開口部15の上端縁と略同じ位置の高さまで延び、該第1の仕切板19の下端と前記底面板11eとの間には、排水用開口部16が形成されるようになる。   The first partition plate 19 extends from the ceiling plate 11f to, for example, a height that is substantially the same position as the upper end edge of the lower opening 15, and between the lower end of the first partition plate 19 and the bottom plate 11e. The drainage opening 16 is formed.

そして、前記第1の仕切板19により、前記箱体内において、該第1の仕切板19の一方の面側の一方の部屋と、他方の面側の他方の部屋との2室が形成され、それぞれ、前記流路室部12と分離室部13とが形成されるようになる。   Then, the first partition plate 19 forms two chambers in the box, one room on one surface side of the first partition plate 19 and the other chamber on the other surface side, The flow path chamber portion 12 and the separation chamber portion 13 are formed respectively.

即ち、前記箱体は、例えば、前記第1の仕切板19により、前後の2室に仕切られ、前面側が前記流路室部12となり、背面側が、前記分離室部13となる。   That is, the box body is partitioned into, for example, two front and rear chambers by the first partition plate 19, the front surface side is the flow channel chamber portion 12, and the rear surface side is the separation chamber portion 13.

なお、前記前面板11cは、前記処理槽2の側壁自体により構成されてもよい。   The front plate 11c may be constituted by the side wall of the processing tank 2 itself.

また、前記上部開口部14は、例えば、矩形状の開口に形成され、横方向(左右方向)が、前記左側の側壁11aから右側の側壁11bに至り、縦方向(上下方向)が、前記天井板11fから、下方に所望の長さ(L6)、例えば、槽径に対して0.01〜0.1倍の長さで形成される。   The upper opening 14 is formed in, for example, a rectangular opening, and the horizontal direction (left and right direction) extends from the left side wall 11a to the right side wall 11b, and the vertical direction (vertical direction) is the ceiling. A desired length (L6), for example, 0.01 to 0.1 times the tank diameter is formed downward from the plate 11f.

また、前記下部開口部15は、例えば、矩形状の開口に形成され、横方向(左右方向)が、前記左側の側壁11aから右側の側壁11bに至り、縦方向が、前記底面板11eから、上方に所望の長さ(L7)、例えば、槽径に対して0.05〜0.2倍の長さに形成される。なお、前記下部開口部15の開口の縦方向の長さ(L7)は、前記上部開口部14の開口の縦方向の長さ(L6)よりも大きく形成するのが好ましく、これにより、より前記流路室部12内の処理水が、前記下部開口部15を通じて、前記処理槽2内に排出されやすくなる。   The lower opening 15 is formed in, for example, a rectangular opening, and the horizontal direction (left and right direction) extends from the left side wall 11a to the right side wall 11b, and the vertical direction extends from the bottom plate 11e. A desired length (L7) is formed above, for example, 0.05 to 0.2 times the tank diameter. The vertical length (L7) of the opening of the lower opening 15 is preferably larger than the vertical length (L6) of the opening of the upper opening 14. The treated water in the flow path chamber 12 is easily discharged into the treatment tank 2 through the lower opening 15.

なお、前記底面板11eは、例えば、図3に示すように、凹状に湾曲させる以外に、図7に示すように、直線状に傾斜させるようにしてもよい。   For example, the bottom plate 11e may be inclined linearly as shown in FIG. 7 in addition to being concavely curved as shown in FIG.

また、前記底面板11eを、前記下部開口部15の縁部から水平状に延び、そこから、直線状に上方に傾斜させて、前記背面板11dに接続するようにしてもよい。   Further, the bottom plate 11e may extend horizontally from the edge of the lower opening 15 and be inclined linearly upward from there to be connected to the back plate 11d.

また、図4に示すように、前記下部開口部15を、前記上部開口部14の真下に設ける以外に、例えば、図17に示すように、前記上部開口部14を、回転翼3の回転方向の後方側に形成し、前記下部開口部15を、回転翼3の回転方向の前方側に形成して、前記下部開口部15を、前記上部開口部14に対して、回転翼3の回転方向に対して前方側の、斜め下方に設けるようにしてもよい。   In addition to providing the lower opening 15 directly below the upper opening 14 as shown in FIG. 4, for example, as shown in FIG. 17, the upper opening 14 is arranged in the rotational direction of the rotary blade 3. The lower opening 15 is formed on the front side of the rotating blade 3 in the rotation direction, and the lower opening 15 is rotated with respect to the upper opening 14 in the rotating direction of the rotating blade 3. However, it may be provided obliquely below the front side.

また、図18に示すように、前記流路室部12を、下方に向かうに従って、回転翼3の回転方向に対して前方側に向くように、斜め下方に傾斜させてもよい。   Further, as shown in FIG. 18, the flow path chamber portion 12 may be inclined obliquely downward so as to face the front side with respect to the rotation direction of the rotary blade 3 as it goes downward.

これらにより、前記処理槽2から前記流路室部12内に流入した液体の流速を高めることができ、前記液体内の担体が前記下部開口15から前記処理槽2内に戻りやすくなる。   Thus, the flow rate of the liquid flowing into the flow path chamber 12 from the processing tank 2 can be increased, and the carrier in the liquid can easily return from the lower opening 15 into the processing tank 2.

(4.カバー体の一例の説明) (4. Description of an example of a cover body)

また、前記カバー体18は、例えば、図5及び図6に示すように、前記下部開口部15の、回転翼3の回転方向の後方側の縁部15aに設けた、回転方向の前方側に向かって、前記処理槽2の中心方向側に傾斜して延びる、前記下部開口部15を略覆う大きさの、矩形状のカバー板18aと、該カバー板18aの上辺と前記下部開口部15の上辺縁とを連結した略三角形状の上板18bと、前記カバー板18aの下辺と前記下部開口部15の下辺縁とを連結した略三角形状の下板18cとよりなる、回転方向の前方側に、略正方形状の開口部18dが形成された断面三角形状の筒状で形成される。   Further, for example, as shown in FIGS. 5 and 6, the cover body 18 is provided on the front side in the rotational direction of the lower opening 15 provided at the edge 15 a on the rear side in the rotational direction of the rotary blade 3. A rectangular cover plate 18a having a size substantially covering the lower opening 15 extending obliquely toward the center side of the processing tank 2, and an upper side of the cover plate 18a and the lower opening 15 A front side in the rotational direction, which includes a substantially triangular upper plate 18b connected to the upper edge, and a substantially triangular lower plate 18c connected to the lower edge of the cover plate 18a and the lower edge of the lower opening 15. In addition, it is formed in a cylindrical shape having a triangular cross section in which a substantially square opening 18d is formed.

そして、前記流路室部12からの処理水が、前記下部開口部15を通じて、前記カバー体18内に流入し、該カバー体18の開口部18dから、前記処理槽2内に排出されるようになる。   Then, the treated water from the flow path chamber 12 flows into the cover body 18 through the lower opening 15 and is discharged into the treatment tank 2 from the opening 18d of the cover 18. become.

なお、前記下板18cを省略して、前記カバー体18の下部も開口するようにしてもよい。   The lower plate 18c may be omitted and the lower portion of the cover body 18 may be opened.

該カバー体18により、前記下部開口部15から前記流路室部12内に前記処理槽2内の処理水が逆流しないようになると共に、前記流路室部12内の処理水が、処理槽内に流出しやすいようになる。   The cover body 18 prevents the treated water in the treatment tank 2 from flowing backward from the lower opening 15 into the flow path chamber 12, and the treated water in the flow path chamber 12 is treated in the treatment tank. It becomes easy to flow out in.

(5.排水処理方法と効果の説明) (5. Explanation of wastewater treatment methods and effects)

次に、前記実施例1の撹拌装置による処理方法と効果を説明する。   Next, the processing method and effect by the stirring apparatus of Example 1 will be described.

前記流入管6より、微生物や触媒などを担持した担体を有する処理水などの液体を、前記処理槽2内に所望の高さまで流入させて、前記液体を前記処理槽2内に貯めるようにする。   From the inflow pipe 6, a liquid such as treated water having a carrier carrying microorganisms or a catalyst is allowed to flow into the processing tank 2 to a desired height, and the liquid is stored in the processing tank 2. .

前記回転翼3を回転させることにより、図1に示す前記処理槽2内において、担体を有する処理水は、図19に示す従来の装置と同様に、前記回転翼3により、半径方向外側に吐出されて処理槽2の側壁内面に当接して下方に流れて、前記処理槽2の側壁内面を旋回しながら緩やかに処理槽2の底部2aに向かう下降流Pが形成され、その後、該処理槽2の中心部の底部において、前記静翼4により、上昇流Qを引き起こし、これにより、前記回転翼3と前記静翼4との間において、循環流が形成され、前記処理槽2内で処理水の混合・均一分散化を図ることができるようになる。   By rotating the rotary blade 3, treated water having a carrier is discharged radially outward by the rotary blade 3 in the treatment tank 2 shown in FIG. 1, as in the conventional apparatus shown in FIG. Then, a downward flow P gently flowing toward the bottom 2a of the processing tank 2 is formed while flowing downwardly in contact with the inner surface of the side wall of the processing tank 2 and turning the inner surface of the side wall of the processing tank 2, and thereafter the processing tank 2 2, an upward flow Q is caused by the stationary blade 4 at the bottom of the central portion of the center portion 2, thereby forming a circulating flow between the rotating blade 3 and the stationary blade 4. It becomes possible to achieve water mixing and uniform dispersion.

また、前記旋回する下降流Pの一部は、図8に示すように、前記上部開口部14から前記流路室部12内に流入し、前記流路部室12内で前記下降流Pの流れに沿った比較的流れの強い下降流Rを形成して、該流路室部12内を下降して、前記下部開口部15から処理槽2内に戻り、この際、前記流路室部12内を流れる、前記処理水よりも比重が重い担体は、前記下降流Rと共に、そのまま前記下部開口部15から前記カバー体18を介して前記処理槽2内に戻されるようなる。   Further, as shown in FIG. 8, a part of the swirling downward flow P flows into the flow channel chamber 12 from the upper opening 14, and the flow of the downward flow P in the flow channel chamber 12. A downward flow R having a relatively strong flow is formed, descends in the flow path chamber 12 and returns to the processing tank 2 from the lower opening 15. At this time, the flow path chamber 12 The carrier having a higher specific gravity than the treated water flowing inside is returned to the treatment tank 2 through the cover body 18 from the lower opening 15 together with the descending flow R.

そして、前記排水用開口部16には、図8に示すように、担体のない処理水のみが流入するようになり、前記分離室部13内には、前記排出口17に向かう、前記下降流Rに比べて弱い流れの上昇する排出流Sが形成され、前記排出口17からは、担体の無い処理水のみを槽外に排出することができるようになる。   Then, as shown in FIG. 8, only treated water without a carrier flows into the drain opening 16, and the downward flow toward the discharge port 17 enters the separation chamber 13. A discharge flow S that is weaker than R is formed, and only treated water without a carrier can be discharged from the discharge port 17 to the outside of the tank.

また、一部の担体が前記分離室部13に流入しても、前記処理水よりも比重が重い担体は、下方に沈降し、前記排水用開口部16を通じて、前記流路室部12内に戻り、前記下部開口部15から前記処理槽2内に戻されるようになる。   Even if a part of the carrier flows into the separation chamber 13, the carrier whose specific gravity is heavier than that of the treated water settles downward and enters the flow path chamber 12 through the drainage opening 16. Returning to the processing tank 2 from the lower opening 15.

また、前記カバー体18により、前記下部開口部15から、前記処理槽2内の旋回流が入り込まないようになるので、前記流路室部12内の下降流Rを妨げることがなく、担体の処理槽2内への流出がスムーズに行われるようになる。   Further, the cover body 18 prevents the swirling flow in the processing tank 2 from entering the lower opening 15, so that the downward flow R in the flow path chamber portion 12 is not hindered, and the carrier Outflow into the processing tank 2 is performed smoothly.

(6.仕切板の他の実施例の説明) (6. Description of another embodiment of partition plate)

なお、前記垂直状に形成した第1の仕切板19においては、図9に示すように、前記分離室部13内の下部において、回転流が生じ、前記流路室部12内の担体が巻き込まれて、前記分離室部13内に入り込んでしまう場合がある。   In the first partition plate 19 formed in the vertical shape, as shown in FIG. 9, a rotating flow is generated in the lower part in the separation chamber 13 and the carrier in the flow path chamber 12 is caught. May enter the separation chamber 13.

そこで、図10に示すように、前記第1の仕切板19の下部に、上方から下方に向かうに従って、前記下部開口部15に向かって傾斜した傾斜面20aを有する、例えば、断面三角形状の三角柱状の整流部20を設ける。   Therefore, as shown in FIG. 10, the lower part of the first partition plate 19 has an inclined surface 20 a that is inclined toward the lower opening 15 as it goes downward from above, for example, a triangular triangle. A columnar rectification unit 20 is provided.

該整流部20の傾斜面20aにより、前記流路室部12内を通る処理水が、前記下部開口部15側に向かって流れるようになると共に、前記整流部20の下面の下部において回転流が形成され、前記分離室部13内に、担体が巻き込まれることが少なくなるようになる。   Due to the inclined surface 20 a of the rectifying unit 20, the treated water passing through the flow path chamber 12 flows toward the lower opening 15, and a rotating flow is generated at the lower part of the lower surface of the rectifying unit 20. As a result, the carrier is less likely to be caught in the separation chamber section 13.

なお、前記断面三角形状の整流部20は、図10に示すように、前記傾斜面20aの下端から、前記仕切板19に向かう下面20bが、上方に向かうように形成され、該下面20bと前記第1の仕切板19とのなす角が鈍角状に形成され、この場合には、前記下面20bの下に、回転流が形成され、その回転流の一部が、前記分離室部13内に形成されるため、前記流路室部12内の担体が、前記分離室部13内に巻き込まれる恐れがある。   As shown in FIG. 10, the rectifying unit 20 having a triangular cross section is formed such that a lower surface 20 b toward the partition plate 19 extends upward from a lower end of the inclined surface 20 a, and the lower surface 20 b and the An angle formed with the first partition plate 19 is formed in an obtuse angle. In this case, a rotating flow is formed under the lower surface 20b, and a part of the rotating flow is in the separation chamber portion 13. As a result, the carrier in the flow path chamber 12 may be caught in the separation chamber 13.

そこで、図11に示すように、前記下面20bを、下方に向かって傾斜する傾斜面とし、該下面20bと前記第1の仕切板19とのなす角を鋭角又は直角とした断面三角形状の三角柱状の整流部20を設けることにより、下面に形成される回転流を流路室部側に発生させ、前記流路室部内の担体が、前記分離室部内に巻き込まれないようにしてもよい。   Therefore, as shown in FIG. 11, the lower surface 20b is an inclined surface that is inclined downward, and the triangle formed between the lower surface 20b and the first partition plate 19 has an acute angle or a right angle. By providing the columnar rectification unit 20, a rotating flow formed on the lower surface may be generated on the flow channel chamber side so that the carrier in the flow channel chamber is not caught in the separation chamber.

(7.担体分離室の他の実施例の説明) (7. Description of another embodiment of carrier separation chamber)

本発明の第2の実施例の担体分離室21においては、前記第1の実施例において、前記担体分離室11の前記流路室部12を、下部の流路室部の流路断面積が、上部の流路室部の流路断面積に比べて大きくなるように形成し、そして、前記上部開口部14を前記上部の流路室部に形成し、前記下部開口部15を前記下部の流路室部に形成するようにする。   In the carrier separation chamber 21 according to the second embodiment of the present invention, in the first embodiment, the flow passage chamber portion 12 of the carrier separation chamber 11 is different from the flow passage cross-sectional area of the lower flow passage chamber portion. The upper opening portion 14 is formed in the upper flow passage chamber portion, and the lower opening portion 15 is formed in the lower flow passage portion. It is made to form in a channel room part.

(8.流路室部の他の実施例の一例の説明) (8. Description of an example of another embodiment of the flow path chamber)

前記担体分離室21の流路室部12は、例えば、上部の上部流路室部12aと、その下部の下部流路室部12bにより形成され、該上部流路室部12aは、例えば、図12及び図13に示すように、前記第1の実施例の担体分離室11の前記流路室部12内に、上部の流路を狭めるための第2の仕切板22が設けられ、該第2の仕切板22と前記第1の仕切板19と前記右側の側壁11bと前記前面板11cとにより囲まれた部分により構成され、また、前記下部流路室部12bは、前記上部流路室部12aの下部の前記流路室部12により構成される。   The flow path chamber portion 12 of the carrier separation chamber 21 is formed by, for example, an upper upper flow path chamber portion 12a and a lower lower flow path chamber portion 12b, and the upper flow path chamber portion 12a is, for example, illustrated in FIG. As shown in FIGS. 12 and 13, a second partition plate 22 for narrowing the upper flow path is provided in the flow path chamber portion 12 of the carrier separation chamber 11 of the first embodiment. 2 partition plates 22, the first partition plate 19, the right side wall 11b, and the front plate 11c, and the lower flow path chamber portion 12b is formed of the upper flow path chamber. It is comprised by the said flow path chamber part 12 of the lower part of the part 12a.

そして、図12(b)に示すように、前記下部流路室部12bの流路断面積Aは、前記上部流路室部12aの流路断面積Bに対して大きく形成されるようになる。   And as shown in FIG.12 (b), the flow-path cross-sectional area A of the said lower flow path chamber part 12b comes to be largely formed with respect to the flow-path cross-sectional area B of the said upper flow path chamber part 12a. .

そして、前記上部開口部14は、前記流路を狭められた上部流路室部12aの上部に形成され、前記下部開口部15は、前記下部流路室部12に形成されるようなる。   The upper opening 14 is formed in the upper part of the upper flow channel chamber 12a with the flow channel narrowed, and the lower opening 15 is formed in the lower flow channel chamber 12.

該第2の仕切板22は、例えば、前記左側の側壁11aと前記右側の側壁11bとの間、例えば、中間部分に、前記流路室部12内の上部を左側と右側に仕切る、例えば、前後辺が前記前側板11cと前記仕切板19に接続され、前記天井板11fから前記仕切板19の下端(又は、前記下部開口部の上部縁)まで延びる、垂直状の矩形状に形成される。   The second partition plate 22 divides, for example, an intermediate portion between the left side wall 11a and the right side wall 11b, for example, at an intermediate portion, on the left side and the right side. The front and rear sides are connected to the front plate 11c and the partition plate 19, and are formed in a vertical rectangular shape extending from the ceiling plate 11f to the lower end of the partition plate 19 (or the upper edge of the lower opening). .

また、前記上部開口部14は、前記第2の仕切板22と前記右側の側壁11bとの間の、前記前面板11cの上端に形成される。   The upper opening 14 is formed at the upper end of the front plate 11c between the second partition plate 22 and the right side wall 11b.

なお、前記第1の仕切板19は、前記上部流路室部12aの構成に不要な部分、例えば、前記左側の側壁11aから前記第2の仕切板22までの部分を省略してもよい。   The first partition plate 19 may omit a portion unnecessary for the configuration of the upper flow path chamber portion 12a, for example, a portion from the left side wall 11a to the second partition plate 22.

なお、前記上部開口部14は、例えば、矩形状の開口に形成され、横方向(左右方向)が、前記第2の仕切板22から右側の側壁11bに至り、縦方向(上下方向)が、前記天井板11fから、下方に所望の長さで形成される。   The upper opening 14 is formed in, for example, a rectangular opening, the horizontal direction (left-right direction) extends from the second partition plate 22 to the right side wall 11b, and the vertical direction (vertical direction) is A desired length is formed below the ceiling plate 11f.

なお、前記上部開口部14の縦方向(上下方向)の長さは、例えば、前記L6と同様、槽径に対して0.01〜0.1倍の長さ、下部開口部15の縦方向(上下方向)の長さは、例えば、前記L7と同様、槽径に対して0.05〜0.2倍の長さである。   Note that the length of the upper opening 14 in the vertical direction (vertical direction) is, for example, 0.01 to 0.1 times the tank diameter, and the vertical direction of the lower opening 15, similar to L6. The length in the (up and down direction) is, for example, 0.05 to 0.2 times the tank diameter, similar to L7.

(9.排水処理方法と効果) (9. Wastewater treatment methods and effects)

本発明の第2の実施例においては、前記流路室部12に流入した処理水は、前記上部流路室部12aから、前記下方流路室部12bに流入する際に、流速が遅くなり、担体が前記下部開口部15から排出されやすくなり、これにより、前記排水用開口部16を通じて、前記分離室部13に入り込まなくなる。   In the second embodiment of the present invention, when the treated water that has flowed into the flow path chamber portion 12 flows from the upper flow path chamber portion 12a into the lower flow path chamber portion 12b, the flow velocity becomes slow. , The carrier is easily discharged from the lower opening 15, so that the carrier does not enter the separation chamber 13 through the drainage opening 16.

なお、例えば、前記第2実施例の担体分離室21において、図14に示すように、前記分離室部13に、前記第1の仕切板19の面に対向する、底面板11eから所望の上方まで延びる、垂直状の矩形板状の衝立板23を設けるようにしてもよい。   For example, in the carrier separation chamber 21 of the second embodiment, as shown in FIG. 14, the separation chamber portion 13 has a desired upper side from the bottom plate 11 e facing the surface of the first partition plate 19. You may make it provide the perpendicular | vertical rectangular-plate-shaped partition board 23 extended to.

なお、前記衝立板23は、例えば、その両側において、前記担体分離室21の左右の側壁11a、11bに接続され、前記第1の仕切板と所望の距離(L8)、例えば、槽径に対して0.01〜0.05倍の距離、離間して設けられる。   The partition plate 23 is connected to the left and right side walls 11a and 11b of the carrier separation chamber 21 on both sides thereof, for example, with respect to the first partition plate and a desired distance (L8), for example, the tank diameter. And spaced apart by a distance of 0.01 to 0.05 times.

なお、前記排出口17は、例えば、前記衝立板23と前記背面板11dの間の天井板11fに設けるようにする。   The discharge port 17 is provided, for example, in the ceiling plate 11f between the partition plate 23 and the back plate 11d.

このように、前記分離室部13内に衝立板23を設けることにより、より担体が、前記分離室部13内に流入することを防ぐことができるようになる。   As described above, by providing the partition plate 23 in the separation chamber 13, it is possible to prevent the carrier from flowing into the separation chamber 13.

なお、図15及び図16は、前記担体分離室13において、前記衝立板23の上端辺と、前記背面板11dとを塞ぎ板24により塞いだ例を示す。   15 and 16 show an example in which the upper end side of the partition plate 23 and the back plate 11d are closed by the closing plate 24 in the carrier separation chamber 13. FIG.

この実施例においても、図16に示すように、担体分離をすることができるようになる。   Also in this embodiment, the carrier can be separated as shown in FIG.

本発明の撹拌装置は、嫌気処理や、好気処理、脱窒・硝化処理などでも活用することができ、用途も電子産業、食品、畜産、農業、オフィス、下水など、産業排水や生活排水において利用可能である。   The stirrer of the present invention can be used for anaerobic treatment, aerobic treatment, denitrification / nitrification treatment, etc., and is used in industrial wastewater and domestic wastewater such as electronic industry, food, livestock, agriculture, office, sewage, etc. Is available.

1 撹拌装置
2 処理槽
2a 底部
3 回転翼
3a 回転軸
4 静翼
5 間隙
6 流入管
7 担体分離室
8 開口部
9 排出口
10 撹拌装置
11 担体分離室
11a 左側の側壁
11b 右側の側壁
11c 前面板
11d 背面板
11e 底面板
11f 天井板
12 流路室部
12a 上部流路室部
12b 下部流路室部
13 分離室部
14 上部開口部
15 下部開口部
15a 縁部
16 排水用開口部
17 排出口
18 カバー体
18a カバー板
18b 上板
18c 下板
18d 開口部
19 第1の仕切板
20 整流部
20a 傾斜面
20b 下面
21 担体分離室
22 第2の仕切板
23 衝立板
24 塞ぎ板
DESCRIPTION OF SYMBOLS 1 Stirring apparatus 2 Processing tank 2a Bottom part 3 Rotary blade 3a Rotating shaft 4 Stator blade 5 Gap 6 Inflow pipe 7 Carrier separation chamber 8 Opening part 9 Outlet 10 Stirrer 11 Carrier separation chamber 11a Left side wall 11b Right side wall 11c Front plate 11d Back plate 11e Bottom plate 11f Ceiling plate 12 Channel chamber portion 12a Upper channel chamber portion 12b Lower channel chamber portion 13 Separation chamber portion 14 Upper opening portion 15 Lower opening portion 15a Edge portion 16 Drainage opening portion 17 Discharge port 18 Cover body 18a Cover plate 18b Upper plate 18c Lower plate 18d Opening portion 19 First partition plate 20 Rectifying portion 20a Inclined surface 20b Lower surface 21 Carrier separation chamber 22 Second partition plate 23 Screen plate 24 Closing plate

Claims (8)

担体を有する液体が容れられる処理槽と、
該処理槽内に設けられた回転翼と、
前記処理槽の底部に固定された放射状に延びる静翼と、
担体分離室とよりなり、
該担体分離室は、前記処理槽内に連通するよう形成した上部開口部及び下部開口部とを有する流路室部と、前記流路室部の下部に連通するよう形成した排水用開口部と上部に設けた排出口とを有する分離室部とよりなることを特徴とする撹拌装置。
A treatment tank containing a liquid having a carrier;
A rotor blade provided in the treatment tank;
A radially extending stationary blade fixed to the bottom of the treatment tank;
Consisting of a carrier separation chamber,
The carrier separation chamber includes a flow channel chamber having an upper opening and a lower opening formed so as to communicate with the inside of the treatment tank, and a drain opening formed so as to communicate with a lower portion of the flow channel chamber. A stirring device comprising a separation chamber having a discharge port provided at an upper portion.
前記下部開口部の、前記回転翼の回転方向の後方側には、該回転方向の前方側に向かって、前記処理槽内の中心方向側に傾斜したカバー板が設けられていることを特徴とする請求項1に記載の撹拌装置。   A cover plate is provided on the rear side of the lower opening portion in the rotational direction of the rotary blade, and is inclined toward the front side in the rotational direction toward the center direction side in the processing tank. The stirring device according to claim 1. 前記下部開口部は、該下部開口部の開口面積が、前記上部開口部の開口面積よりも大きく形成されていることを特徴とする請求項1又は2に記載の撹拌装置。   The stirring device according to claim 1 or 2, wherein the lower opening is formed such that an opening area of the lower opening is larger than an opening area of the upper opening. 前記流路室部は、上部の流路室部の流路断面積が、下部の流路室部の流路断面積よりも、小さく形成されていることを特徴とする請求項1、2または3に記載の撹拌装置。   The flow passage chamber portion is formed so that a flow passage cross-sectional area of an upper flow passage chamber portion is smaller than a flow passage cross-sectional area of a lower flow passage chamber portion. 3. The stirring device according to 3. 前記担体分離室は、第1の仕切板を有する箱体により形成され、
前記流路室部と前記分離室部とは、該箱体の天井板から、下方の所望の位置まで延びる前記第1の仕切板により仕切られてそれぞれ形成されることを特徴とする請求項1、2、3または4に記載の撹拌装置。
The carrier separation chamber is formed by a box having a first partition plate,
2. The flow path chamber portion and the separation chamber portion are respectively formed by being partitioned by the first partition plate extending from a ceiling plate of the box to a desired position below. The stirring device according to 2, 3, or 4.
前記流路室部は、上部の上部流路室部と下部の下部流路室部とにより形成され、
前記上部の上部流路室部は、前記流路室部の天井板から、下方の所望の位置まで延びる第2の仕切板が設けられ、
該第2の仕切板により、上部の上部流路室部の流路断面積が、下部の下部流路室部の流路断面積よりも、小さく形成されていることを特徴とする請求項5に記載の撹拌装置。
The flow path chamber portion is formed by an upper upper flow path chamber portion and a lower lower flow path chamber portion,
The upper upper channel chamber part is provided with a second partition plate extending from the ceiling plate of the channel chamber part to a desired position below,
6. The flow path cross-sectional area of the upper upper flow path chamber portion is formed smaller by the second partition plate than the flow path cross-sectional area of the lower lower flow path chamber portion. A stirrer described in 1.
前記第1の仕切板の下部には、前記下部開口部側に向かう下方に傾斜した傾斜面を有する整流部を設けたことを特徴とする請求項5または6に記載の撹拌装置。   The stirrer according to claim 5 or 6, wherein a rectifying unit having an inclined surface inclined downward toward the lower opening is provided at a lower portion of the first partition plate. 前記分離室部内に、前記第1の仕切板に対向する、底面から所望の高さまで延びる衝立板を更に設けたことを特徴とする請求項5、6または7に記載の撹拌装置。

The stirrer according to claim 5, 6 or 7, further comprising a partition plate facing the first partition plate and extending from the bottom surface to a desired height in the separation chamber.

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372762U (en) * 1976-11-19 1978-06-17
JPH08103781A (en) * 1994-10-06 1996-04-23 Nitto Seimo Kk Polluted water treatment method and device therefor using spherical material of small diameter on which bacteria are deposited
JP2000246269A (en) * 1999-02-26 2000-09-12 Nec Environment Eng Ltd Waste water treatment apparatus
JP2003019489A (en) * 2001-07-10 2003-01-21 Nec Ameniplantex Ltd Waste water treatment equipment
JP2012030155A (en) * 2010-07-29 2012-02-16 Satake Chemical Equipment Mfg Ltd Wastewater treatment apparatus and wastewater treatment method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372762U (en) * 1976-11-19 1978-06-17
JPH08103781A (en) * 1994-10-06 1996-04-23 Nitto Seimo Kk Polluted water treatment method and device therefor using spherical material of small diameter on which bacteria are deposited
JP2000246269A (en) * 1999-02-26 2000-09-12 Nec Environment Eng Ltd Waste water treatment apparatus
JP2003019489A (en) * 2001-07-10 2003-01-21 Nec Ameniplantex Ltd Waste water treatment equipment
JP2012030155A (en) * 2010-07-29 2012-02-16 Satake Chemical Equipment Mfg Ltd Wastewater treatment apparatus and wastewater treatment method

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